WO2015068722A1 - 硬化物膜の製造方法、電子部品の製造方法及び電子部品 - Google Patents
硬化物膜の製造方法、電子部品の製造方法及び電子部品 Download PDFInfo
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- WO2015068722A1 WO2015068722A1 PCT/JP2014/079320 JP2014079320W WO2015068722A1 WO 2015068722 A1 WO2015068722 A1 WO 2015068722A1 JP 2014079320 W JP2014079320 W JP 2014079320W WO 2015068722 A1 WO2015068722 A1 WO 2015068722A1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
- B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
- B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
- B41J11/00214—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
- B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0577—Double layer of resist having the same pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Definitions
- the present invention relates to a method for producing a cured product film in which a cured product film is formed using a curable composition having photocurability and thermosetting properties. Moreover, this invention relates to the manufacturing method and electronic component of an electronic component which applied the manufacturing method of the said hardened
- various other electronic components are mounted on an electronic component such as a substrate, and the electronic components are electrically connected by wiring.
- a resist pattern or a partition wall is formed between the wirings that electrically connect the electronic components in order to ensure insulation or to function as a protective film.
- An object of the present invention is to provide a method for producing a cured product film that can improve the formation accuracy of a fine cured product film and can improve the adhesion of the cured product film. It is another object of the present invention to provide an electronic component manufacturing method and an electronic component to which the cured film manufacturing method is applied.
- cured material film is a said 1st light irradiation part after the said 1st light irradiation process and before the said heating process.
- An irradiation process is further provided.
- the temperature of the curable composition being circulated is 40 ° C. or higher and 100 ° C. or lower.
- the viscosity at the time of discharging the curable composition is 3 mPa ⁇ s or more and 1500 mPa ⁇ s or less.
- the curable composition includes a photocurable compound, a thermosetting compound, a photopolymerization initiator, and a thermosetting agent.
- the curable composition includes the photocurable compound, light and a thermosetting compound, the thermosetting compound, and the photopolymerization start. And a thermosetting agent.
- the said photocurable compound has a (meth) acryloyl group
- the said light and a thermosetting compound are a (meth) acryloyl group and cyclic ether.
- the thermosetting compound has a cyclic ether group.
- the curable composition has, as the photocurable compound, a monofunctional compound having one (meth) acryloyl group, and a (meth) acryloyl group. And a polyfunctional compound having 2 or more.
- the method includes a step of forming a cured product film on the electronic component body by the above-described method for producing a cured product film, the electronic component body, and the cured product film on the electronic component body.
- An electronic component manufacturing method for obtaining an electronic component comprising:
- an electronic component comprising an electronic component main body and a cured product film obtained by the above-described method for producing a cured product film on the electronic component main body.
- the method for producing a cured film according to the present invention includes the first light irradiation described above after the coating step of applying a liquid curable composition having photocurability and thermosetting using an inkjet apparatus. And the heating process described above, the ink jet apparatus further includes the ink tank, the discharge section, and the circulation flow path section. In the coating process, the curable composition is contained in the ink jet apparatus. After the product is moved from the ink tank to the discharge part, the curable composition that has not been discharged from the discharge part flows through the circulation flow path part and is moved to the ink tank. Since the coating is performed while circulating the composition, it is possible to increase the accuracy of forming a fine cured product film and to improve the adhesion of the cured product film.
- FIG. 1 (a) to 1 (e) are cross-sectional views for explaining each step of a method for producing a cured product film according to an embodiment of the present invention.
- FIG. 2 is a front cross-sectional view schematically showing an electronic component including a cured product film obtained by the method for producing a cured product film according to an embodiment of the present invention.
- FIG. 3 is a schematic configuration diagram showing an example of an ink jet apparatus used in the method for producing a cured film according to an embodiment of the present invention.
- FIG. 4 is a schematic configuration diagram showing another example of an ink jet apparatus used in the method for manufacturing a cured film according to an embodiment of the present invention.
