WO2015000263A1 - 曝光装置及其曝光方法 - Google Patents

曝光装置及其曝光方法 Download PDF

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Publication number
WO2015000263A1
WO2015000263A1 PCT/CN2013/088901 CN2013088901W WO2015000263A1 WO 2015000263 A1 WO2015000263 A1 WO 2015000263A1 CN 2013088901 W CN2013088901 W CN 2013088901W WO 2015000263 A1 WO2015000263 A1 WO 2015000263A1
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WO
WIPO (PCT)
Prior art keywords
marking
exposure
guide rail
rail frame
vehicle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2013/088901
Other languages
English (en)
French (fr)
Inventor
马海涛
赵海生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Beijing BOE Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US14/386,245 priority Critical patent/US9523920B2/en
Publication of WO2015000263A1 publication Critical patent/WO2015000263A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2045Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70541Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Definitions

  • Embodiments of the present invention relate to an exposure apparatus and an exposure method thereof. Background technique
  • the manufactured product needs to be marked, that is, the identification of the product such as ID information and two-dimensional code is made on the substrate, so that the subsequent project realizes the automation of the computer and can trace the product state.
  • the marking device is used to expose each product on the substrate one by one, and then developed, etched, peeled, etc.
  • the first layer circuit pattern and the logo pattern are formed, thereby achieving marking of the product.
  • the exposure of the circuit pattern and the exposure of the marking pattern are performed separately, and the exposure of the marking pattern is an exposure of the identification pattern of each product on the substrate one by one, which leads to an exposure process.
  • the time is too long, which seriously affects production capacity.
  • An embodiment of the present invention provides an exposure apparatus including an exposure lamp, a mask, and a marking device; the marking device includes:
  • the rail frame is disposed on the mask plate
  • At least one marking vehicle the marking vehicle being disposed on the rail frame;
  • a controller configured to control the rail frame to move to a corresponding exposure position on the mask plate before the exposure lamp, and control the marking vehicle to be in a corresponding marking position, and display a corresponding marking identifier.
  • the marking vehicle is a mask for forming a logo pattern.
  • the marking vehicle includes a body module and a display module assembled together;
  • the display module includes: an identification display area and a light transmissive buffer area, wherein the light transmission buffer area is located in the vehicle body Between the module and the identification display area;
  • the marking display area is configured to display a corresponding marking identifier when the marking vehicle is in a corresponding marking position; and the light transmission buffering area performs light transmission display.
  • the controller is configured to control the identification display area of the marking vehicle to perform light transmission display.
  • the rail frame is controlled to start moving, so that the rail frame moves to the second exposure position of the mask plate before the exposure lamp.
  • the moving speed of the exposure lamp when the mask is exposed is 0.2-0.3 m/s
  • the controller controls the moving speed of the rail frame to be 3.0-6.0 m/s.
  • an infrared detector is disposed on the rail frame and the marking vehicle, and the infrared detector is configured to detect a position of the marking vehicle and the rail frame on the mask.
  • the controller is configured to receive, by a wireless transmission technology, a position of the rail frame detected by the infrared detector on the mask, and control the rail frame to move to the mask board. Corresponding exposure position, and then receiving the position of the marking vehicle detected by the infrared detector on the mask board by wireless transmission technology, and then transmitting a control signal control station to the marking vehicle by wireless transmission technology The marking vehicle is in the corresponding marking position, and the corresponding marking identifier is displayed.
  • the apparatus further includes a linear motor
  • the linear motor is connected to the rail frame for driving the rail frame to move linearly on the mask plate in a direction perpendicular to the rail frame;
  • the controller is configured to control movement of the rail frame by controlling a linear motor.
  • the exposure machine is configured to perform a progressive exposure of the mask, the direction of movement of the rail is perpendicular to a row direction, and the rail is configured to control the marking vehicle at Move in the direction of the line.
  • the exposure lamp, the marking vehicle, and the mask are sequentially disposed in this order in the direction of propagation of the light emitted by the exposure lamp.
  • the portion of the mask corresponding to the location where marking is desired is light transmissive.
  • Another embodiment of the present invention provides an exposure method using the above exposure apparatus, the method comprising the steps of:
  • the controller controls the rail frame to move to a corresponding exposure position on the mask plate before the exposure lamp, and controls the marking vehicle to be in a corresponding marking position, and displays a corresponding marking identifier.
  • the marking vehicle includes a body module and a display module assembled together; the display module includes: an identification display area and a light transmissive buffer area, wherein the light transmission buffer area is located in the vehicle body Between the module and the identifier display area; wherein the identifier display area is configured to display a corresponding marking identifier when the marking vehicle is in a corresponding marking position; ;
  • the controller controls the rail frame to move to a corresponding exposure position on the mask plate before the exposure lamp, and controls the marking vehicle to be in a corresponding marking position, and displaying the corresponding marking identifier includes:
  • the controller controls the identification display area of the marking vehicle to perform light transmission display while controlling the guide rail
  • the carriage begins to move, causing the rail frame to move to a second exposure position on the mask plate prior to the exposure lamp.
  • the moving speed of the exposure lamp when the mask is exposed is 0.2-0.3 m/s
  • the controller controls the moving speed of the rail frame to be 3.0-6.0 m/s.
