WO2012008326A1 - 原盤の製造方法、配向膜の製造方法、位相差板の製造方法および表示装置の製造方法 - Google Patents
原盤の製造方法、配向膜の製造方法、位相差板の製造方法および表示装置の製造方法 Download PDFInfo
- Publication number
- WO2012008326A1 WO2012008326A1 PCT/JP2011/065318 JP2011065318W WO2012008326A1 WO 2012008326 A1 WO2012008326 A1 WO 2012008326A1 JP 2011065318 W JP2011065318 W JP 2011065318W WO 2012008326 A1 WO2012008326 A1 WO 2012008326A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- manufacturing
- laser light
- liquid crystal
- mold
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00788—Producing optical films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
- G02B30/22—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the stereoscopic type
- G02B30/25—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the stereoscopic type using polarisation techniques
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13363—Birefringent elements, e.g. for optical compensation
- G02F1/133631—Birefringent elements, e.g. for optical compensation with a spatial distribution of the retardation value
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N13/00—Stereoscopic video systems; Multi-view video systems; Details thereof
- H04N13/30—Image reproducers
- H04N13/332—Displays for viewing with the aid of special glasses or head-mounted displays [HMD]
- H04N13/337—Displays for viewing with the aid of special glasses or head-mounted displays [HMD] using polarisation multiplexing
Definitions
- the present invention relates to a master manufacturing method using a femtosecond laser.
- the present invention also relates to a method for manufacturing an alignment film and a retardation plate using the master.
- the present invention also relates to a method for manufacturing a display device provided with the retardation plate.
- a three-dimensional display method for example, there is a method of displaying an image for the right eye and an image for the left eye on a display screen and observing the image with polarized glasses (for example, Patent Document 1). reference).
- This method is realized by arranging a patterned retardation plate on the front surface of a display capable of two-dimensional display, for example, a cathode ray tube, a liquid crystal display, or a plasma display.
- a phase difference plate it is necessary to pattern retardation and optical axes at the pixel level of the display in order to control the polarization state of light incident on the left and right eyes, respectively.
- Patent Documents 1 and 2 disclose a method of manufacturing a retardation plate as described above by partially patterning a liquid crystal material or a retardation material using a photoresist or the like.
- Patent Document 3 discloses a method for producing a retardation plate by performing patterning using a photo-alignment film. Specifically, after forming a photo-alignment film on the substrate, the photo-alignment film is patterned using polarized ultraviolet rays.
- a polymerizable liquid crystal material (hereinafter referred to as a liquid crystal monomer) is applied on the patterned photo-alignment film to align liquid crystal molecules in a desired direction.
- a phase difference plate is produced by irradiating ultraviolet rays to polymerize the liquid crystalline monomer.
- a method of patterning by subjecting a polyimide alignment film to rubbing is often used.
- the present applicant uses a femtosecond laser to irradiate and scan the surface of the substrate with linearly polarized laser light, thereby causing a direction orthogonal to the polarization direction of the laser light. It is proposed that a retardation plate be manufactured using a master disc on which a strip-like pattern having a plurality of projections and depressions extending on the substrate is drawn. Thereby, while being able to manufacture by a simple process, it becomes possible to suppress the fall of light utilization efficiency.
- Patent Document 4 has a problem that since the pitch is relatively large at about 700 nm, the force for regulating the alignment of the liquid crystal is not so strong. Further, when the pitch is large, in order to sufficiently align the liquid crystal, it is necessary to increase the depth of the unevenness. However, in such a case, when a mold having deep irregularities is used to form irregularities on the substrate surface, and then the mold is peeled off from the alignment film, the stress caused by the peeling is applied when liquid crystal is applied on the alignment film. There is a problem that the liquid crystal may be difficult to align in a desired direction due to the influence of the above. This problem can be solved, for example, by forming a non-oriented thin film layer on the alignment film. However, there is a new problem that the manufacturing cost increases as the number of processes for providing the non-oriented thin film layer increases. It was.
- the present invention has been made in view of such problems, and a first object thereof is to provide a method for producing an alignment film in which the non-oriented thin film layer can be omitted.
- a second object is to provide a method of manufacturing a master that can be used for manufacturing such an alignment film.
- a third object is to provide a method of manufacturing a retardation plate using such an alignment film.
- a fourth object is to provide a method for manufacturing a display device provided with a retardation plate using such an alignment film.
- the master disk manufacturing method of the present invention uses a femtosecond laser to irradiate the substrate surface with linearly polarized laser light having a fluence of a predetermined threshold value or less, and scan the substrate surface, thereby reducing the wavelength of the laser light to less than half. A pattern having pitch irregularities is drawn.
- the above-mentioned fluence refers to the energy density (J / cm 2 ) per pulse, and is obtained by the following equation.
- F P / (f REPT ⁇ S)
- S Lx ⁇ Ly
- F Fluence
- P Laser power
- f REPT Laser repetition frequency
- S Area at the laser irradiation position
- Lx ⁇ Ly Beam size
- a pattern having irregularities with a pitch of half or less of the wavelength of the laser light is drawn by irradiation with femtosecond laser light having a fluence less than a predetermined threshold (that is, low fluence).
- a predetermined threshold that is, low fluence.
- a NiP substrate is irradiated with a femtosecond laser beam having a fluence of 0.04 J / cm 2 or more and 0.12 J / cm 2 or less at a repetition frequency of 1000 Hz and a wavelength of 800 nm, irregularities with a pitch of about 240 nm are formed.
- the uneven pitch of the alignment film can be reduced to half or less of the wavelength of the laser beam (400 nm or less in the above example).
- the orientation regulating power of the film becomes stronger.
- the method for producing an alignment film of the present invention includes the following two steps.
- A1 By using a femtosecond laser and irradiating the surface of the substrate with linearly polarized laser light having a fluence equal to or less than a predetermined threshold and scanning, the surface has irregularities with a pitch of half or less of the wavelength of the laser light.
- a step of forming a pattern on which a pattern is drawn A step of forming a plurality of grooves extending in a specific direction on the surface of the substrate using the above die.
- a pattern having irregularities with a pitch of less than half of the wavelength of the laser beam is drawn by irradiation with femtosecond laser light having a fluence less than a predetermined threshold (that is, low fluence).
- An alignment film is manufactured using the mold.
- the alignment film is manufactured by thermal transfer or transfer using a 2P (Photo Polymerization) molding method.
- the manufacturing method of the phase difference plate of the present invention includes the following four steps.
- (B1) By using a femtosecond laser and irradiating the surface of the substrate with linearly polarized laser light having a fluence equal to or less than a predetermined threshold and scanning, the surface has irregularities with a pitch of half or less of the wavelength of the laser light.
- a step of forming a pattern on which a pattern is drawn (B2)
- a step of forming a plurality of grooves extending in a specific direction on the substrate surface using the above-described mold (B3) A surface of the substrate on which a plurality of grooves are formed
- a step of applying and aligning a polymerizable liquid crystal material in contact with the substrate (B4) a step of polymerizing the liquid crystal material
- a pattern having irregularities with a pitch of less than half of the wavelength of the laser beam is drawn by irradiation with a femtosecond laser beam having a fluence less than a predetermined threshold (that is, having a low fluence).
- the alignment film is manufactured using the mold.
- the alignment film is manufactured by thermal transfer or transfer using a 2P molding method.
- the uneven pitch of the alignment film becomes half or less of the wavelength of the laser beam, and the alignment regulating force of the alignment film becomes stronger.
- the alignment film is transferred and peeled off from the master, and the alignment film is coated with a polymerizable liquid crystal material, aligned, and polymerized, the influence of the peeling stress during transfer may be ignored. it can.
- the method for manufacturing a display device is a method for manufacturing a display device including a retardation plate, and includes the following four steps.
- C1 By using a femtosecond laser and irradiating the surface of the substrate with linearly polarized laser light having a fluence of a predetermined threshold value or less and scanning, the surface has irregularities with a pitch of half or less of the wavelength of the laser light.
- a step of forming a pattern on which a pattern is drawn (C2)
- a step of forming a plurality of grooves extending in a specific direction on the substrate surface using the above mold C3
- a surface of the substrate on which a plurality of grooves are formed Step of forming a retardation plate by polymerizing the liquid crystal material (C4)
- a pattern having irregularities with a pitch of half or less of the wavelength of the laser beam is drawn by irradiation with femtosecond laser light having a fluence less than a predetermined threshold (that is, low fluence).
- An alignment film is manufactured using the mold.
- the alignment film is manufactured by thermal transfer or transfer using a 2P molding method.
- the uneven pitch of the alignment film becomes half or less of the wavelength of the laser beam, and the alignment regulating force of the alignment film becomes stronger.
- the alignment film is transferred and peeled off from the master, and the alignment film is coated with a polymerizable liquid crystal material, aligned, and polymerized, the influence of the peeling stress during transfer may be ignored. it can.
