WO2016061776A1 - 一种柔性衬底基板的制作方法 - Google Patents

一种柔性衬底基板的制作方法 Download PDF

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Publication number
WO2016061776A1
WO2016061776A1 PCT/CN2014/089237 CN2014089237W WO2016061776A1 WO 2016061776 A1 WO2016061776 A1 WO 2016061776A1 CN 2014089237 W CN2014089237 W CN 2014089237W WO 2016061776 A1 WO2016061776 A1 WO 2016061776A1
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Prior art keywords
flexible substrate
substrate material
fabricating
polyimide
substrate according
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PCT/CN2014/089237
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English (en)
French (fr)
Inventor
姚江波
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/404,634 priority Critical patent/US20160107926A1/en
Publication of WO2016061776A1 publication Critical patent/WO2016061776A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Definitions

  • the present invention relates to the field of liquid crystal display technologies, and in particular, to a method for fabricating a flexible substrate.
  • the process of the flexible substrate is generally performed by coating a flexible substrate material such as PI (polyimide) on a glass substrate to form a flexible substrate, and performing a thin film transistor process thereon, but due to the flexible substrate material. Different from the thermal expansion coefficient of the glass substrate, when the flexible substrate material is subjected to heat shrinkage, the periphery of the glass substrate is warped.
  • PI polyimide
  • the machine is specially designed to artificially control the area of the glue during the PI glue application process, so that the PI is divided into many small pieces and coated on the substrate.
  • the above implementation method has high production cost and complicated production process.
  • An object of the present invention is to provide a method for fabricating a flexible substrate to solve the technical problem of warpage of the glass substrate in the flexible substrate process, thereby simplifying the production process and saving production costs.
  • the present invention constructs a method for fabricating a flexible substrate, comprising the following steps:
  • the flexible substrate material is polyimide
  • the developed polyimide is cured to form and A plurality of films of polyimide corresponding to the pattern are set, and the thickness of the polyimide film ranges from 10 to 500 ⁇ m.
  • the interval between the opaque regions is 10-40 mm.
  • the area of the opaque region is 44-27722 square centimeters.
  • the polyimide has a viscosity of from 2,000 to 20,000 cps.
  • the glass substrate has a thickness of 0.4 to 2 mm.
  • the flexible substrate material is exposed using a laser having an energy of 50-100 millijoules per square centimeter.
  • the exposure time is 40-100 seconds.
  • the curing time is from 10 to 60 minutes.
  • the invention constructs a manufacturing method of a flexible substrate, comprising the following steps:
  • the developed flexible substrate material is cured to form a film of a plurality of flexible substrate materials corresponding to the set pattern.
  • the interval between two adjacent opaque regions is 0.5-50 mm.
  • the interval between the opaque regions is 10-40 mm.
  • the area of the opaque region is 44-27722 square centimeters.
  • the flexible substrate material is polyimide
  • the developed polyimide is cured to form a plurality of polyacyl groups corresponding to the set pattern.
  • the polyimide has a viscosity of from 2,000 to 20,000 cps.
  • the glass substrate has a thickness of 0.4 to 2 mm.
  • the flexible substrate material is exposed using a laser having an energy of 50-100 millijoules per square centimeter.
  • the exposure time is 40-100 seconds.
  • the curing time is from 10 to 60 minutes.
  • the method for fabricating the flexible substrate of the present invention comprises: exposing and developing the dried flexible substrate material to form a plurality of films of the flexible substrate material after curing, thereby reducing shrinkage of the film of the flexible substrate material
  • the tension avoids the technical problem of warpage of the glass substrate in the process to simplify the production process and save production costs.
  • FIG. 2 is a flow chart showing a method of fabricating a flexible substrate according to a first embodiment of the present invention
  • FIG. 3 is a schematic view showing the structure of a cross section of a mask according to the present invention.
  • FIG. 1 is a flow chart of a method for fabricating a flexible substrate of the prior art.
  • the entire flexible substrate is fabricated on a flat rigid substrate, and then an electronic component is fabricated on the flexible substrate.
  • the fabrication process of the prior art flexible substrate includes the following steps:
  • the glass substrate is first placed on a substrate stage, and the glass substrate is washed, and then the flexible substrate material is coated on the surface of the cleaned glass substrate.