  • an infrared detector is disposed on the rail frame and the marking vehicle, and the infrared detector is configured to detect a position of the marking vehicle and the rail frame on the mask board.
  • the controller controls the marking vehicle to be in the corresponding marking position, and displays the corresponding marking identifier, including: the controller receiving the rail frame detected by the infrared detector by using a wireless transmission technology Positioning on the mask, controlling the rail frame to move to a corresponding exposure position on the mask, and then receiving the marking vehicle detected by the infrared detector in the mask by wireless transmission technology The position on the board is then sent to the marking vehicle by a wireless transmission technology to control the marking vehicle to be in the corresponding marking position, and the corresponding marking identifier is displayed.
  • the exposure apparatus further includes a linear motor; the linear motor is coupled to the rail frame for driving the rail frame on the mask plate in a direction perpendicular to the rail frame Moving in a straight line, the controller controlling the movement of the rail frame includes:
  • the controller controls the movement of the rail frame by controlling a linear motor.
  • the exposure device provided by the above technical solution and the exposure method thereof, by controlling the guide frame to move to the corresponding exposure position on the mask plate by the controller, and controlling the marking vehicle to be in control Corresponding marking position, displaying a corresponding marking identifier, waiting for the exposure lamp to move to the exposure position to complete exposure of the marking pattern at the exposure position, such that the exposure lamp is finished At the same time as the exposure of the circuit pattern, the mark position on the mask is also exposed, and the exposure of the logo pattern is completed.
  • the mask is first exposed, and then the exposure of the marking pattern is performed one by one, which greatly saves the exposure process time and increases the productivity.
  • FIG. 1 is a schematic structural diagram of an exposure apparatus according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural diagram of a marking vehicle according to an embodiment of the present invention.
  • FIG. 3 is a schematic diagram of movement of a marking vehicle during an exposure process according to an embodiment of the present invention. detailed description
  • the exposure apparatus includes an exposure lamp 1, a mask 2, and a marking device 3.
  • the marking device 3 includes a rail frame 31, and the rail A frame 31 is disposed on the masking plate 2; at least one marking vehicle 32, and the marking vehicle 32 is disposed on the rail frame 31.
  • the controller 34 is configured to control the rail frame 31 to move to a corresponding exposure position on the mask 2 before the exposure lamp 1 and control the marking vehicle 32 to move to a corresponding marking position, and display The corresponding marking mark.
  • the exposure position and the marking position on the mask 2 are determined, and the exposure lamp 1 is a linear light source, and the horizontal movement is performed with respect to the mask 1 to perform one-line exposure operation.
  • the exposure position refers to a position on the upper line of the mask 1 that needs to be exposed to the identification pattern
  • the marking position refers to a position corresponding to each of the identification patterns that need to be exposed at the exposure position. Therefore, preferably, the number of marking vehicles on the rail frame is the number of marking positions included in one row of the mask. Normally, the marking positions at the respective exposure positions are the same. After the marking vehicle moves to the corresponding marking position at the first exposure position, the controller does not need to be again at the next exposure position. Control to move the marking vehicle.
  • the controller needs to control after controlling the rail frame to move to the next exposure position on the mask board first than the exposure lamp
  • the marking vehicle moves to a corresponding marking position.
  • the exposure machine is configured to perform progressive exposure of the mask
  • the direction of movement of the rail is perpendicular to the row direction
  • the rail is configured to control the marking vehicle in the row direction mobile.
  • the exposure lamp 1 is horizontally moved to expose the mask 2 in a row, and the controller 34 controls the corresponding movement of the rail frame 31 to the mask 2 before the exposure lamp 1 is moved.
  • the exposure position when the exposure lamp moves to the corresponding exposure position where the rail frame 1 is located, the exposure of the identification pattern can be completed, after the exposure of the marking position at the corresponding exposure position is completed, the control
  • the slider 34 controls the rail frame 31 to move to the next exposure position, waiting for the exposure lamp 1 to move to the next exposure position to complete the exposure of the logo pattern at the next exposure position.
  • the exposure lamp 1 exposes the mask 2 once to complete the exposure of the circuit pattern, and also exposes all the marked positions on the mask to complete the exposure of the logo pattern.
  • the first corresponding exposure position is the exposure position closest to the boundary of the mask 2.
  • the exposure apparatus provided by the embodiment of the invention can complete the exposure of the marking pattern while completing the exposure of the circuit pattern, which greatly saves the exposure process time and improves the productivity compared with the multiple exposures in the prior art.
  • the marking vehicle 32 includes a body module 321 and a display module 322 assembled together; the display module 322 includes: an identification display area 3221 and a light-transmissive buffer area 3222, The light-transmissive buffer region 3222 is located between the vehicle body module 321 and the marker display region 3221.
  • the identification display area 3221 is configured to display a corresponding marking identifier when the marking vehicle 32 is in the corresponding marking position; the light transmission buffer area 3222 is configured to perform light transmission display.
