WO2016047745A1 - Liquide de revêtement, procédé de production de dispositif à del l'utilisant, et dispositif à del - Google Patents
Liquide de revêtement, procédé de production de dispositif à del l'utilisant, et dispositif à del Download PDFInfo
- Publication number
- WO2016047745A1 WO2016047745A1 PCT/JP2015/077076 JP2015077076W WO2016047745A1 WO 2016047745 A1 WO2016047745 A1 WO 2016047745A1 JP 2015077076 W JP2015077076 W JP 2015077076W WO 2016047745 A1 WO2016047745 A1 WO 2016047745A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating solution
- silane compound
- coating liquid
- reflective layer
- ratio
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 230
- 239000011248 coating agent Substances 0.000 title claims abstract description 223
- 239000007788 liquid Substances 0.000 title claims abstract description 81
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- -1 silane compound Chemical class 0.000 claims abstract description 95
- 239000000758 substrate Substances 0.000 claims abstract description 65
- 229910000077 silane Inorganic materials 0.000 claims abstract description 62
- 239000012463 white pigment Substances 0.000 claims abstract description 39
- 239000002904 solvent Substances 0.000 claims abstract description 38
- 230000001588 bifunctional effect Effects 0.000 claims abstract description 19
- 239000002245 particle Substances 0.000 claims description 79
- 238000001723 curing Methods 0.000 claims description 57
- 238000006243 chemical reaction Methods 0.000 claims description 55
- 238000000034 method Methods 0.000 claims description 33
- 239000010954 inorganic particle Substances 0.000 claims description 29
- 239000002734 clay mineral Substances 0.000 claims description 25
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- 150000005846 sugar alcohols Polymers 0.000 claims description 9
- 238000013007 heat curing Methods 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 160
- 239000000243 solution Substances 0.000 description 127
- 150000001875 compounds Chemical class 0.000 description 80
- 239000010408 film Substances 0.000 description 43
- 229910052751 metal Inorganic materials 0.000 description 39
- 239000002184 metal Substances 0.000 description 39
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 32
- 239000000047 product Substances 0.000 description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 26
- 239000000203 mixture Substances 0.000 description 26
- 229920001296 polysiloxane Polymers 0.000 description 25
- 239000011230 binding agent Substances 0.000 description 23
- 239000000126 substance Substances 0.000 description 20
- 230000008859 change Effects 0.000 description 19
- 229920005989 resin Polymers 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 238000000605 extraction Methods 0.000 description 15
- 238000002156 mixing Methods 0.000 description 15
- 150000004703 alkoxides Chemical class 0.000 description 14
- 239000010419 fine particle Substances 0.000 description 14
- 229910044991 metal oxide Inorganic materials 0.000 description 13
- 150000004706 metal oxides Chemical class 0.000 description 13
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 239000013522 chelant Substances 0.000 description 12
- 239000010445 mica Substances 0.000 description 12
- 229910052618 mica group Inorganic materials 0.000 description 12
- 239000003960 organic solvent Substances 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 239000000377 silicon dioxide Substances 0.000 description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 8
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 8
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 125000000962 organic group Chemical group 0.000 description 7
- 125000004430 oxygen atom Chemical group O* 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 239000011164 primary particle Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 229910052726 zirconium Inorganic materials 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 229910052604 silicate mineral Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 229910021647 smectite Chemical group 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 229910052582 BN Inorganic materials 0.000 description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 4
- 238000007088 Archimedes method Methods 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 4
- 229920006362 Teflon® Polymers 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 239000000440 bentonite Substances 0.000 description 4
- 229910000278 bentonite Inorganic materials 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- 229910002012 Aerosil® Inorganic materials 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910018557 Si O Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910021482 group 13 metal Inorganic materials 0.000 description 3
- 229940094522 laponite Drugs 0.000 description 3
- XCOBTUNSZUJCDH-UHFFFAOYSA-B lithium magnesium sodium silicate Chemical compound [Li+].[Li+].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Na+].[Na+].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3 XCOBTUNSZUJCDH-UHFFFAOYSA-B 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229910052901 montmorillonite Inorganic materials 0.000 description 3
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 3
- 238000001579 optical reflectometry Methods 0.000 description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 3
- 229910052628 phlogopite Inorganic materials 0.000 description 3
- 229960005235 piperonyl butoxide Drugs 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- BGWWGDVCZYRRSZ-UHFFFAOYSA-N C=1C=CC=CC=1O[SiH](OC=1C=CC=CC=1)OC1=CC=CC=C1 Chemical compound C=1C=CC=CC=1O[SiH](OC=1C=CC=CC=1)OC1=CC=CC=C1 BGWWGDVCZYRRSZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- WBDVBAABEUKEGA-UHFFFAOYSA-N [Si].[Si].[Si].[Si].[K] Chemical compound [Si].[Si].[Si].[Si].[K] WBDVBAABEUKEGA-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- AWQTZFCYSLRFJO-UHFFFAOYSA-N diethoxy(methoxy)silane Chemical compound CCO[SiH](OC)OCC AWQTZFCYSLRFJO-UHFFFAOYSA-N 0.000 description 2
- GAURFLBIDLSLQU-UHFFFAOYSA-N diethoxy(methyl)silicon Chemical compound CCO[Si](C)OCC GAURFLBIDLSLQU-UHFFFAOYSA-N 0.000 description 2
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 2
- JVUVKQDVTIIMOD-UHFFFAOYSA-N dimethoxy(dipropyl)silane Chemical compound CCC[Si](OC)(OC)CCC JVUVKQDVTIIMOD-UHFFFAOYSA-N 0.000 description 2
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 2
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- YGANSGVIUGARFR-UHFFFAOYSA-N dipotassium dioxosilane oxo(oxoalumanyloxy)alumane oxygen(2-) Chemical compound [O--].[K+].[K+].O=[Si]=O.O=[Al]O[Al]=O YGANSGVIUGARFR-UHFFFAOYSA-N 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000002223 garnet Substances 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 229920006015 heat resistant resin Polymers 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical group O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- AZJYLVAUMGUUBL-UHFFFAOYSA-A u1qj22mc8e Chemical class [F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].O=[Si]=O.O=[Si]=O.O=[Si]=O.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3 AZJYLVAUMGUUBL-UHFFFAOYSA-A 0.000 description 2
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- 238000004062 sedimentation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- KCTGOQZIKPDZNK-UHFFFAOYSA-N tetrapentyl silicate Chemical compound CCCCCO[Si](OCCCCC)(OCCCCC)OCCCCC KCTGOQZIKPDZNK-UHFFFAOYSA-N 0.000 description 1
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- MYWQGROTKMBNKN-UHFFFAOYSA-N tributoxyalumane Chemical compound [Al+3].CCCC[O-].CCCC[O-].CCCC[O-] MYWQGROTKMBNKN-UHFFFAOYSA-N 0.000 description 1
- HSDAZXVGQVMFAY-UHFFFAOYSA-N tributyl methyl silicate Chemical compound CCCCO[Si](OC)(OCCCC)OCCCC HSDAZXVGQVMFAY-UHFFFAOYSA-N 0.000 description 1
- PZOOLKGCOFWELU-UHFFFAOYSA-N tributyl propyl silicate Chemical compound CCCCO[Si](OCCC)(OCCCC)OCCCC PZOOLKGCOFWELU-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- CXZMPNCYSOLUEK-UHFFFAOYSA-N triethyl propyl silicate Chemical compound CCCO[Si](OCC)(OCC)OCC CXZMPNCYSOLUEK-UHFFFAOYSA-N 0.000 description 1
- WSNJABVSHLCCOX-UHFFFAOYSA-J trilithium;trimagnesium;trisodium;dioxido(oxo)silane;tetrafluoride Chemical compound [Li+].[Li+].[Li+].[F-].[F-].[F-].[F-].[Na+].[Na+].[Na+].[Mg+2].[Mg+2].[Mg+2].[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O WSNJABVSHLCCOX-UHFFFAOYSA-J 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- WKEXHTMMGBYMTA-UHFFFAOYSA-N trimethyl propyl silicate Chemical compound CCCO[Si](OC)(OC)OC WKEXHTMMGBYMTA-UHFFFAOYSA-N 0.000 description 1
- OMBAQAOBNOSBNU-UHFFFAOYSA-N tripentoxy(propyl)silane Chemical compound CCCCCO[Si](CCC)(OCCCCC)OCCCCC OMBAQAOBNOSBNU-UHFFFAOYSA-N 0.000 description 1
- XJXSSNSCWGKDOW-UHFFFAOYSA-N tripentoxysilane Chemical compound CCCCCO[SiH](OCCCCC)OCCCCC XJXSSNSCWGKDOW-UHFFFAOYSA-N 0.000 description 1
- AMUIJRKZTXWCEA-UHFFFAOYSA-N triphenoxy(propyl)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(CCC)OC1=CC=CC=C1 AMUIJRKZTXWCEA-UHFFFAOYSA-N 0.000 description 1
- OZWKZRFXJPGDFM-UHFFFAOYSA-N tripropoxysilane Chemical compound CCCO[SiH](OCCC)OCCC OZWKZRFXJPGDFM-UHFFFAOYSA-N 0.000 description 1
- MDDPTCUZZASZIQ-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]alumane Chemical compound [Al+3].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-] MDDPTCUZZASZIQ-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85909—Post-treatment of the connector or wire bonding area
- H01L2224/8592—Applying permanent coating, e.g. protective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Definitions
- the present invention relates to a coating solution, an LED device manufacturing method using the same, and an LED device.
