WO2010010677A1 - プラズマディスプレイパネル - Google Patents
プラズマディスプレイパネル Download PDFInfo
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- WO2010010677A1 WO2010010677A1 PCT/JP2009/003368 JP2009003368W WO2010010677A1 WO 2010010677 A1 WO2010010677 A1 WO 2010010677A1 JP 2009003368 W JP2009003368 W JP 2009003368W WO 2010010677 A1 WO2010010677 A1 WO 2010010677A1
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- discharge
- electron emission
- protective film
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/40—Layers for protecting or enhancing the electron emission, e.g. MgO layers
Definitions
- the present invention relates to a plasma display panel (hereinafter referred to as “PDP”), and more particularly to a PDP characterized by a protective film covering a dielectric layer on a front substrate.
- PDP plasma display panel
- Plasma display panels are classified into direct current (DC) type and alternating current (AC) type.
- the AC type is superior to the DC type in terms of luminance, light emission efficiency, and lifetime, and is becoming popular.
- An electrode and a dielectric layer are formed in this order on the front substrate of the AC type PDP, and a protective film is further formed so as to cover the dielectric layer.
- Magnesium oxide (MgO) is used as a material for the protective film. This is because magnesium oxide has been considered to be superior to other materials in functions required for a protective film, that is, sputtering resistance and electron emission characteristics.
- ⁇ secondary electron emission coefficient
- Patent Document 1 proposes that the surface layer portion of the protective film is composed of magnesium oxide in which part of oxygen is replaced with nitrogen.
- the PDP having a composition represented by Mg 3 O 3 (1-x) N 2x (where 0 ⁇ x ⁇ 7) is used as the surface layer portion of the protective film than the PDP using magnesium oxide as the protective film.
- the discharge start voltage is lowered.
- Patent Document 2 discloses a composition in which the protective film is represented by AlNX (X is at least one selected from Si, Ge, Sn, Pb, Be, Mg, Ca, O, and S). It is proposed that According to Patent Document 2, AlN is excellent in sputtering resistance and electron emission characteristics. When elements other than Al and N are mixed therein, these characteristics are further improved (paragraphs 0022 and 0023).
- Example 4 of Patent Document 2 (Al 1 -ab M a D b ) 1 -d (N 1 -c A c ) d (where M is at least one selected from Si, Ge, Sn, and Pb) Species, D is at least one selected from Be, Mg, Ca, A is at least one selected from O, S, 0.3 ⁇ d ⁇ 0.5; Although not specified in the column of Example 4, when referring to claim 2, 0 ⁇ a ⁇ 0.5, 0 ⁇ b ⁇ 0.5, 0 ⁇ a + b ⁇ 0. 5, 0 ⁇ c ⁇ 0.5, 0 ⁇ a + b + c ⁇ 1). Table 4 showing the results of Example 4 illustrates (AlMg) 0.60 (NO) 0.40 .
- a neon (Ne) -xenon (Xe) -based inert gas is sealed in the discharge space of an AC-type PDP that is in practical use.
- the partial pressure of xenon in this inert gas is 5 to 10%.
- the value of the discharge start voltage mainly depends on secondary electron emission due to Auger neutralization that occurs when Ne ions or Xe ions approach the protective film up to a distance at which interaction with the protective film occurs in the discharge space.
- Ne ions play most of the role, and the contribution of Xe ions is quite small.
- Patent Documents 1 and 2 can be evaluated as reducing the PDP discharge start voltage to some extent. However, assuming a PDP with a high xenon partial pressure in an inert gas filling the discharge space, further improvement of the protective film is required so that a lower discharge start voltage can be obtained.
- an object of the present invention is to provide a PDP having an improved protective film so that a lower discharge start voltage can be obtained.
- the PDP of the present invention includes a front substrate, a rear substrate disposed so as to face the front substrate, and a partition that partitions a space between the front substrate and the rear substrate into a discharge space,
- a protective film is formed to cover the dielectric layer formed on the front substrate and to be in contact with the discharge space, and the vicinity of the surface of the protective film is substantially composed of magnesium, aluminum, nitrogen and oxygen.
