WO2015010430A1 - 触摸屏及其制作方法 - Google Patents

触摸屏及其制作方法 Download PDF

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Publication number
WO2015010430A1
WO2015010430A1 PCT/CN2013/089801 CN2013089801W WO2015010430A1 WO 2015010430 A1 WO2015010430 A1 WO 2015010430A1 CN 2013089801 W CN2013089801 W CN 2013089801W WO 2015010430 A1 WO2015010430 A1 WO 2015010430A1
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WIPO (PCT)
Prior art keywords
layer
blanking
electrode
blanking layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2013/089801
Other languages
English (en)
French (fr)
Inventor
杨文娟
公伟刚
鲁成祝
林嘉宏
王晓凤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US14/362,064 priority Critical patent/US9383877B2/en
Publication of WO2015010430A1 publication Critical patent/WO2015010430A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16—Constructional details or arrangements
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • Embodiments of the present invention relate to a touch screen and a method of fabricating the same. Background technique
  • touch screens have become more and more widely used in touch display technology as a new input device.
  • Capacitive touch screens have attracted much attention due to their fast response time, high reliability and durability.
  • Capacitive touch screens are classified according to the way they are integrated with the display, including at least In Cell and Add On.
  • touch screens Classified from the principle of work, touch screens include surface capacitive and projected capacitive, and projected capacitive touch screens include self-capacitive and mutual capacitive touch screens. Projected capacitive touch screens are currently widely used touch screens.
  • the projected capacitive touch screen has a structure in which: a touch area (also referred to as a pixel area) of the substrate is provided with a plurality of first electrodes and a plurality of second electrodes for realizing a touch function, and each of the first electrodes and each of the second electrodes
  • the electrodes can be placed on the same layer or on different layers.
  • the first electrode or the second electrode disposed in the same layer is disconnected at the intersection of the first electrode and the second electrode, and the disconnected portion is connected by the bridging member.
  • FIG. 1 is a schematic structural diagram of a touch screen of a first electrode and a second electrode disposed in a same layer, and includes a plurality of first electrodes 101 disposed on a substrate 100 in a first direction along a touch region, along with the first a plurality of second electrodes 102 disposed in a second direction intersecting in a direction; a region where each of the first electrodes 101 intersects with any of the second electrodes 102 is disconnected, and a disconnected portion is connected by the bridging member 103, the bridging member 103 and the second electrode 102 is insulated by an insulating layer 104.
  • the bridging member is a transparent conductive wire or metal wire.
  • the use of the metal wire as the bridging member has the characteristics of low cost, single manufacturing process, and low electrical resistivity.
  • the existing touch screen uses a metal wire as a bridging member to realize the touch screen.
  • the metal wire has a metallic luster, and the reflectance of light incident from the outside of the display panel is high, so that the naked eye can see the bridging member and affect the display effect of the touch screen, even if a metal layer having a lower reflectance is used as the bridging member, the reflectance thereof It will not be less than 30%, and the bridge member cannot be made to be visualized. Summary of the invention
  • An embodiment of the present invention provides a touch screen, including: a substrate; a plurality of first electrodes extending in a first direction above the substrate; and a first electrode extending in a second direction above the substrate and intersecting the first electrodes Arranging a plurality of second electrodes; wherein, the first electrode and the second electrode are transparent electrodes, and the first electrode is disconnected at an intersection with the second electrode to include a plurality of first sub-electrodes, the same Any two adjacent first sub-electrodes in the first electrode are electrically connected by a bridging member; the bridging member is insulated from the second electrode by an insulating layer, and the blanking member includes at least a first elimination a hidden layer and a second blanking layer, configured to reduce reflection of external light, wherein the first blanking layer and the second blanking layer have different densities, and the blanking member is disposed on the substrate and the Between the bridging members, the substrate is disposed between the blanking member and an external environment.
  • a touch screen including: a substrate; a plurality of first electrodes extending in a first direction above the substrate; and a first extending in the second direction above the substrate and the first a plurality of second electrodes in which the electrodes are alternately arranged; wherein the first electrode and the second electrode are insulated by an insulating layer at an intersection region; at least one of the first electrode and the second electrode includes a first The blanking layer and the second blanking layer are used to reduce reflections from external light.
  • the first blanking layer and the second blanking layer are in direct contact and satisfy the following formulas (1-1) and (1-2),
  • ⁇ is the refractive index of the first blanking layer, which is the thickness of the first blanking layer
  • l is any positive integer
  • n 2 is the refractive index of the second blanking layer
  • d 2 is the thickness of the second blanking layer
  • 2 is any positive integer, which is the ambient light wavelength.
  • the touch screen further includes a conductive layer located in a region corresponding to the at least one of the first electrode and the second electrode such that the first electrode and the second electrode are The at least one of the electrodes is located between the conductive layer and the substrate.
  • the projection of the bridging member on the substrate is within a projection of the blanking member on the substrate.
  • the second blanking layer is stacked on the first blanking layer, and the area of the first blanking layer is equal to the area of the second blanking layer.
  • the bridging member is made of a single metal or alloy, preferably molybdenum, aluminum, molybdenum alloy or aluminum alloy.
  • the first blanking layer and/or the second blanking layer are made of metal oxide, metal nitride, metal oxynitride, alloy oxide, alloy nitride, or alloy oxynitride. Things.
  • the material of the first blanking layer and/or the second blanking layer is an oxide, nitride, or oxynitride of at least one metal included in the bridging member.
  • the second electrode, the insulating layer, the first blanking layer, the second blanking layer, and the bridging member are sequentially disposed in the order in a direction away from the substrate. .
  • the first blanking layer, the second blanking layer, the bridging member, the insulating layer, and the second electrode are sequentially disposed in the order in a direction away from the substrate. .
  • the blanking member is insulated from the first electrode, the first blanking layer, the second blanking layer, the second electrode, the insulating layer, and the bridging member They are sequentially disposed in the stated order in a direction away from the substrate.
  • the first electrode is composed of a first blanking layer and a second blanking layer
  • the second electrode is composed of another first blanking layer and another second blanking layer
  • the one first blanking layer, one second blanking layer, the insulating layer, the other first blanking layer and another second blanking layer are sequentially disposed in a direction away from the substrate.
  • a further embodiment of the present invention provides a method of fabricating a touch screen, including the steps of: forming a plurality of first electrodes and a second electrode arranged in a cross on a substrate; the first electrode is disconnected at an area crossing the second electrode Forming a plurality of first sub-electrodes; the first electrode and the second electrode are transparent electrodes; forming a bridging layer on the substrate for connecting any two adjacent first sub-electrodes in the same first electrode; The regions corresponding to the bridge layer sequentially form a first blanking layer and a second blanking layer for reducing reflection of external light.
  • the first blanking layer and the second blanking layer are different in density, and the blanking member is disposed between the substrate and the bridging member.
  • the forming of the first blanking layer and the second blanking layer comprises: targeting a metal or an alloy in a cavity containing a mixed gas of oxygen, nitrogen or nitrogen-oxygen by magnetron sputtering Producing the first blanking layer; preparing the second blanking layer by using a metal or an alloy as a target in a cavity containing a mixed gas of oxygen, nitrogen or nitrogen and oxygen by magnetron sputtering;
  • the targets for forming the first blanking layer and the second blanking layer are the same, the types of gases entering the cavity are different when the first blanking layer and the second blanking layer are formed, or the gas types are the same However, the ventilation is different.
  • a further embodiment of the present invention provides a method of fabricating a touch screen, comprising: forming a plurality of first electrodes and a second electrode arranged in a cross arrangement on a substrate, wherein the first electrode comprises a blanking layer disposed on at least two layers And/or the second electrode comprises at least two layered blanking layers, each blanking layer provided by the stack is a film layer having different densities for reducing light density; forming a cross on the substrate at the intersection The region is used to insulate the insulating layers of the first electrode and the second electrode.
  • the forming of the first electrode includes: sequentially forming a first blanking layer and a second blanking layer as a first electrode on the substrate; forming an insulation on a substrate on which the first electrode is formed a layer; the second electrode is formed on a substrate on which the insulating layer is formed.
  • the forming of the second electrode includes sequentially forming a first blanking layer and a second blanking layer as the second electrode on the substrate.
  • the forming of the first blanking layer and the second blanking layer comprises: targeting a metal or an alloy in a cavity containing a mixed gas of oxygen, nitrogen or nitrogen-oxygen by magnetron sputtering Producing the first blanking layer; preparing the second blanking layer by using a metal or an alloy as a target in a cavity containing a mixed gas of oxygen, nitrogen or nitrogen and oxygen by magnetron sputtering;
  • FIG. 1 is a top plan view of a prior art touch screen
  • FIG. 2 is a schematic perspective view of a touch screen according to a first embodiment of the present invention
  • FIG. 3 is a light path diagram of light passing through a blanking layer in a touch screen according to a first embodiment of the present invention
  • FIG. 4 is a cross-sectional view of the touch screen shown in FIG. 2 in an A-A direction;
  • Figure 5 is a cross-sectional view of the touch screen shown in Figure 2 in the direction of AA
  • Figure 6 is a cross-sectional view of the touch screen shown in Figure 2 in the direction of A-A;
  • FIG. 7 is a schematic structural diagram of a first electrode and a second electrode in a touch screen according to an embodiment of the present disclosure
  • FIG. 8 is a schematic structural diagram of a first electrode and a second electrode in a touch screen according to an embodiment of the present disclosure
  • FIG. 9 is a third schematic structural diagram of a first electrode and a second electrode in a touch screen according to an embodiment of the present disclosure.
  • FIG. 10 is a schematic top plan view of a touch screen according to a second embodiment of the present invention.
  • FIG. 11 is a schematic cross-sectional view of a touch screen according to a third embodiment of the present invention. detailed description
  • Embodiments of the present invention provide a touch screen, a method for fabricating the same, and a display device for reducing reflection of ambient light in the non-transparent member region of the touch screen, and improving the degree of non-visualization of the non-transparent member region in the touch screen.
