WO2009096217A1 - Procédé de production d'un substrat pour support d'enregistrement magnétique et support d'enregistrement magnétique - Google Patents

Procédé de production d'un substrat pour support d'enregistrement magnétique et support d'enregistrement magnétique Download PDF

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Publication number
WO2009096217A1
WO2009096217A1 PCT/JP2009/050293 JP2009050293W WO2009096217A1 WO 2009096217 A1 WO2009096217 A1 WO 2009096217A1 JP 2009050293 W JP2009050293 W JP 2009050293W WO 2009096217 A1 WO2009096217 A1 WO 2009096217A1
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WIPO (PCT)
Prior art keywords
substrate
magnetic recording
recording medium
oxide film
metal oxide
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PCT/JP2009/050293
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English (en)
Japanese (ja)
Inventor
Motohiro Yamada
Hideki Kawai
Masahiro Morikawa
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Konica Minolta Opto, Inc.
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Priority to JP2009551451A priority Critical patent/JP5440180B2/ja
Publication of WO2009096217A1 publication Critical patent/WO2009096217A1/fr

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73917—Metallic substrates, i.e. elemental metal or metal alloy substrates
    • G11B5/73919—Aluminium or titanium elemental or alloy substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates

Definitions

  • the present invention relates to a method for manufacturing a magnetic recording medium substrate used in a magnetic disk recording apparatus, and a magnetic recording medium using the magnetic recording medium substrate manufactured by the manufacturing method.
  • a magnetic recording medium is formed by forming a magnetic film on a glass substrate or an aluminum substrate, and information is recorded on the magnetic recording medium by magnetizing the magnetic film with a magnetic head.
  • the magnetic head for recording information on the magnetic recording medium or reading the recorded information is configured to move with respect to the magnetic recording medium in a state of floating from the surface. If irregularities exist on the surface of the magnetic recording medium, the irregularities and the magnetic head collide with each other when the magnetic head moves, and there is a possibility that problems such as damage to the magnetic head and damage to the magnetic recording medium may occur. In order to suppress the occurrence of such a problem, the substrate used for the magnetic recording medium is subjected to high-precision polishing so that the surface thereof becomes a smooth surface, and the occurrence of surface irregularities is suppressed as much as possible.
  • Patent Document 1 a conventional method for manufacturing a glass substrate used for a magnetic recording medium by polishing the glass substrate will be described (for example, Patent Document 1).
  • a glass material is melted (glass melting step)
  • the molten glass is poured into a planar mold, and the molten glass is sandwiched between the molds and press-molded to produce a disk-shaped glass substrate (press Molding process).
  • a circular through-hole is formed in the center of the surface of the glass substrate using a diamond core drill to produce a donut-shaped glass substrate (coring step).
  • the doughnut-shaped glass substrate is ground by a double-side polishing machine holding a plate with diamond pellets attached (first lapping process).
  • first lapping process both surfaces of the glass substrate are ground and the parallelism, flatness, and thickness of the glass substrate are preliminarily adjusted.
  • the glass substrate whose parallelism is preliminarily adjusted is ground and chamfered at the outer peripheral end face and the inner peripheral end face of the hole, and the outer diameter dimension, roundness, inner diameter dimension of the hole, etc. are finely adjusted. (End grinding process).
  • the glass substrate whose outer diameter is finely adjusted, the inner peripheral end surface and the outer peripheral end surface are polished, and the end surface is mirror-finished (end surface polishing step).
  • the glass substrate whose end face has been polished is ground again on both surfaces, and the parallelism, flatness and thickness of the glass substrate are finely adjusted (second lapping step).
  • the glass substrate with finely adjusted parallelism and the like is polished on both surfaces to make the surface unevenness uniform (polishing step).
  • polishing step damage to the glass substrate due to grinding performed in the lapping process is removed (first polishing process), and then damage remaining in the first polishing process is removed (second polishing process).
