WO2011078193A1 - Adhesive tape for protecting surface of semiconductor wafer - Google Patents
Adhesive tape for protecting surface of semiconductor wafer Download PDFInfo
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- WO2011078193A1 WO2011078193A1 PCT/JP2010/073054 JP2010073054W WO2011078193A1 WO 2011078193 A1 WO2011078193 A1 WO 2011078193A1 JP 2010073054 W JP2010073054 W JP 2010073054W WO 2011078193 A1 WO2011078193 A1 WO 2011078193A1
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- semiconductor wafer
- adhesive tape
- protecting
- resin layer
- wafer surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/622—Polymers of esters of alpha-beta ethylenically unsaturated carboxylic acids
- C08G18/6225—Polymers of esters of acrylic or methacrylic acid
- C08G18/6229—Polymers of hydroxy groups containing esters of acrylic or methacrylic acid with aliphatic polyalcohols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/625—Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids
- C08G18/6254—Polymers of alpha-beta ethylenically unsaturated carboxylic acids and of esters of these acids containing hydroxy groups
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
- C09J5/02—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving pretreatment of the surfaces to be joined
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
- C09J2433/003—Presence of (meth)acrylic polymer in the primer coating
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2467/00—Presence of polyester
- C09J2467/006—Presence of polyester in the substrate
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2475/00—Presence of polyurethane
- C09J2475/003—Presence of polyurethane in the primer coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
Definitions
- the present invention relates to an adhesive tape for protecting a semiconductor wafer surface. More specifically, the present invention relates to a semiconductor wafer surface protecting adhesive tape used when grinding a semiconductor wafer into a thin film.
- a semiconductor package is manufactured by slicing a high-purity silicon single crystal or the like into a semiconductor wafer, and then forming an integrated circuit on the wafer surface by ion implantation, etching, or the like.
- the semiconductor wafer has a desired thickness.
- an adhesive tape for protecting the surface of the semiconductor wafer is used.
- the back-ground semiconductor wafer is stored in a wafer cassette after the back-side grinding is completed, transported to a dicing process, and processed into semiconductor chips.
- the thickness of a semiconductor wafer has been reduced to about 200 to 400 ⁇ m by backside grinding.
- the thickness of the semiconductor wafer is being reduced.
- the diameter of the wafer tends to be increased.
- wafers with diameters of 5 inches and 6 inches have been mainstream, but in recent years, processing of semiconductor chips from semiconductor wafers with diameters of 8 to 12 inches has become the mainstream.
- a semiconductor wafer is taken out one by one from a dedicated case called a wafer cassette by a robot arm, held by a semiconductor wafer fixing jig in a grinding machine, and backside grinding is performed.
- the back-ground semiconductor wafer is stored in a wafer cassette by a robot arm and transferred to the next process.
- the semiconductor wafer may not be adsorbed well, or in the worst case, the semiconductor wafer may be damaged.
- the robot arm comes into contact with the semiconductor wafer after storage and damages the semiconductor wafer.
- an apparatus in-line apparatus
- a thin wafer after grinding is not stored in a wafer cassette but is collectively performed from the back surface grinding process to the dicing tape mounting process.
- methods have been proposed that are less susceptible to the effects of wafer warping due to improved performance of wafer fixing jigs and robot arms.
- Patent Document 1 a base material in which a rigid film and a stress relaxation film are laminated via a peelable adhesive layer, and an adhesive layer provided on the stress relaxation film of the base material An adhesive sheet for processing semiconductor wafers has been proposed.
- middle layer which has the storage elastic modulus of a specific range between a base material and an adhesive layer is proposed, and in patent document 3, a base film consists of at least 3 layers.
- Patent Document 4 proposes a multilayer sheet in which specific materials are laminated.
- the interface between the peelable adhesive layer and the rigid film, the peelable adhesive layer and the stress relaxation property A complicated process of peeling at the interface with the film or inside the layer constituting the peelable adhesive layer is required. Further, the pressure-sensitive adhesive layer and the stress relaxation layer are stacked in layers, and the cushioning property is excessive.
- the present invention provides an adhesive tape for protecting a semiconductor wafer surface, which can be formed into a thin film, for example, a thin film wafer having a thickness of 100 ⁇ m or less, even if the back surface of the wafer is ground while the adhesive tape for protecting a semiconductor wafer surface is bonded to the semiconductor wafer.
- the issue is to provide.
- a semiconductor wafer having a base resin film and an adhesive layer directly through an intermediate resin layer in which a base resin component containing an acrylic polymer and / or polyurethane acrylate is crosslinked on the base resin film A surface protection adhesive tape having a repulsive force ⁇ and a restitution coefficient ⁇ per unit width determined from a load load of a loop stiffness obtained by measuring the semiconductor wafer surface protection adhesive tape under specific conditions in a specific range. It was found that a pressure-sensitive adhesive tape for protecting a semiconductor wafer surface in which the difference between the tensile elongation at break in the machine direction and the transverse direction is not more than a specific value can solve the above problems. The present invention has been made based on this finding.
- the restitution coefficient ⁇ divided by the square of the thickness ⁇ of the material is 100 mN / mm 3 or more, the repulsion force ⁇ is 13 mN / mm or less, and the difference between the tensile breaking elongation in the longitudinal direction and the transverse direction is 35% or less.
- An adhesive tape for protecting a surface of a semiconductor wafer (A) Equipment Loop step tester (trade name, manufactured by Toyo Seiki Co., Ltd.) (B) Loop (test piece) shape Length 50 mm or more, width 10 mm (C) Indenter pushing speed 3.3 mm / sec (D) Indentation amount of indenter 5 mm from the point of contact of the indenter with the loop ⁇ 2>
- the acrylic polymer of the intermediate resin layer has a hydroxyl group and a carboxyl group, for protecting a semiconductor wafer surface according to ⁇ 1> Adhesive tape.
- ⁇ 3> The adhesive tape for protecting a semiconductor wafer surface according to ⁇ 1>, wherein the polyurethane acrylate of the intermediate resin layer has a hydroxyl group and a carboxyl group.
- ⁇ 4> The adhesive tape for protecting a semiconductor wafer surface according to any one of ⁇ 1> to ⁇ 3>, wherein the glass transition temperature after crosslinking of the intermediate resin layer is ⁇ 10 ° C. to 30 ° C.
- ⁇ 5> The adhesive tape for protecting a semiconductor wafer surface according to any one of ⁇ 1> to ⁇ 4>, wherein the base resin film is a polyester resin film.
- the adhesive tape for protecting a semiconductor wafer surface is a pressure-sensitive adhesive tape, has an adhesive strength to a SUS polished surface at 20 to 25 ° C. of 0.5 N / 25 mm or more, and has an adhesive strength to a SUS polished surface at 50 ° C.
- a base resin whose main component is a polymer in which the pressure-sensitive adhesive layer contains, as a constituent unit, an acrylic monomer having at least one radiation-polymerizable carbon-carbon double bond-containing group with respect to the main chain.
- the semiconductor wafer surface protecting adhesive tape of the present invention is bonded to the semiconductor wafer surface and the back surface of the wafer is ground to form a thin film wafer of 100 ⁇ m or less, the warpage of the semiconductor wafer can be reduced. it can. For this reason, the drop mistake at the time of wafer conveyance by the curvature of a semiconductor wafer can be reduced, and it can implement without trouble until the dicing tape and dicing die-bonding film mounting which are a post process, and exfoliation of surface protection tape.
- the adhesive tape for protecting the surface of a semiconductor wafer of the present invention can be used for semiconductor wafer processing that requires thin film grinding, such as DRAM and NAND flash.
- FIG. 1 is a cross-sectional view showing an embodiment of the adhesive tape for protecting a semiconductor wafer surface according to the present invention.
- FIG. 1 is a schematic sectional view showing a preferred embodiment of the adhesive tape for protecting a semiconductor wafer surface of the present invention.
- the base resin film 1 and the pressure-sensitive adhesive layer 2 are formed on the base resin film 1 via the intermediate resin layer 3.
- the semiconductor wafer surface protective adhesive tape of the present invention can suppress the amount of warpage of a semiconductor wafer even when a semiconductor wafer with an insulating film such as polyimide is ground to a thin film.
- an insulating film such as polyimide is formed on the surface of a semiconductor wafer by about several ⁇ m. Since the insulating film is often cross-linked by heating or the like, residual stress may exist in the insulating film on the surface of the semiconductor wafer.
- the semiconductor wafer is thick and rigid so that the semiconductor wafer does not warp due to residual stress.
- the rigidity of the semiconductor wafer itself decreases.
- the adhesive tape of the present invention exhibits a warp correction rate exceeding the residual stress of the insulating film, and after grinding. The warpage of the semiconductor wafer can be reduced.
- the adhesive tape for protecting the surface of a semiconductor wafer according to the present invention is peeled off after grinding the back surface of the semiconductor wafer.
- the adhesive tape for protecting the surface of a semiconductor wafer of the present invention has a restitution coefficient ⁇ obtained by dividing the repulsive force ⁇ per unit width by the square of the thickness ⁇ of the substrate, which is determined from the loop stiffness measured under the following conditions, of 100 N / mm. 3 or more, the repulsive force ⁇ is 18 N / mm or less, and the difference in tensile breaking elongation between the longitudinal direction and the transverse direction is 35% or less.
- the adhesive tape for protecting a semiconductor wafer surface of the present invention can be wound up in a roll shape. If the coefficient of restitution ⁇ is too small, it is not preferable because the force for correcting the warpage of the wafer itself is small. On the other hand, if the repulsive force ⁇ is too large, the rigidity of the tape becomes too strong, and the tape itself is difficult to bend when the tape is peeled off, and the wafer after thin film grinding is liable to break, which is not preferable.
- the repulsive force ⁇ is 18 N / mm or less to obtain good peeling performance, preferably 10 N / mm or less, and more preferably 8 N / mm or less.
- the repulsive force ⁇ is preferably 1 N / mm or more from the viewpoint of suppressing deflection. Moreover, even if the adhesive tape for protecting the semiconductor wafer surface has rigidity capable of suppressing warpage of the semiconductor wafer after grinding, if the adhesive tape itself warps, the semiconductor wafer to which the adhesive tape is bonded is warped. It becomes. In this case, a transport error may occur when the semiconductor wafer is transported while the adhesive tape is bonded, or the edge portion of the semiconductor wafer may be warped. As a result, when the semiconductor wafer is ground, the wafer may flutter and cause edge chipping or edge cracks.
- the difference between the tensile breaking elongation in the longitudinal direction and the transverse direction is set to 35% or less. Thereby, the curvature of adhesive tape itself can be reduced.
- the loop stiffness in the present invention is an index for evaluating the restitution coefficient and repulsion force of a tape-shaped test piece.
- the loop stiffness can be obtained from the load applied to the indenter when the semiconductor wafer surface protecting adhesive tape of the present invention is formed into a loop shape and the loop-shaped test piece is pressed with the indenter and the loop is deformed.
- the loop stiffness in the present invention can be measured using, for example, a loop stiffness tester (trade name, manufactured by Toyo Seiki Co., Ltd.). The loop stiffness is measured under the following conditions (a) to (c).
- the repulsive force ⁇ of the semiconductor wafer surface protecting adhesive tape in the present invention is the load load obtained by (c) described above per width of the test piece. It means the converted one.
- the restitution coefficient ⁇ of the semiconductor wafer surface protecting adhesive tape is a value obtained by dividing the repulsion force ⁇ by the square of the base resin film of the test piece.
- the adhesive tape 20 for protecting a semiconductor wafer surface of the present invention has a specific intermediate resin layer 3 described later between a base resin film 1 and an adhesive layer 2. Further, a release film (not shown) may be laminated on the pressure-sensitive adhesive layer 2.
- the intermediate resin layer 3 is formed by transferring the intermediate resin layer composition directly onto the base resin film 1, and then the adhesive layer 2 is similarly transferred onto the intermediate resin layer 3. It can be produced by direct application.
- an acrylic polymer can be used from the viewpoint of heat resistance.
- the acrylic polymer include the following (meth) acrylic acid ester monomers and (meth) acrylic acid cycloalkyl esters as constituent components.
- Examples of the (meth) acrylic acid alkyl ester used as the monomer include methyl ester, ethyl ester, propyl ester, isopropyl ester, butyl ester, isobutyl ester, s-butyl ester, t-butyl ester, pentyl ester, Isopentyl ester, hexyl ester, heptyl ester, octyl ester, 2-ethylhexyl ester, isooctyl ester, nonyl ester, decyl ester, isodecyl ester, undecyl ester, dodecyl ester, tridecyl ester, tetradecyl ester, hexadecyl ester , Octadecyl esters, eicosyl esters, benzyl esters, etc., (meth) alkyl esters having 1 to 30 carbon atoms,
- Examples of the (meth) acrylic acid cycloalkyl ester used as the monomer include cyclopentyl ester and cyclohexyl ester.
- An acrylic polymer using one or more of these monomers as a constituent component can be used as the base resin component of the intermediate resin component.
- n-butyl methacrylate (n-BMA) is preferable from the viewpoint of improving flexibility due to an increase in the distance between cross-linking points.
- These (meth) acrylic acid ester monomers are preferably used as the main constituent (for example, 90 to 100%) in the acrylic polymer.
- an acrylic polymer used as a base resin component of the intermediate resin layer composition an acrylic copolymer containing as a constituent component another monomer copolymerizable with the (meth) acrylic acid alkyl ester or cycloalkyl ester.
- an acrylic copolymer containing as a constituent component another monomer copolymerizable with the (meth) acrylic acid alkyl ester or cycloalkyl ester can be mentioned.
- one or more of the following monomers can be used.
- Carboxyl group-containing monomers such as acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid (2) acid anhydride single monomer Forms Anhydride monomer such as maleic anhydride, itaconic anhydride (3) Hydroxy-containing monomer (2-hydroxyethyl (meth) acrylate), 2-hydroxypropyl (meth) acrylate, (meth) acrylic acid 4 -Hydroxybutyl, 6-hydroxyhexyl (meth) acrylate, 8-hydroxyoctyl (meth) acrylate, 10-hydroxydecyl (meth) acrylate, 12-hydroxylauryl (meth) acrylate, (4-hydroxymethylcyclohexyl) ) Hydroxyl group-containing monomer such as methyl acrylate
- polyfunctional monomers can be used.
- examples include methylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, and dipentaerythritol hexa (meth) acrylate.
- These polyfunctional monomers can also be used alone or in combination of two or more.
- the acrylic polymer preferably has a hydroxyl group and a carboxyl group.
- the hydroxyl value of the acrylic polymer is preferably 1-30, more preferably 1-10.
- the hydroxyl value refers to a value measured by a method based on JIS K 0070.
- the acid value of the acrylic polymer is preferably 1 to 20, and more preferably 1 to 15.
- the acid value means a value measured by the method described in JIS K 5407.
- the hydroxyl group reacts with an isocyanate cross-linking agent or an isocyanurate cross-linking agent used as a cross-linking agent described later to cross-link the intermediate resin layer.
- a carboxyl group reacts with the epoxy crosslinking agent used as a below-mentioned crosslinking agent, and bridge
- the acrylic polymer can be obtained by subjecting one or more monomer mixtures to polymerization.
- the polymerization can be performed by any method such as solution polymerization, emulsion polymerization, bulk polymerization, suspension polymerization and the like.
- the weight average molecular weight of the acrylic polymer is preferably 50,000 or more, more preferably about 100,000 to 1,000,000.
- the weight average molecular weight of the acrylic polymer can be measured by the method described later.
- Other resins can be blended in the intermediate resin layer composition as long as it is compatible with the acrylic polymer.
- Cohesive force can be added to the intermediate resin layer by crosslinking the acrylic polymer.
- the intermediate resin layer is formed between the base resin film layer and the adhesive layer.
- warpage of the semiconductor wafer can be suppressed.
- this effect can be achieved even when a polyimide film is formed on the surface of the semiconductor wafer.
- a crosslinking agent is mix
- the crosslinking agent examples include, as described above, an isocyanate crosslinking agent, an isocyanurate crosslinking agent, an epoxy crosslinking agent, a metal chelate crosslinking agent, an aziridine crosslinking agent, and an amine resin corresponding to the base resin component.
- the intermediate resin layer composition may contain various additive components as desired within a range not impairing the object of the present invention.
- polyurethane acrylate can be used in addition to the acrylic polymer.
- the polyurethane acrylate include those having the following urethane (meth) acrylate monomers as constituent components.
- isobornyl (meth) acrylate, dicyclopentenyl (meth) acrylate, phenylhydroxypropyl acrylate, and the like can be given. These can use 1 type (s) or 2 or more types.
- the urethane acrylate oligomer can be diluted with a photopolymerizable monomer, coated and dried, and effected by ultraviolet irradiation or the like, and this method is preferred as a method for forming the intermediate layer.
- the polyurethane acrylate preferably has a hydroxyl group and a carboxyl group.
- the hydroxyl value of the polyurethane acrylate is preferably 1 to 30, more preferably 1 to 10.
- the hydroxyl value means a value measured according to the following JIS K 0070.
- the acid value of the polyurethane acrylate is preferably 1-20, and more preferably 1-15.
- the acid value is a value measured by the method described in JIS K 5601-2-1.
- the hydroxyl group reacts with an isocyanate-based cross-linking agent or an isocyanurate-based cross-linking agent used as a cross-linking agent, which will be described later, to cross-link the intermediate resin layer.
- a carboxyl group reacts with the epoxy type crosslinking agent used as a below-mentioned crosslinking agent, and bridge
- polyurethane acrylate is used as the intermediate resin layer, a cohesive force can be applied to the intermediate resin layer as in the case of the acrylic polymer, and the surface of the semiconductor wafer ground to a thickness of 100 ⁇ m or less. This effect can be achieved even when a polyimide film is formed.
- the intermediate resin layer of the adhesive tape for protecting a semiconductor wafer surface of the present invention can provide cushioning properties to the base resin film, and can relieve the tension applied when the adhesive tape is bonded.
- the intermediate resin layer preferably has a higher elastic modulus than the pressure-sensitive adhesive layer.
