WO2015100759A1 - 一种液晶显示装置及其制造方法 - Google Patents

一种液晶显示装置及其制造方法 Download PDF

Info

Publication number
WO2015100759A1
WO2015100759A1 PCT/CN2014/070307 CN2014070307W WO2015100759A1 WO 2015100759 A1 WO2015100759 A1 WO 2015100759A1 CN 2014070307 W CN2014070307 W CN 2014070307W WO 2015100759 A1 WO2015100759 A1 WO 2015100759A1
Authority
WO
WIPO (PCT)
Prior art keywords
alignment
layer
tft array
array substrate
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2014/070307
Other languages
English (en)
French (fr)
Inventor
赵勇
张鑫
连水池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/234,386 priority Critical patent/US20150185514A1/en
Priority to KR1020167020643A priority patent/KR101847325B1/ko
Priority to RU2016125810A priority patent/RU2016125810A/ru
Priority to JP2016561050A priority patent/JP6386082B2/ja
Priority to GB1610217.0A priority patent/GB2535676B/en
Publication of WO2015100759A1 publication Critical patent/WO2015100759A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/40—Arrangements for improving the aperture ratio

Definitions

  • Liquid crystal display device and method of manufacturing same
  • the present invention relates to the field of manufacturing thin film transistor liquid crystal display (TFT-LCD), and more particularly to a liquid crystal display device and a method of fabricating the same.
  • TFT-LCD thin film transistor liquid crystal display
  • FIG. 1 it is a schematic diagram of a conventional pixel electrode of a liquid crystal display device of a PSVA mode (Polymer Stabilization Vertical-Alignment); a pixel electrode is shown in the figure.
  • the pixel electrode In the conventional liquid crystal display device of the PSVA mode, the pixel electrode is designed to have a "meter" shape, with an intermediate vertical trunk 80, a horizontal trunk 81 and an angle of ⁇ 45 degrees with the X axis, ⁇ 135
  • the branch of degree 82 consists of three parts.
  • the vertical trunk 80 and the horizontal trunk 81 divide the pixel area into four regions equally, and each region is composed of a tile 82 of oblique 45 degrees.
  • FIG. 2 is a schematic diagram showing the reverse direction of the liquid crystal after applying a voltage to the pixel electrode of FIG. 1.
  • FIG. 2 is a step of gradually applying the liquid crystal molecules 90 from the outside of the pixel electrode to the inner side after applying a voltage of 4 V to the pixel electrode of FIG. Dumped.
  • the angle of the tilt is in the direction of the slit (i.e., in the direction of the branch 82, as indicated by the direction of the arrow in the figure), and the liquid crystal tilting directions of the four regions are ⁇ 45 degrees and ⁇ 135 degrees, respectively, all pointing to the central region of the pixel.
  • the angle between the liquid crystal reversal and the X axis is: the first quadrant is -135 degrees, the second quadrant is -45 degrees, the third quadrant is 45 degrees, and the fourth quadrant is 135 degrees.
  • the existing PSVA process is to improve the alignment of liquid crystal molecules by designing the pixel electrodes to be "meter" to improve the alignment of the liquid crystal molecules.
  • the existing method strongly relies on the electrode design, which produces distinct bright and dark stripes in the display area, which reduces the transmittance of light, thereby affecting the display effect and brightness.
  • the technical problem to be solved by the present invention is to provide a liquid crystal display device and a method of fabricating the same, which have a good alignment effect, and can improve the large-view character bias and increase the aperture ratio.
  • the present invention provides a liquid crystal display device, comprising: a TFT array substrate having a first electrode layer and a first alignment layer covering the first electrode layer, and further provided with a black matrix and a spacer; a substrate having a second electrode layer and a second alignment layer covering the second electrode layer; a liquid crystal layer disposed between the first alignment layer of the TFT array substrate and the second alignment layer of the CF substrate;
  • the first alignment layer and the second alignment layer are each divided into at least one partition, each partition is divided into a plurality of alignment regions, and the first alignment layer and the alignment layer corresponding to the second alignment layer
  • the predetermined alignment directions are perpendicular to each other; the polarization direction of the linearly polarized light irradiated to the first alignment layer and the second region is adapted to the alignment direction, thereby being in the first alignment film.
  • the TFT array substrate further includes: a glass substrate, a gate line, an insulating layer, a semiconductor layer, a data line, and a passivation layer, wherein a color film layer is disposed between the insulating layer and the passivation layer.
  • the black matrix is disposed on the passivation layer of the TFT array substrate; or is disposed on the glass substrate of the TFT array substrate, below the gate line; or a glass substrate disposed on the TFT array substrate Above, both sides of the gate line; or disposed between the color film layer of the TFT array substrate and the data line.
  • the spacer is disposed on the black matrix; or is disposed on the passivation layer of the TFT array substrate.
  • Each of the partitions is divided into four alignment regions by two mutually perpendicular separation lines, wherein the first electrode layer is a pixel electrode layer, and the second electrode layer is a common electrode layer.
  • the present invention also provides a liquid crystal display device, comprising: a TFT array substrate having a first electrode layer and a first alignment layer covering the first electrode layer, further provided with a black matrix and a spacer; and a CF substrate having a second An electrode layer and a second alignment layer covering the second electrode layer; a liquid crystal layer disposed between the first alignment layer of the TFT array substrate and the second alignment layer of the CF substrate; wherein, the first The alignment layer and the second alignment layer are each divided into at least one partition, and each partition is divided into a plurality of alignment regions, wherein the first alignment layer and the alignment layer corresponding to the second alignment layer have a predetermined alignment direction perpendicular to each other; the each partition is divided into four alignments by two mutually perpendicular separation lines
  • the invention also provides a method of manufacturing a liquid crystal display device, comprising the steps of:
  • each partition includes a plurality of alignment regions, and the alignment layer corresponding to the first alignment layer and the second alignment layer is predetermined
  • the alignment directions are perpendicular to each other;
  • a spacer is disposed on the TFT array substrate.
  • the black matrix is disposed on the passivation layer of the TFT array substrate; or is disposed on the glass substrate of the TFT array substrate, below the gate line; or on the glass substrate of the TFT array substrate, two of the gate lines Side; or disposed between the color film layer of the TFT array substrate and the data line.
  • the spacer is disposed on the black matrix; or is disposed on the passivation layer of the TFT array substrate.
  • the method further includes: A color film layer is formed between the insulating layer and the passivation layer of the TFT array substrate.
  • a specific alignment direction alignment layer is formed, without
  • the pixel electrode is specially designed to avoid dark streaks caused by the pixel electrode in the prior art, thereby improving the transmittance of light;
  • the flexible arrangement of each of the alignment areas in each partition of the first alignment layer can flexibly realize the alignment of the four regions in each pixel structure in the liquid crystal cell, and at the same time Improve the role of the big vision;
  • a black matrix is disposed on the TFT array substrate, which can prevent a problem that the aperture ratio of the pixel region is reduced due to misalignment between the TFT array substrate and the CF substrate;
  • FIG. 1 is a schematic view showing a pixel electrode of a conventional liquid crystal display device of a PSVA mode
  • FIG. 2 is a schematic view showing the reverse direction of the liquid crystal after applying a voltage to the pixel electrode of FIG. 1;
