WO2015060568A1 - 광촉매재의 제조 방법 및 그에 의한 광촉매재 - Google Patents
광촉매재의 제조 방법 및 그에 의한 광촉매재 Download PDFInfo
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- WO2015060568A1 WO2015060568A1 PCT/KR2014/009542 KR2014009542W WO2015060568A1 WO 2015060568 A1 WO2015060568 A1 WO 2015060568A1 KR 2014009542 W KR2014009542 W KR 2014009542W WO 2015060568 A1 WO2015060568 A1 WO 2015060568A1
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- WIPO (PCT)
- Prior art keywords
- photocatalyst
- metal
- metal oxide
- oxide film
- porous
- Prior art date
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- 239000011941 photocatalyst Substances 0.000 title claims abstract description 70
- 238000000034 method Methods 0.000 title claims abstract description 20
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 91
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 91
- 229910052751 metal Inorganic materials 0.000 claims abstract description 56
- 239000002184 metal Substances 0.000 claims abstract description 56
- 239000002245 particle Substances 0.000 claims abstract description 24
- 150000002500 ions Chemical class 0.000 claims abstract description 22
- 239000011148 porous material Substances 0.000 claims abstract description 21
- 239000002243 precursor Substances 0.000 claims abstract description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 230000001678 irradiating effect Effects 0.000 claims abstract description 7
- 238000003980 solgel method Methods 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims description 22
- 239000002923 metal particle Substances 0.000 claims description 20
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 17
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052684 Cerium Inorganic materials 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 230000000844 anti-bacterial effect Effects 0.000 claims description 4
- 229910052788 barium Inorganic materials 0.000 claims description 4
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052793 cadmium Inorganic materials 0.000 claims description 4
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052791 calcium Inorganic materials 0.000 claims description 4
- 239000011575 calcium Substances 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052705 radium Inorganic materials 0.000 claims description 4
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052712 strontium Inorganic materials 0.000 claims description 4
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 238000004332 deodorization Methods 0.000 claims description 3
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 3
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 3
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 3
- 239000011787 zinc oxide Substances 0.000 claims description 3
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 2
- 230000009467 reduction Effects 0.000 abstract description 2
- 238000007598 dipping method Methods 0.000 abstract 2
- 239000000243 solution Substances 0.000 description 19
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 18
- 229910010413 TiO 2 Inorganic materials 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000001878 scanning electron micrograph Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000005388 borosilicate glass Substances 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 230000001699 photocatalysis Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012702 metal oxide precursor Substances 0.000 description 3
- -1 superoxide anions Chemical class 0.000 description 3
- HORQAOAYAYGIBM-UHFFFAOYSA-N 2,4-dinitrophenylhydrazine Chemical compound NNC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O HORQAOAYAYGIBM-UHFFFAOYSA-N 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- 239000012691 Cu precursor Substances 0.000 description 1
- 229910003771 Gold(I) chloride Inorganic materials 0.000 description 1
- 229910002621 H2PtCl6 Inorganic materials 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001877 deodorizing effect Effects 0.000 description 1
- 239000003256 environmental substance Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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- B01J37/0215—Coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/03—Precipitation; Co-precipitation
- B01J37/031—Precipitation
- B01J37/033—Using Hydrolysis
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/50—Solid solutions
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/50—Solid solutions
- C01P2002/52—Solid solutions containing elements as dopants
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
Definitions
- Representative photocatalyst material TiO 2 has the advantages of excellent durability and wear resistance, a safe and nontoxic material, and low price. On the other hand, because the bandgap energy is large, it can absorb only light below ultraviolet rays, and thus there is a limit in applying it to a room, not an exterior material.
- forming a porous first metal oxide film formed of a first metal oxide by a sol-gel method Heat treating the porous first metal oxide film to crystallize the first metal oxide; Immersing the porous first metal oxide film in a precursor solution of a second metal and then irradiating with light to allow ions of the second metal to penetrate into internal pores of the porous first metal oxide film; And immersing the porous first metal oxide film containing ions of the second metal in an internal void in an alcohol solution and then irradiating with light to reduce the ions of the second metal into the internal voids of the porous first metal oxide film. It provides a method for producing a photocatalyst comprising a; forming the particles of the second metal.