  • the polished glass substrate is used as a substrate for a magnetic recording medium.
  • NiP is deposited on the surface by electroless plating. And like a glass substrate, the surface is smoothed by grind
  • polishing process for example, patent document 2.
  • a magnetic recording medium is manufactured by depositing a magnetic material on the surface of a glass substrate or aluminum substrate whose surface has been polished by sputtering or the like.
  • the present invention solves the above-described problem, and a method for manufacturing a magnetic recording medium substrate capable of improving the smoothness of the magnetic recording medium substrate without omitting a part of the polishing step, and the method thereof
  • An object of the present invention is to provide a magnetic recording medium using the magnetic recording medium substrate manufactured in (1).
  • a polishing step for polishing a surface of a disk-shaped substrate, and a metal oxide film is formed on the surface of the substrate after the polishing step by a liquid phase deposition method, so that the magnetic And a film forming step for manufacturing the recording medium substrate.
  • a method for manufacturing a magnetic recording medium substrate according to the first aspect wherein in the polishing step, the surface roughness Ra is 0.3 to 5 [nm]. The surface of the substrate is polished.
  • the metal oxide film comprises Si, Ti, V, Mn. , Ni, Zn, Ge, Y, Zr, Nb, Sn, Sb, Ba, Ta, and W, an oxide film containing one or more components.
  • a method for manufacturing a magnetic recording medium substrate according to any one of the first to fourth aspects, wherein the substrate is a glass substrate or an aluminum substrate. To do.
  • a method for manufacturing a magnetic recording medium substrate according to any one of the first to fifth aspects, wherein in the film formation step, the substrate after the polishing step in an aqueous solution.
  • the metal oxide film is formed on the surface of the substrate after the polishing step by hydrolyzing the metal fluoro complex in the aqueous solution.
  • the seventh embodiment of the present invention is a disk-shaped substrate having a surface roughness Ra of 0.3 to 5 [nm], a metal oxide film formed on the surface of the substrate, and the metal oxide film And a magnetic film formed thereon.
  • the present invention it is possible to improve the smoothness of the surface of the magnetic recording medium substrate by forming a metal oxide film on the surface of the substrate by a liquid phase deposition method. This makes it possible to obtain the smoothness required for a substrate used for a magnetic recording medium even if a part of the polishing process is omitted.
  • FIG. 1 is a perspective view of a magnetic recording medium substrate according to an embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of the magnetic recording medium substrate according to the embodiment of the present invention, which is a cross-sectional view taken along the line II-II in FIG. It is sectional drawing which shows the one part cross section of the board
  • FIG. 1 is a perspective view of a magnetic recording medium substrate according to an embodiment of the present invention.
  • 2 is a cross-sectional view of the magnetic recording medium substrate according to the embodiment of the present invention, and is a cross-sectional view taken along the line II-II of FIG.
  • the magnetic recording medium substrate 1 has a disk-shaped substrate 2.
  • a through-hole 21 is formed in the substrate 2 so as to penetrate the substrate 2 in the thickness direction of the substrate 2.
  • a metal oxide film 3 is formed on the surface of the substrate 2.
  • the substrate 2 is a glass substrate or an aluminum substrate.
  • the size of the substrate 2 is not particularly limited, and for example, a substrate of 0.85 inch, 1 inch, 2.5 inch, or 3.5 inch is used.
  • soda lime glass, aluminosilicate glass, lithium silicate glass, or boron silicate glass manufactured by a method such as a float method or a press method is used.
  • the metal oxide film 3 includes one, two or more kinds of components among Si, Ti, V, Mn, Ni, Zn, Ge, Y, Zr, Nb, Sn, Sb, Ba, Ta, or W.
  • An oxide film containing is used.
  • a SiO 2 film or a TiO 2 film is used for the metal oxide film 3.