- a phosphor such as a YAG phosphor has been placed in the vicinity of a gallium nitride (GaN) blue LED (Light Emitting Diode) chip, and has received blue light and blue light emitted from the blue LED chip.
- GaN gallium nitride
- An LED device that obtains white light by mixing yellow light emitted from a phosphor is widely used.
- various phosphors are arranged in the vicinity of the blue LED chip, and blue light emitted from the blue LED chip and red light and green light emitted from the phosphor upon receiving blue light are mixed to obtain white light.
- Equipment has also been developed.
- White LED devices have a variety of uses, for example, there is a demand as an alternative to fluorescent lamps and incandescent lamps.
- Such an illuminating device has a configuration in which a plurality of white LED devices are combined, and how to increase the light extraction efficiency of each white LED device is important in realizing cost reduction and long life. come.
- a reflector having a high light reflectance is disposed around the LED element.
- Such a reflector is generally formed of metal plating or the like.
- a reflector made of metal plating cannot be formed on the entire surface of the substrate in order to prevent electrical conduction. Therefore, there is a problem that light is absorbed by the substrate in the region where the reflector is not formed.
- Patent Document 1 a reflector in which metal plating is covered with a resin layer
- Patent Document 2 a reflector in which metal plating is covered with a white resin layer
- Patent Document 3 a method of creating a reflective layer made of light diffusing particles and a ceramic binder on an LED substrate has been proposed.
- the reflector is made of resin, or when the reflector surface made of metal plating is coated with resin as in the technique of Patent Document 1, the resin deteriorates due to heat or light, and the light reflection of the reflective layer over time. There is a problem that the property is lowered or electricity is conducted. In particular, in applications where a large amount of light is required, such as in-vehicle headlights, the resin is likely to deteriorate.
- Patent Document 3 if the reflector surface is covered with a reflective layer made of light diffusing particles and a ceramic binder, a decrease in reflectance due to coloring as shown in Patent Document 2 can be suppressed. .
- the coating solution of Patent Document 3 has a problem that cracks are likely to occur during curing because of a large volume change (volume shrinkage) due to curing.
- volume shrinkage volume change
- the thickness of the reflective layer in order to increase the reflectivity it is necessary to increase the number of coatings, and there is a problem that the tact time increases.
- the reflective layer obtained by increasing the number of coatings tends to be difficult to obtain a sufficient reflectivity because it is not homogeneous or has a low density.
- the present invention has been made in view of the above circumstances. For example, when a coating layer formed on a substrate of an LED device is cured to obtain a reflective layer, cracks at the time of curing are satisfactorily suppressed, and high reflectance is achieved. It is an object of the present invention to provide a coating liquid capable of obtaining a cured film that has a reflectance and can maintain the reflectance over a long period of time, and an LED device using the coating liquid.
- R4 (mol%) both conditions of the following formula 1 and formula 2 are satisfied, 0 ⁇ R2 ⁇ 40 (Formula 1)
- 0 ⁇ R4 / R3 ⁇ 2 (Formula 2)
- the volume of the coating solution is A and the volume of the cured product obtained by heat-curing the coating solution at 150 ° C.
- a substrate, an LED element disposed on the substrate, a reflective layer disposed around the LED element on the substrate, and a wavelength conversion layer disposed on the light emitting direction of the LED element The LED device, wherein the reflective layer is a cured film of the coating liquid according to any one of [1] to [9].
- a coating layer formed on a substrate of an LED device is cured to obtain a reflective layer, cracks during curing are satisfactorily suppressed, and the reflectance is high. It is possible to provide a coating liquid capable of obtaining a cured film that can be maintained for a long period of time and an LED device using the coating liquid.
- the coating liquid of the present invention is a composition for forming a reflective layer of an LED device, and the coating liquid contains a white pigment, a silane compound, and a solvent.
- the coating liquid may contain inorganic particles, clay mineral particles, a silane coupling agent, and the like.
- a resin is often used for the binder of the reflective layer of the conventional LED device.
- the resin may be colored or deteriorated by heat or light, and there has been a problem that the light extraction efficiency tends to decrease.
- it has been studied to form a reflective layer by curing a coating film of a coating solution containing a polysiloxane precursor and a white pigment.
- the volume change of the coating film when curing the coating film is large, and cracks are likely to occur due to the stress. This crack is likely to occur particularly when the thickness of the coating film is large.
- the reflective layer having such a crack has a low reflectivity and causes a reduction in light extraction efficiency of the LED device.
- the coating liquid of the present invention 1) reduces the volume change due to curing, and 2) reduces the content ratio of the tetrafunctional silane compound in the polysiloxane precursor. Thereby, generation
- the solvent content is preferably kept below a certain level.
- the content ratio of the tetrafunctional silane compound By setting the content ratio of the tetrafunctional silane compound to a certain value or less, the hardness (or crosslinking density) of the cured product of the coating film can be prevented from becoming excessively high, and the stress generated in the coating film can be alleviated. As a result, a cured film having a high reflectance can be obtained by suppressing cracks during curing.
- the coating solution since the coating solution has a small solvent content, it can be formed into a thick film even with a small number of coatings. Thereby, the obtained cured film is homogeneous and dense, and can have a higher reflectance. As a result, the light extraction efficiency of the LED device can be increased.
- the binder of the reflective layer obtained from the coating solution is polysiloxane, the reflective layer is hardly deteriorated by light or heat. Therefore, an LED device having a reflective layer made of a cured film of the coating liquid can maintain high light extraction efficiency over a long period of time.
- the coating liquid of the present invention contains an alkoxysilane compound.
- the alkoxysilane compound is a compound that is hydrolyzed and polycondensed into a polysiloxane when the coating solution is cured. And polysiloxane becomes a binder of the above-mentioned reflective layer.
- the alkoxysilane compound includes at least one of a bifunctional alkoxysilane compound, a trifunctional alkoxysilane compound, and a tetrafunctional alkoxysilane compound.
- the ratio of the bifunctional alkoxysilane compound to the total amount of the alkoxysilane compound is R2 (mol%)
- the ratio of the trifunctional alkoxysilane compound is R3 (mol%)
- the ratio of the tetrafunctional alkoxysilane compound is R4 (mol%).
- the polysiloxane when R2 is 40 or more, the polysiloxane contains a relatively large amount of organic groups derived from bifunctional alkoxysilane. As a result, it is difficult to form a sufficient siloxane bond between the reflective layer obtained by curing the coating solution and the OH group or the like on the substrate surface, and the adhesion between the reflective layer and the substrate is lowered. In addition, the gas barrier property of the reflective layer may be reduced, and the resistance to sulfurization may be reduced.
- the value of R4 / R3 is preferably 2 or less, more preferably 0 ⁇ R4 / R3 ⁇ 1.5, and further preferably 0 ⁇ R4 / R3 ⁇ 1.
- the ratio of the bifunctional alkoxysilane compound, the trifunctional alkoxysilane compound, and the tetrafunctional alkoxysilane compound with respect to the total amount of the alkoxysilane compound in the coating solution is determined by the solid Si of the sample obtained by drying and solidifying the coating solution at 150 ° C. Each can be determined from the NMR spectrum.
- the spectrum of solid-state Si-NMR (Nuclear Magnetic Resonance) will be described.
- the tetrafunctional alkoxysilane compound polymer (polysiloxane) is represented by the SiO 2 ⁇ nH 2 O characteristic formula, but structurally, oxygen atoms O are bonded to the apexes of the silicon atom Si tetrahedron. These silicon atoms have a structure in which silicon atoms Si are further bonded to these oxygen atoms O and spread in a net shape.
- the schematic diagrams (A) and (B) below show the Si—O net structure, ignoring the tetrahedral structure.
- the schematic diagram (A) shows a case where all of the oxygen atoms O are bonded to other Si atoms in the Si—O net structure.
- the schematic diagram (B) shows a case where part of the oxygen atom O is replaced with another member (here, —H) in the Si—O net structure.
- the Si atoms derived from the tetrafunctional alkoxysilane compound include four atoms (Q 4 ) bonded to —OSi, and three Si atoms as shown in the schematic diagram (B). Atom (Q 3 ) or the like bonded to —OSi.
- a peak based on the silicon atoms derived from the tetrafunctional alkoxysilane compound are collectively referred to as Q sites, the peak derived from each atom, Q 4 peak, Q 3 peak, called ....