- the manufacturing method of the master, the alignment film, the phase difference plate, and the display device of the present invention by transferring the mold (master) formed using a femtosecond laser having a fluence less than a predetermined threshold (that is, having a low fluence). Since the concavo-convex pitch of the alignment film can be reduced to half or less of the wavelength of the laser beam, the influence of the peeling stress can be ignored. Thereby, a non-oriented thin film layer can be abbreviate
- FIG. 10 is a cross-sectional view illustrating a schematic configuration of a retardation plate according to Modification 2.
- FIG. 10 is a cross-sectional view illustrating a schematic configuration of a display device according to application example 1.
- FIG. FIG. 29 is a schematic diagram illustrating a stacked structure of the display device illustrated in FIG. 28.
- 12 is a schematic diagram illustrating a retardation plate and a polarizer according to another example of Application Example 1.
- FIG. 12 is a cross-sectional view illustrating a schematic configuration of a display device according to application example 2.
- Embodiment (FIGS. 1 to 25) 1.1 Structure of retardation plate 1.2 Manufacturing method of retardation plate 1.3 Manufacturing method of mold 1.4 Effect 2. Modification (FIGS. 26 to 29) 3. Application examples (Figs. 30 to 33)
- FIG. 1A illustrates an example of a cross-sectional configuration of a retardation film 10 manufactured by a manufacturing method according to an embodiment of the present invention.
- FIG. 1B shows the substrate 11 of FIG. 1A viewed from the front side.
- the retardation film 10 is obtained by forming a retardation layer 12 on a substrate 11, for example, as shown in FIG.
- the substrate 11 has groove regions 11A and 11B on the surface on the phase difference layer 12 side, and the phase difference layer 12 is in contact with the groove regions 11A and 11B.
- the substrate 11 is made of a thermoplastic material such as plastic, specifically, polymethyl methacrylate, polycarbonate, polystyrene, or the like. Further, when the retardation plate 10 is used in a polarizing glasses type display device 1 to be described later, it is preferable that the retardation of the substrate 11 is as small as possible. Therefore, the substrate 11 is made of an amorphous cycloolefin polymer or an alicyclic type. It is preferable to be comprised from an acrylic resin and a norbornene-type resin. The thickness of the substrate 11 is, for example, 30 ⁇ m to 500 ⁇ m.
- the substrate 11 may have, for example, a single layer structure or a multilayer structure.
- the substrate 11 has a two-layer structure in which a resin layer 32 is formed on the surface of the substrate 31, for example, as shown in FIG.
- the resin layer 32 is different from the photo-alignment film and the polyimide alignment film, and light absorption and coloring hardly occur in the resin layer 32.
- 2 illustrates a case where the groove regions 11A and 11B are patterned on the resin layer 32 formed on the outermost layer of the substrate 11.
- the groove regions 11 ⁇ / b> A and 11 ⁇ / b> B have, for example, a stripe shape and are alternately arranged on the surface of the substrate 11. These stripe widths are, for example, the same width as the pixel pitch of the display device.
- the groove region 11A includes a plurality of grooves 111a. The width of each groove 111a is, for example, several tens nm to several hundred nm, and the depth of each groove 111a is, for example, several nm to several hundred nm.
- the plurality of grooves 111a extend along the same direction d1.
- the groove region 11B includes a plurality of grooves 111b.
- each groove 111b is, for example, several tens nm to several hundred nm, and the depth of each groove 111b is, for example, several nm to hundred nm.
- the plurality of grooves 111b extend along the same direction d2.
- the directions d1 and d2 are orthogonal to each other, for example.
- the directions d1 and d2 form angles of ⁇ 45 ° and + 45 ° with respect to the stripe direction S of the groove regions 11A and 11B, respectively.
- the retardation layer 12 has retardation regions 12a and 12b.
- the phase difference regions 12a and 12b have, for example, a stripe shape and are alternately arranged. These stripe widths are, for example, the same width as the pixel pitch of the display device.
- the phase difference region 12a is provided facing (in contact with) the groove region 11A
- the phase difference region 12b is provided facing (in contact with) the groove region 11B.
- the phase difference characteristics are different from each other.
- the phase difference region 12a has a slow axis AX1 in the extending direction d1 of the groove 111a
- the phase difference region 12b has a slow axis AX2 in the extending direction d2 of the groove 111b.
- the slow axes AX1 and AX2 are orthogonal to each other.
- the retardation value of the retardation layer 12 is set by adjusting the constituent materials and thicknesses of the retardation regions 12a and 12b.
- the retardation value of the retardation layer 12 is preferably set in consideration of the retardation of the substrate 11.
- the retardation regions 12a and 12b are made of the same material and thickness, and the absolute values of the retardations are equal to each other.
- the retardation of the phase difference region 12a is ⁇ / 4
- the retardation of the phase difference region 12b is + ⁇ / 4.
- the signs of retardation being reversed indicate that the directions of the slow axes differ by 90 °.
- the retardation layer 12 includes, for example, a polymerized polymer liquid crystal material. That is, in the retardation layer 12, the alignment state of the liquid crystal molecules is fixed.
- a polymer liquid crystal material a material selected according to a phase transition temperature (liquid crystal phase-isotropic phase), a refractive index wavelength dispersion characteristic, a viscosity characteristic, a process temperature, and the like of the liquid crystal material is used.
- the polymer liquid crystal material preferably has an acryloyl group or a methacryloyl group as a polymerization group from the viewpoint of transparency. Further, as the polymer liquid crystal material, it is preferable to use a material having no methylene spacer between the polymerizable functional group and the liquid crystal skeleton.
- the thickness of the retardation layer 12 is, for example, 1 ⁇ m to 2 ⁇ m.
- the retardation layer 12 does not need to be configured only with the polymerized polymer liquid crystal material.
- An unpolymerized liquid crystal monomer may be contained.
- the unpolymerized liquid crystalline monomer contained in the phase difference layer 12 is aligned in the same direction as the alignment direction of the liquid crystal molecules present around it by an alignment treatment (heat treatment) described later. This is because it has orientation characteristics similar to the orientation characteristics.
- FIG. 3 is a perspective view schematically showing an example of a state near the interface between the groove region 11A and the phase difference region 12a.
- 4A is a top view of the vicinity of the interface of FIG. 3
- FIG. 4B is a cross-sectional view.
- the long axes of the liquid crystal molecules 120 are arranged along the extending direction d1 of the groove 111a.
- the upper liquid crystal molecules 120 in the retardation region 12a are also aligned along the direction d1 so as to follow the alignment direction of the lower liquid crystal molecules. That is, in the retardation region 12a, for example, the orientation of the liquid crystal molecules 120 is controlled by the shape of the groove 111a extending in the direction d1, and the optical axis of the retardation region 12a is set. Similarly, although not shown, in the vicinity of the interface between the groove region 111b and the phase difference region 12b, for example, the long axes of the liquid crystal molecules 120 are arranged along the extending direction d2 of the groove 111b.
- the upper liquid crystal molecules 120 in the retardation region 12b are also aligned along the direction d2 so as to follow the alignment direction of the lower liquid crystal molecules 120. That is, in the retardation region 12b, for example, the orientation of the liquid crystal molecules 120 is controlled by the shape of the groove 111b extending in the direction d2, and the optical axis of the retardation region 12b is set.
- the major axis of the liquid crystal molecules 120 is the slow axis direction, so the extending direction of the grooves is the slow axis direction.
- FIG. 5 shows a process of manufacturing the substrate 11 by the thermal transfer method.
- the groove regions 11 ⁇ / b> A and 11 ⁇ / b> B are patterned on the surface of the substrate 11.
- the substrate 11 at this time may have a single-layer structure or a multilayer structure (for example, a two-layer structure in which a resin layer is formed on the surface of a base material).
- the stripe-shaped groove regions 11A and 11B are alternately arranged by transfer using the mold roll 112 on which a reverse pattern of the pattern in which the stripe-like groove regions 11A and 11B are alternately arranged is formed. Form a pattern at once.
- the substrate 11 made of the above-described material is heated to the vicinity of the glass transition temperature, the mold roll 112 is pressed against the surface of the heated substrate 11, and then cooled and released. Regions 11A and 11B are formed. In this way, the substrate 11 (uneven substrate, alignment film) having the groove regions 11A and 11B on the surface is formed (FIG. 6).
- the roll-shaped mold roll 112 as described above may be used, but a flat mold may be used.
- mass productivity can be improved by using a roll-shaped mold.
- substrate 11 is formed using the type
- FIG. 7 shows an example of an apparatus for manufacturing the substrate 11 by the 2P molding method.
- the 2P molding method for example, a resin material that is cured by ultraviolet rays or an electron beam is applied on a base material to form a resin layer, and a mold having a reverse pattern of the groove region is pressed onto the formed resin layer. Thereafter, the resin layer is cured by irradiating energy rays such as ultraviolet rays and electron beams, thereby transferring the pattern of the mold onto the surface of the resin layer.
- energy rays such as ultraviolet rays and electron beams
- the unwinding roll 200 is obtained by winding the film-like substrate 31 concentrically and supplying the substrate 31.
- the substrate 31 unwound from the unwinding roll 200 flows in the order of the guide roll 220, the guide roll 230, the nip roll 240, the mold roll 112, the guide roll 250, and the guide roll 260, and finally is wound by the winding roll 270. It is supposed to be.
