WO2014026403A1 - 液晶面板及其制作方法 - Google Patents

液晶面板及其制作方法 Download PDF

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Publication number
WO2014026403A1
WO2014026403A1 PCT/CN2012/080647 CN2012080647W WO2014026403A1 WO 2014026403 A1 WO2014026403 A1 WO 2014026403A1 CN 2012080647 W CN2012080647 W CN 2012080647W WO 2014026403 A1 WO2014026403 A1 WO 2014026403A1
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WIPO (PCT)
Prior art keywords
liquid crystal
crystal panel
restriction
component
lower substrate
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Ceased
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PCT/CN2012/080647
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English (en)
French (fr)
Inventor
施明宏
廖作敏
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US13/703,360 priority Critical patent/US20150168752A1/en
Priority to DE112012006668.5T priority patent/DE112012006668B4/de
Publication of WO2014026403A1 publication Critical patent/WO2014026403A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133776—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers having structures locally influencing the alignment, e.g. unevenness
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells

Definitions

  • the present invention relates to the field of liquid crystal panels, and in particular to a method for fabricating a liquid crystal panel with a uniform alignment film.
  • the liquid crystal panel is an important component of the liquid crystal display.
  • the liquid crystal panel mainly comprises an array substrate, a color mold substrate and a liquid crystal enclosed between the array substrate and the color filter substrate.
  • the liquid crystal is aligned by an alignment layer coated on the array substrate and the color mold substrate, controls the alignment direction of the liquid crystal molecules, and provides a pretilt angle required for the liquid crystal display structure (pre-tile) Angle) to achieve the display effect of the liquid crystal panel.
  • the commonly used alignment film is polyimide (polyimide, PI) material with high heat resistance, chemical solvent resistance and radiation and electrical insulation properties.
  • the alignment layer is formed by coating the alignment liquid, it is difficult to control the diffusion of the edge of the alignment film due to the properties of the polyimide insulating property and the poor adhesion of the sealant, resulting in the disadvantage that the edge is not flat and the dimensional control is not easy.
  • the alignment film is beyond the area of the sealant, the strength of the sealant is reduced and the quality of the sealant is affected.
  • the alignment liquid is dried from the outside to the inside during the drying process, which causes the thickness of the edge of the alignment film to be higher than the thickness of the central portion.
  • the thickness of the alignment film is not uniform, the problem of uneven alignment tends to be caused, thereby affecting the display quality.
  • FIG. 1A is a cross-sectional view showing a structure of a conventional array substrate.
  • a trench 102A is formed on a side of an array substrate 10A.
  • the trench 102A can absorb an outward-diffusing alignment liquid 104A to make an alignment liquid 104A. It does not spread further to the sealant 106A outside the groove 102A. However, if the alignment liquid 104A is excessive, it is still possible to overflow the trench 102A and diffuse to the sealant 106A outside the trench 102A.
  • Another conventional method is to form a bump on the side of the array substrate.
  • FIG. 1B is a structural cross-sectional view of another conventional array substrate.
  • the bump 102B of the array substrate 10B can block the alignment liquid 104B from flowing to the frame.
  • Glue 106B Area Glue 106B Area.
  • the alignment liquid 104B flows to the region of the sealant 106B.
  • the step of the formed trench or bump is relatively small, the alignment liquid easily overflows the trench or the bump and the design fails.
  • Another object of the present invention is to provide a method for fabricating a liquid crystal panel, which can be configured to prevent the alignment liquid from overflowing, reduce the distance between the edge of the effective display area and the edge of the panel, and realize an ultra-narrow bezel design.
  • the present invention constructs a liquid crystal panel including an upper substrate, a lower substrate, and a sealant.
  • the lower substrate includes a display area, a non-display area, a first restriction component, and a second restriction component.
  • the non-display area is adjacent to the display area, and the sealant is disposed on the non-display area.
  • the first restriction component is located at the edge of the non-display area.
  • the second restriction component is located between the display area and the first restriction component.
