WO2013146400A1 - Capteur tactile - Google Patents

Capteur tactile Download PDF

Info

Publication number
WO2013146400A1
WO2013146400A1 PCT/JP2013/057603 JP2013057603W WO2013146400A1 WO 2013146400 A1 WO2013146400 A1 WO 2013146400A1 JP 2013057603 W JP2013057603 W JP 2013057603W WO 2013146400 A1 WO2013146400 A1 WO 2013146400A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
electrode pattern
touch sensor
transparent
island
Prior art date
Application number
PCT/JP2013/057603
Other languages
English (en)
Japanese (ja)
Inventor
奥村 秀三
面 了明
Original Assignee
日本写真印刷株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本写真印刷株式会社 filed Critical 日本写真印刷株式会社
Publication of WO2013146400A1 publication Critical patent/WO2013146400A1/fr

Links

Images

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to a projected capacitive touch sensor disposed on the front surface of a display device or the like.
  • Patent Document 1 a capacitive touch sensor and other devices employed in cellular phones and the like are stacked as shown in FIG. 4 (Patent Document 1).
  • FIG. 4 shows an example of a liquid crystal display device 70, a projection-type capacitive touch sensor 71 disposed on the front surface thereof, and a cover glass 72 disposed on the front surface thereof.
  • a pair of transparent substrates 81, 82 constituting the display device 70 sandwich a liquid crystal 83 in a space sealed with a sealing material 84.
  • a liquid crystal display electrode 85 is formed on the transparent substrates 81 and 82, and a polarizing plate 86 is provided.
  • Reference numeral 87 denotes a driving IC, and the driving IC 87 is connected to a control board (not shown) serving as a transmission source of image data via a flexible board 88.
  • a capacitive touch sensor 71 including a transparent substrate 91 provided with a sensor electrode 92 is disposed on the front surface of such a liquid crystal display device 70.
  • a touch position is detected by detecting a change in electrostatic capacitance that occurs when a conductor such as a human finger approaches the sensor electrode 92 provided on the transparent substrate 91.
  • a capacitance is formed between the finger and the sensor electrode 92, and the change is connected via the flexible substrate 95.
  • IC (not shown) detects.
  • FIG. 4 shows an example in which the sensor electrode 92 is formed as a column electrode extending in two directions intersecting each other.
  • an insulating film 93 is provided between the first electrode pattern extending in one direction and the first electrode pattern extending in the other direction so as to be in an electrically non-contact state.
  • the capacitive touch sensor 71 is provided with a protective layer 96 for protecting the sensor electrode 92.
  • a cover glass 72 is further disposed on the capacitive touch sensor 71 via an optical adhesive layer 99.
  • the cover glass 72 is decorated such that a black print 97 or a hole is formed on the periphery.
  • Patent Document 1 a plurality of first electrode patterns extending in the first direction and a plurality of second electrode patterns extending in the second direction as sensor electrodes 92 are formed on one surface of the transparent substrate 1.
  • the second electrode pattern is formed in a divided shape (in FIG. 5, two or more first island-shaped electrode portions 201 c and 201 d formed at intervals in the first direction and formed therebetween) First bridge wiring portion 202 and two or more second island-shaped electrode portions 201 a and 201 b ) spaced apart in the second direction, and further formed without being divided at the intersecting region.
  • the insulating film 9 that covers one electrode pattern in the intersection region and the second island-shaped electrode portion of the second electrode pattern that is divided and formed in the intersection region are formed in a connected state in the intersection region.
  • the insulating film 9 provided between the first bridge wiring portion 202 and the second bridge wiring portion 4 of the first electrode pattern formed without being divided in the intersecting region with a shielding material, Deterioration of visibility due to reflection of the bridge wiring 4 made of a metal material, that is, a high-brightness portion that becomes dazzling occurs in the intersection region of the first electrode pattern and the second electrode pattern, and the user views the liquid crystal screen. In this case, it is possible to suppress the occurrence of a malfunction or visual discomfort.