- the guide rolls 220 and 230 are for guiding the substrate 31 supplied from the unwinding roll 200 to the nip roll 240.
- the nip roll 240 presses the substrate 31 supplied from the guide roll 230 against the mold roll 112.
- the mold roll 112 is arranged with a predetermined gap from the nip roll 240.
- reverse patterns (groove regions 111A and 111B) of the groove regions 11A and 11B are formed.
- the guide roll 250 is for peeling off the substrate 31 wound around the mold roll 112.
- the guide roll 260 is for guiding the substrate 31 peeled off by the guide roll 250 to the take-up roll 270.
- the discharger 280 is provided through a predetermined gap between a portion of the substrate 31 supplied from the unwinding roll 200 and in contact with the guide roll 230.
- the discharger 280 drops on the substrate 31 a composition in which an additive such as a photopolymerization initiator is added to a liquid resin material that is cured by ultraviolet rays or an electron beam as necessary, thereby forming the resin layer 32A. It is like that.
- the UV irradiator 290 irradiates the portion of the substrate 31 supplied from the unwinding roll 200 after passing through the nip roll 240 and is in contact with the mold roll 112 with ultraviolet rays. Yes.
- the resin material dropped from the discharger 280 is of a type that is cured with an electron beam
- the UV irradiator 290 is not a UV irradiator but an electron beam irradiator (not shown).
- the substrate 11 is formed using the manufacturing apparatus having such a configuration. Specifically, first, the substrate 31 unwound from the unwinding roll 200 is guided to the guide roll 230 via the guide roll 220, and then the composition is dropped onto the substrate 31 from the discharger 280 to form a resin. A layer 32A (an uncured energy curable resin layer) is formed. Next, the resin layer 32 ⁇ / b> A is pressed against the peripheral surface of the mold roll 112 by the nip roll 240 through the substrate 31. As a result, the resin layer 32A is in contact with the peripheral surface of the mold roll 112 without a gap, and the uneven shape formed on the peripheral surface of the mold roll 112 is transferred to the resin layer 32A.
- a layer 32A an uncured energy curable resin layer
- UV light is irradiated from the UV irradiator 290 to the resin layer 32A having the concavo-convex shape transferred thereto.
- the liquid crystalline monomer contained in the resin layer 32A is polymerized, the liquid crystalline monomer becomes a polymer liquid crystal oriented in the extending direction of the concavo-convex shape formed on the peripheral surface of the mold roll 112.
- the resin layer 32 is formed on the substrate 31.
- the substrate 31 is taken up by the take-up roll 270 through the guide roll 260. In this way, the substrate 11 having the resin layer 32 on the surface of the substrate 31 is formed (FIG. 8).
- the mold roll 112 is made of a material that transmits UV light (for example, quartz), and ultraviolet rays UV are applied to the resin layer 32A from the inside of the mold roll 112. May be irradiated.
- FIGS. 9A and 9B show the process of manufacturing the retardation film 10 using the substrate 11.
- a liquid crystal layer 12-1 containing a liquid crystalline monomer is formed on the surface of the substrate 11 on which the groove regions 11A and 11B are patterned.
- a high molecular compound having no methylene spacer between the polymerizable functional group and the liquid crystal skeleton is used as the liquid crystal layer 12-1, thereby exhibiting a nematic phase near room temperature. Can be lowered.
- a solvent for dissolving the liquid crystalline monomer, a polymerization initiator, a polymerization inhibitor, a surfactant, a leveling agent, and the like are used for the liquid crystal layer 12-1, as necessary.
- a solvent it does not specifically limit as a solvent, It is preferable to use the thing with the high solubility of a liquid crystalline monomer, low vapor pressure at room temperature, and being hard to evaporate at room temperature.
- alignment treatment of the liquid crystalline monomer of the liquid crystal layer 12-1 applied on the surface of the substrate 11 is performed.
- This heat treatment is performed at a temperature higher than the phase transition temperature of the liquid crystalline monomer and, when a solvent is used, at a temperature higher than the temperature at which the solvent dries, for example, 50 ° C. to 130 ° C.
- the solvent is heated to a temperature at which the solvent is dried at a temperature equal to or higher than the phase transition temperature (52 ° C.) of the liquid crystalline monomer, for example, about 70 ° C., and held for several minutes.
- PMEA 2-methoxy-1-acetoxypropane
- the coating of the liquid crystalline monomer in the previous step causes shear stress to act on the interface between the liquid crystalline monomer and the substrate, resulting in flow orientation (flow orientation) and force orientation (external force orientation), and liquid crystal molecules are not intended. May be oriented in the direction.
- the heat treatment is performed in order to temporarily cancel the alignment state of the liquid crystalline monomer that has been aligned in such an unintended direction.
- the solvent is dried to become only the liquid crystalline monomer, and the state is an isotropic phase.
- the liquid crystalline monomer is aligned according to the pattern of the groove regions 11A and 11B formed on the surface of the substrate 11. That is, the liquid crystalline monomer is aligned along the extending directions d1 and d2 of the grooves 111a and 111b.
- the liquid crystalline monomer is polymerized by irradiating the liquid crystal layer 12-1 after the alignment treatment with UV light.
- the treatment temperature is generally near room temperature, but the temperature may be raised to a temperature equal to or lower than the phase transition temperature in order to adjust the retardation value.
- not only UV light but also heat or electron beam may be used.
- the process can be simplified by using UV light.
- the alignment state of the liquid crystal molecules is fixed along the directions d1 and d2, and the liquid crystal layer 12 including the retardation regions 12a and 12b is formed.
- the retardation plate 10 having the liquid crystal layer 12 on the substrate 11 is completed.
- the mold (master) used for manufacturing the phase difference plate 10 may pulse the pattern areas 210A and 210B of the mold 210 shown in FIG. 10 on a metal such as SUS, NiP, Cu, Al, Fe, or the like. It is formed by drawing a pattern using an ultrashort pulse laser having a width of 1 picosecond ( 10-12 seconds) or less, that is, a so-called femtosecond laser. Further, the polarization of the laser light is linearly polarized light.
- the polarization direction angle of the laser beam is set to the extending direction d1 of the unevenness, the region where the pattern region 210A is formed is irradiated with the laser beam, and the region where the pattern region 210A is formed Scan along.
- the polarization direction angle of the laser light is set to the extending direction d2 of the unevenness, and the region where the pattern region 210B is formed is irradiated with the laser light and the pattern region 210B is formed. Scan along the area.
- the polarization direction angle of the laser light is set to a direction intersecting the scanning direction of the laser light.
- the polarization direction angle of the laser light is set to the scanning direction of the laser light.
- pattern regions 210A and 210B having desired irregularities are formed. be able to.
- the wavelength of the laser used for laser processing is, for example, 800 nm. However, the wavelength of the laser used for laser processing may be 400 nm or 266 nm.
- the repetition frequency is preferably larger in consideration of the processing time and the narrow pitch of the unevenness to be formed, and is preferably 1000 Hz or more.
- the pulse width of the laser is preferably short, and is preferably about 200 femtoseconds (10 ⁇ 15 seconds) to 1 picosecond (10 ⁇ 12 seconds).
- the beam spot of the laser irradiated on the mold is preferably rectangular. The beam spot can be shaped by using, for example, an aperture or a cylindrical lens (see FIGS. 14 and 15).
- the intensity distribution of the beam spot is preferably as uniform as possible, for example, as shown in FIG. This is because it is desired to make the in-plane distribution such as the depth of the unevenness formed in the mold as uniform as possible.
- Lx is determined by the width of the pattern region to be processed.
- the size of Lx may be approximately the same as that of the pattern area 210A, or as shown in FIG.
- the pattern region 210A may be formed.
- the size of Lx may be 1 / N (N is a natural number) of the pattern area 210A, and the pattern area 210A may be formed by N scans.
- Ly can be appropriately determined according to the stage speed, laser intensity, repetition frequency, and the like, and is, for example, about 30 to 1000 ⁇ m.
- FIG. 14 and 15 show an example of an optical device used for laser processing.
- FIG. 14 shows an example of an optical arrangement in the case of producing a flat plate mold
- FIG. 15 shows an example of an optical apparatus in the case of producing a roll-shaped mold.
- the laser body 400 is IFRIT (trade name) manufactured by Cyber Laser Corporation.
- the laser wavelength is 800 nm
- the repetition frequency is 1000 Hz
- the pulse width is 220 fs.
- the laser body 400 emits laser light linearly polarized in the vertical direction. Therefore, in the present apparatus, linear polarization in a desired direction is obtained by rotating the polarization direction using the wave plate 410 ( ⁇ / 2 wave plate). Further, in this apparatus, a part of the laser light is extracted using the aperture 420 having a square opening. This is because the intensity distribution of the laser beam is a Gaussian distribution, and only the vicinity of the center is used to obtain a laser beam having a uniform in-plane intensity distribution. Further, in this apparatus, the laser beam is narrowed down using two orthogonal cylindrical lenses 430 so as to obtain a desired beam size.
