WO2011114699A1 - プラズマディスプレイパネル - Google Patents
プラズマディスプレイパネル Download PDFInfo
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- WO2011114699A1 WO2011114699A1 PCT/JP2011/001487 JP2011001487W WO2011114699A1 WO 2011114699 A1 WO2011114699 A1 WO 2011114699A1 JP 2011001487 W JP2011001487 W JP 2011001487W WO 2011114699 A1 WO2011114699 A1 WO 2011114699A1
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- dielectric layer
- underlayer
- oxide
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/40—Layers for protecting or enhancing the electron emission, e.g. MgO layers
Definitions
- the technology disclosed herein relates to a plasma display panel used for a display device or the like.
- a plasma display panel (hereinafter referred to as PDP) is composed of a front plate and a back plate.
- the front plate includes a glass substrate, a display electrode formed on one main surface of the glass substrate, a dielectric layer that covers the display electrode and functions as a capacitor, and magnesium oxide formed on the dielectric layer It is comprised with the protective layer which consists of (MgO).
- the back plate includes a glass substrate, a data electrode formed on one main surface of the glass substrate, a base dielectric layer covering the data electrode, a partition formed on the base dielectric layer, and each partition It is comprised with the fluorescent substance layer which light-emits each in red, green, and blue formed in between.
- the front plate and the back plate are hermetically sealed with the electrode forming surface facing each other.
- Neon (Ne) and xenon (Xe) discharge gases are sealed in the discharge space partitioned by the partition walls.
- the discharge gas is discharged by the video signal voltage selectively applied to the display electrodes.
- the ultraviolet rays generated by the discharge excite each color phosphor layer.
- the excited phosphor layer emits red, green, and blue light.
- the PDP realizes color image display in this way (see Patent Document 1).
- the protective layer has four main functions. The first is to protect the dielectric layer from ion bombardment due to discharge. The second is to emit initial electrons for generating a data discharge. The third is to hold a charge for generating a discharge. Fourth, secondary electrons are emitted during the sustain discharge.
- an increase in discharge voltage is suppressed.
- the applied voltage is reduced by improving the charge retention performance. As the number of secondary electron emission increases, the sustain discharge voltage is reduced.
- attempts have been made to add silicon (Si) or aluminum (Al) to MgO of the protective layer for example, Patent Documents 1, 2, 3, 4, 5). Etc.
- JP 2002-260535 A Japanese Patent Laid-Open No. 11-339665 JP 2006-59779 A JP-A-8-236028 JP-A-10-334809
- the PDP includes a front plate and a back plate disposed to face the front plate.
- the front plate has a dielectric layer and a protective layer covering the dielectric layer.
- the back plate includes a base dielectric layer, a plurality of barrier ribs formed on the base dielectric layer, and a phosphor layer formed on the base dielectric layer and on the side surfaces of the barrier ribs.
- the protective layer includes an underlayer formed on the dielectric layer. In the underlayer, agglomerated particles obtained by aggregating a plurality of magnesium oxide crystal particles are dispersed over the entire surface.
- the underlayer includes at least a first metal oxide and a second metal oxide. Furthermore, the underlayer has at least one peak in the X-ray diffraction analysis.
- This peak is between the first peak in the X-ray diffraction analysis of the first metal oxide and the second peak in the X-ray diffraction analysis of the second metal oxide.
- the first peak and the second peak have the same plane orientation as the plane orientation indicated by the peak of the underlayer.
- the first metal oxide and the second metal oxide are two kinds selected from the group consisting of magnesium oxide, calcium oxide, strontium oxide and barium oxide.
- the phosphor layer includes platinum group element particles.
- FIG. 1 is a perspective view showing the structure of a PDP according to an embodiment.
- FIG. 2 is a cross-sectional view showing the configuration of the front plate of the PDP.
- FIG. 3 is a diagram showing the results of X-ray diffraction analysis of the surface of the underlayer of the PDP.
- FIG. 4 is a diagram showing the results of X-ray diffraction analysis of the surface of the underlayer having another configuration of the PDP.
- FIG. 5 is an enlarged view for explaining the aggregated particles according to the embodiment.
- FIG. 6 is a diagram showing the relationship between the discharge delay of the PDP and the calcium (Ca) concentration in the protective layer according to one embodiment.
- FIG. 7 is a characteristic diagram showing the examination results of electron emission performance and Vscn lighting voltage in the PDP.
- FIG. 8 is a characteristic diagram showing the relationship between the average particle size of the aggregated particles and the electron emission performance according to one embodiment.
- FIG. 9 is a process diagram showing a protective layer forming process according to an embodiment.
- the basic structure of the PDP is a general AC surface discharge type PDP.
- the PDP 1 has a front plate 2 made of a front glass substrate 3 and a back plate 10 made of a back glass substrate 11 facing each other.
- the front plate 2 and the back plate 10 are hermetically sealed with a sealing material whose outer peripheral portion is made of glass frit or the like.
- the discharge space 16 inside the sealed PDP 1 is filled with a discharge gas such as Ne and Xe at a pressure of 53 kPa (400 Torr) to 80 kPa (600 Torr).
- a pair of strip-shaped display electrodes 6 each consisting of a scanning electrode 4 and a sustain electrode 5 and a plurality of black stripes 7 are arranged in parallel to each other.
- a dielectric layer 8 that functions as a capacitor is formed on the front glass substrate 3 so as to cover the display electrodes 6 and the black stripes 7. Further, a protective layer 9 made of MgO or the like is formed on the surface of the dielectric layer 8.
- Scan electrode 4 and sustain electrode 5 are each formed by laminating a bus electrode containing Ag on a transparent electrode made of a conductive metal oxide such as indium tin oxide (ITO), tin dioxide (SnO 2 ), or zinc oxide (ZnO). Has been.
- ITO indium tin oxide
- SnO 2 tin dioxide
- ZnO zinc oxide
- a plurality of data electrodes 12 made of a conductive material mainly composed of silver (Ag) are arranged in parallel to each other in a direction orthogonal to the display electrodes 6.
- the data electrode 12 is covered with a base dielectric layer 13. Further, a partition wall 14 having a predetermined height is formed on the underlying dielectric layer 13 between the data electrodes 12 to divide the discharge space 16.
