WO2010119961A1 - 液体吐出装置 - Google Patents
液体吐出装置 Download PDFInfo
- Publication number
- WO2010119961A1 WO2010119961A1 PCT/JP2010/056871 JP2010056871W WO2010119961A1 WO 2010119961 A1 WO2010119961 A1 WO 2010119961A1 JP 2010056871 W JP2010056871 W JP 2010056871W WO 2010119961 A1 WO2010119961 A1 WO 2010119961A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- curved surface
- liquid
- connection passage
- surface portion
- slit
- Prior art date
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- 239000007788 liquid Substances 0.000 title claims abstract description 223
- 238000003860 storage Methods 0.000 claims description 134
- 230000009466 transformation Effects 0.000 claims description 17
- 238000013459 approach Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 description 20
- 230000008569 process Effects 0.000 description 20
- 238000007599 discharging Methods 0.000 description 8
- 238000009423 ventilation Methods 0.000 description 6
- 238000007789 sealing Methods 0.000 description 5
- 230000005484 gravity Effects 0.000 description 4
- 238000000926 separation method Methods 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0283—Flat jet coaters, i.e. apparatus in which the liquid or other fluent material is projected from the outlet as a cohesive flat jet in direction of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
- B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
- B05B1/044—Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
- B05C5/0258—Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/30—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages
- B05B1/3013—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages the controlling element being a lift valve
Definitions
- the present invention relates to an apparatus for discharging liquid from a slit-shaped opening.
- a resist solution supply port is provided at both ends in the longitudinal direction of a slit nozzle having a slit-shaped opening, and a position higher than the resist solution supply port in a manifold for temporarily storing the resist solution
- An air vent hole for example, see Patent Document 1.
- the thing of patent document 1 has a cross section of the same shape as a slit-shaped opening part, and a resist liquid is passed from a manifold to a slit-shaped opening part through the connection passage which connects a manifold and the same opening part. Sent. For this reason, in the thing of patent document 1, although it can suppress that the bubble mixed in the resist liquid goes to a connection channel
- the bubbles can be discharged together with the resist solution by discharging the resist solution from the slit-shaped opening in advance to remove the bubbles. A process is required and the resist solution is wasted.
- the present invention has been made in view of such circumstances, and bubbles are mixed into the liquid discharged from the slit-shaped opening even when the process of discharging the liquid in advance and removing the bubbles is not performed.
- the main object of the present invention is to provide a liquid ejection device capable of suppressing this.
- the first invention has a storage section for storing a liquid, a slit-shaped opening for discharging the liquid, a slit-shaped cross section, and the storage section and the slit-shaped section.
- a liquid discharge apparatus including a connection passage that connects an opening, and covers a flow path cross section of the connection passage in the reservoir, and forms a gap with an inner wall of the reservoir, and the liquid is discharged from the gap.
- a current-transforming member that flows into the connection passage, a first curved surface portion projecting toward the storage portion that smoothly connects the inner wall surface of the storage portion and the inner wall surface of the connection passage, and the current-transformation member And a second curved surface portion that is convex on the same side as the first curved surface portion and faces the first curved surface portion.
- the liquid stored by the storage part is discharged from a slit-shaped opening part through a connection channel
- the flow of the liquid in the reservoir toward the connection passage is blocked by the current transformation member that covers the flow path cross section of the connection passage in the storage portion, and the liquid is connected from the gap between the inner wall of the storage portion and the current transformation member. It flows into the passage.
- the liquid flowing into the connection passage is provided in the first curved surface portion that protrudes toward the storage portion and smoothly connects the inner wall surface of the storage portion and the inner wall surface of the connection passage, and the current transformation member.
- the second curved surface portion becomes closer to the downstream side of the liquid. It will be separated from one curved surface portion. Accordingly, the liquid flowing along the second curved surface portion is guided toward the inner wall surface of the connection passage, and the downstream side gradually spreads away from the inner wall surface of the connection passage, that is, toward the center of the connection passage. Become. As a result, it is possible to suppress a deviation in the flow rate of the liquid in the flow path cross section of the connection passage, and it is possible to discharge the liquid more uniformly from the slit-shaped opening.
- the length of the second curved surface portion is set to be longer than the length of the first curved surface portion in the liquid flow direction. Over the range, the flow of the liquid can be guided toward the inner wall surface of the connection passage by the second curved surface portion.
- the second curved surface portion is provided to the downstream side of the first curved surface portion in the liquid flow direction.
- the liquid flowing along the curved surface portion can be guided further downstream by the second curved surface portion toward the inner wall surface of the connection passage.
- the inner wall of the storage section and the current transformation member are relatively movable, and the same change as the inner wall of the storage section is made based on the relative movement. Since the gap between the flow member and the flow member can be sealed, the discharge of the liquid can be stopped even when the pressure that causes the liquid to flow into the connection passage is generated.
- connection passage is connected to a lower portion of the storage section, and a gap between the inner wall of the storage section and the current transformation member is horizontally disposed.
- the liquid is discharged from the slit-shaped opening by the pressure generated by the weight of the liquid.
- the liquid stored in the storage part When the liquid stored in the storage part is pressurized and discharged, the liquid may be discharged from the slit-shaped opening due to the distribution of the liquid pressure.