- the preferable range of the glass transition point (Tg) by DSC of the intermediate resin layer after crosslinking is ⁇ 10 ° C. to 30 ° C., more preferably 0 ° C. to 20 ° C. If the glass transition temperature after crosslinking of the intermediate layer is too low, the semiconductor wafer surface protecting adhesive tape has flexibility, so that the cushioning property is improved, but the thin film grindability may be lowered.
- a high pressure is applied to the semiconductor wafer. If the thin film grindability is low, the semiconductor wafer may be cracked due to the sinking effect of the surface protecting adhesive tape at the high pressure.
- dry polishing, chemical mechanical polishing, polygrinding, etc. are performed to finish the back surface in a mirror state in order to increase the strength of the semiconductor wafer. There may be many cracks due to the sinking of the protective adhesive tape.
- the glass transition temperature after cross-linking of the intermediate resin layer is too high, the cushioning property is lowered, and when the patterned wafer is processed, the semiconductor wafer may be cracked.
- cures by radiation irradiation may be used for the intermediate resin layer composition, and you may make it harden
- the thickness of the intermediate resin layer is preferably 10 to 100 ⁇ m, more preferably 20 to 80 ⁇ m, and more preferably 30 to 70 ⁇ m, from the viewpoint of cushioning in the back grinding process. If the intermediate resin layer is too thin, the cushioning property during the back surface grinding process is reduced, and if the intermediate resin layer is too thick, the probability that the wafer is broken from the center due to the sinking effect during thin film grinding is increased. This phenomenon is particularly noticeable in the polishing process used in thin film grinding, which is considered to be because the pressure on the wafer is higher than in the grinding process.
- the intermediate resin layer may have a configuration in which a plurality of layers are laminated.
- the base resin film refers to the layer having the highest elastic modulus among the materials (types) constituting the semiconductor wafer surface protecting adhesive tape of the present invention.
- the base resin film can protect the semiconductor wafer from warping and can prevent warping of the semiconductor wafer while protecting the semiconductor wafer from the back surface grinding and back surface polishing.
- the base resin film needs to have water resistance against water washing or the like at the time of back surface grinding or back surface polishing of the semiconductor wafer, and to have flexibility enough to hold the semiconductor wafer. More importantly, the correction force can be applied to the warp stress of the semiconductor wafer caused by the residual stress in the insulating film such as polyimide on the semiconductor wafer.
- the base resin film is not particularly limited as long as it satisfies these characteristics.
- a resin composition containing a polyester resin such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or polybutylene terephthalate (PBT) Polyimide is preferred. More preferably, it is PET or PEN. It is preferable to use a polyester-based resin for the outermost layer on the side opposite to the pressure-sensitive adhesive layer because heat resistance can be imparted simultaneously.
- the semiconductor wafer surface protecting adhesive tape of the present invention is stuck to the semiconductor wafer surface and adsorbed to the semiconductor wafer holding member (for example, a chuck table) with the base resin film surface of the tape, Even if heating is performed when the dicing die-bonding tape is bonded to the back surface of the semiconductor wafer, it is possible to reduce the adhesion of the surface-protecting adhesive tape to the chuck table. For this reason, wafer cracking can be reduced.
- flexibility rather than a polyester-type resin with a polyester-type resin can be used as a base resin film.
- the resin composition which blended 2 or more types of resin it can be set as the base material which gave rigidity and a softness
- a resin composition in which a thermoplastic elastomer is blended with a polyester-based resin can be used as the base resin film.
- a semiconductor wafer with an 8-inch polyimide film to which the adhesive tape for protecting the surface of the semiconductor wafer of the present invention is bonded has a warp correction rate of 75% or less and an 8-inch semiconductor with a polyimide film formed on the surface.
- the surface warp adhesive tape is bonded to the wafer surface and the back surface of the semiconductor wafer is ground to a thickness of 50 ⁇ m.
- the amount of forward warping of the 8-inch wafer to which the adhesive tape is bonded is 20 mm or less. preferable.
- the base resin film is preferably a radiation transmissive one.
- the thickness of the base resin film is not particularly limited, but is preferably 10 to 500 ⁇ m, more preferably 40 to 500 ⁇ m, and particularly preferably 80 to 250 ⁇ m.
- the base film 3 is a polyester resin, the thickness of the base resin film is preferably 12 to 80 ⁇ m.
- an acrylic pressure-sensitive adhesive is preferable, specifically, an acrylic polymer selected from a homopolymer and a copolymer having an acrylate ester as a main constituent monomer unit, and other functional monomers. Copolymers and mixtures of these polymers are used.
- the acrylic ester ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, glycidyl acrylate, 2-hydroxyethyl acrylate, etc.
- monomers such as acrylic acid, methacrylic acid, acrylonitrile, and vinyl acetate may be copolymerized for the purpose of controlling adhesiveness and cohesive force.
- the pressure-sensitive adhesive as described above can further set the pressure-sensitive adhesive force and cohesive force to arbitrary values by using a crosslinking agent.
- a crosslinking agent include a polyvalent isocyanate compound, a polyvalent epoxy compound, a polyvalent aziridine compound, and a chelate compound.
- Specific examples of the polyvalent isocyanate compound include toluylene diisocyanate, diphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, and adduct type compounds thereof.
- Specific examples of the polyvalent epoxy compound include ethylene glycol diglycidyl ether, terephthalic acid diglycidyl ester acrylate, and the like.
- polyvalent aziridine compound examples include tris-2,4,6- (1-aziridinyl) -1,3,5-triazine, tris [1- (2-methyl) -aziridinyl] phosphine oxide, hexa [ 1- (2-Methyl) -aziridinyl] triphosphatriazine and the like are used.
- chelate compound specifically, ethyl acetoacetate aluminum diisopropylate, aluminum tris (ethyl acetoacetate) or the like is used.
- any of a radiation-curable pressure-sensitive adhesive that is peeled off by reducing the adhesive strength by radiation irradiation and a pressure-sensitive adhesive that is not cured by radiation are used as appropriate. can do.
- an adhesive that is not cured by radiation is referred to as a pressure-sensitive adhesive tape.
- the pressure-sensitive adhesive is pressure sensitive, the adhesive strength to the SUS polished surface at 20 to 25 ° C. is 0.5 N / 25 mm or more, and the adhesive strength to the SUS polished surface at 50 ° C. is 0.5 N / 25 mm or less. It is preferable.
- the adhesive strength to the SUS polished surface at 20 to 25 ° C. is too low, the holding force is not sufficient, and the wafer may be displaced or cracked during backside grinding of the wafer.
- the adhesive strength to the SUS polished surface at 20 to 25 ° C. is 1.0 N / 25 mm or more.
- the pressure-sensitive adhesive tape is peeled off by heating. If the adhesive force to the SUS polished surface by heat peeling at 50 ° C. is too large, the peeling after thin film grinding may be hindered and the wafer may be cracked.
- the pressure-sensitive adhesive tape of the present invention preferably has an adhesive strength to a SUS280 polished surface at 50 ° C. of 0.3 N / 25 mm or less.
- the “SUS polished surface” is a SUS304 steel plate defined in JIS G 4305, finished using JIS R 6253, No. 280 abrasive paper, based on JIS Z 0237. Say something.
- the weight average molecular weight of the base resin is preferably 1,000,000 or more. If the molecular weight is too small, organic contaminants tend to adhere to the wafer surface, which is not preferable. Although there is no restriction
- the weight average molecular weight can be measured by GPC (gel permeation chromatograph) under the following conditions.
- GPC device HLC-8120GPC (trade name, manufactured by Tosoh Corporation) Column: TSK gel SuperHM-H / H4000 / H3000 / H2000 (trade name, manufactured by Tosoh Corporation) Flow rate: 0.6 mL / min, Concentration: 0.3% by mass Injection volume: 20 ⁇ L, Column temperature: 40 ° C
- a radiation-curable pressure-sensitive adhesive can be used as the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer.
- the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer is a polymer containing an acrylic monomer having a radiation-polymerizable carbon-carbon double bond-containing group with respect to the main chain as a constituent unit (hereinafter referred to as polymer (a). It is preferable to use a base resin whose main component is. In this specification, this polymer (a) is also called a reactive polymer.
- the polymer (a) may be produced by any method.
- a copolymer (a1) comprising (meth) acrylic acid ester, hydroxyl group-containing unsaturated compound, carboxyl group-containing unsaturated compound, and the like. Obtained by subjecting a compound (a2) having a carbon-carbon double bond and a functional group capable of undergoing an addition reaction to the functional group of the copolymer (a1). Things.
- Examples of the (meth) acrylic acid ester include hexyl acrylate, n-octyl acrylate, isooctyl acrylate, 2-ethylhexyl acrylate, dodecyl acrylate, decyl acrylate, or a monomer having 5 or less carbon atoms. Specific examples include pentyl acrylate, n-butyl acrylate, isobutyl acrylate, ethyl acrylate, methyl acrylate, and methacrylates similar to these. In this case, as the monomer having a larger carbon number is used as the monomer, the glass transition point becomes lower, so that the desired glass transition point can be produced.
- a low molecular compound having a carbon-carbon double bond such as vinyl acetate, styrene or acrylonitrile can be added within the range of 5% by mass or less for the purpose of improving compatibility and various performances. .
- hydroxyl group-containing unsaturated compounds examples include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, and the like.
- carboxyl group-containing unsaturated compound examples include acrylic acid and methacrylic acid.
- the functional group of the copolymer (a1) is a carboxyl group or a cyclic acid anhydride group.
- a hydroxyl group, an epoxy group, an isocyanate group, etc. can be mentioned.
- the functional group of (a2) is a hydroxyl group, a cyclic acid anhydride group, an isocyanate group, etc. can be mentioned.
- the functional group of (a2) is an amino group, an isocyanate group can be exemplified.
- the compound (a2) include acrylic acid, methacrylic acid, cinnamic acid, itaconic acid, fumaric acid, phthalic acid, 2-hydroxyalkyl acrylates, 2-hydroxyalkyl methacrylates, glycol monoacrylates, glycol monoacrylate.
- Methacrylates N-methylolacrylamide, N-methylolmethacrylamide, allyl alcohol, N-alkylaminoethyl acrylates, N-alkylaminoethyl methacrylates, acrylamides, methacrylamides, maleic anhydride, itaconic anhydride, fumaric anhydride Acid, phthalic anhydride, glycidyl acrylate, glycidyl methacrylate, allyl glycidyl ether, a part of isocyanate groups of polyisocyanate compounds are hydroxyl groups or carboxyl groups and photopolymerizable carbon It is possible to enumerate such as those urethanization a monomer having a carbon-carbon double bond.
- a ketone, ester, alcohol, or aromatic solvent can be used as the organic solvent when the copolymerization is performed by solution polymerization.
- solvents for acrylic polymers such as toluene, ethyl acetate, isopropyl alcohol, benzene methyl cellosolve, ethyl cellosolve, acetone, methyl ethyl ketone, and solvents having a boiling point of 60 to 120 ° C.
- polymerization initiators include ⁇ , ⁇ Radical generators such as azobis compounds such as' -azobisisobutylnitrile and organic peroxide compounds such as benzoberperoxide are usually used.
- a catalyst and a polymerization inhibitor can be used in combination, the polymerization temperature and the polymerization time are adjusted, and then an addition reaction at a functional group is performed, whereby an acrylic copolymer (a ) Can be obtained.
- a mercaptan or carbon tetrachloride solvent it is preferable to use a mercaptan or carbon tetrachloride solvent.
- the copolymerization is not limited to solution polymerization, and other methods such as bulk polymerization and suspension polymerization may be used.
- the pressure-sensitive adhesive force can be further reduced by irradiating the pressure-sensitive adhesive layer with radiation, particularly preferably ultraviolet rays.
- a photopolymerizable compound include photopolymerizable carbon in a molecule that can be three-dimensionally reticulated by light irradiation as disclosed in, for example, JP-A-60-196956 and JP-A-60-223139. -Low molecular weight compounds having at least two carbon double bonds are widely used.
- trimethylolpropane triacrylate pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, 1,4-butylene glycol diacrylate, 1,6-hexane Diol diacrylate, polyethylene glycol diacrylate, commercially available oligoester acrylate, and the like are used.
- photoinitiators include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyldiphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, dibenzyl, diacetyl, ⁇ -Chloranthraquinone and the like.
- the photoinitiator is usually used in an amount of 0.1 to 10 parts by mass with respect to 100 parts by mass of the photopolymerizable compound.
- a release liner (not shown) can be provided on the adhesive layer 2 of the adhesive tape 20 for protecting a semiconductor wafer surface of the present invention shown in FIG.
- a release liner a polyethylene terephthalate film subjected to silicon release treatment or the like is used. If necessary, polypropylene or the like that is not subjected to silicon release treatment is also used.
- the adhesive tape for surface protection of a semiconductor wafer of the present invention has a warp correction rate C represented by the following formula (1) of 75% or less in a semiconductor wafer with an 8-inch polyimide film to which the tape is bonded. Can do. More preferably, the warp correction rate C can be 50% or less.
- C (A / B) ⁇ 100 Formula (1)
- A, B, and C represent the following.
- a surface protective adhesive tape is bonded to the polyimide film surface of an 8-inch silicon semiconductor wafer, and the back surface of the semiconductor wafer is The amount of forward warping (mm) of the 8-inch wafer to which the adhesive tape was ground after being ground to a thickness of 50 ⁇ m
- B A polyimide film having a thickness of 6 ⁇ m is formed on the surface, the thickness of the whole wafer is 725 ⁇ m, and an adhesive tape for surface protection is bonded to the surface of the polyimide film of an 8-inch diameter silicon semiconductor wafer, The amount of forward warping (mm) of the 8-inch wafer after grinding to 50 ⁇ m thickness and peeling of the adhesive tape
- C Warpage correction rate (%)
- the polyimide film is non-photosensitive polyimide PIX-3400 (trade name, manufactured by Hitachi Chemical DuPont Microsystems Co., Ltd.), and the film thickness after drying is 6 ⁇ m while edge rinsing with a spin coater.
- a silicon semiconductor wafer having a diameter of 8 inches is applied, and then prebaked at 200 ° C. for 30 minutes, followed by baking at 350 ° C. for 1 hour to form a polyimide film having a thickness of 6 ⁇ m.
- the stress relaxation effect of the intermediate resin layer reduces the tension applied at the time of tape bonding.
- the layer including the base resin film layer, the intermediate resin layer and the pressure-sensitive adhesive layer is subjected to stress during grinding evenly in the vertical and horizontal directions. Without setting a proper bonding condition, the warp correction rate exceeding the residual stress of the polyimide insulating film can be exhibited, and the warpage of the semiconductor wafer after grinding can be reduced.
- an insulating film such as polyimide formed on the surface of a semiconductor wafer is often crosslinked by heating or the like. For this reason, residual stress may exist in the insulating film. Even in this case, even if the semiconductor wafer surface protective adhesive tape of the present invention is bonded to the wafer surface and ground, the warp correction rate exceeding the residual stress of the insulating film is exhibited and the warp of the semiconductor wafer after grinding is reduced. be able to.
- Example 1 For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, the adduct isocyanate crosslinker Coronate L ( 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
- an acrylic copolymer having an acid value of 10 and a hydroxyl value of 2
- n-butyl methacrylate as a main component and having a hydroxyl group and a carboxyl group as monomers of other components
- 2 parts by mass of adduct isocyanate crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane) and 2 parts by mass of epoxy crosslinking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical) are mixed with ethyl acetate. Were adjusted to obtain an intermediate resin layer composition.
- the intermediate resin layer composition was applied on one side of a 38 ⁇ m thick polyethylene terephthalate base resin film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 42 ⁇ m.
- the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C.
- This glass transition temperature is a value measured by a differential scanning calorimeter (DSC).
- said adhesive composition was apply
- the weight average molecular weight of the acrylic copolymer was measured by GPC (gel permeation chromatography) under the following conditions.
- GPC device HLC-8120GPC (trade name, manufactured by Tosoh Corporation)
- Flow rate 0.6 mL / min
- Concentration 0.3% by mass Injection volume: 20 ⁇ L
- the weight average molecular weight was measured in the same manner, and the results are shown in Tables 1 to 3.
- the glass transition temperature of the intermediate resin layer was measured by DSC as in Example 1.
- Example 2 For 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, adduct isocyanate crosslinking agent Coronate L (product Name, manufactured by Nippon Polyurethane Co., Ltd.) and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
- Coronate L product Name, manufactured by Nippon Polyurethane Co., Ltd.
- Irgacure 184 trade name, manufactured by Ciba Japan Co., Ltd.
- the intermediate resin layer composition was applied on one side of a 38 ⁇ m thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 42 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was ⁇ 15 ° C. Furthermore, a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 20 ⁇ m is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
- PET polyethylene terephthalate base film
- Example 3 For 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, adduct isocyanate crosslinking agent Coronate L (product Name, manufactured by Nippon Polyurethane Co., Ltd.) and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
- Coronate L product Name, manufactured by Nippon Polyurethane Co., Ltd.
- Irgacure 184 trade name, manufactured by Ciba Japan Co., Ltd.
- polyisocyanate cross-linking agent TKA-100 (trade name, manufactured by Asahi Kasei Chemicals Corporation) with respect to 100 parts by mass of an acrylic copolymer having a hydroxyl group (hydroxyl value 35) having n-butyl methacrylate as one of the constituent components. 12 parts by mass, and the concentration was adjusted with ethyl acetate to obtain an intermediate resin layer composition.
- the intermediate resin layer composition was applied onto one side of a 25 ⁇ m thick polyethylene naphthalate base film (PEN) and then dried to laminate an intermediate resin layer having a dry film thickness of 50 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 30 ° C.
- a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 ⁇ m is laminated to form a semiconductor.
- An adhesive tape for protecting the wafer surface was produced.
- Example 4 4 parts by mass of an isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is blended with 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 1,000,000, and the concentration is adjusted with ethyl acetate. Produced.
- Coronate L trade name, manufactured by Nippon Polyurethane Co., Ltd.
- the intermediate resin layer composition was applied on one side of a 38 ⁇ m thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 62 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was ⁇ 10 ° C. Further, a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 ⁇ m is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
- PET polyethylene terephthalate base film
- Example 5 2 parts by mass of isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane) and 100% by mass of acrylic copolymer having a weight average molecular weight of 1,200,000 and epoxy-based crosslinking agent TETRAD-C (trade name, Mitsubishi Gas Chemical) 4 parts by mass) was prepared, and the pressure-sensitive adhesive composition was prepared by adjusting the concentration with ethyl acetate.
