WO2010098371A1 - 露光装置 - Google Patents
露光装置 Download PDFInfo
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- WO2010098371A1 WO2010098371A1 PCT/JP2010/052919 JP2010052919W WO2010098371A1 WO 2010098371 A1 WO2010098371 A1 WO 2010098371A1 JP 2010052919 W JP2010052919 W JP 2010052919W WO 2010098371 A1 WO2010098371 A1 WO 2010098371A1
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- WIPO (PCT)
- Prior art keywords
- light
- light modulation
- exposed
- transport direction
- beam shaping
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Definitions
- the present invention relates to an exposure apparatus that generates a predetermined pattern by a plurality of light modulation elements made of an electro-optic crystal material while conveying an object to be exposed in a certain direction, and in particular, exposes the object to be exposed.
- the present invention relates to an exposure apparatus that attempts to improve alignment accuracy between a pattern generated by an element and an exposure position of an object to be exposed.
- a conventional exposure apparatus of this type is arranged between a stage for placing and holding an object to be exposed on the upper surface, a light source for emitting light, and a stage and a light source.
- a plurality of light modulation elements each provided with a pair of electrodes facing the side surfaces parallel to the long axis direction of an elongated member made of an electro-optic crystal material are used as the light incident end face and the light emission end face of the light source from both ends.
- Spatial light modulation means for dimensionally arranging and modulating the transmitted light of each light modulation element to generate a predetermined pattern and exposing the object to be exposed, and each light modulation element of the spatial light modulation means is driven individually And a control means for generating a predetermined pattern by control (see, for example, Patent Document 1).
- the alignment between the pattern generated by the plurality of light modulation elements of the spatial light modulator and the exposure position of the object to be exposed is generally performed by the spatial light modulator or the object to be exposed. Either one of them must be moved in a direction substantially orthogonal to the transport direction of the object to be exposed in a plane parallel to the upper surface of the stage.
- the alignment accuracy is limited by the mechanical accuracy of the alignment mechanism. I was receiving. Therefore, it has been difficult to perform the above alignment with an accuracy equal to or lower than the resolution of the exposure pixels irradiated on the object to be exposed.
- the present invention addresses such problems, and an exposure apparatus that attempts to improve alignment accuracy between a pattern generated by a plurality of light modulation elements made of an electro-optic crystal material and an exposure position of an object to be exposed.
- the purpose is to provide.
- an exposure apparatus comprises a conveying means for placing an object to be exposed on an upper surface and conveying the object in a fixed direction, and the object to be exposed within a plane parallel to the upper surface of the conveying means.
- Spatial light modulation means having a plurality of light modulation elements made of electro-optic crystal material arranged at least in a line at a predetermined arrangement pitch in a direction crossing the transport direction of the light, and incident on each light modulation element or from each light modulation element
- a light beam shaping means for limiting the width of the emitted light in the transport direction to a predetermined width, and driving each of the light modulation elements individually to control on / off of the transmitted light of the spatial light modulation means.
- Each of the light modulation elements is formed in a substantially rectangular shape whose cross section perpendicular to the optical axis is long in the transport direction of the object to be exposed, and parallel to the transport direction. A certain angle with respect to the axis Tilt is formed, said control means is for relatively moving the transport direction with respect to said light beam shaping means and said plurality of light modulator elements.
- the object to be exposed is placed on the upper surface by the conveying means and conveyed in a certain direction, and a predetermined arrangement is made in a direction intersecting the conveying direction of the object to be exposed in a plane parallel to the upper surface of the conveying means.
- a cross-sectional shape arranged at least in a line at a pitch and perpendicular to the optical axis is formed into a substantially rectangular shape that is long in the transport direction of the object to be exposed, and is inclined at a predetermined angle with respect to an axis parallel to the transport direction.
- a plurality of light modulation elements of the spatial light modulation means made of the electro-optic crystal material individually driven by the control means, on and off control of the transmitted light of the spatial light modulation means to generate a predetermined pattern
- Light beam shaping means for limiting the width in the transport direction of light incident on or emitted from each light modulation element to a predetermined width relative to the plurality of light modulation elements in the transport direction. Move.
