WO2014189204A1 - Placage de motif transparent d'électrode et panneau d'écran tactile le comportant - Google Patents

Placage de motif transparent d'électrode et panneau d'écran tactile le comportant Download PDF

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Publication number
WO2014189204A1
WO2014189204A1 PCT/KR2014/002826 KR2014002826W WO2014189204A1 WO 2014189204 A1 WO2014189204 A1 WO 2014189204A1 KR 2014002826 W KR2014002826 W KR 2014002826W WO 2014189204 A1 WO2014189204 A1 WO 2014189204A1
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Prior art keywords
transparent electrode
layer
transparent
electrode layer
thickness
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PCT/KR2014/002826
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English (en)
Korean (ko)
Inventor
안기환
하경수
이유성
한용선
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동우화인켐 주식회사
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Publication of WO2014189204A1 publication Critical patent/WO2014189204A1/fr

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to a transparent electrode laminate and a touch screen panel having the same, and more particularly, to a transparent electrode laminate having low visibility to a user and a touch screen panel having the same.
  • a touch screen panel is a screen panel equipped with a special input device that receives a position when touched by hand.
  • the touch screen panel receives input data directly from the screen so that when a person's hand or an object touches a character or a specific location displayed on the screen without using a keyboard, the touch screen panel can identify the location and perform specific processing by the stored software. It is made possible by being laminated
  • the use of the transparent electrode is essential, and typically, a transparent electrode formed in a predetermined pattern is used.
  • GFF glass-ITO film-ITO film
  • G1F glass-ITO film
  • G2 glass-only
  • GFF is the most common structure, and the transparent electrode (ITO) required to implement the X and Y axes is composed of two films.
  • G1F is a thin film of ITO deposited on the back of the glass, and the second ITO is a film like the conventional method.
  • Use G2 is a method of forming a thin film by depositing and patterning X-axis ITO on the back side using one sheet of tempered glass, then forming an insulating layer thereon and patterning the ITO for Y-axis again.
  • the pattern portion and the non-pattern portion (pattern opening) of the transparent electrode can be visually distinguished, and as the difference in reflectance between the pattern portion and the non-pattern portion increases, the difference is increased. Since it becomes clear, there exists a problem that the visibility of the external appearance as a display element falls. In particular, in the capacitive touch panel, since the patterned transparent electrode layer is formed on the entire surface of the display display portion, even when the transparent electrode layer is patterned, a good appearance is required as the display element.
  • JP-A-2008-98169 of Patent Document 1 discloses a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer. Is proposed.
  • a silicon tin oxide layer (thickness of 10 nm or more) having a refractive index of 1.7 as a high refractive index layer on a transparent substrate, a silicon oxide layer having a refractive index of 1.43 as a low refractive index layer (thickness of 30 nm), and an ITO film having a refractive index of 1.95 as a transparent conductive layer
  • the transparent conductive film which formed (thickness 15nm) in this order is described.
  • Patent Document 1 Japanese Unexamined Patent Publication No. 2008-98169
  • An object of the present invention is to provide a transparent electrode laminate having little visibility difference in reflectance for each position of a pattern.
  • an object of this invention is to provide the touch screen panel provided with the said transparent electrode laminated body.
  • a transparent substrate having a transparent dielectric layer; A first transparent electrode layer formed on the transparent dielectric layer in a first pattern connected to each other and a second pattern separated from each other; An insulating layer formed on the first transparent electrode layer; And a second transparent electrode layer which is a bridge electrode electrically connecting the second pattern through a contact hole formed in the insulating layer.
  • the transparent electrode laminate In the above 1, wherein the first transparent electrode layer and the second transparent electrode layer has a refractive index of 1.8 to 2.2, respectively, the transparent electrode laminate.
  • the insulating layer has a refractive index of 1.4 to 1.6 transparent electrode laminate.
  • the transparent substrate has a thickness of 0.1 to 0.7mm transparent electrode laminate.