  • the flexible substrate material coated in step S101 is dried under a vacuum environment, and the purpose of vacuum drying is to remove water molecules in the flexible material.
  • the drying process maintains a vacuum, avoiding the introduction of impurities during the process.
  • a monolithic flexible substrate material film is formed on the glass substrate.
  • FIG. 2 is a flow chart of a method for fabricating a flexible substrate according to a first embodiment of the present invention.
  • the entire flexible substrate is fabricated on a flat and rigid substrate, and then the electronic component is fabricated on the flexible substrate.
  • the flow chart of the flexible substrate of the first embodiment of the present invention includes the following steps:
  • the glass substrate is first placed on a substrate stage, and the glass substrate is washed, and then the flexible substrate material is coated on the surface of the cleaned glass substrate.
  • the cleaning method is ultrasonic cleaning.
  • the flexible substrate material may be polyimide, silicone rubber, parylene, silicone, or the like.
  • the photosensitive material may be a sensitizer.
  • the flexible substrate material containing the photosensitive material is a photoresist, and the material of the photoresist is a positive photoresist material.
  • the flexible substrate material may be coated on the glass substrate by a silicone coating method or a slit coating method.
  • the flexible substrate material coated in step S201 is dried in a vacuum environment, and the purpose of vacuum drying is to remove water molecules in the flexible material.
  • the drying process maintains a vacuum in order to avoid the introduction of impurities during the process while improving the adhesion between the flexible substrate material and the glass substrate.
  • the vacuum drying step is carried out in a vacuum machine.
  • the mask plate further includes a light-transmitting region, and the flexible substrate material corresponding to the light-transmitting region can be illuminated by light, and the flexible substrate material corresponding to the opaque region cannot be illuminated.
  • the light is irradiated onto the glass substrate coated with the positive photoresist material through the light-transmitting region on the reticle, and finally the set pattern formed by the opaque region on the reticle is transferred to On the glass substrate; the opaque regions are distributed on the reticle in an array.
  • the flexible substrate material corresponding to the light-transmitting region is reacted with the developer at the time of performing the developing process of step S204 due to the illumination.
  • the flexible substrate material corresponding to the opaque region does not react with the developer during the development process of step S204 because it is not exposed to light. After sufficient exposure and development, the flexible substrate material corresponding to the set pattern remains, and the remaining portion of the flexible substrate material is developed.
  • the flexible substrate material corresponding to the set pattern remains in step S204, a plurality of films of the flexible substrate material are formed after high temperature curing. Since the opaque regions are distributed in an array manner, the films of the plurality of flexible substrate materials obtained in step S205 are also distributed in an array manner.
  • the flexible substrate material is polyimide
  • the developed polyimide is cured to form a film of a plurality of polyimides corresponding to the set pattern.
  • the method for fabricating the flexible substrate of the present invention comprises: exposing and developing the dried flexible substrate material to form a plurality of films of the flexible substrate material after curing, thereby reducing shrinkage of the film of the flexible substrate material
  • the tension avoids the technical problem of warpage of the glass substrate in the process to simplify the production process and save production costs.
  • the flow chart of the flexible substrate of the second embodiment of the present invention includes The following steps:
  • a 0.4-2 mm glass substrate was placed on a substrate stage, and the glass substrate was washed, and then the flexible substrate material was coated on the surface of the cleaned glass substrate.
  • the cleaning method is ultrasonic cleaning. Since the thinner the glass substrate, the more easily the warpage occurs, the thickness of the glass substrate is too thick, which affects the subsequent process and increases the production cost. Further, the thickness of the glass substrate is preferably 0.5 mm or 0.7 mm.
  • the flexible substrate material may be polyimide, silicone rubber, parylene, silicone, or the like.
  • the photosensitive material may be a sensitizer.
  • the flexible substrate material containing the photosensitive material is a photoresist, and the material of the photoresist is a positive photoresist material.
  • the flexible substrate material may be coated on the glass substrate by a silicone coating method or a slit coating method.
  • the polyimide preferably has a viscosity of from 2,000 to 20,000 cps to form a polyimide film having a thickness of from 10 to 500 ⁇ m.
  • the viscosity is too small to ensure that the thickness of the polyimide film is within the above range.