  • FIG. 3 is a schematic diagram of a pixel structure in an embodiment of a liquid crystal display device according to the present invention.
  • FIG. 4 is a cross-sectional view taken along line A-A of FIG. 3 in an embodiment of a liquid crystal display device according to the present invention
  • FIG. 5 is a schematic diagram showing a partition of a TFT array substrate in a first embodiment of the alignment principle of a liquid crystal display device according to the present invention
  • FIG. 6 is a first embodiment of the principle of alignment of a liquid crystal display device according to the present invention.
  • FIG. Schematic diagram of the partition of the CF substrate;
  • FIG. 7 is a schematic view showing linearly polarized light irradiation of a CF substrate in a first embodiment of the alignment principle of a liquid crystal display device according to the present invention
  • FIG. 8 is a schematic diagram showing the results of liquid crystal alignment in the first embodiment of the alignment principle of a liquid crystal display device provided by the present invention.
  • FIG. 9 is a schematic diagram showing the partitioning of a TFT array substrate in a second embodiment of the liquid crystal display device according to the present invention.
  • FIG. 10 is a schematic diagram showing the partitioning of a CF substrate in a second embodiment of the alignment principle of a liquid crystal display device according to the present invention.
  • FIG. 11 is a schematic view showing the liquid crystal alignment result in the second embodiment of the liquid crystal display device according to the present invention.
  • FIG. 12 is a schematic diagram showing the partitioning of a TFT array substrate in a third embodiment of the alignment principle of a liquid crystal display device according to the present invention.
  • FIG. 13 is a schematic diagram showing the partitioning of a CF substrate in a third embodiment of the alignment principle of a liquid crystal display device according to the present invention.
  • FIG. 14 is a schematic view showing the liquid crystal alignment result in the third embodiment of the alignment principle of the liquid crystal display device provided by the present invention.
  • FIG. 15 is a cross-sectional view showing another embodiment of a liquid crystal display device according to the present invention
  • FIG. 16 is a cross-sectional view showing still another embodiment of a liquid crystal display device according to the present invention
  • FIG. 3 and FIG. 4 are schematic diagrams showing the structure of an embodiment of a liquid crystal display device according to the present invention.
  • the liquid crystal display device includes:
  • the TFT array substrate 1 has a first electrode layer 15 and a first alignment layer 19 covering the first electrode layer 15, and is further provided with a black matrix 22 and a photo spacer 30; a CF (Color Filter) substrate 2 having a second electrode layer 24 and a second alignment layer 29 covering the second electrode layer 24;
  • the liquid crystal layer 3 is disposed between the first alignment layer 19 of the TFT array substrate 1 and the second alignment layer 29 of the CF substrate 2;
  • the first alignment layer 19 and the second alignment layer 29 are each divided into at least one partition, each partition is divided into a plurality of alignment regions, and the first alignment layer 19 and the second alignment layer 29 correspond to an alignment region thereof.
  • the alignment directions are perpendicular to each other;
  • the respective alignment regions of the first alignment layer 19 and the second alignment layer 29 are respectively irradiated with linearly polarized light of different directions, and the polarization direction of the linearly polarized light irradiated for each alignment region is adapted to the alignment direction, thereby An alignment layer 19 and a second alignment layer 29 are formed with alignment axes having a predetermined alignment direction corresponding to the respective alignment regions.
  • each partition 10 Divided into four alignment zones 100 by two mutually perpendicular dividing lines (only one partition 10 is shown divided into four alignment zones in the figure, here only for example), wherein each alignment zone 100 is There is a predetermined alignment direction (shown by an arrow in the figure), and the predetermined alignment directions of at least two alignment areas 100 in one partition 10 are different, wherein the predetermined alignment direction of the two alignment areas 100 on the left side is upward. And the predetermined alignment direction of the two right alignment areas 100 is downward.
  • the second alignment layer of the CF substrate 2 is divided into a plurality of partitions 20, and each of the partitions 20 further includes a plurality of alignment regions 200.
  • each of the partitions 20 is perpendicular to each other.
  • the dividing line is divided into four alignment zones 200, wherein each alignment zone 200 is predetermined to have an alignment direction (shown by an arrow in the figure), and a predetermined alignment of at least two alignment zones 200 in one zone 20 The directions are different, wherein the predetermined alignment direction of the two alignment areas 200 on the upper side is rightward, and the predetermined alignment direction of the two alignment areas 200 on the lower side is leftward.
  • each of the alignment regions 100 of the first alignment layer and the alignment regions 200 corresponding to the second alignment layer have a predetermined alignment direction perpendicular to each other.
  • FIG. 7 a schematic diagram of irradiating a substrate with linearly polarized light is shown.
  • the linearly polarized light is ultraviolet (UV);
  • FIG. 7 shows a case where ultraviolet light is irradiated to the lower alignment region 200 in one of the sections 20 of the second alignment layer of the CF substrate 2 in FIG.
  • the direction of the arrow is the direction of illumination of the linearly polarized light, and the horizontal line of the black line indicates the polarization direction of the linearly polarized light.
  • the polarization direction of the linearly polarized light and the partition 20 of the second alignment layer are required to be ensured.
  • the predetermined alignment direction of the lower alignment region 200 is adapted (e.g., the same) so that the alignment region 200 can be formed into an alignment film having a predetermined alignment direction by irradiation of linearly polarized light.
  • a schematic diagram of liquid crystal alignment results in the first embodiment of a liquid crystal display device provided by the present invention is shown.
  • the first electrode on the TFT array substrate and the second electrode on the CF substrate are energized by the steps to complete the alignment of the liquid crystal molecules in the liquid crystal cell. Since the respective alignment regions 100 of the first alignment layer are perpendicular to the predetermined alignment direction of the alignment regions 200 on the corresponding second alignment layer, the liquid crystal cell can be made under the action of the first alignment layer and the second alignment layer.
  • the liquid crystal molecules corresponding to the respective alignment regions are reversed to complete the alignment.
  • a schematic view of the alignment of liquid crystal molecules corresponding to one of the partitions in Figs. 5 and 6 is shown in Fig. 8.
  • liquid crystal molecules finally in the third quadrant form an a degree angle with the X axis
  • liquid crystal molecules in the first quadrant form an angle of -a degrees with the X axis
  • the liquid crystal molecules in the second corner form an angle with the X axis.
  • liquid crystal molecules in the fourth corner limit form a (180-a) degree angle with the X-axis, thereby improving the problem of the large-view character bias.
  • the alignment of liquid crystal molecules at other partitions is similar.
  • a second embodiment of the present invention is shown.
  • the predetermined alignment direction of the upper two alignment areas 100 is downward, and the predetermined alignment direction of the lower two alignment areas 100 is In the corresponding partition 20 of the second alignment of the CF substrate 2, the predetermined alignment direction of the right two alignment areas 200 is to the left, and the predetermined alignment direction of the two left alignment areas 200 is to the right;