- Coronate L trade name, manufactured by Nippon Polyurethane
- TETRAD-C trade name, Mitsubishi Gas Chemical
- adduct isocyanate coronate L 100 parts by mass of an acrylic copolymer having a main component of n-butyl methacrylate and having a hydroxyl group and a carboxyl group (acid value 11 and hydroxyl value 3) ( 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
- the intermediate resin layer composition was applied on one side of a 38 ⁇ m thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 42 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C. Furthermore, a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 20 ⁇ m is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
- PET polyethylene terephthalate base film
- Example 6 0.5 parts by mass of an isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is blended with 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000, and the concentration is adjusted with ethyl acetate. A product was made.
- Coronate L trade name, manufactured by Nippon Polyurethane Co., Ltd.
- adduct isocyanate coronate L 100 parts by mass of an acrylic copolymer having a main component of n-butyl methacrylate and having a hydroxyl group and a carboxyl group (acid value: 12, hydroxyl value: 5) ( 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 4 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, produced by Mitsubishi Gas Chemical Co., Ltd.), adjusting the concentration with ethyl acetate, and intermediate resin layer composition Got.
- the intermediate resin layer composition was applied on one side of a 50 ⁇ m thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 50 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 15 ° C. Further, a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 ⁇ m is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
- PET polyethylene terephthalate base film
- Example 7 4 parts by mass of isocyanate cross-linking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) per 100 parts by mass of an acrylic base resin having a molecular weight of 700,000 which is a copolymer of 2-ethylhexyl acrylate, methyl acrylate and 2-hydroxyethyl acrylate 1 part by mass of 100 parts of tetramethylolmethane tetraacrylate having a photopolymerizable carbon-carbon double bond as an oligomer and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan), and the concentration is adjusted with ethyl acetate.
- Coronate L trade name, manufactured by Nippon Polyurethane Co., Ltd.
- adduct isocyanate coronate L 100 parts by mass of an acrylic copolymer having n-butyl methacrylate as a main component and having a hydroxyl group and a carboxyl group (acid value 11 and hydroxyl value 2) ( 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
- the intermediate resin layer composition was applied on one side of a 38 ⁇ m thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 42 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C. Furthermore, a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 20 ⁇ m is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
- PET polyethylene terephthalate base film
- Example 8 1.5 parts by mass of the isocyanate-based cross-linking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is blended with 100 parts by mass of the acrylic copolymer having a weight average molecular weight of 800,000, and the concentration is adjusted with ethyl acetate. A product was made.
- Coronate L trade name, manufactured by Nippon Polyurethane Co., Ltd.
- an epoxy crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) and 100 parts by mass of an epoxy crosslinking agent with respect to 100 parts by mass of a polyurethane acrylate having a hydroxyl group and a carboxyl group (acid value: 2, hydroxyl value: 35) 4 parts by mass of the agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company) was blended, and the concentration was adjusted with ethyl acetate to obtain an intermediate resin layer composition.
- the intermediate resin layer composition was applied onto one side of a 25 ⁇ m thick polyethylene naphthalate base film (PEN) and then dried to laminate an intermediate resin layer having a dry film thickness of 50 ⁇ m.
- PEN polyethylene naphthalate base film
- the glass transition temperature after crosslinking of the intermediate resin layer was 30 ° C.
- a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 ⁇ m is laminated to form a semiconductor.
- An adhesive tape for protecting the wafer surface was produced.
- Example 9 For 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, adduct isocyanate crosslinking agent Coronate L (product Name, manufactured by Nippon Polyurethane Co., Ltd.) and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
- Coronate L product Name, manufactured by Nippon Polyurethane Co., Ltd.
- Irgacure 184 trade name, manufactured by Ciba Japan Co., Ltd.
- an adduct isocyanate coronate L 100 parts by mass of an acrylic copolymer having a hydroxyl group and a carboxyl group (acid value is 10 and hydroxyl value is 2) having n-butyl methacrylate as one of the constituent components. 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
- a trade name manufactured by Nippon Polyurethane Co., Ltd.
- TETRAD-C trade name, manufactured by Mitsubishi Gas Chemical Company
- the intermediate resin layer composition was applied on one side of a 75 ⁇ m thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 25 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C. Further, a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 ⁇ m is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
- PET polyethylene terephthalate base film
- Example 10> For 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, adduct isocyanate crosslinking agent Coronate L (product Name, manufactured by Nippon Polyurethane Co., Ltd.) and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
- Coronate L product Name, manufactured by Nippon Polyurethane Co., Ltd.
- Irgacure 184 trade name, manufactured by Ciba Japan Co., Ltd.
- an adduct isocyanate coronate L 100 parts by mass of an acrylic copolymer having a hydroxyl group and a carboxyl group (acid value is 10 and hydroxyl value is 2) having n-butyl methacrylate as one of the constituent components. 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
- a trade name manufactured by Nippon Polyurethane Co., Ltd.
- TETRAD-C trade name, manufactured by Mitsubishi Gas Chemical Company
- the intermediate resin layer composition was applied on one side of a polyimide base film having a thickness of 40 ⁇ m and then dried to laminate an intermediate resin layer having a dry film thickness of 30 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was ⁇ 5 ° C. Further, a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 ⁇ m is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
- Example 11 For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, the adduct isocyanate crosslinker Coronate L ( 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
- the adduct isocyanate crosslinker Coronate L 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl a
- An isocyanate-based cross-linking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is 0.5 per 100 parts by mass of an acrylic copolymer having a hydroxyl group with a weight average molecular weight of 400,000 (acid value is 4, hydroxyl value is 33).
- An intermediate resin layer composition was prepared by blending parts by mass and adjusting the concentration with ethyl acetate. The intermediate resin layer composition was applied on one side of a 38 ⁇ m thick polyethylene terephthalate substrate film (PET), dried, and then laminated several times to laminate an intermediate resin layer having a dry film thickness of 132 ⁇ m.
- PET polyethylene terephthalate substrate film
- the glass transition temperature after crosslinking of the intermediate resin layer was ⁇ 50 ° C.
- a pressure-sensitive adhesive composition is applied on a PET separator having a thickness of 50 ⁇ m, dried and laminated on one side of a multilayer film of PET and EVA, and a pressure-sensitive adhesive layer having a thickness of 10 ⁇ m is laminated.
- An adhesive tape for protecting the surface of a semiconductor wafer was produced.
- ⁇ Comparative Example 1> For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, the adduct isocyanate crosslinker Coronate L ( 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
- the adduct isocyanate crosslinker Coronate L 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with
- adduct isocyanate coronate L for 100 parts by mass of an acrylic copolymer (having an acid value of 11 and a hydroxyl value of 2) having n-butyl methacrylate as one of the components and having a hydroxyl group and a carboxyl group ( 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
- an acrylic copolymer having an acid value of 11 and a hydroxyl value of 2
- TETRAD-C trade name, manufactured by Mitsubishi Gas Chemical Company
- the intermediate resin layer composition was applied on one side of a 40 ⁇ m thick polypropylene (PP) substrate film and then dried to laminate an intermediate resin layer having a dry film thickness of 40 ⁇ m. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C. Furthermore, a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 20 ⁇ m is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
- PP polypropylene
- Coronate L trade name, manufactured by Nippon Polyurethane Co., Ltd.
- TETRAD-C trade name, Mitsubishi 2.5 parts by mass of Gas Chemical Co., Ltd.
- a pressure-sensitive adhesive composition is applied onto a 25 ⁇ m-thick PET separator, dried and laminated on one side of a 165 ⁇ m-thick ethylene vinyl acetate copolymer (EVA) film, and the pressure-sensitive adhesive has a thickness of 40 ⁇ m.
- the adhesive layer for semiconductor wafer surface protection was produced by laminating the agent layer.
- Isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is added to 100 parts by mass of an acrylic base resin having a molecular weight of 700,000 which is a copolymer of 2-ethylhexyl acrylate, methyl acrylate and 2-hydroxyethyl acrylate.
- the pressure-sensitive adhesive composition was prepared. On one side of a polyethylene terephthalate base film (PET) having a thickness of 100 ⁇ m, the pressure-sensitive adhesive composition was applied and then dried, and a pressure-sensitive adhesive layer having a dried thickness of 15 ⁇ m was laminated. Further, a PET separator was laminated on this pressure-sensitive adhesive layer to produce a semiconductor wafer surface protective pressure-sensitive adhesive tape.
- PET polyethylene terephthalate base film
- ⁇ Comparative Example 4 4 parts by mass of isocyanate cross-linking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) per 100 parts by mass of an acrylic base resin having a molecular weight of 700,000 which is a copolymer of 2-ethylhexyl acrylate, methyl acrylate and 2-hydroxyethyl acrylate , 100 parts of tetramethylolmethane tetraacrylate having a photopolymerizable carbon-carbon double bond as an oligomer and 1 part by weight of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.), and the concentration is adjusted with ethyl acetate A pressure-sensitive adhesive composition was prepared.
- Coronate L trade name, manufactured by Nippon Polyurethane Co., Ltd.
- a pressure-sensitive adhesive composition was applied onto a PET separator having a thickness of 25 ⁇ m, dried, and a multilayer film substrate of a high-density polyethylene (HDPE) having a thickness of 30 ⁇ m and an ethylene-vinyl acetate copolymer having a thickness of 70 ⁇ m was formed.
- An adhesive tape for protecting the surface of a semiconductor wafer was prepared by laminating by sticking on an ethylene-vinyl acetate copolymer layer and laminating an adhesive layer having a thickness of 30 ⁇ m.
- ⁇ Comparative Example 5> For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, the adduct isocyanate crosslinker Coronate L ( 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
- the adduct isocyanate crosslinker Coronate L 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with
- a pressure-sensitive adhesive composition was applied onto a PET separator having a thickness of 50 ⁇ m, dried, and a multilayer film substrate of high-density polyethylene (HDPE) having a thickness of 20 ⁇ m and an ethylene-vinyl acetate copolymer having a thickness of 180 ⁇ m was formed. Lamination was performed by laminating several times on the ethylene-vinyl acetate copolymer layer, and an intermediate resin layer having a thickness of 130 ⁇ m was laminated. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was ⁇ 50 ° C.
- HDPE high-density polyethylene
- An EVA resin layer having a thickness of 50 ⁇ m was formed by extruding an ethylene vinyl acetate copolymer (EVA) resin on one surface of a polyethylene terephthalate base film (PET) having a thickness of 100 ⁇ m.
- EVA resin layer having a thickness of 150 ⁇ m was formed by extrusion using the same ethylene vinyl acetate copolymer (EVA) resin.
- the glass transition temperature of this 150 ⁇ m EVA resin layer was ⁇ 42 ° C.
- a pressure-sensitive adhesive composition is applied onto a 50 ⁇ m-thick PET separator, dried, and this pressure-sensitive adhesive layer composition layer and the above-mentioned 150 ⁇ m EVA resin layer are laminated to form a pressure-sensitive adhesive having a thickness of 30 ⁇ m.
- a semiconductor wafer surface protecting adhesive tape having a layer was prepared.
- a semiconductor wafer with a polyimide film was produced by the following method.
- the thickness of the entire wafer is 725 ⁇ m, and an 8-inch silicon semiconductor wafer is coated with non-photosensitive polyimide PIX-3400 (trade name, manufactured by Hitachi Chemical DuPont Microsystems Co., Ltd.) and edged with a spin coater. Coating was performed while rinsing so that the film thickness after drying was 6 ⁇ m. Thereafter, pre-baking was performed at 200 ° C. for 30 minutes, and main baking was performed at 350 ° C. for 1 hour to form a polyimide film having a thickness of 6 ⁇ m. Thus, an 8-inch semiconductor wafer having a total thickness of 725 ⁇ m was obtained.
- the following tests 3 to 5 were performed, and the performance was evaluated.
- Thin film grindability test (test method) 1. Using DR8500II (trade name) manufactured by Nitto Seiki Co., Ltd. as the pasting machine The adhesive tape for protecting the surface of the semiconductor wafer prepared in Examples and Comparative Examples was bonded to a silicon semiconductor wafer with a polyimide film having a thickness of 725 ⁇ m. In this case, the parameters are controlled by a regulator attached to the apparatus, and the tape winding is 0.11 MPa, the tape feeding is 0.26 MPa, the separator is 0.20 MPa, the tape presser is 0.17 MPa, and the tape is stuck. The adhesive tape for semiconductor wafer surface protection was bonded on the conditions of 0.26 MPa.
- Peel test (test method) 3. above. Twenty-five peelability tests were performed using a wafer with a polyimide film ground in a thin film grindability test, using a peeling machine (DFM2700 (trade name) manufactured by DISCO Corporation) attached to the grinder. The pressure-sensitive pressure-sensitive adhesive tape was peeled at 50 ° C., and the radiation-curing pressure-sensitive adhesive tape was measured at room temperature after irradiation with ultraviolet rays at 500 mJ / cm 2 . (Evaluation) The adhesive tape for protecting the surface of a semiconductor wafer produced in each example and each comparative example was evaluated. As a result, the determination was made as follows, and ⁇ and ⁇ were regarded as acceptable.
- Contamination test (test method) Using a DR8500II (trade name) manufactured by Nitto Seiki Co., Ltd. as the pasting machine, the adhesive tape for protecting the surface of the semiconductor wafer produced in Examples and Comparative Examples was bonded to a silicon mirror wafer having a thickness of 725 ⁇ m. did. Thereafter, the pressure-sensitive adhesive tape was peeled off at 50 ° C., and the radiation-curable pressure-sensitive adhesive tape was peeled off at room temperature after irradiation with ultraviolet rays of 500 mJ / cm 2 . Next, the element ratio of contaminants on the wafer surface after peeling the semiconductor wafer surface protecting adhesive tape was measured by XPS (X-ray photoelectron spectroscopy).
- the amount of increase in carbon derived from transfer contaminants from the adhesive tape was calculated as mol% compared to a blank wafer to which the adhesive tape was not bonded.
- XPS was measured under the following conditions. X-ray source: MgK ⁇ , X-ray Take off angle: 45 °, Measurement area: 1.1mm ⁇ (Evaluation)
- the adhesive tape for protecting the surface of a semiconductor wafer produced in each example and each comparative example was evaluated. As a result, it determined as follows and made (circle) the pass.
- C (carbon) amount (atomic%) was 25 or less: ⁇ C (carbon) content (atomic%) greater than 25: x
- Restitution coefficient and resilience measurement test (test method) Using a loop step tester (trade name) manufactured by Toyo Seiki Seisakusho Co., Ltd., the restitution coefficient ⁇ and the repulsion force ⁇ were measured.
- the semiconductor wafer surface protecting adhesive tape prepared in each Example and each Comparative Example was cut into a width of 1 cm and placed on a loop stiffness tester. At that time, a circular loop having a loop length of 50 mm was formed in the vicinity of the center of the belt-like adhesive tape having a loop length of 50 mm or more, and the load applied when the circular loop was pushed in from the outside by 5 mm was measured.
- the load obtained at this time was converted to the width of the pressure-sensitive adhesive tape, and the value displayed in mN / mm was defined as the repulsive force ⁇ .
- a value obtained by dividing the repulsive force ⁇ by the square of the thickness of the base resin film of the adhesive tape was defined as a restitution coefficient ⁇ .
- Adhesive strength measurement test at 25 ° C and 50 ° C (test method) Among the pressure-sensitive adhesive tapes for protecting the semiconductor wafer surface produced in each example and each comparative example, the adhesive strength at 50 ° C. was measured. Three test pieces each having a width of 25 mm and a length of 300 mm were collected from the adhesive tape, and finished with a No. 280 water-resistant abrasive paper specified in JIS R 6253. The thickness specified in JIS G 4305 was 1.5 mm to 2. A 2 kg rubber roller was pressure-bonded on a 0 mm SUS304 steel plate by three reciprocations. After standing for 1 hour, the adhesive strength of the test piece of the adhesive tape pressure-bonded to the SUS plate was measured at 50 ° C. and a relative humidity of 49% using a tensile tester specified in JIS B 7721. The measurement was performed by a 180-degree peeling method, and the tensile speed at this time was 300 mm / min.
- a thin film wafer having a thickness of 100 ⁇ m or less can be obtained by grinding the back surface of the semiconductor wafer while the adhesive tape for protecting the surface of the semiconductor wafer is bonded to the semiconductor wafer. Therefore, this invention is suitable as an adhesive tape for surface protection used by bonding to the surface of a semiconductor wafer.
Abstract
Description
半導体ウエハの薄厚化及び大径化の流れは、特に、NAND型やNOR型が存在するフラッシュメモリの分野や、揮発性メモリであるDRAMなどの分野で、顕著な傾向を示している。例えば、直径12インチの半導体ウエハを用いて、150μmの厚さ以下まで研削することも珍しくない。大口径の半導体ウエハを薄厚まで研削する場合、ウエハの剛性が低下し、反りが生じやすくなる。 Conventionally, the thickness of a semiconductor wafer has been reduced to about 200 to 400 μm by backside grinding. However, with the recent progress of high-density mounting technology, it is necessary to reduce the size of the semiconductor chip, and the thickness of the semiconductor wafer is being reduced. Depending on the type of semiconductor chip, it is necessary to reduce the thickness to about 100 μm. In addition, in order to increase the number of semiconductor chips that can be manufactured by one processing, the diameter of the wafer tends to be increased. Until now, wafers with diameters of 5 inches and 6 inches have been mainstream, but in recent years, processing of semiconductor chips from semiconductor wafers with diameters of 8 to 12 inches has become the mainstream.
The trend of thinning and increasing the diameter of semiconductor wafers has shown a remarkable tendency, particularly in the field of flash memory where NAND type and NOR type exist, and in the field of DRAM, which is a volatile memory. For example, it is not uncommon to grind to a thickness of 150 μm or less using a semiconductor wafer having a diameter of 12 inches. When a large-diameter semiconductor wafer is ground to a thin thickness, the rigidity of the wafer is lowered and warpage is likely to occur.