  • the flexible substrate material coated in step S201 is dried in a vacuum environment, and the purpose of vacuum drying is to remove water molecules in the flexible material.
  • the drying process maintains a vacuum in order to avoid the introduction of impurities during the process while improving the adhesion between the flexible substrate material and the glass substrate.
  • the vacuum drying step is carried out in a vacuum machine.
  • the pressure in the vacuum machine is 20-100 Pa
  • the substrate stage temperature is 90-110 degrees
  • the vacuum drying time is preferably 90-120 seconds.
  • the pressure is too small, the cleaning is not thorough; the pressure is too large, and the flexible substrate material is easily damaged. If the temperature is too low, the organic solvent is not easily evaporated; if the temperature is too high, the properties of the flexible substrate material (especially polyimide having a viscosity of 2000 to 20 000 centipoise) are easily changed.
  • FIG. 3 is a schematic structural view of a cross section of a mask according to the present invention.
  • the mask 10 further includes a transparent region 102 (a portion other than 101) and a plurality of opaque regions 101.
  • the exposed flexible substrate material corresponding to the transparent region 102 can be illuminated by light.
  • the flexible substrate material corresponding to the opaque region 101 cannot illuminate light, and the light is irradiated onto the glass substrate coated with the positive photoresist material through the transparent region 102 on the reticle 10.
  • a setting pattern formed by the opaque region 101 on the reticle 10 is transferred onto the glass substrate; the opaque regions 101 are distributed on the reticle 10 in an array.
  • the interval between two adjacent opaque regions 101 on the mask 10 is 0.5-50 mm, preferably 10-40 mm, further preferably 25 mm, and the area of the opaque region is 44-27722 square centimeters, preferably 5000-25000 square centimeters, further preferably 15000 square centimeters, and when the shape of the opaque region is rectangular or square, the length or width is 2-50 inches, preferably 15-40 inches, further preferably 30 inches, can greatly reduce the probability of warpage of the glass substrate.
  • the exposure process described above exposes the flexible substrate material using a laser having a wavelength of 172-365 nm, preferably 365 nm.
  • the energy of the laser is greater than 50 millijoules per square centimeter, and the laser energy is too small to clearly transfer the pattern on the mask onto the glass substrate.
  • the laser has an energy of 50-100 millijoules per square centimeter.
  • the exposure time is 40-100 seconds. The exposure time is too short to meet the energy required for exposure.
  • the flexible substrate material corresponding to the light-transmitting region 102 is reacted with the developer at the time of performing the developing process of step S204 due to the illumination.
  • the flexible substrate material corresponding to the opaque region 101 does not react with the developer during the development process of step S204 because it is not exposed to light. After sufficient exposure and development, the flexible substrate material corresponding to the set pattern remains, and the remaining portion of the flexible substrate material is developed.
  • the development mode may use a immersion development mode in which the exposed flexible substrate material is developed using a developer, the developer may further include potassium hydroxide, and the composition of the developer contains 2.38% tetramethyl hydroxide. Ammonium, the temperature of the developer is preferably 23 degrees, and the development time is preferably 90 to 120 seconds.
  • the flexible substrate material corresponding to the set pattern remains in step S204, a plurality of films of the flexible substrate material are formed after high temperature curing. Since the opaque regions 101 are distributed in an array manner, the films of the plurality of flexible substrate materials obtained through the step S205 are also distributed in an array manner.
  • the flexible substrate material is polyimide
  • the developed polyimide is cured to form a film of a plurality of polyimides corresponding to the set pattern, the polyimide
  • the thickness of the film ranges from 10 to 500 microns, preferably 300 microns.
  • the polyimide film is too thin to satisfy the demand for forming a component thereon, and the polyimide film is too thick to lower the penetration property.
  • the curing temperature is 110-250 degrees Celsius.
  • the curing time is greater than 10 minutes and the curing time is too short to completely solidify the flexible substrate material; preferably from 10 to 60 minutes, more preferably 30 minutes.
  • the curing temperature is too low to completely solidify the flexible substrate material; the curing temperature is too high to change the material properties of the flexible substrate film.
  • the plurality of flexible substrate films of the present invention have a smaller area than each of the flexible substrate films, so that the curing process is performed during the curing process.
