WO2012111487A1 - Composé ayant des groupes accepteurs, et couche mince organique et élément de couche mince organique utilisant celui-ci - Google Patents
Composé ayant des groupes accepteurs, et couche mince organique et élément de couche mince organique utilisant celui-ci Download PDFInfo
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- WO2012111487A1 WO2012111487A1 PCT/JP2012/052768 JP2012052768W WO2012111487A1 WO 2012111487 A1 WO2012111487 A1 WO 2012111487A1 JP 2012052768 W JP2012052768 W JP 2012052768W WO 2012111487 A1 WO2012111487 A1 WO 2012111487A1
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- thin film
- compound
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- organic
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 140
- 239000010409 thin film Substances 0.000 title claims description 145
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 27
- 125000001424 substituent group Chemical group 0.000 claims description 24
- 125000000623 heterocyclic group Chemical group 0.000 claims description 19
- 125000003545 alkoxy group Chemical group 0.000 claims description 18
- 125000005843 halogen group Chemical group 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 14
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 claims description 12
- 125000000962 organic group Chemical group 0.000 claims description 12
- 125000001931 aliphatic group Chemical group 0.000 claims description 11
- 125000003277 amino group Chemical group 0.000 claims description 11
- 125000004104 aryloxy group Chemical group 0.000 claims description 11
- 229920006395 saturated elastomer Polymers 0.000 claims description 11
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical group C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 claims description 10
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 8
- 150000003949 imides Chemical class 0.000 claims description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 6
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 229920004933 Terylene® Polymers 0.000 claims description 3
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 3
- 125000000656 azaniumyl group Chemical group [H][N+]([H])([H])[*] 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 99
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 54
- 239000000758 substrate Substances 0.000 description 49
- 238000000034 method Methods 0.000 description 35
- 125000004432 carbon atom Chemical group C* 0.000 description 32
- 239000002904 solvent Substances 0.000 description 23
- 238000006243 chemical reaction Methods 0.000 description 22
- 230000032258 transport Effects 0.000 description 22
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 21
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 20
- 239000000463 material Substances 0.000 description 20
- 239000004065 semiconductor Substances 0.000 description 19
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 16
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 16
- -1 polyphenylene vinylene Polymers 0.000 description 16
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 15
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 14
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 14
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 14
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 12
- 229910002027 silica gel Inorganic materials 0.000 description 12
- 239000000741 silica gel Substances 0.000 description 12
- 229960001866 silicon dioxide Drugs 0.000 description 12
- 239000007787 solid Substances 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000004458 analytical method Methods 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 150000002391 heterocyclic compounds Chemical class 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 125000002947 alkylene group Chemical group 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 230000005669 field effect Effects 0.000 description 9
- 238000002189 fluorescence spectrum Methods 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- 238000005481 NMR spectroscopy Methods 0.000 description 8
- 238000000862 absorption spectrum Methods 0.000 description 8
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical compound S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 8
- 229930192474 thiophene Natural products 0.000 description 8
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 7
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 7
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 239000012044 organic layer Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 7
- FNQJDLTXOVEEFB-UHFFFAOYSA-N 1,2,3-benzothiadiazole Chemical compound C1=CC=C2SN=NC2=C1 FNQJDLTXOVEEFB-UHFFFAOYSA-N 0.000 description 6
- 239000005964 Acibenzolar-S-methyl Substances 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 6
- 238000006069 Suzuki reaction reaction Methods 0.000 description 6
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 6
- 238000000137 annealing Methods 0.000 description 6
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 108010021119 Trichosanthin Proteins 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000000816 matrix-assisted laser desorption--ionisation Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000001269 time-of-flight mass spectrometry Methods 0.000 description 5
- 229910052720 vanadium Inorganic materials 0.000 description 5
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 4
- 238000006619 Stille reaction Methods 0.000 description 4
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- JNGZXGGOCLZBFB-IVCQMTBJSA-N compound E Chemical compound N([C@@H](C)C(=O)N[C@@H]1C(N(C)C2=CC=CC=C2C(C=2C=CC=CC=2)=N1)=O)C(=O)CC1=CC(F)=CC(F)=C1 JNGZXGGOCLZBFB-IVCQMTBJSA-N 0.000 description 4
- 238000002484 cyclic voltammetry Methods 0.000 description 4
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- ZTQSADJAYQOCDD-UHFFFAOYSA-N ginsenoside-Rd2 Natural products C1CC(C2(CCC3C(C)(C)C(OC4C(C(O)C(O)C(CO)O4)O)CCC3(C)C2CC2O)C)(C)C2C1C(C)(CCC=C(C)C)OC(C(C(O)C1O)O)OC1COC1OCC(O)C(O)C1O ZTQSADJAYQOCDD-UHFFFAOYSA-N 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 4
- 239000002184 metal Chemical class 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920005596 polymer binder Polymers 0.000 description 4
- 239000002491 polymer binding agent Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 125000006239 protecting group Chemical group 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 229930195734 saturated hydrocarbon Natural products 0.000 description 4
- 229910052938 sodium sulfate Inorganic materials 0.000 description 4
- 235000011152 sodium sulphate Nutrition 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 0 C*C(c(cc1)c(C(C)C=C2C(C3C)=C)c(C)c1-c(cc1)c(C)c2c1C3=C)=* Chemical compound C*C(c(cc1)c(C(C)C=C2C(C3C)=C)c(C)c1-c(cc1)c(C)c2c1C3=C)=* 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 230000005525 hole transport Effects 0.000 description 3
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 3
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical class O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 description 2
- MNDIARAMWBIKFW-UHFFFAOYSA-N 1-bromohexane Chemical compound CCCCCCBr MNDIARAMWBIKFW-UHFFFAOYSA-N 0.000 description 2
- YZWKKMVJZFACSU-UHFFFAOYSA-N 1-bromopentane Chemical compound CCCCCBr YZWKKMVJZFACSU-UHFFFAOYSA-N 0.000 description 2
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 2
- MLRVZFYXUZQSRU-UHFFFAOYSA-N 1-chlorohexane Chemical compound CCCCCCCl MLRVZFYXUZQSRU-UHFFFAOYSA-N 0.000 description 2
- SQCZQTSHSZLZIQ-UHFFFAOYSA-N 1-chloropentane Chemical compound CCCCCCl SQCZQTSHSZLZIQ-UHFFFAOYSA-N 0.000 description 2
- VFBJMPNFKOMEEW-UHFFFAOYSA-N 2,3-diphenylbut-2-enedinitrile Chemical group C=1C=CC=CC=1C(C#N)=C(C#N)C1=CC=CC=C1 VFBJMPNFKOMEEW-UHFFFAOYSA-N 0.000 description 2
- DDTHMESPCBONDT-UHFFFAOYSA-N 4-(4-oxocyclohexa-2,5-dien-1-ylidene)cyclohexa-2,5-dien-1-one Chemical group C1=CC(=O)C=CC1=C1C=CC(=O)C=C1 DDTHMESPCBONDT-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229940126062 Compound A Drugs 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Chemical class 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 235000002597 Solanum melongena Nutrition 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- YOKBFUOPNPIXQC-UHFFFAOYSA-N anti-tetramantane Chemical compound C1C(CC2C3C45)CC6C2CC52CC5CC7C2C6C13CC7C4C5 YOKBFUOPNPIXQC-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 125000005619 boric acid group Chemical group 0.000 description 2
- AQNQQHJNRPDOQV-UHFFFAOYSA-N bromocyclohexane Chemical compound BrC1CCCCC1 AQNQQHJNRPDOQV-UHFFFAOYSA-N 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 150000001923 cyclic compounds Chemical class 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 125000005393 dicarboximide group Chemical group 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 150000008376 fluorenones Chemical class 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000005194 fractionation Methods 0.000 description 2
