WO2009157531A1 - 半導体装置とその製造方法、及びこの半導体装置を用いた表示装置 - Google Patents
半導体装置とその製造方法、及びこの半導体装置を用いた表示装置 Download PDFInfo
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- WO2009157531A1 WO2009157531A1 PCT/JP2009/061687 JP2009061687W WO2009157531A1 WO 2009157531 A1 WO2009157531 A1 WO 2009157531A1 JP 2009061687 W JP2009061687 W JP 2009061687W WO 2009157531 A1 WO2009157531 A1 WO 2009157531A1
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
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- H01L27/1259—Multistep manufacturing methods
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Definitions
- the present invention relates to a semiconductor device typified by a thin film transistor suitable for an organic EL display device, a liquid crystal display device, and the like, a manufacturing method thereof, and a display device using the semiconductor device.
- the OLED panel it is necessary to suppress the luminance variation of each pixel formed on the thin film transistor substrate in order to improve the image quality. Therefore, it is indispensable to strictly control the current flowing in the light emitting layer of the organic EL element (OLED element) constituting the OLED, and the driving TFT provided in each pixel is strongly required to have a small threshold voltage variation. Has been. Also, to reduce the power consumption of the OLED panel, it is necessary to improve the mobility of the TFT.
- the LCD is configured by enclosing a liquid crystal between each pixel electrode formed on a thin film transistor substrate and a color filter substrate.
- a liquid crystal display device hereinafter also referred to as LCD.
- the polycrystalline Si film can be formed by a method other than laser annealing.
- it can be formed by heating the substrate to about 600 ° C. which is higher than the crystallization temperature of Si by a thermal CVD method.
- a large OLED panel uses a glass substrate having a softening temperature of 600 ° C. or less, so that it is difficult to apply the thermal CVD method.
- a polycrystalline Si film can be formed at a low temperature by plasma CVD, since an incubation layer containing an amorphous component is easily formed on the insulating film in the initial stage of film formation, this film formation method forms a channel on the substrate side. It is not suitable for application to a bottom gate type TFT.
- disilane (Si 2 H 6 ) and germanium tetrafluoride (GeF 4 ) are used as source gases, and H is extracted from Si 2 H 6 by fluorine (F) in GeF 4 .
- This is a technique capable of forming a polycrystalline silicon germanium (SiGe) film at a high film formation rate at a temperature lower than the film formation temperature by ordinary thermal CVD. Since the source gas can be reacted mainly on the substrate surface in this method, it is possible to directly form semiconductor crystal nuclei on an insulating substrate with a large area without accompanying an amorphous structure. If crystal growth is performed using various film formation techniques, a polycrystalline semiconductor film having excellent crystallinity can be formed at a low temperature.
- the preferred orientation of the growing polycrystal can be set to (111), (110), (100), for example. There is an advantage that it is possible.
- Patent Document 1 discloses a conventional example of film formation using the reactive thermal CVD method.
- An example of forming a polycrystalline SiGe film described in this document is shown below.
- SiOF formed on a Si wafer is used as a substrate
- GeF 4 and Si 2 H 6 are flowed into a reaction vessel of 2.7 sccm and 20 sccm, respectively
- He for dilution is flowed into a 500 sccm reaction vessel
- the pressure is varied from 15 to 50 torr and deposited at 425 ° C. for 20 minutes.
- the growth temperature is lowered to 375 ° C. and the growth is continued.
- a highly crystalline SiGe polycrystalline film is formed.
- silane-silane fluoride-hydrogen is set to flow rates of 2 sccm, 98 sccm and 50 sccm, respectively, and glow discharge decomposition is performed at a pressure of 1 torr.
- a polycrystalline Si film is formed at 400 ° C. by the method.
- a polycrystalline silicon film is formed at 300 ° C. by an rf-glow discharge method using silane (2%) diluted with hydrogen after forming semiconductor crystal nuclei. A film is being formed.
- the temperature of 450 ° C is lower than the softening temperature of the glass substrate, but is equal to or higher than the temperature at which hillocks and voids are generated in the metal film. Therefore, for example, in the bottom gate type TFT, there is a problem that when the semiconductor layer is formed on the insulating film, the electrode wiring film disposed below the insulating film is damaged and the wiring resistance increases.
- An object of the present invention is to provide a method for promoting the formation of semiconductor crystal nuclei on an insulating film such as a Si oxide film even at a low temperature of 450 ° C. or less in a reactive thermal CVD method.
- a semiconductor film may be formed as a base before film formation by the reactive thermal CVD method.
- This semiconductor film can be etched by halogen atoms contained in the supply gas. Therefore, in the method for manufacturing a semiconductor device according to the present invention, the first step of forming the first semiconductor film on the insulating substrate is performed, and then semiconductor crystal nuclei are formed on a part of the first semiconductor film.
- a second step of etching and removing the first semiconductor film except for the semiconductor crystal nucleus generation region and its periphery is performed, and a second semiconductor film is formed using the semiconductor crystal nucleus as a seed. It is characterized by carrying out at least the process.
- the first step is characterized in that an amorphous silicon film or a microcrystalline silicon film is formed as the first semiconductor film because it can be formed at a low temperature of 450 ° C. or lower.
- silicon is formed by a reactive thermal CVD method in which silanes and germanium halide are supplied to the source gas as semiconductor crystal nuclei and the formation temperature is 450 ° C. or lower. Germanium crystal nuclei are formed, and the first semiconductor film is etched by halogen atoms or halides derived from germanium halide.
- silicon germanium is formed on the semiconductor polycrystalline film.
- the semiconductor polycrystalline film such as silicon film and on the insulating film such as silicon oxide film and silicon nitride film.
- silicon germanium is formed on the semiconductor polycrystalline film.
- the crystal grows, it is difficult to form a film on the insulating film. Therefore, in order to grow a polycrystalline film selectively on and around the semiconductor crystal nucleus, in the third step, as the second semiconductor film, silanes and germanium halide are supplied to the source gas, and the formation temperature is 450 ° C.
- a polycrystalline silicon germanium film is formed by a reactive thermal CVD method of C or less.
