WO2009110074A1 - プラズマディスプレイパネルの製造方法、酸化マグネシウム結晶体粉体の製造方法 - Google Patents
プラズマディスプレイパネルの製造方法、酸化マグネシウム結晶体粉体の製造方法 Download PDFInfo
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- WO2009110074A1 WO2009110074A1 PCT/JP2008/053975 JP2008053975W WO2009110074A1 WO 2009110074 A1 WO2009110074 A1 WO 2009110074A1 JP 2008053975 W JP2008053975 W JP 2008053975W WO 2009110074 A1 WO2009110074 A1 WO 2009110074A1
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- magnesium oxide
- oxide crystal
- crystal powder
- display panel
- manufacturing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/40—Layers for protecting or enhancing the electron emission, e.g. MgO layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
Definitions
- the present invention relates to a plasma display panel (PDP) and a manufacturing method thereof, and more particularly to a magnesium oxide crystal powder contained in a priming particle emission layer (electron emission layer) and a technique effective when applied to the manufacturing method. is there.
- PDP plasma display panel
- a priming particle emission layer electron emission layer
- the resolution of PDP is increasing, and the address operation time for selecting and deciding lighting / non-lighting of the display cell increases as the number of pixels increases.
- it is effective to reduce the pulse width of the address discharge voltage (address voltage).
- the pulse width of the address voltage is too small, no discharge may occur even when a pulse is applied. In that case, the display cell does not light correctly during the sustain period, resulting in image quality degradation.
- JP-A-2006-59786 As a means for improving the discharge delay of the PDP, as described in JP-A-2006-59786 (Patent Document 1), so as to be exposed to a discharge space between two opposing substrate structures, There is a technique of providing a magnesium oxide crystal layer as a priming particle emission layer (electron emission layer). JP 2006-59786 A
- the present invention has been made in view of the problems as described above, and its purpose is to provide a technique that makes it possible to achieve both the suppression of aggregation of the heat-treated magnesium oxide crystal powder and the effect of improving the discharge delay. There is to do.
- the PDP manufacturing method manufactures a PDP in which a priming particle emitting layer including magnesium oxide crystal powder that has been heat-treated at high temperature is disposed so as to be exposed to the discharge space.
- the method is characterized in that a high-temperature heat treatment is performed after a pretreatment step for making the shape and size of the particle group of the raw material magnesium oxide crystal powder uniform.
- FIG. 4 is a diagram showing an example of a fusion state when particles (particle groups) are subjected to high-temperature heat treatment.
- FIG. 4A when the shape and size of the particles (particle group) 40 are not uniform during high temperature heating, the contact between the particles (particle group) 40 is increased, and the fusion 41 after high temperature heating is performed. Since the area of the substrate becomes larger, the aggregation becomes stronger.
- FIG. 4B when the shape and size of the particles (particle groups) 40 are uniform, the contact between the particles (particle groups) 40 can be minimized, and after high-temperature heating. The area of the fusion 41 is reduced and aggregation is weakened.
- the magnesium oxide crystal powder before the high-temperature heat treatment of the magnesium oxide crystal powder, if the shape and size of the particles (particle groups) are not uniform, make them uniform to reduce contact between the particles (particle groups). Thus, aggregation due to fusion of particles (particle groups) during high-temperature heat treatment is suppressed.
- the magnesium oxide crystal powder in which aggregation is suppressed for the priming particle emitting layer it is possible to realize a PDP that achieves both improvement in discharge delay and suppression of display defects and display unevenness.
- FIG. 5 is a diagram showing an example of a basic structure of a PDP (panel) 1 according to an embodiment of the present invention.
- FIG. 5 shows a set of display cells (Cr, Cg, Cb) corresponding to pixels.
- the x direction first direction, horizontal direction
- y direction second direction, vertical direction
- z direction third direction, panel surface vertical direction
- the PDP 1 is formed by combining the front substrate structure 10 and the rear substrate structure 20 and has a discharge space 26 therebetween.
