WO2015085900A1 - 一种有源矩阵有机电致发光显示屏的触控结构 - Google Patents

一种有源矩阵有机电致发光显示屏的触控结构 Download PDF

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WO2015085900A1
WO2015085900A1 PCT/CN2014/093359 CN2014093359W WO2015085900A1 WO 2015085900 A1 WO2015085900 A1 WO 2015085900A1 CN 2014093359 W CN2014093359 W CN 2014093359W WO 2015085900 A1 WO2015085900 A1 WO 2015085900A1
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Prior art keywords
patterned electrode
film
organic electroluminescent
touch
active matrix
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PCT/CN2014/093359
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English (en)
French (fr)
Inventor
朱少鹏
平山秀雄
黄秀颀
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昆山工研院新型平板显示技术中心有限公司
昆山国显光电有限公司
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Application filed by 昆山工研院新型平板显示技术中心有限公司, 昆山国显光电有限公司 filed Critical 昆山工研院新型平板显示技术中心有限公司
Priority to JP2016537433A priority Critical patent/JP6286049B2/ja
Priority to EP14870106.3A priority patent/EP3104260B1/en
Priority to KR1020167018290A priority patent/KR101865054B1/ko
Priority to US15/102,719 priority patent/US10185422B2/en
Publication of WO2015085900A1 publication Critical patent/WO2015085900A1/zh
Priority to US16/136,259 priority patent/US10627942B2/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04102—Flexible digitiser, i.e. constructional details for allowing the whole digitising part of a device to be flexed or rolled like a sheet of paper
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00—Aspects of the constitution of display devices
    • G09G2300/04—Structural and physical details of display devices
    • G09G2300/0421—Structural details of the set of electrodes
    • G09G2300/0426—Layout of electrodes and connections

Definitions

  • the present invention relates to the field of display panels and touch technologies, and more particularly to a touch structure of an active matrix organic electroluminescent display (AMOLED), which is a hybrid touch structure.
  • AMOLED active matrix organic electroluminescent display
  • In-cell technology refers to the integration of touch panel functions into liquid crystals.
  • the method in the pixel, and the On-cell technique refers to a method of embedding the touch panel function between the color filter substrate and the polarizing plate.
  • AMOLED active matrix organic electroluminescent display
  • the existence of thin film packaging makes on-cell technology very difficult. Forming a conventional touch structure on a thin film package requires multiple photolithography. The impact of OLED devices is significant.
  • AMOLED active matrix organic light-emitting display
  • the present invention provides a touch structure of an active matrix organic electroluminescent display.
  • a touch structure of an active matrix organic electroluminescent display screen is disposed on a display substrate, the touch structure includes a mutual inductance transmitting structure and a receiving structure, and the transmitting structure further includes a first encapsulating film, a first patterned electrode formed on the organic electroluminescent device on the display substrate, and a second encapsulating film formed on the first encapsulating film Forming a second encapsulating film on the first patterned electrode; the receiving structure further comprising a flexible polymer foil having a second patterned electrode formed thereon, the second package A sealing film is bonded to the flexible polymer foil, and the first patterned electrode is disposed opposite to the second patterned electrode.
  • the first patterned electrode in the transmitting structure and the second patterned electrode in the receiving structure are both strip-shaped patterns, and the first patterned electrode and the second patterned electrode form a position overlapping complementary pattern.
  • the stripe pattern in the first patterned electrode and the stripe pattern in the second patterned electrode are disposed perpendicular to each other.
  • the first encapsulating film is composed of a multilayer film including at least one inorganic film.
  • the first encapsulating film further comprises one or more organic films.
  • the film thickness of the first patterned electrode and the second patterned electrode is 5-1000 nm.
  • the first encapsulating film and the second encapsulating film have a thickness of 50-5000 nm.
  • the display substrate is a glass substrate or a flexible polymer substrate.
  • the present invention is to form a first patterned electrode and a second patterned electrode on the first encapsulating film and the flexible polymer foil, respectively, which can be prepared by using low-cost nano silver or graphene, thereby further reducing the cost. At the same time, it is compatible with flexible touch.
  • the receiving structure in the present invention is formed on a flexible polymer foil, and the material thereof may be, but not limited to, polyethylene terephthalate, polyethylene naphthalate, polyether sulfone, poly amide.
  • a second patterned electrode of a capacitive touch sensor is formed on the polymer foil by an amine, a parylene, etc., and the material, formation mode and selection range of the second patterned electrode are the same as those of the first patterned electrode, The two patterned electrodes are formed directly on the flexible polymer foil, rather than on the device, and the manufacturing process is greatly reduced.