- Q 0 to Q 4 peaks derived from the Q site are referred to as a Q n peak group.
- the Q n peak group of the silica film containing no organic substituent is usually observed as a multimodal peak continuous in the region of ⁇ 80 to ⁇ 130 ppm chemical shift.
- a silicon atom that is, silicon derived from a trifunctional alkoxysilane compound in which three oxygen atoms are bonded and one non-oxygen atom (usually carbon) is bonded is generally referred to as a T site. Is done.
- the peak derived from the T site is observed as each peak of T 0 to T 3 as in the case of the Q site.
- each peak derived from the T site is referred to as a Tn peak group.
- the T n peak group is generally observed as a multimodal peak continuous in a region on the higher magnetic field side (usually chemical shift of ⁇ 80 to ⁇ 40 ppm) than the Q n peak group.
- a silicon atom that is, silicon derived from a bifunctional alkoxysilane compound in which two oxygen atoms are bonded and two atoms other than oxygen (usually carbon) are bonded is generally referred to as a D site. Is done.
- the peak derived from the D site is also observed as each peak of D 0 to D n (D n peak group), which is further than the peak group of Q n and T n. It is observed as a multimodal peak in the region on the high magnetic field side (usually the region with a chemical shift of ⁇ 3 to ⁇ 40 ppm).
- FIG. 3 is an example of the spectrum of solid-state Si-NMR, and the spectrum of the cured product of the alkoxysilane compound contained in the coating solution of the present invention is not limited to this.
- the horizontal axis indicates the chemical shift
- the vertical axis indicates “relative strength” depending on the abundance of the compound having each structure.
- D11 indicates actual measurement data.
- D12 indicates data modeled by a Gaussian function.
- D13 shows a difference spectrum.
- the peak P11 represents the D n peak group, the peak top of the D n peak group is present in the vicinity of chemical shift -20.0Ppm.
- the peak P12 represents the T n peak group, the peak top of the T n peak group is present in the vicinity of chemical shift -60.0Ppm.
- the peak P13 represents a Q n peak group, the peak top of the Q n peak group is present in the vicinity of a chemical shift -100.0 ⁇ -110 ppm. That is, the spectrum of FIG. 3 shows that silicon derived from a bifunctional alkoxysilane compound, silicon derived from a trifunctional alkoxysilane compound, and silicon derived from a tetrafunctional alkoxysilane compound are included.
- the area ratio of the respective peak groups of D n , T n , and Q n is equal to the molar ratio of silicon atoms placed in the environment corresponding to each peak group. Therefore, Q n peak group, T n peak group, and to the total area of the D n peak group, the ratio of the area of each peak group, the total amount of the alkoxysilane compound contained in the coating liquid (the total molar amount of silicon atoms) And the molar ratio of each alkoxysilane compound (tetrafunctional alkoxysilane compound, trifunctional alkoxysilane compound, and bifunctional alkoxysilane compound).
- the alkoxysilane compound may be in a monomer state; however, at least a part is preferably a polymer (oligomer) of bifunctional alkoxysilane, trifunctional alkoxysilane, or tetrafunctional alkoxysilane. If the alkoxysilane compound is an oligomer in which several to several tens of monomers are polymerized in advance, shrinkage when the coating solution is cured is reduced, and cracks are less likely to occur when the reflective layer is formed.
- each R 1 independently represents an alkyl group or a phenyl group, preferably an alkyl group having 1 to 5 carbon atoms, or a phenyl group.
- tetrafunctional alkoxysilane compounds include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, tetrapentyloxysilane, tetraphenyloxysilane, trimethoxymonoethoxysilane, dimethoxydiethoxysilane, and triethoxymono.
- Trifunctional alkoxysilane compound examples include compounds represented by the following general formula (III).
- R 2 Si (OR 3 ) 3 (III) In the general formula (III), each R 3 independently represents an alkyl group or a phenyl group, preferably an alkyl group having 1 to 5 carbon atoms, or a phenyl group.
- R 2 represents a hydrogen atom or an alkyl group.
- trifunctional alkoxysilane compound examples include trimethoxysilane, triethoxysilane, tripropoxysilane, tripentyloxysilane, triphenyloxysilane, dimethoxymonoethoxysilane, diethoxymonomethoxysilane, dipropoxymonomethoxysilane, Dipropoxymonoethoxysilane, dipentyloxylmonomethoxysilane, dipentyloxymonoethoxysilane, dipentyloxymonopropoxysilane, diphenyloxylmonomethoxysilane, diphenyloxymonoethoxysilane, diphenyloxymonopropoxysilane, methoxyethoxypropoxysilane, monopropoxydimethoxy Silane, monopropoxydiethoxysilane, monobutoxydimethoxysilane, monopentyloxydiethoxysila Monohydrosilane compounds such as monophenyloxydieth,
- R 2 represented by the general formula (III) of these trifunctional alkoxysilane compounds is a methyl group
- the hydrophobicity of the resulting reflective layer surface becomes low.
- the composition for forming a wavelength conversion layer becomes easy to spread.
- the adhesion between the reflective layer and the wavelength conversion layer is enhanced.
- the trifunctional alkoxysilane compound in which R 2 represented by the general formula (III) is a methyl group include methyltrimethoxysilane and methyltriethoxysilane, and is particularly preferably methyltrimethoxysilane. .
- each R 5 independently represents an alkyl group or a phenyl group, preferably an alkyl group having 1 to 5 carbon atoms, or a phenyl group.
- R 4 represents a hydrogen atom or an alkyl group.
- bifunctional alkoxysilane compound examples include dimethoxysilane, diethoxysilane, dipropoxysilane, dipentyloxysilane, diphenyloxysilane, methoxyethoxysilane, methoxypropoxysilane, methoxypentyloxysilane, methoxyphenyloxysilane, ethoxy Propoxysilane, ethoxypentyloxysilane, ethoxyphenyloxysilane, methyldimethoxysilane, methylmethoxyethoxysilane, methyldiethoxysilane, methylmethoxypropoxysilane, methylmethoxypentyloxysilane, methylmethoxyphenyloxysilane, ethyldipropoxysilane, ethyl Methoxypropoxysilane, ethyldipentyloxysilane, ethyldiphenyloxysilane,
- An oligomer that can be an alkoxysilane compound is prepared by mixing a bifunctional alkoxysilane compound, a trifunctional alkoxysilane compound, and a tetrafunctional alkoxysilane compound in a desired ratio and reacting them in the presence of an acid catalyst, water, and a solvent. can get.
- the molecular weight of the oligomer is adjusted by the reaction time, temperature, water concentration, and the like.
- the oligomer preferably has a weight average molecular weight of 500 to 20000 as measured by GPC (gel permeation chromatograph), more preferably 1000 to 10,000, and even more preferably 1500 to 6000. If the degree of polymerization of the oligomer is too high, the viscosity of the coating solution may become excessively high, or the alkoxysilane compound may precipitate in the coating solution.
- GPC gel permeation chromatograph
- solvents for preparing oligomers include monohydric alcohols such as methanol, ethanol, propanol and n-butanol; alkyl carboxylic acid esters such as methyl-3-methoxypropionate and ethyl-3-ethoxypropionate; ethylene Polyhydric alcohols such as glycol, diethylene glycol, propylene glycol, glycerin, trimethylolpropane, hexanetriol; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl Ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, pro Monoethers of polyhydric alcohols such as lenglycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol
- the total amount of alkoxysilane compound contained in the coating solution is preferably 3 to 40% by mass with respect to the total mass of components other than the solvent (including water) contained in the coating solution. More preferably, it is 5 to 30% by mass.
- the total amount of the alkoxysilane compound is less than 3% by mass, the white pigment is not sufficiently bound in the resulting reflective layer. As a result, pigment powder is easily generated on the surface of the reflective layer.
- the total amount of the alkoxysilane compound exceeds 40% by mass, the amount of the white pigment is relatively reduced, and the light reflectivity of the reflective layer tends to be low.
- the solvent contained in the coating solution includes water or an organic solvent.
- the organic solvent may be any organic solvent that is compatible with the aforementioned alkoxysilane compound and can uniformly disperse the white pigment or the like. Examples of such organic solvents include monohydric alcohols, dihydric or higher polyhydric alcohols, ester solvents and the like.
- Examples of monohydric alcohols include methanol, ethanol, propanol, butanol and the like.
- the polyhydric alcohol may be either a diol or a triol.
- Examples of the polyhydric alcohol include ethylene glycol, propylene glycol, diethylene glycol, glycerin, 1,3-butanediol, 1,4-butanediol, and preferably ethylene glycol, propylene glycol, 1,3-butane. Diol, 1,4-butanediol and the like are included.
- Examples of the ester solvent include methyl-3-methoxypropionate, methyl acetate, ethyl acetate, propyl acetate, butyl acetate and the like.