  • the touch screen provided by the embodiment of the invention includes a plurality of first electrodes and a plurality of second electrodes, and the first electrodes and the second electrodes may be touch driving electrodes and touch sensing electrodes, respectively, or touch sensing electrodes and touch driving electrodes.
  • touch screens provided in the embodiments of the present invention or the touch screen structures in the drawings are only for explaining the present invention and are not intended to limit the present invention, that is, the touch screen structures provided by all the drawings of the embodiments of the present invention are only a few
  • a typical touch screen structure is used to describe a non-transparent bridging member or other conductive layer member provided by an embodiment of the present invention.
  • a blanking member is disposed in a region where the bridging member or the conductive layer is located. Any touch screen incorporating this blanking member is within the scope of the present invention.
  • a first embodiment of the present invention provides a touch screen. As shown in FIG. 2, the method includes: a substrate 1; a plurality of first electrodes 11 arranged on the substrate 1 in a first direction; and a second direction on the substrate 1 a plurality of second electrodes 12 arranged (only one first electrode 11 and one second electrode 12 are shown in FIG.
  • the touch screen further includes a blanking member located in a region corresponding to the bridging member 13, which includes, for example, at least two layers of blanking layers, each of which has a different density of film layers that reduce the reflection of external light. Each blanking layer is not shown in FIG.
  • the blanking layer can be any low reflectivity film layer.
  • each film layer is located on the first substrate and includes two cases.
  • the first electrode 11 is located on the substrate 1, which can be understood as the first electrode 11 and The substrate 1 is in contact with each other, or the first electrode 11 is located above the substrate 1, and further functional film layers are included therebetween, for example, a buffer layer is further included therebetween to improve the adhesion of the first electrode 11 on the substrate 1.
  • the cross arrangement is such that the first electrode and the second electrode have a certain angle (corresponding to an acute angle in a triangle) or are perpendicular to each other.
  • each of the blanking layers is close to an incident surface of external light, and the bridging member is away from an incident surface of the external light with respect to the blanking member for the same. That is, the external light passes through the blanking layer and then passes through the bridging member to achieve the purpose of reducing the reflectance of the external light.
  • the external light is natural light incident from the outside of the display panel, that is, different from the backlight in the display panel.
  • the density of each blanking layer is different, and the different density of the film layer reflects different external light, and the optical cancellation between different reflections can further make the touch screen The reflectance of the corresponding region of the bridging member is lowered.
  • the blanking member is composed of two blanking layers, i.e., the first blanking layer 15 and the second blanking layer 16.
  • the light is an electromagnetic wave, as shown in FIG. 3 (the substrate above the first blanking layer is not shown), and when it sequentially passes through the first blanking layer 15 and the second blanking layer 16, reflection occurs on both surfaces. If the optical path difference between the two reflected lights satisfies an odd multiple of the half wavelength, the two reflected lights destructively interfere, so that the reflected light intensity is further reduced or the reflected light is not present, and the degree of the visualization of the bridge member is further improved. .
  • ni the refractive index of the first blanking layer
  • ⁇ first The thickness of the blanking layer
  • l is any positive integer
  • n 2 is the refractive index of the second blanking layer
  • d 2 is the thickness of the second blanking layer
  • 2 is any positive integer, which is the wavelength of external light.
  • the reflected rays satisfying the above formulas (1-1) and (1-2) are canceled to the greatest extent, but as long as the amplitude of the two columns of waves superimposed at the same time is not greater than the amplitude of one of the reflected waves, the reduction can be achieved.
  • the refractive index in the formula is determined, and the optical path difference AS is adjusted by controlling the thickness ⁇ of the first blanking layer 15 on the premise that the wavelength of the incident wave is constant. Let it satisfy the formula (1-1).
  • the thinner the thickness d of the first blanking layer 15 is, the better, that is, when the thickness of the first blanking layer 15 is set to satisfy AS A/2.
  • the optical path difference M 2 can be adjusted by controlling ⁇ , d 2 , n 2 to satisfy the formula (1-2).
  • the materials of the first and second blanking layers are selected from the group consisting of metal oxides, metal nitrides, metal oxynitrides, alloy oxides, alloy nitrides, alloy oxynitrides. Wait. Since the oxides, nitrides, and oxynitrides of metals or alloys are non-metallic, grayish-black, and black, the absorption of light is better, so that the light reflected to the light-emitting side of the touch screen is reduced, and the reflectance of the light is lowered. The degree to which the bridging members are not visualized.
  • an insulating layer, a first blanking layer 15 and a second blanking layer 16 and a bridging member are provided in a region where the first electrode 11 and the second electrode 12 intersect, and the insulating layer is used to avoid the second electrode and Contact of the first electrode or avoiding contact with the bridging member.
  • the area where the first blanking layer 15 and the second blanking layer 16 are located corresponds to the area where the bridging member is located, or the area of the first blanking layer 15 and the second blanking layer 16 is not less than the area of the area where the bridging member is located, and is used for lowering The reflectivity of light when it is incident on the area where the bridging member is located.
  • FIG. 4 - Figure 6 is a cross-sectional view of the touch screen shown in Figure 2 in the A-A direction.
  • the touch screen according to the first example includes: a substrate 1; a first electrode and a second electrode 12 disposed on the substrate 1 in the same layer, the first electrode and the second electrode 12 are arranged in a cross arrangement, and the first electrode is The region intersecting the second electrode 12 is broken into a plurality of first sub-electrodes 111; an insulating layer 14 on the second electrode 12; a first blanking layer 15 on the insulating layer 14 and a first blanking layer 15 a second blanking layer 16 thereon, and a bridging member 13 on the second blanking layer 16; wherein the insulating layer 14 covers only the area of the second electrode 12 corresponding to the bridging member 13, the length and width of the bridging member are guaranteed 13 is insulated from the second electrode 12; the area of the first blanking layer 15 is equal to the area of the second blanking layer 16, and is oppositely disposed; in one example, the area of the first blanking layer 15 is not less than the coverage of the bridging member 13.
  • the area, and the projection of the bridging member 13 on the substrate 1 is located within the projection of the first blanking layer 15 or the second blanking layer 16 on the substrate 1; of course, the area of the first blanking layer 15 may also be smaller than the bridging member 13 The area covered, at which point the projection of the bridging member 13 on the substrate 1 will partially exceed the projection of the first blanking layer 15 or the second blanking layer 16 on the substrate 1.
  • the blanking member is closer to the incident surface of the external light with respect to the bridging member.
  • the incident surface of the external light is located on the lower surface of the substrate 1, and the line with an arrow in Fig. 4 indicates light.
  • the incident surface of the external light is located on the lower surface of the substrate 1, and the external light incident surface is not shown in Figs. 5 and 6.
  • the structure of the touch screen according to the second example is similar to that of the touch screen of the first example described above, except that: at the intersection of the first electrode 11 and the second electrode 12, the first blanking layer 15 and the second The blanking layer 16 is located below the second electrode 12.
  • the touch screen includes: a substrate 1; a first electrode on the substrate 1, the first electrode being disconnected into a plurality of first sub-electrodes 111, and a first blanking layer 15 disposed on the first substrate 1 And a second blanking layer 16, the second blanking layer 16 is located above the first blanking layer 15; the bridging member 13 is located above the second blanking layer 16; the insulating layer 14 is located on the bridging member 13; The second electrode 12 on the insulating layer 14.
  • the arrangement positions and arrangement sizes of the first blanking layer 15, the second blanking layer 16, the bridging member 13, and the insulating layer 14 are similar to those of the first example, and will not be described herein.
  • the structure of the touch screen according to the third example is similar to the touch screen structure described in the above first example, except that the second electrode 12 is located between the bridging member 13 and the first blanking layer 15 and the second blanking layer 16.
  • the touch screen includes: a substrate 1; a first electrode on the substrate 1, a first electrode Disconnected into a plurality of first sub-electrodes 111, a first blanking layer 15 and a second blanking layer 16 are stacked on the substrate 1, and the second blanking layer 16 is located on the first blanking layer 15; A blanking layer 15 and a second blanking layer 16 are insulated from the first electrode 11; a second electrode 12 is disposed above the second blanking layer 16;
  • insulating layer 14 above the second electrode 12 ensures that the first blanking layer 15 and the second blanking layer 16 are insulated from the first electrode 11; and the bridging member 13 above the insulating layer 14, insulating Layer 14 ensures that bridging member 13 is insulated from second electrode 12.
  • the positions of the first blanking layer 15, the second blanking layer 16, the bridging member 13, and the insulating layer 14 and the arrangement size are similar to those of the first example, and will not be described herein.
  • the bridging member can be disposed above or below the second electrode as appropriate.
  • the bridging member may or may not be in contact with the first blanking layer and the second blanking layer.
  • the first to third examples provide a typical touch screen structure of the first embodiment of the present invention, and the touch screen of each example includes two layers of blanking layers, which can reduce the external light reflectance of the bridging member region and the method described in connection with FIG.
  • the principle of reducing the external light reflectance is similar, and will not be described here.
  • the blanking members in the touch screens disclosed in the first to third examples are exemplified by two layers of blanking layers that are in contact with each other, in other embodiments of the present invention, the blanking members may be configured to include two layers of blanking layers. Or, it can be set as a multi-layer metal layer, and the blanking layer is spaced apart from the metal layer or the multi-level blanking layer and the multi-layer metal layer are spaced apart to reduce the reflectivity of the external light in the bridging member region.
  • the first electrode and the second electrode are transparent electrodes, and may be, for example, indium tin oxide ITO or indium oxide IZO or the like.
  • the bridging member may be a metal or a metal alloy, for example, may be molybdenum, aluminum, a molybdenum alloy or an aluminum alloy; compared to other metals, molybdenum (Mo) or aluminum (A1) It has good stability and is not easily oxidized or corroded.
  • each of the blanking layers is an oxide of molybdenum, a nitride of molybdenum, an oxynitride of molybdenum, an oxide of aluminum, a nitride of aluminum, or aluminum.
