WO2014196809A1 - 편광필름의 제조방법 - Google Patents
편광필름의 제조방법 Download PDFInfo
- Publication number
- WO2014196809A1 WO2014196809A1 PCT/KR2014/004968 KR2014004968W WO2014196809A1 WO 2014196809 A1 WO2014196809 A1 WO 2014196809A1 KR 2014004968 W KR2014004968 W KR 2014004968W WO 2014196809 A1 WO2014196809 A1 WO 2014196809A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ink composition
- manganese
- blackening
- polarizing film
- conductive ink
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
Definitions
- the present invention relates to a method for forming a nano-polarization pattern prepared using blackening ink, and more particularly, after coating a functional ink containing a blackening material on a transparent pattern substrate, and then remove the particles formed on the projections, and at the same time,
- the present invention relates to a method of forming a nano-polarizing film composed of one sheet of film by refilling blackening ink into a groove.
- a method of integrating a polarizing film consisting of several sheets into a single film after coating a functional ink exhibiting high reflectance on a transparent nanopattern base material, the particles formed on the projections are removed, and at the same time, the high reflectivity ink is refilled into the grooves, thereby integrating a high brightness nanopolarizing film having a high brightness function. It relates to a method of forming a.
- the polarizing film is superimposed on various kinds of optical film, and used to suit the characteristics such as reflection and absorption depending on the application.
- An object of the present invention is to provide a method for forming an economical and environmentally friendly blackening nano-polarization pattern by coating the polarization pattern using a blackening ink, and selectively etching the projections and refilling the grooves.
- the present invention provides a method for satisfying various blackening degrees without a separate process.
- an object of the present invention is to add a high brightness function to the conventional polarizing film to form an energy saving effect and economical and environmentally friendly high reflectivity nano-polarizing film.
- the present invention provides a method of forming a nano-polarization pattern having a high brightness function by coating a polarization pattern using a functional ink exhibiting a high reflectance, and then selectively etching the protrusions and refilling the grooves.
- a method of forming a blackening nano polarizing film (glass) is provided with a substrate having a transparent polarization pattern is formed, coating the blackening ink on the polarization pattern; And selectively etching the protrusions of the polarization pattern coated with the blackening material and refilling the grooves.
- the method of forming a high reflectivity nano-polarizing film (glass) is provided with a substrate on which a transparent polarization pattern is formed, coating a functional ink exhibiting a high reflectance on the polarization pattern Doing; And selectively etching the protrusions of the polarization pattern coated with the blackening material and refilling the grooves.
- the manufacturing method of the polarizing film of the present invention it is possible to form a blackened polarization pattern using blackening ink (one-component or two-component type) without using an expensive deposition process such as post-treatment or sputtering through a laser. .
- nano-polarization pattern having a high brightness function by using a high reflectivity functional ink (one-component or two-component), without using an expensive deposition process such as post-treatment or sputtering through a laser.
- the selectively etched blackening material can be used in an economical and environmentally friendly process by refilling the groove of the pattern.
- the blackening composition may be adjusted to show various degrees of blackening.
- 1 to 5 are schematic diagrams sequentially showing a method of manufacturing a blackened polarization pattern according to an embodiment of the present invention.
- FIG. 6 is an SEM image of a polarizing film filled with blackening ink according to an embodiment of the present invention.
- FIG. 7 to 11 are schematic views sequentially showing a method of manufacturing a high reflectivity polarizing film according to another embodiment of the present invention.
- FIG. 12 is an SEM image of a nano-polarizing film filled with a high reflectivity ink composition according to another embodiment of the present invention.
- the first filling step of filling the grooves of the substrate having a groove with a blackening conductive ink composition; And a secondary blackening conductive ink composition filled in the grooves by dissolving the remaining blackening conductive ink composition remaining on the surface of the substrate with an etching solution while the blackening conductive ink composition is filled in the grooves in the first filling step.
- Filling step characterized in that it comprises a.
- the blackening conductive ink composition may include a conductive material and a blackening material.
- the conductive material may include at least one of a metal complex compound, a metal precursor, spherical metal particles, metal flakes, or nanoparticles.
- the blackening material may be included in 0.1 to 10% by weight (wt%) based on 100% by weight of the blackening conductive ink composition.
- the blackening material may include a titanium-based, zirconium-based, manganese-based, antimony-based or vanadium-based complex compound or a combination of these complex compounds.
- the titanium-based complex compound is isopropyl titanate, ethyl titanate, n-butyl titanate, poly-N-butyl titanate, 2-ethylhexyl titanate, n-propyl titanate, octyl glycol titanate, tetra iso Octyl titanate, xyl titanate monomer, xyl titanate polymer, thiethanolamine titanate, titanium acetyl acetonate, titanium isopropoxide, ethyl acetoacetic ester titanate, isosteroyl titanate or titanium lactate chelate It may include at least one of.
