WO2013060061A1 - 液晶显示面板及其形成方法 - Google Patents

液晶显示面板及其形成方法 Download PDF

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Publication number
WO2013060061A1
WO2013060061A1 PCT/CN2011/082875 CN2011082875W WO2013060061A1 WO 2013060061 A1 WO2013060061 A1 WO 2013060061A1 CN 2011082875 W CN2011082875 W CN 2011082875W WO 2013060061 A1 WO2013060061 A1 WO 2013060061A1
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Prior art keywords
thin film
film transistor
liquid crystal
layer
substrate
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PCT/CN2011/082875
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English (en)
French (fr)
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侯鸿龙
贺成明
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深圳市华星光电技术有限公司
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Priority to US13/380,044 priority Critical patent/US8797495B2/en
Publication of WO2013060061A1 publication Critical patent/WO2013060061A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

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  • the invention relates to a liquid crystal display panel and a method for forming the same, in particular to a hybrid design spacer (hybrid A liquid crystal display panel and a method of forming the same.
  • Today's consumer electronics products generally use thin and light flat panel display panels, of which liquid crystal display panels have been widely used by various electronic devices such as televisions, mobile phones, personal digital assistants, digital cameras, computer screens or notebook computers.
  • a conventional liquid crystal display panel is composed of a color filter substrate and a thin film transistor substrate (thin film). a transistor array substrate, a TFT array substrate, and a liquid crystal layer disposed between the two substrates Layer).
  • a liquid crystal display panel has a poor resolution and a low aperture ratio of a pixel, and it is easy to have a misalignment when the color filter substrate is bonded to the thin film transistor substrate.
  • FIG. 1 is a structural diagram of a conventional COA liquid crystal display panel 10.
  • the COA liquid crystal display panel 10 includes a substrate of a thin film transistor 14 having a color filter layer 16 (color Filter on array substrate, COA Substrate 12, a pair of substrates 18, a spacer 20, and a liquid crystal layer 22.
  • the spacer 20 and the liquid crystal layer 22 are disposed between the substrate 12 having the color filter layer 16 and the thin film transistor 14 and the opposite substrate 18, and the spacer 20 can be used to maintain the substrate 12 having the color filter layer 16 and the thin film transistor 14.
  • the color filter layer 16 is composed of at least one of a red filter layer, a green filter layer, and a blue filter layer. Since the color filter layer 16 is formed directly on the thin film transistor 14, no alignment error is generated. In addition, since the capacitance between the two substrates 12 and 18 is reduced, the pixel electrode 24 can be expanded outward to increase the aperture ratio.
  • the thickness of the color filter layer 16 is 3 ⁇ m, which flattens the substrate of the thin film transistor having the color filter layer. Therefore, the spacer 20 of the counter substrate 18 will withstand the color filter layer 16, so that it is difficult to control the thickness of the liquid crystal layer.
  • An object of the present invention is to provide a liquid crystal display panel which can control the thickness of a liquid crystal layer and which is pressed when pressed by an external force, and which does not change optical characteristics, and a method of forming the same, to solve the problems of the prior art.
  • the invention discloses a liquid crystal display panel comprising a thin film transistor substrate, a pair of substrates and a liquid crystal layer, wherein the liquid crystal layer is disposed between the thin film transistor substrate and the opposite substrate, the opposite substrate A plurality of main spacers and a plurality of auxiliary spacers are used, and the plurality of main spacers are used to maintain a gap between the thin film transistor substrate and the opposite substrate.
  • the thin film transistor substrate includes a plurality of thin film transistors; a plurality of color filter layers on the plurality of thin film transistors, and a plurality of recessed regions; and a plurality of pixel electrodes covering the plurality of color filter layers And electrically connected to the corresponding thin film transistor.
  • the plurality of auxiliary gaps are disposed at positions aligned with the plurality of recessed regions, the auxiliary spacers not contacting the thin film transistor substrate.
  • the liquid crystal display panel further comprises a black matrix layer, and the plurality of main spacers and the plurality of auxiliary gaps are disposed on the black matrix layer.
  • the thin film transistor substrate includes a glass substrate, and a plurality of scan lines and a plurality of data lines disposed on the glass substrate, each of the scan lines and each of the data lines being electrically connected Thin film transistor.
  • the thin film transistor substrate further includes a protective layer between the thin film transistor and the color filter layer.
  • the pixel electrode comprises a transparent electrode, a reflective electrode or a transflective electrode.
  • the color filter layer comprises a red filter layer, a green filter layer and a blue filter layer.
