WO2016084958A1 - 積層半透膜 - Google Patents
積層半透膜 Download PDFInfo
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- WO2016084958A1 WO2016084958A1 PCT/JP2015/083483 JP2015083483W WO2016084958A1 WO 2016084958 A1 WO2016084958 A1 WO 2016084958A1 JP 2015083483 W JP2015083483 W JP 2015083483W WO 2016084958 A1 WO2016084958 A1 WO 2016084958A1
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- Prior art keywords
- compound
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- layer
- semipermeable membrane
- polymer
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- 239000012528 membrane Substances 0.000 title claims abstract description 151
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 16
- 238000009833 condensation Methods 0.000 claims abstract description 11
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- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 8
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
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- 125000003118 aryl group Chemical group 0.000 description 4
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 4
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- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- XBZSBBLNHFMTEB-UHFFFAOYSA-N cyclohexane-1,3-dicarboxylic acid Chemical compound OC(=O)C1CCCC(C(O)=O)C1 XBZSBBLNHFMTEB-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 description 1
- 239000004914 cyclooctane Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- RRLWYLINGKISHN-UHFFFAOYSA-N ethoxymethanol Chemical compound CCOCO RRLWYLINGKISHN-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
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- 239000001530 fumaric acid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- XLSMFKSTNGKWQX-UHFFFAOYSA-N hydroxyacetone Chemical compound CC(=O)CO XLSMFKSTNGKWQX-UHFFFAOYSA-N 0.000 description 1
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000006166 lysate Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 description 1
- SFMJNHNUOVADRW-UHFFFAOYSA-N n-[5-[9-[4-(methanesulfonamido)phenyl]-2-oxobenzo[h][1,6]naphthyridin-1-yl]-2-methylphenyl]prop-2-enamide Chemical compound C1=C(NC(=O)C=C)C(C)=CC=C1N1C(=O)C=CC2=C1C1=CC(C=3C=CC(NS(C)(=O)=O)=CC=3)=CC=C1N=C2 SFMJNHNUOVADRW-UHFFFAOYSA-N 0.000 description 1
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical group CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 1
- NAQQTJZRCYNBRX-UHFFFAOYSA-N n-pentan-3-ylidenehydroxylamine Chemical group CCC(CC)=NO NAQQTJZRCYNBRX-UHFFFAOYSA-N 0.000 description 1
- 238000001728 nano-filtration Methods 0.000 description 1
- URXNVXOMQQCBHS-UHFFFAOYSA-N naphthalene;sodium Chemical compound [Na].C1=CC=CC2=CC=CC=C21 URXNVXOMQQCBHS-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- ZCYXXKJEDCHMGH-UHFFFAOYSA-N nonane Chemical compound CCCC[CH]CCCC ZCYXXKJEDCHMGH-UHFFFAOYSA-N 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N normal nonane Natural products CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000000466 oxiranyl group Chemical group 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- MTZWHHIREPJPTG-UHFFFAOYSA-N phorone Chemical compound CC(C)=CC(=O)C=C(C)C MTZWHHIREPJPTG-UHFFFAOYSA-N 0.000 description 1
- 229930193351 phorone Natural products 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920012287 polyphenylene sulfone Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- ZYBHSWXEWOPHBJ-UHFFFAOYSA-N potassium;propan-2-ylbenzene Chemical compound [K+].C[C-](C)C1=CC=CC=C1 ZYBHSWXEWOPHBJ-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- BWSZXUOMATYHHI-UHFFFAOYSA-N tert-butyl octaneperoxoate Chemical compound CCCCCCCC(=O)OOC(C)(C)C BWSZXUOMATYHHI-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- JFLKFZNIIQFQBS-FNCQTZNRSA-N trans,trans-1,4-Diphenyl-1,3-butadiene Chemical group C=1C=CC=CC=1\C=C\C=C\C1=CC=CC=C1 JFLKFZNIIQFQBS-FNCQTZNRSA-N 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- UUVZTKMMRCCGHN-OUKQBFOZSA-N triethoxy-[(e)-2-phenylethenyl]silane Chemical compound CCO[Si](OCC)(OCC)\C=C\C1=CC=CC=C1 UUVZTKMMRCCGHN-OUKQBFOZSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- UBMUZYGBAGFCDF-UHFFFAOYSA-N trimethoxy(2-phenylethyl)silane Chemical compound CO[Si](OC)(OC)CCC1=CC=CC=C1 UBMUZYGBAGFCDF-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- JRSJRHKJPOJTMS-MDZDMXLPSA-N trimethoxy-[(e)-2-phenylethenyl]silane Chemical compound CO[Si](OC)(OC)\C=C\C1=CC=CC=C1 JRSJRHKJPOJTMS-MDZDMXLPSA-N 0.000 description 1
- JPPHEZSCZWYTOP-UHFFFAOYSA-N trimethoxysilylmethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C=C JPPHEZSCZWYTOP-UHFFFAOYSA-N 0.000 description 1
- KQBSGRWMSNFIPG-UHFFFAOYSA-N trioxane Chemical compound C1COOOC1 KQBSGRWMSNFIPG-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/70—Polymers having silicon in the main chain, with or without sulfur, nitrogen, oxygen or carbon only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/107—Organic support material
- B01D69/1071—Woven, non-woven or net mesh
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1213—Laminated layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1216—Three or more layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/08—Polysaccharides
- B01D71/12—Cellulose derivatives
- B01D71/14—Esters of organic acids
- B01D71/16—Cellulose acetate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/56—Polyamides, e.g. polyester-amides
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
- C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/02—Details relating to pores or porosity of the membranes
- B01D2325/022—Asymmetric membranes
- B01D2325/0233—Asymmetric membranes with clearly distinguishable layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/04—Characteristic thickness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/14—Membrane materials having negatively charged functional groups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/16—Membrane materials having positively charged functional groups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/30—Chemical resistance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/36—Hydrophilic membranes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/12—Halogens or halogen-containing compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A20/00—Water conservation; Efficient water supply; Efficient water use
- Y02A20/124—Water desalination
- Y02A20/131—Reverse-osmosis
Definitions
- the present invention relates to a semipermeable membrane useful for selective separation of a liquid mixture, and relates to a laminated semipermeable membrane having excellent oxidation resistance.
- an asymmetric semipermeable membrane formed of a polymer such as cellulose acetate, and a microporous support layer and a separation functional layer provided on the microporous support layer, A composite semipermeable membrane comprising is known.
- a composite semipermeable membrane having a separation functional layer formed of polyamide (hereinafter referred to as “polyamide separation functional layer”) can be easily formed by interfacial polycondensation of a polyfunctional amine and a polyfunctional acid halide. It is most widely used because it has a high pressure resistance and a high desalination rate and a high permeation flux (Patent Documents 1 and 2).
- the polyamide separation functional layer has insufficient durability against the oxidizing agent, and the desalting performance and selective separation performance of the semipermeable membrane deteriorate due to chlorine, hydrogen peroxide, etc. used for sterilization of the membrane.
- Patent Document 3 describes that a nitrogen atom of a polyamide, which is a reaction point between a polyamide and an oxidizing agent, is substituted with an alkyl group.
- Patent Document 4 describes that after a polyamide film surface is brought into contact with a polymer emulsion solution such as polyvinyl acetate, it is heated and dried to a temperature higher than the glass transition temperature of the polymer.
- Patent Document 5 discloses at least one selected from the group consisting of an amine compound having at least two amino groups in the molecule, an alkoxysilane structure in the molecule, and an amino group and an oxirane ring in the molecule. It is described that a thin film having a separation function is formed by reacting an organosilicon compound having a functional group of a seed on a porous substrate.
- Non-Patent Document 1 describes that the oxidation of polyamide is remarkably promoted by the coexistence of an oxidizing agent and a trace amount of heavy metal.
- the oxidizing agent and the heavy metal often coexist for practical purposes in order to have oxidation resistance.
- An object of the present invention is to provide a semipermeable membrane capable of realizing a salt removal performance equivalent to that of a semipermeable membrane having poor resistance to an oxidizing agent while having oxidation resistance even in the presence of a heavy metal. .
- the present invention comprises any one of the following configurations (1) to (8).
- (1) comprising a semipermeable layer and a polymer layer formed on the semipermeable layer,
- the polymer layer contains a polymer formed by condensation of a hydrolyzable group of the following compound (A) and polymerization of the compound (A) and the following compound (B).
- Laminated semipermeable membrane
- the compound (A) a silicon compound having a silicon atom, a reactive group having an ethylenically unsaturated group directly bonded to the silicon atom, and a hydrolyzable group directly bonded to the silicon atom (B) a hydrophilic group; A compound other than the compound (A) having an ethylenically unsaturated group (2)
- the hydrophilic group of the compound (B) is at least one selected from a carboxyl group, a sulfonic acid group, and a phosphonic acid group.
- the compound (A) is represented by the following general formula (a): The laminated semipermeable membrane according to (1) or (2).
- R1 represents a reactive group containing an ethylenically unsaturated group.
- R2 represents at least one group selected from the group consisting of an alkoxy group, an alkenyloxy group, a carboxy group, a ketoxime group, an isocyanate group, and a halogen atom.
- R3 represents at least one of hydrogen and an alkyl group, m and n are integers and satisfy m + n ⁇ 4, m ⁇ 1, and n ⁇ 1, and when m is 2 or more, R1 is the same as each other. And when n is 2 or more, R2 may be the same or different from each other.
- the polymer layer contains a polymer formed by condensation of a hydrolyzable group of the compound (A) and polymerization of the compound (A) and two or more kinds of the compounds (B).
- the two or more compounds (B) include the following compound (B1) and compound (B2), The laminated semipermeable membrane according to any one of (1) to (3).
- the polymer layer has a thickness of 50 nm to 500 nm.
- the laminated semipermeable membrane according to any one of (1) to (6).
- Semi-permeable layer A microporous support layer, and a separation functional layer provided on the microporous support layer, The separation functional layer contains a polyamide formed by polycondensation of a polyfunctional amine and a polyfunctional acid halide.
- the laminated semipermeable membrane according to any one of (1) to (7).
- the film of the present invention comprises, on a semipermeable layer, a polymer formed by condensation of a hydrolyzable group possessed by the compound (A) and polymerization of the compound (A) and the compound (B).
- a high salt removal rate is realized by the semipermeable layer, and by preventing the contact between the heavy metal and the semipermeable layer by the polymer layer, high oxidation resistance is realized even in the presence of heavy metal. be able to.
- stable operation can be continued while exhibiting high salt removal performance even for raw water where oxidant remains due to sterilization treatment or the like.
- FIG. 1 is a cross-sectional view showing a schematic configuration of a laminated semipermeable membrane having an asymmetric semipermeable layer according to the first embodiment of the present invention.
- FIG. 2 is a cross-sectional view showing a schematic configuration of a laminated semipermeable membrane including a composite semipermeable layer according to the second embodiment of the present invention.
