WO2016095299A1 - 一种清洗设备 - Google Patents

一种清洗设备 Download PDF

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Publication number
WO2016095299A1
WO2016095299A1 PCT/CN2015/070550 CN2015070550W WO2016095299A1 WO 2016095299 A1 WO2016095299 A1 WO 2016095299A1 CN 2015070550 W CN2015070550 W CN 2015070550W WO 2016095299 A1 WO2016095299 A1 WO 2016095299A1
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WO
WIPO (PCT)
Prior art keywords
cleaning
baffles
cleaned
working chamber
cleaning device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2015/070550
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English (en)
French (fr)
Inventor
李子健
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/417,814 priority Critical patent/US10173251B2/en
Publication of WO2016095299A1 publication Critical patent/WO2016095299A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/28—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with integral means for shielding the discharged liquid or other fluent material, e.g. to limit area of spray; with integral means for catching drips or collecting surplus liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/32—Shielding elements, i.e. elements preventing overspray from reaching areas other than the object to be sprayed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/041—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B08B5/023—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated

Definitions

  • the invention relates to a cleaning device, in particular to a cleaning device for cleaning a glass substrate and a semi-finished array substrate.
  • the manufacturing process of the array substrate it is first necessary to manufacture the glass substrate into a semi-finished array substrate, but remanufacture into a finished array substrate. Among them, it is necessary to perform cleaning on the glass substrate and the semi-finished array substrate a plurality of times, but these cleaning processes are usually performed by one cleaning device.
  • the cleaning device comprises: a first cleaning device capable of removing organic matter on the object to be cleaned by ultraviolet rays; a second cleaning device capable of removing particles on the object to be cleaned with water and gas; capable of removing organic matter and metal on the object to be cleaned by using ozone water a third cleaning device that ionizes or oxidizes amorphous silicon (ie, a-Si) on the object to be cleaned with ozone water to form a surface of amorphous silicon (ie, SiOx); can be removed by hydrofluoric acid etching a fourth cleaning device for the silicon oxide layer; a fifth cleaning device capable of removing particles on the object to be cleaned again by using hydrogen water; capable of oxidizing the surface of the amorphous silicon on the object to be cleaned into uniform and dense silicon by using ozone water a sixth cleaning device for the oxide layer; a seventh cleaning device on the array substrate on the object to be cleaned by water and gas; and an air drying device capable of drying the object to be cleaned by the wind.
  • the cleaning device cleans the glass material to be cleaned, such as a glass substrate
  • the glass substrate is cleaned with a sixth cleaning device.
  • the fourth, fifth and sixth cleaning devices have to be passed. Since the fourth, fifth and sixth cleaning devices are frequently used, liquid leakage is likely to occur, so that the liquid leakage may drop.
  • the hydrofluoric acid of the fourth cleaning device can corrode the glass substrate, the hydrofluoric acid dropped on the glass substrate corrodes the glass substrate, and the glass substrate after cleaning cannot be used normally.
  • an object of the present invention is to provide a cleaning apparatus capable of preventing leakage liquid droplets of an unused cleaning device from falling on an object to be cleaned, thereby avoiding the danger and influence of leakage of the cleaning object.
  • the present invention provides a cleaning apparatus comprising a plurality of cleaning devices, and a conveyor for connecting the cleaning devices and capable of transporting the objects to be cleaned.
  • Each cleaning device includes a body and a working chamber formed in the body, and a liquid discharging unit disposed in the working chamber capable of spraying liquid to be washed.
  • the transport machine runs through the working chamber and is below the spray unit.
  • All or part of the cleaning device includes a plurality of baffles disposed between the liquid ejecting unit and the transporter, and a drive mechanism disposed within the working chamber.
  • the driving mechanism is configured to be capable of actuating the baffles to rotate in the first direction and to overlap adjacent baffles to prevent the leakage droplets of the liquid ejecting unit from falling on the object to be cleaned, and at the same time capable of actuating the respective blocks
  • the plate is rotated in the reverse direction of the first direction to open the liquid ejecting unit.
  • the drive mechanism includes a lifting member and a plurality of drawbars that are vertically movable in a vertical direction, wherein one end of each of the drawbars is hinged to a respective baffle and the other end is secured to the lifter.
  • the two ends of the baffle are respectively connected to the lifting member by a tie rod.
  • the lifting member is coupled to the top chamber wall of the working chamber by a translating member to actuate the lifting member for lifting movement.