- An average diameter of the second metal particles formed in the internal pores of the porous first metal oxide film may be about 1 nm to about 10 nm, respectively.
- the first metal oxide included in the first metal oxide film may include at least one selected from titanium oxide, tungsten oxide, zinc oxide, niobium oxide, and a combination thereof.
- the second metal is selected from tungsten, chromium, vanadium, molybdenum, copper, iron, cobalt, manganese, nickel, platinum, gold, cerium, cadmium, zinc, magnesium, calcium, strontium, barium, radium and combinations thereof. It may comprise at least one metal selected.
- the photocatalyst may include the second metal particles to the porous first metal oxide film in a weight ratio of about 0.1: 99.9 to about 1:99.
- the photocatalyst may have photoactivity to visible light in a wavelength range of about 380 nm to about 780 nm.
- the porous first metal oxide layer may be formed to have a thickness of about 30 nm to about 100 nm.
- the light irradiation may be UV irradiation.
- the photocatalyst is prepared by the method of manufacturing a porous, first metal oxide film; And particles of the second metal formed in the internal pores of the porous first metal oxide film.
- the photocatalyst may be applied to air cleaning, deodorization or antibacterial applications.
- the photocatalyst responds to visible light and has excellent photocatalytic efficiency.
- FIG. 1 is an SEM image of the photocatalyst prepared in Example 1.
- FIG. 2 is an SEM image of the photocatalyst prepared in Comparative Example 1.
- the porous first metal oxide film containing the ions of the second metal in the internal voids is immersed in an alcohol solution and then irradiated with light to reduce the ions of the second metal so that the internal voids in the porous first metal oxide film are reduced. Forming particles of the second metal;
- It provides a method for producing a photocatalyst comprising a.
- the photocatalyst produced by the method for producing a photocatalyst includes a porous first metal oxide film; And particles of the second metal formed in the internal pores of the porous first metal oxide film.
- the first metal oxide forming the porous first metal oxide film a material known as a metal oxide that can be used as a photocatalyst can be used without limitation.
- the second metal particles may be used without limitation a metal having photoactivity to visible light, specifically, the second metal may be, for example, transition metal, precious metal, and the like.
- the photocatalyst formed by the method of manufacturing the photocatalyst such that the second metal particles are doped to the first metal oxide may have photoactivity to visible light.
- the photocatalyst since the photocatalyst includes the second metal particles having photoactivity to visible light, the photocatalyst may be active not only to ultraviolet light but also to visible light, and may absorb light over the entire visible light region.
- the photocatalyst may have photoactivity to visible light in the wavelength range of 380 nm to 780 nm, specifically, may exhibit about 20% absorbance to visible light at about 400 nm, and may be visible at about 500 nm. It can be prepared to exhibit an absorbance of about 10% relative to.
- the photocatalyst is a substance capable of purifying air, deodorizing and antibacterial by generating superoxide anion or hydroxy radicals from electrons and holes generated from energy obtained by absorbing light.
- superoxide anions or hydroxy radicals generated from the photocatalyst can decompose harmful environmental substances such as formaldehyde.
- a separate ultraviolet light supply device may not be required.
- the second metal particles may be uniformly doped into the pores of the porous first metal oxide film.
- the photocatalytic material is not heat-treated to reduce the ions of the second metal to form particles, the photocatalyst is formed in a particle state having a smaller particle size and is evenly distributed and distributed on the surface of the pore inside the porous first metal oxide film. Can be.
- An average diameter of the second metal particles and the second metal oxide particles may be about 1 nm to about 10 nm, specifically, about 1 nm to about 5 nm.
- the second metal particles and the second metal oxide particles may be formed in a nano size having a uniform particle size distribution according to the method of manufacturing the photocatalyst.
- the photocatalyst may include the second metal particles and the second metal oxide particles evenly in the entire range of the first metal oxide film in the above range to further improve the activity efficiency for visible light.
- the photocatalyst may be uniformly dispersed and distributed in the pores inside the entire porous first metal oxide film.
- the photocatalyst may be further dispersed and distributed in the second metal particle and the second metal oxide particle in the entire porous first metal oxide layer to further improve the activity efficiency of visible light of the photocatalyst. .
