CN101294270A - Equipment and method for producing nichrome composite plate with vacuum arc ion plating - Google Patents

Equipment and method for producing nichrome composite plate with vacuum arc ion plating Download PDF

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Publication number
CN101294270A
CN101294270A CN 200810011714 CN200810011714A CN101294270A CN 101294270 A CN101294270 A CN 101294270A CN 200810011714 CN200810011714 CN 200810011714 CN 200810011714 A CN200810011714 A CN 200810011714A CN 101294270 A CN101294270 A CN 101294270A
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nickel
target
chromium
source
arc
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CN 200810011714
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CN101294270B (en
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张世伟
徐成海
张志军
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东北大学
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Abstract

The invention relates to a device for manufacturing a nickel-chromium composite plate by using vacuum arc ion plating to replace electroplating and a method thereof, and is characterized in that the device of the vacuum arc ion plating and the method are utilized to replace water electroplating to sequentially prepare the nickel-chromium composite plate composed of a pure nickel film, a nickel-chromium gradient transition film and a pure chromium film on a copper substrate; the device for manufacturing the nickel-chromium composite plate by using the vacuum arc ion plating is of a vertical cylindrical shape or a regular polygon; arc target sources are evenly distributed around a vacuum chamber wall; a controllable mechanical baffle plate is arranged in front of each target source; a planetary type work rest with rotation and revolution is arranged in the middle part of a vacuum chamber; the technical process of a filming operation comprises three stages that are preliminary treatment, the filming operation and post treatment. The device and the method simplify the process flows and the operation links, increase the work efficiency, fully replace the traditional electroplating technology to coat a wearproof anticorrosion decoration coating on a coppery water heating component, and thoroughly eliminate the environmental pollution problems in the electroplating.

Description

真空电弧离子镀制备镍铬复合镀层的设备及方法 The method and apparatus of a nickel-chromium composite coating prepared vacuum arc ion plating

[0001] 技术领域 [0001] Technical Field

[0002] 本发明涉及真空镀膜技术领域,特别涉及一种真空电弧离子镀代替水电镀在铜基底上制备镍铬复合镀层设备及方法。 [0002] The present invention relates to the field of vacuum coating technology, especially relates to a vacuum arc ion plating nickel-chrome composite coating apparatus and methods of making the copper plating a substrate in place of water.

[0003] 背景技术 [0003] BACKGROUND OF THE INVENTION

[0004] 在铜基底上镀制防腐耐磨镍铬复合镀层方法在工业产品中有大量应用,其典型产品如水暖器材元件。 [0004] On a copper substrate corrosion resistant nickel-chromium plated composite coating methods are widely used in industrial products, such products typically plumbing equipment element. 高档水暖件的生产工艺是:铜铸造成型,表面抛光,先镀镍,再镀铬。 Grade of plumbing production processes are: copper result, surface polishing, the first nickel plating, chrome plating again. 镍铬镀层的功能作用是提高产品的耐腐蚀性、表面耐磨性和表面光亮度。 Function nickel-chromium plating layer is to improve the corrosion resistance, surface abrasion resistance and surface brightness product. 表面膜层质量的优劣直接决定着产品的档次、价格和使用寿命。 The merits of the surface layer directly determines the quality of the product quality, price and service life. 长期以来,我国的水暖元件表面镀膜工艺一直采用水电镀技术。 For a long time, the surface of the coating process has been using water plumbing element plating techniques. 发展已经十分成熟。 Development has been very mature. 产品的耐腐蚀、耐磨损性能都能够满足实际生活使用的需求和行业的技术检验标准。 Corrosion-resistant products, wear resistance are able to meet the technical requirements and industry standard test used in real life.

[0005] 但是,电镀技术具有无法消除的致命缺点,那就是电镀产品镀层中残留的有害物质成分和电镀工艺环节中大量废液排放所带来的严重环境污染。 [0005] However, plating technology has fatal flaws can not be eliminated, and that is a lot of waste and emissions of harmful substances ingredients plating process links plating coating product remaining in the severe environmental pollution. 尤其是表层电镀铬工序中在产品表面残留的高价铬成分和排放的含铬电镀残液,不能在自然界环境中自然降解,它在生物和人体内积聚,能够造成长期性的危害,是一种毒性极强的致癌物质,也是严重的腐蚀介质。 In particular, the surface chromium electroplating step the product remaining on the surface of the chromium plating raffinate, not naturally degradable high emission component and chromium environment in nature, it accumulates in the body and in the biological, can cause long-term hazards, is an highly toxic carcinogen, is a serious corrosive media. 水暖件电镀工艺已经并仍然在严重地污染着人类的自然生态环境,迫切需要改进或替代。 Plumbing electroplating process has been and is still causing serious pollution to human natural environment, the urgent need to improve or replace.

[0006] 以无“三废”排放的真空镀膜方法代替水电镀工艺,是解决上述问题的良好途径之一。 [0006] In vacuum deposition method is not "waste" plating process instead of water discharged, is one good way to solve the above problems. 但是传统普通真空镀膜设备与工艺方法存在如下问题:(1)模仿水电镀工艺在铜基底上直接依次镀制纯镍膜和纯铬膜,很容易因镍膜层和铬膜层之间应力过大而导致膜层结合不牢甚至脱落;(2)采用固定成分靶材作为中间过渡层,例如可以采用含镍、铬各50%的靶材来沉积中间过渡层。 However, there is a general problem of the conventional apparatus and process for vacuum coating: (1) directly mimic the aqueous plating film are sequentially plating pure nickel and pure chromium film on the copper base, due to easily between the nickel layer and the chromium layer through the stress large that the film is not strong binding even fall off; (2) a fixed component of the intermediate layer as a target, for example, may be used nickel, 50% chromium targets each deposited intermediate layer. 但这种膜系结构只是将原来一个成分界面上的差异分摊到二个界面上了,从而减小了每一个界面的差异程度,却并没有消除界面的存在,反而增加了一个成分界面;(3)采用固定成分中间过渡层,要求镀膜机备有中间成分靶材的靶弧源,增加了设备的复杂程度,镀膜过程中三种靶弧源又是分别独立工作,使沉积速率低,工作时间长。 However, this film system had just a difference in the two component interface allocated to the interface, thereby reducing the degree of difference for each interface, but did not eliminate the presence of the interface, but adds a component interface; ( 3) a fixed component intermediate layer, the intermediate component required target coating machine with a target arc source, adds complexity to the device, the coating processes of three arc source and target respectively operate independently, so that a low deposition rate, work long time.

