WO2016011993A1 - Verfahren zur spaltung von silicium-silicium-bindungen und/oder von silicium-chlor-bindungen in mono-, poly- und/oder oligosilanen - Google Patents

Verfahren zur spaltung von silicium-silicium-bindungen und/oder von silicium-chlor-bindungen in mono-, poly- und/oder oligosilanen Download PDF

Info

Publication number
WO2016011993A1
WO2016011993A1 PCT/DE2015/000359 DE2015000359W WO2016011993A1 WO 2016011993 A1 WO2016011993 A1 WO 2016011993A1 DE 2015000359 W DE2015000359 W DE 2015000359W WO 2016011993 A1 WO2016011993 A1 WO 2016011993A1
Authority
WO
WIPO (PCT)
Prior art keywords
silicon
pcs
hcl
oligosilanes
halogenated
Prior art date
Application number
PCT/DE2015/000359
Other languages
German (de)
English (en)
French (fr)
Inventor
Norbert Auner
Max. C. HOLTHAUSEN
Felix NEUMEYER
Original Assignee
Norbert Auner
Holthausen Max C
Neumeyer Felix
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=54365912&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2016011993(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Norbert Auner, Holthausen Max C, Neumeyer Felix filed Critical Norbert Auner
Priority to EP15788316.6A priority Critical patent/EP3172261B2/de
Priority to RU2017105446A priority patent/RU2673664C2/ru
Priority to JP2017503841A priority patent/JP6655599B2/ja
Priority to KR1020177004483A priority patent/KR20170035981A/ko
Priority to CN201580041024.4A priority patent/CN106604924B/zh
Priority to US15/327,145 priority patent/US11104582B2/en
Publication of WO2016011993A1 publication Critical patent/WO2016011993A1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/04—Esters of silicic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C07F7/125—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving both Si-C and Si-halogen linkages, the Si-C and Si-halogen linkages can be to the same or to different Si atoms, e.g. redistribution reactions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms

