WO2010010739A1 - 薄膜半導体基板およびその製造装置 - Google Patents
薄膜半導体基板およびその製造装置 Download PDFInfo
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- WO2010010739A1 WO2010010739A1 PCT/JP2009/056283 JP2009056283W WO2010010739A1 WO 2010010739 A1 WO2010010739 A1 WO 2010010739A1 JP 2009056283 W JP2009056283 W JP 2009056283W WO 2010010739 A1 WO2010010739 A1 WO 2010010739A1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133305—Flexible substrates, e.g. plastics, organic film
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1218—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
Definitions
- the present invention relates to a thin film semiconductor substrate in which a single plate-like insulating substrate having a thin film semiconductor array is continuously bonded on a long plastic film, and an apparatus for manufacturing the same.
- Such flat panel display is generally thin, lightweight, has low power consumption, and is easy to display in color. Widely used as a display for information terminals (Patent Document 1). Such flat panel displays include not only liquid crystal display panels but also EL display panels using TFTs as pixel switching elements. Such flat panel displays include a combination of a thin film semiconductor substrate and a plastic substrate. As a thin film semiconductor substrate, a thin film semiconductor technology is used, and a TFT element (TFT: There is a technique in which a thin film semiconductor array such as a thin film transistor, a contact sensor, or a photoelectric conversion element is formed on an insulating substrate (Patent Document 2).
- a thin film semiconductor array for example, in order to produce an active matrix driving liquid crystal display element, it is necessary to form TFT elements, MIM elements (Metal Insulator Metal), etc. on a substrate, and a glass substrate is mainly used as the substrate. It has been. However, since it is necessary to pass a high-temperature process in forming a TFT element on a plastic substrate, there is a problem of thermal expansion and contraction of the substrate, which makes mass production difficult. Therefore, a plastic substrate is used as a substrate on one side, There is one in which a TFT element-formed glass substrate is used on the other side and both are bonded together with a sealing material (Patent Document 3). JP 2001-296817 A JP-A-2005-51208 JP2007-17655
- the thin film semiconductor array is formed, for example, on a single-plate insulating substrate having a predetermined size, and the single-plate insulating substrate having the thin film semiconductor array is combined so as to face the plastic substrate.
- Manufactures flat panel displays In this case, for example, a single plate-like insulating substrate requires a box or cassette case for storing the substrate in order to prevent breakage during storage and transportation. Accordingly, the time, man-hours, and storage space for loading and unloading the substrate into and from these containers are required, which is one of the factors that increase the cost.
- the present invention has been made in view of such circumstances, and an object of the present invention is to provide a thin-film semiconductor substrate and a manufacturing apparatus thereof that enable mass production of flat panel displays and are easy to store and transport and are inexpensive. Yes.
- the present invention is configured as follows.
- the invention according to claim 1 is a thin film semiconductor substrate for combining with a plastic substrate to form a flat panel display, A thin-film semiconductor substrate, wherein a single-plate insulating substrate having a thin-film semiconductor array is continuously bonded onto a long plastic film.
- the invention according to claim 2 is characterized in that the insulating substrate is configured by laminating a long protective film so as to protect the long protective film with the long plastic film.
- a thin film semiconductor substrate is configured by laminating a long protective film so as to protect the long protective film with the long plastic film.
- the invention according to claim 3 is the thin film semiconductor substrate according to claim 1 or 2, wherein the long plastic film is a plastic film made of the same material as the plastic substrate.
- the invention according to claim 4 is the thin film semiconductor substrate according to any one of claims 1 to 3, wherein the thickness of the thin film semiconductor array is 0.1 mm or less.
- the invention according to claim 5 is the thin film semiconductor substrate according to any one of claims 1 to 4, wherein the plastic substrate is a color filter.
- the invention according to claim 6 is an apparatus for manufacturing a thin film semiconductor substrate for use in combination with a plastic substrate to form a flat panel display, A laminating portion for continuously laminating a single plate-like insulating substrate on which a protective film for protecting the thin film semiconductor array is laminated on a long plastic film; A peeling portion for peeling off the protective film by heating or ultraviolet irradiation; A laminating portion for laminating a long protective film on the long plastic film to protect the thin film semiconductor array; A winding unit for winding the long plastic film laminated with the long protective film into a roll; and It is a manufacturing apparatus of the thin film semiconductor substrate characterized by having.
