WO2010059696A1 - Dual-mode mass flow verification and mass flow delivery system and method - Google Patents

Dual-mode mass flow verification and mass flow delivery system and method Download PDF

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Publication number
WO2010059696A1
WO2010059696A1 PCT/US2009/064948 US2009064948W WO2010059696A1 WO 2010059696 A1 WO2010059696 A1 WO 2010059696A1 US 2009064948 W US2009064948 W US 2009064948W WO 2010059696 A1 WO2010059696 A1 WO 2010059696A1
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WO
WIPO (PCT)
Prior art keywords
chamber
fluid
gas
controller
mode
Prior art date
Application number
PCT/US2009/064948
Other languages
English (en)
French (fr)
Inventor
Junhua Ding
Kaveh Zarkar
Original Assignee
Mks Instruments, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instruments, Inc. filed Critical Mks Instruments, Inc.
Priority to GB1107926.6A priority Critical patent/GB2477247B/en
Priority to KR1020117013859A priority patent/KR101316075B1/ko
Priority to CN200980154214.1A priority patent/CN102301208B/zh
Priority to DE112009003602.3T priority patent/DE112009003602B4/de
Priority to JP2011536615A priority patent/JP5688026B2/ja
Publication of WO2010059696A1 publication Critical patent/WO2010059696A1/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01FMEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • G05D7/0617Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0647Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in series
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01FMEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F25/00Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
    • G01F25/10Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
    • G01F25/15Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters specially adapted for gas meters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01FMEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F11/00Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01FMEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F23/00Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm
    • G01F23/14Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measurement of pressure
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01FMEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F25/00Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume

Definitions

  • a mass flow verifier may be used to verify the accuracy of high-precision fluid delivery systems such as mass flow controllers (MFCs) and mass flow ratio controllers (FRCs).
  • MFCs mass flow controllers
  • FRCs mass flow ratio controllers
  • a mass flow verifier may include a chamber, a pressure transducer, a temperature sensor and two isolation valves, one upstream and one downstream. The valves may be closed during idle, and may open when a run is initiated, allowing flow of fluid from the device under test (DUT) such as a MFC or a FRC through the flow verifier. Once fluid flow has stabilized, the downstream valve may be closed, and as a result the pressure may rise in the chamber, and the raise in pressure may be measured as well the gas temperature. These measurements may be used to calculate the flow rate and thereby verify the performance of the DUT.
  • DUT device under test
  • a mass flow delivery device such as a Mole Delivery Device (MDD) may be used to accurately deliver desired amounts of gases into semiconductor processing chambers.
  • MMD Mole Delivery Device
  • Such mass flow delivery devices may provide highly repeatable and precise quantities of gaseous mass for use in semiconductor manufacturing processes, for example atomic layer deposition (ALD) processes.
  • ALD atomic layer deposition
  • a system performs mass flow delivery of a fluid, as well as mass flow verification of the fluid.
  • the system includes an inlet valve configured to control flow of the fluid into a chamber, an outlet valve configured to control flow of the fluid out of the chamber, a pressure sensor configured to measure pressure within the chamber, and a controller.
  • the system may also include a temperature sensor configured to measure temperature within the chamber.
  • the controller is configured, when in a first mode, to control opening and closing of the inlet and outlet valves so as to verify a measurement of the flow rate of the fluid by a device under test, using the measurements of the pressure and the temperature change within the chamber.
  • the controller is further configured, when in a second mode, to control opening and closing of the inlet and outlet valves so as to deliver a desired amount of the fluid from the chamber into a processing facility, using the measurements of the pressure and the temperature change within the chamber.
  • FIG. 1 illustrates a block diagram of a mass flow verifier.
  • FIG. 2 schematically illustrates a mass flow delivery system.
  • FIG. 3 is a flow chart illustrating an exemplary embodiment of a method of mass flow delivery.
  • FIG. 4 is a schematic illustration of a dual-mode mass flow verification and mass flow delivery system, in accordance with one embodiment of the present disclosure.
  • FIG. 5 is a flow chart illustrating an exemplary embodiment of a method of performing mass flow verification and mass flow delivery, in accordance with one embodiment of the present disclosure.