  • the electrostatic capacitance touch sensor of the said structure is manufactured as follows. First, a first electrode pattern extending in a first direction and a second electrode pattern extending in a second direction that intersects the first direction by patterning a transparent conductive film on one surface of the transparent substrate. And forming a transparent electrode pattern having a shape in which the second electrode pattern is divided at an intersection region of the first electrode pattern and the second electrode pattern. Next, by providing an insulating shielding layer made of a material having shielding properties and insulating properties at the intersection region between the first electrode pattern and the second electrode pattern, the first electrode formed without being divided at the intersection region. An insulating film covering the electrode pattern is used. Next, a second bridge wiring portion is formed on the same surface of the transparent substrate on which the insulating shielding layer is formed by patterning with a metal film in which a metal conductive material is formed.
  • the width of the insulating film 9 having shielding properties is formed wider than the width of the second bridge wiring portion 4 made of a metal material formed so as to straddle the insulating film 9.
  • the visibility of the insulating film 9 having the shielding property is deteriorated due to the wide light shielding, that is, a black portion that always shields the lit pixel in a crossing region of the transparent electrode pattern is generated in a dot shape or a line shape. A new problem arises that hinders.
  • an object of the present invention is to solve the above-mentioned problem, and a point-like or linear high-luminance portion that becomes dazzling occurs in a crossing region of the transparent electrode pattern, or a liquid crystal screen display becomes difficult to see. Another object is to provide a touch sensor in which a linear black portion does not stand out.
  • a touch sensor having a plurality of transparent first electrode patterns and a plurality of transparent second electrode patterns formed on one surface of a transparent substrate and extending in directions intersecting each other.
  • the first electrode pattern is: A plurality of first island-shaped electrode portions formed at intervals in a first direction on the substrate; A first bridge wiring portion electrically connected and formed between the adjacent first island-shaped electrode portions,
  • the second electrode pattern is: A plurality of second island-shaped electrode portions formed on the substrate and spaced apart in a second direction intersecting the first direction; Furthermore, an electrical connection is made between the second island electrode portions adjacent to the second electrode pattern so as to straddle at least the transparent insulating film formed on the first bridge wiring portion of the first electrode pattern.
  • a touch sensor is provided in which a second bridge wiring portion connected to is formed, and the second bridge wiring portion is a black metal fine wire.
  • the touch sensor according to the first aspect wherein the blackening of the thin metal wire is due to black plating.
  • the touch sensor according to the first aspect wherein the blackening of the thin metal wire is due to electrodeposition coating.
  • the touch sensor according to the first aspect wherein the blackening of the thin metal wire is caused by chemical conversion treatment.
  • the touch sensor according to any one of the first to fourth aspects, wherein the thin metal wire is any one of copper, aluminum, and nickel.
  • the touch sensor according to any one of the 1st to 5th aspects, wherein a polarizing plate is provided on the front surface.
  • the bridge wiring portion formed between the island-shaped electrode portions of the divided electrode pattern is formed by blackening the metal thin wire, and is formed so as to straddle the transparent insulating film. Constitute. Therefore, since the bridge wiring portion made of the metal material is not reflected by blackening, a dotted or linear high-luminance portion that is dazzled in the intersecting region of the transparent electrode pattern does not occur. Further, since the light is shielded not by the width of the insulating film but by the width of the blackened bridge wiring portion, the dot-like or linear black portion that makes it difficult to see the liquid crystal screen display does not stand out in the intersecting region of the transparent electrode pattern.
  • FIG. 3 is a sectional view taken along line AA ′ in FIG. 2.
  • It is explanatory drawing which shows the structural example of the electronic device containing an electrostatic capacitance touch sensor. It is explanatory drawing which shows the example of the patterning of a transparent electrode. It is explanatory drawing which expands and shows the state in which the transparent electrode, the insulating film, and the bridge