  • Another object of the present invention is to provide a method for fabricating a liquid crystal panel, which can be configured to prevent the alignment liquid from overflowing, reduce the distance between the edge of the effective display area and the edge of the panel, and realize an ultra-narrow bezel design.
  • the present invention provides a method for fabricating a liquid crystal panel, which comprises the steps of: stacking a plurality of layers on the upper substrate and the lower substrate respectively; forming a first restriction component on a side of the sealant; When forming a multilayer film on the lower substrate, a portion of the multilayer film is retained on the side of the sealant to form a first restriction component; an alignment film is coated on the lower substrate to form an alignment layer; and the first restriction component
  • the structure of the second limiting component, in the process of coating the alignment film, the first limiting component and the second limiting component are used to block the diffusion of the alignment film to the region of the sealant, and avoid overlapping of the alignment film and the sealant.
  • the first limiting component and the second limiting component in the process of coating the alignment film, can block the diffusion of the alignment film to the region of the sealant, avoiding the alignment film and the sealant. Overlapping.
  • the purpose of uniformly coating the alignment film can be achieved, and the distance between the edge of the effective display area and the edge of the panel can be reduced, thereby making the ultra-narrow bezel easier to realize. .
  • 1A is a cross-sectional view showing the structure of a conventional array substrate
  • 1B is a cross-sectional view showing the structure of another conventional array substrate
  • FIG. 2 is a cross-sectional view showing the structure of a liquid crystal panel according to a preferred embodiment of the present invention
  • FIG. 3 is a cross-sectional view showing the structure of a lower substrate of a liquid crystal panel of the present invention.
  • FIG. 4 is a flow chart showing the steps of forming a groove and a retaining wall of the liquid crystal panel of the present invention.
  • the liquid crystal panel 20 mainly includes an upper substrate 202, a lower substrate 204, and a sealant 206.
  • the upper substrate 202 is a color filter (Color Filer, CF), which mainly includes a black matrix (BM) 2021, a color filter layer 2022, and a transparent conductive (or indium tin).
  • Oxide, ITO ITO
  • spacer layer Photo Spacer, PS
  • the function of the light-shielding black matrix 2021 on the upper substrate 202 is to shield the light source, preventing leakage of incident light and affecting the color tone.
  • the color filter layer 2022 is subjected to additive mixing by light and liquid crystal torsion to obtain a coloring effect.
  • the transparent conductive layer 2023 provides an inductance of the electrodes to the liquid crystal molecules of the liquid crystal panel 20 to control the rotation of the liquid crystal molecules.
  • the function of the spacer layer 2024 is to maintain the distance between the upper substrate 202 and the lower substrate 204 (Cell Gap).
  • the lower substrate 204 is an Array substrate, which mainly includes a glass substrate 2045 and an insulating layer 2041, a protective layer 2042, and a thin film transistor (Thin) disposed on the glass substrate 2045. Film Transistor) 2043, second alignment film 2044, and the like. It should be noted that the above description only briefly illustrates the main structure of the liquid crystal panel 20, and the liquid crystal panel not limited to the present invention includes only the above-described structure. Moreover, the manner in which the layers of the film are formed on the upper substrate 202 and the lower substrate 204 is well known to those skilled in the art and will not be described herein.
  • the thin film transistor 2043 when the thin film transistor 2043 is stacked on the lower substrate 204, the film layers of the thin film transistor 2043 are left in the same place of the lower substrate 204, thereby forming a first limit.
  • the thin film transistor 2043 is mainly composed of a portion of the insulating layer 2041, a portion of the protective layer 2042, a first metal layer 2046, a second metal layer 2047, an amorphous silicon layer 2048, and an indium tin oxide (ITO) layer 2049. .
  • the insulating layer 2041 covers the glass substrate 2045 and the first metal layer 2046, and the protective layer 2042 is stacked on the insulating layer 2041 and the second metal layer 2047. Near the edge of the sealant 206, a small portion of each of the above layers is simultaneously retained during the fabrication of the thin film transistor, without the need for additional processing steps to form a first restriction component 208 having a relatively high height, as shown in the figure. Shown in . In the present embodiment, a thin film transistor is taken as an example, but the present invention is not limited thereto. In the present invention, the first restriction component 208 can be formed as a retaining wall, or can be a bump or the like, which is not limited herein.
