WO2011096151A1 - Miroir à film, procédé de production de celui-ci et miroir de recueil de lumière solaire - Google Patents

Miroir à film, procédé de production de celui-ci et miroir de recueil de lumière solaire Download PDF

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Publication number
WO2011096151A1
WO2011096151A1 PCT/JP2010/073496 JP2010073496W WO2011096151A1 WO 2011096151 A1 WO2011096151 A1 WO 2011096151A1 JP 2010073496 W JP2010073496 W JP 2010073496W WO 2011096151 A1 WO2011096151 A1 WO 2011096151A1
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layer
film
film mirror
mirror
metal
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PCT/JP2010/073496
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English (en)
Japanese (ja)
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美佳 本田
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コニカミノルタオプト株式会社
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Priority to JP2011552672A priority Critical patent/JPWO2011096151A1/ja
Publication of WO2011096151A1 publication Critical patent/WO2011096151A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S23/00—Arrangements for concentrating solar-rays for solar heat collectors
    • F24S23/70—Arrangements for concentrating solar-rays for solar heat collectors with reflectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
    • H01L31/056—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means the light-reflecting means being of the back surface reflector [BSR] type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/416—Reflective
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/71—Resistive to light or to UV
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/712—Weather resistant
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/724—Permeability to gases, adsorption
    • B32B2307/7242—Non-permeable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/732—Dimensional properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/752—Corrosion inhibitor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2551/00—Optical elements
    • B32B2551/08—Mirrors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/40—Solar thermal energy, e.g. solar towers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/52—PV systems with concentrators

Definitions

  • the present invention relates to a film mirror, and more particularly to a film mirror for collecting sunlight.
  • biomass energy, nuclear energy, and natural energy such as wind energy and solar energy have been studied as alternative energy to replace fossil fuel energy such as coal energy, oil, and natural gas.
  • fossil fuel energy such as coal energy, oil, and natural gas.
  • the most stable and large amount of natural energy is considered to be solar energy.
  • a glass mirror Since the reflecting device is exposed to sunlight, ultraviolet rays, heat, wind and rain, sandstorms, etc., a glass mirror has been conventionally used. Glass mirrors are highly durable against the environment, but they have the problem of impact properties such as breakage during transportation, and the strength of the frame on which the heavy mirrors are installed increases the construction cost of the plant.
  • Patent Documents 1 and 2 a film mirror in which the reflective layer is made of silver and the surface sealing layer made of glass is replaced with a polymer film made of resin has been proposed (see, for example, Patent Documents 1 and 2). It was.
  • the polymer film is known to be deteriorated by sunlight, particularly ultraviolet rays having a wavelength of 380 nm or less.
  • the polymer films described in Patent Document 1 and Patent Document 2 are blended with an ultraviolet absorber.
  • the irradiation spectrum of sunlight is observed from 2500 nm.
  • the thermoelectric power generation efficiency is lowered, which is not preferable.
  • this polymer film is more permeable to gases such as oxygen and water vapor than glass, and in an environment exposed to rain and dew, it penetrates into the metal reflective layer over time.
  • the gas diffusion coefficient D is different for each polymer film, the diffusion time is proportional to the thickness of the polymer film, and the thicker the film, the slower the gas permeation that degrades the metal reflective layer, so the service life is become longer.
  • the thickness of the polymer film is increased, the above-described absorption cross-sectional area in the infrared region is increased, so that the thermoelectric generation efficiency is lowered. Improving durability and maintaining thermoelectric efficiency was a trade-off.
  • an injection-molded plastic mirror has been developed in which a metal reflective layer is coated with a metal oxide on the surface of a resin substrate (see, for example, Patent Document 3).
  • This injection-molded plastic mirror had a high reflectance of 90% or more on average from the ultraviolet region to the infrared region. Therefore, in order to correspond to a large-area mirror, in Patent Document 2, a film mirror having a structure in which a silver mirror is formed on the surface of a polymer film and the surface is covered with a metal oxide is manufactured.
  • the metal oxide cracks when the film is bent.
  • Patent Document 3 has no problem with an injection-molded plastic mirror, but cannot be applied to a roll-to-roll system for producing a large-area film. It turns out that oxygen and water vapor enter from the generated crack, and the metal reflective film is corroded. It was found that the metal oxide coated film mirror once cracked was not durable.
  • An object of the present invention is to provide a film mirror capable of improving durability and maintaining thermoelectric generation efficiency for a long period of time, and further providing a film mirror for collecting sunlight using the film mirror.
  • a film mirror in which a polymer film layer, a gas barrier layer having a metal oxide, and a metal reflection layer are arranged in this order from the sunlight incident side, the thickness of the gas barrier layer with respect to the polymer film layer
  • metal oxide of the gas barrier layer is at least one selected from silicon oxide, aluminum oxide, and a mixture of two types of silicon oxide and aluminum oxide.
  • thioether thiol
  • Ni organic compound Ni organic compound
  • benzotriazole imidazole
  • oxazole tetrazaindene
  • pyrimidine thiadiazole 8
  • a solar light collecting mirror wherein the film mirror according to 10 is formed on a support through an adhesive layer of the film mirror.
  • the present invention it is possible to prevent a decrease in regular reflectance due to deterioration of the metal reflective layer, and to be light and flexible, lightweight and flexible, and can be manufactured in a large area and mass-produced with reduced manufacturing costs.
  • the film mirror which is excellent and has a good regular reflectance with respect to sunlight, its manufacturing method, and the film mirror for sunlight condensing using the same were able to be provided.
  • the gas barrier layer having a polymer film layer and a metal oxide so as to cover the reflective layer of metal, the gas barrier property can be imparted, the service life can be extended, and the replacement cost can be reduced. it can.
  • the absorption in the infrared region can be reduced, and the thermoelectric generation efficiency can be improved.
  • the present invention improves the impact resistance by coating a metal oxide film with a high molecular weight polymer instead of forming a metal oxide film on the high molecular weight polymer.
  • Molecular polymers are thinned in a direction that reduces absorption in the infrared region. As the polymer film is made thinner, a metal oxide film with a gas barrier function is attached to improve durability and maintain thermoelectric generation efficiency.