- a group of display electrodes 12 (12X, 12Y) is arranged on the front glass substrate 11 in the x direction.
- the display electrode 12 includes a sustain electrode 12X for a sustain operation and a scan electrode 12Y for a sustain operation and a scan operation (shared).
- the display electrode 12 (12X, 12Y) is composed of, for example, a transparent electrode and a bus electrode.
- the display electrode 12 group is covered with a dielectric layer 13.
- a protective layer 14 is further formed on the dielectric layer 13.
- the dielectric layer 13 and the protective layer 14 are formed on the entire surface corresponding to the display area (screen) of the PDP 1.
- a group of address electrodes 22 is arranged on the back glass substrate 21 in the y direction intersecting with the display electrodes 12.
- the group of address electrodes 22 is covered with a dielectric layer 23.
- a partition wall 24 is formed at a position corresponding to between the address electrodes 22 on the dielectric layer 23, for example, in the y direction.
- the barrier ribs 24 divide the discharge space 26 corresponding to the unit light emitting areas (display cells).
- phosphors (phosphor layers) 25 25r, 25g, R) of each color of R (red), G (green), and B (blue) 25b) are formed by color-coding in order for each region (column).
- the internal region formed by bonding the front substrate structure 10 and the back substrate structure 20 is sealed with a discharge gas (for example, a gas in which Ne is mixed with several percent of Xe), thereby being airtight.
- a discharge gas for example, a gas in which Ne is mixed with several percent of Xe
- the discharge space 26 is configured.
- the peripheral part of PDP1 is bonded together with a sealing material.
- a display cell is configured corresponding to the intersection of the sustain electrode 12X, the scan electrode 12Y, and the address electrode 22.
- a discharge is generated by applying a voltage between the address electrode 22 and the scan electrode 12Y in the selected display cell (address operation period).
- a discharge is generated between the pair of display electrodes 12 (12X, 12Y) with respect to the selected display cell (sustain discharge (display discharge)) (sustain operation period).
- light emission is performed in a desired display cell in the subfield.
- the luminance of the pixel is expressed by selecting a subfield to be lit in the field.
- FIG. 6 is a diagram illustrating an example of a cross-sectional configuration of the front substrate structure 10 including the priming particle emitting layer in the PDP 1 according to the embodiment of the present invention.
- the front substrate structure 10 of the PDP 1 has a priming particle emitting layer 15 formed on the surface of the protective layer 14 so as to be exposed to the discharge space 26.
- the priming particle release layer 15 is a magnesium oxide crystal layer containing magnesium oxide (MgO) crystal powder.
- the priming particle emitting layer 15 includes a magnesium oxide crystal powder to which a halogen element such as fluorine (F) is added.
- the magnesium oxide crystal powder is densely or sparsely distributed with respect to the target surface (protective layer 14) (the sparsely distributed layer is also called a layer (film)).
- the display electrode 12 can be composed of, for example, a transparent electrode 12a having a wide width formed of ITO (indium tin oxide) or the like and a bus electrode 12b having a narrow width made of a metal such as Cu or Cr and reducing the electrode resistance.
- the electrode shape is not particularly limited.
- the transparent electrode 12a has a plate shape or a T shape for each display cell, and the bus electrode 12b has a linear shape.
- the display electrode 12 forms a display line by a pair of the adjacent sustain electrode 12X and the scan electrode 12Y.
- an electrode arrangement configuration a normal configuration in which a pair of display electrodes 12 serving as non-discharge regions (reverse slits) is provided, or display electrodes 12 (12X, 12Y) are alternately arranged at equal intervals, and all adjacent display electrodes 12 are arranged.
- a so-called ALIS (Alternate Lighting Surfaces Method) configuration in which a display line is configured by a pair of the above is possible.
