WO2012177032A2 - Procédé de fabrication d'un écran tactile capacitif et écran tactile fabriqué grâce à ce procédé - Google Patents

Procédé de fabrication d'un écran tactile capacitif et écran tactile fabriqué grâce à ce procédé Download PDF

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Publication number
WO2012177032A2
WO2012177032A2 PCT/KR2012/004840 KR2012004840W WO2012177032A2 WO 2012177032 A2 WO2012177032 A2 WO 2012177032A2 KR 2012004840 W KR2012004840 W KR 2012004840W WO 2012177032 A2 WO2012177032 A2 WO 2012177032A2
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WO
WIPO (PCT)
Prior art keywords
axis
touch panel
axis electrostatic
electrostatic electrodes
pattern
Prior art date
Application number
PCT/KR2012/004840
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English (en)
Korean (ko)
Other versions
WO2012177032A3 (fr
Inventor
박준영
정주현
배상모
정해용
Original Assignee
주식회사 티메이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 주식회사 티메이 filed Critical 주식회사 티메이
Priority to CN201280030563.4A priority Critical patent/CN103718142A/zh
Priority to JP2014515772A priority patent/JP2014520326A/ja
Publication of WO2012177032A2 publication Critical patent/WO2012177032A2/fr
Publication of WO2012177032A3 publication Critical patent/WO2012177032A3/fr