- FIG. 5: is front sectional drawing which shows typically an electronic component provided with the hardened
- the method for producing a cured film according to the present invention includes a coating step of applying a liquid curable composition having photocurability and thermosetting using an inkjet apparatus. Moreover, the manufacturing method of the hardened
- the inkjet device is connected to the ink tank in which the curable composition is stored, the ink tank, and the curable composition is discharged.
- the discharge section has one end connected to the discharge section, the other end connected to the ink tank section, and a circulation flow path section through which the curable composition flows.
- the curable composition in the coating step, was not ejected from the ejection unit after being moved from the ink tank to the ejection unit in the inkjet apparatus.
- the curable composition is applied while circulating the curable composition by flowing through the circulation channel and moving to the ink tank.
- the curing is further performed in the inkjet device using the specific inkjet device.
- the curable composition is moved from the ink tank to the discharge portion, the curable composition that has not been discharged from the discharge portion is caused to flow through the circulation flow path portion and be moved to the ink tank. Since it applies, circulating a curable composition, the formation precision of a fine cured material film can be improved and the adhesiveness of a cured material film can be improved. In order to obtain the effects of the present invention, it is significant to apply the curable composition while circulating it.
- membrane which concerns on this invention, Preferably, on the said preliminary-hardened
- a thick cured product film can be formed with high accuracy.
- a cured film having a good predetermined shape can be formed without performing many steps such as an exposure step and a development step in photolithography. For this reason, the amount of waste can be reduced, the environmental load can be reduced, and the material cost for forming the electronic component can also be reduced.
- the electronic component body include semiconductor chips, semiconductor wafers after dicing (divided semiconductor wafers), capacitors, diodes, printed boards, flexible printed boards, glass epoxy boards, and glass boards.
- the electronic component body may have a cured product film on the surface.
- a cured product film may be formed on the cured product film.
- the curable composition 12 which has photocurability and thermosetting, and is liquid is apply
- the curable composition 12 is applied to the entire surface of the electronic component body 2.
- the droplets of the curable composition 12 are mixed with each other, and the state shown in FIG.
- the curable composition that has not been discharged from the discharge unit 22 is removed from the circulation flow path unit. 23 is moved to the ink tank 21. Thereby, in the application step, the curable composition is applied while being circulated.
- the reaction is allowed to proceed to increase the viscosity. It is also included.
- the light irradiation apparatus is not particularly limited, and examples thereof include a light emitting diode (UV-LED) that generates ultraviolet rays, a metal halide lamp, a high pressure mercury lamp, and an ultrahigh pressure mercury lamp. From the viewpoint of further improving the accuracy of forming the cured film, it is particularly preferable to use a UV-LED for the first light irradiation section.
- UV-LED light emitting diode
- the precured material film 12Y was heated and irradiated with light by the second light irradiation unit 14.
- the precured material film 12Y is cured to form the cured material film 3 (heating process). If the second light irradiation step is not performed after the multilayering step, the multilayer preliminary-cured material film 12X is heated after the multilayering step to cure the multilayer preliminary-cured material film 12X. Thus, a cured product film can be formed (heating step).
- the application step and the first light irradiation step are performed on the precured material film to laminate the precured material film.
- the coating step and the first light irradiation step may be performed.
- (meth) acrylate indicates acrylate or methacrylate.
- (meth) acryl refers to acryl or methacryl.
- Examples of the compound having the (meth) acryloyl group and the epoxy group include glycidyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate glycidyl ether.
- the urethane-modified (meth) acrylic epoxy compound is obtained, for example, by the following method.
- a polyol and a bifunctional or higher functional isocyanate are reacted, and the remaining isocyanate group is reacted with a (meth) acryl monomer having an acid group and glycidol.
- a (meth) acryl monomer having a hydroxyl group in a bifunctional or higher isocyanate and glycidol may be reacted without using a polyol.
- the urethane-modified (meth) acryl epoxy compound can be obtained by reacting glycidol with a (meth) acrylate monomer having an isocyanate group.