- the invention according to claim 7 is the thin-film semiconductor substrate manufacturing apparatus according to claim 6, wherein the long plastic film is a plastic film made of the same material as the plastic substrate.
- the invention according to claim 8 is the apparatus for manufacturing a thin film semiconductor substrate according to claim 6 or 7, wherein the thickness of the thin film semiconductor array is 0.1 mm or less.
- the present invention has the following effects.
- a roll-shaped thin film semiconductor substrate having a thin film semiconductor array the roll-shaped thin film semiconductor substrate is opposed to a plastic substrate, and is combined with a quick and accurate position to form a flat panel display. And mass production of flat panel displays is possible. Moreover, by using a roll-shaped thin film semiconductor substrate having a thin film semiconductor array, no special storage container or storage space is required, and storage and transportation are easy.
- the thin film semiconductor array has a thickness of 0.1 mm or less and is a thin thin film semiconductor substrate.
- the plastic substrate is a color filter, and a flat panel display capable of color display can be obtained.
- a semiconductor substrate can be manufactured at low cost.
- the thickness of the thin film semiconductor array is 0.1 mm or less, and a thin thin film semiconductor substrate can be obtained.
- the embodiment of the present invention shows the most preferable mode of the present invention, and the present invention is not limited to this.
- FIG. 1 is a schematic configuration diagram of a thin film semiconductor substrate.
- the thin film semiconductor substrate of this embodiment is for combining with a plastic substrate to form a flat panel display.
- a single plate-like insulating substrate 4 having a thin film semiconductor array 3 is a long plastic film 2. It is continuously laminated on top.
- the insulating substrate 4 is configured by laminating a long protective film 6 so as to protect it with a long plastic film 2.
- FIG. 2 is a diagram illustrating the manufacture of a thin film semiconductor substrate.
- a single plate-like insulating substrate 4 having a thin film semiconductor array 3 is used as shown in FIG.
- the thin film semiconductor array 3 is protected by a protective film 5.
- the single plate-like insulating substrate 4 is continuously bonded onto the long plastic film 2 as shown in FIG.
- the protective film 5 is heated or irradiated with ultraviolet rays, and the protective film 5 is peeled off from the single-plate insulating substrate 4.
- the insulating substrate 4 is laminated so that the long protective film 41 is protected by the long plastic film 2 as shown in FIG.
- a glass substrate that has been thinned by etching is used as the single plate-like insulating substrate 4.
- a glass substrate that has been thinned by etching is used as the single plate-like insulating substrate 4.
- a general low-temperature polysilicon technique is used on a non-alkali glass substrate having a thickness of 0.7 mm.
- the thin film semiconductor array 3 is formed, and the glass substrate is thinly etched to a thickness of less than 0.1 mm by a method as described in Patent Document 4, and used.
- a TFT element, a contact sensor, a photoelectric conversion element, or the like is used.
- JP, 2008-13389, A Long plastic film 2 uses a flexible resin substrate.
- the elongate protective film 6 and the protective film 5 are comprised with a flexible resin base material and an adhesive layer.
- a flexible resin base material for example, a polyester film, a polypropylene film, a polyethylene film, a polycarbonate film, a polystyrene film, a triacetyl cellulose film, and the like can be used. Among these, a smooth surface can be easily obtained and the productivity is excellent. An axially stretched polyester film can be preferably used.
- the thickness of the flexible resin substrate is preferably 30 to 300 ⁇ m. If the thickness is less than 30 ⁇ m, the film strength may be insufficient or wrinkles may occur, and if the thickness is greater than 300 ⁇ m, the film itself is expensive. However, the present invention is not limited to this.
- the flexible resin base material used for the long plastic film 2 can have transparency, and the total light transmittance is 80% or more, more preferably 90% or more, By having transparency, the positioning mark of the single-plate-like insulating substrate 4 having the thin film semiconductor array 3 can be read and positioned and bonded.
- a low Tg monomer such as butyl acrylate, ethyl acrylate or 2-ethylhexyl acrylate is used as a main monomer, and acrylic acid, methacrylic acid, hydroxyethyl methacrylate, hydroxyethyl acrylate, acrylamide
- the acrylic copolymer obtained by copolymerization with a functional group monomer such as acrylonitrile can be obtained by crosslinking with an isocyanate, melamine or epoxy crosslinking agent.
- FIG. 3 is a diagram showing a schematic configuration of a flat panel display.
- the flat panel display of this embodiment uses the thin film semiconductor substrate shown in FIG.