- 229910003472 fullerene Inorganic materials 0.000 description 2
- FVIZARNDLVOMSU-UHFFFAOYSA-N ginsenoside K Natural products C1CC(C2(CCC3C(C)(C)C(O)CCC3(C)C2CC2O)C)(C)C2C1C(C)(CCC=C(C)C)OC1OC(CO)C(O)C(O)C1O FVIZARNDLVOMSU-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 229910017053 inorganic salt Inorganic materials 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- UNFUYWDGSFDHCW-UHFFFAOYSA-N monochlorocyclohexane Chemical compound ClC1CCCCC1 UNFUYWDGSFDHCW-UHFFFAOYSA-N 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920000123 polythiophene Polymers 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical group C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- YTZKOQUCBOVLHL-UHFFFAOYSA-N tert-butylbenzene Chemical compound CC(C)(C)C1=CC=CC=C1 YTZKOQUCBOVLHL-UHFFFAOYSA-N 0.000 description 2
- 125000004149 thio group Chemical group *S* 0.000 description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- KZPYGQFFRCFCPP-UHFFFAOYSA-N 1,1'-bis(diphenylphosphino)ferrocene Chemical compound [Fe+2].C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1 KZPYGQFFRCFCPP-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- MPXKIFWZOQVOLN-UHFFFAOYSA-N 1-(1-adamantyl)adamantane Chemical compound C1C(C2)CC(C3)CC2CC13C(C1)(C2)CC3CC2CC1C3 MPXKIFWZOQVOLN-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- QCOBZGLGHNETNB-UHFFFAOYSA-N CCCC[N](C)(OC(C)[N+]([O-2][NH+]=C=C=C1CC1)=C=C=C1C(C)C1)#C Chemical compound CCCC[N](C)(OC(C)[N+]([O-2][NH+]=C=C=C1CC1)=C=C=C1C(C)C1)#C QCOBZGLGHNETNB-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 208000005156 Dehydration Diseases 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000292 Polyquinoline Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 125000005227 alkyl sulfonate group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000005228 aryl sulfonate group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- IPWKHHSGDUIRAH-UHFFFAOYSA-N bis(pinacolato)diboron Chemical compound O1C(C)(C)C(C)(C)OB1B1OC(C)(C)C(C)(C)O1 IPWKHHSGDUIRAH-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- AMFOXYRZVYMNIR-UHFFFAOYSA-N ctk0i0750 Chemical compound C12CC(C3)CC(C45)C1CC1C4CC4CC1C2C53C4 AMFOXYRZVYMNIR-UHFFFAOYSA-N 0.000 description 1
- TXWRERCHRDBNLG-UHFFFAOYSA-N cubane Chemical compound C12C3C4C1C1C4C3C12 TXWRERCHRDBNLG-UHFFFAOYSA-N 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- WVIIMZNLDWSIRH-UHFFFAOYSA-N cyclohexylcyclohexane Chemical group C1CCCCC1C1CCCCC1 WVIIMZNLDWSIRH-UHFFFAOYSA-N 0.000 description 1
- 238000005695 dehalogenation reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000006392 deoxygenation reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- ZICQBHNGXDOVJF-UHFFFAOYSA-N diamantane Chemical compound C1C2C3CC(C4)CC2C2C4C3CC1C2 ZICQBHNGXDOVJF-UHFFFAOYSA-N 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- HKNRNTYTYUWGLN-UHFFFAOYSA-N dithieno[3,2-a:2',3'-d]thiophene Chemical compound C1=CSC2=C1SC1=C2C=CS1 HKNRNTYTYUWGLN-UHFFFAOYSA-N 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 238000004770 highest occupied molecular orbital Methods 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- WSTNFGAKGUERTC-UHFFFAOYSA-N n-ethylhexan-1-amine Chemical compound CCCCCCNCC WSTNFGAKGUERTC-UHFFFAOYSA-N 0.000 description 1
- AXNCVDQWNPJQOM-UHFFFAOYSA-N n-triethoxysilylpropan-1-amine Chemical compound CCCN[Si](OCC)(OCC)OCC AXNCVDQWNPJQOM-UHFFFAOYSA-N 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000412 polyarylene Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- ZJMWRROPUADPEA-UHFFFAOYSA-N sec-butylbenzene Chemical compound CCC(C)C1=CC=CC=C1 ZJMWRROPUADPEA-UHFFFAOYSA-N 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 description 1
- 239000003115 supporting electrolyte Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D519/00—Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups C07D453/00 or C07D455/00
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
- H10K39/30—Devices controlled by radiation
- H10K39/32—Organic image sensors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/211—Fullerenes, e.g. C60
- H10K85/215—Fullerenes, e.g. C60 comprising substituents, e.g. PCBM
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/621—Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
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- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
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- Y02E10/549—Organic PV cells
Definitions
- the present invention relates to a compound having an acceptor group, an organic thin film using the compound, and an organic thin film element.
- Thin films containing organic materials that have electric charge are expected to be applied to photoelectric conversion elements (eg, organic thin film solar cells, photosensors), organic electroluminescence elements, and organic thin film transistors.
- photoelectric conversion elements eg, organic thin film solar cells, photosensors
- organic electroluminescence elements e.g., organic electroluminescence elements
- organic thin film transistors e.g, organic thin film transistors
- a structure composed of a combination of an organic p-type semiconductor and an organic n-type semiconductor has been proposed.
- an organic p-type semiconductor poly [(2-methoxy-5- (2′-ethylhexyloxy) 1-4-phenylenevinylene], which is a polyphenylene vinylene derivative, and polyhexylthiophene, an electron-donating ⁇ -conjugated compound
- an electron acceptor fullerene derivative see, for example, C 60 , Patent Document 1, and Non-Patent Document 1 as an organic n-type semiconductor.
- organic n-type semiconductors do not necessarily have sufficient electron transport properties, and organic n-type semiconductors having higher electron transport properties are required.
- the present invention comprises a core part which is a tetravalent or higher group derived from a cage compound or an aliphatic hydrocarbon compound, and four or more side chain groups bonded to the core part, and among the side chain groups It relates to a compound in which two or more have an acceptor group.
- the compound according to the present invention Since the compound according to the present invention has an acceptor group contained in a side chain group, it can function as an organic semiconductor having the properties of an organic n-type semiconductor (electron acceptor property). And since the side chain group couple
- the cage compound is adamantane or silsesquioxane, and the aliphatic hydrocarbon compound is methane.
- the acceptor group is preferably a group containing a fullerene derivative residue, a group containing a naphthaleneimide derivative residue, or a group containing a peryleneimide derivative residue.
- a compound having such a structure has good interaction between molecules, and the stability of the compound is particularly excellent. Therefore, more excellent electron transport properties are exhibited.
- the present invention provides an organic thin film containing the compound according to the present invention, and an organic thin film element, an organic thin film transistor, an organic thin film solar cell, and an optical sensor including the organic thin film element.
- the organic thin film element, the organic thin film transistor, the organic thin film solar cell, and the optical sensor according to the present invention are provided with the organic thin film containing the compound of the present invention exhibiting excellent electron transport properties as described above, and thus exhibit excellent performance. can do.
- a novel compound that can be used as an organic semiconductor having excellent charge transportability is provided.
- the organic thin film element provided with this organic thin film containing this compound and this organic thin film is provided. This organic thin film element can be excellent in stability.
- the compound according to the present invention is excellent in stability and solubility in an organic solvent. Therefore, an organic thin film element having excellent performance can be easily produced by forming an organic thin film using a solution. can do.
- the compound according to the present embodiment includes a core part which is a tetravalent or higher group derived from a cage compound or an aliphatic hydrocarbon compound, and four or more side chains bonded to the core part. It is composed of a group. Two or more of the four or more side chain groups have an acceptor group.
- the compound having such a configuration is sometimes referred to as an “acceptor compound”.
- the core part has 4 or more atoms to which a side chain group is bonded as a bonding site.
- three atoms that bind to the binding site of the core are selected from the atoms that constitute the side chain group, they are placed outside (out of the plane) of the plane formed by these three atoms.