- the ratio of the number of atoms of the aluminum to the total number of atoms of the magnesium and the aluminum is 2.1% or more and 66.5% or less, and the number of atoms of the nitrogen with respect to the total number of atoms of the nitrogen and the oxygen
- the ratio is 1.2% or more and 17.2% or less of the total number of atoms of nitrogen and oxygen relative to the total number of atoms of magnesium and aluminum.
- the composition of the protective film is adjusted so that a lower discharge starting voltage can be obtained.
- One of the features of this protective film is that the magnitude relationship of the number of non-metal atoms with respect to the number of metal atoms (Mg, Al) is opposite to the conventionally proposed films containing Mg and O, The ratio of the latter to the former is adjusted to 1.0 or more.
- a PDP that is required to be driven at a higher voltage than the conventional one such as a PDP in which an inert gas of Ne—Xe system having a xenon partial pressure higher than 10% is sealed It becomes possible to drive with the same voltage as the conventional one.
- FIG. 1 It is sectional drawing which shows one form of PDP of this invention. It is II sectional drawing of FIG. It is a figure which shows the relationship between the discharge start pressure and discharge power of three types of protective films. It is a figure which shows the discharge maintenance voltage of PDP of three types of protective films shown in FIG. It is a figure which shows the X-ray electron emission spectrum and UV electron emission spectrum of Sample 2. It is a figure which shows the X-ray electron emission spectrum and UV electron emission spectrum of Sample 3. It is a figure which shows the X-ray electron emission spectrum and UV electron emission spectrum of Sample 4. It is a figure which shows the X-ray electron emission spectrum and UV electron emission spectrum of Sample 6. It is a figure which shows the X-ray electron emission spectrum and UV electron emission spectrum of Sample 7.
- the PDP of the present invention can be configured using members conventionally used except for the protective film.
- the configuration of the PDP is not particularly limited as long as the effect of lowering the discharge start voltage of the protective film according to the present invention can be obtained. Based on this premise, an embodiment of the PDP according to the present invention will be described below with reference to the drawings.
- FIG. 1 is a cross-sectional view showing one embodiment of the PDP of the present invention
- FIG. 2 is a cross-sectional view taken along the line II of FIG.
- the PDP shown in FIGS. 1 and 2 is a so-called AC type.
- Transparent electrodes (usually indium tin oxide (ITO) or tin oxide (SnO 2 ) are used) 12 and 13 are formed on a front substrate 11 made of a transparent insulating substrate (usually a glass plate is used). Is formed.
- the transparent electrode 12 is a scan electrode
- the transparent electrode 13 is a sustain electrode 13. These electrodes 12 and 13 are formed so as to be close to each other and extend parallel to each other and pass over the same discharge cell 17. By applying a voltage between the transparent electrodes 12 and 13, a sustain discharge (display discharge) is generated in the discharge cell 17 previously selected by the address electrode 19 to be described later and in which wall charges are accumulated.
- the bus electrode 14 is an auxiliary electrode having a low resistance constituted by, for example, a thick silver film, an aluminum thin film, or a laminated thin film of chromium / copper / chromium (Cr / Cu / Cr).
- a transparent dielectric layer (usually low-melting glass is used) 15 is formed on these electrodes 12, 13, and 14, and a protective film 16 is further formed so as to cover the dielectric layer 15. .
- the dielectric layer 15 has a current limiting function peculiar to the AC type PDP, and contributes to a relatively long life of the AC type.
- the protective film 16 is conventionally made of magnesium oxide. The material of the protective film 16 in this embodiment will be described later.
- a rear substrate 18 made of a transparent insulating substrate is disposed parallel to the substrate 11 at a predetermined distance from the front substrate 11.
- an address electrode 19 for writing image data and a base dielectric layer 20 are formed in this order.