  • the first blanking layer is MoNbO x N y , wherein Mo is molybdenum metal, Nb is bismuth metal, X and y are integers or decimals; and the second blanking layer is MoNbO x N y , but the first elimination is guaranteed
  • the density of the hidden layer and the second blanking layer are different.
  • each blanking layer can be any film layer having a different density.
  • the materials used for the first blanking layer and the second blanking layer can be the same or different, as long as the first blanking layer and the second blank are ensured.
  • the density of the hidden layer can be different.
  • each blanking layer is a metal oxide, a metal nitride or a metal oxynitride containing at least one metal in the bridging member, or an alloy oxide or an alloy nitrogen.
  • Compound or alloy oxynitride is a metal oxide, a metal nitride or a metal oxynitride containing at least one metal in the bridging member, or an alloy oxide or an alloy nitrogen.
  • the first electrode is a touch driving electrode, and the second electrode is a touch sensing electrode; or the first electrode is a touch sensing electrode, and the second electrode is a touch Drive the electrode.
  • the patterns of the first electrode and the second electrode may be formed by connecting a plurality of diamond-shaped sub-electrodes in series; or by a plurality of rectangular sub-electrodes connected in series; or second The electrodes are strip electrodes.
  • the first electrode 11 and the second electrode 12 include a diamond-shaped sub-electrode, the first electrode 11 is disconnected at the intersection with the second electrode 12, the opening is provided with the insulating layer 14 and the insulating layer The bridging member 13 on the 14th.
  • the first electrode 11 and the second electrode 12 include a rectangular sub-electrode, the first electrode 11 is disconnected at the intersection with the second electrode 12, and the insulating layer 14 is disposed at the break and is located at the insulating layer.
  • the second electrode 12 is a strip electrode
  • the first electrode 11 is broken at the intersection with the second electrode 12, and the insulating layer 14 and the bridging member 13 on the insulating layer 14 are provided at the break.
  • Each of the first electrodes 11 may be provided with one bridging member 13 or a plurality of bridging members. As long as the first electrode that is disconnected is guaranteed to be an entire strip.
  • the first electrode and the second electrode are used as transparent electrodes in the touch screen.
  • a touch screen includes: a substrate 1; a plurality of first electrodes 11 extending in a first direction on the substrate 1, and a first electrode 11 extending in a second direction a plurality of second electrodes 12; the first electrode 11 and the second electrode 12 are insulated by an insulating layer 14 at an intersection region; wherein the first electrode 11 is provided by two laminated layers and has different densities A blanking layer composition that reduces the reflection of light; and/or the second electrode 12 is composed of two blanking layers and different density densities having a light reflecting effect.
  • the reflection effect of the touch screen on external light is caused by two layers of density.
  • the presence of different blanking layers is reduced, which is advantageous for achieving the ignoring effect of the first electrode 11 and/or the second electrode 12.
  • the densities of the blanking layers are different, and the different densities of the film layer absorb different degrees of external light, and the optical cancellation between different absorption effects further causes the touch screen to be on the first electrode 11 and/or the second electrode.
  • the reflectance of the corresponding region of 12 is lowered.
  • the touch screen provided by the third embodiment is similar to the touch screen structure of the second embodiment shown in FIG. 10 , except that the touch screen shown in FIG. 11 further includes: the first electrode 11 and/or the first electrode a conductive layer 18 and/or 17 corresponding to a region of the second electrode 12, the conductive layer 18 and/or 17 being a metal layer or an alloy layer, or a film layer composed of a laminate of a metal layer and an alloy layer, each blanking The layer is adjacent to the incident surface of the ambient light, and the conductive layers 18 and/or 17 are remote from the incident surface of the ambient light relative to the respective blanking layer.
  • the first electrode 11 and the second electrode 12 are respectively composed of a first blanking layer 15 and a second blanking layer 16 , and the first electrode 11 is provided with a first conductive layer 18 and a second electrode. 12 is provided with a second conductive layer 17;
  • the first blanking layer 15 of the first electrode 11 is located above the substrate 1; the second blanking layer 16 of the first electrode 11 is located above the first blanking layer 15 of the first electrode 11; Above the second blanking layer 16 of an electrode 11;
  • the insulating layer 14 is located above the first conductive layer 18;
  • the first blanking layer 15 constituting the second electrode 12 is located above the insulating layer 14; the second blanking layer 16 of the second electrode 12 is located above the first blanking layer 15 of the second electrode 12; the second conductive layer 17 Located above the second blanking layer 16 of the second electrode 12.
  • the incident surface of the external light is located on the lower surface of the substrate, and the arrowed line in Fig. 11 indicates the incident surface of the light.
  • each blanking layer is a metal oxide, a metal nitride, a metal oxynitride or an alloy oxide, an alloy nitride, an alloy oxynitride or the like.
  • each blanking layer is an oxide of molybdenum, a nitride of molybdenum, an oxynitride of molybdenum, and an oxidation of aluminum.
  • Materials aluminum nitrides, aluminum oxynitrides, molybdenum alloy oxides, molybdenum alloy nitrides, molybdenum alloy oxynitrides, aluminum alloy oxides, aluminum alloy nitrides, aluminum alloy oxynitrides, and the like.
  • the conductive layer may be a metal layer, for example, a molybdenum or aluminum metal layer, etc., and the conductive layer may also be an alloy layer, for example, a molybdenum alloy or an aluminum alloy layer.
  • the area of the first blanking layer constituting the first electrode is equal to the area of the second blanking layer and the two are oppositely disposed; the area of the first blanking layer constituting the second electrode is equal to the area of the second blanking layer and Relative setting
  • the projection of the first conductive layer on the substrate is within the projection of the first blanking layer or the second blanking layer on the substrate, or the projection of the first conductive layer on the substrate and the first blanking layer or The projection of the second blanking layer on the substrate overlaps.
  • the projection of the second conductive layer on the substrate is within the projection of the first blanking layer or the second blanking layer on the substrate, or the projection of the second conductive layer on the substrate and the first blanking layer or The projection of the second blanking layer on the substrate overlaps.
  • each of the first electrodes and each of the second electrodes is completed by two patterning processes, such as forming respective first electrodes on the substrate, then providing an insulating layer in a region where the first electrode and the second electrode intersect, and finally on the substrate.
  • Each of the second electrodes is fabricated, and a region of the second electrode opposite to the first electrode is insulated by an insulating layer.
  • each blanking layer is similar to those of the blanking layer in the touch screen provided by the first embodiment, and details are not described herein.
  • the arrangement patterns of the first electrode and the second electrode provided by the second and third embodiments may also be similar to the arrangement shown in any of FIGS. 7 to 9, and the patterns of the first electrode and the second electrode may be a plurality of diamond-shaped sub-electrodes are connected in series; or a plurality of rectangular sub-electrodes are connected in series; or respectively, strip electrodes.
  • the first electrode 11 provided by the second and third embodiments is not disconnected at the intersection with the second electrode 12, and only the insulating layer is included between the first electrode and the second electrode, and there is no bridging member.
  • a method for fabricating a touch screen having a bridging member, at least for the touch screen structure of the first embodiment mainly includes the following steps:
  • the first electrode is The region intersecting the second electrode is broken into a plurality of first sub-electrodes; the first electrode and the second electrode are transparent electrodes;
  • a blanking member including at least two layers of different densification layers is sequentially formed on the substrate corresponding to the bridging member.
  • the blanking member includes two layers of blanking layers, respectively a first blanking layer and a second blanking layer; in this case, the step of forming the blanking member includes, for example:
  • the step of forming the blanking member includes, for example:
  • the step of forming the blanking member includes:
  • the bridging member is formed on a substrate on which the insulating layer is formed.
  • sequentially forming the first blanking layer and the second blanking layer are performed as follows: by a magnetron sputtering method, a mixed gas containing oxygen, nitrogen or nitrogen and oxygen is used as a reaction gas, and argon is used as a rushing gas. Forming the first blanking layer with a first metal or a first alloy as a target in a cavity of the incident gas of the target;
  • the second metal or the second alloy is used as a target in a cavity containing an oxygen gas, a nitrogen gas or a nitrogen-oxygen mixed gas as a reaction gas, and an argon gas as an incident gas of the impact target by a magnetron sputtering method.
  • a blanking layer when the targets for forming the first blanking layer and the second blanking layer are the same, When a blanking layer and a second blanking layer are used, the type of gas flowing into the cavity is different, or the gas type is the same and the ventilation amount is different.
  • a magnetron sputtering chamber is provided with a mixed gas containing at least a reactive gas of 0 2 or N 2 or containing 0 2 or N 2 , and an argon gas Ar as an incident gas for impacting the target, magnetron sputtering.
  • the target in the cavity is a certain metal or metal alloy, and may be, for example, a molybdenum-niobium alloy, or an aluminum-niobium alloy or a target that is the same as at least one of the bridging members.
  • a film of a metal oxide, nitride or oxynitride is formed under the action of plasma Plasma, or an alloy oxide, nitride or oxynitride is formed.
  • Another method for fabricating a touch screen provided by the embodiment of the present invention corresponds to at least the touch screen structure of the second embodiment, and the method includes:
  • first electrodes and second electrodes Forming a plurality of first electrodes and second electrodes arranged in a cross arrangement on the substrate; the first electrode and/or the second electrode are blanking layers provided on at least two laminated layers, and each blanking layer has a reduced density and a reduced light reflection Acting film layer;
  • a process of insulating the insulating layer of the first electrode and the second electrode at the intersection region is formed on the substrate.
  • the touch screen includes a first blanking layer and a second blanking layer; in this case, the step of forming the first electrode includes:
  • the second electrode is formed on a substrate on which the insulating layer is formed.
  • the step of forming the second electrode includes, for example, sequentially forming a first blanking layer and a second blanking layer as the second electrode on the substrate according to the second electrode pattern.
