WO2015144864A1

WO2015144864A1 - Method and device for the continuous applying of a liquid to a substrate

Info

Publication number: WO2015144864A1
Application number: PCT/EP2015/056673
Authority: WO
Inventors: Helmut Bauser
Original assignee: Dieffenbacher GmbH Maschinen- und Anlagenbau
Priority date: 2014-03-27
Filing date: 2015-03-27
Publication date: 2015-10-01
Also published as: DE102014104340A1

Abstract

The invention relates to a method and device for the continuous applying of a liquid to a substrate, more particularly in the process of manufacturing a material in a press, wherein the liquid (2) is transferred onto the substrate by means of an application device, comprising an application roller (3) rotating about the axis (10) of same. The problem addressed by the invention consists in a required usage of the liquid (2) and the potential of enabling the liquid (2) to be applied to the substrate in relation to the maximum required width. The invention is characterized in that a metering device is arranged for applying the liquid (2) on the rotating application roller (3) of the application device, wherein the metering device is suitable for dripping, spraying or pouring the fluid on the application roller (3). For further improvement, sensors (17) can be arranged on the substrate for checking the liquid film (14) during return of the application roller (3) and/or after the application roller (3) touches the substrate, and said sensors can be in operative connection with a control device or regulating device (16) for regulating the applied amount of liquid (2) or the metering devices respectively.

Description

METHOD AND DEVICE FOR CONTINUOUS APPLICATION OF A LIQUID TO A SUBSTRATE

The invention relates to a method for the continuous application of a liquid to a substrate, in particular in the course of the production of material in a press, according to the preamble of claim 1 and an apparatus for continuously applying a liquid according to the preamble of claim 10.

According to the prior art, it is known to apply liquids directly to the respective substrate by means of various devices and methods (wiping, knife coating, spraying, etc.). The success of these measures is of course dependent on the liquid used and the corresponding boundary conditions of the liquid or of the substrate. Overall, it can be problematic in tempered substrates to spray directly onto the substrate, as evaporating portions of the liquid, the application effect for the substances contained in the liquid is deficient. For example, in release agents for press plates are dissolved in the liquid substances that allow the material to be pressed easily or completely detached from the press plate in a press. Without a release agent you would have to cumbersome clean the press plate after the pressing process and would also have an irregular or injured surface of the product to be produced.

A device for applying a liquid (release agent) to a substrate has become known from DE 103 37 594 A1. This is a release agent application device for the press belt of a continuously operating press, with applicator roll and metering, wherein the applicator roll against the press belt with defined by the amount of the release agent to be applied to the press belt Andrückkräften is set and a control device for controlling the contact forces in dependence the respectively required release agent amount disclosed. Crucial to this disclosure is that the applicator roll receives its release agent via a metering roller, which receives the release agent in a dipping bath and transfers it to the applicator roll for transfer to the press belt. This device has basically proven itself in terms of economical consumption in the transfer to the press belt, but also shows various system-related disadvantages.

In a subsequent disclosure DE 10 2010 049 777 A1, which is thematically related to the above-cited publication, an alternative humidification system is shown which exhibits the same or similar features for applying a liquid to a substrate, but the press belt is not disclosed as the substrate, but the material cake, which is to be pressed in a press and cured to obtain a flat material plate. Again, the liquid should be used as a release agent to prevent caking on the press belt during curing. Here too, however, there are various disadvantages due to the system.

One of these disadvantages is a lack of width adjustment relative to the material to be pressed. For example, if the maximum width of the material in a press 4 m and in the press but also produced products with a width of 3.25 m, so there is a range of 0.75 m, which is unnecessarily applied with release agent. Also, it is not possible, applied to the substrate different strong release agent across the width of the substrate. Thus, there is a lack of flexibility of the order options across the width of a substrate, respectively over the width of a press belt or the material cake and in the amount.

Another disadvantage is the contamination of the immersion bath with foreign substances. In this case, worn and contaminated liquid from the return from the applicator roll is transferred back to the fountain roller and get into the fresh liquid. Also, excess liquid that is not accepted by the press belt or reaches the Randbreich the inlet gap (gap between applicator roll and substrate) must be collected again. Usually, this liquid is also returned to the immersion bath after cleaning. Of course, the regeneration of this fluid also has the disadvantage of filters being used to the detriment and certain technological limits, so that, in total, significantly more fluid is consumed than used.

Not conclusively, there is the disadvantage that the immersion requires a certain installation position and the usability of the known devices in machines alone limited by the fact that complicated installation positions or an immersion bath overhead technologically can not be implemented.