- the core part forming such a configuration is preferably a vertex of a polygonal pyramid such as a triangular pyramid, a quadrangular pyramid and a pentagonal pyramid, a vertex of a polygonal column such as a triangular prism, a quadrangular prism and a pentagonal prism, or a regular tetrahedron , Having a binding site arranged at the apex of a regular polyhedron such as a regular octahedron, regular dodecahedron, and regular icosahedron.
- the connecting part of the core is arranged at the apex of the structure in which the structure of the polygonal pyramid, polygonal column, or regular polyhedron is distorted, or at the apex of the structure in which part of the apex is missing from the structure of the polygonal pyramid, polygonal column, or regular polyhedron May be.
- the tetravalent group as the core part may be a residue obtained by removing 4 or more hydrogen atoms from an aliphatic hydrocarbon compound.
- This aliphatic hydrocarbon compound is preferably methane.
- the tetravalent group as the core part may be a residue obtained by removing four or more hydrogen atoms or substituents from a cage compound.
- the cage compound is preferably selected from cubane, adamantane, silsesquioxane and analogs thereof. Of these, silsesquioxane is particularly preferable.
- the core part may be composed of a plurality of residues derived from the same or different cage compounds, and the plurality of residues may be bonded to each other.
- adamantane and its analogs include adamantane (100), biadamantane (101), diamantane (102), triamantane (103), tetramantane (104) and isotetramantane (105) represented by the following structural formula. Illustrated. Of these, adamantane is preferred.
- the cage silsesquioxane is generally obtained by partial hydrolysis / condensation of a trifunctional silane, and has the formula: (RSiO 3/2 ) n (R represents a hydrogen atom or a substituent, Is a polyhedral cluster having a structure represented by:
- R represents a hydrogen atom or a substituent
- Silsesquioxane which is not completely condensed can also be used.
- the core part derived from silsesquioxane is a residue excluding 4 or more Rs.
- the side chain group bonded to the core part is a group represented by the following formula (10).
- L represents a single bond or a divalent organic group
- T represents a hydrogen atom, a halogen atom or a monovalent organic group.
- T is an acceptor group.
- a plurality of L and T present in the same molecule may be the same or different from each other, but since the compound is easy to produce and the interaction between molecules is easy, the plurality of L and T are the same. It is preferable that
- the acceptor group is selected from groups that function as an electron acceptor in combination with a donor group.
- Acceptor groups include, for example, oxadiazole derivative residues, anthraquinodimethane derivative residues, benzoquinone derivative residues, naphthoquinone derivative residues, anthraquinone derivative residues, tetracyanoanthraquinodimethane derivative residues, fluorenone derivatives.
- a group containing a fullerene derivative residue, a group containing a naphthaleneimide derivative residue, and a group containing a peryleneimide derivative residue are preferable.
- the acceptor group is more preferably a group containing a fullerene derivative residue, a group containing a naphthaleneimide derivative residue, or a group containing a peryleneimide derivative residue.
- a group containing a naphthaleneimide derivative residue is particularly preferred because it is easy to synthesize.
- an acceptor group contains a fluorine atom.
- the group containing a fullerene derivative residue is represented by the following structural formula, for example.
- the group containing a peryleneimide derivative residue is represented by the following structural formula, for example.
- a group containing a naphthaleneimide derivative residue is represented by the following structural formula, for example.
- the group containing a terylene imide derivative residue is represented by the following structural formula, for example.
- R 01 represents a monovalent organic group
- R 02 represents a divalent organic group
- R 03 represents a trivalent organic group
- R 01 , R 02 and R 03 are in the same formula. They are the same or different.
- A represents an alkyl group, an alkoxy group, a sulfonyl group, an amino group, an ammonio group, a hydroxy group, a nitro group or a halogen atom
- e is an integer of 0 to 4
- f is an integer of 0 to 12
- g is 0 to 8 Indicates an integer.
- Examples of the monovalent organic group represented by R 01 include linear, branched or cyclic alkyl groups, alkoxy groups, aryl groups, monovalent heterocyclic groups, amino groups, nitro groups, and cyano groups. Is done.
- the alkyl group may have 1 to 20 carbon atoms
- the alkoxy group may have 1 to 20 carbon atoms
- the aryl group may have 6 to 60 carbon atoms.
- the monovalent heterocyclic group is, for example, a heterocyclic compound selected from furan, thiophene, thienothiophene, benzothiophene, thiazole, benzothiazole, benzothiadiazole, oxazole, pyrrole, imidazole, pyridine, pyrazine, pyrimidine, pyridazine, and triazine.
- the aryl group and monovalent heterocyclic group may have a substituent such as a halogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an amino group, a cyano group, or a nitro group. Good.
- Examples of the divalent organic group represented by R 02 include an alkylene group, vinylene group, oxy group (—O—), thio group (—S—), carbonyl group, thiocarbonyl group, sulfenyl group, sulfonyl group, And a mono-substituted amino group, and a residue having a ring structure in which two hydrogen atoms are removed from a cyclic compound such as benzene, a condensed ring compound, and a heterocyclic compound.
- the alkylene group may have 1 to 20 carbon atoms.
- the mono-substituted amino group is an amino group substituted with one substituent such as an alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 20 carbon atoms.
- substituent such as an alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 20 carbon atoms.
- an alkylene group and a residue obtained by removing two hydrogen atoms from benzene are particularly preferable.
- the residue having a ring structure may have a substituent.
- the substituent include a halogen atom, a saturated or unsaturated aliphatic hydrocarbon group, an aryl group, an alkoxy group, an aryloxy group, a monovalent heterocyclic group, an amino group, a nitro group, and a cyano group.
- the saturated or unsaturated aliphatic hydrocarbon group may have 1 to 20 carbon atoms
- the aryl group may have 6 to 60 carbon atoms
- the alkoxy group has 1 to 2 carbon atoms. It may be 20, and the aryloxy group may have 7 to 80 carbon atoms.
- the monovalent heterocyclic group is, for example, a heterocyclic compound selected from furan, thiophene, thienothiophene, benzothiophene, thiazole, benzothiazole, benzothiadiazole, oxazole, pyrrole, imidazole, pyridine, pyrazine, pyrimidine, pyridazine, and triazine. Is a residue obtained by removing one hydrogen atom from
- Examples of the trivalent organic group represented by R 03 include a residue having a ring structure in which three hydrogen atoms are removed from a cyclic compound such as benzene, a condensed ring compound, and a heterocyclic compound. Among these, a residue obtained by removing three hydrogen atoms from benzene is particularly preferable.
- the residue having a ring structure may have a substituent. Examples of the substituent include a halogen atom, a saturated or unsaturated aliphatic hydrocarbon group, an aryl group, an alkoxy group, an aryloxy group, a monovalent heterocyclic group, an amino group, a nitro group, and a cyano group.
- the saturated or unsaturated aliphatic hydrocarbon group may have 1 to 20 carbon atoms
- the aryl group may have 6 to 60 carbon atoms
- the alkoxy group has 1 to 2 carbon atoms. It may be 20, and the aryloxy group may have 7 to 80 carbon atoms.
- the monovalent heterocyclic group is, for example, a heterocyclic compound selected from furan, thiophene, thienothiophene, benzothiophene, thiazole, benzothiazole, benzothiadiazole, oxazole, pyrrole, imidazole, pyridine, pyrazine, pyrimidine, pyridazine, and triazine. Is a residue obtained by removing one hydrogen atom from
- the acceptor compound according to the present embodiment has two or more side chain groups having an acceptor group. Since the electron transport property of the acceptor compound according to the present embodiment is further enhanced, the number of acceptor groups is preferably 4 or more, more preferably 6 or more. Moreover, since the electron transport property of the acceptor compound according to the present embodiment is further enhanced, it is particularly preferable that all of the side chain groups bonded to the core portion have an acceptor group.
