WO2012105393A1 - Dispositif d'exposition, dispositif d'affichage à cristaux liquides ainsi que leur procédé de fabrication - Google Patents

Dispositif d'exposition, dispositif d'affichage à cristaux liquides ainsi que leur procédé de fabrication Download PDF

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Publication number
WO2012105393A1
WO2012105393A1 PCT/JP2012/051588 JP2012051588W WO2012105393A1 WO 2012105393 A1 WO2012105393 A1 WO 2012105393A1 JP 2012051588 W JP2012051588 W JP 2012051588W WO 2012105393 A1 WO2012105393 A1 WO 2012105393A1
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Prior art keywords
exposure
liquid crystal
substrate
photo
crystal display
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PCT/JP2012/051588
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English (en)
Japanese (ja)
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井上　威一郎
宮地　弘一
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シャープ株式会社
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • the present invention relates to an exposure apparatus, a liquid crystal display device, and a manufacturing method thereof. More specifically, the present invention relates to an exposure apparatus suitably used for alignment processing of a photo-alignment film, a liquid crystal display device including the photo-alignment film, and a method for manufacturing the liquid crystal display device.
  • the liquid crystal display device is a display device that can be reduced in weight, thickness, and power consumption, it is widely used for televisions, monitors for personal computers, monitors for portable terminals, and the like.
  • Such a liquid crystal display device usually controls the transmittance of light transmitted through the liquid crystal layer according to the inclination angle of the liquid crystal molecules that changes in accordance with the voltage applied between the pair of substrates (liquid crystal layer). Therefore, the liquid crystal display device has an angle dependency on the transmittance.
  • display defects such as a decrease in contrast and gradation inversion during halftone display may occur depending on the viewing angle (observation) direction. Therefore, in general, the liquid crystal display device has room for improvement in terms of improving viewing angle characteristics.
  • each pixel is divided into two or more regions having different tilt directions of liquid crystal molecules.
  • this technique when a voltage is applied to the liquid crystal layer, the liquid crystal molecules are inclined in different directions within the pixel, so that the viewing angle characteristics can be improved.
  • Each region having a different orientation direction is also called a domain, and orientation division is also called a multi-domain.
  • a multi-domain twisted nematic (TN) mode As the liquid crystal mode in which the alignment division is performed, in the horizontal alignment mode, a multi-domain twisted nematic (TN) mode, a multi-domain birefringence control (ECB) mode, a multi-domain optical compensation birefringence (OCB) (Optically Compensated Birefringence) mode and the like.
  • TN multi-domain twisted nematic
  • ECB multi-domain birefringence control
  • OCB optical compensation birefringence
  • Examples of the method for performing the alignment division include a rubbing method and a photo-alignment method (see, for example, Patent Documents 1, 2, and 5).
  • a rubbing method a method of rubbing the alignment film in a state where the rubbing region and the non-rubbing region are separated by a patterned resist has been proposed.
  • the alignment treatment is performed by rubbing the surface of the alignment film with a cloth wound around a roller. Therefore, in the rubbing method, dust such as cloth hairs or scraped pieces may be generated, or switching elements may be damaged due to static electricity, characteristic shift, deterioration, etc., and there is room for further improvement. It was.
  • the photo-alignment method uses a photo-alignment film as the alignment film, and irradiates (exposures) light such as ultraviolet rays to the photo-alignment film, thereby generating an alignment regulating force in the alignment film and / or This is an alignment method for changing the alignment regulation direction. Therefore, the photo-alignment method can perform the alignment treatment of the alignment film in a non-contact manner, and can suppress the occurrence of dirt, dust, etc. during the alignment treatment. Further, by using a photomask at the time of exposure, light irradiation can be performed under different conditions on a desired region in the alignment film surface. Therefore, a domain having a desired design can be easily formed.
  • This method includes an exposure step of dividing the substrate surface into two or more exposure regions and exposing the alignment film via a photomask for each exposure region, and the exposure step includes a part of the adjacent exposure region. The exposure is performed so as to overlap, and the photomask has a halftone portion corresponding to the overlapping exposure region.
  • a method for performing alignment division using the photo-alignment method will be specifically described.
  • a method for manufacturing a liquid crystal display panel in a 4-domain VATN mode (hereinafter also referred to as a 4VATN mode) is described as an example.
  • an alignment processing method for a 4VATN mode substrate will be described. In this manufacturing method, an alignment process is performed by dividing the substrate into a plurality of regions using a scanning exposure apparatus.
  • Scanning exposure apparatus 130 used in the above manufacturing method is a one-stage scanning exposure apparatus, as shown in FIGS. 22 and 23, and includes an exposure stage 132 including a plurality of exposure heads 131 and a mother glass substrate 110. And a table 133 that is placed and moved in a predetermined direction. A plurality of panel regions 111 are provided on the mother glass substrate 110.
  • the plurality of exposure heads 131 are arranged at intervals in a direction b1 perpendicular to the moving direction (scanning direction) a1 of the substrate 110.
  • Each exposure head 131 is supported so as to be movable in a direction b ⁇ b> 1 within a plane parallel to the irradiated surface of the substrate 110.
  • Each exposure head 131 includes an ultraviolet light source 134 that emits ultraviolet light, a photomask 150, and an optical member (not shown) such as a polarizing filter and an optical lens provided between the light source 134 and the photomask 150.
  • the surface of the substrate 110 can be irradiated with polarized ultraviolet rays through the mask 150 at a predetermined irradiation angle (for example, 40 °).
  • the mask 150 is, for example, a plate-like member, and as shown in FIG. 24, a transparent substrate formed using quartz glass or the like, a light shielding portion 152 formed in a stripe pattern on the surface of the transparent substrate, and a plurality of light shielding portions 152.
  • Light-transmitting portion 151 Each translucent part 151 is longitudinal, and the plurality of translucent parts 151 are arranged in the direction b1 at a predetermined pitch. The pitch is set equal to the picture element pitch. In addition, the dimension in the pitch direction of the translucent portion 151 is set to be approximately a half of the pixel pitch.
  • the mask 150 includes a central region 153 and an overlap region 154 as shown in FIG.
  • the length of the light transmitting portion 156 provided in the overlap region 154 gradually decreases as the distance from the central region 153 increases.
  • the aperture ratio of the light transmitting portion 156 gradually decreases as the distance from the central region 153 increases. In this way, the aperture ratio of the light transmitting portion 156 is smaller than the aperture ratio of the light transmitting portion 155 provided in the central region 153.
  • the aperture ratio means the ratio (percentage) of the area of the light transmitting part to the area of an arbitrary light transmitting part (usually the light transmitting part having the largest area).
  • the irradiation amount of the left region in the region 122 is the left region in the region 121. It becomes smaller than the irradiation amount. Further, the pixel region in the region 123 where the light transmitting portion 151 of the photomask 150 has not passed is not exposed at this stage.
  • the substrate 110 and the table are moved in the ⁇ x-axis direction and returned to the position before the exposure stage 132. Further, each exposure head 131 is moved in the + y-axis direction by one exposure head. As a result, the central area 153 is arranged corresponding to the area 123, and the overlap area 154 is arranged corresponding to the area 122.
  • the polarized ultraviolet light is transmitted from the end to the end of the photo-alignment film 119 provided on the surface of the substrate 110 through the photomask 150.
  • First exposure (2) As a result of the first exposure (2), the left area of the picture element area is exposed in the area 123 through which the central area 153 has passed. Further, in the region 122 where the overlap region 154 has passed, the left region of the pixel region is exposed again. Thus, the first exposure (1) and the first exposure (2) irradiate the same left region of the pixel region.
  • the substrate 110 and the table are moved in the ⁇ x-axis direction and returned to the position before the exposure stage 132. Further, the substrate 110 is rotated 180 ° in the plane and placed on the table. Further, each exposure head 131 is moved in the ⁇ y-axis direction by one exposure head. As a result, the photomask 150 is disposed at substantially the same position as that at the time of the first exposure (1). However, the photomask 150 is arranged at a position shifted in the y-axis direction by half of the pixel pitch compared to the position at the time of the first exposure (1).
  • the substrate 110 and the table are moved in the + x-axis direction, and polarized ultraviolet rays are irradiated from end to end of the photo-alignment film 119 through the photomask 150 (second exposure ( 1)).
  • second exposure (1) in the region 121 through which the central region 153 has passed and the region 122 through which the overlap region 154 has passed, the right half of the pixel region (hereinafter also referred to as the right region). ) Will be exposed.
  • the irradiation amount of the right region in the region 122 is smaller than the irradiation amount of the right region in the region 121.
  • the right region of the picture element region in the region 123 where the translucent part 151 has not passed is not exposed at this stage.
  • the substrate 110 and the table are moved in the ⁇ x-axis direction and returned to the position before the exposure stage 132. Further, each exposure head 131 is moved in the + y-axis direction by one exposure head. As a result, the central area 153 is arranged corresponding to the area 123, and the overlap area 154 is arranged corresponding to the area 122. And the photomask 150 is arrange
  • the substrate 110 and the table are moved in the + x-axis direction, and polarized ultraviolet rays are irradiated from end to end of the photo-alignment film 119 through the photomask 150 (second exposure ( 2)).
  • second exposure (2) the right region of the pixel region is exposed in the region 123 through which the central region 153 has passed. Further, in the region 122 where the overlap region 154 has passed, the right region of the pixel region is exposed again.
  • the second exposure (1) and the second exposure (2) irradiate the same right region of the pixel region.
  • the substrate 110 is exposed over the entire surface, and the optical alignment processing of the substrate 110 is completed.