  • the exposure lamp 1 Since the marking position on the mask 2 is fixed, when the exposure lamp 1 exposes other portions of the mask 2, the rail frame first moves to the exposure position, and the marking vehicle moves to the corresponding marking position. , the corresponding marking mark is displayed. As shown in FIG. 3, at time T1, the exposure lamp 1 is to be moved to the exposure position; at time T2, the exposure lamp 1 completes exposure at the identification display area 3221 of the marking vehicle corresponding to the marking position. At this time, the exposure lamp 1 is about to enter the light-transmissive buffer area. 3222, the light-transmissive buffer area 3222 prevents the vehicle body module 321 from blocking the light of the exposure lamp.
  • the indicator display area 3221 becomes a light-transmitting display.
  • the rail frame 31 starts to move to the next marking position, and the moving speed of the rail frame is greater than the moving speed of the exposure lamp, and FIG. 3 shows the time T3 before the rail frame 31 moves to the next exposure position, The relative position of the exposure lamp 1 and the marking vehicle 32.
  • the moving speed of the exposure lamp is 0.2-0.3 m/s
  • the moving speed of the rail frame is
  • an infrared detector (not shown) is disposed on the rail frame 31 and the N marking vehicles 32, and the infrared detector is used to detect the marking vehicle 32 and the rail frame 31. The position on the mask 2.
  • the infrared detector can detect the distance between the marking vehicle and the rail frame, the marking vehicle and the marking vehicle through infrared detection, thereby detecting that each marking vehicle and the rail frame 31 are in the mask board.
  • the upper position such that the marking vehicle 3 and the rail frame 312 can be moved to the corresponding position on the mask 2 by the control of the controller 34.
  • the controller 34 can receive the position of the rail frame 31 detected by the infrared detector on the mask 2 by wireless transmission technology, and control the rail frame 31 to move to the mask board. 2 corresponding exposure position.
  • the controller 34 can also receive the position of the marking vehicle 32 detected by the infrared detector on the mask board by wireless transmission technology, and then send a control signal to the marking vehicle through a wireless transmission technology.
  • the marking vehicle is controlled to move to the corresponding marking position, and the corresponding marking identifier is displayed. This avoids the interference with the exposure process caused by the data lead to control the marking vehicle in the prior art.
  • the exposure apparatus further includes a linear motor 33, and the linear motor 33 is connected to the rail frame 31 for driving the rail frame 31 along the mask 2
  • the direction in which the rail frame 31 is perpendicular is linearly moved.
  • the controller 34 controls the movement of the rail frame by controlling the linear motor 33.
  • the marking cart 32 is a mask for forming a logo pattern.
  • the marking vehicle can also be called a marking mask. That is to say, the light source for marking and the light source for performing circuit pattern exposure can use the same light source, and the exposure of the circuit pattern and the exposure of the logo pattern can be completed simultaneously.
  • the exposure lamp 1, the marking cart 32, and the masking plate 2 are sequentially disposed in this order.
  • the portion of the mask 2 corresponding to the position where the marking is required is light-transmitting, so that when the marking operation is performed, the light emitted from the exposure lamp 1 can pass through the pattern of the marking vehicle and then pass through the mask. Plate 2, to expose the logo pattern.
  • the process of forming the marking can be the same as the process of forming the circuit pattern.
  • the logo pattern can be formed by a process such as development, etching, or the like.
  • An embodiment of the present invention further provides an exposure method, wherein the exposure method uses the above exposure apparatus, and includes the following steps:
  • the exposure lamp is horizontally moved to expose the mask.
  • the controller controls the rail frame to move to a corresponding exposure position on the mask board before the exposure lamp, and controls the marking vehicle to be in a corresponding marking position, and displays a corresponding marking identifier.
  • step 101 is completed, and after exposing the mask to an exposure, the exposure of the circuit pattern and the logo pattern is completed at the same time. Compared with the multiple exposures in the prior art, the exposure process time is greatly saved, and the productivity is improved.
  • the marking vehicle 32 includes a body module 321 and a display module 322 assembled together;
  • the display module 322 includes: a display display area 3221 and a light-transmissive buffer area 3222, the light transmission
  • the buffer area 3222 is located between the vehicle body module 321 and the identification display area 3221, and the identification display area is used to display a corresponding marking identifier when the marking vehicle is in a corresponding marking position;
  • the light buffer area is transparently displayed.
  • step 102 specifically includes the following steps:
  • the controller controls the identification display area of the marking vehicle to perform light transmission display, and simultaneously controls the The rail frame begins to move, causing the rail frame to move to a second exposure position on the mask plate prior to the exposure lamp.
  • the rail frame first moves to the exposure position, and the marking vehicle moves to the corresponding reaching position, and the corresponding display Marking logo.
  • the exposure lamp 1 is to be moved to the exposure position; at time T2, the exposure lamp 1 completes the identification of the marking vehicle at the corresponding marking position.
  • the exposure light 1 enters the light-transmissive buffer area 3222, and the light-transmissive buffer area 3222 prevents the vehicle body module 321 from blocking the light of the exposure lamp.
  • FIG. 3 shows the relative position of the exposure lamp 1 and the marking vehicle 32 at time T3 before the rail frame 31 is moved to the next marking position.
  • the moving speed of the exposure lamp is 0.2-0.3 m/s
  • the moving speed of the rail frame is 3.0-6.0 m/s.