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to a method of manufacturing a touch panel, and more particularly, to a method of manufacturing a capacitive touch panel that implements an X-axis pattern and a Y-axis pattern with one sheet of indium tin oxide (ITO) film, and a touch panel manufactured by the same. .
  • ITO indium tin oxide
  • the touch panel is an input device that can be easily used by anyone by touching a button with a finger to interactively and intuitively operate a computer.
  • the touch panel is integrated with a display, the touch panel is used as a touch screen.
  • the input device to perform.
  • Such a touch panel uses a resistive method, a capacitive method, an infrared method, an ultrasonic method, etc. according to a method of sensing a touch.
  • a resistive method is used.
  • the use of advantageous capacitive methods will be increased.
  • Such a capacitive touch panel especially a touch screen, has an indium tin oxide (ITO) structure consisting of a transparent conductor on a transparent insulator film such as polyethylene terephthalate (PET) or glass, and the edge of the ITO.
  • ITO indium tin oxide
  • PET polyethylene terephthalate
  • a pad made of lead wire such as silver paste is laminated up and down by adding an adhesive layer or an insulator layer.
  • ITO is composed of X-axis ITO having X-axis electrostatic electrodes formed at equal intervals and Y-axis ITO having Y-axis electrostatic electrodes formed at equal intervals, so as to be stacked in multiple layers during the lamination process.
  • the touch screen formed as above is a controller that receives a touch signal according to a user's touch and outputs a coordinate signal.
  • Electrostatic electrodes have different electrical characteristics.
  • FIG. 1 is a diagram showing a conventional bottom pattern layer, and shows an X-axis pattern
  • FIG. 2 is a diagram showing a conventional Top pattern layer, and a Y-axis pattern.
  • FIG. 3 a top pattern having the X-axis electrostatic electrode 10 and a bottom pattern having the Y-axis electrostatic electrode 20 are manufactured, respectively, as shown in FIGS. Prepared.
  • the touch panel completed by this manufacturing process is shown in FIG. 3.
  • the top pattern having the X-axis electrostatic electrode 10 and the bottom pattern having the Y-axis electrostatic electrode 20 are evenly formed on the front surface of the panel. Then, connecting electrodes 30 and 40 were formed on one side.
  • the layer structure of the conventional capacitive touch panel is shown in FIG. 4.
  • an adhesive layer (Optical Clear Adhesive (OCA)) must be added to the top of the ITO film, which is required because two ITO films are used.
  • OCA Optical Clear Adhesive
  • the conventional touch panel has a disadvantage in that it is expensive because two ITO films and two OCA sheets are used to make a single touch panel product.
  • an object of the present invention is to provide a method of manufacturing a capacitive touch panel that implements an X-axis pattern and a Y-axis pattern with a single ITO film and a touch panel manufactured thereby.
  • a plurality of first axis electrostatic electrodes comprising a transparent conductive layer of the optical material, each of the first axis electrostatic electrodes being at a predetermined distance from each other, and a plurality of second spaced apart from the plurality of first axis electrostatic electrodes Burying the conductive material electrically buried in the area intersecting the axial electrostatic electrode in a form of being buried therein;
  • Capacitive touch channel according to an embodiment of the present invention
  • a plurality of first axis electrostatic electrodes each of the first axis electrostatic electrodes spaced apart from each other, and a plurality of first axis electrostatic electrodes formed on the insulator, the transparent conductive layer being spaced apart from the plurality of first axis electrostatic electrodes
  • An insulating film pattern forming a pattern for separating a second connection portion between the first connection portion of the first axis electrostatic electrode and the second axis electrostatic electrode spaced apart from the first connection portion with an insulating film on the optical material;
  • the transparent conductive layer on which the first and second axis electrostatic electrodes and the plurality of second axis electrostatic electrodes are formed to separate and insulate the first connection portion and the second connection portion using the insulating layer pattern on the optical material. It includes.
  • a capacitive touch panel manufacturing method and a touch panel manufactured by the capacitive touch panel can implement the X-axis pattern and the Y-axis pattern with one ITO film, thereby reducing costs and simplifying the process.
  • a jumping process is first performed in a method of manufacturing a capacitive touch panel, and then the ITO pattern can be implemented to make the jumping region invisible to the naked eye. Is possible.
  • the present invention has an advantageous effect of securing reliability because silver (conductive material) is present inside the resin in the method of manufacturing the capacitive touch panel.
  • FIG. 1 is a view showing an X-axis electrode pattern in a conventional capacitive touch panel.
  • FIG. 2 illustrates a Y-axis electrode pattern in a conventional capacitive touch panel.
  • FIG. 3 is a view illustrating a state in which an X-axis electrode pattern and a Y-axis electrode pattern are coalesced in a conventional capacitive touch panel.
  • FIG. 4 is a diagram illustrating a layer structure in a state in which an X-axis electrode pattern and a Y-axis electrode pattern are combined in a conventional capacitive touch panel.
  • FIG. 5 is a diagram illustrating a configuration of a capacitive touch panel according to an exemplary embodiment of the present invention.
  • FIG. 6 is a diagram illustrating a detailed structure of a portion A of the capacitive touch panel according to the embodiment of the present invention.
  • FIG. 7 illustrates a layer structure of portions A and B of FIG. 5 in the capacitive touch panel according to the exemplary embodiment of the present invention.
  • FIG. 8 is a view showing a side view of the manufacturing method of the capacitive touch panel according to the embodiment of the present invention.
  • FIG 9 illustrates a layer structure of a capacitive touch panel according to an exemplary embodiment of the present invention.
  • FIG. 5 is a view showing a configuration of a capacitive touch panel according to an embodiment of the present invention
  • Figure 6 is a view showing a detailed structure of a portion A in the capacitive touch panel according to an embodiment of the present invention
  • Figure 7 In the capacitive touch panel according to an exemplary embodiment of the present invention, a layer structure of parts A and B of FIG. 5 is shown
  • FIG. 8 is a side view of a method of manufacturing a capacitive touch panel according to an exemplary embodiment of the present invention.
  • an X-axis pattern including a plurality of X electrostatic electrodes 100 and a Y-axis pattern including a plurality of Y-axis electrostatic electrodes 200 are formed on the transparent conductive layer.
  • the transparent conductive layer is formed of a conductive material of a transparent material, such as transparent conductive oxide (TCO), specifically, a transparent conductive material containing ITO or Indium Zinc Oxide (IZO) or made of ITO or IZO Form.
  • TCO transparent conductive oxide
  • IZO Indium Zinc Oxide
  • the X electrostatic electrodes 100 are spaced apart from each other by a predetermined length, and the Y-axis electrostatic electrodes 200 are electrically connected to each other.
  • FIG. 6 is a view showing the capacitive touch panel of the present invention from above
  • FIG. 7 is a cross-sectional view showing a side layer structure of the capacitive touch panel of the present invention.
  • a jumping region 410 connecting the X-axis electrostatic electrodes 100 on the optical film 300.
  • a circuit region 420 which is a wiring electrode pattern.
  • the wiring electrode pattern is a metal circuit connected to one end of the plurality of X-axis and Y-axis electrostatic electrodes 100 and 200 and has an edge region except for the window region of the touch panel, and the plurality of X-axis and Y-axis electrostatic electrodes
  • the bus electrodes 100 and 200 are connected to the printed circuit board to sense and control a user's touch pattern.
  • the optical film 300 represents an undercoated insulator, and the insulator is formed of an organic insulator or an inorganic insulator of a transparent material, and the organic insulator is polyimide or polyethylene terephthalate (PET), polycarbonate (PC). And the inorganic insulator is made of glass.
