WO2014194776A1 - 一种触控面板及其制造方法 - Google Patents

一种触控面板及其制造方法 Download PDF

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Publication number
WO2014194776A1
WO2014194776A1 PCT/CN2014/078468 CN2014078468W WO2014194776A1 WO 2014194776 A1 WO2014194776 A1 WO 2014194776A1 CN 2014078468 W CN2014078468 W CN 2014078468W WO 2014194776 A1 WO2014194776 A1 WO 2014194776A1
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WO
WIPO (PCT)
Prior art keywords
layer
touch panel
sensing electrode
refractive index
protective layer
Prior art date
Application number
PCT/CN2014/078468
Other languages
English (en)
French (fr)
Inventor
李裕文
唐传代
许贤斌
林奉铭
Original Assignee
宸鸿科技(厦门)有限公司
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Application filed by 宸鸿科技(厦门)有限公司 filed Critical 宸鸿科技(厦门)有限公司
Priority to EP14808068.2A priority Critical patent/EP3007043B1/en
Priority to KR1020157013821A priority patent/KR101704323B1/ko
Priority to JP2015543312A priority patent/JP6092416B2/ja
Publication of WO2014194776A1 publication Critical patent/WO2014194776A1/zh

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Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16—Constructional details or arrangements
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds

Definitions

  • the present invention relates to a touch technology, and more particularly to a touch panel and a method of fabricating the same.
  • touch panel touch The panel has been widely used in various consumer electronic devices, such as smart phones, tablet computers, cameras, e-books, MP3 players and other portable electronic products, or display screens for operating control devices.
  • touch panel certainly includes the advantages of being thin, lightweight, and competitive in price.
  • the touch panel generally includes a substrate, a sensing electrode layer, a shielding layer and a protective layer. On the structure, a protective layer is formed on the sensing electrode layer and the shielding layer to protect the sensing electrode layer from physical or chemical damage. .
  • the protective layer causes a color difference problem and affects the light transmittance of the touch panel.
  • the invention improves the matching process adjustment by the structure of the protective layer, and designs two parts of the protective layer to respectively correspond to the sensing electrode layer and the shielding layer having the thickness difference, and the two parts of the protective layer are formed independently, not because of sensing The difference between the electrode layer and the shielding layer causes uneven coating.
  • An embodiment of the present invention provides a touch panel, which is defined as a non-visible area and a pair of visible areas that should be invisible, and the touch panel includes: a shielding layer disposed on the a sensing device is disposed on the substrate a surface and at least in the visible area; a first protective layer at least in the visible area and covering at least the sensing electrode layer; and a second protective layer located in the non-visible area and covering at least the Masking layer.
  • Another embodiment of the present invention provides a method of manufacturing a touch panel, wherein the touch panel is defined with a non-visible area and a pair of visible areas that should be invisible, and the touch panel is characterized in that the touch panel
  • the manufacturing method includes: forming a shielding layer on one side of a substrate, wherein a forming area of the shielding layer defines the non-visible area; forming a sensing electrode layer on the same side of the shielding layer as the shielding layer, At least a portion of the sensing electrode layer is formed on a surface of the substrate and at least in the visible region; at least a first protective layer is formed on the visible region to cover at least the sensing electrode layer; A second protective layer is formed in the non-visible area to cover at least the shielding layer.
  • the present invention can effectively avoid chromatic aberration and reduce factors affecting the light transmittance of the touch panel.
  • the protective layer divided into two parts of the present invention can be further designed with different materials respectively, so that the first protective layer corresponding to the sensing electrode layer has the effect of refractive index compensation and matching in addition to providing a protective function;
  • the adhesion to the shielding layer can be effectively improved.
  • the quality of the touch panel can be improved.
  • FIG. 1 is a cross-sectional view showing a touch panel according to a first embodiment of the present invention.
  • Figure 2 shows a partial enlarged view of the first protective layer of Figure 1 of the present invention.
  • FIG 3 is a cross-sectional view showing a touch panel of a second embodiment of the present invention.
  • FIG. 4 is a cross-sectional view showing a touch panel according to a third embodiment of the present invention.
  • FIG. 5 is a flow chart showing a method of manufacturing a touch panel according to an embodiment of the present invention.
  • the orientations "upper” and “lower” as used in this specification are only used to indicate the relative positional relationship.
  • the upper side of the touch panel is farther away from the user, and the lower side is closer to the user.
  • the touch panel of the embodiment is defined with a non-visible area and a visible area corresponding to the non-visible area.
  • the non-visible area may be correspondingly designed on at least one side of the visible area, and the non-visible areas of the embodiments in the present specification are described, for example, around the periphery of the visible area. .
  • FIG. 1 is a cross-sectional view showing a touch panel according to a first embodiment of the present invention.
  • the touch panel 100 of the present embodiment includes a substrate 110, a shielding layer 130, a sensing electrode layer 120, a first protective layer 151, and a second protective layer 152.
  • the substrate 110 may be made of a transparent material such as glass, and the substrate 110 has opposing lower surfaces 110a and upper surfaces 110b.
  • the lower surface 110a serves as a surface for accepting a user's touch, and the upper surface 110b is used to form various components of the touch panel 100. Detailed aspects will be described in the following.