- the zirconium-based complex compound may include at least one of triethanolamine zirconate, zirconium lactate, zirconium glycolate, n-butyl zirconate or n-propyl zirconate.
- the complex compounds of manganese series are manganese (III) acetyl acetonate, manganese (III) acetyl acetonate tetrahydrate, manganese (II) acetate, manganese (III) acetate dihydrate, manganese (II) acetyl acetonate, manganese (II).
- the antimony complex compounds include antimony (III) chloride, antimony (III) acetate, antimony (III) ethoxide, antimony (V) chloride, antimony (V) sulfide, antimony (III) methoxide antimony (III) sulfide, It may include at least one of antimony (V) fluoride, antimony (III) sulfide, antimony (III) butoxide, antimony (III) isoproposide or antimony (III) proposide.
- the vanadium-based complex compounds include vanadium (III) acetylacetonate, vanadium (II) chloride, vanadium (III) chloride, vanadium (V) oxytriethoxide, vanadium (V) oxyyl chloride, vanadium (IV) chloride, Vanadium (V) oxytripropoxide, vanadium (V) oxyfluoride, vanadium (IV) oxide sulfate hydrate, vanadium boride, vanadium (III) bromide or vanadium (III) iodide have.
- the first filling step, the blackening conductive ink composition by the inkjet method, flat screen screen method, spin coating method, bar coater method, roll coating method, flow coating method, doctor blade, dispensing, gravure printing method or flexo printing method Can be filled.
- the secondary filling step may include: a residual ink composition dissolving step of dissolving the residual blackening conductive ink composition in the etching solution; And a residual ink composition filling step of inducing the residual blackening conductive ink composition dissolved by the etching solution to fill the grooves.
- the etching solution may be applied to the surface of the substrate to dissolve the residual blackening conductive ink composition.
- the etching solution may be ammonium carbamate series, ammonium carbonate series, ammonium bicarbonate series, carboxylic acid series, lactone series, lactam series, cyclic acid anhydride series compounds, acid-base salt complexes, acid-base-alcohol complexes or mercapto And at least one of the class compounds and the oxidant.
- the residual blackening conductive ink composition may be filled in the grooves by pushing the dissolved residual blackening conductive ink composition into the grooves.
- the dissolved blackening conductive ink composition may be pushed into the groove by using a doctor blade or a brush.
- a drying step of drying the blackening conductive ink composition filled in the groove at a temperature of 22 to 600 °C; may further include.
- the secondary filling step is a residual ink composition dissolving step of dissolving the residual high reflectivity conductive ink composition with the etching solution; And a residual ink composition filling step of inducing the residual high reflectivity conductive ink composition dissolved by the etching solution to be filled in the grooves.
- the high reflectivity conductive ink composition may include a conductive material, and the conductive material may be selected from at least one of a metal complex compound, a metal precursor, a spherical metal particle, a metal flake, or a nano particle. Since the details are the same as in the above embodiment, the detailed description will be omitted.
- 1 to 5 are views sequentially showing a method of manufacturing a polarizing film of an embodiment of the present invention.
- FIG. 1 is a transparent substrate on which a fine pattern is formed
- FIG. 2 is a transparent polarizing film coated with blackening improvement ink
- FIG. 3 is a form after heat treatment of a polarizing substrate coated with blackening improvement ink
- FIG. 4 is an ink composition of the protrusion part. Is removed with an etchant and refilled into the grooves.
- FIG. 5 is a blackening improvement polarizing film after final firing.
- a blackening polarization pattern may be formed using blackening ink to form a single nanopolarization film.
- the blackening additive composition in the ink composition may be 0.1 to 10 wt%, and may form a nano-polarization pattern regardless of a substrate such as a polarizing film and polarizing glass.
- the polarization pattern size may be 10 ⁇ 500nm.
- the blackened nanopolarization film may be formed by using a plasma treatment process as a surface pretreatment of the pattern substrate.
- the ink composition material may include at least one of a conductive material (metal complex compound, metal precursor, spherical metal particles, metal flakes or nano particles), insulator material, and semiconductor material.
- a conductive material metal complex compound, metal precursor, spherical metal particles, metal flakes or nano particles
- semiconductor material semiconductor material
- the blackening material may include a titanium-based, zirconium-based, manganese-based or antimony-based complex compound or a combination of these complex compounds.
- the titanium-based complex compound is isopropyl titanate, ethyl titanate, n-butyl titanate, poly-N-butyl titanate, 2-ethylhexyl titanate, n-propyl titanate, octyl glycol titanate, tetra iso Octyl titanate, xyl titanate monomer, xyl titanate polymer, thiethanolamine titanate, titanium acetyl acetonate, titanium isopropoxide, ethyl acetoacetic ester titanate, isosteroyl titanate or titanium lactate chelate It may include at least one of.
