WO2012137721A1 - 液晶表示パネルおよびそれを備える液晶表示装置 - Google Patents
液晶表示パネルおよびそれを備える液晶表示装置 Download PDFInfo
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- WO2012137721A1 WO2012137721A1 PCT/JP2012/058893 JP2012058893W WO2012137721A1 WO 2012137721 A1 WO2012137721 A1 WO 2012137721A1 JP 2012058893 W JP2012058893 W JP 2012058893W WO 2012137721 A1 WO2012137721 A1 WO 2012137721A1
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- pixel electrode
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- crystal display
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- display panel
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/52—RGB geometrical arrangements
Definitions
- the present invention relates to a liquid crystal display panel and a liquid crystal display device including the same, and more particularly to a liquid crystal display panel using a TFT (Thin Film Transistor) using an oxide semiconductor as a channel layer and a liquid crystal display device including the same.
- TFT Thin Film Transistor
- oxide semiconductor film This thin film made of an oxide semiconductor (hereinafter also referred to as “oxide semiconductor film”) has high mobility and high visible light permeability, and thus is used for applications such as a liquid crystal display device.
- oxide semiconductor film for example, InGaZnO x (hereinafter referred to as “IGZO”) which is an oxide semiconductor mainly containing indium (In), gallium (Ga), zinc (Zn), and oxygen (O) is used. What is known.
- the threshold value fluctuation of the TFT occurs due to the light incident on the channel layer of the TFT.
- IGZO-TFT TFT using IGZO as a channel layer
- the electric conductivity varies due to light absorption on the short wavelength side of visible light (for example, (See Patent Document 1). That is, in a TFT using IGZO as a channel layer, threshold value fluctuation occurs when visible light having a short wavelength enters the channel layer. This causes a decrease in the reliability of the liquid crystal display panel.
- Patent Document 2 discloses a liquid crystal display panel in which a red color filter pattern that best absorbs light of a short wavelength is arranged at a position opposite to the TFT of the array substrate in the color filter substrate. ing. According to such a configuration, it is possible to prevent light having a short wavelength from entering the channel layer of the TFT, and thus it is possible to suppress a variation in the threshold value of the TFT.
- a red color filter pattern is disposed at a position opposite to the TFTs of the blue and green sub-pixel formation portions. That is, color filters of different colors are provided close to each other. For this reason, red light leaking from the periphery of the TFT is mixed with a blue or green display. As a result, since the red color is mixed with the blue or green display, the display quality is lowered.
- an object of the present invention is to provide a liquid crystal display panel in which the reliability of a thin film transistor is improved while suppressing deterioration in display quality, and a liquid crystal display device including the same.
- a first aspect of the present invention is a liquid crystal display panel for displaying a color image based on a predetermined number of primary colors, A first substrate and a second substrate facing each other; A liquid crystal layer sandwiched between the first substrate and the second substrate; A plurality of video signal lines and a plurality of scanning signal lines disposed on the first substrate so as to cross each other; A plurality of pixel forming portions arranged in a matrix along the plurality of video signal lines and the plurality of scanning signal lines; Each color layer of the predetermined number of primary colors, Each pixel forming unit includes a plurality of sub-pixel forming units respectively corresponding to the predetermined number of primary colors, Each sub-pixel forming part A thin film transistor having a channel layer made of an oxide semiconductor and disposed corresponding to the video signal line and the scanning signal line along the sub-pixel forming portion; A pixel electrode connected to the thin film transistor and facing the primary color layer corresponding to the subpixel formation portion; In each pixel formation portion, the pixel electrodes of the plurality of subpixel formation
- the distance between the thin film transistor connected to the other pixel electrode adjacent in the predetermined direction to the pixel electrode facing the shortest primary color layer and the pixel electrode facing the shortest primary color layer is the shortest wavelength
- the distance between the thin film transistor connected to the pixel electrode facing the colored layer of the primary color having the shortest wavelength and the pixel electrode facing the colored layer of the primary color having the shortest wavelength is longer than the distance.
- the predetermined direction is a direction in which the plurality of scanning signal lines extend
- the pixel electrode facing the primary color layer having the shortest wavelength is opposed to the thin film transistor connected to the other pixel electrode adjacent in the extending direction of the plurality of scanning signal lines and the primary color layer having the shortest wavelength.
- the distance from the pixel electrode to be applied is greater than the distance between the thin film transistor connected to the pixel electrode facing the primary color layer having the shortest wavelength and the pixel electrode facing the primary color layer having the shortest wavelength.
- the thin film transistor connected to the pixel electrode facing the colored layer of the primary color with the shortest wavelength and the thin film transistor connected to the other pixel electrode are opposed to each other across the video signal line connected to each other. It is characterized by being arranged in.
- the predetermined direction is a direction in which the plurality of video signal lines extend
- the pixel electrode facing the primary color layer having the shortest wavelength is opposed to the thin film transistor connected to the other pixel electrode adjacent in the extending direction of the plurality of video signal lines and the primary color layer having the shortest wavelength.
- the distance from the pixel electrode is equal to the distance between the thin film transistor connected to the pixel electrode facing the primary color layer having the shortest wavelength and the pixel electrode facing the primary color layer having the shortest wavelength.
- a light shielding layer is arranged at a position facing each thin film transistor.
- the colored layer is disposed on the second substrate.
- the colored layer is arranged on a pixel electrode facing the colored layer.
- the primary color having the shortest wavelength is blue.
- a ninth aspect of the present invention is the eighth aspect of the present invention,
- the color image is displayed based on red, green, and blue.
- a tenth aspect of the present invention is the eighth aspect of the present invention, The color image is displayed based on red, green, blue, and yellow.
- An eleventh aspect of the present invention is a liquid crystal display device, A liquid crystal display panel according to any one of the first aspect to the tenth aspect of the present invention is provided.
- a subpixel forming unit corresponding to a primary color having the shortest wavelength among the predetermined number of primary colors.
- a thin film transistor is disposed at a position farther away from the colored layer of the primary color having the shortest wavelength. Furthermore, among the thin film transistors arranged in succession in the predetermined direction and arranged between the pixel electrode facing the first primary color layer and the pixel electrode facing the second primary color layer, the shortest wavelength is selected. Thin film transistors other than the thin film transistor in the sub-pixel forming portion corresponding to the primary color are also arranged at positions farther than the conventional color layer having the shortest wavelength.
- the thin film transistors arranged between the pixel electrodes the incidence of the light of the shortest primary color on the thin film transistors other than the thin film transistor of the subpixel forming part corresponding to the shortest primary color is suppressed.
- the threshold shift of the thin film transistor is reduced. Therefore, the reliability of the thin film transistor in the liquid crystal display panel can be improved.
- the configuration as in Patent Document 2 in which color filters of different primary colors are provided in close proximity is not employed, display quality deterioration due to mixing of other primary colors in the display at the sub-pixel forming portion is suppressed. Is done.
- the first aspect of the present invention Similar effects can be achieved.
- the same effects as in the first aspect of the present invention are exhibited. be able to.
- the threshold shift in the thin film transistor is reduced. Therefore, the reliability of the thin film transistor in the liquid crystal display panel can be further improved.
- the same effects as in the first aspect of the present invention can be achieved.
- the same effects as in the first aspect of the present invention can be achieved.
- the thin film transistor corresponding to blue, the pixel electrode facing the first primary color layer and the pixel facing the second primary color layer, which are continuously arranged in the predetermined direction are arranged.
- the blue light is prevented from entering the thin film transistors other than the thin film transistors in the sub-pixel formation portion corresponding to blue, so that the threshold shift of these thin film transistors is reduced. Therefore, the reliability of the thin film transistor in the liquid crystal display panel can be improved.
- a liquid crystal display panel for displaying a color image based on the three primary colors of red, green, and blue can exhibit the same effects as those of the eighth aspect of the present invention.
- the same effects as in the eighth aspect of the present invention can be achieved. it can.
- the liquid crystal display device can achieve the same effects as any of the first to tenth aspects of the present invention.
- FIG. 2 is a circuit diagram illustrating an electrical configuration of a pixel formation unit in the first embodiment.
- FIG. 3 is a plan view showing a partial structure of the liquid crystal display panel according to the first embodiment.
- FIG. 4 is a sectional view taken along line A-A ′ in FIG. 3. It is a top view which shows the structure of a part of liquid crystal display panel which concerns on the modification of the said 1st Embodiment. It is sectional drawing which shows the structure of a part of liquid crystal display panel which concerns on the 2nd Embodiment of this invention.
- FIG. 14 is a sectional view taken along line B-B ′ in FIG. 13.
- a threshold shift amount (hereinafter referred to as “threshold shift”) was measured when a gate bias stress was applied to the IGZO-TFT without applying light to the IGZO-TFT.
- FIG. 11 is a cross-sectional view showing the configuration of the IGZO-TFT used in this measurement. As shown in FIG. 11, the IGZO-TFT is a bottom gate type TFT having an etching stopper structure.
- a gate electrode 121 is formed on an insulating substrate 111 made of glass or the like.