  • the cleaning apparatus further includes a plurality of support rods, the bottom ends of each of the support rods are respectively hinged to different baffles, and the top ends thereof are connected to the side walls of the working chamber through the moving pair.
  • the moving pair includes a waist hole provided at the top end of the support rod, and a pin fixed to the side wall of the working chamber and capable of being embedded in the waist hole.
  • the hinged position between the drawbar and the baffle is lower than the hinged position between the support bar and the baffle after the baffles are overlapped.
  • the lap joint between any two adjacent baffles is a bevel, curved or curved face.
  • the baffle is a rectangular baffle. Rectangular baffles have the advantage of being easy to manufacture and can save production costs.
  • the object to be cleaned is a glass substrate or a semi-finished array substrate.
  • the cleaning device has a plurality of rotatable baffles disposed in all or part of the cleaning device, and the baffles can form a complete plane after being overlapped with each other for receiving the leakage of the liquid ejecting unit in the cleaning device.
  • the liquid prevents the leakage from continuing to flow down and drip on the object to be cleaned. In this way, the leakage of the unused cleaning device can be prevented from falling on the object to be cleaned, thereby avoiding the leakage of the liquid to be cleaned and influences.
  • the cleaning apparatus according to the present invention is easy to assemble, safe to use, and easy to implement and popularize.
  • Figure 1 is a schematic view showing the structure of a washing apparatus according to the present invention.
  • FIG. 2 is a schematic structural view of a cleaning device of a cleaning device according to the present invention.
  • FIG. 3 is a schematic structural view of a cleaning device of a cleaning device according to the present invention, in which a baffle is in a closed state;
  • FIG. 4 is a schematic view showing the structure of the cleaning device of the cleaning device according to the present invention, in which the baffle is in an open state;
  • Figure 5 is a perspective view of the cleaning device of the cleaning apparatus according to the present invention, in which the shutter is in a closed state;
  • Figure 6 is a perspective view of the cleaning device of the cleaning apparatus in accordance with the present invention, with the shutter in an open state.
  • FIG. 1 shows a cleaning apparatus 50 in accordance with the present invention.
  • the cleaning device 50 includes a plurality of cleaning devices, and a conveyor for connecting the cleaning devices and capable of transporting the objects to be cleaned.
  • the transporter is used to connect the cleaning devices to sequentially transport the objects to be cleaned to the respective cleaning devices.
  • the cleaning device 50 may be a cleaning device for cleaning a glass substrate and a semi-finished array substrate, and may of course be a cleaning device for cleaning other products and workpieces waiting for cleaning.
  • the present invention will be described in detail by taking a cleaning apparatus 50 for cleaning a glass substrate and a semi-finished array substrate as an example.
  • the cleaning device 50 includes seven cleaning devices, respectively a first cleaning device 51 capable of removing organic matter on the object to be cleaned by ultraviolet rays, a second cleaning device 52 capable of removing particles on the object to be cleaned with water and gas, and capable of utilizing ozone.
  • the third cleaning device 53 for removing the organic matter and metal ions on the object to be cleaned by water or oxidizing the amorphous silicon on the object to be cleaned with ozone water to form a silicon oxide layer on the surface of the amorphous silicon can be removed by hydrofluoric acid etching.
  • a fourth cleaning device 54 of a silicon oxide layer a fifth cleaning device 55 capable of removing particles on the object to be cleaned again by using hydrogen water, and capable of oxidizing the surface of the amorphous silicon into a uniform and dense silicon oxide layer by using ozone water
  • the sixth cleaning device 56 can remove the seventh cleaning device 57 and the air drying device 58 and the conveyor 59 on the object to be cleaned with water and gas.
  • Transporter 59 is used to connect the various cleaning devices in series Connected to transport the items to be washed to each cleaning device in sequence. Among them, each cleaning device and transporter 59 are well known to those skilled in the art and will not be described in detail herein.
  • the fourth cleaning device 54 When the cleaning device 50 cleans the glass substrate, although the fourth cleaning device 54 does not need to clean the glass substrate, the leakage of the liquid on the glass substrate may corrode the glass substrate, causing the glass substrate to be unusable. Therefore, the fourth cleaning device 54 needs to have a mechanism or structure capable of preventing its liquid leakage from falling on the glass substrate. In addition, when the cleaning device 50 cleans the semi-finished array substrate or other products, it may also be a combination of other devices or other devices that are not required, and therefore these devices need to be provided with a mechanism or structure capable of preventing the liquid leakage from falling on the object to be cleaned. .