  • FIG. 1 is a block diagram of a mass flow verifier 100.
  • the MFV 100 includes an enclosed volume or chamber 130 (having a known volume V c ) that is configured to receive a flow of a fluid from a device under test (DUT) 110.
  • the DUT 110 shown in the illustrated embodiment is an MFC that delivers a desired flow rate of the fluid.
  • An MFC is typically a self- contained device that includes a mass flow sensor, control valves, and control and signal-processing electronics, and can be used to repeatedly deliver desired fluid flow rates. Examples of the DUT 110 may include, but are not limited to, a mass flow controller (MFC) and a mass flow ratio controller (FRC).
  • MFC mass flow controller
  • FRC mass flow ratio controller
  • An inlet valve 120 shuts on and off the flow of fluid from the DUT 110 into the chamber 130.
  • An outlet valve 150 shuts on and off the flow of the fluid from the chamber 130.
  • the MFV 100 further includes a pressure sensor 170 configured to measure pressure of the fluid within the chamber 130, and a temperature sensor 180 configured to measure temperature of the fluid within the chamber 130.
  • the fluid whose mass flow rate is being verified is a gas, although flow rates of other types of fluids may also be verified by the MFV 100.
  • the device being tested by the MFV 100 is illustrated as being a single DUT (MFC) 110, it should be noted that in other embodiments, a plurality of DUTs may be connected to and tested by the MFV 100.
  • the plurality of DUTs may be connected to the MFV 100 via a gas manifold, for example.
  • a controller 160 is connected to the MFV 100.
  • the controller 160 controls the in-situ verification of the performance of the DUT 110, and controls the operation of the inlet valve 120 and the outlet valve 150.
  • the controller 160 may implement a "rate-of-rise” (ROR) technique flow verification technique to perform mass flow verification.
  • ROR rate-of-rise
  • the basic principle of a ROR MFV is a mass balance over the chamber 130.
  • the inlet fluid flow rate can be obtained by measuring the pressure and the temperature of the gas (or other fluid) in the chamber 130 of MFV 100 according to the following equation:
  • T is the gas temperature
  • V c is the volume of the chamber vessel; ko is a conversion constant, 6 x 10 7 in seem (standard cubic centimeters per minute) units and 6 x 10 4 in slm (standard liters per minute) units;
  • the controller 160 receives the output signals from the pressure sensor 170 and temperature sensor 180, and controls the operation of the inlet valve 120 and the outlet valve 150, based on the received output signals.
  • the controller 160 measures a rate of rise in pressure of the fluid within the chamber 130 after the outlet valve 150 is closed, and using the measured rate of rise of pressure over time and temperature to calculate the flow rate Q 1n of the fluid from the DUT 110 into the chamber 130 according to Eq. (1).
  • the MFC 110 that is being tested may be connected to the MFV 100.
  • flow of the fluid from the MFC 110 to the MFV 100 is shut off.
  • the inlet valve 120 and the outlet valve 150 are opened, so that fluid flows from the MFC 110 to the MFV 100.
  • the MFC 110 may be provided with a flow set point.
  • the fluid flow rate from the MFC 110 and the pressure of the fluid within the chamber 130 are allowed to reach a steady-state.
  • the outlet valve 150 is closed, so that the pressure of the fluid begins to build up within the chamber 130.
  • the controller 160 determines the rate of rise of the pressure (i.e. the rate of change or time derivative of the pressure) during a time period, by receiving pressure measurements from the pressure sensor 170 within the chamber 130, and temperature measurements from the temperature sensor 180.
  • temperature and pressure measurements within the chamber 130 may be recorded at predetermined time intervals throughout the time period.
  • the predetermined time intervals may be about 0.00025 seconds each, and the time period may range from about 0.1 second to about 30 seconds.
  • different time intervals and time periods may be used in other embodiments of the MFV 100.
  • the outlet valve 150 is opened, to allow flow of the fluid out of the chamber 130 onto an exhaust (such as a vacuum pump, by way of example) or other type of output facility.