  • a film mirror in which a metal reflective layer was disposed and the thickness ratio of b) to a) was in the range of 0.1% to 5%.
  • FIG. 3 is a cross-sectional view showing an example of a film mirror having a function of reflecting sunlight according to the present invention.
  • the film mirror F has a polymer film layer 1, a gas barrier layer 2 having a metal oxide, a metal reflection layer (Ag layer) 3, and an adhesive layer 4 laminated in order from the sunlight side.
  • a release film 5 can be attached to the lower surface of the adhesive layer 4 and the release film 5 can be appropriately peeled off when desired to adhere to a metal plate or resin plate as a support.
  • the film mirror of the present invention is not limited to the configuration shown in FIG. 3, and it is preferable to add various functional layers. Moreover, even if it is the said structure, functionality can be provided to each layer.
  • embodiments of the present invention to which a functional layer is added will be described. Further, the present invention is not limited only to these embodiments.
  • the upper side means the side on which sunlight is incident
  • the lower side means the opposite side.
  • an ultraviolet absorber is added to the polymer film layer 1 so that the gas barrier layer 2 below functions as a water vapor barrier layer, and the reflective layer 3 therebelow is composed of a silver vapor deposition layer.
  • stacked the adhesion layer 4 and the peeling film 5 below be the film mirror 1 of this invention.
  • the durability increases by adding an ultraviolet absorber to the polymer film layer.
  • a film mirror provided with a corrosion inhibitor layer (a polymer layer containing a corrosion inhibitor) between the reflective layer 3 and the adhesive layer 4 is referred to as a film mirror 2 of the present invention.
  • a corrosion inhibitor layer a polymer layer containing a corrosion inhibitor
  • the film mirror 1 an adhesive layer and a corrosion inhibitor layer are laminated in order from the side where sunlight enters between the gas barrier layer 2 and the reflective layer 3, and further, a high layer is formed between the reflective layer 3 and the adhesive layer 4.
  • the film mirror which provided the molecular film layer be the film mirror 3 of this invention.
  • the film mirror 2 instead of the polymer film layer 1 to which the ultraviolet absorber is added, a film mirror in which a hard coat layer and a polymer film layer are laminated in order from the sunlight incident side is used as the film mirror of the present invention.
  • the hard coat layer preferably contains an ultraviolet absorber or the like.
  • a film mirror in which an ultraviolet reflecting layer is provided on a polymer film layer instead of a hard coat layer is referred to as a film mirror 5 of the present invention.
  • a film mirror provided with a sacrificial anticorrosive layer instead of the corrosion inhibitor layer is referred to as a film mirror 6 of the present invention.
  • the film material of the polymer film layer preferably contains, for example, polyester, polyethylene terephthalate, polyethylene naphthalate, acrylic, polycarbonate, polyolefin, cellulose, or polyamide from the viewpoint of flexibility and weight reduction.
  • an acrylic copolymer excellent in weather resistance and particularly copolymerized with at least two kinds of acrylic monomers is preferable.
  • acrylic copolymers include methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, 2-hydroxyethyl acrylate, methyl methacrylate, ethyl methacrylate, propyl methacrylate, and butyl methacrylate.
  • One or more monomers selected from monomers having no functional group in the side chain such as alkyl (meth) acrylates such as cyclohexyl methacrylate and 2-ethylhexyl methacrylate
  • alkyl (meth) acrylates such as cyclohexyl methacrylate and 2-ethylhexyl methacrylate
  • monomers selected from monomers such as 2-hydroxyethyl methacrylate, glycidyl methacrylate, acrylic acid, methacrylic acid, itaconic acid, etc.
  • a monomer having a functional group such as OH or COOH in the side chain of the mer (hereinafter referred to as a functional monomer) or a combination of two or more thereof, solution polymerization, suspension polymerization, emulsion polymerization, bulk Examples include acrylic copolymers having a weight average molecular weight of 40,000 to 1,000,000, preferably 100,000 to 400,000, obtained by copolymerization by a polymerization method such as a polymerization method.
  • Tg polymer such as ethylhexyl methacrylate
  • mass% 2-hydroxyethyl methacrylate, acrylic acid, itacone
  • Acrylic polymers such as the functional monomer contains 0 to 10% by weight of an equal is most preferred.
  • the shape of the film may be a shape required as a surface covering material for various film mirrors such as a flat surface, a diffusion surface, a concave surface, a convex surface, and a trapezoid.
  • the thickness of the film substrate is preferably 10 to 125 ⁇ m. If it is thinner than 10 ⁇ m, the film will not be stiff, and the film will be wrinkled easily, which is not preferable in appearance and tends to deteriorate the reflection performance. If it is thicker than 125 ⁇ m, the average reflectance in the range of 1600 nm to 2500 nm is less than 80%. .
  • the surface of the polymer film layer may be subjected to corona discharge treatment, plasma treatment or the like in order to improve adhesion with a metal oxide layer, a hard coat layer, a dielectric coating layer, or the like.
  • the film base material contains any one of benzotriazole, benzophenone, triazine, cyanoacrylate, and polymer type ultraviolet absorbers.
  • UV absorber As the ultraviolet absorber used for the polymer film layer, an ultraviolet absorbent having a wavelength of 370 nm or less and excellent absorption of ultraviolet rays and having a small absorption of visible light having a wavelength of 400 nm or more is preferable from the viewpoint of utilization of sunlight.
  • Examples of the ultraviolet absorber used in the present invention include oxybenzophenone compounds, benzotriazole compounds, salicylic acid ester compounds, benzophenone compounds, cyanoacrylate compounds, nickel complex compounds, triazine compounds, and the like. However, benzophenone compounds, less colored benzotriazole compounds, and triazine compounds are preferable. Further, ultraviolet absorbers described in JP-A Nos. 10-182621 and 8-337574, and polymer ultraviolet absorbers described in JP-A Nos. 6-148430 and 2003-113317 may be used.