- the gate electrode 121 is a laminated film in which a titanium (Ti) film, an aluminum (Al) film, and a Ti film are sequentially formed.
- a gate insulating film 122 is formed on the gate electrode 121 so as to cover the gate electrode 121.
- the gate insulating film 122 is a laminated film in which a silicon nitride (SiN x ) film and a silicon oxide (SiO 2 ) film are sequentially formed.
- An etching stopper layer 124 made of SiO 2 is formed on the upper left side, the upper right side, and the upper center of the channel layer 123 in FIG.
- a source electrode 125s is formed so as to cover the end.
- a drain electrode 125d is formed to cover
- a contact hole is formed between the upper left etching stopper layer 124 and the central upper etching stopper layer 124, and the source electrode 125s and the channel layer 123 are connected by this contact hole.
- a contact hole is formed between the upper right etching stopper layer 124 and the central upper etching stopper layer 124, and the drain electrode 125d and the channel layer 123 are connected by this contact hole.
- the source electrode 125s and the drain electrode 125d are stacked films in which a Ti film, an Al film, and a Ti film are sequentially formed.
- An inorganic protective film 126 made of SiO 2 is formed so as to cover the entire insulating substrate 111 on which the source electrode 125s and the drain electrode 125d are formed.
- FIG. 12 is a diagram showing a threshold shift ⁇ Vth with respect to a time during which gate bias stress is applied (hereinafter referred to as “stress time”).
- stress time a time during which gate bias stress is applied
- the experimental temperature 85 ° C.
- the gate applied voltage is ⁇ 30V.
- the threshold value shift hardly occurs even when the stress time elapses.
- the threshold shift increases as the stress time elapses.
- This threshold shift increases as the wavelength of light applied to the IGZO-TFT is shorter.
- the threshold shift becomes the largest.
- IGZO is generally known as a transparent oxide semiconductor material, but is not completely transparent to visible light.
- blue light having a short wavelength is easily absorbed in visible light.
- a predetermined level is formed in IGZO.
- blue light having a short wavelength is easily absorbed at the interface between the gate insulating film 122 and the channel layer (IGZO) 123. Therefore, a predetermined level is formed at the interface between the gate insulating film 122 and the channel layer (IGZO) 123.
- a threshold shift occurs (threshold decreases). Such a problem is considered to occur not only in IGZO but also in other oxide semiconductors.
- the threshold shift when irradiated with yellow monochromatic light is smaller than the threshold shift when irradiated with green monochromatic light, and more than the threshold shift when irradiated with red monochromatic light. Is also expected to grow.
- FIG. 13 is a plan view showing a part of the structure of the conventional liquid crystal display panel, particularly on the TFT substrate side.
- 14 is a cross-sectional view taken along line BB ′ in FIG.
- This conventional liquid crystal display panel is configured to display a color image based on the three primary colors.
- the liquid crystal display panel includes a TFT substrate 110, a counter substrate 140 facing the TFT substrate 110, and a liquid crystal layer 180 sandwiched between the TFT substrate 110 and the counter substrate 140. .
- the R TFT 120r is arranged corresponding to the intersection of the source line SL (i) and the gate line GL (j), and the R pixel electrode 130r is connected to the drain electrode of the R TFT 120r.
- a red color filter 152r (hereinafter referred to as “R color filter 152r”) is disposed at a position facing the R pixel electrode 130r.
- the G TFT 120g is arranged corresponding to the intersection of the source line SL (i + 1) and the gate line GL (j), and the G pixel electrode 130g is connected to the drain electrode of the G TFT 120g.
- a green color filter 152g (hereinafter referred to as “G color filter 152g”) is disposed at a position facing the G pixel electrode 130g.
- the B TFT 120b is arranged corresponding to the intersection of the source line SL (i + 2) and the gate line GL (j), and the B pixel electrode 130b is connected to the drain electrode of the B TFT 120b.
- a blue color filter 152b (hereinafter referred to as “B color filter 152b”) is disposed at a position facing the B pixel electrode 130b. As shown in FIGS. 13 and 14, a black matrix 151 is formed between the color filters.
- TFT 120 the R TFT 120r, the G TFT 120g, and the B TFT 120b are not distinguished, these are referred to as “TFT 120”.
- R pixel electrode 130r, the G pixel electrode 130g, and the B pixel electrode 130b are not distinguished, they are referred to as “pixel electrodes 130”.
- the external light and the backlight light incident on the liquid crystal display panel pass through the B color filter 152b. And these external light and backlight light turn into blue light.
- the blue light is repeatedly reflected in the liquid crystal display panel and then enters the channel layer 123 of the B TFT 120b. Therefore, a large threshold shift occurs in the B TFT 120b.
- the blue light can be incident not only on the channel layer 123 of the B TFT 120b but also on the channel layer 123 of the R TFT 120r whose source electrode is connected to the source line SL (i + 3). Therefore, a large threshold shift may occur even in the R TFT 120r.
- the red color filter pattern is positioned at a position opposite to the TFTs of the blue and green subpixel formation portions. Therefore, the light leaking from the periphery of the TFT is mixed with the blue and green displays. That is, red is mixed with blue and green displays. Therefore, the display quality is lowered.
- FIG. 1 is a block diagram showing a configuration of a liquid crystal display device including a liquid crystal display panel 100 according to the first embodiment of the present invention.
- the liquid crystal display device includes a liquid crystal display panel 100, a source driver (video signal line driving circuit) 200, a gate driver (scanning signal line driving circuit) 300, a display control circuit 400, and the like.
- the liquid crystal display panel 100 according to the present embodiment may be any of a reflective type, a transmissive type, and a semi-transmissive type.
- a backlight is disposed on the back surface of the liquid crystal display panel 100. .
- the liquid crystal display panel 100 includes a pair of electrode substrates and a liquid crystal layer sandwiched between them, and a polarizing plate is attached to the outer surface of each electrode substrate.
- One of the pair of electrode substrates is an active matrix substrate called a TFT substrate.
- the TFT substrate (first substrate) includes a plurality of source lines (video signal lines) SL (1) to SL (n) (hereinafter referred to as “grid lines”) arranged on an insulating substrate such as a glass substrate so as to cross each other.
- source line SL When not distinguished from each other, it is referred to as “source line SL”) and a plurality of gate lines (scanning signal lines) GL (1) to GL (m) (hereinafter referred to as “gate line GL” when they are not distinguished from each other).
- the TFT includes a TFT, a pixel electrode, and an auxiliary capacitance electrode provided corresponding to each intersection of the source line SL and the gate line GL.
- the other of the pair of electrode substrates is called a counter substrate, and is composed of an insulating substrate such as glass and a common electrode formed over the entire surface of the insulating substrate.
- a liquid crystal capacitor is formed by the pixel electrode and a later-described common electrode facing the pixel electrode, and an auxiliary capacitor is formed by the pixel electrode and the auxiliary capacitor electrode.
- the liquid crystal capacitance and the auxiliary capacitance may be collectively referred to as “pixel capacitance”. A detailed description of the liquid crystal display panel 100 will be given later.
- the display control circuit 400 receives display data DAT and a timing control signal TS from the outside, and displays an image signal DV, a source start pulse signal SSP, a source clock as signals for displaying an image represented by the display data DAT on the liquid crystal display panel 100.
- a signal SCK, a gate start pulse signal GSP, a gate clock signal GCK, and the like are output.
- the display control circuit 400 is typically realized as an IC (Integrated Circuit).
- the source driver 200 receives the image signal DV, the source start pulse signal SSP, the source clock signal SCK, and the like output from the display control circuit 400, and supplies the source signal SS (1) to the source lines SL (1) to SL (n), respectively. ) To SS (n) (hereinafter referred to as “source signal SS” when they are not distinguished).
- the source driver 200 is typically realized as an IC.
- the gate driver 300 receives the gate start pulse signal GSP, the gate clock signal GCK, and the like output from the display control circuit 400, and in each frame period (each vertical scanning period) for displaying an image on the liquid crystal display panel 100,
- the lines GL (1) to GL (m) are sequentially selected for each horizontal scanning period, and active gate signals GS (1) to GS (m) (hereinafter referred to as “active”) are respectively applied to the selected gate lines GL (1) to GL (m).
- active active gate signals
- the gate driver 300 may be realized as an IC or may be realized by being formed integrally with the liquid crystal display panel 100.
- a common electrode Vcom which will be described later, facing the pixel electrode is supplied with a common potential Vcom serving as a reference for a voltage to be applied to the liquid crystal layer of the liquid crystal display panel 100 by a common electrode driving circuit (not shown).
- the auxiliary capacitance electrode may be supplied with a common potential Vcom from a common electrode driving circuit, or may be supplied with a potential from another driving circuit.
- the source signal SS is applied to each source line SL, and the gate signal GS is applied to each gate line GL, whereby each pixel electrode of the liquid crystal display panel 100 has the common potential Vcom as a reference.
- a voltage corresponding to the pixel value of the pixel to be displayed is applied via the TFT and held in the pixel capacitor. Thereby, a voltage corresponding to the potential difference between each pixel electrode and the common electrode is applied to the liquid crystal layer.