  • a magnetic recording medium is manufactured by forming a magnetic film on the surface of the magnetic recording medium substrate 1 by sputtering or the like.
  • the magnetic recording medium substrate 1 Next, a method for manufacturing the magnetic recording medium substrate 1 will be described. In this embodiment, the case where the substrate 1 for magnetic recording media is manufactured using a glass substrate for the substrate 2 will be described.
  • a glass material is melted (glass melting process), the molten glass is poured into a planar mold, and the molten glass is sandwiched between the molds and press-molded to obtain a disk-shaped glass.
  • a substrate is produced (press molding process).
  • the surface roughness Ra of the glass substrate is 0.1 to 2.0 [ ⁇ m]
  • the maximum height Rmax is 0.5 to 10.0 [ ⁇ m].
  • a circular through-hole is formed in the center of the surface of the glass substrate using a diamond core drill to produce a donut-shaped glass substrate (coring step).
  • the doughnut-shaped glass substrate is ground by a double-side polishing machine holding a plate with diamond pellets attached (first lapping process).
  • first lapping process both surfaces of the glass substrate are ground and the parallelism, flatness, and thickness of the glass substrate are preliminarily adjusted.
  • the surface roughness Ra of the glass substrate is 0.1 to 0.5 [ ⁇ m]
  • the maximum height Rmax is 0.5 to 5.0 [ ⁇ m].
  • the surface of the glass substrate is ground until the surface roughness Ra becomes 0.1 to 0.5 [ ⁇ m] and the maximum height Rmax becomes 0.5 to 5.0 [ ⁇ m].
  • the glass substrate with pre-adjusted parallelism is ground on the outer peripheral end face and the inner peripheral end face of the hole (end face grinding process), and then the inner peripheral end face and the outer peripheral end face are polished to mirror the end face. (End face polishing process).
  • the glass substrate whose end face has been polished is ground again on both surfaces, and the parallelism, flatness and thickness of the glass substrate are finely adjusted (second lapping step).
  • the surface roughness Ra of the glass substrate is 0.05 to 0.2 [ ⁇ m]
  • the maximum height Rmax is 0.3 to 2.0 [ ⁇ m].
  • the surface of the glass substrate is ground until the surface roughness Ra is 0.05 to 0.2 [ ⁇ m] and the maximum height Rmax is 0.3 to 2.0 [ ⁇ m].
  • polish both surfaces of the glass substrate whose parallelism is finely adjusted polishing process.
  • the surface roughness Ra of the glass substrate is 0.3 to 5 [nm]
  • the maximum height Rmax is 2.0 to 200 [nm].
  • the surface of the glass substrate is polished until the surface roughness Ra becomes 0.3 to 5 [nm] and the maximum height Rmax becomes 2.0 to 200 [nm].
  • the substrate after this polishing step corresponds to the substrate 2.
  • polishing process a known polishing apparatus is used, and both surfaces of the glass substrate are polished using foamed urethane or a suede polishing cloth.
  • the polishing material used in the polishing process is used in the form of a slurry of cerium oxide particles. For example, polishing is performed using cerium oxide having an average particle size of about 0.5 [ ⁇ m].
  • FIG. 3 is a cross-sectional view showing a partial cross section of the magnetic recording medium substrate according to the embodiment of the present invention.
  • FIG. 3A shows the substrate 2 after the polishing process is performed.
  • Groove-shaped polishing marks 4 that cannot be removed in the lapping process or the polishing process remain on the surfaces 22 and 23 of the substrate 2.
  • the surface roughness Ra of the substrate 2 after the polishing process is 0.3 to 5 [nm]
  • the maximum height Rmax is 2.0 to 200 [nm].
  • the magnetic recording medium substrate 1 is manufactured by forming the metal oxide film 3 on the surfaces 22 and 23 of the substrate 2 by a liquid phase deposition method in which a metal oxide film is deposited from the liquid phase. Specifically, the substrate 2 is immersed in an aqueous solution, and the metal oxide film 3 is formed on the surfaces 22 and 23 of the substrate 2.