- the light modulation elements are arranged in two rows with a predetermined distance in the transport direction of the object to be exposed. As a result, a predetermined pattern is generated by a plurality of light modulation elements arranged in two rows at a predetermined distance in the conveyance direction of the object to be exposed.
- the light beam shaping means includes a light shielding mask having a long and narrow opening formed in a direction intersecting the transport direction of the object to be exposed, and is incident on each light modulation element or each light modulation element
- the width in the transport direction of the light emitted from is limited to a predetermined width.
- each light modulation element is incident on or emitted from each light modulation element by the light beam shaping means configured to include a light-shielding mask having a long and narrow opening formed in a direction intersecting the conveyance direction of the object to be exposed.
- the width in the light transport direction is limited to a predetermined width.
- the light beam shaping means includes an elongated cylindrical lens that is long in a direction intersecting the conveyance direction of the object to be exposed, and has a predetermined width in the conveyance direction of light incident on each light modulation element. It is limited to the width.
- the width of the light incident in each light modulation element is limited to a predetermined width by the light beam shaping means configured to include a long and narrow cylindrical lens in a direction intersecting the conveyance direction of the object to be exposed. .
- the control unit shifts the irradiation position of the light transmitted through each light modulation element onto the object to be exposed in a direction intersecting the transport direction of the object to be exposed, the amount of shift is determined by the amount of each light.
- each of the light modulation elements is driven by being shifted by a distance equal to an integer multiple of the arrangement pitch, and the amount of shift less than the arrangement pitch is the light beam shaping means Is set by moving a predetermined distance in the conveying direction of the object to be exposed.
- the shift amount is an integral multiple of the arrangement pitch of each light modulation element.
- the control means drives each light modulation element by shifting it by a distance equal to an integral multiple of the arrangement pitch, and the control means moves the light beam shaping means to the object to be exposed. It is set by moving it a predetermined distance in the transport direction.
- the control means transfers a predetermined drive pattern to each of the light modulation elements on the front side in the transport direction of the two rows of light modulation elements each time the object to be exposed is moved by w.
- the same drive pattern as the drive pattern transferred n times before to each row of light modulation elements on the front side in the transport direction is provided. To be transferred.
- the width in the light transport direction is limited to w by the light beam shaping means, and among the plurality of light modulation elements in two rows separated by nw (n is a positive integer) by the control means, A predetermined drive pattern is transferred to each light modulation element in a certain row, and each light modulation element in a row on the rear side in the transport direction is n times before each light modulation element in the front in the transport direction.
- the same drive pattern as that transferred to is transferred.
- the cross-sectional shape perpendicular to the optical axis of each light modulation element is formed in a substantially rectangular shape that is long in the transport direction of the object to be exposed, and with respect to an axis parallel to the transport direction.
- the light beam shaping means is formed at a predetermined angle and is generated by the spatial light modulation means by moving the light beam shaping means relative to the plurality of light modulation elements in the conveying direction of the object to be exposed.
- the irradiation position of the predetermined pattern on the object to be exposed can be shifted in a direction crossing the conveying direction of the object to be exposed.
- the pattern can be linearly shifted in the direction intersecting the transport direction in accordance with the amount of movement of the light beam shaping means, and the alignment between the pattern and the exposure position of the object to be exposed is performed on the object to be exposed. Can be performed with high accuracy below the resolution of the exposed pixels irradiated.
- the unexposed portions between the plurality of exposed pixels by the plurality of light modulation elements disposed in the rear side in the transport direction are arranged in a row in the front direction in the transport direction. It is possible to perform exposure by complementing with a plurality of exposure pixels by the modulation element.
- the width in the transport direction of the light incident on or emitted from each light modulation element is limited to a predetermined width by the light shielding mask having an elongated opening formed therein. Can do. Therefore, the light beam shaping means can be formed with a simple configuration.
- the width in the transport direction of the light incident on each light modulation element can be limited to a predetermined width by the elongated cylindrical lens. Therefore, light can be collected by the cylindrical lens and incident on each modulation element, and the light utilization efficiency can be improved.
