WO2016008367A1

WO2016008367A1 - High vacuum electric arc pump and air extraction unit thereof

Info

Publication number: WO2016008367A1
Application number: PCT/CN2015/083276
Authority: WO
Inventors: 储继国
Original assignee: 储继国
Priority date: 2014-07-17
Filing date: 2015-07-03
Publication date: 2016-01-21
Also published as: CN104100492A; CN104100492B

Abstract

Disclosed are a high vacuum electric arc pump (1), and a high vacuum electric arc pump unit, a cryogenic high vacuum electric arc pump unit, a high vacuum evaporation coating unit and a cryogenic electric arc pump evaporation coating unit comprising the high vacuum electric arc pump, which belong to the field of vacuum production techniques. A high vapour pressure material is doped into a cathode target of a traditional electric arc pump, which substantially extends the high vacuum operating scope of the electric arc pump, and the high vapour pressure material is magnesium, aluminium, zinc or calcium, or a mixture of at least two thereof, and the high vapour pressure material has a weight percentage of 0.5-80% in the cathode target. A metal baffle plate (18) is provided between a cathode target (17) and an openable and closable panel (13) of the electric arc pump (1), and the metal baffle plate (18) is insulated from surrounding components, which eliminates the temperature rise of the panel (13), notably reduces the desorption of an adsorbed gas in the panel (13), and further improves the ultimate vacuum of the electric arc pump (1). In addition, the electric arc pump (1) is provided with a consumption forewarning measure for the cathode target (17), which effectively avoids the accident of burning through a cooling water jacket of the electric arc pump (1), and improves the reliability of the electric arc pump (1).

Description

High vacuum arc pump and its air pumping unit

Technical field

The invention belongs to the technical field of vacuum acquisition, and in particular relates to a high vacuum arc pump and an air extraction unit thereof.

Background technique

Patent 201210170072.1 (a pumping system and process)

Patent 201310241954.7 (vacuum furnace pumping system and its pumping process)

Patent 201310242244.6 (evaporation coating equipment and its pumping process)

Patent 201310241939.2 (plasma coating equipment and its pumping process)

The above four patents propose an arc pump that uses chemical discharge to extract gas by arc discharge (usually using titanium as an adsorbent), as well as its pumping unit, pumping process and typical applications. The arc titanium pump has a large pumping speed (easy to obtain tens of thousands of L / s large pumping speed), low energy consumption (about 1/3 of the conventional diffusion pump), quick start (a few seconds to a few minutes), no oil vapor pollution Significantly improve the quality of vacuum products. However, the arc titanium pump has the following disadvantages:

1. The pressure ≤10-2Pa section, the density of the space gas molecules is very low, the electrons collide with the gas molecules, the ionization probability is small, and the arc discharge cannot be maintained.

2. Part of the electrons emitted by the titanium target of the arc titanium pump will be wound around the back side of the titanium target and flow into the pump casing panel of the fixed arc pump base. The arc pump base is usually installed on the pump casing panel, so it is difficult to achieve effective Cooling results in localized temperature rise, releasing a large amount of desorbed gas, reducing the pumping efficiency and ultimate vacuum of the arc titanium pump.

3. When the cathode target is nearly exhausted, if the new target is not replaced in time, the arc will burn through the cooling water jacket of the arc pump base, resulting in a production accident.

The above shortcomings limit the promotion and application of the arc pump.

Summary of the invention

SUMMARY OF THE INVENTION The object of the present invention is to overcome the above-mentioned deficiencies of the prior art and to provide a high vacuum arc pump which can expand the high vacuum operating range, increase the ultimate vacuum, and use more reliable.

The present invention is achieved by a high vacuum arc pump comprising a pump casing and a power source on the pump casing a pump port is provided, and a base is fixed on the openable panel on one side of the pump casing, the base is insulated from the panel, and the base is electrically connected to the negative pole of the power source, the base The inner end is fixedly connected to the cathode target, the positive pole of the power source is electrically connected to the pump casing, and the pump casing is further provided with a metal baffle between the cathode target and the panel, the metal baffle and the metal baffle The surrounding components are insulated.

Further, a thermal conductive thin layer having a material characteristic spectrum different from a characteristic spectrum of the cathode target is disposed between the cathode target and the susceptor.