- the polyol is not particularly limited, and examples thereof include ethylene glycol, glycerin, sorbitol, trimethylolpropane, and (poly) propylene glycol.
- the total of the photocurable compound and the light and thermosetting compound in 100% by weight of the curable composition is preferably 40% by weight or more, more preferably 50% by weight or more, preferably 90% by weight or less, more preferably 85% by weight or less.
- the photo radical polymerization initiator is not particularly limited.
- the photo radical polymerization initiator is a compound for generating radicals upon light irradiation and initiating a radical polymerization reaction.
- Specific examples of the photo radical polymerization initiator include, for example, benzoin, benzoin alkyl ethers, acetophenones, aminoacetophenones, anthraquinones, thioxanthones, ketals, 2,4,5-triarylimidazole dimer, Examples include riboflavin tetrabutyrate, thiol compounds, 2,4,6-tris-s-triazine, organic halogen compounds, benzophenones, xanthones, and 2,4,6-trimethylbenzoyldiphenylphosphine oxide.
- the said radical photopolymerization initiator only 1 type may be used and 2 or more types may be used together.
- a titanocene compound such as CGI-784 (manufactured by Ciba Specialty Chemicals) having absorption in the visible light region may be used to promote the photoreaction.
- epoxy compound addition polyamine reaction product of epoxy compound and polyamine
- Michael addition polyamine reaction product of ⁇ , ⁇ unsaturated ketone and polyamine
- Mannich addition polyamine condensate of polyamine, formalin and phenol
- thiourea addition Adducts such as polyamine (reaction product of thiourea and polyamine) and ketone-capped polyamine (reaction product of ketone compound and polyamine [ketimine]) may also be used.
- guanidine derivatives include dicyandiamide, 1-o-tolyldiguanide, ⁇ -2,5-dimethylguanide, ⁇ , ⁇ -diphenyldiguanide, ⁇ , ⁇ -bisguanylguanidinodiphenyl ether, p-chlorophenyldiguanide, Examples include ⁇ , ⁇ -hexamethylenebis [ ⁇ - (p-chlorophenol)] diguanide, phenyldiguanide oxalate, acetylguanidine, and diethylcyanoacetylguanidine.
- Examples of the acid anhydride include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, dodecyl succinic anhydride, chlorendic acid, pyromellitic anhydride, Examples include benzophenone tetracarboxylic acid anhydride, methylcyclohexene tetracarboxylic acid anhydride, trimellitic anhydride, and polyazeline acid anhydride.
- the curable composition may contain other components. Although it does not specifically limit as another component, Adhesion adjuvants, such as a coupling agent, a pigment, dye, a leveling agent, an antifoamer, a polymerization inhibitor, etc. are mentioned.
- curable composition A 60 parts by weight of trimethylolpropane triacrylate (TMPTA, manufactured by Daicel Ornex Co., Ltd.) as a photocurable compound, and acrylic acid adduct of bisphenol A type epoxy resin (UVACURE 1561, manufactured by Daicel Ornex Co., Ltd.) as a light and thermosetting compound 10 Parts by weight, 30 parts by weight of a bisphenol A type epoxy compound (EXA850CRP, manufactured by DIC) as a thermosetting compound, 30 parts by weight of a terpene acid anhydride compound (YH309, manufactured by Mitsubishi Chemical Corporation), and DBU as a curing accelerator -1 part by weight of octylate (UCAT SA102, manufactured by San Apro) and 5 parts by weight of 2-benzyl-2-dimethylamino-4-morpholinobutyrophenone (IRUGACURE 369, manufactured by BASF
- Example 1 Film formation A FR-4 substrate (Panasonic “R-1705” (plate thickness 0.8 mm)) and a catalyst (Rohm and Haas “Catalyst 44”) and a copper plating solution (Rohm and Haas) Manufactured by “Cuposit 253”) and a copper plating layer as a copper wiring was partially formed to obtain a substrate (copper-clad laminate).
- the cured product is subjected to the steps shown in FIGS. 1A to 1E (however, the conditions are set as shown in Table 3 below).