  • An infrared detector is disposed on the rail frame and the marking vehicle, and the infrared detector is configured to detect a position of the marking vehicle and the rail frame on the mask board, and then steps 102 and 103
  • the controller described in the control unit moves the marking vehicle to a corresponding marking position, and displays a corresponding marking identifier, including:
  • the exposure apparatus further includes a linear motor 33, wherein the controller controls the movement of the rail frame, and the linear motor is connected to the rail frame for driving the rail frame on the mask edge
  • the linear movement of the direction perpendicular to the rail frame, the controller controlling the movement of the rail frame comprises: the controller controlling the movement of the rail frame by controlling a linear motor.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

提供了一种曝光装置及其曝光方法。曝光装置包括曝光灯(1)、掩膜板(2)和打标设备(3)。打标设备(3)包括:设置在掩膜板(2)上的导轨架(31),设置在导轨架(31)上的至少一个打标车(32),控制器(34)。控制器(34)用于控制导轨架(31)比曝光灯(1)先移动到掩膜板(2)上相应的曝光位置,并控制打标车(32)处于相应的打标位置,显示相应的打标标识。

Description

曝光装置及其曝光方法 技术领域
本发明的实施例涉及一种曝光装置及其曝光方法。 背景技术
在阵列基板的制作工艺中, 需要对制作的产品进行打标, 即在基板上制 作产品的标识如 ID信息和二维码, 以便后续工程实现电算自动化并且能够 追溯产品状态。
在生产小尺寸(7inch以下)产品时, 5代线一张基板上一般可以制作上 百个产品。 通常在基板上完成各个产品的第一层电路图案的曝光完成后, 就 使用所述打标设备对基板上的每个产品逐一进行标识图案的曝光, 然后进行 显影、 刻蚀、 剥离等工艺制作形成第一层电路图案和标识图案, 进而实现产 品的打标。
在上述曝光的过程中, 对电路图案的曝光和对标识图案的曝光是分开进 行的,且对标识图案的曝光是对基板上的每个产品逐一进行标识图案的曝光, 这就会导致曝光工艺的时间太长, 严重影响产能。 发明内容
本发明的一个实施例提供一种曝光装置, 包括曝光灯、 掩膜板和打标设 备; 所述打标设备包括:
导轨架, 所述导轨架设置在所述掩膜板上;
至少一个打标车, 所述打标车设置在所述导轨架上;
控制器, 用于控制所述导轨架比所述曝光灯先移动到所述掩膜板上相应 的曝光位置,并控制所述打标车处于相应的打标位置,显示相应的打标标识。
在一个示例中, 所述打标车为用于形成标识图案的掩膜。
在一个示例中, 所述打标车包括组装在一起的车体模块和显示屏模块; 所述显示屏模块包括: 标识显示区域和透光緩沖区域, 所述透光緩沖区 域位于所述车体模块和所述标识显示区域之间; 所述标识显示区域用于在所述打标车处于相应的打标位置, 显示相应的 打标标识; 所述透光緩沖区域进行透光显示。
在一个示例中, 所述曝光灯对所述掩膜板上的第一曝光位置处的打标位 置曝光完成后, 所述控制器用于控制所述打标车的标识显示区域进行透光显 示, 同时控制所述导轨架开始移动, 使所述导轨架比所述曝光灯先移动到所 述掩膜板的第二曝光位置。
在一个示例中, 所述曝光灯对所述掩膜板进行曝光时的移动速度为 0.2-0.3m/s, 所述控制器控制所述导轨架的移动速度为 3.0-6.0m/s。
在一个示例中, 所述导轨架和所述打标车上都设置有红外探测器, 所述 红外探测器用于探测所述打标车和所述导轨架在所述掩膜板上的位置。