  • benzotriazole ultraviolet absorbers include 2- (2'-hydroxy-5'-methylphenyl) benzotriazole, 2- (2'-hydroxy-3 ', 5'-di-tert-butylphenyl) benzo Triazole, 2- (2'-hydroxy-3'-tert-butyl-5'-methylphenyl) benzotriazole, 2- (2'-hydroxy-3 ', 5'-di-tert-butylphenyl) -5 Chlorobenzotriazole, 2- (2′-hydroxy-3 ′-(3 ′′, 4 ′′, 5 ′′, 6 ′′ -tetrahydrophthalimidomethyl) -5′-methylphenyl) benzotriazole, 2,2-methylenebis (4- (1,1,3,3-tetramethylbutyl) -6- (2H-benzotriazol-2-yl) phenol), 2- (2'-hydroxy 3'-tert-butyl-5'-methylphenyl) -5-chlorobenzotriazole, 2- (2'-
  • TINUVIN 171, TINUVIN 900, TINUVIN 928, TINUVIN 360 (all manufactured by BASF Japan), LA31 (manufactured by ADEKA), RUVA-100 (Otsuka) Chemical).
  • benzophenone compounds include 2,4-dihydroxybenzophenone, 2,2'-dihydroxy-4-methoxybenzophenone, 2-hydroxy-4-methoxy-5-sulfobenzophenone, bis (2-methoxy-4-hydroxy-) 5-benzoylphenylmethane) and the like, but are not limited thereto.
  • gas barrier layer having a metal oxide examples include silicon oxide, aluminum oxide, or silicon oxide, a composite oxide starting from aluminum oxide, zinc oxide, tin oxide, indium oxide, niobium oxide, chromium oxide, etc. From the viewpoint of water vapor barrier properties, silicon oxide, aluminum oxide, or a composite oxide starting from silicon and aluminum is preferable.
  • a multilayer film in which a low refractive index layer having a refractive index of 1.35 to 1.8 at a wavelength of 550 nm and a high refractive index film having a refractive index of 1.85 to 2.8 at a wavelength of 550 nm are alternately laminated. Also good.
  • Examples of the low refractive index film material include silicon oxide, aluminum oxide, silicon nitride, and aluminum nitride.
  • Examples of the high refractive index film material include niobium oxide, titanium oxide, zinc oxide, tin oxide, indium oxide, tantalum oxide, and zirconium oxide. These are formed by a vacuum process such as a vacuum deposition method, a sputtering method, a PVD method (physical vapor deposition method) such as ion plating, or a CVD method (chemical vapor deposition method).
  • the thickness of the gas barrier layer having a metal oxide is preferably in the range of 5 to 800 nm, more preferably in the range of 10 to 300 nm.
  • a gas barrier layer is formed on a polymer film, and thus a silicon oxide layer or an aluminum oxide layer obtained as described above, or a composite oxide layer using silicon oxide and aluminum oxide as a starting material is oxygenated.
  • excellent barrier action against gas such as carbon dioxide, air, or water vapor.
  • a laminate of a silicon oxide layer or an aluminum oxide layer, or a composite oxide layer starting from silicon oxide or aluminum oxide and a polymer film has a water vapor permeability of 1 ⁇ 10 ⁇ 2 at 40 ° C. and 90% RH. It is preferably g / m 2 ⁇ 24 h or less.
  • the water vapor transmission rate can be measured with a water vapor transmission rate measuring device PERMATRAN-W3-33 manufactured by MOCON.
  • the silicon oxide layer or the aluminum oxide layer, or the composite oxide layer using silicon oxide and aluminum oxide as a starting material has a thickness of 1 ⁇ m or less, and the average value of each light transmittance is 90% or more. It is preferable. Thereby, there is no light loss and sunlight can be reflected efficiently.
  • the ratio of the thickness of the polymer film layer and the gas barrier layer having a metal oxide is in the range of 0.1% to 5%.
  • the ratio is smaller than 0.1%, that is, when the thickness of the gas barrier layer with respect to the polymer film becomes thin, sufficient gas barrier properties cannot be obtained and the function of suppressing the progress of deterioration cannot be exhibited.
  • the ratio is larger than 5%, that is, when the thickness of the gas barrier layer with respect to the polymer film is increased, the metal oxide cracks when an external bending force is applied, and as a result, the gas barrier property cannot be obtained and the deterioration progresses. The function to suppress is not demonstrated.
  • Metal reflective layer As the metal reflective layer according to the present invention, for example, silver or a silver alloy, gold, copper, aluminum, or an alloy thereof can be used. In particular, it is preferable to use silver.
  • a reflective layer serves as a reflective film that reflects light.
  • the reflectance of the film mirror from the infrared region to the visible light region can be increased, and the dependency of the reflectance on the incident angle can be reduced. From the infrared region to the visible light region means a wavelength region of 2500 to 400 nm.
  • the incident angle means an angle with respect to a line (normal line) perpendicular to the film surface.
  • the silver alloy there is an alloy of silver and one or more other metals selected from the group consisting of gold, palladium, tin, gallium, indium, copper, titanium and bismuth because the durability of the reflective layer is improved.
  • gold is particularly preferable from the viewpoint of high temperature humidity resistance and reflectance.
  • the reflective layer is a silver alloy film
  • silver is preferably 90 to 99.8 atomic% in the total (100 atomic%) of silver and other metals in the reflective layer. Further, the other metal is preferably 0.2 to 10 atomic% from the viewpoint of durability.
  • the film thickness of the reflective layer is preferably 60 to 300 nm, particularly preferably 80 to 200 nm. If the thickness of the reflective layer is less than 60 nm, the film thickness is thin and light is transmitted, so that the reflectance in the visible light region of the film mirror may be reduced. The reflectance increases in proportion to the film thickness up to about 200 nm, but it does not depend on the film thickness above 200 nm. Rather, when the thickness of the reflective layer exceeds 300 nm, irregularities are likely to occur on the surface of the reflective layer, which causes light scattering, which may reduce the reflectance in the visible light region.
  • Film mirrors are required to be glossy, but the method of making and bonding metal foils loses gloss due to surface irregularities. For film mirrors that require uniform surface roughness over a wide area, metal foil lamination is not preferred as a manufacturing method.
  • the metal reflection layer is preferably formed by wet plating or dry plating such as vacuum deposition.
  • the pressure-sensitive adhesive layer of the present invention is not particularly limited, and for example, any of a dry laminating agent, a wet laminating agent, a heat seal agent, a hot melt agent and the like are used.
