TW201241523A - Exposure device, liquid crystal display device, and method of manufacturing same - Google Patents

Abstract

The present invention provides an exposure device, a liquid crystal display device, and a method of manufacturing same with which it is possible to control a pretilt angle with high precision. The present invention is an exposure device which exposes a photo-aligned film which is disposed on the obverse face of a substrate while moving the substrate relative to an exposure light. The exposure device carries out a first exposure which exposes a first portion of the photo-aligned film and a second exposure which exposes a second portion of the photo-aligned film. In the first exposure, the direction of the movement of the substrate relative to the exposure light and the direction of the projection on the face of the substrate of the direction of the illumination of the exposure light have substantially opposite orientations. In the second exposure, the direction of the movement and the direction of the projection have substantially the same orientation. An angle formed by the direction of the normal of the face of the substrate and the direction of the illumination is greater in the second exposure than in the first exposure.

Description

201241523 VI. Description of the Invention: [Technical Field] The present invention relates to an exposure apparatus, a liquid crystal display device, and a method of manufacturing the same. More specifically, the present invention relates to an exposure apparatus which is preferably used for alignment treatment of a photo-alignment film, a liquid crystal display device including a photo-alignment film, and a method of manufacturing the liquid crystal display device. [Prior Art] A liquid crystal display device is widely used for televisions, screens for personal computers, and screens for portable terminals, because it can realize weight reduction, thinning, and low power consumption. Such a liquid crystal display device generally controls the transmittance of light transmitted through the liquid crystal layer by the inclination angle of liquid crystal molecules which are changed in accordance with the voltage applied between a pair of substrates (liquid crystal layer). Therefore, the transmittance of the liquid crystal display device has an angle dependency. As a result, in the conventional liquid crystal display device, display defects such as a decrease in the viewing angle (observation) direction and a gray scale inversion in the middle color display may occur. Therefore, in general, there is room for improvement in the improvement of the viewing angle characteristics in the liquid crystal display device. Therefore, there has been developed a technique of assigning alignment of pixels to regions of two or more different tilt directions of liquid crystal molecules. According to this technique, when a voltage is applied to the liquid crystal layer, the liquid crystal molecules are inclined in different directions in the pixel, whereby the viewing angle characteristics can be improved. Furthermore, the regions with different alignment directions are also referred to as domains, and the alignment segmentation is also referred to as multi-domain (existing domain) ° 'Nematic in horizontal alignment mode' mode, multi-domain electronic control as The liquid crystal mode of the alignment division lists a multi-domain twisted nematic (TN; Twisted 161897.doc 201241523 Electrically Controlled Birefringence (ECB) mode, Multi-domain Optically Compensated Birefringence (OCB) mode, etc. On the other hand, In the vertical alignment mode, a multi-domain vertical alignment (MVA; Multi-Domain Vertical Alignment) mode, a multi-domain vertical alignment twisted nematic (VATN; Vertical Alignment Twisted Nematic) mode, and a PVA (Patterned Vertical Alignment) image vertical adjustment are exemplified. Mode, multi-domain VAEBC (Vertical Alignment ECB) mode, etc., and various improvements in the liquid crystal display device of each mode are implemented to achieve further widening. As a method of performing alignment division, List rubbing method, light alignment method, etc. (for example, refer to patent text) 1, 2, 5) As a specific example of the rubbing method, there is proposed a method in which the rubbing region and the non-friction region are separated by a resist formed by patterning, and the rubbing treatment of the alignment film is performed. The method of rubbing the surface of the alignment film by the cloth wound on the roll is subjected to the alignment treatment. Therefore, in the rubbing method, garbage such as cloth or shaving may be generated, or the switching element may be destroyed or characterized by static electricity. On the other hand, the photo-alignment method uses a photo-alignment film as an alignment film, and irradiates (exposes) light such as ultraviolet rays to the photo-alignment film, thereby causing an alignment regulating force to be generated in the alignment film. And/or the method of aligning the alignment direction of the alignment film. Therefore, the photo-alignment method can perform the alignment treatment of the alignment film in a non-contact manner, thereby suppressing the generation of contaminants, garbage, and the like in the alignment treatment. By using a reticle, light can be irradiated to different areas of the alignment film in different conditions. 161897.doc 201241523 is irradiated. Therefore, 'the desired design can be easily formed. In recent years, with the enlargement of liquid crystal display devices, LCD TVs are rapidly entering the size range of 40 to 60 inches, which was previously the main market for plasma TVs. However, by the optical alignment method, this kind of 60 It is very difficult to divide the alignment of the large liquid crystal display device of the inch size. The reason is that the exposure device capable of exposing the substrate of 6 inches in size and being sized in the factory has not existed so far. The entire surface of the graded substrate is exposed at one time. Therefore, when the large liquid crystal display device is divided by the optical alignment method, the substrate is not divided and the exposure is performed. Further, in the case where the liquid crystal display device of the 20-inch class is divided by the photo-alignment method, it is considered that the size of the exposure device is as small as possible. It is considered that it is necessary to divide the substrate several times and perform exposure. However, in the liquid crystal display device in which the substrate is divided and exposed in this manner and subjected to the alignment division in this manner, the seam between the respective exposure regions is clearly visible on the display surface, and becomes a defective product. Therefore, when the liquid crystal display device is divided by the alignment by dividing the substrate into exposure, there is still room for improvement in terms of improving the display quality and improving the yield. The inventors of the present invention have developed the following methods and have applied for a patent (see Patent Document 3). The method includes an exposure step of exposing the alignment film to an exposure region in which the substrate is divided into two or more in the plane of the substrate, and the exposure step is repeated in one of the adjacent exposure regions. The exposure is performed in a manner that the photomask has a halftone portion corresponding to the repeated exposure regions. [Patent Document 1] [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei No. Hei No. Hei. No. Hei. No. Hei. No. Hei. Document 4: Japanese Patent Publication No. 2008-538819 Patent Document 5: Japanese Patent Laid-Open No. 2010-39485 Non-Patent Document Non-Patent Document 1. M. Kimura and the other three, "Photo-Rubbing Method: A Single -Exposure Method to Stable Liquid-Crystal