- an image based on the display data DAT sent from the outside is displayed on the liquid crystal display panel 100.
- FIG. 2 is a circuit diagram showing an electrical configuration of the pixel forming portion in the liquid crystal display panel 100 according to the present embodiment.
- the liquid crystal display panel 100 according to the present embodiment is configured to display a color image based on three primary colors (red, green, and blue). That is, each pixel forming unit MP includes a sub-pixel forming unit SPr (hereinafter referred to as “R sub-pixel forming unit SPr”) indicating a red (R) component, and a sub-pixel forming unit SPg (hereinafter referred to as “R” sub-pixel forming unit SPr).
- R sub-pixel forming unit SPr sub-pixel forming unit SPr
- SPg sub-pixel forming unit SPr
- a sub-pixel formation portion SPb (hereinafter referred to as “B sub-pixel formation portion SPb”) exhibiting a blue (B) component.
- Such pixel forming portions MP are arranged in a matrix along the source line SL and the gate line GL.
- R subpixel formation portion SPr, the G subpixel formation portion SPg, and the B subpixel formation portion SPb are not distinguished, these are referred to as “subpixel formation portions SP”.
- the R subpixel forming portion SPr includes an R TFT 120r having a gate terminal connected to a gate line GL (j) passing through a corresponding intersection and a source terminal connected to a source line SL (i) passing through the intersection.
- the R pixel electrode 130r connected to the drain terminal of the R TFT 120r, and an auxiliary capacitance electrode (not shown).
- This auxiliary capacitance electrode is not an essential configuration.
- a liquid crystal capacitor is formed by the pixel electrode 130r and a common electrode, which will be described later, and an auxiliary capacitor is formed by the pixel electrode 130r and the auxiliary capacitor electrode.
- a pixel capacitor Cp is formed by the liquid crystal capacitor and the auxiliary capacitor.
- Each of the G subpixel forming portion SPg and the B subpixel forming portion SPb has the same configuration as the R subpixel forming portion SPr except for the R TFT 120r and the R pixel electrode 130r. That is, the G sub-pixel forming portion SPg is connected to the gate line GL (j) that passes through the corresponding intersection, instead of the R TFT 120r and the R pixel electrode 130r, and the source line that passes through the intersection. It has a G TFT 120g having a source terminal connected to SL (i + 1), and a G pixel electrode 130g connected to the drain terminal of the G TFT 120g.
- the B sub-pixel formation portion SPb has a gate terminal connected to the gate line GL (j) passing through the corresponding intersection and a source passing through the intersection instead of the R TFT 120r and the R pixel electrode 130r. It has a B TFT 120b whose source terminal is connected to the line SL (i + 2), and a B pixel electrode 130b connected to the drain terminal of the B TFT 120b.
- FIG. 3 is a plan view showing a part of the structure on the TFT substrate side in the liquid crystal display panel 100 according to the present embodiment.
- 4 is a cross-sectional view taken along line AA ′ in FIG.
- the liquid crystal display panel 100 includes a TFT substrate 110, a counter substrate 140 facing the TFT substrate 110, and a liquid crystal layer 180 sandwiched between the TFT substrate 110 and the counter substrate 140.
- a polarizing plate is attached to the outer surface of each of the TFT substrate 110 and the counter substrate 140 (not shown).
- the TFT substrate 110 includes an insulating substrate 111 such as a glass substrate, gate lines GL and source lines SL arranged on the insulating substrate 111 so as to cross each other, and a gate electrode (gate terminal) on the gate line GL.
- a TFT 120 having a source electrode (source terminal) 125s connected to the source line SL and a pixel electrode 130 connected to a drain electrode (drain terminal) 125d of the TFT 120 via a contact hole CH is formed. It is constituted by. Note that the gate line GL and the gate electrode 121 connected thereto are actually formed continuously. Similarly, the source line SL and the source electrode 125s connected thereto are actually formed continuously.
- a gate insulating film 122 is formed so as to cover the entire insulating substrate 111 on which the gate line GL is formed, and the gate line GL and the source line SL cross each other through the gate insulating film 122 and the like. is doing.
- an inorganic protective film 126 and an organic protective film 127 are sequentially stacked so as to cover the entire insulating substrate 111 on which the gate line GL, the source line SL, and the TFT 120 are formed.
- a contact hole CH is formed in a part of the inorganic protective film 126 and the organic protective film 127, and the pixel electrode 130 is formed on the organic protective film 127 so as to be connected to the drain electrode 125d of the TFT 120 via the contact hole CH.
- the organic protective film 127 is for forming the pixel electrode 130 flat, and is not an essential component.
- the R pixel electrode 130r, the G pixel electrode 130g, and the B pixel electrode 130b are sequentially arranged from the front in the extending direction of the gate line GL (hereinafter referred to as “gate line extending direction”).
- gate line extending direction refers to the side where the gate line GL is connected to the gate driver 300.
- the opposite side to the front of the gate line extending direction be the rear of the gate line extending direction.
- source line extending direction In the extending direction of the source line SL (hereinafter referred to as “source line extending direction”), pixel electrodes 130 for the same primary color are arranged (not shown).
- source line extending direction the side where the source line SL is connected to the source driver 200 is referred to as the front in the source line extending direction, and the side opposite to the front is referred to as the rear in the source line extending direction.
- the R pixel electrode 130r, the G pixel electrode 130g, and the B pixel electrode 130b are arranged in this order from the front in the gate line extending direction. It is not limited. For example, the order of the R pixel electrode 130r, the B pixel electrode 130b, and the G pixel electrode 130g from the front in the gate line extending direction may be used.
- the auxiliary capacitance electrode 132 is formed on the insulating substrate 111 at a position facing a part of each pixel electrode 130.
- the formation position of this auxiliary capacitance electrode 132 is not limited to the form of this embodiment and each embodiment mentioned later. Further, as described above, the auxiliary capacitance electrode 132 need not be formed.
- the counter substrate 140 includes an insulating substrate 141 such as a glass substrate, a black matrix 151 as a light shielding layer formed on the insulating substrate 141, an R color filter 152r as a red colored layer, and a G color as a green colored layer.
- Each color filter 152 is formed in a stripe shape in the source line extending direction. In this specification, the color filter formed in a stripe shape in the source line extending direction is referred to as a “longitudinal stripe color filter”.
- the protective film 153 is for forming the common electrode 160 flat and is not an essential component.
- the R pixel electrode 130r and the R color filter 152r are opposed to each other.
- the G pixel electrode 130g and the G color filter 152g face each other
- the B pixel electrode 130b and the B color filter 152b face each other.
- it is desirable that the end portion of the pixel electrode 130 is opposed to the black matrix 151.
- the R TFT 120r is a bottom gate type TFT having an etching stopper structure.
- the R TFT 120r is formed on the insulating substrate 111.
- the gate electrode 121 gate line GL (j)
- the gate insulating film 122 the channel layer 123 made of IGZO
- the etching stopper layer 124 the gate electrode 121 (gate line GL (j)), the gate insulating film 122, the channel layer 123 made of IGZO, the etching stopper layer 124,
- the source electrode 125s source line SL (i + 3)
- the drain electrode 125d and the inorganic protective film 126 are laminated.
- the material of each layer / film / electrode other than the channel layer 123 is not particularly limited. Also, each layer, each film, and each electrode is not particularly limited. Since the G TFT 120g and the B TFT 120b have the same configuration as the R TFT 120r, description thereof is omitted.
- the G TFT 120g in which the drain electrode 125d is connected to the G pixel electrode 130g (one pixel electrode) adjacent to the front of the B pixel electrode 130b in the gate line extending direction is provided.
- the G pixel electrode 130g is disposed on the opposite side of the B pixel electrode 130b.
- the distance between the B TFT 120b having the drain electrode 125d connected to the B pixel electrode 130b and the B pixel electrode 130b is equal to the G TFT 120g having the drain electrode 125d connected to the G pixel electrode 130g (one pixel electrode).
- the G pixel electrode 130g is the distance between the B TFT 120b having the drain electrode 125d connected to the G pixel electrode 130g (one pixel electrode).
- the distance between the R TFT 120r having the drain electrode 125d connected to the R pixel electrode 130r (the other pixel electrode) adjacent to the rear of the B pixel electrode 130b in the gate line extending direction and the B pixel electrode 130b is B It is larger than the distance between the B TFT 120b connected to the pixel electrode 130b and the B pixel electrode 130b.
- the source line SL (i + 2) to which the source electrode 125s of the B TFT 120b is connected and the source line SL (i + 3) to which the source electrode 125s of the R TFT 120r is connected are a gate line. Adjacent to each other in the stretching direction. That is, the B TFT 120b having the drain electrode 125d connected to the B pixel electrode 130b, and the R pixel electrode 130r (the other pixel electrode) adjacent to the rear of the B pixel electrode 130b in the gate line extending direction are drain electrodes.