  • the liquid crystal molecules in the region corresponding to the liquid crystal display device are both oriented toward the center position after the end of the alignment (see FIG. 11), wherein the liquid crystal molecules at the first quadrant form an angle c with the X axis.
  • a third embodiment of the present invention is shown.
  • the predetermined alignment direction of the right alignment areas 100 on the right side is rightward, and the predetermined alignment direction of the two alignment areas 100 on the left side is To the left;
  • the predetermined alignment direction of the upper two alignment regions 200 is upward, and the predetermined alignment direction of the lower two alignment regions 200 is downward;
  • the liquid crystal molecules in the region corresponding to the liquid crystal display device are far from the center position after the end of the alignment (see FIG. 14), wherein the liquid crystal molecules at the first quadrant form an angle b with the X axis.
  • the predetermined alignment directions of the respective alignment regions in the respective sections of the first alignment layer can also be adjusted as needed.
  • the first electrode layer 15 is a pixel electrode layer; and the second electrode layer 24 is a common electrode layer.
  • each partition size of the alignment layer may correspond to the size and position of one pixel structure of the TFT array substrate 1.
  • the TFT array substrate 1 further includes:
  • An insulating layer 16 is overlaid thereon, and a semiconductor layer 17 is further disposed on the insulating layer 16 directly above the gate line 13, and a data line 12 for forming a drain and a source is disposed on the semiconductor layer 17, and then A passivation layer 180 is disposed thereon, and a pixel electrode 15 is formed on the passivation layer 180, and the first alignment layer 19 is disposed on the pixel electrode 15.
  • the CF substrate 2 specifically includes: a glass substrate 21 and a common electrode layer 24 overlying the glass substrate 21; wherein the second alignment layer 29 is disposed on the common electrode layer 24.
  • the liquid crystal layer 3 specifically includes liquid crystal molecules (not shown) and a spacer 30.
  • the black matrix 22 is provided on the TFT array substrate.
  • the black matrix 22 is disposed on the blunt TFT array substrate 1. Above the layer 180, no black matrix is provided on the CF substrate 2.
  • Figure 15 is a cross-sectional view showing another embodiment of a liquid crystal display device according to the present invention.
  • the black matrix is 22 is disposed on the glass substrate 1 of the TFT P train substrate 1 below the gate line 13; and no black matrix is disposed on the CF substrate 2, and other structures are the same as those in the embodiment shown in FIG.
  • the description of FIG. 4 can be referred to together.
  • Figure 16 is a cross-sectional view showing still another embodiment of a liquid crystal display device according to the present invention.
  • the main difference from the embodiment shown in FIG. 4 is that, in this embodiment, the black matrix 22 is disposed on the glass substrate 1 of the TFT array substrate 1 on both sides of the gate line 13; On the other hand, the black matrix is not provided on the CF substrate 2.
  • the other structure is the same as that of the embodiment shown in Fig. 4. It will not be described in detail here, and the description of Fig. 4 can be referred to together.
  • the black matrix 22 can be disposed at other positions of the TFT array substrate 1 as needed.
  • the black matrix 22 can be disposed on the color film layer 18 of the TFT array substrate 1. Between data lines 12. The position of the setting can be referred to the above description, and the same effect can be achieved, so it will not be described here.
  • the present invention further provides a photo spacer 30 on the TFT array substrate 1.
  • the spacer 30 is disposed on the black matrix 22.
  • the spacers are disposed on the passivation layer 180.
  • the purpose of disposing the spacer 30 (Photo spacer) on the TFT P train substrate 1 is to prevent the CF substrate 2 from being displaced from the TFT array substrate 1 to cause a disclination line of the pixel region. Since the height of the spacer 30 is large, the flatness in the liquid crystal cell in the vicinity thereof is changed to cause poor alignment.
  • the spacer 30 is disposed outside a certain distance from the display area, but if the spacer 30 is placed on the CF substrate 2, when the CF substrate 2 and the TFT array substrate 1 are misaligned, the spacer 30 may enter the TFT P car.
  • the display area of the column substrate 1 causes poor alignment (dark lines are caused by poor alignment of the liquid crystal).
  • the spacer 30 may abut the CF substrate 2 or may maintain a certain distance.
  • FIG. 17 is a schematic diagram showing the main flow of an embodiment of a method for manufacturing a liquid crystal display device according to the present invention.
  • the manufacturing method includes the following steps: Step S10, providing a TFT array substrate and a CF substrate, applying a polarization sensitive material on the first electrode layer of the TFT array substrate to form a first alignment layer, and coating a polarization sensitive material on the second electrode layer of the CF substrate to form a first Two alignment layers;
  • Step S11 dividing the first alignment layer and the second alignment layer into at least one partition, each partition includes a plurality of alignment regions, and the alignment directions corresponding to the first alignment layer and the second alignment layer have a predetermined alignment direction perpendicular to each other;
  • Step S12 the respective alignment regions of the first alignment layer and the second alignment layer are respectively irradiated with linearly polarized light of different directions, and the polarization direction of the linearly polarized light irradiated for each alignment region is adapted to the alignment direction, thereby An alignment layer and a second alignment direction form an alignment moon having a predetermined alignment direction corresponding to each alignment region;
  • Step S13 energizing the first electrode layer on the TFT array substrate and the second electrode layer on the CF substrate to complete alignment of the liquid crystal molecules in the liquid crystal cell;
  • Step S14 the black matrix is disposed on the TFT array substrate
  • Step S15 the spacer is disposed on the TFT array substrate.
  • the black matrix is disposed on the passivation layer of the TFT array substrate; or is disposed on the glass substrate of the TFT array substrate, below the gate line; or is disposed on the glass substrate of the TFT array substrate, Both sides of the gate line; or disposed at other positions of the TFT array substrate, for example, disposed between the color film layer of the TFT array substrate and the data line.
  • step S15 the spacer is disposed on the black matrix; or is disposed on the passivation layer of the TFT array substrate.
  • the method before the polarizing-sensitive material is coated on the TFT array substrate to form the first alignment layer, the method further includes:
  • a color film layer is formed between the insulating layer and the passivation layer of the TFT array substrate.
  • the color film layer is disposed in the TFT array substrate, so that the upper and lower surfaces of the liquid crystal cell can be planarized, so that in step S13, Get better alignment.
  • the first electrode layer 15 is a pixel electrode layer; and the second electrode layer 24 is a common electrode layer.
  • each partition size of the alignment layer may correspond to the size and position of one pixel structure of the TFT array substrate 1.
  • a specific alignment direction alignment layer is formed, without
  • the pixel electrode is specially designed to avoid dark streaks caused by the pixel electrode in the prior art, thereby improving the transmittance of light;
  • the flexible arrangement of each of the alignment areas in each partition of the first alignment layer can flexibly realize the alignment of the four regions in each pixel structure in the liquid crystal cell, and at the same time Change the role of the big vision;
  • a black matrix is disposed on the TFT array substrate, which can prevent a problem that the aperture ratio of the pixel region is reduced due to misalignment between the TFT array substrate and the CF substrate;
  • the upper and lower surfaces of the liquid crystal cell can be flattened, and the effect of liquid crystal alignment can be improved.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)