在一个示例中, 所述控制器用于通过无线传输技术接收所述红外探测器 探测到的所述导轨架在所述掩膜板上的位置, 控制所述导轨架移动到所述掩 膜板上相应的曝光位置, 然后通过无线传输技术接收所述红外探测器探测到 的所述打标车在所述掩膜板上的位置, 然后通过无线传输技术向所述打标车 发送控制信号控制所述打标车处于相应的打标位置, 显示相应的打标标识。
在一个示例中, 所述装置还包括直线电机;
所述直线电机, 连接所述导轨架, 用于驱动所述导轨架在所述掩膜板上 沿着与所述导轨架垂直的方向进行直线移动;
所述控制器, 用于通过控制直线电机控制所述导轨架的移动。
在一个示例中, 所述曝光机被配置为对所述掩膜板进行逐行曝光, 所述 导轨移动的方向垂直于行方向, 且所述导轨被配置为能够控制所述打标车在 所述行方向上移动。
在一个示例中, 在所述曝光灯发出的光线的传播方向上, 所述曝光灯、 所述打标车和所述掩膜板以该顺序依次设置。
在一个示例中, 所述掩膜板的对应于需要打标的位置的部分是透光的。 本发明的另一个实施例提供一种曝光方法, 应用上述的曝光装置, 所述 方法包括以下步骤:
曝光灯水平移动对掩膜板进行曝光;
控制器控制所述导轨架比所述曝光灯先移动到所述掩膜板上相应的曝光 位置, 并控制所述打标车处于相应的打标位置, 显示相应的打标标识。 在一个示例中, 所述打标车包括组装在一起的车体模块和显示屏模块; 所述显示屏模块包括: 标识显示区域和透光緩沖区域, 所述透光緩沖区域位 于所述车体模块和所述标识显示区域之间; 其中, 所述标识显示区域用于在 所述打标车处于相应的打标位置时, 显示相应的打标标识; 所述透光緩沖区 域进行透光显示;
所述控制器控制所述导轨架比所述曝光灯先移动到所述掩膜板上相应的 曝光位置, 并控制所述打标车处于相应的打标位置, 显示相应的打标标识包 括:
在所述曝光灯对所述掩膜板上的第一曝光位置处的标识显示区域曝光完 成后, 所述控制器控制所述打标车的标识显示区域进行透光显示, 同时控制 所述导轨架开始移动, 使所述导轨架比所述曝光灯先移动到所述掩膜板上的 第二曝光位置。
在一个示例中, 所述曝光灯对所述掩膜板进行曝光时的移动速度为 0.2-0.3m/s, 所述控制器控制所述导轨架的移动速度为 3.0-6.0m/s。
在一个示例中, 所述导轨架和所述打标车上都设置有红外探测器, 所述 红外探测器用于探测所述打标车和所述导轨架在所述掩膜板上的位置, 则所 述控制器控制所述打标车处于相应的打标位置,显示相应的打标标识, 包括: 所述控制器通过无线传输技术接收所述红外探测器探测到的所述导轨架 在所述掩膜板上的位置, 控制所述导轨架移动到所述掩膜板上相应的曝光位 置, 然后通过无线传输技术接收所述红外探测器探测到的所述打标车在所述 掩膜板上的位置, 然后通过无线传输技术向所述打标车发送控制信号控制所 述打标车处于相应的打标位置, 显示相应的打标标识。
在一个示例中, 所述曝光装置还包括直线电机; 所述直线电机, 连接所 述导轨架, 用于驱动所述导轨架在所述掩膜板上沿着与所述导轨架垂直的方 向进行直线移动, 则所述控制器控制所述导轨架移动包括:
所述控制器通过控制直线电机控制所述导轨架的移动。
上述技术方案提供的一种曝光装置及其曝光方法, 通过用控制器控制所 述导轨架比所述曝光灯先移动到所述掩膜板上相应的曝光位置, 并控制所述 打标车处于相应的打标位置, 显示相应的打标标识, 等待所述曝光灯移动到 该曝光位置完成对该曝光位置处标识图案的曝光, 这样所述曝光灯在完成对 电路图案的曝光的同时, 也对掩膜板上的标识位置处进行了曝光, 完成了对 标识图案的曝光。 与现有技术中的先对掩膜板进行一次曝光, 再进行对标识 图案的逐一曝光相比, 大大节省了曝光工艺的时间, 提高产能。 附图说明
为了更清楚地说明本发明实施例的技术方案, 下面将对实施例的附图作 筒单地介绍,显而易见地,下面描述中的附图仅仅涉及本发明的一些实施例, 而非对本发明的限制。
图 1为本发明实施例提供的一种曝光装置的结构示意图;
图 2为本发明实施例提供的一种打标车的结构示意图;
图 3为本发明实施例提供的一种曝光过程中的打标车移动示意图。 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚, 下面将结合本发 明实施例的附图,对本发明实施例的技术方案进行清楚、 完整地描述。显然, 所描述的实施例是本发明的一部分实施例, 而不是全部的实施例。 基于所描 述的本发明的实施例, 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例, 都属于本发明保护的范围。
本发明实施例提供了一种曝光装置, 如图 1所示, 所述曝光装置包括曝 光灯 1、 掩膜板 2和打标设备 3 , 所述打标设备 3包括导轨架 31 , 所述导轨 架 31设置在所述掩膜板 2上; 至少一个打标车 32, 所述打标车 32设置在所 述导轨架 31上。 控制器 34, 用于控制所述导轨架 31比所述曝光灯 1先移动 到所述掩膜板 2上相应的曝光位置,并控制所述打标车 32移动至相应的打标 位置, 显示相应的打标标识。