[0007] 发明内容 [0007] SUMMARY OF THE INVENTION

[0008] 针对现有电镀技术及真空镀膜技术存在的问题,本发明提供一种真空电弧离子镀代替水电镀在铜基底上制备镍铬复合镀层的设备及方法。 [0008] for the presence of the prior art electroplating and vacuum coating technology problem, the present invention provides a vacuum arc ion plating apparatus and method of water instead of nickel-chromium plating preparing composite coating on the copper substrate.

[0009] 本发明真空电弧离子镀膜设备包括镀膜真空室、真空系统、气动系统、供气系统、水冷系统、加热系统、传动系统、电气系统、控制与监测系统等辅助配套系统。 [0009] The vacuum arc ion plating apparatus according to the present invention comprises a vacuum coating chamber, vacuum systems, pneumatic systems, gas supply systems, water cooling systems, heating systems, drive system, electrical system, control and monitoring systems supporting other auxiliary systems.

[0010] 真空电弧离子镀膜设备的镀膜真空室为立式圆筒形或正多边形。 [0010] Vacuum coating chamber vacuum arc ion plating apparatus of a vertical cylindrical or a regular polygon. 在真空室壁周围,均匀地布置了电弧靶源,每个靶源前面都设置有可控机械挡板,真空室中部设置带有自转与公转的行星式工件架。 Around the vacuum chamber wall, disposed uniformly arc source target, each target is provided with a controllable source in front of the mechanical shutter, central vacuum chamber is provided with a workpiece holder planetary rotation and revolution.

[0011] 在镀膜真空室壁周围设置的靶源包括镍靶源和铬靶源两种电弧离子镀靶源,镍靶源的数量等于或略多于铬靶源的数量,镍靶源和铬靶源间隔交替排列。 [0011] Nickel chromium target source and target are two sources source arc ion plating target, a target amount of nickel is equal to or slightly more than a source of chromium target number of sources, the source of nickel and chromium target in a target source coating provided around the vacuum chamber wall comprises target source is separated alternately arranged. 当采用小圆平面电弧靶源,则两种靶源应该沿镀膜真空室筒壁周围方向分别成螺旋线上升的形式排列;当采用矩形或柱面电弧靶源,则应该沿真空室筒壁周围均匀竖直排布。 When using small circular arc plane target source, then the two targets are the source should be increased in a spiral form arranged along a line vacuum chamber surrounding the barrel wall coating direction; the target rectangular or cylindrical arc source, should be along the periphery of the cylindrical wall of the vacuum chamber uniformly arranged vertically. 两种靶源的排布要求处于工件架外侧的被镀工件都能够同时得到镍和铬的膜材沉积。 Arrangement requires two target source located outside the workpiece to be plated of the workpiece holder can be simultaneously obtained membrane deposition of nickel and chromium.

[0012] 承载被镀工件的悬挂式或托载式工件架布置在真空室的中部,采用行星式传动机构驱动,要具有自转和公转运动,以保证所有被镀工件都能够得到均匀的膜层沉积。 [0012] The carrier to be plated of the workpiece suspended or prop-load workpiece holder disposed in the middle of the vacuum chamber, the use of the planetary gear mechanism is driven to have rotation and orbital motion, to ensure that all the plating workpiece can obtain a uniform film deposition.

[0013] 在每个电弧靶源前面,设置可控的联动式挡板机构或分立式挡板机构。 [0013] arc in front of each source target, provided with a controllable shutter mechanism or linkage of formula discrete shutter mechanism. 其作用是防止一种靶源在停止工作阶段被另一种工作中的靶源污染;以及防止电弧靶源在起弧阶段喷射出的大液滴影响被镀工件的膜层质量,特别要求每一种靶源在启动引弧时都关闭挡板,直至形成稳定放电后再打开挡板,对被镀工件镀膜。 Its role is to prevent the one target source of the target phase is stopped pollution another work; film quality and prevent large drops in an electric arc source target arcing stage ejected to be plated of the workpiece, each special requirements one target source of the arc when starting the shutter are closed, until a stable discharge and then open the shutter of the workpiece to be plated film. 如果采用分立式挡板机构,是在每一个电弧靶源前都独立设置一个挡板,具体用法是:在镀制镍膜层时,将镍靶前的挡板打开,保持铬靶挡板关闭;在镀制铬膜层时,铬靶挡板打开,保持镍靶挡板关闭;在镀制镍-铬梯度过渡膜层时,两种靶源的挡板都打开。 If discrete shutter mechanism, a shutter is provided independently of each arc in front of the target source, specific usage is: when the nickel plating layer, the nickel target opening the front bezel, a chromium target holding flap off; when the chromium plating layer, chromium target to open the shutter, the shutter is closed to maintain a target of nickel; nickel-plating in - chromium gradient transition layer, source shutter two targets are open.

[0014] 本发明真空电弧离子镀代替电镀在铜基底上制备镍铬复合镀层方法所采用的技术方案是:在本发明提供的上述真空电弧离子镀膜设备内,全部采用真空电弧离子镀膜方法,在铜制元件基底上,依次沉积由纯镍膜层、镍铬梯度过渡膜层和纯铬膜层组成的镍铬复合镀层,一次装炉开机完成全部镀膜过程。 [0014] The vacuum arc present invention, ion plating instead of plating prepared on a copper substrate aspect nickel-chrome composite coating methods used are: in the vacuum arc ion plating apparatus according to the present invention provides, in all vacuum arc ion plating method, on a copper base member, the transition layer are sequentially deposited and pure chromium layer film pure nickel, nickel-chromium-nickel-chromium gradient composite coating composition, a coating loading furnace to complete a full boot procedure.

[0015] 镀膜作业的工艺过程分成前处理、镀膜作业和后处理三个阶段。 Process [0015] The coating operation is divided into pre-processing, post-processing operations and three coating stages.

[0016] 1.前处理阶段:将经过清洗烘干的被镀工件装挂在工件架上,关闭真空室门,依次启动真空系统的预抽泵和主泵,使真空室达到本底真空,其压强值应低于1×10-3Pa;充入工作气体氩气,压力至0.1~5Pa范围;启动离子轰击电源为工件加500~1200V轰击电压;对工件进行离子轰击清洗和加热,使其温度达到250~400℃后,关闭离子轰击电源。 [0016] 1. Pre-processing stages: After washing and drying the coated workpiece is mounted to the workpiece carrier hanging in the closed door of the vacuum chamber, the vacuum system in turn starts the main pump and backing pump in the vacuum chamber reaches the base pressure, pressure value which should be lower than 1 × 10-3Pa; charged with a working gas of argon, to a pressure range of 0.1 ~ 5Pa; start power for ion bombardment of the workpiece 500 ~ 1200V applied voltage bombardment; ion bombardment of the workpiece heating and cleaning, it after the temperature reached 250 ~ 400 ℃, ion bombardment power off.