  • a concave second restriction component 210 is formed on the front side of the first restriction component 208.
  • the second restriction component 210 may be a groove, or may be a groove or the like. This is not limited here.
  • the second restriction component 210 can accommodate the outwardly diffused second alignment film 2047, and in conjunction with the arrangement of the first restriction component 208, the second alignment film 2047 is less likely to pass over the first restriction component 208 and the second restriction component 210.
  • the combined structure prevents the second alignment film 2047 from overlapping with the sealant 206, which affects the adhesion of the sealant 206.
  • the manner in which the first restriction component 208 is stacked is not limited to the shape shown in the figures, and in various embodiments, the manner in which the stack can be adjusted to form the first restriction component 208 of a different shape or height.
  • the depth or width of the etch can also be modified to etch different film layers to form second restriction members 210 of different depths or different widths. For example, it may be etched over the insulating layer 2041 or etched over the lower substrate 204, and the second limiting component 210 of different depths may be etched according to actual needs.
  • FIG. 3 is a cross-sectional structural view showing a lower substrate of a liquid crystal panel of the present invention.
  • the area where the lower substrate 30 of the embodiment is coated with the alignment film 302 is the display area 304, and the area where the alignment film 302 is not applied, that is, the area of the sealant 306 is the non-display area 308.
  • the first restriction component 310 of the lower substrate 30 is disposed at an edge of the non-display area 308, and the first restriction component 310 may be a retaining wall or a bump or the like, which is not limited herein.
  • the second limiting component 312 is disposed between the first limiting component 310 and the display area 304.
  • the second limiting component 312 can be a trench or a groove, etc., and is not limited herein. Due to the design of the first restriction component 310 and the second restriction component 312, the alignment film 302 is prevented from diffusing from the display area 304 to the undisplayed area 308, preventing the alignment film 302 from overlapping with the sealant 306. On the other hand, in the present invention, the combination of the first restriction component 310 and the second restriction component 312 can achieve a larger step difference than the conventional structure using only the first restriction component 310 or the second restriction component 312. The effect of preventing the alignment film 302 from overflowing is better.
  • step 402 a multilayer film is stacked on the upper substrate and the lower substrate, the upper substrate is a glass substrate on the color filter side, and the lower substrate is a glass substrate on the array side.
  • step 404 when the multilayer substrate is formed on the lower substrate, a portion of the multilayer film is retained on the side of the sealant to form a first restriction member formed by retaining a portion of the multilayer film. For example, an insulating layer and/or a protective layer of a portion of the lower substrate is retained to form a first confinement component.
  • the first limiting component is preferably a retaining wall or a bump, which is not limited herein.
  • the multilayer film above the lower substrate is etched to form a second limiting component.
  • the second limiting component is preferably a trench or may be a recess, which is not limited herein. Additionally, the second restriction component is formed in a region adjacent to the first restriction component.
  • an alignment film is coated on the lower substrate to form an alignment layer.
  • the purpose of uniformly coating the alignment film can be achieved, and the distance between the edge of the effective display area and the edge of the panel can be reduced, thereby making the ultra-narrow bezel easier to realize.