  • the above-described undercoating is a coating for treating the presence or absence of ITO after the ITO pattern, that is, an optical treatment is applied to the ITO base layer so that the presence or absence of ITO is not detected by the eye during capacitive ITO film production.
  • the undercoat may in some cases raising the SiO 2, TiO 2 Ceo 2 such as a dry method (vapor deposition), there is also a case that a chemical treatment by a wet method.
  • the jumping region 410 and the circuit region 420 are formed by applying an optical material 400 on the optical film 300 and digging a groove (S100).
  • the optical material 400 may be any material as long as the material has optical properties such as resin (UV, thermosetting type).
  • a conductive material 430 is applied to the jumping region 410 to electrically connect the X-axis electrostatic electrodes 100 to the circuit region 420 to form a wiring electrode pattern (S102).
  • the conductive material 430 may be a conductive material such as silver or a conductive polymer.
  • a first dry film resistor (DFR) masking process is performed to protect an area where the insulating film SiO 2 500 should not be deposited (S104).
  • the first DFR masking performs a first DFR laminating, a first exposure, and a first developing process.
  • the insulating film 500 is deposited on the entire region by a known method such as sputtering, vapor deposition, and e-beam, and a dry film is peeled off (S106).
  • the insulating material pattern for separating the connecting portion between the X-axis electrostatic electrode 100 and the connecting portion between the Y-axis electrostatic electrode 200 spaced a predetermined distance from the insulating film 500 may be formed of the optical material 300. Form on top of.
  • the conductive material 430 formed in the circuit area 420 has an upper surface open to the outside, and is positioned at a portion corresponding to each bus electrode of the edge of the touch panel of the optical material 400, and the open upper surface Each X-axis electrostatic electrode 100 is formed on the substrate.
  • the conductive material 430 formed in the jumping region 300 forms a connection portion between each of the X-axis electrostatic electrodes 100 with a portion of the upper surface opened and an insulating layer 500 interposed therebetween. .
  • the transparent conductive layer (ITO) is deposited on the entire region by a known method such as sputtering, vapor deposition, and e-beam, and a second DFR masking process and an ITO etching process are performed to perform an XTO and Y-axis ITO circuit.
  • a known method such as sputtering, vapor deposition, and e-beam
  • a second DFR masking process and an ITO etching process are performed to perform an XTO and Y-axis ITO circuit.
  • Implement (100, 200) (S108).
  • the second DFR masking performs a second DFR laminating, a second exposure, and a second development process.
  • step S108 a DFR peeling process is performed to form an X-axis pattern including a plurality of X electrostatic electrodes 100 and a Y-axis pattern including a plurality of Y-axis electrostatic electrodes 200 on the ITO film (S110).
  • step S110 simultaneously patterning the X-axis, Y-axis pattern corresponding to the window area of the touch panel (the transparent portion where the screen is displayed) and the wiring electrode pattern of the bus electrode, which is the edge region of the touch panel, with the transparent conductive layer. To form.
  • the insulating film 500 is formed thereon, and then the ITOs 100 and 200 are coated and It is a method of patterning by deposition.
  • a bottom pattern which is an X-axis pattern and an Y-axis pattern, that is, a top pattern, which is a Y-axis pattern including a plurality of Y electrostatic electrodes 200, and an X-axis pattern, which includes a plurality of X electrostatic electrodes 100. Since the (Bot) pattern is implemented with one sheet of ITO film, cost reduction and the process are simplified. There are three layers constituting the touch panel as shown in FIG.
  • the touch panel includes three window layers, an OCA layer, and an ITO layer (100, 200), and the window layer and the OCA layer are similar to the conventional ones, and the jumping area 410 and the circuit area 420 are provided. After the pre-formed on the inside of the resin 400 to implement the ITO layer (100, 200).
  • the ITO patterns 100 and 200 may be implemented to make the jumping region 410 invisible to the naked eye. Since the 410 and the circuit region 420 are formed in advance, the process can be simplified.
  • the embodiment of the present invention is advantageous in securing reliability because the silver (conductive material) 430 is present inside the resin 400.
  • the circuit region 420 is formed in the groove formed in the optical material 400 corresponding to the region where the wiring electrode pattern is formed in the touch panel.
  • the conductive material 430 is coated and formed.
  • the jumping region 410 described above is the X-axis electrostatic electrode 100 and the Y-axis electrostatic out of the portions corresponding to the window region (the transparent portion on which the screen will be displayed) of the touch panel as shown in FIG. 5, 6, and 7A. It means the area where the electrode 200 crosses.
  • the jumping region 410 masks the first dry film register in an area where the insulating film 500 should not be deposited through steps S104 and S106, and then deposits an insulating film in an area where the first dry film resistor is not present.
  • the X-axis pattern including the plurality of X-axis electrostatic electrodes 100 and the Y-axis pattern including the plurality of Y-axis electrostatic electrodes 200 are formed through S110.
  • the capacitive touch panel including the window panel layer and the adhesive layer includes a plurality of X-axis electrostatic electrodes 100 spaced apart from each other at a lower portion of the adhesive layer by a plurality of Y-axis electrostatic electrodes 200 electrically connected to each other.
  • Transparent conductive layer is formed.
  • the optical material 400 is formed under the transparent conductive layer to dig a groove corresponding to a region where the wiring electrode pattern is formed in the touch panel, and apply the conductive material 400 to the formed groove.
  • the optical material 400 digs a groove in a connection portion where the X-axis electrostatic electrode 100 and the Y-axis electrostatic electrode 200 intersect among the portions corresponding to the window region of the touch panel, and forms a conductive material 430 in the groove formed. ) Is applied. Connection portions of the plurality of X-axis electrostatic electrodes 100 are positioned on the conductive material 430 to electrically connect the spaced apart plurality of X-axis electrostatic electrodes 100.
  • the insulating portion 500 separates the connection portion between the plurality of Y-axis electrostatic electrodes 200 and the connection portion between the plurality of X-axis electrostatic electrodes 100 spaced apart from the connection portion by a predetermined distance. Insulate it.
  • the connection portions between the X-axis electrostatic electrodes 100 are electrically connected through the conductive material 430 formed in the optical material 400.
  • connection portion between the plurality of X-axis electrostatic electrodes 100 is formed below the connection portion between the plurality of Y-axis electrostatic electrodes 200 with the insulating film 500 therebetween.
  • the jumping region 410 has a connection portion between the conductive material 430 formed inside the optical material 400 and the plurality of X-axis electrostatic electrodes 100 thereon, and the connection portion of the X-axis electrostatic electrode 100.
  • a connection portion of the Y-axis electrostatic electrode 200 electrically connected to each other with an insulating film 500 therebetween is formed thereon.
  • the structure of the capacitive touch panel may implement the X-axis ITO pattern 100 and the Y-axis ITO pattern 200 as one ITO film.
  • a capacitive touch panel manufacturing method and a touch panel manufactured by the capacitive touch panel can implement the X-axis pattern and the Y-axis pattern with one ITO film, thereby reducing costs and simplifying the process.
  • a jumping process is first performed in a method of manufacturing a capacitive touch panel, and then the ITO pattern can be implemented to make the jumping region invisible to the naked eye. Is possible.
  • the present invention has an advantageous effect of securing reliability because silver (conductive material) is present inside the resin in the method of manufacturing the capacitive touch panel.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