- FIGS. 1 and 2 show examples of the structure of the polymer laminated semipermeable membrane of the present invention.
- the polymer laminated semipermeable membrane (“11” in FIG. 1 and “12” in FIG. 2) was formed on the semipermeable layer (“21” in FIG. 1 and “23” in FIG. 2) and the semipermeable layer.
- a polymer layer (“22” in FIGS. 1 and 2).
- the laminated semipermeable membrane is a membrane having a function of removing ions from an aqueous solution.
- Specific examples of the “laminated semipermeable membrane” include an RO (Reverse Osmosis) film and an NF (Nanofiltration) film.
- the semipermeable layer is a layer substantially responsible for the ion removability of the polymer laminated semipermeable membrane. That is, the semipermeable layer alone has a function of removing ions from the aqueous solution, and can function as an RO membrane or an NF membrane.
- the semipermeable layer is roughly classified into an asymmetrical semipermeable layer (ie, an asymmetrical semipermeable membrane) and a composite semipermeable layer (ie, a composite semipermeable membrane).
- the laminated semipermeable membrane 11 shown in FIG. 1 includes an asymmetric semipermeable membrane 21 and a polymer layer 22 laminated thereon.
- the asymmetric semipermeable layer 21 is a semipermeable layer having a structure in which the hole diameter increases from the first surface to the second surface of the membrane.
- the vicinity of the dense membrane surface of the asymmetrical semipermeable layer 21 exhibits separation performance, and the inside having a large pore diameter plays a role of reducing water permeation resistance and maintaining water permeability and membrane strength.
- Examples of the material for the asymmetric type semipermeable layer include cellulose acetate, cellulose triacetate, and polyamide.
- the laminated semipermeable membrane 12 shown in FIG. 2 includes a composite semipermeable layer 23 and a polymer layer 22 laminated thereon.
- the composite semipermeable layer 23 includes a microporous support layer 51 and a separation functional layer 41 provided on the microporous support layer 51.
- microporous support layer provides strength to the composite semipermeable layer by supporting the separation functional layer.
- the separation functional layer is provided on at least one surface of the microporous support membrane.
- the separation functional layer 41 is provided on one side of the microporous support layer 51.
- the microporous support layer may be simply referred to as “support layer”.
- the pore diameter on the surface of the support layer 51 (the surface in contact with the separation function layer 41) is preferably in the range of 1 nm to 100 nm.
- a separation functional layer with sufficiently few defects on the surface can be formed.
- the obtained composite semipermeable layer has a high pure water permeation flux, and the structure can be maintained without the separation functional layer falling into the support membrane hole during the pressurizing operation.
- the pore diameter on the surface of the support layer 51 can be calculated from an electron micrograph.
- the surface of the support layer is photographed with an electron micrograph, the diameters of all the pores that can be observed are measured, and the pore diameter can be determined by arithmetic averaging.
- a circle having an area equal to the area of the pores can be obtained by an image processing apparatus or the like, and the equivalent circle diameter can be obtained by the method of setting the diameter of the pores.
- the pore diameter can be determined by differential scanning calorimetry (DSC) using the principle that water in minute pores has a lower melting point than ordinary water. The details are described in literature (Ishikiriyama et al., Journal of Colloid and Interface Science, Vol. 171, p103, Academic Press Incorporated (1995)).
- the thickness of the support layer 51 is preferably in the range of 1 ⁇ m to 5 mm, and more preferably in the range of 10 ⁇ m to 100 ⁇ m. If the thickness is small, the strength of the support layer tends to decrease, and as a result, the strength of the composite semipermeable layer tends to decrease. When the thickness is large, it becomes difficult to handle the support layer and the composite semipermeable layer obtained from the support layer when bent.
- the material constituting the support layer 51 is not particularly limited.
- Examples of the material constituting the support layer include polysulfone, polyethersulfone, polyamide, polyester, cellulose polymer, vinyl polymer, homopolymer and copolymer such as polyphenylene sulfide, polyphenylene sulfide sulfone, polyphenylene sulfone, and polyphenylene oxide.
- the support layer may contain only a single polymer among these polymers, or may contain a plurality of types of polymers.
- examples of the cellulose polymer include cellulose acetate and cellulose nitrate.
- Preferred examples of the vinyl polymer include polyethylene, polypropylene, polyvinyl chloride, polyacrylonitrile and the like.
- homopolymers and copolymers such as polysulfone, polyethersulfone, polyamide, polyester, cellulose acetate, cellulose nitrate, polyvinyl chloride, polyacrylonitrile, polyphenylene sulfide, and polyphenylene sulfide sulfone are preferable.
- polysulfone and polyethersulfone which have high chemical stability, mechanical strength, and thermal stability and are easy to mold, are particularly preferable.
- the support layer 51 preferably contains the polymer as a main component. Specifically, the proportion of these polymers in the support layer is preferably 80% by weight or more, more preferably 90% by weight or more, and still more preferably 95% by weight or more. Moreover, the support layer may be comprised only with these polymers.
- the separation function layer 41 has a function of separating ions from the aqueous solution. That is, the ion separation function of the semipermeable layer is realized by the separation function layer.
- the separation functional layer 41 can contain a polymer such as polyamide, cellulose acetate, or cellulose triacetate as a main component.
- the proportion of the polymer in the separation functional layer is preferably 80% by weight or more, more preferably 90% by weight or more, and still more preferably 95% by weight or more.
- the separation functional layer may be composed of only these polymers.
- the separation functional layer may be a layer formed of polyamide formed by interfacial polycondensation of a polyfunctional amine and a polyfunctional acid halide on the support layer 51, cellulose acetate, triacetic acid It may be a layer formed from cellulose, polyamide or the like by the non-solvent induced phase separation method.
- the polyamide layer formed by interfacial polycondensation of the above polyfunctional amine and polyfunctional acid halide will be described below.
- the polyfunctional amine is at least one component selected from an aliphatic polyfunctional amine and an aromatic polyfunctional amine.
- An aliphatic polyfunctional amine is an aliphatic amine having two or more amino groups in one molecule.
- the aliphatic polyfunctional amine is not limited to a specific compound, but examples thereof include piperazine-based amines and derivatives thereof.
- Examples of aliphatic polyfunctional amines include piperazine, 2,5-dimethylpiperazine, 2-methylpiperazine, 2,6-dimethylpiperazine, 2,3,5-trimethylpiperazine, 2,5-diethylpiperazine, 2,3, Exemplified is at least one compound selected from the group consisting of 5-triethylpiperazine, 2-n-propylpiperazine, and 2,5-di-n-butylpiperazine.
- piperazine and 2,5-dimethylpiperazine are particularly preferable.
- the aromatic polyfunctional amine is an aromatic amine having two or more amino groups in one molecule.
- the aromatic polyfunctional amine is not limited to a specific compound, but examples of the aliphatic polyfunctional amine include metaphenylene diamine, paraphenylene diamine, 1,3,5-triaminobenzene, and N-alkylated products thereof.
- aliphatic polyfunctional amines are metaphenylenediamine and 1,3,5-triaminobenzene because of their stable performance.
- the polyfunctional acid halide is an acid halide having two or more halogenated carbonyl groups in one molecule, and may be any one that generates a polyamide by reaction with the aromatic polyfunctional amine.
- the polyfunctional acid halide is not limited to a specific compound. Examples of the polyfunctional acid halide include oxalic acid, malonic acid, maleic acid, fumaric acid, glutaric acid, 1,3,5-cyclohexanetricarboxylic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid.
- Acid halides can be used.
- acid chlorides are preferable, and in particular, polyfunctional acid of 1,3,5-benzenetricarboxylic acid from the viewpoint of economy, availability, ease of handling, ease of reactivity, and the like.
- Trimesic acid chloride which is a halide is preferred.
- the said polyfunctional acid halide can also be used independently, you may use it as a mixture. Details of the interfacial polymerization will be described later.
- the composite semipermeable layer 23 may further include a substrate 61.
- the composite semipermeable layer can obtain high strength and dimensional stability.
- a laminate of the support layer and the substrate may be referred to as a “support film”.
- the reference numeral “31” is attached to the support film.
- Examples of the substrate 61 include cloth, nonwoven fabric, and paper.
- a fibrous base material is preferably used in terms of strength, unevenness forming ability and fluid permeability.
- the fibrous base material both a long fiber nonwoven fabric and a short fiber nonwoven fabric are preferably used.
- the long fiber nonwoven fabric has excellent film-forming properties, when the polymer polymer solution is cast, the solution penetrates due to excessive penetration, and the microporous support layer peels off from the substrate.
- the base material is made of a long-fiber non-woven fabric composed of thermoplastic continuous filaments, compared to a short-fiber non-woven fabric, thickness nonuniformity and film defects caused by fiber fluffing during casting of a polymer solution can be prevented. Can be suppressed. Furthermore, since the composite semipermeable layer is subjected to tension in the film forming direction when continuously formed, it is preferable to use a long fiber nonwoven fabric having excellent dimensional stability as a base material.
- the fibers in the surface layer on the side opposite to the support layer are preferably longitudinally oriented as compared with the fibers on the surface layer on the support layer side in terms of formability and strength. According to such a structure, the high effect which prevents a film tear etc. is implement
- the substrate is a long-fiber non-woven fabric when unevenness is imparted to the composite semipermeable layer by embossing or the like, the moldability of the laminate including the support layer and the substrate is also improved, and the surface of the composite semipermeable layer is uneven. It is preferable because the shape is stable.
- the thickness of the substrate is preferably 50 ⁇ m or more and 150 ⁇ m or less.
- the polymer layer contains a polymer formed by condensation of hydrolyzable groups of the compound (A) and polymerization of the compound (A) and the compound (B).
- the compound (A) is a silicon compound having a silicon atom, a reactive group having an ethylenically unsaturated group directly bonded to the silicon atom, and a hydrolyzable group directly bonded to the silicon atom.
- the compound (B) has one or more hydrophilic groups and one or more ethylenically unsaturated groups, and is a compound other than the compound (A).
- the compound (A) will be described.
- the reactive group having an ethylenically unsaturated group include a vinyl group, an allyl group, a methacryloxyethyl group, a methacryloxypropyl group, an acryloxyethyl group, an acryloxypropyl group, and a styryl group. From the viewpoint of polymerizability, a methacryloxypropyl group, an acryloxypropyl group, and a styryl group are preferable.
- the silicon compound (A) only needs to have at least one such reactive group. In addition, when the silicon compound (A) has a plurality of such reactive groups, one silicon compound (A) may have a plurality of types of reactive groups.
- hydrolyzable groups examples include alkoxy groups, alkenyloxy groups, carboxy groups, ketoxime groups, aminohydroxy groups, halogen atoms, and isocyanate groups.
- alkoxy group a C1-C10 thing is preferable, More preferably, it is a C1-C2 thing.