  • FIG. 1 is a schematic diagram illustrating an example of a touch sensor.
  • FIG. 2 is a partially enlarged view near the intersection region.
  • FIG. 3 is a partially enlarged sectional view taken along line II in FIG.
  • a projection capacitive touch sensor 101 shown in FIG. 1 includes a single transparent substrate 1 and a sensor electrode 14 formed on the transparent substrate 1.
  • a touch position is detected by detecting a change in capacitance that occurs when a conductor such as a human finger approaches the sensor electrode 14 provided on the transparent substrate 1. Since the approach of the finger is detected by the capacitance change, it is not necessary for the finger to touch the sensor electrode 14 directly.
  • a capacitance is formed between the finger and the sensor electrode 14, and the change is electrostatically connected via a flexible substrate (not shown).
  • the touch position is detected by detecting the capacitance sensor IC (not shown).
  • the sensor electrode 14 and the flexible substrate are connected by the lead wiring 5.
  • the capacitance sensor IC may be mounted on the flexible substrate or may be mounted on the transparent substrate 1.
  • the sensor electrode 14 has an X electrode pattern 10 as a plurality of first electrode patterns and a Y electrode pattern 20 as a plurality of second electrode patterns on one surface of the transparent substrate 1.
  • the X electrode pattern 10 extends in the X-axis direction as the first direction in the drawing, and a plurality of X-electrode patterns 10 are arranged at intervals in the Y-axis direction.
  • the Y electrode patterns 20 extend along the Y-axis direction as the second direction in the drawing, and a plurality of Y electrode patterns 20 are arranged at intervals in the X-axis direction.
  • the Y electrode pattern 20 is formed in a divided shape in the intersecting region.
  • the X electrode pattern 10 integrally includes a plurality of first island electrode portions 12 arranged at intervals in the X-axis direction and a first bridge wiring portion 11 that connects adjacent first island electrode portions 12 to each other. It has a film.
  • the first island-like electrode portion 12 is formed in a rectangular shape in plan view, and is arranged so that one diagonal line is along the X axis.
  • the Y electrode pattern 20 has a plurality of second island-shaped electrode portions 22 arranged at intervals in the Y-axis direction.
  • the second island-shaped electrode portion 22 is formed in a rectangular shape in plan view, and is arranged so that one diagonal line is along the Y axis.
  • the first island-like electrode portion 12 and the second island-like electrode portion 22 are alternately arranged (checkered arrangement) in the X-axis direction and the Y-axis direction, and are rectangular first and second island-like electrode portions. 12 and 22 are arranged in a matrix in a plan view.
  • the transparent insulating film 3 is provided so as to cover the first bridge wiring portion 11.
  • the wiring is formed to connect the adjacent second island-shaped electrode portions 22 in the intersecting region,
  • a second bridge wiring portion 30 is provided so as to straddle the transparent insulating film 3 (see FIGS. 2 and 3). That is, the second island-shaped electrode portions 22 adjacent to each other in the second electrode pattern 20 are electrically connected by the second bridge wiring portion 30 that is separate from the transparent electrode pattern.
  • the second bridge wiring portion 30 crosses the transparent insulating film 3 so that the upper surface of the insulating film 3 is completely traversed by the second bridge wiring portion 30 longer than the width of the insulating film 3. Means that.
  • the routing wiring 5 is formed on the peripheral portion of the transparent substrate 1, and one end thereof is connected to the X electrode pattern 10 and the Y electrode pattern 20, and signals sensed by the X electrode pattern 10 and the Y electrode pattern 20 are externally transmitted. It can be sent.
  • the other end of the routing wiring 5 is connected to a driving unit and an electric signal conversion / calculation unit (both not shown) provided in the touch sensor or in an external device.
  • the transparent substrate 1 is an electrically insulating substrate, such as a glass substrate, a PET (polyethylene terephthalate) film, a PC (polycardnate) film, a COP (cycloolefin polymer) film, or a PVC (polyvinyl chloride) film. Etc.