- the connecting passage is connected to the lower portion of the storage section, and the gap between the inner wall of the storage section and the current-transforming member is horizontally disposed.
- the pressure generated by the weight of the liquid that has been made becomes uniform in the gap between the inner wall of the reservoir and the current transformation member. Accordingly, when the liquid is discharged from the slit-like opening due to the pressure generated by the weight of the liquid, the liquid can be sent to the connection passage from the gap between the inner wall of the storage portion and the current-transforming member at a uniform pressure. . As a result, the liquid can be discharged more uniformly from the slit-shaped opening.
- connection is made from the gap between the inner wall of the storage part and the current transformation member until the end of liquid discharge.
- the liquid can be sent to the passage at a uniform pressure, and the generation of bubbles due to the pressure fluctuation of the liquid caused by stopping the discharge of the liquid halfway can be avoided.
- the first curved surface portion is provided in an annular shape along an inner wall surface of the connection passage having the slit-shaped cross section, and the inner wall of the storage portion and the deformable portion are provided.
- the flow member can be moved relative to each other, and based on this relative movement, the gap between the inner wall of the storage portion and the current change member can be annularly sealed at a position equidistant from the first curved surface portion.
- the pressure generated by the weight of the liquid stored in the storage part is uniform in the gap between the inner wall of the storage part and the current transformation member, and the liquid is transferred from this gap to the connection passage, as in the sixth invention.
- the first curved surface portion is annularly provided along the inner wall surface of the connection passage having the slit-shaped cross section, and the inner wall of the storage portion and the current transformation member are located at an equal distance from the first curved surface portion.
- the gap is sealed in an annular shape.
- the slit-like shape is caused by the pressure generated by the weight of the liquid.
- the liquid stored in the storage unit is collected in the connection passage by gravity. As a result, the liquid stored in the storage unit can be discharged without leaving.
- Sectional drawing which shows a liquid discharge apparatus The perspective view which shows a liquid discharge apparatus.
- path of the liquid discharge apparatus of FIG. (A) is a perspective view which shows the lower wall of a storage part, and the opening part of a connection channel
- A) is the perspective view which looked at the storage part and valve body part of the liquid discharge apparatus of FIG. 2 from the downward direction
- (b) is the perspective view which expands and shows a 2nd curved surface part.
- (A) is a perspective view which shows the modification of the lower wall of a storage part
- (b) is a perspective view which expands and shows the lower wall and 1st curved surface part of a storage part.
- this liquid ejection apparatus includes a first main body 10 and a second main body 40 as main bodies in which a liquid storage unit 20 is provided, and a slit-shaped opening from the storage unit 20.
- the valve body part 50 as a current transformation member which changes the flow of the liquid which goes to the part 41, and the drive part 70 which relatively moves the lower wall 43 and the valve body part 50 as an inner wall of the storage part 20 are provided. Note that the liquid ejection device may be fixed and used or moved.
- the main body is configured by connecting the first main body 10 and the second main body 40. Inside these main bodies 10, 40, a cavity constituting the liquid reservoir 20 is provided.
- the storage unit 20 is configured by providing a recess in the first body 10 and assembling the second body 40 to the first body 10 so as to cover the recess.
- a sealing member 21 is provided between the first main body 10 and the second main body 40, and the processing liquid in the storage unit 20 is sealed so as not to leak from between these.
- the liquid stored in the storage unit 20 and discharged from the slit-shaped opening 41 is not limited to the processing liquid used for etching and plating, and other liquids such as a resist used in a semiconductor manufacturing process are employed. You can also.
- the storage unit 20 will be described with reference to FIG. As shown with a broken line in FIG. 3, the storage part 20 is formed in the substantially rectangular parallelepiped shape.
- the volume of the storage unit 20 is set to a size that can store the processing liquid discharged by the liquid discharge device in one process. That is, the volume of the storage unit 20 is equal to or slightly more than the sum of the volume of the processing liquid discharged in one process and the volume of the member such as the valve body unit 50 stored in the storage unit 20. It is set large. Then, the amount of processing liquid used for one process in the liquid ejection device is stored in the storage unit 20, and all the processing liquid stored in the storage unit 20 is discharged in one process. Specifically, the volume of the storage unit 20 is set to several hundred ml.
- the reservoir 20 communicates with the outside of the first main body 10 via a supply port 11 and a ventilation port 12 provided in the first main body 10.
- the supply port 11 is connected to a supply passage for supplying a processing liquid as a liquid to the storage unit 20.
- the ventilation port 12 is connected to a ventilation passage through which air as gas flows in and out of the storage unit 20. For this reason, when the processing liquid is supplied into the storage unit 20 through the supply port 11, the air flows out from the storage unit 20 through the ventilation port 12. Further, when the processing liquid in the reservoir 20 is discharged from the slit-shaped opening 41, air flows into the reservoir 20 through the vent port 12. Therefore, the supply of the processing liquid to the storage unit 20 and the discharge of the processing liquid from the storage unit 20 can be performed smoothly.
- the ventilation passage 12 may be omitted and the ventilation port 12 may be open to the atmosphere.
- connection passage 42 provided in the second body 40 will be described with reference to FIG. 4 in which the valve body 50 is omitted.
