Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/50—Substrate holders
  • C23C14/505—Substrate holders for rotation of the substrates
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C13/00—Means for manipulating or holding work, e.g. for separate articles
  • B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
• • C—CHEMISTRY; METALLURGY
  • C21—METALLURGY OF IRON
  • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
  • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/04—Coating on selected surface areas, e.g. using masks
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/50—Substrate holders
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F27—FURNACES; KILNS; OVENS; RETORTS
  • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
  • F27D5/00—Supports, screens or the like for the charge within the furnace
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F27—FURNACES; KILNS; OVENS; RETORTS
  • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
  • F27D5/00—Supports, screens or the like for the charge within the furnace
  • F27D5/005—Supports specially adapted for holding elongated articles in an upright position, e.g. sparking plugs
• • C—CHEMISTRY; METALLURGY
  • C21—METALLURGY OF IRON
  • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
  • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
  • C21D9/0006—Details, accessories not peculiar to any of the following furnaces
  • C21D9/0025—Supports; Baskets; Containers; Covers

Definitions

• the present invention relates to the coating of drills and to the holders which can be used for this purpose.
• PVD processes such as, for example, arc evaporation, electron beam evaporation or sputtering, are used in a batch process to apply the layers.
• Batch process means that holders are equipped with the drills to be coated and these holders are arranged on a kind of turntable, which ensures by rotation that the drills are passed several times at the coating source. An attempt is made to construct the holder so that only the drill tip and the area directly behind the tip are coated.
• a holder which comprises at least one perforated outer wall which is provided with an array of openings into which drills can be inserted.
• a parallel to the outer wall support wall is provided with corresponding openings, so that the drill can be arranged with their shafts substantially parallel.
• an abutment means spaced inwardly from the support wall is provided within the hollow interior of the support to ensure that the drills protrude substantially to the same extent from the outer wall.
• the holder is designed as a hollow holder to shield that part of a drill inside the outer wall of the external environment, but expose the atmosphere in the interior of the holder.
• the holder as disclosed in DE 600 02 579 T2 has the disadvantage that it is formed in polygonal shape and the drill protrude in the coating of an outer surface of the polygonal shape. Therefore, if the drill tips rotate past the coating source, those drills,
• CONFIRMATION COPY which are arranged near the corners of the polygon, a smaller minimum distance to the coating source than those drills which lie in the center of the polygon surface. This results in an undesirable different thickness of the coating of the drill.
• those drills located near the corners of the polygon when located at the shortest distance from the coating source, are not perpendicular to the surface of the coating source. Thus, one side of the flute will be shaded while the other side of the flute will be more directly exposed to the source. Since most of the material is deposited on the drill surface at this time, there is an undesirable asymmetric coating of these drills.
• Another disadvantage is that because it must be a hollow support, the flexibility of coating is severely limited. It is the object of the present invention to at least partially solve the problems described above.
• the object is achieved in that the holder is not formed as a hollow holder, but as a sandwich of at least three spaced walls, wherein the walls are curved such that when arranging the holder on the turntable, the curvature substantially adapted to the circumference of the turntable is.
• the holder is not formed as a hollow holder, but as a sandwich of at least three spaced walls, wherein the walls are curved such that when arranging the holder on the turntable, the curvature substantially adapted to the circumference of the turntable is.
• FIG. 1a schematically shows the cross section of a single holder according to the invention according to a first embodiment.
• FIG. 1b shows schematically the exploded view of a single holder according to the first embodiment according to the invention
• FIG. 1 c shows, for the first embodiment, the holders according to the invention, as they would be arranged in a coating installation. Shown is the top view of the turntable.
• Figure 2a shows schematically the cross section of a single inventive holder according to a second embodiment
• Figure 2b shows schematically the exploded view of a single inventive holder according to the second embodiment
• Figure 2c shows the cross section of a single inventive holder according to the second embodiment with a variable stop.
• FIG. 2 d shows a second embodiment of the holders according to the invention, how they would be arranged in a coating installation. Shown is the top view of the turntable.
• FIG. 3a shows the cross section of a single holder according to the invention according to a third embodiment.
• Figure 3b shows the exploded view of the holder according to the third embodiment.
• the holder according to a first embodiment comprises a first curved to a circle segment and perforated wall 103 with an arrangement of holes 105 into which the drill 107 can be inserted. It also comprises a second curved and perforated wall 109 with holes 11, whose curvature substantially corresponds to the curvature of the first wall 103 and whose holes 11 are arranged essentially corresponding to the holes 105 of the first wall 103.
• the second wall 109 is spaced from the first wall 103 on its concave side.
• the support includes a third curved wall 13 that does not include holes corresponding to the holes of the first and second walls.
• a corresponding bracket is shown schematically in Figure 1 a in cross-section and shown schematically in Figure 1 b in an exploded view.
• FIG. 1c Shown are the annularly arranged according to the invention holders which are surrounded for example by four coating sources 121, 123, 125 and 127, where they verbbeirotieren. It is clear that the curvatures of the brackets should be adapted to the size of the coating system. Therefore, the radii of curvature of the brackets are between 0.2m for small coating plants and 3m for large coating plants. It is also clear from FIG. 1c that each of the drills rotates past the coating source with the same minimum distance. It is also clear that with this first embodiment of the present invention, the problem of asymmetrical coating of the flutes is not yet solved.
• the holder according to the second embodiment comprises a first curved to a circular segment and perforated wall 203 with an array of holes 205, in which the drill 207 can be inserted. It also includes a second curved to a circular segment and perforated wall 209 with holes 211. The second wall 209 is spaced from the first wall 203 disposed on the concave side.
• the support also includes a third wall 213 curved to a circular segment. The third wall 213 is spaced from the second wall 209 on the concave side. It does not include any holes which would correspond to the holes of the first or second wall.
• the curvatures of the three walls are chosen so that if they were completed into circles, the centers of the circles would be superimposed.
• the holes 21 1 of the second wall 209 are aligned with the holes 205 of the first wall 203 so that the drills 207 are substantially radially oriented as they are inserted into the holder through the first wall 203 and the second wall 209 and on the third wall 213 find their stop.
• Figure 2c shows how the three walls can be connected together by struts 251, 253.
• the first wall 203 is fixedly connected to the second wall 209 so that the respective holes for the drills remain coordinated with each other.
• FIG. 2d schematically shows the plan view of a coating installation in which the holders according to the second embodiment just described are arranged in a ring shape. As can be seen from the figure, all drills protrude radially outwards and are guided past the coating sources with the same minimum distance.
• the holder comprises four walls.
• the two outer walls 303, 313 correspond to the first wall and the third wall of the first two embodiments. Between these two outer walls 303, 313 two walls 309, 315 are additionally arranged.
• the wall 309, which is disposed adjacent to the outer wall 303, includes slots 317 that are perpendicular to the curvature of the wall 309.
• the wall 315, which is located adjacent to the wall 313, includes slots 319 which extend along the curvature of the wall.
• the drill bits come when they are inserted into the brackets to the stop to lie on a cylinder jacket. This results in the ability to stack several cylinders, ie several brackets one above the other.
• a support for carrying drills in a coater having a perforated first wall with first holes and a second perforated wall spaced from the first wall with second holes or slots tuned to the first holes such that drills in each case the first holes and the same drills may be inserted simultaneously into the second holes or slots,
• the bracket including at least one third wall spaced from the second wall and adapted to serve as a stop for drills inserted into the first and second holes or slots and wherein at least the first wall and the third wall are bent into circle segments and therefore have curvatures, such that following insertion of the drills as far as the respective stop, they project out of the holder as an ensemble following the circle segment of the third wall with the drill tip.
• the second wall to be curved to a circle segment.
• the second wall may be spaced from the first wall on its concave side and the third wall may be spaced from the second wall on the concave side of the first wall, the second wall being disposed between the first and third walls.
• first, second and third walls are arranged relative to one another and are curved in such a way into circle segments that, when the circles are completed, the centers of the circles lie substantially one above the other.
• brackets are arranged in the coater such that during coating, the drills can be guided past a circular orbit at substantially the same minimum distance from a coating source.