  • the lower surface 110a of the substrate 110 may be subjected to surface treatment such as strengthening, scratch resistance, anti-glare, antibacterial, and/or anti-reflection, for example, so that the substrate 110 has the functions of carrying and protecting.
  • the shielding layer 130 is disposed on one side of the upper surface 110b of the substrate 110, and the range of the shielding layer is used to define the non-visible area 100B of the touch panel 100.
  • the shielding layer 130 in this embodiment is a non-transparent insulating layer, such as a black or other color polyimide layer, or an ink layer.
  • the masking layer 130 can be formed by a deposition, lithography, and etching process.
  • the sensing electrode layer 120 is located on the same side of the same upper surface 110b of the substrate as the shielding layer 130, and at least a portion of the sensing electrode layer 120 is disposed on the upper surface 110b of the substrate 110 and at least in the visible area 100A for sensing
  • the electrode layer 120 provides a function of user touch sensing at least in the visible area 100A of the touch panel 100. More specifically, the sensing electrode layer 120 includes a plurality of first electrodes 121 arranged in a column, a plurality of second electrodes arranged in a row (not shown), and connecting adjacent second electrodes (not shown) a plurality of connecting portions 124.
  • the complex bridging portion 123 can be used to connect the adjacent first electrodes 121 on the same column.
  • a plurality of insulating portions 122 may be disposed between the connecting portion 124 and the bridging portion 123 for electrically insulating the connecting portion 124 and the bridging portion 123.
  • the overall arrangement allows the electrode pattern of the sensing electrode layer 120 to be divided into two parts, an etched region 120A and a non-etched region 120B.
  • the first protective layer 151 is at least located in the visible region 100A and covers the sensing electrode layer 120 also located in the visible region 100A, thereby protecting the sensing electrode layer 120 from physical or chemical damage.
  • the sensing electrode layer 120 is divided into the etched region 120A and the non-etched region 120B, the first protective layer 151 covers the etched region 120A in addition to the non-etched region 120B of the sensing electrode layer 120.
  • the second protective layer 152 is located in the non-visible area 100B and covers the shielding layer 130. Since the shielding layer 130 used to define the non-visible area 100B in this embodiment is around the visible area 100A. To be set, the second protective layer 152 of the present embodiment will present a frame-like structural aspect.
  • the first protective layer 151 and the second protective layer 152 are independently designed, so that the protective layer formed in the last stage of the touch panel 100 is not affected by the shielding layer 130 (thickness). Approximately 1.5 ⁇ m to 20 ⁇ m) and the influence of the thickness difference between the sensing electrode layer 120 (thickness of about 250 ⁇ to 300 ⁇ ) causes uneven coating on the process, effectively avoiding the problem of chromatic aberration due to uneven coating. The factor affecting the light transmittance of the touch panel is reduced, thereby improving the production yield of the touch panel 100.
  • the embodiment is illustrated by the process sequence of first setting the shielding layer 130 to form the sensing electrode layer 120, and the sensing electrode layer 120 is further extended in the non-visible area 100B to be formed on the shielding layer 130.
  • the sensing electrode layer 120 can be directly fabricated as shown in FIG. 1 to extend over the non-visible area 100B.
  • the portion of the sensing electrode layer 120 extending from the non-visible area 100B may also be a separate connecting portion and formed in different process steps, which is not limited by the present invention.
  • the touch panel 100 of the present embodiment further includes a signal transmission layer 160 disposed between the shielding layer 130 and the second protection layer 152 for electrically connecting the sensing electrode layer 120, transferring the sensing electrode layer 120 and an external controller. Signal between (not shown).
  • the second protective layer 152 is designed in the non-visible area 100B to cover the signal transmission layer 160 at the same time for protecting the signal transmission layer 160 from physical or chemical damage.
  • the signal transmission layer 160 is a metal laminated structure of molybdenum aluminum molybdenum. Due to the presence of an aluminum layer in the middle, aluminum is highly active and is easily oxidized in the air to form a layer of non-conductive aluminum oxide.
  • the film, and thus the second protective layer 152 can be used to insulate the signal transmission layer 160 from the air to prevent oxidation; it is also possible to simultaneously reduce the chance that the molybdenum layer is scratched to expose the aluminum layer.
  • the first protective layer 151 of the embodiment can be designed as a refractive index compensation layer
  • the second protective layer 152 can be designed as an adhesion layer.
  • the first protective layer 151 corresponding to the sensing electrode layer 120 has the effect of refractive index compensation and matching in addition to providing a protection function, preventing the etching region 120A and the non-etching region in the sensing electrode layer 120.
  • the etched line between 120B is visible; and the second protective layer 152 correspondingly covering the shielding layer 130 and the signal transmitting layer 160 can effectively enhance the adhesion with the shielding layer in addition to providing a protective function.
  • the refractive index compensation layer may employ a metal oxide, a non-metal oxide, a silicon-based material, or a mixture thereof, and may be a single-layer structure or a composite layer structure in architecture.