Definitions

  • the present invention relates to a process for the cleavage of silicon-silicon bonds and / or silicon-chlorine bonds in mono-, poly- and / or oligosilanes.
  • Polysilanes are chain-structured silicon-hydrogen compounds of the general formula Si n H 2n + 2 .
  • the process described here also covers substituted polysilanes in which hydrogen atoms have been replaced by corresponding substituents, in particular halogens.
  • Such thermally produced halogenated polysilanes have a branched structure with a high content of branched short-chain and cyclic polysilanes.
  • lische compounds, wherein their branch points have a proportion of the total mixture of more than 1 percent.
  • halogenated polysilanes As a second way, a plasma-chemical process for the production of halogenated polysilanes is known, as described for example in DE 10 2008 025 261 B4. Such plasma-chemically produced halogenated polysilanes have a predominantly linear structure. Both variants have different average molecular weights.
  • halogenated polysilanes From such halogenated polysilanes it is possible to derive halogenated oligosilanes which have significance as starting materials for amorphous or crystalline silicon.
  • oligosilanes are of particular interest for the preparation of Si layers and Si film depositions.
  • EP 0574912 B1 describes a process for the preparation of methylchlorosilanes from the high-boiling residue obtained by a direct process.
  • EP 1533315 A1 discloses a process for the preparation of alkylchlorosilanes from residues of a direct synthesis.
  • WO 2011/107360 Al describes the preparation of disilanes which are amine catalyzed and cleavable with HCl.
  • EP 635510 A1 describes the cleavage of the high boilers with HCl and an aluminum chloride-containing catalyst at T> 250 ° C. in monosilanes.
  • EP 1 179 534 A1 discloses a process for working up residues of the direct synthesis of organochlorosilanes. From EP 0 250 823 Bl a process for the preparation of Organooxyhalogensilanen in the presence of catalysts is known. DE 3 924 193 C2 describes a process for the preparation of an alkoxy-unsaturated methylpolysilane. DE 3 741 946 A1 discloses the preparation of polysilanes having at least 8 Si atoms. The present invention has for its object to provide a method for the cleavage of silicon-silicon bonds and / or of silicon-chlorine bonds in mono-, poly- and / or oligosilanes available that particularly simple and therefore cost is.
  • This object is achieved by a process for the cleavage of silicon-silicon bonds and / or of silicon-chlorine bonds in mono-, poly- and / or oligosilanes, in which the mono-, poly- and / or Oligosilane in ether or ether hydrochloric acid solution dissolves or suspended.
  • the ethers used according to the invention are substances of the general formula R 1 -OR 2 , where R 1 and R 2 can each be any desired alkyl and / or aryl radicals. Under certain circumstances, cyclic ethers in high Dilution with inert solvents find use. Diethyl ether is preferably used.
  • an ether-hydrochloric acid solution in particular diethyl ether-hydrochloric acid solution, is used, which is preferably used.
  • a preparatively simple cleavage of the silicon-silicon bonds and / or silicon-chlorine bonds in the poly- or oligosilanes is achieved both with ether and with the ether-hydrochloric acid solution (diethyl ether-hydrochloric acid solution), in which case in particular In a single reaction step corresponding end products can be produced.
  • the cleavage of the Si-Cl bonds in monosilanes is not carried out by ether alone, but rather requires the use of ether-hydrochloric acid solutions (diethyl ether-hydrochloric acid solutions).
  • An example of the process according to the invention relates to a process in which halogenated polysilanes, in particular chlorinated polysilanes, especially perchlorinated polysilanes (PCS), halogenated oligosilanes, in particular chlorinated oligosilanes produced by cleavage of silicon-silicon bonds.
  • This process variant thus relates to the specific representation of defined oligosilanes from halogenated polysilanes.
  • a preferred variant of the method according to the invention is characterized in that. the halogenated polysilane in ethyl ether (Et 2 O) or ethyl ether hydrochloric acid solution, in particular diethyl ether or diethyl ether hydrochloric acid solution, dissolved or suspended.
  • ethyl ether Et 2 O
  • ethyl ether hydrochloric acid solution diethyl ether or diethyl ether hydrochloric acid solution
  • thermally produced halogenated polysilane in particular perchlorinated polysilane (T-PCS), or plasma-chemically produced halogenated polysilane, in particular perchlorinated polysilane (P-PCS)
  • T-PCS perchlorinated polysilane
  • P-PCS perchlorinated polysilane
  • the solution obtained from the reaction is isolated, in particular from accumulating solid precipitates when they occur.
  • At least one halogenated oligosilane is isolated from the resulting solution, for example by condensing, decanting or distilling.
  • chlorinated oligosilanes are prepared from thermally prepared perchlorinated polysilanes (T-PCS).
  • Thermally produced PCS is synthetically more easily accessible by conventional means than plasma-chemically produced PCS (P-PCS).
  • T-PCS is preferably dissolved in Et 2 O. The substance is completely soluble. First, a clouding of the solution takes place, which then clears up again. After about 2 h of reaction time at room temperature, the following products are obtained: Si 2 Cl 6 ⁇ SiCl 4 > Si 3 Cl 8 > iso-Si 4 Cl 10 ⁇ neo-Si 5 CL 12
  • P-PCS gave significantly worse Si 2 Cl 6 access by forming a precipitate, ie a polymer with a higher molecular weight.