Pretilt Angle on Photo-Alignment Film", IDW1 04: proceedings of the 11th International Display Workshops, IDW'04 Publication committee, 2004, LCT2-1, p. 35-38 [Summary of the Invention] A method of performing alignment division using the photo-alignment method will be specifically described. Here, a method of manufacturing a liquid crystal display panel in a VATN mode (hereinafter also referred to as a 4VATN mode) of four domains will be described as an example. First, the alignment processing method of the substrate for the 4 VATN mode will be described. In the production method, the substrate is divided into a plurality of regions by a scanning exposure apparatus to perform alignment processing. As shown in FIGS. 22 and 23, the scanning exposure apparatus 130 used in the above-described manufacturing method is a one-stage scanning exposure apparatus, and includes an exposure stage 132 including a plurality of exposure heads 131, and a mother glass substrate placed thereon. Workbench 133 moving in a specific direction along 161897.doc -6 - 201241523. A plurality of panel regions 111 are provided on the mother glass substrate 110. The plurality of exposure heads 131 are arranged at a distance from the direction b1 of the moving direction (scanning direction) aal of the substrate 11A. Each of the exposure heads Hi is supported in a state in which it can move in the direction b1 in a plane parallel to the illuminated surface of the substrate 11. Each of the exposure heads 13 1 includes an ultraviolet light source 丨 34 that emits ultraviolet rays, a mask 150, a polarizing filter provided between the light source 134 and the mask 15A, and an optical member (not shown) such as an optical lens. Further, the surface of the substrate 11 can be irradiated with polarized ultraviolet rays at a specific irradiation angle (for example, 40°) through the mask 15 。. The photomask 150 is, for example, a plate-like member, and as shown in FIG. 24, includes a transparent substrate formed using quartz glass or the like, a light-shielding portion 152 formed in a stripe pattern on the surface of the transparent substrate, and a plurality of light-transmitting portions 151 each The light transmitting portion 151 is elongated and the plurality of light transmitting portions 151 are arranged in the direction b1 with a certain distance therebetween. The above spacing is set to be equal to the pixel spacing. Further, the dimension of the distance between the light transmitting portions 15 1 is set to a size of about 丨/2 of the pixel pitch. Further, as shown in Fig. 25, the photomask 150 includes a central region 153 and an overlapping region 154. Further, the length of the light transmitting portion 156 provided in the overlapping region 154 gradually becomes shorter as it goes away from the central portion 153. Thereby, the aperture ratio of the light transmitting portion 156 gradually becomes smaller as it goes away from the central region 153. Thus, the aperture ratio of the light transmitting portion 156 becomes smaller than the aperture ratio of the light transmitting portion 155 provided in the central region 153. When the substrate 110 passes directly under the reticle 150, only the region directly under the light transmitting portion 151 is exposed. In addition, the aperture ratio refers to the ratio (percentage) of the area of the light-transmitting portion to the area of the light-transmitting portion (usually the light-transmitting portion having the largest area) of any of the light-transmitting portions. Next, a method of exposing the substrate 110 using the exposure device 130 will be described. As shown in FIGS. 26 and 27, while the substrate no and the table are moved in the +χ axis direction, the polarizing film is irradiated with ultraviolet light from one end of the light alignment film H9 provided on the surface of the substrate 110 to the other end. (1st exposure (1)). As a result of the first exposure (1), the region in the region 121 through which the central region 153 passes and the region in the left half of the region where the overlap region 154 passes (hereinafter also referred to as the left region) are exposed. However, since the aperture ratio of the light transmitting portion 156 in the overlapping region 丨 54 is smaller than the aperture ratio of the light transmitting portion 155 in the central region 153, the irradiation amount in the left region in the region 122 is also smaller than the irradiation amount in the left region of the region 12. . Further, the pixel region in the region 123 where the light transmitting portion 151 of the photomask 15 is not passed is not exposed at this stage. It is recognized that the substrate 110 and the table are moved in the -X pumping direction and returned to the position immediately before the exposure platform 132. Further, each of the exposure heads 31 is moved in the +y-axis direction by a distance of one exposure head size. As a result, the central region 153 is disposed corresponding to the region 123, and the overlapping region 154 is disposed corresponding to the region 122. Further, as shown in Figs. 26 and 27, the substrate 11 () and the table are moved in the +χ axis direction, and one of the light alignment films 119 is provided on the surface of the substrate 110 from the one end to the other end. The polarized ultraviolet ray is irradiated (first exposure (2)). As a result of the first exposure (2), the left region of the picture region is exposed in the region 123 through which the central region 153 passes. Further, the left region of the region 122 in the region 122 through which the overlap region 154 passes is again exposed. Thus, the first exposure (1) and the first exposure (2) illuminate the same left region of the pixel region. 161897.doc 201241523 It is recognized that the substrate 110 and the table are moved in the direction of the x-axis and returned to the position immediately before the exposure stage 132. Further, the substrate 11 () was rotated in the plane by 18 Å. And placed on the workbench. Further, each of the exposure heads 131 is moved in the -y sleeve direction by a distance of one exposure head. As a result, the photomask 15 is disposed at substantially the same position as that at the time of the first exposure (1). However, the mask 150 is disposed at a position deviated from the y-axis direction by a general distance of the pixel pitch as compared with the position of the second exposure (1). Further, as shown in Figs. 26 and 27, the substrate 11 and the table are moved in the +χ axis direction, and the polarized ultraviolet rays are irradiated from one end of the optical alignment film 119 to the other end via the mask 150 (second exposure). (丨)). As a result of the second exposure (i), the region (hereinafter also referred to as the right region) of the right half of the picture region in the region 121 through which the central region i 53 passes and the region 122 through which the overlap region 154 passes is exposure. However, the amount of illumination in the right region within region 22 is less than the amount of illumination in the region within region 121. Further, the right region of the pixel region in the region 123 through which the light transmitting portion 151 does not pass is not exposed at this stage. The person moves the substrate and the table in the direction of the -X axis and returns to the position immediately before the exposure stage 132. Further, each of the exposure heads 131 is moved in the +y-axis direction at a distance equal to the size of one of the exposure heads. As a result, the central area 153 is arranged corresponding to the area 123, and the overlapping area ι54 is arranged corresponding to the area 122. Further, the photomask 150 is disposed at substantially the same position as that at the time of the first exposure (2). However, compared with the position at the time of the first exposure (2), the mask 150 is disposed at a position shifted by one half of the pixel pitch in the y-axis direction. 0 5 161897.doc 201241523 Also, as shown in FIGS. 26 and 27 As shown in the figure, while the substrate 110 and the table are moved in the +x-axis direction, the polarized ultraviolet rays are irradiated from one end to the other end of the photo-alignment film 119 via the mask 150 (second exposure (2)). The result of the second exposure (2) is that in the region 123 where the central region 153 passes, the right region of the pixel region is exposed. Further, in the region 122 through which the overlapping region 154 passes, the right region of the pixel region is again exposed. Thus, the second exposure (1) and the second exposure (2) are irradiated to the same right region of the picture element region. As a result of the above, the substrate 110 is exposed over the entire surface, and the photoalignment processing of the substrate n is completed. Further, each of the pixel regions is divided into two alignment regions, and a portion (only the exposure portion) that is exposed only once and a portion that is exposed twice (continuation exposure portion) are formed on the substrate 110, and the substrate is used.丨〇When the liquid crystal display panel is produced, it is possible to continue to view the seam, but since the aperture ratio of the light-transmitting portion 156 in the overlap region 154 is gradually smaller as it is away from the central region 153, the connection can be made. The seams are no longer eye-catching. As a method of making the seam unobtrusive, for example, the method of Patent Document 3 can be suitably employed. Moreover, in the left area and the right area of the picture element area, the pretilt angle needs to be the same size, so the exposure conditions of the first exposure (1), (2), and the second exposure (1), (2) are all set to be the same. . Furthermore, the exposure apparatus 13 including one platform 132 will be described herein, but the exposure apparatus 130 may also include a plurality of platforms. For example, the platform may be separately provided with respect to the first exposure (1), the second exposure (2), the second exposure (1), and the second exposure (2). In this case, the design conditions of the overlapping regions of the masks of the respective platforms (corresponding to the regions of the continued exposure portion) are also set to be the same. Figure 28 is a plan view schematically showing the relationship between various directions in the respective pixels in the substrate 161897.doc •10·201241523 after the exposure step shown in Figs. 26 and 27, as shown in Fig. 28, at the first exposure (1) '(7), and between the second exposures (1) and (7), the projection direction A toward the substrate surface in the irradiation direction of the polarized ultraviolet rays is parallel to each other and differs by 180. The orientation. Further, between the first light (1), (2), and the second exposure (1), (7), the moving direction B of the substrate becomes parallel to each other and differs by 18 Å. The direction of the direction. The result is that the left region of the exposed pixel region is exposed by the second exposure (1) and/or the second exposure (2), and by the second exposure (丨) and/or the second exposure (2) Between the right regions of the exposed pixel regions, the tilt directions C of the liquid crystal molecules in the vicinity of the photoalignment film become parallel to each other and differ by 18 Å. The orientation. Further, the relationship between the projection direction A and the moving direction B of the substrate is the same for all exposures (first exposure (1), (2), and second exposure (1), (2)). Further, in the present specification, as shown in Fig. 29, the 'inclination direction c' refers to a projection direction of the long axis of the liquid crystal molecules 4b in the vicinity of the photo-alignment film toward the surface of the substrate 1''. Further, the "tilt angle" refers to the angle between the long axis of the liquid crystal molecules 4b and the surface of the substrate 10. Further, the pretilt angle means an inclination angle when no voltage is applied. Next, the two substrates which were subjected to the above-described alignment treatment were bonded so that the irradiation directions of the polarized ultraviolet rays were orthogonal to each other. Further, a nematic liquid crystal material having a negative dielectric anisotropy is sealed between the two substrates to form a liquid crystal layer, whereby the liquid crystal display panel of the 4VATN mode is completed. Fig. 30 is a schematic view showing the alignment direction of liquid crystal molecules in each picture element. The liquid crystal molecules are aligned in the direction of the alignment treatment performed in each region of each substrate, that is, in accordance with the irradiation direction of the polarized ultraviolet rays. As a result, as shown in FIG. 30, the liquid crystal molecules in the vicinity of one substrate (lower substrate) are 161,897.doc -1, 2012,415,23, the oblique direction (the dotted arrow of the figure), and the other substrate (the upper substrate). The tilt direction of the liquid crystal molecules in the vicinity (the solids in Fig. 3G are orthogonal to each other. μ) and the four domains D11 to D14 in which the alignment directions of the liquid crystal molecules are different from each other are formed in the respective pixels. The first exposure (1), (7), and the second exposure (1), (7) have the same exposure conditions, and the projection direction A and the movement direction B of the substrate are related to all exposures (fourth light). (1), (7), and the second exposure (1), (7)) are the same. Therefore, the pretilt angles obtained after each exposure are also the same value. When liquid crystal molecules in each domain are applied with a sufficient driving voltage of a threshold or more on the liquid crystal layer ( When the voltage is applied, the tilting direction of the two substrates is divided into two. For example, the liquid crystal molecules 104a located at equal distances from the surfaces of the two substrates are applied at a voltage of 45. Azimuth, 135. 225. Orientation 3, the liquid crystal molecules are tilted to a direction substantially parallel to the faces of the two substrates. As a result, the transmittances of all domains become the same, the transmittance is high, and the display quality is achieved. Fig. 31 shows the result of simulating the brightness of one picture element in the liquid crystal display panel of the first aspect. Here, a polarizing plate is disposed on the outer side of each substrate. The polarizing plate is disposed such that the absorption axis is parallel to the oblique direction of the liquid crystal molecules in the vicinity of the upper substrate (the solid arrow of FIG. 3), and the other polarizing plate is the absorption axis. The liquid crystal molecules in the vicinity of the lower substrate are arranged in parallel with each other in the oblique direction (the dotted arrow in Fig. 30). As shown in Fig. 31, the tilting directions of the liquid crystal molecules 104a in the four domains D11 to D14 are substantially 90. Therefore, at the boundary of the different domains of 161897.doc •12- 201241523, the liquid crystal molecules 104a are connected in such a manner that the liquid crystal molecules 1 〇 4a which are to be dumped in the same complementary direction are continuously connected. Further, the tilting direction of the liquid crystal molecules i〇4a in the four domains D11 to D14 differs by about 45 from the absorption axis directions of the two polarizing plates. As a result, the liquid crystal molecules 104a on the boundary of the different domains are The alignment direction is an orientation that is substantially the same or substantially orthogonal to the absorption axis direction of the two polarizing plates. Therefore, at the boundary of the different domains, the polarization of the polarizing plate passing through the lower side does not cause a delay (phase difference) due to the liquid crystal molecules. That is, the polarized light transmitted through the polarizing plate on the lower side is not affected by any influence of the liquid crystal layer. The polarized light transmitted through the polarizing plate on the lower side cannot pass through the polarizing plate on the upper side. As a result, the brightness is lower at the boundary of different domains. A dark line, that is, a dark line. According to the method of using the scanning exposure apparatus 130, a liquid crystal display device having high transmittance and excellent display quality can be realized. However, it is necessary to perform a total of four scanning exposures on the i-block substrate. The exposure processing time is long, and there is room for improvement in shortening the takt time. Therefore, as an alternative to the scanning exposure apparatus 13A, there is a scanning exposure apparatus 230 that halve the number of masks. As shown in Fig. 32, the exposure device 230 includes an exposure stage 232 that includes a plurality of exposure heads 23A. Each of the exposure heads 231 includes a light source and an optical member for the first exposures (1) and (2), a light source and an optical member for the second exposures (1) and (2), and a mask 25 on each of the masks 250. The light transmitting portion patterns 251 & for the first exposures (1) and (2) and the light transmitting portion patterns 251b for the second exposures (1) and (2) are formed. The light transmitting portion patterns 25u' 25 lb are disposed, for example, at a distance of one-half the distance from the pixel pitch. Further, as shown in FIGS. 32 and 33, the polarized ultraviolet light generated by the light source 1313105.doc 201241523 for the first exposure (1) and (2) is irradiated to the light transmitting portion pattern 25 la, and the second exposure is performed (1). (2) The polarized ultraviolet light generated by the light source is irradiated to the light transmitting portion pattern 2 5 1 b, and in this state, the substrate 11 is caused to pass under the mask 250. The polarized ultraviolet rays are irradiated in opposite directions from each other. Thereby, the first exposure (1) and the second exposure (1) can be simultaneously performed, and the second exposure and the second exposure (2) can be simultaneously performed. In other words, the alignment process is completed by performing only two scanning exposures on one substrate, so that the process time can be shortened. However, in the case of using the exposure device 230, the asymmetry of the pretilt angle sometimes occurs. One of the objects of the present invention is to solve this problem. The subject is explained in detail below. When the exposure device 230 is used, as shown in FIG. 34, between the ith exposure (1), (2), and the second exposure (1), (2), the direction of the polarized ultraviolet light is directed toward the substrate surface. The relationship between the projection direction A and the moving direction B of the substrate is different from each other. Further, when the relationship between the projection direction A and the movement direction B between the first exposures (1) and (2) and the second exposures (1) and (2) is different from each other, the first exposure (Ό, ( 2) When the exposure conditions of the second exposures (1) and (2) are set to be the same, the characteristics such as the pretilt angle and the anchoring energy are caused by the first exposure (1), (2) of the photoalignment film. The exposed portion is different from the exposed portion of the second exposure (1), (2) by the photo-alignment film. The reason is not clear, but it is presumed that the scanning direction of the substrate itself may be to the photo-alignment film. The alignment regulation force has some influence. The asymmetry of the alignment regulation force is related to the tilting orientation of the liquid crystal molecules when the dust is applied. The orientation deviation is related to the orientation deviation. 161897.doc 201241523 In the case of using the exposure device 230, As shown in Fig. 35, four domains D21 to D24 in which the alignment directions of the liquid crystal molecules 104a are different from each other are also formed in the respective pixels. However, as shown in the following table, the two alignments in the pixels in each substrate are shown. The pretilt angles of the regions are different from each other. Therefore, the pretilt angle of the upper and lower substrates in the four domains D21 to D24 The combinations are (high, high), (high, low), (low, 咼), (low, low). In the domains D21 and D24 in which the pretilt angles of the upper and lower substrates are the same, the liquid crystal molecules 1 are etched during voltage application. However, in the domains D22 and D23 in which the pretilt angles of the upper and lower substrates are different from each other, the liquid crystal molecules 10a are tilted in such a manner that the tilt direction is inclined toward the tilt direction of the substrate side having a lower pretilt angle. 