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
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Description

液晶面板及其制作方法 技术领域
本发明涉及液晶面板技术领域，特别是涉及一种均匀配向膜的液晶面板制作方法。
 背景技术
液晶面板为液晶显示器的重要组件，液晶面板主要包含数组(array)基板、彩模基板与封闭在数组基板与彩模基板之间的液晶。液晶通过涂覆在数组基板和彩模基板上的配向层进行配向，控制液晶分子的排列方向，并提供液晶显示器结构所需的预倾角(pre-tile angle)，以达到液晶面板的显示效果。一般常用的配向膜为聚亚酰胺(polyimide, PI)材料，其具有高耐热性、耐化学溶剂与辐射线与电器绝缘特性佳等性质。
然而，在涂覆配向液形成配向层时，考虑到聚亚酰胺绝缘性与框胶黏着性较差等特性，不易控制配向膜边缘的扩散，导致边缘不平整且尺寸控制不易的缺点。当配向膜超出框胶的区域时，会降低框胶的强度而影响框胶的质量。另一方面，配向液在干燥过程为由外向内干燥，这样会造成配向膜边缘厚度比中央区域厚度高的现象。而且，由于配向膜的厚度不均匀，容易导致配向不均的问题因而影响显示质量。
为了解决上述的问题，传统的方法是设置结构阻止配向膜与框胶重迭。图1A为传统数组基板的结构剖面图，如图1A所示，在数组(array)基板10A的侧边形成沟槽102A，沟槽102A可以吸收容纳向外扩散的配向液104A，使配向液104A不会进一步扩散到沟槽102A外的框胶106A。然而若是配向液104A过量，还是有可能溢过沟槽102A，扩散到沟槽102A外的框胶106A。另一种传统方法是在数组基板的侧边形成凸块，图1B为另一传统数组基板的结构剖面图，如图1B所示，数组基板10B的凸块102B可以阻挡配向液104B流至框胶106B 的区域。但是在配向液104B靠近凸块102B的区域，有可能因为配向液104B过量而流至框胶106B的区域。而且，由于形成的沟槽或凸块的段差比较小，配向液很容易溢过沟槽或凸块而使设计失败。
因此存在一种需求，在数组基板上设计可以有较大段差的结构，阻止配向液外溢。
 技术问题
本发明的一个目的在于提供一种防止配向液扩散到框胶的结构，影响框胶的黏着性。
本发明的另一个目的在于提供一种液晶面板的制作方法，制作出一种结构可以防止配向液外溢，减小有效显示区域边缘与面板边缘距离，实现超窄边框设计。
 技术解决方案
本发明的一个目的在于提供一种防止配向液扩散到框胶的结构，影响框胶的黏着性。
为解决上述技术问题，本发明构造了一种液晶面板，其包含上基板、下基板与框胶。所述下基板包含显示区域、非显示区域、第一限制组件与第二限制组件。非显示区域邻近于显示区域，且在非显示区域上设置框胶。第一限制组件位于非显示区域的边缘。第二限制组件位于显示区域与第一限制组件之间。藉由第一限制组件与第二限制组件的组合，在涂布一配向膜于下基板时，让配向膜不会扩散至非显示区域。
本发明的另一个目的在于提供一种液晶面板的制作方法，制作出一种结构可以防止配向液外溢，减小有效显示区域边缘与面板边缘距离，实现超窄边框设计。
为解决上述技术问题，本发明构造了一种液晶面板的制作方法，其特征在于包含下列步骤：分别在上基板与下基板上堆栈多层薄膜；在框胶的侧边形成第一限制组件；在下基板形成多层薄膜时，在框胶的侧边保留部分的多层薄膜，以形成第一限制组件；在下基板上涂布一配向膜，以形成配向层；藉由第一限制组件与第二限制组件的结构，在涂布配向膜的过程中，第一限制组件与第二限制组件用于阻挡配向膜扩散到框胶的区域，避免配向膜与框胶重迭。
 有益效果
藉由第一限制组件与第二限制组件的结构，在涂布配向膜的过程中，第一限制组件与第二限制组件可以阻挡配向膜扩散到框胶的区域，避免配向膜与框胶的重迭。另一方面，藉由第一限制组件与第二限制组件的设置，可以达到均匀涂布配向膜的目的，也可以减小有效显示区域边缘与面板边缘的距离，进而使超窄边框更容易实现。
