WO2016058905A1 - Vorrichtung und verfahren zur schichtdickenmessung für dampfabscheideverfahren - Google Patents
Vorrichtung und verfahren zur schichtdickenmessung für dampfabscheideverfahren Download PDFInfo
- Publication number
- WO2016058905A1 WO2016058905A1 PCT/EP2015/073304 EP2015073304W WO2016058905A1 WO 2016058905 A1 WO2016058905 A1 WO 2016058905A1 EP 2015073304 W EP2015073304 W EP 2015073304W WO 2016058905 A1 WO2016058905 A1 WO 2016058905A1
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- Prior art keywords
- section
- measuring
- cooling
- arrangement according
- measuring arrangement
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 20
- 238000005259 measurement Methods 0.000 title abstract description 13
- 238000000151 deposition Methods 0.000 title abstract description 10
- 238000001816 cooling Methods 0.000 claims abstract description 101
- 238000010438 heat treatment Methods 0.000 claims abstract description 78
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims description 39
- 238000007789 sealing Methods 0.000 claims description 13
- 238000007740 vapor deposition Methods 0.000 claims description 9
- 230000003750 conditioning effect Effects 0.000 claims 1
- 239000000523 sample Substances 0.000 claims 1
- 238000000605 extraction Methods 0.000 abstract 2
- 238000009833 condensation Methods 0.000 description 21
- 230000005494 condensation Effects 0.000 description 21
- 238000000576 coating method Methods 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000009675 coating thickness measurement Methods 0.000 description 5
- 238000011144 upstream manufacturing Methods 0.000 description 5
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 4
- 239000002826 coolant Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 229910052711 selenium Inorganic materials 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 230000002028 premature Effects 0.000 description 3
- 230000001902 propagating effect Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000004063 acid-resistant material Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000005493 condensed matter Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000002783 friction material Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000004941 influx Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000004326 stimulated echo acquisition mode for imaging Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
- G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
- G01B17/025—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness for measuring thickness of coating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/022—Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/66—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by measuring frequency, phase shift or propagation time of electromagnetic or other waves, e.g. using ultrasonic flowmeters
- G01F1/662—Constructional details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/036—Analysing fluids by measuring frequency or resonance of acoustic waves
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/04—Analysing solids
- G01N29/12—Analysing solids by measuring frequency or resonance of acoustic waves
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/02—Indexing codes associated with the analysed material
- G01N2291/025—Change of phase or condition
- G01N2291/0256—Adsorption, desorption, surface mass change, e.g. on biosensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/02—Indexing codes associated with the analysed material
- G01N2291/028—Material parameters
- G01N2291/02854—Length, thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/04—Wave modes and trajectories
- G01N2291/042—Wave modes
- G01N2291/0426—Bulk waves, e.g. quartz crystal microbalance, torsional waves
Definitions
- the present invention relates to a device, in particular a measuring arrangement for measuring the layer thickness of one by means of a
- Vapor deposition on a substrate coatable layer and a corresponding method for coating thickness measurement are described.
- a portion of the vaporized material from a vapor space, typically from a vacuum chamber, and to supply it to a vibrating plate, typically a quartz crystal.
- the amount of material deposited on the vibrating plate leads to a change in the resonant frequency of the vibrating plate, which can be detected electronically.
- the shift of the resonance frequency is a measure of the mass and the thickness of the on the extent
- Vibrating plate accumulating layer With such vibrating plates, a volumetric flow of the evaporated material to be measured during the current coating process can be measured.
- the vibrating plate is spaced from the vacuum chamber to arrange. It is typically coupled with the vacuum chamber via a decoupling path in gas or steam. When decoupling a vapor jet from the vacuum chamber, it must be ensured that a sufficient amount of material vapor is output for a stable measurement signal. About the
- the condensation temperature of the decoupled steam jet is fallen below. This can lead, over the longitudinal extent of the decoupling path, to a part of the propagation propagating across the decoupling path
- measuring devices which have a plurality of vibrating plates, which can be acted upon successively with the material vapor to be measured.
- vibrating plates are typically arranged on a rotatably mounted carrier of a revolver measuring head. By rotation of the carrier individual vibrating plates arranged thereon can be successively held in the decoupled steam jet or on the vacuum chamber opposite end of the Auskoppeltier be positioned.