また特許文献2では、基材と粘着剤層との間に特定の範囲の貯蔵弾性率を有する中間層を有する加工用粘着シートが提案され、特許文献3では、基材フィルムが少なくとも3層からなり、該基材フィルムの、表裏の最外層と内層の貯蔵弾性率がそれぞれ特定の範囲内の半導体ウエハ保護用粘着フィルムが提案されている。さらに特許文献4では、特定の材料が積層された多層シートが提案されている。
しかし特許文献1の半導体ウエハ表面保護用粘着テープを使用する際には、半導体ウエハ加工を行った後に、剥離可能な接着剤層と剛性フィルムとの界面、剥離可能な接着剤層と応力緩和性フィルムとの界面、又は剥離可能な接着剤層を構成する層の内部で剥離するという煩雑な工程を必要とする。また、粘着剤層及び応力緩和層が何層にも重ねられており、クッション性が過剰であるため50μm厚以下に半導体ウエハを研削する場合にはウエハ割れを発生させる可能性が高い。
また、特許文献2の半導体ウエハ加工用粘着シートの半導体ウエハ保護用粘着シートを、ポリイミド膜が形成された半導体ウエハに貼合し、半導体ウエハの裏面研削を行った場合、半導体ウエハの厚さが100μm以下になると、半導体ウエハ表面にコーティングされている絶縁膜が収縮し、これにより半導体ウエハ自体も反ることがある。この場合は、半導体ウエハをウエハ固定用治具に保持する際に、半導体ウエハが落下するという問題がある。
さらに特許文献3の半導体ウエハ加工用粘着シートをポリイミド膜が形成された半導体ウエハに貼合し、半導体ウエハの裏面研削を行った場合、粘着シート付きのウエハを搬送する点については問題ないが、50μm厚以下の薄膜に半導体ウエハを研削した場合には、エッジクラックやウエハ割れが発生する場合がある。 On the other hand, a method for reducing the warpage of the semiconductor wafer by reducing the stress applied to the semiconductor wafer when the semiconductor wafer surface protecting adhesive tape is bonded to the semiconductor wafer has been proposed. For example, in
Moreover, in
However, when using the semiconductor wafer surface protecting adhesive tape of
Moreover, when the adhesive sheet for semiconductor wafer protection of the adhesive sheet for semiconductor wafer processing of
Furthermore, when the adhesive sheet for semiconductor wafer processing of
<1>基材樹脂フィルムと、該基材樹脂フィルム上にアクリル重合体及び/又はポリウレタンアクリレートを含有するベース樹脂成分が架橋された中間樹脂層を介して、直接粘着剤層を有する、半導体ウエハ表面保護用粘着テープであって、当該半導体ウエハ表面保護用粘着テープを下記条件(a)~(d)で測定したループスティフネスの負荷荷重から求められた、単位幅当りの反発力αを基材の厚さβの2乗で割った反発係数γが100mN/mm3以上であり、反発力αが13mN/mm以下であり、且つ縦方向と横方向の引張破断伸度の差が35%以下であることを特徴とする半導体ウエハ表面保護用粘着テープ。
(a)装置
ループステフネステスタ(商品名、東洋精機社製)
(b)ループ(試験片)形状
長さ50mm以上、幅10mm
(c)圧子の押し込み速度
3.3mm/sec
(d)圧子の押し込み量
圧子がループと接触した時点から5mm押し込む
<2>前記中間樹脂層のアクリル重合体が水酸基及びカルボキシル基を有することを特徴とする<1>記載の半導体ウエハ表面保護用粘着テープ。
<3>前記中間樹脂層のポリウレタンアクリレートが水酸基及びカルボキシル基を有することを特徴とする<1>記載の半導体ウエハ表面保護用粘着テープ。
<4>前記中間樹脂層の架橋後のガラス転移温度が-10℃~30℃である<1>~<3>のいずれか1項に記載の半導体ウエハ表面保護用粘着テープ。
<5>前記基材樹脂フィルムがポリエステル樹脂フィルムであることを特徴とする<1>~<4>のいずれか1項記載の半導体ウエハ表面保護用粘着テープ。
<6>前記ポリエステル樹脂フィルムがポリエチレンテレフタレートフィルムであることを特徴とする<5>記載の半導体ウエハ表面保護用粘着テープ。
<7>前記ポリエステル樹脂フィルムの厚さが25~75μmであることを特徴とする<5>又は<6>記載の半導体ウエハ表面保護用粘着テープ。
<8>前記半導体ウエハ表面保護用粘着テープが感圧型粘着テープであり、20~25℃におけるSUS研磨面に対する粘着力が0.5N/25mm以上であり、かつ50℃におけるSUS研磨面に対する粘着力が0.5N/25mm以下であることを特徴とする<1>~<7>のいずれか1項記載の半導体ウエハ表面保護用粘着テープ。
<9>前記粘着剤層を構成するベース樹脂の重量平均分子量が100万以上であることを特徴とする<8>記載の半導体ウエハ表面保護用粘着テープ。
<10>前記粘着剤層が、放射線を照射することにより粘着力が低くなることを特徴とする<1>~<7>のいずれか1項記載の半導体ウエハの表面保護用粘着テープ。
<11>前記粘着剤層が、主鎖に対して放射線重合性炭素-炭素二重結合含有基を1つ以上有するアクリル系単量体を構成単位として含む重合体を主成分とするベース樹脂を用いてなることを特徴とする<10>に記載の半導体ウエハの表面保護用粘着テープ。 That is, the present invention provides the following inventions.
<1> A semiconductor wafer having a pressure-sensitive adhesive layer directly through a base resin film and an intermediate resin layer in which a base resin component containing an acrylic polymer and / or polyurethane acrylate is crosslinked on the base resin film A surface protective adhesive tape, which is obtained by applying a repulsive force α per unit width obtained from a load load of loop stiffness measured on the semiconductor wafer surface protective adhesive tape under the following conditions (a) to (d): The restitution coefficient γ divided by the square of the thickness β of the material is 100 mN / mm 3 or more, the repulsion force α is 13 mN / mm or less, and the difference between the tensile breaking elongation in the longitudinal direction and the transverse direction is 35% or less. An adhesive tape for protecting a surface of a semiconductor wafer.
(A) Equipment Loop step tester (trade name, manufactured by Toyo Seiki Co., Ltd.)
(B) Loop (test piece) shape Length 50 mm or more, width 10 mm
(C) Indenter pushing speed 3.3 mm / sec
(D) Indentation amount of indenter 5 mm from the point of contact of the indenter with the loop <2> The acrylic polymer of the intermediate resin layer has a hydroxyl group and a carboxyl group, for protecting a semiconductor wafer surface according to <1> Adhesive tape.
<3> The adhesive tape for protecting a semiconductor wafer surface according to <1>, wherein the polyurethane acrylate of the intermediate resin layer has a hydroxyl group and a carboxyl group.
<4> The adhesive tape for protecting a semiconductor wafer surface according to any one of <1> to <3>, wherein the glass transition temperature after crosslinking of the intermediate resin layer is −10 ° C. to 30 ° C.
<5> The adhesive tape for protecting a semiconductor wafer surface according to any one of <1> to <4>, wherein the base resin film is a polyester resin film.
<6> The adhesive tape for protecting a semiconductor wafer surface according to <5>, wherein the polyester resin film is a polyethylene terephthalate film.
<7> The adhesive tape for protecting a semiconductor wafer surface according to <5> or <6>, wherein the polyester resin film has a thickness of 25 to 75 μm.
<8> The adhesive tape for protecting a semiconductor wafer surface is a pressure-sensitive adhesive tape, has an adhesive strength to a SUS polished surface at 20 to 25 ° C. of 0.5 N / 25 mm or more, and has an adhesive strength to a SUS polished surface at 50 ° C. The adhesive tape for protecting a semiconductor wafer surface according to any one of <1> to <7>, wherein the adhesive tape is 0.5 N / 25 mm or less.
<9> The adhesive tape for protecting a semiconductor wafer surface according to <8>, wherein the weight average molecular weight of the base resin constituting the pressure-sensitive adhesive layer is 1,000,000 or more.
<10> The adhesive tape for protecting a surface of a semiconductor wafer according to any one of <1> to <7>, wherein the adhesive layer has low adhesive strength when irradiated with radiation.
<11> A base resin whose main component is a polymer in which the pressure-sensitive adhesive layer contains, as a constituent unit, an acrylic monomer having at least one radiation-polymerizable carbon-carbon double bond-containing group with respect to the main chain. The adhesive tape for surface protection of a semiconductor wafer according to <10>, wherein the tape is used.
図1は本発明の半導体ウエハ表面保護用粘着テープの好ましい一実施形態を示す概略断面図である。図1からわかるように、基材樹脂フィルム1と、基材樹脂フィルム1上に粘着剤層2が、中間樹脂層3を介して基材樹脂フィルム1上に形成されている。 A preferred semiconductor wafer surface protecting adhesive tape of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic sectional view showing a preferred embodiment of the adhesive tape for protecting a semiconductor wafer surface of the present invention. As can be seen from FIG. 1, the
反発係数がこの範囲内であれば、本発明の半導体ウエハ表面保護用粘着テープをロール状に巻取ることができる。反発係数γが小さすぎる場合には、ウエハ自体の反りを矯正する力が少ないため好ましくない。一方、反発力αが大きすぎると、テープの剛性が強くなりすぎて、テープを剥離する際にテープ自体が曲がりにくくなり、薄膜研削後のウエハが割れやすくなるため好ましくない。反発力αは、18N/mm以下で良好な剥離性能が得られ、好ましくは10N/mm以下であり、更に好ましくは8N/mm以下である。反発力αは、たわみ抑制の点から、1N/mm以上であることが好ましい。
また、半導体ウエハ表面保護用粘着テープに研削後の半導体ウエハの反りを抑えられる剛性があったとしても、該粘着テープ自身が反ると、該粘着テープが貼合された半導体ウエハが反る結果となる。この場合、該粘着テープを貼合したまま半導体ウエハを搬送する場合の搬送エラーが起きたり、半導体ウエハのエッジ部が反ることがある。これにより、半導体ウエハ研削時に該ウエハがバタついてエッジチッピングやエッジクラックを発生させることがある。そこで、半導体ウエハ表面保護用粘着テープ自体の反りを抑制するため、縦方向と横方向の引張破断伸度の差が35%以下とする。これにより、粘着テープ自身の反りを低減することができる。 The adhesive tape for protecting the surface of a semiconductor wafer according to the present invention is peeled off after grinding the back surface of the semiconductor wafer. The adhesive tape for protecting the surface of a semiconductor wafer of the present invention has a restitution coefficient γ obtained by dividing the repulsive force α per unit width by the square of the thickness β of the substrate, which is determined from the loop stiffness measured under the following conditions, of 100 N / mm. 3 or more, the repulsive force α is 18 N / mm or less, and the difference in tensile breaking elongation between the longitudinal direction and the transverse direction is 35% or less.
If the coefficient of restitution is within this range, the adhesive tape for protecting a semiconductor wafer surface of the present invention can be wound up in a roll shape. If the coefficient of restitution γ is too small, it is not preferable because the force for correcting the warpage of the wafer itself is small. On the other hand, if the repulsive force α is too large, the rigidity of the tape becomes too strong, and the tape itself is difficult to bend when the tape is peeled off, and the wafer after thin film grinding is liable to break, which is not preferable. The repulsive force α is 18 N / mm or less to obtain good peeling performance, preferably 10 N / mm or less, and more preferably 8 N / mm or less. The repulsive force α is preferably 1 N / mm or more from the viewpoint of suppressing deflection.
Moreover, even if the adhesive tape for protecting the semiconductor wafer surface has rigidity capable of suppressing warpage of the semiconductor wafer after grinding, if the adhesive tape itself warps, the semiconductor wafer to which the adhesive tape is bonded is warped. It becomes. In this case, a transport error may occur when the semiconductor wafer is transported while the adhesive tape is bonded, or the edge portion of the semiconductor wafer may be warped. As a result, when the semiconductor wafer is ground, the wafer may flutter and cause edge chipping or edge cracks. Therefore, in order to suppress the warpage of the semiconductor wafer surface protecting adhesive tape itself, the difference between the tensile breaking elongation in the longitudinal direction and the transverse direction is set to 35% or less. Thereby, the curvature of adhesive tape itself can be reduced.
本発明におけるループスティフネスは、例えば、ループステフネステスタ(商品名、東洋精機社製)を用いて測定することができる。ループスティフネスは、以下の条件(a)~(c)で測定される。
(a)ループ(試験片)形状
長さ50mm以上、幅10mm
(b)圧子の押し込み速度
3.3mm/sec
(c)圧子の押し込み量
圧子がループと接触した時点から5mm押し込む
本発明における半導体ウエハ表面保護用粘着テープの反発力αは、上記の(c)により得られる負荷荷重を試験片の幅当たりで換算したものをいう。また半導体ウエハ表面保護用粘着テープの反発係数γは、該反発力αを試験片の基材樹脂フィルムの2乗で割った値をいう。 The loop stiffness in the present invention is an index for evaluating the restitution coefficient and repulsion force of a tape-shaped test piece. The loop stiffness can be obtained from the load applied to the indenter when the semiconductor wafer surface protecting adhesive tape of the present invention is formed into a loop shape and the loop-shaped test piece is pressed with the indenter and the loop is deformed.
The loop stiffness in the present invention can be measured using, for example, a loop stiffness tester (trade name, manufactured by Toyo Seiki Co., Ltd.). The loop stiffness is measured under the following conditions (a) to (c).
(A) Loop (test piece) shape 50 mm or more in length and 10 mm in width
(B) Indenter pushing speed 3.3 mm / sec
(C) Pushing amount of indenter Push in 5 mm from the time when the indenter comes into contact with the loop. The repulsive force α of the semiconductor wafer surface protecting adhesive tape in the present invention is the load load obtained by (c) described above per width of the test piece. It means the converted one. The restitution coefficient γ of the semiconductor wafer surface protecting adhesive tape is a value obtained by dividing the repulsion force α by the square of the base resin film of the test piece.
図1に示す本発明の半導体ウエハ表面保護用粘着テープは、例えば、剥離フィルム上に中間樹脂層2を構成する組成物を塗布、乾燥して得られる中間樹脂層を、基材フィルム1上へ転写することや、中間樹脂層組成物を基材樹脂フィルム1へ直接塗布することで中間樹脂層3を形成し、その後、中間樹脂層3上へ同様にして粘着剤層2を転写することや、直接塗布することにより製造することができる。 As shown in FIG. 1, the
The adhesive tape for protecting a semiconductor wafer surface of the present invention shown in FIG. 1, for example, applies an intermediate resin layer obtained by applying a composition constituting the
(1)カルボキシル基含有単量体
アクリル酸、メタクリル酸、カルボキシエチルアクリレート、カルボキシペンチルアクリレート、イタコン酸、マレイン酸、フマル酸、クロトン酸などのカルボキシル基含有単量体
(2)酸無水物単量体
無水マレイン酸、無水イタコン酸などの酸無水物単量体
(3)ヒドロキシ含有単量体
(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-ヒドロキシプロピル、(メタ)アクリル酸4-ヒドロキシブチル、(メタ)アクリル酸6-ヒドロキシヘキシル、(メタ)アクリル酸8-ヒドロキシオクチル、(メタ)アクリル酸10-ヒドロキシデシル、(メタ)アクリル酸12-ヒドロキシラウリル、(4-ヒドロキシメチルシクロヘキシル)メチルアクリレートなどのヒドロキシル基含有単量体 As an acrylic polymer used as a base resin component of the intermediate resin layer composition, an acrylic copolymer containing as a constituent component another monomer copolymerizable with the (meth) acrylic acid alkyl ester or cycloalkyl ester. Can be mentioned. For example, one or more of the following monomers can be used.
(1) Carboxyl group-containing monomers Carboxyl group-containing monomers such as acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid (2) acid anhydride single monomer Forms Anhydride monomer such as maleic anhydride, itaconic anhydride (3) Hydroxy-containing monomer (2-hydroxyethyl (meth) acrylate), 2-hydroxypropyl (meth) acrylate, (meth) acrylic acid 4 -Hydroxybutyl, 6-hydroxyhexyl (meth) acrylate, 8-hydroxyoctyl (meth) acrylate, 10-hydroxydecyl (meth) acrylate, 12-hydroxylauryl (meth) acrylate, (4-hydroxymethylcyclohexyl) ) Hydroxyl group-containing monomer such as methyl acrylate
水酸基は、後述の架橋剤として用いられる、イソシアネート架橋剤やイソシアヌレート架橋剤と反応して、中間樹脂層を架橋させる。また、カルボキシル基は、後述の架橋剤として用いられる、エポキシ架橋剤と反応して、中間樹脂層を架橋させる。 The acrylic polymer preferably has a hydroxyl group and a carboxyl group. The hydroxyl value of the acrylic polymer is preferably 1-30, more preferably 1-10. Here, the hydroxyl value refers to a value measured by a method based on JIS K 0070. Further, the acid value of the acrylic polymer is preferably 1 to 20, and more preferably 1 to 15. Here, the acid value means a value measured by the method described in JIS K 5407.
The hydroxyl group reacts with an isocyanate cross-linking agent or an isocyanurate cross-linking agent used as a cross-linking agent described later to cross-link the intermediate resin layer. Moreover, a carboxyl group reacts with the epoxy crosslinking agent used as a below-mentioned crosslinking agent, and bridge | crosslinks an intermediate resin layer.
ポリウレタンアクリレートは、水酸基及びカルボキシル基を有することが好ましい。ポリウレタンアクリレートの水酸基価は1~30が好ましく、さらに好ましくは、1~10である。ここで水酸基価は以下のJIS K 0070により測定した値をいう。また、ポリウレタンアクリレートの酸価は1~20が好ましく、さらに好ましくは、1~15である。ここで酸価はJIS K 5601-2-1に記載の方法により測定した値をいう。 As the intermediate resin layer composition, polyurethane acrylate can be used in addition to the acrylic polymer. Examples of the polyurethane acrylate include those having the following urethane (meth) acrylate monomers as constituent components. For example, isobornyl (meth) acrylate, dicyclopentenyl (meth) acrylate, phenylhydroxypropyl acrylate, and the like can be given. These can use 1 type (s) or 2 or more types. When forming the intermediate layer, the urethane acrylate oligomer can be diluted with a photopolymerizable monomer, coated and dried, and effected by ultraviolet irradiation or the like, and this method is preferred as a method for forming the intermediate layer.