[0017] 2.镀膜作业阶段:调节室内气体压力在5×10-2~5Pa范围内的合适值并维持不变,启动工件架旋转驱动;引弧启动镍靶弧源,打开镍靶挡板并关闭铬靶挡板,开始在铜制工件上沉积镍膜直至镍膜达到预期厚度;引弧启动铬靶弧源,打开铬靶挡板,进行镍铬共镀,沉积镍-铬梯度过渡膜;在镍铬共镀期间,逐渐提高铬靶弧源的发射电流和膜材发射速率,同时对应降低镍靶弧源的发射电流和膜材发射速率,使沉积膜层中镍的成分比例逐渐减少而铬的成分比例逐渐增加;直至所沉积镍-铬梯度过渡膜层达到预期厚度;调节铬靶弧源的发射电流至最大工作值并且镍靶弧源的发射电流降至很小后,关闭镍靶挡板,切断镍靶弧源电源;开始单独沉积表面纯铬膜,直至达到预期厚度,关闭铬靶挡板,切断铬靶弧源电源。 [0017] 2. Coating operational phases: adjusting the gas pressure chamber a suitable value in the range of 5 × 10-2 ~ 5Pa and remains unchanged, the rotational driving start workpiece holder; arc start target arc source of nickel, a nickel target shutter open chromium target and close the shutter, a nickel film deposition is started until the film reaches a desired thickness of nickel on the copper workpiece; arc arc chromium target promoter, the target shutter open chromium, nickel - chromium plating, Nickel - chromium film Graded ; composition ratio of nickel - chromium-plated during the gradual increase in the emission current and emission rate of chromium target membrane arc source, while the corresponding decrease in emission current transmission rate and the nickel target membrane arc source, the deposited film is gradually reduced nickel the chromium component ratio gradually increases; until the Nickel - chromium gradient transition layer reaches a desired thickness; the adjusted chromium target arc source emission current to the maximum operating value, and the nickel target arc emission current source is reduced to a small, closed Ni target shutter, a nickel target arc cutting power source; start separately deposited surface of the pure chromium film, until the desired thickness, the shutter closed chromium target, the chromium target arc cutting power source.

[0018] 3.后处理阶段:停止工件架驱动;充入氮气并逐渐升高真空室内压力至103Pa或103Pa以下,使工件降温至100℃以下;真空室放大气;开炉门,被镀工件出炉、检验、包装。 [0018] 3. The post-processing phase: stop driving the workpiece holder; flushed with nitrogen and gradually increasing the vacuum chamber pressure to 103Pa 103Pa or less, and cooling the workpiece to below 100 deg.] C; vacuum chamber enlarged air; open door, to be plated of the workpiece baked, testing and packaging.

[0019] 本发明真空电弧离子镀代替电镀制备镍铬复合镀层方法的主要特征: [0019] The vacuum arc ion plating according to the present invention is mainly characterized in place of nickel-chromium plating method of preparing a composite coating:

[0020] 1.本发明提出了一种适合于产品性能要求、与镀膜方法相匹配的涂层膜系结构。 [0020] 1. The present invention provides a product suitable for the performance requirements, the coating film deposition method and architecture matches. 所采用的涂层膜系是在铜基底上,依次沉积由纯镍膜、镍-铬梯度过渡膜和纯铬膜组成的三层镍铬复合镀层,如图3所示。 The coating film is used based on a copper substrate, sequentially depositing a pure nickel film, a nickel - Ni - Cr three layer composite coating film and a chromium Graded pure chromium film is formed, as shown in FIG. 其中镍膜层较厚,主要作用是与铜基底牢固结合和保护铜表面耐腐蚀;最外层的铬膜层相对较薄,主要作用是提高表面硬度和耐摩擦磨损能力、提高表面光亮度、增加产品装饰效果;处于中间的镍-铬过渡膜层厚度与铬膜层相当,其镍铬成分含量比例呈均匀梯度过渡变化,由靠近镍膜处为100%镍成分,直至靠近铬膜处为100%铬成分,主要作用是实现低应力软镍膜与高应力硬铬膜间的协调过渡,消除二种膜层间的应力。 Wherein the nickel layer is thick, the main role is to protect the copper surface and firmly bonded to the copper substrate corrosion; chromium outermost layer is relatively thin, the main role is to improve the surface hardness and abrasion wear resistance, to improve the surface brightness, increase decorative effect; in the middle of the Ni - Cr layer thickness and the transition layer of chromium equivalent content of nickel chromium component in a proportion in a uniform gradient transient change, the film is near 100% of the nickel component of the nickel, the chromium film at a point near 100 % chromium content, the main role is to achieve low stress coordinate the transition between the soft and the hard film is a nickel-chromium film having a high stress, stress-relief layer between the two kinds. 本发明提出的膜系结构只能在双靶材共沉积条件下才能够实现。 Membrane system proposed by the present invention can be achieved only in a dual-target co-deposition conditions.

[0021] 2.上述的三层镍铬复合镀层膜系,全部采用真空电弧离子镀技术镀制。 [0021] 2. The above three-layer composite coating film of nickel-chrome based, all vacuum arc ion plating using plating. 采用本发明提出的真空电弧离子镀膜设备中两种靶材弧源的协调匹配工作方法,正是实现由纯镍膜层向纯铬膜层均匀梯度过渡的最佳工艺。 Arc source target using two vacuum arc ion plating apparatus of the present invention proposed coordination matching working methods, it is optimum to achieve transition to a pure chromium film uniformity gradient pure nickel layer. 由于同属于电弧离子镀方法,镀镍电弧源和镀铬电弧源可以在同一镀膜室内、相同温度和压力条件下、同时工作而互不干扰。 Since an arc ion plating method belong, nickel and chrome arc source can be an arc source in the same coating chamber, the same temperature and pressure conditions, simultaneously and interfere with each other. 通过随意调节各自的工作电流而改变其沉积速率,达到制备镍-铬均匀梯度过渡膜层的目的。 Adjustable by a respective operating current deposition rate is changed, to the production of nickel - chromium object Graded uniform film layer. 此外,被镀工件在清洗、装炉后,一次就可以完成全部3种膜层的镀制加工,简化了工艺流程和作业环节,提高了工作效率。 Further, in the cleaning work to be plated, after loading the furnace, once to complete all three layers of plating process, it simplifies the process and operational aspects, improve work efficiency.

