WO2014091136A8 - Support conducteur pour dispositif oled, ainsi que dispositif oled l'incorporant. - Google Patents

Support conducteur pour dispositif oled, ainsi que dispositif oled l'incorporant. Download PDF

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Publication number
WO2014091136A8
WO2014091136A8 PCT/FR2013/053008 FR2013053008W WO2014091136A8 WO 2014091136 A8 WO2014091136 A8 WO 2014091136A8 FR 2013053008 W FR2013053008 W FR 2013053008W WO 2014091136 A8 WO2014091136 A8 WO 2014091136A8
Authority
WO
WIPO (PCT)
Prior art keywords
layer
thickness
smaller
oled device
zinc oxide
Prior art date
Application number
PCT/FR2013/053008
Other languages
English (en)
Other versions
WO2014091136A1 (fr
Inventor
Denis Guimard
Anne Lelarge
Original Assignee
Saint-Gobain Glass France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint-Gobain Glass France filed Critical Saint-Gobain Glass France
Priority to JP2015547117A priority Critical patent/JP2016506037A/ja
Priority to EP13818277.9A priority patent/EP2932539A1/fr
Priority to KR1020157018305A priority patent/KR20150097587A/ko
Priority to CN201380072919.5A priority patent/CN104969376A/zh
Priority to US14/651,795 priority patent/US20150311470A1/en
Publication of WO2014091136A1 publication Critical patent/WO2014091136A1/fr
Publication of WO2014091136A8 publication Critical patent/WO2014091136A8/fr

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/816—Multilayers, e.g. transparent multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3639—Multilayers containing at least two functional metal layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3655—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing at least one conducting layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/10—Transparent electrodes, e.g. using graphene
    • H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H10K2102/102—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising tin oxides, e.g. fluorine-doped SnO2
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/10—Transparent electrodes, e.g. using graphene
    • H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/831—Aging

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

L'invention se rapporte à un support conducteur pour OLED, comportant : - une sous couche, diélectrique, d'épaisseur optique L1 supérieure à 20nm et inférieure à 180nm, comportant une première couche cristalline de contact à base d'oxyde de zinc, de préférence dopé, - une première couche d'argent, d'épaisseur inférieure à 20nm, - une couche séparatrice, diélectrique, d'épaisseur optique L2 donnée supérieure à 80nm et inférieure à 280nm, comportant dans cet ordre : - une couche d'oxyde de zinc de préférence dopé, d'épaisseur e2, directement sur la première couche d'argent - une éventuelle couche amorphe, à base d'oxyde d'étain et de zinc ou à base d'oxyde d'indium et de zinc ou à base d'oxyde d'indium de zinc et d'étain d'épaisseur e, inférieure à 15nm, - une deuxième couche d'oxyde de zinc, d'épaisseur ec2, la somme des épaisseurs eC2+e2 étant d'au moins 30nm, - une deuxième couche d'argent, d'épaisseur inférieure à 20nm, - un surbloqueur métallique, d'épaisseur inférieure à 3nm - une surcouche électroconductrice, diélectrique.
PCT/FR2013/053008 2012-12-13 2013-12-10 Support conducteur pour dispositif oled, ainsi que dispositif oled l'incorporant. WO2014091136A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2015547117A JP2016506037A (ja) 2012-12-13 2013-12-10 Ｏｌｅｄデバイスのための導電性支持体及びそれを組み込んだｏｌｅｄデバイス
EP13818277.9A EP2932539A1 (fr) 2012-12-13 2013-12-10 Support conducteur pour dispositif oled, ainsi que dispositif oled l'incorporant.
KR1020157018305A KR20150097587A (ko) 2012-12-13 2013-12-10 Oled 장치를 위한 전도성 지지체 및 그것을 포함하는 oled 장치
CN201380072919.5A CN104969376A (zh) 2012-12-13 2013-12-10 用于oled装置的导电载体和包括该导电载体的oled装置
US14/651,795 US20150311470A1 (en) 2012-12-13 2013-12-10 Conductive support for an oled device, and oled device incorporating the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1262009A FR2999807B1 (fr) 2012-12-13 2012-12-13 Support conducteur pour dispositif oled, ainsi que dispositif oled l'incorporant
FR1262009 2012-12-13

Publications (2)

Publication Number Publication Date
WO2014091136A1 WO2014091136A1 (fr) 2014-06-19
WO2014091136A8 true WO2014091136A8 (fr) 2014-10-30

Family

ID=49209397

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2013/053008 WO2014091136A1 (fr) 2012-12-13 2013-12-10 Support conducteur pour dispositif oled, ainsi que dispositif oled l'incorporant.