- the alkenyloxy group preferably has 2 to 10 carbon atoms, more preferably 2 to 4 carbon atoms, and further preferably 3 carbon atoms.
- the carboxy group those having 2 to 10 carbon atoms are preferable, and those having 2 carbon atoms, that is, an acetoxy group is preferable.
- the ketoxime group include a methyl ethyl ketoxime group, a dimethyl ketoxime group, and a diethyl ketoxime group.
- the aminohydroxy group is one in which an amino group is bonded to a silicon atom via an oxygen atom via oxygen. Examples of such include dimethylaminohydroxy group, diethylaminohydroxy group, methylethylaminohydroxy group and the like.
- the halogen atom a chlorine atom is preferably employed.
- an alkoxy group is particularly preferable. This is because a reaction liquid having a viscosity and pot life suitable for film formation can be realized by using an alkoxy group in forming the separation functional layer.
- the silicon compound (A) only needs to have at least one hydrolyzable group as described above.
- One silicon compound (A) may have a plurality of types of hydrolyzable groups.
- R1 represents a reactive group containing an ethylenically unsaturated group.
- R2 represents at least one group selected from the group consisting of an alkoxy group, an alkenyloxy group, a carboxy group, a ketoxime group, an isocyanate group, and a halogen atom.
- R3 represents at least one of hydrogen and an alkyl group, m and n are integers and satisfy m + n ⁇ 4, m ⁇ 1, and n ⁇ 1, and when m is 2 or more, R1 is the same as each other. And when n is 2 or more, R2 may be the same or different from each other.
- (4-mn) is 2 or more, R3 is the same as each other. Or different.
- R1 is a reactive group having an ethylenically unsaturated group directly bonded to a silicon atom.
- the details of the reactive group R1 are as described above.
- R2 is a hydrolyzable group directly bonded to the silicon atom.
- the details of the hydrolyzable group R2 are as described above.
- the number of carbon atoms of the alkyl group as R3 is preferably 1 or more and 10 or less, and more preferably 1 or 2.
- Examples of such a compound (A) include vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, allyltriethoxysilane, styryltrimethoxysilane, styryltriethoxysilane, styrylethyltrimethoxysilane, and styrylethyl.
- Triethoxysilane methacryloxypropylmethyldimethoxysilane, methacryloxypropyltrimethoxysilane, methacryloxypropylmethyldiethoxysilane, methacryloxypropyltriethoxysilane, acryloxymethyltrimethoxysilane, acryloxypropyltrimethoxysilane, (acryloxy Examples include methyl) phenethyltrimethoxysilane.
- the compound (B) When the compound (B) has a hydrophilic group, a polymer laminated semipermeable membrane having high water selective permeability and high salt rejection is realized.
- the compound (B) is preferably an organic compound. Further, the compound (B) includes a carboxyl group, a sulfonic acid group, a phosphonic acid group, a primary amino group, a secondary amino group, a tertiary amino group, a quaternary ammonium group, a heterocyclic group, and phosphorus. It is preferable to have at least one hydrophilic group selected from acid esters. In addition, the compound (B) may contain two or more hydrophilic groups, and among them, it is preferable to contain one or two hydrophilic groups.
- the compound (B) has an ethylenically unsaturated group having addition polymerizability.
- examples of the compound (B) having an ethylenically unsaturated group include ethylene, propylene or styrene derivatives; and methacrylic acid, acrylic acid, and derivatives thereof.
- Examples of the compound (B) having a carboxyl group include maleic acid, maleic anhydride, acrylic acid, methacrylic acid, 2- (hydroxymethyl) acrylic acid, 4- (meth) acryloyloxyethyl trimellitic acid and corresponding anhydrides, Examples thereof include 10-methacryloyloxydecylmalonic acid, N- (2-hydroxy-3-methacryloyloxypropyl) -N-phenylglycine, 4-vinylbenzoic acid, 3-phenylacrylic acid, and salts thereof.
- Examples of the compound (B) having a sulfonic acid group include vinyl sulfonic acid, allyl sulfonic acid, 3- (acryloyloxy) propane-1-sulfonic acid, 3- (methacryloyloxy) propane-1-sulfonic acid, and 4-methacrylamide.
- Examples of the compound (B) having a phosphonic acid group include vinylphosphonic acid, 4-vinylphenylphosphonic acid, 4-vinylbenzylphosphonic acid, 2-methacryloyloxyethylphosphonic acid, 2-methacrylamidoethylphosphonic acid, 4-methacrylamide -4-methyl-phenyl-phosphonic acid, 2- [4- (dihydroxyphosphoryl) -2-oxa-butyl] -acrylic acid and 2- [2-dihydroxyphosphoryl) -ethoxymethyl] -acrylic acid-2,4 Examples thereof include 6-trimethyl-phenyl ester and salts thereof.
- Examples of the compound (B) having a primary amino group, secondary amino group, tertiary amino group, quaternary ammonium group, or heterocyclic group include allylamine, N-methylallylamine, 4-aminostyrene, N , N-dimethylallylamine, 4-vinylbenzylamine, dimethylaminoethyl methacrylate, dimethylaminoethyl acrylate, dimethylaminomethyl methacrylate, dimethylaminomethyl acrylate, dimethylaminopropyl methacrylate, dimethylaminopropyl acrylate, dimethylaminobutyl methacrylate, dimethylaminobutyl Acrylate, diethylaminoethyl methacrylate, diethylaminoethyl acrylate, diethylaminopropyl methacrylate, diethylaminopropyl acrylate, diethylaminopropyl acrylate, diethyl alcohol
- Examples of the compound (B) having a phosphate ester include 2-methacryloyloxypropyl monohydrogen phosphate, 2-methacryloyloxypropyl dihydrogen phosphate, 2-methacryloyloxyethyl monohydrogen phosphate and 2-methacryloyloxyethyl dihydrogen phosphate.
- Acid 2-methacryloyloxyethyl-phenyl-hydrogen phosphoric acid, 10-methacryloyloxydecyl-dihydrogen phosphoric acid, phosphoric acid mono- (1-acryloyl-piperidin-4-yl) -ester, 6- (methacrylamide) hexyl
- Examples thereof include dihydrogen phosphate and salts thereof.
- the polymer formed by condensation of the hydrolyzable group of the silicon compound (A) and polymerization of the compound (A) and the compound (B) is condensed and polymerized.
- the polymer layer contains a polymer obtained by polymerizing the compound (A) and the compound (B) and crosslinked by a condensation reaction via the functional group of the compound (A).
- Such a polymer layer has oxidation resistance because the polymer layer itself has no reaction point with respect to the oxidation agent. Furthermore, the polymer layer has a hydrophilic structure, has good water permeability, and can form a dense structure capable of blocking salts such as heavy metals by a crosslinked structure.
- the polymer layer has sufficient water permeability, and the molecular structure of the semipermeable layer is the same as before laminating the polymer layer. And at least a separation performance equivalent to that of the semipermeable layer. Furthermore, when the polymer layer itself removes heavy metal, the semipermeable layer located in the lower layer becomes difficult to contact simultaneously with the heavy metal and the oxidizing agent. Therefore, deterioration of the semipermeable layer due to the oxidizing agent is suppressed, and as a result, a semipermeable membrane having oxidation resistance even in the presence of heavy metal can be provided.
- the polymer contained in the polymer layer may be formed of one kind of compound (A) and one kind of compound (B), or one kind of compound (A) and plural kinds (two or more kinds). It may be formed with the compound (B), may be formed with a plurality of (two or more) compounds (A) and one compound (B), or may be formed with two or more (two or more). ) Compound (A) and a plurality of (two or more) compounds (B).
- the part derived from the compound (A) and the compound (B) which are monomers that is, the part of each monomer excluding the functional group involved in the polymerization is referred to as “unit”, and before polymerization. It can also be distinguished from “compound”. That is, it can be said that the polymer contains a unit derived from at least one compound (A) and a unit derived from at least one compound (B).
- the plurality of types of compounds (B) When a plurality of types of compounds (B) constitute a polymer, the plurality of types of compounds (B) have one or more anionic groups and one or more ethylenically unsaturated groups. And a compound (B2) other than the compound (A) and the compound (B1) having one or more cationic groups and one or more ethylenically unsaturated groups. Good.
- the polymer can contain a unit derived from the compound (A), a unit derived from the compound (B1), and a unit derived from the compound (B2). .
- Compound (B1) having an anionic group realizes a polymer laminated semipermeable membrane having high water selective permeability and high salt rejection.
- the compound (B1) is preferably an organic compound.
- the compound (B1) preferably has at least one hydrophilic group selected from a carboxyl group, a sulfonic acid group, a phosphonic acid group, and a phosphate ester or a salt thereof as an anionic group.
- the compound (B1) can contain two or more anionic groups, and among them, it preferably contains 1 to 2 anionic groups.
- Compound (B1) has an ethylenically unsaturated group having addition polymerizability.
- Examples of the compound (B1) having an ethylenically unsaturated group include ethylene, propylene or styrene derivatives; and methacrylic acid, acrylic acid, and derivatives thereof.
- Examples of the compound (B1) having a carboxyl group include maleic acid, maleic anhydride, acrylic acid, methacrylic acid, 2- (hydroxymethyl) acrylic acid, 4- (meth) acryloyloxyethyl trimellitic acid and the corresponding anhydride, Examples thereof include 10-methacryloyloxydecylmalonic acid, N- (2-hydroxy-3-methacryloyloxypropyl) -N-phenylglycine, 4-vinylbenzoic acid, 3-phenylacrylic acid, and salts thereof.
- Examples of the compound (B1) having a sulfonic acid group include vinyl sulfonic acid, allyl sulfonic acid, 3- (acryloyloxy) propane-1-sulfonic acid, 3- (methacryloyloxy) propane-1-sulfonic acid, and 4-methacrylamide.
- Examples of the compound (B1) having a phosphonic acid group include vinylphosphonic acid, 4-vinylphenylphosphonic acid, 4-vinylbenzylphosphonic acid, 2-methacryloyloxyethylphosphonic acid, 2-methacrylamidoethylphosphonic acid, 4-methacrylamide.
- Examples thereof include 6-trimethyl-phenyl ester and salts thereof.
- Examples of the compound (B1) having a phosphate ester include 2-methacryloyloxypropyl monohydrogen phosphate, 2-methacryloyloxypropyl dihydrogen phosphate, 2-methacryloyloxyethyl monohydrogen phosphate and 2-methacryloyloxyethyl dihydrogen phosphate.
- Acid 2-methacryloyloxyethyl-phenyl-hydrogen phosphoric acid, 10-methacryloyloxydecyl-dihydrogen phosphoric acid, phosphoric acid mono- (1-acryloyl-piperidin-4-yl) -ester, 6- (methacrylamide) hexyl
- Examples thereof include dihydrogen phosphate and salts thereof.