Object of the present invention is to improve the generic method and a corresponding device for applying liquids to a substrate so that less liquid is consumed in the sum and the application of the liquid to the width of the substrate and in individual cases even different properties of the substrate can be adjusted across the width. In an extension of the task but in particular the meterability of the liquid to be improved and be adaptable to different production and substrate conditions, especially in high-end solutions.

The solution to this problem is that in the application device, the liquid is applied to the rotating applicator roll by means of a metering device, wherein the liquid is dropped by means of the metering device on the applicator roll, sprayed or poured.

The solution for a device is that for the application of the liquid to the rotating applicator roll of the applicator a metering device is arranged, wherein the metering device is adapted to drop the liquid onto the applicator roll to spray or pour.

Advantageously, it is now possible, in particular in the case of spraying the liquid with one or more nozzles, to adapt the liquid to be applied to the width of the substrate and to provide the applicator roll with a liquid only in the areas which are actually exposed to a substrate.

In that regard, it is advantageous if, in a particularly preferred embodiment, courses of the substrate are tracked with a sensor and the dosing device follows the path of the substrate. For example, a material cake on a conveyor belt may deviate from the ideal line in certain areas. It is the design of the device whether, alternatively, the individual dosing devices (eg several nozzles next to one another) are switched off and on in the edge region. Also, the metering devices may be individually movable and adjusted according to their discharge pattern (e.g., spray cone ...) as needed.

Finally, a mechanical spray limitation would be conceivable, which is active according to the edge regions of the substrate (actuators) or passively (by the substrate itself). A mechanical limitation has the advantage that liquid is not contaminated by the impact on the boundary and without Filtrieraufwand usually directly back to the boundary, for example via a gutter, can be returned to the metering device.

Further advantageous embodiments of the method can be found in the subclaims and not listed below:

Depending on the embodiment, the substrate and / or the application device or the application roller can be moved in order to adapt the manner or the quality of the application to the circumstances. In particular, it is also possible, regardless of the installation position, to adapt the device to the machine or the substrate.

Preferably, the substrate is a strand of material or a planar machine element, in particular a steel strip or a press plate of a press. Particularly preferably, the method and the apparatus in a continuous double belt press or a calender press applicable.

Alternatively or in combination, the liquid may be at least partially applied along the applicator roll and the distribution of the liquid along the applicator roll in the inlet gap between the substrate and the applicator roll done.

Alternatively or in combination, the width of the liquid applied to the applicator roll can be adjusted according to the width of the substrate, in particular by switching off or adjusting the outer metering devices along the axis of the applicator roll.

Alternatively or in combination, with the use of a plurality of metering devices, these can be arranged along the axis of the applicator roll and, in particular, these can be controlled and regulated individually and / or in groups. This includes in particular the possibility to switch off individual dosing devices.

Alternatively or in combination can be determined in the return of the applicator roll and / or after contact of the applicator roll with the substrate on the substrate and / or between the metering device and the inlet gap of the liquid film by means of sensors and to control the order quantity of the liquid respectively the metering device by means of a control or Control device is used.

Particularly preferably, monitoring of the inlet gap can also be performed as to whether there is too much or too little liquid to control or regulate the metering device (s).

Alternatively or in combination, a displaceable (spray) boundary, preferably with a liquid collecting gutter, may be used along the axis of the applicator roll. This limitation is active or passive and should follow the edge of the substrate. This may be particularly useful if the metering cover predetermined areas of the applicator roll, for example with Sprühkegeln, but the dosing device with respect to the width adjustment can not fine enough to adapt to the changes or the technological effort would be too large.

Alternatively or in combination, the metering devices can be set differently over the width of the substrate, particularly preferably as a function of the surface properties and / or the density of the substrate.

With regard to the device, it should be mentioned that it can be used in conjunction with the method according to the invention, but can also be used alone.

Preferably, the application device or the application roller 3 can be arranged to be movable relative to the substrate.

Alternatively or in combination, the metering device may be suitable for adjusting the width of the liquid to be applied in accordance with the width of the substrate.

Alternatively or in combination may be arranged along the axis of the applicator roll when using multiple metering devices, wherein the metering devices can also be arranged axially and / or radially adjustable to the axis of the applicator roll.

Alternatively or in combination, a plurality of metering devices may be controlled and regulated individually and / or in groups.

Alternatively or in combination, at least one nozzle can be arranged as the metering device.

In particular, it can be provided that in the return of the applicator roll and / or after contact of the applicator roll with the substrate on the substrate sensors for testing the liquid film are arranged and they are in operative connection with a control or regulating device for controlling the order quantity of the liquid respectively the metering devices ,

Alternatively or in combination, a displaceable spray limiter, preferably with a collecting channel for the liquid, can be arranged along the axis of the applicator roll. In particular, this can be designed to be actively or passively displaceable.