- a polycrystalline silicon film can be formed as the second semiconductor film.
- the film forming method can also be a thermal CVD method, but the plasma CVD method is preferable for the following reasons.
- the film formation rate is as low as about 50 nm or less per minute even when the substrate temperature is 500 ° C., but in the case of forming an amorphous Si film by the plasma CVD method, a high growth rate of about 200 nm per minute at around 250 ° C. This is because the film rate is realized.
- the polycrystalline silicon film is formed on the semiconductor crystal nucleus, the polycrystalline silicon film can be formed under conditions for forming an amorphous Si film by plasma CVD.
- an amorphous, microcrystalline, or polycrystalline silicon film is formed by plasma CVD in order to improve the deposition throughput in accordance with the required characteristics of the TFT. Is preferred.
- the TFT of the present invention has a semiconductor film, a source electrode, a drain electrode, and a gate electrode on an insulating substrate, and the semiconductor film is discretely formed on a part of the insulating film.
- the semiconductor film includes a semiconductor film, a semiconductor crystal nucleus formed on and around the first semiconductor film, and a second semiconductor film formed on the semiconductor crystal nucleus.
- the first semiconductor film can be formed at a low temperature by using, for example, a plasma CVD method, an amorphous silicon film or a microcrystalline silicon film is preferable. Further, since the etching rate by halogen atoms is sufficiently fast if it is about 100 ° C. or higher, the selection of these films is convenient.
- the semiconductor crystal nucleus is made of silicon germanium crystal nucleus.
- the second semiconductor film is preferably a polycrystalline silicon film. Furthermore, since the crystal is selectively grown on and around the semiconductor crystal nucleus, it is more preferable that the second semiconductor film is a polycrystalline silicon germanium film.
- the TFT of the present invention has a third semiconductor film on the second semiconductor film.
- the third semiconductor film is made of an amorphous silicon film, a microcrystalline silicon film, or a polycrystalline silicon film. If it consists, it is suitable.
- the TFT of the present invention it is preferable to apply the TFT of the present invention to organic EL driving.
- the TFT of the present invention is preferable to apply to a liquid crystal display device.
- the method for manufacturing a semiconductor device of the present invention when a directly grown polycrystalline film applied as a semiconductor layer of a TFT is formed, the first semiconductor film is deposited on the underlying insulating film. Therefore, semiconductor crystal nuclei are more likely to be formed at a lower temperature on the semiconductor film than on the insulating film, so that the film formation temperature can be lowered. Therefore, it is possible to maintain the H termination of defects in the film, and to suppress an increase in resistance of the electrode wiring film, thereby realizing an improvement in TFT characteristics.
- FIG. 1 is a cross-sectional structure diagram of a bottom gate TFT for explaining a first embodiment of a semiconductor device formed by using a method for manufacturing a semiconductor device according to the present invention.
- FIG. 2 is a partial enlarged cross-sectional view showing a manufacturing method of the TFT shown in FIG. It is the elements on larger scale of the process following FIG. 2A which shows the manufacturing method of TFT shown in FIG. 1 in order of a process.
- FIG. 2B is a partially enlarged cross-sectional view of a step following FIG. 2B showing the manufacturing method of the TFT shown in FIG. 1 in order of steps.
- FIG. 2C is a partial enlarged cross-sectional view of the process following FIG. 2C illustrating the manufacturing method of the TFT illustrated in FIG. 1 in order of processes.
- FIG. 2D is a partially enlarged cross-sectional view of a step following FIG. 2D showing the manufacturing method of the TFT shown in FIG. 1 in order of steps. It is a figure which shows Ge composition ratio profile in the semiconductor layer of TFT shown in FIG. It is a figure which shows the cross-section of the OLED display device formed using TFT shown in FIG. It is a figure which shows the cross-section of the liquid crystal display device formed using TFT shown in FIG. It is a cross-section figure of the bottom gate type TFT explaining Embodiment 4 of the semiconductor device formed using the manufacturing method of the semiconductor device which concerns on this invention.
- FIG. 1 shows Ge composition ratio profile in the semiconductor layer of TFT shown in FIG.
- FIG. shows the cross-section of the OLED display device formed using TFT shown in FIG.
- FIG. 2D is a partially enlarged cross-sectional view of a step following FIG. 2D showing the manufacturing method of the TFT shown in FIG
- FIG. 10 is a cross-sectional structure diagram of a top gate TFT for explaining a semiconductor device according to a fifth embodiment formed by using the method for manufacturing a semiconductor device according to the present invention. It is a figure which shows the cross-section of OLED formed using TFT shown in FIG.
- FIG. 8 is a cross-sectional structure diagram of a liquid crystal display device formed using the TFT shown in FIG. 7. It is a cross-section figure of the top gate type TFT explaining Embodiment 8 of the semiconductor device formed using the manufacturing method of the semiconductor device which concerns on this invention.
- FIG. 1 is a fragmentary cross-sectional view for explaining Embodiment 1 of a semiconductor device manufactured by using the method for manufacturing a semiconductor device according to the present invention.
- the semiconductor device shown in FIG. 1 is a bottom gate type TFT formed on an insulating substrate 1.
- This TFT is generally composed of a semiconductor film 4 provided on the gate electrode 2, and a source electrode wiring 6a and a drain electrode wiring 6b that are spaced apart by a channel on the semiconductor film 4.
- this structure will be described in detail.
- a gate insulating film 3 is formed on an insulating substrate 1 obtained by processing the gate electrode wiring 2 on a part of the surface, and a semiconductor film 4 is formed in a TFT formation region of the gate insulating film 3.
- the semiconductor film 4 includes a part 4a of a semiconductor film made of, for example, amorphous Si formed on the gate insulating film 3 and a part of the semiconductor film 4a, for example, SiGe. And a semiconductor film 4c made of, for example, SiGe formed on the semiconductor crystal nucleus 4b.
- n + silicon film 5a and the source electrode wiring 6a of the source region are formed at one end of the semiconductor film 4, and the n + silicon film 5b and the drain of the drain region are formed at the other end.
- Electrode wiring 6b is formed.