- the R TFT 120r to which 125d is connected is disposed at a position facing each other across the source lines SL (i + 2) and SL (i + 3) to which the source electrodes 125s of the B TFT 120b and the R TFT 120r are respectively connected. Yes.
- the R TFT 120r having the source electrode 125s connected to the source line SL (i) or the source line SL (i + 3), and the G having the source electrode 125s connected to the source line SL (i + 1).
- the TFT 120g is disposed in the vicinity (notch portion) of the R pixel electrode 130r and the G pixel electrode 130g, respectively, as in the conventional case.
- the B TFT 120b in which the source electrode 125s is connected to the source line SL (i + 2) is farther away from the B pixel electrode 130b than before and is disposed at a position closer to the R pixel electrode 130r than before. Has been.
- the B TFT 120b of the B subpixel formation portion SPb is changed from the B pixel electrode 130b connected to the drain electrode 125d of the B TFT 120b and the B color filter 152b facing the B pixel electrode 130b. Is also located at a distance.
- the R TFT 120r of the R subpixel forming portion SPr adjacent to the B subpixel forming portion SPb is changed from the B pixel electrode 130b of the B subpixel forming portion SPb and the B color filter 152b facing the same. Is also located at a distance. Note that the distances between the B pixel electrode 130b of the B subpixel formation portion SPb and the B color filter 152b facing the B pixel electrode 130b and the G TFT 120g of the G subpixel formation portion SPg are the same as the conventional distance.
- a black matrix 151 is arranged between the color filters 152. That is, the black matrix 151 is disposed on each TFT 120. Thereby, since the incidence of light on each TFT 120 can be suppressed, the threshold shift in each TFT 120 is reduced.
- the width of the black matrix 151 between the B color filter 152b and the R color filter 152r (the length in the gate line extending direction) is equal to the R color filter 152r and the G color.
- the width of the black matrix 151 between the filter 152g and the width of the black matrix 151 between the G color filter 152g and the B color filter 152b are set larger. Further, the width of each color filter 152 is set to be uniform in order to make the aperture ratio of each sub-pixel forming portion SP uniform.
- the vertical-striped color filter 152 is formed.
- Each color filter 152 is formed continuously over the source line extending direction. That is, as shown in FIG. 3, in the source line extending direction, the color filter 152 is also located at positions facing the gate lines GL (j ⁇ 1) and GL (j) respectively located in front and rear of each pixel electrode 130. Has been placed.
- the present invention is not limited to this, and each color filter 152 may be formed discontinuously in the source line extending direction. That is, in the source line extending direction, the black matrix 151 is disposed in place of the color filter 152 at positions facing the gate lines GL (j ⁇ 1) and GL (j) respectively positioned in front and rear of each pixel electrode 130. May be.
- the B TFT 120b of the B sub-pixel forming portion SPb is provided in the liquid crystal display panel for displaying a color image based on the three primary colors of red, green, and blue, in which the vertical stripe color filter is formed. Is disposed at a position farther from the B color filter 152b than before. Furthermore, the R TFT 120r disposed between the B pixel electrode 130b and the R pixel electrode 130r that are continuously arranged in the gate line extending direction is also disposed at a position farther from the B color filter 152b than in the past. . As a result, since blue light is prevented from entering the B TFT 120b and the R TFT 120r, the threshold shift of these TFTs is reduced. Therefore, the reliability of the TFT in the liquid crystal display panel can be improved.
- the position of the B TFT 120b is closer to the position of the R TFT 120r and the position of the R color filter 152r facing the TFT 120r than before, so that the incident amount of red light incident on the B TFT 120b is larger than before.
- this does not prevent the reduction of the threshold shift described above. That is, in the B TFT 120b, the incident amount of the red light is increased, while the incident amount of the blue light having a shorter wavelength than the red light is decreased.
- the threshold shift of the B TFT 120b is performed as described above. Is reduced as compared with the prior art.
- FIG. 5 is a plan view showing a part of the structure on the TFT substrate side in the liquid crystal display panel 100 according to the modification of the first embodiment of the present invention. As shown in FIG. 5, in this modification, the width (length in the gate line extending direction) of the R pixel electrode 130r and the R color filter 152r is made smaller than in the first embodiment. Other components are the same as those in the first embodiment.
- the widths of the R pixel electrode 130r positioned behind the B pixel electrode 130b and the R color filter 152r opposed thereto in the gate line extending direction are the same as those of the other primary color pixel electrodes 130 and the color filter 152 opposed thereto, respectively. It is set smaller than the width. In other words, the width of the black matrix 151 between the B color filter 152b and the R color filter 152r is equal to the width of the black matrix 151 between the R color filter 152r and the G color filter 152g, and the G color filter 152g and the B color filter.
- the width of the R pixel electrode 130r and the width of the R color filter 152r are reduced by an amount larger than each of the widths of the black matrix 151 between the R matrix filter 152b and the R color filter 152r. Thereby, the reliability of the liquid crystal display panel 100 can be improved without increasing the size of the liquid crystal display panel 100 than the conventional one.
- the source signal SS to be applied to the source line SL connected to the R pixel electrode 130r via the R TFT 120r by the amount corresponding to the reduction in the width of the R pixel electrode 130r and the width of the R color filter 152r. It is desirable to change the voltage (in the case of normally black, it is increased, and in the case of normally white, it is decreased).
- the width of the G pixel electrode 130g and the G color filter 152g may be reduced.
- the width of the B pixel electrode 130b and the B color filter 152b may be reduced.
- FIG. 6 is a cross-sectional view (corresponding to a cross-sectional view taken along the line AA ′ in FIG. 3) showing a partial structure of the liquid crystal display panel 100 according to the second embodiment of the present invention.
- the black matrix 151 and the color filter 152 are arranged on the counter substrate 140, whereas in the liquid crystal display panel 100 according to the present embodiment, as shown in FIG. In addition, the black matrix 151 and the color filter 152 are arranged on the TFT substrate 110 side.
- the black matrix 151 is formed so as to cover part of the organic protective film 127 and the pixel electrode 130 (part corresponding to the contact hole CH).
- the black matrix 151 is formed so as to cover the organic protective film 127 and the portion corresponding to the contact hole CH in the B pixel electrode 130b and the portion corresponding to the contact hole CH in the R pixel electrode 130b. Has been.
- Each color filter 152 is formed so as to cover a part of the opposing pixel electrode 130 and the black matrix 151.
- the B color filter 152b covers the B pixel electrode 130b and a part of the black matrix 151 (the upper part of the contact hole CH) covering the portion corresponding to the contact hole CH in the B pixel electrode 130b.
- the R color filter may cover the R pixel electrode 130r and a part of the black matrix 151 (a portion above the contact hole CH) covering the portion corresponding to the contact hole CH in the R pixel electrode 130r. 152r is formed.
- the counter substrate 140 has a configuration in which the common electrode 160 is directly formed on the insulating substrate 141.
- a G TFT 120g having a drain electrode 125d connected to a G pixel electrode 130g (one pixel electrode) adjacent to the front of the B pixel electrode 130b in the gate line extending direction is connected to the G pixel electrode 130g.
- the pixel electrode 130b is disposed on the opposite side.
- the distance between the B TFT 120b having the drain electrode 125d connected to the B pixel electrode 130b and the B pixel electrode 130b is equal to the G TFT 120g having the drain electrode 125d connected to the G pixel electrode 130g (one pixel electrode).
- the G pixel electrode 130g is the same as that in the first embodiment (similar to the arrangement shown in FIG. 3).
- the distance between the R TFT 120r having the drain electrode 125d connected to the R pixel electrode 130r (the other pixel electrode) adjacent to the rear of the B pixel electrode 130b in the gate line extending direction and the B pixel electrode 130b is B It is larger than the distance between the B TFT 120b connected to the pixel electrode 130b and the B pixel electrode 130b.
- the source line SL (i + 2) to which the source electrode 125s of the B TFT 120b is connected and the source line SL (i + 3) to which the source electrode 125s of the R TFT 120r is connected are adjacent to each other in the gate line extending direction. Yes. That is, the B TFT 120b having the drain electrode 125d connected to the B pixel electrode 130b, and the R pixel electrode 130r (the other pixel electrode) adjacent to the rear of the B pixel electrode 130b in the gate line extending direction are drain electrodes.
- the R TFT 120r to which 125d is connected is disposed at a position facing each other across the source lines SL (i + 2) and SL (i + 3) to which the source electrodes 125s of the B TFT 120b and the R TFT 120r are respectively connected. Yes.
- the R TFT 120r having the source electrode 125s connected to the source line SL (i) or the source line SL (i + 3) and the G TFT 120g having the source electrode 125s connected to the source line SL (i + 1) are the same as the conventional one. Are arranged in the vicinity (notch portion) of the R pixel electrode 130r and the G pixel electrode 130g, respectively.
- the B TFT 120b in which the source electrode 125s is connected to the source line SL (i + 2) is farther away from the B pixel electrode 130b than before and is disposed at a position closer to the R pixel electrode 130r than before. Has been.
- the blue light to the B TFT 120b and the R TFT 120r is the same as in the first embodiment. Is suppressed. Therefore, the same effects as those of the first embodiment can be obtained.