  • the tension generated by each flexible substrate film is much smaller than the tension generated by the entire flexible substrate film, and the tension of the plurality of flexible substrate films does not form a resultant force due to the gap between the plurality of flexible substrate films. Therefore, it does not cause warpage of the glass substrate.
  • the method for fabricating the flexible substrate of the present invention comprises: exposing and developing the dried flexible substrate material to form a plurality of films of the flexible substrate material after curing, thereby reducing shrinkage of the film of the flexible substrate material
  • the tension avoids the technical problem of warpage of the glass substrate in the process to simplify the production process and save production costs.

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Abstract

提供了一种柔性衬底基板的制作方法，包括：涂布柔性衬底材料（S201）并进行干燥（S202）；使用具有多个间隔设置的不透光区域的掩模板对干燥后的柔性衬底材料进行曝光，多个不透光区域形成设定图案（S203）；然后进行显影去除不透光区域以外的柔性衬底材料（S204）；然后进行固化形成与设定图案对应的多块柔性衬底材料的薄膜（S205）。避免了在制程中玻璃基板翘曲的技术问题，简化了生产过程、节省了生产成本。

Description

一种柔性衬底基板的制作方法 技术领域
本发明涉及液晶显示器技术领域，特别是涉及一种柔性衬底基板的制作方法。
 背景技术
柔性衬底基板的制程，一般是将柔性衬底材料譬如PI（聚酰亚胺）涂布在玻璃基板加热做成柔性衬底，并在其上进行薄膜晶体管的制程，但由于柔性衬底材料与玻璃基板受热膨胀系数不同，在柔性衬底材料受热收缩时，导致玻璃基板四周翘曲。为了解决上述问题，一般有两种方式解决：一种是设计特殊薄膜晶体管制程的设备，添加夹具及负压装置以保证基板完全水平放置于载台上；另一种是对高粘度的涂胶机进行特殊的设计，在PI胶涂胶过程中人为控制涂胶的面积，使PI分成很多小块分别涂布在基板上。但是上述实现方式的生产成本较高、生产工艺复杂。
因此，有必要提供一种柔性衬底基板的制作方法，以解决现有技术所存在的问题。
 技术问题
本发明的目的在于提供一种柔性衬底基板的制作方法，以解决在柔性衬底基板制程中玻璃基板翘曲的技术问题，以简化生产过程、节省生产成本。
 技术解决方案
为解决上述技术问题，本发明构造了一种柔性衬底基板的制作方法，包括以下步骤：
在玻璃基板的表面涂布含有感光材料的柔性衬底材料；
对所述柔性衬底材料进行真空干燥；
使用掩模板对干燥后的所述柔性衬底材料进行曝光，所述掩模板具有多个间隔设置的不透光区域，所述多个不透光区域形成设定图案；
对所述曝光后的柔性衬底材料进行显影，去除所述不透光区域以外的柔性衬底材料；以及