- the present invention is therefore based on the object, a
- the measuring arrangement should in this respect a lowest possible, but stable and steady influx vapor or gaseous
- the measuring arrangement should deliver particularly precise measurement results and at the same time one
- a measuring arrangement according to the independent patent claim 1 and with a method for measuring the layer thickness according to claim 13.
- Advantageous embodiments are each the subject of dependent claims.
- a measuring arrangement for measuring the layer thickness of a coatable by means of a vapor deposition on a substrate layer is provided.
- the measuring arrangement has a measuring head, which with at least one vibrating plate, typically with a
- the vibrating plate has a resonant frequency which can be determined by an electronic control or evaluation unit and which changes with the addition of a material to be measured on the vibrating plate.
- the electronic control connected or coupled to the vibrating plate is designed to precisely measure resonant frequency shifts of the vibrating plate due to deposition of materials. By means of an associated evaluation so that the thickness of the on the
- Vibrating plate knockdown layer determinable.
- the measuring arrangement is further provided with a decoupling path, which can be coupled or coupled to a first end with a vacuum chamber in gas or steam.
- the decoupling path further has a second end opposite the first end. At the second end, the decoupling path can be coupled to the measuring head in gas or steam-conducting manner or it is coupled to the measuring head in gas or steam-conducting manner.
- Vacuum chamber can be done.
- the decoupling path furthermore has at least one heating section or at least one cooling section.
- the Auskoppellay is partially or partially selectively heated or cooled.
- the amount of steam to be supplied to the measuring head via the decoupling path can be precisely controlled or controlled.
- condensate formation in the region of the decoupling path can be largely avoided.
- the amount of steam arriving at the vibrating plate can be reduced to a required maximum.
- Heating section can be an early condensation of over the
- the decoupling path may have only one heating section or only one cooling section.
- the heating section and an at least partially active heating of the decoupling path the amount of steam supplied to the vibrating plate can in principle be increased. Should the amount of steam or the volume flow be too large, alternatively or additionally by means of the cooling section, a controlled heating of the decoupling path.
- the decoupling path has both at least one heating section and at least one cooling section.
- the decoupling path has a heating section adjacent to its first end. In this way it can be achieved that the steam emerging from the vacuum chamber experiences no condensation at least at the beginning of the decoupling path, so that virtually the entire decoupled from the vacuum chamber and flowing into the decoupling steam is largely completely and without condensation losses over the decoupling distance to the vibrating plate conveyed.
- the decoupling path has at least one cooling section adjacent to its second end, that is to say facing the measuring head.
- Cooling section it is possible, the guided over or through the Auskoppelumble amount of steam or a corresponding volume flow immediately before the measuring head and immediately before hitting the
- the volume flow of the steam arriving at the vibrating plate can be reduced to a fraction of the volume flow coupled out of the vacuum chamber and coupled into the first end of the decoupling path. This reduction in the amount of steam or the volume flow contributes to an extension of the life and service life of the
- the Auskoppelhold is both with a
- Heating section and provided with a cooling section.
- Heating section and cooling section are in this case separated from each other in the longitudinal direction of the decoupling path. Heating section and
- Cooling section can, viewed in the longitudinal direction of the decoupling, also directly adjacent to each other or merge into each other.
- the decoupling path has at least one gas- or steam-carrying tube extending between the vacuum chamber and the measuring head.
- the pipe is in the area of
- Heating section surrounded by a heater.
- the heater can
- Condensation temperature of the steam in question are kept. An unwanted condensation of the steam flowing through the tube to the inner walls of the tube can be reduced to a minimum or be completely suppressed. A possible cleaning for the
- Auskoppelumble and for the steam-carrying pipe can be reduced in this way. Maintenance intervals for the decoupling path and the associated measuring arrangement can be extended in an advantageous manner. The efficiency of a hereby equipped vacuum coating system can be further increased thereby.