  • Each pixel region is divided into two alignment regions, and the substrate 110 is formed with a portion exposed only once (normal exposure portion) and a portion exposed twice (exposure joint portion).
  • the aperture ratio of the light transmitting portion 156 in the overlap region 154 is lower than the central region 153.
  • This seam can be made inconspicuous because it gradually decreases with distance.
  • the method described in Patent Document 3 can be appropriately employed.
  • the pretilt angle needs to be the same in the left region and the right region of the picture element region, the exposure of the first exposure (1), (2), the second exposure (1), (2). All conditions are set the same.
  • the exposure apparatus 130 having one stage 132 has been described, but the exposure apparatus 130 may have a plurality of stages.
  • a stage may be provided for each of the first exposure (1), the first exposure (2), the second exposure (1), and the second exposure (2).
  • the design conditions of the overlap region (region corresponding to the exposure joint) of the photomask of each stage are set to be the same.
  • FIG. 28 is a plan view schematically showing the relationship between various directions in each pixel for the substrate after the exposure process shown in FIGS.
  • the projection direction A onto the substrate surface in the irradiation direction of polarized ultraviolet rays is mutually , Parallel and 180 ° different directions.
  • the movement direction B of the substrate between the first exposures (1) and (2) and the second exposures (1) and (2) is parallel to each other and is different by 180 °.
  • the tilt direction C of the liquid crystal molecules in the vicinity of the photo-alignment film is parallel to each other and 180 ° different from the right region of the elementary region.
  • the relationship between the projection direction A and the movement direction B of the substrate is the same for all exposures (first exposure (1), (2) and second exposure (1), (2)).
  • the tilt direction C means the projection direction of the major axis of the liquid crystal molecules 4b in the vicinity of the photo-alignment film onto the surface of the substrate 10.
  • the tilt angle ⁇ means an angle formed between the long axis of the liquid crystal molecules 4b and the surface of the substrate 10.
  • the pretilt angle means a tilt angle when no voltage is applied.
  • the two substrates subjected to the alignment treatment as described above are bonded so that the irradiation directions of the polarized ultraviolet rays are orthogonal to each other. Then, a nematic liquid crystal material having a negative dielectric anisotropy is sealed between the two substrates to form a liquid crystal layer, thereby completing a 4VATN mode liquid crystal display panel.
  • FIG. 30 is a diagram schematically showing the alignment direction of the liquid crystal molecules in each picture element.
  • the liquid crystal molecules are aligned according to the direction of alignment treatment applied to each region of each substrate, that is, the irradiation direction of polarized ultraviolet rays.
  • the tilt direction of the liquid crystal molecules near one substrate (lower substrate) dotted line arrow in FIG. 30
  • the tilt direction of the liquid crystal molecules near the other substrate dotted line arrow in FIG. 30
  • the tilt direction of the liquid crystal molecules near the other substrate upper substrate
  • the exposure conditions of the first exposure (1), (2), the second exposure (1), (2) are all the same, and the relationship between the projection direction A and the movement direction B of the substrate is It is the same in all exposures (first exposure (1), (2) and second exposure (1), (2)). Therefore, the pretilt angle obtained as a result of each exposure has the same value.
  • the liquid crystal molecules are tilted in an orientation that bisects the tilt direction of both substrates.
  • the liquid crystal molecules 104a positioned equidistant from the surfaces of both substrates are tilted to 45 ° azimuth, 135 ° azimuth, 225 ° azimuth, or 315 ° azimuth when a voltage is applied. Further, the liquid crystal molecules 104a are tilted in a direction substantially parallel to the surfaces of both substrates. As a result, the transmittance of all domains is the same, a liquid crystal display device having high transmittance and excellent display quality can be realized.
  • FIG. 31 shows the result of simulating the brightness of one picture element in the liquid crystal display panel according to comparative example 1.
  • polarizing plates are arranged outside each substrate, and these polarizing plates are arranged in crossed Nicols.
  • One polarizing plate is arranged so that its absorption axis is parallel to the tilt direction of the liquid crystal molecules in the vicinity of the upper substrate (solid line arrow in FIG. 30), and the other polarizing plate has its absorption axis on the lower substrate.
  • the liquid crystal molecules in the vicinity were arranged so as to be parallel to the tilt direction (dotted line arrow in FIG. 30).
  • the directions in which the liquid crystal molecules 104a are tilted in the four domains D11 to D14 form an angle of approximately 90 °.
  • the liquid crystal molecules 104a are aligned so as to continuously connect the liquid crystal molecules 104a tilted in different directions. Further, the direction in which the liquid crystal molecules 104a fall in the four domains D11 to D14 differs by about 45 ° with respect to the absorption axis directions of the two polarizing plates. As a result, the orientation direction of the liquid crystal molecules 104a at the boundary between different domains is substantially the same or substantially perpendicular to the absorption axis direction of the two polarizing plates. Accordingly, retardation (phase difference) is not generated by the liquid crystal molecules in the polarized light transmitted through the lower polarizing plate at the boundary between different domains.
  • the polarized light transmitted through the lower polarizing plate is not affected at all by the liquid crystal layer, and the polarized light transmitted through the lower polarizing plate cannot be transmitted through the upper polarizing plate.
  • a dark line having a low luminance that is, a dark line, is generated at the boundary between different domains.
  • a liquid crystal display device having high transmittance and excellent display quality can be realized.
  • the exposure apparatus 230 includes an exposure stage 232 including a plurality of exposure heads 231 as shown in FIG.
  • Each exposure head 231 includes a light source and optical member for first exposure (1) and (2), a light source and optical member for second exposure (1) and (2), and a photomask 250.
  • Each photomask 250 is formed with a light-transmitting portion pattern 251a for the first exposure (1) and (2) and a light-transmitting portion pattern 251b for the second exposure (1) and (2).
  • the translucent part patterns 251a and 251b are arranged so as to be shifted from each other by half the picture element pitch, for example.
  • the polarized ultraviolet rays generated from the light sources for the first exposure (1) and (2) are irradiated to the light transmitting portion pattern 251a, and the second exposure (1) and (2).
  • the substrate 110 is passed under the mask 250 in a state in which the polarized ultraviolet rays generated from the light source for use are irradiated on the light transmitting portion pattern 251b.
  • These polarized ultraviolet rays are irradiated from opposite directions.
  • the first exposure (1) and the second exposure (1) can be performed simultaneously, and the first exposure (2) and the second exposure (2) can be performed simultaneously. That is, since the alignment process is completed only by performing a total of two scanning exposures on one substrate, the tact time can be shortened.
  • the relationship between the projection direction A and the substrate movement direction B is different from each other.
  • the first exposure (1) When the relationship between the projection direction A and the movement direction B is different between the first exposure (1), (2) and the second exposure (1), (2), the first exposure (1), If the exposure conditions are set to be the same in (2) and the second exposure (1), (2), the resulting characteristics such as the pretilt angle and anchoring energy are the first exposure ( The portions exposed by 1) and (2) are different from the portions exposed by the second exposure (1) and (2) of the photo-alignment film. Although the cause is not known, it is presumed that the scanning direction of the substrate itself has some influence on the alignment regulating force of the photo-alignment film.
  • the exposure apparatus 230 when used, as shown in FIG. 35, four domains D21 to D24 having different orientation directions of the liquid crystal molecules 104a are formed in each picture element.
  • Table 1 the pretilt angles of the two alignment regions in the picture element are different from each other on each substrate. Therefore, the combinations of the pretilt angles of the upper and lower substrates in the four domains D21 to D24 are (high, high), (high, low), (low, high), (low, low), respectively.
  • the liquid crystal molecules 104a are tilted in the 45 ° azimuth when a voltage is applied.
  • the liquid crystal molecules 104a are tilted so that the tilt direction is drawn toward the tilt direction on the substrate side having a lower pretilt angle.
  • Two types of substrates 310a and 310b were prepared as test cell substrates.
  • the moving direction (scanning direction) a2 and the tilt direction C of the substrate 310a and the projection direction of the polarized ultraviolet irradiation direction onto the substrate surface are parallel to each other. And it set so that it might become a direction different 180 degrees. Exposure in such a direction is also referred to as forward exposure hereinafter.
  • the direction of projection (scanning direction) a3 of the substrate 310b and the irradiation direction of polarized ultraviolet light onto the substrate surface and the tilt direction C are parallel to each other.
  • a direction different 180 degrees exposure in such a direction is also referred to as reverse exposure.
  • a plurality of slit-like light-transmitting portions 351 are formed on the photomask 350 used here as shown in FIG. 38, and the light-transmitting portions 351 are formed in parallel to each other.
  • each of the cells 1 to 3 is a one-domain VATN mode cell.
  • the cell 1 uses a substrate 310a subjected to forward exposure as upper and lower substrates
  • the cell 2 uses an upper substrate.
  • the back-exposed substrate 310b was used as the lower substrate
  • the back-exposed substrate 310b was used as the upper and lower substrates.
  • the arrow B indicates the moving direction of the substrate
  • the arrow C indicates the tilt direction
  • the broken arrow indicates the moving direction and the tilt direction on the lower substrate side
  • the solid arrow indicates the upper substrate. Side movement direction and tilt direction are shown. Table 2 below shows the results of measuring the pretilt angles of the cells 1 and 3.
  • the pretilt angle in the cell 3 in which the back-exposed substrate and the back-exposed substrate are combined as compared to the cell 1 in which the forward-exposed substrate and the forward-exposed substrate are combined. was found to be about 0.2 ° larger.
  • the extinction position angles of the cells 1 to 3 were measured.
  • the extinction position angle is obtained by rotating the polarizer (absorption axis P of the polarizer) and the analyzer (absorption axis A of the analyzer) arranged in crossed Nicol in the voltage application state. It is defined as the angle at which the cell is darkest.