对显影后的柔性衬底材料进行固化，以形成与所述设定图案对应的多块柔性衬底材料的薄膜；
其中，相邻两个所述不透光区域之间的间隔为0.5-50毫米，所述柔性衬底材料为聚酰亚胺，对显影后的聚酰亚胺进行固化，以形成与所述设定图案对应的多块聚酰亚胺的薄膜，所述聚酰亚胺膜的厚度范围为10-500微米。
在本发明的柔性衬底基板的制作方法中，所述不透光区域之间的间隔为10-40毫米。
在本发明的柔性衬底基板的制作方法中，所述不透光区域的面积为44-27722平方厘米。
在本发明的柔性衬底基板的制作方法中，所述聚酰亚胺的粘度2000-20000厘泊。
在本发明的柔性衬底基板的制作方法中，所述玻璃基板的厚度为0.4-2毫米。
在本发明的柔性衬底基板的制作方法中，使用激光对所述柔性衬底材料进行曝光，所述激光的能量50-100毫焦每平方厘米。
在本发明的柔性衬底基板的制作方法中，所述曝光的时间40-100秒。
在本发明的柔性衬底基板的制作方法中，所述固化的时间为10-60分钟。
本发明构造了一种柔性衬底基板的制作方法，包括以下步骤：
在玻璃基板的表面涂布含有感光材料的柔性衬底材料；
对所述柔性衬底材料进行真空干燥；
使用掩模板对干燥后的所述柔性衬底材料进行曝光，所述掩模板具有多个间隔设置的不透光区域，所述多个不透光区域形成设定图案；
对所述曝光后的柔性衬底材料进行显影，去除所述不透光区域以外的柔性衬底材料；以及
对显影后的柔性衬底材料进行固化，以形成与所述设定图案对应的多块柔性衬底材料的薄膜。
在本发明的柔性衬底基板的制作方法中，相邻两个所述不透光区域之间的间隔为0.5-50毫米。
在本发明的柔性衬底基板的制作方法中，所述不透光区域之间的间隔为10-40毫米。
在本发明的柔性衬底基板的制作方法中，所述不透光区域的面积为44-27722平方厘米。
在本发明的柔性衬底基板的制作方法中，所述柔性衬底材料为聚酰亚胺，对显影后的聚酰亚胺进行固化，以形成与所述设定图案对应的多块聚酰亚胺的薄膜，所述聚酰亚胺膜的厚度范围为10-500微米。
在本发明的柔性衬底基板的制作方法中，所述聚酰亚胺的粘度2000-20000厘泊。
在本发明的柔性衬底基板的制作方法中，所述玻璃基板的厚度为0.4-2毫米。
在本发明的柔性衬底基板的制作方法中，使用激光对所述柔性衬底材料进行曝光，所述激光的能量50-100毫焦每平方厘米。
在本发明的柔性衬底基板的制作方法中，所述曝光的时间40-100秒。
在本发明的柔性衬底基板的制作方法中，所述固化的时间为10-60分钟。
有益效果
本发明的柔性衬底基板的制作方法，通过对干燥后的柔性衬底材料进行曝光显影，以在固化后形成多块柔性衬底材料的薄膜，从而减小柔性衬底材料的薄膜产生的收缩的张力，避免在制程中玻璃基板翘曲的技术问题，以简化生产过程、节省生产成本。
 附图说明
图1为现有技术的柔性衬底基板的制作方法流程图；
图2为本发明第一实施例的柔性衬底基板的制作方法流程图；
图3为本发明的掩模板横截面的结构示意图。
本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是以相同标号表示。
请参照图1，图1为现有技术的柔性衬底基板的制作方法流程图。
如图1所示，整个柔性衬底基板是在平坦硬质的底座上制作的，然后在柔性衬底基板上制作有电子元件，现有技术柔性衬底基板的制作流程，包括以下步骤：
S101、在玻璃基板的表面涂布柔性衬底材料；
首先将所述玻璃基板放置在基板载台上，再清洗所述玻璃基板，之后在洗干净的玻璃基板的表面涂布所述柔性衬底材料。
S102、对所述柔性衬底材料进行真空干燥；
将步骤S101中涂布的柔性衬底材料放在真空环境下干燥，真空干燥的目的是去除柔性材料中的水分子。干燥过程保持真空，避免了制程过程中引入杂质。
S103、对干燥后的柔性衬底材料进行固化。
对所述柔性衬底材料进行高温固化后，以在玻璃基板上形成一个整块的柔性衬底材料薄膜。
请参照图2，图2为本发明第一实施例的柔性衬底基板的制作方法流程图。整个柔性衬底基板是在平坦硬质的底座上制作的，然后在柔性衬底基板上制作有电子元件，本发明第一实施例的柔性衬底基板的制作方法流程图，包括以下步骤：