- the decoupling path in the region of the cooling section has a cold trap with at least one actively coolable
- the cold trap or the cooling section formed by the cold trap is typically of a cooling medium
- Temperature level is cooled. In the region of the cooling section and the cold trap condenses a predetermined subset of the above
- Cooling section at the second end of the Auskoppelumble compared to first end of the decoupling, a reduced by a predetermined amount of volume flow of the steam flows out.
- cooling section and the heating section adjoin one another directly, so that the steam flow flowing into the cooling section via the heating section causes a sudden cooling and thus a controlled condensation on the inner walls of the
- Cooling section or the cold trap experiences According to a further embodiment, it is provided that one of gas or
- Steam-permeable inner cross-section of the cooling section is greater than a gas or vapor flow-through internal cross-section of the
- Heating section may in particular downstream, that is the
- the inner cross section of the cooling section is larger than the inner cross section of the heating section, the inner surface of the actively cooled side wall section of the cold trap can be compared to
- Heating section can be effectively increased.
- Cooling section in the flow direction the condensation capacity of the cooling section can be increased.
- the cooling section can absorb a comparatively large amount of the condensing vapor on its inner wall, before the
- Cooling properties of the cooling section for example by deposition of a comparatively thick layer of the originally vaporous material would possibly be affected.
- the cooling section of the decoupling section must be strictly separated from one
- the vibrating plate is typically cooled separately so that the vapor or gaseous material condenses thereon.
- Auskoppelgiven is, based on the flow of the measuring head and the vibrating plate disposed thereon upstream, so that a defined subset of flowing through the Auskoppelorder
- Vibrating plate accumulating material can be reduced in this way by a predetermined amount.
- the cooling section and the
- cooling section and the heating section are thermally insulated from each other, so that a thermal energy exchange between the cooling section and
- Heating section is effectively prevented.
- a thermal decoupling of cold trap and heating serves to improve the respective efficiency of cold trap and heating.
- At least one heating power of the heating section is adjustable.
- the cooling capacity of the cooling section can also be designed to be adjustable.
- Control of the heating power and / or the cooling capacity thus by controlling the maximum and / or minimum heating or cooling temperature, can Condensation and flow behavior of the vapor in the
- Vacuum chamber decoupled amount of steam flows almost lossless through the heating section and so far reaches loss-free in the flow direction adjacent thereto cooling section.
- the steam volume flow arriving there can then be reduced to a predetermined extent that extends the service life and service life of the vibration plate.
- a cooling or heating power which is constant over the service life of the measuring arrangement can also be brought about. If, during continuous operation of the measuring arrangement, a subset of the material vapor flowing via the decoupling path is deposited on the inner wall of the cold trap, this can impair the cooling properties, in particular the thermal conductivity of the at least one actively coolable side wall section of the cold trap. By a controllability of the cold trap, such an effect can be counteracted.
- Heating section at least 50% to 90% of the total length of the
- the heating section serves, in particular, for a loss-free conduction of the steam through the decoupling path, while the cooling section is located only at the end of the heating section facing the measuring head for a defined reduction of the heating section
- the subdivision of the decoupling section into the heating section and the cooling section can vary in accordance with the geometric configurations of the heating section and / or the cooling section, in particular as a function of the internal cross sections of the heating section and the cooling section. Furthermore, the subdivision of the decoupling distance in heating section and the cooling section.
- the measuring head has at least two or more vibrating plates, which are arranged on a rotatable carrier and can be selectively brought into the region of a housing opening of the measuring head.
- the measuring head is designed in particular as a turret, so that by rotation of the measuring head by a predetermined angular range, a
- the vibrating plates can be successively brought into the region of a housing opening of the measuring head by rotating the carrier.
- the housing opening in question is in extension of the second end of the
- Decoupling path arranged. As soon as a vibrating plate is in the area of the housing opening of the measuring head, it is with the over the
- Auskoppelhold funded material vapor acted upon.
- rotating the carrier can move that vibrating plate outside the region of the housing opening and bring a new, unused vibrating plate into that region of the housing opening of the measuring head.
- vibrating platens can be exchanged in a defined and reproducible manner, for example during the course of a coating operation.
- a sealing insert is used in the housing opening of the housing of the measuring head, which is sealingly engageable with the carrier in the interior of the housing to the plant.