- the dielectric layer 13 is formed, for example, by applying a low melting point glass paste on the front glass substrate 11 by screen printing or the like and baking it.
- the protective layer 14 has functions such as protecting the dielectric layer 13 and emitting secondary electrons.
- the protective layer 14 is made of, for example, a metal oxide such as magnesium oxide, calcium oxide, strontium oxide, or barium oxide, and is preferably made of a magnesium oxide layer having a high secondary electron emission coefficient.
- the protective layer 14 is formed by, for example, an electron beam evaporation method (or a sputtering method, a coating method, etc.).
- the back substrate structure 20 can be manufactured using a known technique as follows, for example.
- the rear glass substrate 21, the address electrode 22, the dielectric layer 23, and the like can be manufactured in the same manner as the front substrate structure 10.
- the partition wall 24 can be, for example, a stripe shape only in the y direction, or a box shape having partition walls in the x direction and the y direction.
- the phosphor 25 is formed for each of R, G, and B, for example, by applying a phosphor paste to a region between the barrier ribs 24 by a method such as a screen printing method or a dispenser and baking it.
- the priming particle emitting layer (magnesium oxide crystal layer) 15 is disposed at any location exposed to the discharge space 26 in the substrate structure constituting the PDP 1.
- a configuration directly disposed on the dielectric layer 13 or a configuration disposed on the protective layer 14 on the dielectric layer 13 is possible.
- the front substrate structure 10 is arranged on the protective layer 14.
- the priming particle emitting layer 15 has a priming particle emitting powder material.
- the priming particle emitting powder material is made of magnesium oxide crystal powder (powder) or magnesium oxide crystal powder to which a halogen element is added.
- the kind of halogen element to be added is, for example, one or more of fluorine (F), chlorine, bromine, iodine and the like. In the case of using fluorine, it has been confirmed that the effect of improving the discharge delay lasts for a long time.
- the amount of halogen element added is, for example, 1 to 10,000 ppm.
- the halogen-containing material include magnesium fluoride (MgF 2 ), which is a halide of magnesium, and halides of Al, Li, Mn, Zn, Ca, and Ce.
- Calcination of the substance containing magnesium oxide crystal powder is performed within a range of 1000 to 1700 ° C., for example.
- the particle size after heat treatment of the magnesium oxide crystal powder or the magnesium oxide crystal powder to which a halogen element is added is preferably within a predetermined range (50 nm to 20 ⁇ m). If the particle size is too small, the effect of improving the discharge delay by the priming particle emitting layer 15 is small. On the other hand, if the particle size is too large, the priming particle releasing layer 15 is difficult to be formed uniformly.
- the basic formation method of the priming particle emitting layer 15 is, for example, as follows.
- a paste or slurry (priming particle emitting powder-containing material) prepared by mixing magnesium oxide crystal powder with a solvent (solvent) is prepared.
- This material is deposited on the target surface by a method such as spraying (spreading) or coating.
- a slurry spraying method or a paste spraying method by a printing method can be used.
- the priming particle emitting layer 15 is completed by removing the solvent component or the like by drying or baking the deposited material and fixing the powder component to the target surface.
- the priming particle emitting layer 15 is formed to have a predetermined thickness over the entire target surface (the surface of the protective layer 14).
- the manufacturing method of PDP1 which has the priming particle
- the manufacturing method of PDP 1 of the present embodiment includes a pretreatment step for making the shape and size of the particle groups uniform before heat-treating the raw material powder of the magnesium oxide crystal powder at a high temperature.
- FIG. 1 is a diagram showing an outline of an example of a pretreatment process for making the shape and size of the particle group uniform in the present embodiment
- FIG. 2 is an oxidation including the pretreatment process in the present embodiment
- FIG. 5 is a diagram showing a manufacturing flow of a magnesium crystal powder and a priming particle release layer 15.
- a magnesium oxide (MgO) crystal powder 201 is added to a flux (a substance that lowers the melting point of magnesium oxide).