  • the liquid phase deposition method is a method in which the metal oxide film 3 is directly formed on the substrate 2 using an equilibrium reaction of a metal fluoro complex in an aqueous solution.
  • This reaction can be expressed by the following chemical reaction formula.
  • Chemical reaction formula (1) MF x (x-2n) ⁇ + nH 2 O ⁇ MO n + xF ⁇ +2 nH + Chemical reaction formula (2) H 3 BO 3 + 4H + + 4F ⁇ ⁇ HBF 4 + 3H 2 O
  • Chemical reaction formula (1) is the main reaction, and M represents a metal.
  • the metal fluoro complex is hydrolyzed to produce a metal oxide.
  • fluoride ions are consumed by adding boric acid into the system.
  • the equilibrium reaction of the chemical reaction formula (1) is shifted to the right side to promote the metal oxide precipitation reaction.
  • a uniform metal oxide film 3 is formed on the surfaces 22 and 23 of the substrate 2 as shown in FIG.
  • the smoothness of the surface of the magnetic recording medium substrate 1 can be improved by forming the metal oxide film 3 on the surfaces 22 and 23 of the substrate 2 using the liquid phase deposition method. That is, the surface of the magnetic recording medium substrate 1 can be smoothed by filling the polishing marks 4 left on the surfaces 22 and 23 of the substrate 2 with the metal oxide film 3 deposited by the liquid phase deposition method.
  • the surface roughness Ra of the magnetic recording medium substrate 1 on which the metal oxide film 3 is formed is set to 0.1 to 0.3 [nm], and the maximum height Rmax is set to 1.0 to 10.0 [nm]. nm].
  • the surface roughness Ra of the magnetic recording medium substrate 1 is smoothed to the extent required for the magnetic recording medium. Can be. As a result, it is possible to omit a part of the polishing process in the manufacturing process of the magnetic recording medium substrate, and to reduce the polishing cost and the time required for polishing.
  • the flying height which is the flying height of the head from the surface of the medium, decreases as the recording density increases, and is, for example, 10 nm or less.
  • the magnetic recording medium is required to have a very smooth surface having a surface roughness Ra of several ⁇ m or less without a minute defect.
  • the surface roughness Ra of the magnetic recording medium substrate 1 can be set to 0.1 to 0.3 [nm]. nm] or less can be applied.
  • a second polishing step has been performed as the final polishing step.
  • the glass substrate after the first polishing process is polished until the surface roughness Ra becomes a level required for the magnetic recording medium.
  • the surface roughness Ra is set to 0.1 to 0.3 [nm] and the maximum height Rmax is set to 1.0 to 10. Since the thickness can be set to 0 [nm], the second polishing step can be omitted.
  • the metal oxide film 3 can be formed on the entire surface of the substrate 2. That is, the metal oxide film 3 can be simultaneously formed on both surfaces (surfaces 22 and 23) of the substrate 2, the inner peripheral end surface of the through hole 21, and the outer peripheral end surface of the substrate 2. As described above, since the metal oxide film 3 can be formed on all the surfaces of the substrate 2 in one film forming process, the metal oxide film 3 can be easily formed without increasing the number of film forming processes. Can do. Accordingly, film formation cost and time required for film formation can be reduced. In particular, since a hard disk uses both sides of a magnetic recording medium as recording areas, according to the present invention, it is possible to produce a magnetic recording medium substrate without effectively increasing the number of film forming steps.
  • the substrate 2 may be immersed in the aqueous solution, the possibility of damage to the substrate or particle contamination can be reduced. Furthermore, since it is sufficient to immerse the substrate 2 in an aqueous solution, batch processing is possible, and film formation processing can be performed on a plurality of substrates at a time. In addition, micro minute defects that are likely to occur at the edge portion of the substrate 2 can be filled with the metal oxide film 3, so that the yield of the magnetic recording medium substrate 1 can be improved.