- the organic solvent preferably contains at least one of a monohydric alcohol and a polyhydric alcohol.
- the solvent can further include water.
- water When water is contained in the coating solution, water enters between the layers of the clay mineral particles, the clay mineral particles swell, and the viscosity of the coating solution is more likely to increase.
- the water content is preferably 0 to 30% by mass, more preferably 0 to 20% by mass, based on the entire solvent.
- the total amount of the solvent contained in the coating solution is preferably 10 to 45% by mass and more preferably 20 to 40% by mass with respect to the total amount of the coating solution from the viewpoint of setting the volume ratio before and after curing in the above range. preferable. If the total amount of the solvent is excessively small, the fluidity of the coating solution becomes too low and the coating stability tends to be lowered. On the other hand, if the total amount of the solvent is excessively large, the volume change before and after curing becomes too large.
- the white pigment contained in the coating liquid plays a role of reflecting light emitted from the LED element in the reflective layer.
- the white pigment is a particle having an average primary particle size of more than 100 nm and 20 ⁇ m or less, and a refractive index of light having a wavelength of 587.6 nm of 1.6 or more.
- the average primary particle size of the white pigment is preferably larger than 100 nm and not larger than 10 ⁇ m, more preferably 200 nm to 2.5 ⁇ m.
- the “average primary particle size” refers to the value of D50 measured with a laser diffraction particle size distribution meter. Examples of the laser diffraction particle size distribution measuring device include a laser diffraction particle size distribution measuring device manufactured by Shimadzu Corporation.
- white pigments include barium carbonate, barium sulfate, zinc oxide, magnesium oxide, calcium oxide, titanium oxide, aluminum oxide, zirconium oxide, zinc sulfide, barium sulfate, yttrium oxide, aluminum hydroxide, boron nitride, aluminum nitride, Examples include potassium titanate, barium titanate, aluminum titanate, strontium titanate, calcium titanate, magnesium titanate, and hydroxyapatite. Among these, titanium oxide, aluminum oxide, barium sulfate, zinc oxide, yttrium oxide, boron nitride, and aluminum nitride are particularly preferable.
- the resulting reflective layer has high thermal conductivity. As a result, the heat generated from the LED element can be quickly released from the substrate. Therefore, the temperature of the LED device can be kept low, and the device life can be extended.
- the amount of the white pigment contained in the coating solution is preferably 50 to 98% by mass, more preferably 60 to 98% by mass, and still more preferably based on the mass of the solid content after heat curing of the coating solution. Is 70 to 95% by mass.
- the mass of the solid content after heat curing of the coating solution is the mass of a cured product obtained by curing the coating solution at 150 ° C. for 1 hour.
- the amount of the white pigment can be specified by analyzing the blending amount at the time of preparing the coating solution and the following procedures 1) to 3). That is, 1) SEM-EDX analysis is performed on the cured product obtained by curing the coating solution at 150 ° C. for 1 hour, and the contrast of the SEM photograph and the ratio of each element in the area are obtained. 2) The cured product of the coating solution is structurally analyzed by XRD to identify the type of white pigment. 3) The content ratio of the white pigment specified in 2) above in the cured product is determined from the elemental ratio determined in 1) above.
- the coating solution may further contain inorganic particles.
- the inorganic particles are particles made of an inorganic material other than the white pigment described above.
- the inorganic particles can be, for example, metal oxide fine particles having an average particle size of 5 nm or more and less than 100 nm.
- metal oxide fine particles When the metal oxide fine particles are contained in the coating solution, fine irregularities are generated on the surface of the resulting reflective layer, and an anchor effect is easily exhibited between the reflective layer and other layers.
- metal oxide fine particles are contained in the coating solution, the stress generated in the film during the polycondensation of the alkoxysilane compound is relaxed, and cracks are less likely to occur in the resulting reflective layer.
- the type of metal oxide fine particles is not particularly limited, but is relatively easy to obtain from the group of aluminum oxide, zirconium oxide, zinc oxide, tin oxide, yttrium oxide, cerium oxide, titanium oxide, copper oxide, and bismuth oxide. One or more selected metal oxide fine particles are preferable.
- the surface of the metal oxide fine particles may be treated with a silane coupling agent or a titanium coupling agent. By the surface treatment, the compatibility between the metal oxide fine particles and the alkoxysilane compound or the organic solvent is increased.
- the average particle diameter of the metal oxide fine particles is preferably 5 to 100 nm, more preferably 5 to 80 nm, still more preferably 5 to 50 nm in consideration of the respective effects described above. By setting the average particle diameter in such a range, fine irregularities can be formed on the surface of the reflective layer, and the anchor effect described above can be obtained.
- the average particle diameter of the metal oxide fine particles is measured, for example, by a Coulter counter method.
- the metal oxide fine particles may be porous, and the specific surface area is preferably 200 m 2 / g or more. If the metal oxide fine particles are porous, impurities are easily adsorbed in the porous voids.
- the amount of the metal oxide fine particles contained in the coating solution is preferably 0.1 to 20% by mass with respect to the total mass (total amount of solid content) of components other than the solvent contained in the coating solution. More preferably, it is ⁇ 10% by mass. If the amount of the metal oxide fine particles is too small, the above-described anchor effect is not sufficient. On the other hand, if the amount is too large, the amount of the alkoxysilane compound is relatively reduced, and the strength of the resulting reflective layer may be reduced.
- the inorganic particles may include other inorganic particles having an average primary particle size of 100 nm or more and 100 ⁇ m or less.
- the gaps between the white pigments are filled with the inorganic particles, and the viscosity of the coating liquid tends to increase.
- the binder in the gaps between the particles such as white pigment particles and inorganic particles is filled with the inorganic fine particles, the crack resistance during curing can be improved.
- Examples of other inorganic particles include oxide particles such as silicon oxide, fluoride particles such as magnesium fluoride, and mixtures thereof.
- the other inorganic particles are preferably oxide particles, and particularly preferably silicon oxide.
- the surface of other inorganic particles may be treated with a silane coupling agent or a titanium coupling agent. By the surface treatment, compatibility between the other inorganic particles and the alkoxysilane compound or the organic solvent is increased.
- the content of other inorganic particles contained in the coating solution is preferably 0.1 to 10% by mass, more preferably 0.2 to 7% by mass, based on the total mass of the coating solution. . This is because if the other inorganic particles exceed 10% by mass, cracks are likely to occur during the formation of the reflective layer, and if it is less than 0.1%, the thickening effect of the coating solution is reduced.
- the average particle diameter of the other inorganic particles is preferably 100 nm or more and 50 ⁇ m or less, and more preferably 1 ⁇ m or more and 30 ⁇ m or less from the viewpoint of filling a gap generated at the interface between the white pigments.
- the average particle diameter of other inorganic particles can be measured by, for example, a Coulter counter method.
- Clay mineral particles The coating liquid may contain clay mineral particles. When clay mineral particles are contained in the coating solution, the viscosity of the coating solution increases, and sedimentation of the white pigment is suppressed. Examples of clay mineral particles include layered silicate minerals, imogolite, allophane and the like. These particles have a very large surface area and can increase the viscosity of the coating solution in a small amount.
- the layered silicate mineral is preferably a clay mineral having a mica structure, a kaolinite structure, or a smectite structure.
- the layered silicate mineral particles tend to form a card house structure when the coating solution is left standing.
- the viscosity of the coating solution is greatly increased.
- the card house structure is apt to collapse by applying a certain pressure, thereby reducing the viscosity of the coating solution. That is, when the layered silicate mineral particles are contained in the coating solution, the viscosity of the coating solution increases in a stationary state, and the viscosity of the coating solution decreases when a certain pressure is applied.
- layered silicate minerals include natural or synthetic hectrite, saponite, stevensite, hydelite, montmorillonite, nontrinite, bentonite, laponite and other smectite clay minerals, and Na-type tetralithic fluoric mica.
- Non-swelling mica such as swellable mica genus clay minerals such as Li-type tetralithic fluorine mica, Na-type fluorine teniolite, Li-type fluorine teniolite, muscovite, phlogopite, fluorine phlogopite, sericite, potassium tetrasilicon mica Genus clay minerals, vermiculite and kaolinite, or mixtures thereof.
- swellable mica genus clay minerals such as Li-type tetralithic fluorine mica, Na-type fluorine teniolite, Li-type fluorine teniolite, muscovite, phlogopite, fluorine phlogopite, sericite, potassium tetrasilicon mica Genus clay minerals, vermiculite and kaolinite, or mixtures thereof.