- the amount of shift is each The irradiation position can be shifted by an amount substantially matching the shift amount even when it is an integer multiple of the arrangement pitch of the light modulation elements. Therefore, alignment between the pattern and the exposure position of the object to be exposed can be performed with higher accuracy.
- FIG. 3A and 3B are three views showing the main part of the light modulation element assembly of the spatial light modulation means, wherein FIG. 3A is a plan view, FIG. 3B is a right side view, and FIG. It is.
- FIG. 3A is a plan view
- FIG. 3B is a right side view
- FIG. 1 is a schematic block diagram showing an embodiment of an exposure apparatus according to the present invention.
- the exposure apparatus generates a predetermined pattern by a plurality of light modulation elements made of an electro-optic crystal material while conveying the object to be exposed in a certain direction, and exposes the object to be exposed.
- spatial light modulation means 3
- light beam shaping means 4
- imaging means 5
- control means 6 6.
- the conveying means 1 is configured to carry the object 7 on the upper surface and convey it in a certain direction, and has a plurality of ejection holes for ejecting gas and a plurality of suction holes for sucking gas on the upper surface.
- the unit stages 8 are arranged in parallel in the conveyance direction of the object to be exposed 7 and the object to be exposed 7 is floated on the plurality of unit stages 8 by a predetermined amount due to the balance between gas ejection and suction.
- the both ends of the object to be exposed 7 are supported by rollers and conveyed in the direction of arrow A in FIG.
- An exposure light source 2 is disposed above the transport means 1.
- the exposure light source 2 emits light to a spatial light modulator 3 described later, and is a laser oscillator, a xenon lamp, an ultrahigh pressure mercury lamp, or the like that emits ultraviolet rays.
- the spatial light modulation unit 3 is arranged with the light emitting side surface 3 a facing the upper surface of the transport unit 1.
- the spatial light modulating means 3 generates a predetermined pattern by transmitted light as it is irradiated onto the object to be exposed 7, electrical, such as, for example, LiNbO 3, which controls the rotation of the polarization plane of the linearly polarized light as shown in FIG. 2
- a plurality of light modulation elements 9 made of an optical crystal material are arranged at a pitch P in a direction intersecting (substantially orthogonal) with the transport direction (arrow A direction) of the object to be exposed 7 in a plane parallel to the upper surface of the transport means 1. 3) and these are formed in two rows.
- each of the light modulation elements 9 is formed in a substantially rectangular shape having a cross-sectional shape orthogonal to the optical axis and extending in the transport direction of the object to be exposed 7, and is orthogonal to the arrangement direction as shown in FIG. It is formed to be inclined by a predetermined angle ⁇ with respect to an axis (an axis parallel to the conveyance direction of the object to be exposed 7).
- common polarizing plates 10A and 10B are arranged on the light incident side and the light emission side of the plurality of light modulation elements 9 so as to be arranged in crossed Nicols whose polarization axes are orthogonal to each other.
- one row of light modulation elements 9 located on the rear side in the transport direction (arrow A direction) of the exposure object 7 shown in FIG. 2 is referred to as a first element row 11.
- a row of light modulation elements 9 located on the front side in the transport direction (arrow A direction) is referred to as a second element row 12.
- Such a spatial light modulator 3 can be formed as follows, for example. That is, as shown in FIG. 3, a strip-shaped electro-optic crystal material 13 having a predetermined thickness is formed using a dicing saw, for example, to form a groove 14 having a width W 1 and a depth D along the major axis. excising a depth D of the opposite side portions of the parallel electro-optic crystal material 13 in the width W 2 to 14. At this time, the width W 3 of the portion sandwiched between the groove 14 and the cut portion 15 of the electro-optic crystal material 13 is a width in the transport direction of the object 7 to be exposed later, which will be described later. It is set to be larger than the width w of the opening 29 of the light beam shaping means 4. The distance between the center lines of the portion sandwiched between the groove 14 and the cut portion 15 is set to be nw (n is a positive integer).