 附图说明
图1A为传统数组(array)基板的结构剖面图；
图1B为另一传统数组基板的结构剖面图；
图2为根据本发明较佳实施例的液晶面板的结构剖面图；
图3为本发明液晶面板的下基板的结构剖面图；以及
图4为本发明之液晶面板的沟槽与挡墙形成的步骤流程图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
图2为根据本发明较佳实施例的液晶面板的剖面结构图。如图2所示，液晶面板20主要包含上基板202、下基板204与框胶206。上基板202为彩色滤光片(Color Filer，CF)，其主要包含遮光黑矩阵(Black Matrix，BM)2021、滤色层2022、透明导电(或称氧化铟锡Indium Tin Oxide，ITO)层2023、间隔子层(Photo Spacer，PS)2024、第一配向膜2025与玻璃基板2026等。遮光黑矩阵2021在上基板202的功能为光源的遮蔽，防止入射光的泄漏而影响色泽性。滤色层2022藉由光及液晶扭转产生加乘混合，以获得彩色化效果。透明导电层2023提供电极给液晶面板20之液晶分子的感应，以控制液晶分子的旋转。间隔子层2024的功能是维持上基板202与下基板204的距离(Cell Gap)。下基板204为数组(Array)基板，其主要包含玻璃基板2045与设置于玻璃基板2045上的绝缘层2041、保护层2042、薄膜晶体管(Thin Film Transistor)2043、第二配向膜2044等。在此需要说明的是，上述只是简略说明液晶面板20的主要结构，并非用于局限本发明的液晶面板仅包含上述的结构。而且各层薄膜在上基板202与下基板204的形成方式为熟悉此技艺者所熟知，在此不再赘述。
依旧参阅图2，在本发明的较佳实施例中，在下基板204上堆栈形成薄膜晶体管2043时，将制作薄膜晶体管2043的各薄膜层在下基板204的同一个地方保留下来，藉以形成第一限制组件208。一般而言，薄膜晶体管2043主要是由部分的绝缘层2041、部分的保护层2042、第一金属层2046、第二金属层2047、非晶硅层2048与氧化铟锡(ITO)层2049所组成。绝缘层2041覆盖于玻璃基板2045与第一金属层2046上，而保护层2042堆栈于绝缘层2041与第二金属层2047上。在接近框胶206的边缘处，在制作薄膜晶体管的过程中同时将上述各层的一小部分保留下来，不需额外的制程步骤而形成具有相对较高高度的第一限制组件208，如图中所示。本实施例中虽以薄膜晶体管为例，但本发明并不限于此。在本发明中，第一限制组件208可形成为一挡墙，或可为一凸块等，在此并不局限。另外，在第一限制组件208的前侧，以蚀刻的方式形成下凹的第二限制组件210，在本发明中，第二限制组件210可为一沟槽，或可为一凹槽等，在此并不局限。此第二限制组件210可以容纳向外扩散的第二配向膜2047，而且配合第一限制组件208的设置，让第二配向膜2047更不容易越过第一限制组件208与第二限制组件210所组合的结构，避免第二配向膜2047与框胶206交迭，影响框胶206的黏着性。另外，第一限制组件208的堆栈方式并不局限于图中所示的形状，在不同实施例中，可以调整堆栈的方式，形成不同形状或高度的第一限制组件208。而且，也可以更改蚀刻的深度或宽度，蚀刻不同的薄膜层形成不同深度或不同宽度的第二限制组件210。举例来说，可以蚀刻至绝缘层2041上方，或蚀刻至下基板204上方，可以依据实际需求蚀刻不同深度的第二限制组件210。
图3为本发明液晶面板的下基板的剖面结构图。如图3所示，在此实施例的下基板30涂布配向膜302的区域为显示区域304，而没有涂布配向膜302的地方，也就是框胶306的区域为非显示区域308。下基板30的第一限制组件310设置在非显示区域308的边缘，第一限制组件310可为挡墙或凸块等，在此并不局限。而第二限制组件312是设置在第一限制组件310与显示区域304之间，第二限制组件312可为沟槽或凹槽等，在此并不局限。由于第一限制组件310与第二限制组件312的设计，让配向膜302不会从显示区域304扩散到未显示区域308，阻止配向膜302与框胶306重迭。另一方面来说，相较于传统仅用第一限制组件310或第二限制组件312的结构，在本发明中第一限制组件310与第二限制组件312的组合可以达到更大的段差，阻止配向膜302外溢效果更佳。