  • the cleaning device 10 shown in FIG. 2 can be any cleaning device in the cleaning device 50.
  • the cleaning device 10 includes a body 8 and a working chamber 9 formed in the body 8, and a liquid ejecting unit 3 disposed in the working chamber 9 and capable of ejecting liquid to the object 1 to be cleaned.
  • the conveyor 59 runs through the working chamber 9 and below the liquid ejecting unit 3.
  • the conveyor 59 is capable of transporting the object to be cleaned 1 from the previous cleaning device to the next cleaning device.
  • the liquid ejecting unit 3 may be composed of a plurality of liquid ejecting members 3a.
  • the liquid ejecting member 3a may be selected as a nozzle capable of ejecting liquid to the surface of the object 1 to be cleaned, thereby achieving a cleaning or etching function of the cleaning device 10.
  • the cleaning device 10 further includes a plurality of rotatable baffles 5 disposed between the liquid ejecting unit 3 and the transporter 59, and capable of actuating the baffle 5 A drive mechanism 6 that rotates.
  • the baffle 5 can be a rectangular baffle that has the advantage of being easy to manufacture and cost effective.
  • the leakage liquid is a liquid flowing out of the liquid discharge unit 3 that is not working.
  • the driving mechanism 6 can not only actuate the baffles 5 to rotate in the first direction but also overlap the adjacent baffles 5 (ie, the closed state) to prevent the liquid ejecting unit 3 from being detached.
  • the leakage liquid falls on the object to be cleaned 1; and it is also possible to actuate the rotation of each of the baffles 5 in the reverse direction of the first direction to open the liquid ejecting unit 3, that is, to open all the nozzles 3a in the liquid ejecting unit 3, Referred to as open status.
  • a complete plane can be formed for receiving the liquid leakage of the liquid ejecting unit 3, preventing the liquid leakage from continuing to flow down and dripping onto the object to be cleaned 1, thereby It can avoid the danger and impact of leakage to the cleaning object.
  • the drive mechanism 6 includes a lifting member 61 and a tie rod 62 that can be raised and lowered in the vertical direction V.
  • the lifting member 61 can be coupled to the top wall of the working chamber 9 through the translating member 63 to effect the lifting operation of the lifting member 61.
  • the translating member 63 can be selected as a linear motor or a hydraulic cylinder.
  • one end of each of the pull rods 62 is hinged to the corresponding baffle 5, and the other end is connected to the elevating member 61.
  • the articulation employed between the drawbar 62 and the baffle 5 can allow the baffle 5 to rotate.
  • both ends of the baffle 5 are connected to the elevating member 61 via tie rods 62, respectively. In this way, the stability of the baffle 5 can be improved and prevented from being deformed to some extent.
  • the baffle 5 can be arranged between the spray unit 3 and the transporter 59 via a vertical rod, the top end of which is fixed to the top wall of the working chamber 9, and the bottom end is blocked.
  • the plates 5 are hinged.
  • the cleaning device 10 further includes a plurality of support rods 7. As shown in FIG. 5 or FIG. 6, the number of the support bars 7 is the same as the number of the baffles 5.
  • the bottom ends of the respective support rods 7 are respectively hinged to the ends of the different baffles 5, and the top ends thereof are connected to the side walls of the working chamber 9 by the moving pair 12.
  • the moving pair 12 may include a waist hole 12a provided at the bottom end of the support rod 7, and a pin 12b fixed to the side wall 9a of the working chamber 9 and embedded in the waist hole 12a (see Fig. 2). And Figure 3).
  • the lifting member 61 when the lifting member 61 is raised, the lifting member 61 can pull the baffle 5 up by the pull rod 62, and the baffle 5 drives the supporting rod 7 to rise with it until the waist hole on the supporting rod 7. The bottom end of 12a meets the pin 12b. Then, the elevating member 61 that continues to rise can be used to urge the baffle 5 to rotate in the reverse direction of the first direction A by the pull rod 62 until the baffles 5 are released from the overlapping relationship and the liquid ejecting unit 3 is opened and then stopped. Since the rotation of the baffle 5 is performed after it and the support rod 7 are raised, it is possible to prevent the rotating baffle 5 from being obstructed by the object to be cleaned, and to smoothly rotate the baffles 5.