  • the rate of rise or time derivative of the fluid pressure (divided by the fluid temperature T), namely ⁇ (P/T)/ ⁇ t, may be calculated based on the measurements of temperature and pressure within the known volume V of the chamber 130. Based on the calculated rate of rise ⁇ (P/T)/ ⁇ t, the flow rate produced by the MFC 110 can then be determined and verified, so that the MFC 110 can be properly calibrated.
  • the flow rate Q is calculated by the controller 160 using equation (1) above.
  • a typical mass flow verification may proceed as follows:
  • the controller 160 verifies the measurement of flow rate performed by the DUT 110.
  • FIG. 2 is a schematic illustration of an exemplary embodiment of a mass flow delivery system 200 in accordance with one embodiment of the present disclosure.
  • the mass flow delivery system 200 includes a chamber 230, an inlet valve 220 that controls mass flow into the chamber 230, and a outlet valve 250 that controls mass flow out of the chamber 230.
  • the inlet valve 220 and the outlet valves 250 comprise on/off type valves, and at least the outlet valve 250 has a very fast response time, for example about 1 to 5 milliseconds.
  • the mass flow delivery system 200 also has a pressure transducer 270 for providing measurements of pressure within the chamber 230 and a temperature sensor 280 for providing measurements of temperature on or within the chamber 230.
  • the pressure transducer 270 also has a very fast response time, for example about 1 to 20 milliseconds.
  • the temperature sensor 280 is in contact with, and provides measurements of the temperature of, a wall of the chamber 230.
  • Examples of a suitable pressure transducer 270 for use with the delivery system 200 are Baratron® brand pressure transducers available from the assignee of the present disclosure, MKS Instruments of Andover, Mass. (http://www.mksinst.com). Suitable valves 220, 250 are also available from the assignee.
  • the controller 260 is programmed to control the opening and closing of the inlet valve 220 and the outlet valve 250, so as to deliver from the delivery chamber 230 into the output process facility a precise, known number of moles of gas.
  • the delivery system 200 may be a pulsed delivery system configured to deliver the gas in a sequence of delivery pulses.
  • the delivery system 200 delivers the gas in discrete pulses according to the following cycle:
  • FIG. 3 is a flow chart illustrating an exemplary embodiment of a method of mass flow delivery.
  • the controller 260 of the mass flow delivery system 200 of FIG. 2 may be configured to carry out the method 300 of FJG. 3.
  • the controller 260 is programmed to receive the desired mass flow delivery setpoint, for example through an input device, as shown at 302 of FIG. 3, close the outlet valve 250, as shown at 304 of FIG. 3, and open the inlet valve 220 to the chamber 230, as shown at 306 of FIG. 3.
  • the controller 260 is further programmed to receive measurement signals from the pressure transducer 270 and the temperature sensor 280, which measure the pressure and the temperature of the gas within the chamber 230 respectively, as shown at 308 of FIG. 3.
  • the controller 260 is further programmed to close the inlet valve 220 when pressure within the chamber 230 reaches a predetermined level, as shown at 310 of FIG. 3.
  • the predetermined level of pressure may be user defined, in which case it may be provided through the input device. Alternatively, it may be calculated by the controller 260 based on the desired mass flow delivery setpoint.
  • the controller 260 opens the outlet valve 250, to discharge a mass of gas from the delivery chamber 230 to an output processing facility, as shown at 312 of FIG. 3.
  • the predetermined waiting period may be user defined, in which case it may be provided through the input device. Alternatively, the predetermined waiting period may be determined by the controller 260 based on the equilibrium state of the gas inside the delievery chamber.
  • the controller 260 is further programmed to receive measurement signals from the pressure transducer 270 and the temperature sensor 280 in order to mornitor the amount of mass flow delivered to an output processing facility as shown at 313 of FIG, 3.
  • the outlet valve 250 may then be closed, when the mass of gas discharged equals the user defined desired mass flow setpoint, as shown at 314 of FIG. 3. Typically, the outlet valve 250 may only be opened for only a very short period (e.g., 100 to 1000 milliseconds). The controller 260 may then indicates the mass of gas that has been discharged to the output device.
  • the delivery system 200 may be a mole delivery device (MDD) configured to accurately measure and control the number of moles of gas (or other fluid) it delivers to an output processing facility, such as a semiconductor wafer processing chamber by way of example.