- a film was formed. While circulating the curable composition A, the coating step for coating and the first light irradiation step are performed once, the heating step is performed to form a cured film, and a printed wiring as an electronic component I got a plate. In the coating step, coating was performed while circulating the curable composition.
- the coating pattern was a flat film of 5 cm ⁇ 5 cm, and 20 films were formed.
- Example 2 to 10 and Comparative Examples 1 to 4 Film formation and fine pattern formation were performed in the same manner as in Example 1 except that the type of the curable composition and the production conditions were changed as shown in Table 3 below.
- Line width is 80 ⁇ 5 ⁇ m ⁇ : Not equivalent to ⁇
- line width is 80 ⁇ 10 ⁇ m ⁇ : Not equivalent to ⁇ and ⁇
- line width is 80 ⁇ 20 ⁇ m ⁇ : Does not correspond to OO, ⁇ and ⁇
- the line width is 80 ⁇ 30 ⁇ m
- XX The interval between the lines is lost, or the line width exceeds 80 ⁇ 30 ⁇ m
- thermosetting compound A 30 parts by weight of trimethylolpropane triacrylate (TMPTA, manufactured by Daicel Ornex) as a photocurable compound, 30 parts by weight of tricyclodecane dimethanol diacrylate (IRR-214K, manufactured by Daicel Ornex) as a photocurable compound, 10 parts by weight of an acrylic acid adduct of bisphenol A type epoxy compound (UVACURE 1561, manufactured by Daicel Ornex) as a light and thermosetting compound, and 30 parts by weight of bisphenol A type epoxy compound (EXA850CRP, manufactured by DIC) as a thermosetting compound 7.5 parts by weight of thermosetting agent A (synthesized in Synthesis Example 1) as a thermosetting agent, 1 part by weight of DBU-octylate (UCAT SA102, manufactured by San Apro) as a curing accelerator, and 2 parts as a photopolymerization initiator -Benzyl-2-dimethylamino-4 A curable composition A was
- Example 11 Film formation A FR-4 substrate (Panasonic “R-1705” (plate thickness 0.8 mm)) and a catalyst (Rohm and Haas “Catalyst 44”) and a copper plating solution (Rohm and Haas) Manufactured by “Cuposit 253”) and a copper plating layer as a copper wiring was partially formed to obtain a substrate (copper-clad laminate).
- the cured product is subjected to the steps shown in FIGS. 1A to 1E (however, the conditions are set as shown in Table 6 below).
- a film was formed. While the curable composition A is circulated, the coating step for coating and the first light irradiation step are repeated 10 times, and then the heating step is performed to form a cured product film, which is an electronic component.
- a printed wiring board was obtained. In the coating step, coating was performed while circulating the curable composition. The coating pattern was a flat film of 5 cm ⁇ 5 cm, and 20 films were formed.
- the cured product is subjected to the steps shown in FIGS. 1A to 1E (however, the conditions are set as shown in Table 6 below).
- a film was formed. While the curable composition A is circulated, the coating step for coating and the first light irradiation step are repeated 10 times, and then the heating step is performed to form a cured product film, which is an electronic component.
- a printed wiring board was obtained. In the coating step, coating was performed while circulating the curable composition. The coating pattern was coated so that the line width was 150 ⁇ m and the distance between the lines was 300 ⁇ m.
- Example 12 to 21 and Comparative Examples 5 to 8 Film formation and fine pattern formation were performed in the same manner as in Example 11 except that the type of the curable composition and the production conditions were changed as shown in Table 6 below.
- Line width is 150 ⁇ 30 ⁇ m ⁇ : Not equivalent to ⁇
- line width is 150 ⁇ 50 ⁇ m ⁇ : Not equivalent to ⁇ and ⁇
- line width is 150 ⁇ 80 ⁇ m ⁇ : Does not correspond to ⁇ , ⁇ and ⁇
- the line width is 150 ⁇ 120 ⁇ m XX: There is no gap between lines
- the substrate was observed with a stereoscopic microscope ("SMZ-10" manufactured by Nikon Corporation), and peeling was confirmed.