Preferably, the material of the heat conductive thin layer is iron or copper, and the heat conductive thin layer has a thickness of 0.5 to 2 mm.

Preferably, the material of the cathode target is titanium.

Further, the cathode target is doped with other materials, and the other material is magnesium, aluminum, zinc, calcium or a mixture of any two of them, and the weight percentage of the other materials in the cathode target is 0.5. ~80%.

The invention also provides a high vacuum arc pump unit, comprising a vacuum chamber, which is respectively connected with a rough pump, a traction molecular pump and a high vacuum arc pump as described above;

The vacuum chamber is connected to the rough pump through a first vacuum valve, the vacuum chamber is connected to the traction molecular pump through a second vacuum valve, and the traction molecular pump is connected to the foreline pump through a third vacuum valve. The vacuum chamber is sequentially connected to the high vacuum arc pump via a dust shield and a fourth vacuum valve, and the vacuum chamber is further connected with a gas release valve and a vacuum gauge.

The vacuum chamber is connected to the rough pump through a first vacuum valve, the vacuum chamber is connected to the traction molecular pump through a second vacuum valve, and the traction molecular pump is connected to the foreline pump through a third vacuum valve. The vacuum chamber is sequentially connected to the high vacuum arc pump via a fourth vacuum valve and a dust shield, and the vacuum chamber is further connected with a gas release valve and a vacuum gauge.

The invention also provides a cryogenic high vacuum arc pump unit, comprising a vacuum chamber, which is respectively connected with a cryogenic pump, a rough pump, a traction molecular pump and a high vacuum arc pump as described above;

The vacuum chamber is connected to the rough pump through a first vacuum valve, and the vacuum chamber is respectively connected to the cryogenic pump and the traction molecular pump through a second vacuum valve, and the traction molecular pump passes through a third vacuum The valve is connected to the foreline pump, and the vacuum chamber is connected to the high vacuum arc pump via a dust shield and a fourth vacuum valve, and the vacuum chamber is further connected with a vent valve and a vacuum gauge, respectively.

The invention also provides a cryogenic arc pump evaporation coating unit, comprising a coating chamber, the coating chamber A rough pump, a traction molecular pump, and a high vacuum arc pump as described above are respectively connected;

The coating chamber is connected to the rough pump through a first vacuum valve, and the coating chamber is respectively connected to a cryogenic pump and the traction molecular pump through a second vacuum valve, and the traction molecular pump passes through a third vacuum valve The front stage pump is connected, and the coating chamber is connected to the high vacuum arc pump via a dust shield and a fourth vacuum valve, and the coating chamber is further connected with a gas release valve and a vacuum gauge.

The advantages of the invention are as follows:

(1) The arc pump provided by the invention has a high ultimate vacuum, and the high vacuum operating range is more than 100 times higher than that of the conventional arc pump.

(2) The arc pump provided by the invention is reliable in operation, and can issue an early warning signal when the cathode target is exhausted, thereby avoiding a cooling water jacket burn-through accident of the arc pump base.

(3) The arc pump provided by the present invention also has a large instantaneous pumping speed and instantaneous pumping flow rate.

(4) The high vacuum arc pump unit provided by the invention can replace the large-scale diffusion pump + Roots pump unit with high energy consumption and high oil vapor pollution which is widely used at present, saves 80% of pumping energy consumption, eliminates oil vapor pollution, and improves vacuum. product quality.

DRAWINGS

In order to more clearly illustrate the technical solutions of the present invention, the drawings used in the embodiments will be briefly described below. It is obvious that the drawings in the following description are only some embodiments of the present invention, which are common in the art. For the skilled person, other drawings can be obtained from these drawings without any creative work.

1 is a schematic view of a high vacuum arc pump according to a first embodiment of the present invention.

2 is a schematic view of a high vacuum arc pump unit according to a second embodiment of the present invention.

3 is a schematic view of a cryogenic high vacuum arc pump unit according to a third embodiment of the present invention.

4 is a schematic view of a high vacuum evaporation coating unit provided in Embodiment 4 of the present invention.

5 is a schematic view of a cryogenic arc pump evaporation coating unit provided in Embodiment 5 of the present invention.

detailed description

The technical solutions in the embodiments of the present invention will be clearly and completely described in the following with reference to the accompanying drawings.

