WO2015000263A1 - 曝光装置及其曝光方法 - Google Patents
曝光装置及其曝光方法 Download PDFInfo
- Publication number
- WO2015000263A1 WO2015000263A1 PCT/CN2013/088901 CN2013088901W WO2015000263A1 WO 2015000263 A1 WO2015000263 A1 WO 2015000263A1 CN 2013088901 W CN2013088901 W CN 2013088901W WO 2015000263 A1 WO2015000263 A1 WO 2015000263A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- marking
- exposure
- guide rail
- rail frame
- vehicle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2045—Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70541—Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
Definitions
- Embodiments of the present invention relate to an exposure apparatus and an exposure method thereof. Background technique
- the manufactured product needs to be marked, that is, the identification of the product such as ID information and two-dimensional code is made on the substrate, so that the subsequent project realizes the automation of the computer and can trace the product state.
- the marking device is used to expose each product on the substrate one by one, and then developed, etched, peeled, etc.
- the first layer circuit pattern and the logo pattern are formed, thereby achieving marking of the product.
- the exposure of the circuit pattern and the exposure of the marking pattern are performed separately, and the exposure of the marking pattern is an exposure of the identification pattern of each product on the substrate one by one, which leads to an exposure process.
- the time is too long, which seriously affects production capacity.
- An embodiment of the present invention provides an exposure apparatus including an exposure lamp, a mask, and a marking device; the marking device includes:
- the rail frame is disposed on the mask plate
- At least one marking vehicle the marking vehicle being disposed on the rail frame;
- a controller configured to control the rail frame to move to a corresponding exposure position on the mask plate before the exposure lamp, and control the marking vehicle to be in a corresponding marking position, and display a corresponding marking identifier.
- the marking vehicle is a mask for forming a logo pattern.
- the marking vehicle includes a body module and a display module assembled together;
- the display module includes: an identification display area and a light transmissive buffer area, wherein the light transmission buffer area is located in the vehicle body Between the module and the identification display area;
- the marking display area is configured to display a corresponding marking identifier when the marking vehicle is in a corresponding marking position; and the light transmission buffering area performs light transmission display.
- the controller is configured to control the identification display area of the marking vehicle to perform light transmission display.
- the rail frame is controlled to start moving, so that the rail frame moves to the second exposure position of the mask plate before the exposure lamp.
- the moving speed of the exposure lamp when the mask is exposed is 0.2-0.3 m/s
- the controller controls the moving speed of the rail frame to be 3.0-6.0 m/s.
- an infrared detector is disposed on the rail frame and the marking vehicle, and the infrared detector is configured to detect a position of the marking vehicle and the rail frame on the mask.
- the controller is configured to receive, by a wireless transmission technology, a position of the rail frame detected by the infrared detector on the mask, and control the rail frame to move to the mask board. Corresponding exposure position, and then receiving the position of the marking vehicle detected by the infrared detector on the mask board by wireless transmission technology, and then transmitting a control signal control station to the marking vehicle by wireless transmission technology The marking vehicle is in the corresponding marking position, and the corresponding marking identifier is displayed.
- the apparatus further includes a linear motor
- the linear motor is connected to the rail frame for driving the rail frame to move linearly on the mask plate in a direction perpendicular to the rail frame;
- the controller is configured to control movement of the rail frame by controlling a linear motor.
- the exposure machine is configured to perform a progressive exposure of the mask, the direction of movement of the rail is perpendicular to a row direction, and the rail is configured to control the marking vehicle at Move in the direction of the line.
- the exposure lamp, the marking vehicle, and the mask are sequentially disposed in this order in the direction of propagation of the light emitted by the exposure lamp.
- the portion of the mask corresponding to the location where marking is desired is light transmissive.
- Another embodiment of the present invention provides an exposure method using the above exposure apparatus, the method comprising the steps of:
- the controller controls the rail frame to move to a corresponding exposure position on the mask plate before the exposure lamp, and controls the marking vehicle to be in a corresponding marking position, and displays a corresponding marking identifier.
- the marking vehicle includes a body module and a display module assembled together; the display module includes: an identification display area and a light transmissive buffer area, wherein the light transmission buffer area is located in the vehicle body Between the module and the identifier display area; wherein the identifier display area is configured to display a corresponding marking identifier when the marking vehicle is in a corresponding marking position; ;
- the controller controls the rail frame to move to a corresponding exposure position on the mask plate before the exposure lamp, and controls the marking vehicle to be in a corresponding marking position, and displaying the corresponding marking identifier includes:
- the controller controls the identification display area of the marking vehicle to perform light transmission display while controlling the guide rail
- the carriage begins to move, causing the rail frame to move to a second exposure position on the mask plate prior to the exposure lamp.