1] Pre-tilt upper substrate lower substrate D21 Θ 2 (high) D22 Θ 2 (high) Θ 1 (low) D23 Θ 1 (low) 92 (rij) D24 Θ 1 (low) Θ 1 (low) Hereinafter, the exposure device 230 is used to actually create a plural number The test unit describes the result of detecting the pretilt angle of the units. Two kinds of substrates 3丨〇a and 3丨〇b are prepared as the substrate for the test unit. As shown in Fig. 36, in the exposure step of the substrate 310a, The moving direction (scanning direction) a2 and the oblique direction C of the substrate 31 〇 & and the projection direction of the substrate surface toward the irradiation direction of the polarized ultraviolet ray are set to be parallel to each other and are different from each other by 18 Å. The following is also referred to as forward exposure. As shown in the exposure step of the substrate 310b, the moving direction (scanning direction) a3 of the substrate 31b and the projection direction of the polarized ultraviolet light toward the substrate surface 16l897.doc - \5 - δ 201241523 The direction C is set to be parallel to each other and is different from each other. The exposure in this direction is also referred to as reverse exposure below. Further, as shown in Fig. 38, the photomask 350 used herein is formed in a slit shape. The plurality of light transmitting portions 351' and the light transmitting portions 351 are formed to be parallel to each other. Further, three types of cells 1 to 3 are formed using the substrates 310a and 310b. As shown in FIGS. 39 to 41, the cells 1 to 3 are units of the VATN mode of the one domain, and the substrate 3 10a which is the forward exposure is used as the upper and lower substrates in the cell j, and the substrate 310a which is the forward exposure is used in the cell 2 as the substrate On the upper substrate, the substrate 3 10b which is reverse-exposed is used as the lower substrate, and in the unit 3, the substrate 31 〇b which is reverse-exposed is used as the upper and lower substrates. In FIGS. 39 to 41, an arrow B indicates a moving direction of the substrate, an arrow C indicates an oblique direction, a broken line indicates a moving direction and an inclined direction of the lower substrate side, and a solid arrow indicates a moving direction and an inclined direction of the upper substrate side. . The measurement results of the pretilt angles of the units 丨 and 3 are shown in Table 2 below. [Table 2] Pretilt angle (°) Unit 1 88.9 Unit 3 89.1 As shown in Table 2, it can be seen that the reverse exposure is performed as compared with the unit 1 in which the substrate exposed in the forward direction is combined with the substrate which is exposed in the forward direction. In the unit 3 in which the substrate is combined with the substrate for reverse exposure, the pretilt angle becomes larger by 2. about. Also, the extinction position angles of the units 1 to 3. In addition, as shown in FIG. 42, the extinction position angle is defined as a polarizing element (absorption axis p of the polarizing element) and a deposition sheet (absorption axis of the deposition sheet) which are arranged in a positive-polarized state in a voltage application state. A) When the camera is constantly rotating, the unit becomes the darkest angle. As shown in Fig. 42 161897.doc -16-201241523, if the pretilt angles of the upper and lower substrates are equal to each other, and the voltage is applied to tilt the angle formed by the tilt direction of the upper and lower substrates by the direction of the crystallization molecule 304, the extinction position angle becomes 45. . Angle of (45. Table 3 below shows the extinction angle of the unit 丨~3. Figures 43 to 4S show the mode of the extinction angle of the single U~3. Figs. 43 to 45, the dotted arrow indicates the lower substrate. Side view main-needle direction 'solid arrow' does not indicate the tilt direction of the substrate side. [Table 3] Extinction position angle η Unit 1 45 Unit 2 47 Unit 3 45 As shown in Table 3 and Figures 43 and 45, unit 3 The extinction position angle is 45. It is considered that the pretilt angles of the upper and lower substrates are equal to each other. On the other hand, as shown in Table 3 and FIG. 44, it is understood that the extinction position angle of the unit 2 is 47. The liquid crystal molecules are biased toward the upper substrate. The tilting direction of the side is tilted. In the unit 2, since the tilting orientation of the liquid crystal molecules is biased toward the substrate side in the forward direction, the pretilt angle of the upper substrate is considered to be lower than the pretilt angle of the lower substrate. The result is integrated. The pretilt angle of the liquid crystal molecules is a very important parameter in the design of the liquid crystal display device, which can affect various characteristics of the liquid crystal display device. Therefore, regardless of the liquid crystal mode, the pretilt angle needs to be controlled with high precision. In the vatn mode, as described in Patent Document 4, it is extremely important to control the pretilt angle with high precision. Further, in Patent Document 5, it is described that the number of masks of 161897.doc 5 201241523 is halved as in the above-described exposure apparatus 230. The scanning exposure apparatus has a content of adjusting the exposure energy and the tilt angle between (4) and the second light to adjust the degree of the silk-reactive polymer film. However, it is not described. There is still room for further research on the specific adjustment method of the degree. 'The purpose is to provide a liquid crystal display device and the system thereof. The invention is a kind of exposure device capable of controlling the pretilt angle with high precision in view of the above-mentioned status quo." Means for Solving the Problems The inventors of the present invention conducted various studies on exposure cracking capable of controlling the pretilt angle with high precision and a method of manufacturing a liquid crystal display device, focusing on the following aspect: in a certain portion of the photoalignment film (the丨 part) between the exposure of the akisaki light and the second exposure of the other part of the optical alignment film (the second part), the pair of substrates The relationship between the relative movement direction of the exposure light and the projection direction of the exposure light to the substrate surface is different from each other. More specifically, for the second exposure, the moving direction is substantially opposite to the projection direction. In the second exposure, the moving direction is substantially the same as the projection direction. Further, it is found that even in such a state, the exposure conditions are different between the second exposure and the second exposure, and more specifically In other words, (1) the angle between the normal direction of the surface of the substrate and the irradiation direction of the exposure light is greater than the second exposure when the second exposure is performed, and (2) the alignment of the exposure light is directed to the surface of the film. The illuminance is greater than the first exposure when the second exposure is performed, and (3) the exposure conditions of the above (1) and (2) are combined, and the pretilt angle can be reduced between the first portion and the second portion. The present invention has been made in view of the fact that it is possible to solve the above problems perfectly. 16I897.doc -18-201241523 That is, the first aspect of the present invention is an exposure apparatus (hereinafter also referred to as a first exposure apparatus of the present invention) which has a substrate on a surface of which a photoalignment film is provided and which is relatively moved with respect to exposure light. The first exposure unit that exposes the first portion of the photo-alignment film and the second exposure portion that exposes the second portion of the photo-alignment film, the first exposure device that exposes the first portion of the photo-alignment film, In the second exposure, the direction of the relative movement of the exposure light and the direction of the exposure of the exposure light to the surface of the substrate are opposite in the direction of the second exposure, in the second exposure, the movement direction and The projection direction is substantially the same direction, and an angle formed by a normal direction of the surface of the substrate and the irradiation direction (hereinafter also referred to as an irradiation angle) is greater than the first exposure time at the second exposure. The configuration of the first exposure apparatus of the present invention is not particularly limited by other constituent elements as long as it is formed by such a constituent element. A second aspect of the present invention is an exposure apparatus (hereinafter also referred to as a first exposure apparatus of the present invention) which has a substrate on a surface of which a photo-alignment film is relatively moved with respect to exposure light, and faces the photo-alignment film. The exposure apparatus is configured to perform a first exposure for exposing a second portion of the photo-alignment film and a second exposure for exposing a second portion of the photo-alignment film, wherein the substrate is exposed during the first exposure The direction of the relative movement of the exposure light and the direction of the exposure of the exposure light to the surface of the substrate are substantially opposite directions, and in the second exposure, the moving direction is substantially the same direction as the projection direction, and The illuminance (hereinafter also referred to as the substrate surface illuminance) of the exposure light on the surface of the light-aligning flag is greater than the first exposure time when the exposure is performed in the second 161,897, doc -19, 2012, 415, 223. The configuration of the second exposure apparatus of the present invention is not particularly limited by other constituent elements as long as it is formed by such a constituent element. A third aspect of the present invention relates to a method of manufacturing a liquid crystal display device (hereinafter also referred to as a method of manufacturing a first liquid crystal display device of the present invention), which comprises moving a substrate having a photoalignment film on a surface thereof with respect to exposure light. An exposure step of exposing the photo-alignment film; in the exposing step, performing a first exposure for exposing a second portion of the photo-alignment film and exposing a second portion of the photo-alignment film (2) in the first exposure, the projection direction of the relative movement direction of the exposure light and the irradiation direction of the exposure light on the substrate is substantially opposite to the projection direction, and the moving direction is in the second exposure The projection direction is substantially the same direction, and an angle (irradiation angle) between the normal direction of the surface of the substrate and the irradiation direction is greater than the first exposure time at the second exposure. The steps of the method of manufacturing the first liquid crystal display device of the present invention are not particularly limited by the other steps as long as they must include such steps. A fourth aspect of the present invention is a method of manufacturing a liquid crystal display device (hereinafter also referred to as a method of manufacturing a second liquid crystal display device of the present invention), which comprises moving a substrate having a photoalignment film on a surface thereof relative to exposure light. An exposure step of exposing the photo-alignment film; in the exposing step, 'the 161897.doc -20-201241523 light for exposing the i-th portion of the photo-alignment film, and the photo-alignment film In the second exposure in which the two portions are exposed to the first exposure, the projection direction of the relative movement direction of the exposure light and the irradiation direction of the exposure light on the substrate is substantially opposite to the projection direction. In the exposure, the moving direction is substantially the same direction as the projection direction, and the illuminance (substrate surface illuminance) on the surface of the light aligning film of the exposure light is greater than the ith exposure when the second exposure is performed. The steps of the manufacturing method of the second liquid crystal display device of the invention are as long as they are necessary to include such (4) and are subject to the special requirements of (4). Furthermore, in the first and second exposure apparatuses of the present invention and the method of manufacturing the first and second liquid crystal display devices of the present invention, the exposure light and the substrate are not particularly limited to movement, and only One of the movements may also move both, and the irradiation direction may be the direction of the optical axis. Further, in the first and second exposure apparatuses of the present invention and the method of manufacturing the first and second liquid crystal display devices of the present invention, the moving direction is substantially opposite to the projection direction, and the two directions are not necessarily strict. The ground is in the opposite direction, and the angle formed by the two directions is preferably 175. (More preferably Μ.) Above, 180. the following. Further, the direction in which the direction of movement of the whistle and the whistle is substantially the same as the direction of the projection is not necessarily strictly the same direction, and the angle formed by the two directions is preferably 〇. Above, 5. (more preferably 2.) below. In the first exposure, the moving direction and the projection square power may be smaller than Μ0, and the angle between the moving direction and the projection direction may be greater than 〇 in the second exposure. . 161897.doc 201241523 Hereinafter, preferred embodiments of the first and second exposure apparatuses of the present invention, and the method of manufacturing the first and second liquid crystal display devices of the present invention will be described in detail. The various forms shown below can be combined as appropriate, and the form in which the following two or more preferred forms are combined with each other is also a preferred embodiment. In the first and second exposure apparatuses of the present invention, and the manufacturing method of the first and second liquid crystal display devices of the present invention, the light alignment film is preferably used according to exposure light (which may also be an optical axis of exposure light). A material (optical alignment material) that changes the direction of alignment of the liquid crystal by the direction and/or the direction of movement of the exposure light on the film. In the first exposure apparatus of the present invention and the method of manufacturing the first liquid crystal display device of the present invention, the difference between the irradiation angle at the time of the first exposure and the irradiation angle at the time of the second exposure is preferably greater than zero. 20. The following (more preferably 5 or more, 15 or less). In the second exposure apparatus of the present invention and the method of manufacturing the second liquid crystal display device of the present invention, when the substrate surface illuminance at the time of the first exposure is 1%%, the substrate surface illuminance at the second exposure is preferably More than 1 〇〇%, 5 〇〇% or less (more preferably 120% or more, 400% or less). The first and second exposure devices of the present invention may also perform the above-described steps separately! Exposure and the second exposure, but in terms of shortening the processing time, the first and second exposure apparatuses of the present invention preferably perform the first light and the second exposure simultaneously. According to the same viewpoint, in the above exposure step, the second exposure and the second exposure are preferably performed simultaneously. Preferably, the first and second exposure apparatuses of the present invention emit ultraviolet rays to the above-mentioned photoalignment film 161897.doc -22· 201241523. Thereby, the required pretilt angle can be easily found. Further, the wavelength range of the above-mentioned standby and external lines may be appropriately set according to the material of the exposed light alignment film. From the same viewpoint, in the above exposure step, it is preferred to irradiate the above-mentioned photo-alignment film with ultraviolet rays. The above ultraviolet rays are preferably polarized ultraviolet rays. Thus, the anisotropic rearrangement and/or chemical reaction of the molecules in the photoalignment film can be easily caused by irradiating the anisotropic material and the external line to the photo-alignment film. Therefore, the alignment direction of the liquid crystal molecules in the vicinity of the photoalignment film can be more uniformly controlled. Preferably, the first and second exposure apparatuses of the present invention include a photomask including a light shielding portion and a plurality of light transmissive portions, and exposing the photo alignment film through the photomask. Thereby, the pixel region (which can also be a picture region) can be easily divided and aligned. From the same viewpoint, in the above exposure step, it is preferred that the photoalignment film is exposed through a photomask including a light shielding portion and a plurality of light transmitting portions. Preferably, the light shielding portion and the plurality of light transmitting portions are arranged in a stripe shape. Thereby, the substrate which is arranged in a matrix in the pixel region (which may also be a picture element region) can be efficiently aligned. Further, at this time, the orientation of the longitudinal direction of the plurality of transparent portions and the orientation of the relative movement direction of the substrate are preferably substantially the same. Thereby, by simply moving the mask and the substrate, it is possible to accurately and easily divide all the pixel regions (or all of the pixel regions). Furthermore, it is understood that the orientation of the strip direction of the plurality of transparent portions is substantially the same as the orientation of the substrate s 161897.doc -23- 201241523 in the direction of movement, and the two orientations do not have to be strictly identical, two orientations The resulting angle is preferably 5. (more preferably 2.) below. Preferably, a short gap is provided between the photomask and the substrate. By this, it is possible to smoothly move the substrate relative to the exposure light, and it is possible to suppress the contact of the reticle with the substrate even if the reticle is bent by its own weight. Preferably, the first and second exposure apparatuses of the present invention include an imaging unit that reads a pattern of the substrate. Thereby, the relative movement direction of the substrate with respect to the exposure light can be controlled while reading the pattern of the substrate. Therefore, even in the case of substrate distortion, high-precision scanning exposure can be performed along the pixel arrangement. According to this aspect, the first and second exposure apparatuses of the present invention preferably control the relative movement direction of the substrate with respect to the exposure light while arranging the pattern of the substrate. Further, in the first and second exposure apparatuses of the present invention, the pattern of the substrate is not an essential component, and the substrate may have no pattern, and a pattern is usually formed on the substrate. Further, the specific example of the round case is not particularly limited, and a member having a dot shape or a shape which is periodically or continuously formed in the relative movement direction of the substrate is preferably a confluent line, for example, a source confluence, a line, Gate bus line), black matrix. The method of fabricating the first and second liquid crystal display devices of the present invention preferably comprises the step of forming a liquid crystal layer of a vertical alignment type. Thereby, a liquid crystal display device of a vertical alignment mode can be realized. The method for fabricating the first and second liquid crystal display devices of the present invention preferably comprises the step of forming a liquid crystal layer containing a liquid crystal material having a negative dielectric anisotropy. 161897.doc -24 - 201241523. Thereby, the liquid crystal layer can be efficiently driven in the liquid crystal display device of the vertical alignment mode, so that the transmittance can be increased. The method for fabricating the first and second liquid crystal display devices of the present invention may further include bonding the two substrates subjected to the exposure process by the exposure step so as to be substantially orthogonal to each other in the projection direction (or the exposure direction). In this way, a liquid crystal display device of TN mode, VATN mode, multi-domain TN mode or multi-domain VATN mode can be realized. Further, the projection directions are substantially orthogonal to each other, and the angle formed by the projection direction is not necessarily strictly 9 inches. However, the angle formed by the projection direction is preferably 90. ±1〇. (more preferably, 90 ° ± 5 °).