  • the present invention further provides a method for forming a liquid crystal display panel, comprising: providing a glass substrate; forming a thin film transistor, a common electrode, a scan line, and a data line on the glass substrate Forming a protective layer on the thin film transistor; forming a color filter layer on the protective layer; etching the color filter layer to form a recessed region; and forming a pixel electrode on the color filter layer And forming a liquid crystal layer on the pixel electrode; covering a pair of substrates on the liquid crystal layer, the opposite substrate comprising a main spacer and an auxiliary spacer, the main a spacer for maintaining a gap between the thin film transistor substrate and the opposite substrate, wherein the auxiliary spacer is disposed at a position aligned with the recessed region, the auxiliary spacer does not contact the thin film transistor substrate .
  • the step of forming a thin film transistor, a common electrode, a scan line and a data line on the glass substrate comprises: forming a first metal layer on the glass substrate; etching a first metal layer to form a gate of the thin film transistor, the common electrode, and the scan line; forming an insulating layer on a gate of the thin film transistor, the common electrode, and the scan line; Forming a channel region of the thin film transistor on the insulating layer;
  • the method before the step of forming a pixel electrode on the color filter layer and the recessed region, the method further comprises: etching the color filter layer and the protective layer to A first opening and a second opening are respectively formed above the drain of the thin film transistor and above the common electrode.
  • a method of forming the primary spacer and the auxiliary spacer includes a lithography and etching process or an inkjet printing process.
  • the liquid crystal display panel of the present invention can have better structural strength by having a hybrid spacer.
  • the main gap can be used to maintain a gap between the thin film transistor substrate having the color filter layer and the opposite substrate.
  • the sub-gap can be used to maintain the spacing between the thin film transistor substrate having the color filter layer and the opposite substrate, thereby avoiding the change of the liquid crystal layer pitch and causing the optical characteristics of the panel to change. Causes the panel to display unevenly.
  • a gap is provided between the sub-gap and the thin film transistor substrate having the color filter layer, which can increase the elastic space injected into the liquid crystal layer.
  • FIG. 1 is a structural view of a conventional COA liquid crystal display panel.
  • FIG. 2 is a schematic view of a liquid crystal display panel according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural view of a liquid crystal display panel.
  • 4 to 5 are schematic views showing a method of forming the opposite substrate of FIG.
  • 6 to 11 are schematic views showing a method of forming the thin film transistor substrate of Fig. 3.
  • FIG. 2 is a schematic diagram of a liquid crystal display panel 100 according to an embodiment of the present invention.
  • the liquid crystal display panel 100 includes a glass substrate 210, a plurality of scan lines 212, a plurality of data lines 214, a plurality of thin film transistors 220, a plurality of common electrodes 280, and a plurality of pixel electrodes 240.
  • the scan line 212, the data line 214 and the thin film transistor 220 are all disposed on the glass substrate 210, and the scan line 212 and the data line 214 are alternately arranged in a matrix area arranged in a matrix.
  • Each of the thin film transistors 220 is electrically connected to a pixel electrode 240, a scan line 212, and a data line 214.
  • FIG. 3 is a schematic structural diagram of the liquid crystal display panel 100.
  • the liquid crystal display panel 100 further includes a thin film transistor substrate having a color filter layer (color Filter on array (COA) substrate) 200, a pair of substrates (opposite The substrate 300 and a liquid crystal layer 400 disposed between the thin film transistor substrate 200 having the color filter layer and the counter substrate 300.
  • the thin film transistor substrate 200 having a color filter layer further includes a glass substrate 210 and a plurality of pixel electrodes 240.
  • the thin film transistor 220 has a gate 221, a source 222, a drain 223, and a semiconductor layer 224.
  • the gate 221 is electrically connected to the scan line 212, the source 222 is electrically connected to the data line 214, and the drain 223 is electrically connected to the pixel. Electrode 240.
  • the semiconductor layer 224 includes an amorphous silicon layer 224a as a thin film transistor 220 channel and an ohmic contact layer for reducing impedance (Ohmic) Contact Layer) 224b.
  • the gate 221 of the thin film transistor 220 receives the scan signal pulse from the scan line 212, the thin film transistor 220 turns on and transmits the data signal voltage of the data line 214 to the pixel electrode 240 through the source 222 and the drain 223.
  • the pixel electrode 240 controls the rotation direction of the liquid crystal molecules of the liquid crystal layer (not shown) to display images of different gray levels according to the voltage difference between the data signal voltage and the common voltage of the common electrode 280.
  • the thin film transistor 220 is covered with a protective layer 270, and a color filter layer 230 is formed on the protective layer 270.
  • the color filter layer 230 in each pixel region is composed of, for example, at least one of a red filter layer, a green filter layer and a blue filter layer, and covers the thin film transistor 220.
  • the color filter layer 230 may be provided with a plurality of recessed regions 233 at random locations.
  • a first opening 231 and a second opening 233 are respectively formed above the drain electrode 223 of the thin film transistor 220 and above the common electrode 280.
