WO2009107550A1 - 搬送ロボット - Google Patents
搬送ロボット Download PDFInfo
- Publication number
- WO2009107550A1 WO2009107550A1 PCT/JP2009/052963 JP2009052963W WO2009107550A1 WO 2009107550 A1 WO2009107550 A1 WO 2009107550A1 JP 2009052963 W JP2009052963 W JP 2009052963W WO 2009107550 A1 WO2009107550 A1 WO 2009107550A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- hand
- wafer
- arm
- grip
- workpiece
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/10—Programme-controlled manipulators characterised by positioning means for manipulator elements
- B25J9/106—Programme-controlled manipulators characterised by positioning means for manipulator elements with articulated links
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T74/00—Machine element or mechanism
- Y10T74/20—Control lever and linkage systems
- Y10T74/20207—Multiple controlling elements for single controlled element
- Y10T74/20305—Robotic arm
- Y10T74/20329—Joint between elements
Definitions
- the present invention relates to a transfer robot configured to transfer a work between a work cassette having a plurality of work storage slots and a work stage preceding the process apparatus.
- EFEM Equipment Front End Module
- EFEM Equipment Front End Module
- a transfer robot that transfers the wafer between the wafer cassette and the wafer stage in the previous stage of the process apparatus is provided.
- the transfer robot is required to transfer the wafer between the wafer cassette and the wafer stage without damaging the wafer.
- various attempts have been made to increase the speed of wafer conveyance. For example, among conventional transfer robots, there are many that increase the speed by mounting a plurality of arms (for example, see Patent Document 1). JP 2002-158272 A
- the wafer replacement operation becomes faster.
- the transfer of the transfer robot by 180 degrees is inevitably involved when the wafer is transferred from the wafer cassette to the wafer stage. If the turning operation of the transfer robot can be efficiently eliminated, it can be expected that the transfer of the wafer between the wafer cassette and the wafer stage can be speeded up, the configuration of the transfer robot can be simplified, and the space of the transfer robot can be saved.
- An object of the present invention is to provide a transfer robot capable of efficiently transferring a work between a work cassette and a work stage without involving a turning motion.
- the transfer robot according to the present invention is configured to transfer a work between a work cassette having a plurality of work storage slots and a work stage in the previous stage of the process apparatus.
- a work cassette is a wafer cassette such as FOUP (Front Opening Unified Unified Pod).
- An example of the work stage is a wafer stage such as a wafer delivery stage.
- This transfer robot includes a main body, a first arm, and a second arm.
- the first arm is movably supported by the main body, and is configured to be able to reciprocate between the work cassette and the upper position of the main body.
- the first arm includes a first hand having a plurality of grip portions configured to grip a workpiece.
- the second arm is movably supported by the main body and is configured to be able to reciprocate between the upper position of the main body and the work stage.
- the second arm includes a second hand having a plurality of grip portions configured to grip a workpiece from an angle different from that of the first hand.
- the first hand grips the workpiece from the front-rear direction
- the second hand grips the workpiece from the lateral direction orthogonal to the front-rear direction or from the direction oblique to the front-rear direction. Gripping.
- the second hand is arranged above or below the first hand. If the first hand is configured to grip the workpiece from below, the second hand is preferably disposed above the first hand, and if the first hand is configured to grip the workpiece from above.
- the second hand is preferably arranged below the first hand.
- the grip portion in the first hand and the grip portion in the second hand are configured to be arranged at the same height.
- the same height is intended to overlap in the height direction to such an extent that a workpiece placed at a certain height can be gripped at the same time. It is not essential to match the heights of at least one of the upper end and the lower end of the grip portion of the hand.
- the workpiece can be transferred from the first arm to the second arm at a position above the main body.
- the work is transferred from the work cassette to the work stage and the work is transferred from the work stage to the work cassette without the rotation of the robot. It becomes possible.