  • FIG. 1 is a cross-sectional view showing a touch structure of an active matrix organic electroluminescent display panel according to the present invention
  • FIG. 2 is a cross-sectional view of an AMOLED touch structure described in accordance with an embodiment of the present invention.
  • 10-emitting structure 101-display substrate; 102-thin film transistor array; 103-organic electroluminescent device; 104-first encapsulating film; 105-first patterned electrode; 106-second encapsulating film; - glue; 108 - second patterned electrode; 109 - polymer foil; 20 - receiving structure.
  • the present invention provides a touch structure of an active matrix organic electroluminescent display panel, comprising a transmitting structure 10 and a receiving structure 20, the transmitting structure 10 further comprising a first encapsulating film 104, a first graphic
  • the first encapsulating film 104 is formed on the organic electroluminescent device 103 on the display substrate 101, and the first patterned electrode 105 is formed on the first encapsulating film 104.
  • a second encapsulating film 106 is formed on the first patterned electrode 105; the receiving structure 20 further includes a flexible polymer foil 109 having a second patterned electrode 108 formed thereon, and a second encapsulating film 106
  • the flexible polymer foil 109 is bonded by glue 107, and the first patterned electrode 105 is disposed opposite to the second patterned electrode 108.
  • the display substrate 101 is selected, wherein the display substrate 101 can be a conventional glass substrate or a flexible polymer substrate.
  • TFT thin film transistor
  • LTPS low temperature polysilicon
  • IGZO indium gallium zinc oxide
  • OTFT organic thin film transistor
  • An organic electroluminescent device (OLED) 103 is formed on a thin film transistor (TFT) array 102.
  • TFT thin film transistor
  • the manner in which the thin film transistor (TFT) array 102 and the organic electroluminescent device (OLED) 103 are formed may be a method conventionally employed in the art, which is not limited herein.
  • the first encapsulating film 104 On the organic electroluminescent device (OLED) 103, one or more layers of the first encapsulating film 104 are formed to insulate water oxygen, and the first encapsulating film 104 includes at least one inorganic film.
  • the material may be, but not limited to, a mixture of one or more of alumina, silica, silicon nitride, titania, zirconia, amorphous carbon, magnesium oxide; the formation may be, but not limited to, atomic layer deposition, splashing Injection, chemical vapor deposition, etc.
  • 104 may also include one or more layers of organic thin film, and the material thereof may be, but not limited to, polyacrylate, polyurea, polyimide, parylene, etc., and the formation method may be, but not limited to, organic chemical vapor deposition, Inkjet printing, flash evaporation, organic vapor deposition, spin coating, and the like.
  • a first patterned electrode 105 of the capacitive touch sensor on the first encapsulating film 104 the material of which is a transparent conductive film material, which may be, but not limited to, indium tin oxide, aluminum-doped zinc oxide, fluorine-doped oxidation Zinc, silver nanowires,
  • a transparent conductive film material which may be, but not limited to, indium tin oxide, aluminum-doped zinc oxide, fluorine-doped oxidation Zinc, silver nanowires,
  • One or more of carbon nanotubes, graphene, and conductive polymers may be patterned, but not limited to, photolithography, inkjet printing, metal masking, screen printing, etc., and the film thickness varies according to materials. , between 5-1000nm.
  • 109 is a flexible polymer foil, the material of which may be, but not limited to, polyethylene terephthalate, polyethylene naphthalate, polyether sulfone, polyimide, parylene, etc.
  • a second patterned electrode 108 of the capacitive touch sensor is formed on the flexible polymer foil 109.
  • the strip pattern in the second patterned electrode 108 and the strip pattern in the first patterned electrode 105 are perpendicular to each other.
  • the material, the forming manner and the selection range are the same as those of the first patterned electrode 105. Since it is directly formed on the flexible polymer foil 109 instead of the device, the process difficulty is greatly reduced.
  • one side of the second encapsulating film 106 in the emissive structure 10 is bonded to one side of the second patterned electrode 108 in the receiving structure 20 by the glue 107, so that the second patterned electrode 108 and the first patterned electrode 105 are The positions overlap to form a complementary pattern that can be used as a touch sensor.
  • the display substrate 101 is a flexible polymer substrate made of polyimide.
  • a low temperature polysilicon thin film transistor array is formed on the flexible polymer substrate, and then an organic electroluminescent device 103 is formed on the corresponding top electrodes of the arrays.
  • the first encapsulating film 104 is composed of two pairs of silicon nitride and polyacrylate films alternately formed, wherein silicon nitride is formed by plasma enhanced chemical vapor deposition, and polyacrylate is formed by an inkjet printing-ultraviolet curing method.