- the connection passage 42 has a slit-shaped cross section, and connects the reservoir 20 and the slit-shaped opening 41 (see FIG. 1).
- the connection passage 42 is connected to the lower part of the storage unit 20 and opens to the lower wall 43 as the inner wall of the storage unit 20. That is, the upper end portion of the connection passage 42 is an opening 44 to the storage portion 20 of the connection passage 42.
- the processing liquid stored in the storage unit 20 flows into the connection passage 42 opened to the lower part of the storage unit 20 by the action of gravity.
- the surface of the lower wall 43 of the reservoir 20 is formed flat, and the surface of the lower wall 43 is horizontally disposed. For this reason, substantially all of the processing liquid stored in the storage unit 20 flows into the connection passage 42 without staying in the storage unit 20.
- connection passage 42 is formed so as to penetrate the second main body 40 and has a cross section having the same shape and the same dimensions as the slit-shaped opening 41.
- the end of the connection passage 42 forms a slit-like opening 41, that is, a liquid discharge port.
- the flow path cross section of the connection passage 42 and the slit-shaped opening 41 are formed so that the length of the short side (slit width) is constant.
- the flow path cross section of the connection passage 42 and the length of the short side (slit width) of the slit-shaped opening 41 are set to several mm.
- the opening surface of the slit-like opening 41 is disposed horizontally, and the opening 41 opens vertically downward.
- path 42 each connected to the storage part 20 and the opening part 41 is arrange
- the inner wall surface of the connection passage 42 is provided so as to extend in the vertical direction.
- the processing liquid stored in the storage unit 20 flows downward through the connection passage 42 by pressure generated by its own weight, and is discharged from the slit-shaped opening 41.
- the length (slit width) of the short side of the cross section of the connection passage 42 is set to be relatively large such as several mm. For this reason, even if a liquid having a relatively high viscosity such as a resist is used, the liquid can be discharged from the slit-shaped opening 41 through the connection passage 42 by the pressure generated by the weight of the liquid.
- the flow path cross section of the connection passage 42 is covered, and a gap 22 is formed between the inner wall (lower wall 43) of the reservoir 20 and the gap 22 is formed.
- a current-transforming member (valve element portion 50) for allowing the processing liquid to flow into the connection passage 42 is accommodated.
- the valve body portion 50 covers the flow path cross section of the connection passage 42 in the storage portion 20, that is, the opening portion 44 of the connection passage 42 that opens to the storage portion 20. For this reason, the flow of the processing liquid in the reservoir 20 toward the connection passage 42 is blocked by the valve body portion 50, and the processing liquid is prevented from flowing directly into the connection passage 42.
- the processing liquid stored in the storage unit 20 flows into the connection passage 42 from the gap 22 between the lower wall 43 as the inner wall of the storage unit 20 and the valve body unit 50.
- the gap 22 is provided so as to surround the opening 44 and is disposed horizontally. For this reason, the pressure generated by the weight of the processing liquid stored in the storage unit 20 is uniform in the gap 22 provided so as to surround the opening 44.
- the lower wall 43 of the reservoir 20 and the valve body 50 are provided so as to be relatively movable, and the space between the lower wall 43 and the valve body 50 is sealed based on this relative movement. That is, by adjusting the width of the gap 22 based on the relative movement between the lower wall 43 of the reservoir 20 and the valve body 50, the flow rate of the processing liquid flowing into the connection passage 42 from the gap 22 is adjusted. . When the width of the gap 22 is reduced to 0, the space between the lower wall 43 and the valve body 50 is sealed. At this time, the space between the lower wall 43 and the valve body portion 50 is annularly sealed so that the width of the gap 22 provided so as to surround the opening 44 is zero.
- FIG. 1 shows a state in which the processing liquid flows into the connection passage 42 from the gap 22, that is, a state in which the valve body portion 50 opens the connection passage 42.
- the valve body unit 50 is in a state where the space between the lower wall 43 of the storage unit 20 and the valve body unit 50 is sealed to a state where the processing liquid flows into the connection passage 42 from the gap 22. Be controlled.
- the valve body 50 is connected to a piston as a movable part via a sliding part 71 and a support part 72 as a connecting part.
- the sliding portion 71 is slidably inserted into a through hole 74 provided in the first main body 10.
- the sliding portion 71 and the valve body portion 50 are provided on the extension of the connection passage 42, that is, above the opening 44 of the connection passage 42. For this reason, the valve body portion 50 is vertically approached and separated from the opening portion 44 of the connection passage 42.
- the piston is accommodated in the cylinder 76 so as to be able to reciprocate, and is driven to reciprocate based on the operation pressure by the air supplied and discharged through the operation port 75. Specifically, by supplying air to one of the operation ports 75, the piston moves the valve body portion 50 in a direction approaching the opening portion 44 of the connection passage 42 via the support portion 72 and the sliding portion 71. Further, by supplying air to the other of the operation ports 75, the piston moves the valve body portion 50 in the direction of separating from the opening portion 44 of the connection passage 42 via the support portion 72 and the sliding portion 71. For this reason, both the approach and separation of the valve body 50 with respect to the opening 44 of the connection passage 42 can be quickly performed with a relatively large force based on the operation pressure by air.