  • the transparent substrate has a refractive index of 1.4 to 1.6 transparent electrode laminate.
  • the transparent dielectric layer is a transparent electrode laminate formed of a plurality of layers.
  • the transparent dielectric layer has a refractive index of 1.4 to 2.5 transparent electrode laminate.
  • the transparent dielectric layer has a total thickness of 50 to 80nm transparent electrode laminate.
  • the insulating layer has a thickness of 1,000 to 2,000nm transparent electrode laminate.
  • the second transparent electrode layer is formed on the transparent dielectric layer
  • the insulating layer is formed on the second transparent electrode layer
  • the transparent electrode laminate is formed on the insulating layer the first transparent electrode layer .
  • the passivation layer has a thickness of less than 2,000nm transparent electrode laminate.
  • the transparent electrode laminate of the present invention adjusts the thickness of each layer constituting the laminate to a specific range, thereby minimizing the difference in reflectance by position caused by the patterned transparent electrode structure, thereby reducing the visibility to the user. Transparency is shown.
  • the transparent electrode laminate of the present invention can be very usefully used by showing high transmittance and low reflectance when applied to a touch screen panel having a G2 structure.
  • FIG. 1 is a schematic plan view of one embodiment of a transparent electrode laminate of the present invention.
  • FIG. 2 is a schematic plan view of a unit structure in one embodiment of the transparent electrode stack of the present invention.
  • FIG. 3 is a schematic cross-sectional view showing the laminated structure of each position of the transparent electrode laminate of the present invention.
  • FIG. 1 is a schematic plan view of one embodiment of a transparent electrode laminate of the present invention.
  • the transparent electrode laminate of the present invention may include a first transparent electrode layer 100, a second transparent electrode layer 200, an insulating layer 300, and a contact hole 400.
  • the transparent electrode laminate of the present invention may be formed on a transparent substrate (not shown), the passivation layer (not shown) may be further provided on the opposite side of the transparent substrate.
  • the transparent electrode laminate is formed in a predetermined pattern.
  • the first transparent electrode layer 100 and the second transparent electrode layer 200 provide position information of a touched point, and the insulating layer 300 is disposed between the first transparent electrode layer 100 and the second transparent electrode layer 200.
  • the two layers are electrically separated from each other, and the contact hole 400 is formed in the insulating layer 300 so that the first transparent electrode layer 100 and the second transparent electrode layer 200 can be electrically connected to each other.
  • each structure of the transparent electrode laminate is formed in a predetermined pattern, and according to the pattern structure, the transparent electrode laminate has a different laminate structure depending on its position.
  • the transparent electrode laminate may have five types of stacked structures from 1 to 5 depending on the position. 3 schematically shows the lamination structure in the above 1 to 5 positions.
  • the transparent electrode laminate has various layer structures. Due to the various layer structures according to the positions, differences in reflectance, luminance, color difference, etc. occur for each position, and accordingly, visibility of the pattern is increased, thereby making it transparent. There is a limit to the function as an electrode.
  • the present invention solves the above problems by minimizing the difference in reflectance by having a specific thickness range of the transparent electrode layer and the insulating layer.
  • the present invention will be described in more detail.
  • the present invention includes a first transparent electrode layer and a second transparent electrode layer.
  • the first transparent electrode layer 100 may be formed of the first pattern 110 and the second pattern 120.
  • the first pattern 110 and the second pattern 120 are disposed in the same row or column direction, respectively, to provide information about the X and Y coordinates of the touched point.
  • the first circuit 110, the second pattern 120, the second transparent electrode layer 200, and the position detection line via the position detection line toward the contact position The change in capacitance is thus conveyed.
  • the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.
  • the first pattern 110 and the second pattern 120 are formed on the same layer (first transparent electrode layer), and the respective patterns must be electrically connected to detect a touched point.