- a protective insulating film 7 and an interlayer insulating layer 8 are further deposited on the source electrode wiring 6a and the drain electrode wiring 6b. Further, a pixel electrode 9 connected to the drain electrode wiring 6b is formed.
- the gate electrode wiring 2 is formed on the insulating substrate 1 made of, for example, glass.
- the wiring material metals such as Nb, Mo, W, Ta, Cr, Ti, Fe, Ni and Co, alloys thereof, and laminated films thereof can be used.
- a low resistance metal such as Al or Cu.
- These films can be formed by a sputtering method. In this embodiment, an AlNd alloy film is used. The film thickness is 200 nm.
- the gate electrode wiring pattern 2 is processed using photolithography.
- the gate insulating film 3 is formed on the substrate.
- the insulating film material SiO, SiN, SiON or the like can be used. These films can be formed by a plasma CVD method or a sputtering method. Or you may use plasma oxidation, photooxidation, etc. together.
- an SiO film formed using TEOS under standard conditions is formed to a thickness of 100 nm by plasma CVD. As a result, the structure shown in FIG. 2A is obtained.
- a semiconductor film 4 a is deposited on the gate insulating film 3.
- the semiconductor film 4a for example, an amorphous Si film or a microcrystalline Si film is preferable.
- the microcrystalline film is a film in which a crystalline component and an amorphous component are mixed and the crystal grain size is about 1 to 30 nm.
- the semiconductor film 4a may be formed by, for example, a plasma CVD method. It is possible to use a film formation temperature of room temperature or higher. However, in order to improve the TFT manufacturing throughput, it is necessary to ensure a film formation speed of a certain level or higher. In order to suppress generation of hillocks and voids in the gate electrode wiring 2, the temperature is preferably set to 450 ° C. or lower.
- the film thickness of the semiconductor film 4a is preferably 50 nm or less because it is desirable that the film is etched away except for the semiconductor crystal nucleus 4b and its periphery when the semiconductor crystal nucleus 4b is formed later. .
- the amorphous Si film or the microcrystalline Si film has hydrogen of 1 ⁇ 10 19 cm ⁇ 3 or more and 1 ⁇ 10 22 cm ⁇ . It is desirable to include 3 or less.
- a plasma frequency of 13.56 MHz is used, hydrogen-diluted 10% monosilane (SiH 4 ) is supplied at 100 sccm, a substrate temperature is set to 200 ° C., and a gas pressure is set to 133 Pa. do it.
- a semiconductor crystal nucleus 4b and a semiconductor film 4c are formed on the semiconductor film 4a.
- the formation process of these films in the region surrounded by the broken line in FIG. 2B will be described with reference to FIG. 2C.
- a reactive thermal CVD method for forming the semiconductor crystal nuclei 4b and to select SiGe as a material.
- the reactive thermal CVD method uses an oxidation-reduction reaction with a semiconductor hydrogenation gas and a halogenated gas, Si n H 2n + 2 (n> 1) as a semiconductor hydrogenation gas is used as the source gas to be supplied.
- a semiconductor hydrogenation gas for example, GeF 4 may be used as the gas.
- the reactive thermal CVD film formation not only the oxidation-reduction reaction but also the thermal decomposition of the source gas has an effect, so in order to realize the film formation at a lower temperature, for example, Si 2 H 6 having a low thermal decomposition temperature. Is desirable.
- the combination of the semiconductor hydrogenation gas and the halogenation gas may be, for example, silanes, germane (GeH 4 ) and F 2 , and GeH 4 and SiF 4. Considering the formation rate, gas use cost, etc., a combination of Si 2 H 6 and GeF 4 is advantageous. For the flow rate ratio, Si 2 H 6 may be 1 and GeF 4 may be 0.005 to 2, for example.
- a carrier gas such as He, Ar, or H 2 is used during film formation in order to secure a film formation pressure of about 10 Pa to 10,000 Pa in order to generate crystal nuclei at a certain formation rate or higher. Is introduced. If, for example, He is selected, the flow rate ratio between Si 2 H 6 and He is preferably set to, for example, 1:10 to 5000.
- the film forming temperature is preferably 300 ° C. or higher at which nucleation occurs, and 450 ° C. or lower in order to suppress H desorption from the crystal nucleus.
- amorphous Si film under the film forming conditions of Si 2 H 6 flow rate: 0.5 sccm, GeF 4 flow rate: 0.5 sccm, He flow rate: 1000 sccm, substrate temperature 400 ° C., and total pressure 1300 Pa.
- Si 2 H 6 flow rate 0.5 sccm
- GeF 4 flow rate 0.5 sccm
- He flow rate 1000 sccm
- substrate temperature 400 ° C. total pressure 1300 Pa.
- the semiconductor crystal nuclei 4b are shown as being adjacent to each other, but they may be in contact with each other.
- the size of the crystal nuclei is preferably 10 nm or more in order to realize good crystallinity in the semiconductor film 4c to be formed later, and on the other hand, it is preferably 100 nm or less in order to suppress an increase in surface unevenness. .
- semiconductor crystal nuclei may be formed of only Ge. Thereafter, when film formation is subsequently carried out, SiGe grows on the semiconductor crystal with almost no deposition on the insulating film. Therefore, a polycrystalline semiconductor film 4c selectively grown using the semiconductor crystal nucleus 4b as a seed is formed. It is formed (FIG. 2C (c)).
- the polycrystalline film is a film substantially composed of a crystal component, and the crystal grain size in the film is about 30 nm or more.
- the deposition conditions for the semiconductor film 4c may be exactly the same as those for the semiconductor crystal nucleus 4b.
- the SiGe film can be selectively grown even if the Ge composition ratio is small, for example, only the Si 2 H 6 flow rate may be increased and changed to 1.5 sccm.
- Etching is performed later in the formation of the source / drain of the TFT, but the film thickness of the semiconductor film 4c is the same as the film thickness of the semiconductor crystal nucleus 4b in order to avoid a film that is too thin to maintain TFT characteristics.