- the photocatalyst may include a weight ratio of the sum of the weights of the second metal particles and the second metal oxide particles to the porous first metal oxide film of about 0.1: 99.9 to about 1:99.
- the porous first metal oxide layer may have a thickness of about 30 nm to about 100 nm.
- the second metal is selected from tungsten, chromium, vanadium, molybdenum, copper, iron, cobalt, manganese, nickel, platinum, gold, cerium, cadmium, zinc, magnesium, calcium, strontium, barium, radium and combinations thereof. It may include at least one selected.
- the porous first metal oxide film may be formed on a substrate.
- the substrate may be a glass substrate.
- the porous first metal oxide film may be deposited on a substrate by a sol-gel method using a first metal oxide precursor.
- the solution containing the first metal oxide precursor may be coated in a sol form, dried to form a gel, and then subjected to a heat treatment step to form a film having crystallinity.
- a solution including the first metal oxide precursor such as metal alkoxide, alcohol, acid, etc. may be prepared and then hydrolyzed, and a sol may be obtained by dehydration or dealcohol, and then coated on a flat substrate.
- the sol-gel method may be carried out according to known process conditions, and is not limited to specific conditions.
- heat treatment may be performed to crystallize the first metal oxide to impart photoactivity.
- the heat treatment may be performed at about 500 to about 700 ° C., and may be performed at about 5 minutes to about 15 minutes.
- the heat treatment is performed in the above range so that the first metal oxide of the first metal oxide film may be crystallized to have photocatalytic reactivity so that aggregation does not occur so that the surface area is not reduced.
- the porous first metal oxide film formed as described above is immersed in the precursor solution of the second metal, so that the precursor solution of the second metal is evenly penetrated into the pores of the porous first metal oxide film.
- the precursor solution of the second metal is a solution containing the ions of the second metal, so that the porous first metal oxide film is immersed in the precursor solution of the second metal so that the ions of the second metal may be formed in the porous first metal oxide film. It may penetrate into the internal pores and may be irradiated again to bind the ions of the second metal to the internal pore surface of the porous first metal oxide layer.
- the light irradiation may be performed by, for example, UV irradiation.
- Ions of the bound second metal may be reduced again in a later step to be formed on the inner pore surface of the porous first metal oxide film as second metal particles.
- the porous first metal oxide film containing the ions of the second metal in the internal pores is immersed in an alcohol solution and then irradiated with light.
- the light irradiation may be performed by, for example, UV irradiation.
- alcohol solution for example, methanol, ethanol and the like can be used.
- the second metal particles are first doped into the first metal oxide formed as a film as a precursor solution of the second metal, they can easily penetrate the entire inside of the first metal oxide film. It can be distributed evenly.
- the second metal particles formed by immersing the ions of the evenly dispersed second metal by using alcohol rather than heat treatment and then reducing them by light irradiation are also uniformly dispersed and distributed throughout the first metal oxide film.
- the size of the second metal particles to be formed can be uniformly formed in a particle size distribution in nano size.
- the precursor compound of the second metal that can be used in the precursor solution of the second metal is a substance that can be reduced to the second metal by electrons excited by light irradiation, and a salt compound dissolved in an aqueous solution can be used without limitation.
- a salt compound dissolved in an aqueous solution can be used without limitation.
- nitrates, sulfates, chlorides, bromide and the like of the second metal may be used.
- Au precursors are AuCl, AuBr, Aul, Au (OH) 2 , HAuCl 4 , KAuCl 4 , KAuBr 4 and the like, as a precursor of Pd (CH 3 COO) 2 Pd , and the like PdCl 2, PdBr 2, Pd l2, Pd (OH) 2, Pd (NO 3) 2, PdSO 4.
- the light irradiation may be performed by specifically irradiating UV.
- the doping amount of the second metal in the photocatalyst may be adjusted by adjusting process conditions such as light irradiation amount and light irradiation time during the light irradiation. For example, in order to increase the doping amount of the second metal, the light irradiation amount can be increased, and the light irradiation time can be increased.
- a porous first metal oxide film prepared by the photocatalyst manufacturing method; And particles of the second metal formed in the internal pores of the porous first metal oxide film.
- the photocatalyst can be applied to, for example, air cleaning, deodorization, and antibacterial applications.
