WO2014042139A8 - 酸化物焼結体およびスパッタリングターゲット - Google Patents

酸化物焼結体およびスパッタリングターゲット Download PDF

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Publication number
WO2014042139A8
WO2014042139A8 PCT/JP2013/074340 JP2013074340W WO2014042139A8 WO 2014042139 A8 WO2014042139 A8 WO 2014042139A8 JP 2013074340 W JP2013074340 W JP 2013074340W WO 2014042139 A8 WO2014042139 A8 WO 2014042139A8
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sintered body
oxide
oxide sintered
sputtering target
phase
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PCT/JP2013/074340
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English (en)
French (fr)
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WO2014042139A1 (ja
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幸樹 田尾
守賀 金丸
旭 南部
英雄 畠
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株式会社コベルコ科研
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Priority to CN201380047313.6A priority Critical patent/CN104619673B/zh
Priority to US14/427,761 priority patent/US9905403B2/en
Priority to KR1020157006265A priority patent/KR101762043B1/ko
Publication of WO2014042139A1 publication Critical patent/WO2014042139A1/ja
Publication of WO2014042139A8 publication Critical patent/WO2014042139A8/ja

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    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
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    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
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  • Compositions Of Oxide Ceramics (AREA)
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Abstract

　酸化亜鉛と；酸化インジウムと；酸化ガリウムと；酸化錫を混合および焼結して得られる酸化物焼結体。前記酸化物焼結体の相対密度が８５％以上であり、前記酸化物焼結体をＸ線回折したとき、Ｚｎ２ＳｎＯ４相とＩｎＧａＺｎＯ４相が所定の割合で含まれている。
PCT/JP2013/074340 2012-09-14 2013-09-10 酸化物焼結体およびスパッタリングターゲット WO2014042139A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201380047313.6A CN104619673B (zh) 2012-09-14 2013-09-10 氧化物烧结体及溅射靶
US14/427,761 US9905403B2 (en) 2012-09-14 2013-09-10 Oxide sintered body and sputtering target
KR1020157006265A KR101762043B1 (ko) 2012-09-14 2013-09-10 산화물 소결체 및 스퍼터링 타깃

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012-203577 2012-09-14
JP2012203577A JP5883368B2 (ja) 2012-09-14 2012-09-14 酸化物焼結体およびスパッタリングターゲット

Publications (2)

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WO2014042139A1 WO2014042139A1 (ja) 2014-03-20
WO2014042139A8 true WO2014042139A8 (ja) 2015-03-12

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US (1) US9905403B2 (ja)
JP (1) JP5883368B2 (ja)
KR (1) KR101762043B1 (ja)
CN (1) CN104619673B (ja)
TW (1) TWI507374B (ja)
WO (1) WO2014042139A1 (ja)

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CN105705673B (zh) * 2013-11-06 2018-05-04 三井金属矿业株式会社 溅射靶及其制造方法
WO2015080271A1 (ja) * 2013-11-29 2015-06-04 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット、並びにその製造方法
JP6398645B2 (ja) * 2014-11-20 2018-10-03 Tdk株式会社 スパッタリングターゲット、透明導電性酸化物薄膜、及び導電性フィルム
TWI577032B (zh) * 2015-04-24 2017-04-01 群創光電股份有限公司 顯示裝置
JP6144858B1 (ja) * 2016-04-13 2017-06-07 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法
JP6254308B2 (ja) * 2016-04-19 2017-12-27 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法
WO2017183263A1 (ja) * 2016-04-19 2017-10-26 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法
JP6364561B1 (ja) * 2017-05-18 2018-07-25 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット
JP6364562B1 (ja) * 2017-05-19 2018-07-25 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット
CN108642458A (zh) * 2018-06-20 2018-10-12 江苏瑞尔光学有限公司 一种ito镀膜靶材及其制备方法
CN109659411B (zh) * 2018-12-11 2020-02-14 中山大学 一种氧化镓半导体叠层结构及其制备方法
CN112537954B (zh) * 2020-12-17 2022-04-15 中山智隆新材料科技有限公司 一种igzo靶材的制备方法

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JP3746094B2 (ja) 1995-06-28 2006-02-15 出光興産株式会社 ターゲットおよびその製造方法
JP4198918B2 (ja) * 2002-02-14 2008-12-17 日鉱金属株式会社 硫化亜鉛を主成分とするスパッタリングターゲット及び該スパッタリングターゲットの製造方法
TWI532862B (zh) 2008-05-22 2016-05-11 Idemitsu Kosan Co A sputtering target, a method for forming an amorphous oxide film using the same, and a method for manufacturing a thin film transistor
KR101549295B1 (ko) * 2008-12-12 2015-09-01 이데미쓰 고산 가부시키가이샤 복합 산화물 소결체 및 그것으로 이루어지는 스퍼터링 타겟
JP5591523B2 (ja) * 2009-11-19 2014-09-17 出光興産株式会社 長期成膜時の安定性に優れたＩｎ−Ｇａ−Ｚｎ−Ｏ系酸化物焼結体スパッタリングターゲット
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JP2012114367A (ja) * 2010-11-26 2012-06-14 Idemitsu Kosan Co Ltd 錫を含む非晶質酸化物薄膜、及び薄膜トランジスタ
JP2012158512A (ja) 2011-01-14 2012-08-23 Kobelco Kaken:Kk 酸化物焼結体およびスパッタリングターゲット

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Publication number Publication date
CN104619673A (zh) 2015-05-13
JP5883368B2 (ja) 2016-03-15
WO2014042139A1 (ja) 2014-03-20
TW201420544A (zh) 2014-06-01
KR101762043B1 (ko) 2017-07-26
KR20150041137A (ko) 2015-04-15
US9905403B2 (en) 2018-02-27
JP2014058416A (ja) 2014-04-03
CN104619673B (zh) 2016-07-13
TWI507374B (zh) 2015-11-11
US20150235819A1 (en) 2015-08-20

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