- the Ge composition ratio profile in the semiconductor film 4 is, for example, as shown in FIG. This profile is in the dotted line portion between aa ′ shown in FIG. 2C (c).
- the semiconductor crystal nuclei 4b are formed under the above-described film forming condition 1.
- the semiconductor film 4c is formed under the same conditions as the film forming condition 1 except that the Si 2 H 6 flow rate is 1.5 sccm.
- Ge is not contained in the semiconductor film 4a made of amorphous Si or microcrystalline Si, but the Ge composition ratio of about 50% is contained in the semiconductor crystal nucleus 4b made of SiGe. Further, the Ge composition ratio is about 20% in the semiconductor film 4c made of SiGe.
- the Ge composition ratio tends to be high in the semiconductor crystal nucleus 4b. This is because, since the nucleation temperature is 450 ° C. or lower, Si 2 H 6 is not thermally decomposed compared to GeF 4 , and Si is less likely to be taken into the semiconductor crystal nuclei 4b.
- This Ge composition ratio profile is the same in the semiconductor films in the following embodiments as long as the film formation by the reactive thermal CVD method is performed.
- the Ge composition ratio in the semiconductor crystal nuclei 4b and the semiconductor film 4c is not limited to the above values, and by adjusting the flow rate ratio of the source gas such as Si 2 H 6 and GeF 4 and the film formation temperature, It is possible to control to various values. Thus, the structure shown in FIG. 2C is obtained.
- an n + Si film 5 serving as a contact layer is formed on the semiconductor film 4 by a plasma CVD method.
- the condition of the semiconductor film 4a made of hydrogenated amorphous Si is used, and phosphine (PH 3 ) or its hydrogen dilution gas (PH 3 / H 2 ) may be additionally supplied as an n-type doping gas.
- the doping concentration is 1 ⁇ 10 17 cm ⁇ 3 or more in order to form a low-resistance contact layer, and 1 ⁇ 10 22 cm ⁇ to suppress deterioration of crystallinity and high resistance due to dopant atom clustering or segregation. 3 or less is desirable.
- the film thickness is preferably about 40 nm as a contact.
- a metal film is deposited on the substrate on which the laminated film is processed.
- this material it is possible to use Nb, Mo, W, Ta, Cr, Ti, Fe, Ni, Co, etc., alloys thereof, and laminated films of these metals.
- a low resistance metal such as Al or Cu.
- These films can be formed by a sputtering method.
- an AlNd alloy / Cr laminated film is used. The film thickness is 200/50 nm.
- n + Si film 5 on the TFT channel region and a part on the surface side of the semiconductor film 4 are etched using the source electrode wiring 6a and the drain electrode wiring 6b as masks to form contact layers 5a and 5b. Form.
- the structure shown in FIG. 2E is obtained.
- a protective insulating film 7 made of a SiN film is formed on the source electrode wiring 6a and the drain electrode wiring 6b by a plasma CVD method.
- the film thickness is preferably 500 nm, for example.
- an interlayer insulating layer 8 made of, for example, an organic resin is formed on the protective insulating film 7, and then a contact hole is formed in the formation region of the interlayer insulating layer 8 and the drain electrode wiring 6 b of the protective insulating film 7 using photolithography.
- an Al film is deposited by a sputtering method, and the pixel electrode 9 is formed by processing using photolithography.
- a reflective metal film or a transparent conductive film can be used for the pixel electrode 9, and the film thickness is preferably 100 nm.
- the bottom gate type TFT shown in FIG. 1 is completed.
- the semiconductor film 4a made of amorphous Si or microcrystalline Si remains on the gate insulating film 3, but the semiconductor crystal nucleus 4b and polycrystal are formed between the adjacent films. Since the semiconductor film 4c is formed and the semiconductor crystal nucleus 4b and the semiconductor film 4c can be made larger than the semiconductor film 4a as the exclusive region on the gate insulating film, this embodiment This TFT achieves performance far exceeding that of an existing amorphous Si-TFT or a TFT having polycrystalline Si formed by film formation by a normal plasma CVD method.
- the semiconductor film 4a is formed in advance on the gate insulating film 3, so that the formation of the semiconductor crystal nuclei 4b by the reactive thermal CVD method is 450 ° C. It can also be realized at the following low temperatures. At such a low temperature, the H termination is easily maintained in the defect in the TFT semiconductor layer. Therefore, for example, it becomes difficult to generate an off-leakage current, so that it is possible to realize good TFT characteristics.
- the glass substrate is not softened, and hillocks and voids are generated in the metal film. The possibility is small. Accordingly, since an increase in wiring resistance due to damage to the electrode wiring film is suppressed, there is an advantage that a TFT having good characteristics can be manufactured.
- the method for manufacturing a semiconductor device in this embodiment is suitable for forming pixel TFTs with small threshold voltage variations on a large-area glass substrate, and is therefore suitable for development of a large OLED display.
- the semiconductor crystal nucleus 4b in the method for manufacturing a semiconductor device according to the present embodiment contains at least Ge, nucleation is possible at a low temperature of 450 ° C. or lower.
- the crystal can be selectively grown on the semiconductor crystal nucleus 4b and its periphery without forming the film almost in the region where the semiconductor film 4a is removed by etching. Thereby, there is an advantage that sufficient crystallinity for securing TFT characteristics can be obtained in the semiconductor film 4c.
- Embodiment 2 of the present invention an application example to an OLED will be described with reference to FIG. First, a bottom gate TFT is formed by the same method as in the first embodiment. Next, as shown in FIG. 4, the charge transport layer 10, the light emitting layer 11, and the charge transport layer 12 of the OLED are formed on the pixel electrode 9 by vapor deposition or the like. Furthermore, when the sealing layer 14 is formed after the upper electrode 13 made of a transparent conductive film is formed by vapor deposition or sputtering, the OLED display device shown in FIG. 4 is completed.
- the threshold voltage variation is reduced in the TFT formed on the large-area substrate by the manufacturing method of the present invention.
- the current flowing in the light emitting layer of the OLED is strictly controlled and the luminance variation of each pixel is suppressed, so that the OLED of this embodiment can be applied to a large panel and achieve high image quality. It is.