[0022] 3.本发明所提出的设备与方法,可以完全替代传统电镀技术为铜制水暖件等镀制防腐耐磨装饰膜层,彻底消除了电镀中的环境污染问题。 The proposed method and device [0022] 3. The present invention, can completely replace the conventional copper plating technique plumbing pieces of corrosion resistant decorative plating layer, the complete elimination of the problem of environmental pollution electroplating.

[0023] 附图说明 [0023] BRIEF DESCRIPTION OF DRAWINGS

[0024] 图1是本发明镀膜真空室设置小圆平面电弧靶螺旋排列的立式圆筒形真空电弧离子镀膜机俯视图; [0024] FIG. 1 is a coating of the present invention, a vacuum chamber disposed upright cylindrical vacuum arc ion plating small circular arc plane top view of the target helical arrangement;

[0025] 图2是图1的主视图; [0025] FIG. 2 is a front view of Figure 1;

[0026] 图3是本发明镀膜真空室设置柱面电弧靶竖直排列的立式正方形真空电弧离子镀膜机俯视图; [0026] FIG. 3 is a coating of the present invention is provided a cylindrical vacuum chamber vertically aligned vertical arc target vacuum arc ion plating square plan view;

[0027] 图4是图3的主视图; [0027] FIG. 4 is a front view of Figure 3;

[0028] 图5是本发明镍铬复合镀层的膜系组成示意图; [0028] FIG. 5 is a nickel-chromium-based composite coating film of the composition of the present invention, a schematic view;

[0029] 图6是本发明的工艺流程图。 [0029] FIG. 6 is a process flow diagram of the present invention.

[0030] 图中1真空室门,2真空室体,3圆平面电弧镍靶源,4联动式挡板,5悬挂式工件架,6圆平面电弧铬靶源,7观察窗,8真空室抽气口,9抽气口屏蔽挡板,10挡板驱动机构,11悬挂式工件架行星传动机构,12工件架驱动机构,13柱面电弧镍靶源,14柱面电弧铬靶源15托载式工件架,16托载式工件架行星传动机构。 [0030] FIG. 1 vacuum chamber door, the body 2 of the vacuum chamber, an arc 3 circular planar target source of nickel, 4 linkage baffles, suspended workpiece holder 5, 6 arc circular planar target source of chromium, the observation window 7, 8 vacuum chamber suction port, suction port 9 shielding shutter, the shutter driving mechanism 10, the workpiece carrier 11 suspended planetary gear mechanism, drive mechanism 12 of the workpiece, the arc 13 cylindrical target source of nickel, a chromium target 14 cylindrical arc-load source 15 Torr workpiece carrier, the workpiece carrier 16 torr-load planetary gear mechanism.

[0031] 具体实施方式 [0031] DETAILED DESCRIPTION

[0032] 实施例1: [0032] Example 1:

[0033] 本实施例真空电弧离子镀膜设备包括镀膜真空室、真空系统、气动系统、供气系统、水冷系统、加热系统、传动系统、电气系统、控制与监测系统等辅助配套系统。 [0033] Example embodiments of the present vacuum arc ion plating apparatus comprises a vacuum coating chamber, vacuum systems, pneumatic systems, gas supply systems, water cooling systems, heating systems, drive system, electrical system, control and monitoring systems supporting other auxiliary systems.

[0034] 本实施例真空电弧离子镀膜设备中镀膜真空室的结构是立式圆筒形结构,如图1、图2所示。 [0034] The configuration of the present embodiment, vacuum arc ion plating apparatus plating vacuum chamber is a vertical cylindrical configuration, as shown in FIG 1, FIG. 2.

[0035] 在镀膜真空室圆筒四周,设置有9只圆平面电弧镍靶源3和9只圆平面电弧铬靶源6,两种圆平面电弧镀靶源共18只;镍靶源3和铬靶源6成竖排间隔交替排列。 [0035] In the vacuum coating chamber cylinder four weeks, provided with a planar circular arc 9 of nickel source 3 and the target plane circular arc 9 chromium target source 6, two kinds of circular arc plane were plated target source 18; a nickel target and source 3 chromium target to vertical interval source 6 are alternately arranged. 沿镀膜真空室筒壁圆周方向分别成螺旋线上升的形式排布。 Vacuum coating chamber along the circumferential direction of the cylindrical wall, respectively, into a rising spiral form arrangement.

[0036] 在真空室上部中央布置有悬挂式工件架行星传动机构11,下带承载被镀工件的悬挂式工件架5,由工件架驱动机构12驱动,实现工件架5的公转和自转运动。 [0036] Central disposed in an upper portion of the vacuum chamber with an overhead workpiece carrier of the planetary gear mechanism 11, the tape carrying the suspended workpiece holder 5 to be plated of the workpiece, is driven by a workpiece carrier drive mechanism 12, to achieve the revolution and rotation movement of the workpiece holder 5.

[0037] 在每个电弧靶源与工件架之间,设置有可控的联动式挡板机构4。 [0037] In the arc between each source and target workpiece holder is provided with a controllable baffle linkage mechanism 4. 联动式挡板机构4有3块挡板,与沿圆周均匀排布的6列电弧靶源匹配工作的方式是:利用挡板驱动机构10,在镀制镍膜层时,挡板转到铬靶源6前面(图1中A位置处);在镀制镍-铬梯度过渡膜层时,转到空位处(图1中B位置处);在镀制铬膜层时,转到镍靶源前(图1中C位置处)。 Interlocking baffle means has three baffles 4, 6 arc source matching the target work uniform circumferential manner are arranged: using the shutter driving mechanism 10, when the nickel plating layer, chrome baffle to 6 in front of the target source (A position in FIG. 1); in the nickel plating - chromium gradient transition layer, to the gap (at position B in FIG. 1); in the chromium plating layer, a nickel target to front (the position in FIG. 1 C) source. 每一种靶源在启动引弧时都是关闭挡板,直至形成稳定放电后再打开挡板,对被镀工件镀膜。 Each target source when the arc starts are closed shutter, until a stable discharge and then open the shutter of the workpiece to be plated film.

