CN204434714U - The equipment of a kind of subatmospheric plasma enhancing nitriding - Google Patents

The equipment of a kind of subatmospheric plasma enhancing nitriding Download PDF

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Publication number
CN204434714U
CN204434714U CN201520058633.8U CN201520058633U CN204434714U CN 204434714 U CN204434714 U CN 204434714U CN 201520058633 U CN201520058633 U CN 201520058633U CN 204434714 U CN204434714 U CN 204434714U
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furnace cavity
nitriding
nitriding furnace
hot
wire device
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林国强
韩治昀
魏科科
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Changzhou Institute Co Ltd Of Daian University Of Technology
Changzhou Institute of Dalian University of Technology
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Changzhou Institute Co Ltd Of Daian University Of Technology
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Abstract

An equipment for subatmospheric plasma enhancing nitriding, belongs to material surface modifying technology field.Comprise nitriding furnace cavity, nitrogenize bell is covered on nitriding furnace cavity upper opening, nitriding furnace cavity bottom is provided with support platform, place work piece in support platform, support platform is connected with workpiece bias power cathode, support platform and nitriding furnace cavity insulate, and grid bias power supply positive pole is connected with nitriding furnace cavity; Nitriding furnace cavity inner wall is installed with hot-wire device, and the negative pole of hot-wire device is connected with heated filament grid bias power supply negative pole, and heated filament grid bias power supply positive pole is connected with nitriding furnace cavity, and hot-wire device and nitriding furnace cavity insulate; Described nitriding furnace cavity wall is provided with vacuum system, described nitriding furnace cavity wall is also provided with chamber air inlet port.This invention adds hot-wire device on legacy equipment, excites the ionization of nitrogen, improves the concentration of Nitrogen ion in nitriding space, improves the efficiency of nitriding, solves the technical problem of ionitriding under lower pressure.

