WO2013183421A1 - Procédé de fabrication de réseau de micromiroirs - Google Patents

Procédé de fabrication de réseau de micromiroirs Download PDF

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Publication number
WO2013183421A1
WO2013183421A1 PCT/JP2013/063774 JP2013063774W WO2013183421A1 WO 2013183421 A1 WO2013183421 A1 WO 2013183421A1 JP 2013063774 W JP2013063774 W JP 2013063774W WO 2013183421 A1 WO2013183421 A1 WO 2013183421A1
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WO
WIPO (PCT)
Prior art keywords
micromirror array
substrate
unit optical
manufacturing
optical element
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Application number
PCT/JP2013/063774
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English (en)
Japanese (ja)
Inventor
昭子 長藤
紀行 十二
成紀 森田
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日東電工株式会社
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Application filed by 日東電工株式会社 filed Critical 日東電工株式会社
Publication of WO2013183421A1 publication Critical patent/WO2013183421A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00596—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors

Definitions

  • the present invention relates to a method of manufacturing a micromirror array in which a mirror image of a projection object is formed in a space by unit optical elements having a pair of light reflecting surfaces orthogonal to each other arranged on a substrate.
  • a unit optical that reflects light by one or more mirror surfaces is applied to a substrate (substrate) that constitutes the element surface of the optical element.
  • a micromirror array in which a plurality of elements are arranged has been developed.
  • convex unit optical elements such as a small quadrangular prism having “two mirror surfaces perpendicular to each other” (corner reflectors) arranged at an angle perpendicular to or close to the substrate are arranged in an array.
  • the arranged “corner reflector array” has recently attracted attention because of its simple structure (see Patent Document 1).
  • the convex micromirror array 20 (hereinafter, also simply referred to as “array”) includes a transparent square columnar micro-unit optical element 22 (this example) on one surface of a substrate 21 (element surface P) made of a transparent material. Then, a large number of regular cubes having a vertical, horizontal, and height ratio of approximately 1: 1: 1 are arranged in a grid of 45 ° diagonally. In the case of the array 20, at least two of the four side surfaces (side surfaces 22a and 22b) of each unit optical element 22 are formed as mirror surfaces (light reflecting surfaces).
  • the above-described conventional micromirror array manufacturing method has a problem that it is difficult to obtain a micromirror array capable of forming a bright and clear image. That is, in order to obtain bright and high-brightness imaging, it is necessary to increase the amount of reflected (transmitted) light per unit area of the micromirror array.
  • each unit optical element corner reflector
  • a method of increasing or lengthening the light reflection surface (mirror surface area) is conceivable.
  • each unit optical element such as a minute quadrangular prism [height of unit optical element (vertical length in thickness direction) / width of unit optical element (element surface
  • the above-described method using photolithography has a limitation because a deep vertical groove cannot be formed accurately and the light reflecting surface becomes rough.
  • the aspect ratio is increased, there arises a problem that it is difficult to release the array from the mold. Therefore, in these conventional manufacturing methods, it is difficult to obtain a convex micromirror array having a light reflection surface of a desired shape with a high aspect ratio and a wide light reflection area.
  • the present invention has been made in view of such circumstances, and has a high degree of freedom in designing a convex unit optical element, and can easily produce a micromirror array that connects bright and high-brightness images.
  • the purpose is to provide a manufacturing method.
  • the present invention provides a method for manufacturing a micromirror array comprising a transparent flat substrate and a plurality of convex unit optical elements formed in an array on the surface of the substrate.
  • the gist of the present invention is a method of manufacturing a micromirror array, which includes a cutting process in which straight grooves are sequentially formed on the surface in two directions orthogonal to each other with a predetermined interval therebetween.
  • the present inventors have broken down the conventional technical knowledge using photolithography and molds as a processing method for increasing the degree of freedom of processing of the convex unit optical element, and considered the use of cutting.