- Examples of commercial products of clay mineral particles include Laponite XLG (synthetic hectorite analogue manufactured by LaPorte, UK), Laponite RD (Synthetic hectorite analogue produced by LaPorte, UK), Thermabis (Synthetic product, Henkel, Germany) Hectorite-like substance), smecton SA-1 (saponite-like substance manufactured by Kunimine Industry Co., Ltd.), Bengel (natural bentonite sold by Hojun Co., Ltd.), Kunivia F (natural montmorillonite sold by Kunimine Industry Co., Ltd.), bee gum ( Natural hectorite manufactured by Vanderbilt, USA, Daimonite (synthetic swellable mica manufactured by Topy Industries, Ltd.), Micromica (synthetic non-swellable mica, manufactured by Coop Chemical Co., Ltd.), Somasifu (Coop Chemical Co., Ltd.) ) Synthetic swelling mica), SWN (Synthetic s
- the content of clay mineral particles is preferably from 0.1 to 5% by mass, more preferably from 0.1 to 3% by mass, based on the total mass of the coating solution.
- the content of clay mineral particles is small, the viscosity of the coating solution is difficult to increase, and the white pigment tends to settle.
- the content of the clay mineral particles is excessive, the viscosity of the coating solution becomes too high, and the coating solution may not be discharged uniformly from the coating device.
- the surface of the clay mineral particles may be modified (surface treatment) with an ammonium salt or the like in consideration of compatibility with the solvent in the coating solution.
- the total content of the inorganic particles and the clay mineral particles is preferably 2% by mass or less based on the total mass of the coating liquid (or the solid content of the coating liquid) from the viewpoint of improving the coating stability of the coating liquid. It is more preferable that it is 1.8 mass% or less.
- the coating solution may further contain a silane coupling agent.
- a silane coupling agent When the silane coupling agent is contained in the coating solution, the adhesion between the resulting reflective layer and the substrate is increased, and the durability of the LED device is improved.
- silane coupling agents include vinyltrimethoxysilane, vinyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyl Methyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3 -Acryloxypropyltrimethoxysilane, N-2- (aminoethyl) -3-aminopropylmethyldimethoxysilane, N-2- (aminoethyl) -3-aminopropyltrimethoxysilane, N-2- (aminoethy
- the amount of the silane coupling agent contained in the coating solution is preferably 0.5 to 10% by mass relative to the total mass of components other than the solvent (including water) contained in the coating solution. % Is more preferable. If the amount of the silane coupling agent is too small, the adhesion between the resulting reflective layer and the substrate is not sufficiently increased, and if it is too large, the heat resistance may be lowered.
- the coating solution may contain a metal alkoxide or metal chelate containing a metal element other than Si element.
- the metal alkoxide or metal chelate forms a metalloxane bond with the aforementioned alkoxysilane compound or a hydroxyl group present on the substrate surface during the formation of the reflective layer. Since the metalloxane bond is very strong, when the coating liquid contains a metal alkoxide or a metal chelate, the adhesion between the resulting reflective layer and the substrate increases.
- a part of the metal alkoxide or metal chelate forms a nano-sized cluster composed of a metalloxane bond in the cured film (reflective layer) of the coating solution. Due to the photocatalytic effect of this cluster, it is possible to oxidize a highly corrosive sulfide gas or the like existing in the vicinity of the LED device and change it to a sulfur dioxide gas or the like having a low corrosivity.
- the metal element contained in the metal alkoxide or metal chelate is preferably a group 4 or group 13 metal element other than Si, and a compound represented by the following general formula (V) is preferable.
- M m + X n Y mn (V) M represents a group 4 or group 13 metal element (excluding Si), and m represents the valence of M (3 or 4).
- X represents a hydrolyzable group, and n represents the number of X groups (an integer of 2 or more and 4 or less). However, m ⁇ n. Y represents a monovalent organic group.
- the group 4 or group 13 metal element represented by M is preferably aluminum, zirconium, or titanium, and particularly preferably zirconium.
- a cured product of zirconium alkoxide or chelate does not have an absorption wavelength in the emission wavelength region of a general LED element (particularly blue light (wavelength 420 to 485 nm). That is, the cured product contains light from the LED element. Is difficult to absorb.
- the hydrolyzable group represented by X may be a group that is hydrolyzed with water to form a hydroxyl group.
- the hydrolyzable group include a lower alkoxy group having 1 to 5 carbon atoms, an acetoxy group, a butanoxime group, a chloro group and the like.
- all the groups represented by X may be the same group or different groups.
- the hydrolyzable group represented by X is hydrolyzed and released during the formation of the reflective layer. Therefore, the compound produced after hydrolysis from the group represented by X is preferably neutral and light boiling. Therefore, the group represented by X is preferably a lower alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group or an ethoxy group.
- the monovalent organic group represented by Y may be a monovalent organic group contained in a general silane coupling agent. Specifically, the aliphatic group, alicyclic group, aromatic group, fatty acid having 1 to 1000 carbon atoms, preferably 500 or less, more preferably 100 or less, further preferably 40 or less, and particularly preferably 6 or less. It may be a ring aromatic group.
- the organic group represented by Y may be an aliphatic group, an alicyclic group, an aromatic group, or a group in which an alicyclic aromatic group is bonded via a linking group.
- the linking group may be an atom such as O, N, or S, or an atomic group containing these.
- the organic group represented by Y may have a substituent.
- substituents include halogen atoms such as F, Cl, Br, and I; vinyl group, methacryloxy group, acryloxy group, styryl group, mercapto group, epoxy group, epoxycyclohexyl group, glycidoxy group, amino group, cyano group, Organic groups such as nitro group, sulfonic acid group, carboxy group, hydroxy group, acyl group, alkoxy group, imino group and phenyl group are included.
- metal alkoxide or metal chelate represented by the general formula (V) include aluminum triisopropoxide, aluminum tri-n-butoxide, aluminum tri-t-butoxide, aluminum triethoxide and the like.
- metal alkoxide or metal chelate of zirconium represented by the general formula (V) include zirconium tetramethoxide, zirconium tetraethoxide, zirconium tetra n-propoxide, zirconium tetra i-propoxide, zirconium tetra n- Examples include butoxide, zirconium tetra-i-butoxide, zirconium tetra-t-butoxide, zirconium dimethacrylate dibutoxide, dibutoxyzirconium bis (ethylacetoacetate) and the like.
- metal alkoxide or metal chelate of the titanium element represented by the general formula (V) include titanium tetraisopropoxide, titanium tetra n-butoxide, titanium tetra i-butoxide, titanium methacrylate triisopropoxide, titanium tetra Examples include methoxypropoxide, titanium tetra n-propoxide, titanium tetraethoxide, titanium lactate, titanium bis (ethylhexoxy) bis (2-ethyl-3-hydroxyhexoxide), titanium acetylacetonate and the like.
- metal alkoxides or metal chelates exemplified above are a part of commercially available organometallic alkoxides or metal chelates.
- Metal alkoxides or metal chelates shown in the list of coupling agents and related products in Chapter 9 “Optimum Utilization Technology of Coupling Agents” published by the National Institute of Science and Technology are also applicable to the present invention.
- the amount of the metal alkoxide or metal chelate contained in the coating solution is preferably 1 to 10% by mass relative to the total mass of components other than the solvent (including water) contained in the coating solution, and 2 to 7 parts by mass It is more preferable that If the content is too small, the effect of improving the adhesion cannot be obtained, and if the content is too large, the storage stability of the coating solution decreases.
- the coating solution may contain components other than the white pigment, alkoxysilane compound, organic solvent, inorganic particles, clay mineral particles, silane coupling agent, metal alkoxide, or metal chelate as necessary. Good.
- the preparation method of the coating solution may be a method of mixing raw materials such as white pigments, alkoxysilane compounds, organic solvents, inorganic particles, clay mineral particles, silane coupling agents, A method of mixing a plurality of raw materials in advance and mixing the mixed liquids later may be used. In order to enhance the thickening effect of inorganic particles and clay mineral particles, it is preferable to disperse one or both of inorganic particles and clay mineral particles in a solvent and then mix with the remaining components. The following method is mentioned as an example of the preparation method of a coating liquid.
- a composition containing an alkoxysilane compound (oligomer) by mixing a bifunctional alkoxysilane compound, a trifunctional alkoxysilane compound, and a tetrafunctional alkoxysilane compound in an arbitrary ratio and polymerizing them in the presence of water, an organic solvent, and a catalyst.
- a composition containing an organic solvent, inorganic particles, clay mineral particles, silane coupling agent and the like is prepared.
- the composition containing an alkoxysilane compound, the composition containing an inorganic particle etc., and a white pigment are fully mixed, and a coating liquid is obtained.
- the coating liquid in order to improve the uniformity in the coating liquid, it is preferable to disperse all or part of the raw material of the coating liquid with the following apparatus. Moreover, in order to improve the dispersibility of a white pigment, it is preferable to disperse
- Mixing / dispersing device is, for example, a magnetic stirrer, an ultrasonic dispersing device, a homogenizer, a stirring mill, a blade kneading stirring device, a thin-film swirling type dispersing device, a high-pressure impact dispersing device, a rotation and revolution mixer, etc. Can be done.
- the viscosity of the coating solution measured at 25 ° C. with a vibration viscometer is preferably more than 5 mPa ⁇ s and not more than 2000 mPa ⁇ s.