S201、在玻璃基板的表面涂布含有感光材料的柔性衬底材料；
首先将所述玻璃基板放置在基板载台上，再清洗所述玻璃基板，之后在洗干净的玻璃基板的表面涂布所述柔性衬底材料。
所述清洗的方式为超音波清洗。所述柔性衬底材料可以为聚酰亚胺、硅橡胶、聚对二甲苯、硅树脂等。所述感光材料可为感光剂。所述含有感光材料的柔性衬底材料为光刻胶，所述光刻胶的材料为正向光阻材料。可以采用甩胶涂布法或者狭缝涂布法将所述柔性衬底材料涂布在所述玻璃基板上。
S202、对所述柔性衬底材料进行真空干燥；
对步骤S201中涂布的柔性衬底材料在真空环境下干燥，真空干燥的目的是去除柔性材料中的水分子。干燥过程保持真空，是为了避免制程过程中引入杂质，同时提高所述柔性衬底材料和玻璃基板之间的附着性。所述真空干燥的步骤是在真空机中进行的。
S203、使用掩模板对干燥后的所述柔性衬底材料进行曝光，所述掩模板具有多个间隔设置的不透光区域，所述多个不透光区域形成设定图案；
所述掩膜板上还包括透光区域，通过曝光，所述透光区域对应的所述柔性衬底材料可以照到光，而所述不透光区域对应的所述柔性衬底材料不能照到光，光线通过所述掩模板上的透光区域照射到涂布了所述正向光阻材料的玻璃基板上，最终将所述掩模板上的不透光区域形成的设定图案转移到所述玻璃基板上；所述不透光区域以阵列方式分布在所述掩模板上。
S204、对所述曝光后的柔性衬底材料进行显影，去除所述不透光区域以外的柔性衬底材料；
与所述透光区域对应的所述柔性衬底材料的由于受到光照，在执行步骤S204的显影工艺时与显影液发生反应。与所述不透光区域对应的所述柔性衬底材料的由于未受到光照，在执行步骤S204的显影工艺时不与显影液发生反应。经过充分曝光、显影后，与设定图案对应的所述柔性衬底材料保留下来，其余部分的所述柔性衬底材料被显影掉。
S205、对显影后的柔性衬底材料进行固化，以形成与所述设定图案对应的多块柔性衬底材料的薄膜。
由于在步骤S204中，与设定图案对应的所述柔性衬底材料保留下来，经过高温固化后就形成多块柔性衬底材料的薄膜。由于不透光区域以阵列方式分布，因此步骤S205得到多块柔性衬底材料的薄膜也以阵列方式分布。当所述柔性衬底材料为聚酰亚胺时，对显影后的聚酰亚胺进行固化，以形成与所述设定图案对应的多块聚酰亚胺的薄膜。
本发明的柔性衬底基板的制作方法，通过对干燥后的柔性衬底材料进行曝光显影，以在固化后形成多块柔性衬底材料的薄膜，从而减小柔性衬底材料的薄膜产生的收缩的张力，避免在制程中玻璃基板翘曲的技术问题，以简化生产过程、节省生产成本。
本发明第二实施例的柔性衬底基板的制作方法，包括以下步骤：
结合图2，整个柔性衬底基板是在平坦硬质的底座上制作的，然后在柔性衬底基板上制作有电子元件，本发明第二实施例的柔性衬底基板的制作方法流程图，包括以下步骤：
S201、在玻璃基板的表面涂布含有感光材料的柔性衬底材料；
首先将0.4-2mm的玻璃基板放置在基板载台上，再清洗所述玻璃基板，之后在洗干净的玻璃基板的表面涂布所述柔性衬底材料。所述清洗的方式为超音波清洗。由于玻璃基板越薄越容易产生翘曲，所述玻璃基板厚度太厚，影响后续的制程同时增加生产成本。进一步地，所述玻璃基板的厚度优选为0.5mm或者0.7mm。
所述柔性衬底材料可以为聚酰亚胺、硅橡胶、聚对二甲苯、硅树脂等。所述感光材料可为感光剂。
所述含有感光材料的柔性衬底材料为光刻胶，所述光刻胶的材料为正向光阻材料。可以采用甩胶涂布法或者狭缝涂布法将所述柔性衬底材料涂布在所述玻璃基板上。
当所述柔性衬底材料为聚酰亚胺时，所述聚酰亚胺的粘度优选为2000-20000厘泊，以形成厚度为10-500微米的聚酰亚胺膜。粘度太小，不能保证所述聚酰亚胺膜的厚度在上述范围内。
S202、对所述柔性衬底材料进行真空干燥；