  • the pixel electrode 240 is disposed on the color filter layer 230.
  • the pixel electrode 240 is also electrically connected to the drain 223 of the thin film transistor 220 at the same time.
  • the position where the common electrode 280 and the pixel electrode 240 overlap each other forms a storage capacitor. Since the capacitance value of the storage capacitor is inversely proportional to the distance between the common electrode 280 and the pixel electrode 240 and is affected by the dielectric constant of the medium between the two, the purpose of opening the second opening 233 is to shorten the common electrode 280. The distance from the pixel electrode 240, on the other hand, reduces the influence of the dielectric coefficient of the color filter layer 230 on the capacitance value of the storage capacitor.
  • the pixel electrode 240 is, for example, a transparent electrode, and is disposed on the color filter layer 230 and electrically connected to the corresponding thin film transistor 220. In other embodiments not shown, the pixel electrode 240 may also be a reflective electrode or a transflective electrode.
  • the opposite substrate 300 has a substrate 310, a black matrix layer 320, a plurality of main spacers 360, and a plurality of auxiliary spacers 370.
  • the main gap sub-360 and the auxiliary gap sub-370 are disposed on the black matrix layer 320.
  • a black matrix layer 320 is selectively formed over the thin film transistor 220, the scan line 212, and the data line 214 to reduce light leakage at the edge of the pixel.
  • the main gap 360 can be used to maintain a gap between the thin film transistor substrate 200 and the opposite substrate 300.
  • the main gap sub-360 can determine its configuration position according to design requirements.
  • the main gap sub-360 can be configured in each pixel area, or one of the pixel areas can be arranged.
  • the auxiliary gap 370 may be located outside the main gap sub-360.
  • the auxiliary gap 370 may be arbitrarily arranged in a region other than the gap sub-base 330, which may be disposed adjacent to the main gap sub-360, or may replace a part of the main gap.
  • the sub-360 is arranged in a staggered manner with the main gap sub-360.
  • the auxiliary spacer 370 can be used to maintain the spacing between the thin film transistor substrate 200 having the color filter layer and the opposite substrate 300.
  • the liquid crystal display panel 100 can form a liquid crystal display panel having a hybrid design gap by having a main gap sub-360 and an auxiliary gap sub-370, wherein the hybrid design spacer can be used to improve the pressure resistance of the liquid crystal display panel 100.
  • the stability of the assembly process increases the elastic space when the liquid crystal layer 400 is injected.
  • the auxiliary spacer 370 is disposed at a position aligned with the recessed region 233, and the auxiliary spacer 370 is not in contact with the thin film transistor substrate 200. That is, a certain gap is still maintained between the auxiliary gap 370 and the thin film transistor substrate 200.
  • FIG. 4 to FIG. 11 are schematic diagrams showing the liquid crystal display panel 100 of the present invention.
  • 4 to 5 are schematic views showing a method of forming the opposite substrate 300 of FIG. 3
  • FIGS. 6 to 11 are schematic views showing a method of forming the thin film transistor substrate 200 of FIG.
  • a substrate 310 is provided.
  • the material of the substrate 310 may be a glass substrate.
  • Transparent substrate such as substrate) or plastic substrate (transparent) Substrate).
  • a black matrix layer 320 is formed on the substrate 310, and the black matrix layer 320 may be a black resin material.
  • a lithography and etching process or an inkjet printing process is performed on the substrate 310 to form a plurality of main spacers 360 and a plurality of auxiliary spacers 370 on the black matrix layer 320.
  • the auxiliary spacer 370 may be disposed not only adjacent to the main spacer 360 but also a portion of the main spacer 360 to be staggered with the main spacer 360.
  • the fabrication of the counter substrate 300 of the present embodiment has been substantially completed.
  • FIG. 6 to FIG. 11 are schematic diagrams showing respective processes of forming the thin film transistor substrate 200 of FIG. 3 .
  • a glass substrate 210 is first provided, followed by a metal thin film deposition process to form a first metal layer (not shown) on the surface of the glass substrate 210, and a first mask is used to perform the first lithography. Etching, etching to obtain the gate electrode 221 of the thin film transistor 220 and the common electrode 280.
  • an insulating layer 230 made of silicon nitride (SiNx) is deposited to cover the gate electrode 221 and the common electrode 280.
  • the second lithography is performed using the second mask to form the semiconductor layer 224.
  • the semiconductor layer 224 includes an amorphous silicon layer 224a as a thin film transistor 220 channel and an ohmic contact layer for reducing impedance (Ohmic) Contact layer) 224b.
  • a second metal layer (not shown) is formed on the insulating layer 230, and a third mask is used to perform a third lithography process to define the thin film transistor 220, respectively.