- a phosphor layer 15 that emits red light by ultraviolet rays, a phosphor layer 15 that emits green light, and a phosphor layer 15 that emits blue light are sequentially formed on the underlying dielectric layer 13 and the side surfaces of the barrier ribs 14 for each data electrode 12. It is formed by coating.
- a discharge cell is formed at a position where the display electrode 6 and the data electrode 12 intersect. Discharge cells having red, green, and blue phosphor layers 15 arranged in the direction of the display electrode 6 serve as pixels for color display.
- the discharge gas sealed in the discharge space 16 contains 10% by volume or more and 30% or less of Xe.
- Scan electrode 4, sustain electrode 5, and black stripe 7 are formed on front glass substrate 3 by photolithography.
- Scan electrode 4 and sustain electrode 5 have bus electrodes 4b and 5b containing Ag for ensuring conductivity.
- Scan electrode 4 and sustain electrode 5 have transparent electrodes 4a and 5a.
- the bus electrode 4b is laminated on the transparent electrode 4a.
- the bus electrode 5b is laminated on the transparent electrode 5a.
- ITO or the like is used to ensure transparency and electrical conductivity.
- an ITO thin film is formed on the front glass substrate 3 by sputtering or the like.
- transparent electrodes 4a and 5a having a predetermined pattern are formed by lithography.
- a white paste containing a glass frit for binding Ag and Ag, a photosensitive resin, a solvent, and the like is used as a material for the bus electrodes 4b and 5b.
- a white paste is applied to the front glass substrate 3 by a screen printing method or the like.
- the solvent in the white paste is removed by a drying furnace.
- the white paste is exposed through a photomask having a predetermined pattern.
- bus electrodes 4b and 5b are formed by the above steps.
- the black stripe 7 is formed of a material containing a black pigment.
- the dielectric layer 8 is formed.
- a dielectric paste containing a dielectric glass frit, a resin, a solvent, and the like is used as a material for the dielectric layer 8.
- a dielectric paste is applied on the front glass substrate 3 by a die coating method or the like so as to cover the scan electrodes 4, the sustain electrodes 5 and the black stripes 7 with a predetermined thickness.
- the solvent in the dielectric paste is removed by a drying furnace.
- the dielectric paste is fired at a predetermined temperature in a firing furnace. That is, the resin in the dielectric paste is removed. Further, the dielectric glass frit is melted.
- the molten glass frit is vitrified again after firing.
- the dielectric layer 8 is formed.
- a screen printing method, a spin coating method, or the like can be used.
- a film that becomes the dielectric layer 8 can be formed by CVD (Chemical Vapor Deposition) method or the like without using the dielectric paste. Details of the dielectric layer 8 will be described later.
- a protective layer 9 is formed on the dielectric layer 8. Details of the protective layer 9 will be described later.
- the scanning electrode 4, the sustaining electrode 5, the black stripe 7, the dielectric layer 8, and the protective layer 9 are formed on the front glass substrate 3, and the front plate 2 is completed.
- Data electrodes 12 are formed on the rear glass substrate 11 by photolithography.
- a data electrode paste containing Ag for securing conductivity and glass frit for binding Ag, a photosensitive resin, a solvent, and the like is used as the material of the data electrode 12.
- the data electrode paste is applied on the rear glass substrate 11 with a predetermined thickness by a screen printing method or the like.
- the solvent in the data electrode paste is removed by a drying furnace.
- the data electrode paste is exposed through a photomask having a predetermined pattern.
- the data electrode paste is developed to form a data electrode pattern.
- the data electrode pattern is fired at a predetermined temperature in a firing furnace.
- the data electrode 12 is formed by the above process.
- a sputtering method, a vapor deposition method, or the like can be used.
- the base dielectric layer 13 is formed.
- a base dielectric paste containing a dielectric glass frit, a resin, a solvent, and the like is used as a material for the base dielectric layer 13.
- a base dielectric paste is applied by a screen printing method or the like so as to cover the data electrode 12 on the rear glass substrate 11 on which the data electrode 12 is formed with a predetermined thickness.
- the solvent in the base dielectric paste is removed by a drying furnace.
- the base dielectric paste is fired at a predetermined temperature in a firing furnace. That is, the resin in the base dielectric paste is removed. Further, the dielectric glass frit is melted. The molten glass frit is vitrified again after firing.
- the base dielectric layer 13 is formed.
- a die coating method, a spin coating method, or the like can be used.
- a film that becomes the base dielectric layer 13 can be formed by CVD or the like without using the base dielectric paste.
- the barrier ribs 14 are formed by photolithography.
- a partition paste containing a filler, a glass frit for binding the filler, a photosensitive resin, a solvent, and the like is used as a material for the partition wall 14.
- the barrier rib paste is applied on the underlying dielectric layer 13 with a predetermined thickness by a die coating method or the like.
- the solvent in the partition wall paste is removed by a drying furnace.
- the barrier rib paste is exposed through a photomask having a predetermined pattern.
- the barrier rib paste is developed to form a barrier rib pattern.
- the partition pattern is fired at a predetermined temperature in a firing furnace. That is, the photosensitive resin in the partition pattern is removed.
- the partition wall 14 is formed by the above process.
- a sandblast method or the like can be used.
- the phosphor layer 15 is formed.
- a phosphor paste 19 including phosphor particles 17, a binder, a solvent, and the like is used as a material of the phosphor layer 15.
- the phosphor paste 19 contains particles of platinum group elements.
- the phosphor paste 19 is applied on the base dielectric layer 13 between the adjacent barrier ribs 14 and on the side surfaces of the barrier ribs 14 with a predetermined thickness by a dispensing method or the like.
- the solvent in the phosphor paste 19 is removed by a drying furnace.
- the phosphor paste 19 is fired at a predetermined temperature in a firing furnace. That is, the resin in the phosphor paste 19 is removed.
- the phosphor layer 15 is formed by the above steps.
- a screen printing method, an inkjet method, or the like can be used. Details of the phosphor layer 15 will be described later.
- the back plate 10 having predetermined constituent members on the back glass substrate 11 is completed.
- a sealing material (not shown) is formed around the back plate 10 by the dispensing method.
