WO2013123788A1 - 彩膜基板及其制作方法 - Google Patents
彩膜基板及其制作方法 Download PDFInfo
- Publication number
- WO2013123788A1 WO2013123788A1 PCT/CN2012/085202 CN2012085202W WO2013123788A1 WO 2013123788 A1 WO2013123788 A1 WO 2013123788A1 CN 2012085202 W CN2012085202 W CN 2012085202W WO 2013123788 A1 WO2013123788 A1 WO 2013123788A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- heat conductive
- conductive layer
- color filter
- filter substrate
- Prior art date
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133382—Heating or cooling of liquid crystal cells other than for activation, e.g. circuits or arrangements for temperature control, stabilisation or uniform distribution over the cell
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Definitions
- Embodiments of the present invention relate to a color film substrate and a method of fabricating the same. Background technique
- the TFT to LCD is formed by pairing a color film substrate and an array substrate, and the color film substrate mainly provides color to the TFT to the LCD.
- the formation process of the black matrix and the pixel resin layer is the same: First, a corresponding resin material is coated on the entire substrate, and the resin material contains a color pigment, a photoinitiator, a resin, a solvent, etc., and the solvent is in the resin material. It acts to dissolve other materials and can be volatilized under high temperature. After forming the black matrix and color pixel resin layer, the solvent needs to be removed to avoid affecting the black matrix and the color pixel resin layer on the glass substrate. Adhesion; secondly, the substrate coated with the resin material is pre-baked and cured; then mask exposure and development treatment are performed, excess resin material is removed to form a black matrix and a pixel resin layer pattern; and finally cured by post-baking.
- the formed pattern wherein the pixel resin layer includes a red pixel resin layer, a green pixel resin layer, and a blue pixel resin layer.
- An embodiment of the present invention provides a color filter substrate including a substrate; a black matrix and a color pixel layer formed on the substrate, and a transparent heat conductive layer, wherein the transparent heat conductive layer is located on the black matrix and the color pixel layer and the substrate between.
- Another embodiment of the present invention provides a method for fabricating a color filter substrate, comprising: forming on a substrate Forming a transparent thermally conductive layer; forming a black matrix pattern and a color pixel layer on the transparent thermally conductive layer by a patterning process.
- FIG. 1 is a schematic structural view of a color filter substrate in which a transparent heat conductive layer is completed according to an embodiment of the present invention
- FIG. 2 is a schematic structural view showing a structure of a color filter substrate in which a transparent heat conductive layer and a black matrix are completed according to an embodiment of the present invention
- FIG. 3 is a schematic structural view of a color filter substrate completing a transparent heat conductive layer, a black matrix, and a color pixel layer according to an embodiment of the invention
- FIG. 4 is a schematic structural view of a color filter substrate completing a transparent heat conductive layer, a black matrix, a color pixel layer, and a protective layer according to an embodiment of the invention
- FIG. 5 is a schematic structural view of a color filter substrate in which a transparent heat conductive layer, a black matrix, a color pixel layer, a protective layer, and a conductive layer are completed according to an embodiment of the present invention
- FIG. 6 is a schematic overall structural view of a color filter substrate according to an embodiment of the invention.
- FIG. 7 is a flow chart of a method of fabricating a color filter substrate according to an embodiment of the invention. detailed description
- One of the technical problems to be solved by the embodiments of the present invention is to provide a color film substrate and a manufacturing method thereof, which overcome the existing resin material of the color film substrate structure which is easy to produce a black matrix and a color pixel layer due to insufficient temperature in the baking stage.
- the solvent in the medium is not sufficiently removed, and the gelation phenomenon occurs in the developing stage, thereby affecting defects such as product quality.
- a color filter substrate includes: a glass substrate 1 on which a transparent heat conductive layer 2, a black matrix 3, a color pixel layer, a protective layer 7, a conductive layer 8 and The spacer 9, wherein the color pixel layer includes a red pixel layer 4, a green pixel layer 5, and a blue pixel layer 6.
- the thickness of the transparent heat conductive layer 2 is 1 to 5 ⁇ m, which ensures the heat conduction effect of the transparent heat conductive layer is optimized under the premise of ensuring the thinning of the color film substrate.
- the thickness of the black matrix is 1 to 5 ⁇ ⁇
- the thickness of the color pixel layer is 1 to 5 ⁇
- the thickness of the protective layer is 1 to 5 ⁇
- the conductive layer is a ruthenium film having a thickness of 500 to 2000 ⁇ .