- the one that grips the workpiece from the workpiece stage side is configured to be retractable in the direction opposite to the second hand from the workpiece placement surface of the first hand. It is preferable. This is because the grip portion and the workpiece do not interfere with each other even if the height of the second hand is not changed after the workpiece is transferred from the first hand to the second hand.
- FIG. 1 is a diagram showing an outline of a transfer robot 10 according to an embodiment of the present invention.
- the transfer robot 10 is arranged in the EFEM and configured to transfer a wafer (workpiece) between a wafer cassette such as FOUP (Front Opening Unified Unified Pod) and a process apparatus.
- the transfer robot 10 is arranged on a rail that can be moved up and down so as to be reciprocally movable.
- the present invention can also be applied to a case where the robot is fixedly arranged.
- the transfer robot 10 includes a main body 12, a first arm 18, and a second arm 16.
- the main body 12 is configured to movably support the first arm 18 and the second arm 16.
- the first arm 18 is configured to be accessible to the wafer cassette. Specifically, the first arm is configured to be capable of reciprocating at least between the wafer cassette and a position directly above the main body 12.
- the first arm 18 includes a first hand 182 for holding the wafer 100.
- the first hand 182 is, as a rule, arranged so that the tip of the first hand 182 faces the wafer cassette.
- the second arm 16 is configured to be accessible to the wafer stage. Specifically, the first arm is configured to be able to reciprocate at least between the wafer stage and a position directly above the main body 12.
- the second arm 16 has a second hand 162 that can hold a position different from the first hand 182 on the wafer.
- the second hand 162 is arranged so that the tip of the second hand 162 faces the wafer stage.
- the first hand 182 includes a gripping drive unit 56, a gripping claw 185A connected to the gripping drive unit 56 via a connection plate 189, and a grip connected to the gripping drive unit 56 via a connection plate (not shown). Claws 185B and 185C are provided.
- the first gripping drive unit 56 is configured to supply a necessary driving force to the gripping claws 185A to 185C in the first hand 182. Specifically, the grip driving unit 56 operates the grip claws 185A to 185C by pulling or pushing the connecting plate. As a result, the wafer 100 is selectively gripped by the gripping claws 185A to 185C.
- the gripping claws 185B and 185C do not necessarily need to move, and may be fixed to the first hand 182. In this case, the above-described connecting plate that connects the gripping drive unit 56 and the gripping claws 185B and 185C becomes unnecessary.
- the first hand 182 includes a concave portion 187 that is inclined so that its bottom surface becomes lower as it approaches the grip driving unit 56.
- the intent of providing the recess 187 is to allow the gripping claws 185A to escape below the wafer placement surface 183.
- the gripping claw 185A when the gripping claw 185A is closest to the gripping drive unit 56 side, the gripping claw 185A is disposed below the wafer placement surface 183.
- the second hand 162 includes two grip pieces 165A and 165B, support portions 168A and 168B that support the grip pieces 165A and 165B, respectively, and a second grip drive unit 60.
- the second gripping drive unit 60 is configured to supply a necessary driving force to the gripping pieces 165A to 165B.
- the support portions 168A and 168B are rotatable, and the support portions 168A and 168B rotate by a small angle by the driving force from the second gripping drive portion 60. As a result, the wafer 100 is selectively gripped by the gripping pieces 165A to 165B.
- the wafer 100 is gripped from the front and back by the gripping claws 185A to 185C, and the wafer 100 is gripped from the left and right by the gripping pieces 165A to 165B.
- the main reason is to smoothly transfer the wafer 100 from the first hand 182 to the second hand 162, which will be described later.
- FIG. 4 is a block diagram showing an outline of the transfer robot 10.
- the transfer robot 10 includes at least a CPU 50, a ROM 54, a RAM 52, a first drive unit 58, a first grip drive unit 56, a second drive unit 62, and a second grip drive unit 60. Prepare.