对步骤S201中涂布的柔性衬底材料在真空环境下干燥，真空干燥的目的是去除柔性材料中的水分子。干燥过程保持真空，是为了避免制程过程中引入杂质，同时提高所述柔性衬底材料和玻璃基板之间的附着性。所述真空干燥的步骤是在真空机中进行的。所述真空机内的压强为20-100帕，所述基板载台温度为90-110度，所述真空干燥的时间优选为90-120秒。压强太小，清洗不彻底；压强太大，容易损坏所述柔性衬底材料。温度过低，不容易有机溶剂蒸发；温度过高，容易使所述柔性衬底材料（特别是粘度为2000-20000厘泊的聚酰亚胺）的特性发生变化。
S203、使用掩模板对干燥后的所述柔性衬底材料进行曝光，所述掩模板具有多个间隔设置的不透光区域，所述多个不透光区域形成设定图案；
结合图3，图3为本发明的掩模板横截面的结构示意图。所述掩膜板10上还包括透光区域102（101以外的部分）和多个不透光区域101，通过曝光，所述透光区域102对应的所述柔性衬底材料可以照到光，而所述不透光区域101对应的所述柔性衬底材料不能照到光，光线通过所述掩模板10上的透光区域102照射到涂布了所述正向光阻材料的玻璃基板上，最终将所述掩模板10上的不透光区域101形成的设定图案转移到所述玻璃基板上；所述不透光区域101以阵列方式分布在所述掩模板10上。所述掩膜板10上相邻两个所述不透光区域101之间的间隔为0.5-50毫米，优选为10-40毫米，进一步优选为25毫米，所述不透光区域的面积为44-27722平方厘米，优选为5000-25000平方厘米，进一步优选为15000平方厘米，当所述不透光区域的形状为长方形或者正方形时，其长或者宽的尺寸为2-50寸，优选为15-40寸，进一步优选为30寸，能够使得所述玻璃基板发生翘曲的概率大大降低。
上述曝光过程是使用激光对所述柔性衬底材料进行曝光的，所述激光的波长为172-365纳米，优选为365纳米。所述激光的能量大于50毫焦每平方厘米，激光能量过小，不能清晰地将所述掩模板上的图形转移到玻璃基板上。优选地所述激光的能量为50-100毫焦每平方厘米。所述曝光的时间40-100秒。曝光时间过短，不能满足曝光所需要的能量。
S204、对所述曝光后的柔性衬底材料进行显影，去除所述不透光区域以外的柔性衬底材料；
与所述透光区域102对应的所述柔性衬底材料的由于受到光照，在执行步骤S204的显影工艺时与显影液发生反应。与所述不透光区域101对应的所述柔性衬底材料的由于未受到光照，在执行步骤S204的显影工艺时不与显影液发生反应。经过充分曝光、显影后，与设定图案对应的所述柔性衬底材料保留下来，其余部分的所述柔性衬底材料被显影掉。
所述显影模式可以使用浸泡显影模式，即使用显影液对所述曝光后的柔性衬底材料进行显影，所述显影液还可包括氢氧化钾，显影液的成分包含2.38%四甲基氢氧化铵，所述显影液的温度优选为23度，所述显影的时间优选为90-120秒。
S205、对显影后的柔性衬底材料进行固化，以形成与所述设定图案对应的多块柔性衬底材料的薄膜。
由于在步骤S204中，与设定图案对应的所述柔性衬底材料保留下来，经过高温固化后就形成多块柔性衬底材料的薄膜。由于所述不透光区域101以阵列方式分布，因此经过步骤S205得到的多块柔性衬底材料的薄膜也以阵列方式分布。当所述柔性衬底材料为聚酰亚胺时，对显影后的聚酰亚胺进行固化，以形成与所述设定图案对应的多块聚酰亚胺的薄膜，所述聚酰亚胺膜的厚度范围为10-500微米，优选为300微米。所述聚酰亚胺膜太薄，不能满足在其上制成元器件的需求，所述聚酰亚胺膜太厚，会降低穿透性能。所述固化的温度为110-250摄氏度。所述固化的时间大于10分钟，固化时间过短，不能使所述柔性衬底材料完全凝固；优选为10-60分钟，较优选为30分钟。固化温度过低，不能使所述柔性衬底材料完全凝固；固化温度过高，使所述柔性衬底薄膜的材料特性发生变化。
与现有技术中形成一整块的柔性衬底薄膜相比，本发明的多块柔性衬底薄膜，由于每块柔性衬底薄膜的面积小于整块柔性衬底薄膜的面积，使得在固化过程中，每块柔性衬底薄膜产生的张力远远小于整块柔性衬底薄膜产生的张力，且由于多块柔性衬底薄膜之间存在间隙，因而多块柔性衬底薄膜的张力不会形成合力，因而不会导致玻璃基板发生翘曲现象。