  • the hinged position 15 between the tie rod 62 and the baffle 5 is lower than the hinged position 16 between the support rod 7 and the baffle 5, see Figure 3. . In this way, the shutter 5 can smoothly rotate in the first direction A.
  • the overlapping faces S of any two adjacent baffles 5 are beveled, curved or curved faces. These kinds of overlapping faces S can increase the contact area between the baffles 5, improve the sealing performance here, and prevent the leakage of the dripping from continuing to leak.
  • the cleaning device 50 has a plurality of rotatable baffles 5 disposed in all or part of the cleaning device 10, and the baffles 5 can form a complete plane after being overlapped with each other for receiving the inside of the cleaning device 10.
  • the liquid leakage of the liquid unit 3 prevents the leakage liquid from continuing to flow down and drip onto the object to be cleaned 1. In this way, leakage of the unused cleaning device 10 can be prevented from falling on the object to be cleaned 1, thereby avoiding Leakage causes damage and impact on the cleaning product 1.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

一种清洗设备（50），包括多个清洗装置和用于把各清洗装置（51，52，53，54，55，56，57）连接起来的运输机（59）。各清洗装置均包括具有工作腔（9）的本体（8）和喷液单元（3）。其中，全部或部分清洗装置包括设在喷液单元（3）与运输机（59）之间的多个挡板（5），该清洗设备还包括驱动机构（6）。驱动机构（6）能够促动各挡板（5）沿第一方向旋转并使相邻的挡板相互搭接，并且能够促动各挡板沿（5）第一方向的反向旋转。

Description

一种清洗设备
相关申请的交叉引用
本申请要求享有于2014年12月18日提交的名称为“一种清洗设备”的中国专利申请CN201410797975.1的优先权，该申请的全部内容通过引用并入本文中。
技术领域
本发明涉及一种清洗设备，尤其是清洗玻璃基板和半成品阵列基板的清洗设备。
背景技术
在阵列基板的制造过程中，首先需要把玻璃基板制造成半成品阵列基板，然而再制造成成品阵列基板。其中，需要对玻璃基板和半成品阵列基板等待清洗物进行多次清洗，但这些清洗工序通常都通过一台清洗设备进行。
清洗设备包括：能够利用紫外线去除待清洗物上的有机物的第一清洗装置；能够利用水和气去除待清洗物上的颗粒的第二清洗装置；能够利用臭氧水去除待清洗物上的有机物和金属离子的或利用臭氧水氧化待清洗物上的非晶硅(即a-Si)以使非晶硅的表面形成硅氧化物(即SiOx)层的第三清洗装置；能够利用氢氟酸蚀刻去除硅氧化物层的第四清洗装置；能够利用氢气水再次去除待清洗物上的颗粒的第五清洗装置；能够利用臭氧水把待清洗物上的非晶硅的表面氧化成均匀而致密的硅氧化物层的第六清洗装置；能够利用水和气去除待清洗物上的阵列基板上的第七清洗装置；以及能够利用风吹干待清洗物的风干装置。