  • a first patterned electrode 105 of a touch sensor is formed on the first encapsulating film 104 in a strip shape, and the material thereof is indium tin oxide, which is prepared by magnetron sputtering, and has a film thickness of 25 nm, and a metal mask is used. Form a graphic.
  • a second encapsulating film 106 is formed on the first patterned electrode 105, and is formed by alternately forming two pairs of polyacrylate and silicon nitride films, wherein the silicon nitride is obtained by plasma enhanced chemical vapor deposition, and the polyacrylate is used. Inkjet printing - UV curing method is formed. The first portion of the display screen, the emission structure 10, is formed above.
  • the second portion of the display screen, the receiving structure 20, is comprised of a flexible polymer foil 109 and a second patterned electrode 108, wherein the flexible polymer foil 109 is polyethylene terephthalate, in a flexible polymer foil
  • a second patterned electrode 108 is formed by a magnetron sputtering method, and the material thereof is indium tin oxide, and the film thickness is 30 nm, and the patterning method is photolithography.
  • one side of the second encapsulating film 106 in the emission structure 10 is opposed to the second patterned electrode 108 in the receiving structure 20 by the glue 107, and the emission structure 10 and the receiving structure 20 are bonded by the glue 107.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本发明公开了一种有源矩阵有机电致发光显示屏的触控结构，其设置于显示屏基板上，触控结构包括互感的发射结构和接收结构，发射结构进一步包括第一包封薄膜、第一图形化电极和第二包封薄膜，第一包封薄膜形成于位于显示屏基板上的有机电致发光器件上，第一图形化电极形成于第一包封薄膜上，第一图形化电极上形成有第二包封薄膜；接收结构进一步包括柔性聚合物箔片，柔性聚合物箔片上成型有第二图形化电极，第二包封薄膜与柔性聚合物箔片相粘结，第一图形化电极与第二图形化电极相对设置。本发明通过设置互感的发射结构和接收结构能够大幅减少工序，降低成本，并且能兼容柔性触控。

Description

一种有源矩阵有机电致发光显示屏的触控结构 技术领域
本发明涉及显示面板和触控技术领域，更具体地讲，涉及一种有源矩阵有机电致发光显示屏(AMOLED)的触控结构，为一种混合式(hybrid)的触控结构。
背景技术
触控已经成为中小尺寸面板的必要配置，市场巨大。面板厂商为了增加产品附加值，将触控技术掌握于自己手中，纷纷开发内嵌式触控技术，主要包括in-cell和on-cell技术，in-cell技术是指将触摸面板功能嵌入到液晶像素中的方法，而On-cell技术是指将触摸面板功能嵌入到彩色滤光片基板和偏光板之间的方法。对于柔性有源矩阵有机电致发光显示屏(AMOLED)来说，薄膜封装的存在使得on-cell技术变得十分困难，在薄膜封装上形成传统触控结构需要多次光刻，对薄膜封装下的OLED器件影响十分显著。OLED器件与液晶显示器件存在巨大不同，使得in-cell技术在OLED器件上实现困难。因此，需要提供一种能兼容柔性显示的有源矩阵有机发光显示屏(AMOLED)的触控方式，尽量减少对薄膜封装的影响。