  • the pretilt angles of the upper and lower substrates are equal and the liquid crystal molecules 304 are tilted to an angle (45 ° azimuth) that bisects the angle between the tilt directions of the upper and lower substrates when a voltage is applied, Is 45 °.
  • the extinction angle of cells 1 to 3 is shown in Table 3 below.
  • 43 to 45 are schematic diagrams for explaining the extinction position angles of the cells 1 to 3. 43 to 45, the broken line arrow indicates the tilt direction on the lower substrate side, and the solid line arrow indicates the tilt direction on the upper substrate side.
  • the extinction angle of the cells 1 and 3 is 45 °, and the pretilt angles of the upper and lower substrates are considered to be equal to each other.
  • the extinction position angle of the cell 2 is 47 °, and it can be seen that the liquid crystal molecules are tilted so that the tilt direction is drawn in the tilt direction on the upper substrate side. .
  • the upper substrate has a lower pretilt angle than the lower substrate. This is consistent with the pretilt angle measurement results described above.
  • the pretilt angle of the liquid crystal molecules is a very important parameter in designing the liquid crystal display device, and can affect various characteristics of the liquid crystal display device. Therefore, the pretilt angle needs to be controlled with high accuracy regardless of the liquid crystal mode. In particular, in the VATN mode, as described in Patent Document 4, it is extremely important to control the pretilt angle with high accuracy.
  • Patent Document 5 describes a scanning exposure apparatus in which the number of masks is halved, such as the exposure apparatus 230 described above, and adjusts the size of the exposure energy and the tilt angle between the first light and the second light. And adjusting the degree of photo-alignment of the photoreactive polymer film. However, a specific method for adjusting the degree of photo-alignment is not described, and there is room for further study.
  • the present invention has been made in view of the above-described situation, and an object of the present invention is to provide an exposure apparatus, a liquid crystal display apparatus, and a method for manufacturing the same that can control the pretilt angle with high accuracy.
  • the inventors of the present invention have made various studies on an exposure apparatus capable of controlling the pretilt angle with high accuracy and a method for manufacturing a liquid crystal display device.
  • the first exposure for exposing a portion (first part) of the photo-alignment film The relationship between the relative movement direction of the substrate with respect to the exposure light and the projection direction of the exposure light irradiation direction onto the substrate surface during the second exposure for exposing another portion (second portion) of the film.
  • the present inventors have arrived at the present invention by conceiving that it can be solved on a case-by-case basis. *
  • the first aspect of the present invention is an exposure apparatus that exposes the photo-alignment film while moving a substrate on which the photo-alignment film is provided relative to exposure light
  • the exposure apparatus comprising: The first exposure for exposing the first portion of the photo-alignment film and the second exposure for exposing the second portion of the photo-alignment film are performed.
  • the first exposure the exposure light of the substrate is exposed.
  • the relative movement direction and the projection direction of the exposure light irradiation direction onto the surface of the substrate are substantially opposite directions, and in the second exposure, the movement direction and the projection direction are substantially different.
  • An exposure apparatus that has the same direction and an angle formed between the normal direction of the surface of the substrate and the irradiation direction (hereinafter also referred to as an irradiation angle) is larger in the second exposure than in the first exposure. (Hereinafter also referred to as the first exposure apparatus of the present invention).
  • the configuration of the first exposure apparatus of the present invention is not particularly limited by other components as long as such components are formed as essential.
  • an exposure apparatus that exposes the photo-alignment film while moving a substrate having a photo-alignment film provided on the surface thereof relative to exposure light.
  • a first exposure that exposes a first portion of the photo-alignment film and a second exposure that exposes a second portion of the photo-alignment film.
  • the direction of projection and the direction of projection of the irradiation direction of the exposure light onto the surface of the substrate are substantially opposite directions, and in the second exposure, the direction of movement and the direction of projection are substantially the same direction.
  • the exposure apparatus (hereinafter referred to as the present invention) has a higher illuminance (hereinafter also referred to as substrate illuminance) of the exposure light on the surface of the photo-alignment film in the second exposure than in the first exposure. It is also called the second exposure apparatus of the invention.).
  • the configuration of the second exposure apparatus of the present invention is not particularly limited by other components as long as such components are formed as essential.
  • a third aspect of the present invention is a method of manufacturing a liquid crystal display device including an exposure step of exposing the photo-alignment film while moving a substrate on which the photo-alignment film is provided relative to the exposure light.
  • the exposure step a first exposure for exposing a first portion of the photo-alignment film and a second exposure for exposing a second portion of the photo-alignment film are performed.
  • the direction of movement relative to the exposure light and the direction of projection of the irradiation direction of the exposure light onto the surface of the substrate are substantially opposite, and in the second exposure, the direction of movement and the direction of projection are:
  • the angle of the normal direction of the surface of the substrate and the irradiation direction (irradiation angle) of the liquid crystal display device in which the second exposure is larger than the first exposure is substantially the same direction.
  • Manufacturing method hereinafter referred to as the first liquid crystal display device manufacturing method of the present invention and A say.).
  • a fourth aspect of the present invention is a method of manufacturing a liquid crystal display device including an exposure step of exposing the photo-alignment film while moving a substrate on which the photo-alignment film is provided relative to the exposure light.
  • the exposure step a first exposure for exposing a first portion of the photo-alignment film and a second exposure for exposing a second portion of the photo-alignment film are performed.
  • the direction of movement relative to the exposure light and the direction of projection of the irradiation direction of the exposure light onto the surface of the substrate are substantially opposite, and in the second exposure, the direction of movement and the direction of projection are:
  • a method of manufacturing a liquid crystal display device that has substantially the same direction, and the illuminance (substrate surface illuminance) of the exposure light on the surface of the photo-alignment film is greater during the second exposure than during the first exposure. (Hereinafter, it is also called the manufacturing method of the 2nd liquid crystal display device of this invention.) A.
  • the exposure light and the substrate moves is not particularly limited. Only one of them may move, or both may move.
  • the irradiation direction may be an optical axis direction.
  • the movement direction and the projection direction are substantially opposite to each other.
  • the two directions do not necessarily have to be exactly opposite directions, and the angle formed by both directions is preferably 175 ° (more preferably 178 °) or more and 180 ° or less.
  • the direction of movement and the direction of projection are substantially the same direction, it is not necessary that both directions are exactly the same direction, and the angle formed by both directions is 0 ° or more and 5 ° (more preferably Is preferably 2 ° or less.
  • the angle formed by the movement direction and the projection direction may be smaller than 180 °, and in the second exposure, the angle formed by the movement direction and the projection direction is , Greater than 0 °.
  • the photo-alignment film is for exposure light (which may be the optical axis of exposure light). It is preferable to use a material (photo-alignment material) that changes the alignment direction of the liquid crystal according to the direction and / or the direction of movement of exposure light on the film.
  • the difference between the irradiation angle during the first exposure and the irradiation angle during the second exposure is greater than 0 °, It is preferably not more than ° (more preferably not less than 5 ° and not more than 15 °).
  • the substrate surface illuminance at the first exposure when the substrate surface illuminance at the first exposure is 100%, the substrate surface illuminance at the second exposure is 100%. It is preferably larger and 500% or less (more preferably 120% or more and 400% or less).
  • the first and second exposure apparatuses of the present invention may perform the first exposure and the second exposure separately, but from the viewpoint of shortening the tact time, the first and second exposure apparatuses of the present invention.
  • the second exposure apparatus preferably performs the first exposure and the second exposure at the same time.
  • the first exposure and the second exposure are performed simultaneously in the exposure step.
  • the first and second exposure apparatuses of the present invention preferably irradiate the photo-alignment film with ultraviolet rays.
  • a desired pretilt angle can be expressed easily.
  • what is necessary is just to set the wavelength range of the said ultraviolet ray suitably with the material of the photo-alignment film
  • the ultraviolet light is preferably polarized ultraviolet light.
  • anisotropic ultraviolet light By irradiating the photo-alignment film with anisotropic ultraviolet light in this manner, anisotropic rearrangement of molecules and / or chemical reaction in the photo-alignment film can be easily induced. Therefore, the orientation direction of the liquid crystal molecules in the vicinity of the photo-alignment film can be controlled more uniformly.
  • the first and second exposure apparatuses of the present invention preferably include a photomask including a light shielding portion and a plurality of light transmitting portions, and expose the photo-alignment film through the photomask. Accordingly, the pixel region (which may be a pixel region) can be easily divided in orientation.
  • the photo-alignment film is exposed through a photomask including a light shielding portion and a plurality of light transmitting portions.
  • the light shielding part and the plurality of light transmitting parts are arranged in a stripe shape. Thereby, alignment processing can be efficiently performed on a substrate in which pixel regions (which may be pixel regions) are arranged in a matrix.
  • the longitudinal direction of the plurality of translucent portions and the relative direction of movement of the substrate are substantially the same.
  • all pixel regions or all picture element regions
  • the longitudinal direction of the plurality of light transmitting portions and the relative movement direction of the substrate are substantially the same, both positions do not necessarily coincide exactly, both positions Is preferably 5 ° (more preferably 2 °) or less.
  • a proximity gap is preferably provided between the photomask and the substrate.
  • the first and second exposure apparatuses of the present invention preferably include an imaging unit that reads the pattern of the substrate.
  • an imaging unit that reads the pattern of the substrate.
  • the first and second exposure apparatuses of the present invention control the relative movement direction of the substrate with respect to the exposure light while reading the pattern of the substrate.
  • the pattern of the substrate is not an essential component, and there may be no pattern on the substrate, but usually a pattern is formed on the substrate. Yes.