- a sealing paste containing glass frit, a binder, a solvent, and the like is used.
- the solvent in the sealing paste is removed by a drying furnace.
- the front plate 2 and the back plate 10 are arranged to face each other so that the display electrode 6 and the data electrode 12 are orthogonal to each other.
- the periphery of the front plate 2 and the back plate 10 is sealed with glass frit.
- the discharge space 16 is filled with a discharge gas containing Ne, Xe, etc., thereby completing the PDP 1.
- a plurality of pairs of strip-shaped display electrodes 6 and black stripes 7 each consisting of a scanning electrode 4 and a sustaining electrode 5 are arranged in parallel to each other.
- a dielectric layer 8 is formed on the front glass substrate 3 so as to cover the display electrodes 6 and the black stripes 7.
- a protective layer 9 is formed on the surface of the dielectric layer 8.
- the protective layer 9 includes a base layer 91 laminated on the dielectric layer 8 and agglomerated particles 92 attached on the base layer 91.
- the dielectric layer 8 will be described in detail.
- the dielectric layer 8 includes a first dielectric layer 81 and a second dielectric layer 82.
- a second dielectric layer 82 is stacked on the first dielectric layer 81.
- the dielectric material of the first dielectric layer 81 includes the following components.
- Bismuth trioxide (Bi 2 O 3 ) is 20% to 40% by weight.
- At least one selected from the group consisting of calcium oxide (CaO), strontium oxide (SrO) and barium oxide (BaO) is 0.5 to 12% by weight.
- At least one selected from the group consisting of molybdenum trioxide (MoO 3 ), tungsten trioxide (WO 3 ), cerium dioxide (CeO 2 ), and manganese dioxide (MnO 2 ) is 0.1 wt% to 7 wt%. It is.
- MoO 3, WO 3 in place of the CeO 2 and the group consisting of MnO 2, copper oxide (CuO), dichromium trioxide (Cr 2 O 3), trioxide cobalt (Co 2 O 3), heptoxide
- At least one selected from the group consisting of divanadium (V 2 O 7 ) and diantimony trioxide (Sb 2 O 3 ) may be contained in an amount of 0.1 wt% to 7 wt%.
- ZnO is 0 wt% to 40 wt%
- diboron trioxide (B 2 O 3 ) is 0 wt% to 35 wt%
- silicon dioxide (SiO 2 ) is 0 wt% to Components that do not contain a lead component such as 15% by weight and 0% by weight to 10% by weight of dialuminum trioxide (Al 2 O 3 ) may be included.
- the dielectric material is pulverized with a wet jet mill or a ball mill so that the average particle diameter is 0.5 ⁇ m to 2.5 ⁇ m, and a dielectric material powder is produced.
- a dielectric material powder is produced.
- 55 wt% to 70 wt% of the dielectric material powder and 30 wt% to 45 wt% of the binder component are well kneaded with three rolls to obtain a first dielectric layer paste for die coating or printing. Complete.
- the binder component is ethyl cellulose, terpineol containing 1% to 20% by weight of acrylic resin, or butyl carbitol acetate.
- dioctyl phthalate, dibutyl phthalate, triphenyl phosphate, and tributyl phosphate may be added as a plasticizer as needed.
- glycerol monooleate, sorbitan sesquioleate, homogenol (product name of Kao Corporation), alkyl allyl phosphate, or the like may be added as a dispersant. When a dispersant is added, printability is improved.
- the first dielectric layer paste covers the display electrode 6 and is printed on the front glass substrate 3 by a die coating method or a screen printing method.
- the printed first dielectric layer paste is dried and baked at 575 ° C. to 590 ° C., which is slightly higher than the softening point of the dielectric material, to form the first dielectric layer 81.
- the dielectric material of the second dielectric layer 82 includes the following components.
- Bi 2 O 3 is 11% by weight to 20% by weight.
- At least one selected from CaO, SrO, and BaO is 1.6 wt% to 21 wt%.
- At least one selected from MoO 3 , WO 3 , and CeO 2 is 0.1 wt% to 7 wt%.
- At least one selected from CuO, Cr 2 O 3 , Co 2 O 3 , V 2 O 7 , Sb 2 O 3 , and MnO 2 is 0.1% by weight. It may be included up to 7% by weight.
- ZnO is 0 wt% to 40 wt%
- B 2 O 3 is 0 wt% to 35 wt%
- SiO 2 is 0 wt% to 15 wt%
- Al 2 O 3 is 0 wt%.
- Components that do not contain a lead component such as 10% by weight to 10% by weight may be contained.
- the dielectric material is pulverized with a wet jet mill or a ball mill so that the average particle diameter is 0.5 ⁇ m to 2.5 ⁇ m, and a dielectric material powder is produced.
- a dielectric material powder is produced.
- 55 wt% to 70 wt% of the dielectric material powder and 30 wt% to 45 wt% of the binder component are well kneaded with three rolls to obtain a second dielectric layer paste for die coating or printing. Complete.
- the binder component is ethyl cellulose, terpineol containing 1% to 20% by weight of acrylic resin, or butyl carbitol acetate.
- dioctyl phthalate, dibutyl phthalate, triphenyl phosphate, and tributyl phosphate may be added as a plasticizer as needed.
- glycerol monooleate, sorbitan sesquioleate, homogenol (product name of Kao Corporation), alkyl allyl phosphate, or the like may be added as a dispersant. When a dispersant is added, printability is improved.
- the second dielectric layer paste is printed on the first dielectric layer 81 by a screen printing method or a die coating method.
- the printed second dielectric layer paste is dried and baked at 550 ° C. to 590 ° C., which is slightly higher than the softening point of the dielectric material, to form the second dielectric layer 82.
- the film thickness of the dielectric layer 8 is preferably 41 ⁇ m or less in combination with the first dielectric layer 81 and the second dielectric layer 82 in order to ensure visible light transmittance.
- the second dielectric layer 82 is less likely to be colored when the Bi 2 O 3 content is less than 11% by weight, but bubbles are likely to be generated in the second dielectric layer 82. Therefore, it is not preferable that the content of Bi 2 O 3 is less than 11% by weight. On the other hand, when the content of Bi 2 O 3 exceeds 40% by weight, coloring tends to occur, and thus the visible light transmittance is lowered. Therefore, it is not preferable that the content of Bi 2 O 3 exceeds 40% by weight.