Abstract

一种液晶显示装置，包括：TFT阵列基板（1），具有第一电极层（15）与覆盖所述第一电极层（15）的第一配向层（19），还设置有黑矩阵（22）和间隙子（30）；CF基板（2），具有第二电极层（24）与覆盖所述第二电极层（24）的第二配向层（29）；液晶层（3），配置于所述TFT阵列基板（1）的第一配向层（19）与所述CF基板（2）的第二配向层（29）之间；其中，所述第一配向层（19）与所述第二配向层（29）相对应的配向区（100）其预定的配向方向相互垂直；在所述第一配向层（19）与所述第二配向层（29）上形成具有对应于各配向区（100）的预定的配向方向的配向膜。还提供了一种液晶显示装置的制造方法。该液晶显示装置配向效果好，且可以改善大视角色偏和提高开口率。

Description

一种液晶显示装置及其制造方法
本申请要求于 2013 年 12 月 31 日提交中国专利局、 申请号为 201310747803.9、 发明名称为 "一种液晶显示装置及其制造方法" 的中国专 利申请的优先权， 上述专利的全部内容通过引用结合在本申请中。 技术领域
本发明涉及薄膜晶体管液晶显示装置（ Thin Film Transistor liquid crystal display, TFT-LCD )的制造领域，特别涉及一种液晶显示装置及其制造方法。 背景技术
如图 1所示，是现有的一种 PSVA模式（高分子安定化垂直配向， Polymer Stabilization Vertical-Alignment ) 的液晶显示装置常用的像素电极的示意图； 在图中示出了一个像素电极。 在现有的这种 PSVA模式的液晶显示装置中， 其像素电极被设计为 "米" 字型， 由中间的竖直主干 80, 水平主干 81和与 X轴夹角为 ± 45度， ± 135度的分支 82三部分组成。 其中竖直主干 80和水 平主干 81将像素面积平均分成 4个区域，每个区域都由斜向 45度的分支 82 平铺组成。
如图 2所示， 是对图 1的像素电极施加电压后的液晶倒向示意图； 图 2 是是采用对图 1的像素电极施加 4V的电压后，液晶分子 90由像素电极外侧 开始逐渐向内侧倾倒。 倾倒的角度是沿切口方向 （即沿分支 82的方向， 如 图中箭头方向所示）， 4个区域的液晶倾倒方向分别为 ± 45度， ± 135度， 都 指向像素的中央区域。如上图所示液晶倒向与 X轴的夹角为：第一象限为 -135 度，第二象限为 -45度，第三象限为 45度，第四象限为 135度。现有的 PSVA 制程是通过将像素电极设计成 "米" 字形来控制液晶分子的配向来改善大视 角色偏的问题。
但是现有的这种方式强烈依赖于电极设计， 其在显示区会产生明显的亮 暗条纹， 这样会降低光线的穿透率， 从而影响到显示的效果和亮度。
发明内容 本发明所要解决的技术问题在于， 提供一种液晶显示装置及其制造方 法， 配向效果好， 且可以改善大视角色偏和提高开口率。
为了解决上述技术问题， 本发明提供一种液晶显示装置， 包括： TFT阵 列基板， 具有第一电极层与覆盖所述第一电极层的第一配向层， 还设置有黑 矩阵和间隙子； CF基板， 具有第二电极层与覆盖所述第二电极层的第二配 向层； 液晶层， 配置于所述 TFT阵列基板的第一配向层与所述 CF基板的第 二配向层之间； 其中， 所述第一配向层与所述第二配向层均被划分为至少一 个分区， 每一分区被分成多个配向区， 所述第一配向层与所述第二配向层相 对应的配向区其预定的配向方向相互垂直； 在对所述第一配向层与所述第二 区照射的线偏振光的偏振方向与所述配向方向相适应，从而在所述第一配向 膜。
其中， 所述 TFT阵列基板进一步包括： 玻璃基板、 栅线、 绝缘层、 半导 体层、数据线以及钝化层，其中，在所述绝缘层与钝化层之间设置有彩膜层。
其中，所述黑矩阵设置在所述 TFT阵列基板的钝化层之上；或者设置在 所述 TFT阵列基板的玻璃基板之上， 栅线之下； 或者设置在所述 TFT阵列 基板的玻璃基板之上，栅线的两侧；或者设置在所述 TFT阵列基板的彩膜层 与数据线之间。
其中，所述间隙子设置在所述黑矩阵之上； 或者设置在所述 TFT阵列基 板的钝化层之上。
其中， 所述每一分区由两条互相垂直的分隔线分成四个配向区， 所述四 其中， 所述第一电极层为像素电极层， 所述第二电极层为共用电极层。 本发明还提供一种液晶显示装置， 包括： TFT阵列基板， 具有第一电极 层与覆盖所述第一电极层的第一配向层， 还设置有黑矩阵和间隙子； CF基 板， 具有第二电极层与覆盖所述第二电极层的第二配向层； 液晶层， 配置于 所述 TFT阵列基板的第一配向层与所述 CF基板的第二配向层之间； 其中， 所述第一配向层与所述第二配向层均被划分为至少一个分区，每一分区被分 成多个配向区， 所述第一配向层与所述第二配向层相对应的配向区其预定的 配向方向相互垂直； 所述每一分区由两条互相垂直的分隔线分成四个配向
进行照射， 所述对每一配向区照射的线偏振光的偏振方向与所述配向方向相 适应，从而在所述第一配向层与所述第二配向层上形成具有对应于各配向区 的预定的配向方向的配向膜。
本发明还提供一种液晶显示装置的制造方法， 包括步骤：
提供 TFT阵列基板与 CF基板，在所述 TFT阵列基板的第一电极层上涂 布偏振光敏感材料形成第一配向层， 在所述 CF基板的第二电极层上涂布偏 振光敏感材料形成第二配向层；
将所述第一配向层与所述第二配向层均划分成至少一个分区，各分区包 含多个配向区， 所述第一配向层与所述第二配向层相对应的配向区其预定的 配向方向相互垂直；
对所述第一配向层与所述第二配向层的各配向区分别采用不同方向的 线偏振光进行照射， 所述对每一配向区照射的线偏振光的偏振方向与所述配 向方向相适应，从而在所述第一配向层与所述第二配向上形成具有对应于各 配向区的预定的配向方向的配向月莫；
对所述 TFT阵列基板上的第一电极层和 CF基板上的第二电极层通电， 使液晶盒中的液晶分子完成配向；
将黑矩阵设置在所述 TFT阵列基板上； 以及
将间隙子设置在所述 TFT阵列基板上。
其中， 将黑矩阵设置在 TFT阵列基板的钝化层之上； 或者设置在 TFT 阵列基板的玻璃基板之上，栅线之下；或者设置在 TFT阵列基板的玻璃基板 之上， 栅线的两侧； 或者设置在 TFT阵列基板的彩膜层与数据线之间。
其中，将间隙子设置在所述黑矩阵之上；或者设置在所述 TFT阵列基板 的钝化层之上。
其中，在所述 TFT阵列基板上涂布偏振光敏感材料形成第一配向层之前 进一步包括： 在所述 TFT阵列基板的绝缘层与钝化层之间形成彩膜层。
实施本发明， 具有如下的有益效果：
首先， 在本发明的实施例中， 通过在 TFT 阵列基板的第一配向层上和 CF基板的第二配向层上采用不同方向的线偏振光进行照射， 从而形成特定 配向方向配向层， 无需对像素电极进行特别设计， 可以避免现有技术中由于 像素电极导致的暗亮条纹， 从而可以提高光线的透过率；
其次， 在本发明的实施例中， 对第一配向层的各分区中的各配向区的预 以灵活设置， 可以很灵活地实现液晶盒中各像素结构中的四个区域的配向， 同时可以改善大视角色偏；
第三， 在 TFT阵列基板上设置了黑矩阵， 可以防止 TFT阵列基板与 CF 基板之间因错位引起像素区域开口率减小的问题；
第四， 将间隙子设置在 TFT阵列基板上， 可以防止 TFT阵列基板与 CF 基板之间因错位引起像素区域的暗线， 避免配向不良。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案， 下面将对实 施例或现有技术描述中所需要使用的附图作简单地介绍， 显而易见地， 下面 描述中的附图仅仅是本发明的一些实施例， 对于本领域普通技术人员来讲， 在不付出创造性劳动的前提下， 还可以根据这些附图获得其他的附图。