  • Data line 42 is directly connected to source 222.
  • a protective layer of silicon nitride passivation
  • a layer 270 covering the source 222 and the drain 223, and performing a fourth lithography etching on the fourth mask to remove a portion of the protective layer 270 above the drain 223 until the surface of the drain 223 is omitted.
  • a first opening (Via) 231 is formed above the pole 223.
  • the fourth lithography is also etched to remove a portion of the protective layer 270 over the common electrode 280 up to the surface of the insulating layer 230 to form a second opening (Vi) 232 over the common electrode 280.
  • a color filter layer 230 is formed on the protective layer 270, and then a fifth mask is used to perform the fifth lithography process to etch the color filter layer 230.
  • the color filter layer 230 in each pixel region is, for example, The red filter layer, the green filter layer and the blue filter layer are composed of at least one of them.
  • the color filter layer 230 may remove portions of the color filter layer 230 at random locations to form the recess regions 233.
  • an indium tin oxide is formed on the color filter layer 230.
  • indium zinc oxide indium zinc oxide, IZO
  • IZO indium zinc oxide
  • the pixel electrode 240 is electrically connected to the drain 223 of the thin film transistor 220 through the first opening 231 formed in advance.
  • the distance between the common electrode 280 and the pixel electrode 240 is shorter at the position corresponding to the second opening 233, and only the insulating layer 270 exists between the common electrode 280 and the pixel electrode 240, and there is no color filter layer 230, so the common electrode
  • the capacitance of the storage capacitor formed between 280 and the pixel electrode 240 is large. So far, the thin film transistor substrate 200 has also been substantially completed.
  • the liquid crystal layer 400 is implanted on the thin film transistor substrate 200.
  • the counter substrate 300 of FIG. 5 is then placed on the thin film transistor substrate 200 such that the auxiliary spacer 370 is aligned with the position of the recessed region 233.
  • the main gap 360 can be used to maintain the gap between the thin film transistor substrate 200 and the opposite substrate 300.