- the linear stage 440 is moved at a constant speed. For example, as shown in FIG. 16, it is possible to first scan only the pattern area 210A in order, and then scan the pattern area 210B in order.
- the numbers shown in parentheses in FIG. 16 indicate the scanning order.
- the angle of the wave plate 410 is set to a predetermined direction, so that the polarization direction angle of the laser light is set to the extending direction d1 of the unevenness.
- the angle of the wave plate 410 is set to a predetermined direction, so that the polarization direction angle of the laser light is set to the extending direction d2 of the unevenness.
- the pattern area 210A and the pattern area 210B may be scanned alternately.
- the wave plate 410 is used to change the direction of polarization when the processing moves from the pattern region 210A to the pattern region 210B and when the processing moves from the pattern region 210B to the pattern region 210A. It is necessary to change the angle.
- the roll 330 When processing the roll 330, the roll 330 may be rotated instead of moving the linear stage 440.
- the laser beam scanning procedure for processing the roll 330 is the same as the laser beam scanning procedure for processing the flat plate 350.
- FIG. 18 shows the relationship between the laser conditions in the SUS substrate and the formed irregularities.
- FIG. 19 shows the relationship between the laser conditions in the NiP substrate and the formed irregularities. 18 and 19, it is understood that when the substrate is irradiated with a fluence femtosecond laser beam having a predetermined threshold value or less, irregularities with a narrow pitch of less than half the wavelength of the laser beam are formed.
- FIG. 18 shows that when a SUS substrate is irradiated with a fluence femtosecond laser beam of 0.04 J / cm 2 or more and 0.12 J / cm 2 or less at a repetition frequency of 1000 Hz and a wavelength of 800 nm, 50 to 200 nm.
- FIG. 19 shows that when a NiP substrate is irradiated with a fluence femtosecond laser beam of 0.04 J / cm 2 or more and 0.12 J / cm 2 or less at a repetition frequency of 1000 Hz and a wavelength of 800 nm, it is about 100 to 300 nm. It can be seen that irregularities with a narrow pitch are formed (black triangular dots in FIG. 19). From the above, regardless of the substrate material, if the single fluence is below a predetermined threshold, the pitch of the irregularities formed on the substrate can be reduced to half or less of the wavelength of the irradiated laser light. Recognize.
- the unevenness formed thereby is the polarization direction of the laser beam. Extends in a direction parallel to On the other hand, when the SUS substrate or NiP substrate is irradiated with a fluence laser beam of 0.04 J / cm 2 or more and 0.12 J / cm 2 or less, the unevenness formed thereby is orthogonal to the polarization direction of the laser beam. It extends in the direction you want. That is, the relationship between the direction of unevenness formed on the SUS substrate or the NiP substrate and the polarization direction of the laser light changes with 0.12 J / cm 2 as a boundary.
- FIG. 20 forms laser processing conditions corresponding to several points among the plurality of black diamonds in FIG. 18 and laser processing conditions corresponding to several points among the plurality of black triangular points in FIG. This is shown together with the pitch of the irregularities, the arithmetic average roughness Ra, and the presence or absence of liquid crystal alignment.
- the pitch and Ra in FIG. 20 are measured using an AFM (Atomic Force Microscope).
- FIG. 21A is obtained by measuring the unevenness at S3 in FIG. 20 by AFM.
- FIG. 21B is obtained by measuring the unevenness at N3 in FIG. 20 with AFM.
- FIG. 20 shows that when F is kept constant, the uneven pitch is almost constant for each substrate material even if the number of pulses N (actually v) is changed. That is, it can be said that the uneven pitch formed on the substrate does not depend on the pulse number N.
- the number N of pulses is the number of pulses irradiated to one place and is obtained by the following equation.
- N f REPT ⁇ Ly / v Ly: Beam size in laser scanning direction
- v Laser scanning speed
- the depth of the irregularities formed on the substrate is about 2 nm to 80 nm, and it is about 1 nm to 20 nm in terms of arithmetic average roughness. That is, the depth of the unevenness shown in FIGS. 21A and 21B is much shallower than the depth of the unevenness (about several hundred nm) when the unevenness is formed with a conventional high energy density. Yes. Further, when attention is paid to the depth of the unevenness for each substrate material, it can be seen that the depth of the unevenness formed on the SUS substrate is significantly shallower than the depth of the unevenness formed on the NiP substrate.
- the pitch of the unevenness formed on the SUS substrate is significantly narrower (smaller) than the pitch of the unevenness formed on the NiP substrate. Therefore, it is understood that when aligning the liquid crystal, it is preferable to use the SUS substrate as a transfer mold (master). Of course, when aligning the liquid crystal, it is possible to use the NiP substrate as a transfer mold (master).
- the unevenness formed in the mold does not need to have a strict periodicity. Therefore, actually, the pitch of the unevenness is an average value obtained by the number of unevenness included per unit length.
- the master is made by coating a semiconductor material such as DLC (diamond-like carbon) on the surface of a substrate such as SUS, and an ultrashort pulse laser with a pulse width of 1 picosecond (10 -12 seconds) or less, so-called femtosecond laser. It can be manufactured by forming irregularities with a narrow pitch on the surface by drawing a pattern using it. In this case, the substrate can be formed under a wider range of laser conditions than the method using only the above metal material, and the depth of the formed irregularities becomes deep as an arithmetic average roughness of 20 to 60 nm. The smoothness of the material is allowed to about Ra 10 nm. For this reason, restrictions on the manufacturing process can be relaxed.
- FDLC DLC mixed with fluorine (F)
- FDLC fluorine
- titanium nitride titanium nitride
- chromium nitride or the like
- the thickness of the coating may be about 1 ⁇ m, for example.
- FIG. 22 shows a laser condition in which a concavo-convex pitch to be formed is less than half of the laser wavelength in a substrate (hereinafter referred to as a DLC substrate) in which DLC (diamond-like carbon) is coated on a SUS304 base material.
- FIG. 23 shows a laser condition in which the uneven pitch formed is less than half of the laser wavelength in a substrate coated with DLC mixed with fluorine on a SUS304 base material (hereinafter referred to as an FDLC substrate).
- FDLC substrate a substrate coated with DLC mixed with fluorine on a SUS304 base material
- Table 1 shows the laser processing conditions corresponding to several of the black circles in FIGS. 22 and 23 together with the pitch of the formed irregularities, the arithmetic average roughness Ra, and the presence or absence of liquid crystal alignment. It is a thing.
- the pitch and Ra in Table 1 are measured using AFM.
- FIG. 24 is obtained by measuring the unevenness at D1 in Table 1 with AFM.
- FIG. 25 is obtained by measuring the unevenness at F1 in Table 1 with AFM.
- the uneven pitch formed on the substrate is about 125 nm to 180 nm, which is half or less of the irradiated laser wavelength of 800 nm.
- the depth of the unevenness formed on the substrate is about 140 nm to 200 nm, and it is about 30 nm to 50 nm in terms of arithmetic average roughness. That is, the depth of the unevenness shown in FIGS. 24 and 25 is about the same as the depth of the unevenness (about several hundred nm) when the conventional metal material such as SUS is irradiated with high energy to form the unevenness. It is.
- the unevenness that can be formed in the semiconductor material can be narrow pitch with the same depth as compared with the unevenness formed by irradiating a metal material such as SUS with high energy.
- the narrower the pitch of the unevenness the easier the liquid crystal aligns.
- the irregularities that can be formed by light will be larger than the pitch that is half the wavelength of the light. Therefore, in order to form irregularities with a pitch at which the liquid crystal is easily aligned, It is necessary to use laser light.
- the liquid crystal may be difficult to align in the direction of the unevenness due to the peeling stress generated when the transferred resin is peeled from the master.
- the unevenness having a pitch of half or less of the wavelength of the laser beam by irradiation with femtosecond laser light having a fluence less than a predetermined threshold that is, low fluence.
- a pattern having is drawn. For example, when an SUS substrate is irradiated with a femtosecond laser beam having a fluence of 0.04 J / cm 2 or more and 0.12 J / cm 2 or less at a repetition frequency of 1000 Hz and a wavelength of 800 nm, irregularities with a pitch of about 80 nm are formed.
- a NiP substrate is irradiated with a femtosecond laser beam having a fluence of 0.04 J / cm 2 or more and 0.12 J / cm 2 or less at a repetition frequency of 1000 Hz and a wavelength of 800 nm, irregularities with a pitch of about 240 nm are formed. .
- the pitch is less than half the wavelength of the laser light. Unevenness is formed. For example, in the case of DLC, irregularities with a pitch of about 125 nm are formed. For example, in the case of FDLC, unevenness with a pitch of about 140 to 180 nm is formed.
- the substrate 11 As a result, for example, when the unevenness of the mold 210 (master) is transferred to the substrate 11 (alignment film) and peeled off, the substrate 11 having a strong alignment regulating force can be formed.
- the liquid crystal material having the above is applied, aligned, and polymerized, the influence of the peeling stress at the time of transfer can be ignored. Therefore, in this embodiment, since the non-oriented thin film layer can be omitted from the retardation film 10, an increase in manufacturing cost can be suppressed while improving optical characteristics.