  • the design of the present embodiment is such that the refractive index n1 of the refractive index compensation layer is greater than or equal to the refractive index n2 of the sensing electrode layer. . Therefore, the difference in refractive index between the etched region 120A and the non-etched region 120B is reduced, thereby effectively avoiding problems such as poor image quality due to different refractive indices, so that the touch panel 100 has good appearance quality.
  • the first protective layer 151 of the present embodiment includes the first refractive index layer 1511 and the second refractive index layer 1512, so that the first protective layer 151 is in the form of a composite layer structure when designed as a refractive index compensation layer.
  • the first refractive index layer 1511 covers the sensing electrode layer 120, and the second refractive index layer 1512 is disposed on the first refractive index layer 1511.
  • the refractive index n1 design of the refractive index compensation layer of the composite layer structure please refer to the following description:
  • the refractive index of the first refractive index layer 1511 is n3; the refractive index of the second refractive index layer 1512 is n4. among them:
  • N3 sin a/sin b
  • N4 sin b/sin c
  • the laminated layer of the first refractive index layer 1511 and the second refractive index layer 1512 is configured to achieve a refractive index compensation layer having a refractive index greater than or equal to that of the sensing electrode layer 120 disposed in the visible region 100A. Refractive index.
  • the refractive index n3 of the first refractive index layer 1511 is smaller than the refractive index of the sensing electrode layer 120, and the refractive index n4 of the second refractive index layer 1512 is greater than the refractive index of the sensing electrode layer 120.
  • the first refractive index layer 1511 may be a a film having a refractive index of less than 1.86, such as a silicon dioxide layer, having a refractive index of 1.46 and a thickness of 30 Nm to 50 Nm.
  • the second refractive index layer 1512 may be a film layer having a refractive index greater than 1.86, for example, a tantalum pentoxide layer having a refractive index of 2.35 and a thickness of from 5 nm to 10 nm.
  • the first refractive index layer 1511 is a tantalum pentoxide layer
  • the second refractive index layer 1512 is a silicon dioxide layer.
  • the refractive index compensation layer of the composite layer structure may be formed, for example, by a composite of a silicon dioxide layer and a pentoxide layer in response to the refractive index of the actually designed sensing electrode layer 120.
  • the adhesion layer is an organic material layer, and since the adhesion layer adopts an organic material having the same or similar properties as the shielding layer 130, the adhesion layer can produce a better attachment with the light shielding layer 130. Focus on the adhesion layer made of organic materials in the tape test (ASTM) Under D3359-93), the adhesion of the adhesion layer to the shielding layer 130 is at least greater than 4B, and the detachment rate is not more than 5%. Thereby, the signal transmission layer 160 disposed between the adhesion layer and the shielding layer 130 can be sufficiently protected from the air to reduce the chance of being oxidized.
  • the organic material may be a polyimide material, an ink material, an alcohol material, or a mixture thereof.
  • the composition of the polyimide layer contains silane and acryl.
  • the composition of the ink material comprises a pigment, a resin and an auxiliary agent, wherein the pigment may be titanium white or carbon powder, and the auxiliary agent may be a curing agent or a thickener.
  • the alcohol material can be ethylene glycol, propylene glycol, ethanol, isopropanol or a mixture thereof. In the actual process, the adhesion can be improved by adjusting the content of each component, thereby obtaining a better adhesion effect with the shielding layer 130.
  • FIG. 3 a cross-sectional view of a touch panel according to a second embodiment of the present invention is shown.
  • the structure of the touch panel of the present embodiment is substantially the same as that of the first embodiment shown in FIG. 1.
  • the difference is that the first protective layer 151 of the touch panel 100 shown in this embodiment is further
  • the extension is located in the non-visible area 100B and is formed on the surface of the second protective layer 152. Thereby, the falling off of the second protective layer 152 can be further avoided.
  • the first protective layer 151 of this embodiment is formed entirely on the surface of the second protective layer 152.
  • the first protective layer 151 may be formed only on the surface of the portion of the second protective layer 152 according to actual design requirements, which is not limited by the present invention.
  • FIG. 4 a cross-sectional view of a touch panel according to a third embodiment of the present invention is shown.
  • the structure of the touch panel of the present embodiment is substantially the same as that of the first embodiment shown in FIG. 1 .
  • the difference is that the sensing electrode layer 120 of the touch panel 100 shown in this embodiment is shielded.
  • This embodiment is designed in the process sequence of first setting the sensing electrode layer 120 and then forming the shielding layer 130.
  • the sensing electrode layer 120 of the present embodiment is formed on the lower surface of the shielding layer 160 in the non-visible area 100B.
  • the shielding layer 130 of the present embodiment in order to electrically connect the sensing electrode layer 120 and the signal transmitting layer 160 that are disposed first, the shielding layer 130 of the present embodiment further has a through-hole portion and is filled in the perforated portion.
  • the electrical connection layer 140 of the conductive material allows the sensing electrode layer 120 and the signal transmission layer 160 to be electrically connected through the electrical connection layer 140 in the through-hole portion.
  • step S1 a substrate is provided. Then, in step S2, a shielding layer is formed on one side of the substrate, wherein the formation area of the shielding layer is used to define a non-visible area of the touch panel.
  • a sensing electrode layer is formed on the same side of the substrate as the shielding layer.