The polyurethane acrylate preferably has a hydroxyl group and a carboxyl group. The hydroxyl value of the polyurethane acrylate is preferably 1 to 30, more preferably 1 to 10. Here, the hydroxyl value means a value measured according to the following JIS K 0070. The acid value of the polyurethane acrylate is preferably 1-20, and more preferably 1-15. Here, the acid value is a value measured by the method described in JIS K 5601-2-1.
(1)用いる試薬
・アセチル化試薬(無水酢酸-ピリジン)
・N/2水酸化カリウム-エタノール溶液
(2)滴定方法
試料をアセチル化試薬でアセチル化した後、過剰の酢酸をN/2水酸化カリウム-エタノール溶液で滴定する。
(3)計算式
次式によって水酸基価を求める。
水酸基価=((VB-V)×F×28.5)/S
ただし、
V :本試験のN/2水酸化カリウム-エタノール溶液の滴定量(mL)
VB:空試験のN/2水酸化カリウム-エタノール溶液の滴定量(mL)
F :N/2水酸化カリウム-エタノール溶液のファクター
S :試料採取量(g)
AV:試料の酸価(mgKOH/g) (Measuring method of hydroxyl value (JIS K 0070))
(1) Reagents used • Acetylation reagent (acetic anhydride-pyridine)
N / 2 potassium hydroxide-ethanol solution (2) Titration method After acetylating a sample with an acetylating reagent, excess acetic acid is titrated with an N / 2 potassium hydroxide-ethanol solution.
(3) Calculation formula The hydroxyl value is determined by the following formula.
Hydroxyl value = ((VB−V) × F × 28.5) / S
However,
V: titration of N / 2 potassium hydroxide-ethanol solution in this test (mL)
VB: Titrate of N / 2 potassium hydroxide-ethanol solution for blank test (mL)
F: Factor of N / 2 potassium hydroxide-ethanol solution S: Sampling amount (g)
AV: Acid value of the sample (mgKOH / g)
常温での剛性をもたせるために架橋後の中間樹脂層のDSCによるガラス転移点(Tg)の好ましい範囲は、-10℃~30℃であり、より好ましくは0℃~20℃である。中間層の架橋後のガラス転移温度が低すぎると、半導体ウエハ表面保護用粘着テープは柔軟性を有するため、クッション性は向上するが、薄膜研削性が低下する場合がある。ドライポリッシュなどの薄膜ウエハの最終仕上げ工程では、半導体ウエハに高圧力が加わる。薄膜研削性が低いと、その高圧力で、表面保護用粘着テープの沈み込み効果により半導体ウエハが割れることがある。特に、50μm以下の厚さに半導体ウエハを研削する際は、半導体ウエハの強度を上げるために裏面を鏡面状態に仕上げ加工するため、ドライポリッシュやケミカルメカニカルポリッシュ、ポリグラインディングなどが行われ、表面保護用粘着テープの沈み込みによる割れが多くなる場合がある。
一方、中間樹脂層の架橋後のガラス転移温度が高すぎるとクッション性が低下し、パターン付ウエハを加工する場合には、半導体ウエハの割れが発生する場合がある。また、中間樹脂層組成物に放射線照射によって硬化する材料を使用し、放射線照射によって硬化させて中間樹脂層の硬さを調整してもよい。
中間樹脂層の厚さは、裏面研削工程でのクッション性の観点から、好ましくは10~100μmであり、更に好ましくは20~80μmであり、より好ましくは30~70μmである。中間樹脂層が薄すぎると裏面研削工程時のクッション性が小さくなり、中間樹脂層が厚すぎると薄膜研削時にウエハが沈み込み効果によって中央部から割れる確率が高くなる。この現象は薄膜研削の際に用いられるポリッシュの工程で特に顕著に見られ、これらは研削の工程に比べてウエハへの圧力が高くかかっているためであると考えられる。中間樹脂層は複数の層が積層された構成であってもよい。 The intermediate resin layer of the adhesive tape for protecting a semiconductor wafer surface of the present invention can provide cushioning properties to the base resin film, and can relieve the tension applied when the adhesive tape is bonded. The intermediate resin layer preferably has a higher elastic modulus than the pressure-sensitive adhesive layer.
In order to give rigidity at normal temperature, the preferable range of the glass transition point (Tg) by DSC of the intermediate resin layer after crosslinking is −10 ° C. to 30 ° C., more preferably 0 ° C. to 20 ° C. If the glass transition temperature after crosslinking of the intermediate layer is too low, the semiconductor wafer surface protecting adhesive tape has flexibility, so that the cushioning property is improved, but the thin film grindability may be lowered. In the final finishing process of a thin film wafer such as dry polish, a high pressure is applied to the semiconductor wafer. If the thin film grindability is low, the semiconductor wafer may be cracked due to the sinking effect of the surface protecting adhesive tape at the high pressure. In particular, when grinding a semiconductor wafer to a thickness of 50 μm or less, dry polishing, chemical mechanical polishing, polygrinding, etc. are performed to finish the back surface in a mirror state in order to increase the strength of the semiconductor wafer. There may be many cracks due to the sinking of the protective adhesive tape.
On the other hand, if the glass transition temperature after cross-linking of the intermediate resin layer is too high, the cushioning property is lowered, and when the patterned wafer is processed, the semiconductor wafer may be cracked. Moreover, the material which hardens | cures by radiation irradiation may be used for the intermediate resin layer composition, and you may make it harden | cure by radiation irradiation and may adjust the hardness of an intermediate resin layer.
The thickness of the intermediate resin layer is preferably 10 to 100 μm, more preferably 20 to 80 μm, and more preferably 30 to 70 μm, from the viewpoint of cushioning in the back grinding process. If the intermediate resin layer is too thin, the cushioning property during the back surface grinding process is reduced, and if the intermediate resin layer is too thick, the probability that the wafer is broken from the center due to the sinking effect during thin film grinding is increased. This phenomenon is particularly noticeable in the polishing process used in thin film grinding, which is considered to be because the pressure on the wafer is higher than in the grinding process. The intermediate resin layer may have a configuration in which a plurality of layers are laminated.
その場合、本発明の半導体ウエハ表面保護用粘着テープが貼合された8インチポリイミド膜付きの半導体ウエハの反り矯正率が75%以下で、かつ表面にポリイミド膜が形成された8インチ径の半導体ウエハ表面に表面保護用粘着テープを貼合して、該半導体ウエハ裏面を50μm厚に研削した後の該粘着テープが貼合された該8インチ径ウエハの順反り量が20mm以下であることが好ましい。 Moreover, the resin composition which mix | blended the resin which has a softness | flexibility rather than a polyester-type resin with a polyester-type resin can be used as a base resin film. By setting it as the resin composition which blended 2 or more types of resin, it can be set as the base material which gave rigidity and a softness | flexibility. For example, a resin composition in which a thermoplastic elastomer is blended with a polyester-based resin can be used as the base resin film.
In that case, a semiconductor wafer with an 8-inch polyimide film to which the adhesive tape for protecting the surface of the semiconductor wafer of the present invention is bonded has a warp correction rate of 75% or less and an 8-inch semiconductor with a polyimide film formed on the surface. The surface warp adhesive tape is bonded to the wafer surface and the back surface of the semiconductor wafer is ground to a thickness of 50 μm. The amount of forward warping of the 8-inch wafer to which the adhesive tape is bonded is 20 mm or less. preferable.
さらに粘着性や凝集力を制御する目的でアクリル酸あるいはメタクリル酸、アクリロニトリル、酢酸ビニルなどの単量体を共重合させてもよい。 As the base resin constituting the pressure-sensitive adhesive layer, a conventional resin can be used. Among them, an acrylic pressure-sensitive adhesive is preferable, specifically, an acrylic polymer selected from a homopolymer and a copolymer having an acrylate ester as a main constituent monomer unit, and other functional monomers. Copolymers and mixtures of these polymers are used. For example, as the acrylic ester, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, glycidyl acrylate, 2-hydroxyethyl acrylate, etc., and those obtained by replacing the above acrylic ester with, for example, methacrylic ester, etc. Can also be preferably used.
Furthermore, monomers such as acrylic acid, methacrylic acid, acrylonitrile, and vinyl acetate may be copolymerized for the purpose of controlling adhesiveness and cohesive force.
多価エポキシ化合物としては、具体的にはエチレングリコールジグリシジルエーテル、テレフタル酸ジグリシジルエステルアクリレート等が用いられる。多価アジリジン化合物としては、具体的にはトリス-2,4,6-(1-アジリジニル)-1,3,5-トリアジン、トリス〔1-(2-メチル)-アジリジニル〕ホスフィンオキシド、ヘキサ〔1-(2-メチル)-アジリジニル〕トリホスファトリアジン等が用いられる。またキレート化合物としては、具体的にはエチルアセトアセテートアルミニウムジイソプロピレート、アルミニウムトリス(エチルアセトアセテート)等が用いられる。 The pressure-sensitive adhesive as described above can further set the pressure-sensitive adhesive force and cohesive force to arbitrary values by using a crosslinking agent. Examples of such a crosslinking agent include a polyvalent isocyanate compound, a polyvalent epoxy compound, a polyvalent aziridine compound, and a chelate compound. Specific examples of the polyvalent isocyanate compound include toluylene diisocyanate, diphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, and adduct type compounds thereof.
Specific examples of the polyvalent epoxy compound include ethylene glycol diglycidyl ether, terephthalic acid diglycidyl ester acrylate, and the like. Specific examples of the polyvalent aziridine compound include tris-2,4,6- (1-aziridinyl) -1,3,5-triazine, tris [1- (2-methyl) -aziridinyl] phosphine oxide, hexa [ 1- (2-Methyl) -aziridinyl] triphosphatriazine and the like are used. As the chelate compound, specifically, ethyl acetoacetate aluminum diisopropylate, aluminum tris (ethyl acetoacetate) or the like is used.
通常、感圧型粘着テープは加熱して剥離される。50℃における加熱剥離によるSUS研磨面に対する粘着力が大きすぎると、薄膜研削後の剥離に支障を生じ、ウエハ割れを引き起こすことがある。本発明の感圧型粘着テープは、好ましくは50℃におけるSUS280研磨面に対する粘着力が0.3N/25mm以下である。
なお、本発明においては、「SUS研磨面」とは、JIS G 4305に規定されているSUS304鋼板を、JIS R 6253の280番の粗さの研磨紙を用いて、JIS Z 0237に基づき仕上げられたものをいう。 As the pressure-sensitive adhesive layer used for the semiconductor wafer surface protecting pressure-sensitive adhesive tape of the present invention, any of a radiation-curable pressure-sensitive adhesive that is peeled off by reducing the adhesive strength by radiation irradiation and a pressure-sensitive adhesive that is not cured by radiation are used as appropriate. can do. In this specification, an adhesive that is not cured by radiation is referred to as a pressure-sensitive adhesive tape. When the pressure-sensitive adhesive is pressure sensitive, the adhesive strength to the SUS polished surface at 20 to 25 ° C. is 0.5 N / 25 mm or more, and the adhesive strength to the SUS polished surface at 50 ° C. is 0.5 N / 25 mm or less. It is preferable. If the adhesive strength to the SUS polished surface at 20 to 25 ° C. is too low, the holding force is not sufficient, and the wafer may be displaced or cracked during backside grinding of the wafer. Preferably, the adhesive strength to the SUS polished surface at 20 to 25 ° C. is 1.0 N / 25 mm or more.
Usually, the pressure-sensitive adhesive tape is peeled off by heating. If the adhesive force to the SUS polished surface by heat peeling at 50 ° C. is too large, the peeling after thin film grinding may be hindered and the wafer may be cracked. The pressure-sensitive adhesive tape of the present invention preferably has an adhesive strength to a SUS280 polished surface at 50 ° C. of 0.3 N / 25 mm or less.
In the present invention, the “SUS polished surface” is a SUS304 steel plate defined in JIS G 4305, finished using JIS R 6253, No. 280 abrasive paper, based on JIS Z 0237. Say something.
重量平均分子量は、下記条件のGPC(ゲルーパーミエーション クロマトグラフ)で測定することができる。
GPC装置:HLC-8120GPC(商品名、東ソー社製)
カラム:TSK gel SuperHM-H/H4000/H3000/H2000、(商品名、東ソー社製)
流量:0.6mL/min、
濃度:0.3質量%、
注入量:20μL、
カラム温度:40℃ When the pressure-sensitive adhesive is pressure-sensitive, the weight average molecular weight of the base resin is preferably 1,000,000 or more. If the molecular weight is too small, organic contaminants tend to adhere to the wafer surface, which is not preferable. Although there is no restriction | limiting in particular about the upper limit of molecular weight, In consideration of the ease of superposition | polymerization etc., it is preferable that a weight average molecular weight is 2.5 million or less.
The weight average molecular weight can be measured by GPC (gel permeation chromatograph) under the following conditions.
GPC device: HLC-8120GPC (trade name, manufactured by Tosoh Corporation)
Column: TSK gel SuperHM-H / H4000 / H3000 / H2000 (trade name, manufactured by Tosoh Corporation)
Flow rate: 0.6 mL / min,
Concentration: 0.3% by mass
Injection volume: 20 μL,
Column temperature: 40 ° C
剥離ライナーとしては、シリコン離型処理したポリエチレンテレフタレートフィルムなどが用いられる。また必要に応じて、シリコン離型処理をしないポリプロピレンなども用いられる。 A release liner (not shown) can be provided on the
As the release liner, a polyethylene terephthalate film subjected to silicon release treatment or the like is used. If necessary, polypropylene or the like that is not subjected to silicon release treatment is also used.
C=(A/B)×100 式(1)
式(1)中、A、B、Cは以下を表わす。
A:表面に厚さ6μmのポリイミド膜が形成されウエハ全体の厚さが725μmで、8インチ径のシリコン半導体ウエハのポリイミド膜表面に表面保護用粘着テープを貼合して、該半導体ウエハ裏面を50μm厚に研削した後の該粘着テープが貼合された該8インチ径ウエハの順反り量(mm)
B:表面に厚さ6μmのポリイミド膜が形成されウエハ全体の厚さが725μmで、8インチ径のシリコン半導体ウエハのポリイミド膜表面に表面保護用粘着テープを貼合して、該半導体ウエハ裏面を50μm厚に研削し、該粘着テープ剥離後の該8インチ径ウエハの順反り量(mm)
C:反り矯正率(%)
上記式(1)においてポリイミド膜は、非感光性ポリイミドPIX-3400(商品名、日立化成デュポンマイクロシステムズ(株)社製)を用い、スピンコーターでエッジリンスをしながら乾燥後の膜厚が6μmとなるように、8インチ径のシリコン半導体ウエハに塗工を行い、その後、200℃でプレベイクを30分間行い、350℃で本ベークを1時間行い、厚さ6μmのポリイミド膜を形成したものをいう。 The adhesive tape for surface protection of a semiconductor wafer of the present invention has a warp correction rate C represented by the following formula (1) of 75% or less in a semiconductor wafer with an 8-inch polyimide film to which the tape is bonded. Can do. More preferably, the warp correction rate C can be 50% or less.
C = (A / B) × 100 Formula (1)
In formula (1), A, B, and C represent the following.
A: A polyimide film having a thickness of 6 μm is formed on the surface, and the entire thickness of the wafer is 725 μm. A surface protective adhesive tape is bonded to the polyimide film surface of an 8-inch silicon semiconductor wafer, and the back surface of the semiconductor wafer is The amount of forward warping (mm) of the 8-inch wafer to which the adhesive tape was ground after being ground to a thickness of 50 μm
B: A polyimide film having a thickness of 6 μm is formed on the surface, the thickness of the whole wafer is 725 μm, and an adhesive tape for surface protection is bonded to the surface of the polyimide film of an 8-inch diameter silicon semiconductor wafer, The amount of forward warping (mm) of the 8-inch wafer after grinding to 50 μm thickness and peeling of the adhesive tape
C: Warpage correction rate (%)
In the above formula (1), the polyimide film is non-photosensitive polyimide PIX-3400 (trade name, manufactured by Hitachi Chemical DuPont Microsystems Co., Ltd.), and the film thickness after drying is 6 μm while edge rinsing with a spin coater. Then, a silicon semiconductor wafer having a diameter of 8 inches is applied, and then prebaked at 200 ° C. for 30 minutes, followed by baking at 350 ° C. for 1 hour to form a polyimide film having a thickness of 6 μm. Say.
また、半導体ウエハの表面に形成されているポリイミドなどの絶縁膜は、加熱などによって架橋されている場合が多い。このため、絶縁膜には残留応力が存在することがある。この場合でも、本発明の半導体ウエハ表面保護粘着テープをウエハ表面に貼合して研削しても、絶縁膜の残留応力を上回る反り矯正率を発揮し、研削後の半導体ウエハの反りを低減することができる。 Even if the semiconductor wafer surface protective adhesive tape of the present invention is ground to a thin film of a semiconductor wafer with an insulation film such as polyimide, the stress relaxation effect of the intermediate resin layer reduces the tension applied at the time of tape bonding. Along with the effect and the warp correction effect of the base resin film layer, the layer including the base resin film layer, the intermediate resin layer and the pressure-sensitive adhesive layer is subjected to stress during grinding evenly in the vertical and horizontal directions. Without setting a proper bonding condition, the warp correction rate exceeding the residual stress of the polyimide insulating film can be exhibited, and the warpage of the semiconductor wafer after grinding can be reduced.
In addition, an insulating film such as polyimide formed on the surface of a semiconductor wafer is often crosslinked by heating or the like. For this reason, residual stress may exist in the insulating film. Even in this case, even if the semiconductor wafer surface protective adhesive tape of the present invention is bonded to the wafer surface and ground, the warp correction rate exceeding the residual stress of the insulating film is exhibited and the warp of the semiconductor wafer after grinding is reduced. be able to.