- Sealing insert penetration of the vapor stream into the interior of the housing of the measuring head can be widely prevented. So far unused and arranged outside the range of the housing opening of the measuring head vibrating plates can be effectively protected in this way against premature deposition of material vapor.
- the sealing insert in particular the space between the housing of the measuring head and the vibrating plate arranged within the housing is largely filled.
- the arranged on the housing sealing insert may also have a relatively small sliding or
- the sealing insert projects so far into the housing of the measuring head, so that only the vibration plate arranged in the working position or in the region of the housing opening is subjected to material vapor, while all other vibrating plates are applied via the sealing insert
- the invention relates to a method for measuring the layer thickness of a coatable by means of vapor deposition on a substrate layer. The procedure results from the
- a first step it is provided here to decouple a vapor or gaseous medium from a vacuum chamber and thereby
- the decoupling path is at least partially actively heated or actively cooled. In particular, it may be provided to heat a first section of the decoupling path and to actively cool a section of the decoupling section adjacent thereto in the longitudinal direction.
- a vapor deposition rate at the second end of the decoupling section facing away from the vacuum chamber is ultimately measured.
- the change in the vibration behavior of the vibrating plate is measured, which is a measure of the deposition rate or of the thickness of the layers accumulating on the vibrating plate.
- the thickness of the layer depositing on the vibrating plate is a direct measure of the layer thickness on a substrate arranged inside the vacuum chamber, while it is subjected to a coating process.
- Vibrating plate annealing layer can be a fraction of the
- Substrate within the vacuum chamber accumulating layer amount.
- a scaling or calibration factor between the layer thickness that can be measured on the vibrating plate and the actual layer thickness on the substrate located inside the vacuum chamber can be determined according to FIG.
- Configuration and operation of the cold trap or the cooling section of the decoupling path vary.
- a conclusion can be drawn about the thickness of the layer actually present on the substrate from the thickness of the layer which accumulates on the vibrating plate and can be measured by means of the vibrating plate.
- Fig. 1 is a schematic representation of the measuring arrangement in a first
- Fig. 2 is a further schematic representation of the measuring arrangement in
- Figure 3 is an enlarged schematic diagram of the second end of the
- the measuring arrangement 1 0 is connected to a
- Vacuum chamber 20 connected, in which typically to
- coating substrate 24 is arranged.
- the substrate is subjected within the vacuum chamber 20 to a surface treatment process, for example a coating procedure.
- the coating process is a wide variety of coating methods, typically
- Vacuum chamber 20 is designed for example for coating substrates for display applications or solar cells.
- the vacuum chamber 20 may in particular be designed to generate a plasma intended for the coating process.
- the vacuum chamber 20 is also suitable for plasma-assisted
- the vacuum chamber 20 for Coating process for example, the vacuum chamber 20 for
- the measurement arrangement can serve, inter alia, the layer thickness measurement of a selenium layer on the substrate 24 or on other layers already applied to the substrate 24.
- the measuring arrangement 10 has a decoupling path 1 2, which can be coupled or coupled to the vacuum chamber 20 in gas or vapor conducting manner.
- the decoupling path 1 2 is coupled with a first end 1 2a with the vacuum chamber 20 gas or steam.
- the decoupling path 1 2 is further coupled with its end remote from the vacuum chamber 20 1 2b, ie with a second end 1 2b with a measuring head 30 gas or Dampffusedd coupled. In the present embodiment, it is permanently coupled to the measuring head 30.
- the measuring head as will be explained later with reference to FIGS. 3 and 4, has at least one vibrating plate 50, 52, whose resonance or vibration behavior is electrically measurable, and which resonance or vibration behavior can be measured as a result of an attachment of material changes.
- the vibrating plate 50, 52 is typically cooled, so that the steam flow supplied to the vibrating plate 50, 52 undergoes condensation on the vibrating plate, as a result of which the vaporous or gaseous material attaches to the vibrating plate and thus its
- the decoupling path 1 By means of the decoupling path 1 2, a portion of the material vapor generated in the vacuum chamber 20 from the chamber 20 can be branched off. Within the chamber, a constant precipitation or a constant condensation of the relevant vaporous material would not be feasible due to the thermal conditions prevailing there. By means of the decoupling section 1 2, the vapor or gaseous material in an off the
- Vacuum chamber 20 lying area are conveyed, in which the suitable for measuring the film thickness thermal conditions and
- the decoupling path 1 2 has at or adjacent to its first end 1 2a a heating section 1 6, which is provided by means of a heater 26 shown in FIG.