- FIG. 7 is a circuit diagram showing an electrical configuration of a pixel formation portion in the liquid crystal display panel 100 according to the present embodiment.
- the liquid crystal display panel 100 according to the first embodiment is configured to display a color image based on three primary colors (red, green, and blue), whereas the liquid crystal display panel 100 according to the present embodiment. 7 is configured to display a color image based on four primary colors (red, green, blue, yellow) as shown in FIG.
- each pixel formation unit MP has a sub-pixel formation unit SPy (hereinafter referred to as “Y”) indicating yellow (Y) in addition to the R sub-pixel formation unit SPr, the G sub-pixel formation unit SPg, and the B sub-pixel formation unit SPb.
- Subpixel formation portion SPy a sub-pixel formation unit SPy (hereinafter referred to as “Y”) indicating yellow (Y) in addition to the R sub-pixel formation unit SPr, the G sub-pixel formation unit SPg, and the B sub-pixel formation unit SPb.
- Subpixel formation portion SPy a sub-pixel formation unit SPy indicating yellow (Y) in addition to the R sub-pixel formation unit SPr, the G sub-pixel formation unit SPg, and the B sub-pixel formation unit SPb.
- the Y subpixel formation portion SPy has the same configuration as the R subpixel formation portion SPr, the G subpixel formation portion SPg, and the B subpixel formation portion SPb. That is, the Y sub-pixel forming portion SPy has a gate terminal connected to the gate line GL (j) passing through the corresponding intersection and a source terminal connected to the source line SL (i + 3) passing through the intersection.
- the TFT 120y, a Y pixel electrode 130y connected to the drain terminal of the Y TFT 120y, and an auxiliary capacitance electrode (not shown) are configured.
- the configuration of the Y TFT 120y is the same as the configuration of the R TFT 120r, the G TFT 120g, and the B TFT 120b.
- the R TFT 120r, the G TFT 120g, the B TFT 120b, and the Y TFT 120y are referred to as “TFT 120” when they are not distinguished from each other.
- the R pixel electrode 130r, the G pixel electrode 130g, the B pixel electrode 130b, and the Y pixel electrode 130y are not distinguished, they are referred to as “pixel electrodes 130”.
- FIG. 8 is a plan view showing a part of the structure on the TFT substrate side in the liquid crystal display panel 100 according to the third embodiment of the present invention.
- an R pixel electrode 130r, a G pixel electrode 130g, a B pixel electrode 130b, and a Y pixel electrode 130y are arranged in this order from the front in the gate line extending direction.
- the arrangement order of the pixel electrodes 130 is not limited to this.
- the order of the R pixel electrode 130r, the Y pixel electrode 130y, the B pixel electrode 130b, and the G pixel electrode 130g from the front in the gate line extending direction may be used.
- a yellow color filter 152y (hereinafter referred to as “Y color filter 152y”) as a yellow colored layer is formed at a position facing the Y pixel electrode 130y.
- Y color filter 152y A yellow color filter 152y (hereinafter referred to as “Y color filter 152y”) as a yellow colored layer is formed at a position facing the Y pixel electrode 130y.
- color filters 152 when the R color filter 152r, the G color filter 152g, the B color filter 152b, and the Y color filter 152y are not distinguished, these are referred to as “color filters 152”.
- the color filter 152 and the black matrix 151 may be disposed on the counter substrate 140 side as in the first embodiment, and are disposed on the TFT substrate 110 side as in the second embodiment. Also good.
- the G TFT 120g in which the drain electrode 125d is connected to the G pixel electrode 130g (one pixel electrode) adjacent to the front of the B pixel electrode 130b in the gate line extending direction is provided.
- the G pixel electrode 130g is disposed on the opposite side of the B pixel electrode 130b.
- the distance between the B TFT 120b having the drain electrode 125d connected to the B pixel electrode 130b and the B pixel electrode 130b is equal to the G TFT 120g having the drain electrode 125d connected to the G pixel electrode 130g (one pixel electrode).
- the G pixel electrode 130g is the distance between the B TFT 120b having the drain electrode 125d connected to the G pixel electrode 130g (one pixel electrode).
- the distance between the Y TFT 120y having the drain electrode 125d connected to the Y pixel electrode 130y (the other pixel electrode) adjacent to the rear of the B pixel electrode 130b in the gate line extending direction and the B pixel electrode 130b is B It is larger than the distance between the B TFT 120b connected to the pixel electrode 130b and the B pixel electrode 130b.
- the source line SL (i + 2) to which the source electrode 125s of the B TFT 120b is connected and the source line SL (i + 3) to which the source electrode 125s of the Y TFT 120y is connected are a gate line. Adjacent to each other in the stretching direction. That is, the B TFT 120b having the drain electrode 125d connected to the B pixel electrode 130b, and the Y pixel electrode 130y (the other pixel electrode) adjacent to the rear of the B pixel electrode 130b in the gate line extending direction are drain electrodes.
- the Y TFT 120y to which the 125d is connected is disposed at a position facing each other across the source lines SL (i + 2) and SL (i + 3) to which the source electrodes 125s of the B TFT 120b and the Y TFT 120y are respectively connected. Yes.
- the G TFT 120g having the source electrode 125s connected to the R TFT 120r and the source line SL (i + 1) is in the vicinity of the Y pixel electrode 130y, the R pixel electrode 130r, and the G pixel electrode 130g, respectively, as in the prior art. It is arranged at (notch part).
- the B TFT 120b in which the source electrode 125s is connected to the source line SL (i + 2) is farther away from the B pixel electrode 130b than the conventional one and is disposed at a position closer to the Y pixel electrode 130y than the conventional one. Has been.
- the B TFT 120b of the B subpixel formation portion SPb is connected to the B pixel electrode 130b connected to the drain electrode 125d of the B TFT 120b and the B pixel electrode 130b. Is disposed at a position away from the conventional B color filter 152b.
- the Y TFT 120y of the Y sub-pixel formation portion SPy adjacent to the B sub-pixel formation portion SPb is conventionally changed from the B pixel electrode 130b of the B sub-pixel formation portion SPb and the B color filter 152b opposed thereto. Is also located at a distance. Note that the distances between the B pixel electrode 130b of the B subpixel formation portion SPb and the B color filter 152b facing the B pixel electrode 130b and the G TFT 120g of the G subpixel formation portion SPg are the same as the conventional distance.
- a black matrix 151 is arranged between the color filters. That is, the black matrix 151 is disposed on each TFT 120.
- the width of the black matrix 151 between the B color filter 152b and the Y color filter 152y is set so that the black matrix 151 between the Y color filter 152y and the R color filter 152r.
- the width of each color filter 152 is set to be uniform in order to make the aperture ratio of each sub-pixel forming portion SP uniform.
- the widths of the Y pixel electrode 130y and the Y color filter 152y are set to the other primary color pixel electrodes 130 and the same, respectively. You may make it smaller than the width
- the voltage of the source signal SS to be applied to the source line SL connected to the pixel electrode 130 via the TFT 120 is changed by an amount corresponding to the reduced width of the pixel electrode 130 and the color filter 152 facing the pixel electrode 130 ( In the case of normally black, it is desirable that the value be high, and in the case of normally white, it should be low.
- the liquid crystal display panel for displaying a color image based on the four primary colors of red, green, blue, and yellow can achieve the same effects as those of the first embodiment.
- FIG. 9 is a plan view showing a part of the structure on the TFT substrate side in the liquid crystal display panel 100 according to the present embodiment.
- the liquid crystal display panel 100 is configured to display a color image based on three primary colors (red, green, and blue).
- the direction in which the pixel electrodes 130 are arranged in the present embodiment is different from that in the first embodiment. That is, in the first embodiment, the pixel electrodes 130 for each primary color are arranged in order from the front in the gate line extending direction, whereas in this embodiment, for each primary color from the front in the source line extending direction. Pixel electrodes 130 are arranged in order.
- the G pixel electrode 130g, the B pixel electrode 130b, and the R pixel electrode 130r are sequentially arranged from the front in the source line extending direction, but the arrangement order of the pixel electrodes 130 is limited to this. Is not to be done.
- the order of the R pixel electrode 130r, the B pixel electrode 130b, and the G pixel electrode 130g from the front in the source line extending direction may be used.
- the G pixel electrode 130g and the G color filter 152g face each other.
- the B pixel electrode 130b and the B color filter 152b face each other
- the R pixel electrode 130r and the R color filter 152r face each other.
- Each color filter 152 is formed in a stripe shape in the gate line extending direction. In this specification, the color filter formed in a stripe shape in the gate line extending direction is referred to as a “lateral stripe color filter”.
- the color filter 152 and the black matrix 151 may be disposed on the counter substrate 140 side as in the first embodiment, and are disposed on the TFT substrate 110 side as in the second embodiment. Also good.
- the electrical configuration of the liquid crystal display panel 100 according to the present embodiment is the same as that of the liquid crystal display panel 100 according to the first embodiment, and a description thereof will be omitted.