  • the sensing electrode layer is further extended in the non-visible area, except that at least part of the sensing electrode layer is formed on the surface of the substrate and at least outside the visible area of the touch panel. And in the non-visible area is the upper surface of the shielding layer formed in the foregoing step 2.
  • the order of the foregoing steps 2 and 3 can be reversed, that is, the sensing electrode layer is formed first, and then the shielding layer is formed. Thereby, the portion where the sensing electrode layer extends in the non-visible area is located on the lower surface of the shielding layer.
  • step S4 a signal transmission layer is formed on the shielding layer for electrically connecting the sensing electrode layers.
  • step S5 a first protective layer is formed on at least the visible region to cover the sensing electrode layer.
  • step S6 a second protective layer is formed in the non-visible area to cover the shielding layer and the signal transmission layer.
  • the order of the foregoing steps 5 and 6 may also be reversed, that is, the second protective layer is formed first, and then the first protective layer is formed.
  • the first protective layer formed later is not only located in the visible area, but is also designed to extend on the surface of the second protective layer extending in the non-visible area to further prevent the second protective layer from being detached.
  • the foregoing embodiments can be prepared by sequentially applying a coating, a lithography, and an etching process when preparing the insulating portion.
  • the insulating portion is, for example, an epoxy resin layer, a polyimide layer, or a methyl methacrylate layer.
  • the foregoing embodiments may be prepared by a process such as deposition, lithography, and etching when preparing the first electrode, the second electrode, or the signal transmission layer.
  • the aforementioned deposition process is, for example, physical vapor deposition (physical vapor deposition, PVD) or chemical vapor deposition Deposition).
  • Physical vapor deposition may include, for example, evaporation, sputtering, and chemical vapor deposition techniques may include, for example, low pressure chemical vapor deposition (low) Pressure chemical vapor deposition (LPCVD), metal-organic chemical Vapor deposition, MOCVD), plasma-enhanced chemical vapor deposition (plasma-enhanced chemical vapor) Deposition, PECVD) or photochemical vapor deposition (PHOTO) CVD)).
  • the aforementioned etching process can be performed by chemical etching or laser etching.