图 1为现有的一种是现有的一种 PSVA模式的液晶显示装置的像素电极 的示意图；
图 2是对图 1的像素电极施加电压后的液晶倒向示意图；
图 3 为本发明提供的一种液晶显示装置的一个实施例中像素结构示意 图；
图 4 为本发明提供的一种液晶显示装置的一个实施例中按照图 3 中的 A-A向剖视图；
图 5为本发明提供的一种液晶显示装置的配向原理介绍中第一个实施例 中 TFT阵列基板的分区示意图；
图 6为本发明提供的一种液晶显示装置的配向原理介绍中第一个实施例 中 CF基板的分区示意图；
图 7为本发明提供的一种液晶显示装置的配向原理介绍中第一个实施例 中对 CF基板进行线偏振光照射的示意图；
图 8为本发明提供的一种液晶显示装置的配向原理介绍中第一个实施例 中液晶配向结果示意图；
图 9为本发明提供的一种液晶显示装置的配向原理介绍中第二个实施例 中 TFT阵列基板的分区示意图；
图 10为本发明提供的一种液晶显示装置的配向原理介绍中第二个实施 例中 CF基板的分区示意图；
图 11 为本发明提供的一种液晶显示装置的配向原理介绍中第二个实施 例中液晶配向结果示意图；
图 12为本发明提供的一种液晶显示装置的配向原理介绍中第三个实施 例中 TFT阵列基板的分区示意图；
图 13为本发明提供的一种液晶显示装置的配向原理介绍中第三个实施 例中 CF基板的分区示意图；
图 14为本发明提供的一种液晶显示装置的配向原理介绍中第三个实施 例中液晶配向结果示意图；
图 15为本发明提供的一种液晶显示装置的另一个实施例的剖视图； 图 16为本发明提供的一种液晶显示装置的又一个实施例的剖视图； 图 17为本发明提供的一种液晶显示装置的制造方法的主流程示意图。 具体实施方式
以下各实施例的说明是参考附图， 用以式例本发明可以用以实施的特定 实施例。 本发明所提到的方向用语， 例如「上」、 「下」、 「前」、 「后」、 「左」、 r右」、 「内」、 「外」、 「侧面」等， 仅是参考附加图式的方向。 因此， 使用的 方向用语是用以说明及理解本发明， 而非用以限制本发明。
如图 3及图 4所示， 为本发明提供的一种液晶显示装置的一个实施例的 结构示意图， 该液晶显示装置包括：
TFT阵列基板 1 , 具有第一电极层 15与覆盖第一电极层 15的第一配向 层 19, 还设置有黑矩阵（ Black Matrix ) 22和间隙子 （ Photo Spacer ) 30; CF ( Color Filter, 彩膜）基板 2, 具有第二电极层 24与覆盖第二电极层 24的第二配向层 29;
液晶层 3 ,配置于 TFT阵列基板 1的第一配向层 19与 CF基板 2的第二 配向层 29之间；
其中， 第一配向层 19与第二配向层 29均被划分为至少一个分区， 每一 分区被分成多个配向区， 第一配向层 19与第二配向层 29相对应的配向区其 预定的配向方向相互垂直；
在对第一配向层 19与第二配向层 29的各配向区分别采用不同方向的线 偏振光进行照射，对每一配向区照射的线偏振光的偏振方向与配向方向相适 应，从而在第一配向层 19与第二配向层 29上形成具有对应于各配向区的预 定的配向方向的配向月莫。
下面将结合具体的实施例， 首先说明上述第一配向层与第二配向层的配 向原理及过程。
如图 5-图 8所示， 示出了本发明的第一实施例。 在该实施例中， 如图 5 所示， 将 TFT阵列基板 1的第一配向层划分成多个分区 10, 每一分区 10进 一步包括多个配向区 100,在图 5中，每一分区 10由两条互相垂直的分隔线 分成四个配向区 100 (在图中只示出了一个分区 10被划分成四个配向区，此 处仅为举例）， 其中， 每一配向区 100 中均被预定有一个配向方向 （见图中 箭头所示），在一个分区 10中至少有两个配向区 100的预定的配向方向不相 同， 其中， 左侧的两个配向区 100的预定配向方向为向上， 而右侧两个配向 区 100的预定配向方向为向下。
同样， 如图 6所示， 将 CF基板 2的第二配向层划分成多个分区 20, 每 一分区 20进一步包括多个配向区 200, 在图 6中， 每一分区 20由两条互相 垂直的分隔线分成四个配向区 200, 其中， 每一配向区 200中均被预定有一 个配向方向（见图中箭头所示）， 在一个分区 20中至少有两个配向区 200的 预定的配向方向不相同， 其中， 上侧的两个配向区 200的预定配向方向为向 右， 而下侧两个配向区 200的预定配向方向为向左。
其中， 第一配向层的各配向区 100与第二配向层相对应的各配向区 200 其预定的配向方向相互垂直。 如图 7所示， 示出了利用线偏振光对基板进行照射的示意图。 其中， 该 线偏振光采用紫外线 （ UV ); 图 7中示出了紫外光照射图 6中 CF基板 2的 第二配向层的其中一分区 20中下侧配向区 200的情形。 其中， 箭头方向为 线偏振光的照射方向， 而其上的黑色横线表示线偏振光的偏振方向， 在此实 施例中， 需保证线偏振光的偏振方向与第二配向层的分区 20 中下侧配向区 200的预定配向方向相适应 （例如， 相同）， 从而可以通过线偏振光的照射， 可以使该配向区 200形成具有预定配向方向的配向膜。
同理， 需要采用其他不同方向的线偏振光对第二配向层的各分区 20 中 的其他配向区 200进行照射， 以在第二配向层上形成具有预定配向方向的配 向膜； 同时需要采用线偏振光对第一配向层的各分区 10的各配向区 100进 行照射， 以在第一配向层上形成具有预定配向方向的配向膜。
如图 8所示， 示出了本发明提供的一种液晶显示装置中第一个实施例中 液晶配向结果示意图。在形成配向膜之后，通过步骤对 TFT阵列基板上的第 一电极和 CF基板上的第二电极通电， 使液晶盒中的液晶分子完成配向。 由 于第一配向层的各配向区 100与相对应的第二配向层上各配向区 200的预定 的配向方向垂直， 故在第一配向层与第二配向层的作用下， 可以使液晶盒中 对应于各配向区的液晶分子产生倒向， 完成配向。 图 8中示出了对应于图 5 和图 6中的一分区处的液晶分子的配向示意图。其最终在第三象限中的液晶 分子与 X轴形成 a度角， 而在第一象限中的液晶分子与 X轴形成 -a度角， 而在第二角限中的液晶分子与 X轴形成（a-180 )度角， 而在第四角限中的 液晶分子与 X轴形成（180-a )度角， 从而可以改善大视角色偏的问题。 在 其他分区处的液晶分子的配向与此类似。
如图 9-图 11所示，示出本发明的第二个实施例。在该实施例中，在 TFT 阵列基板 1的第一配向层的一个分区 10中， 其上侧两个配向区 100的预定 配向方向为向下， 而下侧两个配向区 100的预定配向方向为向上； 在 CF基 板 2的第二配向的相应分区 20中， 其右侧两个配向区 200的预定配向方向 为向左， 而左侧两个配向区 200的预定配向方向为向右； 最终在液晶显示装 置对应的区域的液晶分子在配向结束后均朝向中心位置（见图 11 ), 其中第 一象限处的液晶分子与 X轴形成 c角度。 如图 12-图 14 所示， 示出本发明的第三个实施例。 在该实施例中， 在 TFT阵列基板 1的第一配向层的一个分区 10中， 其右侧两个配向区 100的 预定配向方向为向右， 而左侧两个配向区 100 的预定配向方向为向左； 在 CF基板 2的第二配向的相应分区 20中， 其上侧两个配向区 200的预定配向 方向为向上， 而下侧两个配向区 200的预定配向方向为向下； 最终在液晶显 示装置对应的区域的液晶分子在配向结束后均远离中心位置（见图 14 ), 其 中第一象限处的液晶分子与 X轴形成 b角度。