Embodiment 1 High Vacuum Arc Pump

As shown in FIG. 1 , a high vacuum arc pump 1 according to a first embodiment of the present invention includes a pump casing 11 . The upper part of the pump casing 11 is provided with a pump port 12 , and the right side of the pump casing 11 is a panel 13 that can be opened and closed. The base 13 is fixed with a base 14 and the base 14 is insulated from the panel 13. The base 14 is electrically connected to the negative pole of the power source 15. The base 14 is provided with a cooling water jacket 16 and the cooling water jacket 16 is cooled. The water is cooled to the susceptor 14. The inner end of the susceptor 14 is fixedly connected to the cathode target 17, the positive pole of the power source 15 is electrically connected to the pump casing 11, and the pump casing 11 is further provided with a metal between the cathode target 17 and the panel 13. The baffle 18, the metal baffle 18 is preferably stainless steel or aluminum, and the metal baffle 18 is insulated from surrounding components.

Since the metal baffle 18 is disposed between the cathode target 17 and the panel 13, the metal baffle 18 can prevent electrons emitted from the cathode target 17 from flowing into the panel 13, so that the temperature of the panel 13 does not rise, and the panel 13 does not need water cooling, The phenomenon of massive desorption of adsorbed gas occurs again. The electron flow from the cathode target 17 flows into the metal baffle 18, but the metal baffle 18 is insulated from the surrounding components, electrons flowing into the metal baffle 18 cannot be separated, and the metal baffle 18 generates a negative voltage, preventing subsequent electrons from continuing to flow. The temperature of the metal baffle 18 does not rise.

The cathode target 17 is made of a material capable of chemically reacting with a gas to form a solid phase material (that is, capable of obtaining chemisorption and pumping). The material of the cathode target 17 is preferably titanium, and the cathode target 17 is also doped with high vapor at a high temperature. Other materials which are pressed and also have partial pumping action, preferably metal, aluminum, zinc, calcium or a mixture of any two of them, the metal material being present in the cathode target 17 in a weight percentage of from 0.5 to 80%.

Since the cathode target 17 is doped with a high vapor pressure metal material, when the arc discharge is performed, the metal material is mixed with the titanium atom to evaporate at the same time, and a thin layer of metal vapor having a higher pressure (>0.1 Pa) is formed on the surface of the cathode target 17 when When the pressure inside the pump casing 11 is lowered and the arc discharge cannot be maintained, the thin metal vapor layer is used to maintain the arc discharge, thereby greatly expanding the high vacuum operation range of the arc pump 1. Since the vapor pressure of the metal material incorporated at room temperature is less than 10 ^-9 Pa, the ultimate pressure of the arc pump 1 is not affected, and the measured results show that the present embodiment can be in a high vacuum region of ≤10 ^-4 Pa. The segment runs stably. Further, since the doped metal material can also remove gases such as O ₂ and H ₂ O at a high temperature, the cathode target 17 of the present embodiment does not significantly decrease in pumping speed after the metal material is incorporated. In addition, since the price of the incorporated metal material is relatively low, the cost of the cathode target 17 can be reduced, and the running cost of the embodiment can be reduced.

Further, between the cathode target 17 and the susceptor 14, a heat conducting thin layer 19 having a characteristic spectrum different from that of the cathode target 17 is further disposed. The material of the heat conductive thin layer 19 is preferably iron or copper, and the thermal conductive thin layer The thickness of 19 is preferably 0.5 to 2 mm. When the cathode target 17 of the arc pump 1 is exhausted, the original of the heat conductive thin layer 19 When the child begins to evade, the color of the arc discharge will change accordingly, warning that the cathode target 17 is exhausted, and it is necessary to replace the new target in time, thereby effectively avoiding the burning of the cooling water jacket 16 .

Further, the outer wall of the pump casing 11 is provided with a water-cooling passage 110 in addition to the panel 19, and the water-cooling passage 110 is provided with cooling water for cooling the pump casing 11.

The arc pump 1 provided in the first embodiment can be used for a high vacuum arc pump unit, a cryogenic high vacuum arc pump unit, a high vacuum device (for example, a high vacuum evaporation coating unit, a brazing furnace, a melting furnace, a sintering furnace, an epitaxial furnace, and a heat treatment). And de-hydrogen furnaces, etc., cryogenic high vacuum equipment (such as cryogenic arc pump evaporation coating unit, brazing furnace, melting furnace, sintering furnace, epitaxial furnace, heat treatment and dehydrogenation furnace, etc.).