[0038] 本实施例应用上述设备在铜基底上镀制镍铬复合镀层(结构如图5所示)作业的工艺过程分成前处理、镀膜作业和后处理三个阶段,具体工艺流程如图6所示。 [0038] The above apparatus of the present embodiment is applied on a copper substrate plated nickel-chrome composite coating (structure shown in Figure 5) process operation is divided into pre-processing, post-processing operations and three coating stages, the specific process shown in Figure 6 Fig.

[0039] 1.前处理阶段:将清洗烘干后的铜制被镀工件装挂在工件架5上;关闭真空室门1,依次启动真空系统的预抽泵和主泵,使真空室内压力达到本底真空1×10-3Pa;充入工作气体氩气,压力至0.5Pa;启动工件架驱动机构12使工件架5旋转;启动离子轰击电源为工件加800V轰击电压;对工件进行离子轰击清洗和加热,使其温度达到350℃后,关闭离子轰击电源。 [0039] 1. Pre-processing stages: After washing and drying the copper to be plated of the workpiece mounted on the workpiece carrier hanging 5; door closing the vacuum chamber 1, the vacuum system in turn starts the main pump and backing pump, the vacuum chamber pressure background vacuum reached 1 × 10-3Pa; charged with a working gas of argon, to a pressure of 0.5 Pa; 12 to start the workpiece holder driving mechanism 5 rotates the workpiece holder; start power for ion bombardment of the workpiece bombardment applied voltage 800V; ion bombardment of the workpiece cleaning and heating to a temperature after reaching 350 deg.] C, turn off the power ion bombardment.

[0040] 2.镀膜作业阶段:调节室内气体压力至0.6Pa维持不变;将联动式挡板4转到镍靶源3前面(图1中C位置处);引弧启动镍靶弧源3,调节电压至20V,每只靶的电流80A;将联动式挡板4转到铬靶源6前面(图1中A位置处),开始在工件上沉积镍膜,直至镍膜厚度达到6μm;引弧启动铬靶弧源6,调节电压至12V,每只靶的电流15A;将联动式挡板4转到空位处(图1中B位置处),进行镍铬共镀,沉积镍-铬梯度过渡膜;在镍铬共镀期间,逐渐提高铬靶弧源6的电压至20V,电流至80A,同时对应降低镍靶弧源3的电压至12V,电流至15A,直至所沉积镍-铬梯度过渡膜层厚度达到1.5μm;将联动式挡板4转到镍靶源3前面(图1中C位置处),切断镍靶弧源3的电源;开始单独沉积表面纯铬膜,直至厚度达到1.5μm;将联动式挡板4转到铬靶源6前面(图1中A位置处),切断铬靶弧源6的电源。 [0040] 2. Coating stages of operation: the gas pressure adjusting chamber to 0.6Pa unchanged; the linkage 3 to the front bezel 4 Ni target source (position C of FIG. 1); a nickel target to start arc Arc 3 adjusting the voltage to current 80A 20V, each target; the interlocking baffles 4 to 6 a chromium target in front of the source (at the position a in FIG. 1) to start depositing a nickel film on the workpiece, until the nickel film thickness of 6 m; start chromium target arc arc 6, the adjustment voltage to 12V, 15A of each of the target current; bezel 4 to the linkage at the gap (at position B in FIG. 1), co-nickel-chromium-plated, Nickel - chromium Graded film; during the nickel - chromium plating, gradually increasing the chromium target arc source voltage to 20V 6, the current to 80A, while the corresponding reduction of nickel target arc source voltage to 12V, current up to 15A 3 until the deposition of nickel - chromium Graded layer thickness of 1.5 m; the linkage 3 to the front bezel 4 (the position C in FIG. 1) target the source of nickel, a nickel target 3 off the power source arc; start deposition surface separate pure chromium film, to a thickness reached 1.5 m; the interlocking baffles 4 to 6 a chromium target in front of the source (a position in FIG. 1), cut off the power source 6 of the chromium target arc.

[0041] 3.后处理阶段:停止工件架驱动;充入氮气并逐渐升高真空室内压力至103Pa,使工件降温至100℃以下;真空室放大气;开炉门,工件出炉、检验、包装。 [0041] 3. The post-processing phase: stop driving the workpiece holder; flushed with nitrogen and vacuum chamber pressure was gradually increased to 103 Pa, the workpiece to cool to below 100 deg.] C; vacuum chamber enlarged air; open door, baked work, inspection, packaging .

[0042] 实施例2: [0042] Example 2:

[0043] 本实施例真空电弧离子镀膜设备包括镀膜真空室、真空系统、气动系统、供气系统、水冷系统、加热系统、传动系统、电气系统、控制与监测系统等辅助配套系统。 [0043] Example embodiments of the present vacuum arc ion plating apparatus comprises a vacuum coating chamber, vacuum systems, pneumatic systems, gas supply systems, water cooling systems, heating systems, drive system, electrical system, control and monitoring systems supporting other auxiliary systems.

[0044] 本实施例真空电弧离子镀膜设备中镀膜真空室的结构是立式正方形结构,如图3、图4所示。 [0044] The configuration of the present embodiment, vacuum arc ion plating apparatus plating vacuum chamber is a vertical square configuration, as shown in FIG 3, FIG. 4.

[0045] 在镀膜真空室体四角位置处,设置有2只柱面电弧镍靶源13和2只柱面电弧铬靶源14,两种柱面电弧镀靶源共4只,间隔交替竖直安放,相同靶材的2只靶源在镀膜真空室内对角线方向上相对排布。 [0045] The vacuum coating chamber at the four corners thereof, is provided with two cylindrical arc source 13 and the nickel target two chromium targets cylindrical arc source 14, two kinds of cylindrical target arc sources were plated four, vertically spaced alternately mounted, two opposing target the same target source are arranged in the diagonal direction of the vacuum coating chamber.

[0046] 在真空室上部中央布置有托载式工件架行星传动机构16,上面安放承载被镀工件的托载式工件架15,由工件架驱动机构12驱动,实现工件架15的公转和自转运动。 [0046] In the upper vacuum chamber disposed at the center have Tropsch-load workpiece carrier of the planetary gear mechanism 16, the upper mounting the carrier to be plated of the workpiece holder-loading workpiece holder 15, driving the workpiece holder driving mechanism 12 by the realization workpiece holder revolution and rotation 15 motion.