- VISCOMATE MODEL VM-10A manufactured by Seconic Corporation
- the above value is a value one minute after the vibrator is immersed in the liquid. If the viscosity of the coating solution exceeds 5 mPa ⁇ s, the white pigment is difficult to settle. On the other hand, if it is 2000 mPa ⁇ s or less, the coating stability from various coating devices tends to increase.
- the volume change before and behind hardening of a coating liquid is small from a viewpoint of preventing the crack at the time of making it harden
- the volume ratio B / A before and after curing satisfies the condition of the following formula 3. It is preferable. 0.2 ⁇ B / A ⁇ 0.7 (Formula 3)
- B / A is less than 0.2, the volume change due to curing is large, so that a large stress is likely to occur. For this reason, cracks at the time of curing tend to occur, particularly when a thick film is applied and formed.
- B / A is more than 0.7, the fluidity of the coating liquid is lowered, and the stability of the ejection amount during film formation tends to be lowered.
- a more preferable range of B / A is 0.25 ⁇ B / A ⁇ 0.6, and further preferably 0.30 ⁇ B / A ⁇ 0.6.
- the volume ratio B / A before and after curing can be measured by the following procedure. 1) The volume of the coating solution is measured with a graduated cylinder in an atmosphere of 25 ° C., and is defined as volume A before curing. 2) After coating the coating solution on a Teflon (registered trademark) substrate, the coating film is heated and cured at 150 ° C. for 1 hour, and then peeled from the Teflon (registered trademark) substrate to obtain a cured product. The weight of the obtained cured product is measured in an atmosphere at 25 ° C. Furthermore, the specific gravity of the obtained cured product is measured in an atmosphere of 25 ° C. by Archimedes method. Then, the volume B of the cured product is calculated from the weight of the cured product and the specific gravity measured by the Archimedes method. 3) The volume ratio B / A is calculated from the volume A measured in 1) and the volume B calculated in 2).
- the volume ratio before and after curing can be adjusted mainly by the solvent content ratio of the coating solution.
- FIG. 1 shows a schematic cross-sectional view of an LED device 100 having a reflective layer made of a cured film of the aforementioned coating solution
- FIG. FIG. 1 corresponds to a cross-sectional view taken along line AA in FIG.
- the LED device 100 includes the substrate 1, the LED element 2 disposed on the substrate 1, and the reflective layer 21 disposed at least around the LED element 2 on the substrate 1. Moreover, it further has the wavelength conversion layer 11 arrange
- the LED device 100 of the present invention has a reflective layer 21 that reflects the emitted light of the LED element 2 and the like to the light extraction surface 10A side. Therefore, the light extraction efficiency from the LED device 100 of the present invention is very high. Further, since the binder of the reflective layer 21 is polysiloxane, it is resistant to light and heat, and the reflective layer 21 is unlikely to deteriorate. Therefore, according to the LED device 100 of the present invention, high light extraction efficiency is maintained over a long period of time.
- the substrate 1 preferably has insulating properties and heat resistance, and is preferably made of a ceramic resin or a heat resistant resin.
- the heat resistant resin include liquid crystal polymer, polyphenylene sulfide, aromatic nylon, epoxy resin, hard silicone resin, polyphthalic acid amide and the like.
- the substrate 1 may contain an inorganic filler.
- the inorganic filler can be titanium oxide, zinc oxide, alumina, silica, barium titanate, calcium phosphate, calcium carbonate, white carbon, talc, magnesium carbonate, boron nitride, glass fiber, and the like.
- the substrate 1 may have a cavity as shown in FIG. 1, but may have a flat plate shape.
- an electrode 3 made of metal is formed on the substrate 1, and the electrode 3 has a function of supplying electricity to the LED element 2 from a power source (not shown) arranged outside the substrate 1.
- the shape of the electrode 3 is not particularly limited, and is appropriately selected according to the type and application of the light emitting device 100.
- the method for producing the substrate 1 having the electrodes 3 is not particularly limited, and is generally obtained by integrally molding a lead frame having a desired shape and a resin.
- the LED element 2 is an element that is electrically connected to the electrode 3 formed on the substrate 1 and emits light of a specific wavelength.
- the LED element 2 is disposed on the bottom surface 1 a of the truncated cone-shaped cavity (concave portion) of the substrate 1.
- the wavelength of light emitted from the LED element 2 is not particularly limited.
- the LED element 2 may be, for example, an element that emits blue light (light of about 420 nm to 485 nm) or an element that emits ultraviolet light. Furthermore, an element that emits green light, red light, or the like may be used.
- the configuration of the LED element 2 is not particularly limited.
- the LED element 2 is an element that emits blue light
- the LED element 2 includes an n-GaN compound semiconductor layer (cladding layer), an InGaN compound semiconductor layer (light emitting layer), and a p-GaN compound semiconductor layer. It may be a laminate of (clad layer) and a transparent electrode layer.
- the shape of the LED element 2 is not particularly limited, and may have, for example, a light emitting surface of 200 to 300 ⁇ m ⁇ 200 to 300 ⁇ m.
- the height of the LED element 2 is usually about 50 to 200 ⁇ m.
- the LED element 2 may be one in which light is extracted not only from the top surface but also from the side surface and the bottom surface. In the LED device 100 shown in FIG. 1, only one LED element 2 is disposed on the substrate 1, but a plurality of LED elements 2 may be disposed on the substrate 1.
- connection method between the LED element 2 and the electrode 3 is not particularly limited.
- the LED element 2 and the electrode 3 may be connected via a metal wire 4 as shown in FIG.
- the LED element 2 and the electrode 3 may be connected via a protruding electrode (not shown).
- a mode in which the LED element 2 and the electrode 3 are connected via the metal wire 4 is referred to as a wire bonding type.
- a mode in which the LED element 2 and the electrode 3 are connected via a protruding electrode is called a flip chip bonding type.
- the reflective layer 21 is a layer that reflects the emitted light from the LED element 2 and the fluorescence emitted by the phosphor contained in the wavelength conversion layer 11 to the light extraction surface 10 ⁇ / b> A side of the LED device 100. By providing the reflective layer 21, the amount of light extracted from the light extraction surface 10A of the LED device 100 increases. The reflective layer 21 is obtained by applying and curing the above-described coating solution.
- the reflective layer 21 is disposed on the substrate 1 excluding the region where the LED elements 2 are disposed.
- the reflective layer 21 is arranged in a mortar shape continuously from the bottom surface 1 a to the side surface 1 b of the truncated cone-shaped cavity (concave portion) of the substrate 1.
- the reflection layer 21 is formed in a ring shape concentric with the wavelength conversion layer 11 on the outer periphery of the wavelength conversion layer 11 in a top view.
- the reflective layer 21 is formed on the surface of the substrate 1 at least outside the region where the LED elements 2 are arranged.
- the arrangement region of the LED element 2 refers to a light emitting surface of the LED element 2 and a connection portion between the LED element 2 and the electrode 3. That is, the reflective layer 21 is formed in a region that does not hinder the emission of light from the LED element 2 and the connection between the LED element 2 and the electrode 3.
- the reflective layer 21 is also formed on the inner wall surface 1b of the cavity. This is because when the reflective layer 21 is formed on the cavity inner wall surface 1b, the light traveling in the horizontal direction on the surface of the wavelength conversion layer 11 can be reflected by the reflective layer 21 and extracted.
- the reflective layer 21 may be formed in the gap between the LED element 2 and the substrate 1.
- the thickness of the reflective layer 21 may be 5 ⁇ m or more, preferably 20 ⁇ m or more, more preferably 40 ⁇ m or more, and particularly preferably 60 ⁇ m or more. If the thickness of the reflective layer 21 is less than 5 ⁇ m, the light reflectivity of the reflective layer 21 may not be sufficient, and the light extraction efficiency may not be sufficient.
- the thickness of the reflective layer 21 may be 300 ⁇ m or less, preferably 250 ⁇ m or less, more preferably 200 ⁇ m or less. If the thickness of the reflective layer 21 exceeds 300 ⁇ m, cracks may easily occur in the reflective layer 21.
- the thickness of the reflective layer 21 means the maximum thickness of the reflective layer 21 formed on the light emitting surface of the LED element 2.
- the thickness of the reflective layer 21 can be measured with a laser holo gauge.
- the reflective layer 21 may be a cured product of a coating film of the coating liquid of the present invention. Since the coating liquid of the present invention has a small volume change due to curing and a small content of the tetrafunctional silane compound, the occurrence of cracks during curing can be satisfactorily suppressed. Moreover, since the coating liquid of this invention has few solvent content ratios, the hardened
- the wavelength conversion layer 11 includes phosphor particles and a binder.