- the acceptor group is preferably arranged at the end of the side chain group.
- the acceptor groups are preferably arranged as far apart as possible from each other in space. Therefore, it is preferable that two or more side chain groups having an acceptor group are bonded to a binding site having a symmetrical arrangement.
- T in the side chain group having no acceptor group is preferably a hydrogen atom, an alkyl group, an alkoxy group, a phenyl group or a substituted phenyl group.
- substituent of the substituted phenyl group include a halogen atom, a saturated or unsaturated aliphatic hydrocarbon group, an aryl group, an alkoxy group, an aryloxy group, a monovalent heterocyclic group, an amino group, a nitro group, and a cyano group. It is done.
- the saturated or unsaturated aliphatic hydrocarbon group may have 1 to 20 carbon atoms
- the aryl group may have 6 to 60 carbon atoms
- the alkoxy group has 1 to 2 carbon atoms. It may be 20, and the aryloxy group may have 7 to 80 carbon atoms.
- the monovalent heterocyclic group is, for example, a heterocyclic compound selected from furan, thiophene, thienothiophene, benzothiophene, thiazole, benzothiazole, benzothiadiazole, oxazole, pyrrole, imidazole, pyridine, pyrazine, pyrimidine, pyridazine, and triazine.
- L in the formula (10) is preferably a group represented by the following general formula (11).
- Q is preferably an alkylene group
- the alkylene group as Q is a divalent saturated hydrocarbon group represented by the formula: —C n H 2n — (where n is an integer of 1 or more).
- the alkylene group preferably has 1 to 12 carbon atoms, more preferably 1 to 6 carbon atoms.
- the alkylene group is selected from, for example, a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, and a hexylene group.
- a part or all of the hydrogen atoms of the alkylene group may be substituted with a halogen atom, and this halogen atom is preferably a fluorine atom.
- the divalent aromatic hydrocarbon group as Q is a residue obtained by removing two hydrogen atoms from benzene or a condensed ring compound.
- the aromatic hydrocarbon group usually has 6 to 60 carbon atoms, preferably 6 to 20 carbon atoms.
- Examples of the condensed ring include a naphthalene ring, an anthracene ring, and a fluorene ring.
- the divalent aromatic hydrocarbon group is preferably a residue obtained by removing two hydrogen atoms from benzene.
- the divalent aromatic hydrocarbon group may have a substituent. The carbon number of the divalent aromatic hydrocarbon group does not include the carbon number of the substituent.
- the substituent examples include a halogen atom, a saturated or unsaturated aliphatic hydrocarbon group, an aryl group, an alkoxy group, an aryloxy group, a monovalent heterocyclic group, an amino group, a nitro group, and a cyano group.
- the saturated or unsaturated aliphatic hydrocarbon group may have 1 to 20 carbon atoms
- the aryl group may have 6 to 60 carbon atoms
- the alkoxy group has 1 to 2 carbon atoms. It may be 20, and the aryloxy group may have 7 to 80 carbon atoms.
- the monovalent heterocyclic group is, for example, a heterocyclic compound selected from furan, thiophene, thienothiophene, benzothiophene, thiazole, benzothiazole, benzothiadiazole, oxazole, pyrrole, imidazole, pyridine, pyrazine, pyrimidine, pyridazine, and triazine. Is a residue obtained by removing one hydrogen atom from furan, thiophene, thienothiophene, benzothiophene, thiazole, benzothiazole, benzothiadiazole, oxazole, pyrrole, imidazole, pyridine, pyrazine, pyrimidine, pyridazine, and triazine. Is a residue obtained by removing one hydrogen atom from furan, thiophene, thienothiophene, benzothiophene, thiazole,
- the divalent heterocyclic group as Q is a residue obtained by removing two hydrogen atoms from a heterocyclic compound, and the carbon number thereof is usually 3 to 60, preferably 3 to 20.
- the heterocyclic compound is selected from, for example, thiophene, thienothiophene, dithienothiophene, pyrrole, pyridine, pyrimidine, pyrazine and triazine.
- the divalent heterocyclic group is preferably a residue obtained by removing two hydrogen atoms from thiophene or thienothiophene.
- the divalent heterocyclic group may have a substituent, and the carbon number of the divalent heterocyclic group does not include the carbon number of the substituent.
- the substituent examples include a halogen atom, a saturated or unsaturated aliphatic hydrocarbon group, an aryl group, an alkoxy group, an aryloxy group, a monovalent heterocyclic group, an amino group, a nitro group, and a cyano group.
- the saturated or unsaturated aliphatic hydrocarbon group may have 1 to 20 carbon atoms
- the aryl group may have 6 to 60 carbon atoms
- the alkoxy group has 1 to 2 carbon atoms. It may be 20, and the aryloxy group may have 7 to 80 carbon atoms.
- the monovalent heterocyclic group is, for example, a heterocyclic compound selected from furan, thiophene, thienothiophene, benzothiophene, thiazole, benzothiazole, benzothiadiazole, oxazole, pyrrole, imidazole, pyridine, pyrazine, pyrimidine, pyridazine, and triazine. Is a residue obtained by removing one hydrogen atom from furan, thiophene, thienothiophene, benzothiophene, thiazole, benzothiazole, benzothiadiazole, oxazole, pyrrole, imidazole, pyridine, pyrazine, pyrimidine, pyridazine, and triazine. Is a residue obtained by removing one hydrogen atom from furan, thiophene, thienothiophene, benzothiophene, thiazole,
- Suitable examples of the acceptor compound according to this embodiment are compounds represented by the following general formula (a), (b), (c), (d), (e), (f), or (g). is there.
- L and T in the formulas (a), (b), (c), (d), (e), (f) and (g) are synonymous with L and T in the formula (10).
- a plurality of L and T in the same molecule may be the same or different. Two or more of the plurality of T are acceptor groups.
- the acceptor compound is particularly preferably a compound represented by the following formula (h), (i) or (j), since the charge transporting property is high and the stability is excellent.
- X represents a single bond or — (Q) q —
- Q and q have the same meanings as Q and q in the formula (11), and in the same molecule
- a plurality of Q and q may be the same or different.
- Ac represents an acceptor group, a hydrogen atom, or a phenyl group, and a plurality of Ac in the same molecule may be the same or different, and two or more of the plurality of Ac in the same molecule are acceptor groups.
- the acceptor compound according to the present embodiment can be produced by the method of Scheme A or Scheme B described below.
- the acceptor compound (54) is produced using the compound (50), the compound (51) and the compound (53) as monomers.
- Q, Ac, and q are synonymous with Q, Ac, and q in formulas (h), (i), and (j).
- Td represents a core part
- h is the number of binding sites of the core part, and represents an integer of 4 or more.
- V and W each independently represent an active functional group that reacts and binds to each other. When there are a plurality of V, they may be the same or different.
- the acceptor compound (58) is produced using the compound (56) and the compound (55) as monomers.
- the core part of the acceptor compound (58) is a tetravalent or higher group derived from silsesquioxane.
- R ' represents a hydrogen atom or an alkyl group, and a plurality of R's may be the same or different.
- the reaction for generating a chemical bond from the active functional group V and the active functional group W is, for example, a Suzuki coupling reaction, a Grignard reaction, a Stille reaction, or a dehalogenation reaction.
- a Suzuki coupling reaction a Grignard reaction
- a Stille reaction a reaction for generating a chemical bond from the active functional group V and the active functional group W
- a dehalogenation reaction a reaction for a chemical bond from the active functional group V and the active functional group W.
- the Suzuki coupling reaction and the Stille reaction are preferable because the raw materials are easily available and the reaction operation is simple.
- the Suzuki coupling reaction uses, for example, palladium [tetrakis (triphenylphosphine)] or palladium acetate as a catalyst, an inorganic base such as potassium carbonate, sodium carbonate and barium hydroxide, an organic base such as triethylamine, or cesium fluoride.