[0047] 在4个电弧靶源与工件架之间,设置有可控的联动式挡板机构4。 [0047] 4 arc between the source and the target workpiece holder is provided with a controllable baffle linkage mechanism 4. 联动式挡板机构4有2块挡板,与沿圆周均匀排布的4个电弧靶源匹配工作的方式是:利用挡板驱动机构10,在镀制镍膜层时,挡板转到铬靶源14前面(图3中A位置处);在镀制镍-铬梯度过渡膜层时,转到空位处(图3中B位置处);在镀制铬膜层时,转到镍靶源13前(图3中C位置处)。 Interlocking baffle has two shutter mechanism 4, the four arc source matching the target work uniform manner along the circumference are arranged: using the shutter driving mechanism 10, when the nickel plating layer, chrome baffle to source 14 in front of the target (the position A in FIG. 3); in a nickel plating - chromium gradient transition layer, to the gap (at position B in FIG. 3); when the chromium plating layer, a nickel target to source 13 before (at the position C in FIG. 3). 每一种靶源在启动引弧时都是关闭挡板,直至形成稳定放电后再打开挡板,对被镀工件镀膜。 Each target source when the arc starts are closed shutter, until a stable discharge and then open the shutter of the workpiece to be plated film.

[0048] 本实施例应用上述设备在铜基底上镀制镍铬复合镀层(结构如图5所示)作业的工艺过程分成前处理、镀膜作业和后处理三个阶段,具体工艺流程如图6所示。 [0048] The above apparatus of the present embodiment is applied on a copper substrate plated nickel-chrome composite coating (structure shown in Figure 5) process operation is divided into pre-processing, post-processing operations and three coating stages, the specific process shown in Figure 6 Fig.

[0049] 1.前处理阶段:将清洗烘干后的铜制被镀工件装挂在工件架15上;关闭真空室门1,依次启动真空系统的预抽泵和主泵,使真空室内压力达到本底真空2×10-3Pa;充入工作气体氩气,压力至0.6Pa;启动工件架驱动机构12使工件架15旋转;启动离子轰击电源为工件加900V轰击电压;对工件进行离子轰击清洗和加热,使其温度达到320℃后,关闭离子轰击电源。 [0049] 1. Pre-processing stages: After washing and drying the copper to be plated of the workpiece mounted on a workpiece holder 15 hanging; door closing the vacuum chamber 1, the vacuum system in turn starts the main pump and backing pump, the vacuum chamber pressure reached the base pressure 2 × 10-3Pa; charged argon working gas pressure to 0.6 Pa; 12 to start the workpiece holder driving mechanism rotating the workpiece holder 15; start power for ion bombardment of the workpiece bombardment applied voltage 900V; ion bombardment of the workpiece cleaning and heating to a temperature reached 320. after deg.] C, turn off the power ion bombardment.

[0050] 2.镀膜作业阶段:调节室内气体压力至0.4Pa维持不变;确认联动式挡板4处于镍靶源13前面(图3中C位置处);引弧启动镍靶弧源13,调节电压至20V,每只靶的电流380A;将联动式挡板4转到铬靶源14前面(图3中A位置处),开始在工件上沉积镍膜,持续时间2小时;引弧启动铬靶弧源14,调节电压至14V,每只靶的电流65A;将联动式挡板4转到空位处(图3中B位置处),进行镍铬共镀,沉积镍-铬梯度过渡膜;在镍铬共镀期间,逐渐提高铬靶弧源14的电压至20V,电流至380A,同时对应降低镍靶弧源13的电压至15V,电流至65A,持续时间0.5小时;将联动式挡板4转到镍靶源13前面(图3中C位置处),切断镍靶弧源电源;开始单独沉积表面纯铬膜,持续时间0.5小时;将联动式挡板4转到铬靶源14前面(图3中A位置处),切断铬靶弧源14电源。 [0050] 2. Coating stages of operation: the gas pressure adjusting chamber to 0.4Pa unchanged; interlocking baffle 4 is confirmed (FIG. 3 at position C) of the target source 13 in front of the nickel; nickel-arc start target arc source 13, adjusting the current and voltage to 20V, each target 380A; the interlocking baffles 14 in front of a chromium target 4 to the source (at the position a in FIG. 3) to start depositing a nickel film on a workpiece, the duration of 2 hours; arc starting chromium target arc source 14, a regulated voltage to 14V, 65A of each of the target current; bezel 4 to the linkage at the gap (at position B in FIG. 3), nickel - chromium plating, Nickel - chromium film Graded ; period of nickel - chromium plating, gradually increasing the chromium target arc source voltage to 20V, the current to 380A 14 while corresponding to reduce the voltage to 15V Ni target arc source 13, the current to. 65A, duration time of 0.5 hours; linkage type stopper 4 to the front plate 13 is a nickel target source (the position C in FIG. 3), a nickel target arc cutting power source; start separately deposited surface of the pure chromium film, duration time of 0.5 hours; the bezel 4 linkage to a chromium target source 14 front (A in FIG. 3 at a position), a chromium target arc cutting power source 14.

[0051] 3.后处理阶段:停止工件架驱动;充入氮气并逐渐升高真空室内压力至103Pa,使工件降温至100℃以下;真空室放大气;开炉门,工件出炉、检验、包装。 [0051] 3. The post-processing phase: stop driving the workpiece holder; flushed with nitrogen and vacuum chamber pressure was gradually increased to 103 Pa, the workpiece to cool to below 100 deg.] C; vacuum chamber enlarged air; open door, baked work, inspection, packaging .

Claims (5)