- SZ-10 stereoscopic microscope
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Abstract
Description
(光硬化性化合物)
上記光硬化性化合物としては、(メタ)アクリロイル基を有する硬化性化合物、ビニル基を有する硬化性化合物及びマレイミド基を有する硬化性化合物等が挙げられる。微細な硬化物膜及び厚みが厚い硬化物膜の形成精度をより一層高める観点からは、上記光硬化性化合物は、(メタ)アクリロイル基(1個以上)を有することが好ましい。上記光硬化性化合物は、1種のみが用いられてもよく、2種以上が併用されてもよい。
上記光及び熱硬化性化合物としては、各種の光硬化性官能基と各種の熱硬化性官能基とを有する化合物が挙げられる。微細な硬化物膜及び厚みが厚い硬化物膜の形成精度をより一層高める観点からは、上記光及び熱硬化性化合物は、(メタ)アクリロイル基と環状エーテル基とを有することが好ましく、(メタ)アクリロイル基とエポキシ基とを有することが好ましい。上記光及び熱硬化性化合物は、1種のみが用いられてもよく、2種以上が併用されてもよい。
上記熱硬化性化合物としては、環状エーテル基を有する熱硬化性化合物、及びチイラン基を有する熱硬化性化合物等が挙げられる。微細な硬化物膜及び厚みが厚い硬化物膜の形成精度をより一層高める観点からは、上記熱硬化性化合物は、環状エーテル基を有する熱硬化性化合物であることが好ましく、エポキシ基を有する熱硬化性化合物(エポキシ化合物)であることがより好ましい。上記熱硬化性化合物は、1種のみが用いられてもよく、2種以上が併用されてもよい。
上記光重合開始剤としては、光ラジカル重合開始剤及び光カチオン重合開始剤等が挙げられる。上記光重合開始剤は、光ラジカル重合開始剤であることが好ましい。上記光重合開始剤は、1種のみが用いられてもよく、2種以上が併用されてもよい。
上記熱硬化剤としては、有機酸、アミン化合物、アミド化合物、ヒドラジド化合物、イミダゾール化合物、イミダゾリン化合物、フェノール化合物、ユリア化合物、ポリスルフィッド化合物及び酸無水物等が挙げられる。上記熱硬化剤として、アミン-エポキシアダクトなどの変性ポリアミン化合物を用いてもよい。これら以外の熱硬化剤を用いてもよい。上記熱硬化剤は、1種のみが用いられてもよく、2種以上が併用されてもよい。
上記硬化促進剤としては、第三級アミン、イミダゾール、第四級アンモニウム塩、第四級ホスホニウム塩、有機金属塩、リン化合物及び尿素系化合物等が挙げられる。
上記硬化性組成物は、他の成分を含んでいてもよい。他の成分としては特に限定されないが、カップリング剤等の接着助剤、顔料、染料、レベリング剤、消泡剤、及び重合禁止剤等が挙げられる。
(硬化性組成物Aの調製)
光硬化性化合物としてトリメチロールプロパントリアクリレート(TMPTA、ダイセル・オルネクス社製)60重量部、光及び熱硬化性化合物としてビスフェノールA型エポキシ樹脂のアクリル酸付加物(UVACURE1561、ダイセル・オルネクス社製)10重量部、熱硬化性化合物としてビスフェノールA型エポキシ化合物(EXA850CRP、DIC社製)30重量部、熱硬化剤としてテルペン系酸無水化合物(YH309、三菱化学社製)30重量部、硬化促進剤としてDBU-オクチル酸塩(UCAT SA102、サンアプロ社製)1重量部、及び光重合開始剤として2-ベンジル-2-ジメチルアミノ-4-モルホリノブチロフェノン(IRUGACURE369、BASF社製)5重量部を均一に混合し、硬化性組成物Aを得た。