- the compound (B2) When the compound (B2) has a cationic group, a laminated semipermeable membrane capable of removing heavy metals is realized.
- the compound (B2) is preferably an organic compound.
- a compound (B2) has an ammonium salt or an imidazolium salt as a cationic group.
- a compound (B2) having an ammonium salt [2- (methacryloyloxy) ethyl] dimethyl- (3-sulfopropyl) ammonium hydroxide is an example of a compound (B2) having an imidazolium salt. -Imidazolium chloride is exemplified respectively.
- the compound (B2) can contain two or more cationic groups, and among them, it preferably contains 1 to 2 cationic groups.
- Compound (B2) has an ethylenically unsaturated group having addition polymerizability.
- Examples of the compound (B2) having an ethylenically unsaturated group include ethylene, propylene or styrene derivatives; and methacrylic acid, acrylic acid, and derivatives thereof.
- Examples of the compound (B1) having an ammonium salt or an imidazolium salt include allylamine, N-methylallylamine, 4-aminostyrene, N, N-dimethylallylamine, 4-vinylbenzylamine, dimethylaminoethyl methacrylate, dimethylamino.
- the polymer layer has a cationic group at the same time as the anionic group, so that the charge on the membrane surface is reduced. There is an advantage that it is neutralized and heavy metals are prevented from adhering to the film surface.
- the thickness of the polymer layer formed on the semipermeable layer can be confirmed from a cross-sectional photograph by a scanning electron microscope.
- the thickness of the polymer layer is preferably 50 nm or more, and more preferably 100 nm or more.
- the upper limit is not particularly important as long as the water permeability of the polymer laminated semipermeable membrane is ensured, but it is usually preferably 1000 nm or less, more preferably 500 nm or less. It is.
- the polymer layer is made thin in this range, the separation performance can be exhibited without greatly impairing the water permeability of the semipermeable layer, and the surface of the semipermeable layer can be coated without any defects to impart oxidation resistance.
- the chemical structure of the polymer layer formed on the semipermeable layer can be determined by nuclear magnetic resonance spectroscopy (NMR). It can be determined by assigning a signal obtained by solution NMR of the polymer or solid NMR measurement of the film and calculating the copolymerization ratio of the compounds (A) and (B) from the signal area. When the compound (B) contains the compounds (B1) and (B2), these ratios can also be calculated.
- NMR nuclear magnetic resonance spectroscopy
- the copolymerization ratio of the compound (B1) and the compound (B2) is preferably in the range of 45: 5 to 5:45.
- the copolymerization ratio of the compound (B1) having an anionic group and the compound (B2) having a cationic group is within this range, the surface potential of the film becomes neutral or close to neutral. As a result, heavy metal adhesion to the laminated semipermeable membrane can be suppressed.
- the copolymerization ratio can be adjusted by selecting a monomer based on the Q value and the e value, or by changing the monomer concentration in the reaction solution during polymerization, the reaction time in polymerization, and the like.
- the Q and e values (Q 2 and e 2 ) of the copolymerization reactivity ratios r 1 , r 2 and the monomer M 2 were measured by T.C. Alfredy and C.I. C. By applying the formulas ( ⁇ ) and ( ⁇ ) submitted by Price, the Q value (Q 1 ) and e value (e 1 ) of the monomer M 1 can be derived.
- r 1 (Q 1 / Q 2 ) exp [ ⁇ e 1 (e 1 ⁇ e 2 )]
- r 2 (Q 2 / Q 1 ) exp [ ⁇ e 2 (e 2 ⁇ e 1 )]
- the copolymerization reactivity ratio can be derived based on these values, and the copolymer composition can be predicted based on these values.
- the copolymer composition can be random, block, alternating, etc., but the monomer having the Q value and e value to give a suitable copolymer composition ratio can be freely selected according to the desired copolymer composition. can do.
- the copolymer of the compounds (A) and (B) in the present invention may be a random copolymer, an alternating copolymer, or a block copolymer, and may have a structure other than a linear shape such as a star shape or a comb shape. It may be a cross-linked structure.
- the monomer charging rate may be controlled in order to obtain a desired monomer introduction rate.
- the polymer laminated semipermeable membrane described above can be produced by a production method having a step of forming a polymer layer on the semipermeable layer.
- the step of forming the polymer layer on the semipermeable layer is selected from any of the following (a) to (c).
- a step of dissolving the compound (A) and the compound (B) in a solvent, and a solution of the polymer by polymerizing the compound (A) and the compound (B) in the solvent via an ethylenically unsaturated group A step of bringing the polymer solution into contact with the semipermeable layer, and a polymer of the compound (A) and the compound (B) via the hydrolyzable group of the compound (A) on the semipermeable layer.
- (B) a step of dissolving the compound (A) in a solvent, a step of condensing the hydrolyzable group of the compound (A) in a solvent to obtain a solution of the condensate, and a compound ( A step of bringing the solution obtained by adding B) into contact with the semipermeable layer, and a step of polymerizing the condensate of the compound (A) and the compound (B) via the ethylenically unsaturated group on the semipermeable layer.
- (C) A step of obtaining a solution of the mixture by dissolving the compound (A) and the compound (B) in a solvent, a step of bringing the solution of the mixture into contact with the semipermeable layer, A step comprising polymerizing the compound (A) and the compound (B) via a saturated group, and a step comprising condensing the compound (A) via a hydrolyzable group on the semipermeable layer.
- the polymerization step or the condensation step may be performed first or in parallel.
- the steps (a) to (c) for forming the polymer layer will be described more specifically.
- the solvent does not destroy the support layer, and the compounds (A) and (B), and a polymerization added as necessary
- the initiator is not particularly limited as long as it dissolves the initiator.
- a solvent is preferably water, an alcohol-based organic solvent, an ether-based organic solvent, a ketone-based organic solvent, or a mixture thereof. If necessary, the dissolution of the material of the support layer can be promoted by adding an acid or an alkali to the solvent.
- an alcohol organic solvent methanol, ethoxymethanol, ethanol, propanol, butanol, amyl alcohol, cyclohexanol, methylcyclohexanol, ethylene glycol monomethyl ether (2-methoxyethanol), ethylene glycol monoacetate, diethylene glycol monomethyl ether
- examples include diethylene glycol monoacetate, propylene glycol monoethyl ether, propylene glycol monoacetate, dipropylene glycol monoethyl ether, and methoxybutanol.
- examples of the ether organic solvent include diethyl ether, dipropyl ether, dibutyl ether, diamyl ether, diethyl acetal, dihexyl ether, dimethoxymethane, dimethoxyethane, trioxane, dioxane and the like.
- ketone organic solvents acetone, methyl ethyl ketone, methyl propyl ketone, methyl isobutyl ketone, methyl amyl ketone, methyl cyclohexyl ketone, diethyl ketone, ethyl butyl ketone, trimethylnonanone, acetonitrile acetone, dimethyl oxide, phorone, cyclohexanone, di Acetone alcohol etc. are mentioned.
- the step of polymerizing the compound (A) and the compound (B) in the solvent via the ethylenically unsaturated group can be performed by, for example, heat treatment, electromagnetic wave irradiation, electron beam irradiation, plasma irradiation or the like.
- the electromagnetic wave includes ultraviolet rays, X-rays, ⁇ rays and the like.
- the polymerization method may be appropriately selected according to reactivity, running cost, productivity, and the like.
- electromagnetic waves ultraviolet irradiation is preferable from the viewpoint of simplicity. When the polymerization is actually performed using ultraviolet rays, these light sources need not selectively generate only light in the ultraviolet wavelength region, but may be any material that contains electromagnetic waves in the ultraviolet wavelength region. From the viewpoints of shortening the polymerization time and ease of controlling the polymerization conditions, it is preferable that the intensity of these ultraviolet rays is higher than electromagnetic waves in other wavelength regions.
- Electromagnetic waves can be generated from, for example, halogen lamps, xenon lamps, UV lamps, excimer lamps, metal halide lamps, rare gas fluorescent lamps, mercury lamps, and the like.
- ultraviolet rays can be generated by a low-pressure mercury lamp, an excimer laser lamp, or the like.
- the polymerization initiator and the polymerization accelerator are not particularly limited, and are appropriately selected according to the structure of the compound to be used, the polymerization technique, and the like.
- the polymerization initiator is exemplified below.
- an initiator for polymerization by electromagnetic waves benzoin ether, dialkylbenzyl ketal, dialkoxyacetophenone, acylphosphine oxide or bisacylphosphine oxide, ⁇ -diketone (eg, 9,10-phenanthrenequinone), diacetylquinone, furylquinone, anisylquinone, Examples include 4,4′-dichlorobenzylquinone and 4,4′-dialkoxybenzylquinone, and camphorquinone.
- Initiators for thermal polymerization include azo compounds (eg, 2,2′-azobis (isobutyronitrile) (AIBN) or azobis- (4-cyanovaleric acid), or peroxides (eg, dibenzoyl peroxide).
- azo compounds eg, 2,2′-azobis (isobutyronitrile) (AIBN) or azobis- (4-cyanovaleric acid
- peroxides eg, dibenzoyl peroxide
- Peroxides and ⁇ -diketones are preferably used in combination with aromatic amines to accelerate the initiation of polymerization.
- This combination is also called a redox system.
- examples of such systems are benzoyl peroxide or camphorquinone and amines (eg N, N-dimethyl-p-toluidine, N, N-dihydroxyethyl-p-toluidine, ethyl p-dimethyl-aminobenzoate). Ester or a derivative thereof).
- a system containing a peroxide in combination with ascorbic acid, barbiturate or sulfinic acid as a reducing agent is also preferable in order to accelerate the initiation of polymerization.
- This step can also be expressed as a step of forming the solution layer on the semipermeable layer.
- the solution is coated on the semipermeable layer using a coating device such as a spin coater, a wire bar, a flow coater, a die coater, a roll coater, or a spray. How to do.
- the thickness of the polymer layer formed later can be adjusted by the thickness of the solution layer on the semipermeable layer, the contact time between the semipermeable layer and the solution, the weight percentage of the solid content in the solution, and the like. .
- the step of condensing the hydrolyzable group of the compound (A) is performed by heat treatment.
- the heating temperature at this time is preferably preferably 20 ° C. or higher, more preferably 40 ° C. or higher, so that the condensation reaction proceeds rapidly.
- the condensation reaction temperature needs to be lower than the temperature at which the support layer melts in the semipermeable layer, and is preferably 150 ° C. or less, more preferably 120 ° C. or less.
- the reaction temperature is 20 ° C. or higher, the hydrolysis and condensation reaction proceeds rapidly, and if it is 150 ° C. or lower, the hydrolysis and condensation reaction are easily controlled. Further, by adding a catalyst that promotes hydrolysis or condensation, the reaction can proceed even at a lower temperature. Further, in the present invention, the heating condition and the humidity condition are selected so that the polymer layer has pores so that the condensation reaction is appropriately performed.