1.一种真空电弧离子镀制备镍铬复合镀层的设备,包括镀膜真空室,其特征在于该设备镀膜真空室为立式圆筒形或正多边形,在真空室壁周围,均匀地布置了电弧靶源,每个靶源前面设置有可控机械挡板,真空室中部设置带有自转与公转的行星式工件架。 Preparation of nickel-chromium plating apparatus 1. A vacuum arc ion composite coating, the coating comprising a vacuum chamber, wherein the vacuum chamber is a vertical plating apparatus a cylindrical or a regular polygon around the vacuum chamber wall, disposed uniformly arc source target, each target is provided with a controllable source in front of a mechanical shutter, a vacuum chamber is provided with a central workpiece holder rotation and planetary revolution.
2.按照权利要求1所述的真空电弧离子镀制备镍铬复合镀层的设备,其特征在于所述真空室壁的电弧靶源有镍靶源和铬靶源两种电弧离子镀靶源,镍靶源的数量等于或略多于铬靶源的数量,镍靶源和铬靶源间隔交替排列;当采用小圆平面电弧靶源,则两种靶源应该沿镀膜真空室筒壁周围方向分别成螺旋线上升的形式排列;当采用矩形或柱面电弧靶源,则沿真空室筒壁周围均匀竖直排布;两种靶源的排布要求处于工件架外侧的被镀工件都能够同时得到镍和铬的膜材沉积。 Claim 2. The vacuum arc ion plating apparatus 1 according to the preparation of nickel-chrome composite coating, wherein the arc chamber wall of the vacuum source of the target nickel chromium target source and target are two sources source arc ion plating target, a nickel the number of target source is equal to or slightly more than the target source of chromium, nickel chromium target source and the target intervals are alternately arranged source; employed when the small circle arc plane target source, the source should be in the two target directions around the vacuum coating chamber, respectively, the cylindrical wall into a spiral arranged in the form of increased; when the target rectangular or cylindrical arc source, along the circumference of the cylindrical wall of the vacuum chamber uniformly arranged vertically; arrangement of two targets in claim source located outside the workpiece to be plated of the workpiece holder can simultaneously resulting membrane deposition of nickel and chromium.
3.按照权利要求1所述的真空电弧离子镀制备镍铬复合镀层的设备,其特征在于所述每个电弧靶源前面设置有可控机械挡板为可控的联动式挡板机构或分立式挡板机构。 3. The vacuum arc plasma apparatus according to a nickel-chromium plating composite coating prepared as claimed in claim wherein said target source in front of each arc is provided with a controllable shutter controllable mechanical interlocking means or baffle sub vertical shutter mechanism.
4.按照权利要求1所述的真空电弧离子镀制备镍铬复合镀层的设备,其特征在于所述承载被镀工件的悬挂式或托载式工件架布置在真空室的中部,采用行星式传动机构驱动,要具有自转和公转运动,以保证所有被镀工件都能够得到均匀的膜层沉积。 Claim 4. The vacuum arc ion plating apparatus 1 according to the preparation of nickel-chrome composite coating, characterized in that the middle carrier to be plated of the workpiece holder or a suspended carrier frame type workpiece disposed in a vacuum chamber, the use of the planetary gear driving means, having to rotation and revolution movement, to ensure that all the work to be plated can be deposited to obtain a uniform film.
5.采用权利要求1所述的真空电弧离子镀制备镍铬复合镀层设备镀制镍铬复合镀层的方法,其特征在于该复合镀层的膜系由纯镍膜、镍-铬梯度过渡膜和纯铬膜组成,其镀制工艺过程分成前处理、镀膜作业和后处理三个阶段: 5. The use as claimed in claim 1, said vacuum arc ion plating method for plating nickel-chrome composite coating prepared nickel-chrome composite coating apparatus, characterized in that the film-based composite coating film of pure nickel, a nickel - chromium film and a gradual transition pure a chromium film, whose plating process is divided into pre-processing, post-processing operations and three coating stages:
(1)前处理阶段:将经过清洗烘干的被镀工件装挂在工件架上,关闭真空室门,依次启动真空系统的预抽泵和主泵,使真空室达到本底真空,其压强值应低于1×10-3Pa;充入工作气体氩气,压力至0.1~5Pa范围;启动离子轰击电源为工件加500~1200V轰击电压;对工件进行离子轰击清洗和加热,使其温度达到250~400℃后,关闭离子轰击电源; (1) pre-treatment phase: After washing and drying to be plated of the workpiece in the workpiece holder mounted hanging, door closed vacuum chamber, the vacuum system in turn starts the main pump and backing pump, the vacuum chamber reaches the base pressure, which pressure value should be less than 1 × 10-3Pa; charged with a working gas of argon, to a pressure range of 0.1 ~ 5Pa; start power for ion bombardment of the workpiece 500 ~ 1200V applied voltage bombardment; ion bombardment cleaning of the workpiece and heating to a temperature of after 250 ~ 400 ℃, ion bombardment power off;
(2)镀膜作业阶段:调节室内气体压力在5×10-2~5Pa范围内的合适值并维持不变,启动工件架旋转驱动;引弧启动镍靶弧源,打开镍靶挡板并关闭铬靶挡板,开始在铜制工件上沉积镍膜直至镍膜达到预期厚度;引弧启动铬靶弧源,打开铬靶挡板,进行镍铬共镀,沉积镍-铬梯度过渡膜;在镍铬共镀期间,逐渐提高铬靶弧源的发射电流和膜材发射速率,同时对应降低镍靶弧源的发射电流和膜材发射速率,使沉积膜层中镍的成分比例逐渐减少而铬的成分比例逐渐增加;直至所沉积镍-铬梯度过渡膜层达到预期厚度;调节铬靶弧源的发射电流至最大工作值并且镍靶弧源的发射电流降至很小后,关闭镍靶挡板,切断镍靶弧源电源;开始单独沉积表面纯铬膜,直至达到预期厚度,关闭铬靶挡板,切断铬靶弧源电源; (2) Coating operational phases: adjusting the gas pressure chamber a suitable value in the range of 5 × 10-2 ~ 5Pa and remains unchanged, the rotational driving start workpiece holder; arc start target arc source of nickel, a nickel target to open and close the shutter chromium target shutter, is deposited on the copper workpiece starts a nickel film until the film reaches a desired thickness of nickel; arc arc start chromium target, the target shutter open chromium, nickel - chromium plating, Nickel - chromium film gradual transition; in composition ratio of nickel - chromium plating period, the emission current and gradually increasing the transmission rate of the chromium target membrane arc source, while the corresponding decrease in emission current transmission rate and the nickel target membrane arc source, the deposited film of nickel and chromium gradually decreases the composition ratio is gradually increased; until the Nickel - chromium gradient transition layer reaches a desired thickness; chromium target adjusting arc current to the source of emission and the emission current value of the maximum working target arc source after the nickel down to small, the target speed Ni Close plate, a nickel target arc cutting power source; start separately deposited surface of the pure chromium film, until the desired thickness, the shutter closed chromium target, the chromium target arc cutting power source;
(3)后处理阶段:停止工件架驱动;充入氮气并逐渐升高真空室内压力至103Pa或103Pa以下,使工件降温至100℃以下;真空室放大气;开炉门,被镀工件出炉、检验、包装。 (3) Processing Stage: stopping the drive of the workpiece holder; flushed with nitrogen and gradually increasing the vacuum chamber pressure to 103Pa 103Pa or less, and cooling the workpiece to below 100 deg.] C; vacuum chamber enlarged air; open door, released the workpiece to be plated, testing and packaging.
CN 200810011714 2008-06-06 2008-06-06 Equipment and method for producing nichrome composite plate with vacuum arc ion plating CN101294270B (en)