  • the first pattern 110 is connected to each other but the second pattern 120 is separated from each other in an island form, a separate connection line is required to electrically connect the second pattern 120. Do.
  • connection line should not be electrically connected to the first pattern 110, the connection line should be formed on a layer different from the first transparent electrode layer 100.
  • the second transparent electrode layer 200 is formed on a separate layer different from the first transparent electrode layer 100 to electrically connect the second pattern 120. That is, the second transparent electrode layer 200 is formed on a layer different from the first transparent electrode layer 100, but is formed of the first transparent electrode layer 100 through the contact hole 400 formed in the insulating layer 300 to be described later. It is a bridge electrode that electrically connects the two patterns 120.
  • the positions 1, 3, and 4 are portions in which the first transparent electrode layer 100 is formed in a predetermined pattern to detect a touched portion, and the positions 3, 4, and 5 are formed in an island shape.
  • the second transparent electrode layer 200 formed to electrically connect the two patterns 120 is present.
  • the second transparent electrode layer 200 since the second transparent electrode layer 200 must be electrically blocked from the first pattern 110 of the first transparent electrode layer 100, for this purpose, the insulating layer 300 and the contact hole 400 (3 in FIG. 2). ) Is provided, which will be described later.
  • the first transparent electrode layer 100 has a thickness of 20 to 200 nm, and the first transparent electrode layer is 20 nm or more and less than 120 nm
  • it is 0.70-1.20, More preferably, it is 0.8-1.
  • the thickness is out of the above range, the difference in reflectance of each position is increased to increase the reflection visibility of the pattern.
  • the resistance of the touch sensor is increased by decreasing the resistance, and if the thickness is more than 150 nm, the transmittance is lowered. There is a problem.
  • first transparent electrode layer 100 and the second transparent electrode layer 200 preferably have a refractive index of 1.8 to 2.2, respectively.
  • the reflectance reduction effect in the case of having the above-mentioned thickness range in the refractive index range can be further enhanced.
  • the first transparent electrode layer 100 and the second transparent electrode layer 200 according to the present invention may be applied without limitation to the transparent electrode material known in the art.
  • indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), PEDOT (poly (3,4-ethylenedioxythiophene)) , Carbon nanotubes (CNT), metal wires, and the like and these may be used alone or in combination of two or more thereof.
  • ITO indium tin oxide
  • the metal used for a metal wire is not specifically limited, For example, silver (Ag), gold, aluminum, copper, iron, nickel, titanium, telenium, chromium, etc. are mentioned. These can be used individually or in mixture of 2 or more types.
  • the transparent electrode layers 100 and 200 may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition.
  • PVD physical vapor deposition
  • CVD chemical vapor deposition
  • the transparent electrode layers 100 and 200 may also be formed by a printing process.
  • various printing methods such as gravure off set, reverse off set, screen printing, and gravure printing may be used.
  • the transparent electrode layers 100 and 200 may be formed of a printable paste material.
  • it may be formed of carbon nanotubes (CNTs), conductive polymers, and silver nano wire inks.
  • the stacking order of the first transparent electrode layer 100 and the second transparent electrode layer 200 is not limited. Therefore, in another embodiment of the present invention, the stacking order of the first transparent electrode layer 100 and the second transparent electrode layer 200 of FIG. 3 may be changed. For example, a second transparent electrode layer may be first formed on the transparent substrate instead of the first transparent electrode layer, an insulating layer may be formed thereon, and then the first transparent electrode layer may be formed on the insulating layer.
  • the insulating layer 300 is formed between the first transparent electrode layer 100 and the second transparent electrode layer 200 to prevent electrical connection between the first transparent electrode layer 100 and the second transparent electrode layer 200. 2 and 3, when the second transparent electrode layer 200 electrically connects the second pattern 120 of the adjacent first transparent electrode layer 100, the first transparent electrode layer 100 is used. Since it is to be electrically connected to the, it is necessary that a portion where the insulating layer 300 is not formed. As such, the portion of the insulating layer 300 where the insulating layer 300 is not formed is called the insulating layer 300 in the contact hole 400 (3 in FIG. 2). Therefore, the contact hole 400 makes electrical connection between the first transparent electrode layer (second pattern) and the second transparent electrode layer.