- a single plate-like insulating substrate 4 is continuously bonded onto the long plastic film 2, and a roll-shaped thin film semiconductor substrate having the thin film semiconductor array 3 can be manufactured at low cost.
- the long protective film 6 is peeled off as shown in FIG. 3A, and the thin film semiconductor substrate 4 is opposed to the plastic substrate 7 as shown in FIG. Combined to form a flat panel display.
- the long plastic film 2 of the thin film semiconductor substrate 4 is a plastic film made of the same material as the plastic substrate 7. Further, since a single plate-like insulating substrate 4 on which the thin film semiconductor array 3 is formed in advance is used, it is possible to use a long plastic film 2 whose heat resistance is lower than the temperature of the manufacturing process of the semiconductor array 3. . Further, the plastic substrate 7 is a color filter, and a flat panel display capable of color display can be obtained. In this way, a roll-shaped thin film semiconductor substrate faces the plastic substrate 4 and can be combined quickly and accurately to form a flat panel display.
- FIG. 4 is a schematic configuration diagram of an apparatus for manufacturing a thin film semiconductor substrate.
- the manufacturing apparatus 1 for a thin film semiconductor substrate according to this embodiment is an apparatus for manufacturing a thin film semiconductor substrate for use in combination with a plastic substrate to form a flat panel display.
- the thin-film semiconductor substrate manufacturing apparatus 1 includes an unwinding unit 10, a bonding unit 20, a peeling unit 30, a laminating unit 40, and a winding unit 50.
- the unwinding unit 11 is provided with an unwinding drum 11 around which the long plastic film 2 is wound, and the long plastic film 2 is sent out from the unwinding drum 11.
- the long plastic film 2 is provided with an alignment mark 60 for bonding.
- an image recognition device 21, a bonding roll 22, and a bonding table 23 are arranged.
- the image recognition device 21 for example, a CCD camera or the like is used.
- the single plate-like insulating substrate 4 having the thin film semiconductor array 3 is supplied by driving the supply means 24, and the single plate-like insulating substrate 4 is provided with an alignment mark 61 for bonding.
- the image recognition device 21 is disposed at a position where the alignment mark 60 of the long plastic film 2 is detected, and the alignment marks 60 and 61 of the single-plate insulating substrate 3 and the long plastic film 2 are detected. , And according to the information of the read alignment marks 60 and 61, the supply means 24 adjusts the alignment mark 60 of the long plastic film 2 and the alignment mark 60 of the single-plate insulating substrate 3. The movement is controlled, and the long plastic film 2 and the single-plate insulating substrate 3 are aligned.
- the laminating roll 22 presses the long plastic film 2 against the single plate-like insulating substrate 4 and a single plate-like insulating substrate on which the protective film 5 for protecting the thin film semiconductor array 3 is bonded. 4 is continuously bonded onto the long plastic film 2.
- the peeling means 31 is arranged at a position facing the protective film 5.
- the protective film 5 is heated or irradiated with ultraviolet rays by the peeling means 31 to peel the protective film 5 from the single-plate insulating substrate 4.
- the unwinding drum 41 around which the long protective film 6 is wound is disposed in the laminating section 40, and the long protective film 6 is sent out from the unwinding drum 41.
- the long protective film 6 is laminated on the long plastic film 2 using the laminating roll 42 to protect the thin film semiconductor array 3.
- a winding drum 51 is disposed in the winding unit 50, and the long plastic film 2 in which the long protective film 41 is laminated by the winding drum 51 is wound into a roll.
- a plurality of single-plate insulating substrates 4 having the thin film semiconductor array 3 are continuously bonded onto the long plastic film 2 to form the thin film semiconductor substrate.
- a roll-shaped thin film semiconductor substrate having the thin film semiconductor array 3 can be manufactured at low cost, and storage and transportation are facilitated.
- the single-plate insulating substrate 4 on which the thin film semiconductor array 3 is formed in advance is used, it is possible to use a long plastic film 2 whose heat resistance is lower than the manufacturing process temperature of the semiconductor array 3. By continuously laminating the single plate-like insulating substrate 4 to the long plastic film 2, a thin film semiconductor substrate that can be rolled up can be obtained.
- the present invention can be applied to a thin-film semiconductor substrate in which a single-plate-like insulating substrate having a thin-film semiconductor array is continuously bonded onto a long plastic film and a manufacturing apparatus therefor. Mass production is possible, no special storage container or storage space is required, and storage and transportation are easy and inexpensive.