- the ROM 54 stores a plurality of programs necessary for the operation of the CPU 50.
- the RAM 52 is a memory that can be directly accessed by the CPU 50, and is used for temporarily storing data.
- the first driving unit 58 includes at least one motor and is configured to supply a necessary driving force to the first arm 18.
- the second driving unit 62 includes at least one motor and is configured to supply a necessary driving force to the second arm 16.
- Examples of drive mechanisms employed in the first gripping drive unit 56 and the second gripping drive unit 60 include a drive mechanism using a fluid pressure cylinder, a drive mechanism using an electromagnet, a drive mechanism using a small motor, and the like. Is mentioned.
- CPU50 controls each part of the conveyance robot 10 based on the program stored in ROM54. For example, the CPU 50 takes out the wafer 100 from the wafer cassette by the first hand 182, delivers the wafer 100 from the first hand 182 to the second hand 162 above the main body 12, and the second hand 162. Thus, the control of the operation of transporting the wafer 100 to the wafer stage is executed.
- FIG. 5A shows a state where the first arm 18 has taken out the wafer 100 from the wafer cassette. From this state, the first arm 18 moves in the direction of the wafer stage (the direction indicated by the arrow 200). At this time, the second hand 162 stands by with the gripping pieces 165A and 165B open at a position above the main body 12.
- FIG. 5B shows a state in which the first hand 182 has passed under the second hand 162 and has reached a position directly above the main body 12.
- the second hand 162 holds the wafer 100 by closing the holding pieces 165A and 165B.
- the gripping claws 185A to 185C release the gripping state of the wafer 100.
- the second hand 162 carries the wafer 100 to the wafer stage.
- the gripping claws 185 ⁇ / b> A are retracted below the wafer placement surface 183, the gripping claws 185 ⁇ / b> A do not become an obstacle to the conveyance of the wafer 100.
- the wafer 100 can be transferred at the same height without the first arm 18 moving up and down.
- the configuration in which the first arm 18 and the second arm 16 are moved up and down independently is adopted and the relative height of the first arm 18 and the second arm 16 can be adjusted, Therefore, it is not necessary to retract the gripping claws 185A below the wafer placement surface 183.
- the arms of the double arm type transfer robot 10 are dedicated to the wafer cassette and the wafer stage, respectively, so that it is not necessary to cause the transfer robot 10 to rotate (axis). For this reason, it is not necessary to mount a configuration for the turning (axis) operation, and it is not necessary to secure a space necessary for the turning (axis) operation.
- the second hand 162 dedicated for the wafer stage grips the wafer 100 from the lateral direction instead of the front-rear direction, the work on the wafer stage becomes efficient. For example, after the wafer 100 is brought into the wafer stage and the wafer 100 is placed on the wafer stage, the processed wafer on the other stage is held and taken back by performing only slight elevation, and delivered to the first hand 182. It can be stored in a wafer cassette. This series of operations cannot be performed when a general-purpose hand that holds the wafer 100 from the front and rear directions is used for the wafer stage, and can be obtained only by using the second hand 162 for the wafer stage. It can be said. In short, by using the second hand 162 for the wafer stage, the work replacement time on the wafer stage can be shortened. It is also possible to execute an alignment process on the wafer stage by mounting an aligner on the wafer stage.
- the configuration of the gripping claws 185A is not limited to this.
- a configuration in which the gripping claws 185A are selectively raised is adopted, or the gripping claws 185A are supported so as to be movable up and down so that the gripping claws 185A selectively protrude above the wafer placement surface 183. Is possible.
- FIG. 7 is an external perspective view of the transfer robot 300.
- FIGS. 8A and 8B show the relative positional relationship between the transfer robot 300, the wafer cassette 302, and the process apparatus 304 (or wafer stage). Yes.
- the transfer robot 300 is different in appearance from the transfer robot 10 according to the previous embodiment, but the basic configuration is the same. For this reason, description of the basic configuration of the transfer robot 300 is omitted.