- An adjustment screw 78 is provided for adjusting the width of the gap 22 between the lower wall 43 of the reservoir 20 and the valve body 50 when the valve body 50 opens the connection passage 42 (see FIG. 1).
- the adjustment screw 78 abuts on a support portion 72 connected to the valve body portion 50, so that the valve body portion 50 is connected to the connection passage 42.
- the position of the valve body 50 in the opened state that is, the movement width of the valve body 50 from the closed state to the opened state of the connection passage 42 is adjusted.
- a base 79 is connected to the first main body 10, and the base 79 supports a cylinder 76, a support part 72, a sliding part 71, a valve body part 50, and the like.
- An adjustment screw 78 is attached to the base 79 so as to be able to advance and retract. Then, by adjusting the screwing amount of the adjusting screw 78, the position of the end 78a of the adjusting screw 78 that abuts the end surface 72a of the support portion 72, in other words, from the end 78a of the adjusting screw 78 to the lower wall of the storage portion 20. The distance up to 43 can be adjusted.
- FIGS. 5 to 7 a first curved surface portion 44a that protrudes toward the storage portion 20 that smoothly connects the surface of the lower wall 43 of the storage portion 20 and the inner wall surface of the connection passage 42, and a valve body
- the second curved surface portion 51a that is provided on the portion 50 and is convex on the same side as the first curved surface portion 44a and faces the first curved surface portion 44a will be described.
- 5A is a perspective view showing the lower wall 43 of the storage portion 20 and the opening 44 of the connection passage 42
- FIG. 5B is an enlarged perspective view showing the first curved surface portion 44a.
- FIG. 6A is a perspective view showing the storage portion 20 and the valve body portion 50
- FIG. 6B is an enlarged perspective view showing the second curved surface portion 51a.
- FIG. 7 is an enlarged cross-sectional view of a portion A in FIG.
- the opening 44 of the connection passage 42 is formed in a slit shape, and both end portions thereof are formed in a semicircular shape. For this reason, the peripheral edge of the opening 44 has a shape in which a pair of linear portions are connected by arcs at both ends.
- the opening 44 of the connection passage 42 is provided with a first curved surface portion 44a over the entire circumference.
- the first curved surface portion 44a is a curved surface portion that smoothly connects the surface of the lower wall 43 of the storage portion 20 and the inner wall surface of the connection passage 42, and is configured as a curved surface portion that protrudes toward the storage portion 20 side.
- the surface of the lower wall 43 of the reservoir 20 and the inner wall surface of the connection passage 42 are provided vertically, and the first curved surface portion 44a connects these surfaces by a curved surface whose inclination changes continuously. .
- the first curved surface portion 44 a is also formed continuously at both ends of the opening portion 44 of the connection passage 42.
- the valve body 50 is provided with a streak-like protrusion 51 that protrudes in the direction of the connection passage 42, and the surface of the protrusion 51 causes the second part to be second.
- a curved surface portion 51a is configured.
- the protrusion 51 extends along the direction in which the valve body 50 extends, that is, in the direction in which the opening 44 of the connection passage 42 formed in a slit shape extends.
- the valve body 50 is provided with a seal member 56 so as to surround the protrusion 51.
- the seal member 56 is configured by an O-ring. In a state where the valve body portion 50 closes the connection passage 42, a part of the protrusion 51 is accommodated in the connection passage 42. At this time, the seal member 56 is in a state of surrounding the opening 44 of the connection passage 42 and seals between the lower wall 43 of the reservoir 20 and the valve body 50 in an annular shape.
- the seal member 56 is It is separated from the lower wall 43.
- the first curved surface portion 44a and the second curved surface portion 51a are provided to face each other.
- the second curved surface portion 51a is convex on the same side as the first curved surface portion 44a that protrudes toward the storage portion 20, and extends along the first curved surface portion 44a.
- the curvature radius of the second curved surface portion 51a is set larger than the curvature radius of the first curved surface portion 44a.
- the radius of curvature of the first curved surface portion 44a is approximately 0.8 mm
- the radius of curvature of the second curved surface portion 51a is 1.9 mm
- the curvature radius of the second curved surface portion 51a is approximately the curvature radius of the first curved surface portion 44a. It is set to 2 times.
- the uppermost stream side portions of the first curved surface portion 44a and the second curved surface portion 51a are arranged in parallel to each other, specifically, both horizontally. For this reason, the space
- the end of the protrusion 51 of the valve body 50 that is, the end on the downstream side of the second curved surface 51 a is closer to the connection passage 42 than the surface of the lower wall 43 as the inner wall of the reservoir 20. It is supposed to be in the state. For this reason, the processing liquid that has flowed along the surface of the lower wall 43 of the storage unit 20 hits the second curved surface portion 51 a when flowing into the connection passage 42.
- the length of the second curved surface portion 51a is set longer than the length of the first curved surface portion 44a in the flow direction of the processing liquid. More specifically, the second curved surface portion 51a is provided to the downstream side of the first curved surface portion 44a in the flow direction of the processing liquid. For this reason, the processing liquid flowing into the connection passage 42 from the gap 22 is guided toward the inner wall surface 42a of the connection passage 42 over a wider range by the second curved surface portion 51a to the downstream side.