  • the insulating layer 300 has a thickness of 1,000 to 2,000 nm. If the thickness is out of the above range, there is a problem in that the reflectance difference of each position is increased to increase the reflection visibility of the pattern. If the thickness is less than 1,000 nm, the capacitance generated between the electrodes is lowered, so that the sensitivity of the touch sensor is lowered. If the thickness is more than 2,000 nm, the effect of increasing the thickness no longer occurs.
  • the insulating layer 300 preferably has a refractive index of 1.4 to 1.6.
  • the reflectance reduction effect in the case of having the above-mentioned thickness range in the refractive index range can be further enhanced.
  • the insulating layer 300 according to the present invention may be applied without limitation the transparent electrode material known in the art.
  • it may be formed in a required pattern using a transparent photosensitive resin composition containing a metal oxide such as silicon oxide or an acrylic resin.
  • the insulating layer 300 may be formed on the first transparent electrode layer 100 by deposition or printing.
  • the contact hole 400 may be formed by forming a hole after forming the insulating layer as a whole (hole method), and the insulating layer is electrically connected to the first transparent electrode layer and the second transparent electrode layer. It may also be formed in such a way as to form a part except for the part connected to the island (island method).
  • the transparent substrate forms the outermost surface of the touch screen panel and is a part to which a human hand or an object directly contacts.
  • the transparent electrode laminate of the present invention is bonded to the side of the opposite surface to which a human hand or an object directly comes into contact.
  • the transparent substrate is not particularly limited as long as it is durable to sufficiently protect the touch screen panel from external force, and a user can see the display well, and materials used in the art may be used without particular limitation.
  • materials used in the art may be used without particular limitation.
  • glass polyethersulphone (PES), polyacrylate (PAR, polyacrylate), polyetherimide (PEI), polyethylene naphthalate (PEN, polyethyelenen napthalate), polyethylene terephthalate (PET, polyethyelene terepthalate, polyphenylene sulfide (PPS), polyallylate, polyimide, polycarbonate (PC, polycarbonate), cellulose tri acetate (TAC), cellulose acetate propionate (cellulose acetate propionate (CAP) and the like may be used, preferably glass may be used, and more preferably tempered glass may be used.
  • PES polyethersulphone
  • PAR polyacrylate
  • PEI polyetherimide
  • PEN polyethylene naphthal
  • the transparent substrate according to the present invention may have a suitable thickness, for example, may be 0.1 to 0.7mm. Within this range, the effect of reducing the reflectance of the transparent electrode laminate according to the present invention can be further improved.
  • the transparent substrate preferably has a refractive index of 1.4 to 1.6.
  • the reflectance reduction effect in the case of having the above-mentioned thickness range in the refractive index range can be further enhanced.
  • the transparent dielectric layer is formed between the transparent substrate and the first transparent electrode layer to improve the optical uniformity of the touch screen panel. In other words, it serves to reduce the difference in optical characteristics due to the structural difference of each position according to the pattern structure of the transparent electrode.
  • the transparent dielectric layer may be formed by mixing niobium oxide, silicon oxide, cerium oxide, indium oxide, or the like, alone or in combination of two or more thereof.
  • the formation method may be a vacuum deposition method, a sputtering method, an ion plating method, and the like, and may be easily manufactured in the form of a thin film through the above method.
  • the transparent dielectric layer may be formed of a plurality of layers.
  • each layer may be formed of different materials, and may have different refractive indices and thicknesses.
  • the refractive index of the transparent dielectric layer is preferably 1.4 to 2.5 for reducing the reflectance of the transparent electrode laminate, and, if formed of a plurality of layers, the refractive index of each layer is preferably 1.8 to 2.2.