- the conductive film 16 is formed on the inner surface of the groove 14 and the cut portion 15 by a known film formation technique such as sputtering, vapor deposition, or CVD. Subsequently, for example, using a dicing saw, a plurality of separation grooves 17 having a width W 4 and a depth d (> D) inclined by an angle ⁇ with respect to an axis orthogonal to the major axis of the electro-optic crystal material 13 are arranged at a pitch P.
- the light modulation element assembly 18 in which the first and second element rows 11 and 12 are arranged in parallel is formed. Thereafter, for example, a conductive paste 19 is applied to the bottom of the groove 14.
- the conductive film 16 formed on the side surface of the light modulation element 9 in the first and second element rows 11 and 12 on the groove 14 side becomes the common electrode (ground electrode) 20, and the groove of each light modulation element 9 is formed.
- the conductive film 16 formed on the side surface opposite to 14 serves as the drive electrode 21.
- the second element array 12 is shifted from the first element array 11 in a direction substantially orthogonal to the transport direction of the object to be exposed 7, and each light modulation element of the first element array 11. The dimension of each part is determined so that each light modulation element 9 of the 2nd element row
- the conductive film 16 may be formed as a base film for each electrode, and a film of a good conductor such as gold or copper may be formed on the conductive film 16 after the light modulation element assembly 18 is processed.
- an opening 22 is formed on the light emitting side surface 18 a of the light modulation element assembly 18 corresponding to the formation region of each light modulation element 9, and the long axis of the opening 22 is formed.
- a plurality of electrode terminal portions 23 are formed along both edge portions parallel to each other and a ground electrode terminal portion 25 is formed near the edge portion parallel to the short axis.
- the region of the light emission side surface 18a is attached to the opening 22 so that the electrode terminal portion 23 of the wiring board 24, the drive electrode 21 of each light modulation element 9, the ground electrode terminal portion 25 of the wiring substrate 24, and the light.
- the ground electrode 20 of the modulation element 9 is electrically connected by wire bonding using a conductive wire 26 such as gold.
- the spatial light modulator 3 is formed by disposing common polarizing plates 10 ⁇ / b> A and 10 ⁇ / b> B in crossed Nicols whose polarization axes are orthogonal to each other on the light incident side and the emission side of each light modulation element 9. Is completed.
- the spatial light modulation means 3 configured in this way operates as follows. That is, as shown in FIG. 4, the ultraviolet light source light U1 emitted from the exposure light source 2 is converted into linearly polarized light U2 by the polarizing plate 10A and enters the incident end face 9a of the light modulation element 9. In this case, as shown in FIG. 5A, when no voltage is applied to the drive electrode 21 of the light modulation element 9, the light modulation element 9 is turned off, and a straight line passing through the light modulation element 9 The polarization plane of the polarized light U2 is not rotated.
- Light beam shaping means 4 is provided adjacent to the exit side end face 3 a of the spatial light modulation means 3.
- the light beam shaping means 4 limits the width in the transport direction of the exposure object 7 indicated by the arrow A of the light emitted from each light modulation element 9 of the spatial light modulation means 3 as shown in FIG.
- the light shielding film 28 deposited on the surface of the transparent substrate 27 is provided with a light shielding mask 30 formed with an elongated opening 29 having a width w that is long (substantially orthogonal) to the transport direction, and will be described later. It is controlled by the means 6 so as to be movable in the conveying direction of the object 7 to be exposed by, for example, an electromagnetic or piezoelectric actuator.
- the light shielding mask 30 may be a light shielding plate having slits.
- the imaging means 5 is provided at a distance L from the first element row 11 of the spatial light modulation means 3 in the direction opposite to the conveyance direction (arrow A direction) of the exposure object 7.
- the imaging unit 5 captures a reference pattern formed in advance on the object to be exposed 7 with transmitted light of illumination light emitted from below the object to be exposed 7 by an illumination unit (not shown).
- 1 is a line camera in which a large number of light receiving elements are arranged in a straight line in a direction substantially orthogonal to the conveyance direction indicated by an arrow A in FIG. 1 within a plane parallel to the upper surface of the conveyance means 1.