- the drain electrode 125d is connected to the R pixel electrode 130r (one pixel electrode) adjacent to the rear of the B pixel electrode 130b in the source line extending direction.
- the R pixel electrode 130r is disposed on the opposite side of the B pixel electrode 130b.
- the distance between the B TFT 120b having the drain electrode 125d connected to the B pixel electrode 130b and the B pixel electrode 130b is equal to the R TFT 120r having the drain electrode 125d connected to the R pixel electrode 130r (one pixel electrode).
- the R pixel electrode 130r is equal to the R TFT 120r having the drain electrode 125d connected to the R pixel electrode 130r (one pixel electrode).
- the distance between the G TFT electrode 120g having the drain electrode 125d connected to the G pixel electrode 130g (the other pixel electrode) adjacent to the front of the B pixel electrode 130b in the source line extending direction and the B pixel electrode 130b is B It is equal to the distance between the B TFT 120b connected to the pixel electrode 130b and the B pixel electrode 130b.
- the R pixel electrode 130r, the B pixel electrode 130b, and the G pixel electrode are disposed between the R pixel electrode 130r and the G pixel electrode 130g adjacent to each other in the source line extending direction.
- An R TFT 120r, a B TFT 120b, and a G TFT 120g, each having a drain electrode 125d connected to 130g, are disposed. That is, three TFTs 120 including the B TFT 120b are disposed between the R pixel electrode 130r and the G pixel electrode 130g.
- pixel electrodes 130 for the same primary color are arranged in the gate line extending direction (not shown).
- a source line SL (i + 1) and a source line SL (i + 2) are arranged below the G pixel electrode 130g located in front of the B pixel electrode 130b with the organic protective film 127 and the inorganic protective film 126 interposed therebetween.
- the organic protective film 127 and the G pixel electrode 130g located behind the R pixel electrode 130r connected to the source line SL (i) via the R TFT 120r are also formed below A source line SL (i + 1) and a source line SL (i + 2) are arranged with the inorganic protective film 126 interposed therebetween.
- the G pixel electrode 130g and the B pixel electrode 130b are formed in a rectangular shape. That is, the G pixel electrode 130g and the B pixel electrode 130b are not provided with a notch portion for disposing the TFT 120 in the vicinity.
- the R pixel electrode 130r is provided with a notch for arranging three TFTs in the vicinity.
- the R TFT 120r, the B TFT 120b, and the G TFT 120g, each having the source electrode 125s connected to the source lines SL (i), SL (i + 1), and SL (i + 2), are disposed in the cutout portion.
- the R TFT 120r, the B TFT 120b, and the G TFT 120g have the width of the R pixel electrode 130r of the R subpixel formation portion SPr adjacent to the B subpixel formation portion SPb (source line extension). (The length in the direction) by a distance corresponding to the B pixel electrode 130b and the B color filter 152b facing the B pixel electrode 130b.
- a black matrix 151 is disposed between the color filters 152. That is, the black matrix 151 is disposed on each TFT 120.
- the width of the portion facing each TFT 120 in the black matrix 151 between the R color filter 152r and the G color filter 152g (the length in the source line extending direction).
- the width of the R pixel electrode is set so that the area of the R pixel electrode 130r is increased by an amount corresponding to the area of the notch portion.
- the length in the extending direction) is set larger than the width of the other pixel electrode.
- the width of the R color filter 152 (the length in the source line extending direction) is also set larger than the width of the color filters of other colors.
- the color filter 152 having a horizontal stripe shape is formed.
- Each color filter 152 is continuously formed over the gate line extending direction. That is, in the gate line extending direction, the color filter 152 is also disposed at a position facing the source lines SL (i) and SL (i + 3) respectively positioned in front and rear of each pixel electrode.
- the present invention is not limited to this, and each color filter 152 may be formed discontinuously in the gate line extending direction. That is, in the gate line extending direction, the black matrix 151 is arranged in place of the color filter 152 at positions facing the source lines SL (i) and SL (i + 3) respectively located in front and rear of each pixel electrode 130. May be.
- each primary color TFT 120 is close to the position of the R TFT 120r and the position of the R color filter 152r facing it, and the position of the G TFT 120g and the position of the G color filter 152g facing it.
- this does not prevent the reduction of the threshold shift described above. That is, in each of the primary color TFTs 120, the incident amount of red light or green light is increased, while the incident amount of blue light having a shorter wavelength than these lights is decreased. As a result, the threshold of the B TFT 120b is decreased. Value shift is reduced.
- the same effect can be obtained even if a configuration for displaying a color image based on the four primary colors of red, green, blue, and yellow as in the third embodiment is employed.
- the B pixel electrode 130g and the color filter 152b facing the B pixel electrode 130g are not positioned either in front of or behind the position of each primary color TFT 120 in the source line extending direction.
- FIG. 10 is a plan view showing a part of the structure on the TFT substrate side in the liquid crystal display panel 100 according to the modification of the fourth embodiment of the present invention. As shown in FIG. 10, in this modification, the width (source line extending direction) of the R pixel electrode 130r and the R color filter 152r is reduced in the fourth embodiment. Other components are the same as those in the fourth embodiment.
- the widths of the R pixel electrode 130r positioned behind the B pixel electrode 130b and the R color filter 152r opposed thereto in the source line extending direction are respectively the other primary color pixel electrodes 130 and the color filter 152 opposed thereto. It is set smaller than the width.
- the width of the black matrix 151 between the B color filter 152b and the R color filter 152r is equal to the width of the black matrix 151 between the R color filter 152r and the G color filter 152g, and the G color filter 152g and the B color filter.
- the width of the R pixel electrode 130r and the width of the R color filter 152r are set so as to be smaller than the width of each of the black matrixes 151 between the R color filter 152r and the black matrix 151. Thereby, the reliability of the liquid crystal display panel 100 can be improved without increasing the size of the liquid crystal display panel 100 than the conventional one.
- the source signal SS to be applied to the source line SL connected to the R pixel electrode 130r via the R TFT 120r by the amount corresponding to the reduction in the width of the R pixel electrode 130r and the width of the R color filter 152r. It is desirable to change the voltage (in the case of normally black, it is increased, and in the case of normally white, it is decreased).
- the width of the G pixel electrode 130g and the G color filter 152g may be reduced.
- the width of the B pixel electrode 130b and the B color filter 152b may be reduced.
- the notched portion is provided in the pixel electrode 130 for the arrangement of the TFT 120.
- the present invention is not limited to this, and the notched portion may not be provided.
- three (or four) source lines SL and one gate line GL correspond to one pixel forming portion MP, but the present invention is not limited to this.
- the present invention can be applied to an aspect in which one source line SL and three (or four) gate lines GL correspond to one pixel formation portion MP.
- the present invention it is possible to provide a liquid crystal display panel in which the reliability of the thin film transistor is improved while suppressing a deterioration in display quality, and a liquid crystal display device including the same.
- the present invention can be applied to a liquid crystal display panel using a TFT whose channel layer is made of an oxide semiconductor.
- Liquid crystal display panel 110 ... TFT substrate (first substrate) 120r ... R TFT (Thin Film Transistor) 120g ... G TFT (Thin Film Transistor) 120b ... TFT for B (Thin Film Transistor) 120y ... Y TFT (Thin Film Transistor) 121 ... Gate electrode (gate terminal) 125d ... Drain electrode (drain terminal) 125s ... Source electrode (source terminal) 130r ... R pixel electrode 130g ... G pixel electrode 130b ... B pixel electrode 130y ... Y pixel electrode 140 ... Counter substrate (second substrate) 151... Black matrix (light shielding layer) 152r ... R color filter (colored layer) 152g ...