- a barrier rib 22 is formed on the underlying dielectric layer 20, and the discharge space between the front substrate 11 and the rear substrate 18 is divided into discharge cells 17 by the barrier rib 22.
- the address electrodes 19 and the barrier ribs 22 are formed so as to extend in a direction orthogonal to the extending direction of the transparent electrodes 12 and 13.
- the phosphor layer 21 is attached to the lower dielectric layer 20 and the barrier ribs 22 and is exposed to the space in the discharge cell 17.
- the phosphor layer 21 is made of any one of RGB (red, green and blue) phosphors.
- ultraviolet light having a wavelength corresponding to the kind of the inert gas enclosed is generated in the cell 17, and the ultraviolet light is determined according to the phosphor material constituting the phosphor layer 21. Visible light having a wavelength is emitted.
- the barrier rib 22 that plays a role of partitioning the discharge cell 17 also has an action of preventing erroneous discharge and optical crosstalk.
- the discharge cell 17 is usually filled with an inert gas (discharge gas) composed of neon (Ne) and xenon (Xe).
- discharge gas composed of neon (Ne) and xenon (Xe).
- the pressure of the discharge gas is usually about 23.9 kPa (180 Torr) to 79.8 kPa (600 Torr), for example, about 66.7 kPa (500 Torr).
- the partial pressure of xenon in the discharge gas composed of neon and xenon is 5 to 10%.
- the present invention can be applied to a PDP using a discharge gas whose Xe partial pressure is about the above level, but more specifically, a PDP in which the Xe partial pressure in the discharge gas is set high for higher luminance, more specifically, neon and Effective when applied to a PDP that uses a discharge gas that is a mixed gas with xenon and has a partial pressure of xenon set to 11 to 100% of the total, in some cases 40 to 100%, or even 70 to 100%. Is big.
- the PDP of the present invention is not limited to a PDP using a Ne—Xe-based discharge gas, but is applied to a PDP using a discharge gas containing other gases such as helium (He), argon (Ar), and krypton (Kr). You can also
- the vicinity of the surface of the protective film 16 is substantially composed of magnesium (Mg), aluminum (Al), nitrogen (N), and oxygen (O).
- Mg magnesium
- Al aluminum
- N nitrogen
- O oxygen
- substantially is used to allow impurities that are difficult to eliminate completely in the mass production process to be mixed to such an extent that they hardly affect the characteristics of the protective film. Specifically, It is a term indicating that other atoms of less than 0.1 atomic% may be contained.
- the ratio of Mg, Al, N and O is determined within the following range.
- the ratio of Al to the total number of Mg and Al atoms (Al / (Mg + Al) ⁇ 100 [%]) is 2.1% or more and 66.5% or less.
- the ratio of N to the total number of N and O atoms (N / (N + O) ⁇ 100 [%]) is 1.2% or more and 17.2% or less.
- the ratio of the total number of N and O atoms to the total number of Mg and Al atoms ((N + O) / (Mg + Al)) is 1.0 or more and 1.35 or less.
- the composition in the vicinity of the surface of the protective film is limited.
- the remaining portion of the protective film is desirably a composition in a limited range in the vicinity of the surface from the viewpoint of ensuring that the composition in the vicinity of the surface is within a predetermined range, but may be a composition outside the above range.
- the composition in the vicinity of the surface can be measured by an XPS (X-ray photoelectron spectroscopy) method.
- the composition of the outermost surface of the film specifically, the composition in the range of several nanometers from the surface can be analyzed.
- “near the surface” refers to a range that can be analyzed by the XPS method for the surface of the film.
- the thickness of the protective film 16 is not particularly limited, but may be about the same as the conventional film, for example, in the range of 0.5 ⁇ m to 1 ⁇ m.
- the discharge characteristics were measured using a pair of electrodes arranged to face each other in a sealed chamber.
- the electrode spacing was 10 cm, and argon (Ar) gas was used as the discharge gas in the chamber.