- Flux a substance that lowers the melting point of magnesium oxide.
- Flux magnesium fluoride
- the state of the raw material powder 103 may be a slurry mixed with a volatile solvent or a mixture of a binder in addition to a dry powder.
- the raw powder 103 is processed as shown in FIG. 1 as a pretreatment step (step S1) for making the shape and size of the particle group uniform.
- a substrate 101 having a plurality of concave holes 102 on the surface is prepared.
- the size (width and depth of the opening) of the concave hole 102 is 1 ⁇ m to 100 ⁇ m, although it depends on the particle size distribution of the powder after heat treatment, the design of the upper limit of allowable aggregation, the heat treatment conditions, the size of the display cell, etc. It is desirable.
- the material of the substrate 101 is not particularly limited, but metal, glass, resin, or the like can be used. In the present embodiment, it is assumed that a concave hole 102 having an opening width of 50 ⁇ m and a depth of 25 ⁇ m is formed on the surface of a flat substrate 101 made of glass by a sandblast method.
- the substrate 101 may be other than a flat plate, such as a roll.
- the shape of the concave hole 102 is illustrated as a hemispherical shape in FIG. 1, it is not particularly limited to this.
- the raw material powder 103 is filled in the concave hole 102 on the substrate 101 by using a squeegee 104 or the like. Thereafter, by turning the substrate 101 upside down and applying vibrations or the like, a particle group 105 made of the raw material powder 103 that is uniformly shaped into the shape and size of the concave hole 102 is obtained.
- the obtained particle group 105 is collected in a high-temperature heating tray, and a high-temperature heat treatment (step S2) in FIG. 2 is performed.
- a drying process is performed before collection
- care is taken not to apply vibration, pressure, or the like to the obtained particle group 105 from after collection until high-temperature heat treatment.
- the heat-treated magnesium oxide crystal powder 203 is mixed at a rate of 2 g (2 g / L) with respect to 1 L of IPA (isopropyl alcohol) as the solvent 204 (step S3) to obtain a slurry 205.
- IPA isopropyl alcohol
- the slurry 205 is sprayed on the surface (target surface) of the front substrate structure 10 on which the protective layer 14 (magnesium oxide layer) in FIG.
- the layer (film) is formed by spraying or coating.
- release layer 15 is completed by drying the said layer (slurry 205) by heating (solvent component removal etc.) (process S4).
- the amount of formation (application) of the slurry 205 is set to 2 g / m 2 .
- the shape and size of the particle group 105 made of the magnesium oxide crystal powder 201 are made uniform by including the pretreatment step (step S1).
- the magnesium oxide crystal powder 203 in which aggregation is suppressed can be obtained without impairing the effect of improving the discharge delay. .
- the priming particle emitting layer 15 including the magnesium oxide crystal powder 203 it is possible to realize a PDP 1 that achieves both improvement in discharge delay and suppression of display defects and display unevenness.
- FIG. 3 is a diagram showing an outline of an example of a pretreatment step (step S1) for making the shape and size of the particle group uniform in the present embodiment.
- a substrate 101 having a plurality of through holes 106 on the surface is prepared.
- the size of the through-hole 106 depends on the particle size distribution of the heat-treated powder, the design of the upper limit of allowable aggregation, the heat treatment conditions, the size of the display cell, etc., but 1 ⁇ m to 100 ⁇ m It is desirable that
- the material of the substrate 101 is not particularly limited, but metal, glass, resin, or the like can be used.
- the substrate 101 may have a plate shape or a shape in which a wire or the like is knitted. In this embodiment, it is assumed that the substrate 101 is knitted with a SUS wire so that the width of the opening is 50 ⁇ m.
- the shape of the through-hole 106 is illustrated as a cylindrical shape in FIG. 3, it is not particularly limited thereto.