下記の表1に示す成分を下記の表2に示す配合量で配合したこと以外は上記硬化性組成物Aの調製と同様にして調製した。得られた硬化性組成物B~Gの粘度も、硬化性組成物Aの粘度と同様にして、後述の膜形成、及び微細パターン形成時の循環温度(吐出時の温度)で測定した。
(1)膜形成
FR-4基板(パナソニック社製「R-1705」(板厚0.8mm))にキャタリスト(ロームアンドハース社製「キャタリスト44」)及び銅めっき液(ロームアンドハース社製「キューポジット253」)を配置し、銅配線である銅めっき層を部分的に形成して、基板(銅張積層板)を得た。
FR-4基板(パナソニック社製「R-1705」(板厚0.8mm))にキャタリスト(ロームアンドハース社製「キャタリスト44」)及び銅めっき液(ロームアンドハース社製「キューポジット253」)を配置し、銅配線である銅めっき層を部分的に形成して、基板(銅張積層板)を得た。
硬化性組成物の種類、及び製造条件を下記の表3に示すように変更した以外は実施例1と同様にして、膜形成及び微細パターン形成を実施した。
(1)膜形成を行った基板の評価(塗出抜けの確認)
実体顕微鏡(ニコン社製「SMZ-10」)にて膜の確認を行い、液の抜けの確認を行った。
○:抜けのあるパターンが0/20
△:抜けのあるパターンが1/20以上、4/20以下
×:抜けのあるパターンが5/20以上
光学顕微鏡(デジタルマイクロスコープVH―Z100、キーエンス社製)を用いてライン、ライン間の間隔を30点(塗布時に抜けのある部分は除く)測定した。
○○:ライン幅が80±5μm
○:○○に相当せず、ライン幅が80±10μm
△:○○及び○に相当せず、ライン幅が80±20μm
×:○○、○及び△に相当せず、ライン幅が80±30μm
××:ラインとラインの間隔がなくなっている、又はライン幅が80±30μmを超える
膜形成を行った基板について、液槽式熱衝撃試験機(ESPEC社製「TSB-51」)を用いて、-50℃で5分間保持した後、125℃まで昇温し、125℃で5分間保持した後-50℃まで降温する過程を1サイクルとする冷熱サイクル試験を実施した。500サイクル後に基板を取り出した。
○:剥離していない
△:わずかに剥離している(使用上問題がない)
×:大きく剥離している(使用上問題があり)
(合成例1)
攪拌器、温度計、滴下ロートを備えた3つ口セパラブルフラスコに、メチルセロソルブ50g、ジシアンジアミド15g、及び2,4-ジアミノ-6-[2’-ウンデシルイミダゾリル-(1’)]-エチル-s-トリアジン1gを加え、100℃に加熱してジシアンジアミドを溶解させた。溶解後、ブチルグリシジルエーテル130gを滴下ロートから20分かけて滴下し、1時間反応させた。その後60℃に温度を下げ、減圧にして溶媒を除去し、薄黄色の反応粘稠物(熱硬化剤A)を得た。
光硬化性化合物としてトリメチロールプロパントリアクリレート(TMPTA、ダイセル・オルネクス社製)30重量部、光硬化性化合物としてトリシクロデカンジメタノールジアクリレート(IRR-214K、ダイセル・オルネクス社製)30重量部、光及び熱硬化性化合物としてビスフェノールA型エポキシ化合物のアクリル酸付加物(UVACURE1561、ダイセル・オルネクス社製)10重量部、熱硬化性化合物としてビスフェノールA型エポキシ化合物(EXA850CRP、DIC社製)30重量部、熱硬化剤として熱硬化剤A(合成例1で合成)7.5重量部、硬化促進剤としてDBU-オクチル酸塩(UCAT SA102、サンアプロ社製)1重量部、及び光重合開始剤として2-ベンジル-2-ジメチルアミノ-4-モルホリノブチロフェノン(IRUGACURE369、BASF社製)5重量部を均一に混合し、硬化性組成物Aを得た。