Alternatively or in combination, at least the outer metering devices along the axis of the applicator roll can be switched off.

In particular, it is advantageous if the device is used in a press and a material strand or a planar machine element is arranged as the substrate.

In summary, it is thus possible to advantageously differentiate the order quantity of the liquid across the width of the substrate and to adjust it as needed. In particular, it would be possible depending on the substrate to adjust the amount of liquid, in particular profiled across the width. It is also no longer necessary to stock release agent in circulation and to clean, or if then only in significantly smaller quantities and without contamination by the applicator roll. The unnecessary contamination of the substrate or a machine at the unnecessary edge areas can be minimized. The reduced consumption of the liquid minimizes production costs and protects the environment.

Reference to the accompanying drawings, the inventive method and the device are exemplified.

In the drawings shows:
1 shows a side view of the device according to the invention in conjunction with a steel strip of an exemplary calender press (shown in excerpts),
Fig. 2 is a plan view of the device according to the invention of Figure 1 and
Fig. 3 shows another side view and the use of the device in a continuous press with two steel bands and thus two arranged devices.

In the schematic representation according to FIG. 1 and the corresponding plan view in FIG. 2, a drum 6 and a circulating endless steel belt 4 can be seen on the left. The device according to the invention has an application roller 3 with an axis 10 in a first exemplary embodiment. The application roller 3 is made to contact with the steel strip 4, wherein preferably the axis of the drum 6 and the axis 10 of the applicator roll 3 lie in one plane. Particularly preferably, the two axes are arranged coaxially to one another. The application roller 3 thus forms an inlet gap 15 for the liquid 2 with the steel strip 4. The application roller 3 can have a rubberized surface, in particular with pores for receiving the liquid 2, for better transfer of the liquid 2. For applying the liquid 2 to the applicator roll 3, at least one metering device is arranged which is capable of dropping, spraying or pouring the liquid 2 onto the applicator roll. In particular, it is preferred to spray the liquid 2 onto the applicator roll by means of at least one nozzle 1, so that the installation position of the applicator roll relative to the metering device is preferably independent of gravity. When using a longer applicator roll, it is advisable to use a nozzle bar 12 with a plurality of nozzles 1. The same would apply analogously to other metering devices than nozzles 1. Preferably, the individual nozzles 1 or metering devices should be able to be controlled via a control or regulating device 16. In operative connection with the application device, but in particular at least with the metering device, a suction device 5 is arranged, which can suck vapors or spray and / or resulting exhaust gases from the inlet gap 15. Depending on the installation position of the device, the suction device 5 may also be suitable for taking up excess liquid 2 which has not been accepted by the application roller 3 and is dripping off in an uncontrolled manner.

Processually, in the present example with the metering device, designed as a nozzle 1, the liquid sprayed onto the applicator roll 3, which transfers the liquid 2 in opposite rotation to the drum 6 and the steel strip 4 on the steel strip 4, so that on the steel strip 4 a Liquid film 14 forms. In particular, in presses for the production of products from a material strand 9, this serves as a release agent, so that after the pressing process, the material can be detached from the steel strip 4 without hesitation. In particular, in the plan view seen from the right to the left the material strand 9 run in from the right in the production direction, which has a width 7. This material strand 9 lies on a conveyor belt 11 and not visible in plan view only below the drum 6 in contact with the steel strip 4. In the plan view, the plurality of nozzles 1 along the nozzle bar 12 are shown visible, the two outermost nozzles. 1 are not turned on in the edge region 8 in a preferred embodiment of the embodiment due to the width 7 of the material strand 9. For even more precise adaptation, at least the outer metering devices, respectively nozzles 1, may be designed to be displaceable, alternatively also parts or the entire nozzle bar 12. In a further alternative, a boundary, here shown as spray limit 18 in FIG. 1, could set the edge area 8 and remove excess liquid 2 via a collecting channel 19.

For an appropriate application of the liquid 2 on the applicator roll 3 respectively a needs-based production of a liquid film 14 on the substrate, it may be useful to use sensors 17, the liquid film 14 or in the return of the steel strip 4 (not shown) respectively of the applicator roll 3 still determine the amount of liquid 2 present and report the values to a control device 16. The control or regulating device would then be able to control the dosing devices, respectively the nozzles 1, as required, with regard to the amount of liquid 2.

In Figure 3, the preferred embodiment of the invention on a continuously operating press (only the inlet is shown) is shown. The device is in the application for the upper and lower steel strip 4 and provides a needs-adapted, in particular in the width of the material strand 9 adapted liquid film 14 on the steel strips. The material strand 9 is conveyed on a conveyor belt 11 to the inlet of the press.