- the transfer robot 300 is arranged in the EFEM and configured to transfer the wafer 100 between the wafer cassette 302 and the process apparatus 304 (or wafer stage).
- the transfer robot 300 is arranged so as to be able to reciprocate on a rail that can be raised and lowered (not shown).
- the transfer robot 300 includes a first arm 318 configured to be accessible to the wafer cassette 302 and a second arm 316 configured to be accessible to the process apparatus 304 (or wafer stage). As shown in FIG. 8, the configuration and operation of the first arm 318 and the second arm 316 are the same as those of the first arm 18 and the second arm 16 in the previous embodiment (see FIG. 5). Description is omitted.
- the first arm 318 also employs a retractable gripping claw 320 similar to the gripping claw 185A of the previous embodiment.
- the transfer robot (10, 300) can be appropriately changed in specifications such as outer shape and dimensions according to the space in the EFEM.
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- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Abstract
Description
16-第2のアーム
18-第1のアーム
162-第2のハンド
165A、165B-把持片
182-第1のハンド
185A~185C-把持爪
Claims (4)
- 複数のワーク収納用スロットを備えたワークカセットと、プロセス装置の前段のワークステージとの間におけるワークの搬送を行うように構成された搬送ロボットであって、
本体と、
前記本体に移動自在に支持されており、前記ワークカセットと前記本体の上方位置との間で往復移動可能に構成された第1のアームと、
前記本体に移動自在に支持されており、前記本体の上方位置と前記ワークステージとの間で往復移動可能に構成された第2のアームと、
を備え、
前記第1のアームは、ワークを把持するように構成された複数の把持部を有する第1のハンドを備え、
前記第2のアームは、第1のハンドとは異なる角度からワークを把持するように構成された複数の把持部を有するとともに、前記第1のハンドよりも上方または下方に配置された第2のハンドを備え、かつ
前記第1のハンドにおける把持部と前記第2のハンドにおける把持部とが互いに同じ高さに配置されるように構成された
搬送ロボット。 - 前記第1のハンドの複数の把持部における前記ワークステージ側からワークを把持する把持部は、前記第1のハンドのワーク載置面よりも前記第2のハンドとは反対方向に退避可能に構成される請求項1に記載の搬送ロボット。
- 前記第1のハンドにおける把持部は、前記第1のハンドの移動方向に平行な方向の両側からワークを把持するように構成されており、
前記第2のハンドにおける把持部は、前記第2のハンドの移動方向に直角な方向の両側からワークを把持するように構成される請求項1に記載の搬送ロボット。 - 前記第1のハンドにおける把持部は、前記第1のハンドの移動方向に平行な方向の両側からワークを把持するように構成されており、
前記第2のハンドにおける把持部は、前記第2のハンドの移動方向に直角な方向の両側からワークを把持するように構成される請求項2に記載の搬送ロボット。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020107020008A KR101182378B1 (ko) | 2008-02-27 | 2009-02-20 | 반송 로봇 |
US12/866,910 US8459928B2 (en) | 2008-02-27 | 2009-02-20 | Conveyor robot |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008-046337 | 2008-02-27 | ||
JP2008046337A JP4511605B2 (ja) | 2008-02-27 | 2008-02-27 | 搬送ロボット |
Publications (1)
Publication Number | Publication Date |
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WO2009107550A1 true WO2009107550A1 (ja) | 2009-09-03 |
Family
ID=41015947
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2009/052963 WO2009107550A1 (ja) | 2008-02-27 | 2009-02-20 | 搬送ロボット |
Country Status (5)
Country | Link |
---|---|
US (1) | US8459928B2 (ja) |
JP (1) | JP4511605B2 (ja) |
KR (1) | KR101182378B1 (ja) |
TW (1) | TW200946301A (ja) |