- the blackening material may be based on titanium, zirconium, manganese, vanadium and antimony.
- the ink filling method may be filled with the blackening conductive ink composition by inkjet method, flat screen method, spin coating method, bar coater method, roll coating method, flow coating method, doctor blade, dispensing, gravure printing method, or flexo printing method. Can be.
- An etchant may be applied to the surface of the substrate to dissolve the residual blackening ink composition.
- the etching solution may be ammonium carbamate series, ammonium carbonate series, ammonium bicarbonate series, carboxylic acid series, lactone series, lactam series, cyclic acid anhydride series compounds, acid-base salt complexes, acid-base-alcohol complexes or mercapto And at least one of the class compounds and the oxidant.
- the residual blackening conductive ink composition may be filled in the groove by pushing the dissolved residual blackening conductive ink composition into the groove.
- the blackening conductive ink composition filled in the groove may further include a drying step of drying at a temperature of 22 to 600 °C.
- FIG. 7 to 11 are views sequentially showing a method of manufacturing a polarizing film of an embodiment of the present invention.
- FIG. 7 is a transparent substrate on which a fine pattern is formed
- FIG. 8 is a transparent polarizing film coated with a highly reflective ink composition
- FIG. 9 is a form after heat treatment of a polarizing film coated with a highly reflective ink composition
- FIG. 11 is a high reflectivity nanopolarizing film after final firing.
- the integrated nano polarizing film which is one of the polarizing films of the present invention, has a high brightness function by using a high reflectivity functional ink.
- the integrated nano polarizing film When forming the integrated nano polarizing film, it is possible to form a high reflectivity nano polarization pattern irrespective of the substrate, such as a polarizing film, polarizing glass.
- a nano polarization pattern size is 10-500 nm (pattern pitch).
- Plasma treatment may be used as the surface pretreatment of the pattern substrate.
- the ink composition material may include at least one of a conductive material, that is, a metal complex compound, a metal precursor, spherical metal particles, metal flakes, or nanoparticles.
- the ink filling method may be filled with the blackening conductive ink composition by inkjet method, flat screen method, spin coating method, bar coater method, roll coating method, flow coating method, doctor blade, dispensing, gravure printing method, or flexo printing method. Can be.
- An etchant may be applied to the surface of the substrate to dissolve the residual ink composition.
- the etching solution may be ammonium carbamate series, ammonium carbonate series, ammonium bicarbonate series, carboxylic acid series, lactone series, lactam series, cyclic acid anhydride series compounds, acid-base salt complexes, acid-base-alcohol complexes or mercapto And at least one of the class compounds and the oxidant.
- the residual conductive ink composition may be filled in the groove by pushing the dissolved residual blackening conductive ink composition into the groove.
- the method may further include a drying step of drying the high reflectivity conductive ink composition filled in the pattern groove at a temperature of 22 to 600 ° C.
- Black-Improved ink was prepared by mixing 6.99 g of IPA with 3 g of a transparent electronic ink (manufactured by Ink Tech) at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300).
- IPA 6.99g and Tyzor AA 0.1g were mixed with 3g of the transparent electronic ink (Ink Tech Co., Ltd.) and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare blackening ink.
- 3g of transparent electronic ink (manufactured by Ink Tech) was mixed with 6.99g of IPA and 0.05g of Tyzor AA105 to prepare blackening improvement ink by stirring at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300).
- IPG 6.99g and Tyzor AA105 0.1g were mixed with 3g of a transparent electronic ink (manufactured by Ink Tech) and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare a blackening ink.
- a transparent electronic ink manufactured by Ink Tech
- JEIO TECH, SK-300 shaker
- IPA 6.99g and Tyzor TE 0.05g were mixed with 3g of the transparent electronic ink (manufactured by InkTech), and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare a blackening ink.
- IPA 6.99g and Tyzor TE 0.1g were mixed with 3g of a transparent electronic ink (manufactured by Ink Tech), and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare a blackening ink.
- IPA 9g and Tyzor TE 0.03g were mixed with 1 g of transparent electronic ink _ (manufactured by Ink Tech), and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare a blackening ink.
- IPA 9g and Tyzor TE 0.045g were mixed with 1 g of transparent electronic ink (Ink Tech Co., Ltd.), and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare a blackening ink.
- IPA 9g and Tyzor LA 0.015g were mixed with 1 g of transparent electronic ink (manufactured by Ink Tech) and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare a blackening ink.
- IPA 9g and Tyzor LA 0.03g were mixed with 1 g of transparent electronic ink (manufactured by Ink Tech), and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare a blackening ink.
