WO2013146408A1 - Capteur tactile - Google Patents

Capteur tactile Download PDF

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Publication number
WO2013146408A1
WO2013146408A1 PCT/JP2013/057629 JP2013057629W WO2013146408A1 WO 2013146408 A1 WO2013146408 A1 WO 2013146408A1 JP 2013057629 W JP2013057629 W JP 2013057629W WO 2013146408 A1 WO2013146408 A1 WO 2013146408A1
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WO
WIPO (PCT)
Prior art keywords
touch sensor
island
electrode pattern
electrode
transparent
Prior art date
Application number
PCT/JP2013/057629
Other languages
English (en)
Japanese (ja)
Inventor
奥村　秀三
面　了明
Original Assignee
日本写真印刷株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本写真印刷株式会社 filed Critical 日本写真印刷株式会社
Publication of WO2013146408A1 publication Critical patent/WO2013146408A1/fr

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes

Definitions

  • the present invention relates to a projected capacitive touch sensor disposed on the front surface of a display device or the like.
  • Patent Document 1 a capacitive touch sensor and other devices employed in cellular phones and the like are stacked as shown in FIG. 5 (Patent Document 1).
  • FIG. 5 shows an example of a liquid crystal display device 70, a projection-type capacitive touch sensor 71 disposed on the front surface thereof, and a cover glass 72 disposed on the front surface thereof.
  • a pair of transparent substrates 81, 82 constituting the display device 70 sandwich a liquid crystal 83 in a space sealed by a sealing material 84.
  • a liquid crystal display electrode 85 is formed on the transparent substrates 81 and 82, and a polarizing plate 86 is provided.
  • Reference numeral 87 denotes a driving IC, and the driving IC 87 is connected to a control board (not shown) serving as a transmission source of image data via a flexible board 88.
  • a capacitive touch sensor 71 including a transparent substrate 91 provided with a sensor electrode 92 is disposed on the front surface of such a liquid crystal display device 70.
  • a touch position is detected by detecting a change in electrostatic capacitance that occurs when a conductor such as a human finger approaches the sensor electrode 92 provided on the transparent substrate 91.
  • a capacitance is formed between the finger and the sensor electrode 92, and the change is connected via the flexible substrate 95.
  • IC (not shown) detects.
  • FIG. 5 shows an example in which the sensor electrode 92 is formed as a column electrode extending in two directions intersecting each other.
  • an insulating film 93 is provided between the first electrode pattern extending in one direction and the first electrode pattern extending in the other direction so as to be in an electrically non-contact state.
  • the capacitive touch sensor 71 is provided with a protective layer 96 for protecting the sensor electrode 92.
  • a cover glass 72 is further disposed on the capacitive touch sensor 71 via an optical adhesive layer 99.
  • the cover glass 72 is decorated such that a black print 97 or a hole is formed on the periphery.
  • a plurality of first electrode patterns extending in the first direction and a plurality of second electrode patterns extending in the second direction as sensor electrodes 92 are formed on one surface of the transparent substrate 1.
  • the second electrode pattern is formed in a divided shape (in FIG. 6, two or more first island-shaped electrode portions 201 c and 201 d formed at intervals in the first direction and formed therebetween) First bridge wiring portion 202 and two or more second island-shaped electrode portions 201 a and 201 b ) spaced apart in the second direction, and further formed without being divided at the intersecting region.
  • the insulating film 9 that covers one electrode pattern in the intersection region and the second island-shaped electrode portion of the second electrode pattern that is divided and formed in the intersection region are formed in a connected state in the intersection region. Wiring, the insulating film 9 being And the second bridge wiring portion 4 formed so as to straddle (see FIG. 7).
  • the second bridge wiring portion 4 is formed of a metal material, and the insulating film is formed of a material having shielding properties and insulating properties. Is disclosed.
  • the insulating film 9 provided between the first bridge wiring portion 202 and the second bridge wiring portion 4 of the first electrode pattern formed without being divided in the intersecting region with a shielding material, Deterioration of visibility due to reflection of the bridge wiring 4 made of a metal material, that is, a high-luminance part that becomes dazzling occurs in a crossing region of the first electrode pattern and the second electrode pattern in a dotted or linear manner, and the user can display the liquid crystal screen. It is possible to suppress troubles or visual discomfort from being seen.
