WO2015180351A1 - 有机发光显示面板的封装方法、有机发光显示面板及显示装置 - Google Patents
有机发光显示面板的封装方法、有机发光显示面板及显示装置 Download PDFInfo
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- WO2015180351A1 WO2015180351A1 PCT/CN2014/087898 CN2014087898W WO2015180351A1 WO 2015180351 A1 WO2015180351 A1 WO 2015180351A1 CN 2014087898 W CN2014087898 W CN 2014087898W WO 2015180351 A1 WO2015180351 A1 WO 2015180351A1
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- WIPO (PCT)
- Prior art keywords
- organic light
- light emitting
- blocking oxygen
- water blocking
- display panel
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 49
- 238000004806 packaging method and process Methods 0.000 title claims abstract description 24
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 95
- 239000001301 oxygen Substances 0.000 claims abstract description 95
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 95
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 238000005530 etching Methods 0.000 claims abstract description 18
- 230000002093 peripheral effect Effects 0.000 claims abstract description 13
- 230000000903 blocking effect Effects 0.000 claims description 67
- 238000000231 atomic layer deposition Methods 0.000 claims description 17
- 238000001020 plasma etching Methods 0.000 claims description 8
- 238000005538 encapsulation Methods 0.000 claims description 7
- 238000010329 laser etching Methods 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 230000000873 masking effect Effects 0.000 claims description 2
- 230000004888 barrier function Effects 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 98
- 239000010408 film Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000013039 cover film Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
Definitions
- At least one embodiment of the present invention is directed to a packaging method of an organic light emitting display panel, an organic light emitting display panel, and a display device.
- an organic light-emitting display panel has gradually become a mainstream in the display field because of its advantages of fast response speed, wide color gamut, ultra-thin, and flexibility.
- the organic light emitting display panel is provided with a plurality of organic light emitting diodes (OLEDs) arranged in a matrix and circuits of peripheral bonding regions.
- OLEDs organic light emitting diodes
- the cathode of an organic light emitting diode is made of a more active metal and is easily oxidized by moisture and oxygen in the air. Oxidation of the cathode causes irreversible effects on the organic layer material in the cathode and OLED, resulting in a shortened lifetime of the OLED and even damage to the OLED. Therefore, the OLED packaging process on the organic light emitting display panel is very important.
- the OLED of the organic light emitting display panel is usually encapsulated by an organic or inorganic material, and the area corresponding to the OLED on the organic light emitting display panel is completely encapsulated, and the circuit of the peripheral binding region is exposed.
- the organic light emitting display panel is usually packaged by Atomic Layer Deposition (ALD), and the packaging method includes the following steps.
- ALD Atomic Layer Deposition
- Step 1 Prepare an organic light emitting display panel in which a circuit having an OLED of a display area and a peripheral binding region has been fabricated.
- Step 2 performing a coating of the water-blocking oxygen layer on the organic light-emitting display panel of the first step by using a mask including the pattern of the bonded region.
- the film formed by the coating is an encapsulation layer, and the coating process is deposited by atomic layer deposition.
- the mask includes an occlusion region and a hollow region, the occlusion region corresponding to at least the binding region, the cutout region corresponding to the region covered by each OLED.
- the etch mask forms a water blocking oxygen layer in the region where the OLED is located for encapsulating the OLED, and the bonding region is exposed without forming a water blocking oxygen layer due to the shielding effect of the mask.
- At least one embodiment of the present invention provides a method of packaging an organic light emitting display panel, an organic light emitting display panel, and a display device to realize a narrow frame organic light emitting display panel.
- the packaging method of the organic light emitting display panel includes: forming a water blocking oxygen layer covering the entire substrate substrate on a substrate substrate on which the organic light emitting device and the peripheral bonding region are formed; The water-blocking oxygen layer on the substrate is etched to remove at least the water-blocking oxygen layer on the connection terminal in the bonding region, and the water-blocking oxygen layer on the organic light-emitting device is retained.
- At least one embodiment of the present invention provides an organic light emitting display panel including an organic light emitting device located in a display region, and a bonding region located at a periphery, the organic light emitting display panel being packaged by the above packaging method.
- At least one embodiment of the present invention provides a display device including the above-described organic light emitting display panel.
- FIG. 1 is a schematic overall flow chart of a method for packaging an organic light emitting display panel according to an embodiment of the present invention
- FIG. 2 is a schematic diagram of a relative position of a connection terminal and a binding area according to an embodiment of the present invention
- FIG. 3 is a second schematic diagram of a relative position of a connection terminal and a binding area according to an embodiment of the present invention
- FIG. 4 is a schematic top view of an unpackaged organic light emitting display panel according to an embodiment of the present invention.