Selon la présente invention, un procédé de fabrication d'un écran tactile capacitif consiste : à former, sur un isolant, un matériau optique ayant des propriétés optiques ; à incorporer un matériau conducteur servant à connecter électriquement une pluralité d'électrodes électrostatiques de premier axe dans une région où chacune des électrodes électrostatiques de premier axe, qui sont composées du matériau optique sous la forme d'une couche conductrice transparente (les électrodes électrostatiques de premier axe étant séparées les unes des autres par une certaine distance), croise une pluralité d'électrodes électrostatiques de second axe espacées de la pluralité d'électrodes électrostatiques de premier axe par une distance prédéfinie ; à former un motif de film isolant sur le matériau optique, le motif de film isolant séparant, dans des films isolants, une première partie de connexion entre les électrodes électrostatiques de premier axe d'une seconde partie de connexion entre les électrodes électrostatiques de second axe qui est séparée de la première par une certaine distance ; et à utiliser le motif de film isolant pour créer un motif de premier axe ainsi qu'un motif de second axe sous la forme de couches conductrices transparentes, le motif de premier axe représentant la pluralité d'électrodes électrostatiques de premier axe isolées qui comportent la première partie de connexion séparée et la seconde partie de connexion, et le motif de second axe représentant la pluralité d'électrodes électrostatiques de second axe.
PCT/KR2012/004840 2011-06-20 2012-06-19 Procédé de fabrication d'un écran tactile capacitif et écran tactile fabriqué grâce à ce procédé WO2012177032A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201280030563.4A CN103718142A (zh) 2011-06-20 2012-06-19 静电容量式触摸面板的制造方法及由此制造的触摸面板
JP2014515772A JP2014520326A (ja) 2011-06-20 2012-06-19 静電容量タッチパネルの製造方法及びこれによって製造されるタッチパネル