- the phosphor particles receive light (excitation light) emitted from the LED element 2 and emit fluorescence. By mixing the excitation light and the fluorescence, the color of the light from the LED device 100 becomes a desired color. For example, when the light from the LED element 2 is blue and the fluorescence emitted from the phosphor included in the wavelength conversion layer 11 is yellow, the light from the LED device 100 is white.
- the wavelength conversion layer 11 may cover the LED element 2.
- the wavelength conversion layer 11 may cover the reflective layer 21 together with the LED element 2.
- the phosphor particles contained in the wavelength conversion layer 11 may be anything that is excited by the light emitted from the LED element 2 and emits fluorescence having a wavelength different from that of the emitted light from the LED element 2.
- examples of phosphor particles that emit yellow fluorescence include YAG (yttrium, aluminum, garnet) phosphors.
- the YAG phosphor receives blue light (wavelength 420 nm to 485 nm) emitted from the blue LED element, and emits yellow fluorescence (wavelength 550 nm to 650 nm).
- the phosphor particles are, for example, 1) An appropriate amount of flux (fluoride such as ammonium fluoride) is mixed with a mixed raw material having a predetermined composition, and pressed to form a molded body. 2) The obtained molded body is packed in a crucible and fired in air at a temperature range of 1350 to 1450 ° C. for 2 to 5 hours to obtain a sintered body.
- flux fluoride such as ammonium fluoride
- a mixed raw material having a predetermined composition is obtained by sufficiently mixing oxides such as Y, Gd, Ce, Sm, Al, La, and Ga, or compounds that easily become oxides at high temperatures in a stoichiometric ratio. .
- the mixed raw material which has a predetermined composition mixes the solution which dissolved 1) the rare earth elements of Y, Gd, Ce, and Sm in the acid in stoichiometric ratio, and oxalic acid, and obtains a coprecipitation oxide. 2) It can also be obtained by mixing this coprecipitated oxide with aluminum oxide or gallium oxide.
- the kind of the phosphor is not limited to the YAG phosphor, and may be another phosphor such as a non-garnet phosphor that does not contain Ce.
- the average particle diameter of the phosphor particles is preferably 1 ⁇ m to 50 ⁇ m, and more preferably 10 ⁇ m or less.
- the particle diameter of the phosphor particles is too large, a gap generated at the interface between the phosphor particles and the binder becomes large. Thereby, the intensity
- the average particle diameter of the phosphor particles refers to the value of D50 measured with a laser diffraction particle size distribution meter. Examples of the laser diffraction particle size distribution measuring device include a laser diffraction particle size distribution measuring device manufactured by Shimadzu Corporation.
- the binder contained in the wavelength conversion layer 11 can be a transparent resin or a translucent ceramic.
- the transparent resin can be, for example, a silicone resin and an epoxy resin.
- the thickness of the wavelength conversion layer 11 is preferably about 25 ⁇ m to 5 mm. If the wavelength conversion layer 11 is too thick, the concentration of the phosphor particles becomes excessively low, and the phosphor particles may not be uniformly dispersed.
- the thickness of the wavelength conversion layer 11 means the maximum thickness of the wavelength conversion layer 11 formed on the light emitting surface of the LED element 2.
- the thickness of the wavelength conversion layer 11 can be measured with a laser holo gauge.
- the binder is a transparent resin, the amount of phosphor particles contained in the wavelength conversion layer 11 is generally 5 to 15% by mass.
- the translucent ceramic may be the same as the polysiloxane contained in the reflective layer.
- the thickness of the wavelength conversion layer 11 is preferably 5 to 200 ⁇ m.
- the thickness of the wavelength conversion layer 11 means the maximum thickness of the wavelength conversion layer 11 formed on the light emitting surface of the LED element 2. The thickness of the wavelength conversion layer 11 can be measured with a laser holo gauge.
- the amount of phosphor particles contained in the wavelength conversion layer 11 is preferably 60 to 95% by mass.
- FIG. 1 shows an example in which the wavelength conversion layer is disposed so as to be in contact with the LED element, but the present invention is not limited to this, and the wavelength conversion layer may not be in contact with the LED element.
- the wavelength conversion layer only needs to be arranged in the light emitting direction of the LED element; even if a space is formed between the wavelength conversion layer and the LED element or other layers are arranged.
- the other layers may be a light-transmitting layer or a sealing layer containing polysiloxane or the like contained in the above-described reflective layer as a binder.
- the aforementioned LED device can be manufactured through the following three steps. (1) The process of preparing the board
- the LED device manufacturing method may further include (4) a step of forming a wavelength conversion layer containing phosphor particles on the reflective layer as necessary.
- substrate with which the LED element and the electrode were connected is prepared.
- it may be a step of preparing a substrate having the above-described electrodes, fixing the LED element to the substrate, and connecting the electrode of the substrate to the cathode electrode and the anode electrode of the LED element.
- the method for connecting the LED element and the electrode and the method for fixing the LED element to the substrate are not particularly limited, and may be the same as a conventionally known method.
- the coating liquid coating process is a process in which the coating liquid is applied to at least the surrounding area of the LED element on the substrate, that is, the area where the reflective layer is formed.
- the coating liquid of the present invention has a low solvent content and a relatively high viscosity. Accordingly, it is possible to form a coating film having a certain thickness or more with a small number of coatings. For example, a coating film having a thickness after curing of 40 ⁇ m or more can be formed by application twice or less, preferably once.
- the method for applying the coating solution is not particularly limited as long as it is a method capable of applying the coating solution to a desired region, and known coating methods such as blade coating, spin coating coating, dispenser coating, spray coating, and inkjet method coating. It can be. Of these, dispenser coating is preferred because a highly viscous coating solution can be stably coated.
- the coating solution curing step may be a step of forming a reflective layer by heating and curing a coating solution coated on a substrate.
- the solvent in the coating solution is removed and the alkoxysilane compound is hydrolyzed and polycondensed.
- the temperature at which the coating solution is cured is preferably 20 to 200 ° C., more preferably 25 to 150 ° C. If the heating temperature is less than 20 ° C, the solvent in the coating film may not be sufficiently evaporated. When the heating temperature is less than 100 ° C., the alkoxysilane compound may not be sufficiently polymerized.
- the coating solution has a small solvent content ratio and a small volume change before and after curing, the stress generated in the coating film during curing can be reduced. Moreover, since the ratio of the tetrafunctional silane compound contained in the coating liquid is small and the hardness of the cured product does not become too high, the stress generated in the coating film can be relaxed. As a result, the occurrence of cracks during curing can be satisfactorily suppressed.
- Wavelength conversion layer formation process may be a process of apply
- the composition for wavelength conversion layer contains phosphor particles and a binder component.
- the binder component can be a transparent resin contained in the wavelength conversion layer or a precursor thereof, or a polysiloxane precursor (alkoxysilane compound). Moreover, a solvent is contained in the composition for wavelength conversion layers as needed.
- the solvent is a hydrocarbon such as toluene or xylene; a ketone such as acetone or methyl ethyl ketone; an ether such as diethyl ether or tetrahydrofuran; propylene glycol monomethyl ether acetate, ethyl It may be an ester such as acetate.
- the binder component is an alkoxysilane compound
- the solvent can be the same as the organic solvent contained in the coating solution.
- the mixing of the composition for wavelength conversion layer can be performed, for example, with a stirring mill, a blade kneading stirring device, a thin-film swirling disperser, or the like.
- a stirring mill a blade kneading stirring device, a thin-film swirling disperser, or the like.
- the method for applying the composition for wavelength conversion layer is appropriately selected depending on the type of binder, and can be, for example, dispenser application or spray application. Moreover, this is hardened after application
- the curing method and curing conditions of the wavelength conversion layer composition are appropriately selected depending on the type of resin. An example of the curing method is heat curing.
- Silane Compound Solution 1 19.5 mass% of tetramethoxysilane (76.0 mol% with respect to the entire silane compound), 5.5 mass% of methyltrimethoxysilane (24.0 mol% with respect to the entire silane compound), 60 mass% of methanol, 14.99% by mass of water and 0.01% by mass of nitric acid were mixed and stirred at 23 ° C. for 3 hours, and then reacted at 26 ° C. with stirring for 3 days to obtain a silane compound solution 1 containing a polysiloxane oligomer. Obtained.
- Silane compound solutions 2-11, 14-20> Silane compound solutions 2 to 11 and 14 to 20 were obtained in the same manner as silane compound solution 1 except that the composition was changed to the composition shown in Table 1.
- a silane compound solution 12 is obtained by mixing 15.5% by mass of tetramethoxysilane, 9.5% by mass of methyltrimethoxysilane, 60% by mass of methanol, 14.99% by mass of water and 0.01% by mass of nitric acid. It was.
- ⁇ Silane compound solution 13> Water and dilute nitric acid were added to 0.1 mol of ethyltrimethoxysilane to prepare a molar ratio of alkoxide: water: dilute nitric acid of 1: 3: 0.002. This solution was stirred in a sealed container at 20 ° C. for 3 hours, and then further aged at 60 ° C. for 48 hours to cause hydrolysis and polycondensation reactions to proceed. The upper phase rich in methanol produced by the reaction was removed and dried at 60 ° C. for 3 hours to obtain a silane compound solution 13.