发明内容
为了解决现有技术的问题，减少多次光刻对薄膜封装的影响，降低工艺难度，本发明提供了一种有源矩阵有机电致发光显示屏的触控结构。
所述技术方案如下：
一种有源矩阵有机电致发光显示屏的触控结构，其设置于显示屏基板上，所述触控结构包括互感的发射结构和接收结构，所述发射结构进一步包括第一包封薄膜、第一图形化电极和第二包封薄膜，所述第一包封薄膜形成于位于显示屏基板上的有机电致发光器件上，所述第一图形化电极形成于所述第一包封薄膜上，所述第一图形化电极上形成有第二包封薄膜；所述接收结构进一步包括柔性聚合物箔片，所述柔性聚合物箔片上成型有第二图形化电极，所述第二包封薄膜与所述柔性聚合物箔片相粘结，所述第一图形化电极与所述第二图形化电极相对设置。
所述发射结构中的第一图形化电极与所述接收结构中的所述第二图形化电极均为条形图案，所述的第一图形化电极与第二图形化电极形成位置重叠的互补图案。
进一步地，所述的第一图形化电极中的条形图案与所述的第二图形化电极中的条形图案彼此垂直设置。
所述的第一包封薄膜由多层薄膜组成，其中至少包括一层无机薄膜。
进一步优选地，所述的第一包封薄膜还包括一层或多层有机薄膜。
所述的第一图形化电极和第二图形化电极的膜厚为5-1000nm。
所述的第一包封薄膜和第二包封薄膜的厚度为50-5000nm。
所述的显示屏基板为玻璃基板或柔性聚合物基板。
本发明提供的技术方案带来的有益效果是：
(1)本发明是在第一包封薄膜和柔性聚合物箔上分别形成第一图形化电极和第二图形化电极，其可以用低成本的纳米银或石墨烯等制备，进一步降低成本，同时能兼容柔性触控。
(2)本发明中的接收结构形成于柔性聚合物箔片上，其材料可以为但不限于聚对苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚醚砜、聚酰亚胺、聚对二甲苯等，在聚合物箔片上形成电容式触控传感器的第二图形化电极，第二图形化电极的材料、形成方式和选择范围均与第一图形化电极相同，由于第二图形化电极直接形成于柔性聚合物箔片上，而非器件之上，制作工艺难度大大降低。
附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明所提供的有源矩阵有机电致发光显示屏的触控结构截面图；
图2为本发明的一个实施例所描述的AMOLED触控结构的截面图。
图中：
10-发射结构，101-显示屏基板；102-薄膜晶体管阵列；103-有机电致发光器件；104-第一包封薄膜；105-第一图形化电极；106-第二包封薄膜；107-胶水；108-第二图形化电极；109-聚合物箔片；20-接收结构。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚，下面将结合附图对本发明实施方式作进一步地详细描述。
如图1所示，本发明提供了一种有源矩阵有机电致发光显示屏的触控结构，包括发射结构10和接收结构20，发射结构10进一步包括第一包封薄膜104、第一图形化电极105和第二包封薄膜106，第一包封薄膜104形成于位于显示屏基板101上的有机电致发光器件103上，第一图形化电极105形成于第一包封薄膜104上，第一图形化电极105上形成有第二包封薄膜106；接收结构20进一步包括柔性聚合物箔片109，柔性聚合物箔片109上成型有第二图形化电极108，第二包封薄膜106与柔性聚合物箔片109通过胶水107相粘结，第一图形化电极105与第二图形化电极108相对设置。
下面具体地对触控结构的制备过程进行描述：
(一)、制备触控结构中的发射结构10
A.选取显示屏基板101，其中的显示屏基板101可以为传统的玻璃基板，也可以为柔性聚合物基板。
B.在显示屏基板101上形成薄膜晶体管(TFT)阵列102，此技术为该行业技术人员所公知，技术路线可以为低温多晶硅(LTPS)，铟镓锌氧化物(IGZO)或有机薄膜晶体管(OTFT)等，用以控制像素的发光。
C.在薄膜晶体管(TFT)阵列102上形成有机电致发光器件(OLED)103。薄膜晶体管(TFT)阵列102与有机电致发光器件(OLED)103的形成方式可以为本技术领域惯常采用的方法，在此不作限定。
D.在有机电致发光器件(OLED)103之上，形成一层或多层第一包封薄膜104，起到隔绝水氧的作用，第一包封薄膜104至少包括一层无机薄膜，其材料可以为但不限于氧化铝、氧化硅、氮化硅、二氧化钛、氧化锆、非晶碳、氧化镁中的一种或几种的混合物；其形成方式可以为但不限于原子层沉积、溅射、化学气相沉积等。其中104还可能包括一层或多层有机薄膜，其材料可以为但不限于聚丙烯酸酯、聚脲、聚酰亚胺、聚对二甲苯等，形成方法可以为但不限于有机化学气相沉积、喷墨打印、闪蒸发、有机气相沉积、旋涂等。
E.第一包封薄膜104之上形成电容式触控传感器的第一图形化电极105，其材料为透明导电薄膜材料，可以为但不限于铟锡氧化物、掺铝氧化锌、掺氟氧化锌、银纳米线、 碳纳米管、石墨烯、导电聚合物中的一种或几种，其图形化的方式可以为但不限于光刻、喷墨打印、金属掩膜、丝网印刷等，其膜厚根据材料不同，在5-1000nm之间。