  • the ether hydrochloric acid solution used according to the invention in particular diethyl ether hydrochloric acid solution (HCl-saturated ether solution), was prepared by introducing HCl gas into ether at room temperature until a saturated solution (about 5 M) was added. was obtained. Thermally prepared perchlorinated polysilane (T-PCS) was added to this solution of HCl in Et 2 O in a SiCl 2 unit / HCl molar ratio of about 1/1.
  • T-PCS perchlorinated polysilane
  • oligosilanes eg HSi (SiCl 3) 3 and H 2 Si (SiCl 3) 2
  • Si 2 Cl 6 is preferential in both synthesis routes.
  • a further embodiment of the method according to the invention is characterized in that a solution of HCl in Et 2 O is used for the cleavage of poly- or oligosilanes and the subsequent synthesis of siloxanes.
  • a solution of HCl in diethyl ether is used, with which each Si-Si and Si-Cl bond, also in monosilanes, is cleaved and converted into a siloxane unit.
  • the process according to the invention is also preferably used for the degradation of mixtures of organohalogenatedisilanes, in particular with chlorinated monosilanes.
  • NMR analyzes were performed on a Bruker AV500 spectrometer.
  • GC-MS analyzes were performed on a Thermo Scientific trace GC ultra gas chromatograph with ITQ 900 MS coupled mass spectrometer.
  • the stationary phase (Machery-Nagel PERM ⁇ BOND silane) had a length of 50 m with an internal diameter of 0.32 mm.
  • One ⁇ of the sample solution was injected, with 1/25 carried by the stationary phase with the aid of helium as the carrier gas and a flow rate of 1.7 m L / min.
  • the temperature of the stationary phase is initially 50 ° C for ten minutes, was then increased at a rate of 20 ° C / min up to 250 ° C and maintained for ten more minutes at this final temperature.
  • 70 eV was ionized and cationic fragments were measured in the range of 34-600 and 34-900 m / z mass per charge, respectively.
  • Diethyl ether (stabilized with butylated hydroxytoluene) was previously dried over sodium / benzophenone and distilled. Subsequently, in a Schlenk flask with gas inlet tube, HCl gas, which had previously been concentrated by Guided sulfuric acid was passed, registered in the diethyl ether. This also resulted in a slight warming of the solution. Saturation was detected when the amount of gas discharged was equal to the amount of gas introduced (indicated by bubble counter). To complete, this condition was maintained for another 30 minutes.
  • HCl / Et20 solution was additionally determined by titration of an aliquot with water and NaOH.
  • T-PCS (64.64 g, largely freed of SiCl 4 in vacuo) was reacted with a saturated solution of HCl in diethyl ether (5 M, 113 mL) under ice-cooling (0 ° C.) (a). The brownish solution was stirred for 16 hours and gradually warmed to room temperature (24 ° C), whereupon the color changed to pale yellow.
  • the distillation residue (f, 2 g) contains the compounds listed in column C, the distillate (g, 16 g) the compounds in column D.
  • the condensation residue from (b) (h, 10 g) was distilled at reduced pressure at the rotary vane pump (0.1 mbar) up to a boiling temperature of 130 ° C.
  • the residue remaining after this distillation (1.7 g) consists largely of insoluble chlorinated polysilanes and traces of the compounds mentioned in column A.
  • the compounds of column B are identified.
  • the Si-Si and Si-Cl bond cleavage reagent used herein is a diethyl ether saturated with HCl gas (HCl / Et 2 O).
  • the disilanes 1-8 are listed in a series of decreasing portions in the residue of the disilane fraction of the Müller-Rochow process.
  • Table 2 contains comparable data for monomeric silane cleavage products, also alkoxy-substituted.
  • the cyclic siloxanes D3 to D10 are listed in Tab. 3, and Table 4 shows the values for linear siloxanes L2 to L13.
  • Tab. 3 GC-MS data for cyclic methylsiloxanes.
  • Tab. 4 GC-MS data for linear methylsiloxanes.
  • Table 6 below also lists the analytical data of other solvents and reagents used in our investigations. Tab. 6: GC-MS data of the solvents and HCl.
  • the ampoules have a length of 125 mm, an outer diameter of 26 mm and a wall thickness of 2 mm.
  • the internal volume corresponds to the melting point
  • 1, 1, 2, 2-Tetrachlordimethyldi- was silane, 1, 2, -Dichlortetramethyldisilan, Chlorpenta- methyldisilane, hexamethyldisilane, pentamethyldisilane and mixtures of the above first four substances performed. Furthermore, the degradation of the disilane residue from a technical Müller-Rochow synthesis and the reaction of monomeric trichlorosilanes with
  • c) The reaction of MeSiCl 3 with HCl / Et 2 O for 65 h at 120 ° C leads to the silsesquioxanes Tl, T2 and T3.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Polymers (AREA)
  • Silicon Compounds (AREA)
PCT/DE2015/000359 2014-07-22 2015-07-20 Verfahren zur spaltung von silicium-silicium-bindungen und/oder von silicium-chlor-bindungen in mono-, poly- und/oder oligosilanen WO2016011993A1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP15788316.6A EP3172261B2 (de) 2014-07-22 2015-07-20 Verfahren zur spaltung von silicium-silicium-bindungen und/oder von silicium-chlor-bindungen in mono-, poly- und/oder oligosilanen
RU2017105446A RU2673664C2 (ru) 2014-07-22 2015-07-20 Способ расщепления кремний-кремниевых связей и/или хлор-кремниевых связей в моно-, поли- и/или олигосиланах
JP2017503841A JP6655599B2 (ja) 2014-07-22 2015-07-20 モノ−、ポリ−および／またはオリゴシランにおけるケイ素−ケイ素結合および／またはケイ素−塩素結合の開裂方法
KR1020177004483A KR20170035981A (ko) 2014-07-22 2015-07-20 모노실란, 폴리실란, 및/또는 올리고실란에서 규소-규소 결합 및/또는 규소-염소 결합의 분해 방법
CN201580041024.4A CN106604924B (zh) 2014-07-22 2015-07-20 用于裂解单硅烷、聚硅烷和/或低聚硅烷中的硅-硅键和/或硅-氯键的方法
US15/327,145 US11104582B2 (en) 2014-07-22 2015-07-20 Process for the cleavage of silicon-silicon bonds and/or silicon-chlorine bonds in mono-, poly- and/or oligosilanes