- the valve body 50 When stopping the flow of the processing liquid into the connection passage 42, the valve body 50 is driven so as to be close to the opening 44 of the connection passage 42, that is, the first curved surface portion 44a. Then, the seal member 56 comes into contact with the lower wall 43 of the storage unit 20, and the space between the lower wall 43 and the valve body unit 50 is sealed. Here, the sealing member 56 is annularly provided at a position equidistant from the first curved surface portion 44a. For this reason, the valve body part 50 seals between the lower wall 43 of the storage part 20 and the valve body part 50 at a position equidistant from the first curved surface part 44a.
- the seal member 56 is inserted into a groove portion 57 formed in a so-called dovetail having a deeper side than the opening side. For this reason, even if the valve body 50 is driven and the seal member 56 repeatedly contacts the lower wall 43 of the storage section 20, the seal member 56 is unlikely to come off from the groove 57, and the lower wall 43 and the valve body 50 The sealing performance between the two can be improved. Furthermore, the drive unit 70 reciprocates the valve body unit 50 with a relatively large force and quickly based on the operation pressure by air.
- the valve body portion 50 is quickly driven to open the connection passage 42, discharge the processing liquid, and then close the connection passage 42 again, thereby
- the member 56 comes into contact with the lower wall 43 and is easily maintained in a deformed shape. Therefore, the pressure fluctuation of the processing liquid due to the deformation of the seal member 56 when contacting the lower wall 43 can be suppressed, and the generation of bubbles in the processing liquid can be suppressed.
- FIG. 8 is an enlarged cross-sectional view of the connection passage 42 viewed from the side in a state where the processing liquid flows from the storage unit 20 into the connection passage 42.
- the amount of processing liquid used in one process is stored in the storage unit 20, and the lower wall 43 and the valve body unit of the storage unit 20 are stored. 50 is sealed by a seal member 56.
- the gap 22 is arranged horizontally, the pressure generated by the weight of the processing liquid is uniform at the position where the seal member 56 seals the ring.
- the processing liquid is sealed by the seal member 56 at a position equidistant from the first curved surface portion 44a. From this state, the valve body 50 is driven in a direction away from the opening 44 of the connection passage 42, that is, the first curved surface 44a.
- the processing liquid flows through the gap 22 toward the connection passage 42. Then, the processing liquid flows into the connection passage 42 along the first curved surface portion 44 a provided over the entire circumference of the opening 44 due to the action of gravity, that is, the pressure generated by the weight of the processing liquid. Further, the processing liquid flowing through the gap 22 strikes the second curved surface portion 51 a provided in the valve body portion 50 and is guided in a direction along the second curved surface portion 51 a. For this reason, the processing liquid flows along the first curved surface portion 44a and the second curved surface portion 51a through the gap between the first curved surface portion 44a and the second curved surface portion 51a. Accordingly, the flow of the processing liquid is guided toward the inner wall surface 42 a of the connection passage 42.
- the radius of curvature of the second curved surface portion 51a is set larger than the radius of curvature of the first curved surface portion 44a, the distance between the first curved surface portion 44a and the second curved surface portion 51a is closer to the downstream side of the processing liquid. growing. For this reason, the processing liquid spreads in the center direction of the connection passage 42 toward the downstream side, and the processing liquid flowing into the connection passage 42 from the first curved surface portions 44a on both sides provided in parallel in the opening 44 of the connection passage 42. Join. Accordingly, the processing liquid flows through the entire flow path cross section of the connection passage 42, and the air as the gas in the connection passage 42 is pushed out toward the slit-shaped opening 41 by the processing liquid. Thereby, it is suppressed that the air which exists in the connection channel
- the valve body unit 50 is driven in a direction approaching the opening 44 of the connection passage 42, that is, the first curved surface unit 44a. And when the sealing member 56 provided in the valve body part 50 contact
- the processing liquid stored in the storage unit 20 is discharged from the slit-shaped opening 41 through the connection passage 42.
- the flow of the processing liquid in the storage portion 20 toward the connection passage 42 is blocked by the valve body portion 50 that covers the flow path cross section of the connection passage 42 in the storage portion 20, and the processing liquid is stored in the lower wall of the storage portion 20. It flows into the connection passage 42 from the gap 22 between the valve body 43 and the valve body portion 50.
- the treatment liquid that flows into the connection passage 42 includes a first curved surface portion 44a that protrudes toward the storage portion 20 that smoothly connects the surface of the lower wall 43 of the storage portion 20 and the inner wall surface 42a of the connection passage 42, and a valve body.
- the first curved surface portion 44a and the second curved surface portion 51a are provided with a gap between the first curved surface portion 44a and the second curved surface portion 51a that is provided on the portion 50 and is convex on the same side as the first curved surface portion 44a. It flows along. For this reason, the flow of the processing liquid is guided toward the inner wall surface 42 a of the connection passage 42, and the separation of the flow of the processing liquid from the inner wall surface 42 a of the connection passage 42 is suppressed. Therefore, when the processing liquid flows from the reservoir 20 into the connection passage 42, it is possible to suppress the air sandwiched between the flow of the processing liquid and the inner wall surface 42 a of the connection passage 42 from being caught in the processing liquid. . As a result, even when the process of discharging the processing liquid in advance and removing the bubbles is not performed, it is possible to suppress the bubbles from being mixed into the processing liquid discharged from the slit-shaped opening 41.