- the moving speed of the exposure lamp when the mask is exposed is 0.2-0.3 m/s
- the controller controls the moving speed of the rail frame to be 3.0-6.0 m/s.
- an infrared detector is disposed on the rail frame and the marking vehicle, and the infrared detector is configured to detect a position of the marking vehicle and the rail frame on the mask board.
- the controller controls the marking vehicle to be in the corresponding marking position, and displays the corresponding marking identifier, including: the controller receiving the rail frame detected by the infrared detector by using a wireless transmission technology Positioning on the mask, controlling the rail frame to move to a corresponding exposure position on the mask, and then receiving the marking vehicle detected by the infrared detector in the mask by wireless transmission technology The position on the board is then sent to the marking vehicle by a wireless transmission technology to control the marking vehicle to be in the corresponding marking position, and the corresponding marking identifier is displayed.
- the exposure apparatus further includes a linear motor; the linear motor is coupled to the rail frame for driving the rail frame on the mask plate in a direction perpendicular to the rail frame Moving in a straight line, the controller controlling the movement of the rail frame includes:
- the controller controls the movement of the rail frame by controlling a linear motor.
- the exposure device provided by the above technical solution and the exposure method thereof, by controlling the guide frame to move to the corresponding exposure position on the mask plate by the controller, and controlling the marking vehicle to be in control Corresponding marking position, displaying a corresponding marking identifier, waiting for the exposure lamp to move to the exposure position to complete exposure of the marking pattern at the exposure position, such that the exposure lamp is finished At the same time as the exposure of the circuit pattern, the mark position on the mask is also exposed, and the exposure of the logo pattern is completed.
- the mask is first exposed, and then the exposure of the marking pattern is performed one by one, which greatly saves the exposure process time and increases the productivity.
- FIG. 1 is a schematic structural diagram of an exposure apparatus according to an embodiment of the present invention.
- FIG. 2 is a schematic structural diagram of a marking vehicle according to an embodiment of the present invention.
- FIG. 3 is a schematic diagram of movement of a marking vehicle during an exposure process according to an embodiment of the present invention. detailed description
- the exposure apparatus includes an exposure lamp 1, a mask 2, and a marking device 3.
- the marking device 3 includes a rail frame 31, and the rail A frame 31 is disposed on the masking plate 2; at least one marking vehicle 32, and the marking vehicle 32 is disposed on the rail frame 31.
- the controller 34 is configured to control the rail frame 31 to move to a corresponding exposure position on the mask 2 before the exposure lamp 1 and control the marking vehicle 32 to move to a corresponding marking position, and display The corresponding marking mark.
- the exposure position and the marking position on the mask 2 are determined, and the exposure lamp 1 is a linear light source, and the horizontal movement is performed with respect to the mask 1 to perform one-line exposure operation.
- the exposure position refers to a position on the upper line of the mask 1 that needs to be exposed to the identification pattern
- the marking position refers to a position corresponding to each of the identification patterns that need to be exposed at the exposure position. Therefore, preferably, the number of marking vehicles on the rail frame is the number of marking positions included in one row of the mask. Normally, the marking positions at the respective exposure positions are the same. After the marking vehicle moves to the corresponding marking position at the first exposure position, the controller does not need to be again at the next exposure position. Control to move the marking vehicle.
- the controller needs to control after controlling the rail frame to move to the next exposure position on the mask board first than the exposure lamp
- the marking vehicle moves to a corresponding marking position.
- the exposure machine is configured to perform progressive exposure of the mask
- the direction of movement of the rail is perpendicular to the row direction
- the rail is configured to control the marking vehicle in the row direction mobile.
- the exposure lamp 1 is horizontally moved to expose the mask 2 in a row, and the controller 34 controls the corresponding movement of the rail frame 31 to the mask 2 before the exposure lamp 1 is moved.
- the exposure position when the exposure lamp moves to the corresponding exposure position where the rail frame 1 is located, the exposure of the identification pattern can be completed, after the exposure of the marking position at the corresponding exposure position is completed, the control
- the slider 34 controls the rail frame 31 to move to the next exposure position, waiting for the exposure lamp 1 to move to the next exposure position to complete the exposure of the logo pattern at the next exposure position.
- the exposure lamp 1 exposes the mask 2 once to complete the exposure of the circuit pattern, and also exposes all the marked positions on the mask to complete the exposure of the logo pattern.
- the first corresponding exposure position is the exposure position closest to the boundary of the mask 2.