- the weight average molecular weight of the polysiloxane oligomer in the obtained silane compound solution and measurement of solid Si-NMR were performed by the following methods.
- Weight average molecular weight of polysiloxane oligomer The weight average molecular weight of the polysiloxane oligomer in the obtained silane compound solution was measured by GPC using polystyrene equivalent weight average molecular weight.
- compositions of the resulting silane compound solutions 1 to 20 are shown in Table 1.
- Silicia 470 Silica (Silicia 470, manufactured by Fuji Silysia Chemical) average particle size of 14 ⁇ m
- SP-1 Silica (Microbead SP-1, manufactured by JGC Catalysts & Chemicals) average particle size of 5 ⁇ m
- VM2270 Silica (VM-2270, manufactured by Dow Corning) average particle size of 5 to 15 ⁇ m SS-50F: Silica (Nip seal SS-50F, manufactured by Tosoh Silica) Average particle size 1.2 ⁇ m Alu-C: Alumina (AEROXIDE Alu-C, Nippon Aerosil) primary particle size 13nm A300: Silica (Nippon Aerosil Co., Ltd.) average primary particle size: 7 nm
- RX300 Silica (manufactured by Nippon Aerosil Co., Ltd.) Average primary particle size: 7 nm
- F3 Silica (high silica F3, manufactured by Nichetsu) Average particle diameter: 3
- ZR-210 ZrO 2 particles (TECNADIS-Zr-210, manufactured by TECNAN) Average particle size: 10 to 15 nm
- Ti-210 TiO 2 particles (TECNADIS-TI-210, manufactured by TECNAN) average particle diameter of 10 to 15 nm
- KBM-403 3-glycidoxypropyltrimethoxysilane (KBM-403, manufactured by Shin-Etsu Silicone)
- KBM-903 3-aminopropyltrimethoxysilane (KBM-903, manufactured by Shin-Etsu Silicone)
- KBM-802 3-mercaptopropylmethyldimethoxysilane (KBM-802, manufactured by Shin-Etsu Silicone)
- KBE-846 Bis (triethoxysilylpropyl) tetrasulfide (KBE-846, manufactured by Shin-Etsu Silicone)
- Titanium oxide SX-3103 Made by Sakai Chemical Industry Co., Ltd. Titanium oxide: D-918 Made by Sakai Chemical Industry Co., Ltd. Titanium oxide: JR Teica Co., Ltd. Titanium oxide: JR-405 Made by Teika Co., Ltd. Titanium oxide: CR-93 Made by Ishihara Sangyo Titanium oxide: CR-95 Made by Ishihara Sangyo Aluminum oxide: HD-11 Made by Nikkato Barium sulfate: NFJ-3-1999 Made by Yamanishi Boron nitride: AP-100S Made by MARUKA
- the viscosity and coating amount stability of the obtained coating solution, the volume ratio B / A before and after curing, crack resistance, reflectance and adhesion were evaluated by the following methods.
- ⁇ Viscosity> The viscosity of the coating solution was measured using a vibration viscometer VISCOMATE MODEL VM-10A (manufactured by Seconic). The measurement temperature was 25 ° C., and the measured value after 1 minute was used after the vibrator was immersed in the liquid.
- the coating amount stability was evaluated according to the following criteria. ⁇ : Mass change rate was less than 3%. ⁇ : Mass change rate was 3% or more and less than 6%. X: Mass change rate was 6% or more.
- cured material was computed from the weight of the obtained hardened
- ⁇ Reflectance measurement 1> The coating solution was applied once to a transparent 1 mm glass plate and cured by heat treatment at 150 ° C. for 1 hour to prepare a measurement sample having a reflective layer having a thickness of 20 ⁇ m. Then, the reflectance of each sample was measured with a spectrophotometer V-670 (manufactured by JASCO Corporation). Evaluation was performed according to the following criteria. ⁇ : The reflectance at a film thickness of 20 ⁇ m is 95% or more ⁇ : The reflectance at a film thickness of 20 ⁇ m is less than 95%
- ⁇ Reflectance measurement 2> The coating solution was applied once to a transparent 1 mm glass plate and cured by heat treatment at 150 ° C. for 1 hour to prepare a measurement sample having a reflective layer having a thickness of 60 ⁇ m. Then, the reflectance of each sample was measured with a spectrophotometer V-670 (manufactured by JASCO Corporation). Evaluation was performed according to the following criteria. A: Reflectance is 98% or more at a film thickness of 60 ⁇ m. ⁇ : Cracks occur at a film thickness of 60 ⁇ m and are not evaluated.
- ⁇ Tape peeling experiment> A coating solution was applied on a silver plate and cured by heat treatment at 150 ° C. for 1 hour to prepare a measurement sample having a reflective layer having a thickness of 20 ⁇ m.
- the work of attaching Nichiban cello tape (registered trademark) (24 mm) to the formed reflective layer and immediately peeling it off was repeated 20 times. And the state of the reflective layer was observed with the microscope for every operation
- ⁇ No separation was observed after 10 times of operation, but after 20 times of operation, it was slightly peeled off.
- the reflective layer was peeled off at the 10th working time.
- Tables 3 to 6 show the evaluation results of the examples and comparative examples.
- the cured products of the coating liquids of Examples 1 to 70 in which the composition of the silane compound satisfies Formulas 1 and 2 and the volume ratio B / A before and after curing satisfies Formula 3 show high crack resistance and adhesion. It can also be seen that a high reflectance can be obtained.
- the cured products of the coating solutions of Comparative Examples 1 to 5 whose composition in the silane compound does not satisfy Formula 2 have low crack resistance
- the cured products of the coating solutions of Comparative Examples 6 and 7 that do not satisfy Formula 1 It turns out that the nature is low.
- the cured product of the coating solution of Comparative Example 9 in which the volume ratio B / A before and after curing is too large has low crack resistance and reflectance
- the coating solution of Comparative Example 10 in which the volume ratio B / A before and after curing is too small is liquid. It turns out that discharge property is low.
- Example 11 From the comparison between Example 11 and Example 36, the coating liquid of Example 11 in which the silane compound has been oligomerized in advance has more cracks during curing than the coating liquid of Example 36 in which the silane compound is a monomer. It is highly suppressed and it can be seen that the resulting cured product has a high reflectance. This is presumably because the pre-oligomerized silane compound has less volume change due to polymerization than the monomeric silane compound.
- a coating layer formed on a substrate of an LED device is cured to obtain a reflective layer, cracks during curing are satisfactorily suppressed, and the reflectance is high. It is possible to provide a coating liquid capable of obtaining a cured film that can be maintained for a long period of time and an LED device using the coating liquid.
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Abstract
L'objet de la présente invention est de produire : un liquide de revêtement qui minimise de manière appropriée les fissures pendant le traitement thermique, et qui rend possible l'obtention d'une pellicule traitée thermiquement présentant une réflectance élevée et la capacité à conserver ladite réflectance sur une longue période lorsque, par exemple, une pellicule de revêtement formée sur un substrat pour un dispositif à DEL est traitée thermiquement pour obtenir une couche réfléchissante ; et un dispositif à DEL qui utilise le liquide de revêtement. Ce liquide de revêtement contient un pigment blanc, un composé de silane, et un solvant. Le liquide de revêtement satisfait 0 ≤ R2 ≤ 40 (formule 1) et 0 ≤ R4/R3 ≤ 2 (formule 2) lorsque, dans la quantité totale du composé de silane, le ratio d'un composé de silane bifonctionnel est représenté par R2 (% mol), le ratio d'un composé de silane trifonctionnel est représenté par R3 (% mol), et le ratio d'un composé de silane tétrafonctionnel est représenté par R4 (% mol). En outre, le ratio volumique B/A du liquide de revêtement avant et après le traitement thermique satisfait 0,2 ≤ B/A ≤ 0,7 (formule 3) lorsque le volume du liquide de revêtement est représenté par A et que le volume d'un produit traité thermiquement obtenu par traitement thermique du liquide de revêtement est représenté par B.
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JP2013004922A (ja) * | 2011-06-21 | 2013-01-07 | Mitsubishi Chemicals Corp | 半導体発光装置用樹脂パッケージ及び該樹脂パッケージを有してなる半導体発光装置 |
WO2014103326A1 (fr) * | 2012-12-27 | 2014-07-03 | コニカミノルタ株式会社 | Liquide de revêtement et dispositif à del pourvu d'une couche réfléchissante formée d'un produit durci dudit liquide de revêtement |
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WO2014103326A1 (fr) * | 2012-12-27 | 2014-07-03 | コニカミノルタ株式会社 | Liquide de revêtement et dispositif à del pourvu d'une couche réfléchissante formée d'un produit durci dudit liquide de revêtement |
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