WO2011074615A1 - Procédé et appareil pour polir un matériau en forme de plaque - Google Patents

Procédé et appareil pour polir un matériau en forme de plaque Download PDF

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Publication number
WO2011074615A1
WO2011074615A1 PCT/JP2010/072587 JP2010072587W WO2011074615A1 WO 2011074615 A1 WO2011074615 A1 WO 2011074615A1 JP 2010072587 W JP2010072587 W JP 2010072587W WO 2011074615 A1 WO2011074615 A1 WO 2011074615A1
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WIPO (PCT)
Prior art keywords
polishing
lanes
plate
polished
glass plate
Prior art date
Application number
PCT/JP2010/072587
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English (en)
Japanese (ja)
Inventor
直彦 石丸
厚 城山
辰朗 河内
Original Assignee
旭硝子株式会社
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Application filed by 旭硝子株式会社 filed Critical 旭硝子株式会社
Priority to CN2010800576887A priority Critical patent/CN102666010A/zh
Priority to JP2011546154A priority patent/JP5637147B2/ja
Publication of WO2011074615A1 publication Critical patent/WO2011074615A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/06—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving conveyor belts, a sequence of travelling work-tables or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/033—Other grinding machines or devices for grinding a surface for cleaning purposes, e.g. for descaling or for grinding off flaws in the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
    • B24B7/244—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass continuous

Definitions

  • the present invention relates to a plate-like object polishing method and polishing apparatus.
  • LCD liquid crystal display devices
  • PDP plasma display devices
  • OLED organic EL display devices
  • These display devices are equipped with a display element having at least one glass plate.
  • a display element having at least one glass plate.
  • Glass plates used for flat panel displays are currently manufactured by the fusion method (overflow downdraw method) or float method from the viewpoint of the required physical and chemical performance. According to the fusion method, both surfaces of the glass become free surfaces when the glass plate is formed, and a glass plate for FPD can be provided without undergoing a polishing step after forming.
  • Manufacturing of glass plate by float method is as follows. As shown in FIG. 18, the twill 40, the canal 42, the molten metal 52, the molten metal bath (float bath) 53, the top roll 56, the slow cooling furnace 62, the imaging devices 50 and 51 for observing the state of the molten glass, and the cutting A device 70 and the like are provided.
  • the molten glass melted in the melting kiln upstream of the canal 42 is supplied to the float bath 53.
  • Molten tin is stored in the float bath 53, and the molten glass 54 flows over the molten tin and is stretched to become a glass ribbon GR having a predetermined thickness and flattened.
  • a lift-out roller 60 that draws the glass ribbon GR from the float bath 53 and carries it into the slow cooling furnace 62.
  • the molten glass 54 on the molten tin of the float bath 53 advances in the form of a ribbon having a constant width toward the downstream side of the float bath 53 while being pulled in the direction of the slow cooling furnace.
  • the glass ribbon GR in the flow direction F d is a direction toward the downstream side from the upstream side of the float bath.
  • the glass (glass ribbon GR) formed in a ribbon shape is conveyed from the float bath 53 to the slow cooling furnace 62 and gradually cooled to room temperature while being conveyed by the layer roller 64 in the slow cooling furnace.
  • the cut glass plate is sent to a polishing process after undergoing an inspection process. Further, end face processing (chamfering) of the glass plate is performed. In the polishing step, the surface of the glass plate is polished by a polishing apparatus to remove minute scratches and undulations on the surface.
  • FIG. 8 shows an example of a conventional polishing apparatus.
  • the non-polishing target surface of the glass plate G is sucked and held on the suction sheet 3 bonded to the table 2 and continuously conveyed in the direction of arrow X by a moving means (not shown).
  • polishing target surface (surface to be polished) of the glass plate G is grind
  • circular polishing tools are arranged in a left-right manner in the X direction, and sequentially contact the glass plate to perform polishing.
  • the circular polishing tools 4, 4... are arranged in pairs with respect to the movement center line L of the glass plate G, and are arranged in a zigzag shape (zigzag shape) along the movement direction.
  • the circular polishing tools 4, 4... Rotate and revolve, move from one side to the other side beyond the moving center line L, and polish the glass plate G.
  • the polishing apparatus 1 having a plurality of polishing heads, a single large polishing tool is not used, but a small circular polishing tool 4, 4 having a diameter D smaller than the width W of the glass plate G. ..., the glass plate G can be polished in a large amount and continuously (see, for example, Patent Document 1).