当该清洗设备对玻璃材质的待清洗物、例如玻璃基板进行清洗时，只需依次经过第一、第二、第三和第七清洗装置以及风干装置即可，而不需要第四、第五和第六清洗装置对该玻璃基板进行清洗。但在整个清洗过程中又不得不经过第四、第五和第六清洗装置，由于第四、第五和第六清洗装置频繁使用后很有可能出现漏液，使得其漏液有可能滴落在经过其内的玻璃基板上，由于第四清洗装置的氢氟酸能够腐蚀玻璃基板，因此滴落在玻璃基板上的氢氟酸会腐蚀玻璃基板，造成清洗后的玻璃基板无法正常使用。
发明内容
为了解决上述问题，本发明的目的是提供了一种清洗设备，其能够避免未使用的清洗装置的漏液滴落在待清洗物上，由此可以避免漏液对待清洗物造成危害和影响。
本发明提供了一种清洗设备，其包括多个清洗装置，以及用于把各清洗装置连接起来的且能够运送待清洗物的运输机。各清洗装置均包括本体和形成在本体内的工作腔，以及设在工作腔内的能够向待清洗物喷液的喷液单元。其中，运输机贯穿工作腔并处喷液单元的下方。全部或部分的清洗装置均包括设在喷液单元与运输机之间的多个挡板，以及设在工作腔内的驱动机构。驱动机构构造成能够促动各挡板沿着第一方向旋转并使相邻的挡板相互搭接，以防止喷液单元的漏液滴落在待清洗物上，同时其能够促动各挡板沿着第一方向的反向进行旋转以敞开喷液单元。
在一个实施例中，驱动机构包括能够沿竖直方向升降的升降部件和多个拉杆，其中各拉杆的一端与分别相应的挡板相铰接，而另一端与升降部件相固接。
在一个实施例中，挡板的两端分别通过拉杆与升降部件相连。
在一个实施例中，升降部件通过平移构件与工作腔的顶部腔壁相连，以促动升降部件进行升降运动。
在一个实施例中，清洗设备还包括多个支撑杆，各支撑杆的底端分别与不同的挡板相铰接，而其顶端均通过移动副与工作腔的侧壁相连。
在一个实施例中，移动副包括设在支撑杆的顶端处的腰型孔，以及固定于工作腔的侧壁上的且能够嵌入在腰型孔内的销轴。
在一个实施例中，在各挡板搭接后，拉杆与挡板之间的铰接位置低于支撑杆与挡板之间的铰接位置。
在一个实施例中，任意两个相邻的挡板之间的搭接面为斜面、曲面或弯折面。
在一个实施例中，挡板为矩形挡板。矩形挡板有着制造方便的优点，可以节约生产成本。
在一个实施例中，待清洗物为玻璃基板或半成品阵列基板。
根据本发明的清洗设备把其全部或部分清洗装置内设置了多个可旋转的挡板，各挡板在相互搭接后能够形成完整的平面，以用于接收清洗装置内喷液单元的漏液，防止漏液继续下流而滴落在待清洗物上，通过这种方式能够避免未使用的清洗装置的漏液滴落在待清洗物上，由此可以避免漏液对待清洗物造成危害和影响。
另外，根据本发明的清洗设备的装配容易，使用安全，便于实施推广应用。
附图说明
在下文中将基于实施例并参考附图来对本发明进行更详细的描述。其中：
图1是根据本发明的清洗设备的结构示意图；
图2是根据本发明的清洗设备的清洗装置的结构示意图；
图3是根据本发明的清洗设备的清洗装置的结构示意图，此时挡板处于关闭状态；
图4是根据本发明的清洗设备的清洗装置的结构示意图，此时挡板处于打开状态；
图5是根据本发明的清洗设备的清洗装置的立体图，此时挡板处于关闭状态；以及
图6是根据本发明的清洗设备的清洗装置的立体图，此时挡板处于打开状态。
在图3到图6中忽略了清洗设备的清洗装置的本体、工作腔和喷嘴单元。另外，在附图中相同的部件使用相同的附图标记。附图并未按照实际的比例绘制。
具体实施方式
下面将结合附图对本发明作进一步说明。
图1显示了根据本发明的清洗设备50。清洗设备50包括多个清洗装置，以及用于把各清洗装置连接起来的且能运输待清洗物的运输机。运输机用于把各清洗装置连接起来，以便把待清洗物依次运送到各个清洗装置。该清洗设备50可以是用于清洗玻璃基板和半成品阵列基板的清洗设备，当然也可以是用于清洗其他产品和工件等待清洗物的清洗设备。以下以清洗玻璃基板和半成品阵列基板的清洗设备50为例，详细介绍本发明。