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102014010674.8 2014-07-22
DE102014010674 2014-07-22

Publications (1)

Publication Number Publication Date
WO2016011993A1 true WO2016011993A1 (de) 2016-01-28

Family

ID=54365912

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2015/000359 WO2016011993A1 (de) 2014-07-22 2015-07-20 Verfahren zur spaltung von silicium-silicium-bindungen und/oder von silicium-chlor-bindungen in mono-, poly- und/oder oligosilanen

Country Status (8)

Country Link
US (1) US11104582B2 (ja)
EP (1) EP3172261B2 (ja)
JP (1) JP6655599B2 (ja)
KR (1) KR20170035981A (ja)
CN (1) CN106604924B (ja)
DE (1) DE102015009129B4 (ja)
RU (1) RU2673664C2 (ja)
WO (1) WO2016011993A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018502817A (ja) * 2014-12-15 2018-02-01 ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド 塩素化オリゴシランの製造方法
RU2722027C1 (ru) * 2016-11-16 2020-05-26 АйЭйчАй КОРПОРЕЙШН Способ стабилизации хлорсиланового полимера
WO2020205356A1 (en) 2019-03-29 2020-10-08 Momentive Performance Materials Inc. Low temperature process for the safe conversion of the siemens process side-product mixture to chloromonosilanes

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019060485A1 (en) * 2017-09-20 2019-03-28 Momentive Performance Materials Inc. PROCESS FOR PRODUCING ORGANOHYDRIDOCHLOROSILANES
CN109686802A (zh) * 2018-11-09 2019-04-26 惠州凯珑光电有限公司 一种电子元器件和模组的封装工艺

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3741946A1 (de) 1986-12-11 1988-06-16 Dow Corning Ltd Polysilan
EP0250823B1 (de) 1986-05-27 1993-01-20 Bayer Ag Verfahren zur Herstellung von Organooxyhalogensilanen
EP0635510A1 (en) 1993-07-19 1995-01-25 Dow Corning Corporation Catalytic conversion of direct process high-boiling component to chlorosilane monomers in the presence of hydrogen chloride
DE3924193C2 (de) 1988-07-22 1995-04-13 Dow Corning Verfahren zur Herstellung eines alkoxyfunktionellen Methylpolysilans
EP0574912B1 (de) 1992-06-19 1999-01-07 Wacker-Chemie GmbH Verfahren zur Gewinnung von Methylchlorsilanen aus hochsiedenden Rückständen der Methylchlorsilansynthese
EP1179534A1 (de) 2000-08-10 2002-02-13 Wacker-Chemie GmbH Verfahren zum Aufarbeiten von Rückständen der Direktsynthese von Organochlorsilanen
EP1533315A1 (de) 2003-11-20 2005-05-25 Wacker-Chemie GmbH Verfahren zur Herstellung von Aklylchlorsilanen aus den Rückständen der Direktsynthese von Alkylchlorsilanen
DE102008025261B4 (de) 2008-05-27 2010-03-18 Rev Renewable Energy Ventures, Inc. Halogeniertes Polysilan und plasmachemisches Verfahren zu dessen Herstellung
WO2011107360A1 (de) 2010-03-04 2011-09-09 Wacker Chemie Ag Verfahren zur umwandlung von disilanen
EP2296804B1 (de) 2008-05-27 2014-03-12 Spawnt Private S.à.r.l. Halogeniertes polysilan und thermisches verfahren zu dessen herstellung