- FIG. 5 is a top plan view of an organic light emitting display panel in which a water blocking oxygen layer is formed on the organic light emitting display panel shown in FIG. 4;
- FIG. 6 is a schematic top plan view of a mask plate structure according to an embodiment of the present invention.
- FIG. 7 is a schematic view showing the relative positions of the mask shown in FIG. 6 and the organic light-emitting display panel shown in FIG. 5 before etching.
- a film is formed on a substrate on which an OLED is formed by using a mask plate and an ALD technique, and a film cover formed by an ALD technique is preferable, and a film formed on a substrate corresponding to a hollow region of the mask plate is used.
- the area of the layer is larger than the area of the hollow area.
- the film wrapping range formed by the ALD technology is generally about 5 to 10 mm. Therefore, the distance between the connection terminal obtained by the mask process and the edge of the film package is about 5 to 10 mm. It is difficult to achieve a narrower border.
- At least one embodiment of the present invention provides a method of packaging an organic light emitting display panel.
- the organic light emitting display panel packaged by the method can realize a narrow border organic light emitting display panel.
- a packaging method of an organic light emitting display panel includes: forming a water blocking oxygen layer covering the entire substrate substrate on a base substrate on which the organic light emitting device and the peripheral bonding region are formed; The water blocking oxygen layer on the base substrate is etched to remove at least the water blocking oxygen layer on the connection terminals in the bonding region, and the water blocking oxygen layer on the organic light emitting device is retained.
- the water blocking oxygen layer on the organic light emitting device is used to encapsulate the OLED, preventing external water, oxygen, and/or nitrogen gas from entering the OLED, affecting the performance of the OLED or damaging the OLED.
- FIG. 1 is a schematic overall flow chart of a method for packaging an organic light emitting display panel according to an embodiment of the present invention. As shown in FIG. 1 , the packaging method includes the following steps:
- the water blocking oxygen layer may be an organic resin layer or an inorganic insulating layer.
- the water blocking oxygen layer may be an aluminum oxide layer, a silicon nitride or silicon oxide layer or the like.
- the OLED is a top emission structure, the emitted light passes through the water blocking oxygen layer, and in order to prevent the water blocking oxygen layer from blocking the light emitted by the OLED, for example, the water blocking oxygen layer may be a transparent film layer.
- Removing at least the water blocking oxygen layer on the connection terminals in the bonding region may include the following two embodiments.
- Method 1 Remove all water-blocking oxygen layers in the bonded area.
- Method 2 Remove the water-blocking oxygen layer on the connection terminal in the bonded area, that is, retain the water-blocking oxygen layer outside the connection terminal.
- the size and setting position of the binding area of the organic light emitting display panel may be determined according to actual needs.
- the binding region 3 of the organic light-emitting display panel may have a size in the direction indicated by the arrow in FIG. 2 to be equivalent to the area covered by the connection terminal 31.
- the binding area 3 is located in an area where the edge of the substrate extends a certain distance toward the center.
- the binding area 3 of the organic light emitting display panel may have a smaller size in a direction indicated by an arrow in FIG. 3 than an area covered by the connection terminal 31, and a binding area is a distance from the edge of the substrate.
- the organic light-emitting display panel shown in FIG. 2 and FIG. 3 can achieve a distance d between the bonding region and the water-blocking oxygen layer of the packaged OLED of 0.1 to 2 mm, and ensure that the OLED package is good and tied. The fixed area is exposed.
- the water blocking oxygen layer may be formed on the base substrate by atomic layer deposition.
- the water blocking oxygen layer on the substrate may be etched by plasma etching or laser etching.
- the water blocking oxygen layer is etched by an oxygen plasma or an air plasma.
- the packaging method of the organic light emitting display panel may further include: forming an etching protection layer on the water blocking oxygen layer, the etching protection a layer covering the organic light emitting device and exposing at least a connection terminal of the bonding region; or placing a mask on the water blocking oxygen layer, the mask being provided with at least a connection terminal with the bonding region A corresponding opening area, a masking area of the mask corresponding to the organic light emitting device.
- the etch protection layer can avoid etching away the water blocking oxygen layer on the organic light emitting device.
- the method of packaging the organic light-emitting display panel may further include: removing an etch protection layer on the water-blocking oxygen layer.
- the distance between the bonding region and the etched water blocking oxygen layer is 0.1 to 2 mm.