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CN102102181A (en) * 2009-12-22 2011-06-22 鸿富锦精密工业(深圳)有限公司 Coating device
CN101724815B (en) 2009-12-16 2011-08-17 苏州爱迪尔自动化设备有限公司 Method for preparing energy-saving heating films
CN102220557A (en) * 2010-04-15 2011-10-19 鸿富锦精密工业(深圳)有限公司 Coating bracket and coating machine
CN102373422A (en) * 2010-08-24 2012-03-14 鸿富锦精密工业(深圳)有限公司 Vacuum coating system
CN102443766A (en) * 2010-10-15 2012-05-09 鸿富锦精密工业(深圳)有限公司 Film coating material frame and film coating equipment with same
CN102560439A (en) * 2012-03-29 2012-07-11 雅视光学有限公司 Method and device for carrying out surface treatment on plasma
CN102766875A (en) * 2012-07-09 2012-11-07 珠海承鸥卫浴用品有限公司 Surface treatment process for PVD wire drawing product
CN102851641A (en) * 2011-06-30 2013-01-02 比亚迪股份有限公司 Vacuum coater and metal high-temperature vacuum coating method
CN102965626A (en) * 2012-12-17 2013-03-13 中国南方航空工业(集团)有限公司 Nickel plating method of powder metallurgy porous material
CN103282541A (en) * 2011-01-05 2013-09-04 珐珂斯株式会社 Method and device for fingerprint resistant coating
CN102086508B (en) * 2009-12-08 2013-12-11 鸿富锦精密工业(深圳)有限公司 Film coating device
CN104100492A (en) * 2014-07-17 2014-10-15 储继国 High vacuum arc pump and pumping unit thereof
CN104975266A (en) * 2015-07-17 2015-10-14 惠州建邦精密塑胶有限公司 Furnace and method for magnetron sputtering ion plating of two layers of films
CN106321494A (en) * 2016-10-25 2017-01-11 郑州航空工业管理学院 Anti-erosion and friction-resistant film for fan blades of aeto-turbofan engine and preparation method of anti-erosion and friction-resistant film
CN106435489A (en) * 2016-11-30 2017-02-22 西北有色金属研究院 Preparation method for oxidation resisting self-healing Cr/NiCr coatings on niobium-based surface
CN106694344A (en) * 2016-11-28 2017-05-24 中信戴卡股份有限公司 Metal protection layer and method for forming metal protection layer
CN107779826A (en) * 2017-10-20 2018-03-09 深圳市生波尔光电技术有限公司 Arc ion plating film device
CN108531854A (en) * 2018-03-21 2018-09-14 中信戴卡股份有限公司 A kind of ageing-resistant periodic variable reacts black chromium plated film and forming method
CN110387525A (en) * 2019-08-15 2019-10-29 常州机电职业技术学院 A kind of medical apparatus surface titanizing processing unit and processing method

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CN102086508B (en) * 2009-12-08 2013-12-11 鸿富锦精密工业(深圳)有限公司 Film coating device
CN101724815B (en) 2009-12-16 2011-08-17 苏州爱迪尔自动化设备有限公司 Method for preparing energy-saving heating films
CN102102181A (en) * 2009-12-22 2011-06-22 鸿富锦精密工业(深圳)有限公司 Coating device
CN102220557A (en) * 2010-04-15 2011-10-19 鸿富锦精密工业(深圳)有限公司 Coating bracket and coating machine
CN102373422A (en) * 2010-08-24 2012-03-14 鸿富锦精密工业(深圳)有限公司 Vacuum coating system
CN102443766A (en) * 2010-10-15 2012-05-09 鸿富锦精密工业(深圳)有限公司 Film coating material frame and film coating equipment with same
CN103282541A (en) * 2011-01-05 2013-09-04 珐珂斯株式会社 Method and device for fingerprint resistant coating
CN102851641A (en) * 2011-06-30 2013-01-02 比亚迪股份有限公司 Vacuum coater and metal high-temperature vacuum coating method
CN102851641B (en) * 2011-06-30 2015-04-22 比亚迪股份有限公司 Vacuum coater and metal high-temperature vacuum coating method
CN102560439A (en) * 2012-03-29 2012-07-11 雅视光学有限公司 Method and device for carrying out surface treatment on plasma
CN102766875A (en) * 2012-07-09 2012-11-07 珠海承鸥卫浴用品有限公司 Surface treatment process for PVD wire drawing product
CN102965626A (en) * 2012-12-17 2013-03-13 中国南方航空工业(集团)有限公司 Nickel plating method of powder metallurgy porous material
CN102965626B (en) * 2012-12-17 2015-01-14 中国南方航空工业(集团)有限公司 Nickel plating method of powder metallurgy porous material
WO2016008367A1 (en) * 2014-07-17 2016-01-21 储继国 High vacuum electric arc pump and air extraction unit thereof
CN104100492A (en) * 2014-07-17 2014-10-15 储继国 High vacuum arc pump and pumping unit thereof
CN104975266A (en) * 2015-07-17 2015-10-14 惠州建邦精密塑胶有限公司 Furnace and method for magnetron sputtering ion plating of two layers of films
CN106321494A (en) * 2016-10-25 2017-01-11 郑州航空工业管理学院 Anti-erosion and friction-resistant film for fan blades of aeto-turbofan engine and preparation method of anti-erosion and friction-resistant film
CN106694344A (en) * 2016-11-28 2017-05-24 中信戴卡股份有限公司 Metal protection layer and method for forming metal protection layer
CN106435489A (en) * 2016-11-30 2017-02-22 西北有色金属研究院 Preparation method for oxidation resisting self-healing Cr/NiCr coatings on niobium-based surface
CN106435489B (en) * 2016-11-30 2019-01-11 西北有色金属研究院 A kind of preparation method of the anti-oxidant self-healing Cr/NiCr coating of niobium primary surface
CN107779826A (en) * 2017-10-20 2018-03-09 深圳市生波尔光电技术有限公司 Arc ion plating film device
CN108531854A (en) * 2018-03-21 2018-09-14 中信戴卡股份有限公司 A kind of ageing-resistant periodic variable reacts black chromium plated film and forming method
CN110387525A (en) * 2019-08-15 2019-10-29 常州机电职业技术学院 A kind of medical apparatus surface titanizing processing unit and processing method

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