Preferably, the method for fabricating the first and second liquid crystal display devices of the present invention is such that when the substrate is viewed in a plan view, two regions exposed in anti-parallel directions are formed in each pixel (also in each picture element). The step of exposing the above-mentioned photo-alignment film. Thereby, a wide-angle mode such as a multi-domain mode, a multi-domain ECB mode, a multi-domain VAEBC mode, a multi-domain VAHAN (Vertical Alignment Hybrid-aligned Nematic) mode, and a multi-domain VATN (VerticaI Alignment Twisted Nematic) mode can be easily realized. Liquid helium a display device. Further, in the anti-parallel direction, it is not necessary that the two directions must be strictly opposite and parallel, but the angle formed by the two directions is preferably 175 (more preferably 178.) or more and 18 Å. the following. A fifth aspect of the present invention is a liquid crystal display device (hereinafter also referred to as a liquid crystal display of the present invention) which is produced by using the first or second exposure apparatus of the present invention or the first or second liquid crystal display device manufacturing method of the present invention. Device). The liquid crystal display device of the present invention is preferably an active matrix drive, but can also be simply driven by 161897.doc -25-201241523. The liquid crystal display device of the present invention is preferably driven in a VATN mode. Furthermore, the liquid crystal display device of the VATN mode includes a pair of substrates, a liquid crystal layer containing nematic liquid crystals, and a pair of vertical alignment holes provided on each of the substrates, and the vertical alignment films are implemented when the two substrate faces are viewed in plan. The directions of the alignment processes are substantially orthogonal to each other, and the nematic liquid crystal system is vertically and twistably aligned when no voltage is applied. The liquid crystal display device of the present invention preferably comprises 2 or more domains, preferably 4 or less domains, and more preferably 4 domains. Thereby, it is possible to suppress the complication of the manufacturing steps and realize a liquid crystal display device having excellent viewing angle characteristics. Further, by setting the domain to four, for example, the up, down, left and right directions are referred to as four directions, and the wide angle can be realized in any of four directions orthogonal to each other. Further, the viewing angle characteristics of any of the four orthogonal directions may be substantially the same. That is, the viewing angle characteristics excellent in symmetry can be achieved. Therefore, a liquid crystal display device having a small viewing angle dependency can be realized. In addition, the arrangement form of the domain when the alignment is divided into four domains is not particularly limited, and examples thereof include a matrix shape, a stripe shape such as a mesh, and the like. Further, as the exposure conditions for differentiating between the exposure and the second exposure, in addition to the above-described irradiation angle and substrate surface illuminance, for example, the degree of polarization of exposure light (for example, polarized ultraviolet light) and exposure light (for example, polarized light) may be mentioned. The wavelength of the ultraviolet ray, the transmittance of the reticle itself, and the like. Further, the exposure apparatus and the method of manufacturing the liquid crystal display device in which the exposure conditions are different between the first exposure and the second exposure, and the liquid crystal display device produced by using the exposure apparatus or the liquid crystal display device manufacturing method are also The present invention is also applicable to the first and second liquid crystal displays of the present invention, the second exposure device, the liquid crystal display device of the present invention, and the first and second liquid crystal displays of the present invention. The above various aspects described in the method of manufacturing the device can achieve the same effects. Advantageous Effects of Invention According to the present invention, an exposure apparatus, a liquid crystal display device, and a method of manufacturing the same capable of controlling a pretilt angle with high precision can be realized. [Embodiment] Hereinafter, the present invention will be described in more detail with reference to the drawings, but the present invention is not limited to the embodiments. (Embodiment 1) Hereinafter, a method of manufacturing a liquid crystal display device of Embodiment 1 will be described. The manufacturing method of the liquid crystal display device of the present embodiment is applied to a manufacturing method of a liquid crystal display device including an exposure step of performing photo-alignment processing, and the method of manufacturing the liquid crystal display device of the present embodiment can be applied to various display modes. In the liquid crystal display device, a liquid crystal display device of a Vertical Alignment Twisted Nematic (VATN) mode is preferable. Hereinafter, a method of manufacturing a VATN mode liquid crystal display device using the method of manufacturing a liquid crystal display device of the present embodiment will be described. First, according to the general method, as shown in Fig. 1, one of the mother glass substrates 10 before the formation of the alignment film is prepared. For example, an array substrate or a color filter substrate of a plurality of blocks (for example, six blocks) is obtained from each mother glass substrate. Furthermore, in the present embodiment, a single array substrate or a single color light-emitting sheet may be used. 161897.doc -27-