Not shown in a separate application of the device on a strand of material 9 as a substrate. Again, the same advantages apply mutatis mutandis for the application of the invention. Further embodiments, such as wipers in the return of the substrates or the applicator roll, further sensors to improve the liquid consumption or the like will be taken according to the skilled person in the sense of its training to further improve the result or the invention.

List of Reference Numerals: P1474
1 nozzle
2 liquid
3 applicator roll
4 steel strip
5 suction device
6 drum
7 width
8 border area
9 material strand
10 axis
11 conveyor belt
12 nozzle bars
14 liquid film
15 inlet gap
16 control device
17 sensor
18 spray limitation
19 gutter

Claims

Method for the continuous application of a liquid to a substrate, in particular during the production of material in a press, wherein the liquid (2) is transferred to the substrate by means of an applicator device comprising an applicator roll (3) rotating about its axis (10) , characterized in that

in the application device, the liquid (2) is applied to the rotating applicator roll (3) by means of a metering device,

wherein the liquid (2) is dropped, sprayed or poured onto the applicator roll (3) by means of the metering device.
A method according to claim 1, characterized in that the substrate and / or the applicator device or the applicator roll (3) is moved.
A method according to claim 1 or 2, characterized in that the substrate is a strand of material (9) or a planar machine element, in particular a steel strip (4) or a press plate of a press.
Method according to one or more of the preceding claims, characterized in that the liquid is at least partially applied along the applicator roll (3) and the distribution of the liquid (2) along the applicator roll (3) in the inlet gap (15) between the substrate and the applicator roll (3).
Method according to one or more of the preceding claims, characterized in that the width of the liquid applied to the applicator roll (3) is adjusted according to the width (7) of the substrate, in particular by switching off or adjusting the outer metering devices along the axis (10).
Method according to one or more of the preceding claims, characterized in that when using several metering devices along the axis (10) of the applicator roll (3) are arranged and in particular these are controlled and regulated individually and / or in groups.
Method according to one or more of the preceding claims, characterized in that in the return of the applicator roll (3) and / or after contact of the applicator roll (3) with the substrate on the substrate and / or between the metering device and the inlet gap (15) of the liquid film ( 14) is determined by means of sensors (17) and used to control the application rate of the liquid (2) or the metering device by means of a control or regulating device (16).
Method according to one or more of the preceding claims, characterized in that a displaceable spray limiter (18), preferably with a collecting channel (19) for the liquid (2), is used along the axis (10) of the applicator roll (3).
Method according to one or more of the preceding claims, characterized in that the metering devices over the width (7) of the substrate are set differently, particularly preferably in dependence on the surface properties and / or the density of the substrate.
Apparatus for continuously applying a liquid to a substrate, in particular during the production of material in a press, wherein the liquid (2) is transferred to the substrate by means of an applicator comprising an applicator roll (3) rotating about its axis (10) , characterized in that

for the application of the liquid (2) to the rotating applicator roll (3) of the application device, a metering device is arranged, wherein the metering device is suitable for dropping, spraying or pouring the liquid onto the applicator roll (3).
Apparatus according to claim 10, characterized in that the application device or the applicator roll (3) is arranged movable relative to the substrate.
Device according to claims 10 or 11, characterized in that the metering device is suitable for adjusting the width of the liquid to be applied in accordance with the width (7) of the substrate.
Device according to one or more of claims 10 to 12, characterized in that when using several metering devices along the axis (10) of the applicator roll (3) are arranged.
Device according to one or more of claims 10 to 13, characterized in that at least one nozzle (1) is arranged as a metering device.
Device according to one or more of claims 10 to 14, characterized in that a plurality of metering devices are controlled and regulated individually and / or in groups.
Device according to one or more of claims 10 to 15, characterized in that arranged in the return of the applicator roll (3) and / or after contact of the applicator roll (3) with the substrate on the substrate sensors (17) for testing the liquid film (14) and these are in operative connection with a control or regulating device (16) for controlling the application quantity of the liquid (2) or the metering devices.
Device according to one or more of claims 10 to 16, characterized in that along the axis of the applicator roll a displaceable spray limiter (18), preferably with a collecting channel (19) for the liquid (2) is arranged.
Device according to one or more of claims 10 to 17, characterized in that at least the outer metering devices along the axis (10) of the applicator roll (3) are designed to be switched off.
Device according to one or more of claims 10 to 18, characterized in that the device is used in a press us as a substrate material strand (9) or a planar machine element is arranged.