<実施例1>
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル共重合体100質量部に対して、アダクト系イソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
また、メタクリル酸n-ブチルを構成成分の主成分とし、ほかの構成成分の単量体として水酸基とカルボキシル基を有するアクリル共重合体(酸価が10、水酸基価が2)100質量部に対してアダクト系イソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を2質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を2質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ38μmのポリエチレンテレフタレート基材樹脂フィルム(PET)の片面上に、上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚42μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は0℃であった。このガラス転移温度は示差走査熱量計(DSC)により測定した値である。
さらに厚さ25μmのPETセパレータ上に上記の粘着剤組成物を塗布し、乾燥させた。その後、この粘着剤組成物層と、上記の基材樹脂フィルム上に形成された中間樹脂層とを突き合わせて、乾燥膜厚20μmの粘着剤層を有する半導体ウエハ表面保護用粘着テープを作製した。
なお、上記のアクリル系共重合体の重量平均分子量は、下記条件のGPC(ゲルーパーミエーション クロマトグラフ)で測定した。
GPC装置:HLC-8120GPC(商品名、東ソー社製)
カラム:TSK gel SuperHM-H/H4000/H3000/H2000、(商品名、東ソー社製)
流量:0.6mL/min、
濃度:0.3質量%、
注入量:20μL、
カラム温度:40℃
以下の実施例2~11及び比較例1~6で使用したアクリル系共重合体についても、同様に重量平均分子量を測定し、その結果を表1~3に示す。また、以下の実施例2~11及び比較例1~6でも、中間樹脂層のガラス転移温度は、実施例1と同様に、DSCで測定した。 EXAMPLES Hereinafter, although this invention is demonstrated further in detail based on an Example, this invention is not limited to these Examples.
<Example 1>
For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, the adduct isocyanate crosslinker Coronate L ( 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
In addition, 100 parts by mass of an acrylic copolymer (having an acid value of 10 and a hydroxyl value of 2) having n-butyl methacrylate as a main component and having a hydroxyl group and a carboxyl group as monomers of
The intermediate resin layer composition was applied on one side of a 38 μm thick polyethylene terephthalate base resin film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 42 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C. This glass transition temperature is a value measured by a differential scanning calorimeter (DSC).
Furthermore, said adhesive composition was apply | coated on 25-micrometer-thick PET separator, and was dried. Then, this adhesive composition layer and the intermediate resin layer formed on said base resin film were faced | matched, and the adhesive tape for semiconductor wafer surface protection which has an adhesive layer with a dry film thickness of 20 micrometers was produced.
The weight average molecular weight of the acrylic copolymer was measured by GPC (gel permeation chromatography) under the following conditions.
GPC device: HLC-8120GPC (trade name, manufactured by Tosoh Corporation)
Column: TSK gel SuperHM-H / H4000 / H3000 / H2000 (trade name, manufactured by Tosoh Corporation)
Flow rate: 0.6 mL / min,
Concentration: 0.3% by mass
Injection volume: 20 μL,
Column temperature: 40 ° C
For the acrylic copolymers used in Examples 2 to 11 and Comparative Examples 1 to 6 below, the weight average molecular weight was measured in the same manner, and the results are shown in Tables 1 to 3. Also in Examples 2 to 11 and Comparative Examples 1 to 6 below, the glass transition temperature of the intermediate resin layer was measured by DSC as in Example 1.
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル共重合体100質量部に対して、アダクト系イソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
また、メタクリル酸n-ブチルを構成成分の主成分とし、ほかの構成成分の単量体として水酸基とカルボキシル基を有するアクリル共重合体(酸価が11、水酸基価が3)100質量部に対してアダクト系イソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を2質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ38μmのポリエチレンテレフタレート基材フィルム(PET)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚42μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は-15℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚20μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 2>
For 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, adduct isocyanate crosslinking agent Coronate L (product Name, manufactured by Nippon Polyurethane Co., Ltd.) and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
In addition, 100 parts by mass of an acrylic copolymer (having an acid value of 11 and a hydroxyl value of 3) containing n-butyl methacrylate as a main component and having a hydroxyl group and a carboxyl group as monomers of
The intermediate resin layer composition was applied on one side of a 38 μm thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 42 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was −15 ° C.
Furthermore, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 20 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル共重合体100質量部に対して、アダクト系イソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
また、メタクリル酸n-ブチルを構成成分の1つとし、水酸基を有するアクリル共重合体(水酸基価が35)100質量部に対してポリイソシアネート架橋剤TKA-100(商品名、旭化成ケミカルズ社製)を12質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ25μmのポリエチレンナフタレート基材フィルム(PEN)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚50μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は30℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚30μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 3>
For 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, adduct isocyanate crosslinking agent Coronate L (product Name, manufactured by Nippon Polyurethane Co., Ltd.) and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
In addition, polyisocyanate cross-linking agent TKA-100 (trade name, manufactured by Asahi Kasei Chemicals Corporation) with respect to 100 parts by mass of an acrylic copolymer having a hydroxyl group (hydroxyl value 35) having n-butyl methacrylate as one of the constituent components. 12 parts by mass, and the concentration was adjusted with ethyl acetate to obtain an intermediate resin layer composition.
The intermediate resin layer composition was applied onto one side of a 25 μm thick polyethylene naphthalate base film (PEN) and then dried to laminate an intermediate resin layer having a dry film thickness of 50 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 30 ° C.
Further, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
重量平均分子量100万のアクリル共重合体100質量部に対してイソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を4質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を作製した。
また、メタクリル酸n-ブチルを構成成分の主成分とし、水酸基とカルボキシル基を有するアクリル共重合体(酸価が11、水酸基価が4)100質量部に対して、アダクト系イソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を1部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ38μmのポリエチレンテレフタレート基材フィルム(PET)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚62μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は-10℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚30μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 4>
4 parts by mass of an isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is blended with 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 1,000,000, and the concentration is adjusted with ethyl acetate. Produced.
In addition, 100 parts by mass of an acrylic copolymer (having an acid value of 11 and a hydroxyl value of 4) having n-butyl methacrylate as a main component and having a hydroxyl group and a carboxyl group, the adduct isocyanate cross-linking
The intermediate resin layer composition was applied on one side of a 38 μm thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 62 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was −10 ° C.
Further, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
重量平均分子量120万のアクリル共重合体100質量部に対してイソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を2質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を4質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を作製した。
また、メタクリル酸n-ブチルを構成成分の主成分とし、水酸基とカルボキシル基を有するアクリル共重合体(酸価が11、水酸基価が3)100質量部に対して、アダクト系イソシアネートコロネートL(商品名、日本ポリウレタン社製)を2質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を2質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ38μmのポリエチレンテレフタレート基材フィルム(PET)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚42μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は0℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚20μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 5>
2 parts by mass of isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane) and 100% by mass of acrylic copolymer having a weight average molecular weight of 1,200,000 and epoxy-based crosslinking agent TETRAD-C (trade name, Mitsubishi Gas Chemical) 4 parts by mass) was prepared, and the pressure-sensitive adhesive composition was prepared by adjusting the concentration with ethyl acetate.
Furthermore, adduct isocyanate coronate L (100 parts by mass of an acrylic copolymer having a main component of n-butyl methacrylate and having a hydroxyl group and a carboxyl group (acid value 11 and hydroxyl value 3) ( 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
The intermediate resin layer composition was applied on one side of a 38 μm thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 42 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C.
Furthermore, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 20 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
重量平均分子量80万のアクリル共重合体100質量部に対してイソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を0.5質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を作製した。
また、メタクリル酸n-ブチルを構成成分の主成分とし、水酸基とカルボキシル基を有するアクリル共重合体(酸価が12、水酸基価が5)100質量部に対して、アダクト系イソシアネートコロネートL(商品名、日本ポリウレタン社製)を2質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を4質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ50μmのポリエチレンテレフタレート基材フィルム(PET)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚50μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は15℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚30μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 6>
0.5 parts by mass of an isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is blended with 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000, and the concentration is adjusted with ethyl acetate. A product was made.
Furthermore, adduct isocyanate coronate L (100 parts by mass of an acrylic copolymer having a main component of n-butyl methacrylate and having a hydroxyl group and a carboxyl group (acid value: 12, hydroxyl value: 5) ( 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 4 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, produced by Mitsubishi Gas Chemical Co., Ltd.), adjusting the concentration with ethyl acetate, and intermediate resin layer composition Got.
The intermediate resin layer composition was applied on one side of a 50 μm thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 50 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 15 ° C.
Further, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
2-エチルヘキシルアクリレート、メチルアクリレート、2-ヒドロキシエチルアクリレートの共重合体である分子量70万のアクリルベース樹脂100質量部に対してイソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を4質量部、オリゴマーとして光重合性炭素-炭素二重結合を有するテトラメチロールメタンテトラアクリレート100部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を1質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を作製した。
また、メタクリル酸n-ブチルを構成成分の主成分とし、水酸基とカルボキシル基を有するアクリル共重合体(酸価が11、水酸基価が2)100質量部に対して、アダクト系イソシアネートコロネートL(商品名、日本ポリウレタン社製)を2質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を2質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ38μmのポリエチレンテレフタレート基材フィルム(PET)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚42μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は0℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚20μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 7>
4 parts by mass of isocyanate cross-linking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) per 100 parts by mass of an acrylic base resin having a molecular weight of 700,000 which is a copolymer of 2-ethylhexyl acrylate, methyl acrylate and 2-
In addition, adduct isocyanate coronate L (100 parts by mass of an acrylic copolymer having n-butyl methacrylate as a main component and having a hydroxyl group and a carboxyl group (acid value 11 and hydroxyl value 2) ( 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
The intermediate resin layer composition was applied on one side of a 38 μm thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 42 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C.
Furthermore, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 20 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
重量平均分子量80万のアクリル共重合体100質量部に対してイソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を1.5質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を作製した。
また、水酸基とカルボキシル基を有するポリウレタンアクリレート(酸価が2、水酸基価が35)100質量部に対して、イソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を3質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を4質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ25μmのポリエチレンナフタレート基材フィルム(PEN)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚50μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は30℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚30μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 8>
1.5 parts by mass of the isocyanate-based cross-linking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is blended with 100 parts by mass of the acrylic copolymer having a weight average molecular weight of 800,000, and the concentration is adjusted with ethyl acetate. A product was made.
In addition, 3 parts by mass of an epoxy crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) and 100 parts by mass of an epoxy crosslinking agent with respect to 100 parts by mass of a polyurethane acrylate having a hydroxyl group and a carboxyl group (acid value: 2, hydroxyl value: 35) 4 parts by mass of the agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company) was blended, and the concentration was adjusted with ethyl acetate to obtain an intermediate resin layer composition.
The intermediate resin layer composition was applied onto one side of a 25 μm thick polyethylene naphthalate base film (PEN) and then dried to laminate an intermediate resin layer having a dry film thickness of 50 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 30 ° C.
Further, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル共重合体100質量部に対して、アダクト系イソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
また、メタクリル酸n-ブチルを構成成分の1つとし、水酸基とカルボキシル基を有するアクリル共重合体(酸価が10、水酸基価が2)100質量部に対して、アダクト系イソシアネートコロネートL(商品名、日本ポリウレタン社製)を2質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を2質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ75μmのポリエチレンテレフタレート基材フィルム(PET)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚25μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は0℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚30μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 9>
For 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, adduct isocyanate crosslinking agent Coronate L (product Name, manufactured by Nippon Polyurethane Co., Ltd.) and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
Further, an adduct isocyanate coronate L (100 parts by mass of an acrylic copolymer having a hydroxyl group and a carboxyl group (acid value is 10 and hydroxyl value is 2) having n-butyl methacrylate as one of the constituent components. 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
The intermediate resin layer composition was applied on one side of a 75 μm thick polyethylene terephthalate base film (PET) and then dried to laminate an intermediate resin layer having a dry film thickness of 25 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C.
Further, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル共重合体100質量部に対して、アダクト系イソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
また、メタクリル酸n-ブチルを構成成分の1つとし、水酸基とカルボキシル基を有するアクリル共重合体(酸価が10、水酸基価が2)100質量部に対して、アダクト系イソシアネートコロネートL(商品名、日本ポリウレタン社製)を2質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を2質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ40μmのポリイミド基材フィルムの片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚30μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は-5℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚30μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 10>
For 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, adduct isocyanate crosslinking agent Coronate L (product Name, manufactured by Nippon Polyurethane Co., Ltd.) and 1 part by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
Further, an adduct isocyanate coronate L (100 parts by mass of an acrylic copolymer having a hydroxyl group and a carboxyl group (acid value is 10 and hydroxyl value is 2) having n-butyl methacrylate as one of the constituent components. 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
The intermediate resin layer composition was applied on one side of a polyimide base film having a thickness of 40 μm and then dried to laminate an intermediate resin layer having a dry film thickness of 30 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was −5 ° C.
Further, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 30 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル共重合体100質量部に対して、アダクト系イソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
重量平均分子量40万の水酸基を有するアクリル共重合体(酸価が4、水酸基価が33)100質量部に対して、イソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を0.5質量部配合し、酢酸エチルで濃度を調整し中間樹脂層組成物を作製した。
厚さ38μmのポリエチレンテレフタレート基材フィルム(PET)の片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、何回か重ね合わせることで乾燥膜厚132μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は-50℃であった。
厚さ50μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、PET及びEVAの複層フィルムの片面上に貼り合わせることで積層し、膜厚10μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Example 11>
For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, the adduct isocyanate crosslinker Coronate L ( 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
An isocyanate-based cross-linking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is 0.5 per 100 parts by mass of an acrylic copolymer having a hydroxyl group with a weight average molecular weight of 400,000 (acid value is 4, hydroxyl value is 33). An intermediate resin layer composition was prepared by blending parts by mass and adjusting the concentration with ethyl acetate.
The intermediate resin layer composition was applied on one side of a 38 μm thick polyethylene terephthalate substrate film (PET), dried, and then laminated several times to laminate an intermediate resin layer having a dry film thickness of 132 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was −50 ° C.
A pressure-sensitive adhesive composition is applied on a PET separator having a thickness of 50 μm, dried and laminated on one side of a multilayer film of PET and EVA, and a pressure-sensitive adhesive layer having a thickness of 10 μm is laminated. An adhesive tape for protecting the surface of a semiconductor wafer was produced.
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル共重合体100質量部に対して、アダクト系イソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
また、メタクリル酸n-ブチルを構成成分の1つとし、水酸基とカルボキシル基を有するアクリル共重合体(酸価が11、水酸基価が2)100質量部に対して、アダクト系イソシアネートコロネートL(商品名、日本ポリウレタン社製)を2質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を2質量部配合し、酢酸エチルで濃度を調整し、中間樹脂層組成物を得た。
厚さ40μmのポリプロピレン(PP)基材フィルムの片面上に上記の中間樹脂層組成物を塗布後、乾燥させて、乾燥膜厚40μmの中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は0℃であった。
さらに厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を設けたテープ上に貼り合わせることで積層し、膜厚20μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Comparative Example 1>
For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, the adduct isocyanate crosslinker Coronate L ( 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
In addition, adduct isocyanate coronate L (for 100 parts by mass of an acrylic copolymer (having an acid value of 11 and a hydroxyl value of 2) having n-butyl methacrylate as one of the components and having a hydroxyl group and a carboxyl group ( 2 parts by mass of a trade name (manufactured by Nippon Polyurethane Co., Ltd.) and 2 parts by mass of an epoxy-based cross-linking agent TETRAD-C (trade name, manufactured by Mitsubishi Gas Chemical Company), and adjusting the concentration with ethyl acetate, an intermediate resin layer composition Got.
The intermediate resin layer composition was applied on one side of a 40 μm thick polypropylene (PP) substrate film and then dried to laminate an intermediate resin layer having a dry film thickness of 40 μm. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was 0 ° C.
Furthermore, a pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on a tape provided with an intermediate resin layer, and a pressure-sensitive adhesive layer with a thickness of 20 μm is laminated to form a semiconductor. An adhesive tape for protecting the wafer surface was produced.
重量平均分子量40万のアクリル共重合体100質量部に対してイソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を1.0質量部及びエポキシ系架橋剤TETRAD-C(商品名、三菱ガス化学社製)を2.5質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を作製した。
厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、厚さ165μmのエチレン酢酸ビニル共重合体(EVA)フィルムの片面上貼り合わせることで積層し、膜厚40μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Comparative Example 2>
1.0 part by mass of an isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) and 100 parts by weight of an acrylic copolymer having a weight average molecular weight of 400,000, and an epoxy-based crosslinking agent TETRAD-C (trade name, Mitsubishi 2.5 parts by mass of Gas Chemical Co., Ltd.) was blended, and the concentration was adjusted with ethyl acetate to prepare an adhesive composition.
A pressure-sensitive adhesive composition is applied onto a 25 μm-thick PET separator, dried and laminated on one side of a 165 μm-thick ethylene vinyl acetate copolymer (EVA) film, and the pressure-sensitive adhesive has a thickness of 40 μm. The adhesive layer for semiconductor wafer surface protection was produced by laminating the agent layer.
2-エチルヘキシルアクリレート、メチルアクリレート、2-ヒドロキシエチルアクリレートの共重合体である分子量70万のアクリル系ベース樹脂100質量部に対してイソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を4質量部、オリゴマーとして光重合性炭素-炭素二重結合を有するテトラメチロールメタンテトラアクリレート100部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を1質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を作製した。
厚さ100μmのポリエチレンテレフタレート基材フィルム(PET)の片面上に、上記の粘着剤組成物を塗布後、乾燥させて、乾燥後の厚さを15μmとした粘着剤層を積層した。さらにこの粘着剤層上に、PETのセパレータを積層して半導体ウエハ表面保護用粘着テープを作製した。 <Comparative Example 3>
Isocyanate-based crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) is added to 100 parts by mass of an acrylic base resin having a molecular weight of 700,000 which is a copolymer of 2-ethylhexyl acrylate, methyl acrylate and 2-hydroxyethyl acrylate. 1 part by mass of 100 parts by mass of tetramethylol methane tetraacrylate having a photopolymerizable carbon-carbon double bond as an oligomer and 1 part by mass of a photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) is added and concentrated with ethyl acetate. The pressure-sensitive adhesive composition was prepared.