  • a method for forming a metal oxide film on the surface of the substrate 2 there are vacuum deposition, sputtering, CVD (chemical vapor deposition), sol-gel method, etc. in addition to the liquid phase deposition method.
  • gas phase methods such as vacuum deposition, sputtering, and CVD, it is difficult to form a metal oxide film to the back of the polishing marks 4 left on the surface of the substrate 2, so that the substrate for the magnetic recording medium It is difficult to flatten the surface.
  • the film forming apparatus is expensive and it is difficult to reduce the manufacturing cost.
  • the sol-gel method is a simple method, but bubbles (voids) are generated between the surface of the substrate 2 and the sol-gel film, and it is difficult to form a good metal oxide film.
  • the metal oxide film can be formed to the depth of the polishing mark 4 by forming the film by the liquid phase deposition method, and the surface of the magnetic recording medium substrate 1 is flattened. It becomes possible to do.
  • the material used for the substrate 2 is not limited to glass, and even if aluminum is used for the substrate 2, the same actions and effects can be achieved. Is possible.
  • NiP having a thickness of 5 to 8 [ ⁇ m] is formed on the ground aluminum substrate by electroless plating. Similar to the polishing of the glass substrate, the film is formed on the aluminum substrate until the surface roughness Ra becomes 0.3 to 5 [nm] and the maximum height Rmax becomes 2.0 to 200 [nm]. Polish the NiP layer.
  • a metal recording film 3 is formed on the NiP layer by a liquid phase deposition method to produce a magnetic recording medium substrate. The metal oxide film 3 is buried in the polishing marks formed on the NiP layer, so that the surface roughness Ra is 0.1 to 0.3 [nm] and the maximum height Rmax is 1.0 to 10.0 [nm]. ].
  • FIG. 4 is an enlarged cross-sectional view of a part of the cross section of the magnetic recording medium substrate according to the embodiment of the present invention.
  • FIG. 4A shows the surface 22 of the substrate 2 after the polishing process.
  • Groove-shaped polishing marks 4 remain on the surface 22 of the substrate 2.
  • film deposition occurs with a small energy difference at the interface due to the equilibrium reaction. Therefore, when the metal oxide film 3 is formed on the surface of the substrate 2 by the liquid phase deposition method, even if the surface 22 has a groove-like shape such as the polishing mark 4, it does not depend on the shape.
  • the metal oxide film 3 can be formed at the same film formation speed.
  • the shape of the metal oxide film 3 follows the shape of the surface 22 of the substrate 2. For example, as shown in FIG. 4B, when the metal oxide film 3 is formed on the surface 22 of the substrate 2, the metal oxide film 3 is also formed inside the polishing mark 4 and follows the shape of the polishing mark 4. Thus, the trench 41 is formed on the metal oxide film 3.
  • the groove-like shape formed on the surface 22 of the substrate 2 is gradually covered as shown in FIG. 4C, and the size of the groove 42 formed on the surface gradually decreases. .
  • the metal oxide film 3 is buried in the groove caused by the polishing mark 4, and the surface of the magnetic recording medium substrate 1 becomes smooth.
  • the metal oxide film 3 is formed on the surface of the substrate 2 by the liquid phase deposition method, it is possible to obtain the smoothness required for the magnetic recording medium substrate.
  • the metal oxide film 3 having the same thickness as the depth of the polishing mark 4 is formed on the surface, the shape of the polishing mark 4 is substantially covered. Therefore, the metal oxide film 3 is matched to the smoothness of the substrate 2. The amount of film formation may be controlled.
  • the metal oxide film 3 it is preferable to form a SiO 2 film or a TiO 2 film. This is because the use of Si or Ti as the metal allows the equilibrium reaction in the aqueous solution to proceed smoothly, so that the SiO 2 film or the TiO 2 film can be formed relatively easily.