Embodiment 2 High vacuum arc pump unit

As shown in FIG. 2, a high vacuum arc pump unit according to a second embodiment of the present invention includes a vacuum chamber 21 connected to a rough pump 22, a traction molecular pump 23, and a high as described in the first embodiment. Vacuum arc pump 1;

Specifically, the vacuum chamber 21 is connected to the rough pump 22 through the first vacuum valve 24, the vacuum chamber 21 is connected to the traction molecular pump 23 through the second vacuum valve 25, and the traction molecular pump 23 is passed through the third vacuum valve 26 and the foreline pump 27 The vacuum chamber 21 is connected to the high vacuum arc pump 1 via the dust shield 28 and the fourth vacuum valve 29, and the dust shield 28 is preferably an electrostatic dust shield. The vacuum chamber 21 is also connected with a vent valve 210 and a vacuum gauge 211, respectively. .

Wherein, the arc pump 1 is mainly used for extracting the active gas in the fine pumping stage, the traction molecular pump 23 is used for extracting the inert gas in the fine pumping stage and the pumping in the medium vacuum stage, and the rough pump 22 is only used in the rough pumping stage. Pumping, running time only accounts for 1/10 of the total pumping time.

The pumping process of the high vacuum arc pump unit of the second embodiment includes the following steps:

(1) Roughing stage: 22 gas is pumped by the rough pump, and the pressure of the vacuum chamber 21 is pumped from atmospheric pressure to about 10 ² Pa, and then no longer runs;

(2) medium vacuum stage: pumping by the traction molecular pump 23 + the foreline pump 27, the pressure of the vacuum chamber 21 is pumped from 10 ² Pa to about 0.1 Pa;

(3) Fine extraction stage: The arc pump 1 + the traction molecular pump 23 + the foreline pump 27 is evacuated, and the pressure of the vacuum chamber 21 is drawn from 0.1 Pa to a high vacuum.

The high vacuum arc pump unit provided in the second embodiment can replace the traditional large diffusion pump + Roots pump + rough pump unit (referred to as diffusion pump unit), obtain high vacuum better than 10 ^-4 Pa, and save energy consumption. More than 80%, reduce operating costs by more than 60%, and can eliminate oil vapor pollution and improve the quality of vacuum products.

Embodiment 3 cryogenic high vacuum arc pump unit

As shown in FIG. 3, the third embodiment provides a cryogenic high vacuum arc pump unit, including a vacuum chamber 31. The vacuum chamber 31 is connected with a rough pump 32, a traction molecular pump 33, and the same as described in the first embodiment. High vacuum arc pump 1;

Specifically, the vacuum chamber 31 is connected to the rough pump 32 through the first vacuum valve 34, and the vacuum chamber 31 is connected to the cryogenic pump 36 and the traction molecular pump 33 directly or through the second vacuum valve 35, respectively, and the traction molecular pump 33 passes through the third The vacuum valve 37 is connected to the foreline pump 38, and the vacuum chamber 31 is connected to the high vacuum arc pump 1 through the dust shield 39 and the fourth vacuum valve 310, respectively, and the vacuum chamber 31 is also connected with a deflation valve 311 and a vacuum gauge 312, respectively.

Wherein, the cryogenic pump 36 is used for pumping out the medium and high vacuum condensable gas, the arc pump 1 is mainly used for extracting the active gas in the fine pumping stage, and the traction molecular pump 33 is used for extracting the inert gas in the fine pumping stage and In the middle vacuum stage, the rough pump 32 is only used for pumping in the rough pumping stage, and the running time is only 1/5 of the total pumping time.

The pumping process of the cryogenic arc pump unit of the third embodiment of the present invention comprises the following steps:

(1) rough pumping stage: pumping by the rough pump 32, pumping the pressure of the vacuum chamber 31 from atmospheric pressure to about 10 ² Pa;

(2) Medium vacuum stage: pumping by the traction molecular pump 33+ fore pump 38+ cryogenic pump 36, or pumping by the traction molecular pump 33+ cryogenic pump 36, pumping the pressure of the vacuum chamber 31 from about 10 ² Pa Up to about 0.1 Pa;

(3) Fine pumping stage: pumping by arc pump 1 + fore pump 38 + traction molecular pump 33 + cryogenic pump 36, or pumping by arc pump 1 + traction molecular pump 33 + cryogenic pump 36, vacuum chamber The pressure of 31 was drawn from a pressure of about 0.1 Pa to a high vacuum.