- IPA 9g and Tyzor LA 0.045g were mixed with 1g of a transparent electronic ink (manufactured by Ink Tech), and stirred at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300) to prepare a blackening ink.
- Example 1 3% transparent electron ink _ref
- the ink prepared in Preparation Example 1 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 2 3% transparent electronic ink + Tyzor AA 0.5%
- the ink prepared in Preparation Example 2 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 3 3% transparent electronic ink + Tyzor AA 1%
- the ink prepared in Preparation Example 3 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- the ink prepared in Preparation Example 4 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 5 3% transparent electronic ink + Tyzor AA105 1%
- the ink prepared in Preparation Example 5 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 6 3% transparent electronic ink + 0.5% Tyzor TE
- the ink prepared in Preparation Example 6 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 7 3% transparent electronic ink + Tyzor TE 1%
- the ink prepared in Preparation Example 7 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 8 1% transparent electronic ink_ref
- the ink prepared in Preparation Example 8 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 9 1% transparent electronic ink + Tyzor TE 0.15%
- the ink prepared in Preparation Example 9 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 10 1% transparent electronic ink + Tyzor TE 0.3%
- the ink prepared in Preparation Example 10 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 11 1% Transparent Electron Ink + Tyzor TE 0.45%
- the ink prepared in Preparation Example 11 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 12 1% transparent electronic ink + Tyzor LA 0.15%
- the ink prepared in Preparation Example 12 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- the ink prepared in Preparation Example 13 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 17 1% Transparent Electron Ink + Tyzor LA 0.45%
- the ink prepared in Preparation Example 17 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- the ink prepared in Preparation Example 8 was applied, and spin-coated at a speed of 1500 (5 seconds) / 2000 (5 seconds) rpm.
- the coated substrate was calcined at 120 degrees for 3 minutes, and the etchant prepared in Preparation Example 15 was applied and maintained for 30 seconds, and then the etchant was removed at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the etched substrate was baked at 120 degrees for 3 minutes.
- Example 1 Haze Example 1 60 28 2 Example 2 51 19 One Example 3 44 14 One Example 4 49 18 One Example 5 43 13 One Example 6 26 4 2 Example 7 37 8 One Example 8 73 45 2 Example 9 62 30 One Example 10 63 30 2 Example 11 66 34 2 Example 12 72 43 2 Example 13 69 40 One Example 14 69 40 One Example 15 48 44 -
- IPA 6.99g was mixed with 3g of a transparent electronic ink (Ink Tech) to prepare a high reflectivity improving ink by stirring at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300).
- IPA 9g and Tyzor TE 0.015g were mixed with 1g of a transparent electronic ink (Ink Tech Co., Ltd.) to prepare a high reflectivity improving ink by stirring at 250 rpm for 1 hour using a shaker (JEIO TECH, SK-300).
- the ink prepared in Preparation Example 17 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- the ink prepared in Preparation Example 18 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- Example 21 1% transparent electronic ink_ref
- the ink prepared in Preparation Example 19 was applied, and spin-coated at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the coated substrate was baked at 120 degrees for 3 minutes.
- the ink prepared in Preparation Example 18 was applied, and spin-coated at a speed of 1500 (5 seconds) / 2000 (5 seconds) rpm.
- the coated substrate was calcined at 120 degrees for 3 minutes, the etchant prepared in Preparation Example 20 was applied and maintained for 30 seconds, and then the etchant was removed at a speed of 1000 (5 seconds) / 1500 (5 seconds) rpm.
- the etched substrate was baked at 120 degrees for 3 minutes.
- a blackened polarization pattern may be formed using blackening ink (one-component or two-component) without using an expensive deposition process such as post-processing or sputtering through a laser.
- a nano-polarization pattern having a high brightness function may be formed using a high reflectivity functional ink (one-component or two-component) without using an expensive deposition process such as post-treatment or sputtering through a laser.
- the selectively etched blackening material can be used in an economical and environmentally friendly process by refilling the groove of the pattern.
- the blackening composition may be adjusted to show various degrees of blackening.
- the manufacturing method of the polarizing film of the present invention it is possible to form a blackened polarization pattern using blackening ink (one-component or two-component type) without using an expensive deposition process such as post-treatment or sputtering through a laser. .