在这里需要说明的是,所述掩膜板 2上的曝光位置和打标位置是确定的, 曝光灯 1为线性光源, 相对于所述掩膜板 1进行水平运动, 进行一行行的曝 光操作。 所述曝光位置就是指掩膜板 1上一行需要曝光出标识图案的位置, 所述打标位置是指所述曝光位置上需要曝光出的各个标识图案对应的位置。 故优选的, 所述导轨架上的打标车的个数为所述掩膜板上一行所包含的打标 位置的个数。 通常情况下, 各曝光位置处的打标位置都是相同的, 在第一曝光位置处 所述打标车移动至相应的打标位置后, 在下一曝光位置处所述控制器并不需 要再次控制移动所述打标车。 当掩膜板上各曝光位置处的打标位置不同时, 所述控制器在控制所述导轨架比所述曝光灯先移动到所述掩膜板上的下一曝 光位置后, 还需要控制所述打标车移动至相应的打标位置。 例如, 所述曝光 机被配置为对所述掩膜板进行逐行曝光,所述导轨移动的方向垂直于行方向, 且所述导轨被配置为能够控制所述打标车在所述行方向上移动。
综上所述, 曝光灯 1水平移动对掩膜板 2进行一行行的曝光, 所述控制 器 34控制所述导轨架 31比所述曝光灯 1先移动到所述掩膜板 2上的相应的 曝光位置, 当所述曝光灯移动到所述导轨架 1所处的相应的曝光位置时, 就 可以完成标识图案的曝光, 在该相应曝光位置处的打标位置曝光完成后, 所 述控制器 34就会控制所述导轨架 31先移动到下一曝光位置, 等待所述曝光 灯 1移动到所述下一曝光位置完成所述下一曝光位置处标识图案的曝光。 这 样曝光灯 1对掩膜板 2进行一次曝光, 完成对电路图案的曝光的同时, 也对 掩膜板上所有标识位置处进行了曝光, 完成了对标识图案的曝光。 在这里, 在所述曝光灯 1最开始从所述掩膜板 2的一个边界进行曝光时, 第一个相应 的曝光位置是离所述掩膜板 2的该边界最近的曝光位置。
本发明实施例提供的曝光装置, 可以在完成电路图案的曝光的同时, 也 完成了标识图案的曝光, 与现有技术中的多次曝光相比, 大大节省了曝光工 艺的时间, 提高产能。
例如,如图 2所示,所述打标车 32包括组装在一起的车体模块 321和显 示屏模块 322; 所述显示屏模块 322包括: 标识显示区域 3221和透光緩沖区 域 3222, 所述透光緩沖区域 3222位于所述车体模块 321和所述标识显示区 域 3221之间。所述标识显示区域 3221用于在所述打标车 32处于相应的打标 位置时, 显示相应的打标标识; 所述透光緩沖区域 3222用于进行透光显示。
由于掩膜板 2上的打标位置是固定的, 在曝光灯 1曝光掩膜板 2的其他 部分时,所述导轨架先移动至曝光位置,所述打标车移动到相应的打标位置, 显示相应的打标标识。 如图 3所示, T1时刻, 所述曝光灯 1将要移动至所述 曝光位置; T2时刻, 所述曝光灯 1完成在对应打标位置的所述打标车的标识 显示区域 3221处的曝光;此时,所述曝光灯 1就要进入了所述透光緩沖区域 3222 , 所述透光緩沖区域 3222避免了车体模块 321遮挡曝光灯的光线, 在 T2时刻所述曝光灯的光线移动将要超出标识显示区域 3221时, 标识显示区 域 3221变成透光显示, 同时所述导轨架 31开始移动至下一打标位置, 且导 轨架的移动速度大于所述曝光灯的移动速度,图 3显示了在导轨架 31移动至 下一曝光位置之前的 T3时刻, 所述曝光灯 1和打标车 32的相对位置。
例如, 此时曝光灯的移动速度为 0.2-0.3m/s, 所述导轨架的移动速度为
Figure imgf000008_0001
例如, 所述导轨架 31和所述 N个打标车 32上都设置有红外探测器(图 中未显示 ) , 所述红外探测器用于探测所述打标车 32和所述导轨架 31在所 述掩膜板 2上的位置。
所述红外探测器可以通过红外探测, 检测到打标车与导轨架, 打标车与 打标车之间的距离,从而探测到各个打标车和所述导轨架 31在所述掩膜板上 的位置,这样所述打标车 3和所述导轨架 312就可以通过控制器 34的控制移 动到所述掩膜板 2上相应的位置。
例如,所述控制器 34可以通过无线传输技术接收所述红外探测器探测到 的所述导轨架 31在所述掩膜板 2上的位置, 控制所述导轨架 31移动到所述 掩膜板 2上相应的曝光位置。所述控制器 34还可以通过无线传输技术接收所 述红外探测器探测到的所述打标车 32在所述掩膜板上的位置,然后通过无线 传输技术向所述打标车发送控制信号控制所述打标车移动至相应的打标位 置, 显示相应的打标标识。 这样就避免了现有技术中的通过数据引线来控制 打标车所造成的对曝光工艺的干扰。
例如, 如图 1所示, 所述曝光装置还包括直线电机 33 , 所述直线电机 33 连接所述导轨架 31 , 用于驱动所述导轨架 31在所述掩膜板 2上沿着与所述 导轨架 31垂直的方向进行直线移动。 此时, 所述控制器 34就会通过控制直 线电机 33来控制所述导轨架的移动。