  • a dry laminating agent for example, polyester resin, urethane resin, polyvinyl acetate resin, acrylic resin, nitrile rubber, etc. are used.
  • the laminating method is not particularly limited, and for example, it is preferable to carry out continuously by a roll method from the viewpoint of economy and productivity.
  • the thickness of the adhesive layer is usually selected from the range of about 1 to 50 ⁇ m. When the thickness is less than 1 ⁇ m, a sufficient adhesive effect cannot be obtained. On the other hand, when the thickness exceeds 50 ⁇ m, the pressure-sensitive adhesive layer is too thick and the drying speed is slow, which is inefficient. In addition, the original adhesive strength cannot be obtained, and adverse effects such as residual solvent occur, which is not preferable.
  • the release film that can be used in the present invention has a base material and a release agent layer provided on the base material.
  • the outer surface of the release film has high smoothness.
  • the release agent constituting the release film include silicone resins, long-chain alkyl resins, fluorine resins, fluorosilicone resins, long-chain alkyl-modified alkyd resins, silicone-modified alkyd resins, and the like. .
  • silicone resin when used as a material for the release agent, more excellent release properties are exhibited.
  • silicone resin any of addition type, condensation type, solventless type and the like can be used.
  • the average thickness of the release agent constituting the release film is not particularly limited, but is preferably 0.01 to 0.3 ⁇ m, and more preferably 0.05 to 0.2 ⁇ m. When the average thickness of the release agent layer is less than the lower limit, the function as the release agent layer may not be sufficiently exhibited. On the other hand, if the average thickness of the release agent layer exceeds the upper limit, blocking may occur when the release film is wound into a roll, resulting in a failure in feeding.
  • the total thickness of the film mirror according to the present invention is preferably 75 to 250 ⁇ m, more preferably 90 to 230 ⁇ m, still more preferably 100 to 220 ⁇ m.
  • the thickness is 75 ⁇ m or less, when the film mirror is attached to the metal substrate, the mirror is bent and sufficient regular reflectance cannot be obtained, and when it is thicker than 250 ⁇ m, the handleability is deteriorated. It is not preferable.
  • the corrosion inhibitor layer installed on the film mirrors 2 to 5 described above as an embodiment of the present invention functions to prevent discoloration of a metal reflection layer (specifically, an Ag layer), for example, a thioether type, a thiol type, a Ni type Organic compound type, benzotriazole type, imidazole type, oxazole type, tetrazaindene type, pyrimidine type, and thiadiazole type are mentioned.
  • the corrosion inhibitor layer is roughly classified into a corrosion inhibitor having an adsorption group with silver and an antioxidant. Specific examples of these corrosion inhibitors and antioxidants are given below.
  • Corrosion inhibitors having an adsorption group with silver include amines and derivatives thereof, products having a pyrrole ring, products having a triazole ring, products having a pyrazole ring, products having a thiazole ring, products having an imidazole ring, indazole It is desirable to be selected from a ring-containing product, a copper chelate compound, a thiourea, a product having a mercapto group, at least one naphthalene-based compound, or a mixture thereof.
  • amines and derivatives thereof include ethylamine, laurylamine, tri-n-butylamine, o-toluidine, diphenylamine, ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, monoethanolamine, diethanolamine, triethanolamine, 2N- Dimethylethanolamine, 2-amino-2-methyl-1,3-propanediol, acetamide, acrylamide, benzamide, p-ethoxychrysoidine, dicyclohexylammonium nitrite, dicyclohexylammonium salicylate, monoethanolamine benzoate, dicyclohexylammonium benzoate, diisopropyl Ammonium benzoate, diisopropylammonium nitrite , Cyclohexylamine carbamate, nitronaphthalene nitrite, cyclohexylamine benzoate, dicyclohexyl
  • Examples of the compound having a pyrrole ring include N-butyl-2,5-dimethylpyrrole, N-phenyl-2,5dimethylpyrrole, N-phenyl-3-formyl-2,5-dimethylpyrrole, N-phenyl-3, 4-diformyl-2,5-dimethylpyrrole, etc., or a mixture thereof.
  • Examples of the compound having a triazole ring include 1,2,3-triazole, 1,2,4-triazole, 3-mercapto-1,2,4-triazole, 3-hydroxy-1,2,4-triazole, 3- Methyl-1,2,4-triazole, 1-methyl-1,2,4-triazole, 1-methyl-3-mercapto-1,2,4-triazole, 4-methyl-1,2,3-triazole, Benzotriazole, tolyltriazole, 1-hydroxybenzotriazole, 4,5,6,7-tetrahydrotriazole, 3-amino-1,2,4-triazole, 3-amino-5-methyl-1,2,4- Triazole, carboxybenzotriazole, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2′-hydroxy- '-Tert-butylphenyl) benzotriazole, 2- (2'-hydroxy3'5'-di-tert-butylphenyl) benzotriazole, 2-
  • Examples of the compound having a pyrazole ring include pyrazole, pyrazoline, pyrazolone, pyrazolidine, pyrazolidone, 3,5-dimethylpyrazole, 3-methyl-5-hydroxypyrazole, 4-aminopyrazole and the like, or a mixture thereof.
  • Examples of those having a thiazole ring include thiazole, thiazoline, thiazolone, thiazolidine, thiazolidone, isothiazole, benzothiazole, 2-N, N-diethylthiobenzothiazole, P-dimethylaminobenzallodanine, 2-mercaptobenzothiazole, etc. Or a mixture thereof.
  • Examples of compounds having an imidazole ring include imidazole, histidine, 2-heptadecylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methyl Imidazole, 2-phenyl-4-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecyl Imidazole, 2-phenyl-4-methyl-5-hydromethylimidazole, 2-phenyl-4,5 dihydroxymethylimidazole, 4-formylimidazole, 2-methyl-4-formylimidazole, 2-phenyl-4-phospho Myrimidazole, 4-methyl-5-formylimidazole, 2-ethyl-4
  • Examples of the compound having an indazole ring include 4-chloroindazole, 4-nitroindazole, 5-nitroindazole, 4-chloro-5-nitroindazole, and the like, or a mixture thereof.