  • the thickness of the transparent dielectric layer is preferably 50 to 80 nm, in the case of forming a plurality of layers, the thickness of each layer may be adopted so long as the total thickness does not deviate from the thickness range.
  • the transparent electrode laminate of the present invention if necessary, in order to prevent the transparent electrode layers 100 and 200 from being contaminated by an external environment (moisture, air, etc.), the surface on which the transparent substrate is bonded based on the transparent electrode laminate
  • the passivation layer may be further provided on the opposite side of the substrate.
  • the passivation layer may be formed by adopting a material usable in the insulating layer 300.
  • the passivation layer according to the present invention may have a suitable thickness, for example, may be 2,000 nm or less. Thus, for example, it may be 0 to 2,000 nm. Within this range, the effect of reducing the reflectance of the transparent electrode laminate according to the present invention can be further improved.
  • the passivation layer preferably has a refractive index of 1.4 to 1.6.
  • the reflectance reduction effect in the case of having the above-mentioned thickness range in the refractive index range can be further enhanced.
  • the adhesive layer bonds the transparent electrode laminated body of this invention with a display panel part.
  • the adhesive layer may be formed by coating and curing the transparent curable resin composition (OCR), or may be formed by compressing an already cured film (OCA).
  • the adhesive layer may also affect the reflectance of the transparent electrode laminate, and therefore, it is desirable to have a suitable thickness and refractive index for reducing the reflectance of the transparent electrode laminate.
  • the thickness may be 0 to 250 ⁇ m and the refractive index may be 1 to 1.6.
  • the thickness is 0 ⁇ m, when the adhesive layer is formed only at the edge portion of the transparent electrode laminate, this means that the adhesive layer is not formed at the inner portion where the actual image is displayed. Only the air layer is present between the display panel units.
  • the transparent electrode layer and the insulating layer may have a specific thickness range, thereby minimizing the difference in reflectance according to the position, and thus, the transparency may be significantly improved. Therefore, the transparent electrode laminate of the present invention may be manufactured as a touch screen panel having excellent transparency when bonded to the display panel unit.
  • the transparent electrode laminate was produced with the thickness shown in Table 1 below, and the difference between the average reflectance at each position and the maximum and minimum values of the average reflectance was described.
  • the average reflectance means the average of the reflectance at 400nm ⁇ 700nm.
  • the transparent dielectric layer As the transparent dielectric layer, a double layer of Nb 2 O 5 layer (refractive index: 2.32, extinction coefficient: 0) and SiO 2 layer (refractive index: 1.46, extinction coefficient: 0)
  • ITO refractive index: 1.8, extinction coefficient: 0.014
  • ITO reffractive index: 1.8, extinction coefficient: 0.014
  • An acrylic insulating material (refractive index: 1.51, extinction coefficient: 0) was used as the insulating layer and the passivation layer, and the refractive index and the extinction coefficient were described based on light having a wavelength of 550 nm.
  • the adhesive layer is described as air, it means that only the bezel part is bonded so that the image display area is not formed of the adhesive layer.
  • the transparent electrode laminate was manufactured with the thickness shown in Table 2 below, and the difference between the average reflectance at each position and the maximum and minimum values of the average reflectance was described.
  • the average reflectance means the average of the reflectance at 400nm ⁇ 700nm.
  • the transparent dielectric layer As the transparent dielectric layer, a double layer of Nb 2 O 5 layer (refractive index: 2.32, extinction coefficient: 0) and SiO 2 layer (refractive index: 1.46, extinction coefficient: 0)
  • ITO refractive index: 1.975, extinction coefficient: 0.014
  • ITO reffractive index: 1.8, extinction coefficient: 0.014
  • an acrylic insulating material (refractive index: 1.51, extinction coefficient: 0) was used, and the refractive index and the extinction coefficient were described based on light having a wavelength of 550 nm.