  • the COP film is preferable because it not only has excellent optical isotropy, but also has excellent dimensional stability and, in turn, processing accuracy.
  • the transparent substrate 1 is a glass substrate, it may be a thickness of 0.3 mm to 3 mm.
  • the transparent substrate 1 is a resin film, the thickness may be 20 ⁇ m to 3 mm.
  • a transparent conductive film for example, metal oxide such as indium tin oxide (ITO), zinc oxide aluminum (AZO), indium oxide zinc (IZO), etc. It is a thing. Further, the transparent conductive film is formed with a thickness of about several tens to several hundreds of nanometers, and it is necessary that the transparent conductive film is not easily etched with an etching solution used for patterning formation of the second bridge wiring portion 30 made of a thin metal wire described later. It is. And it is preferable to show a light transmittance of 80% or more and a surface resistance value of several m ⁇ to several hundred ⁇ .
  • the transparent electrically insulating substance constituting the transparent insulating film 3 for example, an inorganic material such as SiO2 or an organic resin material such as photolithography resin can be used.
  • the second bridge wiring portion 30 and the routing wiring 5 are made of black metal thin wires.
  • a metal such as copper, aluminum, nickel, iron, gold, silver, chromium, titanium, or an alloy obtained by combining these metals can be used. Of these, it is desirable to use copper, aluminum, nickel, etc. from the viewpoint of high conductivity, easy processing, and low cost.
  • black metal wires can be blackened by black plating.
  • black nickel plating treatment, chromate plating treatment, black ternary alloy plating treatment using tin, nickel, and copper, black ternary alloy plating treatment using tin, nickel, and molybdenum may be performed.
  • the blackening of the fine metal wires can be performed by electrodeposition coating.
  • black electrodeposition coating a black paint in which a black pigment is dispersed in an electrodeposition resin is used.
  • the black pigment include carbon black, and a conductive black pigment is preferable.
  • the electrodeposition resin may be an anionic resin or a cationic resin, and specifically, an acrylic resin, a polyester resin, an epoxy resin, etc., these electrodeposition resins are respectively It is used alone or in combination of two or more.
  • the blackening of the fine metal wires can be performed by chemical conversion treatment such as sulfurization treatment or oxidation treatment.
  • Sulfurization treatment and oxidation treatment can be performed by a known method.
  • blackening “black” is preferably one having a lightness of L * of 1 to 20 and a chromaticity of a * and b * of +5 to ⁇ 5, respectively.
  • the lightness and chromaticity are measured by a color difference meter.
  • the lightness and chromaticity are also adopted in the L * a * b * color system (JIS Z 8729) defined by the International Commission on Illumination (CIE). Stipulated).
  • the lightness means that the smaller the value is, the more black it is and it is hard to see without reflecting light, and the theoretical minimum value is zero.
  • Chromaticity represents coordinates on the chromaticity diagram, and represents hue and saturation.
  • the second bridge wiring portion 30 made of the fine metal wire and the routing wiring 5 With the black metal fine wire, the second bridge wiring portion 30 made of the fine metal wire does not reflect, so the X electrode pattern 10 And the dotted
  • a transparent conductive film is formed on one surface of the transparent substrate 1 using a sputtering method or the like, and the formed transparent conductive film is patterned using a photolithographic technique or the like to extend in the X-axis direction.
  • the sensor electrode 14 is formed by processing the X electrode pattern 10 having a shape and the Y electrode pattern 20 having a divided shape extending in the Y-axis direction.
  • a transparent insulating material is formed on the same surface of the transparent substrate 1 on which the sensor electrode 14 is formed (the surface on which the sensor electrode 14 is formed) by using a spin coat method or the like, and photo By patterning using a lithography technique, the transparent insulating film 3 is patterned and formed in a region where the X electrode pattern 10 and the Y electrode pattern 20 of the sensor electrode 14 intersect.