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Polarising Elements (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
Description
첨가량(g) | 투명전자잉크 | IPA | additive |
제조예 1 | 3 | 6.99 | - |
제조예 2 | 3 | 6.99 | 0.05 |
제조예 3 | 3 | 6.99 | 0.1 |
제조예 4 | 3 | 6.99 | 0.05 |
제조예 5 | 3 | 6.99 | 0.1 |
제조예 6 | 3 | 6.99 | 0.05 |
제조예 7 | 3 | 6.99 | 0.1 |
제조예 8 | 1 | 9 | - |
제조예 9 | 1 | 9 | 0.015 |
제조예 10 | 1 | 9 | 0.03 |
제조예 11 | 1 | 9 | 0.045 |
제조예 12 | 1 | 9 | 0.015 |
제조예 13 | 1 | 9 | 0.03 |
제조예 14 | 1 | 9 | 0.045 |
첨가량(wt%) | 투명전자잉크 | IPA | additive |
제조예 1 | 30.03 | 69.97 | |
제조예 2 | 29.88 | 69.62 | 0.50 |
제조예 3 | 29.73 | 69.28 | 0.99 |
제조예 4 | 29.88 | 69.62 | 0.50 |
제조예 5 | 29.73 | 69.28 | 0.99 |
제조예 6 | 29.88 | 69.62 | 0.50 |
제조예 7 | 29.73 | 69.28 | 0.99 |
제조예 8 | 0.10 | 0.90 | |
제조예 9 | 9.99 | 89.87 | 0.15 |
제조예 10 | 9.97 | 89.73 | 0.30 |
제조예 11 | 9.96 | 89.60 | 0.45 |
제조예 12 | 9.99 | 89.87 | 0.15 |
제조예 13 | 9.97 | 89.73 | 0.30 |
제조예 14 | 9.96 | 89.60 | 0.45 |
L* | Tt (%) | Haze | |
실시예 1 | 60 | 28 | 2 |
실시예 2 | 51 | 19 | 1 |
실시예 3 | 44 | 14 | 1 |
실시예 4 | 49 | 18 | 1 |
실시예 5 | 43 | 13 | 1 |
실시예 6 | 26 | 4 | 2 |
실시예 7 | 37 | 8 | 1 |
실시예 8 | 73 | 45 | 2 |
실시예 9 | 62 | 30 | 1 |
실시예 10 | 63 | 30 | 2 |
실시예 11 | 66 | 34 | 2 |
실시예 12 | 72 | 43 | 2 |
실시예 13 | 69 | 40 | 1 |
실시예 14 | 69 | 40 | 1 |
실시예 15 | 48 | 44 | - |
첨가량(g) | 투명전자잉크 | IPA | Additive |
제조예17 | 3 | 6.99 | - |
제조예 18 | 1 | 9 | 0.015 |
제조예 19 | 1 | 9 | - |
첨가량(wt%) | 투명전자잉크 | IPA | Additive |
제조예 17 | 30.03 | 69.97 | |
제조예 18 | 9.99 | 89.87 | 0.15 |
제조예19 | 10 | 90 |
R (%) | L* | T (%) | Haze | |
실시예 19 | - | 60 | 28 | 2 |
실시예 20 | - | 73 | 45 | 2 |
실시예 21 | - | 48 | 44 | - |
Claims (20)
- 홈을 갖는 기재의 상기 홈에 흑화 전도성 잉크 조성물이 채워지도록 충진하는 1차 충진단계; 및상기 1차 충진단계에서 상기 흑화 전도성 잉크 조성물이 상기 홈에 충진되면서 상기 기재의 표면 상에 남아있는 잔류 흑화 전도성 잉크 조성물을 에칭액으로 용해시켜 상기 잔류 흑화 전도성 잉크 조성물이 상기 홈에 충진되는 2차 충진단계;를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 1항에 있어서,상기 흑화 전도성 잉크 조성물은 전도성 물질 및 흑화 물질을 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 2항에 있어서,상기 전도성 물질은 금속 착제 화합물, 금속 전구체, 구형 금속입자, 금속 플레이크 또는 나노 입자 중 적어도 하나를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제2항에 있어서,상기 흑화 물질은 상기 흑화 전도성 잉크 조성물 100중량%에 대해 0.1 내지 10중량%(wt%)로 포함되는 것을 특징으로 하는 편광필름의 제조방법.