  • Patent Document 2 a polishing apparatus that polishes the entire surface of a large glass plate at one time is known (for example, see Patent Document 2). This is a so-called one-head type polishing apparatus.
  • the glass surface defects are distributed with a certain tendency in parallel with the moving direction of the glass ribbon at the time of molding.
  • the surface defects are minute scratches and undulations caused by various reasons such as glass pieces adhering to a roll and uneven stirring of raw materials.
  • the scratches and swells are generally formed in a line having regularity in one direction, and in this specification, the direction of the line formed on the glass plate is referred to as a streak direction.
  • the glass plate is polished so that the grid direction of the glass plate is in the same direction as the conveying direction at the time of polishing, there are few surface defects on the surface to be polished by some polishing tools, There may be many surface defects on the surface to be polished by other polishing tools.
  • the maximum polishing amount may be determined for a portion having a large surface defect reflecting the inspection result of the surface of the glass plate performed in advance.
  • a portion having few defects and a portion having many defects are similarly polished. That is, in the case of the conventional method in which the entire surface of the glass plate is uniformly polished, there is a problem that it is difficult to reduce the required man-hour (time) for polishing one substrate.
  • the present invention has been made in view of such a situation, and intends to dramatically improve the working efficiency in the polishing process of a plate-like object such as a glass plate. Further, when polishing is performed as described above, uneven polishing (polishing streaks) may occur in a specific portion of the surface to be polished of the plate-like body due to unevenness of the portion to be polished. The present invention further aims to reduce the above-mentioned polishing unevenness.
  • Aspect 1 of the present invention is a method of polishing a surface to be polished of a plate-like object conveyed in a predetermined conveying direction with three or more polishing heads, wherein the surface to be polished is a direction orthogonal to the conveying direction.
  • a plurality of polishing lanes are set so as to be divided into two, the number of polishing heads corresponding to each of the plurality of polishing lanes is weighted and arranged, and the state of the surface to be polished corresponding to each of the plurality of polishing lanes is set
  • a polishing method for a plate-like object is provided, wherein the polishing amount is set based on the above.
  • a plate-like object to be polished is placed in a plane, and M polishing heads (M ⁇ 3) for polishing the surface to be polished are installed,
  • the object to be polished is moved in the X-axis direction in the plane with respect to the polishing head, and the first polishing head with respect to one object to be polished is associated with the relative movement of the object to be polished and the polishing head in the X-axis direction.
  • a method for polishing a material A plurality of polishing lanes are set by dividing the surface to be polished in the Y-axis direction in a plane, the number of polishing heads corresponding to each polishing lane is weighted, and a desired polishing amount (polishing allowance) is set for each polishing lane.
  • a polishing method for a plate-like material A plurality of polishing lanes are set by dividing the surface to be polished in the Y-axis direction in a plane, the number of polishing heads corresponding to each polishing lane is weighted, and a desired polishing amount (polishing allowance) is set for each polishing lane.
  • Aspect 2 provides the polishing method according to aspect 1, wherein the minimum polishing amount in the plurality of polishing lanes is 0 to 3 ⁇ m.
  • Aspect 3 provides the polishing method according to aspect 1, wherein the maximum polishing amount in the plurality of polishing lanes is 1 to 10 ⁇ m.
  • Aspect 4 provides the polishing method according to aspect 1, wherein the difference between the maximum polishing amount and the minimum polishing amount in the plurality of polishing lanes is 0 to 10 ⁇ m.
  • Aspect 5 provides the polishing method according to aspects 1, 2, 3 or 4, wherein the number of the plurality of polishing lanes is 2 to 5.
  • Aspect 6 is characterized in that the number of the polishing heads arranged corresponding to each of the plurality of polishing lanes is 0 to 16 for the minimum number of polishing lanes and 10 to 32 for the maximum number of polishing lanes.
  • a polishing method according to any one of aspects 1 to 5 is provided.
  • Aspect 7 provides the polishing method according to any one of aspects 1 to 6, wherein the total number of the polishing heads is 11 to 35.
  • Aspect 8 provides the polishing method according to any one of aspects 1 to 7, wherein the sizes of the polishing heads are set to be approximately equal.
  • Aspect 9 is characterized in that the plate-like object is a glass plate, and the glass plate is arranged so that the conveying direction in the molding process of the glass plate is the same as the conveying direction at the time of polishing. 8.
  • a polishing method according to any one of 8 is provided.