  • the aspect ratio of the light reflecting surface [vertical length (length in the element surface thickness direction) / width], which was only “about 1” in the conventional regular cube-shaped corner reflector (ratio of aspect ratio of about 1).
  • the ratio of (the width in the element surface direction)] was successfully formed (that is, the rectangular column was long).
  • the amount of light involved in image formation in the micromirror array is increased, and a clear image (mirror image) with high brightness can be obtained.
  • the manufacturing method of the micromirror array of the present invention is such that a flat substrate serving as a work is attached to a predetermined position of a processing stage of a cutting machine, and cutting is performed using a rotary blade on a predetermined surface of the substrate.
  • a plurality of linear grooves having a depth of 50 to 500 ⁇ m and parallel to each other are sequentially formed on the surface in two directions orthogonal to each other with a predetermined interval between them, thereby forming a substantially rectangular column-shaped minute groove.
  • a large number of convex unit optical elements are provided.
  • the convex micromirror array obtained by this manufacturing method has a high “ratio of the longitudinal length in the substrate thickness direction to the lateral width in the substrate surface direction” (aspect ratio) of the light reflecting surface (side surface) in each unit optical element. Compared with the conventional micromirror array, the area of each light reflecting surface and the amount of light reflected and transmitted through the array is increased. Therefore, the convex micromirror array obtained by the manufacturing method of the micromirror array of the present invention can form a bright mirror image of the projection object with high brightness.
  • the linear groove when at least one of the rotary blade and the processing stage intermittently moves a predetermined distance to engrave and form the linear groove, the linear groove is It can be formed quickly and accurately at a desired position at a desired depth. Therefore, the formation efficiency of the linear groove is further improved.
  • a convex micromirror array 10 comprising a transparent flat substrate 1 and a group of minute square columnar convex unit optical elements 2 is used. It is a method of manufacturing. This method uses a cutting machine such as a dicing machine (dicing saw) as shown in FIG. 1 to provide a desired depth on a predetermined surface of a workpiece W (substrate) that is mounted on a moving stage S and temporarily fixed.
  • a cutting machine such as a dicing machine (dicing saw) as shown in FIG. 1 to provide a desired depth on a predetermined surface of a workpiece W (substrate) that is mounted on a moving stage S and temporarily fixed.
  • a cutting machine used in this manufacturing method is called a dicing machine or a dicing saw or the like, and is attached to the tip of a spindle (not shown) that rotates at high speed.
  • An attached rotary blade diamond blade such as dicing blade B
  • a processing stage moving stage S
  • this moving stage Stage driving means for rotating S in the three axis (x, y, z) directions and rotating around the z axis ( ⁇ ) corresponding to the rotation and vertical movement of the blade B.
  • the dicing blade B is a substantially ring-shaped ultra-thin outer peripheral blade, and abrasive grains made of small-diameter industrial diamond are imparted to the blade portion (in some cases, the left and right side end surfaces) provided on the outer peripheral surface.
  • the blade B has a thickness (total thickness in the end face direction) of about 0.015 mm (15 ⁇ m) to 0.3 mm (300 ⁇ m), and a groove obtained by engraving using the blade B ( The groove width g of the groove) is about 0.02 mm to 0.35 mm.
  • the blade B having a flat outer peripheral surface (cutting edge surface) is used, but a blade having a triangular, circular, or elliptical cross section may be used.
  • the moving stage S for temporarily fixing the workpiece W is installed on a slider (linear motion bearing) that can move (position) freely in at least two directions of x and y as shown in FIG.
  • it is further configured to be able to move up and down (not shown) in the z-axis direction and rotate around the z-axis ( ⁇ ).
  • the stage driving means in each axial direction (around the axis) will not be described because it is the same mechanism as a general-purpose machine tool, etc., but intermittent operation and accurate position control of the moving stage S using a stepping motor, actuator, or the like , And can be programmed to run at a constant speed.
  • a plurality of sets of the spindles and blades B are arranged at or apart from each other.
