WO2011063933A1 - Substrat à contact métallique et procédé de fabrication de celui-ci - Google Patents
Substrat à contact métallique et procédé de fabrication de celui-ci Download PDFInfo
- Publication number
- WO2011063933A1 WO2011063933A1 PCT/EP2010/007096 EP2010007096W WO2011063933A1 WO 2011063933 A1 WO2011063933 A1 WO 2011063933A1 EP 2010007096 W EP2010007096 W EP 2010007096W WO 2011063933 A1 WO2011063933 A1 WO 2011063933A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- metal
- region
- contacting
- curable
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 62
- 238000000034 method Methods 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 48
- 239000002184 metal Substances 0.000 claims abstract description 48
- 239000011159 matrix material Substances 0.000 claims abstract description 23
- 230000006641 stabilisation Effects 0.000 claims abstract description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 27
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 27
- 229910052709 silver Inorganic materials 0.000 claims description 22
- 239000004332 silver Substances 0.000 claims description 22
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 15
- 239000000853 adhesive Substances 0.000 claims description 12
- 230000001070 adhesive effect Effects 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 239000011148 porous material Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 239000003822 epoxy resin Substances 0.000 claims description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 6
- 229920000647 polyepoxide Polymers 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 238000011105 stabilization Methods 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- -1 duromers Substances 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 229920001169 thermoplastic Polymers 0.000 claims description 4
- 239000004416 thermosoftening plastic Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910015894 BeTe Inorganic materials 0.000 claims description 2
- 229910004613 CdTe Inorganic materials 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910002601 GaN Inorganic materials 0.000 claims description 2
- 229910005542 GaSb Inorganic materials 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 229910000673 Indium arsenide Inorganic materials 0.000 claims description 2
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910007709 ZnTe Inorganic materials 0.000 claims description 2
- 229910052785 arsenic Inorganic materials 0.000 claims description 2
- 239000005388 borosilicate glass Substances 0.000 claims description 2
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 claims description 2
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims description 2
- 239000005361 soda-lime glass Substances 0.000 claims 1
- 238000010304 firing Methods 0.000 description 15
- 230000007704 transition Effects 0.000 description 7
- 238000013459 approach Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 210000003608 fece Anatomy 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 230000003313 weakening effect Effects 0.000 description 2
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- 241001676573 Minium Species 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007649 pad printing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0116—Porous, e.g. foam
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0129—Thermoplastic polymer, e.g. auto-adhesive layer; Shaping of thermoplastic polymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0263—Details about a collection of particles
- H05K2201/0272—Mixed conductive particles, i.e. using different conductive particles, e.g. differing in shape
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0338—Layered conductor, e.g. layered metal substrate, layered finish layer, layered thin film adhesion layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10954—Other details of electrical connections
- H05K2201/10977—Encapsulated connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1131—Sintering, i.e. fusing of metal particles to achieve or improve electrical conductivity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1147—Sealing or impregnating, e.g. of pores
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
Definitions
- the present invention relates to a metallically contacted substrate in which at least one surface of the substrate is wholly or partially provided with a metallic contact.
- the metallic contact is provided with a matrix material. According to the invention, a method for the production of such a substrate is likewise specified.
- the firing represents a temperature step in which, for example, the solar cell is contacted or printed printed circuit traces of sensors or chips are firmly connected to the existing, usually brittle material.
- One in the literature (US 2005 / 118.362 A) method described in the preparation of elekt ⁇ step contacting of solar cells is the up-take of pastes. In these pastes are aluminum
- the paste is applied to the silicon surface as a layer by screen printing (US 4,388,346) or pad printing.
- the printed layer has a porous sponge-like structure, which is still present after the subsequent temperature step.
- the organic binder is first removed by evaporation and / or pyrolysis.
- the second part of the firing involves the alloy of metal
- % Silver in the paste prevents the formation of oxide the surface, so that an interconnection using conventional solders is possible.
- a reliable ohmic contact between the two layers (aluminum / aluminum silver) obviouslyzustel ⁇ len, the masks for printing in the manner made that the pastes overlap approximately 0.5 to 1 mm in the contact area to each other.
- a mechanical notch represents ⁇ .
- a metallically contacted substrate in which at least one surface of the substrate is wholly or partly provided with a metallic contact, wherein the metallic contacting includes at least one partial area at least one matrix material, that of the mechanical stabilization and / or adhesion the contacting on the substrate surface is used, wherein the matrix material is present in a part or the Ge ⁇ entirety of the pores of the contacting.
- the metallic contacting preferably contains at least one first metal in a first region I, in a second region II, at least one second metal other than the first metal, and in a third region III lying between the first I and second regions II both the first and the second metal, wherein at least the third region III comprises at least one matrix material which serves for the mechanical stabilization and / or the adhesion of the contacting of at least the third region III to the substrate surface and / or the two metal species with one another.