- reference numeral 31 denotes a coupling optical system that makes the intensity distribution of light emitted from the exposure light source 2 uniform and makes it parallel light.
- Control means 6 is electrically connected to the transport means 1, the spatial light modulation means 3, and the imaging means 5.
- the control means 6 individually controls the light modulation elements 9 of the spatial light modulation means 3 to generate a predetermined pattern.
- the image processing unit 32 processes the image of the surface of the object to be exposed 7 imaged by the imaging unit 5 to generate image data.
- the CAD data storage unit 33 stores CAD data of all exposure patterns corresponding to the exposure area on the surface of the object to be exposed 7, and is a memory or a CD-ROM.
- the comparator 34 compares the image data generated by the image processing unit 32 with the CAD data read from the CAD data storage unit 33 corresponding to the image data. It also functions to detect the quantity.
- the bitmap data creation unit 35 is substantially orthogonal to the transport direction of the exposure object 7 by an integral multiple including zero of the arrangement pitch of the plurality of light modulation elements 9 of the spatial light modulation means 3 according to the amount of deviation.
- Bitmap data shifted in the direction (drive pattern of the light modulation element 9) is created. Further, the light beam shaping means drive control unit 36 moves the light beam shaping means 4 by the distance corresponding to the deviation amount less than the arrangement pitch of the plurality of light modulation elements 9 among the deviation amounts in the transport direction of the object 7 to be exposed. To be moved.
- the conveyance means drive control part 37 controls the drive of the conveyance means 1 so that the to-be-exposed body 7 may be conveyed in the arrow A direction at predetermined speed, and based on the output of the position sensor with which the conveyance means 1 was equipped, Each time the exposed object 7 is transported by the distance w after the first exposure position on the reference pattern of the exposed object 7 is imaged by the imaging means 5, predetermined CAD data is sequentially compared from the CAD data storage unit 33. 34 to be transferred.
- the exposure operation of the exposure apparatus configured as described above will be described.
- the image of the exposure position on the reference pattern formed on the surface of the object to be exposed 7 is picked up by the image pickup means 5 while the object to be exposed 7 is conveyed in the direction of arrow A.
- the captured image is subjected to image processing by the image processing unit 32 of the control means 6 and converted into image data.
- this image data is compared with the corresponding CAD data read from the CAD data storage unit 33 by the comparator 34, and a shift amount in a direction substantially orthogonal to the conveying direction of both image data is detected.
- the shift amount is (mP + ⁇ ) (P is the arrangement pitch of the light modulation elements 9, m is an integer including zero, ⁇ P ⁇ ⁇ P)
- Bit map data shifted by mP in a direction substantially orthogonal to the transport direction 7 is created and transferred to the first element array 11 of the spatial light modulator 3.
- the light beam shaping means drive control section 36 calculates ⁇ / tan ⁇ based on the deviation amount ⁇ to calculate the movement amount ⁇ x of the light beam shaping means 4 and generates a drive signal corresponding to the movement amount ⁇ x. Then, it is sent to the light beam shaping means 4.
- the light beam shaping means 4 is moved in the transport direction (arrow A direction) of the object 7 by the amount of movement ⁇ x.
- the shift amount mP corresponding to an integral multiple of the array pitch P of the light modulation elements 9 can be corrected by shifting the bitmap data by mP, and the shift amount ⁇ less than the array pitch P Correction can be made by moving the beam shaping means 4 in the conveying direction of the object 7 to be exposed.
- FIG. 7 is an explanatory view showing displacement correction performed by moving the light beam shaping means 4, and is a view of the spatial light modulation means 3 side as seen from the light beam shaping means 4 side.
- FIG. 6A shows a state in which the two openings 29 of the light beam shaping means 4 are at a reference position in which the major axes thereof coincide with the major axes of the first and second element rows 11 and 12 of the spatial light modulation means 3. Is shown.