- the inorganic salt is used in an amount of not less than the equivalent, preferably 1 to 10 equivalents, based on the monomer.
- the reaction may be performed in a two-phase system using an aqueous solution of an inorganic salt.
- the solvent is selected from, for example, N, N-dimethylformamide (hereinafter referred to as “DMF”), toluene, dimethoxyethane, and tetrahydrofuran.
- the reaction temperature is preferably 50 to 160 ° C. depending on the solvent used. The temperature may be raised to near the boiling point of the solvent and refluxed.
- the reaction time is usually 1 to 200 hours.
- the Suzuki coupling reaction is described, for example, in Chemical Review (Chem. Rev.), 95, 2457 (1995).
- the Stille reaction is performed, for example, using palladium [tetrakis (triphenylphosphine)] or palladium acetate as a catalyst and using an organic tin compound as a monomer.
- the solvent is selected from, for example, DMF, toluene, dimethoxyethane, and tetrahydrofuran.
- the reaction temperature depends on the solvent used, but is preferably 50 to 160 ° C. The temperature may be raised to near the boiling point of the solvent and refluxed.
- the reaction time is usually 1 to 200 hours.
- V and W are, for example, halogen atoms, alkyl sulfonate groups, aryl sulfonate groups, aryl alkyl sulfonate groups, boric acid ester residues, sulfonium methyl groups, phosphonium methyl groups, phosphonate methyl groups, monohalogenated methyl groups, boric acid residues.
- the combination of V and W is selected according to the reaction used.
- boric acid ester residue examples include groups represented by the following formula (300), (301), (302) or (303).
- the combination of V and W is preferably a combination of a halogen atom and a boric acid ester residue or a boric acid residue.
- the combination of V and W is preferably a combination of a halogen atom and an alkylstannyl group.
- the functional group in the monomer is protected by a protecting group as necessary.
- This protecting group is selected according to the site to be protected and the reaction used.
- Protective groups described in Protective Groupes in Organic Syntehesis, 3rd ed. T.W. GreeneandP.G. M .. Wuts, 1999 John Willey & Sons, Inc. are preferred.
- a trialkylsilyl group such as a trimethylsilyl group, a triethylsilyl group, a tert-butyldimethylsilyl group, an aryldialkylsilyl group such as a biphenyldimethylsilyl group, a 2-hydroxypropyl group, etc.
- a trimethylsilyl group is particularly preferred.
- the monomer to be reacted is dissolved in an organic solvent as necessary. If necessary, the reaction can be carried out using an alkali or a suitable catalyst at a melting point or higher and a boiling point or lower of the organic solvent. It is preferable that the alkali or the catalyst is sufficiently soluble in the solvent used for the reaction.
- the organic solvent varies depending on the compound used and the reaction, it is generally preferable that a sufficient deoxygenation treatment is performed in order to suppress side reactions.
- the reaction is preferably allowed to proceed under an inert atmosphere.
- this is not the case in the case of a reaction in a two-phase system of an aqueous layer and an organic layer such as a Suzuki coupling reaction.
- Solvents used in the reaction are, for example, saturated hydrocarbons such as pentane, hexane, heptane, octane and cyclohexane, unsaturated hydrocarbons such as benzene, toluene, ethylbenzene and xylene, carbon tetrachloride, chloroform, dichloromethane, chlorobutane, bromobutane, Halogenated saturated hydrocarbons such as chloropentane, bromopentane, chlorohexane, bromohexane, chlorocyclohexane and bromocyclohexane, halogenated unsaturated hydrocarbons such as chlorobenzene, dichlorobenzene and trichlorobenzene, methanol, ethanol, propanol, isopropanol, butanol And alcohols such as tert-butyl alcohol, carboxylic acids such as formic acid, ace
- the acceptor compound according to this embodiment When the acceptor compound according to this embodiment is used as a material for an organic thin film element, the purity may affect the element characteristics. Therefore, it is preferable to purify the monomer before the reaction by a method such as distillation, sublimation purification, and recrystallization. After the synthesis of the acceptor compound, purification by a method such as sublimation purification, recrystallization, reprecipitation purification, or fractionation by chromatography is also preferred.
- the product can be obtained by usual operations such as, for example, stopping the reaction with water and then extracting with an organic solvent and distilling off the solvent.
- the isolation and purification of the product can be performed by a method such as fractionation by chromatography or recrystallization.
- Organic Thin Film contains one or more acceptor compounds according to the preferred embodiments described above.
- the thickness of the organic thin film is preferably 1 nm to 100 ⁇ m, more preferably 2 nm to 1000 nm, still more preferably 5 nm to 500 nm, and particularly preferably 20 nm to 200 nm.
- the organic thin film is different from the acceptor compound of the present invention in addition to the acceptor compound according to the present embodiment. It may contain a molecular compound (hereinafter referred to as “electron transporting material”), a low molecular compound having a hole transporting property or a high molecular compound (hereinafter referred to as “hole transporting material”).
- electron transporting material a molecular compound having a hole transporting property
- hole transporting material a high molecular compound
- the hole transporting material can be selected from known materials.
- pyrazoline derivatives arylamine derivatives, stilbene derivatives, triaryldiamine derivatives, oligothiophene and derivatives thereof, polyvinylcarbazole and derivatives thereof, polysilane and derivatives thereof, polysiloxane derivatives having an aromatic amine structure in the side chain or main chain
- examples include polyaniline and derivatives thereof, polythiophene and derivatives thereof, polypyrrole and derivatives thereof, polyarylene vinylene and derivatives thereof, and polythienylene vinylene and derivatives thereof.
- the electron transporting material can also be selected from known materials. For example, oxadiazole derivatives, anthraquinodimethane and its derivatives, benzoquinone and its derivatives, naphthoquinone and its derivatives, anthraquinone and its derivatives, tetracyanoanthraquinodimethane and its derivatives, fluorenone derivatives, diphenyldicyanoethylene and its derivatives, diphenoquinone derivatives, metal complexes of 8-hydroxyquinoline and its derivatives, polyquinoline and its derivatives, polyquinoxaline and its derivatives, polyfluorene and its derivatives, fullerenes and derivatives thereof such as C 60.
- oxadiazole derivatives anthraquinodimethane and its derivatives
- benzoquinone and its derivatives naphthoquinone and its derivatives
- anthraquinone and its derivatives tetracyanoanthraquinodimethane and
- the organic thin film may contain a charge generation material in order to generate a charge by light absorbed in the organic thin film.
- the charge generation material can be selected from known materials. For example, azo compounds and derivatives thereof, diazo compounds and derivatives thereof, metal-free phthalocyanine compounds and derivatives thereof, metal phthalocyanine compounds and derivatives thereof, perylene compounds and derivatives thereof, polycyclic quinone compounds and derivatives thereof, squarylium compounds and derivatives thereof, azulenium compounds and their derivatives, thiapyrylium compounds and their derivatives, fullerenes and derivatives thereof such as C 60.
- the organic thin film may contain other materials necessary for developing various functions.
- Other materials include, for example, a sensitizer for sensitizing the function of generating charge by absorbed light, a stabilizer for increasing stability, and a UV absorber for absorbing ultraviolet (UV) light. Etc.
- the organic thin film may contain a polymer material other than the acceptor compound according to the present embodiment as a polymer binder in order to enhance its mechanical properties.
- a polymer binder those not extremely disturbing the charge transporting property are preferable, and those not strongly absorbing visible light are preferably used.
- polymer binder examples include poly (N-vinylcarbazole), polyaniline and derivatives thereof, polythiophene and derivatives thereof, poly (p-phenylene vinylene) and derivatives thereof, poly (2,5-thienylene vinylene) and derivatives thereof, Examples include polycarbonate, polyacrylate, polymethyl acrylate, polymethyl methacrylate, polystyrene, polyvinyl chloride, and polysiloxane.