- 제 2항에 있어서,상기 흑화 물질은 티타늄 계열, 지르코늄 계열, 망간 계열, 안티몬 계열 또는 바나듐 계열의 착제 화합물 또는 이들 착제 화합물의 조합을 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 5항에 있어서,상기 티타늄 계열의 착제 화합물은 이소프로필 티타네이트, 에틸 티타네이트, n-부틸 티타네이트, 폴리-N-부틸 티타네이트, 2-에틸헥실 티타네이트, n-프로필 티타네이트, 옥틸글리콜 티타네이트, 테트라 이소옥틸 티타네이트, 크실 티타네이트 모노머, 크실 티타네이트 폴리머, 티리에탄올아민 티타네이트, 티타늄 아세틸 아세토네이트, 티타늄 이소프로폭시드, 에틸 아세토아세틱 에스테르 티타네이트, 이소스테로일 티타네이트 또는 티타늄 락테이트 킬레이트 중 적어도 하나를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 5항에 있어서,상기 지르코튬 계열의 착제 화합물은 트리에탄올아민 지르코네이트, 지르코늄 락테이트, 지르코늄 글리코레이트, n-부틸 지르코네이트 또는 n-프로필 지르코네이트 중 적어도 하나를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 5항에 있어서,상기 망간 계열의 착제 화합물은 망간(III) 아세틸 아세토네이트, 망간(III) 아세틸 아세토네이트 테트라하이드레이트, 망간(II) 아세테이트, 망간(III) 아세테이트 다이하이드레이트, 망간(II) 아세틸 아세토네이트, 망간(II) 카보네이트, 망간(II) 카보네이트 하이드레이트, 망간(II) 헥사플로로아세틸아세토네이트 트리하이드레이트, 망간(II) 클로라이드, 망간(II) 나이트레이트 테트라하이드레이트, 망간(II) 설페이트 모노하이드레이트, 망간(II) 설파이드, 망간(II) 나이트레이트 하이드레이트, 망간(II) 설페이트 모노하이드레이트, 망간(II) 퍼클로레이트 하이드레이트, 망간(III) 플로라이드, 망간(II) 설페이트 하이드레이트, 망간(II) 클로라이드 하이드레이트 또는 망간(II) 클로라이드 모노하이드레이트 중 적어도 하나를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 5항에 있어서,상기 안티몬 계열의 착제 화합물은 안티몬(III) 클로라이드, 안티몬(III) 아세테이트, 안티몬(III) 에톡사이드, 안티몬(V) 클로라이드, 안티몬(V) 설파이드, 안티몬(III) 메톡사이드 안티몬(III) 설파이드, 안티몬(V) 플로라이드, 안티몬(III) 설파이드, 안티몬(III) 부톡사이드, 안티몬(III) 아이소프록포사이드 또는 안티몬(III) 프록포사이드 중 적어도 하나를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 5항에 있어서,상기 바나듐 계열의 착제 화합물은 바나듐(III) 아세틸아세토네이트, 바나듐(II) 클로라이드, 바나듐(III) 클로라이드, 바나듐(V) 옥실트리에톡사이드, 바나듐(V) 옥실클로라이드, 바나듐(IV) 클로라이드, 바나듐(V) 옥실트리프로폭사이드, 바나듐(V) 옥실플로라이드, 바나듐(IV) 옥사이드 설페이트 하이드레이트, 바나듐 보라이드, 바나듐(III) 브로마이드 또는 바나듐(III) 아이오다이드 중 적어도 하나를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 1항에 있어서,상기 1차 충진단계는, 잉크젯 방법, 평판 스크린법, 스핀 코팅법, 바 코터법, 롤 코팅법, 플로우 코팅법, 닥터 블레이드, 디스펜싱, 그라비아 프린팅법 또는 플렉소 프린팅법으로 상기 흑화 전도성 잉크 조성물이 채워지는 것을 특징으로 하는 편광필름의 제조방법.
- 제 1항에 있어서,상기 2차 충진단계는 상기 잔류 흑화 전도성 잉크 조성물을 상기 에칭액으로 용해시키는 잔류 잉크 조성물 용해단계; 및상기 에칭액에 의해 용해된 상기 잔류 흑화 전도성 잉크 조성물이 상기 홈에 채워지도록 유도하는 잔류 잉크 조성물 충진단계;를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 1항 또는 제 12항에 있어서,상기 에칭액은 상기 기재 표면에 도포되어, 상기 잔류 흑화 전도성 잉크 조성물을 용해시키는 것을 특징으로 하는 편광필름의 제조방법.
- 제 1항 또는 제12항에 있어서,상기 에칭액은 암모늄 카바메이트계열, 암모늄 카보네이트계열, 암모늄 바이카보네이트계열, 카르복실산 계열, 락톤 계열, 락탐 계열, 환상 산 무수물 계열 화합물, 산-염기 염복합체, 산-염기-알코올계 복합체 또는 머캡토 계열 화합물 중 적어도 하나 및 산화제를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제1항 또는 제12항에 있어서,상기 2차 충진단계는, 용해된 상기 잔류 흑화 전도성 잉크 조성물을 상기 홈으로 밀어넣음으로써, 상기 홈에 상기 잔류 흑화 전도성 잉크 조성물이 채워지는 것을 특징으로 하는 편광필름의 제조방법.
- 제15항에 있어서,용해된 상기 잔류 흑화 전도성 잉크 조성물은 닥터 블레이드 또는 브러쉬를 이용하여 상기 홈으로 밀어넣는 것을 특징으로 하는 편광필름의 제조방법.