  • a specific example of the pattern is not particularly limited, but a dot-like or linear member formed periodically or continuously in the relative movement direction of the substrate is preferable, and in particular, a bus line (for example, a source bus line) , Gate bus line) and black matrix are preferable.
  • the first and second liquid crystal display manufacturing methods of the present invention preferably include a step of forming a vertical alignment type liquid crystal layer. Thereby, a liquid crystal display device in a vertical alignment mode can be realized.
  • the first and second liquid crystal display manufacturing methods of the present invention preferably include a step of forming a liquid crystal layer containing a liquid crystal material having a negative dielectric anisotropy. Accordingly, in the liquid crystal display device in the vertical alignment mode, the liquid crystal layer can be driven efficiently, so that the transmittance can be increased.
  • the two substrates subjected to the exposure process in the exposure step are pasted so that the projection directions (or exposure directions) may be substantially orthogonal to each other.
  • a step of combining them may be included.
  • a liquid crystal display device of TN mode, VATN mode, multi-domain TN mode or multi-domain VATN mode can be realized.
  • the fact that the projection directions are substantially orthogonal to each other does not necessarily mean that the angle formed by the projection directions is strictly 90 °, and the angle formed by the projection directions is 90 ° ⁇ 10 ° (more preferably 90 ° ⁇ 5). °) is preferably within the range.
  • the substrate when the substrate is viewed in plan, two regions exposed in antiparallel directions to each other may be included in each pixel (or in each pixel). It is preferable to include a step of exposing the photo-alignment film so as to form the film.
  • wide-angle display such as multi-domain TN mode, multi-domain ECB mode, multi-domain VAECB mode, multi-domain VAHAN (Vertical Alignment Hybrid-aligned Nematic) mode, multi-domain VATN (Vertical Alignment Twisted Nematic) liquid crystal display, etc.
  • the antiparallel direction does not necessarily mean that the two directions are strictly opposite and parallel, and the angle formed by both directions is preferably 175 ° (more preferably 178 °) or more and 180 ° or less. .
  • a liquid crystal display device manufactured using the first or second exposure apparatus of the present invention or the method for manufacturing the first or second liquid crystal display device of the present invention (hereinafter referred to as the present invention). It is also called a liquid crystal display device.).
  • the liquid crystal display device of the present invention is preferably driven by active matrix, but may be driven simply.
  • the liquid crystal display device of the present invention is preferably driven in the VATN mode.
  • a VATN mode liquid crystal display device includes a pair of substrates, a liquid crystal layer containing a nematic liquid crystal, and a pair of vertical alignment films provided on the respective substrates. The directions of the alignment treatment applied to these vertical alignment films are substantially orthogonal to each other, and the nematic liquid crystal is vertically and twist-aligned when no voltage is applied.
  • the liquid crystal display device of the present invention preferably has 2 or more domains, preferably 4 or less domains, and more preferably 4 domains.
  • a liquid crystal display device excellent in viewing angle characteristics can be realized while suppressing the complexity of the manufacturing process.
  • a wide viewing angle can be obtained in any of four directions orthogonal to each other, for example, four directions of up, down, left, and right.
  • the viewing angle characteristics in any of the four directions orthogonal to each other can be made substantially the same. That is, it is possible to realize viewing angle characteristics with excellent symmetry. Therefore, a liquid crystal display device with small viewing angle dependency can be realized.
  • the arrangement form of the domains in the case where the orientation is divided into four domains is not particularly limited, and examples thereof include a matrix shape and a stripe shape such as an eye shape.
  • the exposure conditions that are different from each other between the first exposure and the second exposure include, for example, the degree of polarization of exposure light (for example, polarized ultraviolet light) and exposure light (for example, polarized light) in addition to the above-described irradiation angle and substrate surface illuminance. And the transmittance of the photomask itself.
  • the exposure apparatus in which such exposure conditions differ between 1st exposure and 2nd exposure the manufacturing method of a liquid crystal display device, and the liquid crystal produced using this exposure device or the manufacturing method of a liquid crystal display device
  • the display device is also an aspect of the present invention, and the present invention also includes the first and second exposure apparatuses of the present invention, the liquid crystal display device of the present invention, and the first and second liquid crystal display devices of the present invention.
  • the present invention it is possible to realize an exposure apparatus, a liquid crystal display apparatus, and a manufacturing method thereof that can control the pretilt angle with high accuracy.
  • FIG. 3 is a schematic plan view of a mother glass substrate using the method for manufacturing a liquid crystal display device according to Embodiment 1.
  • FIG. 3 is a perspective view schematically showing a picture element region of a mother glass substrate (array substrate) using the method for manufacturing a liquid crystal display device according to Embodiment 1.
  • FIG. 3 is a perspective view schematically showing a picture element region of a mother glass substrate (color filter substrate) using the method for manufacturing a liquid crystal display device according to Embodiment 1.
  • FIG. FIG. 2 is a schematic diagram showing a main part of an exposure apparatus according to Embodiment 1, viewed from above.
  • FIG. 2 is a schematic view showing a main part of an exposure apparatus according to Embodiment 1, viewed from the side.
  • FIG. 4 is a perspective view schematically showing a photomask using the method for manufacturing a liquid crystal display device according to Embodiment 1.
  • FIG. 4 is a plan view schematically showing a photomask using the method for manufacturing the liquid crystal display device according to Embodiment 1.
  • FIG. It is a graph which shows the relationship between the irradiation amount to a photo-alignment film
  • the relationship between dimensions and positions of the photomask for the array substrate and the pattern formed on the mother glass substrate for the array substrate is shown.
  • FIG. 5 is a plan view schematically showing a pattern formed on the photomask and an arrangement position of the photomask in the exposure process for the array substrate photomask used in the method for manufacturing the liquid crystal display device according to the first embodiment.
  • FIG. 6 is a graph showing irradiation amounts in a normal exposure portion and an exposure joint portion in the method for manufacturing a liquid crystal display device according to the first embodiment. It is the top view which showed typically the relationship of the various directions in each pixel about the board
  • the manufacturing method of the liquid crystal display device which concerns on Embodiment 1 it is the figure which showed the relationship of the dimension and position of the pattern formed in the photomask for color filter substrates, and the mother glass substrate for color filter substrates.
  • FIG. 1 is a cross-sectional view schematically showing a liquid crystal display panel and a liquid crystal display device according to Embodiment 1.
  • FIG. FIG. 3 is a diagram schematically illustrating the alignment direction of liquid crystal molecules in each pixel in the liquid crystal display panel according to Embodiment 1. It is the figure which showed typically the exposure process in the manufacturing method of the liquid crystal display device which concerns on Embodiment 2, and is the figure seen from the side. In Embodiment 2, it is a graph which shows the relationship between a substrate surface illumination intensity and the pretilt angle of a liquid crystal molecule. It is a schematic diagram which shows the principal part of the exposure apparatus which concerns on the comparison form 1, and is the figure seen from upper direction.
  • FIG. FIG. 5 is a plan view schematically showing a photomask using the method for manufacturing a liquid crystal display device according to comparative embodiment 1. It is the figure which showed typically the exposure process in the manufacturing method of the liquid crystal display device which concerns on the comparative form 1, and is the figure seen from upper direction. It is the figure which showed typically the exposure process in the manufacturing method of the liquid crystal display device which concerns on the comparative form 1, and is the figure seen from the side.
  • FIG. 26 and 27 It is the top view which showed typically the relationship of the various directions in each pixel about the board
  • FIG. It is the figure which showed typically the tilt direction and tilt angle of a liquid crystal molecule. It is the figure which showed typically the orientation direction of the liquid crystal molecule in each pixel about the liquid crystal display panel which concerns on the comparative form 1.
  • FIG. The result of having simulated the brightness in one picture element in the liquid crystal display panel which concerns on the comparative form 1 is shown. It is the figure which showed typically the exposure process in the manufacturing method of the liquid crystal display device which concerns on the comparison form 2, and is the figure seen from upper direction.
  • FIG. 32 It is the figure which showed typically the exposure process in the manufacturing method of the liquid crystal display device which concerns on the comparison form 2, and is the figure seen from the side. It is the top view which showed typically the relationship of the various directions in each pixel about the board
  • FIG. It is the figure which showed typically the orientation direction of the liquid crystal molecule in each pixel about the liquid crystal display panel which concerns on the comparison form 2.
  • FIG. It is the figure which showed typically the exposure process in the manufacturing method of a test cell, and is the figure seen from the side. It is the figure which showed typically another exposure process in the manufacturing method of a test cell, and the figure seen from the side. It is the perspective view which showed typically the photomask using the manufacturing method of a test cell.
  • FIG. 3 is a plan view schematically showing the relationship between various directions in each picture element for cell 1.
  • FIG. 6 is a plan view schematically showing the relationship between various directions in each picture element for a cell 2.
  • FIG. 5 is a plan view schematically showing the relationship between various directions in each picture element for a cell 3. It is a schematic diagram for demonstrating the measuring method of an extinction position angle.
  • 3 is a schematic diagram for explaining an extinction position angle of a cell 1.
  • FIG. 3 is a schematic diagram for explaining an extinction position angle of a cell 2.
  • FIG. 3 is a schematic diagram for explaining an extinction position angle of a cell 3.
  • FIG. The result of having simulated the brightness in one picture element in the liquid crystal display panel which concerns on Embodiment 1 is shown.
  • FIG. 6 is a diagram schematically showing the alignment direction of liquid crystal molecules in each pixel in the liquid crystal display panel of Modification 1 according to Embodiment 1.