  • sequentially forming the first blanking layer and the second blanking layer are performed, for example, by magnetron sputtering in a cavity containing at least a mixed gas of oxygen, nitrogen, or nitrogen and oxygen, or The alloy is used as a target to form the first blanking layer;
  • the second blanking layer is formed by a magnetron sputtering method using a metal or an alloy as a target in a cavity containing at least a mixed gas of oxygen, nitrogen or nitrogen-oxygen.
  • the steps of sequentially forming the first blanking layer and the second blanking layer are similar to the steps of fabricating the first blanking layer and the second blanking layer mentioned above, that is, in magnetron sputtering a reactive gas of 0 2 or N 2 or a mixed gas containing 0 2 or N 2 and an incident gas impinging on the target are introduced into the cavity, and the target in the magnetron sputtering cavity is a certain metal or metal alloy.
  • it may be a molybdenum-niobium alloy, or an aluminum-niobium alloy or a target that is the same as at least one of the bridging members.
  • a film of a metal oxide, nitride or oxynitride is formed under the action of plasma Plasma, or an alloy oxide, nitride or oxynitride is formed.
  • Another method for fabricating a touch screen according to an embodiment of the present invention corresponds to at least the touch screen structure of the third embodiment.
  • the method is substantially the same as the touch screen manufacturing method of the second embodiment, and is further included at the first electrode. And/or a process of making a conductive layer on the second electrode.
  • the method further includes:
  • a first conductive layer corresponding to the first electrode image is formed on the first electrode.
  • the method further includes:
  • a second conductive layer corresponding to the second electrode image is formed on the second electrode.
  • the manufacturing method of the first conductive layer and the second conductive layer can be made by a conventional process, and the material is the same as that of the first conductive layer and the second conductive layer mentioned in the above embodiments of the present invention, and details are not described herein. .
  • the step of fabricating the blanking layer by the magnetron sputtering method of the present invention is similar to the prior art, except that the target material is a certain metal or metal alloy described above in the present invention, and the reaction gas is 0 2 . Or N 2 or a mixed gas containing 0 2 or N 2 .
  • the two layers of blanking layer are in contact, then at the same time! 3 ⁇ 4 Mo process to make two layers of different density of blanking layer, that is, to make two layers of blanking layer, by controlling the reaction gas introduced into the magnetron sputtering cavity Different density densities are formed.
  • the first blanking layer is an oxide of molybdenum and niobium
  • the second blanking layer is a molybdenum niobium oxynitride, and it is only necessary to pass through the magnetron sputtering chamber after forming the molybdenum-doped oxide.
  • the amount of oxygen and nitrogen can be used. Or by introducing a certain amount of gas, first or less, or more, and then less, forming a different density of blanking layer.
  • the material used for the blanking layer is generally an oxide, a nitride or an oxynitride of a metal oxide, a nitride or an oxynitride or an alloy formed by the reaction of a gas introduced in the embodiment of the present invention. It may be a metal material having a low reflection characteristic or a non-metal material having a metal property, and the reflectance of the material needs to be 20% or less, and the metal layer material required to be in contact with it has good adhesion. Sex, stress difference is small, etchable, and the etching rate is small compared with the subsequent metal layer. The difference in the amount of gas introduced into the two layers of metal needs to be at least 5% different, for example, 5% or 20% difference.
  • the touch screen provided by the embodiment of the present invention may be any touch screen having a bridging member, and the blanking member provided with the area corresponding to the bridging member in the touch screen is implemented to reduce the reflectivity of the bridging member in the touch screen, thereby achieving the purpose of visualizing the touch screen.
  • the first electrode and the second electrode of the touch screen provided by the embodiment of the invention are a metal or an alloy, and a blanking member is disposed in a region corresponding to the first electrode and the second electrode.
  • the blanking member includes, for example, at least two blanking layers provided in a layered layer.