- the organic thin film according to the present embodiment includes, for example, a solution containing the acceptor compound according to the present embodiment, other materials such as an electron transport material, a hole transport material, and a polymer binder as necessary, and a solvent. Can be produced by a method of removing the solvent from the film-formed solution.
- an organic thin film can be formed by a vacuum deposition method.
- the solvent of the above solution only needs to dissolve the acceptor compound and other materials.
- unsaturated hydrocarbon solvents such as toluene, xylene, mesitylene, tetralin, decalin, bicyclohexyl, n-butylbenzene, sec-butylbenzene and tert-butylbenzene, carbon tetrachloride, chloroform, dichloromethane, dichloroethane, chlorobutane, Halogenated saturated hydrocarbon solvents such as bromobutane, chloropentane, bromopentane, chlorohexane, bromohexane, chlorocyclohexane and bromocyclohexane, halogenated unsaturated hydrocarbon solvents such as chlorobenzene, dichlorobenzene and trichlorobenzene, and tetrahydrofuran
- ether solvents such as tetrahydropyran can be used.
- film forming methods using a solution examples include spin coating, casting, micro gravure coating, gravure coating, bar coating, roll coating, wire bar coating, dip coating, spray coating, and screen printing.
- Application methods such as flexographic printing, offset printing, ink jet printing, dispenser printing, nozzle coating, and capillary coating can be used. Of these, spin coating, flexographic printing, ink jet printing, dispenser printing, nozzle coating, and capillary coating are preferred.
- the method for producing the organic thin film may include a step of orienting the acceptor compound. By this step, the main chain and / or the side chain are arranged along a certain direction, and the charge mobility of the organic thin film is further improved.
- a method for aligning the acceptor compound a method known as a liquid crystal alignment method can be used.
- the rubbing method, the photo-alignment method, the sharing method (shear stress application method) and the pulling coating method are simple, useful and easy to use as the alignment method.
- the rubbing method and the sharing method are preferable.
- the method for producing the organic thin film may include a step of annealing the thin film after removing the solvent. Annealing promotes the interaction between the acceptor compounds, improves the film quality of the organic thin film, and further improves the charge mobility.
- the annealing temperature is preferably a temperature between 50 ° C. and the vicinity of the glass transition temperature (Tg) of the acceptor compound, and more preferably a temperature between (Tg ⁇ 30 ° C.) and Tg.
- the annealing time is preferably 1 minute to 10 hours, and more preferably 10 minutes to 1 hour.
- the atmosphere for annealing is preferably in a vacuum or an inert gas atmosphere.
- the organic thin film of this embodiment has a charge transporting property, it can control various charges such as an organic thin film transistor, an organic thin film solar cell, and a photosensor by controlling the transport of a charge injected from an electrode or a charge generated by light absorption. It can be used for the organic thin film element.
- an organic thin film is used for these organic thin film elements, it is more preferable to align the acceptor compound by an alignment treatment because high charge transport properties can be obtained.
- Organic Thin Film Element The organic thin film according to the preferred embodiment described above has an excellent charge transport property because it includes the acceptor compound according to the present embodiment. Therefore, this organic thin film can efficiently transport charges injected from electrodes or the like, or charges generated by light absorption. Since the acceptor compound according to the present embodiment is excellent in environmental stability, it is possible to obtain an organic thin film element whose performance is stable even in normal air by forming a thin film using these compounds. Is possible.
- preferred embodiments of various organic thin film elements will be described.
- the organic thin film transistor includes a source electrode and a drain electrode, an active layer that functions as a current path between them, and a gate electrode that controls the amount of current passing through the current path.
- Examples of the organic thin film transistor include a field effect type and an electrostatic induction type.
- As the active layer an organic thin film containing the acceptor compound according to the above-described embodiment is used.
- a field-effect organic thin film transistor includes a source electrode and a drain electrode, an active layer that is a current path provided between them, a gate electrode that controls the amount of current passing through the current path, and between the organic thin film and the gate electrode. It is preferable to provide an insulating layer. It is preferable that a source electrode and a drain electrode are provided in contact with the organic thin film, and a gate electrode is provided with an insulating layer in contact with the organic thin film interposed therebetween.
- An electrostatic induction type organic thin film transistor includes a source electrode and a drain electrode, an active layer that is a current path provided therebetween, and a gate electrode that controls the amount of current passing through the current path, and the gate electrode is organic It is preferable to be provided in the thin film. It is preferable that the source electrode, the drain electrode, and the gate electrode are provided in contact with the active layer.
- the gate electrode only needs to have a structure in which a current path flowing from the source electrode to the drain electrode is formed and the amount of current flowing through the current path can be controlled by a voltage applied to the gate electrode.
- the gate electrode is, for example, a comb electrode.
- FIG. 1 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a first embodiment.
- An organic thin film transistor 100 shown in FIG. 1 includes a substrate 1, a source electrode 5 and a drain electrode 6 formed on the substrate 1 with a predetermined interval, and a source electrode 5 and a drain electrode 6 so as to cover the substrate 1. Formed on the insulating layer 3 so as to cover the region of the insulating layer 3 between the source electrode 5 and the drain electrode 6, the insulating layer 3 formed on the active layer 2, and the insulating layer 3 formed between the source electrode 5 and the drain electrode 6.
- FIG. 2 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a second embodiment.
- An organic thin film transistor 110 shown in FIG. 2 includes a substrate 1, a source electrode 5 formed on the substrate 1, an active layer 2 formed on the substrate 1 so as to cover the source electrode 5, a source electrode 5 and a predetermined electrode.
- the drain electrode 6 formed on the active layer 2 with an interval of the insulating layer 3 formed on the active layer 2 and the drain electrode 6, and the insulating layer 3 between the source electrode 5 and the drain electrode 6.
- a gate electrode 4 formed on the insulating layer 3 so as to cover the region.
- FIG. 3 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a third embodiment.
- the organic thin film transistor 120 shown in FIG. 3 includes a substrate 1, an active layer 2 formed on the substrate 1, a source electrode 5 and a drain electrode 6 formed on the active layer 2 at a predetermined interval, and a source electrode. 5 and the drain electrode 6 so as to partially cover the insulating layer 3 formed on the active layer 2, the region of the insulating layer 3 where the source electrode 5 is formed below, and the drain electrode 6 are formed below.
- a gate electrode 4 formed on the insulating layer 3 so as to partially cover the region of the insulating layer 3.
- FIG. 4 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a fourth embodiment.
- 4 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- an active layer 2 formed on the insulating layer 3 so as to cover it.
- FIG. 5 is a schematic cross-sectional view of an organic thin film transistor (field effect type organic thin film transistor) according to a fifth embodiment.
- An organic thin film transistor 140 shown in FIG. 5 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- a source electrode 5 formed on the insulating layer 3 so as to partially cover the region of the insulating layer 3 formed on the active layer 2 and an active layer 2 formed on the insulating layer 3 so as to partially cover the source electrode 5.
- a source electrode 5 and a drain electrode 6 formed on the insulating layer 3 at a predetermined interval so as to partially cover a region of the active layer 2 formed below the gate electrode 4.
- FIG. 6 is a schematic cross-sectional view of an organic thin film transistor (field effect type organic thin film transistor) according to a sixth embodiment.
- An organic thin film transistor 150 shown in FIG. 6 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- the active layer 2 is formed on the insulating layer 3 so as to partially cover the region of the active layer 2 formed under the active layer 2 and the gate electrode 4 formed below.
- a source electrode 5 and a drain electrode 6 formed on the insulating layer 3 at a predetermined interval so as to partially cover the region of the active layer 2 where the gate electrode 4 is formed below. .
- FIG. 7 is a schematic cross-sectional view of an organic thin film transistor (electrostatic induction type organic thin film transistor) according to a seventh embodiment.
- the organic thin film transistor 160 shown in FIG. 7 includes a substrate 1, a source electrode 5 formed on the substrate 1, an active layer 2 formed on the source electrode 5, and a plurality on the active layer 2 at a predetermined interval.