- the thickness of the dielectric layer 8 is set to 41 ⁇ m or less, the first dielectric layer 81 is set to 5 ⁇ m to 15 ⁇ m, and the second dielectric layer 82 is set to 20 ⁇ m to 36 ⁇ m.
- the coloring phenomenon (yellowing) of the front glass substrate 3 and the generation of bubbles in the dielectric layer 8 are suppressed even when an Ag material is used for the display electrode 6. It has been confirmed that the dielectric layer 8 having excellent withstand voltage performance is realized.
- the reason why yellowing and bubble generation are suppressed in the first dielectric layer 81 by these dielectric materials will be considered. That is, by adding MoO 3 or WO 3, the dielectric glass containing Bi 2 O 3, Ag 2 MoO 4, Ag 2 Mo 2 O 7, Ag 2 Mo 4 O 13, Ag 2 WO 4, Ag 2 It is known that compounds such as W 2 O 7 and Ag 2 W 4 O 13 are easily generated at a low temperature of 580 ° C. or lower. In the present embodiment, since the firing temperature of the dielectric layer 8 is 550 ° C. to 590 ° C., the silver ions (Ag + ) diffused into the dielectric layer 8 during firing are the MoO 3 in the dielectric layer 8.
- the content of MoO 3 , WO 3 , CeO 2 , and MnO 2 in the dielectric glass containing Bi 2 O 3 is preferably 0.1% by weight or more.
- 0.1 wt% or more and 7 wt% or less is more preferable.
- the amount is less than 0.1% by weight, the effect of suppressing yellowing is small.
- the dielectric layer 8 of the PDP 1 in the present embodiment suppresses the yellowing phenomenon and the generation of bubbles in the first dielectric layer 81 in contact with the bus electrodes 4b and 5b made of Ag material.
- a high light transmittance is realized by the second dielectric layer 82 provided in FIG. As a result, it is possible to realize a PDP having a high transmittance with very few bubbles and yellowing as the entire dielectric layer 8.
- the protective layer 9 includes a base layer 91 and aggregated particles 92.
- the underlayer 91 includes at least a first metal oxide and a second metal oxide.
- the first metal oxide and the second metal oxide are two kinds selected from the group consisting of MgO, CaO, SrO and BaO.
- the underlayer 91 has at least one peak in the X-ray diffraction analysis. This peak is between the first peak in the X-ray diffraction analysis of the first metal oxide and the second peak in the X-ray diffraction analysis of the second metal oxide.
- the first peak and the second peak have the same plane orientation as the plane orientation indicated by the peak of the underlayer 91.
- FIG. 3 shows an X-ray diffraction result on the surface of the base layer 91 constituting the protective layer 9 of the PDP 1 in the present embodiment.
- FIG. 4 also shows the results of X-ray diffraction analysis of MgO alone, CaO alone, SrO alone, and BaO alone.
- the horizontal axis represents the Bragg diffraction angle (2 ⁇ )
- the vertical axis represents the intensity of the X-ray diffraction wave.
- the unit of the diffraction angle is indicated by a degree that makes one round 360 degrees, and the intensity is indicated by an arbitrary unit.
- the crystal orientation plane which is the specific orientation plane is shown in parentheses.
- CaO alone has a peak at a diffraction angle of 32.2 degrees.
- MgO alone has a peak at a diffraction angle of 36.9 degrees.
- SrO alone has a peak at a diffraction angle of 30.0 degrees.
- the peak of BaO alone has a peak at a diffraction angle of 27.9 degrees.
- the base layer 91 of the protective layer 9 includes at least two or more metal oxides selected from the group consisting of MgO, CaO, SrO, and BaO.
- FIG. 7 shows the X-ray diffraction results when the single component constituting the base layer 91 is two components.
- Point A is the result of X-ray diffraction of the base layer 91 formed using MgO and CaO alone as a single component.
- Point B is the result of X-ray diffraction of the base layer 91 formed using MgO and SrO alone as a single component.
- Point C is an X-ray diffraction result of the base layer 91 formed using MgO and BaO alone as simple components.
- point A has a peak at a diffraction angle of 36.1 degrees in the (111) plane orientation.
- MgO alone serving as the first metal oxide has a peak at a diffraction angle of 36.9 degrees.
- CaO alone as the second metal oxide has a peak at a diffraction angle of 32.2 degrees. That is, the peak at point A exists between the peak of MgO simple substance and the peak of CaO simple substance.
- the peak at point B has a diffraction angle of 35.7 degrees, and exists between the peak of MgO simple substance serving as the first metal oxide and the peak of SrO simple substance serving as the second metal oxide.
- the peak at point C also has a diffraction angle of 35.4 degrees, and exists between the peak of single MgO serving as the first metal oxide and the peak of single BaO serving as the second metal oxide.
- FIG. 4 shows the X-ray diffraction results when the single component constituting the base layer 91 is three or more components.
- Point D is an X-ray diffraction result of the base layer 91 formed using MgO, CaO, and SrO as a single component.
- Point E is an X-ray diffraction result of the base layer 91 formed using MgO, CaO, and BaO as a single component.
- Point F is an X-ray diffraction result of the base layer 91 formed using CaO, SrO, and BaO as a single component.
- point D has a peak at a diffraction angle of 33.4 degrees in the (111) plane orientation.
- MgO alone serving as the first metal oxide has a peak at a diffraction angle of 36.9 degrees.
- SrO simple substance serving as the second metal oxide has a peak at a diffraction angle of 30.0 degrees. That is, the peak at point A exists between the peak of MgO simple substance and the peak of CaO simple substance.
- the peak at the point E has a diffraction angle of 32.8 degrees, and exists between the peak of the MgO simple substance serving as the first metal oxide and the peak of the BaO simple substance serving as the second metal oxide.
- the peak at point F also has a diffraction angle of 30.2 degrees, and exists between the peak of single MgO serving as the first metal oxide and the peak of single BaO serving as the second metal oxide.