- the exposure pixel 38 that is modulated by the spatial light modulation means 3 and passes through the opening 29 of the light beam shaping means 4 and irradiates the object 7 to be exposed is in the transport direction of the object 7 with respect to the reference position. It shifts by a distance ⁇ in a direction substantially orthogonal. In this way, the shift amount ⁇ is corrected.
- the image pickup position by the image pickup means 5 and the exposure position by the spatial light modulation means 3 are separated by a distance L in the transport direction of the object to be exposed 7. After the exposure position on the exposure object 7 is detected based on this, the exposure object 7 is transported by a distance L, and the exposure position is below the first element array 11 of the spatial light modulation means 3 with the light beam.
- Bitmap data shifted by mP is transferred from the bitmap data creation unit 35 to the first element array 11 at the timing when the position corresponding to the opening 29 of the shaping unit 4 is reached.
- the light beam shaping means 4 is moved by the distance ⁇ x while the exposure object 7 is transported by the distance L after the exposure position on the exposure object 7 is detected based on the captured image of the imaging means 5. It will be.
- the drive timing of the spatial light modulation means 3 is based on a reference in which the major axis of each element array 11, 12 of the spatial light modulation means 3 matches the major axis of each opening 29 of the light beam shaping means 4.
- the distance varies depending on the amount of movement ⁇ x of the light beam shaping means 4 from the position.
- the bitmap data may be transferred to the spatial light modulator 3 as soon as it is created by the bitmap data creation unit 35 and stored in a storage unit (not shown) provided in the spatial light modulator 3.
- predetermined bitmap data is transferred from the bitmap data creation unit 35 to the first element array 11 of the spatial light modulator 3, and the bitmap data is transferred to the bitmap data. Based on this, each light modulation element 9 in the first element array 11 is driven to generate a predetermined pattern, and the predetermined pattern is exposed at a predetermined position of the object 7 to be exposed.
- the same bitmap data as the bitmap data transferred to the first element row 11 n times before is transferred to the second element row 12 of the spatial light modulator 3.
- the second element row 12 can be exposed by being superimposed on the plurality of exposure pixels 38 exposed n times before by the first element row 11.
- the second element row 12 is formed so that each light modulation element 9 can complement the portion between the light modulation elements 9 of the first element row 11. 11 can be complemented by the exposed pixels 38 by the second element row 12.
- the spatial light modulator 3 has the first and second element rows 11 and 12 has been described.
- the present invention is not limited to this, and only the first element row 11 is provided. May be.
- the present invention is not limited to this, and the light beam shaping means 4 is Further, it may be provided adjacent to the incident side end face of the spatial light modulator 3.
- the light beam shaping unit 4 includes the light shielding mask 30 having the opening 29 through which light is transmitted has been described.
- the present invention is not limited to this, and the light beam shaping unit 4 is provided. May be configured to include a cylindrical lens that generates a linear light beam by narrowing incident light only in one uniaxial direction of two orthogonal axes (conveying direction of the object 7 to be exposed).