可以理解的是，上述三个实施例仅为举例，在本发明的其他的实施例中， 第一配向层的各分区中的各配向区的预定配向方向还可以根据需要进行调 动。
其中， 在一个实施例中， 第一电极层 15为像素电极层； 第二电极层 24 为共用电极层。其中，可以将配向层的每个分区大小与 TFT阵列基板 1的一 个像素结构的大小和位置相对应。
以下再具体介绍本发明提供的液晶显示装置的结构。如图 3和图 4所示， 该 TFT阵列基板 1进一步包括：
玻璃基板 11以及设置在该玻璃基板 11上的栅线 13和共用电极 14。 在 其上覆盖有绝缘层 16,在栅线 13的正上方的绝缘层 16上进一步设置有半导 体层 17, 在半导体层 17上设置有用于形成漏极和源极的数据线 12, 然后在 其上设置有一层钝化层 180, 在钝化层 180上形成有像素电极 15 , 第一配向 层 19设置在像素电极 15之上。
为了使液晶盒（液晶层） 的上下表面实现平坦化， 需要将彩膜层 18设 置在 TFT P车列基板 1的绝缘层 16与钝化层 180之间。
而 CF基板 2具体包括： 玻璃基板 21 , 以及覆盖于玻璃基板 21之上的 共用电极层 24; 其中， 第二配向层 29设置于共用电极层 24之上。
液晶层 3具体包括液晶分子（未示出） 以及间隙子 30。
本发明中， 为防止 TFT阵列基板 1与 CF基板 2之间错位引起像素区域 开口率减小的问题， 在 TFT阵列基板上设置了黑矩阵 22。
如图 4所示， 在本实施例中， 将黑矩阵 22设置于 TFT阵列基板 1的钝 化层 180之上， 而在 CF基板 2上不设置黑矩阵。
图 15为本发明提供的一种液晶显示装置的另一个实施例的剖视图； 在 该实施例中， 其与图 4示出的实施例的主要区别在于， 在本实施例中， 其中 将黑矩阵 22设置于 TFT P车列基板 1的玻璃基板 1之上，栅线 13之下； 而在 CF基板 2上不设置黑矩阵， 其他的结构与图 4中示出的实施例相同， 在此 不进行详述， 可一并参照对图 4的介绍。
图 16为本发明提供的一种液晶显示装置的又一个实施例的剖视图。 在 该实施例中， 其与图 4示出的实施例的主要区别在于， 在本实施例中， 将黑 矩阵 22设置于 TFT阵列基板 1的玻璃基板 1之上， 栅线 13的两侧； 而在 CF基板 2上不设置黑矩阵， 其他的结构与图 4中示出的实施例相同， 在此 不进行详述， 可一并参照对图 4的介绍。
可以理解的是， 在其他的实施例中， 还可以根据需要将黑矩阵 22设置 在 TFT阵列基板 1的其他位置上， 例如， 可以将黑矩阵 22设置于 TFT阵列 基板 1的彩膜层 18与数据线 12之间。 设置的位置可以参照前述的说明， 亦 可以达到相同的效果， 故在此不再贅述。
请再参照图 4、图 15和图 16所示，本发明还将间隙子 30 ( Photo spacer ) 设置在 TFT阵列基板 1上， 具体的， 图 4中是将间隙子 30设置在黑矩阵 22 之上， 而图 15和图 16中均是将间隙子设置在钝化层 180之上。将间隙子 30 ( Photo spacer )设置在 TFT P车列基板 1上的目的在于， 防止 CF基板 2与 TFT阵列基板 1错位引起像素区域的暗线（disclination line )。 因为间隙子 30 的高度较大， 会改变其附近的液晶盒内的平坦度从而造成配向不良。 一般将 间隙子 30设置在离开显示区一定距离之外， 但是如果间隙子 30放在 CF基 板 2上， 当 CF基板 2和 TFT阵列基板 1有错位的时候， 间隙子 30有可能 进入 TFT P车列基板 1的显示区从而造成配向不良（暗线就是液晶配向不良引 起的）。 间隙子 30可以与 CF基板 2相抵接， 也可以保持一定距离。
基于前述有关配向原理、 过程以及液晶显示装置结构的介绍， 本发明还 提供该液晶显示装置的制造方法。 如图 17所示， 为本发明提供的一种液晶 显示装置的制造方法的一个实施例的主流程示意图。 在该实施例中， 该制造 方法包括如下的步骤： 步骤 S10, 提供 TFT阵列基板与 CF基板， 在 TFT阵列基板的第一电极 层上涂布偏振光敏感材料形成第一配向层， 在 CF基板的第二电极层上涂布 偏振光敏感材料形成第二配向层；
步骤 S11 , 将第一配向层与第二配向层均划分成至少一个分区， 各分区 包含多个配向区， 第一配向层与第二配向层相对应的配向区其预定的配向方 向相互垂直；
步骤 S12, 对第一配向层与第二配向层的各配向区分别采用不同方向的 线偏振光进行照射，对每一配向区照射的线偏振光的偏振方向与配向方向相 适应，从而在第一配向层与第二配向上形成具有对应于各配向区的预定的配 向方向的配向月莫；
步骤 S13 , 对 TFT阵列基板上的第一电极层和 CF基板上的第二电极层 通电， 使液晶盒中的液晶分子完成配向；
步骤 S14, 将黑矩阵设置在 TFT阵列基板上；
步骤 S15 , 将间隙子设置在 TFT阵列基板上。
具体的， 步骤 S14中， 黑矩阵设置在 TFT阵列基板的钝化层之上； 或 者设置在 TFT阵列基板的玻璃基板之上， 栅线之下； 或者设置在 TFT阵列 基板的玻璃基板之上，栅线的两侧；或者设置在 TFT阵列基板的其他位置上， 例如， 设置于 TFT阵列基板的彩膜层与数据线之间。
步骤 S15 中， 间隙子设置在黑矩阵之上； 或者设置在 TFT阵列基板的 钝化层之上。
需要注意的是，在本发明的制造方法中，在 TFT阵列基板上涂布偏振光 敏感材料形成第一配向层之前进一步包括：
在 TFT阵列基板的绝缘层与钝化层之间形成彩膜层，本发明通过将彩膜 层设置于 TFT阵列基板中， 这样可以使液晶盒的上下表面实现平坦化处理， 从而在步骤 S13中获得更好的配向效果。
其中， 在一个实施例中， 第一电极层 15为像素电极层； 第二电极层 24 为共用电极层。其中，可以将配向层的每个分区大小与 TFT阵列基板 1的一 个像素结构的大小和位置相对应。
有关第一配向层和第二配向层的配向原理及过程请参照对图 5-14 的介 绍， 此处不再贅述。
实施本发明， 具有如下的有益效果：
首先， 在本发明的实施例中， 通过在 TFT 阵列基板的第一配向层上和 CF基板的第二配向层上采用不同方向的线偏振光进行照射， 从而形成特定 配向方向配向层， 无需对像素电极进行特别设计， 可以避免现有技术中由于 像素电极导致的暗亮条纹， 从而可以提高光线的透过率；
其次， 在本发明的实施例中， 对第一配向层的各分区中的各配向区的预 以灵活设置， 可以很灵活地实现液晶盒中各像素结构中的四个区域的配向， 同时可以改改善大视角色偏；
第三， 在 TFT阵列基板上设置了黑矩阵， 可以防止 TFT阵列基板与 CF 基板之间因错位引起像素区域开口率减小的问题；
第四， 将间隙子设置在 TFT阵列基板上， 可以防止 TFT阵列基板与 CF 基板之间因错位引起像素区域的暗线， 避免配向不良。
另外， 本发明的实施例中， 将彩膜层设置在 TFT阵列基板上， 可以使液 晶盒（液晶层） 的上下表面实现平坦化， 可以提高液晶配向的效果。
以上所揭露的仅为本发明较佳实施例而已， 当然不能以此来限定本发明 之权利范围， 因此等同变化， 仍属本发明所涵盖的范围。