- the second curved surface portion 51a Since the curvature radius of the second curved surface portion 51a is set larger than the curvature radius of the first curved surface portion 44a, the second curved surface portion 51a is separated from the first curved surface portion 44a toward the downstream side of the processing liquid. . Accordingly, the processing liquid flowing along the second curved surface portion 51a is guided toward the inner wall surface 42a of the connection passage 42, while the downstream side is gradually separated from the inner wall surface 42a of the connection passage 42, that is, in the connection passage 42. It spreads in the direction of the center. As a result, it is possible to suppress a deviation in the flow rate of the processing liquid in the flow path cross section of the connection passage 42, and the processing liquid can be discharged more uniformly from the slit-shaped opening 41.
- the length of the second curved surface portion 51a is set longer than the length of the first curved surface portion 44a in the flow direction of the processing liquid, the flow of the processing liquid is connected by the second curved surface portion 51a over a wider range. It can be led in the direction of the inner wall surface 42 a of the passage 42.
- the processing liquid flowing along the first curved surface portion 44a is further passed by the second curved surface portion 51a. Up to the downstream, it is possible to guide in the direction of the inner wall surface 42 a of the connection passage 42.
- the gap 22 between the lower wall 43 of the storage unit 20 and the valve body unit 50 can be sealed based on this relative movement. Even when the pressure that causes the processing liquid to flow into the connection passage 42 is generated, the discharge of the processing liquid can be stopped.
- the processing liquid stored in the reservoir 20 When the processing liquid stored in the reservoir 20 is pressurized and discharged, the processing liquid is distributed from the slit-shaped opening 41 due to the distribution of the pressure of the processing liquid.
- connection passage 42 is connected to the lower part of the storage unit 20, and the gap 22 between the lower wall 43 of the storage unit 20 and the valve body unit 50 is disposed horizontally, so that it is stored in the storage unit 20.
- the pressure generated by the weight of the processing liquid is uniform in the gap 22 between the lower wall 43 of the reservoir 20 and the valve body 50. Therefore, when the processing liquid is discharged from the slit-shaped opening 41 due to the pressure generated by the weight of the processing liquid, the processing liquid is supplied from the gap 22 between the lower wall 43 of the reservoir 20 and the valve body 50 to the connection passage 42. Can be sent with uniform pressure. As a result, the processing liquid can be discharged more uniformly from the slit-shaped opening 41.
- the connection path is formed from the gap 22 between the lower wall 43 of the storage unit 20 and the valve body unit 50 until the processing liquid is completely discharged.
- the processing liquid can be sent to 42 at a uniform pressure, and the generation of bubbles due to the pressure fluctuation of the processing liquid caused by stopping the discharge of the processing liquid can be avoided.
- the pressure generated by the dead weight of the processing liquid stored in the storage unit 20 is uniform in the gap 22 between the lower wall 43 of the storage unit 20 and the valve body unit 50, and processing is performed from the gap 22 to the connection passage 42.
- the liquid can be sent at a uniform pressure.
- the first curved surface portion 44a is annularly provided along the inner wall surface 42a of the connection passage 42 having a slit-like cross section, and the lower wall of the storage portion 20 is located at an equal distance from the first curved surface portion 44a.
- the gap between 43 and the valve body 50 is sealed in an annular shape.
- the first curved surface portion 44a is formed from the annular gap 22.
- the processing liquid is sent evenly. Therefore, since the processing liquid flows evenly along the inner wall surface 42a of the connection passage 42, the processing liquid can be more uniformly discharged from the slit-shaped opening 41.
- the present invention is not limited to the above embodiment, and can be implemented as follows, for example.
- the lower wall 143 of the storage part 20 is shown. You may incline so that the surface may become low, so that it approaches the connection channel
- FIG. In this case, in the configuration in which the processing liquid is discharged from the slit-shaped opening 41 by the pressure generated by the weight of the processing liquid, the processing liquid stored in the storage unit 20 is collected in the connection passage 42 by gravity. As a result, the processing liquid stored in the storage unit 20 can be discharged without leaving.
- the seal member 56 is provided in an annular shape at a position equidistant from the first curved surface portion 44 a, and the valve body portion 50 is located between the lower wall 43 of the storage portion 20 and the valve body portion 50.
- the annular sealing is performed at a position equidistant from the first curved surface portion 44a.
- the valve body part 50 does not necessarily have to seal between the lower wall 43 of the storage part 20 and the valve body part 50 at a position equidistant from the first curved surface part 44a.
- the amount of processing liquid used for one process in the liquid ejection apparatus is stored in the storage unit 20 so that all the processing liquid stored in the storage unit 20 is discharged in one process. did.
- the volume of the storage part 20 is expanded and the process liquid larger than the quantity used for one process is stored in the storage part 20, the process stored by the storage part 20 in one process. A part of the liquid may be discharged.
- the treatment liquid can be replenished with the treatment liquid remaining in the reservoir 20, air is discharged into the gap between the lower wall 43 of the reservoir 20 and the valve body 50 after the treatment liquid is discharged. It can suppress entering. For this reason, it can suppress that a bubble mixes in the process liquid discharged from the slit-shaped opening part 41.