S 201241523 substrate. A plurality of panel regions 11 are provided on each of the mother glass substrates ίο with respect to the obtained array substrate or color filter substrate. On the panel region 11 of the mother glass substrate, as shown in FIG. 2, a source bus line 12 and a gate bus line 13 intersecting each other are formed in a mesh shape, and the source bus line 12 and the gate bus line 13 are formed. A thin film transistor 14 and a picture electrode 15 are formed in each of the picture regions. Further, in the respective element regions, two regions A1 and A2 which are formed by dividing the substantially middle of the source bus lines 12 on both sides (the line CL 1 in the figure) into two are assumed, in the following exposure steps. In the respective regions A1 and A2, the polarized ultraviolet rays are irradiated from a direction normal to the surface of the substrate 1A at a specific angle e. In the case where the irradiation direction of the polarized ultraviolet rays is projected on the surface of the substrate 10 by the optical axis of the polarized ultraviolet light respectively irradiated, the optical axes of the projections are parallel to the source bus line 12 and are different from each other by 180. The orientation. On the panel region 另一 of the other mother glass substrate, a black matrix 16 is formed in a mesh shape as shown in FIG. 3, and a color filter 17 is formed in each of the picture regions defined by the black matrix 16. A common electrode (not shown) is formed on the black matrix 16 and the color filter 17. Further, in each of the pixel regions, it is assumed that there are two regions β1 formed by dividing the two sides parallel to the gate bus line 13 (line CL2 in the drawing) in the respective pixel regions. B2, in the exposure step described below, the polarized ultraviolet rays are irradiated to the respective regions B1 and B2 from a direction normal to the surface of the substrate 1〇 at a specific angle θ. When the irradiation direction of the polarized ultraviolet rays is projected on the surface of the substrate 10 by the optical axes of the polarized ultraviolet rays respectively irradiated, the optical axes of the projections are parallel to the gate bus line 13 and differ from each other. Hey. The orientation. 161897.doc -28 - 201241523 In the present embodiment, a liquid crystal display device in which each pixel is composed of a plurality of pixels and having a color display is described. However, the liquid crystal display device of the present embodiment may be a single color. Display liquid crystal display device. In the above case, in the present embodiment, it is only necessary to read a pixel instead of reading a picture element. Further, the picture element is an element constituting a pixel, and is synonymous with the sub-pixel β. Next, a solution containing the photo-alignment film material is applied to each mother glass substrate 1 by a method such as a spin coating method, for example, at 180. Calcination of the 6 minute light alignment film material, thereby forming a photoalignment film (vertical alignment film). The material of the photo-alignment film is not particularly limited, and examples thereof include a resin containing a photosensitive group. More specifically, 'preferably, it contains a 4-radyl group (the following chemical formula (1)), 4, a chalcone group (the following chemical formula (7)), a coumarin group (the following chemical formula (7)), cinnamon A polyimide group having a photosensitive group such as a mercapto group (chemical formula (4) below). The photosensitive groups of the following chemical formulas ()) to (4) are subjected to crosslinking (including dimerization reaction), isomerization reaction, photorealignment, etc. by irradiation of light (preferably ultraviolet rays), according to These bases can effectively reduce the unevenness of the pretilt angle in the plane of the alignment film as compared with the photodecomposition type photoalignment film material. Further, the photosensitive group of the following chemical formulas (1) to (4) also includes a structure in which a substituent is bonded to a benzene ring. Further, the cinnamic acid derived from the base of the cassia base of the following chemical formula (4), which is bonded to an oxygen atom, has the advantage of being easy to synthesize (C-CH=CH._·, the following chemical formula (5)). Therefore, as the photo-alignment film material, it is more preferable to contain a cinnamic acid vinegar base. Further, the calcination temperature, the calcination time, and the film thickness of the photo-alignment film are not particularly limited, and may be appropriately set. I6I897.doc •29· 5 (1)201241523 [化i]

ί c

[Chemical 3]

(3)

(4) [Chemical 5]