  • the controller 260 is configured to count the number of moles of gas that leaves the delivery chamber 230 while discharging to the processing facility.
  • the controller 260 of the gas delivery system 200 may implement model-based algorithms to measure and control the number of moles of gas that flows into the holding volume of the delivery chamber 230.
  • the algorithms implemented by the controller 260 may allow the number of moles of gas that flows into and out of the chamber 230 to be counted. In the gas delivery system 200 above, therefore, the mole number of gas leaving the delivery chamber 230 will be known when the delivery chamber 230 discharges into the processing facility.
  • the controller 260 may implement a model- based algorithm that causes the controller 260 to monitor the pressure measurements by the pressure sensor 270 and the temperature measurements by the temperature sensor 280, and to use the ideal gas law to derive the desired number of moles.
  • the controller 260 opens the inlet valve 220 so as to introduce the gas into the delivery chamber 230.
  • the gas is then charged to a target pressure.
  • the controller 260 measures the amount of the gas that goes into the holding volume of the delivery chamber 230, and closes the inlet valve 220 when a target number of moles are obtained in the holding volume.
  • the number of gas moles charged into the delivery chamber 230 during this stage is given by: V P
  • ⁇ n denotes the number of moles delivered into the delivery chamber 230
  • V c denotes the volume of the delivery chamber 230
  • R denotes the universal gas constant (having a value of 8.3144 Joules/mol/K)
  • ⁇ (P/T) is the change in gas pressure divided by gas temperature, from the beginning of the step 306 to the end of the step 310.
  • Eq. (2) shows that, by monitoring the values of P and T, as measured by the pressure sensor 270 and the temperature sensor 280 at desired points in time, the number of moles being charged into the delivery chamber 230 during any given time period can be monitored.
  • the controller 260 causes the system 200 to wait for a while for the pressure and the temperature of the gas to be stabilized. The system 200 then moves on to the delivery stage, during which the number of moles of the gas is precisely delivered to an output processing facility.
  • the controller 260 opens the outlet valve 250, which leads to the output processing facility.
  • the controller 260 measures the number of moles of the gas that leaves the delivery chamber 230 according to Eq. (2) using the measurement signals of the pressure transducer 270 and the temperature sensor 280.
  • the controller 260 closes the outlet valve 250 when the correct desired number of moles of gas has left the delivery chamber 230 and delivered to the output processing facility.
  • the controller 260 causes the system 200 to return to the initial stage, and repeat the entire delivery cycle, for the next mass flow delivery setpoint.
  • the system 200 directly measures and precisely controls to deliver a specific number of moles of the gas into the output processing facility, using the technique described above.
  • FIG. 4 is a schematic illustration of a dual-mode mass flow verification and mole delivery system 400, in accordance with one embodiment of the present disclosure.
  • the system 400 includes a chamber 430; an inlet valve 420 configured to control flow of a fluid into the chamber; and an outlet valve 450 configured to control flow of the fluid out of the chamber 430.
  • the system 400 further includes a pressure sensor 470 configured to measure the pressure within the chamber 430.
  • the system may further include a temperature sensor 480 configured to measure the temperature within the chamber 430.
  • the system 400 further includes a controller 460.
  • the controller 460 is configured, when in a first mode, to control opening and closing of the inlet valve and the outlet valve so as to verify a measurement of the flow rate of the fluid by a device 410.
  • the system 400 operates as a mass flow verifier for verifying the flow rate of the unit under test (UDT) 410.
  • the device 410 is shown in FIG. 4 as an MFC.
  • Other devices for which mass flow verification may be performed include, but are not limited to, an FRC.
  • the controller 460 is further configured, when in a second mode, to control opening and closing of the inlet and outlet valves so as to deliver a desired amount of the fluid from the chamber 430 into an output processing facility, for example a semiconductor wafer processing chamber.
  • an output processing facility for example a semiconductor wafer processing chamber.
  • the controller 460 may be responsive to input from a user, for selecting between the first mode and the second mode.
  • the controller 460 may be configured to receive an input signal (for example, directly from a user, or indirectly from a computer system at the output processing facility) indicative of a select/on between the first and second modes, and to operate at either the first mode or the and second mode, in response to the received input signal.