- a bottom gate TFT is formed by the same method as in the first embodiment.
- a transparent conductive film is used as the pixel electrode 9.
- an ITO film is formed by sputtering and processed using photolithography. The film thickness is preferably 70 nm.
- an alignment film 20 is formed on the pixel electrode 9.
- a counter substrate 25 on which a color filter layer 21, an overcoat layer 22, a counter electrode 23 made of an ITO film, and an alignment film 24 are formed in this order is bonded via a spacer 26.
- the liquid crystal 27 is sealed in this, the liquid crystal display device shown in FIG. 5 is completed.
- the TFT formed by the manufacturing method of the present invention is less likely to generate off-leakage current. Therefore, even when applied to pixel driving of a liquid crystal display, the leakage current is small and high-quality images can be displayed. It is possible to obtain.
- Embodiment 4 of a semiconductor device manufactured by using the method for manufacturing a semiconductor device according to the present invention will be described with reference to FIG.
- the difference between the fourth embodiment and the first embodiment is the layer structure of the semiconductor film formed in the bottom gate TFT.
- the gate electrode wiring 102 is formed on a part of the insulating substrate 101, and the gate insulating film 103 is further deposited.
- a semiconductor film 104 is formed in the TFT formation region of the gate insulating film 103.
- the semiconductor film 104 includes a semiconductor film 104a, a semiconductor crystal nucleus 104b formed around the semiconductor film 104a, a semiconductor film 104c formed on the semiconductor crystal nucleus 104b, and a semiconductor film 104d. Further, an n + silicon film 105a and a source electrode wiring 106a in the source region, and an n + silicon film 105b and a drain electrode wiring 106b in the drain region are formed.
- a protective insulating film 107 and an interlayer insulating layer 108 are further deposited on the source electrode wiring 106a and the drain electrode wiring 106b. Further, a pixel electrode 109 connected to the drain electrode wiring 106b is formed.
- the formation of the gate electrode wiring 102 and the gate insulating film 103 on the insulating substrate 101 may be performed in the same manner as in Embodiment Mode 1, and thus description thereof is omitted.
- the semiconductor film 104a, the semiconductor crystal nucleus 104b, and the semiconductor film 104c are sequentially formed on the next gate insulating film 103 in the same material and film quality as those of the semiconductor film 4a, the semiconductor crystal nucleus 4b, and the semiconductor film 4c in the first embodiment.
- the formation method and conditions may be used.
- a semiconductor film 104d is grown on the semiconductor film 104c.
- the film material is preferably amorphous Si containing hydrogen, microcrystalline Si, or polycrystalline Si, for example.
- a film can be formed by plasma CVD.
- the film formation conditions may be the same as those used when forming the semiconductor film 4a of the first embodiment, for example, if amorphous Si is formed.
- the thickness of the semiconductor film 104d is desirably adjusted so that the semiconductor film 104 has a thickness of about 200 nm.
- the step of depositing the n + silicon film 105b of the n + silicon film 105a and a drain region of the source region, until the formation of the pixel electrode 109 similarly use materials of the same steps described in Embodiment 1, the conditions The description is omitted here. Thus, the structure shown in FIG. 6 is obtained.
- the semiconductor film 104d made of amorphous Si containing hydrogen, for example, is formed. Therefore, even when the semiconductor crystal nuclei 104b and the semiconductor film 104c with a low hydrogen content are used, hydrogen of crystal defects in the semiconductor crystal nuclei 104b and the semiconductor film 104c is supplied by supplying hydrogen from the high hydrogen-containing semiconductor film 104d. The hydrogen concentration necessary for termination can be ensured. Therefore, compared with the TFT of Embodiment Mode 1, it is possible to manufacture a TFT having favorable characteristics in which the interface state in the channel portion is reduced, the mobility is high, and the threshold voltage shift is small.
- Embodiment 5 of a semiconductor device manufactured by using the method for manufacturing a semiconductor device according to the present invention will be described with reference to FIG.
- the difference between the fifth embodiment and the first embodiment is that the semiconductor device is a top-gate TFT.
- a SiN film 32 and a SiO film 33 are formed on the insulating substrate 31 as a base insulating film, and a semiconductor film 34 is formed in the TFT formation region of the SiO film 33.
- the semiconductor film 34 includes a semiconductor film 34a made of, for example, amorphous Si formed on the SiO film 33, a semiconductor crystal nucleus 34b made of, for example, SiGe formed on the semiconductor film 34a, and, for example, a multi-layer formed on the semiconductor crystal nucleus 34b.
- the semiconductor film 34c is made of crystalline SiGe.
- a gate insulating film 35 and a gate electrode wiring 36 are formed on the semiconductor film 34. Further, contact regions 37 and 38 are formed in the semiconductor layer 34 excluding the lower portion of the gate electrode wiring 36.
- An interlayer insulating layer 39 is deposited on the substrate formed as described above, and contact holes are further opened on the contact regions 37 and 38.
- a source electrode wiring 40 and a drain electrode wiring 41 are buried in these openings.
- a protective insulating film 42 is deposited on these wirings and on the interlayer insulating layer 39, and a contact hole is opened on the drain electrode wiring 41 to form a pixel electrode 43.
- an SiN film 32 and an SiO film 33 that are base insulating films are formed on an insulating substrate 31 made of glass, for example.
- a film formation method a plasma CVD method, a sputtering method, or the like can be used.
- a semiconductor film 34 a to be a part of the TFT semiconductor layer 34 is deposited on the SiO film 33.
- the semiconductor film 34a is preferably an amorphous Si film or a microcrystalline Si film, for example, and the deposition method and conditions may be the same as those used in the semiconductor film 4a shown in the first embodiment.
- a semiconductor crystal nucleus 34b and a semiconductor film 34c are further formed on the semiconductor film 34a as part of the semiconductor layer 34 of the TFT.
- the formation method, film formation conditions, crystal nucleus and film formation process, Ge composition ratio profile, and the like may be the same as those shown in the formation of the semiconductor crystal nucleus 4b and the semiconductor film 4c in the first embodiment.