- the mat has a trapezoidal columnar cross section with a cross-sectional diameter of 15 to 20 ⁇ m at the bottom end and a cross-sectional diameter of 5 to 10 ⁇ m.
- the transparent heat conductive layer 2 is made of a heat conductive material having a thermal conductivity of, for example, 2 to 4 w/mk.
- the thermal conductivity of the heat conductive material can be set to 4 w/mk,
- the thermally conductive material has a good thermal conductivity.
- the thermal conductivity coefficient selected in practice is determined by the degree of equipment and process technology in the actual environment.
- the heat conductive material of the transparent heat conductive layer 2 is made of a high molecular polymer containing heat conductive particles.
- the heat conductive particles are one or more of a metal, a metal oxide, and a nonmetal.
- the thermally conductive particles may be selected from the group consisting of gold, silver, copper, aluminum, calcium, magnesium, iron, aluminum oxide, magnesium oxide, cerium oxide, calcium oxide, nickel oxide, aluminum nitride, silicon nitride, carbonization.
- One or more of silicon, carbon fiber, diamond and quartz, and the polymer composite is composed of one or more of epoxy resin, silica gel, phenolic resin and polyimide.
- the method for fabricating the color film substrate provided by the present invention includes, for example:
- Step 1 Form a transparent heat conductive layer on the substrate.
- a transparent heat conductive material is coated on the glass substrate 1 and baked to form a transparent heat conductive layer 2, and the baking temperature ranges from 80 to 100 ° C. In this temperature range, the heat conductive layer can be compared. Fast curing, if the temperature is too low, will affect the curing effect of the thermal layer, if it is too high, it will increase energy loss, increase cost, and is not conducive to environmental protection.
- the optimal temperature is 90 ° C, which ensures the best curing effect under the premise of saving energy.
- the heat conductive material is made of, for example, a high molecular polymer containing heat conductive particles.
- thermally conductive particles are metals, metal oxides and non-metals
- metals, metal oxides and non-metals One or more of, for example, gold, silver, copper, aluminum, calcium, magnesium, iron, aluminum oxide, magnesium oxide, cerium oxide, calcium oxide, nickel oxide, aluminum nitride, silicon nitride, silicon carbide, carbon fiber
- the polymer composite is epoxy resin, silica gel, phenolic resin or polyimide.
- the thickness of the transparent heat conductive layer is, for example, 1 to 5 ⁇ m.
- the heat in the prebaking stage can be transferred to the black matrix and the color pixel layer to be formed to the maximum extent, so that the solvent in the black matrix and the color pixel layer made of the resin material is most volatilized. When it is removed, the solvent is removed to the utmost extent, thereby avoiding the problem that the color pixel layer is easily broken in the subsequent steps, and improving the efficiency and precision of the manufacturing process.
- a black matrix pattern 3 is formed on the glass substrate 1 of the step 1 by a patterning process.
- a resin material of a black matrix is coated on the glass substrate on which the step 1 is completed, and is exposed and developed by a patterned mask to obtain a black matrix pattern 3 having a thickness of 1 to 5 ⁇ m.
- a color pixel layer is formed on the glass substrate 1 of the step 2 by a patterning process, and the color pixel layer includes a red pixel layer 4, a green pixel layer 5, and a blue pixel layer 6.
- the red pixel resin material is first coated on the glass substrate of step 2, and exposed and developed by a patterned mask to obtain a red pixel layer 4.
- a green resin layer 5 and a blue resin layer 6 were obtained by a similar process.
- the thickness of the red pixel layer 4, the green pixel layer 5, and the blue pixel layer 6 is, for example, 1 to 5 ⁇ m.
- the color pixel layer is a color pixel resin layer.
- a protective layer 7 is formed on the glass substrate 1 on which the step 3 is completed.
- a protective layer of photoresist is applied on the glass substrate 1 on which the step 3 is completed, and a transparent protective layer 7 is formed by thermal curing.
- the transparent protective layer 7 has a thickness of, for example, 1 to 5 ⁇ m.
- a transparent conductive layer 8 is formed on the glass substrate 1 on which step 4 is completed.
- the transparent conductive layer 8 is formed by electroplating on the glass substrate 1 of the step 4, and the transparent conductive layer has a thickness of, for example, 500 to 2,000.
- a spacer 9 is formed on the glass substrate 1 on which step 5 is completed.
- a photoresist for a spacer is coated on the glass substrate 1 on which the step 5 is completed, and a spacer 9 is finally formed by an exposure and development process.