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Abstract
Description
このフラットパネルディスプレイには液晶ディスプレイパネルだけでなく、TFTを画素スイッチング素子として用いたELディスプレイパネルなどがある。このようなフラットパネルディスプレイとして、プラスチック基板と対向して薄膜半導体基板を組み合わせたものがある。薄膜半導体基板としては、薄膜半導体技術を用い、TFT素子(TFT:
Thin Film Transistor)、密着センサ、光電変換素子等の薄膜半導体アレイを絶縁基板上に形成するものがある(特許文献2)。
薄膜半導体アレイを有する単板状の絶縁基板が長尺状のプラスチックフィルム上に連続して貼合されてなることを特徴とする薄膜半導体基板である。
薄膜半導体アレイを保護するための保護フィルムが貼合された単板状の絶縁基板を長尺状のプラスチックフィルム上に連続して貼合する貼合部と、
前記保護フィルムを加熱または紫外線照射により剥がす剥離部と、
長尺状の保護フィルムを前記長尺状のプラスチックフィルムにラミネートして前記薄膜半導体アレイを保護するラミネート部と、
前記長尺状の保護フィルムをラミネートした前記長尺状のプラスチックフィルムをロール状に巻き取る巻取り部と、
を有することを特徴とする薄膜半導体基板の製造装置である。
図1は薄膜半導体基板の概略構成図である。この実施の形態の薄膜半導体基板は、プラスチック基板と対向して組み合わせてフラットパネルディスプレイとするためのものであり、薄膜半導体アレイ3を有する単板状の絶縁基板4が長尺状のプラスチックフィルム2上に連続して貼合されてなる。この絶縁基板4は、長尺状の保護フィルム6を長尺状のプラスチックフィルム2で保護するようにラミネートして構成される。
図4は薄膜半導体基板の製造装置の概略構成図である。この実施の形態の薄膜半導体基板の製造装置1は、プラスチック基板と対向して組み合わせてフラットパネルディスプレイとするための薄膜半導体基板を製造する装置である。この薄膜半導体基板の製造装置1は、巻出し部10と、貼合部20と、剥離部30と、ラミネート部40と、巻取り部50とを備えている。
2 長尺状のプラスチックフィルム
3 薄膜半導体アレイ
4 単板状の絶縁基板
5 保護フィルム
6 長尺状の保護フィルム
7 フラットパネルディスプレイのプラスチック基板
10 巻出し部
20 貼合部
30 剥離部
40 ラミネート部
50 巻取り部
Claims (8)
- プラスチック基板と対向して組み合わせてフラットパネルディスプレイとするための薄膜半導体基板であって、
薄膜半導体アレイを有する単板状の絶縁基板が長尺状のプラスチックフィルム上に連続して貼合されてなることを特徴とする薄膜半導体基板。 - 前記絶縁基板が、長尺状の保護フィルムを前記長尺状のプラスチックフィルムで保護するようにラミネートして構成されることを特徴とする請求項1に記載の薄膜半導体基板。
- 前記長尺状のプラスチックフィルムは、前記プラスチック基板と同じ素材のプラスチックフィルムであることを特徴とする請求項1または請求項2に記載の薄膜半導体基板。
- 前記薄膜半導体アレイの厚さが、0.1mm以下であることを特徴とする請求項1乃至請求項3のいずれか1項に記載の薄膜半導体基板。
- 前記プラスチック基板が、カラーフィルタであることを特徴とする請求項1乃至請求項4のいずれか1項に記載の薄膜半導体基板。
- プラスチック基板と対向して組み合わせてフラットパネルディスプレイとするための薄膜半導体基板を製造する装置であって、
薄膜半導体アレイを保護するための保護フィルムが貼合された単板状の絶縁基板を長尺状のプラスチックフィルム上に連続して貼合する貼合部と、
前記保護フィルムを加熱または紫外線照射により剥がす剥離部と、
長尺状の保護フィルムを前記長尺状のプラスチックフィルムにラミネートして前記薄膜半導体アレイを保護するラミネート部と、
前記長尺状の保護フィルムをラミネートした前記長尺状のプラスチックフィルムをロール状に巻き取る巻取り部と、
を有することを特徴とする薄膜半導体基板の製造装置。 - 前記長尺状のプラスチックフィルムは、前記プラスチック基板と同じ素材のプラスチックフィルムであることを特徴とする請求項6に記載の薄膜半導体基板の製造装置。
- 前記薄膜半導体アレイの厚さが、0.1mm以下であることを特徴とする請求項6または請求項7に記載の薄膜半導体基板の製造装置。
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CN2009801288403A CN102224535A (zh) | 2008-07-24 | 2009-03-27 | 薄膜半导体基板及其制造装置 |
US12/737,543 US20120025213A1 (en) | 2008-07-24 | 2009-03-27 | Thin film semiconductor substrate and apparatus for manufacturing the same |
KR1020117001523A KR101301405B1 (ko) | 2008-07-24 | 2009-03-27 | 박막 반도체 기판 및 그 제조 장치 |
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JP2008191137A JP2010026457A (ja) | 2008-07-24 | 2008-07-24 | 薄膜半導体基板およびその製造装置 |
JP2008-191137 | 2008-07-24 |