  • the embodiment of the present invention provides that the arrangement of the two-layer blanking layer can also be applied to any metal lead that needs to have a blanking effect.
  • a metal lead is required to be disposed in the display area, and at least or two layers of the blanking layer of the present invention may be disposed above or below the metal lead to achieve blanking effect.
  • the bridging member and the blanking member provided by the embodiments of the present invention can be at least applied to products in which the metal mesh structure needs to be blanked.
  • the embodiment of the invention further provides a display device comprising the above touch screen.
  • the touch screen provided by the embodiment of the present invention includes a non-transparent member (for example, a first electrode, a second electrode, a metal or alloy bridging member or other conductive layer) disposed on the substrate, and located at the same A blanking member between the transparent member and the external environment.
  • the blanking member comprises, for example, two layers of different density blanking layers, wherein the blanking layer is a metal oxide, a metal nitride or a metal oxynitride.
  • each blanking layer is a metal oxide, a metal nitride or a metal oxynitride
  • the oxides, nitrides, and oxynitrides of the metal are non-metallic, grayish-black, and black, and the light absorption effect is better. Less external light is reflected by the non-transparent member out of the touch screen, reducing the reflectivity of the light.
  • the densities of the blanking layers are different, and the different densities of the layers are different for the absorption of light, and the optical destructive action between the different absorption effects further reduces the overall reflectance of the non-transparent members.

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Abstract

提供了触摸屏及其制作方法。该触摸屏包括：基板、多条第一电极、多条第二电极、以及消隐构件。所述消隐构件至少包括第一消隐层和第二消隐层，用于减少对于外界光线的反射，其中，所述第一消隐层和第二消隐层的致密度不同，所述消隐构件设置于所述基板与所述桥接构件之间，所述基板设置于所述消隐构件与外界环境之间。

Description

触摸屏及其制作方法 技术领域
本发明实施例涉及触摸屏及其制作方法。 背景技术
在显示技术领域， 触摸屏作为一种新的输入装置已经在触控显示屏技术 领域应用越来越广泛。
其中， 电容式触摸屏具有反应时间快、 可靠性高以及耐用等优点而备受 关注。 电容式触摸屏按照与显示屏的集成方式分类至少包括内嵌式（In Cell ) 和外挂式（Add on ) 两种。
从工作的原理分类， 触摸屏包括表面电容式和投射电容式， 投射电容式 触摸屏包括自电容式和互电容式触摸屏。 投射电容式触摸屏为目前应用比较 广的触摸屏。
一般地， 投射电容式触摸屏的结构为： 在基板的触控区域（也称为像素 区域）设置有实现触摸功能的多条第一电极和多条第二电极， 各第一电极和 各第二电极可以设置在同一层或者设置在不同层。 设置在同一层的第一电极 或第二电极在第一电极和第二电极交叉处断开，断开部分通过桥接构件连接。
参见图 1 , 为现有设置在同一层的第一电极和第二电极的触摸屏结构示 意图， 包括位于基板 100 上位于触摸区域沿第一方向分布的多条第一电极 101 , 沿与所述第一方向交叉的第二方向设置的多条第二电极 102; 各第一电 极 101与任一第二电极 102交叉的区域断开， 断开部分通过桥接构件 103连 接， 桥接构件 103与第二电极 102之间通过绝缘层 104相绝缘。
一般地， 桥接构件为透明导电线或金属线。 采用金属线作为桥接构件具 有成本低、 制作工艺筒单且电阻率低的特点， 现有触摸屏多采用金属线作为 桥接构件实现触摸屏。 金属线具有金属光泽， 对由显示面板外界入射的光的 反射率较高， 使得肉眼能够看到桥接构件而影响触摸屏的显示效果， 即使使 用反射率较低的金属层作为桥接构件， 其反射率也不会低于 30%, 无法使得 桥接构件达到无视化的目的。 发明内容
本发明一实施例提供一种触摸屏， 包括： 基板； 位于所述基板上方沿第 一方向延伸的多条第一电极； 位于所述基板上方沿第二方向延伸的与所述各 第一电极交叉排列的多条第二电极； 其中， 所述第一电极和第二电极为透明 电极， 所述第一电极在与所述第二电极的交叉区域断开为包括多个第一子电 极， 同一第一电极内的任意相邻的两个所述第一子电极通过桥接构件电性连 接； 所述桥接构件与所述第二电极通过绝缘层相绝缘， 以及消隐构件， 至少 包括第一消隐层和第二消隐层， 用于减少对于外界光线的反射， 其中， 所述 第一消隐层和第二消隐层的致密度不同， 所述消隐构件设置于所述基板与所 述桥接构件之间， 所述基板设置于所述消隐构件与外界环境之间。
本发明另一实施例提供一种触摸屏， 包括： 基板； 位于所述基板上方沿 第一方向延伸的多条第一电极； 以及位于所述基板上方沿第二方向延伸的与 所述各第一电极交叉排列的多条第二电极； 其中， 所述第一电极与所述第二 电极在交叉区域通过绝缘层相绝缘； 所述第一电极和所述第二电极中的至少 一个包括第一消隐层和第二消隐层， 用于减少对于外界光线的反射。
在一个示例中， 所述第一消隐层和所述第二消隐层直接接触， 且满足以 下公式（1-1 )和（1-2 ) ,
^nA = (2m,— ΐμ/2 公式（丄―工）
- 2n2d2 \ = (2m2 - l)A / 2 公式（ 1-2 ) 其中 ηι为第一消隐层的折射率， 为第一消隐层的厚度， l为任意正整 数， n2为第二消隐层的折射率， d2为第二消隐层的厚度， 2为任意正整数， 为环境光波长。
在一个示例中， 所述触摸屏还包括位于与所述第一电极和所述第二电极 中的所述至少一个相对应的区域的导电层， 使得所述第一电极和所述第二电 极中的所述至少一个位于所述导电层与所述基板之间。
在一个示例中， 所述桥接构件在所述基板上的投影位于所述消隐构件在 所述基板上的投影内。
在一个示例中， 所述第二消隐层层叠在所述第一消隐层上， 且所述第一 消隐层的面积等于第二消隐层的面积。 在一个示例中， 所述桥接构件的材质为单一金属或合金，优选为钼、铝、 钼合金或铝合金。
在一个示例中，所述第一消隐层和 /或所述第二消隐层的材质为金属氧化 物、 金属氮化物、 金属氮氧化物、 合金氧化物、 合金氮化物， 或合金氮氧化 物。
在一个示例中，所述第一消隐层和 /或所述第二消隐层的材质为所述桥接 构件所包含的至少一种金属的氧化物、 氮化物、 或氮氧化物。
在一个示例中， 所述第二电极、 所述绝缘层、 所述第一消隐层、 所述第 二消隐层、 所述桥接构件在远离所述基板的方向上以所述顺序依次设置。
在一个示例中， 所述第一消隐层、 所述第二消隐层、 所述桥接构件、 所 述绝缘层、 所述第二电极在远离所述基板的方向上以所述顺序依次设置。
在一个示例中， 所述消隐构件与所述第一电极保持绝缘， 所述第一消隐 层、 所述第二消隐层、 所述第二电极、 所述绝缘层、 所述桥接构件在远离所 述基板的方向上以所述顺序依次设置。
在一个示例中，所述第一电极由一个第一消隐层和一个第二消隐层构成， 所述第二电极由另一第一消隐层和另一第二消隐层构成， 且所述一个第一消 隐层、 一个第二消隐层、 所述绝缘层、 所述另一第一消隐层和另一第二消隐 层在远离所述基板的方向上依次设置。
本发明的又一实施例提供一种触摸屏的制作方法， 包括如下步骤： 在基 板上形成多条交叉排列的第一电极和第二电极； 第一电极在与第二电极交叉 的区域断开以形成多个第一子电极； 第一电极和第二电极为透明电极； 在基 板上形成用于连接同一第一电极内的任意相邻两个第一子电极的桥接层； 在 基板上与所述桥接层对应的区域依次形成第一消隐层和第二消隐层， 用于减 少对于外界光线的反射。
在一个示例中， 所述第一消隐层和第二消隐层的致密度不同， 所述消隐 构件设置于所述基板与所述桥接构件之间。
在一个示例中， 所述第一消隐层和所述第二消隐层的形成包括： 通过磁控溅射法在含有氧气、 氮气或氮氧混合气体的腔体中以金属或合 金为靶材制作所述第一消隐层； 通过磁控溅射法在含有氧气、 氮气或氮氧混 合气体的腔体中以金属或合金为靶材制作所述第二消隐层； 当用于形成所述第一消隐层和第二消隐层的靶材相同时， 制作第一消隐 层和第二消隐层时通入腔体中的气体类型不同， 或气体类型相同但通气量不 同。