- further regions may be present or are arranged iteratively on the surface of the substrate.
- a further layer can be applied to these areas.
- the substrate according to the invention which can represent, for example, an electronic component, thus has, in a preferred embodiment, a contacting which is subdivided into three subregions, wherein the contacting in the first region is formed from a different metal than in the second region.
- the third region lying between the first and second regions has both materials and can therefore be referred to as an "overlap region".
- this area By the matrix material included in this third region it is achieved that a structural, i. mechanical reinforcement, this area, which, as known from the prior art, has particular brittleness is guaranteed, so that the
- the technical field of application of the substrates is the use, for example, in the production of solar cells with the aim of increasing the strength of these components, thus reducing the rejects due to breakage in production, transport to module manufacturers as well as soldering and interconnection in module production.
- the long-term stability is increased in the module, since the mechanical resistance ⁇ to environmental temperature cycles that lead to mechanical stresses in the solar cells is increased by the use of Gumatrix.
- module herstel ⁇ ler that can solidify the purchased solar cells before Verlö ⁇ processing into modules by Grepix and thus both the disturbing production process to the module and for the years of service under a variety of environmental conditions to ⁇ make it more reliable.
- Another area of application is sensor technology and electronics. In these disciplines manager ⁇ will pave and contact techniks vom partly just ⁇ if produced by screen printing and subsequent firing me ⁇ on-metal pastes. Even with this appli ⁇ dung increasing the mechanical Reliable ⁇ ness of conductors is possible.
- Preferred matrix materials are selected from the group consisting of cured polymers, cured thermoplastics and / or cured thermosets, preferably cured chemical adhesives, preferably polyaddition adhesives and / or two-component adhesives, especially epoxy resins.
- the metallic contact is porous, the matrix material is present in part or all of the pores of the contact.
- the porosity of the contacting results from the manufacturing process, after which a fine metal paste is applied to the substrate to be contacted and connected in the firing step with this.
- the metal material that is to form the contact is at least partially melted.
- the fine metal powder used in such Pastes are included, besides, form small droplets that at least partially wet the surface of the substrate and making electrical Verbin ⁇ dung to the substrate after cooling.
- the droplets formed during the firing step to keep due to its surface tension at their droplet form, so that only a partial connection to further me ⁇ -metallic droplets takes place and forms a porous, spongy network of metal after cooling.
- the metallic contact is due to production, both in the areas I, II and III open-pored, that is porous.
- Preferred pore sizes of the contacting are between 10 nm and 1 mm, preferably between 500 nm and 10 ⁇ m, particularly preferably between 1 ⁇ m and 5 ⁇ m.
- the pore size can also assume dimensions that are in the range of the layer thickness of the contact.
- Preferred metals of the metallic contacting are selected from the group consisting of aluminum, silver, copper, iron, gold, cobalt, nickel, platinum, chromium, vanadium, titanium, a mixture of silver and aluminum and / or combinations thereof.
- the first metal is selected from the group consisting of aluminum, and / or
- the second metal is selected from the group consisting of silver or mixtures of silver and aluminum.
- the contacting, for example, in the first region I can be formed of aluminum, while the contacting in the second region II beispielswei ⁇ se is a silver contact or an alloy or mixture of aluminum and silver.
- Erfindungsge ⁇ Gurss are in this case in the transition region III in front of both aluminum and silver in separate areas, so that due to the different nature of the two metals here see a lower mechanical resistance of the predetermined contact at the interface. This is remedied according to the invention by adding a matrix material.
- the contact layer is formed in layers, wherein a second metal-containing layer of contacting directly on the surface of the substrate and another, the first metal-containing layer containing the second metals
- the layered formation of the contacting in the third region may be configured opposite as described above.
- a gradient-wise transition from the metal of the second region II in the direction of the first region I takes place, i.
- the layer thickness of the second metal-containing layer decreases starting from the second region II in the direction of the first region I, and / or b) the layer thickness of the first metal contained ⁇ the layer decreases, starting from the first region I in the direction of the second region II.
- Preferred layer thicknesses of the metallic PLEASE CONTACT ⁇ tion are in this case in the first region (I), in the second region (II) and / or in the third region (III) inde ⁇ pendently between 10 nm and 2 mm, preferably between 10 ym and 100 ym, more preferably Zvi ⁇ rule 25 and 45 ym.
- the metallic contacting may contain further substances which may be, for example, the nonvolatile components of standard pastes which are applied as metallic contacting. For example, these are selected from the group of glasses such as borosilicate glass, quartz glass, lime
- Soda glass or plastics and / or mixtures or combinations thereof Soda glass or plastics and / or mixtures or combinations thereof.