  • the first electrode and the second electrode in the foregoing embodiments may be, for example, a transparent conductive material.
  • the transparent conductive material may comprise indium tin oxide (indium) Tin oxide, ITO), indium zinc oxide (IZO), cadmium tin oxide (cadmium tin oxide, CTO), aluminum zinc oxide (AZO), indium tin zinc oxide (ITZO), zinc oxide (zinc) Oxide, cadmium oxide, hafnium oxide (HfO), indium gallium zinc Oxide, InGaZnO), indium gallium zinc magnesium oxide (indium gallium zinc magnesium oxide, InGaZnMgO), indium gallium magnesium oxide (InGaMgO) or indium gallium Aluminum oxide, InGaAlO) and so on.
  • the material of the signal transmission layer 160 may be selected from gold, silver, copper, nickel, aluminum, chromium, or any combination thereof (such as a molybdenum aluminum molybdenum laminate structure in which an aluminum layer is located between the two molybdenum layers).
  • the present invention can effectively avoid chromatic aberration and reduce factors affecting the light transmittance of the touch panel.
  • the protective layer divided into two parts of the present invention can be further designed with different materials respectively, so that the first protective layer corresponding to the sensing electrode layer has the effect of refractive index compensation and matching in addition to providing a protective function;
  • the adhesion to the shielding layer can be effectively improved.
  • the quality of the touch panel can be improved.

Abstract

一种触控面板，被定义有一非可视区及一对应该非可视区的可视区，其特征在于，该触控面板包括：一遮蔽层，设置于一基板的一侧，其中该遮蔽层的设置区域定义出该非可视区；一感测电极层，与该遮蔽层位于该基板之同侧，其中至少部分的该感测电极层设置于该基板直表面而且至少位于该可视区；一第一保护层，至少位于该可视区，并且至少覆盖该感测电极层；以及一第二保护层，位于该非可视区，并且至少覆盖该遮蔽层。进一步提供了制造该触控面板的方法。藉此通过保护层的架构改良搭配制程调整，使得保护层不会因为感测电极层及遮蔽层之间的落差来产生涂布不均进而出现色差问题。

Description

一种触控面板及其制造方法 技术领域
本发明乃是关于一种触控技术，特别是指一种触控面板及其制造方法。
背景技术
随着触控技术(Touch control)的演进，触控面板(touch panel)已广泛应用于各种消费电子装置，例如：智能型手机、平板计算机、相机、电子书、MP3播放器等携带式电子产品，或是应用于操作控制设备的显示屏幕。触控面板除了方便使用者操作之外，当然还包括薄型、轻便以及具有价格上的竞争力等优势。
触控面板通常包括基板、感测电极层、遮蔽层以及保护层，在架构上，保护层形成于感测电极层及遮蔽层上，用以保护感测电极层避免物理性或化学性的损坏。
然而，由于遮蔽层与感测电极层之间的厚度存在一定程度(约数十倍至百倍)的落差，因此在保护层的制作过程中，容易因为此厚度落差而造成涂布不均，让保护层产生色差问题而影响触控面板的透光性。
发明内容
本发明通过保护层的架构改良搭配制程调整，设计两部分的保护层来分别对应存在有厚度落差的感测电极层及遮蔽层，并且让两部分的保护层是独立形成，不会因为感测电极层及遮蔽层之间的落差来产生涂布不均情形。
本发明的一实施例提供一种触控面板，被定义有一非可视区及一对应该非可视区的可视区，其特征在于，该触控面板包括：一遮蔽层，设置于一基板的一侧，其中该遮蔽层的设置区域定义出该非可视区；一感测电极层，与该遮蔽层位于该基板之同侧，其中至少部分的该感测电极层设置于该基板之表面且至少位于该可视区；一第一保护层，至少位于该可视区，并且至少覆盖该感测电极层；以及一第二保护层，位于该非可视区，并且至少覆盖该遮蔽层。
本发明的另一实施例提供一种触控面板的制造方法，其中该触控面板被定义有一非可视区及一对应该非可视区的可视区，其特征在于，该触控面板的制造方法的步骤包括：形成一遮蔽层于一基板的一侧，其中该遮蔽层的形成区域定义出该非可视区；形成一与该遮蔽层位于该基板同侧的感测电极层，其中至少部分的该感测电极层形成于该基板之表面且至少位于该可视区；至少于该可视区内形成一第一保护层来至少覆盖于该感测电极层上；以及于该非可视区内形成一第二保护层来至少覆盖于该遮蔽层上。