Ο

II - o - c In the present embodiment, as the alignment film material, a photo-alignment film material which generates a pretilt angle of liquid crystal molecules in a direction in which light is irradiated by light reaction may be used as in Non-Patent Document 1 As disclosed by the light alignment method, the pre-tilt direction can be used to align the light according to the direction of movement of the light-irradiated area. The film material is 161897.doc -30· 201241523. In this case, & can be incident substantially perpendicularly with respect to the substrate without obliquely incident on the substrate. Next, the exposure step of the photoalignment film will be described. First, the exposure apparatus 3 of the present embodiment will be described. As shown in FIGS. 4 and 5, the exposure apparatus (10) is a flat type scanning exposure apparatus including an exposure stage 32 including a plurality of exposure heads 31, and a work of placing the mother glass substrate 10 to move in a specific direction. Table 33. The table 33 also functions as a moving mechanism. Further, the exposure device 3 may include a moving mechanism for moving the exposure flat σ 32, or a table for mounting the mother glass substrate 10 which does not function as a moving mechanism b, and a moving mechanism for moving the exposure stage 32. The plurality of exposure heads 31 are arranged at intervals in a direction b orthogonal to the moving direction (scanning direction) 3 of the substrate 。. Each of the exposure heads 31 is supported in a state of being movable in the direction b in a plane parallel to the illuminated surface of the substrate 10. Each of the exposure heads 31 includes an exposure unit 36a for the i-th exposure (1), (2), an exposure unit 36b for the second exposure (1), (2), and a mask 50. Further, the first exposures (1) and (2) and the second exposures (1) and (2) are described below. The exposure unit 36 & includes an ultraviolet light source 34a that emits ultraviolet light, a polarizing beam that is disposed between the light source 34a and the mask 5, and an optical member such as an optical lens (the optical members are not shown to optically convert the ultraviolet light emitted from the light source 34a) The exposure unit 36b includes an ultraviolet light source 34t) that emits ultraviolet light, a polarizing filter provided between the light source 34b and the mask 5, and an optical member (not shown) such as an optical lens. The ultraviolet light emitted from the light source 34a is optically converted into the desired exposure light. Each of the exposure heads 3 is configured to be capable of interposing the mask 5 〇 with a specific angle of 161897.doc 5 -31 - 201241523 (the normal direction of the surface of the substrate ίο, the angle with the direction of irradiation of the exposure light, for example 40.) The surface of the substrate 10 is irradiated with polarized ultraviolet rays. The light sources 34a and 34b may be appropriately selected depending on the irradiation target, or may be a light source that emits visible light. Further, each of the exposure heads 31 includes an image pickup unit 35, a storage mechanism, a comparison mechanism, and a mask moving mechanism. The image pickup mechanism 35 can photograph the surface of the substrate 1 and can read the pattern of the substrate 10 (for example, the source bus line 2, the gate bus line 13, the black matrix 16, and the like). The camera mechanism 35 can apply a camera such as a cCD (Charge Coupled Device) camera. The storage mechanism can pre-store a reference image as a reference for the alignment of the exposure. The comparison mechanism compares the image captured by the imaging unit 35 with the reference image to calculate the deviation between the position of the actual exposure and the position to be exposed. The mask moving mechanism corrects the position and angle of the mask 5 根据 based on the calculation result of the deviation of the comparison mechanism. Thereby, the pattern of the substrate 1 can be read, and the relative movement direction and position of the exposure light of the substrate 10 can be controlled with high precision, and scanning exposure can be performed. Further, instead of using the reference image, the collimating means can correct the position and angle of the mask 5 同样 in the same manner by comparing the result of the photographing substrate 10 with the result of the photographing mask 5 ’. The photomask 50 is disposed such that its surface is substantially parallel to the surface to be irradiated of the substrate, and a close gap 41 is provided between the mask 50 and the surface of the substrate to be irradiated, that is, the surface of the photo-alignment film. The photomask 50 is, for example, a plate-like member, and as shown in FIG. 6, includes a transparent substrate formed using quartz glass or the like, and a light shielding portion 52 formed on a surface of the transparent substrate in a specific pattern (preferably a stripe pattern). And a plurality of light transmission 161897.doc -32- 201241523 Part 5 1. Each of the light transmitting portions 5A is elongated and the plurality of light transmitting portions $1 are arranged at a specific pitch in a direction 6 orthogonal to the moving direction a of the substrate 10. As shown in FIG. 7, the light transmissive portion pattern 51a for the ith exposure (1) and (2) and the light transmission portion pattern 511 for the second exposure (1) and (2) are formed on the mask 50. The light portion patterns 5 la and 5 lb are disposed, for example, at a distance of one-half of a distance from the pixel pitch. Further, the photomask 50 includes a central region 53 and an overlapping region 54. The light transmitting portion patterns 5ia, 5 lb are formed on the central region 53 and the overlapping region 54, but the longer the length of the light transmitting portions 56a, 56b (corresponding to the second light transmitting portion) provided in the overlapping region 54, the central region 53 is gradually getting shorter. As a result, the aperture ratio of the light transmitting portions 56a and 56b provided in the overlap region μ is smaller than the aperture ratio of the light transmitting portions 55a and 55b (corresponding to the first light transmitting portion) provided in the central region 53. In other words, the farther the light transmitting portions 56a, 56b are from the light transmitting portions 55a, 55b, the shorter the length thereof and the smaller the aperture ratio. When the right substrate 10 passes directly under the reticle 50, it is exposed only through the region directly under the light transmitting portion 51. Further, the material of the light transmitting portion 51 is not particularly limited as long as it can transmit light (for example, polarized ultraviolet light), and the light transmitting portion 5 can also be an opening portion penetrating the mask 50. In the embodiment in which the scanning exposure method is employed, the irradiation amount is set in accordance with the length Y of the light transmitting portion 51 of the mask 5 and the moving speed (scanning speed) V of the substrate 10. More specifically, the amount of irradiation to the photo-alignment film is calculated by the following formula. (Irrigation amount) = (illuminance) x (length Y of the light transmitting portion) / (moving speed V of the substrate) Further, the term "illuminance" refers to the illuminance of the exposure light to the light alignment film. Therefore, if the illuminance and the moving speed V are kept constant, the amount of irradiation becomes -33-161897.doc 5 201241523 which is proportional to the length γ of the light transmitting portion. Thus, in the present embodiment, the amount of irradiation to the light alignment film can be calculated by the following formula. (irradiation amount) = (illuminance) χ (width of exposure light) / (scanning speed) Further, 'the width of the exposure light, more specifically, the scanning (moving) direction of the exposure light to the light alignment film Width (length). The exposure light is incident on the planar region, so that it generally spreads in a direction orthogonal to the direction of movement of the exposure light on the optical alignment film. When the exposure light has a width and the width of the exposure light is not fixed depending on the place (for example, when the width of the exposure light is reduced in a sinusoidal function in a region corresponding to the continued exposure portion), the width of the exposure light is determined. Refers to the width (length) of each location in the above orthogonal direction. Further, the so-called scanning speed refers to the relative movement (scanning) speed of the substrate with respect to the exposure light. Fig. 8 is a graph showing the relationship between the amount of irradiation to the photoalignment film and the pretilt angle of the liquid crystal molecules. As shown in Fig. 8, generally, the larger the amount of irradiation to the photo-alignment film, the smaller the pretilt angle of the liquid crystal molecules in the vicinity of the alignment film. As described in Patent Document 4, it is extremely important to control the pretilt angle with high precision in the VATN mode. Next, a method of exposing the mother glass substrate 1 to the exposure apparatus 30 will be described. In the present embodiment, the exposed region (exposure region) of the mother glass substrate 1 is divided into a plurality of regions to perform exposure (optical alignment treatment). First, the mother glass substrate 10a for the array substrate will be described. As shown in Fig. 9, the array substrate mask 6 is a substantially rectangular plate-shaped member, and the light-transmitting portion pattern for the first exposure (1) and (2) is 16I897.doc -34· 201241523 Can polarized ultraviolet light pass through the slit-like light-transmitting portion 6丨a at a specific pitch? There are a plurality of formations. Further, the light-transmitting portion pattern ' as the second exposures (1) and (2) is formed by a plurality of slit-shaped light-transmissive portions 6ib through which the polarized ultraviolet rays can pass. The pitch is set to be equal to the distance between the source bus lines 12. Further, the dimension Lx of the distance between the light transmitting portions 61a and 6ib is set to a size of about 丨/2 between the source bus lines 12. The light transmitting portion 6ia is arranged to be offset from the light transmitting portion 61b by one half of the pitch px. Further, the photomask 60 includes a central region and an overlapping region, and an aperture ratio of the light transmitting portion provided in the overlapping region is smaller than an opening ratio of the light transmitting portion provided in the central region. Further, as shown in FIG. 1A and u, the polarized ultraviolet light generated by the light emitted from the light source 34 & is irradiated to the first exposure (丨), and the light transmissive portion pattern (transmission portion 61a) for (2) will be The polarized ultraviolet light generated by the light emitted from the light source 3 is irradiated to the light transmitting portion pattern (light transmitting portion 61b) for the second exposure (1) and (2), and the substrate 10a and the table are placed along the +x in this state. The axis direction moves at a constant speed below the mask 6〇. The polarized ultraviolet rays are irradiated in opposite directions from each other. Further, polarized ultraviolet rays (first exposure (1) and second exposure (1)) are irradiated from one end to the other end of the photo-alignment film 19 provided on the surface of the substrate i〇a via the mask 60. At this time, the substrate 10a is moved in such a manner that the source bus line 12 is along the longitudinal direction of the light transmitting portions 61a and 61b of the mask 60. As a result of the first exposure (1), in the region 22 where the central region of the mask 60 passes and the region 22 where the overlapping region of the mask 6〇 passes, the region of the pixel region shown in Fig. 2 is gossip. Was exposed. Further, as a result of the second exposure (1), in the region 21 and in the region 22, the region A2 of the pixel region shown in Fig. 2 is exposed. That is, in the area 21, all areas of the 'Phoenix area' within the area 22 161897.doc 201241523 are exposed. However, since the aperture ratio of the light transmitting portion provided in the overlapping region is smaller than the aperture ratio of the light transmitting portion provided in the central region, the irradiation amount of the regions A1, A2 in the region 22 is smaller than the regions A1, A2 in the region 21. The amount of exposure. Further, the pixel regions in the region 23 through which the light transmitting portions 61a, 61b do not pass are not exposed at this stage. Next, the substrate 1 Oa and the table are moved in the -X axis direction, and returned to the position immediately before the exposure stage 32. Further, each of the exposure heads 31 is moved in the +y-axis direction at a distance of one exposure head size. As a result, the central region corresponding region 23 of the mask 6 is disposed and the overlapping region corresponding region 22 of the mask 60 is disposed. Further, as shown in FIGS. 10 and 11, the polarized ultraviolet light generated by the light emitted from the light source 34a is irradiated to the light transmitting portion pattern (light transmitting portion 61a) for the first exposure (1) and (2). The polarized ultraviolet light generated by the light emitted from 34b is irradiated to the light transmitting portion pattern (light transmitting portion 61b) for the second exposure (1) and (2), and the substrate 1 〇a and the table are placed along the +x axis in this state. The direction moves at a constant speed below the mask 6〇. The polarized ultraviolet rays are irradiated in opposite directions from each other. Further, polarized ultraviolet rays (first exposure (2) and second exposure (2)) are irradiated from one end of the light alignment film 19 provided on the surface of the substrate i〇a to the other end via the mask 60. At this time, the substrate 10a moves in the strip direction of the light transmitting portions 61a, 6lb of the mask 60 with the source bus bar 12. As a result of the exposure (2), the region A1 of the picture region is exposed in the region 23 through which the central portion of the mask 60 passes. Further, in the region 22 through which the overlapping region of the mask 60 passes, the region A1 is again exposed. Further, as a result of the second exposure (2), the region A2 of the 'pixel region' in the region 23 passing through the central region is exposed. Further, in the area 22 where the overlapping area passes through 161897.doc -36 - 201241523, the area A2 is exposed again. Thus, the first exposure (i) and the first exposure P) are irradiated to the same region A1. Further, a portion of the light alignment film 19 and a portion of the region 21, the region 22, and the region A1 in the region 23 correspond to the first portion, a portion of the photoalignment film 19, and the region 21, the region 22, and the region 23 The portion of A2 corresponds to the second part above. As a result of the above, the substrate 10a is exposed over the entire surface, and the light alignment processing of the substrate i〇a is completed. Further, as shown in FIG. 12, a normal exposure portion 24 that is exposed only once and a continuous exposure portion 25 that is exposed twice are formed on the substrate 10a. FIG. 13 schematically shows a pattern formed on the mask 60, and exposure. A plan view of the location of the reticle 60 in the step. As shown in Fig. 13, the reticle 60 includes a central region 63 and an overlapping region 64. In the central region 63 and the overlapping region 64, a light transmitting portion pattern (light transmitting portion 61a) for the first exposure (1) and (2) and a light transmitting portion pattern for the second exposure (1) and (2) are formed. (light transmitting portion 61b). The overlap region 64 has a width of 10 to 80 mm (preferably 30 to 60 mm, for example, 45 mm). The length y of the light transmitting portion 66 (corresponding to the second light transmitting portion) provided in the overlapping region 64 is smaller than the length y of the light transmitting portion 65 (corresponding to the first light transmitting portion) provided in the central portion 63. Further, the farther away from the central portion 63, the length y of the light transmitting portion 66 gradually becomes shorter, and the aperture ratio of the light transmitting portion 66 is gradually decreased. Therefore, the portion exposed by the relatively long light transmitting portion 66 in the first exposure (1) or the second exposure (1) passes through the relatively short portion in the first exposure (2) or the second exposure (2). The light transmitting portion 66 is exposed. The length (opening ratio) of the light transmitting portion 66 is preferably changed in accordance with a linear function or a dihedral function. Further, in the continuation exposure unit 25, the first exposure (1) and the first exposure (2), the second exposure (1), and the second exposure (2) are opposite to each other 161897.doc „ ~ 201241523. The reticle 60 is designed in such a manner that exposure is performed in the same manner as in the case of the unilateral half of the accommodating element. The method of making the aperture ratio of the light transmitting portion 66 gradually larger than the central portion 63 is not particularly limited. For example, the method of Patent Document 3 can be suitably employed. Alternatively, the method can be such that the length of the light transmitting portion 66 is kept constant, and the shape is applied to the light transmitting portion 66 to make the concentration of the shadow gradually away from the central portion 63. Fig. 14 is a graph showing the amount of grazing of the normal exposure unit 24 and the continuation exposure unit 25: the irradiation amount E0 of the normal exposure unit 24 and the light transmission provided in the central region 63. The length yG is proportional and fixed regardless of the position X. The continuation of the exposure P 25 and the amount e are proportional to the length y of the light transmitting portion provided in the overlapping region 64, so that the distance from the normal exposure portion 24 is further away. Then gradually less. Continue to expose 邠25 as above, after two exposures, so continue to the total exposure of the exposure The amount is the sum of the irradiation amount of the first exposure (1) and the irradiation amount of the first exposure (2), or the sum of the irradiation amount of the second exposure (1) and the irradiation amount of the second exposure (7), that is, the exposure to -be. The total amount of irradiation depends on the amount of exposure of each exposure, and the maximum value Emax is also present. The total exposure amount of the continuation exposure unit 25 can be appropriately set, for example, based on the description of Patent Document 3. Preferably, the total exposure amount of the continuation exposure unit 25 is smaller than the irradiation amount E0 of the normal exposure unit 24. Thus, in the embodiment in which the scanning exposure method is employed, it is possible to effectively suppress the occurrence of the adjacent normal exposure unit 24. The condition of the seam. The sum of the irradiation amount of the first exposure (1) and the irradiation of the first exposure (2), and the sum of the irradiation amount of the second exposure (1) and the irradiation amount of the second exposure (2) Usually set to be the same, but can also be set to be different from each other. 161897.doc -38- 201241523 Figure 15 is a schematic representation of the various directions in the various pixels in the substrate after the exposure step shown in Figure 1〇&u A plan view of the relationship, as shown in Figure 15, at the first exposure (1), (2) Between the second exposure (丨) and (2), the projection direction A toward the substrate surface in the irradiation direction of the polarized ultraviolet light (which may be the direction of the optical axis) becomes parallel to each other and is different from each other by 180.丨 Exposure (1), (2), and the second exposure (1), (2), the moving direction B of the substrate becomes the same direction. As a result, the first exposure (1) and/or the 1 in the region A1 where the exposure (2) is exposed and the region A2 exposed by the second exposure (1) and/or the second exposure (2), the tilt direction c of the liquid crystal molecules in the vicinity of the photoalignment film becomes Parallel to each other and differ by 180. The orientation. In the present embodiment, the relationship between the projection direction A and the moving direction B of the substrate is different between the ith exposure 〇), the second exposure (1), and the second exposure (1) and (2). In the exposures (1) and (2), the projection direction A and the movement direction B of the substrate become parallel to each other and differ by 〇8〇. In the second exposure (1) and (2), the projection direction a becomes the same direction as the movement direction B of the substrate. Therefore, as described above, the pretilt angle Θ1 of the liquid crystal molecules of the region and the pretilt angle θ2 of the liquid crystal molecules of the region A2 are likely to be different. Therefore, in the present embodiment, the exposure conditions, specifically, the irradiation angles of the polarized ultraviolet rays are different from each other between the first exposures (1) and (2) and the second exposures (1) and (2). By this, the resulting pretilt angle can be made to be the same in the area A1 and the area A2. That is, the pretilt angle Θ1 can be set to be the same as the pretilt angle 02. Fig. 16 is a graph showing the results of measuring the relationship between the irradiation angle of the polarized ultraviolet rays and the pretilt angle using the plurality of test units of the first embodiment, and the results are shown in Table 161897.doc-39-s 201241523. As shown in FIG. 16, it can be seen that as the irradiation angle increases, the pretilt angle becomes small. Therefore, the pretilt angle Θ1 can be made equal to the pretilt angle Θ2 by making the irradiation angle of the second exposure larger than the irradiation angle of the first exposure. For example, the irradiation angles of the first exposures (1) and (2) are set to 40. In the case, the pretilt angle Θ1 of the liquid crystal molecules of the region A1 is set to 89,13. about. Further, the amount of exposure (exposure energy) was 20 mJ. In the present embodiment, the movement direction B of the substrate and the projection direction A of the polarized ultraviolet light are not related to each other in the case of the first exposure (1), (2), and the second exposure (1), (2). the same. Therefore, when the second exposures (1) and (2) are performed under the same exposure conditions as those of the first exposure and (2), the pretilt angle rises by approximately 22 as described above. The pretilt angle Θ2 of the liquid crystal molecules of the region A2 becomes 89.13 + 0.2 = 89.33. . Therefore, the pretilt angle Θ2 can be made the same as the pretilt angle 01, and the irradiation angle of the second exposure (1) and (2) is 40. ' is set to, for example, 52. about. Thereby, the amount of increase in the pretilt angle can be made 0.2. With the effect of the lowering, the area A2 can also obtain the pretilt angle of about 8 9 · 13 ° which is the same as the area A1. According to this point of view, in the present embodiment, the difference between the irradiation angle of the first exposure and the irradiation angle of the second exposure is preferably greater than zero. 2〇. The following (more preferably 5 or more, 15 or less). Next, the exposure method of the mother glass substrate 1 〇b for the color filter substrate will be described. As shown in Fig. 17, the color filter substrate mask 7 has substantially the same configuration as the array substrate mask 60. In other words, the light-transmitting portion pattern for the first exposures (1) and (2) is formed by a plurality of slit-shaped light-transmitting portions 71a through which the polarized ultraviolet rays can pass at a predetermined pitch Py. In addition, as the light-transmitting portion pattern for the second exposure 161897.doc • 40· 201241523 (1) and (2), the slit-shaped light-transmitting portion 71b through which the polarized ultraviolet light can pass is formed in parallel at a pitch Py. One. The pitch py is set to be equal to the distance between the black matrix 16 (here, the distance between the sides parallel to the gate bus line 13 of the array substrate when superimposed on the array substrate). Further, the dimension Ly of the distance between the light transmitting portions 71a and 71b is set to be about 1/2 of the distance between the black matrixes 16. The light transmitting portion 71a is disposed offset from the light transmitting portion 71b by one half of the pitch Py. Further, the photomask 70 includes a central region and an overlapping region, and an aperture ratio of the light transmitting portion provided in the overlapping region is smaller than an aperture ratio of the light transmitting portion provided in the central region. Next, the mother glass substrate i 〇 b is exposed using the exposure device 30. The exposure state of the mother glass substrate 10b only changes the orientation of the substrate by 9 Å. The exposure state of the mother glass substrate 10a for the array substrate is substantially the same, and detailed description thereof will be omitted. As a result, the 'area B1 is exposed by the first exposure 〇) and/or the first exposure (2), and the area B2 is exposed by the second exposure (1) and/or the second exposure (2). Further, the pretilt angle μ of the liquid crystal molecules of the region Bi becomes the same as the pretilt angle θ2 of the liquid crystal molecules of the region B2. Thereafter, the substrates 10a and 10b are divided into panel regions, and the array substrate 1 and the color filter substrate 2 are produced. Then, a bonding step of performing the alignment treatment of the substrates 1 and 2 is performed. In the bonding step, the sealing material is applied to the side frame region of one of the substrates. Next, for example, a plastic bead having a particle diameter of 4 μm is spread on a substrate coated with a sealing material, and then the two substrates are bonded together. Further, as shown in Fig. 18, a nematic liquid crystal material having a negative dielectric anisotropy is sealed between the two substrates 丨 and 2 to form a liquid crystal layer 3, whereby the liquid crystal display panel is completed. Furthermore, the production process of the liquid crystal display panel can also be as follows. First 161897.doc Λί 3 201241523 First, a sealing material is applied to the frame region of each panel region u on one of the substrates 10a and 10b. Next, a nematic liquid crystal material having a negative dielectric anisotropy is dropped in a dot shape at a specific pitch on the surface of the other substrate. Next, the two substrates processed in this way are bonded together in a true private environment. The thickness of the cell is controlled to be set to, for example, 4 μm by a photosensitive spacer provided in advance on the mother glass substrate 10b for the color filter substrate. Thereafter, the sealing material was hardened and divided into panels to complete the liquid crystal display panel. When the liquid crystal molecules 4 in the liquid crystal layer 3 are not applied with a driving voltage on the liquid crystal layer 3 (when no voltage is applied), they are aligned in a substantially vertical direction with respect to the surface of the photo-alignment film 19. In contrast, the liquid crystal molecules 4 are now separated from the normal direction of the surface of the photoalignment film 19 by ο. From left to right. The left and right are slightly inclined to align. That is, the liquid crystal molecules 4 are aligned by the light alignment 19 so as to have a slight pretilt angle. Fig. 19 is a view schematically showing the alignment direction of liquid crystal molecules in each chlorophyll. When the array substrate and the color filter substrate subjected to the alignment treatment as described above are bonded to each other to form a liquid crystal display panel, the liquid crystal molecules are irradiated by polarized ultraviolet rays in an orientation direction of the respective regions of the respective substrates. As a result, as shown in FIG. 9, the tilt direction of the liquid crystal molecules in the vicinity of the array substrate (the dotted arrow in FIG. 9) and the tilt direction of the liquid crystal molecules in the vicinity of the color filter substrate (Fig. The solid arrows in 19) are roughly orthogonal to each other. Further, in each of the pixels, four domains D1 to D4 in which the alignment directions of the liquid crystal molecules are different from each other are formed. The liquid crystal molecules in each domain are twisted by approximately 90. And the alignment. Further, in the present embodiment, the pretilt angle obtained as a result of each exposure becomes the same value. When liquid crystal molecules are applied to the liquid crystal layer 3 in each domain, a sufficient driving voltage of a threshold or more is applied (at the time of voltage application), the tilting direction of the two substrates is divided into two. For example, liquid crystal molecules 4a located at equal distances from the surfaces of the two substrates are attached to 45 at the time of voltage application. Azimuth, 135° azimuth, 225° azimuth, or 315. Heading down. Further, the liquid crystal molecules 4a are inclined to a direction substantially parallel to the faces of the both substrates. As a result of the above, a liquid crystal display device having the same transmittance in all domains, high transmittance, and excellent display quality can be realized. Next, as shown in Fig. 18, two retardation plates 7a and 7b and two polarizing plates 6a and 6b are attached to the outer sides of the substrates 1 and 2. Further, the phase difference plates 7a and 7b may not be provided. However, it is preferable to provide the phase difference plates 7a and 7b from the viewpoint of realizing a wide angle. Further, only one of the phase difference plates 7a and 7b may be disposed. The polarizing plates 6a and 6b are arranged to be orthogonally polarized. Further, one of the polarizing plate cores and 6b is disposed such that the absorption axis is parallel to the oblique direction of the liquid crystal molecules in the vicinity of the array substrate (the dotted arrow in FIG. 9), and the other is the absorption axis and the color light guide substrate. The tilt directions of the nearby liquid crystal molecules (the solid arrows in Fig. 19) are arranged in parallel. As described above, since the liquid crystal molecules are substantially vertically aligned when no voltage is applied, the liquid crystal display panel of the present embodiment can realize a good black display (standard black mode). Further, since the liquid crystal display panel of the present embodiment includes four domains, and the liquid crystal molecules of the four domains correspond to four directions which are different from each other, display characteristics which do not substantially depend on the viewing angle direction can be exhibited. Fig. 46 is a graph showing the results of simulating the brightness of one picture on the liquid crystal display panel of the first embodiment. As shown in Fig. 46, in the liquid crystal display panel of the first embodiment, the tilting directions of the liquid crystal molecules 4a in the four domains D1 to D4 are substantially 90. The angle. Therefore, at the boundary of the different domains, the liquid crystal molecules 4a 161897.doc • 43-201241523 are aligned in such a manner that the liquid crystal molecules 4a which are poured in mutually different directions are continuously connected. Further, the tilting directions of the liquid crystal molecules 4a in the four domains D1 to D4 are substantially different from each other with respect to the absorption axis directions of the polarizing plates 6a and 6b. . As a result, the orientation of the liquid crystal molecules 4a on the boundary of the different domains becomes substantially the same or substantially orthogonal to the absorption axis direction of the polarizing plate 6a or the absorption axis direction of the polarizing plate 6b. Therefore, at the boundary of the different domains, the retardation (phase difference) caused by the liquid crystal molecules does not occur in the polarized light transmitted through the lower polarizing plate 6a. That is, the polarized light transmitted through the lower polarizing plate 6a is not affected by the liquid crystal layer 3, but the polarized light transmitted through the lower polarizing plate 6a cannot pass through the upper polarizing plate 6b. As a result, a line having a lower luminance and a darker line, that is, a dark line, is generated on the boundary of the different domains. Further, in FIGS. 19 and 46, when the panel is viewed from the color filter substrate side, the inverted panel is formed. The dark line mode sets the alignment direction of the liquid crystal molecules, but the alignment direction of the liquid crystal molecules can also be set as shown in FIGS. 47 to 49. In Figs. 47 to 49, the dotted arrows indicate the oblique directions of the liquid crystal molecules in the vicinity of the array substrate, and the solid arrows indicate the oblique directions of the liquid crystal molecules in the vicinity of the color filter substrate. When the panel is viewed from the color filter substrate side, a dark line is formed in the case shown in Fig. 47, and a dark line of 8 characters is generated in the case shown in Fig. 48. Dark line. Further, one picture region can be divided into two regions, and four domains are formed in each region. Thereafter, the liquid crystal display device of the first embodiment can be completed through a general module manufacturing process. The liquid crystal display device of this embodiment has a VATN mode of four domains. From the viewpoint of realizing the wide angle of the liquid crystal display device of 161897.doc -44 - 201241523, it is preferable to divide the enamel pigment into four domains. Further, it is possible to reduce the reticle step of forming an alignment control structure such as a rib (protrusion) necessary for the liquid crystal mode of the alignment control structure, such as the previous elbow mode, and the result is a photolithography step. Simplify the manufacturing process. Further, when one pixel (one sub-pixel) is divided into two domains, for example, the wide angle can be realized in either of the up and down or left and right directions, but the viewing angle characteristic in the other direction cannot be improved. Moreover, although it can be increased to a domain of 5 or more, the process is complicated and the processing time becomes long, which is not preferable. Further, in the case of 4 domains and 4 or more, it is also known that the viewing angle characteristics are not greatly different in practicality. The materials which can be used in the present embodiment and the conditions of the applicable manufacturing process are listed below. However, the materials and conditions that can be used in the present embodiment are not limited to the following. Further, the type of the light to be used for exposure is not particularly limited to the polarized ultraviolet ray, which may be appropriately set depending on the alignment film material, the manufacturing process, etc., and may be set to be non-polarized (extinction ratio = 1:1). Liquid daily material · An (birefringence) = 〇. 〇 6 ~ 〇. 14, Α ε (dielectric anisotropy) = . ~ -8.0, Tni (nematic-isotropic phase transfer temperature) = 60~11向c nematic liquid crystal. • Pretilt angle: 85~89 9. Cell thickness: 2~5 μιη • Irradiation energy density: 0.01~5 J/cm2 • Proximity gap: 100-300 μιη Light source 'Low-pressure water lamp, high-pressure mercury lamp, gas lamp, metal lamp, argon