本发明的又一实施例提供一种触摸屏的制作方法， 包括： 在基板上形成 多条交叉排列的第一电极和第二电极， 其中所述第一电极包括至少两层叠层 设置的消隐层， 和 /或所述第二电极包括至少两层叠层设置的消隐层， 叠层设 置的各消隐层为致密度不同的具有降低光线反射作用的膜层； 在基板上形成 位于所述交叉区域用于绝缘第一电极和第二电极的绝缘层。
在一个示例中， 所述第一电极的形成包括： 在所述基板上依次形成第一 消隐层和第二消隐层作为第一电极； 在形成有所述第一电极的基板上形成绝 缘层； 在形成有所述绝缘层的基板上形成所述第二电极。
在一个示例中， 所述第二电极的形成包括在所述基板上依次形成第一消 隐层和第二消隐层作为第二电极。
在一个示例中， 所述第一消隐层和所述第二消隐层的形成包括： 通过磁控溅射法在含有氧气、 氮气或氮氧混合气体的腔体中以金属或合 金为靶材制作所述第一消隐层； 通过磁控溅射法在含有氧气、 氮气或氮氧混 合气体的腔体中以金属或合金为靶材制作所述第二消隐层；
当用于形成所述第一消隐层和第二消隐层的靶材相同时， 制作第一消隐 层和第二消隐层时通入腔体中的气体类型不同， 或气体类型相同但通气量不 同。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例或现有技 术描述中所需要使用的附图作筒单地介绍， 显而易见地， 下面描述中的附图 仅仅涉及本发明的一些实施例， 并非对本发明的限制。
图 1为现有技术触摸屏俯视示意图；
图 2为本发明第一实施例提供的触摸屏立体示意图；
图 3为本发明第一实施例提供的触摸屏中光线经过消隐层的光路图； 图 4为图 2所示的触摸屏在 A-A， 向的截面图；
图 5为图 2所示的触摸屏在 A-A， 向的截面图； 图 6为图 2所示的触摸屏在 A- A， 向的截面图；
图 7为本发明实施例提供的触摸屏中第一电极和第二电极的结构示意图 之一；
图 8为本发明实施例提供的触摸屏中第一电极和第二电极的结构示意图 之二；
图 9为本发明实施例提供的触摸屏中第一电极和第二电极的结构示意图 之三；
图 10为本发明第二实施例提供的触摸屏的俯视示意图；
图 11为本发明第三实施例提供的触摸屏截面示意图。 具体实施方式
下面将结合附图，对本发明实施例中的技术方案进行清楚、完整地描述， 显然， 所描述的实施例仅仅是本发明一部分实施例， 而不是全部的实施例。 基于本发明中的实施例， 本领域普通技术人员在没有做出创造性劳动前提下 所获得的所有其他实施例， 都属于本发明保护的范围。
本发明实施例提供触摸屏及其制作方法以及显示装置， 用以降低触摸屏 在非透明构件区域的对于外界环境光的反射， 提高触摸屏中的所述非透明构 件区域的无视化的程度。
本发明实施例提供的触摸屏包括多条第一电极和多条第二电极， 第一电 极和第二电极分别可以为触摸驱动电极和触摸感应电极， 或者为触摸感应电 极和触摸驱动电极。
需要说明的是， 本发明实施例提供的所有触摸屏或附图中的触摸屏结构 仅是为了解释本发明并不用于限制本发明， 即本发明实施例的所有附图提供 的触摸屏结构仅是几种典型的触摸屏结构， 用于说明本发明实施例提供的非 透明的桥接构件或其他导电层构件， 例如其材质为金属或合金时， 在该桥接 构件或导电层所在区域设置消隐构件。 任何包含这一消隐构件的触摸屏均在 本发明保护范围之内。
第一实施例
本发明第一实施例提供一种触摸屏， 如图 2所示， 包括： 基板 1; 位于 基板 1上的沿第一方向排列的多条第一电极 11;位于基板 1上的沿第二方向 排列的多条第二电极 12(图 2中仅示出一条第一电极 11和一条第二电极 12 ); 第一电极 11和第二电极 12为透明电极， 第一电极 11和第二电极 12交叉排 列且彼此绝缘； 第一电极 11在交叉区域断开为多个第一子电极 111 , 相邻的 两个第一子电极 111通过金属或合金形成的桥接构件 13电性连接;桥接构件 13与未断开的第二电极 12通过绝缘层 14相绝缘。该触摸屏还包括位于与桥 接构件 13相对应的区域的消隐构件，其例如包括至少两层消隐层，各消隐层 为不同致密度的具有降低外界光线反射作用的膜层。图 2中未示出各消隐层。
例如， 消隐层可以为任何低反射率的膜层。
需要说明的是， 本发明实施例提供的触摸屏， 各膜层位于第一基板之上 包含两种情况， 以图 2为例， 第一电极 11位于基板 1上， 可以理解为第一电 极 11与基板 1相接触， 或者第一电极 11位于基板 1上方， 二者之间还包括 其他功能膜层，例如二者之间还包括緩沖层以提高第一电极 11在基板 1上的 附着力。
所述交叉排列为第一电极和第二电极之间具有一定夹角 （对应三角形中 的锐角）或相互垂直。
本发明第一实施例提供的触摸屏中， 所述各消隐层靠近外界光线的入射 面， 所述桥接构件相对于用于其的消隐构件远离外界光线的入射面。 即外界 光线先经过消隐层再经过桥接构件， 实现降低外界光线反射率的目的。 所述 外界光线为由显示面板外部入射的自然光， 即区别于显示面板中的背光。
本发明第一实施例提供的所述触摸屏中， 各消隐层的致密度不同， 不同 致密度的膜层对外界光线的反射不同， 不同反射之间发生光学的相消作用可 进一步使得触摸屏在桥接构件对应区域的反射率降低。
在图 3至 6所示示例中，消隐构件由两个消隐层， 即第一消隐层 15和第 二消隐层 16构成。
光是电磁波， 如图 3所示 （未示出第一消隐层上方的基板） ， 当其顺次 经过第一消隐层 15和第二消隐层 16时， 在二者表面发生反射， 如果两束反 射光之间的光程差满足半波长的奇数倍， 则两束反射光发生相消干涉， 使得 反射光强进一步减小或无反射光的存在，桥接构件的无视化程度进一步提高。
例如， 外界光线经过第一消隐层 15 和第二消隐层 16 时满足如下公式 ( 1-1 )和（1-2 ) ： = 2nldl = (2ml -ΐμ/2 公式（ 1-1 )
Δ^2 = ^η,ά, - 2n2d2 \ = (2m2 - 1)1/2 公式（1-2 ) 其中， 其中 ni为第一消隐层的折射率， （^为第一消隐层的厚度， l为任 意正整数， n2为第二消隐层的折射率， d2为第二消隐层的厚度， 2为任意正 整数， 为外界光的波长。
满足上述公式（1-1 )和（1-2 ) 的反射光线最大程度相消， 然而只要能 保证两列波在同一时刻叠加后的振幅不大于其中某一束反射波的振幅就可达 到降低光线反射率的目的。
例如， 当第一消隐层 15的材料确定时， 公式中的折射率 确定， 入射 波波长义一定的前提下， 可通过控制第一消隐层 15的厚度 ηι来调节光程差 AS, , 使其满足公式（1-1 )。 当然第一消隐层 15的厚度 d越薄越好， 即设置 第一消隐层 15的厚度满足 A S=A/2时最佳。 同样的， 可以通过控制 ^、 d2、 n2来调节光程差 M2 , 使其满足公式（1-2 ) 。
在一个示例中， 所述第一和第二消隐层的材料选自下列材料构成的组： 金属氧化物、 金属氮化物、 金属氮氧化物、 合金氧化物、 合金氮化物、 合金 氮氧化物等。 由于金属或合金的氧化物、 氮化物、 氮氧化物本身颜色是非金 属色， 偏灰色和黑色， 对光线的吸收作用较佳， 使得反射到触摸屏出光侧的 光线减少， 降低光线的反射率， 提高桥接构件无视化的程度。
本发明第一实施例在第一电极 11和第二电极 12交叉的区域设置有绝缘 层、 第一消隐层 15和第二消隐层 16以及桥接构件， 绝缘层用于避免第二电 极与第一电极的接触或避免与桥接构件的接触。第一消隐层 15和第二消隐层 16所在区域与桥接构件所在区域对应，或第一消隐层 15和第二消隐层 16的 面积不小于桥接构件所在区域的面积， 用于降低光线入射到桥接构件所在区 域时光的反射率。
为了更清楚地说明本发明第一实施例提供的桥接构件与各消隐层的相对 位置， 以下以图 4-图 6所示的示例的触摸屏为例说明。 图 4-图 6所示的为图 2所示的触摸屏在 A-A，向的截面图。
第一示例
参见图 4,根据第一示例的触摸屏包括： 基板 1; 位于基板 1上同层设置 的第一电极和第二电极 12, 第一电极和第二电极 12交叉排列， 第一电极在 于第二电极 12交叉的区域断开为多个第一子电极 111; 位于第二电极 12上 的绝缘层 14; 位于绝缘层 14上的第一消隐层 15和位于第一消隐层 15上的 第二消隐层 16, 以及位于第二消隐层 16上的桥接构件 13; 其中， 绝缘层 14 仅覆盖第二电极 12上与桥接构件 13相对应的区域， 长度和宽度保证桥接构 件 13与第二电极 12相绝缘； 第一消隐层 15的面积等于第二消隐层 16的面 积， 且相对设置； 在一个示例中， 第一消隐层 15的面积不小于桥接构件 13 覆盖的面积， 且桥接构件 13在基板 1上的投影位于第一消隐层 15或第二消 隐层 16在基板 1上的投影内； 当然第一消隐层 15的面积也可以小于桥接构 件 13覆盖的面积， 此时桥接构件 13在基板 1上的投影会部分超出第一消隐 层 15或第二消隐层 16在基板 1上的投影。
需要说明的是本发明实施例提供的触摸屏中， 所述消隐构件相对于所述 桥接构件更靠近外界光线的入射面。 如图 4所示， 外界光线的入射面位于基 板 1的的下表面， 图 4中带箭头的线 ^^示光线。 图 5和图 6所示的触摸屏， 外界光线的入射面位于基板 1的下表面，图 5和图 6中未示出外界光入射面。
第二示例
参见图 5, 根据第二示例的触摸屏的结构与上述第一示例的触摸屏结构 类似， 不同之处在于： 在第一电极 11与第二电极 12的交叉区域， 第一消隐 层 15和第二消隐层 16位于第二电极 12下方。
参见图 5, 该触摸屏包括： 基板 1; 位于基板 1上的第一电极， 第一电极 断开为多个第一子电极 111 ,位于第一基板 1上叠层设置的第一消隐层 15和 第二消隐层 16,第二消隐层 16位于第一消隐层 15之上；位于第二消隐层 16 之上的桥接构件 13; 位于桥接构件 13上的绝缘层 14; 以及位于绝缘层 14 上的第二电极 12。 第一消隐层 15、 第二消隐层 16、桥接构件 13和绝缘层 14 的设置位置以及设置大小与第一示例所述的设置位置以及设置大小类似， 这 里不再赘述。
第三示例
根据第三示例的触摸屏的结构与上述第一示例所述的触摸屏结构类似， 不同之处在于：第二电极 12位于桥接构件 13与第一消隐层 15和第二消隐层 16之间。
参见图 6, 该触摸屏包括： 基板 1; 位于基板 1上的第一电极， 第一电极 断开为多个第一子电极 111 ,位于基板 1上叠层设置的第一消隐层 15和第二 消隐层 16, 第二消隐层 16位于第一消隐层 15之上； 第一消隐层 15和第二 消隐层 16与第一电极 11保持绝缘；位于第二消隐层 16之上的第二电极 12;
位于第二电极 12之上的绝缘层 14, 绝缘层 14保证第一消隐层 15和第 二消隐层 16与第一电极 11相绝缘； 以及位于绝缘层 14之上的桥接构件 13, 绝缘层 14保证桥接构件 13与第二电极 12相绝缘。
第一消隐层 15、第二消隐层 16、桥接构件 13和绝缘层 14的设置位置以 及设置大小与第一示例所述的设置位置以及设置大小类似， 这里不再赘述。