- the deposited semiconductor layer 34 is processed into an island shape using photolithography.
- a gate insulating film 35 is formed on the SiO film 33 and the semiconductor film 34.
- the material for the film SiO, SiN, or the like is suitable. Films of these materials may be formed by a plasma CVD method, a sputtering method, or the like. Alternatively, plasma oxidation, photooxidation, or the like can be used in combination. Therefore, as the gate insulating film 35, for example, a 100 nm-thickness SiO film formed by a plasma CVD method using TEOS is applied.
- a wiring film is deposited on the gate insulating film 35.
- a metal such as Si, Ge or an alloy thereof, Nb, Mo, W, Ta, Cr, Ti, Fe, Ni or Co, an alloy thereof, or a laminated film thereof. It is. Furthermore, it is also possible to use a low resistance metal such as Al or Cu. These films may be formed by a sputtering method. Therefore, for example, an Nb film having a thickness of 200 nm is applied to the wiring film. Thereafter, the wiring film is processed by photolithography to form a gate electrode wiring pattern 36.
- P or B is implanted into part of the semiconductor layer 34 through the gate insulating film 35 by ion implantation to form contact regions 37 and 38.
- a SiO film or a SiN film is formed as an interlayer insulating layer 39 on the substrate on which the above has been formed by a plasma CVD method or a sputtering method. Therefore, for the interlayer insulating layer 39, for example, a 300 nm-thickness SiO film formed by a plasma CVD method using TEOS is applied.
- a contact hole is opened in the interlayer insulating layer 39 on the contact regions 37 and 38, and a wiring film is deposited inside the opening and on the interlayer insulating layer 39.
- the material of this film it is preferable to select metals such as Nb, Mo, W, Ta, Cr, Ti, Fe, Ni, Co, alloys thereof, and laminated films thereof. Furthermore, it is also possible to use a low resistance metal such as Al or Cu. These films may be formed by a sputtering method. Therefore, for example, a Cr film having a thickness of 200 nm is applied to the wiring film. Thereafter, the wiring film is processed by photolithography to form a source electrode wiring 40 and a drain electrode wiring 41.
- a protective insulating film 42 is formed on the interlayer insulating layer 39, the source electrode wiring 40, and the drain electrode wiring 41.
- a SiN film having a film thickness of 500 nm formed by plasma CVD is applied.
- a contact hole is opened in the protective insulating film 42 on the drain electrode wiring 41, and a wiring film is deposited inside the opening and on the protective insulating film 42.
- a material for this film it is preferable to select a reflective metal film or a transparent conductive film such as ITO, IZO, ZnO or the like. Therefore, a Cr film with a thickness of 100 nm formed by a sputtering method is applied. Thereafter, when this wiring film is processed by photolithography to form the pixel electrode 43, the TFT having the structure shown in FIG. 6 is completed.
- the channel portion is formed in the polycrystalline semiconductor film 34c formed on the surface side of the semiconductor film 34, so that the mobility is high and the threshold voltage variation is small. Easy to realize TFT. Therefore, the manufacturing method of the semiconductor device of the present invention is convenient not only for the production of the top gate type TFT as in this embodiment mode but also the bottom gate type TFT of the first embodiment mode.
- a top gate TFT is formed by the same method as in the fifth embodiment.
- a charge transport layer 70, a light emitting layer 71, and a charge transport layer 72 of the OLED are formed on the pixel electrode 43 by vapor deposition or the like.
- the sealing layer 74 is formed after the upper electrode 73 made of a transparent conductive film is formed by vapor deposition or sputtering, the OLED display device shown in FIG. 8 is completed.
- the threshold voltage variation is reduced.
- the current flowing in the light emitting layer of the OLED is strictly controlled and the luminance variation of each pixel is suppressed. Therefore, the OLED display device of this embodiment can be applied to a large panel and achieve high image quality. Is possible.
- a top gate type TFT is formed by the same method as in the fifth embodiment.
- a transparent conductive film is used as the pixel electrode 43.
- an ITO film is formed by sputtering and processed using photolithography.
- the film thickness is preferably 70 nm.
- an alignment film 120 is formed on the pixel electrode 43.
- a counter substrate 125 in which a color filter layer 121, an overcoat layer 122, a counter electrode 123 made of an ITO film, and an alignment film 124 are formed in this order is bonded to each other with a spacer 126 interposed therebetween.
- liquid crystal 127 is sealed in this, the liquid crystal display device shown in FIG. 9 is completed.
- the TFT formed by the manufacturing method of Embodiment 5 hardly generates an off-leakage current, the leak current is small even when applied to pixel driving of a liquid crystal display, and a high-quality image can be obtained.
- an insulating substrate 81, a SiN film 82 serving as a base insulating film, and a SiO film 83 are formed. Further, a semiconductor film 84 is formed in the TFT formation region of the SiO film 83. Unlike the fourth embodiment, the semiconductor film 84 is composed of, for example, a semiconductor film 84a made of amorphous Si and a semiconductor crystal nucleus made of SiGe, for example. 84b and a semiconductor film 84c made of, for example, polycrystalline Si.
- the pixel electrode 93 is formed in the same manner as the TFT of the fifth embodiment.
- the formation of the SiN film 82 and the SiO film 83 on the insulating substrate 81 may be the same as in the case of the SiN film 32 and the SiO film 33 in the fifth embodiment, and thus description thereof is omitted.
- the formation of the semiconductor film 84a on the next SiO film 83 may use the same material, film quality, formation method and conditions as those of the semiconductor film 34a in the fifth embodiment.
- the semiconductor crystal nuclei 84b may be formed by using the same material, film quality, and formation method as those of the semiconductor crystal nuclei 34b in the fourth embodiment.
- adjacent semiconductor crystal nuclei 84b are in contact with each other as much as possible. It is formed as follows. This is to cope with the formation of a polycrystalline Si film as the semiconductor film 84c.
- the SiGe film is more likely to be selectively grown on a semiconductor polycrystalline film such as a Si film than on an insulating film such as a Si oxide film or a Si nitride film, but the Si film is almost independent of the underlying material. Easy to form a film.