- the Auskoppeltier 1 2 has in particular a steam-carrying tube 14, which extends from the vacuum chamber 20 to the measuring head 30. In the area of the heating section 1 6, the tube 14 is surrounded by the heater 26.
- the heater 26 can be single
- the heater 26, or their heating coil are presently arranged on the inside of a tube 14 enclosing the sleeve 25.
- the tube 14 can be kept at a predetermined temperature level, so that an early condensation of the guided in the tube vapor material is prevented.
- the Auskoppelrange 1 2 further includes a cooling section 1 8, which is located at the second end 1 2b of the Auskoppelrange 1 2.
- the cooling section 1 8 can directly adjoin the heating section 1 6. However, it can also be separated from it or thermally decoupled from the heating section 1 6.
- the cooling section 1 8 is designed in particular as a cold trap 28 and is provided with its own cooling 29.
- the cooling 29 can in particular be a hollow chamber structure in at least one
- a hollow chamber structure can be acted upon by a cooling medium and, accordingly, flowed through by a cooling medium located at a predetermined temperature level.
- a connecting piece 22 for fluidic coupling between Auskoppeltier 1 2 and measuring head 30 is provided at one of the vacuum chamber 20 remote from the end of the cooling section 1 8.
- a connecting piece 22 for fluidic coupling between Auskoppeltier 1 2 and measuring head 30 is provided at one of the vacuum chamber 20 remote from the end of the cooling section 1 8.
- an inflow 1 8a and a drain 1 8b for the cooling or refrigerant are further shown.
- a suitable coolant or refrigerant for example, water at room temperature or below in question.
- Cooling section 1 8 the heating section 1 6 and inlet and outlet 1 8a, 1 8b mechanically interconnected.
- Inner cross section QK which is greater than the inner cross section QH of the upstream thereto lying Edelungsabitess 1 6. Based on the length of the Auskoppelrange 1 2, the cooling section 1 8, a larger inner wall surface than the heating section 1 6 and thus a
- Heating section 1 6 per unit length even with the onset of condensation on the inner walls of the cooling section 1 8 an undiminished or effected by condensation hardly affected cooling that section.
- the combination of the heating section 16 and the downstream cooling section is advantageous insofar as that by means of the heating section
- Heating section 1 6 can be transported. There and with the arrival of the steam in the cooling section 1 8 can then take place a controlled or controllable condensation of the supplied material vapor to the
- the length of the heating section 16 is typically greater than the length of the cooling section 18 adjacent thereto in the longitudinal direction.
- the heating section 1 6 is at least twice, three times or four times as long as the cooling section 1 8.
- Cooling section 18 can be adapted to the respective process in the vacuum chamber 20 as well as to the material to be measured.
- the layer thickness of a selenium layer on a substrate 24 can be measured by means of the measuring arrangement 10 described here.
- the steam-carrying pipe 14 is represented as a single pipe extending directly from the vacuum chamber 20 to the measuring head 30, which in the region of the heating section 16 and in the region of the cooling section 18 each have an identical one
- Heating section 1 6 the radially expanded cooling section 1 8 over.
- the tube 14 or the tube formed therefrom At the end of the measuring head, the tube 14 or the tube formed therefrom
- Auskoppelset 1 2 designed to be largely open, as can be seen from the enlarged view of FIG. The output of the
- Auskoppelrange 1 2 and the second end 1 2b of the Auskoppelrange 1 2 is approximately in alignment with a housing opening 36 of the housing 34 of the
- the measuring head 30 has, inside its housing 34, a rotatably mounted carrier 32, which is rotatable or adjustable relative to a rotation axis 33 between various discrete positions.
- the carrier 32 is aligned in the housing 34 such that a arranged on the carrier 32
- Vibrating plate 50 comes to lie approximately in alignment with the housing opening 36. The respective vibrating plate 50 is thus over the
- Auskoppelset 1 2 exposed material vapor exposed.