由第一示例至第三示例公开的触摸屏可知， 桥接构件可以视情况设置于 第二电极上方或下方。
桥接构件可以与第一消隐层和第二消隐层接触或不接触。
第一示例至第三示例提供了本发明第一实施例的典型的触摸屏结构， 各 示例的触摸屏包括两层消隐层， 其可以降低桥接构件区域外界光反射率的原 理与结合图 3描述的降低外界光反射率的原理类似， 这里不再赘述。
尽管第一示例至第三示例公开的触摸屏中的消隐构件以相互接触的两层 消隐层为例， 但是在本发明其他实施例中， 消隐构件可设置为包括对于两层 消隐层， 或者设置为多层金属层， 消隐层与金属层间隔设置或多层消隐层与 多层金属层间隔设置均能够实现降低桥接构件区域外界光线的反射率。
本发明第一示例至第三示例提供的触摸屏中， 第一电极和第二电极为透 明电极， 例如可以为铟锡氧化物 ITO或铟辞氧化物 IZO等。
本发明第一示例至第三示例提供的触摸屏中， 桥接构件可以为金属或金 属合金， 例如可以为钼、 铝、 钼合金或铝合金； 相比较其他金属， 钼 （Mo ) 或铝（A1 ) 的稳定性较好， 不容易被氧化或腐蚀。
本发明第一示例至第三示例提供的触摸屏中， 所述各消隐层分别为钼的 氧化物、 钼的氮化物、 钼的氮氧化物、 铝的氧化物、 铝的氮化物、 铝的氮氧 化物、 钼合金氧化物、 钼合金氮化物、 钼合金氮氧化物、 铝合金氧化物、 铝 合金氮化物、 铝合金氮氧化物等。
例如可以为： Mo、 Al、 MoNb、 MoTa、 MoTi、 AlNd等的氧化物、 氮化 物或氮氧化物等。 例如第一消隐层为 MoNbOxNy,其中， Mo为钼金属， Nb为 铌金属， X和 y整数或小数； 第二消隐层为 MoNbOxNy, 但是要保证第一消 隐层和第二消隐层的致密度不同。
上述仅是列举了一些典型的金属化合物或合金化合物作为消隐层。 实际 上， 各消隐层可以为任何具有不同致密度的膜层， 例如， 第一消隐层和第二 消隐层的制作材料可以相同或者不同， 只要保证第一消隐层和第二消隐层的 致密度不同即可。
例如， 当桥接构件为某一种金属或合金时， 各消隐层为包含桥接构件中 的至少一种金属的金属氧化物、 金属氮化物或金属氮氧化物， 或者为合金氧 化物、 合金氮化物或合金氮氧化物。
例如， 上述第一示例至第三示例中， 所述第一电极为触摸驱动电极， 所 述第二电极为触摸感应电极； 或者所述第一电极为触摸感应电极， 所述第二 电极为触摸驱动电极。
上述第一示例至第三示例提供的触摸屏中， 第一电极和第二电极的图案 可以为由多个菱形状子电极串联而成； 或由多个矩形状子电极串联而成； 或 者第二电极为条状电极。
图 7所示的示例中， 第一电极 11和第二电极 12包括菱形状子电极， 第 一电极 11在与第二电极 12交叉处断开，断开处设置有绝缘层 14和位于绝缘 层 14上的桥接构件 13。
图 8所示的示例中， 第一电极 11和第二电极 12包括矩形状子电极， 第 一电极 11在与第二电极 12交叉处断开，断开处设置有绝缘层 14和位于绝缘 层 14上的桥接构件 13。
图 9所示的示例中， 第二电极 12为条状电极， 第一电极 11在与第二电 极 12交叉处断开， 断开处设置有绝缘层 14和位于绝缘层 14上的桥接构件 13。每一条第一电极 11可以设置一条桥接构件 13也可以设置多条桥接构件。 只要保证被断开的第一电极最终为一整条导电条即可。
上述所有示例中提供触摸屏中以第一电极和第二电极为透明电极为例。 第二实施例
参见图 10, 本发明第二实施例提供的触摸屏包括： 基板 1; 位于基板 1 上沿第一方向延伸的多条第一电极 11 ,以及沿第二方向延伸的与各第一电极 11交叉排列的多条第二电极 12;第一电极 11与第二电极 12在交叉区域通过 绝缘层 14相绝缘； 其中， 第一电极 11由两层叠层设置且致密度不同的具有 降低光线反射作用的消隐层组成； 和 /或第二电极 12由两层叠层设置且致密 度不同的具有降低光线反射作用的消隐层组成。
本发明第二实施例提供的触摸屏中， 第一电极 11和第二电极 12至少之 一由两层具有降低光线反射作用的消隐层组成时， 触摸屏对外界光线的反射 作用因两层致密度不同的消隐层的存在而降低， 有利于实现第一电极 11和 / 或第二电极 12无视效果。 例如， 各消隐层的致密度不同， 不同致密度的膜层 对外界光线的吸收程度不同， 不同吸收效果之间发生光学的相消作用进一步 使得触摸屏在第一电极 11和 /或第二电极 12的对应区域的反射率降低。
第三实施例
参见图 11 , 第三实施例提供的触摸屏与图 10所示的第二实施例的触摸 屏结构类似， 不同之处在于， 图 11 所示的触摸屏还包括： 位于与第一电极 11和 /或第二电极 12相对应的区域的导电层 18和 /或 17, 该导电层 18和 /或 17为金属层或合金层， 或者为由金属层和合金层的叠层组成的膜层， 各消隐 层靠近外界光线的入射面，导电层 18和 /或 17相对于各自的消隐层远离所述 外界光线的入射面。
参见图 11 , 例如第一电极 11和第二电极 12分别由第一消隐层 15和第 二消隐层 16叠层组成，且第一电极 11上设置有第一导电层 18,第二电极 12 上设置有第二导电层 17;
第一电极 11的第一消隐层 15位于基板 1之上；第一电极 11的第二消隐 层 16位于第一电极 11的第一消隐层 15之上； 第一导电层 18位于第一电极 11的第二消隐层 16之上；
绝缘层 14位于第一导电层 18之上；
构成第二电极 12的第一消隐层 15位于绝缘层 14之上； 第二电极 12的 第二消隐层 16位于第二电极 12的第一消隐层 15之上； 第二导电层 17位于 第二电极 12的第二消隐层 16之上。
需要说明的是，图 11所示的触摸屏，外界光的入射面位于基板的下表面， 如图 11中的带箭头的线 示光线的入射面。
例如各个消隐层为金属氧化物、 金属氮化物、 金属氮氧化物或者为合金 氧化物、 合金氮化物、 合金氮氧化物等。
例如各个消隐层为钼的氧化物、 钼的氮化物、 钼的氮氧化物、 铝的氧化 物、 铝的氮化物、 铝的氮氧化物、 钼合金氧化物、 钼合金氮化物、 钼合金氮 氧化物、 铝合金氧化物、 铝合金氮化物、 铝合金氮氧化物等。
例如， 导电层可以为金属层， 例如可以为钼或铝金属层等， 导电层也可 以为合金层， 例如可以为钼合金或铝合金层等。
例如， 构成第一电极的第一消隐层的面积等于第二消隐层的面积且二者 相对设置； 构成第二电极的第一消隐层的面积等于第二消隐层的面积且二者 相对设置；
针对第一电极， 第一导电层在基板上的投影位于第一消隐层或第二消隐 层在基板上的投影内， 或者第一导电层在基板上的投影与第一消隐层或第二 消隐层在基板上的投影重叠。
针对第二电极， 第二导电层在基板上的投影位于第一消隐层或第二消隐 层在基板上的投影内， 或者第二导电层在基板上的投影与第一消隐层或第二 消隐层在基板上的投影重叠。
在一个示例中， 各第一电极和各第二电极通过两次构图工艺完成， 例如 在基板上制作各第一电极， 然后在第一电极与第二电极交叉的区域设置绝缘 层， 最后在基板上制作各第二电极， 第二电极与第一电极相对的区域通过绝 缘层相绝缘。
第二和第三实施例提供的触摸屏中， 各消隐层的制作材料、 致密度和结 构与上述第一实施例提供的触摸屏中的各消隐层设置类似， 这里不再赘述。
此外， 第二和第三实施例提供的第一电极和第二电极的设置图案还可以 与图 7至图 9任一所示的设置方式类似， 第一电极和第二电极的图案可以为 由多个菱形状子电极串联而成； 或由多个矩形状子电极串联而成； 或者分别 为条状电极。不同之处在于，第二和第三实施例提供的第一电极 11没有在与 第二电极 12交叉处断开，第一电极与第二电极之间仅包括绝缘层，无桥接构 件。
以下介绍本发明实施例提供的触摸屏的制作法。
针对不同的触摸屏其制作方法不同。
首先说明具有桥接构件的触摸屏的制作方法， 至少对第一实施例的触摸 屏结构， 主要包括以下步骤：
在基板上形成多条交叉排列的第一电极和第二电极的过程； 第一电极在 与第二电极交叉的区域断开为多个第一子电极； 第一电极和第二电极为透明 电极；
在基板上形成用于连接任意相邻两个第一子电极的桥接构件的过程， 所 述第一子电极属于同一第一电极；
在基板上与所述桥接构件对应的区域依次形成包括至少两层致密度不同 的消隐层的消隐构件。
例如，所述消隐构件包括两层消隐层，分别为第一消隐层和第二消隐层； 在此情况下， 所述形成消隐构件的步骤例如包括：
在所述基板上同时形成第一电极和第二电极， 筒化工艺流程；
在形成有所述第一电极和第二电极的基板上形成所述绝缘层；
在形成有所述绝缘层的基板上依次形成第一消隐层和第二消隐层； 在形成有所述第一消隐层和第二消隐层的基板上形成所述桥接构件； 或者所述形成消隐构件的步骤例如包括：
在所述基板上依次形成第一消隐层和第二消隐层；
在形成有所述第一消隐层和第二消隐层的基板上形成所述桥接构件； 在形成有所述桥接构件的基板上形成所述绝缘层；
在形成所述绝缘层的基板上形成第一电极和第二电极；
或者所述形成消隐构件的步骤例如包括：
在所述基板上依次形成第一消隐层和第二消隐层；
在形成有所述第一消隐层和第二消隐层的基板上形成第一电极和第二电 极；
在形成有所述第一电极和第二电极的基板上形成所述绝缘层；
在形成所述绝缘层的基板上形成所述桥接构件。
在一个实例中，依次形成所述第一消隐层和所述第二消隐层例如执行为： 通过磁控溅射法在含有氧气、 氮气或氮氧混合气体作为反应气体， 氩气 作为沖击靶材的入射气体的腔体中以第一金属或第一合金为靶材制作所述第 一消隐层；
通过磁控溅射法在含有氧气、 氮气或氮氧混合气体作为反应气体， 氩气 作为沖击靶材的入射气体的腔体中以第二金属或第二合金为靶材制作所述第 二消隐层； 当用于形成所述第一消隐层和第二消隐层的靶材相同时， 制作第 一消隐层和第二消隐层时通入腔体中的气体类型不同， 或气体类型相同且通 气量不同。
例如， 在磁控溅射腔体中通入至少包含反应性气体 02或 N2或含 02或 N2的混合气体， 以及氩气 Ar作为沖击靶材的入射气体， 磁控溅射腔体中的 靶材为某一金属或者金属合金， 例如可以为钼铌合金， 或铝钕合金或者为与 桥接构件中的至少一种金属相同的靶材。在等离子体 Plasma的作用下形成金 属的氧化物、 氮化物或氮氧化物的膜层， 或者形成合金氧化物、 氮化物或氮 氧化物。
本发明实施例提供的另一种触摸屏的制作方法， 至少对应第二实施例的 触摸屏结构， 该方法包括：
在基板上形成多条交叉排列的第一电极和第二电极；第一电极和 /或第二 电极为至少两层叠层设置的消隐层， 各消隐层为致密度不同的具有降低光线 反射作用的膜层；
在基板上形成位于所述交叉区域用于绝缘第一电极和第二电极的绝缘层 的过程。
在一个示例中，所述触摸屏包括第一消隐层和第二消隐层；在此情况下， 所述形成第一电极的步骤包括：
根据第一电极图形在所述基板上依次形成第一消隐层和第二消隐层作为 第一电极；
在形成有所述第一电极的基板上形成绝缘层；
在形成有所述绝缘层的基板上形成所述第二电极。
在一个示例中， 形成所述第二电极的步骤例如包括： 根据第二电极图形 在所述基板上依次形成第一消隐层和第二消隐层作为第二电极。