- 제1항 또는 제12항에 있어서,상기 홈에 채워진 상기 흑화 전도성 잉크 조성물을 22 내지 600℃의 온도에서 건조하는 건조단계;를 더 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 홈을 갖는 기재의 상기 홈에 고반사율 전도성 잉크 조성물이 채워지도록 충진하는 1차 충진단계; 및상기 1차 충진단계에서 상기 고반사율 전도성 잉크 조성물이 상기 홈에 충진되면서 상기 기재의 표면 상에 남아있는 잔류 고반사율 전도성 잉크 조성물을 에칭액으로 용해시켜 상기 잔류 고반사율 전도성 잉크 조성물이 상기 홈에 충진되는 2차 충진단계;를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
- 제18항에 있어서,상기 고반사율 전도성 잉크 조성물은 전도성 물질을 포함하며, 상기 전도성 물질로는 금속 착제 화합물, 금속 전구체, 구형 금속입자, 금속 플레이크 또는 나노 입자 중 적어도 하나를 선택하여 사용하는 것을 특징으로 하는 편광필름의 제조방법.
- 제 19항에 있어서,상기 2차 충진단계는 상기 잔류 고반사율 전도성 잉크 조성물을 상기 에칭액으로 용해시키는 잔류 잉크 조성물 용해단계; 및상기 에칭액에 의해 용해된 상기 잔류 고반사율 전도성 잉크 조성물이 상기 홈에 채워지도록 유도하는 잔류 잉크 조성물 충진단계;를 포함하는 것을 특징으로 하는 편광필름의 제조방법.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/895,500 US9671542B2 (en) | 2013-06-04 | 2014-06-03 | Method for manufacturing polarizing film |
CN201480040789.1A CN105393146B (zh) | 2013-06-04 | 2014-06-03 | 偏光薄膜的制造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20130063994 | 2013-06-04 | ||
KR10-2013-0063994 | 2013-06-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014196809A1 true WO2014196809A1 (ko) | 2014-12-11 |
Family
ID=52008382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2014/004968 WO2014196809A1 (ko) | 2013-06-04 | 2014-06-03 | 편광필름의 제조방법 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9671542B2 (ko) |
KR (1) | KR102175705B1 (ko) |
CN (1) | CN105393146B (ko) |
WO (1) | WO2014196809A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9671542B2 (en) | 2013-06-04 | 2017-06-06 | Inktec Co., Ltd. | Method for manufacturing polarizing film |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100922810B1 (ko) * | 2007-12-11 | 2009-10-21 | 주식회사 잉크테크 | 흑화 전도성 패턴의 제조방법 |
CN109613641A (zh) * | 2019-01-30 | 2019-04-12 | 拓米(成都)应用技术研究院有限公司 | 上色一体型偏光片及其制造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090061225A (ko) * | 2007-12-11 | 2009-06-16 | 주식회사 잉크테크 | 흑화 전도성 패턴의 제조방법 |
KR20090078669A (ko) * | 2008-01-15 | 2009-07-20 | 주식회사 엘지화학 | 탄성체 스탬프 |
WO2010074518A2 (ko) * | 2008-12-24 | 2010-07-01 | 제일모직 주식회사 | 반도체용 복층구조 접착 필름 및 이를 포함하는 다이본딩필름 |
KR20100097957A (ko) * | 2009-02-27 | 2010-09-06 | 주식회사 디엠에스 | 그라비어롤 세정장치 |
KR20120012298A (ko) * | 2010-07-30 | 2012-02-09 | 주식회사 잉크테크 | 투명 도전막의 제조방법 및 이로부터 제조되는 투명 도전막 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060008534A (ko) * | 2004-07-21 | 2006-01-27 | 삼성코닝 주식회사 | 신규 블랙 매트릭스, 그 제조방법 및 그를 이용한평판표시소자 및 전자파차폐 필터 |
KR101022015B1 (ko) * | 2010-04-09 | 2011-03-16 | 한국기계연구원 | 열형 롤 임프린팅과 블레이드 코팅을 이용하는 필름제품 제조방법, 이를 이용한 보안 필름 및 필름 일체형 전기 소자 |
KR20140084880A (ko) * | 2012-12-27 | 2014-07-07 | 삼성전기주식회사 | 터치 패널 |
CN103176650B (zh) * | 2013-03-01 | 2016-09-28 | 南昌欧菲光科技有限公司 | 导电玻璃基板及其制作方法 |
KR102175705B1 (ko) | 2013-06-04 | 2020-11-09 | 주식회사 잉크테크 | 편광필름의 제조방법 |
-
2014
- 2014-06-03 KR KR1020140067917A patent/KR102175705B1/ko active IP Right Grant