- One of the electrodes was grounded, and the other was connected to a high frequency power source (13.56 MHz).
- a protective film whose characteristics are to be evaluated was formed on an electrode (high-frequency electrode) connected to a high-frequency power source. Then, while maintaining the discharge power applied between the pair of electrodes constant (8 W), the pressure of the discharge gas was gradually increased from 0.5 Pa, and the pressure at which discharge started was measured.
- the discharge start voltage basically depends on ions and electrons generated in the discharge space.
- ions and electrons in the discharge gas are less likely to be generated.
- ions / electrons generated on the surface of the high-frequency electrode determine the discharge start voltage. Therefore, the secondary electron emission coefficient of the protective film can be evaluated by the method as described above.
- FIG. 3 shows the results of the evaluation method performed on the protective films A, B, and C made of different materials.
- the discharge power was appropriately selected within the range indicated on the vertical axis of the graph, and the discharge start pressure was determined at the discharge power. As shown in FIG. 3, the result that the discharge start pressure was low was obtained in the order of the protective films A, C, and B.
- FIG. 4 shows the discharge sustaining voltage of a PDP test panel manufactured using the protective films A, B, and C (the discharge gas is 100% Xe gas).
- the discharge sustaining voltage was measured for each type of phosphor (RGB), and further by emitting three types of phosphors simultaneously (white light emission).
- the sustaining voltage in the PDP test panel well reflected the value of the discharge start pressure, and became lower as the discharge start pressure was lower. From the above, it was confirmed that the above evaluation method is appropriate as a method for evaluating the secondary electron emission coefficient of the protective film, which is a problem in an actual PDP.
- the protective film was formed on the high frequency electrode by sputtering or electron beam evaporation (EB).
- the film thickness was 0.5 ⁇ m.
- Table 1 shows the target used in the sputtering method and the vapor deposition source used in the EB method together with the film formation atmosphere.
- Table 1 also shows the composition of the protective film measured by the XPS method.
- the soft X-ray used in this XPS method is Alk ⁇ (1.485 keV).
- an automatic etching operation sometimes performed when analyzing a composition change in the depth direction of the film was not performed, and only the composition near the surface of the film was evaluated.
- X-rays are the result of performing spectroscopy of electrons that are perpendicularly incident on the sample and emitted in a direction inclined by 45 ° from the vertical direction.
- MgO / Al indicates that an Al foil is disposed on a part of the surface of the MgO target.
- AlN / MgO indicates that the MgO crystal target is arranged on a part of the surface of the AlN target. If these targets are used and the ratio of the area in which the Al foil or the like is disposed is adjusted, the ratio of atoms to be sputtered can be controlled.
- the film was formed while supplying nitrogen gas into the chamber.
- the notation of AlN + MgO indicates that the film was formed by co-evaporation using two deposition sources of an AlN deposition source and an MgO deposition source.
- the discharge start pressure of the MgON-based protective film (sample 0) containing no Al was 1.60 Pa and was not sufficiently low. Even if the amount of Al mixed was small, it was effective in reducing the discharge start pressure (Sample 2). However, when the ratio of Al to the total of Mg and Al was too high (Samples 5 to 8), the discharge start pressure was not sufficiently lowered. Similarly, even when the amount of N mixed is small, the discharge start pressure is greatly reduced (sample 12). However, when the ratio of N to the sum of N and O became too high (sample 14), the discharge start pressure was not sufficiently lowered. Moreover, even if the ratio of the nonmetallic atom (O, N) to the metal atom (Mg, Al) was too low (Sample 18) or too high (Sample 1), the discharge start pressure was not sufficiently lowered. .
- Patent Document 1 Japanese Patent Laid-Open No. 2000-173476 (Patent Document 1) and Japanese Patent Laid-Open No. 2003-100217 (Patent Document 2), O and N with respect to the total number of metal atoms such as Al and Mg.
- the total number of non-metallic atoms is set to be less than one.