  • Aspect 10 is characterized in that 0.8 W ⁇ D L ⁇ 0.3 W is satisfied, where W is the width of the plate-like material and D L is the effective length of the polishing head.
  • a polishing method is provided.
  • the rotation center and / or revolution center of the polishing head in the most downstream section on the same polishing lane, and at least one rotation center of the polishing head located on the upstream side of the first to third sections from the most downstream section and / or The polishing method according to any one of aspects 1 to 10, wherein the revolution center is not located on the same parallel line in the transport direction during polishing.
  • Aspect 12 is characterized in that at least one of the polishing heads located on the upstream side of the first to third sections from the most downstream section on the same polishing lane reciprocates in a direction crossing the conveying direction during the polishing.
  • a polishing method according to any one of 1 to 10 is provided.
  • the plate-like body transporting unit facing at least one of the polishing heads located on the upstream side of the first to third sections from the most downstream section on the same polishing lane reciprocates in the direction crossing the transport direction.
  • a polishing method according to any one of aspects 1 to 10 is provided.
  • Aspect 14 provides the polishing method according to any one of aspects 1 to 13, wherein the distribution state of surface defects on the surface to be polished is inspected before polishing.
  • Aspect 15 provides the polishing apparatus according to any one of Aspects 1 to 14, wherein the plate-like product is a glass plate manufactured by a float process.
  • Aspect 16 provides the polishing method according to any one of Aspects 1 to 15, wherein the surface defect distribution state on the surface to be polished is further inspected after polishing.
  • Aspect 17 provides the polishing method according to any one of Aspects 1 to 16, wherein the plate-like material is a glass plate for a flat panel display.
  • Aspect 18 provides the polishing method according to any one of Aspects 1 to 17, wherein the plate-like object has a short side length of 1900 mm or more and a long side length of 2200 mm or more.
  • the thickness of the object to be polished is preferably 0.1 to 1.8 mm.
  • Aspect 19 provides the polishing method according to any one of aspects 1 to 18, wherein the width of one of the plurality of polishing lanes is 800 mm to 1600 mm.
  • Aspect 20 is any one of Aspects 1 to 19, wherein the polishing head is circular and rotates around the rotation axis of each polishing head, and revolves around the plate-like object with a predetermined revolving radius.
  • a polishing method is provided.
  • Aspect 21 is that the time from when the first polishing head comes into contact with one plate-like object and the polishing is started until the last polishing head is finished is 1 to 20 minutes.
  • a polishing method according to any one of aspects 1 to 20 is provided.
  • Aspect 22 is an apparatus for polishing a surface to be polished of a plate-like object conveyed in a predetermined conveying direction with three or more polishing heads, and the surface to be polished is divided in a direction orthogonal to the conveying direction.
  • a plurality of polishing lanes are set, the number of polishing heads corresponding to each of the plurality of polishing lanes is weighted, and polishing is performed based on the state of the surface to be polished corresponding to each of the plurality of polishing lanes.
  • An apparatus for polishing a plate-like material characterized in that the amount is set.
  • a plate-like object to be polished is placed in a plane, M polishing heads (M ⁇ 3) for polishing the surface to be polished are installed,
  • the object to be polished is moved in the X-axis direction in the plane with respect to the polishing head, and the first polishing head with respect to one object to be polished is associated with the relative movement of the object to be polished and the polishing head in the X-axis direction.
  • a polishing apparatus for the object A plurality of polishing lanes are set by dividing the surface to be polished in the Y-axis direction in a plane, and the number of polishing heads corresponding to each polishing lane is weighted and arranged to achieve a desired polishing amount for each polishing lane.
  • a plate-like material polishing apparatus is provided.
  • the object to be polished is preferably a glass plate for FPD.
  • FPD has a larger screen and a higher definition display device than before, and a glass plate having excellent flatness is required.
  • partial non-uniformity in the width direction of the glass ribbon may occur in the process of the glass plate from melting of the raw material to forming, cutting and the like.
  • manufacturing techniques used as mass production techniques include a float method, an overflow downdraw method, a redraw method, and the like, and in each of these, there may be a tendency defect in the width direction of the glass ribbon with respect to surface flatness and foreign matter. Further, during the conveyance of the glass plate, the generation of scratches on the end surface of the glass plate and the scratches on the main surface of the glass plate may occur unevenly.
  • the present invention is particularly preferably a glass plate produced by a float process.
  • a glass plate formed in a ribbon shape through each process by a float process is cut into a glass plate of a predetermined size by a cutting device. At this time, surface defects tend to occur in the glass plate G along the moving direction F d (straight line direction) during molding.