  • the auxiliary spacer 370 can be used to maintain the spacing between the thin film transistor substrate 200 having the color filter layer and the opposite substrate 300, but the auxiliary spacer 370 and the thin film transistor substrate 200 There is still a certain gap between them.
  • the liquid crystal display panel 100 can form a liquid crystal display panel having a hybrid design gap by having a main gap sub-360 and an auxiliary gap sub-370, wherein the hybrid design spacer can be used to improve the pressure resistance of the liquid crystal display panel 100. And the stability of the assembly process increases the elastic space when the liquid crystal layer 400 is injected.

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Abstract

一种液晶显示面板（100）以及其形成方法。该液晶显示面板（100）包含薄膜晶体管基板（200）、对向基板（300）以及液晶层（400），该液晶层（400）配置于该薄膜晶体管基板（200）与该对向基板（300）之间，该对向基板（300）包含多个主间隙子（360）以及多个辅助间隙子（370），多个主间隙子（360）用来维持薄膜晶体管基板（200）与对向基板（300）之间的间隙。薄膜晶体管基板（200）包含多个薄膜晶体管（220）。多个彩色滤光层（230）位于多个薄膜晶体管（220）上，设有多个凹陷区（233）。多个辅助间隙子（370）设置的位置是对准于多个凹陷区（233），辅助间隙子（370）未接触薄膜晶体管基板（200）。该液晶显示面板（100）在注入液晶时，可控制液晶层（400）厚度，并于外力挤压时，也不会改变光学特性造成显示不均匀的问题。

Description

液晶显示面板及其形成方法 技术领域
本发明涉及一种液晶显示面板以及其形成方法，尤指一种具有混合式设计间隙子(hybrid spacer)的液晶显示面板以及其形成方法。
 背景技术
现今消费电子产品普遍采用轻薄的平板显示面板，其中液晶显示面板已经逐渐被各种电子设备如电视、移动电话、个人数字助理、数码相机、计算机屏幕或笔记本电脑等所广泛使用。
传统的液晶显示面板是由一彩色滤光(color filter)基板、一薄膜晶体管基板(thin film transistor array substrate, TFT array substrate)以及一配置于此两基板间的液晶层(liquid crystal layer)所构成。然而，此种液晶显示面板的分辨率(resolution)较差、像素(pixel)的开口率较低，且彩色滤光基板与薄膜晶体管基板接合时容易有对位误差(misalignment)。
请参阅图1，图1是传统COA液晶显示面板10的结构图。为了改善上述问题，COA液晶显示面板10包含具有彩色滤光层16的薄膜晶体管14的基板(color filter on array substrate, COA substrate)12、一对向基板18、一间隙子(Spacer)20以及一液晶层22。间隙子20与液晶层22配置于具有彩色滤光层16和薄膜晶体管14的基板12与对向基板18之间，且间隙子20可用以维持具有彩色滤光层16和薄膜晶体管14的基板12与对向基板18之间的间隙。在此种液晶显示面板10中，彩色滤光层16包括由红色滤光层、绿色滤光层与蓝色滤光层至少其中之一所组成。由于彩色滤光层16是直接形成于薄膜晶体管14上，因此不会产生对位误差。此外，因为两基板12和18间的电容减少，所以可以将像素电极24往外扩展，以增加开口率。
然而，在此种液晶显示面板中，彩色滤光层16的厚度达3um，会让具有彩色滤光层的薄膜晶体管的基板平坦化。因此对向基板18的间隙子20都会顶住彩色滤光层16，故会难以控制液晶层的厚度。
 技术问题
本发明的目的是提供一种可控制液晶层厚度并于外力挤压时，也不会改变光学特性造成显示不均匀的液晶显示面板以及其形成方法，以解决现有技术的问题。
 技术解决方案
本发明揭示一种液晶显示面板，其包含一薄膜晶体管基板、一对向基板以及一液晶层，所述液晶层配置于所述薄膜晶体管基板与所述对向基板之间，所述对向基板包含多个主间隙子以及多个辅助间隙子，所述多个主间隙子用来维持所述薄膜晶体管基板与所述对向基板之间的间隙。所述薄膜晶体管基板包含多个薄膜晶体管；多个彩色滤光层，位于所述多个薄膜晶体管上，设有多个凹陷区；以及多个像素电极，覆盖于所述多个彩色滤光层上，并与对应的所述薄膜晶体管电性连接。所述多个辅助间隙子设置的位置是对准于所述多个凹陷区，所述辅助间隙子未接触所述薄膜晶体管基板。