- Common electrode 180 Liquid crystal layers GL (1) to GL (m) ... Gate lines (scanning signal lines) SL (1) to SL (n) ... source line (video signal line) MP ... Pixel formation portion SPr ... R subpixel formation portion SPg ... G subpixel formation portion SPb ... B subpixel formation portion SPy ... Y subpixel formation portion
Abstract
Description
互いに対向する第1基板および第2基板と、
前記第1基板と前記第2基板との間に挟持された液晶層と、
前記第1基板上に互いに交差するように配置された複数の映像信号線および複数の走査信号線と、
前記複数の映像信号線および前記複数の走査信号線に沿ってマトリクス状に配置された複数の画素形成部と、
前記所定数の原色のそれぞれの着色層とを備え、
各画素形成部は、前記所定数の原色にそれぞれ対応した複数の副画素形成部を含み、
各副画素形成部は、
該副画素形成部に沿った前記映像信号線と前記走査信号線とに対応して配置された、チャネル層が酸化物半導体からなる薄膜トランジスタと、
前記薄膜トランジスタに接続されると共に、該副画素形成部が対応する原色の着色層に対向する画素電極とを有し、
各画素形成部において、前記複数の副画素形成部の画素電極が所定方向に並び、
前記所定数の原色のうちの最も波長の短い原色の着色層に対向する画素電極に前記所定方向において隣接する一方の画素電極に接続された薄膜トランジスタは、該一方の画素電極に対して、該最も波長の短い原色の着色層に対向する画素電極の反対側に配置され、
前記最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離が、前記一方の画素電極に接続された薄膜トランジスタと該一方の画素電極との距離よりも大きく、
前記最も波長の短い原色の着色層に対向する画素電極に前記所定方向において隣接する他方の画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離が、該最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離以上であることを特徴とする。
前記所定方向は、前記複数の走査信号線の延伸する方向であり、
前記最も波長の短い原色の着色層に対向する画素電極に、前記複数の走査信号線の延伸する方向において隣接する他方の画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離は、該最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離よりも大きいことを特徴とする。
前記最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと、前記他方の画素電極に接続された薄膜トランジスタとは、それぞれに接続された前記映像信号線を挟んで互いに対向する位置に配置されていることを特徴とする。
前記所定方向は、前記複数の映像信号線の延伸する方向であり、
前記最も波長の短い原色の着色層に対向する画素電極に、前記複数の映像信号線の延伸する方向において隣接する他方の画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離は、該最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離と等しいことを特徴とする。
各薄膜トランジスタに対向する位置に遮光層が配置されていることを特徴とする。
前記着色層は、前記第2基板上に配置されていることを特徴とする。
前記着色層は、当該着色層に対向する画素電極上に配置されていることを特徴とする。
前記最も波長の短い原色は青色であることを特徴とする。
前記カラー画像は、赤色、緑色、および青色に基づき表示されることを特徴とする。
前記カラー画像は、赤色、緑色、青色、および黄色に基づき表示されることを特徴とする。
本発明の第1の局面から第10の局面までのいずれかに係る液晶表示パネルを備えることを特徴とする。
本発明の実施形態について説明する前に、上記課題を解決すべく本願発明者によりなされた基礎検討について説明する。
本願発明者は、キセノンランプ光源を用いて赤色(λ=640nm)、緑色(λ=520nm)、および青色(λ=460nm)の単色光のそれぞれをIGZO-TFTに照射しながら、当該IGZO-TFTにゲートバイアスストレスを与えた場合と光を照射せずにIGZO-TFTにゲートバイアスストレスを与えた場合とにおける、しきい値のシフト量(以下、「しきい値シフト」という)を測定した。
図13は、従来の液晶表示パネルのうち、特にTFT基板側の一部の構造を示す平面図である。図14は、図13におけるB-B’線断面図である。この従来の液晶表示パネルは、3原色に基づいてカラー画像を表示するように構成されている。図14に示すように、この液晶表示パネルは、TFT基板110と、TFT基板110に対向する対向基板140と、TFT基板110と対向基板140とに挟持された液晶層180とにより構成されている。
<1.1 液晶表示装置の構成>
図1は、本発明の第1の実施形態に係る液晶表示パネル100を備える液晶表示装置の構成を示すブロック図である。図1に示すように、この液晶表示装置は、液晶表示パネル100、ソースドライバ(映像信号線駆動回路)200、ゲートドライバ(走査信号線駆動回路)300、および表示制御回路400等により構成されている。本実施形態に係る液晶表示パネル100は、反射型・透過型・半透過型のいずれでもよく、透過型または半透過型である場合には、液晶表示パネル100の背面にバックライトが配置される。
次に、本実施形態に係る液晶表示パネル100の詳細な構成(電気的構成および構造)ついて、図2~図4を参照しつつ説明する。
まず、本実施形態に係る液晶表示パネル100の電気的構成について説明する。図2は、本実施形態に係る液晶表示パネル100における画素形成部の電気的構成を示す回路図である。図2に示すように、本実施形態に係る液晶表示パネル100は、3原色(赤色・緑色・青色)に基づいてカラー画像を表示するように構成されている。すなわち、各画素形成部MPは、赤色(R)成分を示す副画素形成部SPr(以下、「R副画素形成部SPr」という)、緑色(G)成分を示す副画素形成部SPg(以下、「G副画素形成部SPg」という)、および青色(B)成分を示す副画素形成部SPb(以下、「B副画素形成部SPb」という)により構成されている。このような画素形成部MPは、ソースラインSLおよびゲートラインGLに沿ってマトリクス状に配置されている。以下では、R用副画素形成部SPr、G副画素形成部SPg、およびB副画素形成部SPbを区別しない場合には、これらを「副画素形成部SP」という。
次に、本実施形態に係る液晶表示パネル100の構造について説明する。図3は、本実施形態に係る液晶表示パネル100のうち、特にTFT基板側の一部の構造を示す平面図である。図4は、図3におけるA-A’線断面図である。
本実施形態によれば、縦ストライプ状のカラーフィルタが形成された、赤色・緑色・青色の3原色に基づくカラー画像を表示するための液晶表示パネルにおいて、B副画素形成部SPbのB用TFT120bが、Bカラーフィルタ152bから従来よりも離れた位置に配置される。さらに、ゲートライン延伸方向において連続して並んだB用画素電極130bとR用画素電極130rとの間に配置されたR用TFT120rも、Bカラーフィルタ152bから従来よりも離れた位置に配置される。その結果、B用TFT120bおよびR用TFT120rへの青色光の入射が抑制されるので、これらのTFTのしきい値シフトが低減される。したがって、液晶表示パネルにおけるTFTの信頼性を高めることができる。
図5は、本発明の第1の実施形態の変形例に係る液晶表示パネル100のうち、特にTFT基板側の一部の構造を示す平面図である。図5に示すように、本変形例は、上記第1の実施形態よりも、R用画素電極130rおよびRカラーフィルタ152rの幅(ゲートライン延伸方向の長さ)を小さくしたものである。なお、他の構成要素は上記第1の実施形態と同様である。
<2.1 液晶表示パネルの構造>
本発明の第2の実施形態に係る液晶表示パネル100の構造について、図6を参照しつつ説明する。なお、本実施形態の構成要素のうち第1の実施形態と同一の要素については、同一の参照符号を付して説明を省略する。図6は、本発明の第2の実施形態に係る液晶表示パネル100の一部の構造を示す断面図(図3におけるA-A’線断面図に相当するもの)である。
本実施形態によれば、ブラックマトリクス151およびカラーフィルタ152がTFT基板110側に配置された液晶表示パネル100において、上記第1の実施形態と同様に、B用TFT120bおよびR用TFT120rへの青色光の入射が抑制される。したがって、第1の実施形態と同様の効果を奏することができる。
<3.1 液晶表示パネルの構成>
本発明の第3の実施形態に係る液晶表示パネル100の構成(電気的構成および構造)について、図7および図8を参照しつつ説明する。なお、本実施形態の構成要素のうち第1の実施形態と同一の要素については、同一の参照符号を付して説明を省略する。
まず、本実施形態に係る液晶表示パネル100の電気的構成について説明する。図7は、本実施形態に係る液晶表示パネル100における画素形成部の電気的構成を示す回路図である。上記第1の実施形態に係る液晶表示パネル100は、3原色(赤色・緑色・青色)に基づいてカラー画像を表示するように構成されているのに対し、本実施形態に係る液晶表示パネル100は、図7に示すように、4原色(赤色・緑色・青色・黄色)に基づいてカラー画像を表示するように構成されている。すなわち、各画素形成部MPが、R副画素形成部SPr、G副画素形成部SPg、およびB副画素形成部SPbに加えて、黄色(Y)を示す副画素形成部SPy(以下、「Y副画素形成部SPy」という)により構成されている。以下では、R用副画素形成部SPr、G副画素形成部SPg、およびB副画素形成部SPb、さらにY副画素形成部SPyを区別しない場合には、これらを「副画素形成部SP」という。
次に、本実施形態に係る液晶表示パネル100の構造について説明する。図8は、本発明の第3の実施形態に係る液晶表示パネル100のうち、特にTFT基板側の一部の構造を示す平面図である。
本実施形態によれば、赤色・緑色・青色・黄色の4原色に基づくカラー画像を表示するための液晶表示パネルにおいて、上記第1の実施形態と同様の効果を奏することができる。
<4.1 液晶表示パネルの構造>
本発明の第4の実施形態に係る液晶表示パネル100の構造について、図9を参照しつつ説明する。なお、本実施形態の構成要素のうち第1の実施形態と同一の要素については、同一の参照符号を付して説明を省略する。図9は、本実施形態に係る液晶表示パネル100のうち、特にTFT基板側の一部の構造を示す平面図である。
本実施形態によれば、横ストライプ状のカラーフィルタが形成された、赤色・緑色・青色の3原色に基づくカラー画像を表示するための液晶表示パネルにおいて、上記第1の実施形態と同様に、B用TFT120bおよびR用TFT120rへの青色光の入射が抑制される。したがって、上記第1の実施形態と同様の効果を奏することができる。
図10は、本発明の第4の実施形態の変形例に係る液晶表示パネル100のうち、特にTFT基板側の一部の構造を示す平面図である。図10に示すように、本変形例は、上記第4の実施形態において、R用画素電極130rおよびRカラーフィルタ152rの幅(ソースライン延伸方向)を小さくしたものである。なお、他の構成要素は上記第4の実施形態と同様である。
上記各実施形態では、TFT120の配置のために画素電極130に切り欠き部分を設けているが、本発明はこれに限定されるものではなく、このような切り欠き部分を設けなくてもよい。
110…TFT基板(第1基板)
120r…R用TFT(薄膜トランジスタ)