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3012006A (en) * 1958-04-24 1961-12-05 Dow Corning Fluorinated alkyl silanes and their use
US3878234A (en) * 1973-07-30 1975-04-15 Dow Corning Preparation of hydrocarbon silanes from polysilanes
EP0640642B1 (en) * 1993-08-18 1998-03-11 Shin-Etsu Chemical Co., Ltd. Method of producing dimethylpolysiloxanes
JP3644703B2 (ja) * 1993-08-18 2005-05-11 信越化学工業株式会社 環状ジメチルポリシロキサンの製造方法
JP3362630B2 (ja) * 1997-02-28 2003-01-07 信越化学工業株式会社 直接法メチルクロルシラン合成より副生する高沸点成分からのモノシラン類の製造方法
US6337415B1 (en) * 1999-11-04 2002-01-08 Shin-Etsu Chemical Co., Ltd. Process for preparing tetrakis (trimethylsily) silane and tris (trimethysilyl) silane
DE102006034061A1 (de) * 2006-07-20 2008-01-24 REV Renewable Energy Ventures, Inc., Aloha Polysilanverarbeitung und Verwendung
DE102008042934A1 (de) * 2008-10-17 2010-04-22 Wacker Chemie Ag Verfahren zur Herstellung von Neopentasilanen
CA2743246A1 (en) * 2008-12-03 2010-06-10 Dow Corning Corporation Process for producing trichlorosilane and tetrachlorosilane
DE102009027194A1 (de) 2009-06-25 2010-12-30 Wacker Chemie Ag Verfahren zur Herstellung von Dodecahalogenneopentasilanen
DE102009056731A1 (de) * 2009-12-04 2011-06-09 Rev Renewable Energy Ventures, Inc. Halogenierte Polysilane und Polygermane
US8575381B2 (en) 2010-09-17 2013-11-05 Gelest Technologies, Inc. Trihydridosilyl-terminated polysilanes and methods of preparation
DE102010062984A1 (de) 2010-12-14 2012-06-14 Evonik Degussa Gmbh Verfahren zur Herstellung höherer Halogen- und Hydridosilane
DE102010063823A1 (de) * 2010-12-22 2012-06-28 Evonik Degussa Gmbh Verfahren zur Herstellung von Hydridosilanen
DE102013207441A1 (de) * 2013-04-24 2014-10-30 Evonik Degussa Gmbh Verfahren zur Herstellung von Hexachlordisilan durch Spaltung von höheren Polychlorsilanen wie Octachlortrisilan

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0250823B1 (de) 1986-05-27 1993-01-20 Bayer Ag Verfahren zur Herstellung von Organooxyhalogensilanen
DE3741946A1 (de) 1986-12-11 1988-06-16 Dow Corning Ltd Polysilan
DE3924193C2 (de) 1988-07-22 1995-04-13 Dow Corning Verfahren zur Herstellung eines alkoxyfunktionellen Methylpolysilans
EP0574912B1 (de) 1992-06-19 1999-01-07 Wacker-Chemie GmbH Verfahren zur Gewinnung von Methylchlorsilanen aus hochsiedenden Rückständen der Methylchlorsilansynthese
EP0635510A1 (en) 1993-07-19 1995-01-25 Dow Corning Corporation Catalytic conversion of direct process high-boiling component to chlorosilane monomers in the presence of hydrogen chloride
EP1179534A1 (de) 2000-08-10 2002-02-13 Wacker-Chemie GmbH Verfahren zum Aufarbeiten von Rückständen der Direktsynthese von Organochlorsilanen
EP1533315A1 (de) 2003-11-20 2005-05-25 Wacker-Chemie GmbH Verfahren zur Herstellung von Aklylchlorsilanen aus den Rückständen der Direktsynthese von Alkylchlorsilanen
DE102008025261B4 (de) 2008-05-27 2010-03-18 Rev Renewable Energy Ventures, Inc. Halogeniertes Polysilan und plasmachemisches Verfahren zu dessen Herstellung
EP2296804B1 (de) 2008-05-27 2014-03-12 Spawnt Private S.à.r.l. Halogeniertes polysilan und thermisches verfahren zu dessen herstellung
WO2011107360A1 (de) 2010-03-04 2011-09-09 Wacker Chemie Ag Verfahren zur umwandlung von disilanen

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
H. MARSMANN: "NMR: Oxygen-17 and Silicön-29", vol. 17, 1981, SPRINGER-VERLAG, article "Si-NMR Spectroscopic Results", pages: 65 - 235
R. LEHNERT; M. HÖPPNER; H. KELLING, Z. ANORG. ALLG. CHEM., vol. 591, 1990, pages 209 - 213