  • the electrostatic capacitance touch sensor of the said structure is manufactured as follows. First, a first electrode pattern extending in a first direction and a second electrode pattern extending in a second direction that intersects the first direction by patterning a transparent conductive film on one surface of the transparent substrate. And forming a transparent electrode pattern having a shape in which the second electrode pattern is divided at an intersection region of the first electrode pattern and the second electrode pattern. Next, by providing an insulating shielding layer made of a material having shielding properties and insulating properties at the intersection region between the first electrode pattern and the second electrode pattern, the first electrode formed without being divided at the intersection region. An insulating film covering the electrode pattern is used. Next, a second bridge wiring portion is formed on the same surface of the transparent substrate on which the insulating shielding layer is formed by patterning with a metal film in which a metal conductive material is formed.
  • the second bridge wiring portion 4 is formed so as to straddle the insulating film 9.
  • the second bridge wiring portion 4 is formed. There is a problem that the contact area with the second island-shaped electrode portion defined by the outer edge of the wiring portion 4 varies, which affects the contact resistance.
  • an object of the present invention is to solve the above-mentioned problems and to provide a touch sensor excellent in electrical connectivity.
  • a touch sensor having a plurality of transparent first electrode patterns and a plurality of transparent second electrode patterns formed on one surface of a transparent substrate and extending in directions intersecting each other.
  • the first electrode pattern is: A plurality of first island-shaped electrode portions formed at intervals in a first direction on the substrate; A first bridge wiring portion electrically connected and formed between the adjacent first island-shaped electrode portions
  • the second electrode pattern is: A plurality of second island-shaped electrode portions formed on the substrate and spaced apart in a second direction intersecting the first direction; Furthermore, a transparent insulating film is formed at least between the second island-shaped electrode portions adjacent to the second electrode pattern and on both sides thereof, A second bridge wiring portion electrically connected and formed between the second island-shaped electrode portions adjacent to the second electrode pattern via a pair of through holes that the insulating film has on the both banks.
  • a touch sensor formed separately from the second electrode pattern is provided.
  • the touch sensor according to the first aspect wherein the insulating film is formed over the entire input region.
  • the insulating film is formed only between the second island-shaped electrode portions adjacent to the second electrode pattern and on both sides thereof. Provide a sensor.
  • the touch sensor according to any one of the first to third aspects, wherein the second bridge wiring portion is a black metal thin line.
  • the touch sensor according to the fourth aspect wherein the blackening of the thin metal wire is due to black plating.
  • the touch sensor according to the fourth aspect wherein the blackening of the fine metal wires is due to electrodeposition coating.
  • the touch sensor according to the fourth aspect wherein the blackening of the thin metal wire is due to chemical conversion treatment.
  • the touch sensor according to any one of the fourth to seventh aspects, wherein the thin metal wire is any one of copper, aluminum, and nickel.
  • the touch sensor according to any one of the first to eighth aspects, further comprising a polarizing plate on the front surface.
  • the second bridge wiring portion is electrically connected between the second island-shaped electrode portions adjacent to the second electrode pattern via the pair of through holes included in the insulating film. Connection is formed. Therefore, even if the patterning accuracy of the second bridge wiring portion is not high, the contact area with the second island electrode portion is determined not by the outer edge of the second bridge wiring portion 4 but by the through hole of the insulating film. Contact resistance. That is, a touch sensor having excellent electrical connectivity can be obtained.