On one side of a polyethylene terephthalate base film (PET) having a thickness of 100 μm, the pressure-sensitive adhesive composition was applied and then dried, and a pressure-sensitive adhesive layer having a dried thickness of 15 μm was laminated. Further, a PET separator was laminated on this pressure-sensitive adhesive layer to produce a semiconductor wafer surface protective pressure-sensitive adhesive tape.
2-エチルヘキシルアクリレート、メチルアクリレート、2-ヒドロキシエチルアクリレートの共重合体である分子量70万のアクリルベース樹脂100質量部に対してイソシアネート架橋剤コロネートL(商品名、日本ポリウレタン社製)を4質量部、オリゴマーとして光重合性炭素-炭素二重結合を有するテトラメチロールメタンテトラアクリレート100部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を1質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を作製した。
厚さ25μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、厚さ30μmの高密度ポリエチレン(HDPE)及び厚さ70μmのエチレン-酢酸ビニル共重合体の複層フィルム基材の、エチレン-酢酸ビニル共重合体の層上に貼り合わせることで積層し、膜厚30μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Comparative Example 4>
4 parts by mass of isocyanate cross-linking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) per 100 parts by mass of an acrylic base resin having a molecular weight of 700,000 which is a copolymer of 2-ethylhexyl acrylate, methyl acrylate and 2-hydroxyethyl acrylate , 100 parts of tetramethylolmethane tetraacrylate having a photopolymerizable carbon-carbon double bond as an oligomer and 1 part by weight of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.), and the concentration is adjusted with ethyl acetate A pressure-sensitive adhesive composition was prepared.
A pressure-sensitive adhesive composition was applied onto a PET separator having a thickness of 25 μm, dried, and a multilayer film substrate of a high-density polyethylene (HDPE) having a thickness of 30 μm and an ethylene-vinyl acetate copolymer having a thickness of 70 μm was formed. An adhesive tape for protecting the surface of a semiconductor wafer was prepared by laminating by sticking on an ethylene-vinyl acetate copolymer layer and laminating an adhesive layer having a thickness of 30 μm.
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル共重合体100質量部に対して、アダクト系イソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量20万のアクリル共重合体(酸価が4、水酸基価が33)100質量部に対して、アダクト系イソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を0.5質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を5質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
厚さ50μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、厚さ20μmの高密度ポリエチレン(HDPE)及び厚さ180μmのエチレン-酢酸ビニル共重合体の複層フィルム基材の、エチレン-酢酸ビニル共重合体の層上に何回か貼り合わせることで積層し、膜厚130μm厚の中間樹脂層を積層した。このとき、中間樹脂層の架橋後のガラス転移温度は-50℃であった。
厚さ50μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、中間樹脂層を積層したフィルムに貼り合わせることで積層し、膜厚5μm厚の粘着剤層を積層して半導体ウエハ表面保護用粘着テープを作製した。 <Comparative Example 5>
For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, the adduct isocyanate crosslinker Coronate L ( 1 part by mass of product name (manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan) were mixed, and the concentration was adjusted with ethyl acetate to obtain an adhesive composition.
With respect to 100 parts by mass of an acrylic copolymer having a weight-average molecular weight of 200,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a group containing a carboxyl group (acid value is 4, hydroxyl value is 33) 0.5 parts by mass of adduct isocyanate crosslinking agent Coronate L (trade name, manufactured by Nippon Polyurethane Co., Ltd.) and 5 parts by mass of photopolymerization initiator Irgacure 184 (trade name, manufactured by Ciba Japan Co., Ltd.) The pressure-sensitive adhesive composition was obtained by adjusting the concentration.
A pressure-sensitive adhesive composition was applied onto a PET separator having a thickness of 50 μm, dried, and a multilayer film substrate of high-density polyethylene (HDPE) having a thickness of 20 μm and an ethylene-vinyl acetate copolymer having a thickness of 180 μm was formed. Lamination was performed by laminating several times on the ethylene-vinyl acetate copolymer layer, and an intermediate resin layer having a thickness of 130 μm was laminated. At this time, the glass transition temperature after crosslinking of the intermediate resin layer was −50 ° C.
Apply a pressure-sensitive adhesive composition on a 50 μm thick PET separator, dry it, and laminate it by laminating it on a film laminated with an intermediate resin layer. Laminate a 5 μm thick pressure-sensitive adhesive layer on the surface of the semiconductor wafer A protective adhesive tape was prepared.
放射線硬化性炭素-炭素二重結合含有基、水酸基、及びカルボキシル基を含有する基をそれぞれ有する重量平均分子量80万のアクリル系共重合体100質量部に対して、アダクト系イソシアネート系架橋剤コロネートL(商品名、日本ポリウレタン社製)を1質量部、光重合開始剤イルガキュア184(商品名、チバジャパン社製)を3質量部配合し、酢酸エチルで濃度を調整し粘着剤組成物を得た。
厚さ100μmのポリエチレンテレフタレート基材フィルム(PET)の一方の面に、エチレン酢酸ビニル共重合体(EVA)樹脂を押出しによって厚さ50μmのEVA樹脂層を形成した。また、他方の面に、同じエチレン酢酸ビニル共重合体(EVA)樹脂を用いて、押出しによって厚さ150μmのEVA樹脂層を形成した。この150μmのEVA樹脂層のガラス転移温度は-42℃であった。
厚さ50μmのPETセパレータ上に粘着剤組成物を塗布し、乾燥させて、この粘着剤層組成物層と、上記の150μmのEVA樹脂層を貼り合わせることで積層し、厚さ30μmの粘着剤層を有する半導体ウエハ表面保護用粘着テープを作製した。 <Comparative Example 6>
For 100 parts by mass of an acrylic copolymer having a weight average molecular weight of 800,000 each having a radiation-curable carbon-carbon double bond-containing group, a hydroxyl group, and a carboxyl group-containing group, an adduct isocyanate
An EVA resin layer having a thickness of 50 μm was formed by extruding an ethylene vinyl acetate copolymer (EVA) resin on one surface of a polyethylene terephthalate base film (PET) having a thickness of 100 μm. On the other side, an EVA resin layer having a thickness of 150 μm was formed by extrusion using the same ethylene vinyl acetate copolymer (EVA) resin. The glass transition temperature of this 150 μm EVA resin layer was −42 ° C.
A pressure-sensitive adhesive composition is applied onto a 50 μm-thick PET separator, dried, and this pressure-sensitive adhesive layer composition layer and the above-mentioned 150 μm EVA resin layer are laminated to form a pressure-sensitive adhesive having a thickness of 30 μm. A semiconductor wafer surface protecting adhesive tape having a layer was prepared.
(試験方法)
中間樹脂層に酢酸エチルを吹きかけて中間樹脂層を膨潤させ、スパチュラにて架橋後の中間樹脂層を採取した。その後、真空乾燥にてすべての溶剤を飛ばした後、示差走査熱量計(DSC)で測定した。 1. Measurement of glass transition temperature after crosslinking of intermediate resin layer (Test method)
Ethyl acetate was sprayed on the intermediate resin layer to swell the intermediate resin layer, and the intermediate resin layer after crosslinking was collected with a spatula. Thereafter, all the solvents were removed by vacuum drying, and then measured with a differential scanning calorimeter (DSC).
以下の方法で、ポリイミド膜付き半導体ウエハを作製した。
ウエハ全体の厚さが725μmで、8インチ径のシリコン半導体ウエハに、ポリイミドとして、非感光性ポリイミドPIX-3400(商品名、日立化成デュポンマイクロシステムズ(株)社製)を用い、スピンコーターでエッジリンスをしながら乾燥後の膜厚が6μmとなるように塗工を行った。その後、200℃でプレベイクを30分間行い、350℃で本ベークを1時間行い、厚さ6μmのポリイミド膜を形成し、ウエハ全体の厚さが725μmで、8インチ径の半導体ウエハを得た。
このポリイミド膜付き半導体ウエハを用いて、以下の3~5の試験を行い、その性能について評価した。 2. Production of semiconductor wafer with polyimide film A semiconductor wafer with a polyimide film was produced by the following method.
The thickness of the entire wafer is 725μm, and an 8-inch silicon semiconductor wafer is coated with non-photosensitive polyimide PIX-3400 (trade name, manufactured by Hitachi Chemical DuPont Microsystems Co., Ltd.) and edged with a spin coater. Coating was performed while rinsing so that the film thickness after drying was 6 μm. Thereafter, pre-baking was performed at 200 ° C. for 30 minutes, and main baking was performed at 350 ° C. for 1 hour to form a polyimide film having a thickness of 6 μm. Thus, an 8-inch semiconductor wafer having a total thickness of 725 μm was obtained.
Using this semiconductor wafer with a polyimide film, the following
(試験方法)
貼り付け機として日東精機株式会社製DR8500II(商品名)を用いて、2.の方法で作製した8インチウエハの厚さが725μmのポリイミド膜付きシリコン半導体ウエハに、実施例及び比較例で作製した半導体ウエハ表面保護用粘着テープを貼合した。その場合の貼合は、装置の付属のレギュレータによってパラメータを制御し、それぞれテープ巻取りを0.11MPa、テープ繰り出しを0.26MPa、セパレータを0.20MPa、テープ押さえを0.17MPa、テープ貼り付けを0.26MPaの条件で半導体ウエハ表面保護用粘着テープの貼合を行った。その後、インライン機構を持つグラインダー(株式会社ディスコ製DFG8760(商品名))を使用して厚さ50μm、30μm、20μmの厚みまでそれぞれ25枚のウエハの研磨を行った。また、ウエハの強度向上のため、ドライポリッシュにて最終仕上げを行った。
(評価)
各実施例及び各比較例で作製した半導体ウエハ表面保護用粘着テープについて、評価を行った。その結果、以下のように判定し、○及び△を合格とし、×を不合格とした。
エッジクラックがほとんどなく、25枚すべてのウエハで研削可能であったもの:○
エッジクラックが若干見られるもののウエハに割れはなく研削できたもの、又は25枚のウエハ中割れが1枚~2枚であったもの:△
ウエハが3枚以上割れたもの:× 3. Thin film grindability test (test method)
1. Using DR8500II (trade name) manufactured by Nitto Seiki Co., Ltd. as the pasting machine The adhesive tape for protecting the surface of the semiconductor wafer prepared in Examples and Comparative Examples was bonded to a silicon semiconductor wafer with a polyimide film having a thickness of 725 μm. In this case, the parameters are controlled by a regulator attached to the apparatus, and the tape winding is 0.11 MPa, the tape feeding is 0.26 MPa, the separator is 0.20 MPa, the tape presser is 0.17 MPa, and the tape is stuck. The adhesive tape for semiconductor wafer surface protection was bonded on the conditions of 0.26 MPa. Thereafter, 25 wafers were each polished to a thickness of 50 μm, 30 μm, and 20 μm using a grinder having an inline mechanism (DFG8760 (trade name) manufactured by DISCO Corporation). Moreover, the final finishing was performed by dry polishing in order to improve the strength of the wafer.
(Evaluation)
The adhesive tape for protecting the surface of a semiconductor wafer produced in each example and each comparative example was evaluated. As a result, it determined as follows, (circle) and (triangle | delta) were set as the pass, and x was set as the disqualification.
There were almost no edge cracks and all 25 wafers could be ground: ○
Although some edge cracks were observed, the wafer could be ground without cracks, or 25 wafers had 1 to 2 cracks in the wafer: △
Three or more wafers broken: ×
(試験方法)
上記の3.薄膜研削性試験で研削したポリイミド膜付ウエハを用いて、上記グラインダーに併設されている剥離機(株式会社ディスコ製DFM2700(商品名))を用いて剥離性試験を25枚行った。感圧型粘着テープの剥離は50℃で行い、放射線硬化型粘着テープの剥離温度は紫外線を500mJ/cm2照射後、常温で測定を行った。
(評価)
各実施例及び各比較例で作製した半導体ウエハ表面保護用粘着テープについて、評価を行った。その結果、以下のように判定し、○及び△を合格とした。
テープがウエハから25枚全てが問題なく剥離できたもの:○
テープがウエハを破損等することなく剥離できたが、剥離失敗により1度以上エラーが発生したもの:△
剥離中にウエハの破損等が発生したもの、又はテープをウエハから剥離できなかったもの:× 4). Peel test (test method)
3. above. Twenty-five peelability tests were performed using a wafer with a polyimide film ground in a thin film grindability test, using a peeling machine (DFM2700 (trade name) manufactured by DISCO Corporation) attached to the grinder. The pressure-sensitive pressure-sensitive adhesive tape was peeled at 50 ° C., and the radiation-curing pressure-sensitive adhesive tape was measured at room temperature after irradiation with ultraviolet rays at 500 mJ / cm 2 .
(Evaluation)
The adhesive tape for protecting the surface of a semiconductor wafer produced in each example and each comparative example was evaluated. As a result, the determination was made as follows, and ○ and Δ were regarded as acceptable.
All 25 tapes were peeled off from the wafer without any problem: ○
The tape could be peeled without damaging the wafer, but an error occurred more than once due to failure of peeling:
A wafer that was damaged during peeling, or a tape that could not be peeled from the wafer: ×
(試験方法)
上記の3.薄膜研削試験で、半導体ウエハ表面保護用粘着テープを貼合したままウエハ厚さが50μmまで研削されたテープ付ウエハを、インライン装置(株式会社ディスコ製DFG8760(商品名)及び株式会社ディスコ製DFM2700(商品名)の一体型)を用いて、バックグラインド工程からダイシングダイボンドフィルムの貼合工程及び剥離工程まで搬送を行った。ダイシングダイボンドフィルムはFH-900-20(商品名、日立化成工業社製)を用い、貼合は60℃で行った。
(評価)
各実施例及び各比較例で作製した半導体ウエハ表面保護用粘着テープについて、評価を行った。その結果、以下のように判定し、○を合格とした。
吸着エラーがなく、搬送可能であったもの:○
吸着エラーが発生し、搬送エラーが発生したもの:× 5. Conveyance test (test method)
3. above. In a thin film grinding test, an in-line device (DFG8760 (trade name) manufactured by DISCO Corporation and DFM2700 manufactured by DISCO Corporation) The product was transported from the back grinding process to the dicing die bonding film bonding process and the peeling process. The dicing die bond film used was FH-900-20 (trade name, manufactured by Hitachi Chemical Co., Ltd.), and the bonding was performed at 60 ° C.
(Evaluation)
The adhesive tape for protecting the surface of a semiconductor wafer produced in each example and each comparative example was evaluated. As a result, it determined as follows and made (circle) the pass.
What could be transported without any adsorption error: ○
A suction error has occurred and a transport error has occurred: ×
(試験方法)
貼り付け機として日東精機株式会社製DR8500II(商品名)を用いて、8インチウエハの厚さが725μmのシリコンミラーウエハに、実施例及び比較例で作製した半導体ウエハ表面保護用粘着テープを貼合した。その後、感圧型粘着テープの剥離は50℃で行い、放射線硬化型粘着テープは紫外線を500mJ/cm2照射後、常温で剥離した。
次に半導体ウエハ表面保護用粘着テープを剥した後のウエハ表面の汚染物の元素比率を、XPS(X線光電子分光分析)で測定した。該粘着テープからの転写汚染物に由来する炭素の増加量を該粘着テープを貼合しないブランクウエハと比較して、mol%として算出した。XPSは以下の条件で測定した。
X線原:MgKα、X線のTake off angle:45°、
測定面積:1.1mmφ
(評価)
各実施例及び各比較例で作製した半導体ウエハ表面保護用粘着テープについて、評価を行った。その結果、以下のように判定し、○を合格とした。
C(カーボン)量(atomic%)が25以下であったもの:○
C(カーボン)量(atomic%)が25より大きかったもの:× 6). Contamination test (test method)
Using a DR8500II (trade name) manufactured by Nitto Seiki Co., Ltd. as the pasting machine, the adhesive tape for protecting the surface of the semiconductor wafer produced in Examples and Comparative Examples was bonded to a silicon mirror wafer having a thickness of 725 μm. did. Thereafter, the pressure-sensitive adhesive tape was peeled off at 50 ° C., and the radiation-curable pressure-sensitive adhesive tape was peeled off at room temperature after irradiation with ultraviolet rays of 500 mJ / cm 2 .
Next, the element ratio of contaminants on the wafer surface after peeling the semiconductor wafer surface protecting adhesive tape was measured by XPS (X-ray photoelectron spectroscopy). The amount of increase in carbon derived from transfer contaminants from the adhesive tape was calculated as mol% compared to a blank wafer to which the adhesive tape was not bonded. XPS was measured under the following conditions.
X-ray source: MgKα, X-ray Take off angle: 45 °,
Measurement area: 1.1mmφ
(Evaluation)
The adhesive tape for protecting the surface of a semiconductor wafer produced in each example and each comparative example was evaluated. As a result, it determined as follows and made (circle) the pass.
C (carbon) amount (atomic%) was 25 or less: ○
C (carbon) content (atomic%) greater than 25: x
(試験方法)
株式会社東洋精機製作所製のループステフネステスタ(商品名)を用いて、反発係数γ及び反発力αを測定した。
各実施例及び各比較例で作製した半導体ウエハ表面保護用粘着テープを幅1cmにカットし、ループステフネステスタに設置した。その際、ループ長50mm以上の帯状の該粘着テープの中央付近で、ループ長50mmの円形ループを作り、この円形ループを外側から5mm押し込んだときにかかる荷重測定した。このとき得られた荷重を該粘着テープの幅当たりに換算し、mN/mm単位で表示した値を反発力αとした。この反発力αを該粘着テープの基材樹脂フィルムの厚さの2乗で割った値を反発係数γとした。
(評価)
各実施例及び各比較例で作製した半導体ウエハ表面保護用粘着テープについて、評価を行った。その結果、反発係数が100mN/mm3以上、かつ反発力が13mN/mm以下の場合を合格とした。また、反発力が20mN/mm以上であったものは測定不能とした。 7). Restitution coefficient and resilience measurement test (test method)
Using a loop step tester (trade name) manufactured by Toyo Seiki Seisakusho Co., Ltd., the restitution coefficient γ and the repulsion force α were measured.