  • FIG. 6 is a diagram schematically showing the alignment direction of liquid crystal molecules in each picture element of a liquid crystal display panel of a second modification according to the first embodiment. It is the figure which showed typically the orientation direction of the liquid crystal molecule in each pixel about the liquid crystal display panel of the modification 3 which concerns on Embodiment 1.
  • Embodiment 1 Below, the manufacturing method of the liquid crystal display device which concerns on Embodiment 1 is demonstrated.
  • the method for manufacturing a liquid crystal display device according to the present embodiment is applied to a method for manufacturing a liquid crystal display device including an exposure process for performing a photo-alignment process.
  • the manufacturing method of the liquid crystal display device according to the present embodiment can be applied to liquid crystal display devices of various display modes, and in particular, a liquid crystal display device of a twisted nematic vertical alignment (Vertical Aligned Twisted Nematic (VATN)) mode. It is suitable for.
  • VATN twisted nematic vertical alignment
  • a pair of mother glass substrates 10 before alignment film formation are prepared by a general method. From each mother glass substrate 10, for example, a plurality of (for example, six) array substrates or color filter substrates are obtained. In this embodiment, a single array substrate or a single color filter substrate may be used. Each mother glass substrate 10 is provided with a plurality of panel regions 11 corresponding to the obtained array substrate or color filter substrate.
  • source bus lines 12 and gate bus lines 13 that intersect with each other are formed in a mesh shape, and the source bus lines 12 and the gate bus lines 13 A thin film transistor 14 and a pixel electrode 15 are formed in each partitioned pixel region. Then, in each of the pixel regions, assuming two regions A1 and A2 formed by being substantially divided between the source bus lines 12 on both sides (line CL1 in the drawing), The polarized ultraviolet rays are irradiated to the regions A1 and A2 from a direction inclined by a predetermined angle ⁇ with respect to the normal line of the surface of the substrate 10.
  • the direction of irradiation of polarized ultraviolet light with respect to each region is such that when the optical axis of polarized ultraviolet light to be irradiated is projected onto the surface of the substrate 10, the projected optical axes are parallel to the source bus line 12 and different from each other by 180 °.
  • a black matrix 16 is formed in a mesh pattern in the panel region 11 of the other mother glass substrate, and a color filter 17 is formed in each pixel region partitioned by the black matrix 16.
  • a common electrode (not shown) is formed on the black matrix 16 and the color filter 17.
  • two regions B1 and B2 formed by being divided into two substantially at the middle (line CL2 in the figure) of two sides parallel to the gate bus line 13 when bonded to the array substrate.
  • polarized ultraviolet rays are irradiated from the direction inclined by a predetermined angle ⁇ with respect to the normal of the surface of the substrate 10 to the regions B1 and B2.
  • the irradiation directions of the polarized ultraviolet rays with respect to the respective regions are such that, when the optical axes of the polarized ultraviolet rays to be irradiated are projected onto the surface of the substrate 10, these projected optical axes are parallel to the gate bus line 13 and different from each other by 180 °. Orient.
  • the liquid crystal display device according to this embodiment is a monochrome display liquid crystal display device. Also good.
  • the picture element may be read as a pixel. Note that a picture element is an element constituting a pixel and is synonymous with a sub-pixel.
  • the photo-alignment film material is not particularly limited, and examples thereof include a resin containing a photosensitive group. More specifically, a 4-chalcone group (the following chemical formula (1)), a 4′-chalcone group (the following chemical formula (2)), a coumarin group (the following chemical formula (3)), and a cinnamoyl group (the following chemical formula (4)).
  • a polyimide containing a photosensitive group such as is suitable.
  • the photosensitive groups of the following chemical formulas (1) to (4) are those that cause a crosslinking reaction (including a dimerization reaction), an isomerization reaction, a photoreorientation, etc. by irradiation with light (preferably ultraviolet rays). Accordingly, the variation in the pretilt angle in the alignment film plane can be effectively reduced as compared with the photodecomposition type photo-alignment film material.
  • the photosensitive groups represented by the following chemical formulas (1) to (4) include structures in which a substituent is bonded to the benzene ring.
  • the photo-alignment film material is more preferably a polyimide containing a cinnamate group.
  • the firing temperature, firing time, and film thickness of the photo-alignment film are not particularly limited and may be set as appropriate.
  • a photo-alignment film material that reacts with light and generates a pretilt angle of liquid crystal molecules in the light irradiation direction is used as the alignment film material.
  • the photo-alignment method disclosed in Non-Patent Document 1 As described above, a photo-alignment film material that can define the pretilt direction depending on the moving direction of the light irradiation region may be used. In this case, light does not need to be incident on the substrate from an oblique direction, and can be incident substantially perpendicular to the substrate.
  • the exposure apparatus 30 is a one-stage scanning exposure apparatus, and an exposure stage 32 including a plurality of exposure heads 31 and a mother glass substrate 10 are placed and moved in a predetermined direction. And a table 33 to be operated.
  • the table 33 also functions as a moving unit.
  • the exposure apparatus 30 may include a moving unit that moves the exposure stage 32, or does not function as a moving unit, and includes a table on which the mother glass substrate 10 is placed and a moving unit that moves the exposure stage 32. You may prepare.
  • the plurality of exposure heads 31 are arranged at intervals in a direction b orthogonal to the moving direction (scanning direction) a of the substrate 10. Each exposure head 31 is supported so as to be movable in a direction b in a plane parallel to the irradiated surface of the substrate 10.
  • Each exposure head 31 includes an exposure unit 36a for the first exposure (1) and (2), an exposure unit 36b for the second exposure (1) and (2), and a photomask 50.
  • the first exposure (1), (2) and the second exposure (1), (2) will be described later.
  • the exposure unit 36a includes an ultraviolet light source 34a that emits ultraviolet light, and an optical member (not shown) such as a polarizing filter and an optical lens provided between the light source 34a and the photomask 50.
  • Each optical member optically converts the ultraviolet rays emitted from the light source 34a into desired exposure light.
  • the exposure unit 36b includes an ultraviolet light source 34b that emits ultraviolet light, and an optical member (not shown) such as a polarizing filter and an optical lens provided between the light source 34b and the photomask 50.
  • Each optical member optically converts the ultraviolet rays emitted from the light source 34a into desired exposure light.
  • Each exposure head 31 is polarized ultraviolet light at a predetermined irradiation angle (an angle between the normal direction of the surface of the substrate 10 and the irradiation direction of the exposure light, for example, 40 °) on the surface of the substrate 10 via the photomask 50. It is comprised so that it can irradiate.
  • the light sources 34a and 34b may be appropriately selected according to the irradiation target, and may be light sources that emit visible light.
  • Each exposure head 31 includes an imaging unit 35, a storage unit, a collation unit, and a mask moving unit.
  • the imaging means 35 can photograph the surface of the substrate 10 and can read a pattern of the substrate 10 (for example, the source bus line 12, the gate bus line 13, the black matrix 16, etc.).
  • a camera such as a CCD camera can be applied.
  • the storage means can store a reference image serving as a reference for exposure alignment.
  • the collating unit compares and collates the image captured by the image capturing unit 35 with the reference image, and calculates a difference between the position where the exposure is actually performed and the position where the exposure is to be performed.
  • the mask moving means corrects the position and angle of the mask 50 based on the calculation result of the deviation by the collating means.
  • the scanning exposure can be performed while reading the pattern of the substrate 10 and controlling the relative movement direction and position of the substrate 10 with respect to the exposure light with high accuracy.
  • the collating means can similarly correct the position and angle of the mask 50 by a method of comparing and collating the result of imaging the substrate 10 and the result of imaging the mask 50 instead of using the reference image.
  • the mask 50 is disposed so that the surface thereof is substantially parallel to the irradiated surface of the substrate 10, and a proximity gap 41 is formed between the mask 50 and the irradiated surface of the substrate 10, that is, the surface of the photo-alignment film. Is provided.
  • the mask 50 is, for example, a plate-like member, and as shown in FIG. 6, a transparent substrate formed using quartz glass or the like, and a predetermined pattern (preferably a stripe pattern) on the surface of the transparent substrate.
  • the light-shielding portion 52 and the plurality of light-transmitting portions 51 are formed.
  • Each translucent portion 51 has a longitudinal shape, and the plurality of translucent portions 51 are arranged in a direction b orthogonal to the moving direction a of the substrate 10 at a predetermined pitch.
  • the mask 50 includes a translucent pattern 51a for the first exposure (1) and (2) and a translucent pattern 51b for the second exposure (1) and (2). Is formed.
  • the translucent part patterns 51a and 51b are arranged so as to be shifted from each other by half of the pixel pitch, for example.
  • the mask 50 has a central region 53 and an overlap region 54.
  • the translucent patterns 51a and 51b are both formed in the central region 53 and the overlap region 54, but the translucent portions 56a and 56b provided in the overlap region 54 (corresponding to the second translucent portion). Is gradually shortened as the distance from the central region 53 increases.
  • the aperture ratio of the light transmitting portions 56a and 56b provided in the overlap region 54 is the opening of the light transmitting portions 55a and 55b (corresponding to the first light transmitting portion) provided in the central region 53. It is smaller than the rate.
  • the light transmitting portions 56a and 56b that are further away from the light transmitting portions 55a and 55b have shorter lengths and smaller aperture ratios.
  • the material of the light transmission part 51 will not be specifically limited if light (for example, polarized ultraviolet rays) can be permeate
  • the translucent part 51 may be an opening that penetrates the mask 50.
  • the illuminance means the illuminance of the exposure light on the photo-alignment film. Therefore, if the illuminance and the moving speed V are kept constant, the irradiation amount is proportional to the length Y of the light transmitting part.