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- General Physics & Mathematics (AREA)
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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Abstract
Description
先ず、露光光源2が点灯された後、被露光体7を矢印A方向に搬送しながら撮像手段5で被露光体7表面に形成された基準パターン上の露光位置の画像を撮像する。撮像された画像は、制御手段6の画像処理部32で画像処理されて画像データに変換される。そして、この画像データは、CADデータ記憶部33から読み出された対応するCADデータと比較器34で比較され両画像データの搬送方向に略直交する方向のずれ量が検出される。
3…空間光変調手段
4…光ビーム整形手段
6…制御手段
7…被露光体
9…光変調素子9
11…第1の素子列
12…第2の素子列
13…電気光学結晶材料
29…開口
30…遮光マスク
Claims (6)
- 上面に被露光体を載置して一定方向に搬送する搬送手段と、
前記搬送手段の上面に平行な面内にて前記被露光体の搬送方向と交差する方向に電気光学結晶材料から成る複数の光変調素子を所定の配列ピッチで少なくとも一列に並べて有する空間光変調手段と、
前記各光変調素子に入射、又は各光変調素子から射出する光の前記搬送方向の幅を所定幅に制限する光ビーム整形手段と、
前記各光変調素子を個別に駆動して前記空間光変調手段の透過光をオン・オフ制御し、所定のパターンを生成させる制御手段と、を備え、
前記各光変調素子は、その光軸に直交する横断面形状が前記被露光体の搬送方向に長い略長方形状に形成されると共に、前記搬送方向に平行な軸に対して所定角度だけ傾けて形成され、
前記制御手段は、前記光ビーム整形手段を前記複数の光変調素子に対して前記搬送方向に相対的に移動させることを特徴とする露光装置。 - 前記各光変調素子は、前記被露光体の搬送方向に所定距離だけ離隔して二列に並べられていることを特徴とする請求項1記載の露光装置。
- 前記光ビーム整形手段は、前記被露光体の搬送方向と交差する方向に長い細長状の開口を形成した遮光マスクを備えて構成され、前記各光変調素子に入射、又は各光変調素子から射出する光の前記搬送方向の幅を所定幅に制限することを特徴とする請求項1又は2記載の露光装置。
- 前記光ビーム整形手段は、前記被露光体の搬送方向と交差する方向に長い細長状のシリンドリカルレンズを備えて構成され、前記各光変調素子に入射する光の前記搬送方向の幅を所定幅に制限することを特徴とする請求項1又は2記載の露光装置。
- 前記制御手段は、前記各光変調素子を透過した光の前記被露光体上への照射位置を前記被露光体の搬送方向と交差する方向にずらす場合に、そのずらし量が前記各光変調素子の配列ピッチの整数倍以上であるときには、前記各光変調素子を前記配列ピッチの整数倍に等しい距離だけシフトして駆動し、前記配列ピッチに満たないずらし量は、前記光ビーム整形手段を前記被露光体の搬送方向に所定距離だけ移動して設定することを特徴とする請求項1~4のいずれか1項に記載の露光装置。
- 前記光ビーム整形手段により制限された光の前記搬送方向の幅がwであるとき、
前記二列に並んだ複数の光変調素子の列間距離は、nw(nは正の整数)に設定され、
前記制御手段は、前記被露光体がwだけ移動される度に、前記二列の光変調素子のうち前記搬送方向の前側にある一列の各光変調素子に所定の駆動パターンを転送し、前記搬送方向手の後側にある一列の各光変調素子には、前記搬送方向の前側にある一列の各光変調素子に対してn回前に転送された駆動パターンと同一の駆動パターンを転送することを特徴とする請求項2記載の露光装置。
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KR1020117020635A KR101688127B1 (ko) | 2009-02-26 | 2010-02-25 | 노광 장치 |
CN201080009430.XA CN102334070B (zh) | 2009-02-26 | 2010-02-25 | 曝光装置 |
US13/206,794 US8953146B2 (en) | 2009-02-26 | 2011-08-10 | Exposure apparatus for improving alignment accuracy of a pattern generated by light modulating elements |
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KR (1) | KR101688127B1 (ja) |
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CN103250231A (zh) * | 2010-11-12 | 2013-08-14 | 株式会社V技术 | 曝光装置 |
US8953146B2 (en) | 2009-02-26 | 2015-02-10 | V Technology Co., Ltd. | Exposure apparatus for improving alignment accuracy of a pattern generated by light modulating elements |
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JP6250415B2 (ja) * | 2014-01-31 | 2017-12-20 | 株式会社Screenホールディングス | パターン描画装置およびパターン描画方法 |
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JP2007017895A (ja) * | 2005-07-11 | 2007-01-25 | Fujifilm Holdings Corp | 露光装置 |
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US8953146B2 (en) | 2015-02-10 |
JP2010197822A (ja) | 2010-09-09 |
KR20110128841A (ko) | 2011-11-30 |
KR101688127B1 (ko) | 2016-12-20 |
TW201104359A (en) | 2011-02-01 |
CN102334070B (zh) | 2013-07-10 |
JP5190630B2 (ja) | 2013-04-24 |
CN102334070A (zh) | 2012-01-25 |
TWI480708B (zh) | 2015-04-11 |
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