该清洗设备50包括七个清洗装置，分别为能够利用紫外线去除待清洗物上的有机物的第一清洗装置51、能够利用水和气去除待清洗物上的颗粒的第二清洗装置52、能够利用臭氧水去除待清洗物上的有机物和金属离子或利用臭氧水氧化待清洗物上的非晶硅以使非晶硅的表面形成硅氧化物层的第三清洗装置53、能够利用氢氟酸蚀刻去除硅氧化物层的第四清洗装置54、能够利用氢气水再次去除待清洗物上的颗粒的第五清洗装置55、能够利用臭氧水把非晶硅的表面氧化成均匀而致密的硅氧化物层的第六清洗装置56、能够利用水和气去除待清洗物上的第七清洗装置57和风干装置58以及运输机59。运输机59用于把各个清洗装置串联 连接起来，以便把待清洗物依次运送到各个清洗装置。其中，各清洗装置和运输机59均属于本领域技术人员熟知的，在此不作详细描述。
当该清洗设备50清洗玻璃基板时，虽然第四清洗装置54不需对玻璃基板进行清洗，但是其滴落在玻璃基板上的漏液会腐蚀玻璃基板，造成玻璃基板无法正常使用。因此，第四清洗装置54需要具有能够阻止其漏液低落在玻璃基板上的机构或结构。此外，当该清洗设备50清洗半成品阵列基板或其他产品时，也可能就不需要的其他装置或其他装置的组合，因此这些装置均需要设置能够阻止漏液低落在待清洗物上的机构或结构。本领域技术人员可以根据实际需要选择在哪个清洗装置内设置能够阻止漏液低落在待清洗物上的机构或结构。最简单的做法就是，在所有的清洗装置内均设置能够阻止漏液低落在待清洗物上的机构或结构，在需要时开启相应的机构工作即可。
图2所示的清洗装置10可以是清洗设备50内任意的清洗装置。清洗装置10包括本体8和形成在本体8内的工作腔9，以及设在工作腔9内的且能够向待清洗物1喷液的喷液单元3。运输机59贯穿工作腔9并处喷液单元3的下方。运输机59能够把待清洗物1从上一个清洗装置内运送至下一个清洗装置内。其中，喷液单元3可由多个喷液件3a组成。喷液件3a可选为喷嘴，其能够向待清洗物1的表面喷射液体，从而实现清洗装置10的清洗或蚀刻功能。
为了防止喷液单元3的漏液滴落在待清洗物1上，清洗装置10还包括设在喷液单元3与运输机59之间的多个可旋转的挡板5，以及能够促动挡板5进行旋转的驱动机构6。挡板5可为矩形挡板，其有着方便制造和节约成本的优点。其中，所述的漏液为未工作的喷液单元3流出的液体。
如图3到图6所示，驱动机构6不仅能够促动各挡板5沿着第一方向旋转并使相邻的挡板5相互搭接(即闭合状态)，以防止喷液单元3的漏液滴落在待清洗物1上；而且还能够促动各挡板5沿着第一方向的反向进行旋转，以便敞开喷液单元3，即敞开喷液单元3内的所有喷嘴3a，简称打开状态。如图3所示，在各挡板5相互搭接后，能够形成完整的平面以用于接收喷液单元3的漏液，防止漏液继续下流而滴落在待清洗物1上，由此可以避免漏液对待清洗物造成危害和影响。
如图3到图6所示，驱动机构6包括能够沿着竖直方向V升降的的升降部件61和拉杆62。如图2所示，升降部件61可通过平移构件63与工作腔9的顶壁相连，以实现升降部件61的升降动作。平移构件63可选为直线电机或液压缸。其中，各拉杆62的一端与相应的挡板5相铰接，而另一端与升降部件61相连。 拉杆62与挡板5之间采用的铰接能够允许挡板5进行旋转。如图5所示，挡板5的两端分别通过拉杆62与升降部件61相连。通过这种方式，能够提高挡板5的稳定性，并在一定程度上阻止其发生变形。
在一个未示出的实施例中，挡板5能够通过竖直杆设在喷液单元3与运输机59之间，竖直杆的顶端与工作腔9的顶壁相固定，而底端与挡板5相铰接。但在一个优选的实施例中，该清洗装置10还包括多个支撑杆7。如图5或图6所示，支撑杆7的数量与挡板5的数量相同。各支撑杆7的底端分别与不同的挡板5的端部相铰接，而其顶端均通过移动副12与工作腔9的侧壁相连。其中，移动副12可包括设在支撑杆7的底端处的腰型孔12a，以及固定于工作腔9的侧壁9a的并能嵌入在腰型孔12a内的销轴12b(见图2和图3)。
如图3到图6所示，当升降部件61上升时，升降部件61能够通过拉杆62拉动挡板5上升，同时挡板5带动支撑杆7随其上升，直至支撑杆7上的腰型孔12a的底端与销轴12b相接处。然后，继续上升的升降部件61便可通过拉杆62来促动挡板5沿着第一方向A的反向进行旋转，直至各挡板5解除搭接关系而敞开喷液单元3后停止。由于挡板5的旋转是在其和支撑杆7上升之后进行的，因此其能够避免旋转的挡板5受到待清洗物的阻碍，实现各挡板5的顺利旋转。