  • a conductive material made entirely of a metal material is formed on the same surface of the transparent substrate 1 on which the transparent insulating film 3 is formed (the surface on which the insulating film 3 is formed) using a sputtering method or the like. Then, after blackening the metal film by black plating, electrodeposition coating, or chemical conversion treatment, the blackened metal film is formed into a predetermined pattern shape using a photolithography technique. That is, the second bridge wiring portion 30 made of a thin metal wire that is electrically connected between the adjacent second island-like electrode portions 22 of the second electrode pattern so as to straddle over the respective insulating films 3, and the lead wiring 5 And at the same time. Since the second bridge wiring portion 30 and the routing wiring 5 are simultaneously formed in this way, the number of processes can be reduced.
  • the material of the routing wiring 5 is not the same material as the second bridge wiring portion 30 made of a thin metal wire as in the first embodiment, but a different material.
  • the lead wiring 5 can be formed by screen printing such as silver paste.
  • a material unsuitable for the second bridge wiring portion 30 can be used for the routing wiring 5, and there is an advantage that the range of material selection is widened.
  • thickness adjustment such as forming thickly, is also possible.
  • the present invention is not limited to the above embodiments.
  • the transparent substrate 1 when it is a resin film, it may give a phase difference of ⁇ / 4.
  • giving a phase difference of ⁇ / 4 ideally means giving a phase difference of ⁇ / 4 to all wavelengths in the visible light region.
  • the retardation value ( ⁇ nd) at a wavelength of 550 nm is preferably 125 to 150 nm, and more preferably 131 to 145 nm.
  • the resin film of the transparent substrate 1 is not limited to a ⁇ / 4 retardation film single layer.
  • a laminate in which a ⁇ / 4 retardation film and an optical isotropic film are bonded may be used.
  • an optically isotropic film for example, a retardation ( ⁇ nd) value is 30 nm or less.
  • the transparent substrate 1 may use the laminated body which adhere
  • the transparent conductive film includes a conductive polymer film such as PEDOT: poly (3,4-ethylenedioxythiophene), carbon nanotube, carbon nanohorn, carbon nanowire, carbon nanofiber, graphite.
  • a film in which ultrafine conductive carbon fibers such as fibrils or ultrafine conductive fibers made of a silver material are dispersed in a polymer material functioning as a binder may be formed by various printing methods, coating methods, ink jets, or the like. These are excellent in flexibility, and when the transparent substrate 1 is a resin film, the capacitive touch sensor 10 can be attached along a 2.5-dimensional curved surface or a 3-dimensional curved surface.
  • the lead wiring 5 may be made of the same material as the sensor electrode 14, and in this case, the sensor electrode 14 and the lead wiring 5 can be formed simultaneously. Furthermore, the routing wiring 5 may be a multilayer film including a layer made of the same material as the sensor electrode 14 and a layer made of a different material.
  • a protective layer may be further formed on the surface of the transparent substrate 1 on which the sensor electrode 14, the insulating film 3, the second bridge wiring portion 30 made of a thin metal wire, and the routing wiring 5 are formed.
  • a film of SiO2 material may be formed by a sputtering method using a mask.
  • the SiO 2 film is formed on the entire surface excluding the connection portion where the routing wiring 5 and the flexible substrate are connected.
  • the projected capacitive touch sensor of the present invention may be either a self-capacitance (Self Capacitance) method or a mutual capacitance (Mutual Capacitance) method.
  • the touch sensor 101 of each of the above embodiments is configured to have the X electrode pattern 10 as the first electrode pattern and the Y electrode pattern 20 as the second electrode pattern, but conversely as the first electrode pattern.
  • the Y electrode pattern and the X electrode pattern 20 as the second electrode pattern may be provided.
  • the projected capacitive touch sensor of the present invention may further include a polarizing plate on the front surface.
  • a so-called “On-Cell type” liquid crystal display device in which a touch panel function is built in between the polarizing plate and the color filter is obtained.
  • Transparent substrate 3 Insulating film (transparent) 4 Second bridge wiring part (reflection) 9 Insulation film (shielding) 14, 92 Sensor electrode 5 Lead-out wiring 10 X electrode pattern 11, 202 First bridge wiring part 12, 201 c , 201 d First island electrode part 13, 23 Connection part 20 Y electrode pattern 22, 201 a , 201 b 2nd island electrode part 30 2nd bridge wiring part (blackening) 71,101 Touch sensor