下記の表4に示す成分を下記の表5に示す配合量で配合したこと以外は上記硬化性組成物Aの調製と同様にして調製した。得られた硬化性組成物B~Hの粘度も、硬化性組成物Aの粘度と同様にして測定した。
(1)膜形成
FR-4基板(パナソニック社製「R-1705」(板厚0.8mm))にキャタリスト(ロームアンドハース社製「キャタリスト44」)及び銅めっき液(ロームアンドハース社製「キューポジット253」)を配置し、銅配線である銅めっき層を部分的に形成して、基板(銅張積層板)を得た。
FR-4基板(パナソニック電工社製「R-1705」(板厚0.8mm))にキャタリスト(ロームアンドハース社製「キャタリスト44」)及び銅めっき液(ロームアンドハース社製「キューポジット253」)を配置し、銅配線である銅めっき層を部分的に形成して、基板(銅張積層板)を得た。
硬化性組成物の種類、及び製造条件を下記の表6に示すように変更した以外は実施例11と同様にして、膜形成及び微細パターン形成を実施した。
(1)膜形成を行った基板の評価(塗出抜けの確認)
実体顕微鏡(ニコン社製「SMZ-10」)にて膜の確認を行い、液の抜けの確認を行った。
○:抜けのあるパターンが0/20
△:抜けのあるパターンが1/20以上、4/20以下
×:抜けのあるパターンが5/20以上
光学顕微鏡(デジタルマイクロスコープVH―Z100、キーエンス社製)を用いてライン、ライン間の間隔を30点(塗布時に抜けのある部分は除く)測定した。
○○:ライン幅が150±30μm
○:○○に相当せず、ライン幅が150±50μm
△:○○及び○に相当せず、ライン幅が150±80μm
×:○○、○及び△に相当せず、ライン幅が150±120μm
××:ラインとラインの間隔とがなくなっている
膜形成を行った基板について、液槽式熱衝撃試験機(ESPEC社製「TSB-51」)を用いて、-50℃で5分間保持した後、125℃まで昇温し、125℃で5分間保持した後-50℃まで降温する過程を1サイクルとする冷熱サイクル試験を実施した。500サイクル後に基板を取り出した。
○:剥離していない
△:わずかに剥離している(使用上問題がない)
×:大きく剥離している(使用上問題があり)
2…電子部品本体
3…多層の硬化物膜(加熱後)
3A,3B,3C…硬化物膜(加熱後)
11,11X…インクジェット装置
12…硬化性組成物
12A,12B,12C…第1の光照射部により光が照射された予備硬化物膜
12X…多層の予備硬化物膜
12Y…第2の光照射部により光が照射された多層の予備硬化物膜
13…第1の光照射部
14…第2の光照射部
21…インクタンク
22…吐出部
23,23X…循環流路部
23A…バッファタンク
23B…ポンプ
31…電子部品
32…硬化物膜
Claims (16)
- インクジェット装置を用いて、光硬化性及び熱硬化性を有しかつ液状である硬化性組成物を塗布する塗布工程と、
前記塗布工程後に、第1の光照射部から前記硬化性組成物に光を照射して、前記硬化性組成物の硬化を進行させて、予備硬化物膜を形成する第1の光照射工程と、
前記第1の光照射工程後に、光が照射された前記予備硬化物膜を加熱して、光が照射された前記予備硬化物膜を硬化させて、硬化物膜を形成する加熱工程とを備え、
前記インクジェット装置が、前記硬化性組成物が貯留されるインクタンクと、前記インクタンクと接続されておりかつ前記硬化性組成物が吐出される吐出部と、一端が前記吐出部に接続されており、他端が前記インクタンク部に接続されており、かつ内部を前記硬化性組成物が流れる循環流路部とを有し、