- the content of the compound (A) in the reaction solution is preferably 10 parts by weight or more, more preferably 20 parts by weight to 50 parts by weight with respect to 100 parts by weight of the solid content contained in the reaction solution.
- the solid content contained in the reaction solution is the final content of the polymer laminated semipermeable membrane obtained by the production method of the present invention, excluding the solvent and the distilling component among all the components contained in the reaction solution. In particular, it refers to a component included as a polymer layer.
- the resulting polymer layer has a sufficient degree of cross-linking, and membrane filtration can be performed stably without the polymer layer eluting.
- the reaction solution contains a plurality of types of compounds (A), the total content only needs to satisfy the above range.
- the content of the compound (B) in the reaction solution is preferably 90 parts by weight or less, more preferably 5 to 80 parts by weight with respect to 100 parts by weight of the solid content contained in the reaction solution.
- the reaction solution contains a plurality of types of compounds (B)
- the total content may satisfy the above-mentioned range.
- step (b) the step of dissolving the compound (A) in the solvent is performed in the same manner as the step of dissolving the compound (A) and the compound (B) in the solvent in the above step (a).
- step (b) the step of condensing the hydrolyzable group possessed by the compound (A) in a solvent is the same as the step of condensing the hydrolyzable group possessed by the compound (A) in the aforementioned step (a). Done.
- the step of bringing the condensate of the compound (A) and the compound (B) into contact with the semipermeable layer is the same as the step of bringing the solution into contact with the semipermeable layer in the above step (a).
- the step of polymerizing the mixture of the condensate of the compound (A) and the compound (B) via the ethylenically unsaturated group on the semipermeable layer is the same as the step (a) described above. This is carried out in the same manner as in the step of polymerizing compound (A) and compound (B) in a solvent via a saturated group.
- step (c) the step of dissolving the compound (A) and the compound (B) in the solvent is performed in the same manner as the step of dissolving the compound (A) and the compound (B) in the solvent in the step (a) described above. Is called.
- the step of bringing the mixed solution of the compound (A) and the compound (B) into contact with the semipermeable layer is performed in the same manner as the step of bringing the solution into contact with the semipermeable layer in the aforementioned step (a).
- step (c) the step of polymerizing the compound (A) and the compound (B) via the ethylenically unsaturated group on the semipermeable layer is performed via the ethylenically unsaturated group in the step (a) described above. This is carried out in the same manner as the step of polymerizing the compound (A) and the compound (B) in a solvent.
- step (c) the step of condensing the compound (A) via the hydrolyzable group on the semipermeable layer is performed by condensing the hydrolyzable group of the compound (A) in the step (a). It is performed in the same manner as the step of causing the
- the polymer laminated semipermeable membrane thus obtained can be used as it is, but it is preferable to hydrophilize the surface of the membrane with, for example, an alcohol-containing aqueous solution or an alkaline aqueous solution before use.
- the method for producing a polymer laminated semipermeable membrane may include a step of forming a semipermeable layer.
- Asymmetrical semipermeable layer is prepared by, for example, dissolving a polymer as a membrane material in a solvent, casting the obtained polymer solution onto a glass plate, etc.
- a membrane production method is generally called non-solvent-induced phase separation method (detailed in Japanese Membrane Society, Membrane Experiment Series Artificial Membrane, Kyoritsu Shuppan (1993)). Is listed).
- cellulose acetate, cellulose triacetate, polyamide or the like is used as a membrane material, and acetone, dimethylformamide, dioxane, N-methyl-2-pyrrolidone or the like is used as a solvent. It is done.
- the composite semipermeable layer From the reason of supporting the membrane, preventing clogging, and ensuring water permeability, it is preferable to laminate a finer layer in order on a coarser layer. Therefore, the composite semipermeable layer is preferably formed in the order of providing a support layer on the substrate and further providing a separation functional layer on the support layer.
- the base material is as described above.
- the support layer is composed of the above-mentioned materials, “Office of Saleen Water Research and Development Progress Report” No. 359 (1968) and can be produced by molding on the above-mentioned substrate.
- the support layer casts a polysulfone N, N-dimethylformamide solution on a densely woven polyester or nonwoven fabric to a constant thickness, which is 0.5% by weight sodium dodecyl sulfate, It is formed by wet coagulation in an aqueous solution containing 2% by weight of DMF.
- the step of forming the separation functional layer may include forming a polyamide by interfacial polycondensation of a polyfunctional amine and a polyfunctional acid halide on the support layer. It may include forming by a phase separation method.
- Interfacial polycondensation uses, for example, an aqueous solution containing the aforementioned polyfunctional amine and an organic solvent solution that contains the aforementioned polyfunctional acid halide and is immiscible with water, and this aqueous solution and the organic solvent solution are placed on the support layer. It is performed by contacting with.
- the kind of polyfunctional amine is as already explained.
- the concentration of the polyfunctional amine in the aqueous solution containing the polyfunctional amine is preferably 0.1 to 20% by weight, more preferably 0.5 to 15% by weight.
- the kind of polyfunctional acid halide is as already described.
- the organic solvent that dissolves the polyfunctional acid halide is preferably immiscible with water and does not destroy the support layer, and any organic solvent that does not inhibit the formation reaction of the crosslinked polyamide.
- Typical examples include liquid hydrocarbons, halogenated hydrocarbons such as trichlorotrifluoroethane, etc., but they are substances that do not destroy the ozone layer, are easily available, are easy to handle, In consideration of safety, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, heptadecane, hexadecane, and the like, and simple substances such as cyclooctane, ethylcyclohexane, 1-octene, 1-decene, or a mixture thereof are preferably used.
- the concentration of the polyfunctional acid halide in the organic solvent solution is preferably in the range of 0.01 to 10% by weight, and more preferably in the range of 0.02 to 2.0% by weight. Within this range, a sufficient reaction rate can be obtained, and the occurrence of side reactions can be suppressed. Further, it is more preferable that an acylation catalyst such as N, N-dimethylformamide is contained in this organic solvent solution because interfacial polycondensation is promoted.
- an acylation catalyst In the case of an aqueous solution containing a polyfunctional amine or an organic solvent solution containing a polyfunctional acid halide, an acylation catalyst, a polar solvent, an acid scavenger may be used as long as it does not interfere with the reaction between the two components.
- compounds such as surfactants and antioxidants may be contained.
- the excess aqueous solution is sufficiently drained so that no droplets remain on the membrane.
- a method for draining liquid for example, there is a method in which the film surface is allowed to flow naturally while being held in a vertical direction.
- a method of draining for example, as described in Japanese Patent Application Laid-Open No.
- the organic solvent solution containing the polyfunctional acid halide is applied to the support layer containing the polyfunctional amine, and a separation functional layer of the crosslinked polyamide is formed by interfacial polycondensation.
- interfacial polycondensation is performed by contacting an organic solvent solution of a polyfunctional acid halide to form a separation functional layer containing a crosslinked polyamide on the support layer, excess solvent may be drained.
- a method for draining for example, a method in which a film is held in a vertical direction and excess organic solvent is allowed to flow down and removed can be used.
- the time for gripping in the vertical direction is preferably between 10 seconds and 5 minutes, and more preferably between 30 seconds and 3 minutes. If it is too short, the separation functional layer will not be completely formed, and if it is too long, the organic solvent will be overdried and defects will easily occur and performance will be deteriorated.
- the composite semipermeable membrane obtained by the above method is subjected to a hydrothermal treatment step in the range of 40 to 150 ° C., preferably in the range of 40 to 130 ° C. for 1 to 10 minutes, more preferably 2 to 8 minutes.
- a hydrothermal treatment step in the range of 40 to 150 ° C., preferably in the range of 40 to 130 ° C. for 1 to 10 minutes, more preferably 2 to 8 minutes.
- the support film thus obtained is immersed in a 2.5% by weight aqueous solution of metaphenylenediamine for 1 minute, the support film is slowly pulled up in the vertical direction, and nitrogen is blown from an air nozzle to remove excess from the surface of the support film.
- an n-decane solution containing 0.08% by weight of trimesic acid chloride was applied so that the surface was completely wetted and allowed to stand for 30 seconds.
- the membrane was vertically held for 1 minute to drain the solution, and n-decane on the membrane surface was removed with a blower at room temperature. Thereafter, it was washed with hot water at 90 ° C. for 2 minutes to obtain a semipermeable membrane.
- Comparative Example 2 Cellulose Acetate Semipermeable Membrane Toray SC-3000 membrane, which is an asymmetric semipermeable membrane made of cellulose acetate, was used as the membrane of Comparative Example 2.
- the solution thus obtained was irradiated with 365 nm ultraviolet rays by a UV irradiation apparatus to obtain a polymer solution for forming a polymer layer.
- the irradiation intensity of the UV irradiation apparatus was set so that the value measured by the UV integrating light meter was 40 mW / cm 2 .
- the semipermeable membrane on which the polymer solution layer is formed is held in a hot air dryer at 120 ° C. for 5 minutes to condense the silicon compound in which the hydrolyzable group is directly bonded to the silicon atom.
- a membrane was obtained.
- the thickness of the polymer layer of the polymer laminated semipermeable membrane was calculated by observing a cross section of a sample obtained by vacuum drying the membrane piece with a scanning electron microscope and averaging the thicknesses of 10 representative portions.
- Example 7 Polymer laminated semipermeable membrane The same as Example 1 except that the reverse osmosis membrane made of cellulose acetate of Comparative Example 2 was used instead of the polyamide semipermeable membrane, and the rotation speed of the spin coater was changed. By performing the operation, a polymer laminated semipermeable membrane was obtained.
- Example 11 Polymer laminated semipermeable membrane The same operation as in Example 1 was conducted except that 1-allyl-3-sulfopropylimidazolium chloride was used as compound (B) and the rotation speed of the spin coater was changed. By performing, a polymer laminated semipermeable membrane was obtained.
- Example 12 Polymer laminated semipermeable membrane A polymer laminated semipermeable membrane was obtained by performing the same operation as in Example 11 except that 1-vinyl-3-sulfopropylimidazolium chloride was used as the compound (B). Got.
- Example 13 3-Acryloxypropyltrimethoxysilane was dissolved in water at a concentration of 100 mM, sodium 4-vinylphenylsulfonate 100 mM, and a photopolymerization initiator 2,2-dimethoxy-2-phenylacetophenone at a concentration of 10 mM.
- the polymer laminated semipermeable membrane was obtained by performing the same operation as Example 11 as ultraviolet irradiation to this solution and a subsequent process.
- Example 14 100 mM 3-acryloxypropyltrimethoxysilane, 100 mM [2- (methacryloyloxy) ethyl] dimethyl- (3-sulfopropyl) ammonium hydroxide, 10 mM photoinitiator 2,2-dimethoxy-2-phenylacetophenone was dissolved in water at a concentration of The polymer laminated semipermeable membrane was obtained by performing the same operation as Example 11 as ultraviolet irradiation to this solution and a subsequent process.