  • copper chelate compounds include acetylacetone copper, ethylenediamine copper, phthalocyanine copper, ethylenediaminetetraacetate copper, hydroxyquinoline copper, and the like, or a mixture thereof.
  • thioureas examples include thiourea, guanylthiourea, and the like, or a mixture thereof.
  • mercaptoacetic acid thiophenol, 1,2-ethanediol, 3-mercapto-1,2,4-triazole, 1-methyl-3-mercapto are added if the above-mentioned materials are added.
  • naphthalene-based compounds examples include thionalide.
  • antioxidant As the antioxidant that can be used in the corrosion inhibitor layer according to the present invention, it is preferable to use a phenol-based antioxidant, a thiol-based antioxidant, and a phosphite-based antioxidant.
  • phenolic antioxidants include 1,1,3-tris (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, 2,2′-methylenebis (4-ethyl-6-t- Butylphenol), tetrakis- [methylene-3- (3 ′, 5′-di-t-butyl-4′-hydroxyphenyl) propionate] methane, 2,6-di-t-butyl-p-cresol, 4,4 '-Thiobis (3-methyl-6-t-butylphenol), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 1,3,5-tris (3', 5'-di-t -Butyl-4'-hydroxybenzyl) -S-tri
  • the phenolic antioxidant preferably has a molecular weight of 550 or more.
  • the thiol antioxidant include distearyl-3,3′-thiodipropionate, pentaerythritol-tetrakis- ( ⁇ -lauryl-thiopropionate), and the like.
  • the phosphite antioxidant include tris (2,4-di-t-butylphenyl) phosphite, distearyl pentaerythritol diphosphite, di (2,6-di-t-butylphenyl) pentaerythritol.
  • Diphosphite bis- (2,6-di-t-butyl-4-methylphenyl) -pentaerythritol diphosphite, tetrakis (2,4-di-t-butylphenyl) 4,4′-biphenylene-diphosphonite 2,2′-methylenebis (4,6-di-t-butylphenyl) octyl phosphite and the like.
  • a metal reflective layer is formed on the surface of the polymer film (A), and a corrosion inhibitor layer is further laminated thereon.
  • an adhesive layer is formed on the surface of the polymer film (A), that is, on the corrosion inhibitor layer.
  • a gas barrier layer is formed on the lower surface of another polymer film (B), and the gas barrier layer of the polymer film (B) and the adhesive layer of the polymer film (A) are faced to each other to produce them.
  • Adhesive layer As an adhesive layer installed in the film mirror 3 of the aspect of this invention, it consists of resin and adheres a film and the polymer film layer containing the above-mentioned ultraviolet absorber. Therefore, the adhesive layer needs to have an adhesive property for closely adhering the film and the ultraviolet absorber-containing polymer film layer, and smoothness and transparency to bring out the high reflection performance inherent to the metal reflective layer.
  • the resin used for the adhesive layer is not particularly limited as long as it satisfies the above conditions of adhesion, heat resistance, and smoothness.
  • Polyester resin, acrylic resin, melamine resin, epoxy resin, polyamide Resin, vinyl chloride resin, vinyl chloride vinyl acetate copolymer resin or the like, or a mixed resin thereof can be used. From the viewpoint of weather resistance, a polyester resin and a melamine resin mixed resin are preferable. It is more preferable to use a thermosetting resin mixed with a curing agent.
  • the thickness of the adhesive layer is preferably 0.01 to 3 ⁇ m, more preferably 0.1 to 1 ⁇ m. If the thickness is less than 0.01 ⁇ m, the adhesiveness is deteriorated and there is no effect of forming an adhesive layer, and it is difficult to cover the unevenness on the surface of the film substrate, and the smoothness is deteriorated. Even if the thickness is greater than 3 ⁇ m, improvement in adhesion cannot be expected, and on the contrary, unevenness of coating may cause poor smoothness or insufficient curing of the adhesive layer, which is not preferable.
  • a method for forming the adhesive layer conventionally known coating methods such as a gravure coating method, a reverse coating method, and a die coating method can be used.
  • a hard coat layer can be provided as the outermost layer of the film mirror.
  • the hard coat layer is provided for preventing scratches.
  • the film mirror 4 mentioned above can be mentioned.
  • the hard coat layer can be composed of acrylic resin, urethane resin, melamine resin, epoxy resin, organic silicate compound, silicone resin, and the like.
  • silicone resins and acrylic resins are preferable in terms of hardness and durability.
  • an active energy ray-curable acrylic resin or a thermosetting acrylic resin is preferable in terms of curability, flexibility, and productivity.
  • the active energy ray-curable acrylic resin or thermosetting acrylic resin is a composition containing a polyfunctional acrylate, an acrylic oligomer, or a reactive diluent as a polymerization curing component.
  • Acrylic oligomers include polyester acrylates, urethane acrylates, epoxy acrylates, polyether acrylates, etc., including those in which a reactive acrylic group is bonded to an acrylic resin skeleton, and rigid materials such as melamine and isocyanuric acid. A structure in which an acrylic group is bonded to a simple skeleton can also be used.
  • the reactive diluent has a function of a solvent in the coating process as a medium of the coating agent, and has a group that itself reacts with a monofunctional or polyfunctional acrylic oligomer. It becomes a copolymerization component.
  • polyfunctional acrylic cured paints include Mitsubishi Rayon Co., Ltd. (trade name “Diabeam (registered trademark)” series, etc.), Nagase Sangyo Co., Ltd. (trade name “Denacol (registered trademark)” series, etc. ), Shin-Nakamura Co., Ltd.
  • additives can be further blended in the hard coat layer as required, as long as the effects of the present invention are not impaired.
  • stabilizers such as antioxidants, light stabilizers, ultraviolet absorbers, surfactants, leveling agents, antistatic agents, and the like can be used.
  • ⁇ Leveling agents are effective in reducing surface irregularities, especially when functional layers are applied.
  • a dimethylpolysiloxane-polyoxyalkylene copolymer for example, SH190 manufactured by Toray Dow Corning Co., Ltd.
  • SH190 manufactured by Toray Dow Corning Co., Ltd. is suitable as the silicone leveling agent.