  • a flat substrate (W) made of a material having a visible light transmittance of 80% or more such as an acrylic resin is prepared.
  • the substrate is attached to a predetermined position on the moving stage S using an adhesive tape or an adhesive so that the surface to be processed is up (blade B side), and is attached and fixed as a workpiece W ( (Temporary fixing) [work attachment process].
  • the workpiece W may be gripped by a chuck or a vise without using an adhesive or the like.
  • the moving stage S is moved to a machining start position, and the blade B is lowered to a position where the workpiece can be cut while rotating the blade B at a high speed.
  • the (moving stage S) is slid horizontally to cut a linear groove having a desired depth (50 to 500 ⁇ m) on the processing target surface (surface) of the workpiece W.
  • the moving stage S is moved to the machining start position of the next groove, and the workpiece W is slid in the horizontal direction at a predetermined feed rate again, Process the next groove. Then, by repeating the engraving process of this linear groove at a predetermined interval (pitch) in one direction, a plurality of linear grooves parallel to each other in a predetermined first direction (y direction at this time) are obtained. It is formed.
  • the moving stage S is subsequently rotated by 90 ° in the ⁇ direction, and a second direction orthogonal to the linear grooves in the first direction (In this example, the linear groove engraving similar to the above is repeatedly performed on the one that was previously in the x direction and turned 90 ° into the y direction (cutting step).
  • the grooves 3x and 3y (groove width g) engraved on one surface of the substrate 1 in two directions (x and y directions) perpendicular to each other are formed between the grooves 3x and 3y.
  • a micromirror array 10 in which a large number of small square columnar unit optical elements 2 having a desired high aspect ratio (element height v / element width h) are arranged.
  • the position of the moving stage S may be fixed, and the position of the spindle and blade B may be moved and rotated in the horizontal direction to cut (engrave) the linear groove similar to the above.
  • the diamond abrasive grains used in the dicing blade B are usually those having a particle size of about # 240 to # 5000, but the surface of the light reflecting surface (both side walls of the groove) after cutting is preferably rough (mirror surface). ), It is preferable that the grain size of the abrasive is # 1000 or more.
  • a flat substrate 1 and the substrate 1 (element surface P) ) Of a plurality of convex unit optical elements (cuboid rectangular quadrangular prisms) 2 formed in an array on one surface (upper surface).
  • a pair of (two) light reflecting surfaces (first side surface 2a and second side surface 2b on the side of the quadrangular prism) constituting the corner reflector are respectively “substrate surface direction
  • the ratio of the vertical length (element height v) in the substrate thickness direction to the lateral width (element width h) ”(hereinafter referred to as“ aspect ratio (v / h) ”) is usually 1.5 or more, preferably 2. 0 or more.
  • the aspect ratio is usually less than about 1.3, and often 1.1 or less. It is.
  • the convex micromirror array 10 will be described in more detail.
  • the substrate 1 and each unit optical element 2 are integrally formed as shown in the cross-sectional view of FIG. Grooves 3 (3x, 3y) carved using the blade B are formed.
  • the “depth” of the grooves 3 (3x, 3y) is the same as the “element height v” of each unit optical element 2 formed by cutting.
  • the substrate 1 is a support for arranging the unit optical elements 2 in an array, and is usually a flat plate having a constant thickness (thickness of about 0.5 to 10.0 mm), An element surface of the optical element (symbol P in the figure, one-dot chain line) is formed.
  • Each unit optical element 2 has a vertically long regular quadrangular prism shape projecting convexly from one surface of the substrate 1, and faces each side surface (first side surface 2a, second side surface 2b and the same).
  • the third side surface 2d and the fourth side surface 2e) are formed at an angle substantially perpendicular to the surface (upper surface in the drawing) of the substrate 1.
  • two side surfaces (first side surface 2a and second side surface 2b) constituting one corner are the outer surfaces (and The corresponding inner surface) is a light-reflecting mirror surface, and these constitute a corner reflector.
  • the light reflecting surfaces (side surfaces 2a and 2b) of the unit optical element 2 each have a rectangular shape with the aspect ratio (v / h) of 1.5 or more.
  • the element height v of each unit optical element 2 (that is, the “depth” of the groove 3) is usually set to 200 ⁇ m or more, preferably 250 ⁇ m or more, more preferably 300 ⁇ m or more.
