WO2014190676A1 - 曝光设备和曝光方法 - Google Patents
曝光设备和曝光方法 Download PDFInfo
- Publication number
- WO2014190676A1 WO2014190676A1 PCT/CN2013/086978 CN2013086978W WO2014190676A1 WO 2014190676 A1 WO2014190676 A1 WO 2014190676A1 CN 2013086978 W CN2013086978 W CN 2013086978W WO 2014190676 A1 WO2014190676 A1 WO 2014190676A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- diffusion sheet
- exposure
- source
- light source
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/351,083 US9500955B2 (en) | 2013-05-30 | 2013-11-12 | Exposure apparatus and exposure method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310210193.9 | 2013-05-30 | ||
CN2013102101939A CN103309172A (zh) | 2013-05-30 | 2013-05-30 | 曝光设备和曝光方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014190676A1 true WO2014190676A1 (zh) | 2014-12-04 |
Family
ID=49134538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CN2013/086978 WO2014190676A1 (zh) | 2013-05-30 | 2013-11-12 | 曝光设备和曝光方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US9500955B2 (zh) |
CN (1) | CN103309172A (zh) |
WO (1) | WO2014190676A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103309172A (zh) * | 2013-05-30 | 2013-09-18 | 京东方科技集团股份有限公司 | 曝光设备和曝光方法 |
EP3454126A1 (en) * | 2017-09-08 | 2019-03-13 | ASML Netherlands B.V. | Method for estimating overlay |
CN111458986A (zh) * | 2020-04-22 | 2020-07-28 | 安徽大学 | 一种倒置接触式光学曝光光刻设备及曝光方法 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
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US6163405A (en) * | 1999-04-15 | 2000-12-19 | Industrial Technology Research Institute | Structure of a reflection-type light diffuser in a LCD |
CN1866055A (zh) * | 2005-05-19 | 2006-11-22 | 精工爱普生株式会社 | 微透镜及其制造方法、及其应用 |
CN1908754A (zh) * | 2005-08-05 | 2007-02-07 | 鸿富锦精密工业(深圳)有限公司 | 直下式背光模组及液晶显示装置 |
CN1942788A (zh) * | 2004-02-26 | 2007-04-04 | 他喜龙株式会社 | 光扩散片和使用该光扩散片的背光单元 |
CN101021579A (zh) * | 2007-03-13 | 2007-08-22 | 友达光电股份有限公司 | 光源扩散板及背光模块 |
CN101042488A (zh) * | 2006-03-24 | 2007-09-26 | 宣茂科技股份有限公司 | 光散射膜片及其制法与使用该膜片的背光模组及显示装置 |
WO2009048896A1 (en) * | 2007-10-09 | 2009-04-16 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Gray-tone lithography using optical diffusers |
CN101907734A (zh) * | 2009-06-07 | 2010-12-08 | 索尼公司 | 扩散片及其制造方法、背光以及液晶显示装置 |
CN102520591A (zh) * | 2011-12-15 | 2012-06-27 | 东南大学 | 一种基于负性光刻胶的扩散片光刻工艺方法 |
CN103309172A (zh) * | 2013-05-30 | 2013-09-18 | 京东方科技集团股份有限公司 | 曝光设备和曝光方法 |
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DE3772467D1 (de) * | 1986-06-13 | 1991-10-02 | Dainippon Screen Mfg | Belichtungssystem. |
US4936666A (en) * | 1989-08-08 | 1990-06-26 | Minnesota Mining And Manufacturing Company | Diffractive lens |
JP2916010B2 (ja) * | 1991-02-21 | 1999-07-05 | 大日本印刷株式会社 | 真空密着焼付装置 |
JP2949036B2 (ja) * | 1994-08-03 | 1999-09-13 | 大日本スクリーン製造株式会社 | プロキシミティ露光装置用光学系 |
JP2001264626A (ja) * | 2000-03-15 | 2001-09-26 | Canon Inc | 回折光学素子を有する光学系 |
CN1292310C (zh) * | 2001-12-17 | 2006-12-27 | 皇家飞利浦电子股份有限公司 | 形成光学图像的方法、本方法用的衍射部件、实行所述方法的设备 |
US7364839B2 (en) * | 2002-07-24 | 2008-04-29 | Kabushiki Kaisha Toshiba | Method for forming a pattern and substrate-processing apparatus |
JP4293857B2 (ja) * | 2003-07-29 | 2009-07-08 | シチズン電子株式会社 | フレネルレンズを用いた照明装置 |
JP4522166B2 (ja) * | 2004-06-29 | 2010-08-11 | キヤノン株式会社 | 露光方法 |
JP2010062309A (ja) * | 2008-09-03 | 2010-03-18 | Nikon Corp | 照明光学系、露光装置、およびデバイス製造方法 |
CN102597880B (zh) * | 2009-10-29 | 2015-09-16 | 株式会社V技术 | 曝光装置和光掩模 |
CN101976019A (zh) * | 2010-11-12 | 2011-02-16 | 复旦大学 | 一种异型表面上纳米尺寸的光刻方法和光刻设备 |
CN103048894B (zh) * | 2013-01-29 | 2014-10-15 | 中国科学院光电研究院 | 一种光刻机投影物镜波像差在线测量装置和方法 |
-
2013
- 2013-05-30 CN CN2013102101939A patent/CN103309172A/zh active Pending
- 2013-11-12 WO PCT/CN2013/086978 patent/WO2014190676A1/zh active Application Filing
- 2013-11-12 US US14/351,083 patent/US9500955B2/en active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6163405A (en) * | 1999-04-15 | 2000-12-19 | Industrial Technology Research Institute | Structure of a reflection-type light diffuser in a LCD |
CN1942788A (zh) * | 2004-02-26 | 2007-04-04 | 他喜龙株式会社 | 光扩散片和使用该光扩散片的背光单元 |
CN1866055A (zh) * | 2005-05-19 | 2006-11-22 | 精工爱普生株式会社 | 微透镜及其制造方法、及其应用 |
CN1908754A (zh) * | 2005-08-05 | 2007-02-07 | 鸿富锦精密工业(深圳)有限公司 | 直下式背光模组及液晶显示装置 |
CN101042488A (zh) * | 2006-03-24 | 2007-09-26 | 宣茂科技股份有限公司 | 光散射膜片及其制法与使用该膜片的背光模组及显示装置 |
CN101021579A (zh) * | 2007-03-13 | 2007-08-22 | 友达光电股份有限公司 | 光源扩散板及背光模块 |
WO2009048896A1 (en) * | 2007-10-09 | 2009-04-16 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Gray-tone lithography using optical diffusers |
CN101907734A (zh) * | 2009-06-07 | 2010-12-08 | 索尼公司 | 扩散片及其制造方法、背光以及液晶显示装置 |
CN102520591A (zh) * | 2011-12-15 | 2012-06-27 | 东南大学 | 一种基于负性光刻胶的扩散片光刻工艺方法 |
CN103309172A (zh) * | 2013-05-30 | 2013-09-18 | 京东方科技集团股份有限公司 | 曝光设备和曝光方法 |
Also Published As
Publication number | Publication date |
---|---|
US9500955B2 (en) | 2016-11-22 |
CN103309172A (zh) | 2013-09-18 |
US20150293455A1 (en) | 2015-10-15 |
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