- Modifications 1 to 7 are modifications of the configuration of the phase difference plate 10.
- a single-layer structure is used as the substrate 11 is exemplified, but a multilayer structure (for example, a two-layer structure in which a resin layer is formed on the surface of a substrate) is used. Of course, it is possible to use.
- FIG. 26 shows the retardation plate substrate 13 according to the first modification as viewed from the front surface side.
- the configuration is the same as that of the retardation plate 10 of the above embodiment except for the configuration of the groove regions 13A and 13B formed on the surface of the substrate 13.
- the groove regions 13A and 13B are alternately arranged on the surface of the substrate 13, for example, in a stripe shape.
- the groove region 13A is constituted by a plurality of grooves 130a extending along the same direction d3, and the groove region 13B is constituted by a plurality of grooves 130b extending along the same direction d4.
- the directions d3 and d4 are orthogonal to each other. However, in this modification, the directions d3 and d4 form angles of 0 ° and 90 ° with respect to the stripe direction S of the groove regions 13A and 13B, respectively.
- the cross-sectional shape of each of the grooves 130a and 130b is, for example, V-shaped like the grooves 111a and 111b of the above-described embodiment.
- a retardation layer having a retardation region (not shown) having different retardation characteristics is formed. That is, the phase difference regions having the optical axes in the directions d3 and d4 are alternately formed in stripes in contact with the surface of the substrate 13. Also in this modification, the retardation layer is made of the same liquid crystal material as the retardation layer 12 of the above embodiment, and each retardation region is also made of the same material and thickness. Thereby, in each phase difference region, retardation values are equal to each other, and phase difference characteristics having optical axes in directions d3 and d4 are exhibited.
- a mold roll on which the reverse pattern of the groove regions 13A and 13B is formed is pressed against the surface of the substrate 13.
- the other steps are the same as those of the retardation plate 10 of the above embodiment.
- the extending directions d3 and d4 of the grooves 130a and 130b in the groove regions 13A and 13B may be parallel or orthogonal to the stripe direction S.
- the extending direction of the grooves in each groove region only needs to be orthogonal to each other, and the angle formed with the stripe direction S is not particularly limited. Note that when the retardation plate of this modification is used in combination with a polarizer, the angle between these directions d3 and d4 and the transmission axis direction of the polarizer is 45 °.
- FIG. 27A shows a cross-sectional structure of the retardation film 20 according to the second modification.
- FIG. 27B shows the substrate 17 as seen from the front side.
- the groove region 17 ⁇ / b> A is patterned on the surface of the substrate 17, and the retardation layer 18 is formed in contact with the surface of the substrate 17.
- the groove region 17A is formed over the entire surface of the substrate 17.
- the groove region 17A is configured by a plurality of grooves 170a extending along one direction d1.
- the groove region 17A does not necessarily have to be patterned in a stripe shape.
- the retardation plate 10 described in the above embodiment has already been described as being suitable as a component of a 3D display, for example.
- the retardation plate 20 of the present modification is not limited to the 3D display as described above.
- it can be suitably used as a viewing angle compensation film (for example, A plate) of a normal display for two-dimensional display. It can also be used as a retardation plate for 3D polarized glasses for viewing a 3D display.
- Modification 4 Further, in the above-described embodiment and its modification example, the configuration in which a plurality of grooves are densely arranged without gaps in the groove region has been described as an example. However, the present invention is not limited to this, and a predetermined interval is provided between the grooves. An interval may be provided. Further, the configuration in which the groove is provided on the entire surface has been described as an example, but the groove may be provided only in a local region on the substrate in accordance with a required phase difference characteristic.
- FIG. 28 illustrates a cross-sectional structure of the display device 1 according to Application Example 1.
- FIG. 29 is a schematic diagram illustrating a stacked structure of the display device 1.
- the display device 1 displays a two-dimensional image based on, for example, an image signal for the right eye and an image signal for the left eye, and observes these two-dimensional images using polarized glasses. By doing so, it is a 3D display that realizes stereoscopic viewing.
- a plurality of pixels of three primary colors of red (R: Red), green (G: Green), and blue (B: Blue) are arranged in a matrix, and the polarizer 22 is sequentially arranged from the backlight 21 side.
- the retardation plate 10 is attached to the light exit side of the polarizer 26 so that, for example, the retardation layer 12 side faces the polarizer 26.
- the optical axis directions of the retardation regions 12 a and 12 b in the retardation layer 12 are arranged so as to form an angle of 45 ° with respect to the transmission axis of the polarizer 26.
- the groove regions 11A and 11B of the phase difference plate 10 correspond to the even and odd lines of the display pixel region, respectively, and the stripe widths of the groove regions 11A and 11B are equal to the pixel pitch.
- the backlight 21 is, for example, an edge light type using a light guide plate or a direct type.
- a CCFL Cold Cathode Fluorescent Lamp
- LED Light Emitting Diode: light emission). Diode
- the drive substrate 23 is a substrate in which a pixel drive element such as a TFT (Thin Film Transistor) is formed on the surface of a transparent substrate 23a such as glass.
- the counter substrate 25 is obtained by forming a color filter layer 25b corresponding to the three primary colors on the surface of a transparent substrate 25a such as glass.
- the liquid crystal layer 24 is made of a liquid crystal material such as a nematic liquid crystal, a smectic liquid crystal, or a cholesteric liquid crystal. ing.
- An alignment film (not shown) for controlling the alignment of liquid crystal molecules in the liquid crystal layer 24, for example, a polyimide alignment film, is provided between the liquid crystal layer 24 and the drive substrate 23 and the counter substrate 25. Yes.
- the polarizers 22 and 26 transmit polarized light that vibrates in a specific direction, and absorb or reflect polarized light that vibrates in a direction orthogonal thereto. These polarizers 22 and 26 are arranged so that their transmission axes are orthogonal to each other. Here, the polarizer 22 selectively transmits the polarization component in the horizontal direction, and the polarizer 26 selectively transmits the polarization component in the vertical direction.
- the polarization component transmitted through the polarizer 26 is converted into a predetermined polarization state for each of the phase difference regions 12 a and 12 b by the phase difference layer 12 in the phase difference plate 10, and is emitted from the substrate 11 side.
- the light emitted from the phase difference plate 10 in this way is recognized as a three-dimensional stereoscopic image by an observer wearing polarized glasses.
- the alignment film is not formed on the phase difference plate 10
- generation of light loss due to the phase difference plate 10 is suppressed, and light utilization efficiency is increased. Therefore, brighter display than before can be realized.
- the transmission axis forms an angle of 45 ° with the horizontal direction.
- the set polarizer 27 is used. Thereby, the transmission axis direction of the polarizer 27 and the optical axis direction of each phase difference region of the phase difference plate are arranged so as to form an angle of 45 °.
- phase difference plate 10 is bonded to the front surface of the display device 1, it is disposed on the outermost surface of the display. For this reason, it is preferable to provide an antireflection layer or an antiglare layer (both not shown) on the back surface of the substrate 11 in order to improve contrast in a bright place. Furthermore, the vicinity of the boundary between the phase difference patterns may be covered with a black pattern. With this configuration, it is possible to suppress the occurrence of crosstalk between phase difference patterns.
- the retardation plate 10 is manufactured by using the manufacturing method according to the embodiment and the modification thereof.
- the phase difference plate 10 is manufactured by applying and polymerizing a polymerizable liquid crystal material on the substrate 11 formed by thermal transfer or transfer using a 2P molding method.
- substrate 11 becomes below half the wavelength of a laser beam, and the orientation control force of the board
- the substrate 11 alignment film
- the mold 210 master disk
- the retardation plate 10 in which the liquid crystal is aligned can be used without providing an unaligned thin film layer, so that an increase in manufacturing cost can be suppressed while improving optical characteristics.
- the retardation plate 10 in which the liquid crystal is aligned can be used without providing an unoriented thin film layer, so that an increase in manufacturing cost is suppressed while improving optical characteristics. be able to.
- FIG. 31 illustrates a cross-sectional structure of the display device 2 according to Application Example 2.
- FIG. 32 is a schematic diagram illustrating a stacked structure of the display device 2.
- the display device 2 is a display for two-dimensional display such as a liquid crystal television or a personal computer, for example, and uses the retardation plate 20 as a viewing angle compensation film.
- the display device 2 includes a polarizer 22, a drive substrate 23, a liquid crystal layer 24, a counter substrate 25, and a polarizer 26 in order from the backlight 21 side, and a modified example on the light emission side of the polarizer 22.
- the phase difference plate 20 which concerns on 2 is arrange
- the retardation plate 20 is obtained by uniformly aligning the polymerizable liquid crystal in the retardation layer 18 in the extending direction of the groove (A plate).
- the phase difference plate 20 is disposed such that the angle between the extending direction of the groove, that is, the optical axis direction and the transmission axis direction of the polarizer 22 is 0 °.
- a C plate or the like can be used as the viewing angle compensation film used for the display as described above.
- a retardation plate in which biaxiality is imparted to the retardation layer by irradiating polarized ultraviolet rays can be used.