根据本发明的实施例，所述液晶显示面板另包含一黑色矩阵层，所述多个主间隙子以及所述多个辅助间隙子设置于所述黑色矩阵层上。
根据本发明的实施例，所述薄膜晶体管基板包括一玻璃基板、以及多条扫描线以及多条数据线，配置于所述玻璃基板上，每一条扫描线和每一条数据线电性连接对应的薄膜晶体管。所述薄膜晶体管基板另包含一保护层，位于所述薄膜晶体管和所述彩色滤光层之间。
根据本发明的实施例，所述像素电极包括透明电极、反射电极或半穿透半反射电极。
根据本发明的实施例，所述彩色滤光层包括红色滤光层、绿色滤光层以及蓝色滤光层。
为了达成本发明的目的，本发明另提供一种形成液晶显示面板的方法，其包含：提供一玻璃基板；形成一薄膜晶体管、一共通电极、一扫描线以及一数据线于所述玻璃基板上；在所述薄膜晶体管上形成一保护层；形成一彩色滤光层于所述保护层上；蚀刻所述彩色滤光层以形成一凹陷区；以及形成一像素电极于所述彩色滤光层以及所述凹陷区上；形成一液晶层于所述像素电极上；将一对向基板覆盖于所述液晶层上，所述对向基板包含一主间隙子以及一辅助间隙子，所述主间隙子用来维持所述薄膜晶体管基板与所述对向基板之间的间隙，所述辅助间隙子设置的位置是对准于所述凹陷区，所述辅助间隙子未接触所述薄膜晶体管基板。
根据本发明的实施例，所述形成一薄膜晶体管、一共通电极、一扫描线以及一数据线于所述玻璃基板上的步骤包含：形成一第一金属层于所述玻璃基板上；蚀刻所述第一金属层，以形成所述薄膜晶体管的栅极、所述共通电极以及所述扫描线；在所述薄膜晶体管的栅极、所述共通电极以及所述扫描线上形成一绝缘层；形成所述薄膜晶体管的通道区域于所述绝缘层上；以及
形成一第二金属层，并蚀刻所述第二金属层，以形成所述薄膜晶体管的源极和漏极以及所述数据线。
根据本发明的实施例，在形成一像素电极于所述彩色滤光层以及所述凹陷区上的步骤之前，所述方法另包含；蚀刻所述彩色滤光层以及所述保护层，以在所述薄膜晶体管的漏极上方、所述共通电极的上方分别形成一第一开口以及一第二开口。
根据本发明的实施例，形成所述主间隙子以及所述辅助间隙子的方法包括微影与蚀刻制程或喷墨印刷制程。
 有益效果
相较于现有技术，本发明的液晶显示面板因具有混合式间隙子而可具有较佳的结构强度。主间隙子可用以维持具有彩色滤光层的薄膜晶体管基板与对向基板之间的间隙。而且，当液晶显示面板在受到外力挤压时，子间隙子可用以维持具有彩色滤光层的薄膜晶体管基板与对向基板之间的间距，进而避免液晶层间距改变造成面板光学特性改变，因而造成面板显示不均匀。此外，子间隙子与具有彩色滤光层的薄膜晶体管基板之间保有一空隙，可以增加注入液晶层的弹性空间。
 附图说明
图1是传统COA液晶显示面板的结构图。
图2是本发明本发明一实施例的液晶显示面板的示意图。
图3绘示液晶显示面板的结构示意图。
图4至图5是形成图3的对向基板的方法示意图。
图6至图11是形成图3的薄膜晶体管基板的方法示意图。
 本发明的最佳实施方式
在说明书及权利要求书中使用了某些词汇来指称特定的组件。所属领域中具有通常知识者应可理解，制造商可能会用不同的名词来称呼同样的组件。本说明书及权利要求并不以名称的差异来作为区别组件的方式，而是以组件在功能上的差异来作为区别的基准。在通篇说明书及权利要求当中所提及的“包含”为一开放式的用语，故应解释成“包含但不限定于”。此外，“电性连接”一词在此是包含任何直接及间接的电气连接手段。因此，若文中描述一第一装置电性连接于一第二装置，则代表该第一装置可直接连接于该第二装置，或透过其他装置或连接手段间接地连接至该第二装置。
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施之特定实施例。本发明所提到的方向用语，例如“上”、“下”、“前”、“后”、“左”、“右”、“顶”、“底”、“水平”、“垂直”等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
请参阅图2，图2是本发明本发明一实施例的液晶显示面板100的示意图。液晶显示面板100包括一玻璃基板210、多条扫描线212、多条数据线214、多个薄膜晶体管220、多个共通电极280以及多个像素电极240。扫描线212、数据线214与薄膜晶体管220皆配置于玻璃基板210上，且扫描线212与数据线214交错排列出呈矩阵排列的像素区域。每一薄膜晶体管220电性连接至一像素电极240、一扫描线212和一数据线214。
请一并参阅图2和图3，图3绘示液晶显示面板100的结构示意图。液晶显示面板100另包括一具有彩色滤光层的薄膜晶体管基板(color filter on array (COA) substrate)200、一对向基板(opposite substrate)300以及一配置于具有彩色滤光层的薄膜晶体管基板200与对向基板300之间的液晶层400。具有彩色滤光层的薄膜晶体管基板200另包括一玻璃基板210以及多个像素电极240。薄膜晶体管220具有栅极221、源极222、漏极223以及半导体层224，栅极221电性连接于扫描线212，源极222电性连接于数据线214，漏极223电性连接于像素电极240。半导体层224包含作为薄膜晶体管220通道的非晶硅层224a以及用来降低阻抗的欧姆接触层(Ohmic contact layer)224b。