- the base layer 91 of the PDP 1 in the embodiment includes at least the first metal oxide and the second metal oxide. Furthermore, the underlayer 91 has at least one peak in the X-ray diffraction analysis. This peak is between the first peak in the X-ray diffraction analysis of the first metal oxide and the second peak in the X-ray diffraction analysis of the second metal oxide. The first peak and the second peak have the same plane orientation as the plane orientation indicated by the peak of the underlayer 91.
- the first metal oxide and the second metal oxide are two kinds selected from the group consisting of MgO, CaO, SrO and BaO.
- (111) is described as the crystal plane orientation plane, but the peak position of the metal oxide is the same as described above even when other plane orientations are targeted.
- the depth from the vacuum level of CaO, SrO and BaO exists in a shallow region as compared with MgO. Therefore, when driving the PDP 1, when electrons existing in the energy levels of CaO, SrO, and BaO transition to the ground state of the Xe ions, the number of electrons emitted by the Auger effect is less than the energy level of MgO. It is thought that it will increase compared to the case of transition.
- the peak of the base layer 91 in the present embodiment is between the peak of the first metal oxide and the peak of the second metal oxide. That is, it is considered that the energy level of the base layer 91 exists between single metal oxides, and the number of electrons emitted by the Auger effect is larger than that in the case of transition from the energy level of MgO.
- the base layer 91 can exhibit better secondary electron emission characteristics as compared with MgO alone, and as a result, the discharge sustaining voltage can be reduced. Therefore, particularly when the Xe partial pressure as the discharge gas is increased in order to increase the luminance, it becomes possible to reduce the discharge voltage and realize a low-voltage and high-luminance PDP1.
- the partial pressure of Xe of the discharge gas is increased from 10% to 15%, the luminance increases by about 30%, but in the comparative example in which the base layer 91 is made of MgO alone, the discharge sustaining voltage increases by about 10%. .
- the discharge sustaining voltage can be reduced by about 10% to 20% compared to the comparative example. Therefore, the discharge start voltage can be set within the normal operation range, and a high-luminance and low-voltage drive PDP can be realized.
- CaO, SrO, and BaO have a problem that since the single substance has high reactivity, it easily reacts with impurities, and the electron emission performance is lowered.
- the structure of these metal oxides reduces the reactivity and forms a crystal structure with few impurities and oxygen vacancies. Therefore, excessive emission of electrons during driving of the PDP is suppressed, and in addition to the effect of achieving both low voltage driving and secondary electron emission performance, the effect of moderate electron retention characteristics is also exhibited.
- This charge retention characteristic is particularly effective for retaining wall charges stored in the initialization period and preventing a write failure in the write period and performing a reliable write discharge.
- Table 1 shows the results of the discharge sustaining voltage when a 450 Torr mixed gas (Xe, 15%) of xenon (Xe) and neon (Ne) is sealed in the PDP in the present embodiment.
- the discharge sustaining voltage in Table 1 is expressed as a relative value when the comparative example is 100.
- the underlayer 91 is composed of a metal oxide made of magnesium oxide (MgO) and calcium oxide (CaO).
- the underlayer 91 is composed of a metal oxide made of magnesium oxide (MgO) and strontium oxide (SrO).
- the underlayer 91 is composed of a metal oxide made of magnesium oxide (MgO) and barium oxide (BaO).
- the underlayer 91 is composed of a metal oxide composed of magnesium oxide (MgO), calcium oxide (CaO), and strontium oxide (SrO).
- the underlayer 91 is composed of a metal oxide made of magnesium oxide (MgO), calcium oxide (CaO), and barium oxide (BaO).
- the underlayer 91 is composed only of magnesium oxide (MgO).
- the partial pressure of the discharge gas xenon (Xe) is increased from 10% to 15%, the luminance increases by about 30%.
- the underlayer 91 is made of only magnesium oxide (MgO), the sustaining voltage increases by about 10%.
- the discharge sustaining voltage can be reduced by about 10% or more and 20% or less compared to the sample (Comparative Example). Therefore, the discharge start voltage can be set within the normal operation range, and a high-luminance and low-voltage drive PDP can be realized.
- Table 2 shows the results of the discharge sustaining voltage and the in-plane uniformity when the ratio of magnesium oxide (MgO) and calcium oxide (CaO) is changed for sample A.
- the unit (atomic%) shown in Table 2 is based on the sum of the number of magnesium (Mg) atoms of magnesium oxide (MgO) and the number of calcium (Ca) atoms of calcium oxide (CaO) included in the base layer 91. The ratio of the number of calcium (Ca) atoms is shown.
- each discharge sustain voltage measured the discharge sustain voltage (V) of 9 points
- the average value of the discharge sustain voltage is 5% or less of the discharge sustain voltage of the panel made only of magnesium oxide (MgO), x is less than 10%, and if it is 10% or more. ⁇ .
- in-plane uniformity is ⁇ if the difference between the minimum value and the maximum value of the discharge sustain voltage at 9 points in the plane of the 42-inch panel is 100% or less with respect to the voltage difference of the MgO-only panel, and ⁇ , 150% or more, x.
- the discharge sustaining voltage can be reduced without deteriorating the in-plane uniformity by setting the calcium (Ca) concentration to more than 1 atomic% and not more than 5 atomic%.
- the base layer 91 in the present embodiment is made of a metal oxide selected from magnesium oxide, calcium oxide, strontium oxide, and barium oxide. Therefore, the reactivity with impurities is reduced, and the crystal structure is less contaminated with impurities and less oxygen deficient.
- This charge retention performance is particularly effective for retaining wall charges stored during the initialization period and preventing write defects during the write period to perform reliable write discharge.
- the aggregated particles 92 are obtained by aggregating a plurality of crystal particles 92b having a particle diameter smaller than that of the crystal particles 92a on the MgO crystal particles 92a.
- the shape can be confirmed by a scanning electron microscope (SEM).
- SEM scanning electron microscope
- a plurality of aggregated particles 92 are dispersedly arranged over the entire surface of the underlayer 91.
- the crystal particles 92a are particles having an average particle diameter in the range of 0.9 ⁇ m to 2 ⁇ m.
- the crystal particles 92b are particles having an average particle diameter in the range of 0.3 ⁇ m to 0.9 ⁇ m.