Claims

权 利 要 求
1、 一种液晶显示装置， 其中， 包括：
TFT阵列基板 ( 1 ), 具有第一电极层（ 15 )与覆盖所述第一电极层（ 15 ) 的第一配向层 （19), 其上还设置有黑矩阵（22)和间隙子（30);
CF基板 (2), 具有第二电极层 （24)与覆盖所述第二电极层（24) 的 第二配向层（29);
液晶层（3), 配置于所述 TFT阵列基板（1 ) 的第一配向层（19)与所 述 CF基板 (2) 的第二配向层（29)之间；
其中， 所述第一配向层（19)与所述第二配向层（29)均被划分为至少 一个分区 （10, 20), 每一分区被分成多个配向区 （ 100, 200), 所述第一配 向层（19)与所述第二配向层（29)相对应的配向区 （ 100, 200)其预定的 配向方向相互垂直；
在对所述第一配向层（19)与所述第二配向层（29) 的各配向区 （100, 200)分别采用不同方向的线偏振光进行照射， 所述对每一配向区照射的线 偏振光的偏振方向与所述配向方向相适应， 从而在所述第一配向层（19)与 所述第二配向层（29)上形成具有对应于各配向区 （ 100, 200)的预定的配 向方向的配向月莫。
2、 如权利要求 1所述的液晶显示装置， 其中， 所述 TFT阵列基板（1 ) 进一步包括： 玻璃基板（11)、 栅线 （13)、 绝缘层（16)、 半导体层（17)、 数据线（ 12 )以及钝化层（ 180 ), 其中， 在所述绝缘层（ 16 )与钝化层（ 180 ) 之间设置有彩膜层（ 18)。
3、 如权利要求 2所述的液晶显示装置， 其中， 所述黑矩阵（22)设置 在所述 TFT阵列基板 ( 1 ) 的钝化层（ 180 )之上； 或者设置在所述 TFT阵 列基板 ( 1 )的玻璃基板 ( 11 )之上， 栅线 ( 13 )之下； 或者设置在所述 TFT 阵列基板 ( 1 ) 的玻璃基板 ( 11 )之上， 栅线 ( 13 ) 的两侧； 或者设置在所 述 TFT阵列基板 ( 1 ) 的彩膜层（ 18 )与数据线 ( 12 )之间。
4、 如权利要求 3所述的液晶显示装置， 其中， 所述间隙子（30)设置 在所述黑矩阵（ 22 )之上；或者设置在所述 TFT阵列基板（ 1 )的钝化层（ 180 ) 之上。
5、 如权利要求 4所述的液晶显示装置， 其中， 所述每一分区 （10, 20) 由两条互相垂直的分隔线分成四个配向区， 所述四个配向区中至少有两个配 向区的预定的配向方向不相同。
6、 如权利要求 1 所述的液晶显示装置， 其中， 所述第一电极层（15) 为像素电极层， 所述第二电极层（24) 为共用电极层。
7、 一种液晶显示装置， 其中， 包括：
TFT阵列基板 ( 1 ), 具有第一电极层（ 15 )与覆盖所述第一电极层（ 15 ) 的第一配向层 （19), 其上还设置有黑矩阵（22)和间隙子（30);
CF基板 (2), 具有第二电极层 （24)与覆盖所述第二电极层（24) 的 第二配向层（29);
液晶层（3), 配置于所述 TFT阵列基板（1 ) 的第一配向层（19)与所 述 CF基板 (2) 的第二配向层（29)之间；
其中， 所述第一配向层（19)与所述第二配向层（29)均被划分为至少 一个分区 （10, 20), 每一分区被分成多个配向区 （ 100, 200), 所述第一配 向层（19)与所述第二配向层（29)相对应的配向区 （ 100, 200)其预定的 配向方向相互垂直； 所述每一分区 （10, 20) 由两条互相垂直的分隔线分成 同；
在对所述第一配向层（19)与所述第二配向层（29) 的各配向区 （100, 200)分别采用不同方向的线偏振光进行照射， 所述对每一配向区照射的线 偏振光的偏振方向与所述配向方向相适应， 从而在所述第一配向层（19)与 所述第二配向层（29)上形成具有对应于各配向区 （ 100, 200)的预定的配 向方向的配向月莫。
8、 一种液晶显示装置的制造方法， 包括步骤：
提供 TFT阵列基板与 CF基板，在所述 TFT阵列基板的第一电极层上涂 布偏振光敏感材料形成第一配向层， 在所述 CF基板的第二电极层上涂布偏 振光敏感材料形成第二配向层；
将所述第一配向层与所述第二配向层均划分成至少一个分区，各分区包 含多个配向区， 所述第一配向层与所述第二配向层相对应的配向区其预定的 配向方向相互垂直；
对所述第一配向层与所述第二配向层的各配向区分别采用不同方向的 线偏振光进行照射， 所述对每一配向区照射的线偏振光的偏振方向与所述配 向方向相适应，从而在所述第一配向层与所述第二配向上形成具有对应于各 配向区的预定的配向方向的配向月莫；
对所述 TFT阵列基板上的第一电极层和 CF基板上的第二电极层通电， 使液晶盒中的液晶分子完成配向；
将黑矩阵设置在所述 TFT阵列基板上； 以及
将间隙子设置在所述 TFT阵列基板上。
9、 如权利要求 8所述的制造方法， 其中， 将黑矩阵设置在 TFT阵列基 板的钝化层之上； 或者设置在 TFT阵列基板的玻璃基板之上， 栅线之下； 或 者设置在 TFT阵列基板的玻璃基板之上， 栅线的两侧； 或者设置在 TFT阵 列基板的彩膜层与数据线之间。
10、 如权利要求 9所述的制造方法， 其中， 将间隙子设置在所述黑矩阵 之上； 或者设置在所述 TFT阵列基板的钝化层之上。
11、如权利要求 8所述的制造方法， 其中， 在所述 TFT阵列基板上涂布 偏振光敏感材料形成第一配向层之前进一步包括：
在所述 TFT阵列基板的绝缘层与钝化层之间形成彩膜层。
PCT/CN2014/070307 2013-12-31 2014-01-08 一种液晶显示装置及其制造方法 Ceased WO2015100759A1 (zh)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US14/234,386 US20150185514A1 (en) 2013-12-31 2014-01-08 Liquid crystal device and the manufacturing method thereof
KR1020167020643A KR101847325B1 (ko) 2013-12-31 2014-01-08 액정 디스플레이 장치 및 그 제조방법
RU2016125810A RU2016125810A (ru) 2013-12-31 2014-01-08 Жидкокристаллическое устройство и способ его изготовления
JP2016561050A JP6386082B2 (ja) 2013-12-31 2014-01-08 液晶表示装置及びその製造方法
GB1610217.0A GB2535676B (en) 2013-12-31 2014-01-08 Liquid crystal device and the manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201310747803.9 2013-12-31
CN201310747803.9A CN103728780A (zh) 2013-12-31 2013-12-31 一种液晶显示装置及其制造方法

Publications (1)

Publication Number Publication Date
WO2015100759A1 true WO2015100759A1 (zh) 2015-07-09

Family

ID=50452922

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2014/070307 Ceased WO2015100759A1 (zh) 2013-12-31 2014-01-08 一种液晶显示装置及其制造方法

Country Status (6)