- the electron emission spectrum from the valence band by XPS (hereinafter referred to as “X-ray electron emission spectrum”) and the electron emission spectrum by photon radiation (hereinafter referred to as “UV electron emission spectrum”). ) And measured.
- the UV electron emission spectrum is obtained by measuring electrons emitted when irradiated with visible / ultraviolet rays having a wavelength of 500 to 200 nm.
- the X-ray electron emission spectrum reflects the state near the surface of the film, whereas the UV electron emission spectrum is considered to reflect the state deeper than the X-ray electron emission spectrum.
- the X-ray electron emission spectrum is shown by thinly hatching a region having a binding energy of 6 eV or less.
- a low discharge start pressure tends to be obtained from a sample having a wide hatched region.
- Samples 2 to 4 had very similar X-ray electron emission spectra.
- the ratio of [Al / (Mg + Al)] based on the number of atoms (hereinafter simply referred to as “Al”) relative to the ratio of [N / (N + O)] based on the number of atoms (hereinafter simply referred to as “N ratio”).
- the ratio (expressed as “ratio”) (Al ratio / N ratio) is 3 or less. When this ratio is adjusted to 3 or less, more specifically 2.4 or less, a characteristic X-ray electron emission spectrum in which a large peak having an apex in a region of 6 eV or less is obtained. A low discharge starting pressure is obtained.
- the Al ratio / N ratio is less than 1.
- the peak in the vicinity of 12 to 13 eV indicated by the arrow decreases as the Al ratio increases (from FIG. 5 to FIGS. 6 and 7). It can be confirmed that Since this peak corresponds to the hydroxylation / carbonation of the film surface, a protective film having a small peak is advantageous for production in the mass production process of PDP. Therefore, when chemical change of the surface of the protective film becomes a problem, it should be considered that the Al ratio is 40% or more, more preferably 42.1%. Looking at the X-ray electron emission spectra in other figures, if the Al ratio is 40% or more, no peak corresponding to hydroxylation / carbonation on the film surface is observed.
- the maximum value of the X-ray electron emission spectrum in FIG. 10 is also in the region of 6 eV or less, which corresponds to the low discharge start pressure obtained from sample 9.
- the ratio of N ratio to Al ratio in this sample is 5.9.
- the Al ratio and N ratio of another sample in which a low discharge start pressure was obtained while the ratio (Al ratio / N ratio) exceeded 3, the Al ratio was 40 to 67. %, N ratio 5.0 to 18%, and ratio of N ratio to Al ratio (Al ratio / N ratio) 4 to 6 are one of the preferred composition ranges of the protective film for keeping the discharge start pressure low. I understand.
- the Al ratio is 40.2 to 66.5%
- the N ratio is 6.8 to 16.1%
- the ratio of the N ratio to the Al ratio is 4.1 to 5.9.
- the X-ray electron emission spectrum as a whole becomes high. Therefore, unlike the sample 10, even if the maximum value of this spectrum is not less than 6 eV, a protective film having a low discharge start pressure can be obtained (see FIG. 13).
- the present invention is useful for realizing a PDP, particularly a high-luminance and high-efficiency PDP.