- Step 1 a base substrate on which a connection terminal of an organic light-emitting device and a peripheral bonding region is formed Above, a water-blocking oxygen layer covering the entire substrate is formed by an atomic layer deposition (ALD) method.
- ALD atomic layer deposition
- FIG. 4 An unpackaged organic light emitting display panel as shown in FIG. 4, the organic light emitting display panel comprising a substrate substrate 1 and a plurality of organic light emitting devices 2 and peripheral bonding regions 3 on a display region (AA region) on the substrate substrate 1 .
- the peripheral bonding area 3 is provided with a connection terminal 31; the connection terminal 31 may be a circuit connection line of an IC bonding area on the organic light emitting display panel, and the connection terminal 31 may be exposed after being packaged by the organic light emitting display panel In order to be bound to the IC.
- FIG. 5 is a top plan view of an organic light emitting display panel in which the water blocking oxygen layer 4 is formed on the organic light emitting display panel shown in FIG. 4.
- Atomic Layer Deposition is a method of vapor phase thin film deposition in which the deposited material covers the entire substrate.
- the water blocking oxygen layer formed by the ALD process is advantageous over other water blocking oxygen barrier layers formed by other thin film deposition techniques because the ALD grown film is typically conformally, pinhole-free, and chemically bonded into the substrate.
- a uniform thickness coating can be deposited in deep trenches, porous media, and around the particles.
- the water blocking oxygen layer may be an organic resin layer or an inorganic insulating layer.
- the water blocking oxygen layer may be an aluminum oxide (Al 2 O 3 ) layer or a silicon nitride (SiN X ), silicon oxide (SiO X ).
- Al 2 O 3 aluminum oxide
- SiN X silicon nitride
- SiO X silicon oxide
- the water blocking oxygen layer may be a transparent film layer.
- Step 2 etching the water blocking oxygen layer on the organic light emitting device with an etch protection layer to expose the water blocking oxygen layer in the bonding region.
- the etch protection layer is a protective film layer that acts to prevent the mask from being etched away during etching, and is also referred to as a cover.
- the etch protection layer may be a reticle or a peelable cover film layer.
- an etch protection layer may be attached on a region corresponding to the organic light-emitting device on the water-blocking oxygen layer to expose water-blocking oxygen.
- the area on the layer that corresponds to the binding area may be attached on a region corresponding to the organic light-emitting device on the water-blocking oxygen layer to expose water-blocking oxygen.
- the etch protection layer is a reticle
- a mask plate may be placed on the base substrate on which the water blocking oxygen layer is formed, and the reticle is provided with an opening corresponding to the binding region
- the region corresponding to the organic light emitting device is provided with an etch protection region.
- FIG. 6 is a schematic top view of a mask 5 according to an embodiment of the present invention
- FIG. 7 is a front view of the mask shown in FIG. 6 and the organic light-emitting display panel (Panel) shown in FIG. Location map.
- the etched protective layer is a reticle
- the mask 5 is located above the organic light emitting display panel, and the opening 51 on the mask 5 corresponds to the bonding region 3 on the organic light emitting display panel, that is, the opening 51 on the mask 5 and the bonding region 3 on the substrate.
- the projection overlaps, or the opening 51 is slightly larger than the area of the bonding area 3, ensuring that the connection terminals of the bonding area 3 are completely exposed to facilitate good bonding with the chip IC.
- the second step is an option.
- Step 3 etching the water blocking oxygen layer by plasma etching or laser etching to remove the water blocking oxygen layer corresponding to the bonding region, and retaining the water blocking oxygen layer corresponding to the organic light emitting device. That is, the portion of the water blocking oxygen layer 4 corresponding to the opening 51 on the mask 5 shown in FIG. 7 is removed, and the bonding region 3 corresponding to the opening 51 is exposed.
- the plasma etching method may be an etching method such as an oxygen plasma or an air plasma.
- the pattern and size of the etched water-blocking oxygen layer almost correspond to the pattern and size of the opening 51 on the mask 5 by plasma or laser etching, because of the etching precision of the plasma or laser etching method. Higher, the etching precision is on the order of micrometers.
- the distance d between the bonded region and the water-blocking oxygen layer of the packaged OLED can be 0.1 to 2 mm, and the OLED package is ensured to be good. Fully exposed.
- the distance between the binding region and the water blocking oxygen layer may be 0.1 to 2 mm. This makes it possible to realize an organic light-emitting display panel with a narrower border.
- the organic light-emitting display panel of the embodiment of the present invention can reduce the width of the frame region by about 3 ⁇ compared with the organic light-emitting display panel with a distance of 5 to 10 mm between the connection terminal and the water-blocking oxygen layer of the packaged OLED. 9.9mm.