- Example 15 In Examples 15 to 24, a polymer layer having both an anionic group and a cationic group was formed on a polyamide semipermeable membrane.
- 3-acryloxypropyltrimethoxysilane corresponding to the compound (A) is 100 mM
- sodium 4-vinylphenylsulfonate corresponding to the compound (B1) is 80 mM
- the compound (B2) is [2 -(Methacryloyloxy) ethyl] dimethyl- (3-sulfopropyl) ammonium hydroxide was dissolved in water at a concentration of 20 mM and the photopolymerization initiator 2,2-dimethoxy-2-phenylacetophenone was dissolved in water at a concentration of 10 mM.
- Example 2 ultraviolet rays were irradiated in the same manner as in Example 1 to obtain a polymer solution.
- a polymer layer was formed on the polyamide semipermeable membrane in the same manner as in Example 1.
- the rotation speed of the spin coater was adjusted, and the thickness of the completed polymer layer was 300 nm.
- Table 1 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test.
- Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 16 Except that the sodium 4-vinylphenylsulfonate corresponding to the compound (B1) is 60 mM, and [2- (methacryloyloxy) ethyl] dimethyl- (3-sulfopropyl) ammonium hydroxide corresponding to the compound (B2) is 40 mM. This is the same as in Example 15.
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test. Furthermore, Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 17 Except for 50 mM sodium 4-vinylphenylsulfonate corresponding to compound (B1) and 50 mM [2- (methacryloyloxy) ethyl] dimethyl- (3-sulfopropyl) ammonium hydroxide corresponding to compound (B2) This is the same as in Example 15.
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test. Furthermore, Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 15 is the same as Example 15 except that sodium acrylate was used as the compound (B1).
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test.
- Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 16 is the same as Example 16 except that sodium acrylate is used as the compound (B1).
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test.
- Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 17 is the same as Example 17 except that sodium acrylate is used as the compound (B1).
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test.
- Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 21 The same as Example 17 except that 1-allyl-3-methylimidazolium chloride was used as the compound (B2).
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test.
- Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 21 is the same as Example 21 except that sodium acrylate was used as the compound (B1) and the charging ratio of the compounds (A), (B1), and (B2) was changed.
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test.
- Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 1 is the same as Example 22 except that 1-vinylimidazole was used as the compound (B2) and the charging ratios of the compounds (A), (B1), and (B2) were changed.
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test.
- Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Example 23 is the same as Example 23 except that sodium acrylate was used as the compound (B1) and the charging ratio of the compounds (A), (B1), and (B2) was changed.
- the thickness of the polymer layer of the obtained polymer laminated semipermeable membrane was 300 nm.
- Table 2 shows the initial performance of the polymer laminated semipermeable membrane thus obtained and the performance after the chlorine resistance test.
- Table 3 shows preparation ratios of the compounds (A), (B1), and (B2).
- Comparative Example 3 Semipermeable membrane with polymer layer formed directly on support layer Example 15 except that the polymer layer was formed on a microporous support membrane rather than on a polyamide semipermeable membrane A film was prepared by the same operation as in the above. The thickness of the polymer layer was 300 nm. Table 2 shows the initial performance and the performance after the chlorine resistance test of the semipermeable membrane thus obtained.
- Desalination rate (%) 100 ⁇ ⁇ 1- (Salt concentration in permeated water / Salt concentration in feed water) ⁇ Moreover, the membrane permeation flux (m 3 / m 2 / day) was determined from the amount of water per day (cubic meter) per square meter of membrane obtained under the above conditions.
- the polymer laminated semipermeable membrane shown in Example 1-14 has a desalination rate equal to or higher than that of the semipermeable membranes of Comparative Examples 1 and 2, and has a small salt permeability change ratio. It can be seen that the salt-removing performance of the semipermeable membrane is maintained and that it has oxidation resistance even in the presence of heavy metals.
- the polymer laminated semipermeable membranes shown in Examples 15 to 24 have a desalination rate equal to or higher than that of the semipermeable membrane of Comparative Example 1 and a small salt permeability change ratio. It can be seen that the film has salt-removing performance and has oxidation resistance even in the presence of heavy metals.
- Example 15 the polymer layer of Comparative Example 3 was formed on the polyamide semipermeable membrane of Reference Example 3, and the salt removal rate of this polymer laminated semipermeable membrane after the chlorine resistance test was 99.17. %, And a salt removal rate higher than that in the case of the above superposition is exhibited. From this, it can be seen that by suppressing the contact between the heavy metal and the polyamide, the oxidation resistance was exhibited in the presence of the heavy metal.
- the composite semipermeable membrane of the present invention includes solid-liquid separation, liquid separation, filtration, purification, concentration, sludge treatment, seawater desalination, drinking water production, pure water production, waste water reuse, waste water volume reduction, valuable material recovery, etc. Available in the field of water treatment.
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Abstract
Description
また、非特許文献1には、ポリアミドの酸化が、酸化剤と極微量の重金属とが共存することで著しく促進されることが記載されている。水処理膜の使用においては処理する原水中に多くのケースで重金属が含まれるため、実用上、耐酸化剤性を有するためには酸化剤と重金属とが共存することが多い。
(1)半透層と、前記半透層上に形成されたポリマー層とを備え、
前記ポリマー層は、下記化合物(A)の有する加水分解性基の縮合と、前記化合物(A)と下記化合物(B)との重合とにより形成される重合物を含有する、
積層半透膜。
(A)ケイ素原子と、前記ケイ素原子に直接結合したエチレン性不飽和基を有する反応性基と、前記ケイ素原子に直接結合した加水分解性基と、を有するケイ素化合物