  • a magnetic recording medium is produced by forming a magnetic film on the surface of the magnetic recording medium substrate 1 produced by the above steps. That is, the magnetic recording medium according to the present embodiment has a configuration in which the metal oxide film 3 is formed on the surface of the substrate 2 made of a glass substrate or an aluminum substrate, and the magnetic film is formed on the metal oxide film 3. have.
  • a soft magnetic layer may be formed on the surface of the magnetic recording medium substrate 1, an intermediate layer may be formed on the soft magnetic layer, and a recording layer made of a magnetic film may be formed on the intermediate layer.
  • CoZrNb with a thickness of 5 to 20 [nm] is used for the soft magnetic layer
  • Pt—C with a thickness of 10 to 20 [nm] is used for the intermediate layer.
  • CoCrPt—SiO 2 having a thickness of 10 to 15 [nm] is used for the magnetic film. These films may be formed by sputtering, for example.
  • a NiP layer is formed on the aluminum substrate, and a metal oxide film 3 is formed on the NiP layer.
  • Example 1 (Substrate 2)
  • an aluminosilicate glass substrate produced by a press method was used for the substrate 2.
  • the dimensions of the substrate 2 are shown below.
  • the substrate 2 is a substrate that has been subjected to the above-described first lapping step, second lapping step, and polishing step. In the first lapping process and the second lapping process, both surfaces of the substrate 2 were polished by adjusting the weight of the surface plate applied to the glass substrate and the rotation speed of the surface plate using a double-side polishing machine.
  • polishing was performed with a load of 60 [g / cm 2 ] and a rotation speed of the surface plate of 10 [rpm].
  • a pad and a polishing liquid were used in place of the diamond pellets used in the lapping process.
  • the pad was made of urethane foam having a hardness of 80.
  • cerium oxide having a particle size of 0.6 [ ⁇ m] was dispersed in water and used as a slurry.
  • the weight applied to the glass substrate by the surface plate was 90 [g / cm 2 ], and the rotation speed of the surface plate was 25 [rpm].
  • the surface roughness Ra of the substrate 2 after the polishing process was measured by an atomic force microscope (AFM). As a result, the surface roughness Ra of the substrate 2 was 0.8 [nm], and the maximum height Rmax was 30.0 [nm].
  • (Deposition of metal oxide film 3) In Example 1, a SiO 2 film as the metal oxide film 3 was formed on the surface of the substrate 2. Specifically, a mixed solution obtained by mixing a 0.5 [mol / l] (NH 4 ) 2 SiF 6 aqueous solution and a 0.2 [mol / l] H 3 BO 3 aqueous solution into the mixed solution after the polishing step. The substrate 2 was immersed for 1 hour at room temperature.
  • Example 1 the substrate 2 was immersed in a mixed solution having a capacity of 500 [ml]. In the case of forming the SiO 2 film on a plurality of substrates at a time, the capacity of the mixed solution is increased, the mixed solution is circulated, it is sufficient to immerse the substrate 2 to the mixed solution. (Surface roughness Ra after film formation) By the immersion, a SiO 2 film having a thickness of 30 [nm] was formed on the surface of the substrate 2. Since the substrate 2 was immersed in the mixed solution, an SiO 2 film was formed on all surfaces of the substrate 2. The substrate on which the SiO 2 film is formed corresponds to the magnetic recording medium substrate 1 described above. The surface roughness Ra of the substrate on which the SiO 2 film was formed was measured. As a result, the surface roughness Ra was 0.1 [nm].
  • the SiO 2 film is formed on the surface of the substrate 2 after the polishing process by the liquid phase deposition method, so that the second polishing process is not performed, and the magnetic recording medium substrate is performed.
  • a substrate having a sufficiently smooth surface could be produced.