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)
  • Liquid Crystal (AREA)

Abstract

[Problème] Fournir un capteur tactile dans lequel rien de ce qui suit ne se produit dans une partie d'intersection d'un motif d'électrode transparent : une partie à forte luminosité éblouissante en lignes ou en pointillés est générée ; ou une partie en lignes ou en pointillés dans laquelle un écran d'affichage à cristaux liquides est difficile à voir est perceptible. [Solution] Ce capteur tactile comprend plusieurs premiers motifs d'électrode transparents et plusieurs deuxièmes motifs d'électrode transparents, lesdits premiers et deuxièmes motifs d'électrode étant formés sur une surface d'un substrat transparent et s'étendant dans des directions en intersection mutuelle. Le premier motif d'électrode comprend : plusieurs premières parties d'électrode à structure en îlot qui sont formées dans une première direction sur le substrat et formées avec un espace les séparant chacune ; et une première partie de câblage en pont formée avec une connexion électrique entre les premières parties d'électrode à structure en îlot. Le deuxième motif d'électrode comprend plusieurs deuxièmes parties d'électrode à structure en îlot qui sont formées dans une seconde direction coupant la première direction sur le substrat et formées avec un espace les séparant chacune. Une deuxième partie de câblage en pont formée avec une connexion électrique entre les deuxièmes parties d'électrode à structure en îlot du second motif d'électrode est formée de manière à former un pont sur un film isolant transparent qui est formé sur au moins la première partie de câblage en pont du premier motif d'électrode. La deuxième partie de câblage en pont a des fils métalliques minces noircis.
PCT/JP2013/057603 2012-03-28 2013-03-18 Capteur tactile WO2013146400A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012-075224 2012-03-28
JP2012075224A JP2013206198A (ja) 2012-03-28 2012-03-28 タッチセンサー

Publications (1)

Publication Number Publication Date
WO2013146400A1 true WO2013146400A1 (fr) 2013-10-03

Family

ID=49259661

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2013/057603 WO2013146400A1 (fr) 2012-03-28 2013-03-18 Capteur tactile

Country Status (3)

Country Link
JP (1) JP2013206198A (fr)
TW (1) TW201351234A (fr)
WO (1) WO2013146400A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6447185B2 (ja) * 2015-01-30 2019-01-09 住友金属鉱山株式会社 導電性基板の製造方法、積層導電性基板の製造方法
JP6612075B2 (ja) 2015-07-23 2019-11-27 株式会社ジャパンディスプレイ 表示装置、入力装置および表示装置の製造方法
JP2018036896A (ja) 2016-08-31 2018-03-08 株式会社ジャパンディスプレイ タッチセンサ及び表示装置
KR20180076688A (ko) * 2016-12-28 2018-07-06 엘지디스플레이 주식회사 표시 장치
CN107783699B (zh) * 2017-10-16 2021-05-04 业成科技(成都)有限公司 触控面板结构与其制造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006344163A (ja) * 2005-06-10 2006-12-21 Nissha Printing Co Ltd 静電容量型タッチパネル
WO2008108042A1 (fr) * 2007-03-01 2008-09-12 Sharp Kabushiki Kaisha Substrat de panneau d'affichage, panneau d'affichage, dispositif d'affichage et procédé de fabrication d'un substrat de panneau d'affichage
JP2009116433A (ja) * 2007-11-02 2009-05-28 Seiko Epson Corp タッチパネル装置付き電気光学装置及び電子機器
WO2011013279A1 (fr) * 2009-07-31 2011-02-03 シャープ株式会社 Substrat d'électrode, procédé de fabrication de substrat d'électrode et dispositif d'affichage d'image
JP2011076200A (ja) * 2009-09-29 2011-04-14 Dainippon Printing Co Ltd タッチパネル用電極フィルム、該タッチパネル用電極フィルムの製造方法及びタッチパネル
WO2012060344A1 (fr) * 2010-11-05 2012-05-10 富士フイルム株式会社 Écran tactile