在一个示例中，依次形成所述第一消隐层和所述第二消隐层例如执行为： 通过磁控溅射法在至少含有氧气、 氮气或氮氧混合气体的腔体中以金属 或合金为靶材制作所述第一消隐层；
通过磁控溅射法在至少含有氧气、 氮气或氮氧混合气体的腔体中以金属 或合金为靶材制作所述第二消隐层。
例如， 当用于形成所述第一消隐层和第二消隐层的靶材相同时， 制作第 一消隐层和第二消隐层时通入腔体中的气体类型不同， 或气体类型相同且通 气量不同； 依次形成所述第一消隐层和所述第二消隐层的步骤与上述提到的 制作第一消隐层和所述第二消隐层的步骤类似， 即在磁控溅射腔体中通入反 应性气体 02或 N2或含 02或 N2的混合气体以及沖击靶材的入射气体， 磁控 溅射腔体中的靶材为某一金属或者金属合金， 例如可以为钼铌合金， 或铝钕 合金或者为与桥接构件中的至少一种金属相同的靶材。 在等离子体 Plasma 的作用下形成金属的氧化物、 氮化物或氮氧化物的膜层， 或者形成合金氧化 物、 氮化物或氮氧化物。
本发明实施例提供的另一种触摸屏的制作方法， 至少对应第三实施例的 触摸屏结构， 该方法与上述对应第二实施例的触摸屏制作方法基本相同， 除 此之外还包括在第一电极和 /或第二电极上制作导电层的过程。
当所述第一电极由至少两层消隐层组成时， 该方法还包括：
在所述第一电极上形成与所述第一电极图像相对应的第一导电层。
当所述第二电极由至少两层消隐层组成时， 该方法还包括：
在所述第二电极上形成与所述第二电极图像相对应的第二导电层。
第一导电层和第二导电层的制作方法可以通过常规的! ¾ 工艺制作， 制 作材料与本发明上述实施例提到的第一导电层和第二导电层的制作材料相 同， 这里不再赘述。
需要说明的是， 本发明通过磁控溅射法制作消隐层的步骤与现有技术类 似， 不同之处在于， 靶材为本发明上述说明的某一金属或者金属合金， 反应 气体为 02或 N2或含 02或 N2的混合气体。
如果两层消隐层相接触， 则在同一次! ¾莫工艺制作两层不同致密度的消 隐层， 即制作两层消隐层， 通过控制磁控溅射腔体中通入的反应气体形成不 同致密度的消隐层。 例如要形成第一消隐层为钼铌的氧化物， 第二消隐层为 钼铌的氮氧化合物， 只需要在形成钼铌的氧化物之后在磁控溅射腔体中接着 通入一定量的氧气和氮气即可。 或者通过通入某一气体的量先少后多或先多 后少形成不同致密度的消隐层。
用于消隐层的材料除一般为本发明实施例中提到的通入气体反应后形成 的金属的氧化物、 氮化物或氮氧化物或合金的氧化物、 氮化物或氮氧化物， 还可以为具有低反射特征的金属材料或具有金属特性的非金属材料， 该材料 的反射率需要在 20%以下， 且需要与何其接触的金属层材料具有良好的附着 性， 应力差异小， 可刻蚀， 且刻蚀速率与后面的金属层差异性小。 两层金属 的气体通入量的差异需要至少差 5%, 例如可以差 5%或 20%等。
本发明实施例提供的触摸屏可以是任何具有桥接构件的触摸屏， 触摸屏 中设置有与桥接构件相对应的区域的消隐构件， 实现降低触摸屏中桥接构件 的反射率， 实现触摸屏无视化的目的。 或者本发明实施例提供的触摸屏中第 一电极和第二电极为金属或合金， 在与第一电极和第二电极相对应的区域中 设置有消隐构件。 所述消隐构件例如至少包括两层叠层设置的消隐层。
需要说明的是， 本发明实施例提供两层消隐层的设置方式还可以适用于 任何需要有消隐作用的金属引线。 例如在显示技术领域， 在显示区域不可避 免地需要设置金属引线， 则该金属引线上方或下方可以设置本发明所述的至 少两层消隐层实现消隐的效果。 例如， 本发明实施例提供的桥接构件和消隐 构件可以至少适用于金属网线结构需要被消隐的产品中。
本发明实施例还提供一种显示装置， 包括上述触摸屏。
综上所述， 本发明实施例提供的触摸屏， 包括设置在基板上的非透明构 件（例如、 第一电极、 第二电极、 金属或合金桥接构件或其他导电层） ， 以 及位于与所述非透明构件与所述外界环境之间的消隐构件。 该消隐构件例如 包括两层不同致密度的消隐层， 其中， 所述消隐层为金属氧化物、 金属氮化 物或金属氮氧化物。 由于各消隐层为金属氧化物、 金属氮化物或金属氮氧化 物， 金属的氧化物、 氮化物、 氮氧化物本身颜色是非金属色， 偏灰色和黑色， 对光线的吸收作用较佳， 使得较少的外界光线被非透明构件反射出触摸屏， 降低光线的反射率。 此外， 各消隐层的致密度不同， 不同致密度的膜层对光 线的吸收程度不同， 不同的吸收效果之间发生光学的相消作用进一步使得非 透明构件的整体反射率降低。
虽然上文中已经用一般性说明及具体实施方式， 对本发明作了详尽的描 述， 但在本发明基础上， 可以对之作一些修改或改进， 这对本领域技术人员 而言是显而易见的。 因此， 在不偏离本发明精神的基础上所做的这些修改或 改进， 均属于本发明要求保护的范围。

Claims

权利要求书
1、 一种触摸屏， 包括：
基板；
位于所述基板上方沿第一方向延伸的多条第一电极；
位于所述基板上方沿第二方向延伸的与所述各第一电极交叉排列的多条 第二电极； 其中， 所述第一电极和第二电极为透明电极， 所述第一电极在与 所述第二电极的交叉区域断开为包括多个第一子电极， 同一第一电极内的任 意相邻的两个所述第一子电极通过桥接构件电性连接； 所述桥接构件与所述 第二电极通过绝缘层相绝缘， 以及
消隐构件， 至少包括第一消隐层和第二消隐层， 用于减少对于外界光线 的反射， 其中， 所述第一消隐层和第二消隐层的致密度不同， 所述消隐构件 设置于所述基板与所述桥接构件之间， 所述基板设置于所述消隐构件与外界 环境之间。
2、 一种触摸屏， 包括：
基板；
位于所述基板上方沿第一方向延伸的多条第一电极； 以及
位于所述基板上方沿第二方向延伸的与所述各第一电极交叉排列的多条 第二电极；
其中， 所述第一电极与所述第二电极在交叉区域通过绝缘层相绝缘； 所 述第一电极和所述第二电极中的至少一个包括第一消隐层和第二消隐层， 用 于减少对于外界光线的反射。
3、根据权利要求 1或 2所述的触摸屏， 其中， 所述第一消隐层和所述第 二消隐层直接接触， 且满足以下公式（1-1 )和（1-2 ) ,
2nldl = (2m, - \)λ Ι 2 公式 ( 1-1 )
Figure imgf000019_0001
= (2m2 -1)1/2 公式 ( 1-2 ) 其中 ni为第一消隐层的折射率，（^为第一消隐层的厚度， l为任意正整 数， n2为第二消隐层的折射率， d2为第二消隐层的厚度， 2为任意正整数， 为环境光波长。
4、根据权利要求 2所述的触摸屏，还包括位于与所述第一电极和所述第 二电极中的所述至少一个相对应的区域的导电层， 使得所述第一电极和所述 第二电极中的所述至少一个位于所述导电层与所述基板之间。
5、根据权利要求 1或 3所述的触摸屏， 其中， 所述桥接构件在所述基板 上的投影位于所述消隐构件在所述基板上的投影内。
6、根据权利要求 1至 5中任一项所述的触摸屏， 其中， 所述第二消隐层 层叠在所述第一消隐层上，且所述第一消隐层的面积等于第二消隐层的面积。
7、根据权利要求 1至 6中任一项所述的触摸屏， 其中， 所述桥接构件的 材质为单一金属或合金， 优选为钼、 铝、 钼合金或铝合金。
8、根据权利要求 1至 6中任一项所述的触摸屏， 其中， 所述第一消隐层 和 /或所述第二消隐层的材质为金属氧化物、 金属氮化物、 金属氮氧化物、 合 金氧化物、 合金氮化物， 或合金氮氧化物。
9、 根据权利要求 7所述的触摸屏， 其中， 所述第一消隐层和 /或所述第 二消隐层的材质为所述桥接构件所包含的至少一种金属的氧化物、 氮化物、 或氮氧化物。
10、根据权利要求 1所述的触摸屏， 其中， 所述第二电极、 所述绝缘层、 所述第一消隐层、 所述第二消隐层、 所述桥接构件在远离所述基板的方向上 以所述顺序依次设置。
11、 根据权利要求 1所述的触摸屏， 其中， 所述第一消隐层、 所述第二 消隐层、 所述桥接构件、 所述绝缘层、 所述第二电极在远离所述基板的方向 上以所述顺序依次设置。
12、 根据权利要求 1所述的触摸屏， 其中， 所述消隐构件与所述第一电 极保持绝缘， 所述第一消隐层、 所述第二消隐层、 所述第二电极、 所述绝缘 层、 所述桥接构件在远离所述基板的方向上以所述顺序依次设置。
13、 根据权利要求 2所述的触摸屏， 其中， 所述第一电极由一个第一消 隐层和一个第二消隐层构成， 所述第二电极由另一第一消隐层和另一第二消 隐层构成， 且所述一个第一消隐层、 一个第二消隐层、 所述绝缘层、 所述另 一第一消隐层和另一第二消隐层在远离所述基板的方向上依次设置。
14、 一种触摸屏的制作方法， 包括如下步骤：
在基板上形成多条交叉排列的第一电极和第二电极； 第一电极在与第二 电极交叉的区域断开以形成多个第一子电极； 第一电极和第二电极为透明电 极；
在基板上形成用于连接同一第一电极内的任意相邻两个第一子电极的桥 接层；
在基板上与所述桥接层对应的区域依次形成第一消隐层和第二消隐层， 用于减少对于外界光线的反射。
15、根据权利要求 14所述的方法， 其中， 所述第一消隐层和第二消隐层 的致密度不同， 所述消隐构件设置于所述基板与所述桥接构件之间。
16、 根据权利要求 14或 15所述的方法， 其中所述第一消隐层和所述第 二消隐层的形成包括：
通过磁控溅射法在含有氧气、 氮气或氮氧混合气体的腔体中以金属或合 金为靶材制作所述第一消隐层；
通过磁控溅射法在含有氧气、 氮气或氮氧混合气体的腔体中以金属或合 金为靶材制作所述第二消隐层；
当用于形成所述第一消隐层和第二消隐层的靶材相同时， 制作第一消隐 层和第二消隐层时通入腔体中的气体类型不同， 或气体类型相同但通气量不 同。
17、 一种触摸屏的制作方法， 包括：
在基板上形成多条交叉排列的第一电极和第二电极， 其中所述第一电极 包括至少两层叠层设置的消隐层，和 /或所述第二电极包括至少两层叠层设置 的消隐层， 叠层设置的各消隐层为致密度不同的具有降低光线反射作用的膜 层；
在基板上形成位于所述交叉区域用于绝缘第一电极和第二电极的绝缘 层。
18、 根据权利要求 17所述的方法， 其中， 所述第一电极的形成包括： 在所述基板上依次形成第一消隐层和第二消隐层作为第一电极； 在形成有所述第一电极的基板上形成绝缘层；
在形成有所述绝缘层的基板上形成所述第二电极。
19、根据权利要求 18所述的方法， 其中， 所述第二电极的形成包括在所 述基板上依次形成第一消隐层和第二消隐层作为第二电极。
20、 根据权利要求 18或 19所述的方法， 其中， 所述第一消隐层和所述 第二消隐层的形成包括：
通过磁控溅射法在含有氧气、 氮气或氮氧混合气体的腔体中以金属或合 金为靶材制作所述第一消隐层；
通过磁控溅射法在含有氧气、 氮气或氮氧混合气体的腔体中以金属或合 金为靶材制作所述第二消隐层；
当用于形成所述第一消隐层和第二消隐层的靶材相同时， 制作第一消隐 层和第二消隐层时通入腔体中的气体类型不同， 或气体类型相同但通气量不 同。
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