- the processing liquid is discharged from the slit-shaped opening 41 by the pressure generated by the weight of the processing liquid, but in addition to that, the processing liquid can be pressurized with air or the like.
- the gap 22 between the lower wall 43 of the reservoir 20 and the valve body 50 is arranged horizontally, but the gap 22 may be slightly inclined.
- the connection passage 42 is arranged so as to extend in the vertical direction, but the connection passage 42 may be arranged so as to extend slightly inclined from the vertical direction.
- valve body part 50 was driven by the drive part 70, the lower wall 43 of the storage part 20 and the valve body part 50 are driven by the lower wall 43 of the storage part 20 being driven.
- a configuration of relative movement can also be employed.
- the configuration is not limited to the configuration in which the gap between the lower wall 43 as the inner wall of the storage unit 20 and the valve body unit 50 as the current transformation member is sealed, but is also provided in a shutoff provided in a supply passage for supplying the processing liquid to the storage unit 20.
- a configuration in which the discharge of the processing liquid is stopped by a valve or the like may be employed.
- the length of the second curved surface portion 51a is set longer than the length of the first curved surface portion 44a in the flow direction of the processing liquid, and the second curved surface portion 51a is more than the first curved surface portion 44a.
- connection passage 42 has the same shape and the same dimensions. However, the closer to the slit-shaped opening 41, the smaller the flow passage cross-sectional area of the connection passage 42 becomes.
- a configuration including other connection passages having a slit-like cross section, such as a configuration or a configuration in which the connection passage 42 that gently bends the opening 44 and the slit-like opening 41 of the connection passage 42 provided in a non-parallel manner Can also be adopted.
- the length of the short side (slit width) of the slit-shaped opening 41 is constant, but a configuration in which the length of the short side (slit width) is partially different may be adopted. it can.
- the length (slit width) of the short side of the slit-shaped opening 41 is set to several mm, the length of the short side (slit width) can be arbitrarily changed. Specifically, the length (slit width) of the short side of the slit-shaped opening 41 can be set to several hundreds of ⁇ m.
- the first curved surface portion 44a is provided over the entire circumference of the opening 44 of the connection passage 42, and the projection 51 provided on the valve body portion 50 is opposed to the first curved surface portion 44a.
- the second curved surface portion 51a is provided over the entire circumference, a part of the first curved surface portion 44a and the second curved surface portion 51a can be omitted. Even in that case, In the portion where the first curved surface portion 44a and the second curved surface portion 51a are provided, the flow of the processing liquid is guided in the direction of the inner wall surface 42a of the connection passage 42. It can suppress that the gas pinched
- SYMBOLS 20 Storage part, 22 ... Gap, 41 ... Slit-like opening part, 42 ... Connection channel, 43 ... Lower wall as inner wall, 44a ... First curved surface part, 50 ... Valve body part as current transformation member, 51a ... Second curved surface part.
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Abstract
Description
面と前記接続通路の内壁面とを滑らかに接続する前記貯留部側に凸の第1曲面部と、前記変流部材に設けられて前記第1曲面部と同じ側に凸であり同第1曲面部に対向する第2曲面部との隙間を、これらの第1曲面部及び第2曲面部に沿うように流れる。このため、液体の流れは接続通路の内壁面の方向へ導かれることとなり、液体の流れが接続通路の内壁面から離間することが抑制される。したがって、貯留部から接続通路へ液体が流入する際に、液体の流れと接続通路の内壁面とに挟まれた気体が液体中に巻き込まれることを抑制することができる。その結果、液体を予め吐出して気泡を抜く処理を行わない場合であっても、スリット状の開口部から吐出される液体中に気泡が混入することを抑制することができる。