  • the system 400 may include an input device (not shown) that transmits the input signal indicative of the selection between the first and second modes, and the controller 460 may be configured to receive the input signal through the input device.
  • the controller 460 may be configured, when in the first mode (i.e. in the mass flow verification mode), to implement the ROR technique for mass flow verification.
  • the controller 460 may be configured to measure a rate of rise in the pressure of the fluid within the chamber during a time period after a closing of the outlet valve, and to calculate the flow rate of the fluid from the device using the measured rate of rise, as described in conjunction with FIG. 1 above.
  • the controller 460 may be configured, when in the second mode (i.e. the mass flow delivery mode), to measure a mass of the fluid that flows into the chamber 430 during a time period, and then to deliver a desired mass of the fluid into an output processing facility by controlling opening and closing of the inlet valve 420 and the outlet valve 450.
  • the second mode i.e. the mass flow delivery mode
  • the system may be configured to operate as a MDD (mole delivery device), when the controller 460 is in the second mode.
  • the desired mass of the fluid may be desired number of moles of the fluid.
  • the controller may be configured, when in the second mode, to measure a number of moles of the fluid that flows into the chamber during the charge stage and then to control a number of moles of the fluid that delivers into the output processing facility during the delivery stage by monitoring pressure measurements of the pressure transducer 470 and temperature measurements of the temperature sensor 480 and controlling opening and closing of the inlet valve 420 and the outlet valve 450.
  • the number of moles of the gas that charges into the chamber and the number of moles of the gas that deliveres into the processing facility may be calculated using Eq. (2) above.
  • FIG. 5 is a flow chart illustrating an exemplary embodiment of a method 500 of performing mass flow verification and mass flow delivery, in accordance with one embodiment of the present disclosure.
  • the method 500 may include receiving an input signal indicative of a selection between a first mode and a second mode of operation of a system, as shown at 502 of FIG. 5.
  • the system 400 operates in a mass flow verification mode to verify a measurement of the flow rate of the fluid by a device.
  • the method 500 may include an act 520 of measuring a rate of rise in the pressure of the fluid within the vessel during a time period, and an act 522 of using the measure rate of rise of the pressure to calculate the flow rate of the fluid.
  • the method 500 may further include an act 524 of comparing the computed flow rate with a flow set point of the DUT to verify the flow rate.
  • the system 400 When the input signal indicates selection of the second mode, as shown at 506 of FIG. 5, the system 400 operates in a mass flow delivery mode, to deliver a desired amount of the fluid from a chamber 430 in the system 400 into an output processing facility, such as a processing chamber.
  • the method 500 may include an act 508 of opening the inlet valve 420 in the system 400 to allow the fluid to flow into the chamber 430, and an act 510 of measuring an amount of the fluid that flows into the chamber 430 through the inlet valve 420.
  • the method 500 may further include the act 512 of closing the inlet valve 420 when a desired amount of the fluid has entered the chamber, the act 514 of opening the outlet valve 450 to discharge the mass of fluid from the chamber 430, and closing the outlet valve 450 when the mass of gas discharged equals the desired mass set point of the fluid.
  • the controller may consist of, or include, one or more processing systems. These processing systems may be selectively configured and/or activated by a computer program stored therein.
  • Such a computer program may be stored in any computer readable storage medium, including but not limited to, any type of disk including floppy disks, optical disks, CD-ROMs, and magnetic- optical disks, read-only memories (ROMs), random access memories (RAMs), erasable programmable read-only memory (EPROMs), electrically erasable programmable read-only memory (EEPROMs), magnetic or optical cards, or any type of media suitable for storing electronic instructions.