  • each side surface of each unit optical element 2 in the convex micromirror array 10 is normally set to 50 to 300 ⁇ m, and the interval between adjacent unit optical elements 2 (that is, the width of the engraved groove by the blade B). g) is usually set to 10 to 200 ⁇ m.
  • a bright, high-brightness, high-aspect-ratio micromirror array can be easily manufactured with a high yield. Therefore, it contributes to the cost reduction of the micromirror array.
  • the obtained micromirror array 10 increases the area of each light reflecting surface and the amount of light reflected and transmitted through the array as compared with the conventional micromirror array. Thereby, it is possible to form a clear mirror image of the projection object with high brightness.
  • a micromirror array having a substantially square columnar convex unit optical element has been described as an example.
  • the method of manufacturing a micromirror array of the present invention has other polygonal column shapes such as a substantially triangular column shape.
  • the present invention can be applied to the manufacture of a micromirror array having unit optical elements.
  • Example 1 First, an acrylic plate serving as a substrate was prepared, and a convex micromirror array of Example 1 was produced by dicing (cutting).
  • ⁇ Acrylic plate> Acrylic resin substrate (flat plate): 50 mm x 50 mm x thickness 2 mm ⁇ Cutting machine> Automatic dicing saw DAD3350 manufactured by DISCO ⁇ Dicing conditions> ⁇ Dicing blade ⁇ DBC, NBC-Z2050> Blade thickness 25 ⁇ m ⁇
  • micromirror array> Affix the acrylic plate to an adhesive tape ⁇ Dicing tape: manufactured by Nitto Denko Corp., ELEP tape> and fix the acrylic plate fixed body on the chuck table (processing stage) of the dicing device ⁇ Disco>. did. Then, a groove having a depth of 300 ⁇ m (corresponding to the “element height v” of the square column of the unit optical element) is carved (digged) into a predetermined lattice shape under the conditions shown in the above ⁇ Dicing Condition> A convex micromirror array of Example 1 was produced.
  • FIG. 4 shows an enlarged photograph of the unit optical element of the convex micromirror array of Example 1 taken with a microscope.
  • Each unit optical element has an element height v of 300 ⁇ m, an element width h of 100 ⁇ m, and a groove width g between adjacent elements of 30 ⁇ m.
  • the aspect ratio (v / h) of (and the light reflecting surface) was 3.0.
  • the dimension measurement (photographing) of the manufactured unit optical element was performed using a microscope (manufactured by Keyence Corporation, VHX-200) and a laser microscope (manufactured by Keyence Corporation, VK-9700) (the following comparative examples are also included). The same).
  • the unit optical element (square prism) of the obtained convex micromirror array has an element height v of 170 ⁇ m, an element width h of 150 ⁇ m, and a groove width g between adjacent elements of 60 ⁇ m.
  • Each unit optical element (and light reflection) Surface) had an aspect ratio (v / h) of 1.13.
  • a quartz chromium mask in which squares with a side of 100 ⁇ m are regularly arranged is arranged, and an i-line bandpass filter is used from above, and contact exposure method (gap 0 ⁇ m) is used to measure 375 mJ / Exposure by cm 2 ultraviolet irradiation was performed. Further, a heat treatment of 65 ° C. ⁇ 2 minutes + 95 ° C. ⁇ 8 minutes was performed. Next, after developing with SU-8 Developer (manufactured by Nippon Kayaku Co., Ltd.) and washing with 2-propanol (manufactured by Wako Pure Chemical Industries, Ltd.), heat treatment at 150 ° C. for 10 minutes is performed.
  • SU-8 Developer manufactured by Nippon Kayaku Co., Ltd.
  • 2-propanol manufactured by Wako Pure Chemical Industries, Ltd.
  • a square columnar pattern including one micromirror was formed to obtain a convex micromirror array of Comparative Example 2.
  • the unit height v of the unit optical element (square column) of the obtained convex micromirror array is 125 ⁇ m
  • the element width h is 100 ⁇ m
  • the groove width g between adjacent elements is 30 ⁇ m
  • each unit optical element (and light reflection) The aspect ratio (v / h) of (surface) was 1.25.
  • Example 1 in which the unit optical element (light reflecting surface) has an aspect ratio (v / h) of 3.0 is a mirror image compared to the conventional convex micromirror array (Comparative Examples 1 and 2). It was confirmed that the brightness (luminance) and the visibility of images (characters) were improved.
  • the manufacturing method of the micro mirror array of the present invention can easily and easily manufacture a micro mirror array that has a high degree of freedom in designing a convex unit optical element and connects bright and bright images.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