から接続通路へ液体を均一の圧力で送ることができるとともに、液体の吐出を途中で止めることによる液体の圧力変動に起因した気泡の発生を避けることができる。
れる。特に、接続通路42の流路断面の短辺の長さ(スリット幅)が、数mmというように比較的大きく設定されている。このため、液体としてレジスト等の相対的に粘度の高いものが用いられたとしても、液体の自重により生じる圧力によって、接続通路42を通じてスリット状の開口部41から液体を吐出させることができる。
を開いた状態における弁体部50の位置、すなわち接続通路42を閉じた状態から開いた状態までの弁体部50の移動幅を調節する。具体的には、第1本体10に基台79が連結されており、基台79はシリンダ76,支持部72,摺動部71,弁体部50等を支持している。この基台79に調節ねじ78が進退可能に取り付けられている。そして、調節ねじ78のねじ込み量を調節することにより、支持部72の端面72aに当接する調節ねじ78の端部78aの位置、換言すれば調節ねじ78の端部78aから貯留部20の下壁43までの距離を調節することができる。
め、貯留部20の下壁43の表面に沿って流れた処理液は、接続通路42へ流入する際に第2曲面部51aに当たることとなる。
る。
20に貯留され、1回の処理において貯留部20に貯留された全ての処理液が吐出されるようにした。これに対して、貯留部20の容積を拡大して1回の処理に用いられる量よりも多い処理液を貯留部20に貯留するとともに、1回の処理においては貯留部20に貯留された処理液の一部が吐出されるようにしてもよい。この場合には、貯留部20に処理液が残った状態で処理液を補充することができるため、処理液の吐出後に貯留部20の下壁43と弁体部50との隙間等に空気が入り込むことを抑制することができる。このため、スリット状の開口部41から吐出される処理液中に気泡が混入することを抑制することができる。
第1曲面部44a及び第2曲面部51aが設けられた部分においては、処理液の流れが接続通路42の内壁面42aの方向へ導かれることとなり、処理液の流れと接続通路42の内壁面42aとに挟まれた気体が処理液中に巻き込まれることを抑制することができる。
Claims (8)
- 液体を貯留する貯留部と、前記液体を吐出するスリット状の開口部と、スリット状の断面を有して前記貯留部と前記スリット状の開口部とを接続する接続通路とを備える液体吐出装置であって、
前記貯留部内において前記接続通路の流路断面を覆うとともに、前記貯留部の内壁とで隙間を形成してその隙間から前記液体を前記接続通路へ流入させる変流部材と、
前記貯留部の内壁面と前記接続通路の内壁面とを滑らかに接続する前記貯留部側に凸の第1曲面部と、
前記変流部材に設けられて前記第1曲面部と同じ側に凸であり同第1曲面部に対向する第2曲面部と
を備えることを特徴とする液体吐出装置。 - 前記第2曲面部の曲率半径は、前記第1曲面部の曲率半径よりも大きく設定されていることを特徴とする請求項1に記載の液体吐出装置。
- 前記液体の流れ方向において、前記第2曲面部の長さは、前記第1曲面部の長さよりも長く設定されていることを特徴とする請求項1又は2に記載の液体吐出装置。
- 前記液体の流れ方向において、前記第2曲面部は、前記第1曲面部よりも下流側まで設けられていることを特徴とする請求項1~3のいずれか1項に記載の液体吐出装置。
- 前記貯留部の内壁と前記変流部材とが相対移動可能であり、この相対移動に基づいて同貯留部の内壁と同変流部材との隙間をシール可能であることを特徴とする請求項1~4のいずれか1項に記載の液体吐出装置。
- 前記貯留部の下部に前記接続通路が接続されるとともに、前記貯留部の内壁と前記変流部材との隙間が水平に配置され、
前記液体の自重により生じる圧力によって前記スリット状の開口部から同液体を吐出することを特徴とする請求項1~5のいずれか1項に記載の液体吐出装置。 - 前記第1曲面部は、前記スリット状の断面を有する前記接続通路の内壁面に沿って環状に設けられており、
前記貯留部の内壁と前記変流部材とが相対移動可能であり、この相対移動に基づいて同貯留部の内壁と同変流部材との隙間を、前記第1曲面部から等距離の位置において環状にシール可能であることを特徴とする請求項6に記載の液体吐出装置。 - 前記貯留部の内壁面が前記接続通路に近付くほど低くなるように傾斜していることを特徴とする請求項6又は7に記載の液体吐出装置。
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KR1020117027169A KR101140040B1 (ko) | 2009-04-16 | 2010-04-16 | 액체 토출 장치 |
US13/264,742 US8840049B2 (en) | 2009-04-16 | 2010-04-16 | Liquid ejecting apparatus |
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JP2009-099669 | 2009-04-16 | ||
JP2009099669A JP4668330B2 (ja) | 2009-04-16 | 2009-04-16 | 液体吐出装置 |
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US (1) | US8840049B2 (ja) |
JP (1) | JP4668330B2 (ja) |
KR (1) | KR101140040B1 (ja) |
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CN112635645A (zh) * | 2021-01-14 | 2021-04-09 | 深圳市科润光电股份有限公司 | 一种具有高散热功能的led封装结构 |
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WO2012098730A1 (ja) | 2011-01-19 | 2012-07-26 | シーケーディ株式会社 | 液体気化器 |
JP5989944B2 (ja) * | 2011-09-30 | 2016-09-07 | Ckd株式会社 | 液体制御装置 |
KR101892758B1 (ko) | 2011-09-30 | 2018-10-04 | 시케이디 가부시키가이샤 | 액체 제어 장치 |
JP6055280B2 (ja) * | 2012-11-11 | 2016-12-27 | 平田機工株式会社 | 塗布液充填方法 |
US20180030678A1 (en) * | 2016-08-01 | 2018-02-01 | Specialized Pavement Marking, Inc. | Striping apparatus |
KR102502732B1 (ko) * | 2020-12-18 | 2023-02-23 | 주식회사 동우전자 | Led용 렌즈 공급기의 접착제 도포장치 |
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- 2010-04-16 WO PCT/JP2010/056871 patent/WO2010119961A1/ja active Application Filing
- 2010-04-16 TW TW099112043A patent/TWI523697B/zh active
- 2010-04-16 US US13/264,742 patent/US8840049B2/en active Active
- 2010-04-16 KR KR1020117027169A patent/KR101140040B1/ko active IP Right Grant
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JP4668330B2 (ja) | 2011-04-13 |
TW201103637A (en) | 2011-02-01 |
US8840049B2 (en) | 2014-09-23 |
KR101140040B1 (ko) | 2012-05-02 |
TWI523697B (zh) | 2016-03-01 |
US20120024989A1 (en) | 2012-02-02 |
JP2010247078A (ja) | 2010-11-04 |
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