  • any computer readable storage medium including but not limited to, any type of disk including floppy disks, optical disks, CD-ROMs, and magnetic- optical disks, read-only memories (ROMs), random access memories (RAMs), erasable programmable read-only memory (EPROMs), electrically erasable programmable read-only memory (EEPROMs), magnetic or optical cards, or any type of media suitable for storing electronic instructions.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
  • Measuring Volume Flow (AREA)
PCT/US2009/064948 2008-11-18 2009-11-18 Dual-mode mass flow verification and mass flow delivery system and method WO2010059696A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GB1107926.6A GB2477247B (en) 2008-11-18 2009-11-18 Dual-mode mass flow verification and mass flow delivery system and method
KR1020117013859A KR101316075B1 (ko) 2008-11-18 2009-11-18 유체의 질량 유량 전달 및 유체의 질량 유량 검증용 시스템, 및 그 실행 방법
CN200980154214.1A CN102301208B (zh) 2008-11-18 2009-11-18 双模式质量流检验以及质量流递送系统和方法
DE112009003602.3T DE112009003602B4 (de) 2008-11-18 2009-11-18 Dualmodus-Massenflussverifizierungs- und Massenflusslieferungsvorrichtung und entsprechendes Verfahren
JP2011536615A JP5688026B2 (ja) 2008-11-18 2009-11-18 二重モードマスフロー確証及びマスフロー送給のシステム及び方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/273,234 US7891228B2 (en) 2008-11-18 2008-11-18 Dual-mode mass flow verification and mass flow delivery system and method
US12/273,234 2008-11-18

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JP (1) JP5688026B2 (de)
KR (1) KR101316075B1 (de)
CN (1) CN102301208B (de)
DE (1) DE112009003602B4 (de)
GB (1) GB2477247B (de)
TW (1) TWI472721B (de)
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Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2455728A (en) * 2007-12-18 2009-06-24 Weston Aerospace Ltd Air temperature sensing on aircraft
JP5346628B2 (ja) * 2009-03-11 2013-11-20 株式会社堀場エステック マスフローコントローラの検定システム、検定方法、検定用プログラム
JP5538119B2 (ja) * 2010-07-30 2014-07-02 株式会社フジキン ガス供給装置用流量制御器の校正方法及び流量計測方法
US8997686B2 (en) 2010-09-29 2015-04-07 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US9348339B2 (en) 2010-09-29 2016-05-24 Mks Instruments, Inc. Method and apparatus for multiple-channel pulse gas delivery system
US10126760B2 (en) 2011-02-25 2018-11-13 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US10353408B2 (en) * 2011-02-25 2019-07-16 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US10031531B2 (en) * 2011-02-25 2018-07-24 Mks Instruments, Inc. System for and method of multiple channel fast pulse gas delivery
US9188989B1 (en) 2011-08-20 2015-11-17 Daniel T. Mudd Flow node to deliver process gas using a remote pressure measurement device
US9958302B2 (en) 2011-08-20 2018-05-01 Reno Technologies, Inc. Flow control system, method, and apparatus
US9557744B2 (en) 2012-01-20 2017-01-31 Mks Instruments, Inc. System for and method of monitoring flow through mass flow controllers in real time
US9471066B2 (en) 2012-01-20 2016-10-18 Mks Instruments, Inc. System for and method of providing pressure insensitive self verifying mass flow controller
US9846074B2 (en) 2012-01-20 2017-12-19 Mks Instruments, Inc. System for and method of monitoring flow through mass flow controllers in real time
US10031005B2 (en) 2012-09-25 2018-07-24 Mks Instruments, Inc. Method and apparatus for self verification of pressure-based mass flow controllers
US9778083B2 (en) 2013-05-16 2017-10-03 Lam Research Corporation Metrology method for transient gas flow
JP6336719B2 (ja) * 2013-07-16 2018-06-06 株式会社ディスコ プラズマエッチング装置