  • the glass plate G processed to a predetermined size is moved in the same direction as the streak direction (movement direction F d at the time of molding), and inspection is performed.
  • information such as the position, size and depth of the surface defect, and the type of the surface defect is detected.
  • Information on the detected surface defects is recorded in the recording means.
  • polishing is performed by a polishing tool of a plurality of polishing heads arranged for each polishing lane along the moving direction of the glass plate.
  • polishing heads are arranged at positions where there are more surface defects than positions where there are few surface defects.
  • the polishing information necessary for the polishing process is extracted from the recording means and provided by the control means, and the polishing head is appropriately arranged.
  • This polishing information is statistical data corresponding to a predetermined quantity of production.
  • the arrangement of the polishing head can be appropriately determined according to the type and standard of the product to be produced, the specifications for each shipping destination, and the like. In the polishing process, the position of each polishing head is moved manually, semi-automatically or automatically based on the polishing information.
  • the glass plate in which surface defects are generated with a tendency due to the influence of each process of the float process increases the polishing ability of the portion (polishing lane) where the surface defects are large, while the surface defects are reduced.
  • the polishing capability of a small part (polishing lane) can be lowered.
  • the polishing can be performed more efficiently than the conventional method (a polishing method having a polishing ability to make the in-plane uniform).
  • the present invention it becomes possible to optimally correspond to the polishing time according to the degree of polishing required for the portion where the surface defect exists, and it is possible to realize polishing without waste as a whole.
  • the operating rate of the plate-like object polishing apparatus can be dramatically improved.
  • polishing unevenness (polishing streaks) caused by polishing can be removed / reduced.
  • a polishing lane is set in accordance with the occurrence distribution of surface defects on the surface to be polished of the plate-like object, and the distribution of the polishing ability in the polishing lane is made to correspond to the conventional method (in-plane Compared with a polishing method for uniform polishing, the polishing efficiency can be improved dramatically. Further, since polishing unevenness (polishing streaks) due to polishing can be removed / reduced, the surface quality of the plate-like material after polishing can be stabilized.
  • the top view which shows the setting condition of the polishing head in this invention A perspective view showing a conventional polishing apparatus Top view showing the state of polishing by a conventional polishing apparatus
  • FIG. 1 is a side view of the polishing apparatus 10 when the polishing head 5 of the polishing apparatus 10 is viewed in the moving direction of the glass plate G
  • FIG. 2 is a view of the polishing head 5 viewed from a direction perpendicular to the moving direction of the glass plate G
  • 3 is a side view of the polishing apparatus 10
  • FIG. 3 is a side view of the polishing apparatus 10 in which the polishing head 5 is moved from the A side to the B side
  • FIG. 4 is a schematic plan view showing a state in which the polishing head 5 is installed in two polishing lanes. It is shown that the weight of the parallel arrangement is changed along the flowing direction of the glass plate.
  • FIG. 5 is a side view of the polishing apparatus 10 showing the fixed state of the polishing head 5.
  • a melting furnace a molten metal bath (float bath), a slow cooling furnace, a cutting device, and the like are provided (see FIG. 18).
  • the glass plate formed into a ribbon shape through each process by the float method is cut into a glass plate G of a predetermined size by a cutting device. At this time, in the glass plate G, surface defects are generated with a tendency along the moving direction during molding.
  • FIG. 10 schematically shows the state of undulation in the cross-sectional direction of the glass plate.
  • the glass plate manufactured by the float process has a short-period undulation in the substrate surface direction.
  • the height of the peaks and valleys in the thickness direction (T d ) is on the order of ⁇ m and may have scratches in addition to the swells.
  • the defects tend to occur continuously along the glass ribbon moving direction at the time of forming, that is, the line direction.
  • this short period of undulation tends to lead to display unevenness at a level that can be visually recognized by the user.
  • the glass plate also has a longer-period pitch thickness variation (thickness deviation), but these are optically problematic.
  • a portion having a large surface defect on the glass plate and a portion having a small surface defect are separated as polishing lanes, and the polishing heads are dispersedly arranged so as to obtain a desired polishing amount in each polishing lane.
  • the polishing amount of more abrasive lanes of surface defects such as short period waviness and P R
  • the polishing amount of the polishing lane surface defect is less set as P L. Both polishing lanes need not be completely separated areas, and their ends may be folded over in effect.
  • FIG. 11 shows the distribution of the polishing amount in the above conventional example. Basically, two rows of polishing lanes are provided, but the polishing amount in each polishing lane is set equal.