  • the irradiation amount to the photo-alignment film can also be calculated by the following equation.
  • (Irradiation amount) (Illuminance) ⁇ (Exposure light width) / (Scanning speed)
  • the width of the exposure light means the width (length) of the exposure light in the scanning (moving) direction on the photo-alignment film. Since the exposure light is applied to a planar area, it normally spreads in a direction orthogonal to the moving direction of the exposure light on the photo-alignment film.
  • the exposure light has a spread and the width of the exposure light is not constant depending on the location (for example, when the width of the exposure light decreases in a sine function within the region corresponding to the exposure joint), the exposure is performed.
  • the width of light means the width (length) at each location in the orthogonal direction.
  • the scanning speed means a relative movement (scanning) speed of the substrate with respect to the exposure light.
  • FIG. 8 is a graph showing the relationship between the irradiation amount to the photo-alignment film and the pretilt angle of the liquid crystal molecules.
  • the pretilt angle of the liquid crystal molecules in the vicinity of the alignment film becomes smaller as the irradiation amount to the photo-alignment film becomes larger.
  • Patent Document 4 in the VATN mode, it is extremely important to control the pretilt angle with high accuracy.
  • an area to be exposed (exposure area) of the mother glass substrate 10 is divided into a plurality of areas and exposed (photo-alignment treatment).
  • the mother glass substrate 10a for an array substrate will be described.
  • the array substrate photomask 60 is a substantially rectangular plate-shaped member.
  • a plurality of slit-like light transmitting portions 61a through which polarized ultraviolet rays can pass are formed in parallel at a predetermined pitch Px as the light transmitting portion patterns for the first exposure (1) and (2).
  • a plurality of slit-like light-transmitting parts 61b through which polarized ultraviolet rays can pass are formed in parallel at a pitch Px.
  • the pitch Px is set equal to the pitch of the source bus line 12.
  • the dimension Lx in the pitch direction of the light transmitting parts 61 a and 61 b is set to about 1 ⁇ 2 of the pitch of the source bus line 12.
  • the translucent part 61a is arranged so as to be shifted in the pitch direction by half of the pitch Px with respect to the translucent part 61b.
  • the mask 60 has a central region and an overlap region, and the aperture ratio of the light transmissive portion provided in the overlap region is smaller than the aperture ratio of the light transmissive portion provided in the central region. .
  • the polarized ultraviolet rays generated from the light emitted from the light source 34a are applied to the light transmitting portion pattern (the light transmitting portion 61a) for the first exposure (1) and (2), and the light source
  • the substrate 10a and the table are placed under the photomask 60 in the state where the polarized ultraviolet rays generated from the light emitted by the light beam 34b are applied to the light transmitting portion pattern (light transmitting portion 61b) for the second exposure (1) and (2).
  • + Move in the x-axis direction at a constant speed.
  • first exposure (1) and second exposure (1) polarized ultraviolet rays are irradiated from one end of the photo-alignment film 19 provided on the surface of the substrate 10a through the photomask 60 (first exposure (1) and second exposure (1)).
  • the substrate 10a is moved so that the source bus line 12 is along the longitudinal direction of the light transmitting portions 61a and 61b of the photomask 60.
  • first exposure (1) the region of the picture element region shown in FIG. 2 in the region 21 through which the central region of the photomask 60 passes and the region 22 through which the overlap region of the photomask 60 passes. A1 is exposed.
  • the second exposure (1) the area A2 of the picture element area shown in FIG. 2 is exposed in the area 21 and the area 22.
  • the irradiation amounts of the areas A1 and A2 in the area 22 are the area 21. It becomes smaller than the irradiation amount of the area
  • the substrate 10a and the table are moved in the ⁇ x-axis direction and returned to the position before the exposure stage 32. Further, each exposure head 31 is moved in the + y-axis direction by one exposure head. As a result, the central region of the photomask 60 is disposed corresponding to the region 23, and the overlap region of the photomask 60 is disposed corresponding to the region 22.
  • the polarized ultraviolet rays generated from the light emitted from the light source 34a are applied to the light transmitting portion pattern (the light transmitting portion 61a) for the first exposure (1) and (2), and the light source
  • the substrate 10a and the table are placed under the photomask 60 in the state where the polarized ultraviolet rays generated from the light emitted by the light beam 34b are applied to the light transmitting portion pattern (light transmitting portion 61b) for the second exposure (1) and (2).
  • + Move in the x-axis direction at a constant speed.
  • first exposure (2) and second exposure (2) polarized ultraviolet rays are irradiated from one end of the photo-alignment film 19 provided on the surface of the substrate 10a through the photomask 60 (first exposure (2) and second exposure (2)).
  • the substrate 10a is moved so that the source bus line 12 is along the longitudinal direction of the light transmitting portions 61a and 61b of the photomask 60.
  • the area A1 of the picture element area is exposed in the area 23 through which the central area of the photomask 60 has passed.
  • the region A1 is exposed again.
  • the substrate 10a is exposed over the entire surface, and the photo-alignment processing of the substrate 10a is completed. Then, as shown in FIG. 12, the substrate 10a is formed with the normal exposure portion 24 exposed only once and the exposure joint portion 25 exposed twice.
  • FIG. 13 is a plan view schematically showing a pattern formed on the photomask 60 and an arrangement location of the photomask 60 in the exposure process.
  • the photomask 60 has a central region 63 and an overlap region 64.
  • a light transmitting portion pattern (light transmitting portion 61a) for the first exposure (1) and (2) and a light transmitting portion for the second exposure (1) and (2).
  • a pattern (translucent portion 61b) is formed.
  • the width of the overlap region 64 is 10 to 80 mm (preferably 30 to 60 mm, for example, 45 mm).
  • the length y of the translucent part 66 (corresponding to the second translucent part) provided in the overlap region 64 is equal to the translucent part 65 (corresponding to the first translucent part) provided in the central region 63. ) Is smaller than the length y0. Further, as the distance from the central region 63 increases, the length y of the light transmitting portion 66 is gradually shortened, whereby the aperture ratio of the light transmitting portion 66 is gradually decreased. Therefore, the portion exposed through the relatively long light transmitting portion 66 in the first exposure (1) or the second exposure (1) is relatively transparent in the first exposure (2) or the second exposure (2). The light is exposed through the light part 66.
  • the length (aperture ratio) of the translucent portion 66 preferably changes according to a linear function or a trigonometric function. In the exposure joint 25, the first exposure (1) and the first exposure (2) are the same, and the second exposure (1) and the second exposure (2) are the same part (for example, the same half on the same side of the picture element). ) Is designed to be exposed.
  • the method of gradually decreasing the aperture ratio of the light transmitting portion 66 as the distance from the central region 63 is not particularly limited, and for example, the method described in Patent Document 3 can be appropriately employed. Alternatively, a method may be used in which the translucent portion 66 is shaded while the length of the translucent portion 66 is kept constant, and the density of the shade is gradually increased as the distance from the central region 63 increases.
  • FIG. 14 is a graph showing the irradiation amounts in the normal exposure part 24 and the exposure joint part 25.
  • the dose E0 of the normal exposure unit 24 is proportional to the length y0 of the translucent unit 65 provided in the central region 63, and is constant regardless of the position x. Since the irradiation amount E of the exposure joint portion 25 is proportional to the length y of the light transmitting portion 66 provided in the overlap region 64, it gradually decreases as the distance from the normal exposure portion 24 increases.
  • the total irradiation amount of the exposure joint portion 25 is the sum of the irradiation amount by the first exposure (1) and the irradiation amount by the first exposure (2), or , The sum of the dose by the second exposure (1) and the dose by the second exposure (2). That is, the total dose of the exposure joint portion 25 depends on the dose of each exposure, and may have a maximum value E max or a minimum value E min .
  • the total irradiation amount of the exposure joint portion 25 can be appropriately set based on, for example, the description of Patent Document 3, but among them, the total irradiation amount of the exposure joint portion 25 is smaller than the irradiation amount E0 of the normal exposure portion 24.
  • the sum of the dose by the first exposure (1) and the dose by the first exposure (2), and the sum of the dose by the second exposure (1) and the dose by the second exposure (2) are usually Are set to be the same, but may be set to be different from each other.
  • FIG. 15 is a plan view schematically showing the relationship between various directions in each pixel for the substrate after the exposure process shown in FIGS.
  • the substrate in the irradiation direction of polarized ultraviolet rays (or the direction of the optical axis may be used) between the first exposure (1), (2) and the second exposure (1), (2).
  • Projection directions A onto the planes are parallel to each other and differ by 180 °.
  • the movement direction B of the substrate is the same between the first exposure (1) and (2) and the second exposure (1) and (2).
  • the tilt directions C of the liquid crystal molecules in the vicinity of the photo-alignment film are parallel to each other and different from each other by 180 °.
  • the relationship between the projection direction A and the movement direction B of the substrate is the same between the first exposure (1), (2) and the second exposure (1), (2).
  • the projection direction A and the movement direction B of the substrate are parallel to each other and are different from each other by 180 °, but the second exposures (1) and (2) are different.
  • the projection direction A is the same as the substrate movement direction B. Therefore, as described above, there is a concern that the pretilt angle ⁇ 1 of the liquid crystal molecules in the region A1 is different from the pretilt angle ⁇ 2 of the liquid crystal molecules in the region A2.
  • the exposure conditions specifically, the irradiation angle of polarized ultraviolet rays are different between the first exposure (1), (2) and the second exposure (1), (2). ing.
  • the pretilt angle obtained as a result can be made the same in the area A1 and the area A2. That is, the pretilt angle ⁇ 1 can be set to the same level as the pretilt angle ⁇ 2.