(B)親水性基とエチレン性不飽和基とを有する、前記化合物(A)以外の化合物
(2)前記化合物(B)の親水性基はカルボキシル基、スルホン酸基、及びホスホン酸基のうちから選ばれる少なくとも1種の官能基である、
前記(1)に記載の積層半透膜。
(3)前記化合物(A)が下記一般式(a)で表される、
前記(1)又は(2)に記載の積層半透膜。
Si(R1)m(R2)n(R3)4-m-n ・・・(a)
(R1はエチレン性不飽和基を含む反応性基を示す。R2はアルコキシ基、アルケニルオキシ基、カルボキシ基、ケトオキシム基、イソシアネート基及びハロゲン原子からなる群より選択される少なくとも1種の基を表す。R3は水素及びアルキル基の少なくとも一方を表す。m、nは整数であり、m+n≦4、m≧1、及びn≧1を満たす。mが2以上である場合、R1は互いに同一であっても異なっていてもよく、nが2以上である場合、R2は互いに同一であっても異なっていてもよく,(4-m―n)が2以上である場合、R3は互いに同一であっても異なっていてもよい。)
(4)前記ポリマー層は、前記化合物(A)の有する加水分解性基の縮合、及び前記化合物(A)と2種以上の前記化合物(B)との重合により形成される重合物を含有し、
前記2種以上の化合物(B)は、下記化合物(B1)及び化合物(B2)を含む、
前記(1)~(3)のいずれか1に記載の積層半透膜。
(B1)1個以上のアニオン性基と1個以上のエチレン性不飽和基とを有する、前記化合物(A)以外の化合物
(B2)1個以上のカチオン性基と1個以上のエチレン性不飽和基とを有する、前記化合物(A)及び前記化合物(B1)以外の化合物
(5)前記化合物(B1)のアニオン性基がカルボキシル基、スルホン酸基、及びホスホン酸基のうちから選ばれる少なくとも1種の官能基である、
前記(4)に記載の積層半透膜。
(6)前記化合物(B2)のカチオン性基がアンモニウム塩、及びイミダゾリウム塩のうちから選ばれる少なくとも1種の官能基である、
前記(4)又は(5)に記載の積層半透膜。
(7)前記ポリマー層の厚さが50nm以上500nm以下である、
前記(1)~(6)のいずれか1に記載の積層半透膜。
(8)半透層は、
微多孔性支持層と、前記微多孔性支持層上に設けられた分離機能層とを備え、
前記分離機能層は、多官能アミンと多官能酸ハロゲン化物とを重縮合させることで形成されたポリアミドを含有する、
前記(1)~(7)のいずれか1に記載の積層半透膜。
図1及び図2に、本発明のポリマー積層半透膜の構造の例を示す。ポリマー積層半透膜(図1の“11”及び図2の“12”)は、半透層(図1の“21”,図2の“23”)と、半透層上に形成されたポリマー層(図1,図2の“22”)とを備える。
積層半透膜は、水溶液からイオンを除去する機能を有する膜である。「積層半透膜」として、具体的には、RO(Reverse Osmosis)膜及びNF(Nanofiltration)膜が挙げられる。
本書において、半透層とは、ポリマー積層半透膜のイオン除去性を実質的に担う層である。つまり、半透層は、それ単独で水溶液からイオンを除去する機能を有し、RO膜又はNF膜として機能し得る。半透層は、非対称型半透層(つまり非対称型半透膜)と複合半透層(つまり複合半透膜)とに大別される。
図1に示す積層半透膜11は、非対称型半透膜21と、それに積層されたポリマー層22とを備える。非対称型半透層21は、膜の第1面から第2面にかけて、孔径が大きくなっていく構造を持つ半透層である。非対称型半透層21の緻密な膜表面付近が分離性能を発揮するとともに孔径の大きな内部が水の透過抵抗を小さくして透水性と膜強度を保持する役割を果たしている。
非対称型半透層の素材としては、酢酸セルロース、三酢酸セルロース、ポリアミド等が挙げられる。
図2に示す積層半透膜12は、複合半透層23と、それに積層されたポリマー層22とを備える。複合半透層23は、微多孔性支持層51と、上記微多孔性支持層51上に設けられる分離機能層41と、を備える。
微多孔性支持層は、分離機能層を支持することで、複合半透層に強度を与える。分離機能層は微多孔性支持膜の少なくとも片面に設けられる。図2では、微多孔性支持層51の片側に分離機能層41が設けられている。以下、微多孔性支持層を単に「支持層」と称することがある。
分離機能層41は、水溶液からイオンを分離する機能を有する。つまり、半透層のイオン分離機能は、分離機能層によって実現される。
分離機能層41は、ポリアミド、酢酸セルロース又は三酢酸セルロースなどのポリマーを主成分として含有することができる。分離機能層において上記ポリマーが占める割合は、好ましくは80重量%以上、より好ましくは90重量%以上、さらに好ましくは95重量%以上である。また、分離機能層は、これらのポリマーのみで構成されていてもよい。例えば、分離機能層は、支持層51上で多官能アミンと多官能酸ハロゲン化物とを界面重縮合させることで形成されるポリアミドで形成された層であってもよいし、酢酸セルロース、三酢酸セルロース、ポリアミド等から前記非溶媒誘起相分離法によって形成される層であってもよい。
多官能アミンは、脂肪族多官能アミンと芳香族多官能アミンとから選ばれる少なくとも1つの成分である。
界面重合の詳細については、後述する。
図2に示すように、複合半透層23はさらに基材61を有してもよい。基材61を備えることで、複合半透層は、高い強度及び寸法安定性を得ることができる。支持層と基材との積層物を「支持膜」と称することがある。図2では、支持膜に符号“31”を付す。
基材61としては、強度、凹凸形成能及び流体透過性の点で繊維状基材が好ましく用いられる。繊維状基材としては、長繊維不織布及び短繊維不織布のいずれも好ましく用いられる。特に、長繊維不織布は、優れた製膜性を有するので、高分子重合体の溶液を流延した際にその溶液が過浸透により裏抜けすること、微多孔性支持層が基材から剥離すること、基材の毛羽立ち等により複合半透層の厚みが不均一化すること、及びピンホール等の欠点が生じることを抑制できる。
基材の厚みは、50μm以上150μm以下であることが好ましい。
ポリマー層は、化合物(A)の有する加水分解性基の縮合と、化合物(A)と化合物(B)との重合とにより形成される重合物とを含有する。
化合物(A)はケイ素原子と、前記ケイ素原子に直接結合したエチレン性不飽和基を有する反応性基と、前記ケイ素原子に直接結合した加水分解性基と、を有するケイ素化合物である。化合物(B)は、1個以上の親水性基と1個以上のエチレン性不飽和基を有し、かつ前記化合物(A)以外の化合物である。
エチレン性不飽和基を有する反応性基としては、ビニル基、アリル基、メタクリルオキシエチル基、メタクリルオキシプロピル基、アクリルオキシエチル基、アクリルオキシプロピル基、スチリル基等が例示される。重合性の観点から、メタクリルオキシプロピル基、アクリルオキシプロピル基、スチリル基が好ましい。ケイ素化合物(A)は、少なくとも1つのこのような反応性基を有していればよい。また、ケイ素化合物(A)は、複数のこのような反応性基を有する場合、1つのケイ素化合物(A)が、複数種類の反応性基を有してもよい。
Si(R1)m(R2)n(R3)4-m-n ・・・(a)
(R1はエチレン性不飽和基を含む反応性基を示す。R2はアルコキシ基、アルケニルオキシ基、カルボキシ基、ケトオキシム基、イソシアネート基及びハロゲン原子からなる群より選択される少なくとも1種の基を表す。R3は水素及びアルキル基の少なくとも一方を表す。m、nは整数であり、m+n≦4、m≧1、及びn≧1を満たす。mが2以上である場合、R1は互いに同一であっても異なっていてもよく、nが2以上である場合、R2は互いに同一であっても異なっていてもよく,(4-m―n)が2以上である場合、R3は互いに同一であっても異なっていてもよい。)
で表されるものであることが好ましい。
化合物(B)が親水性基を有することで、高い水の選択的透過性と、高い塩の阻止率とを有するポリマー積層半透膜が実現される。化合物(B)は有機化合物であることが好ましい。また、化合物(B)は、カルボキシル基、スルホン酸基、及びホスホン酸基、第一級アミノ基、第二級アミノ基、第三級アミノ基、第四級アンモニウム基、複素環基、及びリン酸エステルのうちから選ばれる少なくとも1種の親水性基を有することが好ましい。また、化合物(B)は、2つ以上の親水性基を含有し得るが、中でも1個~2個の親水性基を含有することが好ましい。
Q値(「アルフレイ-プライスのQ値」とも呼ばれる。)は、ラジカル重合性モノマーの二重結合とその置換基との共役の程度を表す指標として、当該二重結合の電子密度の指標であるe値とともに、1948年にT.AlfreyとC.C.Priceによって提出された。スチレンを基準(Q=1.0、e=-0.8)として、数多くのモノマーについてQ値及びe値が実験的に求められている。
F(f-1)/f=r1F2/f-r2 ・・・式(α)
r1=(Q1/Q2)exp[-e1(e1-e2)] ・・・式(β)
r2=(Q2/Q1)exp[-e2(e2-e1)] ・・・式(γ)
上述のポリマー積層半透膜は、半透層上にポリマー層を形成する工程を有する製造方法によって製造可能である。
半透層上にポリマー層を形成する工程とは、以下(a)~(c)のいずれかから選択される。
工程(c)において、重合を行う工程と縮合を行う工程は、どちらが先に行われてもよいし、並行して行われてもよい。
以下に、上記のポリマー層を形成する工程(a)~(c)をより具体的に説明する。
工程(b)において、化合物(A)の有する加水分解性基を溶媒中で縮合する工程は、前述の工程(a)における、化合物(A)の有する加水分解性基を縮合させる工程と同様に行われる。
工程(b)において、半透層上で化合物(A)の縮合物と化合物(B)の混合物をエチレン性不飽和基を介して重合する工程は、前述の工程(a)における、エチレン性不飽和基を介して化合物(A)と化合物(B)を溶媒中で重合する工程と同様に行われる。
ポリマー積層半透膜の製造方法は、半透層を形成する工程を含んでいてもよい。
非対称型半透層は、例えば、膜素材となる高分子を溶媒に溶解させ、得られた高分子溶液をガラス板等の上へ流延した後、水のような非溶媒中で凝固させることで得られ、このような膜の製造方法は一般に非溶媒誘起相分離法と呼ばれる(日本膜学会編、膜学実験シリーズ人工膜編、共立出版(1993)に詳細が記載されている)。
非溶媒誘起相分離法による非対称型半透層では、膜素材として酢酸セルロース、三酢酸セルロース、ポリアミド等が用いられ、溶媒としてはアセトン、ジメチルホルムアミド、ジオキサン、N-メチル-2-ピロリドン等が用いられる。
膜の支持性、目詰まりの防止及び透水性の確保という理由から、目の粗い層に目の細かい層を順に積層するのが好ましい。そこで、複合半透層の形成工程としては、基材の上に支持層を設け、さらにその支持層の上に分離機能層を設けるという順序で行うことが好ましい。
基材の材料についてはすでに述べたとおりである。
例えば、支持層は、ポリスルホンのN,N-ジメチルホルムアミド溶液を、密に織られたポリエステル布又は不織布の上に一定の厚さに注型し、それを、ドデシル硫酸ソーダ0.5重量%、DMF2重量%を含む水溶液中で湿式凝固することで形成される。
多官能アミンを含有する水溶液の多官能アミン濃度は、0.1~20重量%が好ましく、より好ましくは0.5~15重量%である。
多官能酸ハロゲン化物を溶解する有機溶媒は、水と非混和性を有し、かつ支持層を破壊しないことが好ましく、架橋ポリアミドの生成反応を阻害しないものであればいずれであってもよい。代表例としては、液状の炭化水素、トリクロロトリフルオロエタンなどのハロゲン化炭化水素等が挙げられるが、オゾン層を破壊しない物質であることや入手のしやすさ、取り扱いの容易さ、取り扱い上の安全性を考慮すると、オクタン、ノナン、デカン、ウンデカン、ドデカン、トリデカン、テトラデカン、ヘプタデカン、ヘキサデカンなど、シクロオクタン、エチルシクロヘキサン、1-オクテン、1-デセンなどの単体又はこれらの混合物が好ましく用いられる。
多官能酸ハロゲン化物の有機溶媒溶液を接触させて界面重縮合を行い、支持層上に架橋ポリアミドを含む分離機能層を形成したあとは、余剰の溶媒を液切りするとよい。液切りの方法は、例えば、膜を垂直方向に把持して過剰の有機溶媒を自然流下して除去する方法を用いることができる。この場合、垂直方向に把持する時間としては、10秒間~5分間の間にあることが好ましく、30秒間~3分間であるとより好ましい。短すぎると分離機能層が完全に形成せず、長すぎると有機溶媒が過乾燥となり欠点が発生しやすく、性能低下を起こしやすい。
[1.膜の作製]
(比較例1)ポリアミド半透膜
基材であるポリエチレンテレフタレート不織布上に、ポリスルホンの16重量%ジメチルホルムアミド溶液を200μmの厚みで、室温(25℃)でキャストした。キャスト後、ただちに純水中に浸漬して5分間放置することによって、基材及び支持層を備える支持膜を作製した。
このようにして得られた支持膜を、メタフェニレンジアミン2.5重量%水溶液中に1分間浸漬し、該支持膜を垂直方向にゆっくりと引き上げ、エアーノズルから窒素を吹き付けて支持膜表面から余分な水溶液を取り除いた後、トリメシン酸クロリド0.08重量%のn-デカン溶液を表面が完全に濡れるように塗布して30秒間静置した。次に膜から余分な溶液を除去するために、膜を1分間垂直に把持して液切りし、室温下送風機で膜表面のn-デカンを除去した。その後、90℃の熱水で2分間洗浄して半透膜を得た。
酢酸セルロース製非対称型半透膜である東レ株式会社SC-3000膜を比較例2の膜として用いた。
化合物(A)に該当する3-アクリロキシプロピルトリメトキシシランを80mM、化合物(B)に該当する4-ビニルフェニルスルホン酸ナトリウム80mM、光重合開始剤2,2-ジメトキシ-2-フェニルアセトフェノンを8.5mMの濃度で水に溶解させた。
以下、各実施例について、他の実施例を引用して説明の一部を省略することがある。ただし、他の実施例を引用しても、スピンコーターの回転数については異なることがある。例えば、「実施例1と同様」と記載されていても、スピンコーターの回転数は異なることがある。
ポリアミド半透膜に代えて比較例2の酢酸セルロース製逆浸透膜を用い、かつスピンコーターの回転数を変更した他は、実施例1と同様の操作を行うことで、ポリマー積層半透膜を得た。
化合物(B)として、1-アリル-3-スルホプロピルイミダゾリウムクロリドを用い、かつスピンコーターの回転数を変更した他は、実施例1と同様の操作を行うことで、ポリマー積層半透膜を得た。
化合物(B)として、1-ビニル-3-スルホプロピルイミダゾリウムクロリドを用いた他は、実施例11と同様の操作を行うことで、ポリマー積層半透膜を得た。