  • FIG. 3 is a sectional view taken along line AA ′ in FIG. 2. It is a fragmentary top view which shows the structure of the touch sensor which concerns on 2nd, 4th embodiment.
  • It is explanatory drawing which shows the structural example of the electronic device containing an electrostatic capacitance touch sensor. It is explanatory drawing which shows the example of the patterning of a transparent electrode. It is explanatory drawing which expands and shows the state in which the transparent electrode, the insulating film, and the bridge
  • FIG. 1 is a schematic diagram illustrating an example of a touch sensor.
  • FIG. 2 is a partially enlarged view near the intersection region.
  • FIG. 3 is a partially enlarged sectional view taken along line II in FIG.
  • a projection capacitive touch sensor 101 shown in FIG. 1 includes a single transparent substrate 1 and a sensor electrode 14 formed on the transparent substrate 1.
  • a touch position is detected by detecting a change in capacitance that occurs when a conductor such as a human finger approaches the sensor electrode 14 provided on the transparent substrate 1. Since the approach of the finger is detected by the capacitance change, it is not necessary for the finger to touch the sensor electrode 14 directly.
  • a capacitance is formed between the finger and the sensor electrode 14, and the change is electrostatically connected via a flexible substrate (not shown).
  • the touch position is detected by detecting the capacitance sensor IC (not shown).
  • the sensor electrode 14 and the flexible substrate are connected by the lead wiring 5.
  • the capacitance sensor IC may be mounted on the flexible substrate or may be mounted on the transparent substrate 1.
  • the sensor electrode 14 has an X electrode pattern 10 as a plurality of first electrode patterns and a Y electrode pattern 20 as a plurality of second electrode patterns on one surface of the transparent substrate 1.
  • the X electrode pattern 10 extends in the X-axis direction as the first direction in the drawing, and a plurality of X-electrode patterns 10 are arranged at intervals in the Y-axis direction.
  • the Y electrode patterns 20 extend along the Y-axis direction as the second direction in the drawing, and a plurality of Y electrode patterns 20 are arranged at intervals in the X-axis direction.
  • the Y electrode pattern 20 is formed in a divided shape in the intersecting region.
  • the X electrode pattern 10 integrally includes a plurality of first island electrode portions 12 arranged at intervals in the X-axis direction and a first bridge wiring portion 11 that connects adjacent first island electrode portions 12 to each other. It has a film.
  • the first island-like electrode portion 12 is formed in a rectangular shape in plan view, and is arranged so that one diagonal line is along the X axis.
  • the Y electrode pattern 20 has a plurality of second island-shaped electrode portions 22 arranged at intervals in the Y-axis direction.
  • the second island-shaped electrode portion 22 is formed in a rectangular shape in plan view, and is arranged so that one diagonal line is along the Y axis.
  • the first island-like electrode portion 12 and the second island-like electrode portion 22 are alternately arranged (checkered arrangement) in the X-axis direction and the Y-axis direction, and are rectangular first and second island-like electrode portions. 12 and 22 are arranged in a matrix in a plan view.
  • the transparent insulating film 3 is formed only between the adjacent second island-shaped electrode portions 22 of the second electrode pattern 20 and on both sides thereof. Furthermore, the second bridge wiring electrically connected and formed between the second island-shaped electrode portions 22 adjacent to the second electrode pattern via the pair of through holes 3a of the insulating film 3 on both banks. 30 parts are formed separately from the second electrode pattern 20 (see FIGS. 2 and 3). In the present invention, the second bridge wiring portion 30 does not straddle the insulating film 3 (that is, completely across the upper surface), but only between the pair of through holes 3a on the upper surface of the insulating film 3 and in the through holes 3a. It is formed.