- a 10 wt% solution of titanium tetraisopropoxide is prepared using isopropyl alcohol as a solvent. After stirring for 30 minutes, a small amount of concentrated nitric acid was added to hydrolyze. After dehydration and dealcoholization by stirring for 30 minutes, TiO 2 sol was prepared.
- TiO 2 membrane was immersed in 0.01 wt% aqueous solution of H 2 PtCl 6 for 30 minutes, and then irradiated with UV for about 30 minutes using a 20W UV lamp to dope Pt into the TiO 2 membrane. Subsequently, the Pt-doped TiO 2 film was immersed in a methanol solution for 30 minutes, and then irradiated with UV for about 30 minutes using a 20W UV lamp to prepare a photocatalyst.
- a 10 wt% solution of titanium tetraisopropoxide is prepared using isopropyl alcohol as a solvent. After stirring for 30 minutes, a small amount of concentrated nitric acid was added to hydrolyze. After dehydration and dealcoholization by stirring for 30 minutes, TiO 2 sol was prepared.
- grains was evaluated from the SEM image obtained about the photocatalyst of Example 1 and the comparative example 1, and it is shown in following Table 1.
- FIG. 1 is an SEM image of the photocatalyst prepared in Example 1
- Figure 2 is a SEM image of the photocatalyst prepared in Comparative Example 1. It can be seen that the Pt particles are smaller and uniformly formed in FIG. 1 than in FIG. 2.
- Formaldehyde removal performance of the photocatalysts of Example 1 and Comparative Example 1 was evaluated. After installing the photocatalyst prepared in Example 1 and Comparative Examples 1 and 2 in a 20L small chamber (ADTEC Co.), clean air having a formaldehyde concentration of 0.08 ppm was continuously flowed at a flow rate of 167 cc / min. Was 0.5 times / hr. A 10W white fluorescent lamp was used as the light source, and the illuminance was set to be 1000 lux. Formaldehyde removal rate was calculated by measuring the concentration before entering the chamber and after passing through the chamber is shown in Table 1 below. The concentration was analyzed by high performance liquid chromatography (HPLC, Agilent) by concentrating the amount for 10 L using a DNPH (2,4-dinitrophenylhydrazine) cartridge.
- HPLC high performance liquid chromatography
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Abstract
Description
구분 | 형성된 Pt 입자 크기 | 포름알데히드 제거율 |
실시예 1 | 1~2nm | 75% |
비교예 1 | 5~7nm | 50% |
Claims (16)
- 졸겔법에 의해 제1 금속 산화물로 형성된 다공성 제1 금속 산화물막을 성막하는 단계;상기 다공성 제1 금속 산화물막을 열처리하여 상기 제1 금속 산화물을 결정화하는 단계;상기 다공성 제1 금속 산화물막을 제2 금속의 전구체 용액에 침지시킨 후 광조사하여, 상기 다공성 제1 금속 산화물막의 내부 공극에 상기 제2 금속의 이온을 침투시키는 단계; 및상기 제2 금속의 이온을 내부 공극에 함유한 상기 다공성의 제1 금속 산화물막을 알코올 용액에 침지시킨 후 광조사하여 상기 제2 금속의 이온이 환원되어 상기 다공성의 제1 금속 산화물막의 내부 공극에 상기 제2 금속의 입자가 형성되는 단계;를 포함하는 광촉매재의 제조 방법.
- 제1항에 있어서,상기 다공성의 제1 금속 산화물막의 내부 공극에 형성된 제2 금속 입자의 평균 직경이 각각 1nm 내지 10nm인광촉매재의 제조 방법.
- 제1항에 있어서,상기 제1 금속 산화물막에 포함된 제1 금속 산화물은 산화티탄, 산화텅스텐, 산화아연, 산화니오븀 및 이들의 조합에서 선택된 적어도 하나를 포함하는광촉매재의 제조 방법.
- 제1항에 있어서,상기 제2 금속은 텅스텐, 크롬, 바나듐, 몰리브데넘, 구리, 철, 코발트, 망간, 니켈, 백금, 금, 세륨, 카드늄, 아연, 마그네슘, 칼슘, 스트로니튬, 바륨, 라듐 및 이들의 조합에서 선택된 적어도 하나의 금속을 포함하는광촉매재의 제조 방법.