  • the ultraviolet reflective layer installed in the film mirror 5 of the embodiment of the present invention is a layer that reflects ultraviolet light and transmits visible light and infrared light.
  • the ultraviolet reflection layer preferably has an average reflectance of 75% or more for electromagnetic waves (ultraviolet rays) of 300 nm to 400 nm.
  • the ultraviolet reflective layer preferably has an average transmittance of 80% or more for electromagnetic waves (visible light and infrared light) of 400 nm to 2500 nm.
  • the polymer film layer is disposed on the side of the metal reflection layer on which sunlight is incident, and the sunlight that has passed through the polymer film layer is reflected by the metal reflection layer.
  • the ultraviolet reflective layer on the side of the polymer film layer on which sunlight is incident, the polymer film layer can be prevented from being deteriorated and discolored by ultraviolet rays, and the decrease in light transmittance of the polymer film layer can be reduced. Therefore, it becomes possible to reduce the reflectance drop of the film mirror.
  • the ultraviolet reflecting layer on the side of the polymer film layer on which sunlight is incident, it is possible to reduce a decrease in moisture resistance of the polymer film layer due to deterioration of the polymer film layer due to ultraviolet rays of sunlight. Therefore, it is possible to prevent the metal reflective layer from being deteriorated due to the deterioration of the moisture resistance of the polymer film layer, so that it is possible to reduce the reflectance drop of the film mirror.
  • the ultraviolet reflective layer is not particularly limited, a dielectric multilayer film of alternating layers of two or more kinds of dielectric materials having different refractive indexes can be used.
  • the dielectric multilayer film according to the present invention is preferably configured by alternately stacking a high refractive index dielectric layer and a low refractive index dielectric layer in an amount of 2 to 6 layers alternately.
  • the scratch resistance of a dielectric multilayer film can be improved by using a multilayer structure in which dielectric layers are stacked.
  • the high refractive index dielectric layer preferably has a refractive index of 2.0 to 2.6.
  • the low refractive index dielectric layer preferably has a refractive index of 1.8 or less.
  • the dielectric layer of high refractive index can be preferably used SiO 2, Al 2 O 3 as a dielectric layer of ZrO 2, TiO 2 the low refractive index.
  • TiO 2 can be used, and as the low refractive index dielectric layer, SiO 2 can be used more preferably.
  • TiO 2 is used on the outermost surface of the ultraviolet reflection layer, that is, the outermost surface of the film mirror, as a dielectric material having a high refractive index, the anti-fouling effect on the mirror surface due to the photocatalytic effect of TiO 2 can be obtained. It is possible to reduce the decrease in the reflectance of the film mirror caused by the above.
  • the sacrificial anticorrosive layer installed on the film mirror 6 of the embodiment of the present invention is a layer that protects the metal reflective layer by sacrificial anticorrosion, and the sacrificial anticorrosive layer is disposed between the metal reflective layer and the protective layer.
  • the corrosion resistance of the metal reflective layer can be improved.
  • the anticorrosive sacrificial layer is preferably copper having a higher ionization tendency than silver, and the copper anticorrosive sacrificial layer is provided under the reflective layer made of silver, thereby suppressing the deterioration of silver.
  • the film mirror of the present invention can be manufactured by the following steps.
  • Step 1 A biaxially stretched polyester film (polyethylene terephthalate film, thickness 60 ⁇ m) is prepared as a base material for the polymer film, placed inside the vapor deposition machine, and the inside of the vapor deposition machine is evacuated by a vacuum pump.
  • a feeding device for feeding out a polymer film wound in a roll shape
  • a winding device for taking up the polymer film deposited on the polymer film by vapor deposition.
  • a large number of rolls are arranged between the feeding device and the winding device so as to respectively guide the film, and are driven to rotate in synchronization with the polymer film travel by the driving means.
  • a metal oxide deposition nucleus evaporation source is disposed at a position facing the upstream portion of the polymer film traveling direction.
  • the deposition nuclear evaporation source is for depositing metals such as Si, Al, Ag, Cu, etc. on polymer films.
  • Metal vapor is generated by vacuum deposition or the like, and the metal is uniformly distributed over the entire width of the film.
  • An oxide vapor deposition film and a metal vapor deposition film are formed.
  • Step 3 A polyester-based pressure sensitive adhesive is applied to the surface of the metal vapor deposition film produced in step 2 to a thickness of 5 ⁇ m. Not only the above-mentioned production order but also a corrosion inhibitor effective for preventing metal deterioration after step 2 may be applied, and a sacrificial anticorrosive layer, for example, Cu may also be deposited to prevent metal deterioration.
  • a corrosion inhibitor effective for preventing metal deterioration after step 2 may be applied, and a sacrificial anticorrosive layer, for example, Cu may also be deposited to prevent metal deterioration.
  • the film mirror of the present invention can be preferably used for the purpose of collecting sunlight.
  • the film mirror can be used alone as a sunlight collecting mirror, more preferably, the film mirror is attached to a support via an adhesive layer and used as a sunlight collecting mirror.
  • Examples of the support for the solar light collecting mirror of the present invention include a resin material or a metal material.
  • resin materials such as polycarbonate resin, polyacetal resin, acrylic resin, polystyrene resin, polyimide resin, polyethylene terephthalate resin, polybutylene terephthalate resin, and ABS resin are used without particular limitation.
  • examples of the metal material include an aluminum plate, an aluminum alloy plate, a brass plate, a stainless plate, and a steel plate.
  • Example 1 (Preparation of film mirror sample 1)
  • a biaxially stretched acrylic film (thickness: 60 ⁇ m) containing benzotriazole as an ultraviolet absorber was used.
  • a composite oxide starting from silicon oxide and aluminum oxide as a water vapor barrier layer having a metal oxide was deposited with a thickness of 80 nm.
  • Vapor deposition materials of silicon oxide and aluminum oxide were formed by an electron beam vapor deposition method at a mixing ratio of 80:20.
  • a 150 nm thick silver reflective layer is formed by vacuum deposition, and on the silver reflective layer, acrylic adhesive Sdyne # 7851 (manufactured by Sekisui Chemical Co., Ltd.) is applied to a thickness of 5 ⁇ m as an adhesive.