- the average particle diameter is a volume cumulative average diameter (D50).
- a laser diffraction particle size distribution measuring device MT-3300 manufactured by Nikkiso Co., Ltd. was used for measuring the average particle size.
- the agglomerated particles 92 are those in which a plurality of crystal particles 92a and 92b having a predetermined primary particle size are aggregated. Aggregated particles 92 are not bonded as a solid by a strong bonding force. The agglomerated particles 92 are a collection of a plurality of primary particles due to static electricity, van der Waals force, or the like. In addition, the aggregated particles 92 are bonded with a force such that part or all of the aggregated particles 92 are decomposed into primary particles by an external force such as ultrasonic waves.
- the particle diameter of the agglomerated particles 92 is about 1 ⁇ m, and the crystal particles 92a and 92b have a polyhedral shape having seven or more faces such as a tetrahedron and a dodecahedron.
- the crystal particles 92a and 92b were produced by a liquid phase method in which a crystal solution of MgO precursor such as magnesium carbonate or magnesium hydroxide was baked.
- the particle size can be controlled by adjusting the firing temperature and firing atmosphere by the liquid phase method.
- the firing temperature can be selected in the range of about 700 ° C. to 1500 ° C. When the firing temperature is 1000 ° C. or higher, the primary particle size can be controlled to about 0.3 to 2 ⁇ m.
- the crystal particles 92a and 92b are obtained in the form of aggregated particles 92 in which a plurality of primary particles are aggregated in the production process by the liquid phase method.
- the MgO aggregated particles 92 have been confirmed by the inventor's experiments mainly to suppress the discharge delay in the write discharge and to improve the temperature dependence of the discharge delay. Therefore, in the present embodiment, the aggregated particles 92 are arranged as an initial electron supply unit required at the time of rising of the discharge pulse by utilizing the property that the advanced initial electron emission characteristics are superior to those of the base layer 91.
- the discharge delay is mainly caused by a shortage of the amount of initial electrons that are triggered from the surface of the underlayer 91 being discharged into the discharge space 16 at the start of discharge.
- MgO aggregated particles 92 are dispersedly arranged on the surface of the underlayer 91.
- abundant electrons are present in the discharge space 16 at the rise of the discharge pulse, and the discharge delay can be eliminated. Therefore, such initial electron emission characteristics enable high-speed driving with good discharge response even when the PDP 1 has a high definition.
- the metal oxide aggregated particles 92 are disposed on the surface of the underlayer 91, in addition to the effect of mainly suppressing the discharge delay in the write discharge, the effect of improving the temperature dependence of the discharge delay is also obtained.
- the PDP 1 as a whole is constituted by the base layer 91 that exhibits both low-voltage driving and charge retention effects and the MgO aggregated particles 92 that exhibit the effect of preventing discharge delay.
- the base layer 91 that exhibits both low-voltage driving and charge retention effects
- the MgO aggregated particles 92 that exhibit the effect of preventing discharge delay.
- FIG. 6 is a diagram showing the relationship between the discharge delay and the calcium (Ca) concentration in the protective layer 9 when the base layer 91 composed of MgO and CaO is used in the PDP 1 in the present embodiment.
- the underlayer 91 is composed of MgO and CaO, and the underlayer 91 is configured such that a peak exists between the diffraction angle at which the MgO peak occurs and the diffraction angle at which the CaO peak occurs in the X-ray diffraction analysis. ing.
- FIG. 6 shows the case where only the underlayer 91 is used as the protective layer 9 and the case where the aggregated particles 92 are arranged on the underlayer 91, and the discharge delay does not contain Ca in the underlayer 91.
- the case is shown as a reference.
- the discharge delay increases as the Ca concentration increases in the case of the base layer 91 alone.
- the discharge delay can be significantly reduced, and the discharge delay hardly increases even when the Ca concentration increases.
- the prototype 1 is a PDP 1 in which only the protective layer 9 made of MgO is formed.
- the prototype 2 is a PDP 1 in which a protective layer 9 made of MgO doped with impurities such as Al and Si is formed.
- the prototype 3 is a PDP 1 in which only the primary particles of the crystal particles 92a made of MgO are dispersed and adhered onto the protective layer 9 made of MgO.
- prototype 4 is PDP 1 in the embodiment.
- the prototype 4 is a PDP 1 in which aggregated particles 92 obtained by aggregating MgO crystal particles 92 a having the same particle diameter are attached on an underlayer 91 made of MgO so as to be distributed over the entire surface.
- the protective layer 9 the sample A described above is used. That is, the protective layer 9 has a ground layer 91 composed of MgO and CaO, and agglomerated particles 92 obtained by aggregating crystal particles 92a on the ground layer 91 so as to be distributed almost uniformly over the entire surface. .
- the base layer 91 has a peak between the peak of the first metal oxide and the peak of the second metal oxide constituting the base layer 91 in the X-ray diffraction analysis of the surface of the base layer 91. That is, the first metal oxide is MgO, and the second metal oxide is CaO.
- the diffraction angle of the MgO peak is 36.9 degrees
- the diffraction angle of the CaO peak is 32.2 degrees
- the diffraction angle of the peak of the underlayer 91 is 36.1 degrees. .
- Electron emission performance and charge retention performance were measured for PDP 1 having these four types of protective layer configurations.
- the electron emission performance is a numerical value indicating that the larger the electron emission performance, the larger the amount of electron emission.
- the electron emission performance is expressed as the initial electron emission amount determined by the surface state of the discharge, the gas type and the state.
- the initial electron emission amount can be measured by a method of measuring the amount of electron current emitted from the surface by irradiating the surface with ions or an electron beam.
- a numerical value called a statistical delay time which is a measure of the likelihood of occurrence of discharge, was measured.
- a numerical value linearly corresponding to the initial electron emission amount is obtained.
- the delay time at the time of discharge is the time from the rise of the address discharge pulse until the address discharge is delayed. It is considered that the discharge delay is mainly caused by the fact that initial electrons that become a trigger when the address discharge is generated are not easily released from the surface of the protective layer into the discharge space.