- the raw material powder 103 is pushed into the through hole 106 of the substrate 101 with a constant pressure using a squeegee 104 or the like, and is passed through the through hole 106.
- the raw material powder 103 is the same as that in Embodiment 1.
- the state of the raw material powder 103 may be a slurry mixed with a volatile solvent or a mixture of a binder in addition to a dry powder.
- the pretreatment step includes the particle group 105 made of the magnesium oxide crystal powder 201.
- Magnesium oxide crystals that can be made uniform in shape and size and have reduced aggregation without impairing the effect of improving discharge delay by reducing the contact between the particle groups 105 during the high-temperature heat treatment (step S2) Powder 203 can be obtained.
- the present invention can be used for a PDP and a manufacturing method thereof.
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Abstract
Description
本発明の一実施の形態であるPDPの製造方法では、プライミング粒子放出層において、上述した課題である、熱処理した酸化マグネシウム結晶体の凝集抑制と、放電遅れ改善効果との両立を実現させるため、酸化マグネシウム結晶体粉体の熱処理工程において、熱処理を行う前に、原料の酸化マグネシウム結晶体粉体の粒子群の形状、サイズを均一にすることで、高温加熱処理時の粒子群同士の接触を少なくする。
図5は、本発明の一実施の形態であるPDP(パネル)1の基本構造の一例を示した図である。図5では、画素に対応する表示セルのセット(Cr、Cg、Cb)の部分を示している。なお、説明のために、x方向(第1方向、横方向)、y方向(第2方向、縦方向)、z方向(第3方向、パネル面垂直方向)を図示している。
図6は、本発明の一実施の形態のPDP1における、プライミング粒子放出層を含む前面基板構造体10の断面構成の例を示した図である。PDP1の前面基板構造体10は、保護層14の表面に、放電空間26に露出して形成されるプライミング粒子放出層15を有する。プライミング粒子放出層15は、酸化マグネシウム(MgO)結晶体粉体を含んでなる酸化マグネシウム結晶体層である。あるいは、プライミング粒子放出層15は、フッ素(F)等のハロゲン元素が添加された酸化マグネシウム結晶体粉体を含んでなる。なお、プライミング粒子放出層15では、対象面(保護層14)に対し、酸化マグネシウム結晶体粉体が、密あるいは疎に分布する(なお、疎に分布する場合も層(膜)と称する)。
プライミング粒子放出層(酸化マグネシウム結晶体層)15は、PDP1を構成する基板構造体において、放電空間26に露出するいずれかの箇所に配置される。例えば、誘電体層13上に直接配置する構成、あるいは、誘電体層13上の保護層14上に配置する構成などが可能である。本実施の形態では、図6に示すように、前面基板構造体10において、保護層14上に配置する構成とする。放電空間26に露出してプライミング粒子放出層15が配置される構成とすることにより、プライミング粒子放出層15(これを構成する酸化マグネシウム結晶体粉体)により、放電空間26にプライミング粒子を放出する機能、およびPDP1での放電遅れが改善される効果などが得られる。
以下に、本発明の実施の形態1である酸化マグネシウム結晶体粉体およびこの酸化マグネシウム結晶体粉体を含むプライミング粒子放出層15を有するPDP1の製造方法について説明する。本実施の形態のPDP1の製造方法は、酸化マグネシウム結晶体粉体の原料粉末を高温加熱処理する前に、粒子群同士の形状、サイズを均一にする前処理工程を有するものである。
本発明の実施の形態2である酸化マグネシウム結晶体粉体およびこの酸化マグネシウム結晶体粉体を含むプライミング粒子放出層15を有するPDP1の製造方法は、実施の形態1の図2に示す酸化マグネシウム結晶体粉体203およびプライミング粒子放出層15の製造フローにおける、原料粉末103の粒子群の形状、サイズを均一にする前処理工程(工程S1)において、別な手段を用いるものである。他の工程の処理内容等は実施の形態1と同様である。
Claims (11)