  • FIG. 16 is a graph showing the results of measuring the relationship between the irradiation angle of polarized ultraviolet rays and the pretilt angle using the plurality of test cells according to the first embodiment. As can be seen from FIG. 16, the pretilt angle decreases as the irradiation angle increases.
  • the pretilt angle ⁇ 1 can be made substantially equal to the pretilt angle ⁇ 2 by making the irradiation angle in the second exposure larger than the irradiation angle in the first exposure.
  • the pretilt angle ⁇ 1 of the liquid crystal molecules in the region A1 is about 89.13 °.
  • the irradiation amount (exposure energy) was 20 mJ.
  • the relationship between the movement direction B of the substrate and the projection direction A of the polarized ultraviolet rays is the same in the first exposure (1) and (2) and in the second exposure (1) and (2). Different.
  • the difference between the irradiation angle in the first exposure and the irradiation angle in the second exposure is greater than 0 ° and not more than 20 ° (more preferably not less than 5 ° and not more than 15 °). ) Is preferable.
  • the color filter substrate photomask 70 has substantially the same configuration as the array substrate photomask 60. That is, a plurality of slit-like light transmitting portions 71a through which polarized ultraviolet rays can pass are formed in parallel with a predetermined pitch Py as the light transmitting portion patterns for the first exposure (1) and (2). Further, as the light-transmitting part patterns for the second exposure (1) and (2), a plurality of slit-like light-transmitting parts 71b through which polarized ultraviolet rays can pass are formed in parallel at the pitch Py.
  • the pitch Py is set to be equal to the pitch of the black matrix 16 (here, the pitch of the side parallel to the gate bus line 13 of the array substrate when superimposed on the array substrate).
  • the dimension Ly in the pitch direction of the light transmitting parts 71 a and 71 b is set to a dimension that is approximately 1 ⁇ 2 of the pitch of the black matrix 16.
  • the translucent part 71a is arranged so as to be shifted in the pitch direction by half of the pitch Py with respect to the translucent part 71b.
  • the mask 70 has a central region and an overlap region, and the aperture ratio of the light transmissive portion provided in the overlap region is smaller than the aperture ratio of the light transmissive portion provided in the central region. .
  • the exposure mode for the mother glass substrate 10b is substantially the same as the exposure mode for the mother glass substrate 10a for an array substrate, except that the orientation of the substrate is different by 90 °, and therefore detailed description thereof is omitted.
  • the region B1 is exposed by the first exposure (1) and / or the first exposure (2)
  • the region B2 is exposed by the second exposure (1) and / or the second exposure (2).
  • the pretilt angle ⁇ 1 of the liquid crystal molecules in the region B1 is approximately the same as the pretilt angle ⁇ 2 of the liquid crystal molecules in the region B2.
  • the substrates 10a and 10b are divided into panel regions, and the array substrate 1 and the color filter substrate 2 are produced. And the bonding process of the board
  • a sealing material is applied to the frame region of one substrate.
  • plastic beads having a particle diameter of 4 ⁇ m are sprayed on a substrate coated with a sealing material, and then both substrates are bonded together.
  • a nematic liquid crystal material having a negative dielectric anisotropy is sealed between the substrates 1 and 2 to form a liquid crystal layer 3, thereby completing a liquid crystal display panel.
  • the following process may be employed for manufacturing the liquid crystal display panel.
  • a sealing material is applied to the frame region of each panel region 11 for one of the substrates 10a and 10b.
  • a nematic liquid crystal material having a negative dielectric anisotropy is dropped onto the other substrate surface at a predetermined pitch.
  • both substrates thus treated are bonded together in a vacuum environment.
  • the cell thickness is controlled by a photo spacer previously set on the mother glass substrate 10b for the color filter substrate, and is set to 4 ⁇ m, for example.
  • the sealing material is cured and divided into panels to complete a liquid crystal display panel.
  • the liquid crystal molecules 4 in the liquid crystal layer 3 are aligned in a direction substantially perpendicular to the surface of the photo-alignment film 19 when a driving voltage is not applied to the liquid crystal layer 3 (when no voltage is applied).
  • the liquid crystal molecules 4 are aligned with a slight inclination of about 0.1 ° to several degrees with respect to the normal direction of the surface of the photo-alignment film 19 at this time. That is, the liquid crystal molecules 4 are aligned by the optical alignment 19 so as to have a slight pretilt angle.
  • FIG. 19 is a diagram schematically showing the alignment direction of the liquid crystal molecules in each picture element.
  • the liquid crystal display panel is configured by bonding the array substrate and the color filter substrate subjected to the alignment treatment as described above, the liquid crystal molecules are directed to the orientation treatment applied to each region of each substrate, that is, irradiated with polarized ultraviolet rays. Orient according to direction.
  • the tilt direction of the liquid crystal molecules in the vicinity of the array substrate dotted line arrow in FIG. 19
  • the tilt direction of the liquid crystal molecules in the vicinity of the color filter substrate solid arrow in FIG. 19
  • four domains D1 to D4 having different orientation directions of liquid crystal molecules are formed.
  • the liquid crystal molecules are twisted and aligned by approximately 90 °.
  • the pretilt angle obtained as a result of each exposure has the same value.
  • the liquid crystal molecules are tilted in an orientation that bisects the tilt direction of both substrates.
  • the liquid crystal molecules 4a located equidistant from the surfaces of both substrates are tilted to 45 ° azimuth, 135 ° azimuth, 225 ° azimuth, or 315 ° azimuth when a voltage is applied.
  • the liquid crystal molecules 4a are inclined in a direction substantially parallel to the surfaces of both substrates.
  • the two retardation plates 7 a and 7 b and the two polarizing plates 6 a and 6 b are attached to the outside of the substrates 1 and 2.
  • the retardation plates 7a and 7b need not be installed, but are preferably installed from the viewpoint of realizing a wide viewing angle. Further, only one of the phase difference plates 7a and 7b may be arranged.
  • the polarizing plates 6a and 6b are arranged in crossed Nicols. One of the polarizing plates 6a and 6b is arranged so that the absorption axis thereof is parallel to the tilt direction (dotted line arrow in FIG. 19) of the liquid crystal molecules in the vicinity of the array substrate, and the other has the absorption axis of the color filter.
  • the liquid crystal molecules in the vicinity of the substrate are arranged so as to be parallel to the tilt direction (solid arrow in FIG. 19).
  • the liquid crystal display panel of the present embodiment can realize a good black display (normally black mode).
  • the liquid crystal display panel of the present embodiment has four domains, and the liquid crystal molecules in the four domains respond to four different directions, so that display characteristics almost independent of the viewing angle direction can be exhibited.
  • FIG. 46 shows the result of simulating the brightness of one picture element in the liquid crystal display panel according to the first embodiment.
  • the directions in which the liquid crystal molecules 4a are tilted in the four domains D1 to D4 form an angle of approximately 90 °. Therefore, at the boundary between different domains, the liquid crystal molecules 4a are aligned so as to continuously connect the liquid crystal molecules 4a tilted in different directions. Further, the direction in which the liquid crystal molecules 4a fall in the four domains D1 to D4 differs by about 45 ° with respect to the absorption axis directions of the polarizing plates 6a and 6b.
  • the orientation direction of the liquid crystal molecules 4a at the boundary between different domains is an orientation that is substantially the same or substantially orthogonal to the absorption axis direction of the polarizing plate 6a or the absorption axis direction of the polarizing plate 6b. Accordingly, retardation (phase difference) due to liquid crystal molecules does not occur in the polarized light transmitted through the lower polarizing plate 6a at the boundary between different domains. That is, the polarized light transmitted through the lower polarizing plate 6a is not affected at all by the liquid crystal layer 3, and the polarized light transmitted through the lower polarizing plate 6a cannot be transmitted through the upper polarizing plate 6b. As a result, a dark line having a low luminance, that is, a dark line, is generated at the boundary between different domains.
  • FIGS. 47 to 49 show the case where the alignment direction of the liquid crystal molecules is set so that an inverted saddle-shaped dark line is generated when the panel is observed from the color filter substrate side.
  • the direction may be set as shown in FIGS. 47 to 49, the dotted arrow indicates the tilt direction of the liquid crystal molecules near the array substrate, and the solid arrow indicates the tilt direction of the liquid crystal molecules near the color filter substrate.
  • a saddle-shaped dark line is generated in the case shown in FIG. 47
  • an 8-shaped dark line is generated in the case shown in FIG. 48
  • a dark line with a letter shape is generated.
  • One picture element region may be divided into two regions, and four domains may be formed in each region.
  • Embodiment 1 can be completed through a general module manufacturing process.
  • the liquid crystal display device of this embodiment is a four-domain VATN mode. Dividing one picture element into four domains is a preferable form from the viewpoint of realizing a wide viewing angle of the liquid crystal display device. Further, the photomask for forming the alignment control structure such as ribs (protrusions) required in the liquid crystal mode having the alignment control structure such as the conventional MVA mode, that is, the photolithography process can be reduced. As a result, the manufacturing process can be simplified.
  • one pixel one sub-pixel
  • the viewing angle characteristics in the other direction can be increased, although the viewing angle in the other direction can be widened. Can not.
  • the number of domains may be increased to five or more, it is not preferable because the process becomes complicated and the processing time becomes long. Furthermore, it has been found that there is practically no difference in viewing angle characteristics between four domains and more domains.
  • Examples of materials that can be used in the present embodiment and conditions in an applicable manufacturing process include the following. However, materials and conditions that can be used in the present embodiment are not limited to the following.