Country Link
JP (1) JP6386082B2 (zh)
KR (1) KR101847325B1 (zh)
CN (1) CN103728780A (zh)
GB (1) GB2535676B (zh)
RU (1) RU2016125810A (zh)
WO (1) WO2015100759A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103728781A (zh) * 2013-12-31 2014-04-16 深圳市华星光电技术有限公司 一种液晶显示器及其制造方法
CN104007590A (zh) * 2014-06-17 2014-08-27 深圳市华星光电技术有限公司 Tft阵列基板结构
CN104503169B (zh) * 2014-11-21 2018-03-06 深圳市华星光电技术有限公司 垂直配向型液晶显示器
CN104678666A (zh) * 2015-03-19 2015-06-03 京东方科技集团股份有限公司 显示面板及其制备方法
KR102401621B1 (ko) * 2015-07-23 2022-05-25 삼성디스플레이 주식회사 액정 표시 장치 및 그 제조 방법
CN105911735A (zh) * 2016-06-15 2016-08-31 苏州众显电子科技有限公司 一种液晶显示装置的制造方法
CN113031349B (zh) * 2021-03-22 2021-12-31 惠科股份有限公司 光配向装置及光配向方法
CN115113442B (zh) * 2022-04-26 2024-04-26 成都京东方显示科技有限公司 一种显示面板和显示装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5909265A (en) * 1996-09-20 1999-06-01 Lg Electronics Inc. Method of fabricating a multi-domain liquid crystal cell
CN101251688A (zh) * 2007-02-22 2008-08-27 龙腾光电（控股）有限公司 液晶面板以及液晶显示装置
US20090284702A1 (en) * 2008-05-19 2009-11-19 Samsung Electronics Co., Ltd. Liquid crystal display
WO2011142144A1 (ja) * 2010-05-11 2011-11-17 シャープ株式会社 液晶表示装置
WO2012160740A1 (ja) * 2011-05-20 2012-11-29 株式会社有沢製作所 光回折素子、光ピックアップ及び光回折素子の製造方法
CN102819144A (zh) * 2012-07-30 2012-12-12 北京京东方光电科技有限公司 取向膜制备方法、取向实现方法及液晶显示装置
CN103376593A (zh) * 2012-04-19 2013-10-30 三星显示有限公司 液晶显示器

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW439003B (en) * 1995-11-17 2001-06-07 Semiconductor Energy Lab Display device
KR100193653B1 (ko) * 1995-11-20 1999-06-15 김영환 축적 캐패시터를 구비한 스태거 tft-lcd 및 그의 제조방법
JP3471692B2 (ja) * 2000-01-21 2003-12-02 Ｎｅｃ液晶テクノロジー株式会社 カラー液晶表示パネル
KR100623989B1 (ko) * 2000-05-23 2006-09-13 삼성전자주식회사 액정 표시 장치용 박막 트랜지스터 기판 및 그의 수리 방법
JP3744521B2 (ja) * 2003-02-07 2006-02-15 セイコーエプソン株式会社 電気光学装置及び電子機器
KR101036723B1 (ko) * 2003-12-30 2011-05-24 엘지디스플레이 주식회사 액정표시장치 및 그 제조방법
JP4212529B2 (ja) 2004-08-09 2009-01-21 壽一 久保 光ファイバ配線方法及びその装置
ATE548676T1 (de) * 2007-04-20 2012-03-15 Sharp Kk Flüssigkristallanzeigeanordnungs- herstellungsverfahren und flüssigkristallanzeigeanordnung
CN102356351B (zh) * 2009-03-17 2015-04-29 夏普株式会社 液晶显示装置和其制造方法
CN202025170U (zh) * 2011-04-22 2011-11-02 京东方科技集团股份有限公司 一种显示屏及显示装置
US8600844B2 (en) 2012-02-02 2013-12-03 W.W. Grainger, Inc. Methods and systems for customizing inventory in an automated dispensing cabinet
US9025112B2 (en) 2012-02-02 2015-05-05 Apple Inc. Display with color mixing prevention structures
JP5689436B2 (ja) * 2012-04-03 2015-03-25 シャープ株式会社 液晶表示装置
KR20130115621A (ko) * 2012-04-12 2013-10-22 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법
CN103199095B (zh) * 2013-04-01 2016-06-08 京东方科技集团股份有限公司 显示器、薄膜晶体管阵列基板及其制造工艺
CN103226272B (zh) * 2013-04-16 2015-07-22 合肥京东方光电科技有限公司 一种阵列基板及其制备方法、显示装置
CN103353699A (zh) * 2013-06-24 2013-10-16 京东方科技集团股份有限公司 一种阵列基板、其制备方法及显示装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5909265A (en) * 1996-09-20 1999-06-01 Lg Electronics Inc. Method of fabricating a multi-domain liquid crystal cell
CN101251688A (zh) * 2007-02-22 2008-08-27 龙腾光电（控股）有限公司 液晶面板以及液晶显示装置
US20090284702A1 (en) * 2008-05-19 2009-11-19 Samsung Electronics Co., Ltd. Liquid crystal display
WO2011142144A1 (ja) * 2010-05-11 2011-11-17 シャープ株式会社 液晶表示装置
WO2012160740A1 (ja) * 2011-05-20 2012-11-29 株式会社有沢製作所 光回折素子、光ピックアップ及び光回折素子の製造方法
CN103376593A (zh) * 2012-04-19 2013-10-30 三星显示有限公司 液晶显示器
CN102819144A (zh) * 2012-07-30 2012-12-12 北京京东方光电科技有限公司 取向膜制备方法、取向实现方法及液晶显示装置

Also Published As

Publication number Publication date
KR20160102562A (ko) 2016-08-30
JP2017501455A (ja) 2017-01-12
CN103728780A (zh) 2014-04-16
KR101847325B1 (ko) 2018-04-10
JP6386082B2 (ja) 2018-09-05
GB2535676B (en) 2020-09-09
GB201610217D0 (en) 2016-07-27
RU2016125810A (ru) 2018-01-10
GB2535676A (en) 2016-08-24

Similar Documents

Publication Publication Date Title
WO2015100765A1 (zh) 一种液晶显示装置及相应的制造方法
WO2015100759A1 (zh) 一种液晶显示装置及其制造方法
US8767147B2 (en) Liquid crystal display wherein a first light blocking portion and a first colored portion extends generally along a gate line and generally covers the gate line and a thin film transistor
JP4952630B2 (ja) 液晶装置
WO2015100758A1 (zh) 一种液晶显示面板的配向方法及相应的液晶显示装置
US9269727B2 (en) Curved display device including trenches in substrate
WO2018086312A1 (zh) 一种液晶面板、液晶显示器及液晶面板的制造方法
WO2017181732A1 (zh) 显示面板及其制作方法、以及显示装置
WO2015100763A1 (zh) 一种液晶显示器及其制造方法
JP2014206637A (ja) 液晶表示装置
WO2017128779A1 (zh) 显示基板及其制作方法、显示装置
US11567370B2 (en) Display substrate and manufacturing method thereof, and display device
CN104360543A (zh) 显示基板及其制造方法、显示面板和显示装置
WO2016033834A1 (zh) 阵列基板以及具备该阵列基板的显示面板
WO2015043055A1 (zh) 阵列基板及其制作方法、液晶面板及显示装置
CN110764327A (zh) 阵列基板及其制备方法
US20140043576A1 (en) Liquid crystal display panel and liquid crystal display device
US20170371188A1 (en) Liquid crystal panel and fabricating method thereof
JP2012027205A (ja) 液晶表示パネル
US9658485B2 (en) Display panel, a display device, and fabrication method thereof
JP2015060199A (ja) 液晶表示装置
JP5183267B2 (ja) 液晶装置
WO2017185423A1 (zh) 液晶面板及液晶显示器
JP5820908B2 (ja) 液晶表示パネル
JP2009250993A (ja) 液晶装置

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 14234386

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14876966

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 201610217

Country of ref document: GB

Kind code of ref document: A

Free format text: PCT FILING DATE = 20140108

WWE Wipo information: entry into national phase

Ref document number: 1610217

Country of ref document: GB

ENP Entry into the national phase

Ref document number: 2016125810

Country of ref document: RU

Kind code of ref document: A

Ref document number: 2016561050

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20167020643

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 14876966

Country of ref document: EP

Kind code of ref document: A1