- a semiconductor film 84c is grown on the semiconductor crystal nucleus 84b.
- the film material is preferably polycrystalline Si containing hydrogen, for example.
- the film forming method can also be a thermal CVD method, but a plasma CVD method is suitable.
- the film forming conditions when using the plasma CVD method may be the same as those used when forming the semiconductor film 4a of the first embodiment, for example.
- the materials and conditions of the same steps shown in the fifth embodiment may be used in the same manner from the step of processing the semiconductor layer 84 by photolithography to the formation of the pixel electrode 93. Omitted. Thus, the structure shown in FIG. 10 is obtained.
- the semiconductor film 84c made of polycrystalline Si can be used as the channel portion of the top gate TFT. Since the channel portion is polycrystalline SiGe in the fifth embodiment, this embodiment has an advantage that a leakage current in the semiconductor layer can be easily reduced and a TFT having a good off-current characteristic can be realized. .
- the deposition rate of the polycrystalline film by the reactive thermal CVD method is very slow at 5 nm or less per minute when the substrate temperature is about 450 ° C.
- the film formation rate is about 250 ° C. per minute.
- a high deposition rate of 100 nm or more can be obtained. Therefore, it is possible to significantly improve the throughput in manufacturing the TFT by using the plasma CVD method together as in this embodiment, rather than forming the semiconductor layer formed on the TFT only by the reactive thermal CVD method.
- the application destination may be the formation of a semiconductor layer of the bottom-gate TFT.
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Abstract
Description
図1は、本発明に係る半導体装置の製造方法を用いて作製した半導体装置の実施の形態1を説明する要部断面図である。図1に示した半導体装置は絶縁基板1上に形成したボトムゲート型のTFTである。このTFTは、概略、ゲート電極2の上に設けた半導体膜4と、半導体膜4上にチャネルで離間配置されたソース電極配線6aとドレイン電極配線6bで構成される。以下、この構造を詳しく説明する。
本発明の実施の形態2として、OLEDへの適用例を、図4を用いて説明する。まず、実施の形態1と同様な方法で、ボトムゲート型TFTを形成する。次に、図4に示すように画素電極9上に、OLEDの電荷輸送層10、発光層11、電荷輸送層12を蒸着法などにより形成する。さらに、透明導電膜からなる上部電極13を蒸着やスパッタリング法などで形成してから封止層14を形成すると、図4に示すOLED表示装置が完成する。
本発明の実施の形態3として、液晶表示装置への適用例を、図5を用いて説明する。まず、実施の形態1と同様な方法で、ボトムゲート型TFTを形成する。なお、画素電極9として、透明導電膜を用いている。具体的には、ITO膜をスパッタリング法で形成し、ホトリソグラフィーを用いて加工したものである。膜厚は70nmが好適である。次に、図5に示すように、画素電極9上に配向膜20を形成している。次に、カラーフィルタ層21、オーバーコート層22、ITO膜からなる対向電極23、配向膜24を順番に形成した対向基板25を、スペーサ26を介して張り合わせている。これに液晶27を封入すると、図5に示す液晶表示装置が完成する。
本発明に係る半導体装置の製造方法を用いて作製した半導体装置の実施の形態4を図6によって説明する。実施の形態4が実施の形態1と違う点は、ボトムゲート型TFTに形成している半導体膜の層構成である。
本発明に係る半導体装置の製造方法を用いて作製した半導体装置の実施の形態5を図7によって説明する。実施の形態5が実施の形態1と違う点は、半導体装置がトップゲート型TFTとなっている点である。絶縁基板31上に下地絶縁膜となるSiN膜32とSiO膜33を形成しており、SiO膜33のTFT形成領域には半導体膜34を形成している。この半導体膜34は、SiO膜33上に形成した例えばアモルファスSiから成る半導体膜34aと、半導体膜34a上に形成した例えばSiGeから成る半導体結晶核34bと、半導体結晶核34b上に形成した例えば多結晶SiGeから成る半導体膜34cから構成している。
本発明の実施の形態6として、OLEDへの適用例を、図8を用いて説明する。まず、例えば実施の形態5と同様な方法で、トップゲート型TFTを形成する。次に、図8に示すように、画素電極43上に、OLEDの電荷輸送層70、発光層71、電荷輸送層72を蒸着法などにより形成する。さらに、透明導電膜からなる上部電極73を蒸着やスパッタリング法などで形成してから封止層74を形成すると、図8に示すOLED表示装置が完成する。