  • a release film was attached to obtain a sample 1 corresponding to the film mirror 1 of the embodiment of the present invention.
  • a biaxially stretched polyester film (polyethylene terephthalate film, thickness 50 ⁇ m) containing an ultraviolet absorber benzotriazole was used.
  • a composite oxide starting from silicon and aluminum was deposited as a water vapor barrier layer having a metal oxide with a thickness of 300 nm. Vapor deposition materials of silicon oxide and aluminum oxide were formed by electron beam vapor deposition at a mixing ratio of 90:10.
  • a 150 nm thick silver reflective layer was formed by vacuum deposition, and an acrylic film was applied to the upper surface of the silver reflective layer to a thickness of 60 ⁇ m.
  • the acrylic film contains the corrosion inhibitor dimercaptoacetate.
  • acrylic adhesive Sdyne # 7851 manufactured by Sekisui Chemical Co., Ltd. was applied in a thickness of 5 ⁇ m from above, and a release film was attached to obtain a sample 2 corresponding to the film mirror 2 of the embodiment of the present invention.
  • the polymer film 2 was a biaxially stretched polyester film (polyethylene terephthalate film, thickness 50 ⁇ m) as the polymer film.
  • a 150 nm thick silver reflective layer was formed thereon as a metal reflective layer by vacuum deposition, and an acrylic film was applied to the upper surface of the silver reflective layer to a thickness of 60 ⁇ m.
  • the acrylic film contains the corrosion inhibitor dimercaptoacetate.
  • Acrylic pressure-sensitive adhesive Sdyne # 7851 manufactured by Sekisui Chemical Co., Ltd. was applied to the surface opposite to the silver reflective layer as a pressure-sensitive adhesive to a thickness of 5 ⁇ m and a release film was attached.
  • the sample prepared so far was designated as Sample A.
  • a composite oxide starting from silicon and aluminum was deposited at a thickness of 300 nm as a water vapor barrier layer having a metal oxide on a polymer film 1 (thickness 25 ⁇ m) containing benzotriazole as an ultraviolet absorber.
  • Vapor deposition materials of silicon oxide and aluminum oxide were formed by electron beam vapor deposition at a mixing ratio of 90:10.
  • Sample B was a polymer film 1 with a water vapor barrier layer produced in this separate step. Sample A and Sample B were bonded via a polyester adhesive layer to obtain Sample 3 corresponding to Film Mirror 3 of the embodiment of the present invention.
  • the polymer film 1 was a biaxially stretched polyester film (polyethylene terephthalate film, thickness 12 ⁇ m) as the polymer film.
  • a chemical vapor deposition (CVD) apparatus is used on one side of the polymer film 1 to form tetramethylenedisiloxane, oxygen, and helium at a ratio of 1:20:10 (slm) and a pressure of 100 ⁇ 10 ⁇ 4.
  • a thin film of silicon oxide (SiOx, X ⁇ 2) was formed with a thickness of 60 nm as a water vapor barrier layer having a metal oxide under the conditions of Torr, vapor deposition rate 50 nm / S, and film thickness 10 nm.
  • a 150 nm thick silver reflective layer was formed thereon as a metal reflective layer by vacuum deposition, and an acrylic film was applied to the upper surface of the silver reflective layer to a thickness of 60 ⁇ m.
  • the acrylic film contains the corrosion inhibitor dimercaptoacetate.
  • acrylic adhesive Esdyne # 7851 manufactured by Sekisui Chemical Co., Ltd.
  • a release film was attached.
  • 5% by mass of TINUVIN 328 (ultraviolet absorber, manufactured by BASF Japan) was mixed with methyl acrylate: butyl acrylate copolymer (ratio 64:36, ultraviolet curable resin) on the surface of the polymer film 1 having no silver reflection layer.
  • the toluene solution is coated by a gravure coating method, dried at 80 ° C. for 30 seconds, and then irradiated with ultraviolet rays so that the accumulated light amount becomes 5000 mJ / cm 2 to form an ultraviolet absorber-containing hard coat layer.
  • Four samples corresponding to the film mirror 4 were obtained.
  • a sample 5 corresponding to the film mirror 5 of the embodiment of the present invention was obtained in the same manner as in Example 4 except that the ultraviolet reflecting layer was made of a metal oxide instead of the ultraviolet absorbent-containing hard coat layer.
  • the ultraviolet reflection layer is composed of a dielectric multilayer film, and six layers of dielectric layers TiO 2 (thickness 37 nm) having a high refractive index and dielectric layers SiO 2 (thickness 65 nm) having a low refractive index are alternately formed by vacuum deposition. It is constructed by stacking.
  • the total thickness of the ultraviolet reflecting layer is 306 nm.
  • a biaxially stretched acrylic film (thickness 10 ⁇ m) containing benzotriazole as an ultraviolet absorber was used as the polymer film.
  • An aluminum oxide layer having a thickness of 500 nm was deposited on one side of the acrylic film as a water vapor barrier layer having a metal oxide.
  • the aluminum oxide vapor deposition material was formed by electron beam vapor deposition.
  • a silver reflection layer having a thickness of 150 nm was formed by a vacuum deposition method, and a copper layer was deposited as a sacrificial anticorrosion layer by resistance heating to a thickness of 60 nm on the silver reflection layer.
  • an acrylic pressure-sensitive adhesive Sdyne # 7851 (manufactured by Sekisui Chemical Co., Ltd.) was applied to a thickness of 5 ⁇ m as a pressure-sensitive adhesive, and a release film was attached to obtain a sample 6 corresponding to the film mirror 6 of the embodiment of the present invention. .
  • a biaxially stretched polyester film (polyethylene terephthalate film, thickness 60 ⁇ m) was used as the polymer film.
  • a 150 nm thick silver reflective layer is formed as a metal reflective layer on one side of the polyethylene terephthalate film by a vacuum deposition method, and a composite oxide starting from silicon and aluminum is deposited on the silver reflective layer to a thickness of 80 nm. did.
  • a comparative sample 1 was obtained by applying an acrylic adhesive Sdyne # 7851 (manufactured by Sekisui Chemical Co., Ltd.) as a pressure-sensitive adhesive on the side opposite to the silver reflecting layer to a thickness of 5 ⁇ m and attaching a release film.