藉此，本发明能有效地避免产生色差而降低影响触控面板透光性的因素。此外，本发明分成两部分的保护层更可进一步分别采用不同的材料来设计，让对应位于感测电极层的第一保护层除了提供保护功能之外，更具有折射率补偿及匹配的效果；而对应位于遮蔽层的第二保护层则除了提供保护功能之外，更可有效地提升与遮蔽层的附着力。整体而言更可提高触控面板的品质。
为了能更进一步了解本发明为达成既定目的所采取之技术、方法及功效，请参阅以下有关本发明之详细说明、图式，相信本发明之目的、特征与特点，当可由此得以深入且具体之了解，然而所附图式与附件仅提供参考与说明用，并非用来对本发明加以限制者。
为让本发明之特征能更明显易懂，下文特举实施例，并配合所附图式，作详细说明如下：
附图说明
图1 显示本发明第一实施例的触控面板的剖面示意图。
图2 显示本发明图1中的第一保护层的局部放大图。
图3 显示本发明第二实施例的触控面板的剖面示意图。
图4 显示本发明第三实施例的触控面板的剖面示意图。
图5 显示本发明实施例的触控面板的制造方法流程图。
具体实施方式
本说明书中所称的方位“上及“下，仅是用来表示相对的位置关系，对于本说明书的图式而言，触控面板的上方较远离使用者，而下方则较接近使用者。另外，本实施例的触控面板被定义有一非可视区及一对应非可视区的可视区。一般来讲，非可视区可以是对应设计在可视区的至少一侧边，本说明书中的各实施例的非可视区皆是例如以围绕在可视区周边的态样来进行说明。
请参照图1，图1显示本发明第一实施例的触控面板的剖面示意图。本实施例的触控面板100包括基板110、遮蔽层130、感测电极层120、第一保护层151及第二保护层152。其中，基板110可采用例如玻璃等透明的材质，并且基板110具有相对的下表面110a及上表面110b。下表面110a作为接受使用者触碰的表面，上表面110b上则用来形成触控面板100的各个部件，详细态样将会在后续内容中加以说明。此外，在本实施例中，基板110的下表面110a可例如已先经过强化、防刮、抗眩、抗菌及/或抗反射等表面处理，以使基板110兼具承载及保护的功能。
遮蔽层130设置于基板110的上表面110b之一侧，并且遮蔽层的设置区域之范围是用来定义出触控面板100的非可视区100B。本实施中的遮蔽层130是非透明的绝缘层，例如是黑色或是其他颜色的聚酰亚胺层，或者是油墨层。遮蔽层130可藉由沉积、微影及蚀刻制程来形成。
感测电极层120是与遮蔽层130一样位于基板的同一上表面110b之侧，并且至少有部分的感测电极层120设置于基板110的上表面110b且至少位于可视区100A，让感测电极层120至少在触控面板100的可视区100A内提供使用者触碰感测的功能。更具体来讲，感测电极层120包含复数个排列成列的第一电极121，复数个排列成行的第二电极（图中未示），以及连接相邻的第二电极（图中未示）的复数连接部124。复数跨接部123可用以连接在同一列上且相邻的第一电极121。复数个绝缘部122可设置于连接部124与跨接部123之间，用以电性绝缘连接部124和跨接部123。藉此，整体设置让感测电极层120的电极图案可分为蚀刻区120A与非蚀刻区120B两个部分。
第一保护层151在设计上至少位于可视区100A，并且覆盖于同样位于可视区100A的感测电极层120，藉以保护感测电极层120避免受到物理性或化学性的损坏。当然，由于感测电极层120区分有蚀刻区120A及非蚀刻区120B，因此第一保护层151除了覆盖于感测电极层120的非蚀刻区120B之外，更会同时覆盖于因蚀刻区120A而暴露出来的部分基板110。第二保护层152在设计上则是位于非可视区100B，并且覆盖于遮蔽层130上，由于本实施例中用来定义出非可视区100B的遮蔽层130是围绕于可视区100A来设置，因此本实施例的第二保护层152将呈现框型的结构态样。
承上所述，本实施例通过第一保护层151及第二保护层152的独立设计，让触控面板100的整个架构中，属于最后段制作形成的保护层不会受到遮蔽层130(厚度约1.5μm至20μm)及感测电极层120(厚度约250Å至300Å)之间厚度落差的影响而在制程上产生涂布不均的情形，有效地避免因涂布不均而产生色差的问题，降低影响触控面板透光性的因素，进而提升触控面板100的生产良率。
进一步说明的是，本实施例是以先设置遮蔽层130再形成感测电极层120的制程顺序来举例说明，并且感测电极层120是进一步延伸位于非可视区100B而形成于遮蔽层130的上表面。在一实施例中，感测电极层120可如图1所示的是整体直接制作来延伸于非可视区100B。在另一实施例中，感测电极层120延伸于非可视区100B的部分也可以是一独立的连接部，并在不同制程步骤中形成，在此并非为本发明所限制。
本实施例的触控面板100更包括信号传送层160，设置于遮蔽层130与第二保护层152之间，用来电性连接感测电极层120，传递感测电极层120与一外部控制器(图未示)之间的信号。如此一来，本实施例在非可视区100B设计第二保护层152的作用，即可同时覆盖于信号传送层160，用来保护信号传送层160避免受到物理性或化学性的损坏。举一实例来看，假设信号传送层160采用钼铝钼的金属叠层结构，由于中间有铝层的存在，铝的活泼性强，在空气中容易被氧化而形成一层不导电的氧化铝薄膜，因此第二保护层152可以用来将信号传送层160与空气隔绝，防止氧化；另外也可同时减少钼层被刮伤而暴露出铝层的机会。
值得一提的是，本实施例的第一保护层151更可设计为一折射率补偿层，而第二保护层152则可设计为一附着层。如此一来，让对应覆盖于感测电极层120的第一保护层151除了提供保护功能之外，更具有折射率补偿及匹配的效果，防止感测电极层120中蚀刻区120A及非蚀刻区120B之间的蚀刻线可视；而对应覆盖于遮蔽层130及信号传送层160的第二保护层152则除了提供保护功能之外，更可有效地提升与遮蔽层之间的附着力。