  • Pretilt angle 85 ⁇ 89.9 °
  • Cell thickness 2-5 ⁇ m
  • Irradiation energy density 0.01 to 5 J / cm 2
  • Proximity gap 100-300 ⁇ m
  • Light source low-pressure mercury lamp, high-pressure mercury lamp, deuterium lamp, metal halide lamp, argon resonance lamp, xenon lamp, excimer laser, ultraviolet extinction ratio (degree of polarization): 1: 1 to 60: 1 ⁇ UV irradiation angle: 0-70 °
  • four domains can be formed by performing scanning exposure twice for each of the substrates 10a and 10b and performing scanning exposure for a total of four times. Therefore, it is possible to reduce the exposure processing time (tact time).
  • the exposure apparatus 30 having one stage 32 has been described.
  • the exposure apparatus 30 may have a plurality of stages. For example, a stage for the first exposure (1) and the second exposure (1) and a stage for the first exposure (2) and the second exposure (2) may be provided. Thereby, the tact time can be further shortened.
  • Embodiment 2 This embodiment is almost the same as Embodiment 1 except that the aspect of the exposure process is different.
  • the first exposure (1), (2) and the second exposure (1), (2) in order to change the exposure conditions of the first exposure (1), (2) and the second exposure (1), (2), the first exposure (1), (2) and the second exposure (1).
  • the second exposure (1), (2) in order to change the substrate surface illuminance.
  • the irradiation angle of polarized ultraviolet rays is set to be the same in the first exposure (1), (2) and the second exposure (1), (2). Yes.
  • the substrate surface illuminance is expressed by the following equation, where illuminance is L, irradiation angle is ⁇ , and transmittance of the polarizing filter is Tp.
  • (Substrate surface illumination) L ⁇ cos ⁇ ⁇ Tp
  • the illuminance L means the illuminance on the surface of the substrate (photo-alignment film) of the exposure light in a state where the exposure light (for example, polarized ultraviolet rays) is vertically incident on the surface of the substrate. .
  • FIG. 21 shows the result of actual measurement of the relationship between the substrate surface illuminance and the pretilt angle using a test cell. As shown in FIG. 21, it can be seen that the pretilt angle decreases as the substrate surface illuminance increases.
  • the region exposed by the first exposure (1) and / or (2) the region exposed by the first exposure (1) and / or (2)
  • the pretilt angle ⁇ 1 of the liquid crystal molecules in A1 and B1 was about 88.58 °.
  • the irradiation amount (exposure energy) was 20 mJ.
  • the relationship between the movement direction B of the substrate and the projection direction A of the polarized ultraviolet rays is the same in the case of the first exposure (1) and (2) and in the case of the second exposure (1) and (2). Different.
  • the ratio (percentage) of the substrate surface illuminance in the second exposure to the substrate surface illuminance in the first exposure is greater than 100% and not more than 500% (more preferably not less than 120%, 400% or less).
  • Embodiment 3 This embodiment is the same as Embodiments 1 and 2 except that the exposure conditions in the exposure process are different.
  • the exposure conditions that are different between the first exposure (1), (2) and the second exposure (1), (2) include the degree of polarization of exposure light (for example, polarized ultraviolet light), exposure.
  • Examples include the wavelength of light (for example, polarized ultraviolet rays), the transmittance of the photomask itself, and the like, which can be appropriately employed.
  • the wavelength of exposure light different the method of using the cut filter which permeate
  • a method for making the transmittance of the photomask itself different for example, one photomask for the first exposure (1), (2) or the second exposure (1), (2) is shaded. The method of giving is mentioned.
  • the mode in which one kind of exposure condition is different between the first exposure (1), (2) and the second exposure (1), (2) has been described.
  • the seed exposure conditions may be different from each other.
  • the exposure conditions described in the third embodiment are different from each other between the first exposure (1), (2) and the second exposure (1), (2). Also good.
  • Array substrate 2 Color filter substrate 3: Liquid crystal layers 4, 4a, 4b: Liquid crystal molecules 6a, 6b: Polarizing plates 7a, 7b: Retardation plate 10: Mother glass substrate 10a: Mother glass substrate 10b for array substrate: Mother glass substrate 11 for color filter substrate 11: Panel region 12: Source bus line 13: Gate bus line 14: Thin film transistor 15: Picture element electrode 16: Black matrix 17: Color filter 19: Photo-alignment films 21, 22, 23, A1 A2, B1, B2: Area 24: Normal exposure section 25: Exposure joint section 30: Exposure apparatus 31: Exposure head 32: Exposure stage 33: Table 34a, 34b: Ultraviolet light source 35: Imaging means 36a, 36b: Exposure unit 41 : Proximity gap 50: Photomask 52: Light shielding parts 51, 55 a, 55 b, 56 a, 6b, 61a, 61b, 65, 66, 71a, 71b: Translucent portion 51a, 51b: Translucent portion pattern 53

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  • Crystallography & Structural Chemistry (AREA)
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Abstract

L'invention concerne un dispositif d'exposition permettant de commander avec une grande précision un angle de pré-inclinaison, un dispositif d'affichage ainsi que le procédé de fabrication de ces deux dispositifs. Plus spécifiquement, l'invention concerne un dispositif d'exposition qui permet d'exposer un film d'orientation optique en déplaçant, relativement à une lumière d'exposition, un substrat sur la surface duquel a été placé un film d'orientation. Ce dispositif d'exposition effectue une première exposition consistant à exposer une première partie du film d'orientation et une seconde exposition consistant à exposer une deuxième partie du film d'orientation. Lors de la première exposition, la direction de déplacement du substrat relativement à la lumière d'exposition et la direction de projection, sur la surface du substrat, du rayonnement de la lumière d'exposition sont inverses. Lors de la seconde exposition, la direction de déplacement du substrat et la direction de projection sont identiques. L'angle entre la normale de la surface du substrat et le rayonnement est supérieur lors du second processus d'exposition.
PCT/JP2012/051588 2011-02-03 2012-01-26 Dispositif d'exposition, dispositif d'affichage à cristaux liquides ainsi que leur procédé de fabrication WO2012105393A1 (fr)

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WO2017057209A1 (fr) * 2015-10-02 2017-04-06 シャープ株式会社 Panneau d'affichage à cristaux liquides et son procédé de fabrication
WO2017057210A1 (fr) * 2015-10-02 2017-04-06 シャープ株式会社 Panneau d'affichage à cristaux liquides, procédé de fabrication de panneau d'affichage à cristaux liquides, et dispositif de fabrication de panneau d'affichage à cristaux liquides
WO2018139274A1 (fr) * 2017-01-26 2018-08-02 株式会社ブイ・テクノロジー Dispositif de rayonnement lumineux polarisé et procédé de rayonnement lumineux polarisé
WO2019142328A1 (fr) * 2018-01-19 2019-07-25 堺ディスプレイプロダクト株式会社 Procédé de fabrication de dispositif d'affichage à cristaux liquides et photomasque
WO2019216287A1 (fr) * 2018-05-11 2019-11-14 株式会社ブイ・テクノロジー Dispositif d'exposition et procédé d'exposition

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WO2007086474A1 (fr) * 2006-01-26 2007-08-02 Sharp Kabushiki Kaisha Procédé de fabrication d’un dispositif d’affichage à cristaux liquides, et dispositif d’affichage à cristaux liquides
WO2008105538A1 (fr) * 2007-03-01 2008-09-04 Zeon Corporation Composé polymérisable de cristaux liquides, composition polymérisable de cristaux liquides, substance polymère et anisotrope sur le plan optique de cristaux liquides
WO2009037889A1 (fr) * 2007-09-21 2009-03-26 Sharp Kabushiki Kaisha Dispositif d'affichage à cristaux liquides et son procédé de fabrication

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WO2007086474A1 (fr) * 2006-01-26 2007-08-02 Sharp Kabushiki Kaisha Procédé de fabrication d’un dispositif d’affichage à cristaux liquides, et dispositif d’affichage à cristaux liquides
WO2008105538A1 (fr) * 2007-03-01 2008-09-04 Zeon Corporation Composé polymérisable de cristaux liquides, composition polymérisable de cristaux liquides, substance polymère et anisotrope sur le plan optique de cristaux liquides
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Cited By (8)

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Publication number Priority date Publication date Assignee Title
WO2017057209A1 (fr) * 2015-10-02 2017-04-06 シャープ株式会社 Panneau d'affichage à cristaux liquides et son procédé de fabrication
WO2017057210A1 (fr) * 2015-10-02 2017-04-06 シャープ株式会社 Panneau d'affichage à cristaux liquides, procédé de fabrication de panneau d'affichage à cristaux liquides, et dispositif de fabrication de panneau d'affichage à cristaux liquides
CN108027539A (zh) * 2015-10-02 2018-05-11 夏普株式会社 液晶显示面板及其制造方法
JPWO2017057210A1 (ja) * 2015-10-02 2018-08-02 シャープ株式会社 液晶表示パネル、液晶表示パネルの製造方法及び液晶表示パネルの製造装置
CN108027539B (zh) * 2015-10-02 2021-05-04 夏普株式会社 液晶显示面板及其制造方法
WO2018139274A1 (fr) * 2017-01-26 2018-08-02 株式会社ブイ・テクノロジー Dispositif de rayonnement lumineux polarisé et procédé de rayonnement lumineux polarisé
WO2019142328A1 (fr) * 2018-01-19 2019-07-25 堺ディスプレイプロダクト株式会社 Procédé de fabrication de dispositif d'affichage à cristaux liquides et photomasque
WO2019216287A1 (fr) * 2018-05-11 2019-11-14 株式会社ブイ・テクノロジー Dispositif d'exposition et procédé d'exposition

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