- 対向配置された2つの基板構造体間の放電空間に露出するように、高温加熱処理された酸化マグネシウム結晶体粉体を含むプライミング粒子放出層が配置されたプラズマディスプレイパネルの製造方法であって、
前記酸化マグネシウム結晶体粉体に前記高温加熱処理を行う前に、前記酸化マグネシウム結晶体粉体の複数の粒子からなる粒子群の形状、サイズを均一にする前処理工程を有することを特徴とするプラズマディスプレイパネルの製造方法。 - 請求項1に記載のプラズマディスプレイパネルの製造方法において、
前記前処理工程では、基板上に設けた凹状孔に前記酸化マグネシウム結晶体粉体を充填して成型することにより、前記酸化マグネシウム結晶体粉体の複数の粒子からなる粒子群の形状、サイズを均一にすることを特徴とするプラズマディスプレイパネルの製造方法。 - 請求項2に記載のプラズマディスプレイパネルの製造方法において、
前記凹状孔のサイズが1~100μmであることを特徴とするプラズマディスプレイパネルの製造方法。 - 請求項1に記載のプラズマディスプレイパネルの製造方法において、
前記前処理工程では、基板上に設けた貫通孔に前記酸化マグネシウム結晶体粉体を押し込んで通過させることにより、前記酸化マグネシウム結晶体粉体の複数の粒子からなる粒子群の形状、サイズを均一にすることを特徴とするプラズマディスプレイパネルの製造方法。 - 請求項4に記載のプラズマディスプレイパネルの製造方法において、
前記貫通孔のサイズが1~100μmであることを特徴とするプラズマディスプレイパネルの製造方法。 - 対向配置された2つの基板構造体間の放電空間に露出するように、高温加熱処理された酸化マグネシウム結晶体粉体を含むプライミング粒子放出層が配置されたプラズマディスプレイパネルの製造方法であって、
前記酸化マグネシウム結晶体粉体に前記高温加熱処理を行う際に、前記酸化マグネシウム結晶体粉体の粒子もしくは複数の粒子からなる粒子群の形状、サイズが均一であるものを用いることを特徴とするプラズマディスプレイパネルの製造方法。 - プラズマディスプレイパネルにおける、対向配置された2つの基板構造体間の放電空間に露出するように配置されたプライミング粒子放出層に含まれる、高温加熱処理された酸化マグネシウム結晶体粉体の製造方法であって、
前記酸化マグネシウム結晶体粉体に前記高温加熱処理を行う前に、前記酸化マグネシウム結晶体粉体の複数の粒子からなる粒子群の形状、サイズを均一にする前処理工程を有することを特徴とする酸化マグネシウム結晶体粉体の製造方法。 - 請求項7に記載の酸化マグネシウム結晶体粉体の製造方法において、
前記前処理工程では、基板上に設けた凹状孔に前記酸化マグネシウム結晶体粉体を充填して成型することにより、前記酸化マグネシウム結晶体粉体の複数の粒子からなる粒子群の形状、サイズを均一にすることを特徴とする酸化マグネシウム結晶体粉体の製造方法。 - 請求項8に記載の酸化マグネシウム結晶体粉体の製造方法において、
前記凹状孔のサイズが1~100μmであることを特徴とする酸化マグネシウム結晶体粉体の製造方法。 - 請求項7に記載の酸化マグネシウム結晶体粉体の製造方法において、
前記前処理工程では、基板上に設けた貫通孔に前記酸化マグネシウム結晶体粉体を押し込んで通過させることにより、前記酸化マグネシウム結晶体粉体の複数の粒子からなる粒子群の形状、サイズを均一にすることを特徴とする酸化マグネシウム結晶体粉体の製造方法。 - 請求項10に記載の酸化マグネシウム結晶体粉体の製造方法において、
前記貫通孔のサイズが1~100μmであることを特徴とする酸化マグネシウム結晶体粉体の製造方法。
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KR1020107015555A KR101106830B1 (ko) | 2008-03-05 | 2008-03-05 | 플라즈마 디스플레이 패널의 제조 방법, 산화 마그네슘 결정체 분체의 제조 방법 |
JP2010501719A JP4961495B2 (ja) | 2008-03-05 | 2008-03-05 | プラズマディスプレイパネルの製造方法、酸化マグネシウム結晶体粉体の製造方法 |
CN200880125140.4A CN101919019B (zh) | 2008-03-05 | 2008-03-05 | 等离子体显示面板的制造方法、氧化镁晶体粉体的制造方法 |
PCT/JP2008/053975 WO2009110074A1 (ja) | 2008-03-05 | 2008-03-05 | プラズマディスプレイパネルの製造方法、酸化マグネシウム結晶体粉体の製造方法 |
US12/863,613 US20110018169A1 (en) | 2008-03-05 | 2008-03-05 | Method of manufacturing plasma display panel and method of producing magnesium oxide crystal powder |
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PCT/JP2008/053975 WO2009110074A1 (ja) | 2008-03-05 | 2008-03-05 | プラズマディスプレイパネルの製造方法、酸化マグネシウム結晶体粉体の製造方法 |