Un procédé de fabrication de réseau de micromiroirs selon la présente invention comprend un processus de découpe dans lequel une pluralité de rainures linéaires mutuellement parallèles ayant une profondeur de 5 à 500 µm sont formées en séquence dans deux directions orthogonales l'une à l'autre sur la surface prescrite d'un substrat plan (travail W) monté sur un étage de travail (S) ayant une distance prescrite générée entre celles-ci, à l'aide d'une lame tournante (lame B) d'une machine de découpe. Ainsi, un élément optique unitaire ayant la forme d'un prisme quadrangulaire fin peut être formé, lequel prisme a un grand rapport d'au moins 1,5 pour la hauteur de l'élément (v) dans la direction d'épaisseur du substrat à la largeur de l'élément (h) dans la direction de surface du substrat (rapport de forme v/h). En outre, le procédé de fabrication mentionné ci-dessus autorise une production aisée d'un réseau de micromiroirs apte à créer une image brillante et hautement lumineuse.
PCT/JP2013/063774 2012-06-08 2013-05-17 Procédé de fabrication de réseau de micromiroirs WO2013183421A1 (fr)

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JP2012-130709 2012-06-08
JP2012130709A JP2013254145A (ja) 2012-06-08 2012-06-08 マイクロミラーアレイの製法

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WO2013183421A1 true WO2013183421A1 (fr) 2013-12-12

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015166845A (ja) * 2014-02-13 2015-09-24 日本電気硝子株式会社 光学結像素子及びその製造方法
JP2016114733A (ja) * 2014-12-15 2016-06-23 コニカミノルタ株式会社 光学素子の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09218304A (ja) * 1995-12-08 1997-08-19 Victor Co Of Japan Ltd マイクロミラーの製造方法
JP2003500684A (ja) * 1999-05-20 2003-01-07 ツムトーベル シュタッフ ゲゼルシャフト ミット ベシュレンクテル ハフツング 光線を反射させるための光学要素、およびその製造方法
JP2010256840A (ja) * 2009-03-29 2010-11-11 Utsunomiya Univ 偏光子、その製造方法及び光モジュール
WO2011052588A1 (fr) * 2009-10-28 2011-05-05 シャープ株式会社 Système optique
JP2011191404A (ja) * 2010-03-12 2011-09-29 Stanley Electric Co Ltd ２面コーナーリフレクタアレイ光学素子およびそれを用いた表示装置
JP2012027172A (ja) * 2010-07-22 2012-02-09 Mitsubishi Rayon Co Ltd 成形体およびその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09218304A (ja) * 1995-12-08 1997-08-19 Victor Co Of Japan Ltd マイクロミラーの製造方法
JP2003500684A (ja) * 1999-05-20 2003-01-07 ツムトーベル シュタッフ ゲゼルシャフト ミット ベシュレンクテル ハフツング 光線を反射させるための光学要素、およびその製造方法
JP2010256840A (ja) * 2009-03-29 2010-11-11 Utsunomiya Univ 偏光子、その製造方法及び光モジュール
WO2011052588A1 (fr) * 2009-10-28 2011-05-05 シャープ株式会社 Système optique
JP2011191404A (ja) * 2010-03-12 2011-09-29 Stanley Electric Co Ltd ２面コーナーリフレクタアレイ光学素子およびそれを用いた表示装置
JP2012027172A (ja) * 2010-07-22 2012-02-09 Mitsubishi Rayon Co Ltd 成形体およびその製造方法

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JP2013254145A (ja) 2013-12-19

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