120g…G用TFT(薄膜トランジスタ)
120b…B用TFT(薄膜トランジスタ)
120y…Y用TFT(薄膜トランジスタ)
121…ゲート電極(ゲート端子)
125d…ドレイン電極(ドレイン端子)
125s…ソース電極(ソース端子)
130r…R用画素電極
130g…G用画素電極
130b…B用画素電極
130y…Y用画素電極
140…対向基板(第2基板)
151…ブラックマトリクス(遮光層)
152r…Rカラーフィルタ(着色層)
152g…Gカラーフィルタ(着色層)
152b…Bカラーフィルタ(着色層)
152y…Yカラーフィルタ(着色層)
160…共通電極
180…液晶層
GL(1)~GL(m)…ゲートライン(走査信号線)
SL(1)~SL(n)…ソースライン(映像信号線)
MP…画素形成部
SPr…R副画素形成部
SPg…G副画素形成部
SPb…B副画素形成部
SPy…Y副画素形成部
Claims (11)
- 所定数の原色に基づくカラー画像を表示するための液晶表示パネルであって、
互いに対向する第1基板および第2基板と、
前記第1基板と前記第2基板との間に挟持された液晶層と、
前記第1基板上に互いに交差するように配置された複数の映像信号線および複数の走査信号線と、
前記複数の映像信号線および前記複数の走査信号線に沿ってマトリクス状に配置された複数の画素形成部と、
前記所定数の原色のそれぞれの着色層とを備え、
各画素形成部は、前記所定数の原色にそれぞれ対応した複数の副画素形成部を含み、
各副画素形成部は、
該副画素形成部に沿った前記映像信号線と前記走査信号線とに対応して配置された、チャネル層が酸化物半導体からなる薄膜トランジスタと、
前記薄膜トランジスタに接続されると共に、該副画素形成部が対応する原色の着色層に対向する画素電極とを有し、
各画素形成部において、前記複数の副画素形成部の画素電極が所定方向に並び、
前記所定数の原色のうちの最も波長の短い原色の着色層に対向する画素電極に前記所定方向において隣接する一方の画素電極に接続された薄膜トランジスタは、該一方の画素電極に対して、該最も波長の短い原色の着色層に対向する画素電極の反対側に配置され、
前記最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離が、前記一方の画素電極に接続された薄膜トランジスタと該一方の画素電極との距離よりも大きく、
前記最も波長の短い原色の着色層に対向する画素電極に前記所定方向において隣接する他方の画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離が、該最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離以上であることを特徴とする、液晶表示パネル。 - 前記所定方向は、前記複数の走査信号線の延伸する方向であり、
前記最も波長の短い原色の着色層に対向する画素電極に、前記複数の走査信号線の延伸する方向において隣接する他方の画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離は、該最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離よりも大きいことを特徴とする、請求項1に記載の液晶表示パネル。 - 前記最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと、前記他方の画素電極に接続された薄膜トランジスタとは、それぞれに接続された前記映像信号線を挟んで互いに対向する位置に配置されていることを特徴とする、請求項2に記載の液晶表示パネル。
- 前記所定方向は、前記複数の映像信号線の延伸する方向であり、
前記最も波長の短い原色の着色層に対向する画素電極に、前記複数の映像信号線の延伸する方向において隣接する他方の画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離は、該最も波長の短い原色の着色層に対向する画素電極に接続された薄膜トランジスタと該最も波長の短い原色の着色層に対向する画素電極との距離と等しいことを特徴とする、請求項1に記載の液晶表示パネル。 - 各薄膜トランジスタに対向する位置に遮光層が配置されていることを特徴とする、請求項1に記載の液晶表示パネル。
- 前記着色層は、前記第2基板上に配置されていることを特徴とする、請求項1に記載の液晶表示パネル。
- 前記着色層は、当該着色層に対向する画素電極上に配置されていることを特徴とする、請求項1に記載の液晶表示パネル。
- 前記最も波長の短い原色は青色であることを特徴とする、請求項1に記載の液晶表示パネル。
- 前記カラー画像は、赤色、緑色、および青色に基づき表示されることを特徴とする、請求項8に記載の液晶表示パネル。
- 前記カラー画像は、赤色、緑色、青色、および黄色に基づき表示されることを特徴とする、請求項8に記載の液晶表示パネル。
- 請求項1から10までのいずれか一項に記載の液晶表示パネルを備えることを特徴とする、液晶表示装置。
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CN (1) | CN103492938B (ja) |
TW (1) | TWI539221B (ja) |
WO (1) | WO2012137721A1 (ja) |
Cited By (1)
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JP2020122924A (ja) * | 2019-01-31 | 2020-08-13 | 三菱電機株式会社 | 液晶表示装置 |
Families Citing this family (6)
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CN103926737B (zh) * | 2013-12-23 | 2017-01-04 | 厦门天马微电子有限公司 | 彩膜基板、液晶显示面板和液晶显示装置 |
KR20150134465A (ko) * | 2014-05-21 | 2015-12-02 | 삼성디스플레이 주식회사 | 표시 장치 |
DE102015112770A1 (de) * | 2015-08-04 | 2017-02-09 | Thyssenkrupp Ag | Fügen mit Fügehilfselementen |
CN107024794B (zh) * | 2017-06-08 | 2020-06-09 | 厦门天马微电子有限公司 | 显示面板与显示装置 |
CN108333845A (zh) * | 2018-02-26 | 2018-07-27 | 武汉华星光电技术有限公司 | 阵列基板、显示面板以及阵列基板的制作方法 |
CN110928023A (zh) * | 2019-11-26 | 2020-03-27 | 武汉华星光电技术有限公司 | 一种彩膜基板和显示面板 |
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JP2001091971A (ja) * | 1999-09-20 | 2001-04-06 | Matsushita Electric Ind Co Ltd | 液晶表示パネル |
JP2011054957A (ja) * | 2009-08-07 | 2011-03-17 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
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KR100930919B1 (ko) * | 2003-06-30 | 2009-12-10 | 엘지디스플레이 주식회사 | 횡전계형 액정표시장치 및 그 제조방법 |
JP5131508B2 (ja) * | 2005-11-14 | 2013-01-30 | Nltテクノロジー株式会社 | 受光回路 |
JP5016831B2 (ja) * | 2006-03-17 | 2012-09-05 | キヤノン株式会社 | 酸化物半導体薄膜トランジスタを用いた発光素子及びこれを用いた画像表示装置 |
JP5116277B2 (ja) * | 2006-09-29 | 2013-01-09 | 株式会社半導体エネルギー研究所 | 半導体装置、表示装置、液晶表示装置、表示モジュール及び電子機器 |
JP4932415B2 (ja) * | 2006-09-29 | 2012-05-16 | 株式会社半導体エネルギー研究所 | 半導体装置 |
TWI443430B (zh) * | 2007-06-29 | 2014-07-01 | Au Optronics Corp | 液晶顯示面板與包含液晶顯示面板之光電裝置 |
JP2011158563A (ja) * | 2010-01-29 | 2011-08-18 | Hitachi Displays Ltd | 液晶表示装置 |
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2012
- 2012-04-02 CN CN201280017469.5A patent/CN103492938B/zh not_active Expired - Fee Related
- 2012-04-02 US US14/009,602 patent/US9513522B2/en active Active
- 2012-04-02 JP JP2013508859A patent/JP5383951B2/ja active Active
- 2012-04-02 KR KR1020137029149A patent/KR101511894B1/ko active IP Right Grant
- 2012-04-02 WO PCT/JP2012/058893 patent/WO2012137721A1/ja active Application Filing
- 2012-04-03 TW TW101111927A patent/TWI539221B/zh not_active IP Right Cessation
Patent Citations (2)
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JP2001091971A (ja) * | 1999-09-20 | 2001-04-06 | Matsushita Electric Ind Co Ltd | 液晶表示パネル |
JP2011054957A (ja) * | 2009-08-07 | 2011-03-17 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020122924A (ja) * | 2019-01-31 | 2020-08-13 | 三菱電機株式会社 | 液晶表示装置 |
JP7261595B2 (ja) | 2019-01-31 | 2023-04-20 | トライベイル テクノロジーズ, エルエルシー | 表示装置 |
Also Published As
Publication number | Publication date |
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TW201248284A (en) | 2012-12-01 |
CN103492938B (zh) | 2016-06-08 |
JPWO2012137721A1 (ja) | 2014-07-28 |
CN103492938A (zh) | 2014-01-01 |
JP5383951B2 (ja) | 2014-01-08 |
KR101511894B1 (ko) | 2015-04-13 |
US9513522B2 (en) | 2016-12-06 |
TWI539221B (zh) | 2016-06-21 |
US20140022477A1 (en) | 2014-01-23 |
KR20140024362A (ko) | 2014-02-28 |
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