Description

The equipment of a kind of subatmospheric plasma enhancing nitriding
Technical field
The invention belongs to material surface modifying technology field, the surface modifying apparatus of particularly a kind of nitriding.
Background technology
Iron and steel oozes nitrogen studies and started from for 20 beginnings of the century, obtains industrial application after the twenties.Initial gas nitriding, is only limitted to, containing the steel of chromium, aluminium, just expand other steel grades to afterwards.From the seventies, nitriding is all developed rapidly and is gradually improved from theory to technique, the material be suitable for and workpiece also expanding day, becomes one of important chemical heat treatment process.
Nitriding makes nitrogen-atoms infiltrate the chemical heat treatment process of workpiece surface in certain medium at a certain temperature.Common have liquid nitriding, gas nitriding, ionitriding.Traditional gas nitriding is that workpiece is put into sealed vessel, pass to the ammonia of flowing and heat, after the insulation long period, ammonia thermolysis produces activated nitrogen atom, constantly be adsorbed onto workpiece surface, and diffusion is infiltrated in workpiece surface, thus change chemical composition and the tissue on top layer, obtain excellent surface property.Conventional is gas nitriding and ionitriding.
Ionitriding, also known as aura nitriding, utilizes glow discharge principle to carry out.Metal works is put into as negative electrode the negative-pressure container be connected with containing nitrogen medium, and the nitrogen hydrogen atom after energising in medium is ionized, between anode and cathode, form plasma zone.Under the effect of plasma zone highfield, the positive ion of nitrogen and hydrogen is to bombard to workpiece surface at a high speed.The kinetic energy of ion changes heat energy into, and heated parts surface is to temperature required.Due to the bombardment of ion, workpiece surface produces atom sputtering, is thus purified, and simultaneously due to absorption and diffusion, nitrogen infiltrates workpiece surface then.
Compared with general gas nitriding, the feature of ionitriding is: 1. can suitably shorten the nitriding cycle; 2. nitrided case fragility is little; 3. can the consumption of save energy and ammonia; 4. to the part maskable not needing nitriding, selective nitriding is realized; 5. ion bombardment has purification surface action, can remove workpiece surface passive film, can make stainless steel, the direct nitriding of high temperature steel workpiece; 6. alloying layer thickness and tissue can control.
But, the operating air pressure of conventional ion nitriding is 133Pa ~ 1330Pa, under the condition of air pressure lower than 100Pa, nitriding time is long, and energy consumption is large, this is mainly because under the condition that air pressure is lower, gas is thin, and ion excitation speed is comparatively slow, and in gas, Nitrogen ion content is low, nitriding efficiency reduces greatly, at present also not used for completing the equipment of efficient nitriding and the nitriding method of coupling thereof under low air pressure condition.
Utility model content
The object of this invention is to provide the equipment of a kind of subatmospheric plasma enhancing nitriding, this equipment increases the number of electrons of discharge space and the probability of collision of electronics and gas molecule by hot-wire device, promote the ionization of gas and the generation of active group, make gas can maintain stable glow discharge on the order of magnitude of 0.1-100Pa, by N 2effectively ionized and be deposited on workpiece, obtain uniform nitrided case.
The technical scheme that the present invention is adopted for achieving the above object is: the equipment of a kind of subatmospheric plasma enhancing nitriding, comprise nitriding furnace cavity, nitrogenize bell is covered on nitriding furnace cavity upper opening, it is characterized in that, described nitriding furnace cavity bottom is provided with support platform, place work piece in support platform, and support platform is connected with workpiece bias power cathode, support platform and nitriding furnace cavity insulate, and grid bias power supply positive pole is connected with nitriding furnace cavity; Described nitriding furnace cavity inner wall is installed with hot-wire device, and the negative pole of hot-wire device is connected with heated filament grid bias power supply negative pole, and heated filament grid bias power supply positive pole is connected with nitriding furnace cavity, and hot-wire device and nitriding furnace cavity insulate; Described nitriding furnace cavity wall is provided with vacuum system, described nitriding furnace cavity wall is also provided with chamber air inlet port.
Described hot-wire device adopts heated filament to be connected on direct supply two end electrodes, is provided with hot-wire device's switch in the circuit of hot-wire device, and described heated filament is the tungsten of diameter 0.5-1.5mm, molybdenum or tantalum wire.
Support platform insulation covering is installed between described support platform and nitriding furnace cavity, hot-wire device's insulation covering is installed between described hot-wire device and nitriding furnace cavity.
Described nitriding furnace cavity inner wall is also provided with well heater.
Apparatus of the present invention have following beneficial effect:
(1) equipment of a kind of subatmospheric plasma enhancing of the present invention nitriding adds hot-wire device on legacy equipment, this hot-wire device inspires a large amount of electronics when heating power, a large amount of electronics and nitrogen molecule collide, excite the ionization of nitrogen, improve the concentration of Nitrogen ion in nitriding space, improve the efficiency of nitriding, make air pressure still can realize efficient nitriding process under the condition of 0.1-100Pa, solve the technical problem of ionitriding under lower pressure;
(2) the surface recombination modified method of ionitriding provided by the present invention and arc ion plating, in the ionitriding stage, passes into N 2a certain amount of H is added while ionization 2, H 2add to reduce and produce the intensity of activation of activated nitrogen atom, increase the quantity of activated nitrogen atom, improve the efficiency of nitriding.
Accompanying drawing explanation
Fig. 1 is the structural representation of the equipment of a kind of subatmospheric plasma enhancing nitriding.
In figure: 1 nitrogenize bell, 2 heated filament grid bias power supplies, 3 hot-wire device's insulation coverings, 4 hot-wire device's switches, 5 hot-wire device, 6 vacuum systems, 7 workpiece bias power supplys, 8 grid bias power supply switches, 9 support platform insulation coverings, 10 support platforms, 11 chamber air inlet ports, 12 workpiece, 13 well heaters, 14 nitriding furnace cavitys
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described, but the present invention is not limited to specific embodiment.
Embodiment 1
The equipment of a kind of subatmospheric plasma enhancing nitriding as shown in Figure 1, comprise nitriding furnace cavity 14, nitrogenize bell 1 is covered on nitriding furnace cavity upper opening, nitriding furnace cavity bottom is provided with support platform 10, place work piece 12 in support platform, support platform lower end is stretched out nitriding furnace cavity and is connected with workpiece bias power supply 7 negative pole, support platform insulation covering 9 is installed between support platform and nitriding furnace cavity, to reach the object that support platform and nitriding furnace cavity insulate, workpiece bias positive source is connected with nitriding furnace cavity; Support platform adopts metallic substance to make, and makes the electromotive force of workpiece 12 equal with workpiece bias power cathode electromotive force, and nitriding furnace chamber outer wall ground connection, electromotive force is 0.