- a drain electrode 6 formed on the active layer 2a.
- the active layer 2 and / or the active layer 2a contains the acceptor compound according to the present embodiment, and a current path (channel) between the source electrode 5 and the drain electrode 6 is obtained. ).
- the gate electrode 4 controls the amount of current passing through the current path (channel) in the active layer 2 and / or the active layer 2a by applying a voltage.
- Such a field effect organic thin film transistor can be produced by a known method, for example, a method described in JP-A-5-110069.
- the electrostatic induction organic thin film transistor can be produced by a known method, for example, a method described in JP-A-2004-006476.
- the substrate 1 is selected so as not to disturb the characteristics as an organic thin film transistor.
- a glass substrate, a flexible film substrate, or a plastic substrate can be used as the substrate 1.
- the insulating layer 3 can be formed from a material selected from known insulating materials. For example, SiOx, SiNx, Ta 2 O 5, polyimide, polyvinyl alcohol, polyvinyl phenol, organic glass and photoresists. Since the voltage can be lowered, it is preferable to form the insulating layer 3 using a material having a high dielectric constant.
- the surface of the insulating layer 3 is treated with a surface treatment agent such as a silane coupling agent in order to improve the interface characteristics between the insulating layer 3 and the active layer 2. It is also possible to form the active layer 2 after the modification.
- a surface treatment agent such as a silane coupling agent
- the surface treatment agent include silylamine compounds such as long-chain alkylchlorosilanes, long-chain alkylalkoxysilanes, fluorinated alkylchlorosilanes, fluorinated alkylalkoxysilanes, and hexamethyldisilazane.
- the surface of the insulating layer can be treated with ozone UV or O 2 plasma.
- an organic thin-film transistor is interrupted
- Examples of the method for forming the protective film include a method of covering with a UV curable resin, a thermosetting resin, or an inorganic SiONx film.
- a method of covering with a UV curable resin, a thermosetting resin, or an inorganic SiONx film In order to effectively cut off from the atmosphere, it is preferable to perform the steps from the preparation of the organic thin film transistor to the formation of the protective film without exposure to the atmosphere (for example, in a dry nitrogen atmosphere or in a vacuum).
- An organic thin film transistor array can be formed by integrating a plurality of organic thin film transistors, and can also be used as a backplane of a flat panel display.
- FIG. 8 is a schematic cross-sectional view of an organic thin-film solar cell according to a preferred embodiment.
- An organic thin film solar cell 200 shown in FIG. 8 is formed on the substrate 1, the first electrode 7a formed on the substrate 1, the active layer 2 formed on the first electrode 7a, and the active layer 2.
- the active layer 2 is an organic thin film containing the acceptor compound according to the present embodiment.
- At least one of the first electrode 7a and the second electrode 7b is a transparent or translucent electrode.
- a metal such as aluminum, gold, silver, copper, alkali metal, alkaline earth metal, or a translucent film or a transparent conductive film thereof can be used.
- each electrode is preferably selected so that the difference in work function is large.
- the active layer 2 may contain a charge generating agent, a sensitizer and the like in order to increase photosensitivity.
- the substrate 1 a silicon substrate, a glass substrate, a plastic substrate, or the like can be used.
- the operation mechanism of the organic thin film solar cell will be described.
- Light energy incident from a transparent or translucent electrode is absorbed by the acceptor compound and / or donor compound, and excitons in which electrons and holes are combined are generated.
- excitons When the generated excitons move and reach the heterojunction interface where the acceptor compound and the donor compound are adjacent to each other, electrons and holes are separated due to the difference in HOMO and LUMO energy of each compound at the interface.
- the generated electrons can be taken out as electrical energy (current) by moving to the cathode and the generated holes to the anode.
- organic thin-film solar cells in order to obtain an organic thin film solar cell with high photoelectric conversion efficiency, an acceptor compound and / or a donor having an absorption region capable of efficiently absorbing a spectrum of desired incident light. It is important that organic thin-film solar cells contain many heterojunction interfaces in order to efficiently separate excitons, and that materials that have charge transportability to quickly transport generated charges to the electrode are important in order to efficiently separate excitons. is there.
- an additional layer may be provided between at least one of the first electrode 7a and the second electrode 7b and the active layer 2 in the element.
- the additional layer include a charge transport layer that transports charges, and a buffer layer that separates the electrode from the organic layer.
- the organic layer having a buffer layer between the active layer 2 containing the acceptor compound and the donor compound and one or both of the pair of electrodes.
- Thin film solar cells are preferred.
- An organic thin film solar cell can be operated as a solar cell by generating a photovoltaic force between the electrodes by irradiating light such as sunlight from a transparent or translucent electrode.
- An organic thin film solar cell module can be constituted by integrating a plurality of organic thin film solar cells.
- FIG. 9 is a schematic cross-sectional view of the photosensor according to the first embodiment.
- An optical sensor 300 shown in FIG. 9 is formed on the substrate 1, the first electrode 7a formed on the substrate 1, the active layer 2 formed on the first electrode 7a, and the active layer 2.
- the charge generation layer 8 and a second electrode 7b formed on the charge generation layer 8 are provided.
- the active layer 2 is an organic thin film containing the acceptor compound according to the present embodiment.
- FIG. 10 is a schematic cross-sectional view of an optical sensor according to the second embodiment.
- An optical sensor 310 illustrated in FIG. 10 is formed on the substrate 1, the first electrode 7a formed on the substrate 1, the charge generation layer 8 formed on the first electrode 7a, and the charge generation layer 8.
- the active layer 2 is an organic thin film containing the acceptor compound according to the present embodiment.
- An optical sensor including an organic thin film according to the present embodiment can operate as an optical sensor by irradiating light from a transparent or translucent electrode with a voltage applied between the electrodes, thereby causing a photocurrent to flow.
- An image sensor can be configured by integrating a plurality of optical sensors.
- FIG. 11 is a schematic cross-sectional view of an optical sensor according to the third embodiment.
- An optical sensor 320 shown in FIG. 11 is formed on the substrate 1, the first electrode 7a formed on the substrate 1, the active layer 2 formed on the first electrode 7a, and the active layer 2. And a second electrode 7b.
- the active layer 2 is an organic thin film containing the acceptor compound according to the present embodiment.
- one of the first electrode 7a and the second electrode 7b is a transparent or translucent electrode.
- the charge generation layer 8 is a layer that absorbs light and generates charges.
- an electrode material a metal such as aluminum, gold, silver, copper, alkali metal, alkaline earth metal, or a translucent film or a transparent conductive film thereof can be used.
- the active layer 2 may contain a carrier generating agent, a sensitizer and the like in order to increase photosensitivity.
- the substrate 1 a silicon substrate, a glass substrate, a plastic substrate, or the like can be used.
- the nuclear magnetic resonance (NMR) spectrum was measured using the product name JMN-270 (270 MHz at 1 H measurement) manufactured by JEOL (JEOL Ltd.) or the product name JMNLA-600 (150 MHz at 13 C measurement) manufactured by the same company. It was measured. Chemical shifts are expressed in parts per million (ppm). Tetramethylsilane (TMS) was used as an internal standard of 0 ppm. Coupling constants (J) are shown in hertz, and the abbreviations s, d, t, q, m and br are respectively singlet, doublet, triplet, four.
- MS Mass spectrometry
- the silica gel used in the column chromatography (GPC) separation was the product name Silicagel 60N (40-50 ⁇ m) manufactured by Kanto Chemical Co., Ltd.
- the product name aluminum oxide 90standardized manufactured by Merck was used for alumina. Is a reagent grade and was purchased from Wako Pure Chemical Industries, Ltd., Tokyo Chemical Industry Co., Ltd., Kanto Chemical Co., Ltd., Nacalai Tesque Co., Ltd., or Sigma Aldrich Japan Co., Ltd.