  • the second bridge wiring portion is electrically connected and formed between the adjacent second island-shaped electrode portions of the second electrode pattern via the pair of through holes of the insulating film, Even if the patterning accuracy of the second bridge wiring portion is not high, the contact area with the second island-shaped electrode portion is determined not by the outer edge of the second bridge wiring portion 4 but by the through hole of the insulating film. It becomes. That is, a touch sensor having excellent electrical connectivity can be obtained.
  • the routing wiring 5 is formed on the peripheral portion of the transparent substrate 1, and one end thereof is connected to the X electrode pattern 10 and the Y electrode pattern 20, and signals sensed by the X electrode pattern 10 and the Y electrode pattern 20 are externally transmitted. It can be sent.
  • the other end of the routing wiring 5 is connected to a driving unit and an electric signal conversion / calculation unit (both not shown) provided in the touch sensor or in an external device.
  • the transparent substrate 1 is an electrically insulating substrate, such as a glass substrate, a PET (polyethylene terephthalate) film, a PC (polycardnate) film, a COP (cycloolefin polymer) film, or a PVC (polyvinyl chloride) film. Etc.
  • the COP film is preferable because it not only has excellent optical isotropy, but also has excellent dimensional stability and, in turn, processing accuracy.
  • the transparent substrate 1 is a glass substrate, it may be a thickness of 0.3 mm to 3 mm.
  • the transparent substrate 1 is a resin film, the thickness may be 20 ⁇ m to 3 mm.
  • a transparent conductive film for example, metal oxide such as indium tin oxide (ITO), zinc oxide aluminum (AZO), indium oxide zinc (IZO), etc. It is a thing.
  • the transparent conductive film is formed with a thickness of about several tens to several hundreds of nanometers, and it is necessary that the transparent conductive film is not easily etched with an etching solution used when patterning the two-bridge wiring portion 30 described later. And it is preferable to show a light transmittance of 80% or more and a surface resistance value of several m ⁇ to several hundred ⁇ .
  • the transparent electrically insulating substance constituting the transparent insulating film 3 for example, an inorganic material such as SiO2 or an organic resin material such as photolithography resin can be used.
  • the shape of the through-hole 3a of the insulating film 3 is not limited to a circle as shown in FIG. May be.
  • the second bridge wiring portion 30 and the routing wiring 5 are metal thin wires.
  • a metal such as copper, aluminum, nickel, iron, gold, silver, chromium, titanium, or an alloy obtained by combining these metals can be used. Of these, it is desirable to use copper, aluminum, nickel, etc. from the viewpoint of high conductivity, easy processing, and low cost.
  • a transparent conductive film is formed on one surface of the transparent substrate 1 using a sputtering method or the like, and the formed transparent conductive film is patterned using a photolithographic technique or the like to extend in the X-axis direction.
  • the sensor electrode 14 is formed by processing the X electrode pattern 10 having a shape and the Y electrode pattern 20 having a divided shape extending in the Y-axis direction.
  • a transparent insulating material is formed on the same surface of the transparent substrate 1 on which the sensor electrode 14 is formed (the surface on which the sensor electrode 14 is formed) by using a spin coat method or the like, and photo By patterning using the lithography technique, the region between the X electrode pattern 10 and the Y electrode pattern 20 of the sensor electrode 14 intersecting between the second island electrode portions 22 adjacent to each other in the second electrode pattern 20. And the transparent insulating film 3 is formed by patterning so as to cover only both banks.
  • a conductive material made entirely of a metal material is formed on the same surface of the transparent substrate 1 on which the transparent insulating film 3 is formed (the surface on which the insulating film 3 is formed) using a sputtering method or the like.
  • a predetermined pattern shape is formed by using a photolithography technique. That is, the second bridge wiring portion made of a thin metal wire that electrically connects and connects the adjacent second island-shaped electrode portions 22 of the second electrode pattern via the pair of through holes 3a of the insulating film 3. 30 and the lead wiring 5 are formed simultaneously. Since the second bridge wiring portion 30 and the routing wiring 5 are simultaneously formed in this way, the number of processes can be reduced.