- VA mode liquid crystal is used for the liquid crystal layer 24
- the retardation layer has, for example, a chiral nematic phase (cholesteric phase), and the optical axis direction thereof coincides with the normal direction of the substrate surface.
- liquid crystal molecules aligned along the extending direction of the groove form a helical structure having a helical axis in the normal direction of the substrate surface by introducing a chiral agent or the like.
- a configuration in which the orientation of liquid crystal molecules changes in the thickness direction of the retardation layer may be employed.
- the extending direction of the groove and the optical axis direction of the retardation plate may be different from each other. This is because the optical anisotropy as a retardation plate is finally determined depending on the alignment state of the liquid crystal molecules in the thickness direction.
- phase difference plate 20 when the light emitted from the backlight 21 enters the polarizer 22, only the horizontally polarized component is transmitted and enters the phase difference plate 20.
- the light transmitted through the phase difference plate 20 is sequentially transmitted through the drive substrate 23, the liquid crystal layer 24, the counter substrate 25, and the polarizer 26, and is emitted from the polarizer 26 as a vertically polarized component.
- a two-dimensional display is performed.
- the phase difference plate 20 since the phase difference plate 20 is arranged, the phase difference of the liquid crystal when viewed from the oblique direction is compensated, and the light leakage and coloring in the oblique direction at the time of black display can be reduced. That is, the phase difference plate 20 can be used as a viewing angle compensation film.
- the alignment film is not formed on the phase difference plate 20, generation of light loss due to the phase difference plate 20 is suppressed, and light utilization efficiency is increased. Therefore, brighter display than before can be realized.
- the retardation plate 20 as such a viewing angle compensation film may be disposed between the polarizer 22 and the drive substrate 23 in the display device 1 for 3D display according to Application Example 1 described above. Good.
- the configuration in which the angle formed by the optical axis direction d1 of the phase difference plate 20 and the transmission axis direction of the polarizer 22 is set to 0 ° has been described as an example, but the angle formed by these directions. Is not limited to 0 °.
- the angle between the optical axis direction d 1 of the phase difference plate 20 and the transmission axis direction of the polarizer 22 is 45 °.
- FIG. 33 illustrates a cross-sectional structure of the display device 3 according to Application Example 3.
- the display device 3 is, for example, a transflective two-dimensional display.
- a retardation plate 20 as a viewing angle compensation film is formed between the drive substrate 23 and the counter substrate 25 together with liquid crystal layers 33A and 33B for display modulation.
- the reflective layer 34 is provided in a selective region on the drive substrate 23, and the phase difference plate 20 is formed in a region facing the reflective layer 34 on the counter substrate 25 side.
- a liquid crystal layer 33 ⁇ / b> B is sealed between the drive substrate 23 and the retardation plate 20.
- a liquid crystal layer 33A is sealed in another region between the drive substrate 23 and the counter substrate 25.
- the liquid crystal layers 33A and 33B modulate light by applying a voltage, and have phase differences of ⁇ / 2 and ⁇ / 4, respectively.
- a backlight 21 and a polarizer 22 are disposed below the drive substrate 23, and a polarizer 26 (none of which is shown in FIG. 33) is disposed above the counter substrate 25.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Liquid Crystal (AREA)
- Polarising Elements (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
F=P/(fREPT×S)
S=Lx×Ly
F:フルエンス
P:レーザのパワー
fREPT:レーザの繰り返し周波数
S:レーザの照射位置での面積
Lx×Ly:ビームサイズ
(A1)フェムト秒レーザを用いて、所定の閾値以下のフルエンスを有する直線偏光のレーザ光を基材の表面に照射すると共に走査することにより、レーザ光の波長の半分以下のピッチの凹凸を有するパターンが描画された型を形成する工程
(A2)上記の型を用いて、基板表面に、特定の方向に延在する複数の溝を形成する工程
(B1)フェムト秒レーザを用いて、所定の閾値以下のフルエンスを有する直線偏光のレーザ光を基材の表面に照射すると共に走査することにより、レーザ光の波長の半分以下のピッチの凹凸を有するパターンが描画された型を形成する工程
(B2)上記の型を用いて、基板表面に、特定の方向に延在する複数の溝を形成する工程
(B3)複数の溝を形成した基板の表面に接して、重合性を有する液晶材料を塗布して配向させる工程
(B4)液晶材料を重合させる工程
(C1)フェムト秒レーザを用いて、所定の閾値以下のフルエンスを有する直線偏光のレーザ光を基材の表面に照射すると共に走査することにより、レーザ光の波長の半分以下のピッチの凹凸を有するパターンが描画された型を形成する工程
(C2)上記の型を用いて、基板表面に、特定の方向に延在する複数の溝を形成する工程
(C3)複数の溝を形成した基板の表面に接して、重合性を有する液晶材料を塗布して配向させる工程
(C4)液晶材料を重合させることにより、位相差板を形成する工程
1.実施の形態(図1~図25)
1.1 位相差板の構成
1.2 位相差板の製造方法
1.3 型の製造方法
1.4 効果
2.変形例(図26~図29)
3.適用例(図30~図33)
[1.1 位相差板の構成]
図1(A)は、本発明の一実施の形態に係る製造方法によって製造された位相差板10の断面構成の一例を表すものである。図1(B)は、図1(A)の基板11を表面側からみたものである。位相差板10は、例えば、図1(A)に示したように、基板11上に位相差層12を形成したものである。基板11は、位相差層12側の表面に溝領域11A,11Bを有しており、位相差層12は、溝領域11A,11Bに接している。
次に、位相差板10の製造方法の一例について説明する。以下では、最初に、熱転写法により基板11を製造する場合について説明し、続いて、いわゆる2P成型法(Photo Polymerization:光硬化を利用した成型法)により基板11を製造する場合について説明する。その後、これらの方法により製造された基板11を利用して位相差板10を製造する方法について説明する。
次に、基板11製造用の型(原盤)の製造方法の一例について説明する。
F=P/(fREPT×S)
S=Lx×Ly
F:フルエンス
P:レーザのパワー
fREPT:レーザの繰り返し周波数
S:レーザの照射位置での面積
Lx×Ly:ビームサイズ
N=fREPT×Ly/v
Ly:レーザの走査方向のビームサイズ
v:レーザの走査速度
次に、本実施の形態の製造方法の効果について説明する。
次に、位相差板10の変形例について図面を参照して説明する。以下では、位相差板10と同様の構成要素については同一の符号を付し、適宜説明を省略する。なお、変形例1~7は、位相差板10の構成についての変形例である。なお、変形例1~7では、基板11として単層構造のものを用いた場合が例示されているが、多層構造(例えば、基材の表面に樹脂層が形成された2層構造)のものを用いることはもちろん可能である。
図26は、変形例1に係る位相差板の基板13を表面側からみたものである。本変形例では、この基板13の表面に形成された溝領域13A,13Bの構成以外は、上記実施の形態の位相差板10と同様の構成となっている。
図27(A)は、変形例2に係る位相差板20の断面構造を表すものである。図27(B)は、基板17を表面側からみたものである。位相差板20では、基板17の表面に溝領域17Aがパターニングされており、この基板17の表面に接して位相差層18が形成されている。但し、本変形例では、基板17の全面に渡って溝領域17Aが形成されている。溝領域17Aは、一の方向d1に沿って延在する複数の溝170aによって構成されている。
上記実施の形態およびその変形例では、溝の断面形状がV字状の場合を例に挙げて説明したが、溝の断面形状はV字状に限定されず、他の形状、例えば円形状や多角形状であってもよい。また、各溝同士の形状は必ずしも同一でなくともよく、基板上の領域ごとに、溝の深さや大きさなどを変化させるようにしてもよい。