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018502817A (ja) * 2014-12-15 2018-02-01 ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド 塩素化オリゴシランの製造方法
RU2722027C1 (ru) * 2016-11-16 2020-05-26 АйЭйчАй КОРПОРЕЙШН Способ стабилизации хлорсиланового полимера
US11319212B2 (en) 2016-11-16 2022-05-03 Ihi Corporation Method for stabilizing chlorosilane polymer
WO2020205356A1 (en) 2019-03-29 2020-10-08 Momentive Performance Materials Inc. Low temperature process for the safe conversion of the siemens process side-product mixture to chloromonosilanes

Also Published As

Publication number Publication date
RU2673664C2 (ru) 2018-11-29
DE102015009129A1 (de) 2016-01-28
US20170166452A1 (en) 2017-06-15
US11104582B2 (en) 2021-08-31
RU2017105446A (ru) 2018-08-22
KR20170035981A (ko) 2017-03-31
CN106604924A (zh) 2017-04-26
CN106604924B (zh) 2020-04-03
RU2017105446A3 (ja) 2018-09-28
JP2017527514A (ja) 2017-09-21
EP3172261A1 (de) 2017-05-31
JP6655599B2 (ja) 2020-02-26
EP3172261B1 (de) 2018-10-24
DE102015009129B4 (de) 2016-12-15
EP3172261B2 (de) 2022-05-04

Similar Documents

Publication Publication Date Title
EP3172261B1 (de) Verfahren zur spaltung von silicium-silicium-bindungen und/oder von silicium-chlor-bindungen in mono-, poly- und/oder oligosilanen
EP2296804B1 (de) Halogeniertes polysilan und thermisches verfahren zu dessen herstellung
DE3128645C2 (de) Verfahren zur Herstellung eines R'↓3↓SiNH-enthaltenden Silazanpolymeren und dessen Verwendung zur Herstellung von keramischem Siliciumcarbid
EP2651825B1 (de) Verfahren zur herstellung höherer halogen- und hydridosilane
EP0927734B1 (de) Kontinuierliches Verfahren zur Herstellung von Polyorganosiloxanen
WO2008009473A1 (de) Polysilanverarbeitung und verwendung
DE102005003899A1 (de) Verfahren zur kontinuierlichen Herstellung von alkoxyarmen Siliconharzen
DE69902232T2 (de) Mit silyl- und siloxylgruppen substituierte, ungesättigte endgruppen enthaltende carboranverbindungen
EP0157318B1 (de) Verfahren zur Herstellung von Siliconharzvorprodukten
DE1570446B2 (de) Verfahren zur Herstellung von Organosiloxanblockmischpolymeren
DE102008016696A1 (de) Plasmaunterstützte Organofunktionalisierung von Siliciumtetrahalogeniden oder von Organohalogensilanen
Kawahara et al. A spherosilicate oligomer with eight stable silanol groups as a building block of hybrid materials
DE3518878A1 (de) Phenylengruppen-haltige organosilane, verfahren zu ihrer herstellung
DE69221670T2 (de) Hexenylgruppen enthaltendes Siliconharz und Verfahren zu seiner Herstellung
WO2005123812A1 (de) Verfahren zur herstellung von hydroxyalkylpolysiloxanen
DE69512995T2 (de) Verfahren zur Härtung von einem Siloxan-Polymer
DE3918337A1 (de) Verfahren zur herstellung von organosiloxanen
DE2643469A1 (de) Silacyclopentenyl-bis-epsilon-caprolactam
DE1645651A1 (de) Verfahren zur Herstellung von Polysilarylensiloxanen
DE2542425C3 (de) Verfahren zur Herstellung von Hexasiloxycyclosiloxanen
WO2019060481A1 (en) CLEAVING DISILANE, CARBODISILANE AND OLIGOSILANE WITH CLEAVING COMPOUND AS CATALYST AND HYDROGENATION SOURCE
WO2017167715A1 (de) Gezielte herstellung von 2,2,3,3-tetrasilyltetrasilan
WO2021069081A1 (de) Verfahren zur herstellung von siloxanen aus hydridosiliciumverbindungen
WO2019060486A1 (en) PROCESS FOR PRODUCING ORGANOHYDRIDOCHLOROSILANES FROM HYDRUROSILANES
Tran et al. Methylene-bridged polysilsesquioxanes: substitution of a methylene spacer within a silicate matrix

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15788316

Country of ref document: EP

Kind code of ref document: A1

REEP Request for entry into the european phase

Ref document number: 2015788316

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 15327145

Country of ref document: US

Ref document number: 2015788316

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 2017503841

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 20177004483

Country of ref document: KR

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 2017105446

Country of ref document: RU

Kind code of ref document: A