  • FIGS. 12 to 15 schematically show states in which the weighting of the polishing amount for each polishing lane in the present invention is set differently.
  • FIG. 12 shows a case where there are two rows of polishing lanes and the weighting is 2: 5.
  • FIG. 13 shows a case where there are three rows of polishing lanes and the weighting is 1: 2: 6.
  • FIG. 14 there are three rows of polishing lanes, the weighting is 2: 4: 3, and the inner polishing lane is set to have the highest polishing ability.
  • FIG. 15 shows an example in which three rows of polishing lanes are set so that the polishing heads are overlapped and polished in order to slightly move the polishing head spatially to further reduce the step change in the Y direction.
  • FIG. 16 is a schematic diagram generally showing how to arrange the polishing lane and the polishing head in the present invention.
  • the X direction is the conveyance direction of the glass plate G during polishing.
  • the polishing lane is set so that the surface to be polished is divided.
  • the polishing lane is a region where the center (rotation center and revolution center) of the polishing head is located, and there is no problem that the end of the polishing tool comes out to the adjacent polishing lane at the time of polishing.
  • the polishing surface of the glass plate may be polished by spatially rotating and revolving the polishing tool exclusively in the polishing lane.
  • the polishing lanes in the Y direction is provided of M to L 1 ⁇ L M, polishing lane L 1 in one of the polishing head, the polishing lane L 2 to the two polishing head ..., the polishing lane L M
  • a state in which the polishing heads are arranged at all positions so as to have the highest density in the X direction is shown. Then, with the settings this distributed, polishing amount obtained for each polishing lane is P 1, P 2 ... P M .
  • the number (M) of polishing lanes is preferably 2-5.
  • the number of polishing lanes (M) is 2 lanes or more, it is possible to divide a region where a large amount of polishing is necessary and a region where it is small, and when the number is 5 lanes or less, the position of the polishing head can be adjusted efficiently.
  • a plurality of polishing lanes are set, and the polishing amount is calculated based on the polishing conditions, that is, the distribution state of surface defects (FIG. 17 (a)), and a cross section before polishing.
  • the surface state (FIG. 17 (b)) in the direction is polished, and as a result, the surface state (FIG. 17 (c)) in which the surface defects are removed or relaxed can be obtained. It is.
  • Tables 1 to 3 below show examples of the arrangement of the polishing head in the present invention.
  • each of the N regions divided in the X direction is called a polishing section.
  • Tables 1 and 2 show examples in which the number of polishing lanes is 2 (L 1 and L 2 ) and the number of polishing sections is N (1 to N), and
  • Table 3 shows the number of polishing lanes is 3 (L 1 , L 2 and L 3 ), and the number of polishing sections is N (1 to N).
  • the circles in Tables 1 to 3 indicate positions where the polishing head is present.
  • the plate-like object is polished in the order of polishing heads (1, 2,... N) arranged in the X direction.
  • each polishing head is substantially the same as the size of the plate in the Y direction divided by the number of lane divisions.
  • the diameter in the Y direction of the plate-like object may be about 1 ⁇ 2, and in the case of 3 heads, it may be about 3.
  • the polishing heads at the (N ⁇ 1) -th stage and the N-th stage (final stage) at the end of the polishing process are preferably dispersed in the Y direction.
  • the position of the polishing section in the X direction is x
  • the position of the polishing lane in the Y direction is y (where x is an integer from 1 to N, y is an integer from 1 to M, N is the number of polishing sections, and M is the number of polishing lanes) )
  • the polishing amount of each polishing head is P (x, y)
  • the polishing amount PL (y) of each polishing lane is expressed by the following mathematical formula.
  • a glass plate of the seventh generation (1900 ⁇ 2200 mm) or more is preferable.
  • the size of the glass plate can be preferably applied to the 8th generation (2200 mm ⁇ 2400 mm), the 9th generation (2400 mm ⁇ 2800 mm), or the 10th generation (2800 mm ⁇ 3000 mm). If the area is substantially equal to or greater than that of the above size, the same effect can be obtained.
  • the present invention it is important how all or most of the surface defects can be removed within a predetermined time. That is, it is easy to remove surface defects if polishing is performed for a long time, but it is important to complete desired polishing within a limited process time.
  • the amount of polishing required tends to increase, and in spite of this, polishing work of a certain quality is completed within a predetermined process time.