  • the transparent insulating film 3 having the through-holes 3a is applied only between the second island-like electrode portions 22 adjacent to the second electrode pattern 20 and on both banks as in the first embodiment.
  • the first embodiment is the same as the first embodiment except that the entire input region is formed (see FIG. 4). By comprising in this way, the surface of a transparent electrode can be protected and reliability can be improved.
  • the transparent insulating film 3 having the through holes 3a is formed only between the adjacent second island-shaped electrode portions 22 of the second electrode pattern 20 and on both banks thereof. There is an advantage that the visibility of the input area is excellent.
  • the third and fourth embodiments are the same as the first and second embodiments, except that the second bridge wiring portion 30 and the routing wiring 5 are made of black metal fine wires. In this case, even if a metal material is used for the second bridge wiring portion 30, since it is not reflected by blackening, a spot-like or linear high-luminance portion that is dazzled in the intersecting region of the transparent electrode pattern does not occur.
  • Patent Document 1 cited as the prior art also describes that the insulating film 9 in the intersecting region is provided with a shielding property as a measure for preventing metal reflection.
  • the visibility of the insulating film 9 having a shielding property is deteriorated due to a wide light shielding, that is, a black portion that always shields the lit pixel in a crossing region of the transparent electrode pattern is generated in a dot shape or a line shape, thereby obstructing the liquid crystal screen display.
  • a wide light shielding that is, a black portion that always shields the lit pixel in a crossing region of the transparent electrode pattern is generated in a dot shape or a line shape, thereby obstructing the liquid crystal screen display.
  • a new problem arises.
  • the third embodiment since the light is shielded not by the width of the insulating film but by the width of the blackened bridge wiring portion, the liquid crystal screen display becomes difficult to see in the intersecting region of the transparent electrode pattern.
  • the black part of is not conspicuous.
  • the black metal wires can be blackened.
  • black nickel plating treatment, chromate plating treatment, black ternary alloy plating treatment using tin, nickel, and copper, black ternary alloy plating treatment using tin, nickel, and molybdenum may be performed.
  • the blackening of the fine metal wires can be performed by electrodeposition coating.
  • black electrodeposition coating a black paint in which a black pigment is dispersed in an electrodeposition resin is used.
  • the black pigment include carbon black, and a conductive black pigment is preferable.
  • the electrodeposition resin may be an anionic resin or a cationic resin, and specifically, an acrylic resin, a polyester resin, an epoxy resin, etc., these electrodeposition resins are respectively It is used alone or in combination of two or more.
  • the blackening of the fine metal wires can be performed by chemical conversion treatment such as sulfurization treatment or oxidation treatment.
  • Sulfurization treatment and oxidation treatment can be performed by a known method.
  • blackening “black” is preferably one having a lightness of L * of 1 to 20 and a chromaticity of a * and b * of +5 to ⁇ 5, respectively.
  • the lightness and chromaticity are measured by a color difference meter.
  • the lightness and chromaticity are also adopted in the L * a * b * color system (JIS Z 8729) defined by the International Commission on Illumination (CIE). Stipulated).
  • the lightness means that the smaller the value is, the more black it is and it is hard to see without reflecting light, and the theoretical minimum value is zero.
  • Chromaticity represents coordinates on the chromaticity diagram, and represents hue and saturation.
  • the second bridge wiring portion 30 made of the fine metal wire and the routing wiring 5 With the black metal fine wire, the second bridge wiring portion 30 made of the fine metal wire does not reflect, so the X electrode pattern 10 And the dotted
  • the thin metal wires are blackened on the same surface of the transparent substrate 1 on which the transparent insulating film 3 is formed (the surface on which the insulating film 3 is formed).
  • a conductive material made of a metal material is formed on the entire surface using a sputtering method or the like, and then the blackened metal film is formed into a predetermined pattern shape using a photolithography technique.