JP5797246B2 (ja) * 2013-10-28 2015-10-21 株式会社フジキン 流量計及びそれを備えた流量制御装置
SG11201607383UA (en) * 2014-03-11 2016-10-28 Mks Instr Inc System for and method of monitoring flow through mass flow controllers in real time
DE102015011424A1 (de) * 2015-09-01 2017-03-02 Fresenius Medical Care Deutschland Gmbh Verfahren zur Kalibrierung und / oder Überwachung eines Flusssensors
US10303189B2 (en) 2016-06-30 2019-05-28 Reno Technologies, Inc. Flow control system, method, and apparatus
US10838437B2 (en) 2018-02-22 2020-11-17 Ichor Systems, Inc. Apparatus for splitting flow of process gas and method of operating same
US10679880B2 (en) 2016-09-27 2020-06-09 Ichor Systems, Inc. Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
US11144075B2 (en) 2016-06-30 2021-10-12 Ichor Systems, Inc. Flow control system, method, and apparatus
JP6767232B2 (ja) * 2016-10-14 2020-10-14 東京エレクトロン株式会社 基板処理装置の流量制御器によって出力されるガスの出力流量を求める方法
US10697848B1 (en) * 2016-12-12 2020-06-30 Kirk A. Dobbs Smart building water supply management system with leak detection and flood prevention
US10031004B2 (en) * 2016-12-15 2018-07-24 Mks Instruments, Inc. Methods and apparatus for wide range mass flow verification
US10663337B2 (en) 2016-12-30 2020-05-26 Ichor Systems, Inc. Apparatus for controlling flow and method of calibrating same
US10224224B2 (en) 2017-03-10 2019-03-05 Micromaterials, LLC High pressure wafer processing systems and related methods
US10847360B2 (en) 2017-05-25 2020-11-24 Applied Materials, Inc. High pressure treatment of silicon nitride film
US10622214B2 (en) 2017-05-25 2020-04-14 Applied Materials, Inc. Tungsten defluorination by high pressure treatment
KR102574914B1 (ko) 2017-06-02 2023-09-04 어플라이드 머티어리얼스, 인코포레이티드 보론 카바이드 하드마스크의 건식 스트리핑
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
WO2019036157A1 (en) 2017-08-18 2019-02-21 Applied Materials, Inc. HIGH PRESSURE AND HIGH TEMPERATURE RECOVERY CHAMBER
KR102659317B1 (ko) 2017-09-12 2024-04-18 어플라이드 머티어리얼스, 인코포레이티드 보호 배리어 층을 사용하여 반도체 구조들을 제조하기 위한 장치 및 방법들
US10643867B2 (en) 2017-11-03 2020-05-05 Applied Materials, Inc. Annealing system and method
SG11202003355QA (en) 2017-11-11 2020-05-28 Micromaterials Llc Gas delivery system for high pressure processing chamber
US10854483B2 (en) 2017-11-16 2020-12-01 Applied Materials, Inc. High pressure steam anneal processing apparatus
WO2019099255A2 (en) 2017-11-17 2019-05-23 Applied Materials, Inc. Condenser system for high pressure processing system
JP7299898B2 (ja) 2018-01-24 2023-06-28 アプライド マテリアルズ インコーポレイテッド 高圧アニールを用いたシーム修復
JP7239598B2 (ja) 2018-03-09 2023-03-14 アプライド マテリアルズ インコーポレイテッド 金属含有材料の高圧アニーリングプロセス
US10591934B2 (en) * 2018-03-09 2020-03-17 Lam Research Corporation Mass flow controller for substrate processing
US10714331B2 (en) 2018-04-04 2020-07-14 Applied Materials, Inc. Method to fabricate thermally stable low K-FinFET spacer
US10950429B2 (en) 2018-05-08 2021-03-16 Applied Materials, Inc. Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom
US10566188B2 (en) 2018-05-17 2020-02-18 Applied Materials, Inc. Method to improve film stability
US11327510B2 (en) * 2018-05-23 2022-05-10 Hitachi Metals, Ltd. Multi-chamber rate-of-change system for gas flow verification
US10704141B2 (en) 2018-06-01 2020-07-07 Applied Materials, Inc. In-situ CVD and ALD coating of chamber to control metal contamination
US10748783B2 (en) 2018-07-25 2020-08-18 Applied Materials, Inc. Gas delivery module
US10675581B2 (en) 2018-08-06 2020-06-09 Applied Materials, Inc. Gas abatement apparatus