Further, before the arc pump 1 is operated, the fourth vacuum valve 310 connected to the arc pump 1 is turned off 0.5 to 5 minutes earlier, and the arc pump 1 is turned on, and after the accumulation of more active titanium film is completed, the fourth vacuum valve is opened. The 310 starts pumping and obtains a huge instantaneous pumping speed and pumping flow.

The cryogenic high vacuum arc pump unit provided in the third embodiment has high pumping efficiency, and the pumping time is about 1/2 of that of the high vacuum arc pump unit described in the second embodiment.

Embodiment 4 high vacuum evaporation coating unit

As shown in FIG. 4, a high vacuum evaporation coating unit according to a fourth embodiment of the present invention includes a coating chamber 41 connected to a rough pump 42, a traction molecular pump 43, and a high as described in the first embodiment. Vacuum arc pump 1;

Specifically, the coating chamber 41 is connected to the rough pump 42 through the first vacuum valve 44, the coating chamber 41 is connected to the traction molecular pump 43 through the second vacuum valve 45, and the traction molecular pump 43 is passed through the third vacuum valve 46 and the front. The pumping unit 47 is connected, and the coating chamber 41 is connected to the high vacuum arc pump 1 via the dust shield 48 and the fourth vacuum valve 49 in sequence. The dust shield 48 is preferably an electrostatic dust shield, and the coating chamber 41 is also connected with a vent valve 410 and Vacuum gauge 411.

The arc pump 1 is mainly used for extracting the active gas in the fine pumping stage, the traction molecular pump 43 is used for pumping out the inert gas in the fine pumping stage and the pumping in the medium vacuum stage, and the rough pump 42 is only used in the rough pumping stage. Pumping, running time only accounts for 1/10 of the total pumping time.

Among them, the rough pump 42 is only used for pumping in the rough pumping stage, the arc pump 1 is mainly used for pumping in the fine pumping stage, and the traction molecular pump 43 and the foreline pump 47 are used for pumping in the middle vacuum stage and the fine pumping stage. .

Specifically, the pumping process of the high vacuum evaporation coating unit of the fourth embodiment of the present invention includes the following steps:

(1) Preparation stage: loading the workpiece into the coating chamber 41, closing the coating chamber 41 and all the vacuum valves, sequentially opening the foreline pump 47, the third vacuum valve 46, and the traction molecular pump 43, and the traction molecular pump 43 is in a standby state;

(2) starting the rough pump 42, opening the first vacuum valve 44, and the coating chamber 41 is pumped by the rough pump 42;

(3) When the pressure of the coating chamber 41 is reduced to 120 Pa, the fourth vacuum valve 49 is opened, and the rough pump 42 simultaneously pumps the arc pump 1;

(4) When the pressure of the coating chamber 41 is reduced to 100 Pa, the first vacuum valve 44, the rough pump 42 are sequentially closed, the second vacuum valve 45 is opened, and the coating chamber 41 is evacuated by the traction molecular pump 43;

(5) when the pressure of the coating chamber 41 is reduced to 0.15 Pa, the fourth vacuum valve 49 is closed, and the arc pump 1 is turned on;

(6) When the pressure of the coating chamber 41 is reduced to 0.1 Pa, the fourth vacuum valve 49 is opened, and the coating chamber 41 is evacuated by the arc pump 1 + the traction molecular pump 43;

(7) When the pressure of the coating chamber 41 is reduced to the degree of vacuum required for the coating (for example, 10 ^-3 Pa), the normal operation of the coating is started;

(8) When the normal operation of the coating is finished, the fourth vacuum valve 49 and the second vacuum valve 45 are closed, the arc pump 1 is turned off, then the deflation valve 410 is opened to deflate, the atmosphere is injected into the coating chamber 41, and the coating chamber 41 is opened. The workpiece is taken out to complete the coating operation cycle.

Compared with the vacuum coating equipment of the conventional diffusion pump unit, the high vacuum evaporation coating unit provided in the fourth embodiment saves 80% of the energy consumption of the pumping, significantly improves the product quality, and has significant economic benefits.