本発明の実施の形態7として、液晶表示装置への適用例を、図9を用いて説明する。まず、実施の形態5と同様な方法で、トップゲート型TFTを形成する。なお、画素電極43として透明導電膜を用いている。具体的には、ITO膜をスパッタリング法で形成し、ホトリソグラフィーを用いて加工したものである。膜厚は70nmが好適である。次に、図9に示すように、画素電極43上に配向膜120を形成している。次に、カラーフィルタ層121、オーバーコート層122、ITO膜からなる対向電極123、配向膜124を順番に形成した対向基板125を、スペーサ126を介して張り合わせている。これに液晶127を封入すると、図9に示す液晶表示装置が完成する。
本発明に係る半導体装置の製造方法を用いて作製した半導体装置の別の実施形態を図10によって説明する。実施の形態5と違うのは、トップゲート型TFTに形成している半導体結晶核の形成の仕方と半導体膜の材料である。
2、36、86、102 ゲート電極配線、
3、35、85、103 ゲート絶縁膜、
4、34、84、104 半導体膜、
4a、34a、84a、104a 例えば、アモルファスSiから成る半導体膜、
4b、34b、84b、104b 例えば、SiGeから成る半導体結晶核、
4c、34c、104c 例えば、SiGeから成る半導体膜、
5a、105a ソース領域のn+シリコン膜、
5b、105b ドレイン領域のn+シリコン膜、
6a、40、90、106a ソース電極配線、
6b、41、91、106b ドレイン電極配線、
7、42、92、107 保護絶縁膜、
8、39、89、108 層間絶縁層、
9、43、93、109 画素電極、
10、70 電荷輸送層、
11、71 発光層、
12、72 電荷輸送層、
13、73 上部電極、
14、74 封止層、
20、120 配向膜、
21、121 カラーフィルタ層、
22、122 オーバーコート層、
23、123 対向電極、
24、124 配向膜、
25、125 対向基板、
26、126 スペーサ、
27、127 液晶、
32、82 SiN膜、
33、83 SiO膜、
37、38、87、88 コンタクト領域、
84c 多結晶Siからなる半導体膜、
104d 例えば非晶質Siからなる半導体膜。
Claims (20)
- 絶縁基板上に第1の半導体膜を形成する第1の工程と、
前記第1の半導体膜上の一部に半導体結晶核を形成し、これと共に前記半導体結晶核の発生領域とその周辺を除いて前記第1の半導体膜をエッチング除去する第2の工程と、
前記半導体結晶核をシードとして第2の半導体膜を形成する第3の工程を少なくとも含むことを特徴とする半導体装置の製造方法。 - 前記第1の工程では、前記第1の半導体膜として非晶質シリコン膜または微結晶シリコン膜を形成することを特徴とする請求項1記載の半導体装置の製造方法。
- 前記第2の工程では、前記半導体結晶核として原料ガスにシラン類とハロゲン化ゲルマニウムを用い、形成温度を450°C以下とする反応性熱CVD法によってシリコンゲルマニウム結晶核を形成し、
前記ハロゲン化ゲルマニウムの供給によって前記第1の半導体膜のエッチングを行うことを特徴とする請求項1記載の半導体装置の製造方法。 - 前記第3の工程では、前記第2の半導体膜として、原料ガスにシラン類とハロゲン化ゲルマニウムを用い、
形成温度を450°C以下とする反応性熱CVD法によって多結晶シリコンゲルマニウム膜を形成することを特徴とする請求項1記載の半導体装置の製造方法。 - 前記第3の工程では、前記第2の半導体膜として、多結晶シリコン膜を形成していることを特徴とする請求項1記載の半導体装置の製造方法。
- 前記第2の半導体膜上に第3の半導体膜を形成する第4の工程を含むことを特徴とする請求項1記載の半導体装置の製造方法。
- 前記第4の工程では、前記第3の半導体膜として、プラズマCVD法により非晶質または微結晶、もしくは多結晶からなるシリコン膜を形成することを特徴とする請求項6記載の半導体装置の製造方法。
- 絶縁基板上に、半導体膜、ソース電極、ドレイン電極、ゲート電極を有する半導体装置であって、
前記半導体膜は、前記絶縁膜上の一部に核状に形成された第1の半導体膜と、前記第1の半導体膜上とその周囲に形成された半導体結晶核と、前記半導体結晶核上に形成された第2の半導体膜から成ることを特徴とする半導体装置。 - 前記第1の半導体膜が非晶質シリコン膜、または微結晶シリコン膜から成ることを特徴とする請求項8記載の半導体装置。
- 前記半導体結晶核がシリコンゲルマニウム結晶核からなることを特徴とする請求項8記載の半導体装置。
- 前記第2の半導体膜が多結晶シリコン膜、または多結晶シリコンゲルマニウム膜から成ることを特徴とする請求項8記載の半導体装置。
- 前記第2の半導体膜上に第3の半導体膜を有することを特徴とする請求項8記載の半導体装置。
- 前記第3の半導体膜が非晶質シリコン膜、または微結晶シリコン膜、もしくは多結晶シリコン膜から成ることを特徴とする請求項12記載の半導体装置。
- 第1絶縁基板に形成された複数の画素電極と、この複数の画素電極ごとに当該画素電極上に積層された複数の有機層からなる有機EL層と、この有機EL層を覆い、複数の画素に共通に形成された対向電極と、この対向電極を覆って設置された封止用の第2絶縁膜を備えた表示装置であって、
前記第1絶縁基板上には、半導体膜、ソース電極、ドレイン電極、ゲート電極を備えて、前記画素電極に表示信号を供給する薄膜トランジスタを有しており、
前記半導体膜は、前記第1絶縁膜上の一部に核状に形成された第1の半導体膜と、前記第1の半導体膜上とその周囲に形成された半導体結晶核と、前記半導体結晶核上に形成された第2の半導体膜から成ることを特徴とする表示装置。 - 第1絶縁基板に形成された複数の画素電極と、カラーフィルタ層、オーバーコート層、ITO膜からなる対向電極、配向膜を順に形成した第2絶縁基板と、前記第1絶縁基板と前記第2絶縁基板の貼り合わせ間隙に封入された液晶を有する表示装置であって、
前記第1絶縁基板上には、半導体膜、ソース電極、ドレイン電極、ゲート電極を備えて、前記画素電極に表示信号を供給する薄膜トランジスタを有しており、
前記半導体膜は、前記第1絶縁膜上の一部に核状に形成された第1の半導体膜と、前記第1の半導体膜上とその周囲に形成された半導体結晶核と、前記半導体結晶核上に形成された第2の半導体膜から成ることを特徴とする表示装置。 - 前記第1の半導体膜が非晶質シリコン膜、または微結晶シリコン膜から成ることを特徴とする請求項14記載の表示装置。
- 前記半導体結晶核がシリコンゲルマニウム結晶核からなることを特徴とする請求項14記載の表示装置。
- 前記第2の半導体膜が多結晶シリコン膜、または多結晶シリコンゲルマニウム膜から成ることを特徴とする請求項14記載の表示装置。
- 前記第2の半導体膜上に第3の半導体膜を有することを特徴とする請求項14記載の表示装置。
- 前記第3の半導体膜が非晶質シリコン膜、または微結晶シリコン膜、もしくは多結晶シリコン膜から成ることを特徴とする請求項19記載の表示装置。
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JP2011181539A (ja) * | 2010-02-26 | 2011-09-15 | Hitachi Displays Ltd | 表示装置およびその製造方法 |
JP2012209550A (ja) * | 2011-03-17 | 2012-10-25 | Semiconductor Energy Lab Co Ltd | 微結晶半導体膜、及び半導体装置の作製方法 |
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