  • the present invention has significance. Basically, the number of polishing heads in the glass conveyance direction (X direction) per lane (or the diameter size of the polishing pad ⁇ the number (number installed in the X direction)) is an index of substantial polishing ability. .
  • a numerical value such as “0.5 ⁇ m / min” is given as the polishing capability index of the entire process.
  • the polishing ability per polishing head is set to the maximum, and the polishing pressure and the rotation speed of each polishing head are set to the maximum possible range.
  • the Y direction that is, the ratio of the polishing amount for each polishing lane
  • the glass plate G manufactured by the float process and cut to a predetermined size is held on the suction sheet 3 adhered to the table 2 by suction and held on the non-polishing target surface, and continuously polished by a moving means (not shown). Up to 10.
  • the glass plate G is polished by the circular polishing tools 4 of the plurality of polishing heads 5 that are weighted for each polishing lane.
  • the glass plate G is disposed on the suction sheet 3 so that the line direction and the X direction are substantially parallel.
  • the polishing head 5 includes a spindle 6 for rotating the circular polishing tool 4 as shown in FIG.
  • the upper end of the spindle 6 is attached to a fixed base 8 that moves up and down by a cylinder 7.
  • the cylinder 7 is attached to a moving mechanism 9 constituted by a guide rail, a ball screw, a motor and the like, and is provided so as to be movable in the direction of arrow Y shown in FIG.
  • the circular polishing tool 4 on the glass plate G can be moved from the A side to the B side or from the B side to the A side as shown in FIG.
  • the moving mechanism 9 is constituted by a guide rail, a ball screw, a motor or the like.
  • the present invention is not limited to this structure, and any mechanism capable of moving the polishing head 5 to a predetermined position. What is necessary is just to use various moving mechanisms, such as a chain, a belt, a cylinder, and a gear.
  • the fixing base 8 is provided with four convex pins 11 facing downward, and a fixing cylinder 12 is attached to the opposite side of the convex pin 11 with the fixing base 8 in between.
  • the convex pin 11 is fitted with the concave pin 14 provided on the positioning rail 13 when the fixing base 8 is lowered to the processing position by the piston 7 ⁇ / b> A of the cylinder 7.
  • the piston 12 ⁇ / b> A of the fixing cylinder 12 rises and the upper end of the piston 12 ⁇ / b> A contacts the moving mechanism 9.
  • the convex pin 11 is pressed against the concave pin 14 by the reaction force, so that the movement of the cylinder 7 with respect to the moving mechanism 9 is limited. As a result, the spindle 6 is fixed at a desired position determined by the concave pin 14.
  • the spindle 6 is fixed at a desired position by the convex pin 11, the fixing cylinder 12, and the concave pin 14.
  • the present invention is not limited to this configuration, and the linear motor, rack pinion
  • the spindle can be moved by a moving mechanism such as a mechanism and can be fixed at an arbitrary position.
  • a moving mechanism such as a mechanism and can be fixed at an arbitrary position.
  • an arbitrary number of polishing tools 4 can be arranged in a plurality of polishing lanes, and the polishing tool 4 can be arranged so as to rotate and / or revolve beyond the polishing lane.
  • control means 15 for controlling the rotation of the spindle 6, the driving of the cylinder 7 or the fixing cylinder 12, the movement of the cylinder 7 by the moving mechanism 9, and the like.
  • FIG. 6 a flowchart showing a specific work flow of the polishing process and a top view (FIG. 7) showing a movement state of the circular polishing tools 4, 4,. .
  • the distribution data of the surface defects of the glass sheet G generated during molding can be known in advance from the management data of the inspection process S1 or the molding process (pre-process). And polishing conditions can be found based on the statistical data of the surface defect.
  • the surface defect is inspected by moving the glass plate in the same direction as the grid direction of the glass plate (the moving direction during molding).
  • an optical inspection apparatus using a laser beam or a directional light beam can be used.
  • the inspection of the glass plate G is an optical inspection device, an inspection device that detects an image obtained by imaging the glass plate G by image processing, a contact inspection device, or the like that can obtain information on surface defects, Various inspection devices can be used. In addition, visual inspection by an operator may be used. In this case, information on surface defects is manually input to the recording means.
  • polishing heads 5 a plurality of circular polishing tools 4 (polishing heads 5) arranged are moved based on the surface defect information (step S3).
  • the information is acquired at the stage of the inspection process S1.
  • the control means 15 is based on the information on the surface defect, and the circular polishing tool 4 is moved by the moving mechanism 9 so that the circular polishing tool 4 is arranged in a relatively large number in the polishing lane where the surface defect exists more than the position where the surface defect is small. 4 is moved in the Y direction.