- the components come into question of the substrate for the individual compo-, that is, the substrate itself on which the electrical contact is applied are in this case selected from the Grup ⁇ pe consisting of a) electrically insulating substrates, in particular
- PCB printed circuit boards
- electrically conductive substrates or semiconductors in particular Si, Ge, GaN, Sic, GaP, GaAs, InP, InSb, InAs, GaSb, GaN, A1N, InN, Al x Ga x As, In x Ga x N, ZnO, ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, Hg (1-x) Cd x Te, BeSe, BeTe and / or HgS and / or c) solar cells containing wafers and / or substrates from the materials mentioned under a) and / or b).
- the substrates may be designed such that they contain, for example, a base material from the materials listed under a) above, whereupon a further material layer of the materials mentioned under b) is applied.
- This possibility is realized, for example, with thin-film solar cells.
- a process for the preparation ⁇ position of a substrate described above is also specified, which is characterized in that, at least introduced at least in a partial region in a part or all of the pores of the porous metallic contacting a curable matrix material, with the at least a metal of the metallic contact and / or the surface of the substrate kon ⁇ takted and then cured.
- at least one hardenable matrix material is introduced at least into the third region III of the contacting and contacted and hardened with the at least one first metal, the at least one second metal and / or the surface of the substrate.
- the matrix material which is curable, is introduced into the pores of a porous metallic contacting.
- a curable matrix materials thereby come insbeson ⁇ particular a curable polymer, curable thermoplastic and / or curable thermoset, preferably curable chemical adhesives, preferably Polyadditionsklebstoffen and / or two-component adhesives, in particular epoxy resins used.
- Preferred viscosities of the curable matrix matrix are in a range between 1 and 100,000 mPas, preferably 10,000 and 50,000 mPas, particularly preferably between 15,000 and 40,000 mPas.
- temperature ranges in which the curing is carried out ⁇ are between 20 and 400 ° C, preferably between 50 and 300 ° C, in particular between 80 and 120 ° C.
- the figure shows a metallically contacted substrate 1, which may be, for example, a brittle material, such as silicon or glass, on which a Kontak- tion is applied, which has three areas I, II and III.
- the metallic contacting consists of a first metal 2, which may in the present case be, for example, aluminum, and of an aluminum paste which has been applied to the substrate 1 and subsequently fired.
- the aluminum particles originally forming the aluminum paste are melted during the firing step and partially solidify into larger agglomerates, resulting in a porous structure of the contacting.
- the metallic contact has a further region II, in which the electrical contacting of the substrate I by another metal 3, for example silver, is formed.
- ER also the preparation of the silver contact, for example, followed by applying a silver paste and a subsequent firing step, where ⁇ together with the silver particles initially contained in the silver paste partially through melting and re-solidification, to form a porous structure.
- a layer of the second metal 3 is applied directly to the substrate 1, the metal layer made of the first metal being applied over this metal layer.
- a matrix material 5 which may be, for example, an adhesive introduced, the mechanical hardening of the Schich- th of the first metal II and the second metal III is used. Likewise, this results in an improved adhesion of the contacting on the substrate 1. 'Thus, according to the invention, a significantly higher stability of such produced substrates is achieved.
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
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Abstract
La présente invention concerne un substrat (1) à contact métallique avec lequel au moins une surface du substrat est totalement ou partiellement recouverte d'un contact métallique (2, 3). À des fins de stabilisation mécanique, le contact métallique est muni d'un matériau matriciel (5). L'invention concerne également un procédé de fabrication d'un substrat de ce type.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10787284A EP2508048A1 (fr) | 2009-11-30 | 2010-11-23 | Substrat à contact métallique et procédé de fabrication de celui-ci |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009056308.3 | 2009-11-30 | ||
DE102009056308A DE102009056308A1 (de) | 2009-11-30 | 2009-11-30 | Metallisch kontaktiertes Substrat sowie Verfahren zu dessen Herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011063933A1 true WO2011063933A1 (fr) | 2011-06-03 |
Family
ID=43466206
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2010/007096 WO2011063933A1 (fr) | 2009-11-30 | 2010-11-23 | Substrat à contact métallique et procédé de fabrication de celui-ci |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2508048A1 (fr) |