- the spacer has a trapezoidal column shape in cross section, and has a cross-sectional diameter of, for example, 15 to 20 ⁇ m, and a cross-sectional diameter of the tip end thereof is, for example, 5 to 10 ⁇ m.
- a transparent heat conductive layer on the substrate by providing a transparent heat conductive layer on the substrate, heat conduction inside the color filter substrate can be improved, and the maximum heat in the baking stage can be made.
- the degree of transmission to the black matrix and the color pixel layer on the upper portion of the transparent heat conducting layer allows the solvent in the resin material to be sufficiently removed in the pre-baking stage, thereby avoiding the subsequent occurrence of the glue drop and ensuring the product quality of the color film substrate.
- a color filter substrate comprising: a substrate; a black matrix and a color pixel layer formed on the substrate; and a transparent heat conductive layer, the transparent heat conductive layer being located between the black matrix and the color pixel layer and the substrate .
- the color filter substrate according to (1) further comprising a protective layer, a conductive layer, and a spacer which are sequentially formed on the black matrix and the color pixel layer.
- thermally conductive particles are gold, silver, copper, aluminum, calcium, magnesium, iron, aluminum oxide, magnesium oxide, cerium oxide, calcium oxide, nickel oxide, nitriding
- the thermally conductive particles are gold, silver, copper, aluminum, calcium, magnesium, iron, aluminum oxide, magnesium oxide, cerium oxide, calcium oxide, nickel oxide, nitriding
- aluminum, silicon nitride, silicon carbide, carbon fiber, diamond, and quartz are gold, silver, copper, aluminum, calcium, magnesium, iron, aluminum oxide, magnesium oxide, cerium oxide, calcium oxide, nickel oxide, nitriding
- a method for manufacturing a color film substrate comprising:
- a black matrix pattern and a color pixel layer are formed on the transparent thermally conductive layer by a patterning process.
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/994,738 US9753321B2 (en) | 2012-02-24 | 2012-11-23 | Color filter substrate and manufacturing method thereof |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210044709.2A CN102645785B (zh) | 2012-02-24 | 2012-02-24 | 一种彩膜基板及其制作方法 |
CN201210044709.2 | 2012-02-24 |
Publications (1)
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WO2013123788A1 true WO2013123788A1 (zh) | 2013-08-29 |
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Family Applications (1)
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PCT/CN2012/085202 WO2013123788A1 (zh) | 2012-02-24 | 2012-11-23 | 彩膜基板及其制作方法 |
Country Status (3)
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US (1) | US9753321B2 (zh) |
CN (1) | CN102645785B (zh) |
WO (1) | WO2013123788A1 (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102645785B (zh) * | 2012-02-24 | 2014-08-13 | 京东方科技集团股份有限公司 | 一种彩膜基板及其制作方法 |
CN105807473B (zh) * | 2014-12-31 | 2019-06-28 | 上海仪电显示材料有限公司 | 滤色片的制作方法、滤色片和液晶面板 |
CN105353555B (zh) * | 2015-12-08 | 2018-08-14 | 深圳市华星光电技术有限公司 | 量子点彩膜基板的制作方法 |
EP3351852B1 (en) * | 2017-01-24 | 2019-10-30 | OSRAM GmbH | A lighting device and corresponding manufacturing method |
CN106773425B (zh) * | 2017-02-28 | 2019-09-24 | 厦门天马微电子有限公司 | 显示面板及显示装置 |
WO2019065359A1 (ja) * | 2017-09-28 | 2019-04-04 | 東レ株式会社 | 有機el表示装置、ならびに画素分割層および平坦化層の形成方法 |
CN108333830B (zh) * | 2018-02-08 | 2021-03-26 | Tcl华星光电技术有限公司 | 彩膜基板及其制造方法、遮光层及其制造方法 |
CN113253510B (zh) * | 2021-05-19 | 2022-11-04 | 惠科股份有限公司 | 一种彩膜基板及其制作方法 |
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2012
- 2012-02-24 CN CN201210044709.2A patent/CN102645785B/zh active Active
- 2012-11-23 WO PCT/CN2012/085202 patent/WO2013123788A1/zh active Application Filing
- 2012-11-23 US US13/994,738 patent/US9753321B2/en active Active
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Also Published As
Publication number | Publication date |
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US9753321B2 (en) | 2017-09-05 |
CN102645785A (zh) | 2012-08-22 |
CN102645785B (zh) | 2014-08-13 |
US20140063631A1 (en) | 2014-03-06 |
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