图4为本发明之液晶面板的沟槽与挡墙形成的步骤流程图。如图4所示，在步骤402中，分别在上基板与下基板上堆栈多层薄膜，上基板为彩色滤光片侧的玻璃基板，下基板为数组侧的玻璃基板。在步骤404中，在下基板形成多层薄膜时，在框胶的侧边保留部分的多层薄膜以形成一第一限制组件，此第一限制组件是藉由保留部分的多层薄膜而形成，举例来说，保留下基板之部分的绝缘层与/或保护层以形成第一限制组件。第一限制组件较佳为一挡墙，或可为一凸块，在此并不局限。在步骤406中，蚀刻下基板上方的多层薄膜以形成一第二限制组件，第二限制组件较佳为一沟槽，或可为一凹槽，在此并不局限。另外，第二限制组件是在邻近于第一限制组件的区域形成。在步骤408中，在下基板上涂布配向膜，以形成配向层。藉由第一限制组件与第二限制组件的结构，在涂布配向膜的过程中，第一限制组件与第二限制组件可以阻挡配向膜扩散到框胶的区域，避免配向膜与框胶的重迭。另一方面，藉由第一限制组件与第二限制组件的设置，可以达到均匀涂布配向膜的目的，也可以减小有效显示区域边缘与面板边缘的距离，进而使超窄边框更容易实现。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
工业实用性
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Claims (10)

  1. 一种液晶面板，其包含一上基板、一下基板与至少一框胶，其中所述下基板包含：
    一显示区域；
    一非显示区域，其邻近于所述显示区域；
    一第一限制组件，其位于所述非显示区域的边缘而凸起；以及
    一第二限制组件，其位于所述显示区域与所述第一限制组件之间而凹陷；
    其中藉由所述第一限制组件与所述第二限制组件的组合，在涂布一配向膜于所述下基板时，让所述配向膜不会扩散至所述非显示区域。
  2. 根据权利要求1所述的液晶面板，其中所述第一限制组件是由所述下基板上的多层薄膜堆栈而成。
  3. 根据权利要求1所述的液晶面板，其中所述第一限制组件是形成为一凸块。
  4. 根据权利要求1所述的液晶面板，其中所述第一限制组件是形成为一挡墙。
  5. 根据权利要求1所述的液晶面板，其中所述第二限制组件是藉由蚀刻所述下基板的多层薄膜所形成。
  6. 根据权利要求1所述的液晶面板，其中所述第二限制组件是形成为一凹槽。
  7. 根据权利要求1所述的液晶面板，其中所述第二限制组件是形成为一沟槽。
  8. 根据权利要求1所述的液晶面板，其中在所述非显示区域上设置至少一框胶。
  9. 一种液晶面板的制造方法，其中所述制造方法包含下列步骤：
    分别在一上基板与一下基板上堆栈多层薄膜；
    在所述下基板形成所述多层薄膜时，在一框胶的侧边保留部分的所述多层薄膜，以形成一第一限制组件；
    蚀刻所述下基板上方的所述多层薄膜以形成一第二限制组件；以及
    在所述下基板上涂布一配向膜，以形成一配向层；
    其中，藉由所述第一限制组件与所述第二限制组件的组合，在涂布所述配向膜的过程中，所述第一限制组件与所述第二限制组件用于阻挡所述配向膜扩散到所述框胶的区域，避免所述配向膜与所述框胶重迭。
  10. 根据权利要求9所述的液晶面板的制造方法，其中所述蚀刻步骤是在所述液晶面板的一显示区域与所述第一限制组件之间形成所述第二限制组件。
PCT/CN2012/080647 2012-08-16 2012-08-28 液晶面板及其制作方法 Ceased WO2014026403A1 (zh)

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