关于折射率补偿层，在一实施例中，折射率补偿层可采用金属氧化物、非金属氧化物、硅基材料或其混合物，并且在架构上可以是单层结构或复合层结构的设计。假设本实施例的折射率补偿层的折射率为n1，感测电极层的折射率为n2，本实施例的设计是让折射率补偿层的折射率n1大于或等于感应电极层的折射率n2。藉以减少蚀刻区120A与非蚀刻区120B对光线折射率的差异，从而有效避免因折射率不同而导致的画面质量不佳等问题，使得触控面板100具有良好的外观品质。
请参照图2，显示图1中的第一保护层151的局部放大图。详细而言，本实施例第一保护层151包含第一折射率层1511及第二折射率层1512，让第一保护层151在设计为折射率补偿层时是呈复合层结构的态样。其中，第一折射率层1511覆盖于感测电极层120上，第二折射率层1512设于第一折射率层1511上。此外，对于复合层结构的折射率补偿层的折射率n1设计，请进一步参考以下说明：
假设第一折射率层1511的折射率为n3；第二折射率层1512的折射率为n4。其中：
n3=sin a/sin b；
n4=sin b/sin c；
n3*n4=(sin a/sin b)*(sin b/sin c)=sin a/sin c；
故折射率补偿层的折射率n1与n3及n4之间满足关系式：n3=n1*n2。
本实施例通过第一折射率层1511及第二折射率层1512之叠层配置，达到复合层结构的折射率补偿层的折射率大于或等于设置于可视区100A内的感测电极层120的折射率。
在一实施例中，第一折射率层1511的折射率n3小于感测电极层120的折射率，而第二折射率层1512的折射率n4大于感测电极层120的折射率。具体而言，若感测电极层120的第一电极121及第二导电图案（图中未示）层皆为氧化铟锡图案层，折射率为1.86，则第一折射率层1511可以是一折射率小于1.86的膜层，例如：二氧化硅层，折射率为1.46，厚度为30 nm至50 nm。第二折射率层1512可以是折射率大于1.86的膜层，例如：五氧化二铌层，折射率为2.35，厚度为至5nm至10nm。在另一实施例中，第一折射率层1511为五氧化二铌层，且第二折射率层1512为二氧化硅层。换言之，复合层结构的折射率补偿层可例如是因应实际设计的感测电极层120的折射率而由一二氧化硅层及一五氧化二铌层复合而成。
关于附着层，在一实施例中，附着层为一有机材料层，由于附着层采用了与遮蔽层130性质相同或者相似的有机材料，因此附着层能够与遮光层130之间产生比较好的附着力，由有机材料构成的附着层于胶带百格测试(ASTM D3359－93)下，附着层相对于遮蔽层130的附着力至少大于4B，出现的脱离率不大于5%。藉此，让设置于附着层及遮蔽层130之间的信号传送层160可获得充分保护而与空气隔绝，减少被氧化的机会。
在一实施例中，该有机材料为可以为聚酰亚胺材料、油墨材料、醇类材料或其混合物。其中聚酰亚胺层的组成物包含硅烷及压克力。油墨材料的组成物则包含颜料、树脂及助剂，其中颜料可以是钛白或是碳粉，助剂则可以是固化剂或增稠剂。醇类材料可以是乙二醇、丙烯乙二醇、乙醇、异丙醇或其混合物。实际制程中可以通过调整各组分的含量来改善粘着度，从而获得与遮蔽层130更好的附着效果。
接下来，请参照图3，显示本发明第二实施例的触控面板的剖面示意图。如图3所示，本实施例的触控面板的架构大致与图1所示的第一实施例相同，差异点在于，本实施例所示的触控面板100的第一保护层151是进一步延伸位于非可视区100B，并且形成于第二保护层152之表面。藉此，能够进一步避免第二保护层152的脱落。本实施例的第一保护层151是全面形成于第二保护层152之表面上。当然，依实际设计需求，第一保护层151亦可仅形成于部分的第二保护层152之表面，在此并非为本发明所限制。
请再参照图4，显示本发明第三实施例的触控面板的剖面示意图。如图4所示，本实施例的触控面板的架构大致与图1所示的第一实施例相同，差异点在于，本实施例所示的触控面板100的感测电极层120与遮蔽层130之间的叠层顺序关系。本实施例是以先设置感测电极层120再形成遮蔽层130的制程顺序来设计。换言之，本实施例的感测电极层120在非可视区100B是形成在遮蔽层160的下表面。然而，基于本实施例的架构设计，为了让已先设置的感测电极层120与信号传送层160达成电性连接，本实施例的遮蔽层130进一步开设有一穿孔部，并且在穿孔部填充由导电物质构成的电性连接层140，让感测电极层120与信号传送层160通过穿孔部中的电性连接层140达成电性连接。
请参照图5，显示本发明实施例之触控面板的制造方法。首先，于步骤S1中，提供一基板。然后，于步骤S2中，形成一遮蔽层于基板的一侧，其中遮蔽层的形成区域用来定义出触控面板的非可视区。
于步骤S3中，形成一与遮蔽层位于基板同侧的感测电极层。其中，在本实施例中，除了至少有部分的感测电极层是形成于基板的表面且至少位于触控面板的可视区之外，感测电极层更是进一步延伸位于非可视区，并且在非可视区是位于前述步骤2所形成之遮蔽层的上表面。
当然，在另一实施例中，前述步骤2及步骤3的顺序可以对调，也就是先形成感测电极层，之后再形成遮蔽层。藉此，让感测电极层延伸在非可视区的部分是位于遮蔽层的下表面。
于步骤S4中，形成一信号传送层在遮蔽层上，用以电性连接感测电极层。
于步骤S5中，至少在可视区内形成一第一保护层来覆盖于感测电极层上。
于步骤S6中，在非可视区内形成一第二保护层来覆盖于遮蔽层及信号传送层。藉由上述步骤的执行得以完成本实施例的触控面板之制作。
在另一实施例中，前述步骤5及步骤6的顺序亦可对调，也就是先形成有第二保护层，之后再形成第一保护层。如此一来，后来才形成的第一保护层不仅是位于可视区，更可设计来延伸位于非可视区而形成在第二保护层之表面，进一步防止第二保护层的脱离。
最后补充说明的是，前述各实施例在制备绝缘部时，可依序使用涂布、微影及蚀刻制程来制备。另外，绝缘部例如为环氧树脂层、聚酰亚胺层、或甲基烯酸甲酯层等。除此之外，前述各实施例在制备第一电极、第二电极或信号传送层时，亦可藉由沉积、微影及蚀刻等制程来制备。