3-アクリロキシプロピルトリメトキシシランを100mM、4-ビニルフェニルスルホン酸ナトリウム100mM、光重合開始剤2,2-ジメトキシ-2-フェニルアセトフェノンを10mMの濃度で水に溶解させた。この溶液への紫外線照射及びその後の工程として、実施例11と同様の操作を行うことで、ポリマー積層半透膜を得た。
3-アクリロキシプロピルトリメトキシシランを100mM、[2-(メタクリロイルオキシ)エチル]ジメチル-(3-スルホプロピル)アンモニウムヒドロキシドを100mM、光重合開始剤2,2-ジメトキシ-2-フェニルアセトフェノンを10mMの濃度で水に溶解させた。この溶液への紫外線照射及びその後の工程として、実施例11と同様の操作を行うことで、ポリマー積層半透膜を得た。
実施例15~24では、ポリアミド半透膜上に、アニオン性基及びカチオン性基を共に有するポリマー層を形成した。
本実施例15では、化合物(A)に該当する3-アクリロキシプロピルトリメトキシシランを100mM、化合物(B1)に該当する4-ビニルフェニルスルホン酸ナトリウムを80mM、化合物(B2)に該当する[2-(メタクリロイルオキシ)エチル]ジメチル-(3-スルホプロピル)アンモニウムヒドロキシドを20mM、光重合開始剤2,2-ジメトキシ-2-フェニルアセトフェノンを10mMの濃度で、水に溶解させた。次に、実施例1と同様に紫外線を照射し、ポリマー溶液を得た。
このポリマー溶液を用いて、ポリアミド半透膜上に、実施例1と同様の操作によりポリマー層を形成した。ただし、スピンコータの回転数は調整し、完成したポリマー層の厚みは300nmであった。
このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表1に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B1)に該当する4-ビニルフェニルスルホン酸ナトリウムを60mM、化合物(B2)に該当する[2-(メタクリロイルオキシ)エチル]ジメチル-(3-スルホプロピル)アンモニウムヒドロキシドを40mMとした以外は、実施例15と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B1)に該当する4-ビニルフェニルスルホン酸ナトリウムを50mM、化合物(B2)に該当する[2-(メタクリロイルオキシ)エチル]ジメチル-(3-スルホプロピル)アンモニウムヒドロキシドを50mMとした以外は、実施例15と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B1)としてアクリル酸ナトリウムを使用した他は実施例15と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B1)としてアクリル酸ナトリウムを使用した他は実施例16と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B1)としてアクリル酸ナトリウムを使用した他は実施例17と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B2)として1-アリル-3-メチルイミダゾリウム=クロリドを使用した他は実施例17と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B1)としてアクリル酸ナトリウムを使用し、化合物(A)、(B1)、(B2)の仕込み比を変更した他は実施例21と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B2)として1-ビニルイミダゾールを使用し、化合物(A)、(B1)、(B2)の仕込み比を変更した他は実施例22と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
化合物(B1)としてアクリル酸ナトリウムを使用し、化合物(A)、(B1)、(B2)の仕込み比を変更した他は実施例23と同様である。得られたポリマー積層半透膜のポリマー層の厚さは300nmであった。このようにして得られたポリマー積層半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。さらに、化合物(A)、(B1)、(B2)の仕込み比を表3に示す。
ポリアミド半透膜の上にではなく、微多孔性支持膜の上にポリマー層を形成した以外は、実施例15と同様の操作によって、膜を作製した。
ポリマー層の厚さは300nmであった。
このようにして得られた半透膜の初期性能、耐塩素性試験後の性能をそれぞれ表2に示す。
(2-1)ポリマー層厚さ
膜片を真空乾燥し、乾燥後の膜の断面を走査型電子顕微鏡で観察した。1種の膜サンプルについて、任意の10箇所で、ポリマー層の厚さを測定し、その相加平均を算出した。得られた平均値を、以下ではポリマー層の厚さとして記載する。
温度25℃、pH6.5に調整した塩濃度500mg/Lの食塩水を、操作圧力0.75MPaで、半透膜(ポリマー積層半透膜を含む)に供給することで、膜ろ過処理を行なった。
得られた透過水の食塩濃度を測定し、測定結果に基づいて、次の式から脱塩率を求めた。
脱塩率(%)=100×{1-(透過水中の食塩濃度/供給水中の食塩濃度)}
また、上述の条件下で得られた、膜面1平方メートル当たりの1日の透水量(立方メートル)から、膜透過流束(m3/m2/日)を求めた。
半透膜又はポリマー積層半透膜を、塩化銅(II)1mg/Lを含み、塩素濃度500mg/Lに調整した次亜塩素酸ナトリウム水溶液に15時間浸漬し、前記脱塩率及び膜透過流束を測定した。耐塩素性の指標として塩透過率の変化比を次の式から求めた。
塩透過率変化比=耐塩素性試験後の塩透過率/初期性能の塩透過率
表1において、実施例1-14で示されたポリマー積層半透膜は、比較例1、2の半透膜と同等以上の脱塩率を持つとともに塩透過率変化比が小さくなっており、半透膜の塩除去性能を維持しながら、かつ重金属存在下でも耐酸化剤性を有することがわかる。
表2において、実施例15-24で示されたポリマー積層半透膜は、比較例1の半透膜と同等以上の脱塩率を持つとともに塩透過率変化比が小さくなっており、半透膜の塩除去性能を維持しながら、かつ重金属存在下でも耐酸化剤性を有することがわかる。
Claims (8)
- 半透層と、前記半透層上に形成されたポリマー層とを備え、
前記ポリマー層は、下記化合物(A)の有する加水分解性基の縮合と、前記化合物(A)と下記化合物(B)との重合とにより形成される重合物を含有する、
積層半透膜。
(A)ケイ素原子と、前記ケイ素原子に直接結合したエチレン性不飽和基を有する反応性基と、前記ケイ素原子に直接結合した加水分解性基と、を有するケイ素化合物
(B)親水性基とエチレン性不飽和基とを有する、前記化合物(A)以外の化合物 - 前記化合物(B)の親水性基はカルボキシル基、スルホン酸基、及びホスホン酸基のうちから選ばれる少なくとも1種の官能基である、
請求項1に記載の積層半透膜。 - 前記化合物(A)が下記一般式(a)で表される、
請求項1又は2に記載の積層半透膜。
Si(R1)m(R2)n(R3)4-m-n ・・・(a)
(R1はエチレン性不飽和基を含む反応性基を示す。R2はアルコキシ基、アルケニルオキシ基、カルボキシ基、ケトオキシム基、イソシアネート基及びハロゲン原子からなる群より選択される少なくとも1種の基を表す。R3は水素及びアルキル基の少なくとも一方を表す。m、nは整数であり、m+n≦4、m≧1、及びn≧1を満たす。mが2以上である場合、R1は互いに同一であっても異なっていてもよく、nが2以上である場合、R2は互いに同一であっても異なっていてもよく,(4-m―n)が2以上である場合、R3は互いに同一であっても異なっていてもよい。) - 前記ポリマー層は、前記化合物(A)の有する加水分解性基の縮合、及び前記化合物(A)と2種以上の前記化合物(B)との重合により形成される重合物を含有し、
前記2種以上の化合物(B)は、下記化合物(B1)及び化合物(B2)を含む、
請求項1~3のいずれか1項に記載の積層半透膜。
(B1)1個以上のアニオン性基と1個以上のエチレン性不飽和基とを有する、前記化合物(A)以外の化合物
(B2)1個以上のカチオン性基と1個以上のエチレン性不飽和基とを有する、前記化合物(A)及び前記化合物(B1)以外の化合物 - 前記化合物(B1)のアニオン性基がカルボキシル基、スルホン酸基、及びホスホン酸基のうちから選ばれる少なくとも1種の官能基である、
請求項4に記載の積層半透膜。 - 前記化合物(B2)のカチオン性基がアンモニウム塩、及びイミダゾリウム塩のうちから選ばれる少なくとも1種の官能基である、
請求項4又は5に記載の積層半透膜。 - 前記ポリマー層の厚さが50nm以上500nm以下である、
請求項1~6のいずれか1項に記載の積層半透膜。 - 半透層は、
微多孔性支持層と、前記微多孔性支持層上に設けられた分離機能層とを備え、
前記分離機能層は、多官能アミンと多官能酸ハロゲン化物とを重縮合させることで形成されたポリアミドを含有する、
請求項1~7のいずれか1項に記載の積層半透膜。
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EP3421117A1 (en) * | 2017-06-28 | 2019-01-02 | 3M Innovative Properties Company | Polyamide flat sheet membranes with microporous surface structure for nanoparticle retention |
WO2024117238A1 (ja) * | 2022-11-30 | 2024-06-06 | 東レ株式会社 | 複合半透膜、複合半透膜エレメントおよびろ過装置 |
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CN107297152B (zh) * | 2017-08-25 | 2021-11-19 | 上海城市水资源开发利用国家工程中心有限公司 | 一种制备纳滤/正渗透两栖性能复合膜的方法及装置 |
WO2019151075A1 (ja) | 2018-01-30 | 2019-08-08 | 日東電工株式会社 | 複合半透膜及びその製造方法 |
JP7226708B2 (ja) | 2018-01-30 | 2023-02-21 | 日東電工株式会社 | 複合半透膜及びその製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010094641A (ja) * | 2008-10-20 | 2010-04-30 | Toray Ind Inc | 複合半透膜の処理方法 |
WO2012077619A1 (ja) * | 2010-12-07 | 2012-06-14 | 東レ株式会社 | 複合半透膜およびその製造方法 |
WO2012105397A1 (ja) * | 2011-01-31 | 2012-08-09 | 東レ株式会社 | 水処理用分離膜およびその製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
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AU2009292436A1 (en) * | 2008-09-12 | 2010-03-18 | Toray Industries, Inc. | Composite semitransparent film and manufacturing method therefor |
US9022227B2 (en) * | 2011-03-21 | 2015-05-05 | International Business Machines Corporation | Composite membranes and methods of preparation thereof |
MX2015007841A (es) * | 2012-12-17 | 2016-03-04 | Basf Se | Sistemas de filtración y membranas con flujo intensificado y método para su preparación. |
-
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010094641A (ja) * | 2008-10-20 | 2010-04-30 | Toray Ind Inc | 複合半透膜の処理方法 |
WO2012077619A1 (ja) * | 2010-12-07 | 2012-06-14 | 東レ株式会社 | 複合半透膜およびその製造方法 |
WO2012105397A1 (ja) * | 2011-01-31 | 2012-08-09 | 東レ株式会社 | 水処理用分離膜およびその製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP3225299A4 * |
Cited By (5)
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---|---|---|---|---|
WO2018124103A1 (ja) * | 2016-12-26 | 2018-07-05 | 東レ株式会社 | 複合半透膜及びその製造方法 |
JPWO2018124103A1 (ja) * | 2016-12-26 | 2019-10-31 | 東レ株式会社 | 複合半透膜及びその製造方法 |
JP7167442B2 (ja) | 2016-12-26 | 2022-11-09 | 東レ株式会社 | 複合半透膜及びその製造方法 |
EP3421117A1 (en) * | 2017-06-28 | 2019-01-02 | 3M Innovative Properties Company | Polyamide flat sheet membranes with microporous surface structure for nanoparticle retention |
WO2024117238A1 (ja) * | 2022-11-30 | 2024-06-06 | 東レ株式会社 | 複合半透膜、複合半透膜エレメントおよびろ過装置 |
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