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Abstract
Description
Claims (4)
- 前面基板と、前記前面基板と対向するように配置された後面基板と、前記前面基板と前記後面基板との間の空間を放電空間に区画する隔壁と、を備え、
前記前面基板上に形成された誘電体層を覆い、かつ前記放電空間に接するように、保護膜が形成され、
前記保護膜の表面近傍が、実質的に、マグネシウム、アルミニウム、窒素および酸素から構成され、
前記マグネシウムおよび前記アルミニウムの原子数の合計に対する前記アルミニウムの原子数の比率が2.1%以上66.5%以下であり、
前記窒素および前記酸素の原子数の合計に対する前記窒素の原子数の比率が1.2%以上17.2%以下であり、
前記マグネシウムおよび前記アルミニウムの原子数の合計に対する前記窒素および前記酸素の原子数の合計の比が1.0以上1.35以下である、
プラズマディスプレイパネル。 - 前記窒素および前記酸素の原子数の合計に対する前記窒素の原子数の比率(N比率)を分母とし、前記マグネシウムおよび前記アルミニウムの原子数の合計に対する前記アルミニウムの原子数の比率(Al比率)を分子として算出される比(Al比率/N比率)が、2.4以下である、請求項1に記載のプラズマディスプレイパネル。
- 前記マグネシウムおよび前記アルミニウムの原子数の合計に対する前記アルミニウムの原子数の比率(Al比率)が40.2~66.5%であり、
前記窒素および前記酸素の原子数の合計に対する前記窒素の原子数の比率(N比率)が6.8~16.1%であり、前記N比率に対する前記Al比率の比(Al比率/N比率)が4.1~5.9である、請求項1に記載のプラズマディスプレイパネル。 - 前記放電空間には、ネオンとキセノンからなる放電ガスが充填されており、
前記放電ガスにおけるキセノン分圧が全体の11~100%である請求項1に記載のプラズマディスプレイパネル。
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JP2010504364A JPWO2010010677A1 (ja) | 2008-07-25 | 2009-07-16 | プラズマディスプレイパネル |
US12/680,053 US7932676B2 (en) | 2008-07-25 | 2009-07-16 | Plasma display panel |
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JP2008-192679 | 2008-07-25 | ||
JP2008192679 | 2008-07-25 |
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JP (1) | JPWO2010010677A1 (ja) |
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WO (1) | WO2010010677A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000173476A (ja) * | 1998-12-01 | 2000-06-23 | Fujitsu Ltd | ガス放電パネル |
JP2003100217A (ja) * | 2001-09-19 | 2003-04-04 | Matsushita Electric Ind Co Ltd | 電極材料およびそれを用いたプラズマディスプレイ |
JP2003346663A (ja) * | 2002-05-31 | 2003-12-05 | Hitachi Ltd | プラズマディスプレイパネル |
JP2006196476A (ja) * | 2006-04-21 | 2006-07-27 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル |
JP2008152947A (ja) * | 2006-12-14 | 2008-07-03 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル |
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WO2002019368A1 (en) * | 2000-08-29 | 2002-03-07 | Matsushita Electric Industrial Co., Ltd. | Plasma display panel and production method thereof and plasma display panel display unit |
US20060103307A1 (en) * | 2004-11-17 | 2006-05-18 | Matsushita Electric Industrial Co., Ltd. | Field enhanced plasma display panel |
US20070262715A1 (en) * | 2006-05-11 | 2007-11-15 | Matsushita Electric Industrial Co., Ltd. | Plasma display panel with low voltage material |
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2009
- 2009-07-16 WO PCT/JP2009/003368 patent/WO2010010677A1/ja active Application Filing
- 2009-07-16 JP JP2010504364A patent/JPWO2010010677A1/ja active Pending
- 2009-07-16 US US12/680,053 patent/US7932676B2/en not_active Expired - Fee Related
- 2009-07-16 KR KR1020107005488A patent/KR101039188B1/ko not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000173476A (ja) * | 1998-12-01 | 2000-06-23 | Fujitsu Ltd | ガス放電パネル |
JP2003100217A (ja) * | 2001-09-19 | 2003-04-04 | Matsushita Electric Ind Co Ltd | 電極材料およびそれを用いたプラズマディスプレイ |
JP2003346663A (ja) * | 2002-05-31 | 2003-12-05 | Hitachi Ltd | プラズマディスプレイパネル |
JP2006196476A (ja) * | 2006-04-21 | 2006-07-27 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル |
JP2008152947A (ja) * | 2006-12-14 | 2008-07-03 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル |
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KR20100041885A (ko) | 2010-04-22 |
US20100207524A1 (en) | 2010-08-19 |
KR101039188B1 (ko) | 2011-06-03 |
US7932676B2 (en) | 2011-04-26 |
JPWO2010010677A1 (ja) | 2012-01-05 |
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