本发明的柔性衬底基板的制作方法，通过对干燥后的柔性衬底材料进行曝光显影，以在固化后形成多块柔性衬底材料的薄膜，从而减小柔性衬底材料的薄膜产生的收缩的张力，避免在制程中玻璃基板翘曲的技术问题，以简化生产过程、节省生产成本。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (18)

  1. 一种柔性衬底基板的制作方法，其包括：
    在玻璃基板的表面涂布含有感光材料的柔性衬底材料；
    对所述柔性衬底材料进行真空干燥；
    使用掩模板对干燥后的所述柔性衬底材料进行曝光，所述掩模板具有多个间隔设置的不透光区域，所述多个不透光区域形成设定图案；
    对所述曝光后的柔性衬底材料进行显影，去除所述不透光区域以外的柔性衬底材料；以及
    对显影后的柔性衬底材料进行固化，以形成与所述设定图案对应的多块柔性衬底材料的薄膜；
    其中，相邻两个所述不透光区域之间的间隔为0.5-50毫米，
    所述柔性衬底材料为聚酰亚胺，对显影后的聚酰亚胺进行固化，以形成与所述设定图案对应的多块聚酰亚胺的薄膜，所述聚酰亚胺膜的厚度范围为10-500微米。
  2. 根据权利要求1所述的柔性衬底基板的制作方法，其中所述不透光区域之间的间隔为10-40毫米。
  3. 根据权利要求1所述的柔性衬底基板的制作方法，其中所述不透光区域的面积为44-27722平方厘米。
  4. 根据权利要求1所述的柔性衬底基板的制作方法，其中所述聚酰亚胺的粘度2000-20000厘泊。
  5. 根据权利要求1所述的柔性衬底基板的制作方法，其中所述玻璃基板的厚度为0.4-2毫米。
  6. 根据权利要求1所述的柔性衬底基板的制作方法，其中使用激光对所述柔性衬底材料进行曝光，所述激光的能量50-100毫焦每平方厘米。
  7. 根据权利要求1所述的柔性衬底基板的制作方法，其中所述曝光的时间40-100秒。
  8. 根据权利要求1所述的柔性衬底基板的制作方法，其中所述固化的时间为10-60分钟。
  9. 一种柔性衬底基板的制作方法，其包括：
    在玻璃基板的表面涂布含有感光材料的柔性衬底材料；
    对所述柔性衬底材料进行真空干燥；
    使用掩模板对干燥后的所述柔性衬底材料进行曝光，所述掩模板具有多个间隔设置的不透光区域，所述多个不透光区域形成设定图案；
    对所述曝光后的柔性衬底材料进行显影，去除所述不透光区域以外的柔性衬底材料；以及
    对显影后的柔性衬底材料进行固化，以形成与所述设定图案对应的多块柔性衬底材料的薄膜。
  10. 根据权利要求9所述的柔性衬底基板的制作方法，其中相邻两个所述不透光区域之间的间隔为0.5-50毫米。
  11. 根据权利要求10所述的柔性衬底基板的制作方法，其中所述不透光区域之间的间隔为10-40毫米。
  12. 根据权利要求9所述的柔性衬底基板的制作方法，其中所述不透光区域的面积为44-27722平方厘米。
  13. 根据权利要求9所述的柔性衬底基板的制作方法，其中所述柔性衬底材料为聚酰亚胺，对显影后的聚酰亚胺进行固化，以形成与所述设定图案对应的多块聚酰亚胺的薄膜，所述聚酰亚胺膜的厚度范围为10-500微米。
  14. 根据权利要求13所述的柔性衬底基板的制作方法，其中所述聚酰亚胺的粘度2000-20000厘泊。
  15. 根据权利要求9所述的柔性衬底基板的制作方法，其中所述玻璃基板的厚度为0.4-2毫米。
  16. 根据权利要求9所述的柔性衬底基板的制作方法，其中使用激光对所述柔性衬底材料进行曝光，所述激光的能量50-100毫焦每平方厘米。
  17. 根据权利要求9所述的柔性衬底基板的制作方法，其中所述曝光的时间40-100秒。
  18. 根据权利要求9所述的柔性衬底基板的制作方法，其中所述固化的时间为10-60分钟。
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