また、上記実施の形態およびその変形例では、溝領域において、複数の溝を隙間なく緻密に配列した構成を例に挙げて説明したが、これに限定されず、各溝同士の間に所定の間隔を設けるようにしてもよい。また、全面に溝を設けた構成を例に挙げて説明したが、必要とされる位相差特性に応じて、基板上の局部的な領域にのみ溝を設けるようにしてもよい。
(適用例1)
図28は、適用例1に係る表示装置1の断面構造を表すものである。図29は、表示装置1の積層構造を表す模式図である。この表示装置1は、例えば、右眼用の画像信号と左眼用の画像信号とのそれぞれに基づいて2次元画像を表示するものであり、これらの2次元画像を、偏光めがねを用いて観察することにより、立体視を実現する3Dディスプレイである。
図31は、適用例2に係る表示装置2の断面構造を表すものである。図32は、表示装置2の積層構造を表す模式図である。この表示装置2は、例えば、液晶テレビやパーソナルコンピュータなどの2次元表示用のディスプレイであり、位相差板20を視野角補償フィルムとして用いたものである。この表示装置2は、バックライト21の側から順に、偏光子22、駆動基板23、液晶層24、対向基板25、偏光子26を備えたものであり、偏光子22の光出射側に変形例2に係る位相差板20が配置されたものである。位相差板20は、上述したように、位相差層18における重合性液晶を溝の延在方向に一様に配向させたもの(Aプレート)である。この場合、位相差板20の溝の延在方向すなわち光学軸方向と偏光子22の透過軸方向とのなす角が0°となるように配置される。
図33は、適用例3に係る表示装置3の断面構造を表すものである。表示装置3は、例えば半透過型の2次元表示ディスプレイである。この表示装置3では、駆動基板23と対向基板25との間に、視野角補償フィルムとしての位相差板20が表示変調用の液晶層33A,33Bと共に形成されている。具体的には、駆動基板23上の選択的な領域に、反射層34が設けられており、対向基板25側の反射層34に対向する領域に位相差板20が形成されている。駆動基板23と位相差板20との間には、液晶層33Bが封止されている。一方、駆動基板23と対向基板25との間の他の領域には液晶層33Aが封止されている。液晶層33A,33Bは、電圧印加により光を変調するようになっており、それぞれ位相差がλ/2,λ/4となっている。なお、駆動基板23の下方にはバックライト21と偏光子22、対向基板25の上方には、偏光子26(いずれも図33には図示せず)が配置されている。
Claims (19)
- フェムト秒レーザを用いて、所定の閾値以下のフルエンスを有する直線偏光のレーザ光を基材表面に照射すると共に走査することにより、前記レーザ光の波長の半分以下のピッチの凹凸を有するパターンを描画する
原盤の製造方法。 - 前記閾値は、0.12J/cm2である
請求項1に記載の原盤の製造方法。 - 前記凹凸は、前記レーザ光の偏光方向と平行な方向に延在している
請求項1または請求項2に記載の原盤の製造方法。 - 前記凹凸は、前記レーザ光の走査方向と交差する方向に延在している
請求項3に記載の原盤の製造方法。 - 前記凹凸は、前記レーザ光の走査方向と平行な方向に延在している
請求項3に記載の原盤の製造方法。 - 前記フルエンスの下限は、0.04J/cm2である
請求項3に記載の原盤の製造方法。 - 前記型は、SUS、またはNiPからなる
請求項3に記載の原盤の製造方法。 - 前記レーザ光の繰り返し周波数は、1000Hz以上である
請求項3に記載の原盤の製造方法。 - フェムト秒レーザを用いて、所定の閾値以下のフルエンスを有する直線偏光のレーザ光を基材の表面に照射すると共に走査することにより、前記レーザ光の波長の半分以下のピッチの凹凸を有するパターンが描画された型を形成する工程と、
前記型を用いて、基板表面に、特定の方向に延在する複数の溝を形成する工程と
を含む
配向膜の製造方法。 - 前記閾値は、0.12J/cm2である
請求項9に記載の配向膜の製造方法。 - 前記凹凸は、前記レーザ光の偏光方向と平行な方向に延在している
請求項9または請求項10に記載の配向膜の製造方法。 - 前記型を用いた前記パターンの形成は、熱転写、または2P(Photo Polymerization)成型法を用いた転写により行う
請求項9または請求項10に記載の配向膜の製造方法。 - 前記パターンは、第1の方向に延在した複数の第1の溝と、前記第1の方向に直交する第2の方向に延在した複数の第2の溝とを含み、
前記複数の第1の溝からなる第1の溝領域と、前記複数の第2の溝からなる第2の溝領域とは、それぞれ前記走査方向に延在するストライプ状であると共に交互に配置されている
請求項9または請求項10に記載の配向膜の製造方法。 - 前記基板は、プラスチック材料により構成されている
請求項9または請求項10に記載の配向膜の製造方法。 - 前記基板は、表面に樹脂層が形成された基材により構成されている
請求項9または請求項10に記載の配向膜の製造方法。 - フェムト秒レーザを用いて、所定の閾値以下のフルエンスを有する直線偏光のレーザ光を基材の表面に照射すると共に走査することにより、前記レーザ光の波長の半分以下のピッチの凹凸を有するパターンが描画された型を形成する工程と、
前記型を用いて、基板表面に、特定の方向に延在する複数の溝を形成する工程と、
前記複数の溝を形成した基板の表面に接して、重合性を有する液晶材料を塗布して配向させる工程と、
前記液晶材料を重合させる工程と
を含む
位相差板の製造方法。 - 前記閾値は、0.12J/cm2である
請求項16に記載の位相差板の製造方法。 - 前記凹凸は、前記レーザ光の偏光方向と平行な方向に延在している
請求項16または請求項17に記載の位相差板の製造方法。 - 位相差板を備えた表示装置の製造方法であって、
フェムト秒レーザを用いて、所定の閾値以下のフルエンスを有する直線偏光のレーザ光を基材の表面に照射すると共に走査することにより、前記レーザ光の波長の半分以下のピッチの凹凸を有するパターンが描画された型を形成する工程と、
前記型を用いて、基板表面に、特定の方向に延在する複数の溝を形成する工程と、
前記複数の溝を形成した基板の表面に接して、重合性を有する液晶材料を塗布して配向させる工程と、
前記液晶材料を重合させることにより、前記位相差板を形成する工程と
を含む
表示装置の製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012524518A JPWO2012008326A1 (ja) | 2010-07-12 | 2011-07-05 | 原盤の製造方法、配向膜の製造方法、位相差板の製造方法および表示装置の製造方法 |
US13/701,776 US20130089662A1 (en) | 2010-07-12 | 2011-07-05 | Method of producing master plate, method of producing alignment film, method of producing retardation film, and method of producing display device |
KR1020137000683A KR20130129887A (ko) | 2010-07-12 | 2011-07-05 | 원반의 제조 방법, 배향막의 제조 방법, 위상차판의 제조 방법 및 표시 장치의 제조 방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010157806 | 2010-07-12 | ||
JP2010-157806 | 2010-07-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012008326A1 true WO2012008326A1 (ja) | 2012-01-19 |
Family
ID=45469329
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2011/065318 WO2012008326A1 (ja) | 2010-07-12 | 2011-07-05 | 原盤の製造方法、配向膜の製造方法、位相差板の製造方法および表示装置の製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20130089662A1 (ja) |
JP (1) | JPWO2012008326A1 (ja) |
KR (1) | KR20130129887A (ja) |
TW (2) | TWI498207B (ja) |
WO (1) | WO2012008326A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013171253A (ja) * | 2012-02-22 | 2013-09-02 | Dainippon Printing Co Ltd | 位相差フィルム作成用版及び位相差フィルム作成用版の製造方法 |
JP2014029459A (ja) * | 2012-06-27 | 2014-02-13 | Dainippon Printing Co Ltd | 光学フィルム用転写体、光学フィルム、画像表示装置及び光学フィルムの製造方法 |
JP2014142462A (ja) * | 2013-01-23 | 2014-08-07 | Dainippon Printing Co Ltd | 光学機能層付きタッチパネル用電極部、円偏光板付きタッチパネル電極部、タッチパネル、画像表示装置 |
JP2016151585A (ja) * | 2015-02-16 | 2016-08-22 | 大日本印刷株式会社 | 光学フィルムの製造方法 |
WO2021166942A1 (ja) * | 2020-02-20 | 2021-08-26 | 富士フイルム株式会社 | 位相差フィルム、円偏光板、表示装置 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103941322B (zh) * | 2014-04-10 | 2017-01-18 | 合肥京东方光电科技有限公司 | 一种相位差板的制作方法 |
CN104090414B (zh) * | 2014-06-27 | 2016-08-17 | 合肥京东方光电科技有限公司 | 显示面板、其制作方法和显示装置 |
CN105093686B (zh) * | 2015-02-06 | 2018-01-12 | 深圳市华星光电技术有限公司 | 液晶配向膜制作方法及反应机台 |
US11067855B2 (en) | 2019-02-11 | 2021-07-20 | Facebook Technologies, Llc | Apparatus and methods for aligning photopolymers using an asymmetrically focused beam |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003211400A (ja) * | 2002-01-22 | 2003-07-29 | Japan Science & Technology Corp | 超短パルスレーザーを用いた微細加工方法及びその加工物 |
WO2010032540A1 (ja) * | 2008-09-22 | 2010-03-25 | ソニー株式会社 | 位相差板およびその製造方法並びに表示装置 |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4713518A (en) * | 1984-06-08 | 1987-12-15 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device manufacturing methods |
US5739880A (en) * | 1995-12-01 | 1998-04-14 | Hitachi, Ltd. | Liquid crystal display device having a shielding film for shielding light from a light source |
JP2002169026A (ja) * | 2000-09-25 | 2002-06-14 | Fuji Photo Film Co Ltd | コリメータ及びバックライトシステム |
US20050018595A1 (en) * | 2001-06-06 | 2005-01-27 | Spectra Systems Corporation | System for applying markings to optical media |
JP3939140B2 (ja) * | 2001-12-03 | 2007-07-04 | 株式会社日立製作所 | 液晶表示装置 |
JP2003279705A (ja) * | 2002-03-25 | 2003-10-02 | Sanyo Electric Co Ltd | 反射防止部材 |
KR100763291B1 (ko) * | 2002-04-24 | 2007-10-04 | 닛토덴코 가부시키가이샤 | 시야각 확대 액정표시장치 |
WO2004068553A2 (en) * | 2003-01-29 | 2004-08-12 | The Regents Of The University Of Michigan | Method for forming nanoscale features |
JP4092256B2 (ja) * | 2003-06-04 | 2008-05-28 | 財団法人レーザー技術総合研究所 | 金属密着面表面処理方法 |