  • the material of the routing wiring 5 is not the same material as the second bridge wiring portion 30 made of a thin metal wire as in each of the above embodiments, but a different material.
  • the lead wiring 5 can be formed by screen printing such as silver paste.
  • a material unsuitable for the second bridge wiring portion 30 can be used for the routing wiring 5 and there is an advantage that the range of material selection is widened.
  • thickness adjustment such as forming thickly, is also possible.
  • the present invention is not limited to the above embodiments.
  • the transparent substrate 1 when it is a resin film, it may give a phase difference of ⁇ / 4.
  • giving a phase difference of ⁇ / 4 ideally means giving a phase difference of ⁇ / 4 to all wavelengths in the visible light region.
  • the retardation value ( ⁇ nd) at a wavelength of 550 nm is preferably 125 to 150 nm, and more preferably 131 to 145 nm.
  • the resin film of the transparent substrate 1 is not limited to a ⁇ / 4 retardation film single layer.
  • a laminate in which a ⁇ / 4 retardation film and an optical isotropic film are bonded may be used.
  • an optically isotropic film for example, a retardation ( ⁇ nd) value is 30 nm or less.
  • the transparent substrate 1 may use the laminated body which adhere
  • the transparent conductive film includes a conductive polymer film such as PEDOT: poly (3,4-ethylenedioxythiophene), carbon nanotube, carbon nanohorn, carbon nanowire, carbon nanofiber, graphite.
  • a film in which ultrafine conductive carbon fibers such as fibrils or ultrafine conductive fibers made of a silver material are dispersed in a polymer material functioning as a binder may be formed by various printing methods, coating methods, ink jets, or the like. These are excellent in flexibility, and when the transparent substrate 1 is a resin film, the capacitive touch sensor 10 can be attached along a 2.5-dimensional curved surface or a 3-dimensional curved surface.
  • a transparent material may be used as the material of the second bridge wiring part 30, a transparent material.
  • a conductive polymer film such as thiophene in the previous paragraph, and a conductive fiber film including metal nanowires, carbon nanotubes, and the like are formed by various printing methods, coating methods, ink jet methods, and the like.
  • the visibility of the input region is remarkably improved by the fact that not only the sensor electrode 14 and the insulating film 3 on the transparent substrate 1 but also the second bridge wiring portion 30 are all transparent.
  • the lead wiring 5 may be made of the same material as the sensor electrode 14, and in this case, the sensor electrode 14 and the lead wiring 5 can be formed simultaneously. Furthermore, the routing wiring 5 may be a multilayer film including a layer made of the same material as the sensor electrode 14 and a layer made of a different material.
  • a protective layer may be further formed on the surface of the transparent substrate 1 on which the sensor electrode 14, the insulating film 3, the second bridge wiring portion 30, and the routing wiring 5 are formed.
  • a film of SiO2 material may be formed by a sputtering method using a mask.
  • the SiO 2 film is formed on the entire surface excluding the connection portion where the routing wiring 5 and the flexible substrate are connected.
  • the projected capacitive touch sensor of the present invention may be either a self-capacitance (Self Capacitance) method or a mutual capacitance (Mutual Capacitance) method.
  • the touch sensors 101 and 102 of the above embodiments are configured to have the X electrode pattern 10 as the first electrode pattern and the Y electrode pattern 20 as the second electrode pattern, but conversely as the first electrode pattern.
  • the Y electrode pattern and the X electrode pattern 20 as the second electrode pattern may be provided.
  • the projected capacitive touch sensor of the present invention may further include a polarizing plate on the front surface.
  • a so-called “On-Cell type” liquid crystal display device in which a touch panel function is built in between the polarizing plate and the color filter is obtained.
  • Transparent substrate 3 Insulating film (transparent) 3a Through hole 4 Second bridge wiring part (reflection) 9 Insulation film (shielding) 14, 92 Sensor electrode 5 Lead-out wiring 10 X electrode pattern 11, 202 First bridge wiring part 12, 201 c , 201 d First island electrode part 13, 23 Connection part 20 Y electrode pattern 22, 201 a , 201 b 2nd island electrode part 30 2nd bridge