  • the adhesive layer is described as air, it means that only the bezel part is bonded so that the image display area is not formed of the adhesive layer.
  • the difference between the maximum value and the minimum value of the average reflectance is less than or equal to 2%, and the visibility of the reflectance for each location is not large, so the visibility is very low.
  • the thickness ratio of the first transparent electrode layer and the second transparent electrode layer is outside the scope of the present invention, but the difference in average reflectance is 2% or less, but the comparative examples may include the first transparent electrode layer and / or This is the case where the thickness of the second transparent electrode layer is 10 nm or less.
  • the thickness of the transparent electrode layer was 10 nm or less, the electrical conductivity was lowered, and the basic function as the electrode was not satisfied.
  • 100 first transparent electrode layer, 110: first pattern, 120: second pattern

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

La présente invention concerne un placage de motif transparent d'électrode et un panneau d'écran tactile le comportant et, plus précisément, un placage de motif transparent d'électrode capable de réduire considérablement une différence de réflexibilité selon la position, ainsi qu'un panneau d'écran tactile le comportant, le placage comprenant : un substrat transparent pourvu d'une couche diélectrique transparente ; une première couche transparente d'électrode formée d'un premier motif branché sur la couche diélectrique transparente et un second motif séparé de la couche diélectrique transparente ; une couche isolante constituée sur la première couche transparente d'électrode ; et une seconde couche transparente d'électrode qui est une couche d'électrode pont afin de raccorder électriquement le second motif à travers un trou de contact pratiqué sur la couche isolante, la première couche transparente d'électrode ayant une épaisseur de 20 nm à 200 nm et, si l'épaisseur de la première couche transparente d'électrode est supérieure ou égale à 20 nm et inférieure à 120 nm, le rapport épaisseur de la première couche transparente d'électrode/épaisseur de la seconde couche transparente d'électrode est compris entre 0,15 et 0,375 et, si l'épaisseur de la première couche transparente d'électrode est supérieure ou égale à 120 nm et inférieure ou égale à 200 nm, le rapport épaisseur de la seconde couche transparente d'électrode/épaisseur de la première couche transparente d'électrode est compris entre 0,60 et 1,50.
PCT/KR2014/002826 2013-05-23 2014-04-02 Placage de motif transparent d'électrode et panneau d'écran tactile le comportant WO2014189204A1 (fr)

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KR10-2013-0058363 2013-05-23
KR1020130058363A KR101865685B1 (ko) 2013-05-23 2013-05-23 투명 전극 패턴 적층체 및 이를 구비한 터치 스크린 패널

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WO2016093517A1 (fr) * 2014-12-09 2016-06-16 동우화인켐 주식회사 Panneau à écran tactile et appareil d'affichage d'image doté de ce panneau
CN113140162A (zh) * 2020-01-17 2021-07-20 群创光电股份有限公司 拼接透明显示装置及用于拼接的透明显示装置

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EP3223120B1 (fr) 2014-11-20 2020-09-30 Dongwoo Fine-Chem Co., Ltd. Capteur tactile sous forme de film et son procédé de fabrication
KR20160071735A (ko) * 2014-12-12 2016-06-22 동우 화인켐 주식회사 필름 터치 센서 및 그의 제조 방법
KR102276210B1 (ko) * 2015-01-26 2021-07-12 동우 화인켐 주식회사 필름 터치 센서 및 그의 제조 방법
KR102374644B1 (ko) * 2015-03-24 2022-03-15 삼성디스플레이 주식회사 표시 장치
KR102467806B1 (ko) * 2015-10-23 2022-11-17 삼성디스플레이 주식회사 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법
KR102332579B1 (ko) * 2016-03-31 2021-11-29 동우 화인켐 주식회사 터치 센서
KR102430032B1 (ko) * 2017-08-16 2022-08-04 동우 화인켐 주식회사 투명 전극 적층체 및 이의 제조 방법

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