JP2004360011A (ja) * | 2003-06-04 | 2004-12-24 | Laser Gijutsu Sogo Kenkyusho | 金属摺動面表面処理方法及びその装置 |
JP2005129769A (ja) * | 2003-10-24 | 2005-05-19 | Hitachi Ltd | 半導体薄膜の改質方法、改質した半導体薄膜とその評価方法、およびこの半導体薄膜で形成した薄膜トランジスタ、並びにこの薄膜トランジスタを用いて構成した回路を有する画像表示装置 |
JP4729883B2 (ja) * | 2003-10-31 | 2011-07-20 | セイコーエプソン株式会社 | 基板の加工方法、マイクロレンズシートの製造方法、透過型スクリーン、プロジェクタ、表示装置並びに基板の加工装置 |
JP2005279918A (ja) * | 2004-03-04 | 2005-10-13 | Seiko Epson Corp | 微細構造素子の製造方法、この方法により製造された微細構造素子、空間光変調装置及びプロジェクタ |
US20050254035A1 (en) * | 2004-05-11 | 2005-11-17 | Chromaplex, Inc. | Multi-photon lithography |
US7435927B2 (en) * | 2004-06-18 | 2008-10-14 | Electron Scientific Industries, Inc. | Semiconductor link processing using multiple laterally spaced laser beam spots with on-axis offset |
JP3826145B2 (ja) * | 2004-07-16 | 2006-09-27 | 株式会社クラレ | 集光フィルム、液晶パネルおよびバックライト並びに集光フィルムの製造方法 |
WO2006026743A1 (en) * | 2004-08-31 | 2006-03-09 | Fusion Optix, Inc. | Enhanced light diffusing sheet |
JP2006126338A (ja) * | 2004-10-27 | 2006-05-18 | Nippon Sheet Glass Co Ltd | 偏光子およびその製造方法 |
US20060290253A1 (en) * | 2005-06-23 | 2006-12-28 | Fusion Optix, Inc. | Enhanced Diffusing Plates, Films and Backlights |
JPWO2007046337A1 (ja) * | 2005-10-17 | 2009-04-23 | 三菱レイヨン株式会社 | プリズムシート及びその製造方法並びに面光源装置 |
CN101916015B (zh) * | 2005-12-22 | 2012-04-18 | Nlt技术株式会社 | 液晶显示器件及使用其的终端器件 |
WO2007094338A1 (ja) * | 2006-02-17 | 2007-08-23 | National University Corporation Toyohashi University Of Technology | 機能性分光フィルタの作成方法 |
JP3973225B1 (ja) * | 2006-03-24 | 2007-09-12 | 日東電工株式会社 | 光学補償板、及び液晶セル、及び液晶表示装置 |
JP2008279597A (ja) * | 2006-05-10 | 2008-11-20 | Oji Paper Co Ltd | 凹凸パターン形成シートおよびその製造方法、反射防止体、位相差板、工程シート原版ならびに光学素子の製造方法 |
US7784954B1 (en) * | 2006-07-25 | 2010-08-31 | Fusion Optix, Inc. | Polarization sensitive light homogenizer |
WO2008026454A1 (fr) * | 2006-08-31 | 2008-03-06 | Konica Minolta Opto, Inc. | Film optique, procédé de fabrication de film optique, plaque de polarisation et dispositif d'affichage à cristaux liquides |
US7751006B2 (en) * | 2006-09-29 | 2010-07-06 | Dai Nippon Printing Co., Ltd. | Optical element, liquid crystal display device member with the optical element, liquid crystal display device with the liquid crystal display device member, method of producing the optical element and method of evaluating birefringence functional layer |
JP2008233552A (ja) * | 2007-03-20 | 2008-10-02 | Sony Corp | パターン形成基板、パターン形成方法、並びに金型 |
US8259259B2 (en) * | 2007-04-11 | 2012-09-04 | Fujifilm Corporation | Liquid crystal display device comprising an optically anisotropic film having at least one species of liquid crystal compound which exhibits a nematic phase or a smectic phase |
JP5487592B2 (ja) * | 2007-11-06 | 2014-05-07 | セイコーエプソン株式会社 | レーザー加工方法 |
EP2234469A4 (en) * | 2007-12-12 | 2013-05-15 | Bridgestone Corp | OPTICAL FILTER, OPTICAL FILTER FOR ONE DISPLAY, DISPLAY EQUIPPED WITH SUCH A FILTER AND PLASMA DISPLAY SHIELD |
KR101197162B1 (ko) * | 2008-08-27 | 2012-11-09 | 주식회사 엘지화학 | 면상 스위칭 모드 액정 표시 장치 |
WO2010032610A1 (ja) * | 2008-09-17 | 2010-03-25 | シャープ株式会社 | 反射防止膜及びその製造方法 |
JP5428509B2 (ja) * | 2009-05-11 | 2014-02-26 | ソニー株式会社 | 2次元固体撮像装置、及び、2次元固体撮像装置における偏光光データ処理方法 |
-
2011
- 2011-07-05 KR KR1020137000683A patent/KR20130129887A/ko not_active Application Discontinuation
- 2011-07-05 US US13/701,776 patent/US20130089662A1/en not_active Abandoned
- 2011-07-05 TW TW100123686A patent/TWI498207B/zh active
- 2011-07-05 WO PCT/JP2011/065318 patent/WO2012008326A1/ja active Application Filing
- 2011-07-05 JP JP2012524518A patent/JPWO2012008326A1/ja active Pending
- 2011-07-05 TW TW103127448A patent/TWI517965B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003211400A (ja) * | 2002-01-22 | 2003-07-29 | Japan Science & Technology Corp | 超短パルスレーザーを用いた微細加工方法及びその加工物 |
WO2010032540A1 (ja) * | 2008-09-22 | 2010-03-25 | ソニー株式会社 | 位相差板およびその製造方法並びに表示装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013171253A (ja) * | 2012-02-22 | 2013-09-02 | Dainippon Printing Co Ltd | 位相差フィルム作成用版及び位相差フィルム作成用版の製造方法 |
JP2014029459A (ja) * | 2012-06-27 | 2014-02-13 | Dainippon Printing Co Ltd | 光学フィルム用転写体、光学フィルム、画像表示装置及び光学フィルムの製造方法 |
JP2014142462A (ja) * | 2013-01-23 | 2014-08-07 | Dainippon Printing Co Ltd | 光学機能層付きタッチパネル用電極部、円偏光板付きタッチパネル電極部、タッチパネル、画像表示装置 |
JP2016151585A (ja) * | 2015-02-16 | 2016-08-22 | 大日本印刷株式会社 | 光学フィルムの製造方法 |
WO2021166942A1 (ja) * | 2020-02-20 | 2021-08-26 | 富士フイルム株式会社 | 位相差フィルム、円偏光板、表示装置 |
JPWO2021166942A1 (ja) * | 2020-02-20 | 2021-08-26 | ||
JP7472260B2 (ja) | 2020-02-20 | 2024-04-22 | 富士フイルム株式会社 | 位相差フィルム、円偏光板、表示装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI498207B (zh) | 2015-09-01 |
TWI517965B (zh) | 2016-01-21 |
TW201226162A (en) | 2012-07-01 |
KR20130129887A (ko) | 2013-11-29 |
US20130089662A1 (en) | 2013-04-11 |
TW201442851A (zh) | 2014-11-16 |
JPWO2012008326A1 (ja) | 2013-09-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4547641B2 (ja) | 位相差板の製造方法 | |
WO2012008326A1 (ja) | 原盤の製造方法、配向膜の製造方法、位相差板の製造方法および表示装置の製造方法 | |
JP4720946B2 (ja) | 3次元ディスプレイの位相差板に用いられる凹凸基材の製造方法 | |
JP5679308B2 (ja) | 照明装置および表示装置 | |
JP4645772B1 (ja) | 位相差素子用配向膜およびその製造方法、位相差素子およびその製造方法、表示装置 | |
US8305503B1 (en) | Phase difference element and display device | |
US9091815B2 (en) | Retardation element and display | |
JP6614251B2 (ja) | パターンドリターダー付カラーフィルタおよび液晶表示装置 | |
JP2011164563A (ja) | 位相差素子およびその製造方法、表示装置、ならびに光吸収層付き基板およびその製造方法 | |
US20130335942A1 (en) | Alignment film, method of manufacturing the alignment film, retardation film, method of manufacturing the retardation film, and display | |
US9164322B2 (en) | Display unit | |
JP2015068949A (ja) | 位相差フィルム及びその製造方法、偏光板、並びに、画像表示装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11806656 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012524518 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13701776 Country of ref document: US |
|
ENP | Entry into the national phase |
Ref document number: 20137000683 Country of ref document: KR Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 11806656 Country of ref document: EP Kind code of ref document: A1 |