Nitriding furnace cavity wall is installed with hot-wire device 5, hot-wire device adopts heated filament to be connected on direct supply two end electrodes, hot-wire device's switch 4 is provided with in the circuit of hot-wire device, the negative pole of hot-wire device is connected with heated filament grid bias power supply 2 negative pole, heated filament grid bias power supply positive pole is connected with nitriding furnace cavity, hot-wire device's insulation covering 14 is installed between hot-wire device and nitriding furnace cavity, to reach the object that hot-wire device and nitriding furnace cavity insulate, nitriding furnace chamber outer wall ground connection, electromotive force is 0, and hot-wire device's electromotive force is negative, negative electromotive force is formed like this between hot-wire device and nitriding furnace cavity, the electronics that heated filament inspires leaves heated filament and moves to vacuum chamber under the effect of negative potential, increase electronics and N 2or H 2the probability of collision of molecule, facilitates N 2ionization and H 2the generation of active ion, is beneficial to exciting further and producing of electronics simultaneously, improves the efficiency of ionization.
Nitriding furnace cavity inner wall is provided with well heater 13, well heater can adopt resistive heating.
Nitriding furnace chamber outer wall is provided with vacuum system 6, vacuum system 6 adopts molecular pump to be installed on nitriding furnace chamber outer wall, and mechanical pump is connected on molecular pump.
Nitriding furnace cavity wall is also provided with chamber air inlet port 11, to pass into N 2or H 2.
Embodiment 2
Adopt equipment described in embodiment 1 to carry out subatmospheric ionitriding, comprise following concrete sequential steps:
(1) pre-treatment
Workpiece surface is carried out degreasing, deburring and descaling process;
(2) nitrided case is prepared
Workpiece after step (1) being processed is placed in the support platform of the equipment of above-mentioned subatmospheric plasma enhancing nitriding, closes nitriding furnace cavity, and it is 4.8 × 10 that startup vacuum system is evacuated to vacuum tightness -2pa, starting heater heats workpiece makes it be warming up to 300 DEG C, and start workpiece bias power supply, the parameter arranging workpiece bias power supply is operating frequency 5KHz, dutycycle is 85%, bias voltage amplitude is-400V, starts hot-wire device, and arranging the electric current passed in the heated filament of hot-wire device is 100A, the voltage at heated filament two ends is 100V, start heated filament grid bias power supply 2, the bias voltage arranging heated filament grid bias power supply is-50V, passes into N 2and H 2, pass into N 2flow be 50SCCM, pass into H 2flow be 50SCCM, reach 100Pa to air pressure, N 2and H 2under workpiece bias power supply, hot-wire device's ejected electron and the acting in conjunction of heated filament grid bias power supply, ionization forms the gaseous plasma of enhanced discharge and is surrounded on workpiece surface, carries out nitriding treatment 2 hours, namely obtains nitrided case.
Embodiment 3
Adopt equipment described in embodiment 1 to carry out subatmospheric ionitriding, comprise following concrete sequential steps:
(1) pre-treatment
Workpiece surface is carried out degreasing, deburring and descaling process;
(2) nitrided case is prepared
Workpiece after step (1) being processed is placed in the support platform of the equipment of above-mentioned subatmospheric plasma enhancing nitriding, closes nitriding furnace cavity, and it is 4.5 × 10 that startup vacuum system is evacuated to vacuum tightness -2pa, starting heater heats workpiece makes it be warming up to 450 DEG C, and start workpiece bias power supply, the parameter arranging workpiece bias power supply is operating frequency 25KHz, dutycycle is 45%, bias voltage amplitude is-600V, starts hot-wire device, and arranging the electric current passed in the heated filament of hot-wire device is 80A, the voltage at heated filament two ends is 90V, start heated filament grid bias power supply 2, the bias voltage arranging heated filament grid bias power supply is-40V, passes into N 2and H 2, pass into N 2flow be 150SCCM, pass into H 2flow be 200SCCM, reach 70Pa to air pressure, N 2and H 2under workpiece bias power supply, hot-wire device's ejected electron and the acting in conjunction of heated filament grid bias power supply, ionization forms the gaseous plasma of enhanced discharge and is surrounded on workpiece surface, carries out nitriding treatment 3 hours, namely obtains nitrided case.
Embodiment 4
Adopt equipment described in embodiment 1 to carry out subatmospheric ionitriding, comprise following concrete sequential steps:
(1) pre-treatment
Workpiece surface is carried out degreasing, deburring and descaling process;
(2) nitrided case is prepared
Workpiece after step (1) being processed is placed in the support platform of the equipment of above-mentioned subatmospheric plasma enhancing nitriding, closes nitriding furnace cavity, and it is 4.2 × 10 that startup vacuum system is evacuated to vacuum tightness -2pa, starting heater heats workpiece makes it be warming up to 500 DEG C, and start workpiece bias power supply, the parameter arranging workpiece bias power supply is operating frequency 40KHz, dutycycle is 5%, bias voltage amplitude is-1000V, starts hot-wire device, and arranging the electric current passed in the heated filament of hot-wire device is 50A, the voltage at heated filament two ends is 60V, start heated filament grid bias power supply 2, the bias voltage arranging heated filament grid bias power supply is-20V, passes into N 2and H 2, pass into N 2flow be 300SCCM, pass into H 2flow be 400SCCM, reach 20Pa to air pressure, N 2and H 2under workpiece bias power supply, hot-wire device's ejected electron and the acting in conjunction of heated filament grid bias power supply, ionization forms the gaseous plasma of enhanced discharge and is surrounded on workpiece surface, carries out nitriding treatment 4 hours, namely obtains nitrided case.
Embodiment 5
Adopt equipment described in embodiment 1 to carry out subatmospheric ionitriding, comprise following concrete sequential steps:
(1) pre-treatment
Workpiece surface is carried out degreasing, deburring and descaling process;
(2) nitrided case is prepared
Workpiece after step (1) being processed is placed in the support platform of the equipment of above-mentioned subatmospheric plasma enhancing nitriding, closes nitriding furnace cavity, and it is 4.0 × 10 that startup vacuum system is evacuated to vacuum tightness -2pa, starting heater heats workpiece makes it be warming up to 600 DEG C, and start workpiece bias power supply, the parameter arranging workpiece bias power supply is operating frequency 15KHz, dutycycle is 20%, bias voltage amplitude is-800V, starts hot-wire device, and arranging the electric current passed in the heated filament of hot-wire device is 20A, the voltage at heated filament two ends is 30V, start heated filament grid bias power supply 2, the bias voltage arranging heated filament grid bias power supply is-10V, passes into N 2and H 2, pass into N 2flow be 500SCCM, pass into H 2flow be 1000SCCM, reach 0.1Pa to air pressure, N 2and H 2under workpiece bias power supply, hot-wire device's ejected electron and the acting in conjunction of heated filament grid bias power supply, ionization forms the gaseous plasma of enhanced discharge and is surrounded on workpiece surface, carries out nitriding treatment 6 hours, namely obtains nitrided case.