- a voltage value of a voltage (hereinafter referred to as a Vscn lighting voltage) applied to the scan electrode necessary for suppressing the charge emission phenomenon when the PDP 1 is manufactured was used. That is, a lower Vscn lighting voltage indicates a higher charge retention capability.
- the Vscn lighting voltage is low, the PDP can be driven at a low voltage. Therefore, it is possible to use components having a low withstand voltage and a small capacity as the power source and each electrical component.
- an element having a withstand voltage of about 150 V is used as a semiconductor switching element such as a MOSFET for sequentially applying a scanning voltage to a panel.
- the Vscn lighting voltage is preferably suppressed to 120 V or less in consideration of variation due to temperature.
- the electron emission performance is a numerical value indicating that the larger the electron emission amount, the greater the amount of electron emission.
- the initial electron emission amount can be measured by a method of measuring the amount of electron current emitted from the surface by irradiating the surface with ions or an electron beam.
- the evaluation of the surface of the front plate 2 of the PDP 1 can be performed nondestructively. With difficulty. Therefore, the method described in JP 2007-48733 A was used.
- a numerical value called a statistical delay time which is a measure of the likelihood of occurrence of discharge, is measured, and when the reciprocal is integrated, a numerical value corresponding to the initial electron emission amount is obtained.
- the delay time at the time of discharge means the time of discharge delay when the discharge is delayed from the rising edge of the pulse, and the discharge delay is the time when the initial electrons that trigger when the discharge is started are discharged from the surface of the protective layer 9 to the discharge space. It is considered as a main factor that it is difficult to be released into the inside.
- a voltage value of a voltage (hereinafter referred to as a Vscn lighting voltage) applied to the scan electrode necessary for suppressing the charge emission phenomenon when the PDP 1 was manufactured was used as an index. That is, a lower Vscn lighting voltage indicates a higher charge retention capability.
- a voltage value of a voltage hereinafter referred to as a Vscn lighting voltage
- an element having a withstand voltage of about 150 V is used as a semiconductor switching element such as a MOSFET for sequentially applying a scanning voltage to the panel, and the Vscn lighting voltage is 120 V or less in consideration of variation due to temperature. It is desirable to keep it at a minimum.
- the prototype 4 can make the Vscn lighting voltage 120 V or less in the evaluation of the charge retention performance, and also has an electron emission performance compared to the prototype 1 in the case of the protective layer only of MgO. The remarkably good characteristics were obtained.
- the electron emission ability and the charge retention ability of the protective layer of the PDP are contradictory.
- the Vscn lighting voltage also increases.
- the PDP having the protective layer 9 of the present embodiment it is possible to obtain an electron emission capability having characteristics of 8 or more and a charge holding capability of Vscn lighting voltage of 120 V or less. That is, it is possible to obtain the protective layer 9 having both the electron emission capability and the charge retention capability that can cope with the PDP that tends to increase the number of scanning lines and reduce the cell size due to high definition.
- the particle diameter means an average particle diameter
- the average particle diameter means a volume cumulative average diameter (D50).
- FIG. 8 shows the experimental results of examining the electron emission performance by changing the average particle diameter of the MgO aggregated particles 92 in the protective layer 9.
- the average particle diameter of the aggregated particles 92 was measured by observing the aggregated particles 92 with SEM.
- the number of crystal particles per unit area on the protective layer 9 is large. According to the experiments by the present inventors, if the crystal particles 92a and 92b are present in the portion corresponding to the top of the partition 14 that is in close contact with the protective layer 9, the top of the partition 14 may be damaged. In this case, it has been found that a phenomenon in which the corresponding cell does not normally turn on or off due to, for example, the damaged material of the partition wall 14 getting on the phosphor. The phenomenon of partition wall breakage is unlikely to occur unless the crystal particles 92a and 92b are present at the portion corresponding to the top of the partition wall.
- the probability of breakage of the partition wall 14 increases. From this point of view, when the crystal particle diameter is increased to about 2.5 ⁇ m, the probability of partition wall breakage increases rapidly, and when the crystal particle diameter is smaller than 2.5 ⁇ m, the probability of partition wall breakage is kept relatively small. be able to.
- the PDP 1 having the protective layer 9 according to the present embodiment it is possible to obtain an electron emission ability having characteristics of 8 or more and a charge holding ability of Vscn lighting voltage of 120 V or less.
- MgO particles as crystal particles.
- other single crystal particles are also made of metal oxides such as Sr, Ca, Ba, and Al, which have high electron emission performance like MgO. Since the same effect can be obtained even if crystal particles are used, the particle type is not limited to MgO.
- impurities are formed by vacuum vapor deposition using a sintered material of MgO containing Al as a raw material.
- a base layer 91 made of MgO containing Al is formed on the dielectric layer 8.
- a plurality of agglomerated particles 92 are dispersed and adhered on the unfired underlayer 91. That is, the aggregated particles 92 are dispersedly arranged over the entire surface of the base layer 91.
- an aggregated particle paste in which polyhedral crystal particles 92a and 92b having a predetermined particle size distribution are mixed in a solvent is prepared.
- the agglomerated particle paste application step A3 the agglomerated particle paste is applied onto the underlayer 91, thereby forming an agglomerated particle paste film having an average film thickness of 8 ⁇ m to 20 ⁇ m.
- a screen printing method, a spray method, a spin coating method, a die coating method, a slit coating method, or the like can also be used.
- the solvent used for the production of the agglomerated particle paste has a high affinity with the MgO underlayer 91 and the agglomerated particles 92, and is easy to evaporate and remove in the subsequent drying step A4.
- a vapor pressure of about several tens of Pa is suitable.
- an organic solvent alone such as methylmethoxybutanol, terpineol, propylene glycol, benzyl alcohol or a mixed solvent thereof is used.
- the viscosity of the paste containing these solvents is several mPa ⁇ s to several tens mPa ⁇ s.
- the substrate on which the aggregated particle paste has been applied is immediately transferred to the drying step A4.
- the aggregated particle paste film is dried under reduced pressure. Specifically, the agglomerated particle paste film is rapidly dried within several tens of seconds in a vacuum chamber. Therefore, convection in the film, which is remarkable in heat drying, does not occur. Therefore, the agglomerated particles 92 adhere more uniformly on the base layer 91.