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PCT/JP2009/056283 WO2010010739A1 (ja) | 2008-07-24 | 2009-03-27 | 薄膜半導体基板およびその製造装置 |
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US (1) | US20120025213A1 (ja) |
JP (1) | JP2010026457A (ja) |
KR (1) | KR101301405B1 (ja) |
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WO (1) | WO2010010739A1 (ja) |
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JPH05313151A (ja) * | 1992-05-08 | 1993-11-26 | Idemitsu Kosan Co Ltd | 液晶素子の製造方法 |
JPH11167091A (ja) * | 1997-12-03 | 1999-06-22 | Seiko Epson Corp | 液晶表示装置の製造方法 |
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JP3606013B2 (ja) * | 1997-08-01 | 2005-01-05 | セイコーエプソン株式会社 | 液晶表示装置、電子機器及び液晶表示装置の製造方法 |
JPH11343149A (ja) * | 1998-06-01 | 1999-12-14 | Matsushita Electric Ind Co Ltd | 基板の貼り合わせ装置の付加装置 |
KR100527088B1 (ko) * | 2001-12-31 | 2005-11-09 | 비오이 하이디스 테크놀로지 주식회사 | 플라스틱 기판을 이용한 액정표시장치 |
JP4526771B2 (ja) * | 2003-03-14 | 2010-08-18 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
KR101002936B1 (ko) * | 2003-12-17 | 2010-12-21 | 삼성전자주식회사 | 캐리어 기판, 이를 이용한 플라스틱 기판의 적층 방법 및유연한 디스플레이 장치의 제조 방법 |
JP2007011025A (ja) * | 2005-06-30 | 2007-01-18 | Sharp Corp | 液晶表示素子の製造方法および製造装置 |
JP2007033537A (ja) * | 2005-07-22 | 2007-02-08 | Sharp Corp | 可撓性表示素子の製造装置およびその素子の製造方法 |
KR20070041197A (ko) * | 2005-10-14 | 2007-04-18 | 엘지전자 주식회사 | Eva 진공증착법을 이용한 전자종이 표시소자의 제조방법및 eva 접착제를 포함하는 전자종이 표시소자 |
-
2008
- 2008-07-24 JP JP2008191137A patent/JP2010026457A/ja active Pending
-
2009
- 2009-03-27 WO PCT/JP2009/056283 patent/WO2010010739A1/ja active Application Filing
- 2009-03-27 US US12/737,543 patent/US20120025213A1/en not_active Abandoned
- 2009-03-27 CN CN2009801288403A patent/CN102224535A/zh active Pending
- 2009-03-27 KR KR1020117001523A patent/KR101301405B1/ko not_active IP Right Cessation
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JPH05313151A (ja) * | 1992-05-08 | 1993-11-26 | Idemitsu Kosan Co Ltd | 液晶素子の製造方法 |
JPH11167091A (ja) * | 1997-12-03 | 1999-06-22 | Seiko Epson Corp | 液晶表示装置の製造方法 |
JP2001215891A (ja) * | 2000-02-01 | 2001-08-10 | Nec Corp | フラットディスプレイパネルの製造方法 |
JP2002277847A (ja) * | 2001-03-19 | 2002-09-25 | Casio Comput Co Ltd | 液晶素子の製造方法 |
JP2006049859A (ja) * | 2004-06-29 | 2006-02-16 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
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US20120025213A1 (en) | 2012-02-02 |
KR101301405B1 (ko) | 2013-08-28 |
CN102224535A (zh) | 2011-10-19 |
JP2010026457A (ja) | 2010-02-04 |
KR20110047186A (ko) | 2011-05-06 |
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