当薄膜晶体管220的栅极221接收到来自扫描线212的扫描信号脉冲时，薄膜晶体管220会导通并通过源极222和漏极223传送数据线214的数据信号电压至像素电极240。像素电极240会依据该数据信号电压以及共通电极280的共通电压的电压差控制液晶层(未绘示)的液晶分子转动方向用以显示不同灰阶的影像。薄膜晶体管220上覆盖有保护层270，彩色滤光层230形成于保护层270上。每一像素区域中的彩色滤光层230例如是由红色滤光层、绿色滤光层与蓝色滤光层至少其中之一所组成，且其覆盖薄膜晶体管220。彩色滤光层230可以在随机的位置上设置多个凹陷区233。此外，在薄膜晶体管220的漏极223的上方与共通电极280的上方分别形成一第一开口231以及一第二开口233。像素电极240则设置在彩色滤光层230上。如此一来，像素电极240也同时电性连接薄膜晶体管220的漏极223。而共通电极280和像素电极240重叠的位置形成存储电容。由于存储电容的电容值反比于共通电极280和像素电极240之间的距离，而且受到位于两者间的介质的介电系数影响，所以开设第二开口233的目的一方面是为了缩短共通电极280和像素电极240之间的距离，另一方面减少彩色滤光层230的介电系数影响对存储电容的电容值的影响。
像素电极240例如是透明电极，且其配置于彩色滤光层230上，并与对应的薄膜晶体管220电性连接。在其他未绘示的实施例中，像素电极240还可以是反射电极或半穿透半反射电极。
对向基板300则具有一基板310、一黑色矩阵层320、多个主间隙子360与多个辅助间隙子370。主间隙子360与辅助间隙子370则配置于黑色矩阵层320上。黑色矩阵层320可选择性地形成于薄膜晶体管220、扫描线212与数据线214的上方，以减少像素边缘的漏光。
主间隙子360可用以维持具有薄膜晶体管基板200与对向基板300之间的间隙。主间隙子360可依设计需要决定其配置位置，主间隙子360可在每一像素区域中配置，亦可间隔一定数量的像素区域中配置一个。此外，辅助间隙子370会位于主间隙子360以外之区域上，辅助间隙子370可在间隙子基座330以外的区域任意排列，其可邻近于主间隙子360配置，亦可取代部分主间隙子360，以与主间隙子360交错排列。当液晶显示面板100在受到外力挤压时，辅助间隙子370可用以维持具有彩色滤光层的薄膜晶体管基板200与对向基板300之间的间距。此时，液晶显示面板100可因具有主间隙子360与辅助间隙子370而形成一具有混合式设计间隙子之液晶显示面板，其中混合式设计间隙子可用以提高液晶显示面板100的耐压性及组装制程的稳定性，增加注入液晶层400时的弹性空间。较佳地，辅助间隙子370设置的位置是对准于凹陷区233，辅助间隙子370未接触薄膜晶体管基板200。也就是说，辅助间隙子370和薄膜晶体管基板200之间仍保有一定的空隙。
请参阅图4~图11，图4~图11提供本发明形成液晶显示面板100的示意图。其中图4至图5是形成图3的对向基板300的方法示意图，图6至图11是形成图3的薄膜晶体管基板200的方法示意图。
请先参考图4，首先，提供一基板310，基板310的材质可以是玻璃基板(glass substrate)、塑料基板(plastic substrate)等透光基板(transparent substrate)。接着再于基板310上形成一黑色矩阵层320，黑色矩阵层320可以为一黑色树脂材料。
然后，请参考图5，再于基板310上进行一微影与蚀刻制程或是一喷墨印刷制程，以于黑色矩阵层320上形成多个主间隙子360以及多个辅助间隙子370。辅助间隙子370的配置不仅可邻近于主间隙子360，亦可取代部分主间隙子360，以与主间隙子360交错排列。上述至此，已大致完成本实施例的对向基板300的制作。
在此请参阅图6至图11，图6至图11是形成图3薄膜晶体管基板200的各制程的示意图。
请参阅图6，首先提供一个玻璃基板210，接着进行一金属薄膜沉积制程，以于玻璃基板210表面形成一第一金属层（未显示），并利用一第一掩膜来进行第一微影蚀刻，以蚀刻得到薄膜晶体管220的栅极221以及共通电极280。
接着请参阅图7，接着沉积以氮化硅(SiNx)为材质的绝缘层230而覆盖栅极221以及共通电极280。于绝缘层230上连续沉积非晶硅(a－Si，Amorphous Si)层以及一高电子掺杂浓度的N+ 非晶硅层。利用第二掩膜来进行第二微影蚀刻以构成半导体层224。半导体层224包含作为薄膜晶体管220通道的非晶硅层224a以及用来降低阻抗的欧姆接触层(Ohmic contact layer)224b。
请参阅图8，接着在绝缘层230上形成一全面覆盖的第二金属层(未绘示于图中)，并利用第三掩膜来进行第三微影蚀刻以分别定义出薄膜晶体管220的源极222及漏极223。数据线42是直接连接到源极222。
请参阅图9，接着沉积以氮化硅为材质的保护层(passivation layer)270，并覆盖源极222及漏极223，再利用第四掩膜来进行第四微影蚀刻用以去除漏极223上方的部份保护层270，直至漏极223表面，以于漏极223上方形成第一开口(Via)231。第四微影也会同时蚀刻用以去除共通电极280上方的部份保护层270，直至绝缘层230表面，以于共通电极280上方形成第二开口(Via)232。
请参阅图10。在保护层270上形成彩色滤光层230，接着利用一第五掩膜来进行第五微影蚀刻制程以蚀刻该彩色滤光层230，每一像素区域中的彩色滤光层230例如是由红色滤光层、绿色滤光层与蓝色滤光层至少其中之一所组成。请注意，在第五微影蚀刻制程中，彩色滤光层230可以在随机的位置上去除部分的彩色滤光层230而形成凹陷区233。