- the protective layer baking step A5 the unfired underlayer 91 formed in the underlayer deposition step A2 and the aggregated particle paste film that has undergone the drying step A4 are simultaneously fired at a temperature of several hundred degrees Celsius.
- the solvent and the resin component remaining in the aggregated particle paste film are removed.
- the protective layer 9 to which the aggregated particles 92 composed of a plurality of polyhedral crystal particles 92a and 92b are attached is formed on the base layer 91.
- a method of spraying a particle group directly with a gas or the like without using a solvent, or a method of simply spraying using gravity may be used.
- MgO is taken as an example of the protective layer 9, but the performance required for the base layer 91 is to have high sputtering resistance for protecting the dielectric layer 8 from ion bombardment. High charge retention capability, that is, electron emission performance may not be so high.
- a protective layer mainly composed of MgO has been formed in many cases. Since the composition is controlled predominantly by the single crystal grains, there is no need for MgO, and other materials having excellent impact resistance such as Al 2 O 3 may be used.
- MgO particles as single crystal particles, but other single crystal particles also oxidize metals such as Sr, Ca, Ba, and Al, which have high electron emission performance like MgO. The same effect can be obtained even when crystal grains made of a material are used. Therefore, the particle type is not limited to MgO.
- the present invention is useful for realizing a PDP having high-definition and high-luminance display performance and low power consumption.
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Abstract
Description
酸化マグネシウム(MgO)と酸化カルシウム(CaO)による金属酸化物によって下地層91が構成されている。
酸化マグネシウム(MgO)と酸化ストロンチウム(SrO)による金属酸化物によって下地層91が構成されている。
酸化マグネシウム(MgO)と酸化バリウム(BaO)による金属酸化物によって下地層91が構成されている。
酸化マグネシウム(MgO)、酸化カルシウム(CaO)及び酸化ストロンチウム(SrO)による金属酸化物によって下地層91が構成されている。
酸化マグネシウム(MgO)、酸化カルシウム(CaO)及び酸化バリウム(BaO)による金属酸化物によって下地層91が構成されている。
酸化マグネシウム(MgO)だけによって下地層91が構成されている。
2 前面板
3 前面ガラス基板
4 走査電極
4a,5a 透明電極
4b,5b バス電極
5 維持電極
6 表示電極
7 ブラックストライプ
8 誘電体層
9 保護層
10 背面板
11 背面ガラス基板
12 データ電極
13 下地誘電体層
14 隔壁
15 蛍光体層
16 放電空間
17 蛍光体粒子
18 白金族粒子
19 蛍光体ペースト
81 第1誘電体層
82 第2誘電体層
91 下地層
92 凝集粒子
92a,92b 結晶粒子
Claims (2)
- 前面板と、
前記前面板と対向配置された背面板と、を備え、
前記前面板は、誘電体層と前記誘電体層を覆う保護層とを有し、
前記背面板は、下地誘電体層と、前記下地誘電体層上に形成された複数の隔壁と、前記下地誘電体層上および前記隔壁の側面に形成された蛍光体層と、を有し、
前記保護層は、前記誘電体層上に形成された下地層を含み、
前記下地層には、酸化マグネシウムの結晶粒子が複数個凝集した凝集粒子が全面に亘って分散配置され、
前記下地層は、少なくとも第1の金属酸化物と第2の金属酸化物とを含み、
さらに、前記下地層は、X線回折分析において少なくとも一つのピークを有し、
前記ピークは、第1金属酸化物のX線回折分析における第1のピークと、第2金属酸化物のX線回折分析における第2のピークと、の間にあり、
前記第1のピークおよび前記第2のピークは、前記ピークが示す面方位と同じ面方位を示し、
前記第1の金属酸化物および前記第2の金属酸化物は、酸化マグネシウム、酸化カルシウム、酸化ストロンチウムおよび酸化バリウムからなる群の中から選ばれる2種であり、
前記下地層に含まれるカルシウムの濃度が前記下地層に対して1atomic%以上5atomic%以下であり、
さらに、前記金属酸化物は前記下地層面のX線回折分析において、特定方位面(111)面の前記金属酸化物の単体より発生する最小回折角と最大回折角との間に1本のピークが存在する、
プラズマディスプレイパネル。 - 前記下地層は、
酸化マグネシウムと酸化カルシウムとの金属酸化物から形成され、
前記下地層に含まれるカルシウムの濃度が前記下地層に対して1atomic%以上5atomic%以下である
請求項1に記載のプラズマディスプレイパネル。
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US13/202,896 US20120326598A1 (en) | 2010-03-15 | 2011-03-15 | Plasma display panel |
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Citations (6)
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JP2007096126A (ja) * | 2005-09-29 | 2007-04-12 | Sharp Corp | トランジスタおよび電子デバイス |
JP2007311075A (ja) * | 2006-05-16 | 2007-11-29 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル |
JP2008112745A (ja) * | 2006-04-28 | 2008-05-15 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネルとその製造方法 |
JP2009129616A (ja) * | 2007-11-21 | 2009-06-11 | Panasonic Corp | プラズマディスプレイパネル |
JP2009259422A (ja) * | 2008-04-11 | 2009-11-05 | Hitachi Ltd | プラズマディスプレイパネルおよびその製造方法 |
JP2009259462A (ja) * | 2008-04-14 | 2009-11-05 | Panasonic Corp | プラズマディスプレイパネル |
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JP2007096126A (ja) * | 2005-09-29 | 2007-04-12 | Sharp Corp | トランジスタおよび電子デバイス |
JP2008112745A (ja) * | 2006-04-28 | 2008-05-15 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネルとその製造方法 |
JP2007311075A (ja) * | 2006-05-16 | 2007-11-29 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル |
JP2009129616A (ja) * | 2007-11-21 | 2009-06-11 | Panasonic Corp | プラズマディスプレイパネル |
JP2009259422A (ja) * | 2008-04-11 | 2009-11-05 | Hitachi Ltd | プラズマディスプレイパネルおよびその製造方法 |
JP2009259462A (ja) * | 2008-04-14 | 2009-11-05 | Panasonic Corp | プラズマディスプレイパネル |
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