Claims (4)

1. the equipment of subatmospheric plasma enhancing nitriding, comprise nitriding furnace cavity (14), nitrogenize bell (1) is covered on nitriding furnace cavity upper opening, it is characterized in that, described nitriding furnace cavity bottom is provided with support platform (10), place work piece (12) in support platform, and support platform is connected with workpiece bias power supply (7) negative pole, support platform and nitriding furnace cavity insulate, and grid bias power supply positive pole is connected with nitriding furnace cavity; Described nitriding furnace cavity inner wall is installed with hot-wire device (5), the negative pole of hot-wire device is connected with heated filament grid bias power supply (2) negative pole, and heated filament grid bias power supply positive pole is connected with nitriding furnace cavity, and hot-wire device and nitriding furnace cavity insulate; Described nitriding furnace cavity wall is provided with vacuum system (6), described nitriding furnace cavity wall is also provided with chamber air inlet port (11).
2. the equipment of a kind of subatmospheric plasma enhancing according to claim 1 nitriding, it is characterized in that, described hot-wire device adopts heated filament to be connected on direct supply two end electrodes, be provided with hot-wire device's switch (4) in the circuit of hot-wire device, described heated filament is the tungsten of diameter 0.5-1.5mm, molybdenum or tantalum wire.
3. the equipment of a kind of subatmospheric plasma enhancing according to claim 1 nitriding, it is characterized in that, support platform insulation covering (9) is installed between described support platform and nitriding furnace cavity, hot-wire device's insulation covering (3) is installed between described hot-wire device and nitriding furnace cavity.
4. the equipment of a kind of subatmospheric plasma enhancing according to claim 1 nitriding, is characterized in that, described nitriding furnace cavity inner wall is also provided with well heater (13).
CN201520058633.8U 2015-01-27 2015-01-27 The equipment of a kind of subatmospheric plasma enhancing nitriding Active CN204434714U (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110306151A (en) * 2019-07-22 2019-10-08 上海妙壳新材料科技有限公司 A kind of high-speed steel self-lubricating coat in use pre-processing device and its application method
CN112872348A (en) * 2020-12-31 2021-06-01 广东省科学院稀有金属研究所 Method for improving nitriding efficiency of rare earth-iron alloy
CN113529010A (en) * 2020-04-14 2021-10-22 深圳市和胜金属技术有限公司 Vacuum ion nitriding equipment

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110306151A (en) * 2019-07-22 2019-10-08 上海妙壳新材料科技有限公司 A kind of high-speed steel self-lubricating coat in use pre-processing device and its application method
CN113529010A (en) * 2020-04-14 2021-10-22 深圳市和胜金属技术有限公司 Vacuum ion nitriding equipment
CN112872348A (en) * 2020-12-31 2021-06-01 广东省科学院稀有金属研究所 Method for improving nitriding efficiency of rare earth-iron alloy

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