WO (1) | WO2009107550A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109585349A (zh) * | 2018-11-23 | 2019-04-05 | 中国电子科技集团公司第五十五研究所 | 一种晶圆传输平台、高压剥离机及其工作方法 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5187048B2 (ja) * | 2008-07-29 | 2013-04-24 | 株式会社安川電機 | ハンドリングシステム |
JP5279554B2 (ja) * | 2009-03-05 | 2013-09-04 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP5403120B2 (ja) * | 2012-07-25 | 2014-01-29 | 株式会社安川電機 | ハンドリング方法 |
JP6024267B2 (ja) * | 2012-08-01 | 2016-11-16 | 三星ダイヤモンド工業株式会社 | 基板保持リング把持機構 |
US9079304B2 (en) * | 2012-10-31 | 2015-07-14 | Semes Co., Ltd. | Transfer unit, method for controlling the transfer unit, and apparatus and method for treating substrate using the transfer unit |
US9682848B2 (en) * | 2013-11-19 | 2017-06-20 | Core Laboratories Lp | System and method for a self-contained lifting device |
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JPH0778859A (ja) * | 1993-09-06 | 1995-03-20 | Dainippon Screen Mfg Co Ltd | 基板搬送装置 |
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KR0152324B1 (ko) * | 1994-12-06 | 1998-12-01 | 양승택 | 웨이퍼 측면파지 이송 반도체 제조장치 |
US6183183B1 (en) * | 1997-01-16 | 2001-02-06 | Asm America, Inc. | Dual arm linear hand-off wafer transfer assembly |
JP3778677B2 (ja) * | 1997-12-01 | 2006-05-24 | 大日本スクリーン製造株式会社 | 基板処理装置 |
US6155768A (en) * | 1998-01-30 | 2000-12-05 | Kensington Laboratories, Inc. | Multiple link robot arm system implemented with offset end effectors to provide extended reach and enhanced throughput |
JP2002076094A (ja) * | 2000-08-31 | 2002-03-15 | Daikin Ind Ltd | 基板搬送装置 |
JP2002158272A (ja) | 2000-11-17 | 2002-05-31 | Tatsumo Kk | ダブルアーム基板搬送装置 |
US6592324B2 (en) * | 2001-02-26 | 2003-07-15 | Irm, Llc | Gripper mechanism |
US20030035711A1 (en) * | 2001-07-14 | 2003-02-20 | Ulysses Gilchrist | Centering double side edge grip end effector with integrated mapping sensor |
JP4575792B2 (ja) * | 2005-01-25 | 2010-11-04 | 株式会社ジェーイーエル | 基板保持装置 |
JP2008108991A (ja) * | 2006-10-27 | 2008-05-08 | Daihen Corp | ワーク保持機構 |
-
2008
- 2008-02-27 JP JP2008046337A patent/JP4511605B2/ja active Active
-
2009
- 2009-02-20 KR KR1020107020008A patent/KR101182378B1/ko active IP Right Grant
- 2009-02-20 US US12/866,910 patent/US8459928B2/en active Active
- 2009-02-20 WO PCT/JP2009/052963 patent/WO2009107550A1/ja active Application Filing
- 2009-02-24 TW TW098105744A patent/TW200946301A/zh unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0778859A (ja) * | 1993-09-06 | 1995-03-20 | Dainippon Screen Mfg Co Ltd | 基板搬送装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109585349A (zh) * | 2018-11-23 | 2019-04-05 | 中国电子科技集团公司第五十五研究所 | 一种晶圆传输平台、高压剥离机及其工作方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2009206264A (ja) | 2009-09-10 |
KR20100105905A (ko) | 2010-09-30 |
TW200946301A (en) | 2009-11-16 |
US20100322745A1 (en) | 2010-12-23 |
US8459928B2 (en) | 2013-06-11 |
JP4511605B2 (ja) | 2010-07-28 |
KR101182378B1 (ko) | 2012-09-12 |
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