S 161897.doc -45 - 201241523 Vibration lamp, xenon lamp, excimer laser • Extinction ratio of ultraviolet light (polarization): 1:1~6〇:1 • Irradiation angle of ultraviolet light: 0~70. According to the present embodiment, scanning exposure is performed twice on the substrates 10&, 10b, and scanning exposure is performed four times in total to form four domains. Therefore, the exposure processing time (process time) can be shortened. Further, in the present embodiment, the exposure apparatus 3 including the i stages 32 has been described, but the exposure apparatus 3 may include a plurality of platforms. For example, a platform for the first exposure (1) and the second exposure (1), and a platform for the light (2) and the second exposure (2) may be provided. Thereby, the process time can be further shortened. (Embodiment 2) This embodiment is substantially the same as Embodiment 1 except that the aspect of the exposure step is different. In the present embodiment, attempts are made to change the exposure conditions of the first exposure (1), (2), and the second exposure (1), (2), and the first exposure (1), (2), and the second exposure (1), (2). ) Change the illuminance of the substrate surface. On the other hand, as shown in Fig. 20, in the present embodiment, in the first exposure (1), (2) and the second exposure (1), (2), the irradiation angles of the polarized ultraviolet rays are set to be the same. In addition, when the illuminance is L, the irradiation angle is #, and the transmittance of the polarizing filter is Tp, the substrate surface illuminance is expressed by the following formula. (Substrate surface illuminance) = Lxcos "Τρ Further, the illuminance L refers to the exposure light to the substrate in a state where exposure light (for example, polarized ultraviolet ray) is perpendicularly incident on the surface of the substrate (light alignment 161897.doc - 46 - 201241523 The illuminance on the surface of the film. Fig. 21 shows the result of actual measurement of the relationship between the substrate surface illuminance and the pretilt angle using the test unit. As shown in Fig. 21, 'the illuminance of the substrate surface becomes larger'. For example, in the first exposures (1) and (2), the irradiation angle is set to 4 〇. When the substrate surface illuminance is 30 mW/cm 2 , the first exposure (1) and Or (2) the pretilt angle 01 of the liquid crystal molecules in the exposed regions A1 and B1 is set to about 88.58°. Further, the irradiation amount (exposure energy) is set to 2 μm. In the present embodiment, the moving direction of the substrate is The relationship between B and the above-mentioned projection direction A of the polarized ultraviolet light is different from that of the first exposure meter (1), (in the case of illusion, and the second exposure (丨) and (2). 1 Exposure (丨), (2) Under the same exposure conditions, the second exposure (1), ( 2), as described above, the pretilt angle rises by approximately 0.2. 'The pretilt angle Θ2 of the exposed areas A2, B2 by the second exposure (1) and/or (2) becomes 88·58+0·2=88_78 Therefore, the pretilt angle Θ2 can be set to be the same as the pretilt angle Θ1. The substrate surface illuminance of the second exposures (1) and (2) is greater than 30 mW/cm2, for example, about 96 mW/cm2. An effect of reducing the amount of rise of the pretilt angle by 0.2° can be produced, so that the same pre-tilt angle of 88.58 as the regions A1 and B1 can be obtained in the regions A2 and B2. From this point of view, in the present embodiment, the second The ratio (percentage) of the substrate surface illuminance of the exposure to the substrate surface illuminance of the first exposure is preferably more than 100% and 500% or less (more preferably 120% or more and 400% or less). (Embodiment 3) This embodiment The state of the rise is the same as that of the first and second embodiments except that the exposure conditions of the exposure step are different. 161897.doc -47- 201241523 In the present embodiment, the first exposure (1), (2), and the second exposure (1) (2) The exposure conditions that are different from each other, such as the degree of polarization of exposure light (for example, polarized ultraviolet light), exposure light For example, the wavelength of the polarized ultraviolet light, the transmittance of the mask itself, etc. can be suitably employed. In the present embodiment, the first exposure (1), (2), and the second exposure (1), (2) can also be used. A pretilt angle of the same degree is obtained. In addition, as a method of making the wavelength of the exposure light different, for example, a method of using a cut filter that transmits light of a different wavelength range is used, and the transmittance of the mask itself is different. The method may be, for example, a method of applying a shadow to the one-side mask for the first exposure (1), (2), or the second exposure (1) or (2). Further, in the first to third embodiments, the first exposure (1), the second exposure (1), and the second exposure (1) and (2) are different from each other in the exposure conditions. However, it is also possible to make a plurality of exposure conditions different from each other. For example, the exposure conditions described in the third embodiment may be different from each other between the first exposures (1) and (2) and the second exposures (1) and (7), in addition to the irradiation angle and/or the substrate surface illuminance. Further, even if the first exposure (1), (2) and the second exposure (1) and (2) are obtained at the same pretilt angle by the method described in the first to third embodiments, the exposure portion is still continued. It is possible to visually observe the seams. The reason for this is that the optimum intermediate irradiation amount of the continued exposure portion (the total irradiation amount near the center of the continued exposure portion 25, see FIG. 14) as a condition for the seam disappearing is caused by the second exposure (1) and/or (7). The exposed regions A1, B1 and the regions A2, B2 exposed by the second exposure (1) and/or (2) may be different from each other. In the case where the optimum intermediate irradiation amounts are different from each other, for example, even if there are no problems in the areas A1 and B1, there are problems in the areas A2 and B2, so there is a visual 161897.doc -48·201241523 observed seams Possibility "In this case, the intermediate exposure amount of the continued exposure portion can be handled by the difference between the regions A1, B1 and the regions A2, B2, and can be used for the first exposure (1), (2) The mask is realized by changing the overlap region between the photomask and the photomask for the second exposure (1) and (2). Regarding the design method of continuing the amount of intermediate exposure of the exposure portion, for example, the method of Patent Document 3 can be used. This case is based on the patent application No. 2_11_〇21992 filed on February 3, 2011 and claims the priority based on the Paris Treaty or the transitional country's regulations. The contents of this application are hereby incorporated by reference in its entirety. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a mother glass substrate using a method of manufacturing a liquid crystal display device of the first embodiment. Fig. 2 is a perspective view schematically showing a pixel region of a mother glass substrate (array substrate) using the method for manufacturing a liquid crystal display device of the first embodiment. Fig. 3 is a perspective view showing a picture region of a mother glass substrate (color filter substrate) in which the liquid crystal display device of the first embodiment is not used. Fig. 4 is a schematic view showing the principal part of the exposure apparatus of the first embodiment, which is a view from above. Fig. 5 is a schematic view showing the essential part of the exposure apparatus of the first embodiment, which is a view from the side. Fig. 6 is a perspective view schematically showing a photomask using the method of manufacturing the liquid crystal display device of the first embodiment. Fig. 7 is a plan view schematically showing a photomask using the method of manufacturing the liquid crystal display device of the first embodiment 161897.doc -49·201241523. Fig. 8 is a graph showing the relationship between the amount of irradiation to the photoalignment film and the pretilt angle of the liquid crystal molecules. Fig. 9 is a view showing the relationship between the size and position of a pattern formed on a matrix substrate mask and a mother glass substrate for an array substrate in the method of manufacturing a liquid crystal display device according to the first embodiment. Fig. 10 is a view schematically showing an exposure step in the method of manufacturing the liquid crystal display device of the first embodiment, which is a view from the side. Fig. 11 is a view schematically showing an exposure step in the method of manufacturing the liquid crystal display device of the first embodiment, which is viewed from above. Fig. 12 is a plan view schematically showing a mother glass substrate for an array substrate using the method for fabricating a liquid crystal display device of the first embodiment, and showing a state after the exposure step. Fig. 13 is a plan view showing a place where the pattern of the mask and the mask of the exposure step are placed in the mask for the array substrate used in the method of manufacturing the liquid crystal display device of the first embodiment. Fig. 14 is a graph showing the amount of irradiation of the normal exposure portion and the continuous exposure portion in the method of manufacturing the liquid crystal display device of the first embodiment. Fig. 15 is a plan view schematically showing the relationship among various directions in the respective pixels on the substrate after the exposure step shown in Figs. Fig. 16 is a graph showing the relationship between the irradiation angle and the pretilt angle of liquid crystal molecules in the first embodiment. Fig. 17 is a view showing the size and position of a pattern formed on a color filter substrate for a color filter substrate, a color filter, and a mother glass substrate for a light substrate, in the method for manufacturing a liquid crystal display device according to the first embodiment, in the form of 161897.doc -50-201241523. Diagram of the relationship. Fig. U is a cross-sectional view schematically showing a liquid crystal display panel and a liquid crystal display device of an embodiment. Fig. 19 is a view schematically showing an alignment direction of liquid crystal molecules in respective pixels in the liquid crystal display panel of the embodiment. Fig. 20 is a view schematically showing an exposure step in the method of manufacturing the liquid crystal display device of the second embodiment, which is a view from the side. Fig. 21 is a graph showing the relationship between the substrate surface illuminance and the pretilt angle of the liquid crystal molecules in the second embodiment. Fig. 22 is a schematic view showing the principal part of the exposure apparatus of Comparative Example 1, which is a view from above. Fig. 23 is a schematic view showing the principal part of the exposure apparatus of Comparative Example 1, which is a view from the side. Fig. 24 is a perspective view schematically showing a reticle using a manufacturing method of a liquid crystal display device of a comparative mode. Fig. 25 is a plan view schematically showing a photomask using the manufacturing method of the liquid crystal display device of Comparative Example 1. Fig. 26 is a view schematically showing an exposure step in the method of manufacturing the liquid crystal display device of Comparative Example 1, which is a view from above. Fig. 27 is a view schematically showing an exposure step in the method of manufacturing the liquid crystal display device of Comparative Example 1, which is a view from the side. Fig. 28 is a plan view schematically showing the relationship among various directions in the respective pixels in the substrate after the exposure step shown in Figs. 26 and 27; Fig. 29 is a view schematically showing the tilt direction and the tilt angle of liquid crystal molecules. 5 161897.doc 51 201241523 FIG. 30 is a view schematically showing the alignment direction of liquid crystal molecules in each of the pixels in the liquid crystal display panel of Comparative Example 1. FIG. 3 is a simulation showing a simulation in the liquid crystal display panel of Comparative Example 1. Fig. 32 is a view schematically showing an exposure step in the method of manufacturing the liquid crystal display device of Comparative Example 2, which is a view from above. Fig. 33 is a view schematically showing an exposure step in the method of manufacturing the liquid crystal display device of Comparative Example 2, which is a view from the side. Fig. 34 is a plan view schematically showing the relationship among various directions in the respective pixels in the substrate after the exposure step shown in Figs. 32 and 33. Fig. 35 is a view schematically showing an alignment direction of liquid crystal molecules in respective pixels in the liquid crystal display panel of Comparative Example 2. Fig. 3 is a view schematically showing an exposure step in the manufacturing method of the test unit, which is a view from the side. Fig. 3 is a view schematically showing another exposure step of the manufacturing method of the test unit, which is a view from the side. Fig. 3 is a perspective view schematically showing a reticle using a manufacturing method of the test unit. Fig. 39 is a plan view schematically showing the relationship among various directions in the respective pixels in the unit 1. Fig. 40 is a plan view schematically showing the relationship among various directions in the respective pixels in the unit 2. Fig. 41 is a plan view schematically showing the relationship among various directions in the respective pixels in the unit 3. 161897.doc 52- 201241523 Figure 42 is a diagram for explaining the angle of the extinction position angle *^<姨. Figure 43 is a schematic view for explaining the angle of the extinction position of the unit 丨. Fig. 44 is a view showing a mode 1 of the extinction position angle of the unit 2. Fig. 45 is a view showing the mode 1 of the extinction position angle of the single w. Fig. 46 is a view showing the result of simulating the brightness of the (4) picture element in the liquid crystal display panel of the embodiment. Fig. 47 is a view schematically showing the alignment direction of liquid crystal molecules in each of the pixels in the liquid crystal display panel of the modification (4) of the embodiment. Fig. 48 is a view schematically showing an alignment direction of liquid crystal molecules in each of the pixels in the liquid crystal display panel of the second modification of the embodiment. Fig. 49 is a view schematically showing an alignment direction of liquid crystal molecules in each of the pixels in the liquid crystal display panel of the third modification of the embodiment. [Description of main components] 1 Array substrate 2 Color filter substrate 3 Liquid crystal layer 4 ' 4a ' 4b Liquid crystal molecules 6a, 6b Polarizing plates 7a, 7b Phase difference plate 10 Mother glass substrate 10a Mother glass substrate 10b for array substrate Color Mother glass substrate 11 for filter substrate Panel area 12 Source bus line 161897.doc •53- 201241523 13 Gate bus line 14 Thin film transistor 15 Photoreceptor electrode 16 Black matrix 17 Color ray film 19 Light aligning film 21, 22' 23, A1, area A2, 'B1, B2 24 Normal exposure section 25 Continued exposure section 30 Exposure apparatus 31 Exposure head 32 Exposure stage 33 Table 34a, 34b Ultraviolet light source 35 Imaging mechanism 36a, 36b Exposure unit 41 Proximity Gap 50 Photomask 52 Light blocking portion 51 ' 55a ' 55b ' Light transmitting portion 56a , 56b , 61 a , 61b ' 65 , 66 ' 71a , 71b 161897.doc -54 - 201241523 51a 53 ' 54 > 60 70 a BC D1 Θ1 Θ2 51b light transmitting portion pattern 63 central region 64 overlapping region array substrate reticle color enamel sheet The polarization direction of the reticle plate is irradiated with ultraviolet rays of the moving direction of the substrate plane direction of the substrate of the projection oblique direction D2, D3, D4 domain pretilt angle pretilt angle 161897.doc -55-