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006344163A (ja) * 2005-06-10 2006-12-21 Nissha Printing Co Ltd 静電容量型タッチパネル
WO2008108042A1 (fr) * 2007-03-01 2008-09-12 Sharp Kabushiki Kaisha Substrat de panneau d'affichage, panneau d'affichage, dispositif d'affichage et procédé de fabrication d'un substrat de panneau d'affichage
JP2009116433A (ja) * 2007-11-02 2009-05-28 Seiko Epson Corp タッチパネル装置付き電気光学装置及び電子機器
WO2011013279A1 (fr) * 2009-07-31 2011-02-03 シャープ株式会社 Substrat d'électrode, procédé de fabrication de substrat d'électrode et dispositif d'affichage d'image
JP2011076200A (ja) * 2009-09-29 2011-04-14 Dainippon Printing Co Ltd タッチパネル用電極フィルム、該タッチパネル用電極フィルムの製造方法及びタッチパネル
WO2012060344A1 (fr) * 2010-11-05 2012-05-10 富士フイルム株式会社 Écran tactile

Also Published As

Publication number Publication date
TW201351234A (zh) 2013-12-16
JP2013206198A (ja) 2013-10-07

Similar Documents

Publication Publication Date Title
WO2013146408A1 (fr) Capteur tactile
JP5372697B2 (ja) 投影型静電容量タッチパネルの製造方法
US9471161B2 (en) Touch screen panel
US10248268B2 (en) OGS capacitive touch screen and manufacturing method thereof
US9891764B2 (en) Touch screen panel
US11061504B2 (en) Input sensing unit and display device including the same
TWI584180B (zh) 透明電極圖案結構及具有其之觸控面板
WO2013146400A1 (fr) Capteur tactile
JP2014071734A (ja) カラーフィルタ一体型タッチパネルセンサ用基板、カラーフィルタ一体型タッチパネルセンサおよびカラーフィルタ一体型タッチパネルモジュール
CN108475152B (zh) 触摸屏传感器
JP2013214173A (ja) 静電容量方式のフィルムセンサーとこれを用いたセンサーモジュール及びカバーモジュール
JP2012118936A (ja) 透明シート付タッチパネルセンサ
TW201445394A (zh) 透明電極圖型層板及含此之觸控螢幕面板
KR102281616B1 (ko) 터치 스크린 패널 및 터치 스크린 패널 제조 방법
WO2013008675A1 (fr) Panneau tactile et dispositif d'affichage à panneau tactile
JP5707949B2 (ja) タッチパネルセンサおよびタッチパネルセンサの製造方法
JP2015032214A (ja) タッチパネルセンサおよびタッチ位置検出機能付き表示装置
TW201629728A (zh) 觸控螢幕面板及含此之影像顯示
TWI507935B (zh) 單片式電容觸控面板及其製造方法
TW201546680A (zh) 觸控面板
KR20170038428A (ko) 터치 윈도우
KR102212918B1 (ko) 터치 패널
TWI606382B (zh) 觸控螢幕面板
WO2021019823A1 (fr) Élément d'électrode transparent, capteur de type à capacité électrostatique et dispositif d'entrée/sortie
KR20160079280A (ko) 터치 윈도우

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 13769002

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 13769002

Country of ref document: EP

Kind code of ref document: A1