前記塗布工程において、前記インクジェット装置内で、前記硬化性組成物を前記インクタンクから前記吐出部に移動させた後に、前記吐出部から吐出されなかった前記硬化性組成物を、前記循環流路部内を流して前記インクタンクに移動させることにより、前記硬化性組成物を循環させながら、塗布する、硬化物膜の製造方法。 - 前記第1の光照射工程後かつ前記加熱工程前に、前記第1の光照射部とは別の第2の光照射部から、前記第1の光照射部から光が照射された前記予備硬化物膜に光を照射して、前記予備硬化物膜の硬化をさらに進行させる第2の光照射工程をさらに備える、請求項1に記載の硬化物膜の製造方法。
- 前記第1の光照射工程後かつ前記加熱工程前に、前記第1の光照射工程後の前記予備硬化物膜上にて、前記塗布工程と前記第1の光照射工程とを行い、前記予備硬化物膜上に他の予備硬化物膜を形成することにより、多層の予備硬化物膜を形成する多層化工程をさらに備える、請求項1に記載の硬化物膜の製造方法。
- 前記多層化工程後かつ前記加熱工程前に、前記第1の光照射部とは別の第2の光照射部から、前記多層の予備硬化物膜に光を照射して、前記多層の予備硬化物膜の硬化をさらに進行させる第2の光照射工程をさらに備える、請求項3に記載の硬化物膜の製造方法。
- 前記循環流路部が、前記循環流路部内に、前記硬化性組成物が仮貯留されるバッファタンクを含む、請求項1~4のいずれか1項に記載の硬化物膜の製造方法。
- 前記第1の光照射工程後の前記予備硬化物膜上又は前記予備硬化物膜間にて、前記塗布工程と、前記第1の光照射工程とを行う、請求項1~5のいずれか1項に記載の硬化物膜の製造方法。
- 循環されている前記硬化性組成物の温度が40℃以上、100℃以下である、請求項1~6のいずれか1項に記載の硬化物膜の製造方法。
- 前記インクジェット装置がピエゾ方式のインクジェットヘッドを用いるインクジェット装置であり、
前記塗布工程において、ピエゾ素子の作用によって、前記硬化性組成物を塗布する、請求項1~7のいずれか1項に記載の硬化物膜の製造方法。 - 前記硬化性組成物の吐出時の粘度が3mPa・s以上、1500mPa・s以下である、請求項1~8のいずれか1項に記載の硬化物膜の製造方法。
- 前記硬化性組成物が、光硬化性化合物と、熱硬化性化合物と、光重合開始剤と、熱硬化剤とを含む、請求項1~9のいずれか1項に記載の硬化物膜の製造方法。
- 前記硬化性組成物が、前記光硬化性化合物と、光及び熱硬化性化合物と、前記熱硬化性化合物と、前記光重合開始剤と、前記熱硬化剤とを含む、請求項10に記載の硬化物膜の製造方法。
- 前記光硬化性化合物が、(メタ)アクリロイル基を有し、
前記光及び熱硬化性化合物が、(メタ)アクリロイル基と環状エーテル基とを有し、
前記熱硬化性化合物が、環状エーテル基を有する、請求項11に記載の硬化物膜の製造方法。 - 前記硬化性組成物が、前記光硬化性化合物として、(メタ)アクリロイル基を1個有する単官能化合物と、(メタ)アクリロイル基を2個以上有する多官能化合物とを含む、請求項10~12のいずれか1項に記載の硬化物膜の製造方法。
- 前記硬化性組成物が、光及び熱硬化性化合物を含み、
前記硬化性組成物100重量%中、前記光硬化性化合物と前記光及び熱硬化性化合物との合計の含有量が40重量%以上、90重量%以下である、請求項10~13のいずれか1項に記載の硬化物膜の製造方法。 - 電子部品本体上に、請求項1~14のいずれか1項に記載の硬化物膜の製造方法によって硬化物膜を形成する工程を備え、
電子部品本体と、前記電子部品本体上に前記硬化物膜とを備える電子部品を得る、電子部品の製造方法。 - 電子部品本体と、
前記電子部品本体上に、請求項1~14のいずれか1項に記載の硬化物膜の製造方法により得られる硬化物膜とを備える、電子部品。
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