Claims (1)

201241523 VII. Patent application scope: 1. An exposure apparatus characterized in that one side of a substrate provided with a light alignment film on a surface thereof is relatively moved with respect to exposure light, and an exposure is performed on the light alignment film; the exposure apparatus is performed a first exposure for exposing the first portion of the photo-alignment film and a second exposure for exposing the second portion of the photo-alignment film, and a relative movement of the substrate to the exposure light during the first exposure The direction of projection of the direction and the direction of exposure of the exposure light toward the surface of the substrate is substantially opposite. In the second exposure, the moving direction is substantially the same direction as the projection direction, and the normal of the surface of the substrate The angle formed by the direction and the irradiation direction is larger than the first exposure time at the time of the second exposure. 2. The exposure apparatus of claim 1, wherein the exposure apparatus performs the first exposure and the second exposure simultaneously. The exposure apparatus according to claim 1 or 2, wherein the exposure means irradiates the light alignment film with ultraviolet rays. 4. The exposure apparatus of claim 3, wherein the ultraviolet ray is a polarized ultraviolet ray. 5. The exposure apparatus according to any one of claims 1 to 4, wherein the exposure apparatus comprises a photomask including a light shielding portion and a plurality of light transmissive portions; and exposing the photo alignment film through the photomask. 6. The exposure apparatus of claim 5, wherein the light shielding portion and the plurality of 161897.doc 5 201241523 light transmission portions are arranged in a stripe shape. 7. 8. 9. 10. 11. 12. 13. 14. The exposure apparatus of claim 6 wherein the orientation of the longitudinal direction of the plurality of light transmitting portions is the same as the orientation of the relative movement direction of the substrate. The exposure apparatus according to any one of claims 5 to 7, wherein a contact gap is provided between the photomask and the substrate. An exposure apparatus according to any one of claims 8 to 8, which comprises an image pickup mechanism for reading a pattern of the above substrate. An exposure apparatus according to claim 9, wherein one side of said substrate is read while controlling a relative movement direction of said substrate with respect to exposure light. A liquid crystal display device' is characterized in that it is fabricated using an exposure apparatus according to any one of claims 1 to 10. The liquid crystal display device of claim 11, which is driven in the VATN mode. A liquid crystal display device according to claim 11 or 12, which comprises a domain of 2 or more. An exposure apparatus characterized in that a substrate having a photo-alignment film on a surface thereof is relatively moved with respect to exposure light, and an exposure is performed on the photo-alignment film; and the exposure device performs the first portion of the photo-alignment film a first exposure for performing exposure and a second exposure for exposing the second portion of the photo-alignment film to the direction of the relative movement direction of the exposure light and the irradiation direction of the exposure light in the first exposure The projection direction of the surface of the substrate is substantially opposite, and in the second exposure, the moving direction is qualitatively the same as the projection direction, and the exposure light is directed to the surface of the optical alignment film. The illuminance is greater than the first exposure time when the second exposure is performed. A seed liquid Ba display device' is characterized in that it is produced using the exposure device of claim 14. a method for manufacturing a liquid crystal display device, comprising: an exposing step of: exposing a substrate having a photoalignment film on a surface thereof to a relative movement of the exposure light, and exposing the substrate to the photoalignment film; In the exposing step, a first exposure for exposing the first portion of the photo-alignment film and a second exposure for exposing the second portion of the photo-alignment film are performed, and in the first exposure, the substrate is exposed to light a direction in which the relative movement direction of the light and a direction in which the exposure light is incident on the surface of the substrate are substantially opposite directions, and in the second exposure, the moving direction is substantially the same direction as the projection direction, and the substrate is The angle between the normal direction of the surface and the irradiation direction is greater than the first exposure time when the second exposure is performed. 17. The method of fabricating a liquid crystal display device of claim 16, comprising the step of forming a liquid crystal layer of a vertical alignment type. 18. The method of fabricating a liquid crystal display device of claim 16 or 17, comprising the step of forming a liquid crystal layer comprising a liquid crystal material having a negative dielectric anisotropy. The method of manufacturing a liquid crystal display device according to any one of claims 16 to 18, comprising: arranging the two substrates subjected to exposure processing by the exposure step to be substantially orthogonal to each other by 161897.doc, S 201241523 The way to fit the way. The method of manufacturing a liquid crystal display device according to any one of claims 16 to 19, wherein, in a plan view of the substrate, two regions which are exposed in an anti-parallel direction are formed in each pixel, The step of exposing the photoalignment film described above. A liquid crystal display device produced by using the method of manufacturing a liquid crystal display device according to any one of claims 16 to 20. A manufacturing method of a liquid crystal display device, comprising: an exposure step of: exposing a substrate having a photoalignment film on a surface thereof to a relative movement of the exposure light; and exposing the photoalignment film; In the exposing step, a first exposure for exposing the first portion of the photo-alignment film and a second exposure of the second portion of the photo-alignment film are performed, and in the first exposure, the substrate is exposed. The direction of the relative movement of the exposure light and the direction of the exposure of the exposure light to the surface of the substrate are substantially opposite directions. In the second exposure, the moving direction is substantially the same direction as the projection direction, and the exposure light is exposed. The illuminance on the surface of the photo-alignment film is greater than the first exposure time at the time of the second exposure. A liquid crystal display device produced by using the method of manufacturing a liquid crystal display device of claim 22. 161897.doc