例如, 打标车 32为用于形成标识图案的掩膜。 进行打标操作时, 利用曝 光灯 1发出的光线透过所述打标车 32的图案, 以进行形成打标标识的曝光。 因此, 打标车也可以称为打标掩膜。 也就是说, 进行打标的光源和进行电路 图案曝光的光源可以使用相同的光源, 电路图案的曝光和标识图案的曝光可 以同步完成。 例如, 在曝光灯 1的发出的光线的传播方向上, 曝光灯 1、 打标车 32和 掩膜板 2以该顺序依次设置。
例如, 掩膜板 2对应于需要打标位置处的部分是透光的, 因此, 在进行 打标操作时, 从曝光灯 1发出的光线能够透过打标车的图案, 然后透过掩膜 板 2, 以曝光出标识图案。
例如, 在完成曝光之后, 形成打标的过程可以与形成电路图案的工艺相 同。 例如, 可以通过显影、 刻蚀等工艺形成标识图案。
本发明实施例还提供了一种曝光方法, 所述曝光方法应用上述的曝光装 置, 包括以下步骤:
101、 曝光灯水平移动对掩膜板进行曝光。
102、控制器控制所述导轨架比所述曝光灯先移动到所述掩膜板上相应的 曝光位置, 并控制所述打标车处于相应的打标位置, 显示相应的打标标识。
控制器在进行步骤 101的同时, 循环进行步骤 102, 直至所述掩膜板上 的曝光位置全部被曝光。 这样完成步骤 101 , 对所述掩膜板进行一次曝光后, 就同时完成了对电路图案和标识图案的曝光。与现有技术中的多次曝光相比, 大大节省了曝光工艺的时间, 提高产能。
如图 2所示,所述打标车 32包括组装在一起的车体模块 321和显示屏模 块 322;所述显示屏模块 322包括:标识显示区域 3221和透光緩沖区域 3222, 所述透光緩沖区域 3222位于所述车体模块 321和所述标识显示区域 3221之 间, 所述标识显示区域用于在所述打标车处于相应的打标位置, 显示相应的 打标标识; 所述透光緩沖区域进行透光显示; 此时, 步骤 102具体包括以下 步骤:
1021 , 在所述曝光灯对所述掩膜板上的第一曝光位置处的标识显示区域 曝光完成后, 所述控制器控制所述打标车的标识显示区域进行透光显示, 同 时控制所述导轨架开始移动, 使所述导轨架比所述曝光灯先移动到所述掩膜 板上的第二曝光位置。
由于掩膜板 2上的打标位置是固定的, 在曝光灯曝光掩膜板的其他部分 时, 所述导轨架先移动至曝光位置, 所述打标车移动到相应的达标位置, 显 示相应的打标标识。 如图 3所示, T1时刻, 所述曝光灯 1将要移动至所述曝 光位置; T2时刻, 所述曝光灯 1完成在对应打标位置的所述打标车的标识显 示区域 3221处的曝光; 此时, 所述曝光灯 1就要进入了所述透光緩沖区域 3222, 所述透光緩沖区域 3222避免了车体模块 321遮挡曝光灯的光线, 在 T2时刻所述曝光灯的光线移动将要超出标识显示区域 3221时, 标识显示区 域 3221变成透光显示, 同时所述导轨架 31开始移动至下一打标位置, 且导 轨架的移动速度大于所述曝光灯的移动速度。图 3显示了在导轨架 31移动至 下一打标位置之前的 T3时刻,所述曝光灯 1和打标车 32的相对位置。例如, 此时曝光灯的移动速度为 0.2-0.3m/s, 所述导轨架的移动速度为 3.0-6.0m/s。
所述导轨架和所述打标车上都设置有红外探测器, 所述红外探测器用于 探测所述打标车和所述导轨架在所述掩膜板上的位置, 则步骤 102和 103中 所述的所述控制器控制所述打标车移动至相应的打标位置, 显示相应的打标 标识, 包括:
所述控制器通过无线传输技术接收所述红外探测器探测到的所述导轨架 在所述掩膜板上的位置, 控制所述导轨架移动到所述掩膜板上相应的曝光位 置, 然后通过无线传输技术接收所述红外探测器探测到的所述打标车在所述 掩膜板上的位置, 再通过无线传输技术向所述打标车发送控制信号控制所述 打标车处于相应的打标位置, 显示相应的打标标识。 这样就避免了现有技术 中的通过数据引线来控制打标车所造成的对曝光工艺的干扰。
例如, 所述曝光装置还包括直线电机 33 , 则所述控制器控制所述导轨架 移动, 所述直线电机, 连接所述导轨架, 用于驱动所述导轨架在所述掩膜板 上沿着与所述导轨架垂直的方向进行直线移动, 则所述控制器控制所述导轨 架移动包括: 所述控制器通过控制直线电机控制所述导轨架的移动。
以上所述仅是本发明的示范性实施方式, 而非用于限制本发明的保护范 围, 本发明的保护范围由所附的权利要求确定。

Claims

权利要求书
1、一种曝光装置, 包括曝光灯、掩膜板和打标设备;所述打标设备包括: 导轨架, 所述导轨架设置在所述掩膜板上;
至少一个打标车, 所述打标车设置在所述导轨架上;
控制器, 被配置为控制所述导轨架比所述曝光灯先移动到所述掩膜板上 相应的曝光位置, 并控制所述打标车处于相应的打标位置, 显示相应的打标 标识。
2、根据权利要求 1所述的装置, 其中, 所述打标车为用于形成标识图案 的掩膜。