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Mechanical Engineering (AREA)
• Organic Chemistry (AREA)
• Materials Engineering (AREA)
• Metallurgy (AREA)
• Chemical Kinetics & Catalysis (AREA)
• General Engineering & Computer Science (AREA)
• General Chemical & Material Sciences (AREA)
• Physics & Mathematics (AREA)
• Thermal Sciences (AREA)
• Crystallography & Structural Chemistry (AREA)
• Physical Vapour Deposition (AREA)
• Drilling Tools (AREA)
• Processing Of Stones Or Stones Resemblance Materials (AREA)

Priority Applications (9)

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Publications (1)

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Family Applications (1)

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Cited By (2)

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Citations (3)

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• 2010
  • 2010-12-28 DE DE102010056157A patent/DE102010056157A1/de not_active Withdrawn
• 2011
  • 2011-12-15 JP JP2013546606A patent/JP6027543B2/ja active Active
  • 2011-12-15 BR BR112013012779A patent/BR112013012779B1/pt active IP Right Grant
  • 2011-12-15 CN CN201180063281.XA patent/CN103261475B/zh active Active
  • 2011-12-15 PL PL11801983T patent/PL2659023T3/pl unknown
  • 2011-12-15 KR KR1020137016096A patent/KR20130132868A/ko not_active Ceased
  • 2011-12-15 EP EP11801983.5A patent/EP2659023B1/de active Active
  • 2011-12-15 KR KR1020187024030A patent/KR20180098680A/ko not_active Ceased
  • 2011-12-15 ES ES11801983.5T patent/ES2627812T3/es active Active
  • 2011-12-15 CA CA2824452A patent/CA2824452C/en active Active
  • 2011-12-15 WO PCT/EP2011/006321 patent/WO2012089306A1/de not_active Ceased
  • 2011-12-15 US US13/824,065 patent/US9869023B2/en active Active

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