- quartz plate vibrating plate 50 can be excited to oscillate, the frequency of which changes measurably with addition of previously vaporous condensed material.
- At least one further vibrating plate 52 is further arranged, which in the illustration of FIG. 3 in an outside the housing opening 36 lying area inside the housing 34 comes to rest.
- the housing opening 36 is further provided with an insert 40, which insert acts as a sealing insert. It has an outwardly projecting flange portion 42, which in the one shown in Fig. 4
- the sealing insert 40 is further provided with a projecting into the housing opening 36 stub 44.
- the nozzle 44 comes with its free and projecting into the housing 34 end with a seal 46 to the plant, which z. B. is formed as a sealing washer and disposed on the inside of the housing 34.
- Seal insert 40 and seal 46 are gas-or fluid-sealingly engageable with each other to the plant, so that the outside of the housing opening 36 and disposed inside the housing 34
- Vibrating plate 52 is widely protected from the penetrating into the housing 34 material vapor.
- the seal 46 or the sealing ring is typically made of a material with good sliding properties, so that a sealing arrangement between the seal 46 and sealing insert 40 is relatively simple and
- the housing 34, the carrier 32 and the measuring head 30 are typically made of a heat and acid resistant material, such as a steel of appropriate quality.
- the seal 46 may be made of pyrolytic boron nitride (PBM) or polyetheretherketone (PEEK), for example.
- PBM pyrolytic boron nitride
- PEEK polyetheretherketone
- a vibration plate 40 in working position in FIG. 4 is so covered with condensed matter that it loses its oscillation properties, it can be achieved by simply turning the carrier 32 relative to the latter
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Abstract
Description
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Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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KR1020197008103A KR102342107B1 (ko) | 2014-10-14 | 2015-10-08 | 기상 증착법을 위한 층 두께 측정을 위한 장치 및 방법 |
JP2017521149A JP6581191B2 (ja) | 2014-10-14 | 2015-10-08 | 気相成長法の層厚測定装置および方法 |
US15/519,137 US10684126B2 (en) | 2014-10-14 | 2015-10-08 | Apparatus and method for layer thickness measurement for a vapor deposition method |
KR1020177011136A KR101963987B1 (ko) | 2014-10-14 | 2015-10-08 | 기상 증착법을 위한 층 두께 측정을 위한 장치 및 방법 |
CN201580055498.4A CN107076538B (zh) | 2014-10-14 | 2015-10-08 | 用于针对汽相沉积法的层厚度测量的装置和方法 |
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DE102014014970.6 | 2014-10-14 | ||
DE102014014970.6A DE102014014970B4 (de) | 2014-10-14 | 2014-10-14 | Vorrichtung und Verfahren zur Schichtdickenmessung für Dampfabscheideverfahren |
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WO2016058905A1 true WO2016058905A1 (de) | 2016-04-21 |
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PCT/EP2015/073304 WO2016058905A1 (de) | 2014-10-14 | 2015-10-08 | Vorrichtung und verfahren zur schichtdickenmessung für dampfabscheideverfahren |
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US (1) | US10684126B2 (de) |
JP (1) | JP6581191B2 (de) |
KR (2) | KR101963987B1 (de) |
CN (1) | CN107076538B (de) |
DE (1) | DE102014014970B4 (de) |
WO (1) | WO2016058905A1 (de) |
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WO2019116082A1 (en) * | 2017-12-14 | 2019-06-20 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
Citations (3)
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JP2004059981A (ja) * | 2002-07-26 | 2004-02-26 | Matsushita Electric Works Ltd | 真空蒸着方法 |