  • the convex pin 11 and the concave pin 14 are fitted, and the piston 12A of the fixing cylinder 12 is raised (FIG. 5).
  • the piston 12A is lowered to release the pressed state, and the piston 7A of the cylinder 7 is raised to release the fitting state of the convex pin 11 and the concave pin 14 (FIG. 1). .
  • polishing lane L B side from the polishing lane L A side of a glass plate G of the polishing head 5 and the cylinder 7 is moved horizontally along the moving mechanism 9, or polishing lane L A side from the polishing lane L B side (Fig. 3).
  • the cylinder 7 and the fixing cylinder 12 are driven again to bring the convex pin 11 and the concave pin 14 into a fitted state (FIG. 5).
  • the glass plate G is continuously fed by a plurality of circular polishing tools 4 (polishing heads) while feeding the glass plate G in the X direction by the transport device. (Step S4).
  • step S4 After polishing (step S4), the same inspection of the glass plate G as in the inspection step S1 is performed again (step S5).
  • the glass plate G in which there was no problem in polishing the surface defects is finished in the polishing step, and the glass plate G in which the polishing is insufficient is polished again in step S4.
  • the polishing capability can be obtained by optimally arranging the plurality of polishing heads 5 of the polishing apparatus based on the information of the surface defect 17 generated on the glass plate G. It is possible to polish more efficiently than the conventional polishing method in which the thickness is uniform.
  • the polishing head 5 in the present embodiment although arranged in two rows between the polishing lane L B side polishing lane L A side of a glass plate G, the present invention is not limited thereto, the glass sheet G Depending on the surface defects, the polishing lanes can be arranged in three or more rows.
  • the rotation center and / or revolution center of the polishing head in the most downstream section and 1 to 3 sections upstream from the most downstream section It is preferable that at least one rotation center and / or revolution center of the polishing heads positioned is not located on the same parallel line in the plate-shaped body conveyance direction (X direction).
  • polishing in the most downstream polishing section or the two most downstream polishing sections is performed to remove scratches on the surface to be polished of the plate-like body.
  • This polishing is referred to as “scratch removal polishing”, and a zone where the scratch removal polishing is performed is referred to as “defect removal zone”.
  • the first to third polishing sections adjacent to the upstream side of the most downstream section are referred to as “streak removing zone”, and polishing is performed to remove the aforementioned polishing unevenness.
  • At least one rotation center and / or revolution center of the polishing heads located in the streak polishing section is a plate-like body, and the rotation center and / or revolution center of the polishing head of the scratch removal polishing section on the downstream side is the plate-like body. It is preferable not to be positioned on parallel lines in the transport direction (X direction).
  • FIG. 19 shows an example of a polishing apparatus configured as described above.
  • the division number of lanes as 2 and the first lane L A provided second lane L B, polishing compartment downstream polishing compartment Z N and one upstream Z N-1 It is shown.
  • ZN is set as a scratch removal polishing section
  • ZN-1 is set as a line removal polishing section.
  • the center of rotation (rotation center and / or center of revolution) of the circular polishing tool 4 of muscle-up polishing compartment Z N-1 (polishing head 5) is circular polishing tool 4 wound up polishing zone Z N It does not overlap with the rotation center (rotation center and / or revolution center) of the (polishing head 5), and is not located on the same parallel line in the X direction. By doing so, the region to be polished in the line removal polishing section is dispersed, and polishing unevenness (polishing streaks) generated at a specific portion of the surface to be polished of the plate-like body can be removed / reduced.
  • the circular polishing tool (polishing head) is moved in the Y direction (plate-like body) in addition to the above-described method of shifting the position of the circular polishing tool (polishing head) in the streak polishing section.
  • the plate-like body conveying means (table 2) at a position facing the circular polishing tool (polishing head) in the scoring polishing section may be moved back and forth in the Y-direction (plate-like body conveying direction). May be reciprocated in the direction across the surface.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Surface Treatment Of Glass (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)

Abstract

L'invention porte sur un procédé de polissage, qui a un rendement de fonctionnement amélioré dans une étape de polissage sans être affecté par un état de génération de défauts de surface (17) sur une surface de plaque de verre (G) devant être polie. L'état de distribution des défauts de surface (17) de la plaque de verre (G) aspirée vers une feuille d'aspiration (3) sur une table (2) est inspecté au préalable, ladite distribution se trouvant dans la direction de l'axe (Y) à l'intérieur de la surface, davantage de têtes de polissage (5) qui polissent la surface de la plaque de verre (G) étant disposées dans une piste de polissage (LB), qui est une région où davantage de défauts de surface (17) sont présents par rapport à une piste de polissage (LA), à savoir une région comportant moins de défauts de surface (17), et la surface de la plaque de verre (G) étant polie par déplacement de la plaque de verre dans la direction de l'axe X.