Country Status (7)

Country Link
US (1) US20150311470A1 (fr)
EP (1) EP2932539A1 (fr)
JP (1) JP2016506037A (fr)
KR (1) KR20150097587A (fr)
CN (1) CN104969376A (fr)
FR (1) FR2999807B1 (fr)
WO (1) WO2014091136A1 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104900773B (zh) * 2015-04-15 2017-09-19 安徽三安光电有限公司 一种氮化物发光二极管结构及其制备方法
US10505078B2 (en) * 2016-07-08 2019-12-10 Effulgent Inc. Methods and apparatus for illuminating gemstones
CN107170779A (zh) * 2017-05-12 2017-09-15 京东方科技集团股份有限公司 一种oled显示基板及显示装置
JP2019021599A (ja) 2017-07-21 2019-02-07 株式会社東芝 透明電極、およびその製造方法、ならびにその透明電極を用いた電子デバイス
US10650935B2 (en) * 2017-08-04 2020-05-12 Vitro Flat Glass Llc Transparent conductive oxide having an embedded film
US10998514B2 (en) 2017-12-01 2021-05-04 Samsung Electronics Co., Ltd. Photoelectric devices and image sensors and electronic devices
FR3099413B1 (fr) * 2019-07-30 2021-10-29 Saint Gobain Materiau comprenant un substrat muni d’un empilement a proprietes thermiques pour affichage tête haute
JP2021137993A (ja) * 2020-03-03 2021-09-16 デクセリアルズ株式会社 導電性積層体及びこれを用いた光学装置、導電性積層体の製造方法
CN111559875B (zh) * 2020-06-19 2024-05-14 广东旗滨节能玻璃有限公司 一种镀膜玻璃及其制备方法
CN116018258A (zh) * 2020-09-04 2023-04-25 迪睿合株式会社 导电性层叠体及使用其的光学装置、导电性层叠体的制造方法
CN112670354A (zh) * 2020-12-17 2021-04-16 浙江正泰太阳能科技有限公司 一种高效钝化结构电池及其制备方法
CN114804930A (zh) * 2022-04-18 2022-07-29 苏州博志金钻科技有限责任公司 一种高功率半导体器件散热用单晶碳化硅金属化复合陶瓷片
CN116102362B (zh) * 2023-02-17 2024-04-19 潮州市长鸿卫浴科技有限公司 一种防污卫浴陶瓷及其制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10135513B4 (de) 2001-07-20 2005-02-24 Novaled Gmbh Lichtemittierendes Bauelement mit organischen Schichten
FR2844364B1 (fr) 2002-09-11 2004-12-17 Saint Gobain Substrat diffusant
FR2925981B1 (fr) * 2007-12-27 2010-02-19 Saint Gobain Substrat porteur d'une electrode, dispositif electroluminescent organique l'incorporant.
FR2964254B1 (fr) * 2010-08-30 2013-06-14 Saint Gobain Support de dispositif a diode electroluminescente organique, un tel dispositif a diode electroluminescente organique et son procede de fabrication
FR2969391B1 (fr) * 2010-12-17 2013-07-05 Saint Gobain Procédé de fabrication d'un dispositif oled
FR2973946B1 (fr) * 2011-04-08 2013-03-22 Saint Gobain Dispositif électronique a couches

Also Published As

Publication number Publication date
WO2014091136A1 (fr) 2014-06-19
EP2932539A1 (fr) 2015-10-21
KR20150097587A (ko) 2015-08-26
US20150311470A1 (en) 2015-10-29
CN104969376A (zh) 2015-10-07
JP2016506037A (ja) 2016-02-25
FR2999807B1 (fr) 2015-01-02
FR2999807A1 (fr) 2014-06-20

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