  • Comparative sample 2 produced in the same process as sample 1 was obtained except that the process of forming the water vapor barrier layer having a metal oxide was not performed.
  • Each film mirror sample obtained was cut into a 2.5 cm square of the measurement size, the reflectance measurement mode of the spectrophotometer U4000 (manufactured by Hitachi High-Technologies) was selected, and the reflection of the incident light at an angle of 5 ° Light was guided to an integrating sphere and the regular reflectance was measured.
  • the wavelength range was 2500 nm to 250 nm, and it was confirmed whether there was any wavelength range in which the reflectance dropped.
  • the reflectances in the infrared light region (2500 nm to 800 nm) and the visible light region (800 nm to 400 nm) were averaged to obtain regular reflection average values for the examples and comparative examples.
  • Degradation test 1 moisture resistance test
  • the specular reflectance measurement described above was carried out after being left for 30 days in a constant temperature bath under conditions of a temperature of 85 ° C. and a humidity of 85% RH.
  • the determination of regular reflectance is the same as described above.
  • Degradation test 2 (Ammonium sulfide test) The test was conducted according to the method described in Appendix 2 of JIS-H8623 using ammonium sulfide specified in JIS-K8943. After being immersed in an aqueous ammonium sulfide solution and allowed to stand for 24 hours, the regular reflectance of the film mirror was measured. The determination of regular reflectance is the same as described above.
  • Example 2 Using samples 1 to 6 of the present invention and comparative samples 1 to 3, solar light collecting mirrors were produced by the following method.
  • An actual film mirror for solar thermal power generation has a length of at least 1 m on a side and cannot be evaluated with an evaluation measuring device with the size as it is. Therefore, a solar power generation reflective device with a small size as shown below is produced. The film mirror for solar power generation was evaluated using this.
  • the above-prepared samples 1 to 6 and comparative samples 1 to 3 are attached to a stainless steel (SUS304) plate having a thickness of 15.4 mm and a length of 25.4 mm ⁇ width of 76.2 mm through an adhesive layer having a thickness of 5 ⁇ m.
  • a film mirror for solar thermal power generation was prepared.

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Abstract

L'invention concerne un miroir à film ayant une fonction de réflexion de la lumière solaire, qui comprend une couche de film polymère, une couche de barrière aux gaz contenant un oxyde métallique, et une couche métallique réfléchissante dans cet ordre et depuis le côté d'incidence de la lumière du soleil, lequel est caractérisé en ce que la rapport entre l'épaisseur de la couche de barrière aux gaz et l'épaisseur de la couche de film polymère varie de 0,1 à 5 %. L'invention concerne également un procédé de production d'un miroir à film, et un miroir de recueil de lumière solaire.
PCT/JP2010/073496 2010-02-04 2010-12-27 Miroir à film, procédé de production de celui-ci et miroir de recueil de lumière solaire WO2011096151A1 (fr)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014061497A1 (fr) * 2012-10-16 2014-04-24 コニカミノルタ株式会社 Miroir à film et appareil réfléchissant pour génération d'énergie thermique solaire
WO2014109354A1 (fr) * 2013-01-11 2014-07-17 コニカミノルタ株式会社 Miroir en film et réflecteur pour la conversion thermodynamique solaire
WO2015111327A1 (fr) * 2014-01-24 2015-07-30 コニカミノルタ株式会社 Conducteur transparent
JP2017062425A (ja) * 2015-09-25 2017-03-30 コニカミノルタ株式会社 光反射フィルム及び液晶表示装置用バックライトユニット
JP2018036604A (ja) * 2016-09-02 2018-03-08 コニカミノルタ株式会社 光反射フィルム及び液晶表示装置用バックライトユニット
JP2020204665A (ja) * 2019-06-14 2020-12-24 キヤノン電子株式会社 光学フィルタ、及び光学デバイス
WO2021261433A1 (fr) * 2020-06-22 2021-12-30 日東電工株式会社 Stratifié de miroir en film et élément de miroir

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61154942A (ja) * 1984-12-24 1986-07-14 ミネソタ　マイニング　アンド　マニユフアクチユアリング　コンパニー 耐腐食性反射鏡
JP2001208904A (ja) * 2000-01-26 2001-08-03 Matsushita Electric Works Ltd 高効率反射鏡
JP2004009591A (ja) * 2002-06-07 2004-01-15 Mitsui Chemicals Inc 反射体
JP2007065261A (ja) * 2005-08-31 2007-03-15 Asahi Glass Co Ltd 反射鏡

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61154942A (ja) * 1984-12-24 1986-07-14 ミネソタ　マイニング　アンド　マニユフアクチユアリング　コンパニー 耐腐食性反射鏡
JP2001208904A (ja) * 2000-01-26 2001-08-03 Matsushita Electric Works Ltd 高効率反射鏡
JP2004009591A (ja) * 2002-06-07 2004-01-15 Mitsui Chemicals Inc 反射体
JP2007065261A (ja) * 2005-08-31 2007-03-15 Asahi Glass Co Ltd 反射鏡

Cited By (7)

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WO2014061497A1 (fr) * 2012-10-16 2014-04-24 コニカミノルタ株式会社 Miroir à film et appareil réfléchissant pour génération d'énergie thermique solaire
WO2014109354A1 (fr) * 2013-01-11 2014-07-17 コニカミノルタ株式会社 Miroir en film et réflecteur pour la conversion thermodynamique solaire
WO2015111327A1 (fr) * 2014-01-24 2015-07-30 コニカミノルタ株式会社 Conducteur transparent
JP2017062425A (ja) * 2015-09-25 2017-03-30 コニカミノルタ株式会社 光反射フィルム及び液晶表示装置用バックライトユニット
JP2018036604A (ja) * 2016-09-02 2018-03-08 コニカミノルタ株式会社 光反射フィルム及び液晶表示装置用バックライトユニット
JP2020204665A (ja) * 2019-06-14 2020-12-24 キヤノン電子株式会社 光学フィルタ、及び光学デバイス
WO2021261433A1 (fr) * 2020-06-22 2021-12-30 日東電工株式会社 Stratifié de miroir en film et élément de miroir

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