在一个优选的实施例中，在各挡板5相互搭接后，拉杆62与挡板5之间的铰接位置15低于支撑杆7与挡板5之间的铰接位置16，请参见图3。通过这种方式，挡板5能够沿着第一方向A进行顺利的旋转。
在一个优选的实施例中，任意两个相邻的挡板5的搭接面S均为斜面、曲面或弯折面。这几种搭接面S能够增加挡板5间的接触面积，提高此处的密封性能，防止滴落的漏液从此继续下漏。
根据本发明的清洗设备50把其全部或部分清洗装置10内设置了多个可旋转的挡板5，各挡板5在相互搭接后能够形成完整的平面，用于接收清洗装置10内喷液单元3的漏液，防止漏液继续下流而滴落在待清洗物1上，通过这种方式能够避免未使用的清洗装置10的漏液滴落在待清洗物1上，由此可以避免漏液对待清洗物1造成危害和影响。
虽然已经参考优选实施例对本发明进行了描述，但在不脱离本发明的范围的情况下，可以对其进行各种改进并且可以用等效物替换其中的部件。尤其是，只要不存在结构冲突，各个实施例中所提到的各项技术特征均可以任意方式组合起来。本发明并不局限于文中公开的特定实施例，而是包括落入权利要求的范围内的所有技术方案。

Claims (16)

  1. 一种清洗设备，包括多个清洗装置，以及用于把各所述清洗装置连接起来的且能够运送待清洗物的运输机，各所述清洗装置均包括本体和形成在所述本体内的工作腔，以及设在所述工作腔内的能够向所述待清洗物喷液的喷液单元，其中，所述运输机贯穿所述工作腔并处所述喷液单元的下方，全部或部分的所述清洗装置均包括设在所述喷液单元与运输机之间的多个挡板，以及设在所述工作腔内的驱动机构，所述驱动机构构造成能够促动各所述挡板沿着第一方向旋转并使相邻的所述挡板相互搭接，以防止所述喷液单元的漏液滴落在所述待清洗物上，同时其还能够促动各所述挡板沿着第一方向的反向进行旋转以敞开所述喷液单元。
  2. 根据权利要求1所述的清洗设备，其中，所述驱动机构包括能够沿竖直方向升降的升降部件和多个拉杆，其中各所述拉杆的一端与分别相应的所述挡板相铰接，而另一端与所述升降部件相固接。
  3. 根据权利要求2所述的清洗设备，其中，所述挡板的两端分别通过所述拉杆与升降部件相连。
  4. 根据权利要求3所述的清洗设备，其中，所述升降部件通过平移构件与所述工作腔的顶部腔壁相连，以促动所述升降部件进行升降运动。
  5. 根据权利要求4所述的清洗设备，其中，还包括多个支撑杆，各所述支撑杆的底端分别与不同的所述挡板相铰接，而顶端均通过移动副与所述工作腔的侧壁相连。
  6. 根据权利要求5所述的清洗设备，其中，所述移动副包括设在所述支撑杆的顶端处的腰型孔，以及固定于所述工作腔的侧壁上的且能够嵌入在所述腰型孔内的销轴。
  7. 根据权利要求6所述的清洗设备，其中，在各所述挡板搭接后，所述拉杆与挡板之间的铰接位置低于所述支撑杆与挡板之间的铰接位置。
  8. 根据权利要求7所述的清洗设备，其中，任意两个相邻的所述挡板之间的搭接面为斜面、曲面或弯折面。
  9. 根据权利要求8所述的清洗设备，其中，所述挡板为矩形挡板。
  10. 根据权利要求7所述的清洗设备，其中，所述待清洗物为玻璃基板或半成品阵列基板。
  11. 根据权利要求2所述的清洗设备，其中，还包括多个支撑杆，各所述支 撑杆的底端分别与不同的所述挡板相铰接，而顶端均通过移动副与所述工作腔的侧壁相连。
  12. 根据权利要求11所述的清洗设备，其中，所述移动副包括设在所述支撑杆的顶端处的腰型孔，以及固定于所述工作腔的侧壁上的且能够嵌入在所述腰型孔内的销轴。
  13. 根据权利要求11所述的清洗设备，其中，在各所述挡板搭接后，所述拉杆与挡板之间的铰接位置低于所述支撑杆与挡板之间的铰接位置。
  14. 根据权利要求1所述的清洗设备，其中，任意两个相邻的所述挡板之间的搭接面为斜面、曲面或弯折面。
  15. 根据权利要求14所述的清洗设备，其中，所述挡板为矩形挡板。
  16. 根据权利要求1所述的清洗设备，其中，所述待清洗物为玻璃基板或半成品阵列基板。
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