US20100092665A1 (en) * | 2006-09-27 | 2010-04-15 | Tokyo Electron Limited | Evaporating apparatus, apparatus for controlling evaporating apparatus, method for controlling evaporating apparatus and method for using evaporating apparatus |
WO2013118341A1 (ja) * | 2012-02-10 | 2013-08-15 | 日東電工株式会社 | 蒸着用坩堝及び蒸着装置並びに蒸着方法 |
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JPS60220810A (ja) | 1984-04-17 | 1985-11-05 | Mitsubishi Electric Corp | 膜厚測定方法 |
JPH0397859A (ja) | 1989-09-08 | 1991-04-23 | Toshiba Corp | 蒸発装置 |
FR2670218B1 (fr) | 1990-12-06 | 1993-02-05 | Innovatique Sa | Procede de traitement de metaux par depot de matiere, et pour la mise en óoeuvre dudit procede. |
US5792273A (en) | 1997-05-27 | 1998-08-11 | Memc Electric Materials, Inc. | Secondary edge reflector for horizontal reactor |
JPH11222670A (ja) | 1998-02-06 | 1999-08-17 | Ulvac Corp | 膜厚モニター及びこれを用いた成膜装置 |
JP2001308082A (ja) * | 2000-04-20 | 2001-11-02 | Nec Corp | 液体有機原料の気化方法及び絶縁膜の成長方法 |
US6558735B2 (en) | 2001-04-20 | 2003-05-06 | Eastman Kodak Company | Reusable mass-sensor in manufacture of organic light-emitting devices |
US6668618B2 (en) | 2001-04-23 | 2003-12-30 | Agilent Technologies, Inc. | Systems and methods of monitoring thin film deposition |
TWI264473B (en) * | 2001-10-26 | 2006-10-21 | Matsushita Electric Works Ltd | Vacuum deposition device and vacuum deposition method |
JP4366226B2 (ja) | 2004-03-30 | 2009-11-18 | 東北パイオニア株式会社 | 有機elパネルの製造方法、有機elパネルの成膜装置 |
JP5127372B2 (ja) | 2007-09-03 | 2013-01-23 | キヤノン株式会社 | 蒸着装置 |
DE102010055675A1 (de) | 2010-12-22 | 2012-06-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Haltevorrichtung für Substrate sowie Verfahren zur Beschichtung eines Substrates |
WO2012138242A1 (en) * | 2011-04-05 | 2012-10-11 | Brylev Sergey Fedorovich | Management system of several snipers |
EP2508645B1 (de) | 2011-04-06 | 2015-02-25 | Applied Materials, Inc. | Verdampfungssystem mit Messeinheit |
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2014
- 2014-10-14 DE DE102014014970.6A patent/DE102014014970B4/de active Active
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2015
- 2015-10-08 US US15/519,137 patent/US10684126B2/en active Active
- 2015-10-08 KR KR1020177011136A patent/KR101963987B1/ko active IP Right Grant
- 2015-10-08 KR KR1020197008103A patent/KR102342107B1/ko active IP Right Grant
- 2015-10-08 WO PCT/EP2015/073304 patent/WO2016058905A1/de active Application Filing
- 2015-10-08 CN CN201580055498.4A patent/CN107076538B/zh active Active
- 2015-10-08 JP JP2017521149A patent/JP6581191B2/ja active Active
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2004059981A (ja) * | 2002-07-26 | 2004-02-26 | Matsushita Electric Works Ltd | 真空蒸着方法 |
US20100092665A1 (en) * | 2006-09-27 | 2010-04-15 | Tokyo Electron Limited | Evaporating apparatus, apparatus for controlling evaporating apparatus, method for controlling evaporating apparatus and method for using evaporating apparatus |
WO2013118341A1 (ja) * | 2012-02-10 | 2013-08-15 | 日東電工株式会社 | 蒸着用坩堝及び蒸着装置並びに蒸着方法 |
Also Published As
Publication number | Publication date |
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KR20190032650A (ko) | 2019-03-27 |
US10684126B2 (en) | 2020-06-16 |
DE102014014970A1 (de) | 2016-04-14 |
CN107076538A (zh) | 2017-08-18 |
KR20170066458A (ko) | 2017-06-14 |
CN107076538B (zh) | 2019-10-15 |
DE102014014970B4 (de) | 2020-01-02 |
KR101963987B1 (ko) | 2019-03-29 |
US20170241776A1 (en) | 2017-08-24 |
JP6581191B2 (ja) | 2019-09-25 |
KR102342107B1 (ko) | 2021-12-22 |
JP2017532565A (ja) | 2017-11-02 |
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