- 2014-06-03 CN CN201480040789.1A patent/CN105393146B/zh not_active Expired - Fee Related
- 2014-06-03 US US14/895,500 patent/US9671542B2/en active Active
- 2014-06-03 WO PCT/KR2014/004968 patent/WO2014196809A1/ko active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090061225A (ko) * | 2007-12-11 | 2009-06-16 | 주식회사 잉크테크 | 흑화 전도성 패턴의 제조방법 |
KR20090078669A (ko) * | 2008-01-15 | 2009-07-20 | 주식회사 엘지화학 | 탄성체 스탬프 |
WO2010074518A2 (ko) * | 2008-12-24 | 2010-07-01 | 제일모직 주식회사 | 반도체용 복층구조 접착 필름 및 이를 포함하는 다이본딩필름 |
KR20100097957A (ko) * | 2009-02-27 | 2010-09-06 | 주식회사 디엠에스 | 그라비어롤 세정장치 |
KR20120012298A (ko) * | 2010-07-30 | 2012-02-09 | 주식회사 잉크테크 | 투명 도전막의 제조방법 및 이로부터 제조되는 투명 도전막 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9671542B2 (en) | 2013-06-04 | 2017-06-06 | Inktec Co., Ltd. | Method for manufacturing polarizing film |
Also Published As
Publication number | Publication date |
---|---|
CN105393146A (zh) | 2016-03-09 |
US9671542B2 (en) | 2017-06-06 |
CN105393146B (zh) | 2018-01-09 |
KR102175705B1 (ko) | 2020-11-09 |
US20160202404A1 (en) | 2016-07-14 |
KR20140143110A (ko) | 2014-12-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2014185756A1 (ko) | 하이브리드 투명전극의 제조방법 및 하이브리드 투명전극 | |
WO2014196809A1 (ko) | 편광필름의 제조방법 | |
WO2014104846A1 (ko) | 전도성 패턴의 형성방법, 전도성 필름, 전도성 패턴 및 투명 전도성 필름 | |
WO2017209473A1 (ko) | 편광자 보호 필름, 이를 포함하는 편광판, 및 이를 구비한 표시 장치 | |
WO2013169087A1 (ko) | 전도성 고분자 잉크 조성물 및 이를 포함하는 유기태양전지 | |
WO2014178517A1 (ko) | 폴리에스테르계 프라이머 조성물, 이를 이용한 광학 필름 및 이를 포함하는 편광판 | |
WO2015065162A1 (ko) | 전도성 구조체 및 이의 제조방법 | |
WO2021167377A1 (ko) | 다층 필름 및 이를 포함하는 적층체 | |
WO2021177551A1 (ko) | 표면작용기 제어를 통한 맥신의 산화안정성 향상 방법 | |
WO2015152559A1 (ko) | 저굴절 조성물, 이의 제조방법, 및 투명 도전성 필름 | |
WO2016148456A1 (ko) | 3차원 나노 리플 구조의 금속산화물 박막, 이의 제조방법 및 이를 포함하는 유기태양전지 | |
WO2021201566A1 (ko) | 저온 성막형 고투명 적외선 반사 복합 코팅 조성물 | |
WO2020080844A1 (ko) | 열 차폐 필름 및 그 제조방법 | |
WO2015167235A1 (ko) | 폴리에스테르 필름 및 이의 제조방법 | |
WO2014175644A1 (ko) | 유-무기 하이브리드 조성물, 이를 이용하여 제조된 광학 부재 및 광학 장치 | |
WO2014178640A1 (ko) | 흑화 전도성 패턴의 형성방법 및 흑화 전도성 잉크 조성물 | |
WO2021125695A1 (ko) | 잉크젯용 경화성 조성물 및 이를 포함하는 유기발광 표시장치 | |
CN100538970C (zh) | 等离子体显示面板 | |
WO2017176038A1 (ko) | Basno3 박막 및 이의 저온 제조 방법 | |
WO2011052934A2 (ko) | 투명막 형성용 잉크젯 조성물 및 이의 제조방법 | |
WO2016043477A1 (ko) | 전기발광 기능이 부여된 스마트윈도우 | |
WO2020222375A1 (ko) | 이차전지용 양극 활물질의 제조를 위한 신규 전구체 입자 및 이를 포함하는 신규 전구체 분말 | |
WO2010143794A1 (ko) | 도핑 기능을 갖는 에칭 페이스트 및 이를 이용한 태양전지의 선택적 에미터 형성방법 | |
WO2019093566A1 (ko) | 용액 공정을 이용하여 우수한 접착력을 가지는 유무기 하이브리드 열변색층을 포함하는 광학 적층체 및 이의 제조방법 | |
WO2020076138A1 (ko) | 복합 코팅액, 이를 이용하여 제조된 금속 기판 구조체, 및 그 제조 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201480040789.1 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 14808229 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14895500 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 14808229 Country of ref document: EP Kind code of ref document: A1 |