Embodiment 5 cryogenic arc pump evaporation coating unit

As shown in FIG. 5, a cryogenic arc pump evaporation coating unit provided in Embodiment 5 of the present invention includes a coating chamber 51, and the coating chamber 51 is respectively connected with a rough pump 52, a traction molecular pump 53, and the first embodiment. High vacuum arc pump 1;

Specifically, the coating chamber 51 is connected to the rough pump 52 through the first vacuum valve 54, and the coating chamber 51 is connected to the cryogenic pump 56 and the traction molecular pump 53 through the second vacuum valve 55, respectively, and the cryogenic pump 56 is used for pumping. The condensing gas, the traction molecular pump 53 is connected to the foreline pump 58 through the third vacuum valve 57, and the coating chamber 51 is connected to the high vacuum arc pump 1 via the dust shield 59 and the fourth vacuum valve 510, respectively, and the coating chamber 51 is also respectively A vent valve 511 and a vacuum gauge 512 are connected.

Among them, the rough pump 52 is only used for pumping in the rough pumping stage, the arc pump 1 is mainly used for pumping in the fine pumping stage, and the traction molecular pump 53 and the foreline pump 58 are used for pumping in the middle vacuum stage and the fine pumping stage. .

The pumping process of the cryogenic arc pump evaporation coating unit of the fifth embodiment of the present invention comprises the following steps:

(1) rough pumping stage: pumping by the rough pump 52, pumping chamber 51 pressure from atmospheric pressure to 10 ⁵ ~ 100Pa;

(2) Medium vacuum stage: pumping by the traction molecular pump 53 + the foreline pump 58 + the cryogenic pump 56, pumping the pressure of the coating chamber 51 from 10 ⁵ to 100 Pa to 100 to 0.1 Pa;

(3) Fine pumping stage: pumping by the traction molecular pump 53 + the foreline pump 58 + the cryogenic pump 56 + the arc pump 1 , and pumping the pressure of the coating chamber 51 from 100 to 0.1 Pa to 0.1 to 5 × 10 ^-2 Pa.

Specifically, the pumping process of the cryogenic arc pump evaporation coating unit of the fifth embodiment of the present invention includes the following steps:

(1) Preparation stage: the workpiece to be plated is loaded into the coating chamber 51, the coating chamber 51 and all the vacuum valves are closed, and the foreline pump 58, the third vacuum valve 57, the traction molecular pump 53 and the cryogenic pump 56 are sequentially turned on, and the traction molecules are pulled. The pump 53 and the cryogenic pump 56 are in a standby state;

(2) starting the rough pump 52, opening the first vacuum valve 54, and the coating chamber 51 is pumped by the rough pump 52;

(3) When the pressure of the coating chamber 51 is lowered to 1000 Pa, the fourth vacuum valve 510 is opened, and the rough pump 52 simultaneously pumps the arc pump 1;

(4) When the pressure of the coating chamber 51 is reduced to 100 Pa, the first vacuum valve 54 and the rough pump 52 are sequentially closed, the second vacuum valve 55 is opened, and the coating chamber 51 is evacuated by the traction molecular pump 53 + the cryogenic pump 56;

(5) when the pressure of the coating chamber 51 is reduced to 0.15 Pa, the fourth vacuum valve 510 is closed, and the arc pump 1 is turned on;

(6) When the pressure of the coating chamber 51 is reduced to 0.1 Pa, the fourth vacuum valve 510 is opened, and the coating chamber 51 is evacuated by the arc pump 1 + the traction molecular pump 53 + the cryogenic pump 56;

(7) when the pressure of the coating chamber 51 is reduced to the degree of vacuum required for the evaporation coating (for example, 5 × 10 ^-2 Pa), pre-melting is started, and the coating is performed;

(8) After the coating is completed, the cooling is performed for about 1 minute, the fourth vacuum valve 510 and the second vacuum valve 55 are closed, the arc pump 1 is turned off, and then the deflation valve 511 is opened to deflate, and the atmosphere is injected into the coating chamber 51 to open the coating chamber 51. , the plated workpiece is taken out, and the coating cycle is completed.