F.在第一图形化电极105之上形成第二包封薄膜106，其材料和方法的选择同第一包封薄膜104，第一包封薄膜和第二包封薄膜的厚度为50-5000nm，从而制得触控结构中的发射结构10。
(二)、制备触控结构中的接收结构20
109为柔性聚合物箔片，其材料可以为但不限于聚对苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚醚砜、聚酰亚胺、聚对二甲苯等，在柔性聚合物箔片109上形成电容式触控传感器的第二图形化电极108，优选地，第二图形化电极108中的条形图案与第一图形化电极105中的条形图案彼此垂直设置，其材料、形成方式和选择范围均与第一图形化电极105相同，由于直接形成于柔性聚合物箔片109上，而非器件之上，工艺难度大大降低。
最后，用胶水107将发射结构10中的第二包封薄膜106一面与接收结构20中的第二图形化电极108一面相粘合，使第二图形化电极108与第一图形化电极105的位置重叠，成为可作为触控传感器的互补图案。
实施例1
如图2所示，其中的显示屏基板101为柔性聚合物基板，其材质为聚酰亚胺。在柔性聚合物基板上形成低温多晶硅薄膜晶体管阵列，然后在这些阵列对应的顶部电极上形成有机电致发光器件103。第一包封薄膜104是由交替形成的两对氮化硅和聚丙烯酸酯薄膜组成，其中氮化硅用等离子体增强化学气相沉积制得，聚丙烯酸酯用喷墨打印-紫外固化方法形成。在第一包封薄膜104之上形成触控传感器的第一图形化电极105，呈条状，其材料为铟锡氧化物，用磁控溅射进行制备，膜厚为25nm，采用金属掩膜形成图形。在第一图形化电极105之上形成第二包封薄膜106，由交替形成两对聚丙烯酸酯和氮化硅薄膜组成，其中氮化硅用等离子体增强化学气相沉积制得，聚丙烯酸酯用喷墨打印-紫外固化方法形成。以上形成显示屏的第一部分，即发射结构10。显示屏的第二部分，即接收结构20由柔性聚合物箔片109和第二图形化电极108组成，其中柔性聚合物箔片109为聚对苯二甲酸乙二醇酯，在柔性聚合物箔片109上用磁控溅射方法形成第二图形化电极108，其材质为铟锡氧化物，膜厚为30nm，图形化的方式为光刻。最后，用胶水107将发射结构10中的第二包封薄膜106一面和接收结构20中的第二图形化电极108一面相对，通过胶水107将发射结构10和接收结构20相贴合。
上述本发明实施例序号仅仅为了描述，不代表实施例的优劣。
以上所述仅为本发明的较佳实施例，并不用以限制本发明，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (8)

  1. 一种有源矩阵有机电致发光显示屏的触控结构，其设置于显示屏基板(101)上，其特征在于，所述触控结构包括互感的发射结构(10)和接收结构(20)，所述发射结构(10)进一步包括第一包封薄膜(104)、第一图形化电极(105)和第二包封薄膜(106)，所述第一包封薄膜(104)形成于位于显示屏基板(101)上的有机电致发光器件(103)上，所述第一图形化电极(105)形成于所述第一包封薄膜(104)上，所述第一图形化电极(105)上形成有第二包封薄膜(106)；所述接收结构(20)进一步包括柔性聚合物箔片(109)，所述柔性聚合物箔片(109)上成型有第二图形化电极(108)，所述第二包封薄膜(106)与所述柔性聚合物箔片(109)相粘结，所述第一图形化电极(105)与所述第二图形化电极(108)相对设置。
  2. 根据权利要求1所述的有源矩阵有机电致发光显示屏的触控结构，其特征在于，所述发射结构(10)中的第一图形化电极(105)与所述接收结构(20)中的所述第二图形化电极(108)均为条形图案，所述的第一图形化电极(105)与第二图形化电极(108)形成位置重叠的互补图案。
  3. 根据权利要求2所述的有源矩阵有机电致发光显示屏的触控结构，其特征在于，所述的第一图形化电极(105)中的条形图案与所述的第二图形化电极(108)中的条形图案彼此垂直设置。
  4. 根据权利要求1-3任一所述的有源矩阵有机电致发光显示屏的触控结构，其特征在于，所述的第一包封薄膜(104)由多层薄膜组成，其中至少包括一层无机薄膜。
  5. 根据权利要求4所述的有源矩阵有机电致发光显示屏的触控结构，其特征在于，所述的第一包封薄膜(104)还包括一层或多层有机薄膜。
  6. 根据权利要求5所述的有源矩阵有机电致发光显示屏的触控结构，其特征在于，所述的第一图形化电极(105)和第二图形化电极(108)的膜厚为5-1000nm。
  7. 根据权利要求6所述的有源矩阵有机电致发光显示屏的触控结构，其特征在于，所述的第一包封薄膜和第二包封薄膜的厚度为50-5000nm。
  8. 根据权利要求1所述的有源矩阵有机电致发光显示屏的触控结构，其特征在于，所述的显示屏基板(101)为玻璃基板或柔性聚合物基板。
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