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110059657A KR101191949B1 (ko) 2011-06-20 2011-06-20 정전용량 터치 패널의 제조 방법 및 이에 의해 제조되는 터치 패널
KR10-2011-0059657 2011-06-20

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WO2012177032A2 true WO2012177032A2 (fr) 2012-12-27
WO2012177032A3 WO2012177032A3 (fr) 2013-03-28

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JP (1) JP2014520326A (fr)
KR (1) KR101191949B1 (fr)
CN (1) CN103718142A (fr)
WO (1) WO2012177032A2 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013182414A (ja) * 2012-03-01 2013-09-12 Dainippon Printing Co Ltd タッチパネルセンサ基板、タッチパネルセンサ基板を備えた入出力装置およびタッチパネルセンサ基板の製造方法
WO2016002461A1 (fr) * 2014-07-04 2016-01-07 アルプス電気株式会社 Dispositif d'entrée et son procédé de fabrication

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103247366B (zh) * 2013-03-28 2015-04-08 南昌欧菲光科技有限公司 电容式透明导电膜及其制造方法
WO2015069048A1 (fr) * 2013-11-11 2015-05-14 주식회사 티메이 Écran tactile permettant de mettre en œuvre un capteur tactile au moyen d'une feuille de film, et son procédé de fabrication
KR101687163B1 (ko) * 2014-10-07 2016-12-16 동우 화인켐 주식회사 터치 패널 검사 장치 및 방법
CN106339116B (zh) * 2015-07-11 2023-07-14 宸新科技(厦门)有限公司 触控面板及其制作方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090111783A (ko) * 2008-04-22 2009-10-27 가부시키가이샤 히타치 디스프레이즈 터치 패널을 갖는 표시 장치
KR20090131638A (ko) * 2008-06-18 2009-12-29 엡슨 이미징 디바이스 가부시키가이샤 정전 용량형 입력 장치 및 입력 기능을 갖는 표시 장치
JP2010182027A (ja) * 2009-02-04 2010-08-19 Hosiden Corp タッチパネル及びタッチパネルの製造方法
KR20110000760A (ko) * 2009-03-20 2011-01-05 티피케이 터치 솔루션즈 (씨아먼) 인코포레이티드 정전용량방식의 터치 회로패턴 및 그 제작방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101022105B1 (ko) * 2009-01-16 2011-03-17 삼성모바일디스플레이주식회사 터치 스크린 패널 및 그 제조방법
JP2011060617A (ja) * 2009-09-11 2011-03-24 Toppan Printing Co Ltd 透明導電性積層体およびその製造方法並びに静電容量タッチパネル
KR101309862B1 (ko) * 2009-12-10 2013-09-16 엘지디스플레이 주식회사 터치 패널 일체형 액정 표시 장치

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090111783A (ko) * 2008-04-22 2009-10-27 가부시키가이샤 히타치 디스프레이즈 터치 패널을 갖는 표시 장치
KR20090131638A (ko) * 2008-06-18 2009-12-29 엡슨 이미징 디바이스 가부시키가이샤 정전 용량형 입력 장치 및 입력 기능을 갖는 표시 장치
JP2010182027A (ja) * 2009-02-04 2010-08-19 Hosiden Corp タッチパネル及びタッチパネルの製造方法
KR20110000760A (ko) * 2009-03-20 2011-01-05 티피케이 터치 솔루션즈 (씨아먼) 인코포레이티드 정전용량방식의 터치 회로패턴 및 그 제작방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013182414A (ja) * 2012-03-01 2013-09-12 Dainippon Printing Co Ltd タッチパネルセンサ基板、タッチパネルセンサ基板を備えた入出力装置およびタッチパネルセンサ基板の製造方法
WO2016002461A1 (fr) * 2014-07-04 2016-01-07 アルプス電気株式会社 Dispositif d'entrée et son procédé de fabrication
US10222915B2 (en) 2014-07-04 2019-03-05 Alps Electric Co., Ltd. Input device and method of manufacturing it

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JP2014520326A (ja) 2014-08-21
CN103718142A (zh) 2014-04-09
WO2012177032A3 (fr) 2013-03-28
KR101191949B1 (ko) 2012-10-17

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