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US (1) | US20110018169A1 (ja) |
JP (1) | JP4961495B2 (ja) |
KR (1) | KR101106830B1 (ja) |
CN (1) | CN101919019B (ja) |
WO (1) | WO2009110074A1 (ja) |
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EP2980972A1 (en) | 2014-07-31 | 2016-02-03 | Nxp B.V. | Charge pump for negative voltage generation |
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JP2007254269A (ja) * | 2006-02-21 | 2007-10-04 | Ube Material Industries Ltd | フッ素含有酸化マグネシウム粉末及びその製造方法 |
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JP2008053012A (ja) * | 2006-08-23 | 2008-03-06 | Fujitsu Hitachi Plasma Display Ltd | プラズマディスプレイパネル用基板構体の製造方法、プラズマディスプレイパネル |
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AU2001296702A1 (en) * | 2000-10-16 | 2002-04-29 | 3M Innovative Properties Company | Method of making ceramic aggregate particles |
US6521004B1 (en) * | 2000-10-16 | 2003-02-18 | 3M Innovative Properties Company | Method of making an abrasive agglomerate particle |
US8256091B2 (en) * | 2000-11-17 | 2012-09-04 | Duescher Wayne O | Equal sized spherical beads |
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2008
- 2008-03-05 CN CN200880125140.4A patent/CN101919019B/zh not_active Expired - Fee Related
- 2008-03-05 WO PCT/JP2008/053975 patent/WO2009110074A1/ja active Application Filing
- 2008-03-05 KR KR1020107015555A patent/KR101106830B1/ko not_active IP Right Cessation
- 2008-03-05 JP JP2010501719A patent/JP4961495B2/ja not_active Expired - Fee Related
- 2008-03-05 US US12/863,613 patent/US20110018169A1/en not_active Abandoned
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JP2007128891A (ja) * | 2005-11-01 | 2007-05-24 | Lg Electronics Inc | プラズマディスプレイパネル及びその製造方法 |
JP2007254269A (ja) * | 2006-02-21 | 2007-10-04 | Ube Material Industries Ltd | フッ素含有酸化マグネシウム粉末及びその製造方法 |
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Also Published As
Publication number | Publication date |
---|---|
KR20100090724A (ko) | 2010-08-16 |
CN101919019A (zh) | 2010-12-15 |
US20110018169A1 (en) | 2011-01-27 |
JPWO2009110074A1 (ja) | 2011-07-14 |
CN101919019B (zh) | 2013-02-13 |
JP4961495B2 (ja) | 2012-06-27 |
KR101106830B1 (ko) | 2012-01-19 |
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