The semiconductor wafer surface protecting adhesive tape prepared in each Example and each Comparative Example was cut into a width of 1 cm and placed on a loop stiffness tester. At that time, a circular loop having a loop length of 50 mm was formed in the vicinity of the center of the belt-like adhesive tape having a loop length of 50 mm or more, and the load applied when the circular loop was pushed in from the outside by 5 mm was measured. The load obtained at this time was converted to the width of the pressure-sensitive adhesive tape, and the value displayed in mN / mm was defined as the repulsive force α. A value obtained by dividing the repulsive force α by the square of the thickness of the base resin film of the adhesive tape was defined as a restitution coefficient γ.
(Evaluation)
The adhesive tape for protecting the surface of a semiconductor wafer produced in each example and each comparative example was evaluated. As a result, the case where the restitution coefficient was 100 mN / mm 3 or more and the repulsion force was 13 mN / mm or less was regarded as acceptable. Moreover, the repulsive force was 20 mN / mm or more, and measurement was impossible.
(試験方法)
各実施例及び各比較例で作製した半導体ウエハ表面保護用粘着テープのうち、感圧型のものについて、50℃での粘着力を測定した。
該粘着テープから幅25mm×長さ300mmの試験片を3点採取し、それをJIS R 6253に規定する280番の耐水研磨紙で仕上げたJIS G 4305に規定する厚さ1.5mm~2.0mmのSUS304鋼板上で2kgのゴムローラを3往復かけて圧着した。1時間放置後、JIS B 7721に規定する引張試験機を用いて、SUS板に圧着された該粘着テープの試験片を50℃、相対湿度49%で粘着力を測定した。測定は、180度引きはがし法によるものとし、この時の引張速さは300mm/minとした。 8. Adhesive strength measurement test at 25 ° C and 50 ° C (test method)
Among the pressure-sensitive adhesive tapes for protecting the semiconductor wafer surface produced in each example and each comparative example, the adhesive strength at 50 ° C. was measured.
Three test pieces each having a width of 25 mm and a length of 300 mm were collected from the adhesive tape, and finished with a No. 280 water-resistant abrasive paper specified in JIS R 6253. The thickness specified in JIS G 4305 was 1.5 mm to 2. A 2 kg rubber roller was pressure-bonded on a 0 mm SUS304 steel plate by three reciprocations. After standing for 1 hour, the adhesive strength of the test piece of the adhesive tape pressure-bonded to the SUS plate was measured at 50 ° C. and a relative humidity of 49% using a tensile tester specified in JIS B 7721. The measurement was performed by a 180-degree peeling method, and the tensile speed at this time was 300 mm / min.
(試験方法)
半導体ウエハ表面保護用粘着テープのサンプルをダンベル形状1号型(JIS K 6301)に従いダンベルにて打ち抜き、ロールに対して巻きの方向を縦方向(MD)、幅の方向を横方向(TD)とし、それぞれについてn=3サンプリングを行い、それぞれについてサンプリングしたサンプルの中央部から上下20mmの場所に線を引いた。引張試験機(JIS B 7721)を用いて引張速度300mm/minで引っ張り、線内で破断した際の伸び率を測定した。3回測定の平均値を実際の値として用い、縦方向の引張破断伸度及び横方向の引張破断伸度の差を計算した。 9. Measurement of tensile elongation at break in longitudinal (MD) and transverse (TD) directions (test method)
A sample of an adhesive tape for protecting the surface of a semiconductor wafer is punched out with a dumbbell according to dumbbell shape No. 1 (JIS K 6301), and the winding direction with respect to the roll is set to the vertical direction (MD), and the width direction is set to the horizontal direction (TD). Each sample was subjected to n = 3 sampling, and a line was drawn at a
一方、実施例1~実施例11の半導体ウエハ表面保護用粘着テープはいずれも、搬送試験及び薄膜研削試験結果は合格レベルであり、剥離も問題なく行えることがわかった。特に実施例1、実施例3、実施例4及び実施例10では薄膜研削性及び搬送性に優れる結果となった。基材としてポリイミドを用いると性能は良いがコストが高いため、実施例1、実施例3及び実施例4が総合的に最も優れる結果となった。 As shown in Tables 1 to 3, in Comparative Example 1, the difference in tensile elongation at break between the longitudinal direction and the transverse direction exceeded 35%, and the adhesive tape for protecting the semiconductor wafer surface was warped. became. In Comparative Example 2, since the coefficient of restitution is too small, the warpage of the wafer itself cannot be corrected, the transportability is rejected, and the difference in tensile breaking elongation exceeds 35%, so that the tape itself is also warped. It became. In Comparative Example 3, since PET was used for the base resin film, the transportability was acceptable, but since there was no intermediate resin layer, the cushioning property was insufficient during thin film grinding, and the thin film grindability was poor and edge cracks occurred. As a result. Furthermore, since the repulsive force is high, the tape itself is not easily bent when the tape is peeled off, resulting in the wafer cracking or peeling failure during peeling. In Comparative Examples 4 and 5, the coefficient of restitution was too small and the transportability was rejected. Since the core material PET was used in Comparative Example 6, there was no problem in transportability, but the thin film grindability was poor, and many cracks were generated during thin film grinding.
On the other hand, it was found that all of the semiconductor wafer surface protecting adhesive tapes of Examples 1 to 11 had acceptable results in the conveyance test and thin film grinding test, and could be peeled off without any problem. In particular, Example 1, Example 3, Example 4 and Example 10 resulted in excellent thin film grindability and transportability. When polyimide is used as the base material, the performance is good, but the cost is high. Therefore, Example 1, Example 3 and Example 4 are the best overall results.
2 粘着剤層
3 中間樹脂層
20 半導体ウエハ表面保護用粘着テープ DESCRIPTION OF
Claims (11)
- 基材樹脂フィルムと、該基材樹脂フィルム上にアクリル重合体及び/又はポリウレタンアクリレートを含有するベース樹脂成分が架橋された中間樹脂層を介して、直接粘着剤層を有する、半導体ウエハ表面保護用粘着テープであって、当該半導体ウエハ表面保護用粘着テープを下記条件(a)~(d)で測定したループスティフネスの負荷荷重から求められた、単位幅当りの反発力αを基材の厚さβの2乗で割った反発係数γが100mN/mm3以上であり、反発力αが13mN/mm以下であり、且つ縦方向と横方向の引張破断伸度の差が35%以下であることを特徴とする半導体ウエハ表面保護用粘着テープ。
(a)装置
ループステフネステスタ(商品名、東洋精機社製)
(b)ループ(試験片)形状
長さ50mm以上、幅10mm
(c)圧子の押し込み速度
3.3mm/sec
(d)圧子の押し込み量
圧子がループと接触した時点から5mm押し込む For protecting a semiconductor wafer surface, having a base resin film and an adhesive layer directly through an intermediate resin layer in which a base resin component containing an acrylic polymer and / or polyurethane acrylate is crosslinked on the base resin film An adhesive tape, the repulsive force α per unit width obtained from the load load of the loop stiffness measured on the adhesive tape for protecting a semiconductor wafer surface under the following conditions (a) to (d): The restitution coefficient γ divided by the square of β is 100 mN / mm 3 or more, the repulsion force α is 13 mN / mm or less, and the difference in tensile breaking elongation between the longitudinal direction and the transverse direction is 35% or less. An adhesive tape for protecting the surface of a semiconductor wafer.
(A) Equipment Loop step tester (trade name, manufactured by Toyo Seiki Co., Ltd.)
(B) Loop (test piece) shape Length 50 mm or more, width 10 mm
(C) Indenter pushing speed 3.3 mm / sec
(D) Indenter push-in amount Push in 5 mm from the point when the indenter contacts the loop. - 前記中間樹脂層のアクリル重合体が水酸基及びカルボキシル基を有することを特徴とする請求項1記載の半導体ウエハ表面保護用粘着テープ。 2. The adhesive tape for protecting a semiconductor wafer surface according to claim 1, wherein the acrylic polymer of the intermediate resin layer has a hydroxyl group and a carboxyl group.
- 前記中間樹脂層のポリウレタンアクリレートが水酸基及びカルボキシル基を有することを特徴とする請求項1記載の半導体ウエハ表面保護用粘着テープ。 2. The adhesive tape for protecting a semiconductor wafer surface according to claim 1, wherein the polyurethane acrylate of the intermediate resin layer has a hydroxyl group and a carboxyl group.
- 前記中間樹脂層の架橋後のガラス転移温度が-10℃~30℃である請求項1~3のいずれか1項に記載の半導体ウエハ表面保護用粘着テープ。 The adhesive tape for protecting a semiconductor wafer surface according to any one of claims 1 to 3, wherein the glass transition temperature after crosslinking of the intermediate resin layer is -10 ° C to 30 ° C.
- 前記基材樹脂フィルムがポリエステル樹脂フィルムであることを特徴とする請求項1~4のいずれか1項記載の半導体ウエハ表面保護用粘着テープ。 The adhesive tape for protecting a semiconductor wafer surface according to any one of claims 1 to 4, wherein the base resin film is a polyester resin film.
- 前記ポリエステル樹脂フィルムがポリエチレンテレフタレートフィルムであることを特徴とする請求項5記載の半導体ウエハ表面保護用粘着テープ。 6. The adhesive tape for protecting a semiconductor wafer surface according to claim 5, wherein the polyester resin film is a polyethylene terephthalate film.
- 前記ポリエステル樹脂フィルムの厚さが25~75μmであることを特徴とする請求項5又は6記載の半導体ウエハ表面保護用粘着テープ。 The adhesive tape for protecting a semiconductor wafer surface according to claim 5 or 6, wherein the polyester resin film has a thickness of 25 to 75 µm.
- 前記半導体ウエハ表面保護用粘着テープが感圧型粘着テープであり、20~25℃におけるSUS研磨面に対する粘着力が0.5N/25mm以上であり、かつ50℃におけるSUS研磨面に対する粘着力が0.5N/25mm以下であることを特徴とする請求項1~7のいずれか1項記載の半導体ウエハ表面保護用粘着テープ。 The adhesive tape for protecting a semiconductor wafer surface is a pressure-sensitive adhesive tape, and has an adhesive force to a SUS polished surface at 20 to 25 ° C. of 0.5 N / 25 mm or more, and an adhesive force to a SUS polished surface at 50 ° C. is 0. The adhesive tape for protecting a semiconductor wafer surface according to any one of claims 1 to 7, wherein the pressure-sensitive adhesive tape is 5 N / 25 mm or less.
- 前記粘着剤層を構成するベース樹脂の重量平均分子量が100万以上であることを特徴とする請求項8記載の半導体ウエハ表面保護用粘着テープ。 9. The adhesive tape for protecting a semiconductor wafer surface according to claim 8, wherein the weight average molecular weight of the base resin constituting the adhesive layer is 1 million or more.
- 前記粘着剤層が、放射線を照射することにより粘着力が低くなることを特徴とする請求項1~7のいずれか1項記載の半導体ウエハの表面保護用粘着テープ。 The adhesive tape for protecting a surface of a semiconductor wafer according to any one of claims 1 to 7, wherein the adhesive layer has a low adhesive strength when irradiated with radiation.
- 前記粘着剤層が、主鎖に対して放射線重合性炭素-炭素二重結合含有基を1つ以上有するアクリル系単量体を構成単位として含む重合体を主成分とするベース樹脂を用いてなることを特徴とする請求項10に記載の半導体ウエハの表面保護用粘着テープ。 The pressure-sensitive adhesive layer is made of a base resin composed mainly of a polymer containing as a constituent unit an acrylic monomer having at least one radiation-polymerizable carbon-carbon double bond-containing group with respect to the main chain. The pressure-sensitive adhesive tape for protecting a surface of a semiconductor wafer according to claim 10.
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CN201080054015.6A CN102754200B (en) | 2009-12-22 | 2010-12-21 | Adhesive tape for protecting surface of semiconductor wafer |
KR1020127014335A KR101230736B1 (en) | 2009-12-22 | 2010-12-21 | Adhesive tape for protecting surface of semiconductor wafer |
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JP2009291497 | 2009-12-22 | ||
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JP2010220068A JP4851613B2 (en) | 2009-12-22 | 2010-09-29 | Adhesive tape for semiconductor wafer surface protection |
JP2010-220068 | 2010-09-29 |
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PCT/JP2010/073054 WO2011078193A1 (en) | 2009-12-22 | 2010-12-21 | Adhesive tape for protecting surface of semiconductor wafer |
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JP (1) | JP4851613B2 (en) |
KR (1) | KR101230736B1 (en) |
CN (1) | CN102754200B (en) |
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003306654A (en) * | 2002-04-16 | 2003-10-31 | Furukawa Electric Co Ltd:The | Radiation-curable adhesive tape |
JP2005068420A (en) * | 2003-08-07 | 2005-03-17 | Mitsui Chemicals Inc | Pressure-sensitive adhesive sheet |
JP2008235716A (en) * | 2007-03-22 | 2008-10-02 | Furukawa Electric Co Ltd:The | Pressure-sensitive adhesive tape for machining semiconductor device |
JP2009141023A (en) * | 2007-12-04 | 2009-06-25 | Furukawa Electric Co Ltd:The | Tape for wafer processing |
JP2009221324A (en) * | 2008-03-14 | 2009-10-01 | Soken Chem & Eng Co Ltd | Pressure-sensitive adhesive for optical member and protection film for optical member using the same |
JP2009242776A (en) * | 2008-03-14 | 2009-10-22 | Furukawa Electric Co Ltd:The | Adhesive tape for surface protection for semiconductor wafer |
JP2009267389A (en) * | 2008-03-31 | 2009-11-12 | Mitsui Chemicals Inc | Dicing film |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002069396A (en) * | 2000-08-29 | 2002-03-08 | Mitsui Chemicals Inc | Adhesive film for protecting semiconductor wafer and method for processing back of semiconductor wafer using the same |
JP4493296B2 (en) * | 2002-07-26 | 2010-06-30 | 日東電工株式会社 | Processing adhesive sheet and its manufacturing method |
EP1591504B1 (en) * | 2003-02-05 | 2012-05-23 | The Furukawa Electric Co., Ltd. | Pressure-sensitive adhesive tape for pasting wafer thereto |
US20050031822A1 (en) * | 2003-08-07 | 2005-02-10 | Mitsui Chemicals, Inc. | Adhesive sheet |
JP4776189B2 (en) * | 2004-08-03 | 2011-09-21 | 古河電気工業株式会社 | Wafer processing tape |
CN1827367A (en) * | 2005-02-23 | 2006-09-06 | 日东电工株式会社 | Multilayer sheet, production method thereof and adhesive sheet using the multilayer sheet |
-
2010
- 2010-09-29 JP JP2010220068A patent/JP4851613B2/en active Active
- 2010-12-21 KR KR1020127014335A patent/KR101230736B1/en active IP Right Grant
- 2010-12-21 CN CN201080054015.6A patent/CN102754200B/en active Active
- 2010-12-21 WO PCT/JP2010/073054 patent/WO2011078193A1/en active Application Filing
- 2010-12-22 TW TW099145115A patent/TWI465541B/en active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003306654A (en) * | 2002-04-16 | 2003-10-31 | Furukawa Electric Co Ltd:The | Radiation-curable adhesive tape |
JP2005068420A (en) * | 2003-08-07 | 2005-03-17 | Mitsui Chemicals Inc | Pressure-sensitive adhesive sheet |
JP2008235716A (en) * | 2007-03-22 | 2008-10-02 | Furukawa Electric Co Ltd:The | Pressure-sensitive adhesive tape for machining semiconductor device |
JP2009141023A (en) * | 2007-12-04 | 2009-06-25 | Furukawa Electric Co Ltd:The | Tape for wafer processing |
JP2009221324A (en) * | 2008-03-14 | 2009-10-01 | Soken Chem & Eng Co Ltd | Pressure-sensitive adhesive for optical member and protection film for optical member using the same |
JP2009242776A (en) * | 2008-03-14 | 2009-10-22 | Furukawa Electric Co Ltd:The | Adhesive tape for surface protection for semiconductor wafer |
JP2009267389A (en) * | 2008-03-31 | 2009-11-12 | Mitsui Chemicals Inc | Dicing film |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013065981A1 (en) * | 2011-11-02 | 2013-05-10 | (주)엘지하우시스 | Adhesive film having good machinability for protecting the surface of a semiconductor wafer |
KR101393895B1 (en) * | 2011-11-02 | 2014-05-13 | (주)엘지하우시스 | Adhesive film for protecting surfase of semiconductorwafer which has excellent cutting property |
CN103360972A (en) * | 2012-03-26 | 2013-10-23 | 古河电气工业株式会社 | An adhesive tape for protecting the surface of a semiconductor chip |
CN103525323A (en) * | 2012-07-06 | 2014-01-22 | 古河电气工业株式会社 | Adhesive tape for surface protection of a semiconductor wafer and method of producing a semiconductor wafer using the same |
CN103525323B (en) * | 2012-07-06 | 2015-07-29 | 古河电气工业株式会社 | Semiconductor wafer surface protection adhesive tape and employ the manufacture method of semiconductor wafer of this adhesive tape |
WO2014010933A1 (en) * | 2012-07-10 | 2014-01-16 | (주)엘지하우시스 | Semiconductor wafer surface protecting semi-adhesive film and production method for same |
EP3786246A4 (en) * | 2018-04-24 | 2022-01-19 | Mitsui Chemicals Tohcello, Inc. | Pressure-sensitive adhesive film and method for producing electronic device |
WO2020137980A1 (en) * | 2018-12-25 | 2020-07-02 | 積水化学工業株式会社 | Adhesive tape |
EP3919578A1 (en) * | 2020-06-02 | 2021-12-08 | Nitto Denko Corporation | Pressure-sensitive adhesive sheet for semiconductor processing |
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---|---|
TW201124503A (en) | 2011-07-16 |
JP2011151355A (en) | 2011-08-04 |
JP4851613B2 (en) | 2012-01-11 |
KR20120066685A (en) | 2012-06-22 |
KR101230736B1 (en) | 2013-02-07 |
TWI465541B (en) | 2014-12-21 |
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CN102754200B (en) | 2015-05-27 |
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