  • Example 2 In Example 2, a glass substrate was used as the substrate 2 and the polishing process conditions were changed. Specifically, the polishing amount (polishing time) was shortened in the polishing process.
  • the surface roughness Ra of the substrate 2 was 5 [nm], and the maximum height Rmax was 200 [nm]. Then, a SiO 2 film having a thickness of 200 [nm] was formed on the surface of the substrate 2 by the same method as in Example 1.
  • the substrate on which the SiO 2 film is formed corresponds to the magnetic recording medium substrate 1 described above.
  • the surface roughness Ra of the substrate on which the SiO 2 film was formed was 0.1 [nm].
  • Example 3 In Example 3, an aluminum substrate was used as the substrate 2. Since the dimensions of the substrate 2 are the same as those of the first embodiment, description thereof is omitted.
  • the surface of the substrate 2 was ground, and NiP was formed on the surface by electroless plating. In Example 3, a 5 ⁇ m NiP layer was formed. Then, the NiP layer formed on the substrate 2 was polished in the same manner as the polishing for the glass substrate.
  • the surface roughness Ra of the substrate 2 after polishing was 0.8 [nm], and the maximum height Rmax was 30.0 [nm].
  • the substrate 2 was immersed in the same mixed solution as in Example 1. As a result, a SiO 2 film having a thickness of 30 [nm] was formed on the NiP layer.
  • the substrate on which the SiO 2 film is formed corresponds to the magnetic recording medium substrate 1 described above.
  • the surface roughness Ra of the substrate on which the SiO 2 film was formed was measured. As a result, the surface roughness Ra was 0.1 [nm].
  • Example 1 As described above, according to Examples 2 and 3, as in Example 1, a substrate having a sufficiently smooth surface as a magnetic recording medium substrate can be produced without performing the final polishing step. It was.
  • the surface roughness Ra of the substrate 2 after the polishing process was 0.8 [nm] or 5 [nm]. Even if it is other than, the same effect can be produced.
  • the surface roughness Ra after the polishing process is 0.3 to 5 [nm]
  • the surface roughness Ra is set to 0.1 to 0.3 [nm] by forming a SiO 2 film on the substrate 2. nm].
  • the surface roughness Ra can be reduced by changing the time during which the substrate 2 is immersed in the mixed solution or adjusting the concentration of the mixed solution.
  • the thickness can be 0.1 to 0.3 [nm].
  • the SiO 2 film is used as the metal oxide film 3, but the metal oxide film according to the present invention is not limited to the SiO 2 film. Even when an oxide film containing one kind or two or more kinds of components among the plurality of metals described above is used, the same operation and effect as when the SiO 2 film is used can be obtained.
  • the surface roughness Ra can be set to 0.1 to 0.3 [nm] by changing the time for immersing the substrate 2 in the mixed solution or adjusting the concentration of the mixed solution.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

Dans la présente invention, la surface d'un substrat en verre ou en aluminium en forme de disque est dépolie jusqu'à ce sa rugosité de surface (Ra) se situe entre 0,3 et 0,8 [nm]. Le substrat dépoli est plongé dans une solution aqueuse pour provoquer ainsi l'hydrolyse d'un complexe métal fluoro dans la solution aqueuse, ce qui forme un film d'oxyde de métal (3) sur la surface dépolie du substrat. On peut ainsi produire un substrat (1) pour un support d'enregistrement magnétique qui comporte un film d'oxyde de métal (3) formé sur sa surface.
PCT/JP2009/050293 2008-01-29 2009-01-13 Procédé de production d'un substrat pour support d'enregistrement magnétique et support d'enregistrement magnétique WO2009096217A1 (fr)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113362863A (zh) * 2017-06-30 2021-09-07 Hoya株式会社 磁盘用基板和磁盘
TWI755466B (zh) * 2016-12-28 2022-02-21 日商東洋鋼鈑股份有限公司 硬碟用基板及使用其之硬碟裝置

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