- the exposure apparatus provided by the embodiment of the invention can complete the exposure of the marking pattern while completing the exposure of the circuit pattern, which greatly saves the exposure process time and improves the productivity compared with the multiple exposures in the prior art.
- the marking vehicle 32 includes a body module 321 and a display module 322 assembled together; the display module 322 includes: an identification display area 3221 and a light-transmissive buffer area 3222, The light-transmissive buffer region 3222 is located between the vehicle body module 321 and the marker display region 3221.
- the identification display area 3221 is configured to display a corresponding marking identifier when the marking vehicle 32 is in the corresponding marking position; the light transmission buffer area 3222 is configured to perform light transmission display.
- the exposure lamp 1 Since the marking position on the mask 2 is fixed, when the exposure lamp 1 exposes other portions of the mask 2, the rail frame first moves to the exposure position, and the marking vehicle moves to the corresponding marking position. , the corresponding marking mark is displayed. As shown in FIG. 3, at time T1, the exposure lamp 1 is to be moved to the exposure position; at time T2, the exposure lamp 1 completes exposure at the identification display area 3221 of the marking vehicle corresponding to the marking position. At this time, the exposure lamp 1 is about to enter the light-transmissive buffer area. 3222, the light-transmissive buffer area 3222 prevents the vehicle body module 321 from blocking the light of the exposure lamp.
- the indicator display area 3221 becomes a light-transmitting display.
- the rail frame 31 starts to move to the next marking position, and the moving speed of the rail frame is greater than the moving speed of the exposure lamp, and FIG. 3 shows the time T3 before the rail frame 31 moves to the next exposure position, The relative position of the exposure lamp 1 and the marking vehicle 32.
- the moving speed of the exposure lamp is 0.2-0.3 m/s
- the moving speed of the rail frame is
- an infrared detector (not shown) is disposed on the rail frame 31 and the N marking vehicles 32, and the infrared detector is used to detect the marking vehicle 32 and the rail frame 31. The position on the mask 2.
- the infrared detector can detect the distance between the marking vehicle and the rail frame, the marking vehicle and the marking vehicle through infrared detection, thereby detecting that each marking vehicle and the rail frame 31 are in the mask board.
- the upper position such that the marking vehicle 3 and the rail frame 312 can be moved to the corresponding position on the mask 2 by the control of the controller 34.
- the controller 34 can receive the position of the rail frame 31 detected by the infrared detector on the mask 2 by wireless transmission technology, and control the rail frame 31 to move to the mask board. 2 corresponding exposure position.
- the controller 34 can also receive the position of the marking vehicle 32 detected by the infrared detector on the mask board by wireless transmission technology, and then send a control signal to the marking vehicle through a wireless transmission technology.
- the marking vehicle is controlled to move to the corresponding marking position, and the corresponding marking identifier is displayed. This avoids the interference with the exposure process caused by the data lead to control the marking vehicle in the prior art.
- the exposure apparatus further includes a linear motor 33, and the linear motor 33 is connected to the rail frame 31 for driving the rail frame 31 along the mask 2
- the direction in which the rail frame 31 is perpendicular is linearly moved.
- the controller 34 controls the movement of the rail frame by controlling the linear motor 33.
- the marking cart 32 is a mask for forming a logo pattern.
- the marking vehicle can also be called a marking mask. That is to say, the light source for marking and the light source for performing circuit pattern exposure can use the same light source, and the exposure of the circuit pattern and the exposure of the logo pattern can be completed simultaneously.
- the exposure lamp 1, the marking cart 32, and the masking plate 2 are sequentially disposed in this order.
- the portion of the mask 2 corresponding to the position where the marking is required is light-transmitting, so that when the marking operation is performed, the light emitted from the exposure lamp 1 can pass through the pattern of the marking vehicle and then pass through the mask. Plate 2, to expose the logo pattern.
- the process of forming the marking can be the same as the process of forming the circuit pattern.
- the logo pattern can be formed by a process such as development, etching, or the like.
- An embodiment of the present invention further provides an exposure method, wherein the exposure method uses the above exposure apparatus, and includes the following steps:
- the exposure lamp is horizontally moved to expose the mask.
- the controller controls the rail frame to move to a corresponding exposure position on the mask board before the exposure lamp, and controls the marking vehicle to be in a corresponding marking position, and displays a corresponding marking identifier.
- step 101 is completed, and after exposing the mask to an exposure, the exposure of the circuit pattern and the logo pattern is completed at the same time. Compared with the multiple exposures in the prior art, the exposure process time is greatly saved, and the productivity is improved.