The cryogenic arc pump evaporation coating unit provided in the fifth embodiment adopts a cryogenic pump 56 to remove the medium and high vacuum condensable gas, and the arc pump 1 is used to remove the high vacuum active gas, and the pumping efficiency is remarkably improved, and the conventional Compared with the diffusion pump evaporation coating equipment, the energy consumption of pumping is up to 80%, the vacuum coating quality of the product is significantly improved, and the production efficiency is doubled. Moreover, the equipment cost of the same capacity is slightly reduced, and the economic benefit is remarkable.

The above is a preferred embodiment of the present invention, and it should be noted that those skilled in the art can also make several improvements and retouchings without departing from the principles of the present invention. It is the scope of protection of the present invention.

Claims

A high vacuum arc pump includes a pump casing and a power source, a pump port is disposed on the pump casing, and a base is fixed on the openable panel on one side of the pump casing, and the base and the panel are Insulation, the pedestal is electrically connected to the negative pole of the power source, the inner end of the pedestal is fixedly connected to the cathode target, and the positive pole of the power source is electrically connected to the pump casing, wherein the pump casing is further provided A metal baffle between the cathode target and the panel, the metal baffle being insulated from surrounding components.
The high vacuum arc pump according to claim 1, wherein a heat conductive thin layer having a material characteristic spectrum different from a characteristic spectrum of the cathode target is disposed between the cathode target and the susceptor.
The high vacuum arc pump according to claim 2, wherein the heat conductive thin layer is made of iron or copper, and the heat conductive thin layer has a thickness of 0.5 to 2 mm.
A high vacuum arc pump according to claim 1 wherein the material of the cathode target is titanium.
The high vacuum arc pump according to any one of claims 1 to 4, wherein the cathode target is doped with other materials, and the other materials are magnesium, aluminum, zinc, calcium or at least two of them. Kind of mixing, the weight percentage of the other material in the cathode target is 0.5-80%.
A high vacuum arc pump unit, comprising a vacuum chamber, wherein the vacuum chamber is respectively connected with a rough pump, a traction molecular pump, and the high vacuum arc pump according to any one of claims 1 to 5;

The vacuum chamber is connected to the rough pump through a first vacuum valve, the vacuum chamber is connected to the traction molecular pump through a second vacuum valve, and the traction molecular pump is connected to the foreline pump through a third vacuum valve. The vacuum chamber is sequentially connected to the high vacuum arc pump via a dust shield and a fourth vacuum valve, and the vacuum chamber is further connected with a gas release valve and a vacuum gauge.
A cryogenic high vacuum arc pump unit comprising a vacuum chamber, wherein the vacuum chamber is respectively connected with a cryogenic pump, a rough pump, a traction molecular pump, and the method according to any one of claims 1 to 5 High vacuum arc pump;

The vacuum chamber is connected to the rough pump through a first vacuum valve, and the vacuum chamber is respectively connected to the cryogenic pump and the traction molecular pump through a second vacuum valve, and the traction molecular pump passes through a third vacuum The valve is connected to the foreline pump, and the vacuum chamber is connected to the high vacuum arc pump via a dust shield and a fourth vacuum valve, and the vacuum chamber is further connected with a vent valve and a vacuum gauge, respectively.
A high vacuum evaporation coating unit comprising a coating chamber, wherein the coating chamber is respectively connected with a rough pump, a traction molecular pump and the high vacuum arc pump according to any one of claims 1 to 5;

The coating chamber is connected to the rough pump through a first vacuum valve, the coating chamber is connected to the traction molecular pump through a second vacuum valve, and the traction molecular pump is connected to the foreline pump through a third vacuum valve. The coating chamber is connected to the high vacuum arc pump via a dust shield and a fourth vacuum valve, and the coating chamber is also connected with a vent valve and a vacuum gauge, respectively.
A cryogenic arc pump evaporation coating unit, comprising a coating chamber, wherein the coating chamber is respectively connected with a rough pump, a traction molecular pump, and the high vacuum arc pump according to any one of claims 1 to 5. ;

The coating chamber is connected to the rough pump through a first vacuum valve, and the coating chamber is respectively connected to a cryogenic pump and the traction molecular pump through a second vacuum valve, and the traction molecular pump passes through a third vacuum valve The front stage pump is connected, and the coating chamber is connected to the high vacuum arc pump via a dust shield and a fourth vacuum valve, and the coating chamber is further connected with a gas release valve and a vacuum gauge.