- Cyclic voltammetry (hereinafter referred to as “CV”) was measured using an apparatus manufactured by BAS, using a Pt electrode manufactured by BAS as a working electrode, a Pt line as a counter electrode, and an Ag line as a reference electrode. During this measurement, the sweep speed was 100 mV / second, and the scanning potential region was ⁇ 2.8 V to 1.6 V. The reduction potential and oxidation potential were measured by completely dissolving 1 ⁇ 10 ⁇ 3 mol / L of the compound to be measured and 0.1 mol / L of tetrabutylammonium hexafluorophosphate as a supporting electrolyte in methylene chloride. This was done using the solution.
- the absorption spectrum of the solution was measured using a self-recording spectrophotometer (UV-3100PC: manufactured by Shimadzu Corporation) under the conditions of a quartz cell having a cell width of 1 cm and a slit width of 1 mm.
- the fluorescence spectrum of the solution was measured using a fluorescence spectrophotometer (FluoroMax-2: manufactured by Horiba, Ltd.) and using a photomultiplier tube (R928: manufactured by Hamamatsu Photonics) as a detector.
- the fluorescence spectrum was measured under the conditions that the solution was put in a quartz cell and the slit width was 1 mm and the integration time (1 nm / second).
- Example 1 Synthesis of Compound B> Compound A used as a raw material was synthesized according to the method described in Toshifumi Dohi et al. J. Org. Chem. 2007, 72, 109.
- Example 2 ⁇ Synthesis of Compound D> A test tube with a lid is charged with perylene-3,4,9,10-tetracarboxylic dianhydride (550 mg, 1.40 mmol), ethylhexylamine (435 mg, 3.37 mmol), and DMF (10 mL). Stir overnight at ° C. The obtained product was washed with hexane and then purified with a silica gel column (chloroform) to obtain a red solid compound D (542 mg, yield 63%). The analysis results and structural formula of Compound D are as follows. 1 H NMR (400 MHz, CDCl 3 ): ⁇ 0.91 (m), 1.41 (m), 4.13 (m), 8.45 (d, 4H), 8.57 (d, 4H)
- Example 3 Synthesis of Compound H> Compound G used as a raw material was synthesized according to the method described in Yutaka Ie et al. Chem. Comm. 2009, 10, 1213.
- Example 4 Synthesis of Compound L> Compound K used as a raw material was synthesized by the method described in Lyle D. Wescott and Daniell Lewis Mattern, J. Org. Chem. 2003, 68, 10058.
- Example 5 Synthesis of Compound O> Compound N used as a raw material was synthesized according to the method described in Michael R. Wasielewski et al. J. Am. Chem. Soc. 2000, 122, 5563.
- Example 6 Preparation of Organic Thin Film Element 1 and Evaluation of Transistor Characteristics> A substrate in which a 300 nm silicon oxide film was formed as an insulating film by thermal oxidation on the surface of a heavily doped p-type silicon substrate as a gate electrode was prepared. On this substrate, comb-shaped source and drain electrodes having a channel width of 38 mm and a channel length of 25 ⁇ m were formed by a lift-off method. The obtained substrate with electrodes was ultrasonically cleaned with acetone for 10 minutes and then with isopropyl alcohol for 10 minutes, and then irradiated with ozone UV for 30 minutes to clean the surface of the substrate.
- Example 1 Compound C synthesized in Example 1 was dissolved in chloroform at a concentration of 1% by mass. Compound C was completely dissolved in chloroform, and thus it was confirmed that it could be dissolved in an organic solvent. This solution was applied onto the washed substrate by spin coating at a rotational speed of 1500 rpm for 1 minute and dried to form an organic thin film of Compound C. Thereafter, an annealing process was performed in nitrogen at 200 ° C. for 30 minutes to obtain an organic thin film element 1.
- the gate voltage Vg and the source-drain voltage Vsd are varied in the range of 0 to 80 V in vacuum, and the organic thin film element 1 is organic
- the gate voltage Vg and the source-drain voltage Vsd are varied in the range of 0 to 80 V in vacuum, and the organic thin film element 1 is organic
- Mobility at this time was 1.2 ⁇ 10 -4 cm 2 / Vs
- the threshold voltage is 59V
- the on / off ratio was 10 5
- the organic thin film element 1 functions effectively as an n-type organic transistor.
- the compound C can be used as an organic n-type semiconductor having excellent electron transport properties.
- Example 7 Preparation of organic thin film element 2 and evaluation of solar cell characteristics>
- a regioregular poly-3-hexylthiophene as a donor compound and compound C as an acceptor compound are mixed in a 1: 1 ratio (mass ratio) and dissolved in a chloroform solvent to prepare a coating solution.
- a glass substrate provided with an ITO film by sputtering is surface-treated with ozone UV, and then the coating solution is applied on the surface-treated substrate by spin coating to obtain an active layer of an organic thin-film solar cell. Thereafter, lithium fluoride is deposited on the active layer and then aluminum is deposited on the lithium fluoride layer by vacuum deposition to produce the organic thin film element 2.
- the organic thin film element 2 operates as a solar cell when the characteristics of the organic thin film solar cell are measured under light irradiation by a solar simulator (AM1.5G filter, irradiance 100 mW / cm 2 ).
- Example 8 Preparation of Organic Thin Film Element 3 and Evaluation of Transistor Characteristics>
- compound P synthesized in Example 5 was added to chloroform at a concentration of 1% by mass, compound P was completely dissolved in chloroform, so that it could be confirmed that it could be dissolved in an organic solvent.
- An organic thin film element 3 was produced in the same manner as in Example 6 except that the solution thus obtained was used instead of the chloroform solution of Compound C. Next, the organic transistor characteristics of the organic thin film element 3 were measured in the same manner as in Example 6. As a result, good Id-Vg characteristics of the n-type semiconductor were obtained.
- the mobility was 1.1 ⁇ 10 ⁇ 4 cm 2 / Vs
- the threshold voltage was 14 V
- the on / off ratio was 10 7 , both of which were favorable. From this, it was confirmed that the organic thin film element 3 functions effectively as an n-type organic transistor. In addition, it was confirmed that the compound P can be used as an organic n-type semiconductor having excellent electron transport properties.
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Abstract
La présente invention concerne un composé comprenant : une partie formant cœur, laquelle est un groupe tétravalent ou supérieur dérivé d'un composé cage ou d'un composé hydrocarbure aliphatique ; et au moins quatre groupes à chaînes latérales liés à la partie formant cœur, au moins deux des groupes à chaînes latérales ayant un groupe accepteur.
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CN105085756A (zh) * | 2014-05-20 | 2015-11-25 | 华东师范大学 | 一种含苝酰亚胺的共轭聚乙炔及其制备方法 |
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JP6534034B2 (ja) * | 2014-05-14 | 2019-06-26 | 学校法人神奈川大学 | 硬化性組成物、並びにそれを用いた硬化物の製造方法及びその再溶解方法 |
WO2017057747A1 (fr) * | 2015-09-30 | 2017-04-06 | 富士フイルム株式会社 | Composition pour la formation de film semi-conducteur organique, composé, film semi-conducteur organique, et élément semi-conducteur organique |
CN106632412B (zh) * | 2016-12-27 | 2019-05-03 | 武汉工程大学 | 一种苝酰亚胺类化合物及其制备方法和应用 |
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CN104045657A (zh) * | 2013-03-14 | 2014-09-17 | 中国科学院化学研究所 | 五元杂环衍生物桥联的苝二酰亚胺二聚体、其制备方法及其在有机光伏器件中的应用 |
CN105085756A (zh) * | 2014-05-20 | 2015-11-25 | 华东师范大学 | 一种含苝酰亚胺的共轭聚乙炔及其制备方法 |
CN105085756B (zh) * | 2014-05-20 | 2017-12-22 | 华东师范大学 | 一种含苝酰亚胺的共轭聚乙炔及其制备方法 |
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