DE (1) | DE102009056308A1 (fr) |
WO (1) | WO2011063933A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017050702A1 (fr) * | 2015-09-23 | 2017-03-30 | Siemens Aktiengesellschaft | Procédé pour l'isolation électrique d'un conducteur électrique, notamment d'un module composant, module conducteur et module composant correspondants |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9648749B1 (en) * | 2015-11-17 | 2017-05-09 | Northrop Grumman Systems Corporation | Circuit card assembly and method of providing same |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US561101A (en) | 1896-02-24 | 1896-06-02 | George j | |
US4388346A (en) | 1981-11-25 | 1983-06-14 | Beggs James M Administrator Of | Electrodes for solid state devices |
WO1984003586A1 (fr) * | 1983-03-02 | 1984-09-13 | Dennis R Mitchell | Procede de fixation de conducteurs electriques sur un substrat isolant |
GB2202999A (en) * | 1987-03-25 | 1988-10-05 | Pa Consulting Services | Electrical contacts adhered together |
WO1993005545A1 (fr) * | 1991-09-04 | 1993-03-18 | Morganite Electrical Carbon Limited | Procede de formation d'une jonction electroconductrice entre du carbone et un metal, et un article comprenant une jonction conductrice entre du carbone et un metal |
EP0549159A2 (fr) * | 1991-12-06 | 1993-06-30 | International Business Machines Corporation | Procédé et adhésif pour réaliser des connexions électriques et mécaniques |
US20050118362A1 (en) | 2003-11-29 | 2005-06-02 | Mu-Hyun Kim | Thermal transfer element with light-to-heat conversion layer having concentration gradient |
US7022266B1 (en) * | 1996-08-16 | 2006-04-04 | Dow Corning Corporation | Printable compositions, and their application to dielectric surfaces used in the manufacture of printed circuit boards |
US20080182011A1 (en) * | 2007-01-26 | 2008-07-31 | Ng Hou T | Metal and metal oxide circuit element ink formulation and method |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992022928A1 (fr) * | 1991-06-11 | 1992-12-23 | Mobil Solar Energy Corporation | Cellule solaire amelioree et methode de fabrication |
JPH10335267A (ja) * | 1997-05-30 | 1998-12-18 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
DE10032386A1 (de) * | 2000-07-06 | 2002-01-17 | Michael Zimmer | Verfahren zur Herstellung einer Kontaktsammelschiene für Solarzellen und Kontaktsammelschiene für Solarzellen |
US7521515B2 (en) * | 2003-06-03 | 2009-04-21 | Dai Nippon Printing Co., Ltd. | Filler layer for solar cell module and solar cell module using same |
US7910823B2 (en) * | 2005-11-28 | 2011-03-22 | Mitsubishi Electric Corporation | Solar cell and manufacturing method thereof |
-
2009
- 2009-11-30 DE DE102009056308A patent/DE102009056308A1/de not_active Withdrawn
-
2010
- 2010-11-23 EP EP10787284A patent/EP2508048A1/fr not_active Withdrawn
- 2010-11-23 WO PCT/EP2010/007096 patent/WO2011063933A1/fr active Application Filing
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US561101A (en) | 1896-02-24 | 1896-06-02 | George j | |
US4388346A (en) | 1981-11-25 | 1983-06-14 | Beggs James M Administrator Of | Electrodes for solid state devices |
WO1984003586A1 (fr) * | 1983-03-02 | 1984-09-13 | Dennis R Mitchell | Procede de fixation de conducteurs electriques sur un substrat isolant |
GB2202999A (en) * | 1987-03-25 | 1988-10-05 | Pa Consulting Services | Electrical contacts adhered together |
WO1993005545A1 (fr) * | 1991-09-04 | 1993-03-18 | Morganite Electrical Carbon Limited | Procede de formation d'une jonction electroconductrice entre du carbone et un metal, et un article comprenant une jonction conductrice entre du carbone et un metal |
EP0549159A2 (fr) * | 1991-12-06 | 1993-06-30 | International Business Machines Corporation | Procédé et adhésif pour réaliser des connexions électriques et mécaniques |
US7022266B1 (en) * | 1996-08-16 | 2006-04-04 | Dow Corning Corporation | Printable compositions, and their application to dielectric surfaces used in the manufacture of printed circuit boards |
US20050118362A1 (en) | 2003-11-29 | 2005-06-02 | Mu-Hyun Kim | Thermal transfer element with light-to-heat conversion layer having concentration gradient |
US20080182011A1 (en) * | 2007-01-26 | 2008-07-31 | Ng Hou T | Metal and metal oxide circuit element ink formulation and method |
Non-Patent Citations (2)
Title |
---|
C. KOHN ET AL.: "Analyses of warpage effects induced by passivation and electrode coatings in silicon solar cells", 22ND EUPVSEC, 3 September 2007 (2007-09-03) |
See also references of EP2508048A1 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017050702A1 (fr) * | 2015-09-23 | 2017-03-30 | Siemens Aktiengesellschaft | Procédé pour l'isolation électrique d'un conducteur électrique, notamment d'un module composant, module conducteur et module composant correspondants |
Also Published As
Publication number | Publication date |
---|---|
EP2508048A1 (fr) | 2012-10-10 |
DE102009056308A1 (de) | 2011-06-01 |
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