请参阅图11，在彩色滤光层230上形成以氧化铟锡物(Indium tin oxide，ITO) 或是铟锌氧化物(indium zinc oxide, IZO)为材质的透明导电层，接着利用一第六掩膜蚀刻该透明导电层以形成像素电极240。像素电极240透过预先形成的第一开口231与薄膜晶体管220的漏极223电性连接。同时，共通电极280和像素电极240之间的距离在对应第二开口233位置较短，同时共通电极280和像素电极240之间仅有绝缘层270，而没有彩色滤光层230，所以共通电极280和像素电极240之间形成的存储电容的电容值较大。至此，薄膜晶体管基板200也已经大致完成。
请再继续参阅图3。接下来，在薄膜晶体管基板200上注入液晶层400。然后把图5的对向基板300放置在薄膜晶体管基板200上，使得辅助间隙子370对准凹陷区233的位置。如此一来，主间隙子360可用以维持具有薄膜晶体管基板200与对向基板300之间的间隙。当液晶显示面板100在受到外力挤压时，辅助间隙子370可用以维持具有彩色滤光层的薄膜晶体管基板200与对向基板300之间的间距，但辅助间隙子370和薄膜晶体管基板200之间仍保有一定的空隙。此时，液晶显示面板100可因具有主间隙子360与辅助间隙子370而形成一具有混合式设计间隙子之液晶显示面板，其中混合式设计间隙子可用以提高液晶显示面板100的耐压性及组装制程的稳定性，增加注入液晶层400时的弹性空间。
综上所述，虽然本发明已以较佳实施例揭露如上，但该较佳实施例并非用以限制本发明，该领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
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Claims (10)

  1. 一种液晶显示面板，其包含一薄膜晶体管基板、一对向基板以及一液晶层，所述液晶层配置于所述薄膜晶体管基板与所述对向基板之间，所述对向基板包含多个主间隙子以及多个辅助间隙子，所述多个主间隙子用来维持所述薄膜晶体管基板与所述对向基板之间的间隙，其特征在于，所述薄膜晶体管基板包含：
    多个薄膜晶体管；
    多个彩色滤光层，位于所述多个薄膜晶体管上，设有多个凹陷区；以及
    多个像素电极，覆盖于所述多个彩色滤光层上，并与对应的所述薄膜晶体管电性连接；
    其中所述多个辅助间隙子设置的位置是对准于所述多个凹陷区，所述辅助间隙子未接触所述薄膜晶体管基板。
  2. 根据权利要求1所述的液晶显示面板，其特征在于，另包含一黑色矩阵层，所述多个主间隙子以及所述多个辅助间隙子设置于所述黑色矩阵层上。
  3. 根据权利要求1所述的液晶显示面板，其特征在于，所述薄膜晶体管基板包括：
    一玻璃基板；以及
    多条扫描线以及多条数据线，配置于所述玻璃基板上，每一条扫描线和每一条数据线电性连接对应的薄膜晶体管。
  4. 根据权利要求3所述的液晶显示面板，其特征在于，所述薄膜晶体管基板另包含一保护层，位于所述薄膜晶体管和所述彩色滤光层之间。
  5. 根据权利要求1所述的液晶显示面板，其特征在于，所述像素电极包括透明电极、反射电极或半穿透半反射电极。
  6. 根据权利要求1所述的液晶显示面板，其特征在于，所述彩色滤光层包括红色滤光层、绿色滤光层以及蓝色滤光层。
  7. 一种形成液晶显示面板的方法，其包含：
    提供一玻璃基板；
    形成一薄膜晶体管、一共通电极、一扫描线以及一数据线于所述玻璃基板上；
    在所述薄膜晶体管上形成一保护层；
    形成一彩色滤光层于所述保护层上；
    蚀刻所述彩色滤光层以形成一凹陷区；以及
    形成一像素电极于所述彩色滤光层以及所述凹陷区上；
    形成一液晶层于所述像素电极上；
    将一对向基板覆盖于所述液晶层上，所述对向基板包含一主间隙子以及一辅助间隙子，所述主间隙子用来维持所述薄膜晶体管基板与所述对向基板之间的间隙，所述辅助间隙子设置的位置是对准于所述凹陷区，所述辅助间隙子未接触所述薄膜晶体管基板。
  8. 根据权利要求7所述形成液晶显示面板的方法，其特征在于，所述形成一薄膜晶体管、一共通电极、一扫描线以及一数据线于所述玻璃基板上的步骤包含：
    形成一第一金属层于所述玻璃基板上；
    蚀刻所述第一金属层，以形成所述薄膜晶体管的栅极、所述共通电极以及所述扫描线；
    在所述薄膜晶体管的栅极、所述共通电极以及所述扫描线上形成一绝缘层；
    形成所述薄膜晶体管的通道区域于所述绝缘层上；以及
    形成一第二金属层，并蚀刻所述第二金属层，以形成所述薄膜晶体管的源极和漏极以及所述数据线。
  9. 根据权利要求8所述形成液晶显示面板的方法，其特征在于，在形成一像素电极于所述彩色滤光层以及所述凹陷区上的步骤之前，所述方法另包含；
    蚀刻所述彩色滤光层以及所述保护层，以在所述薄膜晶体管的漏极上方和所述共通电极的上方分别形成一第一开口以及一第二开口。
  10. 根据权利要求7所述形成液晶显示面板的方法，其特征在于，形成所述主间隙子以及所述辅助间隙子的方法包括微影与蚀刻制程或喷墨印刷制程。
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