- the marking vehicle 32 includes a body module 321 and a display module 322 assembled together;
- the display module 322 includes: a display display area 3221 and a light-transmissive buffer area 3222, the light transmission
- the buffer area 3222 is located between the vehicle body module 321 and the identification display area 3221, and the identification display area is used to display a corresponding marking identifier when the marking vehicle is in a corresponding marking position;
- the light buffer area is transparently displayed.
- step 102 specifically includes the following steps:
- the controller controls the identification display area of the marking vehicle to perform light transmission display, and simultaneously controls the The rail frame begins to move, causing the rail frame to move to a second exposure position on the mask plate prior to the exposure lamp.
- the rail frame first moves to the exposure position, and the marking vehicle moves to the corresponding reaching position, and the corresponding display Marking logo.
- the exposure lamp 1 is to be moved to the exposure position; at time T2, the exposure lamp 1 completes the identification of the marking vehicle at the corresponding marking position.
- the exposure light 1 enters the light-transmissive buffer area 3222, and the light-transmissive buffer area 3222 prevents the vehicle body module 321 from blocking the light of the exposure lamp.
- FIG. 3 shows the relative position of the exposure lamp 1 and the marking vehicle 32 at time T3 before the rail frame 31 is moved to the next marking position.
- the moving speed of the exposure lamp is 0.2-0.3 m/s
- the moving speed of the rail frame is 3.0-6.0 m/s.
- An infrared detector is disposed on the rail frame and the marking vehicle, and the infrared detector is configured to detect a position of the marking vehicle and the rail frame on the mask board, and then steps 102 and 103
- the controller described in the control unit moves the marking vehicle to a corresponding marking position, and displays a corresponding marking identifier, including:
- the exposure apparatus further includes a linear motor 33, wherein the controller controls the movement of the rail frame, and the linear motor is connected to the rail frame for driving the rail frame on the mask edge
- the linear movement of the direction perpendicular to the rail frame, the controller controlling the movement of the rail frame comprises: the controller controlling the movement of the rail frame by controlling a linear motor.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/386,245 US9523920B2 (en) | 2013-07-04 | 2013-12-09 | Exposure device and exposure method |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310278663.5A CN103324037B (zh) | 2013-07-04 | 2013-07-04 | 一种曝光装置及其曝光方法 |
| CN201310278663.5 | 2013-07-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2015000263A1 true WO2015000263A1 (zh) | 2015-01-08 |
Family
ID=49192866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/CN2013/088901 Ceased WO2015000263A1 (zh) | 2013-07-04 | 2013-12-09 | 曝光装置及其曝光方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9523920B2 (zh) |
| CN (1) | CN103324037B (zh) |
| WO (1) | WO2015000263A1 (zh) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103324037B (zh) | 2013-07-04 | 2015-01-07 | 北京京东方光电科技有限公司 | 一种曝光装置及其曝光方法 |
| CN105446083B (zh) * | 2014-08-28 | 2018-05-04 | 上海微电子装备(集团)股份有限公司 | 一种具有打码功能的曝光机 |
| US10191214B2 (en) | 2017-03-31 | 2019-01-29 | Nokia Of America Corporation | Photonic integrated circuit having a relative polarization-rotating splitter/combiner |
| CN109041441B (zh) * | 2018-09-14 | 2024-07-30 | 东莞市多普光电设备有限公司 | 一种pcb板批次管理曝光方法及其曝光设备 |
| CN110058496B (zh) * | 2019-05-16 | 2021-04-06 | 昆山国华电子科技有限公司 | 一种电路板曝光设备及曝光工艺 |
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2013
- 2013-07-04 CN CN201310278663.5A patent/CN103324037B/zh not_active Expired - Fee Related
- 2013-12-09 US US14/386,245 patent/US9523920B2/en not_active Expired - Fee Related
- 2013-12-09 WO PCT/CN2013/088901 patent/WO2015000263A1/zh not_active Ceased
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| JPH0316111A (ja) * | 1989-03-03 | 1991-01-24 | Nec Corp | 半導体ウェハーおよびその製造方法と半導体チップの選別方法 |
| CN1437713A (zh) * | 2000-06-21 | 2003-08-20 | 芳诺·萨尔米 | 用于给电路板做区别标记的方法 |
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| CN103091974A (zh) * | 2013-02-27 | 2013-05-08 | 上海华力微电子有限公司 | 一种光刻版结构 |
| CN103324037A (zh) * | 2013-07-04 | 2013-09-25 | 北京京东方光电科技有限公司 | 一种曝光装置及其曝光方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US9523920B2 (en) | 2016-12-20 |
| US20160238940A1 (en) | 2016-08-18 |
| CN103324037A (zh) | 2013-09-25 |
| CN103324037B (zh) | 2015-01-07 |
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