- 제1항에 있어서,상기 광촉매재는 상기 제2 금속 입자 대 상기 다공성 제1 금속 산화물막이 0.1:99.9 내지 1:99의 중량비로 포함하는광촉매재의 제조 방법.
- 제1항에 있어서,상기 광촉매재는 380nm 내지 780nm 파장범위의 가시광선에 대하여 광활성을 갖는광촉매재의 제조 방법.
- 제1항에 있어서,상기 다공성의 제1 금속 산화물막은 두께 30nm 내지 100nm로 성막되는광촉매재의 제조 방법.
- 제1항에 있어서,상기 광조사는 UV 조사하는광촉매재의 제조 방법.
- 제1항 내지 제8항 중 어느 한 항에 따른 광촉매재의 제조 방법에 의해 제조되고, 다공성의 제1 금속 산화물막; 및 상기 다공성의 제1 금속 산화물막의 내부 공극에 형성된 상기 제2 금속의 입자를 포함하는 광촉매재.
- 제9항에 있어서,상기 다공성의 제1 금속 산화물막의 내부 공극에 형성된 제2 금속 입자의 평균 직경이 각각 1nm 내지 10nm인광촉매재.
- 제9항에 있어서,상기 제1 금속 산화물막에 포함된 제1 금속 산화물은 산화티탄, 산화텅스텐, 산화아연, 산화니오븀 및 이들의 조합에서 선택된 적어도 하나를 포함하는광촉매재.
- 제9항에 있어서,상기 제2 금속은 텅스텐, 크롬, 바나듐, 몰리브데넘, 구리, 철, 코발트, 망간, 니켈, 백금, 금, 세륨, 카드늄, 아연, 마그네슘, 칼슘, 스트로니튬, 바륨, 라듐 및 이들의 조합에서 선택된 적어도 하나의 금속을 포함하는광촉매재.
- 제9항에 있어서,상기 광촉매재는 상기 제2 금속 입자 대 상기 다공성 제1 금속 산화물막이 0.1:99.9 내지 1:99의 중량비로 포함하는광촉매재.
- 제9항에 있어서,상기 광촉매재는 380nm 내지 780nm 파장범위의 가시광선에 대하여 광활성을 갖는광촉매재.
- 제9항에 있어서,상기 다공성의 제1 금속 산화물막의 두께는 30nm 내지 100nm인광촉매재.
- 제9항에 있어서,공기청정, 탈취 또는 항균 용도에 적용되는광촉매재.
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KR102302940B1 (ko) * | 2019-12-04 | 2021-09-16 | 단국대학교 천안캠퍼스 산학협력단 | 첨가제를 사용하지 않는 금속 도핑 광촉매 나노입자의 제조방법 |
KR20240026334A (ko) * | 2022-08-18 | 2024-02-28 | 삼성전자주식회사 | 광촉매, 및 상기 광촉매를 포함하는 촉매 필터, 촉매 모듈, 및 공기정화 시스템 |
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- 2013-10-22 KR KR1020130126011A patent/KR101804599B1/ko active IP Right Grant
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2014
- 2014-10-10 CN CN201480057896.5A patent/CN105682801A/zh active Pending
- 2014-10-10 JP JP2016524573A patent/JP2016540628A/ja not_active Withdrawn
- 2014-10-10 EP EP14856781.1A patent/EP3061526A4/en not_active Withdrawn
- 2014-10-10 US US15/030,586 patent/US20160263559A1/en not_active Abandoned
- 2014-10-10 WO PCT/KR2014/009542 patent/WO2015060568A1/ko active Application Filing
- 2014-10-22 TW TW103136500A patent/TW201515706A/zh unknown
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Also Published As
Publication number | Publication date |
---|---|
TW201515706A (zh) | 2015-05-01 |
EP3061526A4 (en) | 2017-06-28 |
KR20150046811A (ko) | 2015-05-04 |
JP2016540628A (ja) | 2016-12-28 |
CN105682801A (zh) | 2016-06-15 |
EP3061526A1 (en) | 2016-08-31 |
US20160263559A1 (en) | 2016-09-15 |
KR101804599B1 (ko) | 2017-12-06 |
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