3、根据权利要求 1或 2所述的装置, 其中, 所述打标车包括组装在一起 的车体模块和显示展模块;
所述显示屏模块包括: 标识显示区域和透光緩沖区域, 所述透光緩沖区 域位于所述车体模块和所述标识显示区域之间;
所述标识显示区域用于在所述打标车处于相应的打标位置时, 显示相应 的打标标识;
所述透光緩沖区域进行透光显示。
4、根据权利要求 3所述的装置, 其中, 所述曝光灯对所述掩膜板上的第 一曝光位置处的打标位置曝光完成后, 所述控制器用于控制所述打标车的标 识显示区域进行透光显示, 同时控制所述导轨架开始移动, 使所述导轨架比 所述曝光灯先移动到所述掩膜板的第二曝光位置。
5、 根据权利要求 1-4任一项所述的装置, 其中, 所述曝光灯对所述掩膜 板进行曝光时的移动速度为 0.2-0.3m/s, 所述控制器控制所述导轨架的移动 速度为 3.0-6.0m/s。
6、 根据权利要求 1-5任一项所述的装置, 其中, 所述导轨架和所述打标 车上都设置有红外探测器, 所述红外探测器用于探测所述打标车和所述导轨 架在所述掩膜板上的位置。
7、根据权利要求 6所述的装置, 其中, 所述控制器用于通过无线传输技 术接收所述红外探测器探测到的所述导轨架在所述掩膜板上的位置, 控制所 述导轨架移动到所述掩膜板上相应的曝光位置, 然后通过无线传输技术接收 所述红外探测器探测到的所述打标车在所述掩膜板上的位置, 再通过无线传 输技术向所述打标车发送控制信号控制所述打标车处于相应的打标位置, 显 示相应的打标标识。
8、 根据权利要求 7所述的装置, 其中, 所述装置还包括直线电机; 所述直线电机, 连接所述导轨架, 用于驱动所述导轨架在所述掩膜板上 沿着与所述导轨架垂直的方向进行直线移动;
所述控制器, 用于通过控制直线电机控制所述导轨架的移动。
9、 根据权利要求 1-8任一项所述的装置, 其中, 所述曝光机被配置为对 所述掩膜板进行逐行曝光, 所述导轨移动的方向垂直于行方向, 且所述导轨 被配置为能够控制所述打标车在所述行方向上移动。
10、 根据权利要求 1-9任一项所述的装置, 其中, 在所述曝光灯发出的 光线的传播方向上, 所述曝光灯、 所述打标车和所述掩膜板以该顺序依次设 置。
11、 根据权利要求 1-10任一项所述的装置, 其中, 所述掩膜板的对应于 需要打标的位置的部分是透光的。
12、 一种采用如权利要求 1所述曝光装置的曝光方法, 包括以下步骤: 曝光灯水平移动对掩膜板进行曝光;
控制器控制所述导轨架比所述曝光灯先移动到所述掩膜板上相应的曝光 位置, 并控制所述打标车处于相应的打标位置, 显示相应的打标标识。
13、根据权利要求 12所述的方法, 其中, 所述打标车包括组装在一起的 车体模块和显示屏模块; 所述显示屏模块包括: 标识显示区域和透光緩沖区 域, 所述透光緩沖区域位于所述车体模块和所述标识显示区域之间; 其中, 所述标识显示区域用于在所述打标车处于相应的打标位置时, 显示相应的打 标标识; 所述透光緩沖区域进行透光显示;
所述控制器控制所述导轨架比所述曝光灯先移动到所述掩膜板上相应的 曝光位置, 并控制所述打标车处于相应的打标位置, 显示相应的打标标识包 括:
在所述曝光灯对所述掩膜板上的第一曝光位置处的标识显示区域曝光完 成后, 所述控制器控制所述打标车的标识显示区域进行透光显示, 同时控制 所述导轨架开始移动, 使所述导轨架比所述曝光灯先移动到所述掩膜板上的 第二曝光位置。
14、根据权利要求 13所述的方法, 其中, 所述曝光灯对所述掩膜板进行 曝光时的移动速度为 0.2-0.3m/s, 所述控制器控制所述导轨架的移动速度为 3.0-6.0m/S o
15、 根据权利要求 12-14任一项所述的方法, 其中, 所述导轨架和所述 打标车上都设置有红外探测器, 所述红外探测器用于探测所述打标车和所述 导轨架在所述掩膜板上的位置; 所述控制器控制所述打标车处于相应的打标 位置, 显示相应的打标标识, 包括:
所述控制器通过无线传输技术接收所述红外探测器探测到的所述导轨架 在所述掩膜板上的位置, 控制所述导轨架移动到所述掩膜板上相应的曝光位 置, 然后通过无线传输技术接收所述红外探测器探测到的所述打标车在所述 掩膜板上的位置, 再通过无线传输技术向所述打标车发送控制信号控制所述 打标车处于相应的打标位置, 显示相应的打标标识。
16、 根据权利要求 12-15任一项所述的方法, 其中, 所述曝光装置还包 括直线电机; 所述直线电机, 连接所述导轨架, 用于驱动所述导轨架在所述 掩膜板上沿着与所述导轨架垂直的方向进行直线移动; 所述控制器控制所述 导轨架移动包括:
所述控制器通过控制直线电机控制所述导轨架的移动。
PCT/CN2013/088901 2013-07-04 2013-12-09 曝光装置及其曝光方法 Ceased WO2015000263A1 (zh)

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