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

L'invention porte sur un capteur tactile possédant une connectivité électrique hors du commun. Ce capteur tactile comprend de multiples premiers motifs d'électrode transparents et de multiples seconds motifs d'électrode transparents formés sur une même surface d'un substrat transparent et s'étendant dans des directions se croisant mutuellement. Le premier motif d'électrode comprend : de multiples premières parties d'électrode à structure en îlot qui sont formées dans une première direction sur le substrat et formées avec un espace séparant chacune d'elles ; et une première partie de câblage en pont formée avec une connexion électrique entre des premières parties d'électrode à structure en îlot adjacentes. Le second motif d'électrode comprend de multiples secondes parties d'électrode à structure en îlot qui sont formées dans une seconde direction croisant la première direction sur le substrat et formées avec un espace séparant chacune d'elles. Un film isolant transparent est formé au moins : entre des secondes parties d'électrode à structure en îlot adjacentes du second motif d'électrode ; et sur les deux marges desdites secondes parties d'électrode à structure en îlot adjacentes. Une seconde partie de câblage en pont formée avec une connexion électrique entre les secondes parties d'électrode à structure en îlot adjacentes du second motif d'électrode est formée sous la forme d'un objet séparé du second motif d'électrode, ladite seconde partie de câblage en pont étant formée d'un côté à l'autre d'un intervalle entre deux trous traversants qui sont formés dans la couche isolante sur les deux marges.
PCT/JP2013/057629 2012-03-28 2013-03-18 Capteur tactile WO2013146408A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012-075223 2012-03-28
JP2012075223A JP2013206197A (ja) 2012-03-28 2012-03-28 タッチセンサー

Publications (1)

Publication Number Publication Date
WO2013146408A1 true WO2013146408A1 (fr) 2013-10-03

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JP (1) JP2013206197A (fr)
TW (1) TW201351252A (fr)
WO (1) WO2013146408A1 (fr)

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JP2015088516A (ja) * 2013-10-28 2015-05-07 東レエンジニアリング株式会社 配線基板の製造方法及びそれに使用されるインクジェット塗布装置
CN110045862B (zh) * 2014-03-31 2023-05-23 宸盛光电有限公司 电容式触控装置及其制作方法
KR101827465B1 (ko) * 2015-03-30 2018-03-22 동우 화인켐 주식회사 터치 센서
GB2544353B (en) * 2015-12-23 2018-02-21 Cambridge Touch Tech Ltd Pressure-sensitive touch panel
TWI772401B (zh) 2017-04-06 2022-08-01 日商富士軟片股份有限公司 觸控感測器以及觸控感測器的製造方法
JP6934950B2 (ja) 2017-09-29 2021-09-15 富士フイルム株式会社 タッチセンサー及びタッチセンサーの製造方法、並びに画像表示装置
WO2019077891A1 (fr) * 2017-10-16 2019-04-25 富士フイルム株式会社 Matériau de transfert, capteur tactile et son procédé de fabrication, et dispositif d'affichage d'image

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JP3144241U (ja) * 2008-06-10 2008-08-21 洋華光電股▲ふん▼有限公司 コンデンサー式タッチパッド
WO2011013279A1 (fr) * 2009-07-31 2011-02-03 シャープ株式会社 Substrat d'électrode, procédé de fabrication de substrat d'électrode et dispositif d'affichage d'image

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WO2011013279A1 (fr) * 2009-07-31 2011-02-03 シャープ株式会社 Substrat d'électrode, procédé de fabrication de substrat d'électrode et dispositif d'affichage d'image

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CN111279301A (zh) * 2017-11-01 2020-06-12 阿尔卑斯阿尔派株式会社 静电电容式传感器

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