前述所提到的沉积制程例如为物理气相沈积(physical vapor deposition, PVD)或化学气相沈积(chemical vapor deposition)。物理气相沈积可包括例如蒸镀(evaporation)、溅镀(sputtering)，而化学气相沈积技术可包括例如低压化学气相沉积法(low pressure chemical vapor deposition, LPCVD)、有机金属化学气相沉积法(metal-organic chemical vapor deposition, MOCVD)、电浆增强式化学气相沉积法(plasma-enhanced chemical vapor deposition, PECVD)或光照射式化学气相沉积法(photo chemical vapor deposition, PHOTO CVD))。前述的蚀刻制程则可以采用化学蚀刻或雷射蚀刻。
再者，前述各实施例中的第一电极、第二电极可例如是采用透明导电材料。透明导电材料可包含氧化铟锡(indium tin oxide, ITO)、氧化铟锌(indium zinc oxide, IZO)、氧化镉锡(cadmium tin oxide, CTO)、氧化铝锌(aluminum zinc oxide, AZO)、氧化铟锌锡(indium tin zinc oxide, ITZO)、氧化锌(zinc oxide)、氧化镉(cadmium oxide)、氧化铪(hafnium oxide, HfO)、氧化铟镓锌(indium gallium zinc oxide, InGaZnO)、氧化铟镓锌镁(indium gallium zinc magnesium oxide, InGaZnMgO)、氧化铟镓镁(indium gallium magnesium oxide, InGaMgO)或氧化铟镓铝(indium gallium aluminum oxide, InGaAlO)等。此外，信号传送层160的材料可选择金、银、铜、镍、铝、铬、或上述任意组合(如钼铝钼叠层结构，其中铝层位于两钼层之间)。
综上所述，本发明能有效地避免产生色差而降低影响触控面板透光性的因素。此外，本发明分成两部分的保护层更可进一步分别采用不同的材料来设计，让对应位于感测电极层的第一保护层除了提供保护功能之外，更具有折射率补偿及匹配的效果；而对应位于遮蔽层的第二保护层则除了提供保护功能之外，更可有效地提升与遮蔽层的附着力。整体而言更可提高触控面板的品质。
以上所述仅为本发明的实施例，其并非用以限定本发明的专利保护范围。任何熟习相像技艺者，在不脱离本发明的精神与范围内，所作的更动及润饰的等效替换，仍为本发明的专利保护范围内。

Claims (19)

  1. 一种触控面板，被定义有一非可视区及一对应该非可视区的可视区，其特征在于，该触控面板包括：
    一遮蔽层，设置于一基板的一侧，其中该遮蔽层的设置区域定义出该非可视区；
    一感测电极层，与该遮蔽层位于该基板之同侧，其中至少部分的该感测电极层设置于该基板之表面且至少位于该可视区；
    一第一保护层，至少位于该可视区，并且至少覆盖该感测电极层；以及
    一第二保护层，位于该非可视区，并且至少覆盖该遮蔽层。
  2. 根据权利要求1所述的触控面板，其特征在于，该第一保护层为一折射率补偿层，该第二保护层为一附着层。
  3. 根据权利要求2所述的触控面板，其特征在于，该折射率补偿层为金属氧化物、非金属氧化物、硅基材料或其混合物。
  4. 根据权利要求2所述的触控面板，其特征在于，该折射率补偿层为一复合层结构。
  5. 根据权利要求4所述的触控面板，其特征在于，该折射率补偿层由一二氧化硅层及一五氧化二铌层复合而成。
  6. 根据权利要求5所述的触控面板，其特征在于，该二氧化硅层的厚度为30nm至50nm，该五氧化二铌层的厚度为5nm至10nm。
  7. 根据权利要求2所述的触控面板，其特征在于，该折射率补偿层的折射率大于或等于该感测电极层的折射率。
  8. 根据权利要求2所述的触控面板，其特征在于，该附着层为有机材料。
  9. 根据权利要求8所述的触控面板，其特征在于，该有机材料为聚酰亚胺材料、油墨材料、醇类材料或其混合物。
  10. 根据权利要求1所述的触控面板，其特征在于，该遮蔽层为一聚酰亚胺层或一油墨层。
  11. 根据权利要求1所述的触控面板，其特征在于，该第一保护层进一步延伸位于该非可视区，并且形成于该第二保护层之表面。
  12. 根据权利要求1所述的触控面板，其特征在于，该感测电极层进一步延伸位于该非可视区，并且形成于该遮蔽层的上表面或下表面。
  13. 根据权利要求1所述的触控面板，其特征在于，还包括一信号传送层，设置于该遮蔽层与该第二保护层之间，并且电性连接该感测电极层。
  14. 一种触控面板的制造方法，其中该触控面板被定义有一非可视区及一对应该非可视区的可视区，其特征在于，该触控面板的制造方法的步骤包括：
    形成一遮蔽层于一基板的一侧，其中该遮蔽层的形成区域定义出该非可视区；
    形成一与该遮蔽层位于该基板同侧的感测电极层，其中至少部分的该感测电极层形成于该基板之表面且至少位于该可视区；
    至少于该可视区内形成一第一保护层来至少覆盖于该感测电极层上；以及
    于该非可视区内形成一第二保护层来至少覆盖于该遮蔽层上。
  15. 根据权利要求14所述的触控面板的制造方法，其特征在于，该第一保护层为一折射率补偿层，该第二保护层为一附着层。
  16. 根据权利要求14所述的触控面板的制造方法，其特征在于，该第一保护层进一步延伸位于该非可视区，并且形成于该第二保护层之表面。
  17. 根据权利要求14所述的触控面板的制造方法，其特征在于，在形成该第二保护层之前，还包括：形成一信号传送层于遮蔽层之表面，用以电性连接该感测电极层。
  18. 根据权利要求14所述的触控面板的制造方法，其特征在于，该感测电极层进一步延伸位于该非可视区，并且该感测电极层是形成于该遮蔽层之前，在该非可视区中是位于该遮蔽层的下表面。
  19. 根据权利要求14所述的触控面板的制造方法，其特征在于，该感测电极层进一步延伸位于该非可视区，并且该感测电极层是形成于该遮蔽层之后，在该非可视区中是位于该遮蔽层的上表面。
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