- Step 4 removing the etch protection layer on the water blocking oxygen layer.
- the etch protection layer is a peelable cover film layer
- the etch protection layer may be peeled off.
- the etched protective layer is a reticle
- the reticle can be removed.
- At least one embodiment of the present invention provides an organic light emitting display panel including an organic light emitting device located in a display region, and a bonding region located at a periphery, the organic light emitting display panel being packaged by the packaging method of the above organic light emitting display panel to make.
- the distance between the binding region and the water blocking oxygen layer covering the organic light emitting device is 0.1 to 2 mm.
- At least one embodiment of the present invention provides a display device including any of the above-described organic light emitting display panels.
- the display device can be: electronic paper, mobile phone, tablet computer, television, display Any product or component that has a display function, such as a display, a notebook, a digital photo frame, and a navigator.
- the method for packaging an organic light-emitting display panel, the organic light-emitting display panel, and the display device provided by the embodiments of the present invention form an entire lining on a substrate substrate on which a connection terminal of an organic light-emitting device and a peripheral bonding region is formed by an atomic layer deposition method.
- a water blocking oxygen layer of the base substrate etching the water blocking oxygen layer on the base substrate by a plasma etching method or a laser etching method to remove the water blocking oxygen layer of the bonding region, and retaining the A water blocking oxygen layer on the organic light emitting device.
- Atomic layer deposition coating is an effective OLED device packaging method.
- the use of this technology has the advantage of good packaging effect, which makes it difficult for water molecules and oxygen in the air to enter the OLED, and the sealing effect is good.
- Forming a water blocking oxygen layer in the organic light emitting device and the peripheral bonding region etching the water blocking oxygen layer on the substrate substrate by plasma etching or laser etching to remove the binding
- the water-blocking oxygen layer of the region retains the water-blocking oxygen on the organic light-emitting device, so as to accurately control the coverage of the water-blocking oxygen layer around the bonded region.
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Abstract
Description
Claims (11)
- 一种有机发光显示面板的封装方法,包括:在形成有有机发光器件和外围绑定区域的衬底基板上形成覆盖整个衬底基板的阻水氧层;对所述衬底基板上的阻水氧层进行刻蚀,至少去除所述绑定区域内的连接端子上的阻水氧层,保留所述有机发光器件上的阻水氧层。
- 根据权利要求1所述的封装方法,其中,通过原子层沉积法在所述衬底基板上形成所述阻水氧层。
- 根据权利要求1或2所述的封装方法,其中,通过等离子体刻蚀法或激光刻蚀法对所述衬底基板上的阻水氧层进行刻蚀。
- 根据权利要求3所述的封装方法,其中,通过氧等离子体或空气等离子体对所述阻水氧层进行刻蚀。
- 根据权利要求1-4任一所述的封装方法,其中,所述阻水氧层为氧化铝层、氮化硅或氧化硅层。
- 根据权利要求1-5任一所述的封装方法,其中,所述绑定区域与所述覆盖在所述有机发光器件的阻水氧层之间的距离为0.1~2mm。
- 根据权利要求1-6任一所述的封装方法,对所述阻水氧层进行刻蚀之前,还包括:在所述阻水氧层上形成一层刻蚀保护层,所述刻蚀保护层覆盖所述有机发光器件,且至少露出所述绑定区域的连接端子;或者在所述阻水氧层上放置掩模板,所述掩模板上设置有至少与所述绑定区域的连接端子相对应的开口区域,所述掩膜板的遮盖区域与所述有机发光器件对应。
- 根据权利要求7所述的封装方法,对所述阻水氧层进行刻蚀之后,还包括:去除所述阻水氧层上的所述刻蚀保护层。
- 一种有机发光显示面板,包括位于显示区域的有机发光器件,以及位于外围的绑定区域,其中,所述有机发光显示面板采用权利要求1-8任一所述的封装方法封装而成。
- 根据权利要求9所述的有机发光显示面板,其中,所述绑定区域与 所述覆盖在所述有机发光器件的阻水氧层之间的距离为0.1~2mm。
- 一种显示装置,包括如权利要求9或10所述的有机发光显示面板。
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US14/435,672 US9647236B2 (en) | 2014-05-28 | 2014-09-30 | Packaging method of organic light emitting display panel, organic light emitting display panel and display device |
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CN201410232262.0A CN104022233B (zh) | 2014-05-28 | 2014-05-28 | 一种有机发光显示面板的封装方法和有机发光显示面板 |
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US9647236B2 (en) | 2017-05-09 |
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