PCT/JP2010/072587 2009-12-18 2010-12-15 Procédé et appareil pour polir un matériau en forme de plaque WO2011074615A1 (fr)

Priority Applications (2)

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CN2010800576887A CN102666010A (zh) 2009-12-18 2010-12-15 板状物的研磨方法及研磨装置
JP2011546154A JP5637147B2 (ja) 2009-12-18 2010-12-15 板状物の研磨方法及び研磨装置

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JP2009288005 2009-12-18
JP2009-288005 2009-12-18

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WO2011074615A1 true WO2011074615A1 (fr) 2011-06-23

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CN (1) CN102666010A (fr)
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101381673B1 (ko) * 2011-07-27 2014-04-14 주식회사 엘지화학 신규한 구조의 연마 장치
CN104308685A (zh) * 2014-10-17 2015-01-28 王秀云 一种机械零件的打磨器
CN114683113A (zh) * 2022-05-31 2022-07-01 徐州立宁电子科技有限公司 一种操作稳定的车载显示屏打磨装置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103433830A (zh) * 2013-08-12 2013-12-11 西安轨道交通装备有限责任公司 客车铁顶板打磨除锈机
JP6441056B2 (ja) * 2014-12-10 2018-12-19 株式会社ディスコ 研削装置
CN107068544A (zh) * 2016-12-28 2017-08-18 重庆晶宇光电科技有限公司 晶片的研磨方法
CN108838853A (zh) * 2018-05-23 2018-11-20 维达力实业(深圳)有限公司 抛光装置及方法
CN109227256A (zh) * 2018-11-13 2019-01-18 安徽同步自动化科技有限公司 一种硅酸铝纤维板自动磨削机

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06179164A (ja) * 1992-12-11 1994-06-28 Hitachi Zosen Corp ディスプレイ装置における画像表示面の研磨装置
JPH06292904A (ja) * 1993-04-12 1994-10-21 Sumitomo Metal Ind Ltd 熱延鋼帯の冷間圧延法および表面研削ライン
JPH09103943A (ja) * 1995-08-02 1997-04-22 Sumitomo Metal Ind Ltd 鋼板表面検査用砥石掛け装置及び方法
JP2007190657A (ja) * 2006-01-20 2007-08-02 Asahi Glass Co Ltd 板状体の研磨方法及びその装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1830621A (zh) * 2006-04-14 2006-09-13 河南安彩高科股份有限公司 板状物的研磨设备及研磨方法
CN101357447A (zh) * 2008-09-02 2009-02-04 河南安飞电子玻璃有限公司 平板玻璃表面研磨的装置及研磨方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06179164A (ja) * 1992-12-11 1994-06-28 Hitachi Zosen Corp ディスプレイ装置における画像表示面の研磨装置
JPH06292904A (ja) * 1993-04-12 1994-10-21 Sumitomo Metal Ind Ltd 熱延鋼帯の冷間圧延法および表面研削ライン
JPH09103943A (ja) * 1995-08-02 1997-04-22 Sumitomo Metal Ind Ltd 鋼板表面検査用砥石掛け装置及び方法
JP2007190657A (ja) * 2006-01-20 2007-08-02 Asahi Glass Co Ltd 板状体の研磨方法及びその装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101381673B1 (ko) * 2011-07-27 2014-04-14 주식회사 엘지화학 신규한 구조의 연마 장치
CN104308685A (zh) * 2014-10-17 2015-01-28 王秀云 一种机械零件的打磨器
CN114683113A (zh) * 2022-05-31 2022-07-01 徐州立宁电子科技有限公司 一种操作稳定的车载显示屏打磨装置
CN114683113B (zh) * 2022-05-31 2022-09-27 江苏振宁半导体研究院有限公司 一种操作稳定的车载显示屏打磨装置

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JP5637147B2 (ja) 2014-12-10
TW201130605A (en) 2011-09-16
JPWO2011074615A1 (ja) 2013-04-25
CN102666010A (zh) 2012-09-12

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