US10760944B2 (en) * 2018-08-07 2020-09-01 Lam Research Corporation Hybrid flow metrology for improved chamber matching
US10725484B2 (en) * 2018-09-07 2020-07-28 Mks Instruments, Inc. Method and apparatus for pulse gas delivery using an external pressure trigger
CN112673243A (zh) * 2018-09-14 2021-04-16 芬兰国家技术研究中心股份公司 压力传感器
CN112640065A (zh) 2018-10-30 2021-04-09 应用材料公司 用于蚀刻用于半导体应用的结构的方法
CN112996950B (zh) 2018-11-16 2024-04-05 应用材料公司 使用增强扩散工艺的膜沉积
WO2020117462A1 (en) 2018-12-07 2020-06-11 Applied Materials, Inc. Semiconductor processing system
US11404290B2 (en) * 2019-04-05 2022-08-02 Mks Instruments, Inc. Method and apparatus for pulse gas delivery
US11901222B2 (en) 2020-02-17 2024-02-13 Applied Materials, Inc. Multi-step process for flowable gap-fill film
JP7122335B2 (ja) * 2020-03-30 2022-08-19 Ckd株式会社 パルスショット式流量調整装置、パルスショット式流量調整方法、及び、プログラム
KR102437772B1 (ko) * 2020-09-07 2022-08-30 한국알프스 주식회사 압력센서를 이용한 유량 측정 장치 및 방법
JP2024512898A (ja) 2021-03-03 2024-03-21 アイコール・システムズ・インク マニホールドアセンブリを備える流体流れ制御システム
CN113203443A (zh) * 2021-04-27 2021-08-03 西安热工研究院有限公司 一种压差型在线微量气体流量计及自动检测方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5684245A (en) * 1995-11-17 1997-11-04 Mks Instruments, Inc. Apparatus for mass flow measurement of a gas
US20040261492A1 (en) * 2003-06-25 2004-12-30 Kaveh Zarkar System and method for in-situ flow verification and calibration
US20060005882A1 (en) * 2004-07-09 2006-01-12 Tison Stuart A Method and system for flow measurement and validation of a mass flow controller
WO2006017116A2 (en) * 2004-07-09 2006-02-16 Celerity, Inc. Method and system for flow measurement and validation of a mass flow controller
US20060130744A1 (en) * 2004-12-17 2006-06-22 Clark William R Pulsed mass flow delivery system and method
US20060283254A1 (en) * 2005-03-25 2006-12-21 Mks Instruments, Inc. Critical flow based mass flow verifier

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475949A (en) * 1967-07-20 1969-11-04 Andrew Truhan Gas meter calibration apparatus
US6363958B1 (en) * 1999-05-10 2002-04-02 Parker-Hannifin Corporation Flow control of process gas in semiconductor manufacturing
EP1631801B1 (de) * 2003-06-11 2019-02-27 Micro Motion, Inc. Vorrichtung zur kontinuierlichen kalibrierung eines gasmassendurchflussmessers
US7628860B2 (en) * 2004-04-12 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
JP4648098B2 (ja) * 2005-06-06 2011-03-09 シーケーディ株式会社 流量制御機器絶対流量検定システム
JP4856905B2 (ja) * 2005-06-27 2012-01-18 国立大学法人東北大学 流量レンジ可変型流量制御装置
JP4788920B2 (ja) * 2006-03-20 2011-10-05 日立金属株式会社 質量流量制御装置、その検定方法及び半導体製造装置
JP2011510404A (ja) * 2008-01-18 2011-03-31 ピヴォタル システムズ コーポレーション ガスの流量を決定する方法、ガス・フロー・コントローラの動作を決定する方法、ガスフローコントロールシステムの一部の容量を決定する方法、及びガス搬送システム

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5684245A (en) * 1995-11-17 1997-11-04 Mks Instruments, Inc. Apparatus for mass flow measurement of a gas
US20040261492A1 (en) * 2003-06-25 2004-12-30 Kaveh Zarkar System and method for in-situ flow verification and calibration
US20060005882A1 (en) * 2004-07-09 2006-01-12 Tison Stuart A Method and system for flow measurement and validation of a mass flow controller
WO2006017116A2 (en) * 2004-07-09 2006-02-16 Celerity, Inc. Method and system for flow measurement and validation of a mass flow controller
US20060130744A1 (en) * 2004-12-17 2006-06-22 Clark William R Pulsed mass flow delivery system and method
US20060283254A1 (en) * 2005-03-25 2006-12-21 Mks Instruments, Inc. Critical flow based mass flow verifier

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